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NO953636D0 - Fremgangsmåte til fremstilling av kloridfattige eller kloridfrie aminofunksjonelle organosilaner - Google Patents

Fremgangsmåte til fremstilling av kloridfattige eller kloridfrie aminofunksjonelle organosilaner

Info

Publication number
NO953636D0
NO953636D0 NO953636A NO953636A NO953636D0 NO 953636 D0 NO953636 D0 NO 953636D0 NO 953636 A NO953636 A NO 953636A NO 953636 A NO953636 A NO 953636A NO 953636 D0 NO953636 D0 NO 953636D0
Authority
NO
Norway
Prior art keywords
chloride
poor
preparation
free amino
functional organosilanes
Prior art date
Application number
NO953636A
Other languages
English (en)
Other versions
NO953636L (no
NO304554B1 (no
Inventor
Claus-Dietrich Seiler
Hartwig Rauleder
Hans-Joachim Kotzsch
Hans Gunther Srebny
Original Assignee
Huels Chemische Werke Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19513976A external-priority patent/DE19513976A1/de
Application filed by Huels Chemische Werke Ag filed Critical Huels Chemische Werke Ag
Publication of NO953636D0 publication Critical patent/NO953636D0/no
Publication of NO953636L publication Critical patent/NO953636L/no
Publication of NO304554B1 publication Critical patent/NO304554B1/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C07F7/1872—Preparation; Treatments not provided for in C07F7/20
    • C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/20—Purification, separation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NO953636A 1994-09-14 1995-09-14 FremgangsmÕte til fremstilling av kloridfattige eller kloridfrie aminofunksjonelle organosilaner, og de derav fremstilte aminofunksjonelle organosilaner NO304554B1 (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4432638 1994-09-14
DE19513976A DE19513976A1 (de) 1994-09-14 1995-04-13 Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen

Publications (3)

Publication Number Publication Date
NO953636D0 true NO953636D0 (no) 1995-09-14
NO953636L NO953636L (no) 1996-03-15
NO304554B1 NO304554B1 (no) 1999-01-11

Family

ID=25940101

Family Applications (1)

Application Number Title Priority Date Filing Date
NO953636A NO304554B1 (no) 1994-09-14 1995-09-14 FremgangsmÕte til fremstilling av kloridfattige eller kloridfrie aminofunksjonelle organosilaner, og de derav fremstilte aminofunksjonelle organosilaner

Country Status (6)

Country Link
US (1) US5616755A (no)
EP (1) EP0702017B1 (no)
JP (1) JPH0881478A (no)
CZ (1) CZ209295A3 (no)
NO (1) NO304554B1 (no)
SK (1) SK105695A3 (no)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19516386A1 (de) * 1995-05-04 1996-11-07 Huels Chemische Werke Ag Verfahren zur Herstellung von an chlorfunktionellen Organosilanen armen bzw. freien aminofunktionellen Organosilanen
EP0999215B1 (de) 1998-11-06 2004-07-28 Degussa AG Verfahren zur Herstellung von Alkoxysilanen
ATE284406T1 (de) * 1998-11-06 2004-12-15 Degussa Verfahren zur herstellung von chloridarmen oder chloridfreien alkoxysilanen
US7012292B1 (en) * 1998-11-25 2006-03-14 Advanced Technology Materials, Inc Oxidative top electrode deposition process, and microelectronic device structure
DE10058620A1 (de) * 2000-11-25 2002-05-29 Degussa Verfahren zur Herstellung von Aminoalkylsilanen
US7005392B2 (en) * 2001-03-30 2006-02-28 Advanced Technology Materials, Inc. Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same
US7084080B2 (en) * 2001-03-30 2006-08-01 Advanced Technology Materials, Inc. Silicon source reagent compositions, and method of making and using same for microelectronic device structure
DE10126669A1 (de) 2001-06-01 2002-12-05 Degussa Verfahren zur Spaltung von cyclischen Organosilanen bei der Herstellung von aminofunktionellen Organoalkoxysilanen
DE10143568C2 (de) 2001-09-05 2003-07-03 Degussa Verfahren zur Behandlung von Aminosilanverfärbungen
US6452033B1 (en) * 2002-02-11 2002-09-17 Dow Corning Corporation Method of making N-[2-aminoethyl] aminoalkylalkoxysilanes with ethyenediamine salt recycle
DE10353063B4 (de) * 2003-11-13 2006-03-02 Wacker-Chemie Gmbh Verfahren zur Herstellung von (N-Organylaminoorganyl)- und (N,N-Diorganylaminoorganyl)triorganylsilanen sowie (N-Cyclohexylaminomethyl)trimethoxysilan und [N,N-Bis-(N',N'-dimethylaminopropyl)aminomethyl]triorganylsilan erhältliche mittels dieses Verfahrens
DE102004008442A1 (de) * 2004-02-19 2005-09-15 Degussa Ag Siliciumverbindungen für die Erzeugung von SIO2-haltigen Isolierschichten auf Chips
DE102004025766A1 (de) * 2004-05-26 2005-12-22 Degussa Ag Herstellung von Organosilanestern
DE102004037675A1 (de) * 2004-08-04 2006-03-16 Degussa Ag Verfahren und Vorrichtung zur Reinigung von Wasserstoffverbindungen enthaltendem Siliciumtetrachlorid oder Germaniumtetrachlorid
DE102004060627A1 (de) * 2004-12-16 2006-07-06 Wacker Chemie Ag Verfahren zur kontinuierlichen Herstellung von Amino-Gruppen tragenden Silicium-Verbindungen
US9312557B2 (en) * 2005-05-11 2016-04-12 Schlumberger Technology Corporation Fuel cell apparatus and method for downhole power systems
DE102005041137A1 (de) * 2005-08-30 2007-03-01 Degussa Ag Reaktor, Anlage und großtechnisches Verfahren zur kontinuierlichen Herstellung von hochreinem Siliciumtetrachlorid oder hochreinem Germaniumtetrachlorid
DE102006003464A1 (de) * 2006-01-25 2007-07-26 Degussa Gmbh Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung
US7750173B2 (en) * 2007-01-18 2010-07-06 Advanced Technology Materials, Inc. Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films
DE102007007874A1 (de) * 2007-02-14 2008-08-21 Evonik Degussa Gmbh Verfahren zur Herstellung höherer Silane
DE102007014107A1 (de) * 2007-03-21 2008-09-25 Evonik Degussa Gmbh Aufarbeitung borhaltiger Chlorsilanströme
DE102007037193A1 (de) 2007-08-07 2009-02-12 Wacker Chemie Ag Verfahren zur Herstellung von Aminoorganosilanen
DE102007050199A1 (de) * 2007-10-20 2009-04-23 Evonik Degussa Gmbh Entfernung von Fremdmetallen aus anorganischen Silanen
DE102007050573A1 (de) * 2007-10-23 2009-04-30 Evonik Degussa Gmbh Großgebinde zur Handhabung und für den Transport von hochreinen und ultra hochreinen Chemikalien
DE102007059170A1 (de) * 2007-12-06 2009-06-10 Evonik Degussa Gmbh Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen
DE102008004396A1 (de) * 2008-01-14 2009-07-16 Evonik Degussa Gmbh Anlage und Verfahren zur Verminderung des Gehaltes von Elementen, wie Bor, in Halogensilanen
DE102008002182A1 (de) * 2008-06-03 2009-12-10 Evonik Degussa Gmbh Verfahren zur Herstellung von Alkylaminoalkylalkoxysilanen
DE102008002183A1 (de) 2008-06-03 2009-12-10 Evonik Degussa Gmbh Verfahren zur Aufarbeitung salzhaltiger Rückstände aus der Herstellung von aminofunktionellen Organosilanen
DE102008002181A1 (de) * 2008-06-03 2009-12-10 Evonik Degussa Gmbh Verfahren zur wässrigen Aufarbeitung eines Ammoniumhalogenide und/oder organische Aminhydrohalogenide enthaltenden aminofunktionellen Organosilans
DE102008002537A1 (de) * 2008-06-19 2009-12-24 Evonik Degussa Gmbh Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens
DE102008054537A1 (de) * 2008-12-11 2010-06-17 Evonik Degussa Gmbh Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration
DE102009026755A1 (de) 2009-06-04 2010-12-09 Wacker Chemie Ag Verfahren zur Herstellung von Aminoorganosilanen
JP2012136472A (ja) * 2010-12-27 2012-07-19 Shin-Etsu Chemical Co Ltd 精製アミノシランの製造方法
DE102011006053A1 (de) 2011-03-24 2012-09-27 Evonik Degussa Gmbh Verfahren zur Dechlorierung von alkylfunktionellen Organosilanen und alkylfunktionellen Organosiloxanen
US9337018B2 (en) * 2012-06-01 2016-05-10 Air Products And Chemicals, Inc. Methods for depositing films with organoaminodisilane precursors
DE102012221170A1 (de) 2012-11-20 2014-05-22 Evonik Industries Ag Verfahren zur Tiefenimprägnierung von mineralischen Substraten und Verwendung von Organosilanen und/oder Organosilxanen zur Tiefenimprägnierung von mineralischen Substraten
CN103880875B (zh) * 2012-12-19 2017-04-05 张家港市国泰华荣化工新材料有限公司 一种固砂偶联剂的制备方法
CN103333200B (zh) * 2013-07-22 2015-08-12 荆州市江汉精细化工有限公司 一种正丁基氨丙基三烷氧基硅烷的合成方法
JP7077966B2 (ja) * 2019-01-07 2022-05-31 信越化学工業株式会社 アミノ基含有有機ケイ素化合物の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2521399A1 (de) * 1975-05-14 1976-11-25 Bayer Ag Verfahren zur herstellung von aminoalkylsilanen
DE69116612T2 (de) * 1990-07-05 1996-05-30 Osi Specialties Inc Verfahren zur Verminderung der Verunreinigung durch Halogenide in Alkoxysilanen
JP2552950B2 (ja) * 1990-11-13 1996-11-13 信越化学工業株式会社 アルコキシシランの製造方法
DE4130643A1 (de) * 1991-09-14 1993-03-18 Degussa Verfahren zur reinigung von alkoxysilanen
US5210254A (en) * 1992-03-31 1993-05-11 Union Carbide Chemicals & Plastics Technology Corporation Acidic halide neutralization in alkoxysilanes

Also Published As

Publication number Publication date
JPH0881478A (ja) 1996-03-26
EP0702017B1 (de) 2001-11-14
SK105695A3 (en) 1996-04-03
US5616755A (en) 1997-04-01
NO953636L (no) 1996-03-15
CZ209295A3 (en) 1996-04-17
EP0702017A1 (de) 1996-03-20
NO304554B1 (no) 1999-01-11

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Free format text: LAPSED IN MARCH 2002