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WO2025254110A1 - Glass, chemically strengthened glass, method for producing glass, and method for producing chemically strengthened glass - Google Patents

Glass, chemically strengthened glass, method for producing glass, and method for producing chemically strengthened glass

Info

Publication number
WO2025254110A1
WO2025254110A1 PCT/JP2025/020045 JP2025020045W WO2025254110A1 WO 2025254110 A1 WO2025254110 A1 WO 2025254110A1 JP 2025020045 W JP2025020045 W JP 2025020045W WO 2025254110 A1 WO2025254110 A1 WO 2025254110A1
Authority
WO
WIPO (PCT)
Prior art keywords
glass
less
expressed
chemically strengthened
zro2
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2025/020045
Other languages
French (fr)
Japanese (ja)
Inventor
要 関谷
健太 齊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of WO2025254110A1 publication Critical patent/WO2025254110A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum

Definitions

  • the present invention relates to glass, chemically strengthened glass, a method for manufacturing glass, and a method for manufacturing chemically strengthened glass.
  • the present invention also relates to display devices, electronic device products, and solar cell modules that include the above-mentioned glass or chemically strengthened glass.
  • Chemically strengthened glass materials are sometimes used in electronic devices such as mobile phones, smartphones, and tablet devices, as well as in car navigation systems and other electronic devices installed in vehicles such as automobiles, and in window glass.
  • glass ceramics containing microcrystals have been attracting attention as a base glass for obtaining high-strength chemically strengthened glass.
  • Increasing the crystallization rate of crystallized glass makes it possible to further increase the strength of chemically strengthened glass obtained by using that crystallized glass as a base glass.
  • glass compositions containing large amounts of elements such as Li ions, which form the crystals, and Zr, which acts as the crystal nucleus, are being developed.
  • Patent Document 1 discloses crystallized glass having a composition containing 1.5 to 6 mol % of ZrO 2 and 12 to 22 mol % of Li 2 O, with the aim of providing crystallized glass with a high crystal content.
  • High-alumina bricks which are bricks with a high Al2O3 content
  • high-zirconia bricks which are bricks with a high ZrO2 content
  • Glasses with a high Li and Zr content in the above-mentioned composition are subject to greater corrosion at high temperatures than the high-alumina and high-zirconia bricks. This makes the bricks more susceptible to corrosion during the melting of glass raw materials, shortening the service life of the melting furnace. Furthermore, eroded and liberated brick particles become crystal nuclei, making the resulting glass more susceptible to devitrification defects.
  • the present invention aims to provide glass with low brick corrosion resistance and a method for manufacturing the same. It also aims to provide chemically strengthened glass using the above glass as a base glass and a method for manufacturing the same. It also aims to provide display devices, electronic device products, and solar cell modules that include the above glass or chemically strengthened glass.
  • the inventors have discovered a new glass composition that exhibits excellent brick erosion properties, i.e., low brick erosion.
  • One aspect of the present invention is a composition comprising, in mole percentage on an oxide basis: SiO2 60.0 to 75.0%, 2.0 to 20.0% Al 2 O 3 , 20.0 to 30.0% Li 2 O, MgO 0.0 to 10.0%, CaO 0.0 to 10.0%, Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ; Substantially does not contain Y 2 O 3 , and The present invention relates to glass in which the value of X represented by the following formula (1) is 0.70 or less.
  • X ([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ]
  • [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.
  • the composition of the center portion in the thickness direction is expressed in mole percentage based on oxides as follows: SiO2 60.0 to 75.0%, 2.0 to 20.0% Al 2 O 3 , 20.0 to 30.0% Li 2 O, MgO 0.0 to 10.0%, CaO 0.0 to 10.0%, Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ; Substantially does not contain Y 2 O 3 , and The present invention relates to a chemically strengthened glass, wherein the value of X represented by the following formula (1) is 0.70 or less.
  • X ([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ]
  • [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis at the center in the thickness direction.
  • Another aspect of the present invention is a method for producing glass, comprising: The method comprises heating and melting glass raw materials in a melting furnace, The melting furnace includes electroformed bricks containing 85 mass% or more of Al 2 O 3 expressed as a mass percentage based on oxides,
  • the glass has, in mole percentage on an oxide basis, SiO2 60.0 to 75.0%, 2.0 to 20.0% Al 2 O 3 , 20.0 to 30.0% Li 2 O, MgO 0.0 to 10.0%, CaO 0.0 to 10.0%, Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ; Substantially does not contain Y 2 O 3 , and
  • the present invention relates to a method for producing glass, in which the value of X represented by the following formula (1) is 0.70 or less.
  • X ([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ]
  • [ ] means the content of each component in the brackets expressed as mole percentage on an oxide
  • Another aspect of the present invention relates to a method for producing chemically strengthened glass, which includes chemically strengthening the above-mentioned glass.
  • Another aspect of the present invention relates to a display device having the above-mentioned chemically strengthened glass and a display.
  • Another aspect of the present invention relates to an electronic device product that has the above-mentioned chemically strengthened glass as part of its constituent parts.
  • Another aspect of the present invention relates to a solar cell module having the above-mentioned chemically strengthened glass.
  • the present invention provides glass with a new composition that exhibits low brick corrosion resistance, and a method for producing the same. Furthermore, by chemically strengthening this glass, high-strength chemically strengthened glass can be obtained.
  • the glass or chemically strengthened glass of the present invention can be suitably used in, for example, display devices, electronic device products, and solar cell modules.
  • glass compositions are expressed in mole percentages based on oxides, and mole % is sometimes simply referred to as %. Furthermore, the use of "to" to indicate a numerical range means that the numerical values before and after it are included as the lower and upper limits.
  • substantially free means that it is not contained except for unavoidable impurities contained in raw materials, etc., i.e., it is not intentionally contained.
  • substantially free in a glass composition means, for example, that the content in the glass composition is less than 0.05 mol%.
  • the glass of this embodiment may be amorphous glass containing no crystalline phase, or may be crystallized glass containing a crystalline phase.
  • the glass of this embodiment is preferably crystallized glass, as described below.
  • the glass of this embodiment contains, in mole percentages based on oxides, 60.0 to 75.0% SiO2 , 2.0 to 20.0% Al2O3 , 20.0 to 30.0% Li2O , 0.0 to 10.0% MgO, 0.0 to 10.0% CaO, 2.00 to 10.00% ZrO2 , and 0.50 to 5.00% P2O5 , and is substantially free of Y2O3 .
  • SiO 2 is a component that forms the network structure of the glass and is an essential component of the glass of this embodiment. It is also a component that increases chemical durability and is a constituent of lithium silicate crystals and lithium aluminosilicate crystals.
  • the SiO 2 content is 60.0 to 75.0%. From the above viewpoints, the SiO 2 content is 60.0% or more, preferably 62.0% or more, more preferably 64.0% or more, and even more preferably 66.0% or more. From the viewpoint of sufficiently increasing the stress due to chemical strengthening, the SiO 2 content is 75.0% or less, preferably 73.0% or less, more preferably 72.0% or less, and even more preferably 70.0% or less.
  • Al 2 O 3 is a component that increases the surface compressive stress due to chemical strengthening and is an essential component of the glass of this embodiment.
  • the Al 2 O 3 content is 2.0 to 20.0%.
  • the Al 2 O 3 content is 2.0% or more, preferably 2.4% or more, more preferably 3.0% or more, and even more preferably 4.0% or more.
  • the Al 2 O 3 content is 20.0% or less, preferably 15.0% or less, more preferably 10.0% or less, and even more preferably 8.0% or less.
  • Li 2 O is a component that suppresses the elution of ZrO 2 contained in bricks and reduces the brick erosion of the glass.
  • Li 2 O is also a component that forms surface compressive stress through ion exchange, and is also a constituent of lithium silicate crystals, lithium aluminosilicate crystals, and lithium phosphate crystals.
  • the Li 2 O content is 20.0 to 30.0%. From the above viewpoints, the Li 2 O content is 20.0% or more, preferably 22.0% or more, more preferably 24.0% or more, and even more preferably 26.0% or more. From the viewpoint of maintaining chemical durability, the Li 2 O content is 30.0% or less, preferably 29.0% or less, more preferably 28.0% or less, and even more preferably 27.0% or less.
  • MgO is not essential, it is a component that suppresses the elution of ZrO2 contained in bricks and reduces the brick erosion of the glass, and may be contained. MgO is also a component that improves the meltability of the glass.
  • the MgO content is 0.0 to 10.0%. From the above-mentioned viewpoints, when the glass of this embodiment contains MgO, the content is preferably 0.5% or more, more preferably 1.5% or more, and even more preferably 2.0% or more. From the viewpoint of suppressing a decrease in the ion exchange rate, the MgO content is 10.0% or less, preferably 7.0% or less, more preferably 5.0% or less, and even more preferably 3.0% or less.
  • CaO is not essential, it may be contained as it is a component that suppresses the elution of ZrO2 contained in bricks and reduces the brick erosion of the glass. CaO is also a component that improves the meltability of the glass.
  • the CaO content is 0.0 to 10.0%. From the above-mentioned viewpoints, when the glass of this embodiment contains CaO, the content is preferably 0.5% or more, more preferably 0.8% or more, and even more preferably 1.0% or more. From the viewpoint of suppressing a decrease in the ion exchange rate, the CaO content is 10.0% or less, preferably 7.0% or less, more preferably 5.0% or less, and even more preferably 3.0% or less.
  • ZrO2 is a component that suppresses the elution of ZrO2 and Al2O3 contained in bricks and reduces the brick corrosion of the glass, and is an essential component of the glass of this embodiment.
  • ZrO2 is also a component that can form crystal nuclei during the crystallization process to obtain crystallized glass.
  • the ZrO2 content is 2.00 to 10.00%. From the above viewpoints, the ZrO2 content is 2.00% or more, preferably 2.80% or more, more preferably 3.00% or more, and even more preferably 4.00% or more. From the viewpoint of suppressing devitrification during melting, the ZrO2 content is 10.00% or less, preferably 8.00% or less, more preferably 7.00% or less, and even more preferably 6.00% or less.
  • P 2 O 5 is a component that suppresses the elution of ZrO 2 and Al 2 O 3 contained in bricks and reduces the brick corrosion of the glass, and is an essential component of the glass of this embodiment. Furthermore, P 2 O 5 is a component that promotes phase separation and crystallization of the glass, and is also a constituent of lithium phosphate crystals. In the glass of this embodiment, the P 2 O 5 content is 0.50 to 5.00%. From the above viewpoints, the P 2 O 5 content is 0.50% or more, preferably 0.70% or more, more preferably 0.80% or more, even more preferably 0.90% or more, particularly preferably more than 0.90%, and most preferably 1.20% or more.
  • the content of P 2 O 5 is 5.00% or less, preferably 4.00% or less, more preferably 3.00% or less, even more preferably 2.00% or less, particularly preferably 1.60% or less, and most preferably 1.40% or less.
  • Y 2 O 3 promotes the elution of Al 2 O 3 contained in bricks. Therefore, from the viewpoint of reducing the brick corrosion of the glass, the glass of this embodiment does not substantially contain Y 2 O 3. "Substantially not containing Y 2 O 3" means that the content of Y 2 O 3 in the glass composition is less than 0.05%.
  • TiO2 is not essential, it is a component that can form crystal nuclei during the crystallization process to obtain crystallized glass, and may be contained. Furthermore, TiO2 is a component that suppresses the elution of Al2O3 contained in bricks, particularly reducing the corrosiveness of the glass to high-alumina bricks. In the glass of this embodiment, the TiO2 content is preferably 0.00 to 0.10%. When the glass of this embodiment contains TiO2 , the content may be 0.05% or more, or even 0.06% or more, from the above-mentioned viewpoint.
  • the TiO2 content is preferably 0.10% or less, more preferably 0.09% or less, and even more preferably 0.08% or less; the lower the content, the better. It is most preferable that the glass of this embodiment does not substantially contain TiO2 . Substantially free of TiO2 means that the content of TiO2 in the glass composition is less than 0.05%.
  • the value of X represented by the following formula (1) is 0.70 or less.
  • X ([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ]
  • [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.
  • the value of X is 0.70 or less, glass with low brick erosion can be more suitably obtained.
  • the value of X is preferably 0.66 or less, more preferably 0.60 or less, and even more preferably 0.40 or less. There is no particular lower limit to the value of X, but it may be 0.05 or more, may be greater than 0.09, or may be 0.15 or more.
  • the value of X is, for example, 0.05 to 0.70.
  • the total content of ZrO2 , P2O5 , and TiO2 is preferably 3.00% or more.
  • [ ZrO2 ] + [ P2O5 ] + [ TiO2 ] is 3.00 % or more, a glass with low brick erosion can be more suitably obtained.
  • the above [ ZrO2 ] + [ P2O5 ] + [ TiO2 ] is preferably 3.00% or more, more preferably 3.30% or more, and is preferably 7.00% or less, more preferably 6.50% or less.
  • [ ZrO2 ] + [ P2O5 ] + [ TiO2 ] is , for example, 3.00 to 7.00%.
  • Na 2 O is not essential, it is a component that lowers the melting temperature of the glass and improves the meltability of the glass, and may be contained.
  • the content is preferably 0.50% or more, more preferably 1.00% or more, even more preferably 2.00% or more, and particularly preferably 2.50% or more, from the viewpoint of improving the meltability of the glass.
  • the content of Na 2 O is preferably 6.00% or less, more preferably 4.00% or less, even more preferably 3.50% or less, particularly preferably 3.00% or less, and most preferably 2.70% or less.
  • K 2 O is not essential, it is a component that lowers the melting temperature of the glass and improves the meltability of the glass, and may be contained.
  • the content is preferably 0.10% or more, more preferably 0.20% or more, even more preferably 0.30% or more, and particularly preferably 0.60% or more, from the viewpoint of improving the meltability of the glass.
  • the content of K 2 O is preferably 6.00% or less, more preferably 4.00% or less, even more preferably 3.50% or less, particularly preferably 3.00% or less, and most preferably 2.50% or less.
  • SnO2 is not essential, it has the effect of promoting the formation of crystal nuclei and may be contained.
  • the content is preferably 0.1% or more, more preferably 0.3% or more, even more preferably 1% or more, and particularly preferably 2% or more.
  • the content of SnO2 is preferably 6% or less, more preferably 5% or less, even more preferably 4% or less, and particularly preferably 3% or less.
  • B 2 O 3 is not essential, it is a component that improves the chipping resistance and meltability of glass or chemically strengthened glass, and may be contained.
  • the content is preferably 0.5% or more to improve meltability, more preferably 1% or more, and even more preferably 2% or more.
  • the content of B 2 O 3 is preferably 5% or less to suppress the occurrence of striae during melting and the deterioration of glass quality.
  • the content of B 2 O 3 is more preferably 4% or less, even more preferably 3% or less, and particularly preferably 2% or less.
  • BaO, SrO, and ZnO are components that improve the meltability of glass and may be contained. They also improve the transmittance of the glass-ceramics by increasing the refractive index of the amorphous phase of the glass-ceramics, bringing it closer to the crystalline phase, thereby improving the transmittance and lowering the haze value.
  • the total content ([BaO] + [SrO] + [ZnO]) is preferably 0.3% or more, more preferably 0.5% or more, even more preferably 0.7% or more, and particularly preferably 1% or more.
  • these components may reduce the ion exchange rate.
  • [BaO] + [SrO] + [ZnO] is preferably 2.5% or less, more preferably 2% or less, even more preferably 1.7% or less, and particularly preferably 1.5% or less.
  • CeO2 is not essential, it is a component that oxidizes the glass and may suppress coloration, so it may be contained.
  • the content is preferably 0.03% or more, more preferably 0.05% or more, and even more preferably 0.07% or more.
  • CeO2 is used as an oxidizing agent, the content of CeO2 is preferably 1.5% or less, more preferably 1.0% or less, in order to increase the transparency of the glass.
  • a coloring component may be added to the extent that the desired chemical strengthening properties are not impaired.
  • Suitable examples of the coloring component include Co3O4 , MnO2 , Fe2O3 , NiO , CuO , Cr2O3 , V2O5 , Bi2O3 , SeO2 , Er2O3 , and Nd2O3 .
  • the total content of coloring components is preferably 1% or less. If a higher visible light transmittance of the glass is desired, it is preferable that these components are substantially absent.
  • SO 3 , chlorides, fluorides, etc. may be appropriately contained as a fining agent during melting of the glass.
  • the glass of this embodiment preferably does not contain As 2 O 3.
  • the content is preferably 0.3% or less, more preferably 0.1% or less, and it is most preferable that the glass does not contain Sb 2 O 3 .
  • the glass of this embodiment preferably exhibits an erosion amount of 0.090 mm/day or less of electroformed bricks containing 85 mass % or more of Al 2 O 3 expressed as oxide-based mass percentage, as measured by a finger test method under the following conditions. (Conditions) The glass is heated to a temperature T2 in a crucible, at which the viscosity of the glass becomes 10 2 dPa ⁇ s, and then cooled to a temperature T3.5, at which the viscosity of the glass becomes 10 3.5 dPa ⁇ s. A test piece of electroformed brick is immersed in the resulting glass and held at T3.5 for 48 hours. The glass is then cooled to 20°C or below.
  • test piece is removed from the crucible along with the surrounding glass, and the test piece is cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished.
  • the maximum erosion amount of the test piece is measured for the resulting cross section using a projector.
  • the electroformed bricks used in the finger test are high-alumina bricks containing 85% by mass or more of Al2O3 expressed as a mass percentage based on oxides.
  • the glass of this embodiment exhibits a high-alumina brick erosion rate measured by the finger test of 0.090 mm/day or less, more preferably 0.085 mm/day or less, and even more preferably 0.080 mm/day or less; the lower the better.
  • the erosion rate is an indicator of the glass's resistance to corrosion by high-alumina bricks, and can be adjusted by the glass composition.
  • the glass of this embodiment preferably exhibits an erosion amount of 0.20 mm/day or less of electroformed bricks containing 80 mass % or more of ZrO2 , expressed as a mass percentage based on oxides, as measured by a finger test method under the following conditions.
  • a test piece of electroformed brick was immersed in molten glass heated to a temperature T2 in a crucible, at which the viscosity of the glass reached 10 2 dPa s, and held at T2 for 48 hours. The glass was then cooled to 20°C or below. The test piece was then removed from the crucible along with the surrounding glass, cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished. The maximum erosion of the test piece was measured for the resulting cross section using a projector.
  • the electroformed bricks used in the finger test are high-zirconia bricks containing 80% by mass or more of ZrO2 expressed as a mass percentage based on oxides.
  • the glass of this embodiment exhibits a high-zirconia brick erosion rate measured by the finger test of 0.20 mm/day or less, more preferably 0.15 mm/day or less, and even more preferably 0.13 mm/day or less; the lower the better.
  • the erosion rate is an indicator of the glass's resistance to high-zirconia brick erosion and can be adjusted by the glass composition.
  • the glass transition temperature Tg of the glass of this embodiment is preferably 390°C or higher, more preferably 410°C or higher, and even more preferably 420°C or higher. If the glass transition temperature Tg is high, stress relaxation during chemical strengthening is less likely to occur, making it easier to achieve high strength. On the other hand, from the perspective of glass formability, etc., Tg is preferably 650°C or lower, and more preferably 600°C or lower. The above Tg may be, for example, 390 to 650°C.
  • the average thermal expansion coefficient of the glass of this embodiment at 50°C to 350°C is preferably 90 ⁇ 10 -7 /°C or more, more preferably 100 ⁇ 10 -7 /°C or more, and even more preferably 110 ⁇ 10 -7 /°C or more.
  • the average thermal expansion coefficient is preferably 150 ⁇ 10 -7 /°C or less, more preferably 140 ⁇ 10 -7 /°C or less.
  • the average thermal expansion coefficient may be, for example, 90 ⁇ 10 -7 /°C to 150 ⁇ 10 -7 /°C.
  • the glass of this embodiment is crushed, and the difference between the glass transition point (Tg DSC ) determined from a DSC curve obtained using a differential scanning calorimeter and the crystallization peak temperature (Tc) appearing in the lowest temperature range on the DSC curve is taken as (Tc - Tg).
  • the (Tc - Tg) of the glass of this embodiment is preferably 80°C or higher, more preferably 85°C or higher, even more preferably 90°C or higher, and particularly preferably 95°C or higher.
  • (Tc - Tg) is preferably 150°C or lower, more preferably 140°C or lower.
  • the (Tc - Tg) may be, for example, 80 to 150°C.
  • the Tg DSC may not coincide with the glass transition temperature (Tg) determined from a thermal expansion curve. Furthermore, since Tg DSC is measured after crushing the glass, measurement error is likely to be large. However, in order to evaluate the relationship with the crystallization peak temperature, it is more appropriate to use the Tg DSC determined by the same DSC measurement than the Tg determined from a thermal expansion curve.
  • the Young's modulus of the glass of this embodiment is preferably 75 GPa or more, more preferably 80 GPa or more, and even more preferably 85 GPa or more, and is preferably 130 GPa or less, more preferably 125 GPa or less, and even more preferably 120 GPa or less.
  • the Young's modulus may be, for example, 75 to 130 GPa.
  • the Vickers hardness of the glass of this embodiment is preferably 500 or more, more preferably 550 or more, and preferably 1100 or less, more preferably 1050 or less, and even more preferably 1000 or less.
  • the Vickers hardness may be, for example, 500 to 1100.
  • the thickness of the glass in this embodiment is, for example, 2000 ⁇ m or less, preferably 1500 ⁇ m or less, more preferably 1000 ⁇ m or less, even more preferably 900 ⁇ m or less, particularly preferably 800 ⁇ m or less, and most preferably 700 ⁇ m or less. Furthermore, to obtain sufficient strength, the thickness is, for example, 200 ⁇ m or more, preferably 400 ⁇ m or more, more preferably 500 ⁇ m or more, and even more preferably 600 ⁇ m or more. The thickness may be, for example, 200 to 2000 ⁇ m.
  • the shape of the glass of this embodiment may be plate-like or may be any other shape, depending on the product to which it is applied, its intended use, etc. Furthermore, when the glass of this embodiment is plate-like glass, i.e., a glass plate, the glass plate may have a rim shape with a different thickness around the periphery. Furthermore, the shape of the glass plate is not limited to this; for example, the two main surfaces do not have to be parallel to each other, and one or both of the two main surfaces may be entirely or partially curved. More specifically, the glass plate may be, for example, a flat glass plate without warping, or a curved glass plate with a curved surface.
  • the glass of this embodiment can be used as cover glass for mobile electronic devices such as mobile phones, smartphones, personal digital assistants (PDAs), and tablet devices. It is also useful as cover glass for electronic devices that are not intended to be portable, such as televisions (TVs), personal computers (PCs), and touch panels. It is also useful as building materials such as window glass, tabletops, and the interiors of automobiles and airplanes, as well as the cover glass for these materials.
  • Glass of this type can be bent or formed into shapes other than flat before or after chemical strengthening, making it useful for applications such as housings with curved surfaces.
  • the glass of this embodiment is preferably the crystallized glass that contains crystalline phase.Crystallized glass is obtained by heating amorphous glass to crystallize it.
  • the glass composition of the entire crystallized glass is the same as the composition of the amorphous glass before crystallization, and the preferred embodiment of the composition of crystallized glass is the same as above.
  • crystallized glass containing a crystalline phase refers to glass in which diffraction peaks indicating crystals are observed in the XRD pattern obtained by powder X-ray diffraction (XRD) method.
  • the glass-ceramics preferably contain at least one crystal selected from the group consisting of Li 2 Si 2 O 5 (lithium disilicate), LiAlSi 2 O 6 ( ⁇ -spodumene), LiAlSi 4 O 10 (petalite), Li 3 PO 4 (lithium phosphate), and ⁇ -quartz solid solution.
  • Li 2 Si 2 O 5 lithium disilicate
  • LiAlSi 2 O 6 ⁇ -spodumene
  • LiAlSi 4 O 10 petalite
  • Li 3 PO 4 lithium phosphate
  • ⁇ -quartz solid solution Li 2 Si 2 O 5 (lithium disilicate), LiAlSi 2 O 6 ( ⁇ -spodumene), LiAlSi 4 O 10 (petalite), Li 3 PO 4 (lithium phosphate), and ⁇ -quartz solid solution.
  • the inclusion of the above crystals in the glass-ceramics more preferably results in a glass that exhibits high strength when chemically strengthened.
  • the crystals contained in the glass-ceramics are more preferably at least one crystal selected from the group consisting of Li 2 Si 2 O 5 , LiAlSi 2 O 6 , and LiAlSi 4 O 10 , and more preferably contain Li 2 Si 2 O 5.
  • the presence of the above crystals in the glass-ceramics can be confirmed from an X-ray diffraction spectrum.
  • the crystallization rate of the glass of this embodiment is preferably 5% or more, more preferably 10% or more, even more preferably 15% or more, and particularly preferably 20% or more, in order to increase mechanical strength.
  • the crystallization rate is preferably 80% or less, more preferably 70% or less, and particularly preferably 60% or less, in order to increase transparency.
  • a low crystallization rate is also advantageous in that it is easy to heat and bend the glass.
  • the crystallization rate may be, for example, 5 to 80%.
  • the crystallinity rate can be calculated from the X-ray diffraction intensity using the Rietveld method.
  • the Rietveld method is described in the "Crystal Analysis Handbook" (Kyoritsu Shuppan, 1999, pp. 492-499), edited by the Editorial Committee of the Crystallographic Society of Japan.
  • the average particle size of the precipitated crystals in the crystallized glass is preferably 80 nm or less, more preferably 60 nm or less, even more preferably 50 nm or less, particularly preferably 40 nm or less, and most preferably 30 nm or less. There is no particular lower limit to the average particle size, but it is usually 5 nm or more, for example.
  • the average particle size can be determined from a transmission electron microscope (TEM) image.
  • the average thermal expansion coefficient of the crystallized glass at 50 ° C to 350 ° C is preferably 90 ⁇ 10 -7 / ° C or more, more preferably 100 ⁇ 10 -7 / ° C or more, even more preferably 110 ⁇ 10 -7 / ° C or more, particularly preferably 120 ⁇ 10 -7 / ° C or more, and most preferably 130 ⁇ 10 -7 / ° C or more.
  • the average thermal expansion coefficient is preferably 160 ⁇ 10 -7 / ° C or less, more preferably 150 ⁇ 10 -7 / ° C or less, and even more preferably 140 ⁇ 10 -7 / ° C or less.
  • the average thermal expansion coefficient may be, for example, 90 ⁇ 10 -7 / ° C to 160 ⁇ 10 -7 / ° C.
  • Ceramics glass has a high hardness because it contains crystals. This makes it scratch-resistant and highly abrasion-resistant.
  • the Vickers hardness is preferably 600 or higher, more preferably 700 or higher, even more preferably 730 or higher, particularly preferably 750 or higher, and most preferably 780 or higher. From the standpoint of processability, the Vickers hardness of the crystallized glass is preferably 1100 or lower, more preferably 1050 or lower, and even more preferably 1000 or lower. The Vickers hardness may be, for example, 600 to 1100.
  • the Young's modulus of the glass-ceramics is preferably 85 GPa or more, more preferably 90 GPa or more, even more preferably 95 GPa or more, and particularly preferably 100 GPa or more, in order to suppress warping due to strengthening during chemical strengthening.
  • the glass-ceramics may be polished before use.
  • the Young's modulus of the glass-ceramics is preferably 130 GPa or less, more preferably 125 GPa or less, and even more preferably 120 GPa or less.
  • the Young's modulus may be, for example, 85 to 130 GPa.
  • the fracture toughness value of the crystallized glass is preferably 0.8 MPa ⁇ m 1/2 or more, more preferably 0.85 MPa ⁇ m 1/2 or more, and even more preferably 0.9 MPa ⁇ m 1/2 or more. This is because, when the crystallized glass is chemically strengthened, fragments are less likely to scatter when broken.
  • the upper limit of the fracture toughness value is not particularly limited, but is usually, for example, 2.0 MPa ⁇ m 1/2 or less.
  • the fracture toughness value may be, for example, 0.8 to 2.0 MPa ⁇ m 1/2 .
  • the chemically strengthened glass of this embodiment has a composition at the center in the thickness direction, expressed in mole percentages based on oxides, of 60.0 to 75.0% SiO 2 , 2.0 to 20.0% Al 2 O 3 , 20.0 to 30.0% Li 2 O, 0.0 to 10.0% MgO, 0.0 to 10.0% CaO, 2.00 to 10.00% ZrO 2 , and 0.50 to 5.00% P 2 O 5 , and is substantially free of Y 2 O 3.
  • the value of X represented by the following formula (1) in the composition at the center in the thickness direction is 0.70 or less.
  • X ([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ]
  • [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis at the center in the thickness direction.
  • the chemically strengthened glass of this embodiment refers to glass that has been subjected to a chemical strengthening treatment.
  • the chemically strengthened glass of this embodiment can be produced, for example, by chemically strengthening the glass of this embodiment described above.
  • the glass composition of the non-ion-exchanged portion of the chemically strengthened glass matches the composition of the glass of this embodiment described above, which is the base composition of chemically strengthened glass. Furthermore, even in the ion-exchanged portion, the concentrations of components other than alkali metal oxides basically do not change from the base composition.
  • the preferred glass composition of the center portion in the thickness direction of the chemically strengthened glass of this embodiment is the same as that described above for the glass composition of this embodiment.
  • the chemically strengthened glass of this embodiment has a thickness t (unit: ⁇ m), a compressive stress layer depth (DOC) of 0.15t or more, a compressive stress value (CS 50 ) at a depth of 50 ⁇ m from the glass surface of 30 MPa or more, and a compressive stress value (CS 100 ) at a depth of 100 ⁇ m from the glass surface of -10 MPa or more.
  • the chemically strengthened glass of this embodiment preferably has a depth of compressive stress layer (DOC) (unit: ⁇ m), which is the depth at which the compressive stress value (CS) becomes zero, of 0.15t or more.
  • the DOC is preferably 0.15t or more, more preferably 0.15t + 5 or more, and even more preferably 0.15t + 10 or more.
  • CT internal tensile stress
  • the DOC is preferably 0.25t or less, more preferably 0.25t - 5 or less, and even more preferably 0.25t - 10 or less.
  • the DOC may be, for example, 0.15t to 0.25t.
  • CS 50 is preferably 30 MPa or more from the viewpoint of improving drop strength against #180 sandpaper.
  • CS 50 is more preferably 60 MPa or more, even more preferably 90 MPa or more, and particularly preferably 120 MPa or more.
  • CS 50 is preferably 300 MPa or less, more preferably 250 MPa or less, and even more preferably 200 MPa or less from the viewpoint of suppressing glass fracture (explosive fracture when scratched) due to an increase in CT.
  • the CS 50 may be, for example, 30 to 300 MPa.
  • CS 100 is preferably -10 MPa or more from the viewpoint of improving drop strength against #80 sandpaper.
  • CS 100 is more preferably 0 MPa or more, even more preferably 10 MPa or more, and particularly preferably 20 MPa or more.
  • CS 100 is preferably 100 MPa or less, more preferably 80 MPa or less, and even more preferably 60 MPa or less.
  • the CS 100 may be, for example, -10 to 100 MPa. Note that when the CS 100 takes a negative value, it means that the CS 100 is a tensile stress.
  • the chemically strengthened glass of this embodiment preferably has a DOC of 0.15t or more, a CS 50 of 30 MPa or more, and a CS 100 of ⁇ 10 MPa or more, and more preferably has a DOC of 0.15t + 5 or more, a CS 50 of 60 MPa or more, and a CS 100 of 0 MPa or more. It is more preferable that the DOC is 0.15t + 10 or more, the CS 50 is 90 MPa or more, and the CS 100 is 10 MPa or more.
  • DOC, CS 50 and CS 100 are the results obtained by measuring the stress values of chemically strengthened glass using a measuring instrument SLP-2000 manufactured by Orihara Seisakusho Co., Ltd.
  • the preferred thickness (t), shape, and uses of the chemically strengthened glass of this embodiment are the same as those described above for the glass of this embodiment.
  • a method for producing glass according to this embodiment includes heating and melting glass raw materials in a melting furnace.
  • the melting furnace includes electroformed bricks containing 85 mass% or more of Al2O3 , expressed as mass percentages based on oxides.
  • the glass contains, expressed as mole percentages based on oxides, 60.0 to 75.0% SiO2 , 2.0 to 20.0% Al2O3 , 20.0 to 30.0% Li2O , 0.0 to 10.0% MgO, 0.0 to 10.0% CaO, 2.00 to 10.00% ZrO2 , and 0.50 to 5.00% P2O5 , and is substantially free of Y2O3 .
  • X ([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ]
  • [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.
  • the melting furnace used in the method for producing glass of this embodiment contains high-alumina bricks, which are electroformed bricks containing 85 mass% or more of Al2O3 expressed as a mass percentage based on oxides. More specifically, at least a portion of the furnace materials constituting the melting furnace contain the high-alumina bricks.
  • the furnace materials containing the high-alumina bricks are preferably arranged at least in a region of the melting furnace that comes into contact with the heated and molten glass frit, more preferably in a region that comes into contact with the heated and molten glass frit having a viscosity of 103.5 dPa ⁇ s. Even when the furnace materials of the melting furnace contain high-alumina bricks, when producing glass of this embodiment having a specific composition, erosion of the bricks during melting of the glass frit can be suppressed.
  • the melting furnace preferably further includes high-zirconia bricks, which are electrocast bricks containing 80% by mass or more of ZrO2 expressed as a mass percentage based on oxides. More specifically, at least a portion of the furnace materials constituting the melting furnace preferably include the high-zirconia bricks.
  • the furnace materials including the high-zirconia bricks are more preferably arranged in at least a region of the melting furnace that comes into contact with the heated and melted glass frit, and even more preferably in at least a region that comes into contact with the heated and melted glass frit having a viscosity of 10 2 dPa s. Even when the furnace materials of the melting furnace include high-zirconia bricks, erosion of the bricks during melting of the glass frit can be suppressed when producing the glass of this embodiment having a specific composition.
  • glass raw materials are mixed so as to obtain glass of the specified composition described above, and then heated and melted in a glass melting furnace.
  • the preferred composition of the glass obtained by the method for producing glass of this embodiment is the same as that described above for the glass of this embodiment.
  • the value of Y expressed by the following formula (2 ) using the ZrO2 content (unit: mol % expressed as a molar percentage based on the oxide) of the obtained glass and the Al2O3 content (unit: mol % expressed as a molar percentage based on the oxide) of the electroformed bricks contained in the melting furnace, is preferably 0.02 to 0.10.
  • the electroformed bricks referred to here refer to electroformed bricks that are contained in at least a portion of the furnace materials constituting the melting furnace and are arranged at least in a region in the melting furnace that contacts the heated and molten glass raw material, and contain 85 mass % or more of Al2O3 expressed as a mass percentage based on the oxide.
  • the value of Y be 0.02 to 0.10 for at least some of the multiple electroformed bricks, and more preferably the value of Y be 0.02 to 0.10 for all of the electroformed bricks.
  • Y ( ZrO2 content of glass) / ( Al2O3 content of electroformed brick)
  • the brick erosion suppression effect in the glass manufacturing method of this embodiment is more preferably achieved.
  • the value of Y is more preferably 0.03 or more, and even more preferably 0.04 or more.
  • the value of Y is more preferably 0.09 or less, and even more preferably 0.08 or less.
  • the molten glass may be homogenized by bubbling, stirring, adding a fining agent, etc., formed into the desired shape such as a glass plate, and slowly cooled.
  • the molten glass may be formed into a block, slowly cooled, and then cut into a plate.
  • Glass forming methods include, for example, the float method, press method, fusion method, and downdraw method.
  • the float method is particularly preferred when producing large glass sheets.
  • Continuous forming methods other than the float method, such as the fusion method and downdraw method, are also preferred.
  • the molded glass is then subjected to grinding and polishing processes as necessary.
  • the resulting glass may also be subjected to the chemical strengthening process described below to obtain chemically strengthened glass.
  • the heat treatment is preferably a two-stage heat treatment in which the temperature is raised from room temperature to a first treatment temperature and maintained for a certain period of time, and then the temperature is maintained at a second treatment temperature that is higher than the first treatment temperature for a certain period of time.
  • the first treatment temperature is preferably in a temperature range where the crystal nucleation rate is high for that glass composition
  • the second treatment temperature is preferably in a temperature range where the crystal growth rate is high for that glass composition.
  • the holding time at the first treatment temperature be long enough to generate a sufficient number of crystal nuclei. By generating a large number of crystal nuclei, the size of each crystal becomes small, resulting in highly transparent crystallized glass.
  • the first treatment temperature is, for example, 450°C to 700°C
  • the second treatment temperature is, for example, 600°C to 800°C
  • the holding time at the first treatment temperature is, for example, 1 hour to 6 hours
  • the holding time at the second treatment temperature is, for example, 1 hour to 6 hours.
  • the chemically strengthened glass of this embodiment is produced by chemically strengthening the amorphous glass or crystallized glass described above. That is, the method for producing the chemically strengthened glass of this embodiment includes chemically strengthening the glass or crystallized glass of this embodiment.
  • the chemical strengthening is preferably performed using a molten salt composition containing sodium and less than 5% by mass of potassium.
  • the chemical strengthening treatment may be performed in two or more stages, but one-stage strengthening is preferred to increase productivity.
  • Chemical strengthening is performed, for example, by immersing the glass in a molten salt composition such as sodium nitrate heated to 360 to 600°C for 0.1 to 500 hours.
  • a molten salt composition such as sodium nitrate heated to 360 to 600°C for 0.1 to 500 hours.
  • the heating temperature for the molten salt composition is preferably 375 to 500°C, and the immersion time for the glass in the molten salt composition is preferably 0.3 to 200 hours.
  • the molten salt composition used in this embodiment of the method for producing chemically strengthened glass preferably contains sodium and has a potassium content of less than 5 mass% calculated as potassium nitrate.
  • the potassium content is more preferably less than 2 mass% calculated as potassium nitrate, and it is even more preferable that the molten salt composition contains substantially no potassium.
  • substantially no potassium means that the composition does not contain any potassium, or that it may contain potassium as an impurity that is unavoidably mixed in during production.
  • Examples of the reinforcing salts contained in the molten salt composition include nitrates, sulfates, carbonates, and chlorides.
  • Nitrates include, for example, lithium nitrate and sodium nitrate.
  • Sulfates include, for example, lithium sulfate and sodium sulfate.
  • Carbonates include, for example, lithium carbonate and sodium carbonate.
  • Chlorides include, for example, lithium chloride, sodium chloride, cesium chloride, and silver chloride. These reinforcing salts may be used alone or in combination.
  • Appropriate conditions for chemical strengthening should be selected taking into consideration the glass composition (characteristics), the type of strengthening salt, and the desired chemical strengthening characteristics.
  • the display device of this embodiment includes the glass or chemically strengthened glass of this embodiment and a display.
  • a display device may be used in electronic devices such as mobile phones, smartphones, and tablet terminals, as well as electronic devices such as car navigation systems installed in vehicles such as automobiles.
  • the electronic device product of this embodiment has the glass or chemically strengthened glass of this embodiment as part of its constituent parts.
  • Such electronic device products may be, for example, electronic devices such as mobile phones, smartphones, and tablet terminals, or electronic devices such as car navigation systems installed in vehicles such as automobiles.
  • the solar cell module of this embodiment includes the glass or chemically strengthened glass of this embodiment.
  • the glass or chemically strengthened glass can be used, for example, as a transparent cover member for the light-receiving surface of the solar cell module.
  • the present specification discloses the following configurations. ⁇ 1> Molar percentage based on oxides, SiO2 60.0 to 75.0%, 2.0 to 20.0% Al 2 O 3 , 20.0 to 30.0% Li 2 O, MgO 0.0 to 10.0%, CaO 0.0 to 10.0%, Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ; Substantially does not contain Y 2 O 3 , and A glass in which the value of X represented by the following formula (1) is 0.70 or less.
  • X ([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
  • [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.
  • ⁇ 2> Molar percentage based on oxides The ZrO2 is contained in an amount of 3.00 to 10.00%; The glass according to ⁇ 1>, containing 0.00 to 0.10% of TiO 2 . ⁇ 3> The glass according to ⁇ 1> or ⁇ 2> , wherein the total content of ZrO2 , P2O5 , and TiO2 is 3.00% or more, expressed in mole percentage based on oxides.
  • Crystallized glass comprising at least one crystal selected from the group consisting of Li 2 Si 2 O 5 (lithium disilicate), LiAlSi 2 O 6 ( ⁇ -spodumene), LiAlSi 4 O 10 (petalite), Li 3 PO 4 (lithium phosphate), and ⁇ -quartz solid solution.
  • Li 2 Si 2 O 5 lithium disilicate
  • LiAlSi 2 O 6 ⁇ -spodumene
  • LiAlSi 4 O 10 petalite
  • Li 3 PO 4 lithium phosphate
  • ⁇ -quartz solid solution ⁇ 5>
  • the glass is heated to a temperature T2 in a crucible, at which the viscosity of the glass becomes 10 2 dPa ⁇ s, and then cooled to a temperature T3.5, at which the viscosity of the glass becomes 10 3.5 dPa ⁇ s.
  • a test piece of electroformed brick is immersed in the resulting glass and held at T3.5 for 48 hours.
  • the glass is then cooled to 20°C or below.
  • the test piece is removed from the crucible along with the surrounding glass, and the test piece is cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished.
  • the maximum erosion amount of the test piece is measured for the resulting cross section using a projector.
  • ⁇ 6> The glass according to any one of ⁇ 1> to ⁇ 5>, wherein the amount of corrosion of an electroformed brick containing 80 mass% or more of ZrO2 , expressed as a mass percentage based on oxides, measured by a finger test method under the following conditions is 0.20 mm/day or less.
  • a test piece of electroformed brick was immersed in molten glass heated to a temperature T2 in a crucible, at which the viscosity of the glass reached 10 2 dPa s, and held at T2 for 48 hours. The glass was then cooled to 20°C or below.
  • test piece was then removed from the crucible along with the surrounding glass, cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished.
  • the maximum erosion of the test piece was measured for the resulting cross section using a projector.
  • composition of the center portion in the thickness direction is expressed in mole percentage based on oxides, SiO2 60.0 to 75.0%, 2.0 to 20.0% Al 2 O 3 , 20.0 to 30.0% Li 2 O, MgO 0.0 to 10.0%, CaO 0.0 to 10.0%, Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ; Substantially does not contain Y 2 O 3 , and Chemically strengthened glass, wherein the value of X represented by the following formula (1) is 0.70 or less.
  • X ([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ]
  • [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis at the center in the thickness direction.
  • the composition of the center portion in the thickness direction is expressed in mole percentage based on oxides,
  • the ZrO2 is contained in an amount of 3.00 to 10.00%;
  • the thickness is t (unit: ⁇ m), and the depth of compressive stress layer (DOC) is 0.15t or more;
  • the compressive stress value (CS 50 ) at a depth of 50 ⁇ m from the glass surface is 30 MPa or more, ⁇ 7> or ⁇ 8>, wherein the chemically strengthened glass has a compressive stress value (CS 100 ) of ⁇ 10 MPa or more at a depth of 100 ⁇ m from the glass surface.
  • a method for producing glass comprises heating and melting glass raw materials in a melting furnace,
  • the melting furnace includes electroformed bricks containing 85 mass% or more of Al 2 O 3 expressed as a mass percentage based on oxides,
  • the glass has, in mole percentage on an oxide basis, SiO2 60.0 to 75.0%, 2.0 to 20.0% Al 2 O 3 , 20.0 to 30.0% Li 2 O, MgO 0.0 to 10.0%, CaO 0.0 to 10.0%, Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ; Substantially does not contain Y 2 O 3 , and
  • [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.
  • the glass contains, in terms of mole percentage based on oxides, The ZrO2 is contained in an amount of 3.00 to 10.00%; The method for producing glass according to ⁇ 10>, wherein the glass contains 0.00 to 0.10% of TiO 2 .
  • ⁇ 14> A method for producing chemically strengthened glass, comprising chemically strengthening the glass according to any one of ⁇ 1> to ⁇ 6>.
  • a display device comprising the glass according to any one of ⁇ 1> to ⁇ 6> or the chemically strengthened glass according to any one of ⁇ 7> to ⁇ 9> and a display.
  • ⁇ 17> An electronic device product having the glass according to any one of ⁇ 1> to ⁇ 6> or the chemically strengthened glass according to any one of ⁇ 7> to ⁇ 9> as a part of a component.
  • a solar cell module having the glass according to any one of ⁇ 1> to ⁇ 6> or the chemically strengthened glass according to any one of ⁇ 7> to ⁇ 9>.
  • Examples 1 to 6 are working examples
  • Examples 7 to 12 are comparative examples.
  • Glass production and brick erosion measurement Glass was prepared and the amount of erosion of the brick was measured using the finger test method. Glass raw materials were mixed to obtain the glass composition shown in Table 1, expressed in terms of oxide-based molar percentage, to form 190 ml of cullet, which was then placed in a 300 ml platinum crucible. The glass raw materials were heated at a rate of 300°C/hour to a temperature T2 at which the viscosity of the glass reached 10 2 dPa ⁇ s and maintained at this temperature for 6 hours to melt the glass. The molten glass was then cooled to a temperature T3.5 at which the viscosity of the glass reached 10 3.5 dPa ⁇ s.
  • Test pieces were also prepared: electroformed bricks ("MB-G” manufactured by AGC Ceramics Co., Ltd.) measuring 25 mm x 15 mm x 73 mm and containing 95% Al 2 O 3 by mass, expressed in terms of oxide-based mass percentage.
  • the test specimen was immersed in the T3.5 molten glass by at least 65% of its long side (73 mm) and held at T3.5 for 48 hours. The glass was then cooled to 20°C at a rate of 300°C/hour.
  • the test specimen, along with the surrounding glass, was removed from the crucible, cut along a plane perpendicular to the contact surface between the glass and the test specimen, horizontally ground, and mirror-polished.
  • the maximum erosion depth of the resulting cross section was measured using a projector (Nikon V12BDC). The measurement results are shown in Table 1 as "High-alumina brick erosion depth.”
  • the erosion amount of the brick was measured in the same manner as above, except that the test specimen was an electroformed brick ("ZB-X9510" manufactured by AGC Ceramics Co., Ltd.) containing 94.5 mass% ZrO2 , expressed as a mass percentage based on the oxide, and the molten glass was not cooled to T3.5, but the test specimen was immersed in the molten glass at T2 and held at T2 for 48 hours.
  • the measurement results are shown in Table 1 as "Erosion amount of high-zirconia brick.”
  • Y' represented by the following formula (3)
  • ZrO2 content unit: mol % expressed as a molar percentage based on oxides
  • Al2O3 content unit: mol % expressed as a molar percentage based on oxides; 93.03 mol %) of the electroformed bricks used in the brick erosion amount measurements.
  • Y'value a value of Y represented by the above formula (2) when the electroformed bricks used in the brick erosion amount measurements are used as at least a part of the furnace material of a melting furnace.
  • Y' ( ZrO2 content of glass) / ( Al2O3 content of electroformed brick) Formula (3)
  • the glass of this embodiment was found to have low corrosion resistance against high-alumina bricks. Furthermore, the glasses of Examples 1 to 3 in particular were found to have low corrosion resistance against high-zirconia bricks.
  • the glass according to this embodiment has low brick corrosion resistance, so it can be suitably manufactured in a melting furnace constructed with furnace materials that include bricks.

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Abstract

The present invention relates to a glass comprising, in mole percentage on an oxide basis, 60.0 to 75.0% of SiO2, 2.0 to 20.0% of Al2O3, 20.0 to 30.0% of Li2O, 0.0 to 10.0% of MgO, 0.0 to 10.0% of CaO, 2.00 to 10.00% of ZrO2, and 0.50 to 5.00% of P2O5, substantially free of Y2O3, wherein the value of X represented by X = ([TiO2] + [P2O5]) / [ZrO2] is 0.70 or less. Herein, the brackets [ ] denote the contents of each component within the parentheses in mole percentage on an oxide basis.

Description

ガラス、化学強化ガラス、ガラスの製造方法および化学強化ガラスの製造方法Glass, chemically strengthened glass, method for manufacturing glass, and method for manufacturing chemically strengthened glass

 本発明は、ガラス、化学強化ガラス、ガラスの製造方法および化学強化ガラスの製造方法に関する。また本発明は、上記ガラスまたは化学強化ガラスを含む表示装置、電子デバイス製品および太陽電池モジュールにも関する。 The present invention relates to glass, chemically strengthened glass, a method for manufacturing glass, and a method for manufacturing chemically strengthened glass. The present invention also relates to display devices, electronic device products, and solar cell modules that include the above-mentioned glass or chemically strengthened glass.

 携帯電話、スマートフォンおよびタブレット端末等の電子機器、自動車等の輸送体に設置されるカーナビゲーションなどの電子機器、ならびに窓ガラス等には、化学強化ガラス系材料が用いられる場合がある。特に近年は、微小結晶を含む「結晶化ガラス(Glass Ceramics)」が、高強度の化学強化ガラスを得るための母ガラスとして注目されている。 Chemically strengthened glass materials are sometimes used in electronic devices such as mobile phones, smartphones, and tablet devices, as well as in car navigation systems and other electronic devices installed in vehicles such as automobiles, and in window glass. In particular, in recent years, "glass ceramics" containing microcrystals have been attracting attention as a base glass for obtaining high-strength chemically strengthened glass.

 結晶化ガラスの結晶化率を高めることで、当該結晶化ガラスを母ガラスに用いて得られる化学強化ガラスを、より高強度化できる。結晶化ガラスの結晶化率を高めるために、結晶を構成するLiイオンや、結晶の核となるZr等の元素を多く含有するガラス組成の開発が行われている。 Increasing the crystallization rate of crystallized glass makes it possible to further increase the strength of chemically strengthened glass obtained by using that crystallized glass as a base glass. In order to increase the crystallization rate of crystallized glass, glass compositions containing large amounts of elements such as Li ions, which form the crystals, and Zr, which acts as the crystal nucleus, are being developed.

 例えば、特許文献1には、結晶含有量の高い結晶化ガラスの提供を目的として、ZrOを1.5~6モル%、LiOを12~22モル%含む組成の結晶化ガラスが開示されている。 For example, Patent Document 1 discloses crystallized glass having a composition containing 1.5 to 6 mol % of ZrO 2 and 12 to 22 mol % of Li 2 O, with the aim of providing crystallized glass with a high crystal content.

国際公開第2021/135992号International Publication No. 2021/135992

 ガラス原料を溶融するために用いる溶融炉の構成部材として、一般的に、Al含有量の多いレンガである高アルミナレンガや、ZrO含有量の多いレンガである高ジルコニアレンガが用いられる。ここで、上述した組成中のLiやZrの含有量が多いガラスは、上記高アルミナレンガや高ジルコニアレンガに対する、高温での浸食量が大きい。これによって、ガラス原料の溶融の際に、レンガが浸食されやすくなるため、溶融炉の耐用年数が低下する。また、浸食されて遊離したレンガの粒子が結晶核となり、得られるガラスに失透欠点が発生しやすくなる。 High-alumina bricks, which are bricks with a high Al2O3 content, and high-zirconia bricks, which are bricks with a high ZrO2 content, are generally used as components of a melting furnace used to melt glass raw materials. Glasses with a high Li and Zr content in the above-mentioned composition are subject to greater corrosion at high temperatures than the high-alumina and high-zirconia bricks. This makes the bricks more susceptible to corrosion during the melting of glass raw materials, shortening the service life of the melting furnace. Furthermore, eroded and liberated brick particles become crystal nuclei, making the resulting glass more susceptible to devitrification defects.

 したがって、本発明は、レンガ浸食性の低いガラスおよびその製造方法の提供を目的とする。また、上記ガラスを母ガラスとする化学強化ガラスおよびその製造方法の提供も目的とする。さらに、上記ガラスまたは化学強化ガラスを含む、表示装置、電子デバイス製品および太陽電池モジュールの提供も目的とする。 Accordingly, the present invention aims to provide glass with low brick corrosion resistance and a method for manufacturing the same. It also aims to provide chemically strengthened glass using the above glass as a base glass and a method for manufacturing the same. It also aims to provide display devices, electronic device products, and solar cell modules that include the above glass or chemically strengthened glass.

 上記課題について、本発明者らは、優れたレンガ浸食特性、すなわち低いレンガ浸食性を示す新たなガラス組成を見出した。 In response to the above-mentioned issues, the inventors have discovered a new glass composition that exhibits excellent brick erosion properties, i.e., low brick erosion.

 本発明の一態様は、酸化物基準のモル百分率表示で、
 SiOを60.0~75.0%、
 Alを2.0~20.0%、
 LiOを20.0~30.0%、
 MgOを0.0~10.0%、
 CaOを0.0~10.0%、
 ZrOを2.00~10.00%および
 Pを0.50~5.00%含有し、
 Yを実質的に含有せず、かつ、
 下記式(1)で表されるXの値が0.70以下である、ガラスに関する。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
One aspect of the present invention is a composition comprising, in mole percentage on an oxide basis:
SiO2 60.0 to 75.0%,
2.0 to 20.0% Al 2 O 3 ,
20.0 to 30.0% Li 2 O,
MgO 0.0 to 10.0%,
CaO 0.0 to 10.0%,
Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ;
Substantially does not contain Y 2 O 3 , and
The present invention relates to glass in which the value of X represented by the following formula (1) is 0.70 or less.
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.

 また、本発明の他の態様は、厚さ方向中心部の組成が、酸化物基準のモル百分率表示で、
 SiOを60.0~75.0%、
 Alを2.0~20.0%、
 LiOを20.0~30.0%、
 MgOを0.0~10.0%、
 CaOを0.0~10.0%、
 ZrOを2.00~10.00%および
 Pを0.50~5.00%含有し、
 Yを実質的に含有せず、かつ、
 下記式(1)で表されるXの値が0.70以下である、化学強化ガラスに関する。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、厚さ方向中心部における、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
In another aspect of the present invention, the composition of the center portion in the thickness direction is expressed in mole percentage based on oxides as follows:
SiO2 60.0 to 75.0%,
2.0 to 20.0% Al 2 O 3 ,
20.0 to 30.0% Li 2 O,
MgO 0.0 to 10.0%,
CaO 0.0 to 10.0%,
Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ;
Substantially does not contain Y 2 O 3 , and
The present invention relates to a chemically strengthened glass, wherein the value of X represented by the following formula (1) is 0.70 or less.
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis at the center in the thickness direction.

 また、本発明の他の態様は、ガラスの製造方法であって、
 ガラス原料を溶融炉内で加熱溶融することを含み、
 前記溶融炉は、酸化物基準の質量百分率表示でAlを85質量%以上含有する電鋳レンガを含み、
 前記ガラスは、酸化物基準のモル百分率表示で、
 SiOを60.0~75.0%、
 Alを2.0~20.0%、
 LiOを20.0~30.0%、
 MgOを0.0~10.0%、
 CaOを0.0~10.0%、
 ZrOを2.00~10.00%および
 Pを0.50~5.00%含有し、
 Yを実質的に含有せず、かつ、
 下記式(1)で表されるXの値が0.70以下である、ガラスの製造方法に関する。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
Another aspect of the present invention is a method for producing glass, comprising:
The method comprises heating and melting glass raw materials in a melting furnace,
The melting furnace includes electroformed bricks containing 85 mass% or more of Al 2 O 3 expressed as a mass percentage based on oxides,
The glass has, in mole percentage on an oxide basis,
SiO2 60.0 to 75.0%,
2.0 to 20.0% Al 2 O 3 ,
20.0 to 30.0% Li 2 O,
MgO 0.0 to 10.0%,
CaO 0.0 to 10.0%,
Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ;
Substantially does not contain Y 2 O 3 , and
The present invention relates to a method for producing glass, in which the value of X represented by the following formula (1) is 0.70 or less.
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.

 また、本発明の他の態様は、上記のガラスを化学強化することを含む、化学強化ガラスの製造方法に関する。 Another aspect of the present invention relates to a method for producing chemically strengthened glass, which includes chemically strengthening the above-mentioned glass.

 また、本発明の他の態様は、上記の化学強化ガラスと、ディスプレイとを有する、表示装置に関する。 Another aspect of the present invention relates to a display device having the above-mentioned chemically strengthened glass and a display.

 また、本発明の他の態様は、上記の化学強化ガラスを構成部材の一部として有する、電子デバイス製品に関する。 Another aspect of the present invention relates to an electronic device product that has the above-mentioned chemically strengthened glass as part of its constituent parts.

 また、本発明の他の態様は、上記の化学強化ガラスを有する、太陽電池モジュールに関する。 Another aspect of the present invention relates to a solar cell module having the above-mentioned chemically strengthened glass.

 本発明によれば、レンガ浸食性の低い新たな組成のガラスおよびその製造方法を得られる。また、このガラスを化学強化することにより、高強度の化学強化ガラスを得られる。本発明のガラスまたは化学強化ガラスは、例えば表示装置、電子デバイス製品および太陽電池モジュールに好適に使用できる。 The present invention provides glass with a new composition that exhibits low brick corrosion resistance, and a method for producing the same. Furthermore, by chemically strengthening this glass, high-strength chemically strengthened glass can be obtained. The glass or chemically strengthened glass of the present invention can be suitably used in, for example, display devices, electronic device products, and solar cell modules.

 以下、本発明を実施形態に基づいて、詳細に説明するが、本発明は以下の実施形態に限定されるものではなく、本発明の要旨を逸脱しない範囲において、任意に変形して実施できる。 The present invention will be described in detail below based on the following embodiments, but the present invention is not limited to the following embodiments and can be modified and implemented as desired without departing from the spirit of the present invention.

 本明細書において、ガラス組成は酸化物基準のモル百分率表示で示し、モル%を単に%と記載することがある。また、数値範囲を示す「~」とは、その前後に記載された数値を下限値および上限値として含む意味で使用される。 In this specification, glass compositions are expressed in mole percentages based on oxides, and mole % is sometimes simply referred to as %. Furthermore, the use of "to" to indicate a numerical range means that the numerical values before and after it are included as the lower and upper limits.

 ガラス組成において「実質的に含有しない」とは、原材料等に含まれる不可避の不純物を除いて含有しない、すなわち、意図的に含有させたものではないことを意味する。本明細書において、特に断りがない場合、ガラス組成において「実質的に含有しない」とは、例えば、ガラス組成中の含有量が0.05モル%未満であることを意味する。 In a glass composition, "substantially free" means that it is not contained except for unavoidable impurities contained in raw materials, etc., i.e., it is not intentionally contained. In this specification, unless otherwise specified, "substantially free" in a glass composition means, for example, that the content in the glass composition is less than 0.05 mol%.

 《ガラス》
 本態様のガラスは、結晶相を含まない非晶質ガラスであってもよく、結晶相を含む結晶化ガラスであってもよい。本態様のガラスは、後述するように結晶化ガラスであることが好ましい。
Glass
The glass of this embodiment may be amorphous glass containing no crystalline phase, or may be crystallized glass containing a crystalline phase. The glass of this embodiment is preferably crystallized glass, as described below.

 本態様のガラスは、酸化物基準のモル百分率表示で、SiOを60.0~75.0%、Alを2.0~20.0%、LiOを20.0~30.0%、MgOを0.0~10.0%、CaOを0.0~10.0%、ZrOを2.00~10.00%およびPを0.50~5.00%含有し、Yを実質的に含有しない。 The glass of this embodiment contains, in mole percentages based on oxides, 60.0 to 75.0% SiO2 , 2.0 to 20.0% Al2O3 , 20.0 to 30.0% Li2O , 0.0 to 10.0% MgO, 0.0 to 10.0% CaO, 2.00 to 10.00% ZrO2 , and 0.50 to 5.00% P2O5 , and is substantially free of Y2O3 .

 SiOはガラスのネットワーク構造を形成する成分であり、本態様のガラスの必須成分である。また、化学的耐久性を上げる成分であり、ケイ酸リチウム結晶やアルミノケイ酸リチウム結晶の構成成分でもある。本態様のガラスにおいて、SiOの含有量は60.0~75.0%である。上述の観点から、SiOの含有量は60.0%以上であり、62.0%以上が好ましく、64.0%以上がより好ましく、66.0%以上がさらに好ましい。化学強化による応力を十分に大きくする観点から、SiOの含有量は75.0%以下であり、73.0%以下が好ましく、72.0%以下がより好ましく、70.0%以下がさらに好ましい。 SiO 2 is a component that forms the network structure of the glass and is an essential component of the glass of this embodiment. It is also a component that increases chemical durability and is a constituent of lithium silicate crystals and lithium aluminosilicate crystals. In the glass of this embodiment, the SiO 2 content is 60.0 to 75.0%. From the above viewpoints, the SiO 2 content is 60.0% or more, preferably 62.0% or more, more preferably 64.0% or more, and even more preferably 66.0% or more. From the viewpoint of sufficiently increasing the stress due to chemical strengthening, the SiO 2 content is 75.0% or less, preferably 73.0% or less, more preferably 72.0% or less, and even more preferably 70.0% or less.

 Alは化学強化による表面圧縮応力を大きくする成分であり、本態様のガラスの必須成分である。本態様のガラスにおいて、Alの含有量は2.0~20.0%である。上述の観点から、Alの含有量は2.0%以上であり、2.4%以上が好ましく、3.0%以上がより好ましく、4.0%以上がさらに好ましい。ガラスのヘーズ値を小さくする観点から、Alの含有量は20.0%以下であり、15.0%以下が好ましく、10.0%以下がより好ましく、8.0%以下がさらに好ましい。 Al 2 O 3 is a component that increases the surface compressive stress due to chemical strengthening and is an essential component of the glass of this embodiment. In the glass of this embodiment, the Al 2 O 3 content is 2.0 to 20.0%. From the above-mentioned viewpoints, the Al 2 O 3 content is 2.0% or more, preferably 2.4% or more, more preferably 3.0% or more, and even more preferably 4.0% or more. From the viewpoint of reducing the haze value of the glass, the Al 2 O 3 content is 20.0% or less, preferably 15.0% or less, more preferably 10.0% or less, and even more preferably 8.0% or less.

 LiOは、レンガに含まれるZrOの溶出を抑制し、ガラスのレンガ浸食性を低減する成分である。また、LiOはイオン交換により表面圧縮応力を形成させる成分であるとともに、ケイ酸リチウム結晶、アルミノケイ酸リチウム結晶およびリン酸リチウム結晶の構成成分でもある。本態様のガラスにおいて、LiOの含有量は20.0~30.0%である。上述の観点から、LiOの含有量は20.0%以上であり、22.0%以上が好ましく、24.0%以上がより好ましく、26.0%以上がさらに好ましい。化学的耐久性を保持する観点から、LiOの含有量は30.0%以下であり、29.0%以下が好ましく、28.0%以下がより好ましく、27.0%以下がさらに好ましい。 Li 2 O is a component that suppresses the elution of ZrO 2 contained in bricks and reduces the brick erosion of the glass. Li 2 O is also a component that forms surface compressive stress through ion exchange, and is also a constituent of lithium silicate crystals, lithium aluminosilicate crystals, and lithium phosphate crystals. In the glass of this embodiment, the Li 2 O content is 20.0 to 30.0%. From the above viewpoints, the Li 2 O content is 20.0% or more, preferably 22.0% or more, more preferably 24.0% or more, and even more preferably 26.0% or more. From the viewpoint of maintaining chemical durability, the Li 2 O content is 30.0% or less, preferably 29.0% or less, more preferably 28.0% or less, and even more preferably 27.0% or less.

 MgOは必須ではないが、レンガに含まれるZrOの溶出を抑制し、ガラスのレンガ浸食性を低減する成分であり、含有してもよい。MgOはガラスの溶融性を向上する成分でもある。本態様のガラスにおいて、MgOの含有量は0.0~10.0%である。本態様のガラスがMgOを含有する場合の含有量は、上述の観点から、0.5%以上が好ましく、1.5%以上がより好ましく、2.0%以上がさらに好ましい。イオン交換速度の低下を抑える観点から、MgOの含有量は10.0%以下であり、7.0%以下が好ましく、5.0%以下がより好ましく、3.0%以下がさらに好ましい。 Although MgO is not essential, it is a component that suppresses the elution of ZrO2 contained in bricks and reduces the brick erosion of the glass, and may be contained. MgO is also a component that improves the meltability of the glass. In the glass of this embodiment, the MgO content is 0.0 to 10.0%. From the above-mentioned viewpoints, when the glass of this embodiment contains MgO, the content is preferably 0.5% or more, more preferably 1.5% or more, and even more preferably 2.0% or more. From the viewpoint of suppressing a decrease in the ion exchange rate, the MgO content is 10.0% or less, preferably 7.0% or less, more preferably 5.0% or less, and even more preferably 3.0% or less.

 CaOは必須ではないが、レンガに含まれるZrOの溶出を抑制し、ガラスのレンガ浸食性を低減する成分であり、含有してもよい。CaOはガラスの溶融性を向上する成分でもある。本態様のガラスにおいて、CaOの含有量は0.0~10.0%である。本態様のガラスがCaOを含有する場合の含有量は、上述の観点から、0.5%以上が好ましく、0.8%以上がより好ましく、1.0%以上がさらに好ましい。イオン交換速度の低下を抑える観点から、CaOの含有量は10.0%以下であり、7.0%以下が好ましく、5.0%以下がより好ましく、3.0%以下がさらに好ましい。 Although CaO is not essential, it may be contained as it is a component that suppresses the elution of ZrO2 contained in bricks and reduces the brick erosion of the glass. CaO is also a component that improves the meltability of the glass. In the glass of this embodiment, the CaO content is 0.0 to 10.0%. From the above-mentioned viewpoints, when the glass of this embodiment contains CaO, the content is preferably 0.5% or more, more preferably 0.8% or more, and even more preferably 1.0% or more. From the viewpoint of suppressing a decrease in the ion exchange rate, the CaO content is 10.0% or less, preferably 7.0% or less, more preferably 5.0% or less, and even more preferably 3.0% or less.

 ZrOは、レンガに含まれるZrOおよびAlの溶出を抑制し、ガラスのレンガ浸食性を低減する成分であり、本態様のガラスの必須成分である。また、ZrOは結晶化ガラスを得るための結晶化処理に際して、結晶核を構成し得る成分でもある。本態様のガラスにおいて、ZrOの含有量は2.00~10.00%である。上述の観点から、ZrOの含有量は2.00%以上であり、2.80%以上が好ましく、3.00%以上がより好ましく、4.00%以上がさらに好ましい。溶融時の失透を抑制する観点から、ZrOの含有量は10.00%以下であり、8.00%以下が好ましく、7.00%以下がより好ましく、6.00%以下がさらに好ましい。 ZrO2 is a component that suppresses the elution of ZrO2 and Al2O3 contained in bricks and reduces the brick corrosion of the glass, and is an essential component of the glass of this embodiment. ZrO2 is also a component that can form crystal nuclei during the crystallization process to obtain crystallized glass. In the glass of this embodiment, the ZrO2 content is 2.00 to 10.00%. From the above viewpoints, the ZrO2 content is 2.00% or more, preferably 2.80% or more, more preferably 3.00% or more, and even more preferably 4.00% or more. From the viewpoint of suppressing devitrification during melting, the ZrO2 content is 10.00% or less, preferably 8.00% or less, more preferably 7.00% or less, and even more preferably 6.00% or less.

 Pは、レンガに含まれるZrOおよびAlの溶出を抑制し、ガラスのレンガ浸食性を低減する成分であり、本態様のガラスの必須成分である。また、Pはガラスの分相を促して結晶化を促進する成分であり、リン酸リチウム結晶の構成成分でもある。本態様のガラスにおいて、Pの含有量は0.50~5.00%である。上述の観点から、Pの含有量は0.50%以上であり、0.70%以上が好ましく、0.80%以上がより好ましく、0.90%以上がさらに好ましく、0.90%超が特に好ましく、1.20%以上が最も好ましい。溶融時の過度な分相を抑制し、耐酸性の低下を抑制する観点から、Pの含有量は5.00%以下であり、4.00%以下が好ましく、3.00%以下がより好ましく、2.00%以下がさらに好ましく、1.60%以下が特に好ましく、1.40%以下が最も好ましい。 P 2 O 5 is a component that suppresses the elution of ZrO 2 and Al 2 O 3 contained in bricks and reduces the brick corrosion of the glass, and is an essential component of the glass of this embodiment. Furthermore, P 2 O 5 is a component that promotes phase separation and crystallization of the glass, and is also a constituent of lithium phosphate crystals. In the glass of this embodiment, the P 2 O 5 content is 0.50 to 5.00%. From the above viewpoints, the P 2 O 5 content is 0.50% or more, preferably 0.70% or more, more preferably 0.80% or more, even more preferably 0.90% or more, particularly preferably more than 0.90%, and most preferably 1.20% or more. From the viewpoint of suppressing excessive phase separation during melting and suppressing a decrease in acid resistance, the content of P 2 O 5 is 5.00% or less, preferably 4.00% or less, more preferably 3.00% or less, even more preferably 2.00% or less, particularly preferably 1.60% or less, and most preferably 1.40% or less.

 Yはレンガに含まれるAlの溶出を促進する。このため、ガラスのレンガ浸食性を低減する観点から、本態様のガラスはYを実質的に含有しない。Yを実質的に含有しないとは、ガラス組成中のYの含有量が0.05%未満であることを意味する。 Y 2 O 3 promotes the elution of Al 2 O 3 contained in bricks. Therefore, from the viewpoint of reducing the brick corrosion of the glass, the glass of this embodiment does not substantially contain Y 2 O 3. "Substantially not containing Y 2 O 3" means that the content of Y 2 O 3 in the glass composition is less than 0.05%.

 TiOは必須ではないが、結晶化ガラスを得るための結晶化処理に際して、結晶核を構成し得る成分であり、含有してもよい。また、TiOはレンガに含まれるAlの溶出を抑制し、特に高アルミナレンガに対するガラスの浸食性を低減する成分である。本態様のガラスにおいて、TiOの含有量は0.00~0.10%であることが好ましい。本態様のガラスがTiOを含有する場合の含有量は、上述の観点から、0.05%以上であってもよく、0.06%以上であってもよい。TiOはレンガに含まれるZrOの溶出を促進するため、特に高ジルコニアレンガに対するガラスの浸食性を低減する観点からは、TiOの含有量は0.10%以下が好ましく、0.09%以下がより好ましく、0.08%以下がさらに好ましく、低いほど好ましい。本態様のガラスはTiOを実質的に含有しないことが最も好ましい。TiOを実質的に含有しないとは、ガラス組成中のTiOの含有量が0.05%未満であることを意味する。 Although TiO2 is not essential, it is a component that can form crystal nuclei during the crystallization process to obtain crystallized glass, and may be contained. Furthermore, TiO2 is a component that suppresses the elution of Al2O3 contained in bricks, particularly reducing the corrosiveness of the glass to high-alumina bricks. In the glass of this embodiment, the TiO2 content is preferably 0.00 to 0.10%. When the glass of this embodiment contains TiO2 , the content may be 0.05% or more, or even 0.06% or more, from the above-mentioned viewpoint. Since TiO2 promotes the elution of ZrO2 contained in bricks, particularly from the viewpoint of reducing the corrosiveness of the glass to high-zirconia bricks, the TiO2 content is preferably 0.10% or less, more preferably 0.09% or less, and even more preferably 0.08% or less; the lower the content, the better. It is most preferable that the glass of this embodiment does not substantially contain TiO2 . Substantially free of TiO2 means that the content of TiO2 in the glass composition is less than 0.05%.

 本態様のガラスにおいては、下記式(1)で表されるXの値が0.70以下である。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
In the glass of this embodiment, the value of X represented by the following formula (1) is 0.70 or less.
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.

 上記Xの値が0.70以下であると、レンガ浸食性の低いガラスをより好適に得られる。上記Xの値は0.66以下が好ましく、0.60以下がより好ましく、0.40以下がさらに好ましい。上記Xの値の下限値は特に限定されないが、0.05以上であってよく、0.09超であってよく、0.15以上であってよい。上記Xの値は例えば0.05~0.70である。 If the value of X is 0.70 or less, glass with low brick erosion can be more suitably obtained. The value of X is preferably 0.66 or less, more preferably 0.60 or less, and even more preferably 0.40 or less. There is no particular lower limit to the value of X, but it may be 0.05 or more, may be greater than 0.09, or may be 0.15 or more. The value of X is, for example, 0.05 to 0.70.

 本態様のガラスにおいては、ZrOとPとTiOの合計含有量([ZrO]+[P]+[TiO])が3.00%以上であることが好ましい。[ZrO]+[P]+[TiO]が3.00%以上であると、レンガ浸食性の低いガラスをより好適に得られる。上記[ZrO]+[P]+[TiO]は3.00%以上が好ましく、3.30%以上がより好ましく、また、7.00%以下が好ましく、6.50%以下がより好ましい。[ZrO]+[P]+[TiO]は例えば3.00~7.00%である。 In the glass of this embodiment, the total content of ZrO2 , P2O5 , and TiO2 ([ ZrO2 ] + [ P2O5 ] + [ TiO2 ]) is preferably 3.00% or more. When [ ZrO2 ] + [ P2O5 ] + [ TiO2 ] is 3.00 % or more, a glass with low brick erosion can be more suitably obtained. The above [ ZrO2 ] + [ P2O5 ] + [ TiO2 ] is preferably 3.00% or more, more preferably 3.30% or more, and is preferably 7.00% or less, more preferably 6.50% or less. [ ZrO2 ] + [ P2O5 ] + [ TiO2 ] is , for example, 3.00 to 7.00%.

 NaOは必須ではないが、ガラスの溶融温度を下げ、ガラスの溶融性を向上させる成分であり、含有してもよい。本態様のガラスがNaOを含有する場合の含有量は、ガラスの溶融性を向上させる観点から、0.50%以上が好ましく、1.00%以上がより好ましく、2.00%以上がさらに好ましく、2.50%以上が特に好ましい。化学強化特性の低下を抑制する観点から、NaOの含有量は6.00%以下が好ましく、4.00%以下がより好ましく、3.50%以下がさらに好ましく、3.00%以下が特に好ましく、2.70%以下が最も好ましい。 Although Na 2 O is not essential, it is a component that lowers the melting temperature of the glass and improves the meltability of the glass, and may be contained. When the glass of this embodiment contains Na 2 O, the content is preferably 0.50% or more, more preferably 1.00% or more, even more preferably 2.00% or more, and particularly preferably 2.50% or more, from the viewpoint of improving the meltability of the glass. From the viewpoint of suppressing a decrease in chemical strengthening properties, the content of Na 2 O is preferably 6.00% or less, more preferably 4.00% or less, even more preferably 3.50% or less, particularly preferably 3.00% or less, and most preferably 2.70% or less.

 KOは必須ではないが、ガラスの溶融温度を下げ、ガラスの溶融性を向上させる成分であり、含有してもよい。本態様のガラスがKOを含有する場合の含有量は、ガラスの溶融性を向上させる観点から、0.10%以上が好ましく、0.20%以上がより好ましく、0.30%以上がさらに好ましく、0.60%以上が特に好ましい。化学強化特性の低下を抑制する観点から、KOの含有量は6.00%以下が好ましく、4.00%以下がより好ましく、3.50%以下がさらに好ましく、3.00%以下が特に好ましく、2.50%以下が最も好ましい。 Although K 2 O is not essential, it is a component that lowers the melting temperature of the glass and improves the meltability of the glass, and may be contained. When the glass of this embodiment contains K 2 O, the content is preferably 0.10% or more, more preferably 0.20% or more, even more preferably 0.30% or more, and particularly preferably 0.60% or more, from the viewpoint of improving the meltability of the glass. From the viewpoint of suppressing a decrease in chemical strengthening properties, the content of K 2 O is preferably 6.00% or less, more preferably 4.00% or less, even more preferably 3.50% or less, particularly preferably 3.00% or less, and most preferably 2.50% or less.

 SnOは必須ではないが、結晶核の生成を促進する作用があり、含有してもよい。本態様のガラスがSnOを含有する場合の含有量は、好ましくは0.1%以上であり、より好ましくは0.3%以上、さらに好ましくは1%以上、特に好ましくは2%以上である。一方、溶融時の失透を抑制するために、SnOの含有量は6%以下が好ましく、5%以下がより好ましく、4%以下がさらに好ましく、3%以下が特に好ましい。 Although SnO2 is not essential, it has the effect of promoting the formation of crystal nuclei and may be contained. When the glass of this embodiment contains SnO2 , the content is preferably 0.1% or more, more preferably 0.3% or more, even more preferably 1% or more, and particularly preferably 2% or more. On the other hand, in order to suppress devitrification during melting, the content of SnO2 is preferably 6% or less, more preferably 5% or less, even more preferably 4% or less, and particularly preferably 3% or less.

 Bは必須ではないが、ガラスまたは化学強化ガラスのチッピング耐性を向上させ、また溶融性を向上させる成分であり、含有してもよい。本態様のガラスがBを含有する場合の含有量は、溶融性を向上するために好ましくは0.5%以上であり、より好ましくは1%以上、さらに好ましくは2%以上である。一方、Bの含有量は、溶融時に脈理が発生しガラスの品質が低下することを抑制するため、5%以下が好ましい。Bの含有量は、より好ましくは4%以下、さらに好ましくは3%以下、特に好ましくは2%以下である。 Although B 2 O 3 is not essential, it is a component that improves the chipping resistance and meltability of glass or chemically strengthened glass, and may be contained. When the glass of this embodiment contains B 2 O 3 , the content is preferably 0.5% or more to improve meltability, more preferably 1% or more, and even more preferably 2% or more. On the other hand, the content of B 2 O 3 is preferably 5% or less to suppress the occurrence of striae during melting and the deterioration of glass quality. The content of B 2 O 3 is more preferably 4% or less, even more preferably 3% or less, and particularly preferably 2% or less.

 BaO、SrOおよびZnOは必須ではないが、ガラスの溶融性を向上する成分であり、含有してもよい。また、結晶化ガラスの非晶質相の屈折率を向上させて結晶相に近づけることにより、結晶化ガラスの透過率を向上して、ヘーズ値を下げられる成分でもある。本態様のガラスがBaO、SrOおよびZnOの少なくとも1種を含有する場合、これらの合計含有量([BaO]+[SrO]+[ZnO])は0.3%以上が好ましく、0.5%以上がより好ましく、0.7%以上がさらに好ましく、1%以上が特に好ましい。一方で、これらの成分は、イオン交換速度を低下させる場合がある。化学強化特性を良くするために、[BaO]+[SrO]+[ZnO]は2.5%以下が好ましく、2%以下がより好ましく、1.7%以下がさらに好ましく、1.5%以下が特に好ましい。 While not essential, BaO, SrO, and ZnO are components that improve the meltability of glass and may be contained. They also improve the transmittance of the glass-ceramics by increasing the refractive index of the amorphous phase of the glass-ceramics, bringing it closer to the crystalline phase, thereby improving the transmittance and lowering the haze value. When the glass of this embodiment contains at least one of BaO, SrO, and ZnO, the total content ([BaO] + [SrO] + [ZnO]) is preferably 0.3% or more, more preferably 0.5% or more, even more preferably 0.7% or more, and particularly preferably 1% or more. On the other hand, these components may reduce the ion exchange rate. To improve chemical strengthening properties, [BaO] + [SrO] + [ZnO] is preferably 2.5% or less, more preferably 2% or less, even more preferably 1.7% or less, and particularly preferably 1.5% or less.

 CeOは必須ではないが、ガラスを酸化する成分であり、着色を抑える場合があり、含有してもよい。本態様のガラスがCeOを含有する場合の含有量は0.03%以上が好ましく、0.05%以上がより好ましく、0.07%以上がさらに好ましい。CeOを酸化剤として用いる場合には、CeOの含有量は、ガラスの透明性を高くするために1.5%以下が好ましく、1.0%以下がより好ましい。 Although CeO2 is not essential, it is a component that oxidizes the glass and may suppress coloration, so it may be contained. When the glass of this embodiment contains CeO2 , the content is preferably 0.03% or more, more preferably 0.05% or more, and even more preferably 0.07% or more. When CeO2 is used as an oxidizing agent, the content of CeO2 is preferably 1.5% or less, more preferably 1.0% or less, in order to increase the transparency of the glass.

 ガラスを着色して使用する際は、所望の化学強化特性の達成を阻害しない範囲において着色成分を添加してもよい。着色成分としては、例えば、Co、MnO、Fe、NiO、CuO、Cr、V、Bi、SeO、ErおよびNdが好適なものとして挙げられる。 When the glass is colored for use, a coloring component may be added to the extent that the desired chemical strengthening properties are not impaired. Suitable examples of the coloring component include Co3O4 , MnO2 , Fe2O3 , NiO , CuO , Cr2O3 , V2O5 , Bi2O3 , SeO2 , Er2O3 , and Nd2O3 .

 着色成分の含有量は、合計で1%以下の範囲が好ましい。ガラスの可視光透過率をより高くしたい場合は、これらの成分は実質的に含有しないことが好ましい。 The total content of coloring components is preferably 1% or less. If a higher visible light transmittance of the glass is desired, it is preferable that these components are substantially absent.

 また、ガラスの溶融の際の清澄剤等として、SO、塩化物、フッ化物などを適宜含有してもよい。本態様のガラスはAsを含有しないことが好ましい。本態様のガラスがSbを含有する場合、その含有量は、0.3%以下が好ましく、0.1%以下がより好ましく、Sbを含有しないことが最も好ましい。 Furthermore, SO 3 , chlorides, fluorides, etc. may be appropriately contained as a fining agent during melting of the glass. The glass of this embodiment preferably does not contain As 2 O 3. When the glass of this embodiment contains Sb 2 O 3 , the content is preferably 0.3% or less, more preferably 0.1% or less, and it is most preferable that the glass does not contain Sb 2 O 3 .

 本態様のガラスは、フィンガーテスト法により下記条件にて測定される、酸化物基準の質量百分率表示でAlを85質量%以上含有する電鋳レンガの浸食量が、0.090mm/日以下であることが好ましい。
(条件)坩堝内で、ガラスの粘度が10dPa・sとなる温度T2に加熱し溶融したガラスを、次いでガラスの粘度が103.5dPa・sとなる温度T3.5まで冷却する。得られたガラスに、電鋳レンガの試験片を浸漬させ、T3.5で48時間保持する。その後、ガラスを20℃以下まで冷却する。試験片を周囲のガラスごと坩堝からくり抜き、ガラスと試験片との接触面と垂直な面で試験片を切断して、横軸研削し、鏡面研磨する。得られた断面について、投影機を用いて試験片の最大浸食量を測定する。
The glass of this embodiment preferably exhibits an erosion amount of 0.090 mm/day or less of electroformed bricks containing 85 mass % or more of Al 2 O 3 expressed as oxide-based mass percentage, as measured by a finger test method under the following conditions.
(Conditions) The glass is heated to a temperature T2 in a crucible, at which the viscosity of the glass becomes 10 2 dPa·s, and then cooled to a temperature T3.5, at which the viscosity of the glass becomes 10 3.5 dPa·s. A test piece of electroformed brick is immersed in the resulting glass and held at T3.5 for 48 hours. The glass is then cooled to 20°C or below. The test piece is removed from the crucible along with the surrounding glass, and the test piece is cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished. The maximum erosion amount of the test piece is measured for the resulting cross section using a projector.

 上記フィンガーテスト法に用いる電鋳レンガは、酸化物基準の質量百分率表示でAlを85質量%以上含有する高アルミナレンガである。本態様のガラスは、上記フィンガーテスト法による高アルミナレンガの浸食量が、0.090mm/日以下であることが好ましく、0.085mm/日以下がより好ましく、0.080mm/日以下がさらに好ましく、少ないほど好ましい。上記浸食量は、ガラスの高アルミナレンガ浸食性の指標となり、ガラスの組成により調整できる。 The electroformed bricks used in the finger test are high-alumina bricks containing 85% by mass or more of Al2O3 expressed as a mass percentage based on oxides. The glass of this embodiment exhibits a high-alumina brick erosion rate measured by the finger test of 0.090 mm/day or less, more preferably 0.085 mm/day or less, and even more preferably 0.080 mm/day or less; the lower the better. The erosion rate is an indicator of the glass's resistance to corrosion by high-alumina bricks, and can be adjusted by the glass composition.

 本態様のガラスは、フィンガーテスト法により下記条件にて測定される、酸化物基準の質量百分率表示でZrOを80質量%以上含有する電鋳レンガの浸食量が、0.20mm/日以下であることが好ましい。
(条件)坩堝内で、ガラスの粘度が10dPa・sとなる温度T2に加熱し溶融したガラスに、電鋳レンガの試験片を浸漬させ、T2で48時間保持する。その後、ガラスを20℃以下まで冷却する。試験片を周囲のガラスごと坩堝からくり抜き、ガラスと試験片との接触面と垂直な面で試験片を切断して、横軸研削し、鏡面研磨する。得られた断面について、投影機を用いて試験片の最大浸食量を測定する。
The glass of this embodiment preferably exhibits an erosion amount of 0.20 mm/day or less of electroformed bricks containing 80 mass % or more of ZrO2 , expressed as a mass percentage based on oxides, as measured by a finger test method under the following conditions.
(Conditions) A test piece of electroformed brick was immersed in molten glass heated to a temperature T2 in a crucible, at which the viscosity of the glass reached 10 2 dPa s, and held at T2 for 48 hours. The glass was then cooled to 20°C or below. The test piece was then removed from the crucible along with the surrounding glass, cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished. The maximum erosion of the test piece was measured for the resulting cross section using a projector.

 上記フィンガーテスト法に用いる電鋳レンガは、酸化物基準の質量百分率表示でZrOを80質量%以上含有する高ジルコニアレンガである。本態様のガラスは、上記フィンガーテスト法による高ジルコニアレンガの浸食量が、0.20mm/日以下であることが好ましく、0.15mm/日以下がより好ましく、0.13mm/日以下がさらに好ましく、少ないほど好ましい。上記浸食量は、ガラスの高ジルコニアレンガ浸食性の指標となり、ガラスの組成により調整できる。 The electroformed bricks used in the finger test are high-zirconia bricks containing 80% by mass or more of ZrO2 expressed as a mass percentage based on oxides. The glass of this embodiment exhibits a high-zirconia brick erosion rate measured by the finger test of 0.20 mm/day or less, more preferably 0.15 mm/day or less, and even more preferably 0.13 mm/day or less; the lower the better. The erosion rate is an indicator of the glass's resistance to high-zirconia brick erosion and can be adjusted by the glass composition.

 本態様のガラスのガラス転移点Tgは、390℃以上が好ましく、410℃以上がより好ましく、420℃以上がさらに好ましい。ガラス転移点Tgが高いと化学強化処理中の応力緩和が起こりにくいため、高い強度が得られやすい。一方でガラスの成形性等の観点から、Tgは650℃以下が好ましく、600℃以下がより好ましい。上記Tgは、例えば390~650℃であってよい。 The glass transition temperature Tg of the glass of this embodiment is preferably 390°C or higher, more preferably 410°C or higher, and even more preferably 420°C or higher. If the glass transition temperature Tg is high, stress relaxation during chemical strengthening is less likely to occur, making it easier to achieve high strength. On the other hand, from the perspective of glass formability, etc., Tg is preferably 650°C or lower, and more preferably 600°C or lower. The above Tg may be, for example, 390 to 650°C.

 本態様のガラスの50℃~350℃における平均熱膨張係数は、90×10-7/℃以上が好ましく、100×10-7/℃以上がより好ましく、110×10-7/℃以上がさらに好ましい。一方で、ガラスが成形中に割れることを抑制するため、平均熱膨張係数は150×10-7/℃以下が好ましく、140×10-7/℃以下がより好ましい。上記平均熱膨張係数は、例えば90×10-7/℃~150×10-7/℃であってよい。 The average thermal expansion coefficient of the glass of this embodiment at 50°C to 350°C is preferably 90×10 -7 /°C or more, more preferably 100×10 -7 /°C or more, and even more preferably 110×10 -7 /°C or more. On the other hand, in order to prevent the glass from cracking during molding, the average thermal expansion coefficient is preferably 150×10 -7 /°C or less, more preferably 140×10 -7 /°C or less. The average thermal expansion coefficient may be, for example, 90×10 -7 /°C to 150×10 -7 /°C.

 本態様のガラスを粉砕し、示差走査熱量計を用いて得られるDSC曲線から求められるガラス転移点(TgDSC)と、そのDSC曲線においてもっとも低温度域にあらわれる結晶化ピーク温度(Tc)との差を(Tc-Tg)とする。本態様のガラスの(Tc-Tg)は、80℃以上が好ましく、85℃以上がより好ましく、90℃以上がさらに好ましく、95℃以上が特に好ましい。(Tc-Tg)が大きいと、ガラスを加熱して曲げ加工等しやすい。(Tc-Tg)は、150℃以下が好ましく、140℃以下がより好ましい。上記(Tc-Tg)は、例えば80~150℃であってよい。 The glass of this embodiment is crushed, and the difference between the glass transition point (Tg DSC ) determined from a DSC curve obtained using a differential scanning calorimeter and the crystallization peak temperature (Tc) appearing in the lowest temperature range on the DSC curve is taken as (Tc - Tg). The (Tc - Tg) of the glass of this embodiment is preferably 80°C or higher, more preferably 85°C or higher, even more preferably 90°C or higher, and particularly preferably 95°C or higher. When (Tc - Tg) is large, the glass is easier to heat and process, for example, for bending. (Tc - Tg) is preferably 150°C or lower, more preferably 140°C or lower. The (Tc - Tg) may be, for example, 80 to 150°C.

 上記TgDSCは、熱膨張曲線から求められるガラス転移点(Tg)と一致しない場合がある。また、TgDSCはガラスを粉砕して測定するために、測定誤差が大きくなりやすいが、結晶化ピーク温度との関係を評価するためには、熱膨張曲線から求められるTgよりも、同じDSC測定で求められるTgDSCを用いるのが適切である。 The Tg DSC may not coincide with the glass transition temperature (Tg) determined from a thermal expansion curve. Furthermore, since Tg DSC is measured after crushing the glass, measurement error is likely to be large. However, in order to evaluate the relationship with the crystallization peak temperature, it is more appropriate to use the Tg DSC determined by the same DSC measurement than the Tg determined from a thermal expansion curve.

 本態様のガラスのヤング率は、75GPa以上が好ましく、80GPa以上がより好ましく、85GPa以上がさらに好ましく、また、130GPa以下が好ましく、125GPa以下がより好ましく、120GPa以下がさらに好ましい。上記ヤング率は、例えば75~130GPaであってよい。 The Young's modulus of the glass of this embodiment is preferably 75 GPa or more, more preferably 80 GPa or more, and even more preferably 85 GPa or more, and is preferably 130 GPa or less, more preferably 125 GPa or less, and even more preferably 120 GPa or less. The Young's modulus may be, for example, 75 to 130 GPa.

 本態様のガラスのビッカース硬度は、500以上が好ましく、550以上がより好ましく、また、1100以下が好ましく、1050以下がより好ましく、1000以下がさらに好ましい。上記ビッカース硬度は、例えば500~1100であってよい。 The Vickers hardness of the glass of this embodiment is preferably 500 or more, more preferably 550 or more, and preferably 1100 or less, more preferably 1050 or less, and even more preferably 1000 or less. The Vickers hardness may be, for example, 500 to 1100.

 本態様のガラスの厚さは、例えば2000μm以下であり、好ましくは1500μm以下、より好ましくは1000μm以下、さらに好ましくは900μm以下、特に好ましくは800μm以下、最も好ましくは700μm以下である。また、充分な強度を得るために、厚さは、例えば200μm以上であり、好ましくは400μm以上、より好ましくは500μm以上、さらに好ましくは600μm以上である。上記厚さは、例えば200~2000μmであってよい。 The thickness of the glass in this embodiment is, for example, 2000 μm or less, preferably 1500 μm or less, more preferably 1000 μm or less, even more preferably 900 μm or less, particularly preferably 800 μm or less, and most preferably 700 μm or less. Furthermore, to obtain sufficient strength, the thickness is, for example, 200 μm or more, preferably 400 μm or more, more preferably 500 μm or more, and even more preferably 600 μm or more. The thickness may be, for example, 200 to 2000 μm.

 本態様のガラスの形状は、適用される製品や用途等に応じて、板状でもよく、それ以外の形状でもよい。また、本態様のガラスが板状のガラスすなわちガラス板である場合、当該ガラス板は、外周の厚みが異なる縁取り形状などを有していてもよい。また、ガラス板の形態はこれに限定されず、例えば2つの主面は互いに平行でなくともよく、また、2つの主面の一方または両方の全部または一部が曲面であってもよい。より具体的には、ガラス板は、例えば、反りの無い平板状のガラス板であってもよく、また、湾曲した表面を有する曲面ガラス板であってもよい。 The shape of the glass of this embodiment may be plate-like or may be any other shape, depending on the product to which it is applied, its intended use, etc. Furthermore, when the glass of this embodiment is plate-like glass, i.e., a glass plate, the glass plate may have a rim shape with a different thickness around the periphery. Furthermore, the shape of the glass plate is not limited to this; for example, the two main surfaces do not have to be parallel to each other, and one or both of the two main surfaces may be entirely or partially curved. More specifically, the glass plate may be, for example, a flat glass plate without warping, or a curved glass plate with a curved surface.

 本態様のガラスは、携帯電話、スマートフォン、携帯情報端末(PDA)、タブレット端末等のモバイル電子機器に用いられるカバーガラスとして用いることができる。携帯を目的としない、テレビ(TV)、パーソナルコンピュータ(PC)、タッチパネル等の電子機器のカバーガラスにも有用である。また、窓ガラス等の建築用資材、テーブルトップ、自動車や飛行機等の内装等やそれらのカバーガラスとしても有用である。 The glass of this embodiment can be used as cover glass for mobile electronic devices such as mobile phones, smartphones, personal digital assistants (PDAs), and tablet devices. It is also useful as cover glass for electronic devices that are not intended to be portable, such as televisions (TVs), personal computers (PCs), and touch panels. It is also useful as building materials such as window glass, tabletops, and the interiors of automobiles and airplanes, as well as the cover glass for these materials.

 本態様のガラスは、化学強化の前または後に曲げ加工や成形をおこなって平板状以外の形状にできるので、曲面形状を有する筺体等の用途にも有用である。 Glass of this type can be bent or formed into shapes other than flat before or after chemical strengthening, making it useful for applications such as housings with curved surfaces.

 〈結晶化ガラス〉
 本態様のガラスは、結晶相を含む結晶化ガラスであることが好ましい。結晶化ガラスは、非晶質ガラスを加熱処理して結晶化することで得られる。結晶化ガラス全体のガラス組成は、結晶化前の非晶質ガラスの組成と一致し、結晶化ガラスの組成の好ましい態様は上述したものと同様である。
<Glass-ceramics>
The glass of this embodiment is preferably the crystallized glass that contains crystalline phase.Crystallized glass is obtained by heating amorphous glass to crystallize it.The glass composition of the entire crystallized glass is the same as the composition of the amorphous glass before crystallization, and the preferred embodiment of the composition of crystallized glass is the same as above.

 本明細書において、結晶相を含む結晶化ガラスとは、粉末X線回折(XRD)法により得られたXRDパターンにおいて、結晶を示す回折ピークが認められるガラスを意味する。 In this specification, "crystallized glass containing a crystalline phase" refers to glass in which diffraction peaks indicating crystals are observed in the XRD pattern obtained by powder X-ray diffraction (XRD) method.

 本態様のガラスが結晶化ガラスである場合、当該結晶化ガラスは、LiSi(リチウムダイシリケート)、LiAlSi(β-スポジュメン)、LiAlSi10(ペタライト)、LiPO(リン酸リチウム)およびβ-石英固溶体からなる群より選択される少なくとも1種の結晶を含むことが好ましい。結晶化ガラスが上記の結晶を含むことで、化学強化した際に高強度となるガラスをより好適に得られる。結晶化ガラスに含まれる結晶は、LiSi、LiAlSi、およびLiAlSi10からなる群より選択される少なくとも1種の結晶であることがより好ましく、LiSiを含むことがさらに好ましい。結晶化ガラスが上記の結晶を含むことは、X線回折スペクトルから確認できる。 When the glass of this embodiment is glass-ceramics, the glass-ceramics preferably contain at least one crystal selected from the group consisting of Li 2 Si 2 O 5 (lithium disilicate), LiAlSi 2 O 6 (β-spodumene), LiAlSi 4 O 10 (petalite), Li 3 PO 4 (lithium phosphate), and β-quartz solid solution. The inclusion of the above crystals in the glass-ceramics more preferably results in a glass that exhibits high strength when chemically strengthened. The crystals contained in the glass-ceramics are more preferably at least one crystal selected from the group consisting of Li 2 Si 2 O 5 , LiAlSi 2 O 6 , and LiAlSi 4 O 10 , and more preferably contain Li 2 Si 2 O 5. The presence of the above crystals in the glass-ceramics can be confirmed from an X-ray diffraction spectrum.

 本態様のガラスの結晶化率は、機械的強度を高くするために、5%以上が好ましく、10%以上がより好ましく、15%以上がさらに好ましく、20%以上が特に好ましい。上記結晶化率は、透明性を高くするために、80%以下が好ましく、70%以下がより好ましく、60%以下が特に好ましい。結晶化率が小さいことは、加熱して曲げ成形等しやすい点でも優れている。上記結晶化率は、例えば5~80%であってよい。 The crystallization rate of the glass of this embodiment is preferably 5% or more, more preferably 10% or more, even more preferably 15% or more, and particularly preferably 20% or more, in order to increase mechanical strength. The crystallization rate is preferably 80% or less, more preferably 70% or less, and particularly preferably 60% or less, in order to increase transparency. A low crystallization rate is also advantageous in that it is easy to heat and bend the glass. The crystallization rate may be, for example, 5 to 80%.

 結晶化率は、X線回折強度からリートベルト法で算出できる。リートベルト法については、日本結晶学会「結晶解析ハンドブック」編集委員会編、「結晶解析ハンドブック」(共立出版 1999年刊、p492~499)に記載されている。 The crystallinity rate can be calculated from the X-ray diffraction intensity using the Rietveld method. The Rietveld method is described in the "Crystal Analysis Handbook" (Kyoritsu Shuppan, 1999, pp. 492-499), edited by the Editorial Committee of the Crystallographic Society of Japan.

 結晶化ガラスの析出結晶の平均粒径は、80nm以下が好ましく、60nm以下がより好ましく、50nm以下がさらに好ましく、40nm以下が特に好ましく、30nm以下がもっとも好ましい。上記平均粒径の下限値は特に限定されないが、例えば5nm以上であることが通常である。上記平均粒径は、透過型電子顕微鏡(TEM)像から求められる。 The average particle size of the precipitated crystals in the crystallized glass is preferably 80 nm or less, more preferably 60 nm or less, even more preferably 50 nm or less, particularly preferably 40 nm or less, and most preferably 30 nm or less. There is no particular lower limit to the average particle size, but it is usually 5 nm or more, for example. The average particle size can be determined from a transmission electron microscope (TEM) image.

 本態様のガラスが結晶化ガラスである場合、結晶化ガラスの50℃~350℃における平均熱膨張係数は、90×10-7/℃以上が好ましく、より好ましくは100×10-7/℃以上、さらに好ましくは110×10-7/℃以上、特に好ましくは120×10-7/℃以上、最も好ましくは130×10-7/℃以上である。化学強化の過程で熱膨張率差により割れが発生することを抑制するため、上記平均熱膨張係数は、好ましくは160×10―7/℃以下、より好ましくは150×10-7/℃以下、さらに好ましくは140×10-7/℃以下である。上記平均熱膨張係数は、例えば90×10-7/℃~160×10―7/℃であってよい。 When the glass of this embodiment is crystallized glass, the average thermal expansion coefficient of the crystallized glass at 50 ° C to 350 ° C is preferably 90 × 10 -7 / ° C or more, more preferably 100 × 10 -7 / ° C or more, even more preferably 110 × 10 -7 / ° C or more, particularly preferably 120 × 10 -7 / ° C or more, and most preferably 130 × 10 -7 / ° C or more. In order to suppress the occurrence of cracks due to the difference in thermal expansion coefficient during chemical strengthening, the average thermal expansion coefficient is preferably 160 × 10 -7 / ° C or less, more preferably 150 × 10 -7 / ° C or less, and even more preferably 140 × 10 -7 / ° C or less. The average thermal expansion coefficient may be, for example, 90 × 10 -7 / ° C to 160 × 10 -7 / ° C.

 結晶化ガラスは、結晶を含むので硬度が大きい。そのために傷つきにくく、耐摩耗性にも優れる。本態様のガラスが結晶化ガラスである場合、耐摩耗性を大きくするために、ビッカース硬度は600以上が好ましく、700以上がより好ましく、730以上がさらに好ましく、750以上が特に好ましく、780以上が最も好ましい。加工性の観点から、結晶化ガラスのビッカース硬度は、1100以下が好ましく、1050以下がより好ましく、1000以下がさらに好ましい。上記ビッカース硬度は、例えば600~1100であってよい。 Ceramics glass has a high hardness because it contains crystals. This makes it scratch-resistant and highly abrasion-resistant. When the glass of this embodiment is crystallized glass, in order to increase abrasion resistance, the Vickers hardness is preferably 600 or higher, more preferably 700 or higher, even more preferably 730 or higher, particularly preferably 750 or higher, and most preferably 780 or higher. From the standpoint of processability, the Vickers hardness of the crystallized glass is preferably 1100 or lower, more preferably 1050 or lower, and even more preferably 1000 or lower. The Vickers hardness may be, for example, 600 to 1100.

 本態様のガラスが結晶化ガラスである場合、結晶化ガラスのヤング率は、化学強化時の強化による反りを抑制するために、好ましくは85GPa以上、より好ましくは90GPa以上、さらに好ましくは95GPa以上、特に好ましくは100GPa以上である。結晶化ガラスは研磨して用いることがある。研磨しやすさのために、結晶化ガラスのヤング率は130GPa以下が好ましく、125GPa以下がより好ましく、120GPa以下がさらに好ましい。上記ヤング率は、例えば85~130GPaであってよい。 When the glass of this embodiment is glass-ceramics, the Young's modulus of the glass-ceramics is preferably 85 GPa or more, more preferably 90 GPa or more, even more preferably 95 GPa or more, and particularly preferably 100 GPa or more, in order to suppress warping due to strengthening during chemical strengthening. The glass-ceramics may be polished before use. For ease of polishing, the Young's modulus of the glass-ceramics is preferably 130 GPa or less, more preferably 125 GPa or less, and even more preferably 120 GPa or less. The Young's modulus may be, for example, 85 to 130 GPa.

 本態様のガラスが結晶化ガラスである場合、結晶化ガラスの破壊靱性値は、好ましくは0.8MPa・m1/2以上、より好ましくは0.85MPa・m1/2以上、さらに好ましくは0.9MPa・m1/2以上である。上記結晶化ガラスを化学強化した場合に、割れた際に破片が飛散しにくいためである。上記破壊靱性値の上限値は特に限定されないが、例えば2.0MPa・m1/2以下であることが通常である。上記破壊靱性値は、例えば0.8~2.0MPa・m1/2であってよい。 When the glass of this embodiment is crystallized glass, the fracture toughness value of the crystallized glass is preferably 0.8 MPa·m 1/2 or more, more preferably 0.85 MPa·m 1/2 or more, and even more preferably 0.9 MPa·m 1/2 or more. This is because, when the crystallized glass is chemically strengthened, fragments are less likely to scatter when broken. The upper limit of the fracture toughness value is not particularly limited, but is usually, for example, 2.0 MPa·m 1/2 or less. The fracture toughness value may be, for example, 0.8 to 2.0 MPa·m 1/2 .

 《化学強化ガラス》
 本態様の化学強化ガラスは、厚さ方向中心部の組成が、酸化物基準のモル百分率表示で、SiOを60.0~75.0%、Alを2.0~20.0%、LiOを20.0~30.0%、MgOを0.0~10.0%、CaOを0.0~10.0%、ZrOを2.00~10.00%およびPを0.50~5.00%含有し、Yを実質的に含有しない。また、本態様の化学強化ガラスは、厚さ方向中心部の組成において、下記式(1)で表されるXの値が0.70以下である。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、厚さ方向中心部における、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
Chemically strengthened glass
The chemically strengthened glass of this embodiment has a composition at the center in the thickness direction, expressed in mole percentages based on oxides, of 60.0 to 75.0% SiO 2 , 2.0 to 20.0% Al 2 O 3 , 20.0 to 30.0% Li 2 O, 0.0 to 10.0% MgO, 0.0 to 10.0% CaO, 2.00 to 10.00% ZrO 2 , and 0.50 to 5.00% P 2 O 5 , and is substantially free of Y 2 O 3. Furthermore, in the chemically strengthened glass of this embodiment, the value of X represented by the following formula (1) in the composition at the center in the thickness direction is 0.70 or less.
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis at the center in the thickness direction.

 本態様の化学強化ガラスとは、化学強化処理を施した後のガラスを指す。本態様の化学強化ガラスは、例えば、上述した本態様のガラスを化学強化することにより製造できる。 The chemically strengthened glass of this embodiment refers to glass that has been subjected to a chemical strengthening treatment. The chemically strengthened glass of this embodiment can be produced, for example, by chemically strengthening the glass of this embodiment described above.

 化学強化ガラスでは通常、ガラス表面部分にイオン交換による圧縮応力層が形成される。このため、化学強化ガラスのイオン交換されていない部分、すなわち厚さ方向中心部のガラス組成は、化学強化ガラスの母組成である、上述した本態様のガラスの組成と一致する。また、イオン交換された部分でも、アルカリ金属酸化物以外の成分の濃度は、基本的に母組成から変化しない。本態様の化学強化ガラスの厚さ方向中心部のガラス組成の好ましい態様は、本態様のガラスの組成について上述したものと同様である。 In chemically strengthened glass, a compressive stress layer due to ion exchange typically forms on the surface of the glass. Therefore, the glass composition of the non-ion-exchanged portion of the chemically strengthened glass, i.e., the center portion in the thickness direction, matches the composition of the glass of this embodiment described above, which is the base composition of chemically strengthened glass. Furthermore, even in the ion-exchanged portion, the concentrations of components other than alkali metal oxides basically do not change from the base composition. The preferred glass composition of the center portion in the thickness direction of the chemically strengthened glass of this embodiment is the same as that described above for the glass composition of this embodiment.

 本態様の化学強化ガラスは、厚さがt(単位:μm)であって、圧縮応力層深さ(DOC)が0.15t以上であり、ガラス表面からの深さ50μmにおける圧縮応力値(CS50)が30MPa以上であり、ガラス表面からの深さ100μmにおける圧縮応力値(CS100)が-10MPa以上であることが好ましい。 The chemically strengthened glass of this embodiment has a thickness t (unit: μm), a compressive stress layer depth (DOC) of 0.15t or more, a compressive stress value (CS 50 ) at a depth of 50 μm from the glass surface of 30 MPa or more, and a compressive stress value (CS 100 ) at a depth of 100 μm from the glass surface of -10 MPa or more.

 本態様の化学強化ガラスは、強度を向上する観点から、圧縮応力値(CS)がゼロとなる深さである圧縮応力層深さ(DOC)(単位:μm)が0.15t以上であることが好ましい。DOCは好ましくは0.15t以上、より好ましくは0.15t+5以上、さらに好ましくは0.15t+10以上である。内部引張応力(CT)の増加を抑制する観点から、DOCは好ましくは0.25t以下、より好ましくは0.25t-5以下、さらに好ましくは0.25t-10以下である。上記DOCは、例えば0.15t~0.25tであってよい。 From the perspective of improving strength, the chemically strengthened glass of this embodiment preferably has a depth of compressive stress layer (DOC) (unit: μm), which is the depth at which the compressive stress value (CS) becomes zero, of 0.15t or more. The DOC is preferably 0.15t or more, more preferably 0.15t + 5 or more, and even more preferably 0.15t + 10 or more. From the perspective of suppressing an increase in internal tensile stress (CT), the DOC is preferably 0.25t or less, more preferably 0.25t - 5 or less, and even more preferably 0.25t - 10 or less. The DOC may be, for example, 0.15t to 0.25t.

 本態様の化学強化ガラスは、#180サンドペーパーに対する落下強度を向上する観点から、CS50が30MPa以上であることが好ましい。CS50はより好ましくは60MPa以上、さらに好ましくは90MPa以上、特に好ましくは120MPa以上である。CTの増加に伴うガラスの破砕(加傷時の爆発的な破壊)を抑制する点から、CS50は好ましくは300MPa以下、より好ましくは250MPa以下、さらに好ましくは200MPa以下である。上記CS50は、例えば30~300MPaであってよい。 In the chemically strengthened glass of this embodiment, CS 50 is preferably 30 MPa or more from the viewpoint of improving drop strength against #180 sandpaper. CS 50 is more preferably 60 MPa or more, even more preferably 90 MPa or more, and particularly preferably 120 MPa or more. CS 50 is preferably 300 MPa or less, more preferably 250 MPa or less, and even more preferably 200 MPa or less from the viewpoint of suppressing glass fracture (explosive fracture when scratched) due to an increase in CT. The CS 50 may be, for example, 30 to 300 MPa.

 本態様の化学強化ガラスは、#80サンドペーパーに対する落下強度を向上させる観点から、CS100が-10MPa以上であることが好ましい。CS100はより好ましくは0MPa以上、さらに好ましくは10MPa以上、特に好ましくは20MPa以上である。ガラス破砕時の破片の飛散を抑制する観点から、CS100は好ましくは100MPa以下、より好ましくは80MPa以下、さらに好ましくは60MPa以下である。上記CS100は、例えば-10~100MPaであってよい。なお、上記CS100が負の値を取る場合、当該CS100は引張応力であることを意味する。 In the chemically strengthened glass of this embodiment, CS 100 is preferably -10 MPa or more from the viewpoint of improving drop strength against #80 sandpaper. CS 100 is more preferably 0 MPa or more, even more preferably 10 MPa or more, and particularly preferably 20 MPa or more. From the viewpoint of suppressing scattering of fragments when glass is crushed, CS 100 is preferably 100 MPa or less, more preferably 80 MPa or less, and even more preferably 60 MPa or less. The CS 100 may be, for example, -10 to 100 MPa. Note that when the CS 100 takes a negative value, it means that the CS 100 is a tensile stress.

 本態様の化学強化ガラスは、DOCが0.15t以上であり、CS50が30MPa以上であり、かつCS100が-10MPa以上であることが好ましく、DOCが0.15t+5以上であり、CS50が60MPa以上であり、かつCS100が0MPa以上であることがより好ましく、DOCが0.15t+10以上であり、CS50が90MPa以上であり、かつCS100が10MPa以上であることがさらに好ましい。 The chemically strengthened glass of this embodiment preferably has a DOC of 0.15t or more, a CS 50 of 30 MPa or more, and a CS 100 of −10 MPa or more, and more preferably has a DOC of 0.15t + 5 or more, a CS 50 of 60 MPa or more, and a CS 100 of 0 MPa or more. It is more preferable that the DOC is 0.15t + 10 or more, the CS 50 is 90 MPa or more, and the CS 100 is 10 MPa or more.

 本明細書において、上記DOC、CS50およびCS100は、株式会社折原製作所製の測定機SLP-2000を用いて化学強化ガラスの応力値を測定し、それぞれ読み取った結果である。 In this specification, the above DOC, CS 50 and CS 100 are the results obtained by measuring the stress values of chemically strengthened glass using a measuring instrument SLP-2000 manufactured by Orihara Seisakusho Co., Ltd.

 本態様の化学強化ガラスの厚さ(t)、形状および用途の好ましい態様は、本態様のガラスについて上述したものと同様である。 The preferred thickness (t), shape, and uses of the chemically strengthened glass of this embodiment are the same as those described above for the glass of this embodiment.

 《ガラスの製造方法》
 本態様のガラスの製造方法は、ガラス原料を溶融炉内で加熱溶融することを含む。上記溶融炉は、酸化物基準の質量百分率表示でAlを85質量%以上含有する電鋳レンガを含む。また、上記ガラスは、酸化物基準のモル百分率表示で、SiOを60.0~75.0%、Alを2.0~20.0%、LiOを20.0~30.0%、MgOを0.0~10.0%、CaOを0.0~10.0%、ZrOを2.00~10.00%およびPを0.50~5.00%含有し、Yを実質的に含有せず、かつ、下記式(1)で表されるXの値が0.70以下である。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
<Glass manufacturing method>
A method for producing glass according to this embodiment includes heating and melting glass raw materials in a melting furnace. The melting furnace includes electroformed bricks containing 85 mass% or more of Al2O3 , expressed as mass percentages based on oxides. The glass contains, expressed as mole percentages based on oxides, 60.0 to 75.0% SiO2 , 2.0 to 20.0% Al2O3 , 20.0 to 30.0% Li2O , 0.0 to 10.0% MgO, 0.0 to 10.0% CaO, 2.00 to 10.00% ZrO2 , and 0.50 to 5.00% P2O5 , and is substantially free of Y2O3 . The value of X , as expressed by the following formula (1), is 0.70 or less:
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.

 本態様のガラスの製造方法に用いる溶融炉は、酸化物基準の質量百分率表示でAlを85質量%以上含有する電鋳レンガである高アルミナレンガを含む。より詳細には、上記溶融炉を構成する炉材の少なくとも一部が、上記高アルミナレンガを含む。上記高アルミナレンガを含む炉材は、溶融炉の中で、加熱溶融されたガラス原料と接する領域に少なくとも配置されていることが好ましく、加熱溶融されて粘度が103.5dPa・sとなるガラス原料と接する領域において少なくとも配置されていることがより好ましい。溶融炉の炉材が高アルミナレンガを含む場合であっても、特定の組成を有する本態様のガラスを製造する場合、ガラス原料の溶融の際にレンガが浸食されることを抑制し得る。 The melting furnace used in the method for producing glass of this embodiment contains high-alumina bricks, which are electroformed bricks containing 85 mass% or more of Al2O3 expressed as a mass percentage based on oxides. More specifically, at least a portion of the furnace materials constituting the melting furnace contain the high-alumina bricks. The furnace materials containing the high-alumina bricks are preferably arranged at least in a region of the melting furnace that comes into contact with the heated and molten glass frit, more preferably in a region that comes into contact with the heated and molten glass frit having a viscosity of 103.5 dPa·s. Even when the furnace materials of the melting furnace contain high-alumina bricks, when producing glass of this embodiment having a specific composition, erosion of the bricks during melting of the glass frit can be suppressed.

 上記溶融炉はさらに、酸化物基準の質量百分率表示でZrOを80質量%以上含有する電鋳レンガである高ジルコニアレンガを含むことが好ましい。より詳細には、上記溶融炉を構成する炉材の少なくとも一部が、上記高ジルコニアレンガを含むことが好ましい。上記高ジルコニアレンガを含む炉材は、溶融炉の中で、加熱溶融されたガラス原料と接する領域に少なくとも配置されていることがより好ましく、加熱溶融されて粘度が10dPa・sとなるガラス原料と接する領域において少なくとも配置されていることがさらに好ましい。溶融炉の炉材が高ジルコニアレンガを含む場合であっても、特定の組成を有する本態様のガラスを製造する場合、ガラス原料の溶融の際にレンガが浸食されることを抑制し得る。 The melting furnace preferably further includes high-zirconia bricks, which are electrocast bricks containing 80% by mass or more of ZrO2 expressed as a mass percentage based on oxides. More specifically, at least a portion of the furnace materials constituting the melting furnace preferably include the high-zirconia bricks. The furnace materials including the high-zirconia bricks are more preferably arranged in at least a region of the melting furnace that comes into contact with the heated and melted glass frit, and even more preferably in at least a region that comes into contact with the heated and melted glass frit having a viscosity of 10 2 dPa s. Even when the furnace materials of the melting furnace include high-zirconia bricks, erosion of the bricks during melting of the glass frit can be suppressed when producing the glass of this embodiment having a specific composition.

 本態様のガラスの製造方法においては、上記の所定の組成のガラスが得られるようにガラス原料を調合し、ガラス溶融炉内で加熱溶融する。本態様のガラスの製造方法によって得られるガラスの組成の好ましい態様は、本態様のガラスについて上述したものと同様である。 In the method for producing glass of this embodiment, glass raw materials are mixed so as to obtain glass of the specified composition described above, and then heated and melted in a glass melting furnace. The preferred composition of the glass obtained by the method for producing glass of this embodiment is the same as that described above for the glass of this embodiment.

 本態様のガラスの製造方法においては、得られるガラスのZrO含有量(単位:酸化物基準のモル百分率表示のモル%)と、上記溶融炉に含まれる電鋳レンガのAl含有量(単位:酸化物基準のモル百分率表示のモル%)を用いて、下記式(2)で表されるYの値が0.02~0.10であることが好ましい。ここでいう電鋳レンガとは、上記溶融炉を構成する炉材の少なくとも一部に含まれ、溶融炉の中で、加熱溶融されたガラス原料と接する領域に少なくとも配置されている、酸化物基準の質量百分率表示でAlを85質量%以上含有する電鋳レンガを指す。そのような電鋳レンガとして、Alの含有量が異なる複数の電鋳レンガが含まれる場合、当該複数の電鋳レンガのうち少なくとも一部において、Yの値が0.02~0.10であることが好ましく、全てにおいて、Yの値が0.02~0.10であることがより好ましい。
 Y=(ガラスのZrO含有量)/(電鋳レンガのAl含有量)  式(2)
In the glass manufacturing method of this embodiment, the value of Y, expressed by the following formula (2 ) using the ZrO2 content (unit: mol % expressed as a molar percentage based on the oxide) of the obtained glass and the Al2O3 content (unit: mol % expressed as a molar percentage based on the oxide) of the electroformed bricks contained in the melting furnace, is preferably 0.02 to 0.10. The electroformed bricks referred to here refer to electroformed bricks that are contained in at least a portion of the furnace materials constituting the melting furnace and are arranged at least in a region in the melting furnace that contacts the heated and molten glass raw material, and contain 85 mass % or more of Al2O3 expressed as a mass percentage based on the oxide. When such electroformed bricks include multiple electroformed bricks with different Al2O3 contents, it is preferable that the value of Y be 0.02 to 0.10 for at least some of the multiple electroformed bricks, and more preferably the value of Y be 0.02 to 0.10 for all of the electroformed bricks.
Y = ( ZrO2 content of glass) / ( Al2O3 content of electroformed brick) Formula (2)

 上記Yの値が0.02~0.10であると、本態様のガラスの製造方法における、レンガ浸食の抑制効果がより好適に得られる。上記Yの値は0.03以上がより好ましく、0.04以上がさらに好ましい。上記Yの値は0.09以下がより好ましく、0.08以下がさらに好ましい。 When the value of Y is 0.02 to 0.10, the brick erosion suppression effect in the glass manufacturing method of this embodiment is more preferably achieved. The value of Y is more preferably 0.03 or more, and even more preferably 0.04 or more. The value of Y is more preferably 0.09 or less, and even more preferably 0.08 or less.

 上記以外の製造工程や条件については、従来公知のものを用いればよい。例えば、上記のようにガラス原料を溶融炉内で加熱溶融した後、バブリング、撹拌、清澄剤の添加等により溶融ガラスを均質化し、ガラス板等の所望の形状に成形し、徐冷すればよい。または、溶融ガラスをブロック状に成形して、徐冷した後に切断する方法で板状に成形してもよい。 Other manufacturing processes and conditions may be those known in the art. For example, after the glass raw materials are heated and melted in a melting furnace as described above, the molten glass may be homogenized by bubbling, stirring, adding a fining agent, etc., formed into the desired shape such as a glass plate, and slowly cooled. Alternatively, the molten glass may be formed into a block, slowly cooled, and then cut into a plate.

 ガラスの成形法としては、例えば、フロート法、プレス法、フュージョン法およびダウンドロー法が挙げられる。特に、大型のガラス板を製造する場合は、フロート法が好ましい。また、フロート法以外の連続成形法、例えば、フュージョン法およびダウンドロー法も好ましい。 Glass forming methods include, for example, the float method, press method, fusion method, and downdraw method. The float method is particularly preferred when producing large glass sheets. Continuous forming methods other than the float method, such as the fusion method and downdraw method, are also preferred.

 その後、成形したガラスを必要に応じて研削および研磨処理に供する。なお、得られたガラスに後述する化学強化処理を施して、化学強化ガラスを得てもよい。その場合、化学強化処理を施す前に、ガラスを所定の形状およびサイズに切断したり、ガラスの面取り加工を行ったりすることが好ましい。その後の化学強化処理によって端面にも圧縮応力層が形成されるためである。 The molded glass is then subjected to grinding and polishing processes as necessary. The resulting glass may also be subjected to the chemical strengthening process described below to obtain chemically strengthened glass. In this case, it is preferable to cut the glass to a specified shape and size or to chamfer the glass before carrying out the chemical strengthening process. This is because the subsequent chemical strengthening process will form a compressive stress layer on the edge as well.

 〈結晶化ガラスの製造方法〉
 本態様のガラスが結晶化ガラスである場合は、上記の手順で得られた非晶質ガラスを加熱処理することで結晶化ガラスが得られる。
<Method for producing crystallized glass>
When the glass of this embodiment is crystallized glass, the amorphous glass obtained by the above procedure is subjected to a heat treatment to obtain crystallized glass.

 加熱処理は、室温から第一の処理温度まで昇温して一定時間保持した後、第一の処理温度より高温である第二の処理温度に一定時間保持する2段階の加熱処理によることが好ましい。 The heat treatment is preferably a two-stage heat treatment in which the temperature is raised from room temperature to a first treatment temperature and maintained for a certain period of time, and then the temperature is maintained at a second treatment temperature that is higher than the first treatment temperature for a certain period of time.

 2段階の加熱処理による場合、第一の処理温度は、そのガラス組成において結晶核生成速度が大きくなる温度域が好ましく、第二の処理温度は、そのガラス組成において結晶成長速度が大きくなる温度域が好ましい。また、第一の処理温度での保持時間は、充分な数の結晶核が生成するように一定程度長いことが好ましい。多数の結晶核が生成することで、各結晶の大きさが小さくなり、透明性の高い結晶化ガラスが得られる。 When using a two-stage heat treatment, the first treatment temperature is preferably in a temperature range where the crystal nucleation rate is high for that glass composition, and the second treatment temperature is preferably in a temperature range where the crystal growth rate is high for that glass composition. Furthermore, it is preferable that the holding time at the first treatment temperature be long enough to generate a sufficient number of crystal nuclei. By generating a large number of crystal nuclei, the size of each crystal becomes small, resulting in highly transparent crystallized glass.

 第一の処理温度は、例えば450℃~700℃であり、第二の処理温度は、例えば600℃~800℃であり、第一処理温度での保持時間は、例えば1時間~6時間であり、第二処理温度での保持時間は、例えば1時間~6時間である。 The first treatment temperature is, for example, 450°C to 700°C, the second treatment temperature is, for example, 600°C to 800°C, the holding time at the first treatment temperature is, for example, 1 hour to 6 hours, and the holding time at the second treatment temperature is, for example, 1 hour to 6 hours.

 《化学強化ガラスの製造方法》
 本態様の化学強化ガラスは、上記の非晶質ガラスまたは結晶化ガラスを化学強化処理して製造する。すなわち、本態様の化学強化ガラスの製造方法は、本態様のガラスまたは結晶化ガラスを化学強化することを含む。
<<Method for manufacturing chemically strengthened glass>>
The chemically strengthened glass of this embodiment is produced by chemically strengthening the amorphous glass or crystallized glass described above. That is, the method for producing the chemically strengthened glass of this embodiment includes chemically strengthening the glass or crystallized glass of this embodiment.

 本態様の化学強化ガラスの製造方法における化学強化は、ナトリウムを含有し、かつカリウム含有量が5質量%未満である溶融塩組成物を用いた化学強化であることが好ましい。本態様の化学強化ガラスの製造方法において、化学強化処理は2段階以上行ってもよいが、生産性を高めるためには1段階の強化が好ましい。 In the method for producing chemically strengthened glass of this embodiment, the chemical strengthening is preferably performed using a molten salt composition containing sodium and less than 5% by mass of potassium. In the method for producing chemically strengthened glass of this embodiment, the chemical strengthening treatment may be performed in two or more stages, but one-stage strengthening is preferred to increase productivity.

 化学強化処理は、例えば、360~600℃に加熱された硝酸ナトリウム等の溶融塩組成物中に、ガラスを0.1~500時間浸漬することによって行う。なお、溶融塩組成物の加熱温度としては、375~500℃がより好ましく、また、溶融塩組成物中へのガラスの浸漬時間は、0.3~200時間がより好ましい。 Chemical strengthening is performed, for example, by immersing the glass in a molten salt composition such as sodium nitrate heated to 360 to 600°C for 0.1 to 500 hours. The heating temperature for the molten salt composition is preferably 375 to 500°C, and the immersion time for the glass in the molten salt composition is preferably 0.3 to 200 hours.

 本態様の化学強化ガラスの製造方法に用いる溶融塩組成物は、ナトリウムを含有し、かつカリウム含有量が硝酸カリウム換算で5質量%未満の溶融塩組成物であることが好ましい。上記カリウム含有量は硝酸カリウム換算で2質量%未満がより好ましく、溶融塩組成物はカリウムを実質的に含有しないことがさらに好ましい。「カリウムを実質的に含有しない」とは、カリウムを全く含まないこと、またはカリウムを製造上不可避的に混入した不純物として含んでいてもよいことを意味する。 The molten salt composition used in this embodiment of the method for producing chemically strengthened glass preferably contains sodium and has a potassium content of less than 5 mass% calculated as potassium nitrate. The potassium content is more preferably less than 2 mass% calculated as potassium nitrate, and it is even more preferable that the molten salt composition contains substantially no potassium. "Substantially no potassium" means that the composition does not contain any potassium, or that it may contain potassium as an impurity that is unavoidably mixed in during production.

 溶融塩組成物に含まれる強化塩としては、例えば、硝酸塩、硫酸塩、炭酸塩、塩化物などが挙げられる。このうち硝酸塩としては、例えば、硝酸リチウム、硝酸ナトリウムなどが挙げられる。硫酸塩としては、例えば、硫酸リチウム、硫酸ナトリウムなどが挙げられる。炭酸塩としては、例えば、炭酸リチウム、炭酸ナトリウムなどが挙げられる。塩化物としては、例えば、塩化リチウム、塩化ナトリウム、塩化セシウム、塩化銀などが挙げられる。これらの強化塩は、単独で用いてもよいし、複数種を組み合わせて用いてもよい。 Examples of the reinforcing salts contained in the molten salt composition include nitrates, sulfates, carbonates, and chlorides. Nitrates include, for example, lithium nitrate and sodium nitrate. Sulfates include, for example, lithium sulfate and sodium sulfate. Carbonates include, for example, lithium carbonate and sodium carbonate. Chlorides include, for example, lithium chloride, sodium chloride, cesium chloride, and silver chloride. These reinforcing salts may be used alone or in combination.

 化学強化処理の処理条件は、ガラスの組成(特性)や強化塩の種類、および所望の化学強化特性などを考慮して、適切な条件を選択すればよい。 Appropriate conditions for chemical strengthening should be selected taking into consideration the glass composition (characteristics), the type of strengthening salt, and the desired chemical strengthening characteristics.

 《表示装置、電子デバイス製品、太陽電池モジュール》
 本態様の表示装置は、本態様のガラスまたは化学強化ガラスと、ディスプレイとを有する。かかる表示装置は、例えば携帯電話、スマートフォンおよびタブレット端末等の電子機器や、自動車等の輸送体に設置されるカーナビゲーションなどの電子機器などに用いられてもよい。
<Display devices, electronic device products, solar cell modules>
The display device of this embodiment includes the glass or chemically strengthened glass of this embodiment and a display. Such a display device may be used in electronic devices such as mobile phones, smartphones, and tablet terminals, as well as electronic devices such as car navigation systems installed in vehicles such as automobiles.

 本態様の電子デバイス製品は、本態様のガラスまたは化学強化ガラスを構成部材の一部として有する。かかる電子デバイス製品は、例えば携帯電話、スマートフォンおよびタブレット端末等の電子機器や、自動車等の輸送体に設置されるカーナビゲーションなどの電子機器などであってもよい。 The electronic device product of this embodiment has the glass or chemically strengthened glass of this embodiment as part of its constituent parts. Such electronic device products may be, for example, electronic devices such as mobile phones, smartphones, and tablet terminals, or electronic devices such as car navigation systems installed in vehicles such as automobiles.

 本態様の太陽電池モジュールは、本態様のガラスまたは化学強化ガラスを有する。上記ガラスまたは化学強化ガラスは、例えば太陽電池モジュールの受光面の透明カバー部材等として用いることができる。 The solar cell module of this embodiment includes the glass or chemically strengthened glass of this embodiment. The glass or chemically strengthened glass can be used, for example, as a transparent cover member for the light-receiving surface of the solar cell module.

 以上のとおり、本明細書には次の構成が開示されている。
〈1〉酸化物基準のモル百分率表示で、
 SiOを60.0~75.0%、
 Alを2.0~20.0%、
 LiOを20.0~30.0%、
 MgOを0.0~10.0%、
 CaOを0.0~10.0%、
 ZrOを2.00~10.00%および
 Pを0.50~5.00%含有し、
 Yを実質的に含有せず、かつ、
 下記式(1)で表されるXの値が0.70以下である、ガラス。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
〈2〉酸化物基準のモル百分率表示で、
 前記ZrOを3.00~10.00%含有し、
 TiOを0.00~0.10%含有する、〈1〉に記載のガラス。
〈3〉酸化物基準のモル百分率表示で、ZrOとPとTiOの合計含有量が3.00%以上である、〈1〉または〈2〉に記載のガラス。
〈4〉結晶化ガラスであって、
 LiSi(リチウムダイシリケート)、LiAlSi(β-スポジュメン)、LiAlSi10(ペタライト)、LiPO(リン酸リチウム)およびβ-石英固溶体からなる群より選択される少なくとも1種の結晶を含む、〈1〉~〈3〉のいずれか1に記載のガラス。
〈5〉フィンガーテスト法により下記条件にて測定される、酸化物基準の質量百分率表示でAlを85質量%以上含有する電鋳レンガの浸食量が、0.090mm/日以下である、〈1〉~〈4〉のいずれか1に記載のガラス。
(条件)坩堝内で、ガラスの粘度が10dPa・sとなる温度T2に加熱し溶融したガラスを、次いでガラスの粘度が103.5dPa・sとなる温度T3.5まで冷却する。得られたガラスに、電鋳レンガの試験片を浸漬させ、T3.5で48時間保持する。その後、ガラスを20℃以下まで冷却する。試験片を周囲のガラスごと坩堝からくり抜き、ガラスと試験片との接触面と垂直な面で試験片を切断して、横軸研削し、鏡面研磨する。得られた断面について、投影機を用いて試験片の最大浸食量を測定する。
〈6〉フィンガーテスト法により下記条件にて測定される、酸化物基準の質量百分率表示でZrOを80質量%以上含有する電鋳レンガの浸食量が、0.20mm/日以下である、〈1〉~〈5〉のいずれか1に記載のガラス。
(条件)坩堝内で、ガラスの粘度が10dPa・sとなる温度T2に加熱し溶融したガラスに、電鋳レンガの試験片を浸漬させ、T2で48時間保持する。その後、ガラスを20℃以下まで冷却する。試験片を周囲のガラスごと坩堝からくり抜き、ガラスと試験片との接触面と垂直な面で試験片を切断して、横軸研削し、鏡面研磨する。得られた断面について、投影機を用いて試験片の最大浸食量を測定する。
〈7〉厚さ方向中心部の組成が、酸化物基準のモル百分率表示で、
 SiOを60.0~75.0%、
 Alを2.0~20.0%、
 LiOを20.0~30.0%、
 MgOを0.0~10.0%、
 CaOを0.0~10.0%、
 ZrOを2.00~10.00%および
 Pを0.50~5.00%含有し、
 Yを実質的に含有せず、かつ、
 下記式(1)で表されるXの値が0.70以下である、化学強化ガラス。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、厚さ方向中心部における、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
〈8〉前記厚さ方向中心部の組成は、酸化物基準のモル百分率表示で、
 前記ZrOを3.00~10.00%含有し、
 TiOを0.00~0.10%含有する、〈7〉に記載の化学強化ガラス。
〈9〉厚さがt(単位:μm)であって、圧縮応力層深さ(DOC)が0.15t以上であり、
 ガラス表面からの深さ50μmにおける圧縮応力値(CS50)が30MPa以上であり、
 ガラス表面からの深さ100μmにおける圧縮応力値(CS100)が-10MPa以上である、〈7〉または〈8〉に記載の化学強化ガラス。
〈10〉ガラスの製造方法であって、
 ガラス原料を溶融炉内で加熱溶融することを含み、
 前記溶融炉は、酸化物基準の質量百分率表示でAlを85質量%以上含有する電鋳レンガを含み、
 前記ガラスは、酸化物基準のモル百分率表示で、
 SiOを60.0~75.0%、
 Alを2.0~20.0%、
 LiOを20.0~30.0%、
 MgOを0.0~10.0%、
 CaOを0.0~10.0%、
 ZrOを2.00~10.00%および
 Pを0.50~5.00%含有し、
 Yを実質的に含有せず、かつ、
 下記式(1)で表されるXの値が0.70以下である、ガラスの製造方法。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
〈11〉前記ガラスは、酸化物基準のモル百分率表示で、
 前記ZrOを3.00~10.00%含有し、
 TiOを0.00~0.10%含有する、〈10〉に記載のガラスの製造方法。
〈12〉前記ガラスのZrO含有量(単位:酸化物基準のモル百分率表示のモル%)と、前記電鋳レンガのAl含有量(単位:酸化物基準のモル百分率表示のモル%)を用いて、下記式(2)で表されるYの値が0.02~0.10である、〈10〉または〈11〉に記載のガラスの製造方法。
 Y=(ガラスのZrO含有量)/(電鋳レンガのAl含有量)  式(2)
〈13〉前記溶融炉はさらに、酸化物基準の質量百分率表示でZrOを80質量%以上含有する電鋳レンガを含む、〈10〉~〈12〉のいずれか1に記載のガラスの製造方法。
〈14〉〈1〉~〈6〉のいずれか1に記載のガラスを化学強化することを含む、化学強化ガラスの製造方法。
〈15〉前記化学強化は、ナトリウムを含有し、かつカリウム含有量が5質量%未満である溶融塩組成物を用いた化学強化である、〈14〉に記載の化学強化ガラスの製造方法。
〈16〉〈1〉~〈6〉のいずれか1に記載のガラスまたは〈7〉~〈9〉のいずれか1に記載の化学強化ガラスと、ディスプレイとを有する、表示装置。
〈17〉〈1〉~〈6〉のいずれか1に記載のガラスまたは〈7〉~〈9〉のいずれか1に記載の化学強化ガラスを構成部材の一部として有する、電子デバイス製品。
〈18〉〈1〉~〈6〉のいずれか1に記載のガラスまたは〈7〉~〈9〉のいずれか1に記載の化学強化ガラスを有する、太陽電池モジュール。
As described above, the present specification discloses the following configurations.
<1> Molar percentage based on oxides,
SiO2 60.0 to 75.0%,
2.0 to 20.0% Al 2 O 3 ,
20.0 to 30.0% Li 2 O,
MgO 0.0 to 10.0%,
CaO 0.0 to 10.0%,
Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ;
Substantially does not contain Y 2 O 3 , and
A glass in which the value of X represented by the following formula (1) is 0.70 or less.
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.
<2> Molar percentage based on oxides,
The ZrO2 is contained in an amount of 3.00 to 10.00%;
The glass according to <1>, containing 0.00 to 0.10% of TiO 2 .
<3> The glass according to <1> or <2> , wherein the total content of ZrO2 , P2O5 , and TiO2 is 3.00% or more, expressed in mole percentage based on oxides.
<4> Crystallized glass,
The glass according to any one of <1> to <3>, comprising at least one crystal selected from the group consisting of Li 2 Si 2 O 5 (lithium disilicate), LiAlSi 2 O 6 (β-spodumene), LiAlSi 4 O 10 (petalite), Li 3 PO 4 (lithium phosphate), and β-quartz solid solution.
<5> The glass according to any one of <1> to <4>, wherein the amount of corrosion of an electroformed brick containing 85 mass% or more of Al 2 O 3 expressed as a mass percentage based on oxides, as measured by a finger test method under the following conditions, is 0.090 mm/day or less.
(Conditions) The glass is heated to a temperature T2 in a crucible, at which the viscosity of the glass becomes 10 2 dPa·s, and then cooled to a temperature T3.5, at which the viscosity of the glass becomes 10 3.5 dPa·s. A test piece of electroformed brick is immersed in the resulting glass and held at T3.5 for 48 hours. The glass is then cooled to 20°C or below. The test piece is removed from the crucible along with the surrounding glass, and the test piece is cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished. The maximum erosion amount of the test piece is measured for the resulting cross section using a projector.
<6> The glass according to any one of <1> to <5>, wherein the amount of corrosion of an electroformed brick containing 80 mass% or more of ZrO2 , expressed as a mass percentage based on oxides, measured by a finger test method under the following conditions is 0.20 mm/day or less.
(Conditions) A test piece of electroformed brick was immersed in molten glass heated to a temperature T2 in a crucible, at which the viscosity of the glass reached 10 2 dPa s, and held at T2 for 48 hours. The glass was then cooled to 20°C or below. The test piece was then removed from the crucible along with the surrounding glass, cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished. The maximum erosion of the test piece was measured for the resulting cross section using a projector.
<7> The composition of the center portion in the thickness direction is expressed in mole percentage based on oxides,
SiO2 60.0 to 75.0%,
2.0 to 20.0% Al 2 O 3 ,
20.0 to 30.0% Li 2 O,
MgO 0.0 to 10.0%,
CaO 0.0 to 10.0%,
Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ;
Substantially does not contain Y 2 O 3 , and
Chemically strengthened glass, wherein the value of X represented by the following formula (1) is 0.70 or less.
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis at the center in the thickness direction.
<8> The composition of the center portion in the thickness direction is expressed in mole percentage based on oxides,
The ZrO2 is contained in an amount of 3.00 to 10.00%;
The chemically strengthened glass according to <7>, containing 0.00 to 0.10% of TiO 2 .
<9> The thickness is t (unit: μm), and the depth of compressive stress layer (DOC) is 0.15t or more;
The compressive stress value (CS 50 ) at a depth of 50 μm from the glass surface is 30 MPa or more,
<7> or <8>, wherein the chemically strengthened glass has a compressive stress value (CS 100 ) of −10 MPa or more at a depth of 100 μm from the glass surface.
<10> A method for producing glass,
The method comprises heating and melting glass raw materials in a melting furnace,
The melting furnace includes electroformed bricks containing 85 mass% or more of Al 2 O 3 expressed as a mass percentage based on oxides,
The glass has, in mole percentage on an oxide basis,
SiO2 60.0 to 75.0%,
2.0 to 20.0% Al 2 O 3 ,
20.0 to 30.0% Li 2 O,
MgO 0.0 to 10.0%,
CaO 0.0 to 10.0%,
Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ;
Substantially does not contain Y 2 O 3 , and
A method for producing glass, wherein the value of X represented by the following formula (1) is 0.70 or less:
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.
<11> The glass contains, in terms of mole percentage based on oxides,
The ZrO2 is contained in an amount of 3.00 to 10.00%;
The method for producing glass according to <10>, wherein the glass contains 0.00 to 0.10% of TiO 2 .
<12> The method for producing glass according to <10> or <11>, wherein the value of Y, expressed by the following formula (2) using the ZrO2 content (unit: mol % expressed as a molar percentage based on oxides) of the glass and the Al2O3 content (unit: mol % expressed as a molar percentage based on oxides) of the electroformed brick, is 0.02 to 0.10:
Y = ( ZrO2 content of glass) / ( Al2O3 content of electroformed brick) Formula (2)
<13> The method for producing glass according to any one of <10> to <12>, wherein the melting furnace further includes electroformed bricks containing 80 mass% or more of ZrO2 expressed as a mass percentage based on oxides.
<14> A method for producing chemically strengthened glass, comprising chemically strengthening the glass according to any one of <1> to <6>.
<15> The method for producing chemically strengthened glass according to <14>, wherein the chemical strengthening is chemical strengthening using a molten salt composition containing sodium and having a potassium content of less than 5 mass%.
<16> A display device comprising the glass according to any one of <1> to <6> or the chemically strengthened glass according to any one of <7> to <9> and a display.
<17> An electronic device product having the glass according to any one of <1> to <6> or the chemically strengthened glass according to any one of <7> to <9> as a part of a component.
<18> A solar cell module having the glass according to any one of <1> to <6> or the chemically strengthened glass according to any one of <7> to <9>.

 以下、実施例を示して本発明を詳細に説明する。ただし、本発明は以下の記載によっては限定されない。例1~例6が実施例であり、例7~例12が比較例である。 The present invention will be described in detail below using examples. However, the present invention is not limited to the following descriptions. Examples 1 to 6 are working examples, and Examples 7 to 12 are comparative examples.

 [ガラスの作製およびレンガ浸食量測定]
 ガラスの作製およびフィンガーテスト法によるレンガの浸食量測定を行った。表1に酸化物基準のモル百分率表示で記載したガラス組成となるように、ガラス原料を調合して190mlのカレットとし、300mlの白金坩堝に投入した。ガラス原料を、ガラスの粘度が10dPa・sとなる温度T2まで、300℃/時間の速度で昇温し、6時間保持して溶融した。次いで溶融ガラスを、ガラスの粘度が103.5dPa・sとなる温度T3.5まで冷却した。また、酸化物基準の質量百分率表示でAlを95質量%含有し、25mm×15mm×73mmのサイズを有する電鋳レンガ(AGCセラミック株式会社製「MB-G」)の試験片を用意した。上記T3.5の溶融ガラスに、上記試験片を、長辺の長さ(73mm)の65%以上浸漬させ、T3.5で48時間保持した。その後、ガラスを300℃/時間の速度で20℃まで降温した。試験片を周囲のガラスごと坩堝からくり抜き、ガラスと試験片との接触面と垂直な面で試験片を切断して、横軸研削し、鏡面研磨した。得られた断面について、投影機(Nikon社製「V12BDC」)を用いて試験片の最大浸食量を測定した。測定結果を表1に「高アルミナレンガ浸食量」として示す。
[Glass production and brick erosion measurement]
Glass was prepared and the amount of erosion of the brick was measured using the finger test method. Glass raw materials were mixed to obtain the glass composition shown in Table 1, expressed in terms of oxide-based molar percentage, to form 190 ml of cullet, which was then placed in a 300 ml platinum crucible. The glass raw materials were heated at a rate of 300°C/hour to a temperature T2 at which the viscosity of the glass reached 10 2 dPa·s and maintained at this temperature for 6 hours to melt the glass. The molten glass was then cooled to a temperature T3.5 at which the viscosity of the glass reached 10 3.5 dPa·s. Test pieces were also prepared: electroformed bricks ("MB-G" manufactured by AGC Ceramics Co., Ltd.) measuring 25 mm x 15 mm x 73 mm and containing 95% Al 2 O 3 by mass, expressed in terms of oxide-based mass percentage. The test specimen was immersed in the T3.5 molten glass by at least 65% of its long side (73 mm) and held at T3.5 for 48 hours. The glass was then cooled to 20°C at a rate of 300°C/hour. The test specimen, along with the surrounding glass, was removed from the crucible, cut along a plane perpendicular to the contact surface between the glass and the test specimen, horizontally ground, and mirror-polished. The maximum erosion depth of the resulting cross section was measured using a projector (Nikon V12BDC). The measurement results are shown in Table 1 as "High-alumina brick erosion depth."

 さらに、試験片として酸化物基準の質量百分率表示でZrOを94.5質量%含有する電鋳レンガ(AGCセラミック株式会社製「ZB-X9510」)を用いたことと、溶融ガラスをT3.5まで冷却せず、T2の溶融ガラスに試験片を浸漬させてT2で48時間保持したこと以外は上記と同様にして、レンガの浸食量測定を行った。測定結果を表1に「高ジルコニアレンガ浸食量」として示す。 Furthermore, the erosion amount of the brick was measured in the same manner as above, except that the test specimen was an electroformed brick ("ZB-X9510" manufactured by AGC Ceramics Co., Ltd.) containing 94.5 mass% ZrO2 , expressed as a mass percentage based on the oxide, and the molten glass was not cooled to T3.5, but the test specimen was immersed in the molten glass at T2 and held at T2 for 48 hours. The measurement results are shown in Table 1 as "Erosion amount of high-zirconia brick."

 表1に記載したガラス組成から、式(1)で表されるXの値およびZrOとPとTiOの合計含有量を算出した。これらを表1にそれぞれ「Xの値」および「[ZrO]+[P]+[TiO]」として示す。 The value of X expressed by formula (1) and the total content of ZrO2 , P2O5 , and TiO2 were calculated from the glass compositions listed in Table 1. These are shown in Table 1 as "X value" and "[ ZrO2 ] + [ P2O5 ] + [ TiO2 ] , " respectively.

 また、例1~12のガラスのZrO含有量(単位:酸化物基準のモル百分率表示のモル%)と、上記レンガ浸食量測定に用いた電鋳レンガのAl含有量(単位:酸化物基準のモル百分率表示のモル%;93.03モル%)を用いて、下記式(3)で表されるY’の値を算出した。これを表1に「Y’の値」として示す。Y’の値は、上記レンガ浸食量測定で用いた電鋳レンガを、溶融炉の炉材の少なくとも一部に用いた場合の、上述の式(2)で表されるYの値に対応する。
 Y’=(ガラスのZrO含有量)/(電鋳レンガのAl含有量)  式(3)
Furthermore, the value of Y' represented by the following formula (3) was calculated using the ZrO2 content (unit: mol % expressed as a molar percentage based on oxides) of the glasses of Examples 1 to 12 and the Al2O3 content (unit: mol % expressed as a molar percentage based on oxides; 93.03 mol %) of the electroformed bricks used in the brick erosion amount measurements. This is shown as "Y'value" in Table 1. The Y' value corresponds to the value of Y represented by the above formula (2) when the electroformed bricks used in the brick erosion amount measurements are used as at least a part of the furnace material of a melting furnace.
Y' = ( ZrO2 content of glass) / ( Al2O3 content of electroformed brick) Formula (3)

 表1に示すように、本態様のガラスは、高アルミナレンガに対する浸食性が低いことがわかった。また、特に例1~3のガラスは、高ジルコニアレンガに対する浸食性も低いことがわかった。 As shown in Table 1, the glass of this embodiment was found to have low corrosion resistance against high-alumina bricks. Furthermore, the glasses of Examples 1 to 3 in particular were found to have low corrosion resistance against high-zirconia bricks.

 本発明を詳細にまた特定の実施態様を参照して説明したが、本発明の精神と範囲を逸脱することなく様々な変更や修正を加えることができることは当業者にとって明らかである。本出願は2024年6月7日出願の日本特許出願(特願2024-092882)、2025年1月14日出願の日本特許出願(特願2025-004715)及び2025年2月17日出願の日本特許出願(特願2025-023654)に基づくものであり、その内容はここに参照として取り込まれる。 Although the present invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the present invention. This application is based on Japanese patent applications filed on June 7, 2024 (Patent Application No. 2024-092882), January 14, 2025 (Patent Application No. 2025-004715), and February 17, 2025 (Patent Application No. 2025-023654), the contents of which are incorporated herein by reference.

 本態様に係るガラスはレンガ浸食性が低いため、レンガを含む炉材で構成された溶融炉で好適に製造できる。 The glass according to this embodiment has low brick corrosion resistance, so it can be suitably manufactured in a melting furnace constructed with furnace materials that include bricks.

Claims (18)

 酸化物基準のモル百分率表示で、
 SiOを60.0~75.0%、
 Alを2.0~20.0%、
 LiOを20.0~30.0%、
 MgOを0.0~10.0%、
 CaOを0.0~10.0%、
 ZrOを2.00~10.00%および
 Pを0.50~5.00%含有し、
 Yを実質的に含有せず、かつ、
 下記式(1)で表されるXの値が0.70以下である、ガラス。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
In mole percentage based on oxides,
SiO2 60.0 to 75.0%,
2.0 to 20.0% Al 2 O 3 ,
20.0 to 30.0% Li 2 O,
MgO 0.0 to 10.0%,
CaO 0.0 to 10.0%,
Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ;
Substantially does not contain Y 2 O 3 , and
A glass in which the value of X represented by the following formula (1) is 0.70 or less.
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.
 酸化物基準のモル百分率表示で、
 前記ZrOを3.00~10.00%含有し、
 TiOを0.00~0.10%含有する、請求項1に記載のガラス。
In mole percentage based on oxides,
The ZrO2 is contained in an amount of 3.00 to 10.00%;
2. The glass of claim 1, containing 0.00 to 0.10% TiO2 .
 酸化物基準のモル百分率表示で、ZrOとPとTiOの合計含有量が3.00%以上である、請求項1または2に記載のガラス。 3. The glass according to claim 1, wherein the total content of ZrO2 , P2O5 , and TiO2 is 3.00% or more, expressed in mole percentage on an oxide basis.  結晶化ガラスであって、
 LiSi(リチウムダイシリケート)、LiAlSi(β-スポジュメン)、LiAlSi10(ペタライト)、LiPO(リン酸リチウム)およびβ-石英固溶体からなる群より選択される少なくとも1種の結晶を含む、請求項1または2に記載のガラス。
A crystallized glass,
3. The glass according to claim 1, comprising at least one crystal selected from the group consisting of Li 2 Si 2 O 5 (lithium disilicate), LiAlSi 2 O 6 (β-spodumene), LiAlSi 4 O 10 (petalite), Li 3 PO 4 (lithium phosphate), and β-quartz solid solution.
 フィンガーテスト法により下記条件にて測定される、酸化物基準の質量百分率表示でAlを85質量%以上含有する電鋳レンガの浸食量が、0.090mm/日以下である、請求項1または2に記載のガラス。
(条件)坩堝内で、ガラスの粘度が10dPa・sとなる温度T2に加熱し溶融したガラスを、次いでガラスの粘度が103.5dPa・sとなる温度T3.5まで冷却する。得られたガラスに、電鋳レンガの試験片を浸漬させ、T3.5で48時間保持する。その後、ガラスを20℃以下まで冷却する。試験片を周囲のガラスごと坩堝からくり抜き、ガラスと試験片との接触面と垂直な面で試験片を切断して、横軸研削し、鏡面研磨する。得られた断面について、投影機を用いて試験片の最大浸食量を測定する。
3. The glass according to claim 1, wherein the amount of corrosion of an electroformed brick containing 85 mass % or more of Al 2 O 3 expressed as a mass percentage based on oxides, as measured by a finger test method under the following conditions, is 0.090 mm/day or less.
(Conditions) The glass is heated to a temperature T2 in a crucible, at which the viscosity of the glass becomes 10 2 dPa·s, and then cooled to a temperature T3.5, at which the viscosity of the glass becomes 10 3.5 dPa·s. A test piece of electroformed brick is immersed in the resulting glass and held at T3.5 for 48 hours. The glass is then cooled to 20°C or below. The test piece is removed from the crucible along with the surrounding glass, and the test piece is cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished. The maximum erosion amount of the test piece is measured for the resulting cross section using a projector.
 フィンガーテスト法により下記条件にて測定される、酸化物基準の質量百分率表示でZrOを80質量%以上含有する電鋳レンガの浸食量が、0.20mm/日以下である、請求項5に記載のガラス。
(条件)坩堝内で、ガラスの粘度が10dPa・sとなる温度T2に加熱し溶融したガラスに、電鋳レンガの試験片を浸漬させ、T2で48時間保持する。その後、ガラスを20℃以下まで冷却する。試験片を周囲のガラスごと坩堝からくり抜き、ガラスと試験片との接触面と垂直な面で試験片を切断して、横軸研削し、鏡面研磨する。得られた断面について、投影機を用いて試験片の最大浸食量を測定する。
The glass according to claim 5, wherein the amount of corrosion of an electroformed brick containing 80 mass % or more of ZrO 2 expressed as a mass percentage based on oxides, as measured by a finger test method under the following conditions, is 0.20 mm/day or less.
(Conditions) A test piece of electroformed brick was immersed in molten glass heated to a temperature T2 in a crucible, at which the viscosity of the glass reached 10 2 dPa s, and held at T2 for 48 hours. The glass was then cooled to 20°C or below. The test piece was then removed from the crucible along with the surrounding glass, cut on a plane perpendicular to the contact surface between the glass and the test piece, horizontally ground, and mirror-polished. The maximum erosion of the test piece was measured for the resulting cross section using a projector.
 厚さ方向中心部の組成が、酸化物基準のモル百分率表示で、
 SiOを60.0~75.0%、
 Alを2.0~20.0%、
 LiOを20.0~30.0%、
 MgOを0.0~10.0%、
 CaOを0.0~10.0%、
 ZrOを2.00~10.00%および
 Pを0.50~5.00%含有し、
 Yを実質的に含有せず、かつ、
 下記式(1)で表されるXの値が0.70以下である、化学強化ガラス。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、厚さ方向中心部における、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
The composition of the center in the thickness direction is expressed as mole percentage based on oxides,
SiO2 60.0 to 75.0%,
2.0 to 20.0% Al 2 O 3 ,
20.0 to 30.0% Li 2 O,
MgO 0.0 to 10.0%,
CaO 0.0 to 10.0%,
Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ;
Substantially does not contain Y 2 O 3 , and
Chemically strengthened glass, wherein the value of X represented by the following formula (1) is 0.70 or less.
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis at the center in the thickness direction.
 前記厚さ方向中心部の組成は、酸化物基準のモル百分率表示で、
 前記ZrOを3.00~10.00%含有し、
 TiOを0.00~0.10%含有する、請求項7に記載の化学強化ガラス。
The composition of the center portion in the thickness direction is expressed in mole percentage based on oxides:
The ZrO2 is contained in an amount of 3.00 to 10.00%;
The chemically strengthened glass according to claim 7, containing 0.00 to 0.10% of TiO2 .
 厚さがt(単位:μm)であって、圧縮応力層深さ(DOC)が0.15t以上であり、
 ガラス表面からの深さ50μmにおける圧縮応力値(CS50)が30MPa以上であり、
 ガラス表面からの深さ100μmにおける圧縮応力値(CS100)が-10MPa以上である、請求項7または8に記載の化学強化ガラス。
The thickness is t (unit: μm), and the depth of compressive stress layer (DOC) is 0.15t or more;
The compressive stress value (CS 50 ) at a depth of 50 μm from the glass surface is 30 MPa or more,
The chemically strengthened glass according to claim 7 or 8, wherein the compressive stress value (CS 100 ) at a depth of 100 μm from the glass surface is −10 MPa or more.
 ガラスの製造方法であって、
 ガラス原料を溶融炉内で加熱溶融することを含み、
 前記溶融炉は、酸化物基準の質量百分率表示でAlを85質量%以上含有する電鋳レンガを含み、
 前記ガラスは、酸化物基準のモル百分率表示で、
 SiOを60.0~75.0%、
 Alを2.0~20.0%、
 LiOを20.0~30.0%、
 MgOを0.0~10.0%、
 CaOを0.0~10.0%、
 ZrOを2.00~10.00%および
 Pを0.50~5.00%含有し、
 Yを実質的に含有せず、かつ、
 下記式(1)で表されるXの値が0.70以下である、ガラスの製造方法。
 X=([TiO]+[P])/[ZrO]  式(1)
 ここで[]は、該括弧内の各成分の酸化物基準のモル百分率表示の含有量を意味する。
A method for producing glass, comprising:
The method comprises heating and melting glass raw materials in a melting furnace,
The melting furnace includes electroformed bricks containing 85 mass% or more of Al 2 O 3 expressed as a mass percentage based on oxides,
The glass has, in mole percentage on an oxide basis,
SiO2 60.0 to 75.0%,
2.0 to 20.0% Al 2 O 3 ,
20.0 to 30.0% Li 2 O,
MgO 0.0 to 10.0%,
CaO 0.0 to 10.0%,
Contains 2.00 to 10.00% ZrO2 and 0.50 to 5.00% P2O5 ;
Substantially does not contain Y 2 O 3 , and
A method for producing glass, wherein the value of X represented by the following formula (1) is 0.70 or less:
X=([TiO 2 ]+[P 2 O 5 ])/[ZrO 2 ] Formula (1)
Here, [ ] means the content of each component in the brackets expressed as mole percentage on an oxide basis.
 前記ガラスは、酸化物基準のモル百分率表示で、
 前記ZrOを3.00~10.00%含有し、
 TiOを0.00~0.10%含有する、請求項10に記載のガラスの製造方法。
The glass has, in mole percentage on an oxide basis,
The ZrO2 is contained in an amount of 3.00 to 10.00%;
The method for producing glass according to claim 10, wherein the glass contains 0.00 to 0.10% of TiO2 .
 前記ガラスのZrO含有量(単位:酸化物基準のモル百分率表示のモル%)と、前記電鋳レンガのAl含有量(単位:酸化物基準のモル百分率表示のモル%)を用いて、下記式(2)で表されるYの値が0.02~0.10である、請求項10または11に記載のガラスの製造方法。
 Y=(ガラスのZrO含有量)/(電鋳レンガのAl含有量)  式(2)
The method for producing glass according to claim 10 or 11, wherein the value of Y, expressed by the following formula ( 2 ) using the ZrO2 content (unit: mol % expressed as a molar percentage based on oxide) of the glass and the Al2O3 content (unit: mol % expressed as a molar percentage based on oxide) of the electroformed brick, is 0.02 to 0.10:
Y = ( ZrO2 content of glass) / ( Al2O3 content of electroformed brick) Formula (2)
 前記溶融炉はさらに、酸化物基準の質量百分率表示でZrOを80質量%以上含有する電鋳レンガを含む、請求項10または11に記載のガラスの製造方法。 The method for producing glass according to claim 10 or 11, wherein the melting furnace further includes electroformed bricks containing 80 mass % or more of ZrO 2 expressed as a mass percentage on an oxide basis.  請求項1または2に記載のガラスを化学強化することを含む、化学強化ガラスの製造方法。 A method for producing chemically strengthened glass, comprising chemically strengthening the glass of claim 1 or 2.  前記化学強化は、ナトリウムを含有し、かつカリウム含有量が5質量%未満である溶融塩組成物を用いた化学強化である、請求項14に記載の化学強化ガラスの製造方法。 The method for producing chemically strengthened glass according to claim 14, wherein the chemical strengthening is performed using a molten salt composition containing sodium and less than 5% by mass of potassium.  請求項7または8に記載の化学強化ガラスと、ディスプレイとを有する、表示装置。 A display device comprising the chemically strengthened glass of claim 7 or 8 and a display.  請求項7または8に記載の化学強化ガラスを構成部材の一部として有する、電子デバイス製品。 An electronic device product having the chemically strengthened glass of claim 7 or 8 as part of its constituent parts.  請求項7または8に記載の化学強化ガラスを有する、太陽電池モジュール。 A solar cell module comprising the chemically strengthened glass of claim 7 or 8.
PCT/JP2025/020045 2024-06-07 2025-06-03 Glass, chemically strengthened glass, method for producing glass, and method for producing chemically strengthened glass Pending WO2025254110A1 (en)

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