MX2018009285A - Metodo y dispositivo para la creacion planar y modificaciones en estados solidos. - Google Patents
Metodo y dispositivo para la creacion planar y modificaciones en estados solidos.Info
- Publication number
- MX2018009285A MX2018009285A MX2018009285A MX2018009285A MX2018009285A MX 2018009285 A MX2018009285 A MX 2018009285A MX 2018009285 A MX2018009285 A MX 2018009285A MX 2018009285 A MX2018009285 A MX 2018009285A MX 2018009285 A MX2018009285 A MX 2018009285A
- Authority
- MX
- Mexico
- Prior art keywords
- solid state
- modifications
- solid bodies
- laser processing
- producing planar
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0064—Devices for the automatic drive or the program control of the machines
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
-
- H10P74/203—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials, e.g. fibre reinforced
- B23K2103/166—Multilayered materials
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Laser Beam Processing (AREA)
- Silicon Compounds (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
La presente invención se relaciona con un método para crear modificaciones en un estado sólido, en donde una región para guía de grietas para guiar una grieta para separar una porción de estado sólido, en particular una capa de estado sólido, desde el cuerpo de estado sólido, se predetermina por las modificaciones. El método de acuerdo con la invención de preferencia comprende los pasos: Mover el estado sólido con relación al sistema para procesamiento por láser, luego generar una pluralidad de haces láser por medio del sistema para procesamiento por láser para crear al menos una modificación, en donde el sistema para procesamiento por láser se ajusta para enfocamiento definido de los haces láser continuamente como una función de una pluralidad de parámetros, en particular al menos dos parámetros. (figura 1).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102016000051.1A DE102016000051A1 (de) | 2016-01-05 | 2016-01-05 | Verfahren und Vorrichtung zum planaren Erzeugen von Modifikationen in Festkörpern |
| PCT/EP2016/080667 WO2017118533A1 (de) | 2016-01-05 | 2016-12-12 | Verfahren und vorrichtung zum planaren erzeugen von modifikationen in festkörpern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2018009285A true MX2018009285A (es) | 2019-02-28 |
Family
ID=57680223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2018009285A MX2018009285A (es) | 2016-01-05 | 2016-12-12 | Metodo y dispositivo para la creacion planar y modificaciones en estados solidos. |
Country Status (13)
| Country | Link |
|---|---|
| US (2) | US11059202B2 (es) |
| EP (1) | EP3400110B1 (es) |
| JP (2) | JP6818755B2 (es) |
| KR (1) | KR102125439B1 (es) |
| CN (1) | CN108472766B (es) |
| BR (1) | BR112018013599A2 (es) |
| CA (1) | CA3010394A1 (es) |
| DE (1) | DE102016000051A1 (es) |
| MX (1) | MX2018009285A (es) |
| MY (1) | MY191384A (es) |
| SG (1) | SG11201805682WA (es) |
| WO (1) | WO2017118533A1 (es) |
| ZA (1) | ZA201804352B (es) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102017007586A1 (de) * | 2017-08-11 | 2019-02-14 | Siltectra Gmbh | Fertigungsanlage zum Abtrennen von Wafern von Spendersubstraten |
| DE102018005218A1 (de) * | 2018-03-20 | 2019-09-26 | Innolite Gmbh | Verfahren und Vorrichtung zum Verändern eines Materials in einem Volumenkörper |
| US10388526B1 (en) | 2018-04-20 | 2019-08-20 | Semiconductor Components Industries, Llc | Semiconductor wafer thinning systems and related methods |
| DE102018119313B4 (de) * | 2018-08-08 | 2023-03-30 | Rogers Germany Gmbh | Verfahren zum Bearbeiten eines Metall-Keramik-Substrats und Anlage zum Durchführen des Verfahrens |
| CN113165109B (zh) * | 2018-12-21 | 2023-06-27 | 东京毅力科创株式会社 | 基板处理装置和基板处理方法 |
| KR20210141570A (ko) | 2019-03-21 | 2021-11-23 | 코닝 인코포레이티드 | 환형 볼텍스 레이저 빔을 사용하는 유리-기반 물체에 마이크로-홀을 형성하기 위한 시스템 및 방법 |
| DE102019111985A1 (de) * | 2019-05-08 | 2020-11-12 | Infineon Technologies Ag | Verfahren zum herstellen von siliziumcarbid-vorrichtungen und wafer-verbund, der mit laser modifizierte zonen in einem handhabungssubstrat enthält |
| US11766746B2 (en) * | 2019-05-17 | 2023-09-26 | Corning Incorporated | Phase-modified quasi-non-diffracting laser beams for high angle laser processing of transparent workpieces |
| WO2021060365A1 (ja) | 2019-09-27 | 2021-04-01 | 学校法人関西学院 | 半導体基板の製造方法及び半導体基板の製造装置 |
| CN114423890B (zh) | 2019-09-27 | 2024-10-25 | 学校法人关西学院 | SiC半导体装置的制造方法和SiC半导体装置 |
| DE102019217021A1 (de) * | 2019-11-05 | 2021-05-06 | Photon Energy Gmbh | Laserschneidverfahren und zugehörige Laserschneidvorrichtung |
| JP7443053B2 (ja) * | 2019-12-26 | 2024-03-05 | 株式会社ディスコ | レーザー加工装置 |
| CN111420938B (zh) * | 2020-04-28 | 2022-03-15 | 株洲国创轨道科技有限公司 | 一种多激光头智能化激光清洗方法及装置 |
| CN113146048A (zh) * | 2021-03-17 | 2021-07-23 | 广东工业大学 | 一种激光应力辅助pdms表面裂纹生长的方法及装置 |
| CN114800899A (zh) * | 2022-04-19 | 2022-07-29 | 广东高景太阳能科技有限公司 | 一种单晶硅片色差改善方法、系统、存储介质及电子设备 |
| CN117283152A (zh) * | 2023-08-17 | 2023-12-26 | 山东大学 | 一种高效率激光切割碳化硅晶锭的方法及装置 |
| CN120095315B (zh) * | 2025-04-29 | 2025-09-16 | 西湖仪器(杭州)技术有限公司 | 一种SiC晶锭的激光加工装置 |
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| JP3179140B2 (ja) * | 1991-08-06 | 2001-06-25 | オリンパス光学工業株式会社 | 薄膜の屈折率測定装置 |
| JP2548846Y2 (ja) | 1991-10-31 | 1997-09-24 | 日野自動車工業株式会社 | 車両用前部表示装置 |
| JP4659300B2 (ja) * | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップの製造方法 |
| US6891627B1 (en) * | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
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| GB0328370D0 (en) * | 2003-12-05 | 2004-01-14 | Southampton Photonics Ltd | Apparatus for providing optical radiation |
| JP2005294325A (ja) * | 2004-03-31 | 2005-10-20 | Sharp Corp | 基板製造方法及び基板製造装置 |
| JP4421972B2 (ja) * | 2004-04-30 | 2010-02-24 | 日東電工株式会社 | 半導体装置の製法 |
| FR2870988B1 (fr) * | 2004-06-01 | 2006-08-11 | Michel Bruel | Procede de realisation d'une structure multi-couches comportant, en profondeur, une couche de separation |
| MX2007005018A (es) | 2004-10-25 | 2008-02-19 | Mitsuboshi Diamond Ind Co Ltd | Metodo y aparato para formar ranuras. |
| IL174590A (en) * | 2005-03-29 | 2015-03-31 | Yoel Arieli | A method and an imaging system for the analysis of optical properties of an object illuminated by a light source |
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| JP2009140959A (ja) * | 2007-12-03 | 2009-06-25 | Tokyo Seimitsu Co Ltd | レーザーダイシング装置及びダイシング方法 |
| US8877077B2 (en) * | 2008-12-23 | 2014-11-04 | Siltectra Gmbh | Method for producing thin, free-standing layers of solid state materials with structured surfaces |
| GB0900036D0 (en) * | 2009-01-03 | 2009-02-11 | M Solv Ltd | Method and apparatus for forming grooves with complex shape in the surface of apolymer |
| EP2210696A1 (en) * | 2009-01-26 | 2010-07-28 | Excico France | Method and apparatus for irradiating a semiconductor material surface by laser energy |
| SG173283A1 (en) * | 2010-01-26 | 2011-08-29 | Semiconductor Energy Lab | Method for manufacturing soi substrate |
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| CN102939527B (zh) * | 2010-06-04 | 2016-05-04 | Imec公司 | 用于确定掺杂的半导体区域的有效掺杂浓度的方法 |
| RU2459691C2 (ru) * | 2010-11-29 | 2012-08-27 | Юрий Георгиевич Шретер | Способ отделения поверхностного слоя полупроводникового кристалла (варианты) |
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| DE102013016669A1 (de) * | 2013-10-08 | 2015-04-09 | Siltectra Gmbh | Kombiniertes Herstellungsverfahren zum Abtrennen mehrerer dünner Festkörperschichten von einem dicken Festkörper |
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| JP6494382B2 (ja) * | 2015-04-06 | 2019-04-03 | 株式会社ディスコ | ウエーハの生成方法 |
| US11309191B2 (en) * | 2018-08-07 | 2022-04-19 | Siltectra Gmbh | Method for modifying substrates based on crystal lattice dislocation density |
-
2016
- 2016-01-05 DE DE102016000051.1A patent/DE102016000051A1/de not_active Withdrawn
- 2016-12-12 KR KR1020187022290A patent/KR102125439B1/ko active Active
- 2016-12-12 MY MYPI2018702318A patent/MY191384A/en unknown
- 2016-12-12 SG SG11201805682WA patent/SG11201805682WA/en unknown
- 2016-12-12 EP EP16819470.2A patent/EP3400110B1/de active Active
- 2016-12-12 WO PCT/EP2016/080667 patent/WO2017118533A1/de not_active Ceased
- 2016-12-12 MX MX2018009285A patent/MX2018009285A/es unknown
- 2016-12-12 JP JP2018534125A patent/JP6818755B2/ja active Active
- 2016-12-12 BR BR112018013599-2A patent/BR112018013599A2/pt not_active Application Discontinuation
- 2016-12-12 US US16/067,946 patent/US11059202B2/en active Active
- 2016-12-12 CN CN201680078011.9A patent/CN108472766B/zh active Active
- 2016-12-12 CA CA3010394A patent/CA3010394A1/en not_active Abandoned
-
2018
- 2018-06-28 ZA ZA2018/04352A patent/ZA201804352B/en unknown
-
2020
- 2020-12-28 JP JP2020219346A patent/JP7271501B2/ja active Active
-
2021
- 2021-06-09 US US17/343,219 patent/US20210299910A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR102125439B1 (ko) | 2020-06-22 |
| CN108472766B (zh) | 2021-02-09 |
| EP3400110A1 (de) | 2018-11-14 |
| BR112018013599A2 (pt) | 2019-01-08 |
| DE102016000051A1 (de) | 2017-07-06 |
| WO2017118533A1 (de) | 2017-07-13 |
| US20210299910A1 (en) | 2021-09-30 |
| MY191384A (en) | 2022-06-22 |
| CA3010394A1 (en) | 2017-07-13 |
| CN108472766A (zh) | 2018-08-31 |
| JP2019500220A (ja) | 2019-01-10 |
| US11059202B2 (en) | 2021-07-13 |
| SG11201805682WA (en) | 2018-08-30 |
| EP3400110B1 (de) | 2021-04-07 |
| JP6818755B2 (ja) | 2021-01-20 |
| JP7271501B2 (ja) | 2023-05-11 |
| US20190366586A1 (en) | 2019-12-05 |
| KR20180100063A (ko) | 2018-09-06 |
| JP2021061435A (ja) | 2021-04-15 |
| ZA201804352B (en) | 2019-06-26 |
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