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NL2003310A1 - Radiation source, lithographic apparatus and device manufacturing method. - Google Patents

Radiation source, lithographic apparatus and device manufacturing method. Download PDF

Info

Publication number
NL2003310A1
NL2003310A1 NL2003310A NL2003310A NL2003310A1 NL 2003310 A1 NL2003310 A1 NL 2003310A1 NL 2003310 A NL2003310 A NL 2003310A NL 2003310 A NL2003310 A NL 2003310A NL 2003310 A1 NL2003310 A1 NL 2003310A1
Authority
NL
Netherlands
Prior art keywords
radiation source
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
NL2003310A
Other languages
English (en)
Inventor
Vadim Banine
Erik Loopstra
Roel Moors
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2003310A1 publication Critical patent/NL2003310A1/nl

Links

Classifications

    • H10P76/2042—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094—Reduction, prevention or protection from contamination; Cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
NL2003310A 2008-08-14 2009-07-30 Radiation source, lithographic apparatus and device manufacturing method. NL2003310A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13614408P 2008-08-14 2008-08-14

Publications (1)

Publication Number Publication Date
NL2003310A1 true NL2003310A1 (nl) 2010-02-16

Family

ID=41259409

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2003310A NL2003310A1 (nl) 2008-08-14 2009-07-30 Radiation source, lithographic apparatus and device manufacturing method.

Country Status (7)

Country Link
US (1) US9207548B2 (nl)
JP (1) JP5732392B2 (nl)
KR (1) KR101652361B1 (nl)
CN (1) CN102119365B (nl)
NL (1) NL2003310A1 (nl)
TW (1) TWI468874B (nl)
WO (1) WO2010017892A1 (nl)

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EP2545413A1 (en) * 2010-03-12 2013-01-16 ASML Netherlands B.V. Radiation source, lithographic apparatus and device manufacturing method
US9513569B2 (en) 2010-03-18 2016-12-06 ETH Zürich Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and EUV source with such a collector
WO2011116897A1 (en) 2010-03-25 2011-09-29 Eth Zurich A beam line for a source of extreme ultraviolet (euv) radiation
WO2011116898A1 (en) 2010-03-25 2011-09-29 Eth Zurich Steering device for controlling the direction and/or velocity of droplets of a target material and extreme euv source with such a steering device
WO2011131431A1 (en) * 2010-04-22 2011-10-27 Asml Netherlands B.V. Collector mirror assembly and method for producing extreme ultraviolet radiation
US8648999B2 (en) 2010-07-22 2014-02-11 Cymer, Llc Alignment of light source focus
US9268031B2 (en) 2012-04-09 2016-02-23 Kla-Tencor Corporation Advanced debris mitigation of EUV light source
KR101349898B1 (ko) * 2012-08-30 2014-01-16 한국과학기술연구원 극자외선 빔을 생성하기 위한 모듈
CN103809385A (zh) * 2012-11-12 2014-05-21 川宝科技股份有限公司 曝光机光罩结构的水平角度调整机构及方法
CN103108481B (zh) * 2012-11-30 2016-03-30 中国科学院微电子研究所 一种集光系统防污染保护装置
CN103064259B (zh) * 2012-12-10 2014-11-12 华中科技大学 一种极紫外激光等离子体光源碎屑的隔离方法及系统
WO2015086232A1 (en) * 2013-12-09 2015-06-18 Asml Netherlands B.V. Radiation source device, lithographic apparatus and device manufacturing method
NL2014179A (en) * 2014-02-24 2015-08-25 Asml Netherlands Bv Lithographic system.
US9377693B2 (en) 2014-03-13 2016-06-28 Taiwan Semiconductor Manufacturing Company, Ltd. Collector in an extreme ultraviolet lithography system with optimal air curtain protection
US10101664B2 (en) * 2014-11-01 2018-10-16 Kla-Tencor Corporation Apparatus and methods for optics protection from debris in plasma-based light source
CN104698773B (zh) * 2015-03-31 2017-06-16 上海华力微电子有限公司 光刻对准标记结构及其制造方法
US9538628B1 (en) * 2015-06-11 2017-01-03 Taiwan Semiconductor Manufacturing Co., Ltd. Method for EUV power improvement with fuel droplet trajectory stabilization
CN106324996B (zh) * 2015-06-15 2017-10-20 中国科学院上海光学精密机械研究所 光刻机原位多通道成像质量检测装置及方法
JP6556250B2 (ja) 2015-11-06 2019-08-07 ギガフォトン株式会社 極端紫外光生成装置
US10310380B2 (en) * 2016-12-07 2019-06-04 Taiwan Semiconductor Manufacturing Co., Ltd. High-brightness light source
CN117202469A (zh) 2017-01-06 2023-12-08 Asml荷兰有限公司 引导装置和相关联的系统
US10955749B2 (en) 2017-01-06 2021-03-23 Asml Netherlands B.V. Guiding device and associated system
JP7630515B2 (ja) * 2019-12-23 2025-02-17 エーエスエムエル ネザーランズ ビー．ブイ． コレクタ流リング
JP7467174B2 (ja) * 2020-03-16 2024-04-15 ギガフォトン株式会社 チャンバ装置、極端紫外光生成装置、及び電子デバイスの製造方法

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US6972421B2 (en) 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US6614505B2 (en) * 2001-01-10 2003-09-02 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing method, and device manufactured thereby
CN1262887C (zh) * 2001-12-28 2006-07-05 Asml荷兰有限公司 一种光刻仪及集成电路装置的制造方法
KR100589236B1 (ko) * 2002-08-15 2006-06-14 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치 및 상기 장치에 사용하는 반사기조립체
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
DE10337667B4 (de) * 2003-08-12 2012-03-22 Xtreme Technologies Gmbh Plasma-Strahlungsquelle und Anordnung zur Erzeugung eines Gasvorhangs für Plasma-Strahlungsquellen
DE602004003015T2 (de) * 2003-10-06 2007-02-08 Asml Netherlands B.V. Verfahren und Gerät zur Herstellung einer Schutzschicht auf einem Spiegel
US7167232B2 (en) * 2003-12-30 2007-01-23 Asml Netherlands B.V. Lithographic apparatus and radiation source comprising a debris-mitigation system and method for mitigating debris particles in a lithographic apparatus
EP1743221B1 (en) * 2004-03-31 2016-01-06 Philips Intellectual Property & Standards GmbH Removal of particles generated by a radiation source
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JP4578901B2 (ja) 2004-09-09 2010-11-10 株式会社小松製作所 極端紫外光源装置
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JP4888046B2 (ja) * 2006-10-26 2012-02-29 ウシオ電機株式会社 極端紫外光光源装置
JP5191541B2 (ja) * 2007-08-23 2013-05-08 エーエスエムエル ネザーランズ ビー．ブイ． 極端紫外線を生成するモジュールおよび方法、並びにリソグラフィ投影装置
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source

Also Published As

Publication number Publication date
TW201009513A (en) 2010-03-01
JP5732392B2 (ja) 2015-06-10
TWI468874B (zh) 2015-01-11
US9207548B2 (en) 2015-12-08
KR20110055610A (ko) 2011-05-25
KR101652361B1 (ko) 2016-08-30
CN102119365A (zh) 2011-07-06
CN102119365B (zh) 2013-06-05
WO2010017892A1 (en) 2010-02-18
US20110188014A1 (en) 2011-08-04
JP2011530819A (ja) 2011-12-22

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Effective date: 20100708