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NL2003118A1 - Alignment system, lithographic system and method. - Google Patents

Alignment system, lithographic system and method. Download PDF

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Publication number
NL2003118A1
NL2003118A1 NL2003118A NL2003118A NL2003118A1 NL 2003118 A1 NL2003118 A1 NL 2003118A1 NL 2003118 A NL2003118 A NL 2003118A NL 2003118 A NL2003118 A NL 2003118A NL 2003118 A1 NL2003118 A1 NL 2003118A1
Authority
NL
Netherlands
Prior art keywords
lithographic
alignment
alignment system
lithographic system
Prior art date
Application number
NL2003118A
Other languages
English (en)
Inventor
Everhardus Mos
Henricus Megens
Maurits Van Der Schaar
Hubertus Simons
Scott Middlebrooks
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2003118A1 publication Critical patent/NL2003118A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/705—Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2003118A 2008-07-14 2009-07-03 Alignment system, lithographic system and method. NL2003118A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8038308P 2008-07-14 2008-07-14

Publications (1)

Publication Number Publication Date
NL2003118A1 true NL2003118A1 (nl) 2010-01-18

Family

ID=41401575

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2003118A NL2003118A1 (nl) 2008-07-14 2009-07-03 Alignment system, lithographic system and method.

Country Status (3)

Country Link
US (1) US8706442B2 (nl)
NL (1) NL2003118A1 (nl)
WO (1) WO2010006935A2 (nl)

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EP4060409A1 (en) * 2021-03-16 2022-09-21 ASML Netherlands B.V. Novel interface definition for lithographic apparatus
KR20230147100A (ko) * 2021-02-25 2023-10-20 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치에 대한 신규 인터페이스 규정
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Also Published As

Publication number Publication date
US20110196646A1 (en) 2011-08-11
US8706442B2 (en) 2014-04-22
WO2010006935A3 (en) 2010-03-11
WO2010006935A2 (en) 2010-01-21

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Effective date: 20100323