WO2021230357A1 - 熱伝導率を調整した固体蓄熱材料および複合体 - Google Patents
熱伝導率を調整した固体蓄熱材料および複合体 Download PDFInfo
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- WO2021230357A1 WO2021230357A1 PCT/JP2021/018448 JP2021018448W WO2021230357A1 WO 2021230357 A1 WO2021230357 A1 WO 2021230357A1 JP 2021018448 W JP2021018448 W JP 2021018448W WO 2021230357 A1 WO2021230357 A1 WO 2021230357A1
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- thermal conductivity
- vanadium dioxide
- heat storage
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D20/00—Heat storage plants or apparatus in general; Regenerative heat-exchange apparatus not covered by groups F28D17/00 or F28D19/00
- F28D20/02—Heat storage plants or apparatus in general; Regenerative heat-exchange apparatus not covered by groups F28D17/00 or F28D19/00 using latent heat
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K5/00—Heat-transfer, heat-exchange or heat-storage materials, e.g. refrigerants; Materials for the production of heat or cold by chemical reactions other than by combustion
- C09K5/08—Materials not undergoing a change of physical state when used
- C09K5/14—Solid materials, e.g. powdery or granular
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- H10W40/255—
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- H10W40/258—
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D20/00—Heat storage plants or apparatus in general; Regenerative heat-exchange apparatus not covered by groups F28D17/00 or F28D19/00
- F28D20/0056—Heat storage plants or apparatus in general; Regenerative heat-exchange apparatus not covered by groups F28D17/00 or F28D19/00 using solid heat storage material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/14—Thermal energy storage
Definitions
- the present invention relates to a solid heat storage material and a composite having an adjusted thermal conductivity. More specifically, the present invention comprises a composite of vanadium dioxide and a high thermal conductivity material, and has a thermal conductivity capable of adjusting heat dissipation and heat storage in a wide range. It relates to a solid heat storage material with an adjusted rate.
- the heat storage density (latent heat per unit weight or unit volume) is regarded as an important characteristic.
- heat conduction which is an important factor in heat exchange, has not been sufficiently investigated.
- the thermal conductivity of paraffin which is a typical heat storage material, is about 0.2 W / mK, which is extremely low for rapid heat dissipation and endothermic progress. Therefore, it is essentially important to design a heat exchanger such as a structure that increases the contact area with the container that seals the heat storage material and a material having a high thermal conductivity for the container. That is, the structure tends to be complicated.
- Patent Document 3 a solid heat storage material utilizing a solid-solid phase transition. Since the material described in Patent Document 3 has an electronic phase transition as the source of latent heat, the material does not melt and maintains its shape before and after the phase transition. Therefore, this material can be used as a structural material having a latent heat storage performance (Patent Document 4, Patent Document 5, Non-Patent Document 1). That is, it can be used as it is as a material for heat exchangers and the like. Vanadium dioxide is attracting attention as a solid heat storage material that can solve the problem of molten heat storage materials because there is no need to consider liquid leakage and there is no increase in thermal resistance due to capselling.
- Non-Patent Document 2 and Non-Patent Document 3 the thermal conductivity of vanadium dioxide is about 6 W / mK (Non-Patent Document 2 and Non-Patent Document 3), which is insufficient as a heat dissipation material, and has a problem that the effect of suppressing overheating is low.
- the present invention solves the above-mentioned problems of the prior art, and has adjusted the thermal conductivity so that the thermal conductivity is large, the effect of suppressing overheating is high, and the heat dissipation and heat storage properties can be adjusted in a wide range.
- An object of the present invention is to provide a solid heat storage material.
- the following solid heat storage materials are provided.
- a high thermal conductivity substance having a higher thermal conductivity than vanadium dioxide is dispersed in vanadium dioxide, and the vanadium dioxide and the high thermal conductivity substance are closely adhered to each other, and the volume of the high thermal conductivity substance is high.
- the solid heat storage material in which the high thermal conductivity substance is copper.
- a solid heat storage material made from vanadium dioxide having an excess of oxygen is provided in the invention of the first [1] or [2] above.
- the solid heat storage material is characterized in that the diffusion layer and the reaction phase do not exist at the junction interface between the vanadium dioxide and the high thermal conductivity substance. .. [5]
- a solid heat storage material containing vanadium dioxide whose transition temperature has been adjusted by doping.
- a complex characterized in that copper is bonded to the solid heat storage material according to any one of the above inventions [1] to [7].
- a substance having excellent thermal conductivity is closely bonded to vanadium dioxide, it exhibits endothermic and heat generation characteristics with excellent time response, and effectively utilizes high heat storage density based on latent heat. You will be able to. Therefore, a solid heat storage material having a large thermal conductivity, a high effect of suppressing overheating, and having an adjusted thermal conductivity that can adjust heat dissipation and heat storage in a wide range is realized.
- FIG. 1 It is an electron micrograph which shows the bonding state of vanadium dioxide (VO 2 ) and electrolytic copper powder (Cu) in the sample of Example 1.
- FIG. It is a figure which shows the temperature dependence of the thermal conductivity (k) of the vanadium dioxide / copper powder junction in the sample of Example 1.
- V Cu is the volume fraction of copper.
- V Cu shows the volume fraction (V Cu ) dependence of copper of the latent heat (L) of the sample of Example 1 and the thermal conductivity (k) at room temperature.
- FIG. The substrate temperature is also shown by the dotted line.
- Non-Patent Documents 2 and 3 the thermal conductivity of a vanadium dioxide single crystal is about 6 W / mK at room temperature (Non-Patent Documents 2 and 3), and the crystallinity of vanadium dioxide has been improved and polycrystal crystals have been obtained. With orientation control, etc., it is not possible to expect a large improvement in thermal conductivity that exceeds this value. Therefore, in order to improve the thermal conductivity, it is effective to mix a substance having excellent thermal conductivity (for example, copper, aluminum, carbon fiber, etc.) and adhere them closely.
- a substance having excellent thermal conductivity for example, copper, aluminum, carbon fiber, etc.
- the thermal conductivity when different materials are mixed is the maximum when the high thermal conductive substance is oriented in one direction with the smallest amount of dispersion.
- the thermal conductivity k is as follows when the material is a two-phase system.
- V highk the volume fraction of the high thermal conductivity material
- k highk is the thermal conductivity of the high thermal conductivity material
- the volume fraction of high thermal conductivity should be V highk ⁇ (k limit --k VO2 ) / (k highk --k VO2 ) (2).
- the thermal conductivity needs to be higher than the value of a general metal material. That is, it should be 15 W / mK or more for stainless steel. Since the thermal conductivity of vanadium dioxide is 6 W / mK and the thermal conductivity of typical high thermal conductivity substances (copper, silver) is about 400 W / mK, the thermal conductivity is 15 W / mK or more. In order to obtain the rate, it is necessary that the body integral rate of the high thermal conductivity material is 0.03 or more.
- the steady-state method is desirable for the measurement near the transition temperature because of the influence of latent heat, but other than that, it may be appropriately selected according to the shape of the sample and the like.
- a differential scanning calorimeter is desirable for measuring the latent heat.
- Oxide-metal bonding may be performed directly with indirect bonding using a brazing material, but the latter is desirable because it facilitates stronger bonding and has low interfacial thermal resistance.
- sintering temperature of vanadium dioxide 550 ° C-1050 ° C is an appropriate range.
- this temperature range and the sintering temperature of the high thermal conductivity material match, it becomes possible to uniformly join with a volume fraction in a wide range.
- copper has a sintering temperature in the range of 500-800 ° C
- aluminum has a sintering temperature of 500-600 ° C
- carbon is difficult to sinter in the vanadium dioxide sintering temperature range.
- the process window is in the range of about 550-1050 ° C, and it can be processed in a wide temperature range, which is suitable as a combination with vanadium dioxide.
- aluminum has a narrow process window in the range of about 550-600 ° C, considering that an oxide film is formed on the surface and the melting point is as low as 660 ° C. Therefore, it tends to be difficult to obtain a good bond.
- carbon materials are subject to high temperature processes of 900 ° C or higher. Furthermore, in the case of carbon, the reaction with vanadium dioxide becomes a problem.
- the oxide and the high thermal conductivity material in addition to physically mixing the respective raw materials, coating the high thermal conductivity material by plating or spattering the oxide powder is exemplified.
- the latter has the advantage that it can be mixed uniformly even with a small amount of addition.
- the physical mixing method it is a method suitable for increasing the volume fraction of the mixture. It may be appropriately selected according to the desired mixing amount and dispersion form.
- the form of the high thermal conductivity material there are typically particulate, linear, and plate-like, but these may be appropriately selected according to the heat transfer direction. That is, if it is isotropic heat dissipation / endothermic, it may be in the form of particles, and if the heat transfer direction of heat dissipation / endothermic is one direction, a linear or plate-shaped high heat conductivity material should be oriented parallel to that direction. It's fine. In the latter case, even a small amount of high thermal conductivity material has a large thermal conductivity, and the volume fraction of vanadium dioxide can be maintained at a high concentration, so that the decrease in latent heat due to the high thermal conductivity material can be suppressed.
- phase transition temperature of vanadium dioxide can be adjusted by atomic doping such as tungsten and chromium.
- atomic doping such as tungsten and chromium.
- the sintering behavior of doped vanadium dioxide and that of additive-free vanadium dioxide do not change significantly, and can be sintered under similar conditions. That is, similarly, the above-mentioned form may be applied as it is to the joining.
- the interface of the bonding material causes interfacial thermal resistance, so its control is important.
- the thermal conductivity of the reaction phase is low due to the solid solution effect, which leads to an increase in interfacial thermal resistance. Therefore, from the viewpoint of thermal resistance, it is desirable that no reaction phase or diffusion layer is formed at the interface.
- vanadium oxide has a problem in environmental resistance (Patent Document 6), and since it actually forms a hydrate, it is necessary to pay attention to the atmosphere during use. Especially in an acidic environment, corrosion progresses easily, so use in an acidic environment should generally be avoided.
- a metal copper or aluminum
- corrosion can be prevented and environmental resistance can be significantly improved.
- it since it is electrocorrosion-proof, it is not necessary to coat all vanadium dioxide as described in Patent Document 6, and it is sufficient that it is electrically conductive.
- the solid heat storage material of the present invention is a bonded body in which a high thermal conductivity substance having a higher thermal conductivity than vanadium dioxide is dispersed and the two are closely adhered to each other, and the body integral rate of the high thermal conductivity substance is 0.03 or more. It is characterized by being.
- Examples of the high thermal conductivity material having a higher thermal conductivity than vanadium dioxide include copper, silver, aluminum, alloys containing these metals, carbon materials, and the like, and copper is particularly preferable.
- the bonded body constituting the solid heat storage material of the present invention needs to be closely adhered to vanadium dioxide and a high thermal conductivity substance having a higher thermal conductivity than vanadium dioxide, and the term "dense" is used here. , 90% or more of the theoretical density, more preferably 95% or more.
- the heat treatment temperature and heat treatment time can be appropriately set in consideration of the type of high thermal conductivity substance, the porosity to be achieved, and the like.
- the Archimedes method is desirable for measuring the density in order to accurately measure the porosity.
- the lower limit of the volume fraction of the high thermal conductivity substance is 0.03 (percent notation: 3%) in order to improve the thermal responsiveness.
- the upper limit is about 0.75 (percent notation: 75%).
- the volume fraction may be determined appropriately according to the application within this range, but due to the reciprocal relationship between the latent heat amount and the thermal response, 0.03-0.40 (percent notation: 3-40%) is used when giving priority to the latent heat amount. It is good to adjust it, 0.40-0.60 (percentage notation: 40-60%) when both are compatible, and 0.60-0.75 (percentage notation: 60-75%) when giving priority to thermal response.
- oxygen is applied to the surface of vanadium dioxide in order to obtain an interface with good adhesion by utilizing the reaction between vanadium dioxide and oxygen. It is also preferable to make it excessive.
- the solid heat storage material of the present invention can be used by joining to a high thermal conductive material such as a copper plate. That is, the complex of the present invention is characterized in that the solid heat storage material of the present invention and copper are bonded to each other.
- the joining method brazing material joining and diffusion joining can be applied, but diffusion joining is desirable in order to reduce the interfacial thermal resistance.
- the solid heat storage material and the composite of the present invention are not limited to the above embodiments.
- Example 1 Copper powder (purity 99.9%, particle size 45 ⁇ m mesh under, electrolytic copper powder) and vanadium dioxide powder (purity 99.9%, average particle diameter 1 ⁇ m) were bonded.
- the vanadium dioxide powder was previously heat-treated in air at 250 ° C. for 20 minutes in order to improve the adhesion, and was treated with excess oxygen.
- Each powder was weighed so that the volume fraction of copper was 0.00, 0.25, 0.50, 0.75, 1.00 and mixed by a planetary stirrer. Then, in vacuum, it was treated with a current-carrying sintering device at 550 ° C. for 30 minutes at a molding pressure of 30 MPa to obtain a dense bonded body. All samples were above 95% of the theoretical density.
- FIG. 1 shows an electron micrograph of the polished surface of the sample prepared in this example. From this figure, it was found that vanadium dioxide and copper were bonded without voids.
- the thermal conductivity (k) of the sample prepared above was measured by the laser flash method (Netch LFA447). The results are shown in FIG. From FIG. 2, it was found that as the volume fraction of copper increased, the thermal conductivity improved significantly in all temperature ranges.
- FIG. 3 shows the dependence of latent heat (L) and thermal conductivity (k) on the copper volume fraction. From this figure, it was found that the latent heat (L) decreases in proportion to the volume fraction (V Cu ) of copper, while the thermal conductivity (k) increases quadratically.
- Example 2 Aluminum powder (purity 99% up, particle size 300 ⁇ m mesh under, atomized powder) was bonded to vanadium dioxide powder.
- the vanadium dioxide powder was heat-treated in advance in the same manner as in Example 1 in order to improve the adhesion.
- the volume fraction of aluminum was weighed to 0.50 and mixed by a planetary stirrer. Then, it was treated in vacuum by heating at a molding pressure of 30 MPa, a temperature of 600 ° C., and 30 minutes with an energizing sintering device. As a result, a dense bonded body of 93% of the theoretical density was obtained for the aluminum-vanadium dioxide bonded sample. It was confirmed that its thermal conductivity was 13 W / mK, which was higher than that of vanadium dioxide alone at 4 W / mK.
- Example 3 The copper powder, vanadium dioxide powder (with heat treatment) and carbon fiber (pitch type, chopped fiber, length 6 mm) described in Example 1 were kneaded in a mortar. The volume fraction was copper 0.25 vanadium dioxide 0.5 carbon fiber 0.25. Then, it was treated in vacuum by heating at a molding pressure of 30 MPa, a temperature of 700 ° C., and 30 minutes with an energizing sintering device. As a result, a dense junction 96% of the theoretical density was obtained. Its thermal conductivity was 27 W / mK, and it was confirmed that it increased compared to the thermal conductivity of vanadium dioxide alone.
- Example 1 Aluminum powder (purity 99% up, particle size 300 ⁇ m mesh under, atomized powder) or carbon fiber (pitch-based, chopped fiber, length 6 mm) was bonded to vanadium dioxide powder (purity 99.9%, average particle diameter 1 ⁇ m).
- the vanadium dioxide powder was heat-treated in advance in the same manner as in Example 1 in order to improve the adhesion.
- the volume fractions of aluminum and carbon fibers were weighed to 0.50 and mixed by a planetary stirrer.
- the carbon fibers used were previously dispersed in ethanol by ultrasonic waves. Then, in vacuum, it was treated with a molding pressure of 30 MPa by an energizing sintering device.
- Example 4 The influence of the substrate material on the heating of the chip was investigated.
- the composition of the substrate is 1) copper volume fraction 1.00 (hereinafter, copper substrate), 2) copper volume fraction 0.50, vanadium dioxide volume fraction 0.50 (hereinafter, copper / vanadium dioxide substrate), 3) vanadium dioxide volume fraction 1.00. (Hereinafter, vanadium dioxide substrate) was used as three types.
- the material adjustment of the substrate is the same as in Example 1. Each was machined into a plate material of 30 ⁇ 30 ⁇ 5 mm and used as a substrate.
- a 10 x 10 x 1 mm ceramic microheater was adhered to the center of the substrate with silver paste for a die bonder, and the heat generated by the chip was simulated by the heater output.
- the surface temperature of the chip that is, the heater
- the surface temperature of the substrate the temperature was measured at a point 5 mm away from the chip
- the heating conditions were a heater output of 9 W and 180 seconds.
- Figure 4 shows the results.
- the chip temperature on each substrate is shown by a solid line, and the substrate temperature is shown by a broken line.
- the temperature of the chip mounted on the copper substrate gradually rises as the heating time elapses, but the temperature of the chip mounted on the vanadium dioxide substrate continues to rise sharply at the initial stage of heating and reaches a higher temperature than the copper substrate. It ends up.
- the vanadium dioxide substrate has a low thermal conductivity, so that the substrate is not uniformly heated and only the vicinity of the chip mount portion is heated. Therefore, although the temperature of the substrate is suppressed to the transition temperature or lower, the effect of the latent heat of the substrate is not exhibited in suppressing the temperature rise of the chip.
- the copper / vanadium dioxide substrate having improved thermal conductivity suppresses the temperature rise of the chip as the plate material reaches the transition temperature, and can suppress the temperature rise more than the copper plate.
- Example 5 A copper plate material (purity 99.96%) having a thickness of 0.1 mm was laminated with vanadium dioxide powder, and treated in vacuum at 550 ° C. for 30 minutes at a molding pressure of 30 MPa. The vanadium dioxide powder was heat-treated in advance in the same manner as in Example 1.
- a thermal cycle test across the metal-insulator transition temperature was performed on the bonded body of the sample of Example 5. As for the temperature profile, heating and cooling were repeated at 5 ° C / mim from 45 ° C to 90 ° C. There was no exfoliation in the 100 cycle test.
- Example 6 The interface of the sample of Example 5 was analyzed by an electron micrograph (STEM) and an energy dispersive X-ray analyzer (EDX).
- FIG. 7 shows the composition mapping of EDX. From FIG. 7, it was found that no diffusion layer or reaction phase was observed near the interface, and a clean interface was formed.
- Comparative Example 2 A copper plate material (purity 99.96%) having a thickness of 0.1 mm was laminated with vanadium dioxide powder, and treated in vacuum at 550 ° C. for 30 minutes at a molding pressure of 30 MPa. The vanadium dioxide powder was left untreated by heat treatment. An electron micrograph of the junction interface of the sample of Comparative Example 2 is shown in FIG. From FIG. 6, it can be seen that the copper plate material and vanadium dioxide have poor adhesion and have many voids.
- Example 7 A plurality of 0.1 mm thick copper plates and vanadium dioxide were laminated at equal intervals to prepare a laminated body under the same conditions as in Example 4.
- the volume fraction of copper was 0.29.
- the thermal conductivity was measured with the heat transfer direction of the laminate of Example 6 as the plane direction of the copper plate (copper is vertically oriented). The results are shown in Table 1.
- the data of Example 1 are also shown for comparison. From Table 1, it can be seen that the thermal conductivity is significantly improved even if the copper content is the same volume fraction.
- the latent heat amount is determined by the volume fraction of vanadium dioxide. Therefore, it can be seen that the orientation of copper is effective in increasing the thermal conductivity while maintaining the latent heat amount.
- Example 8 Copper powder (purity 99.9%, particle size 45 ⁇ m mesh under, electrolytic copper powder) and tungsten-added vanadium dioxide powder (phase transition temperature 10 ° C., average particle diameter 1 ⁇ m) were bonded.
- the tungsten-added vanadium dioxide powder was previously heat-treated in air at 250 ° C. for 20 minutes in order to improve the adhesion, and was treated with excess oxygen.
- Each powder was weighed so that the volume fraction of copper was 0.50, and mixed by a mortar. Then, in vacuum, it was treated with a current-carrying sintering device at 550 ° C. for 30 minutes at a molding pressure of 30 MPa.
- the prepared sample was a dense bonded body with a theoretical density of 96%.
- Example 9 The copper powder described in Example 1 was bonded to a chromium-added vanadium dioxide powder (phase transition temperature 120 ° C., average particle diameter 1 ⁇ m).
- the chromium-added vanadium dioxide powder was previously heat-treated and treated with excess oxygen in order to improve the adhesion.
- Each powder was weighed so that the volume fraction of copper was 0.50, and mixed by a mortar. Then, in vacuum, it was treated with a current-carrying sintering device at 700 ° C. for 30 minutes at a molding pressure of 30 MPa.
- the prepared sample was a dense bonded body with a theoretical density of 97%. Its thermal conductivity was 31 W / mK, and it was confirmed that it increased compared to the thermal conductivity of vanadium dioxide alone.
- Example 10 The vanadium dioxide and copper conjugate prepared under the conditions of Example 1 (copper volume fraction 0.50) was immersed in 2 mol / L dilute sulfuric acid for 24 hours. As a result, the sample maintained its shape before immersion. Moreover, the dilute sulfuric acid was not colored.
- Vanadium dioxide (copper volume fraction 0.00) prepared under the conditions of Example 1 was immersed in 2 mol / L dilute sulfuric acid for 24 hours. As a result, the sample was completely dissolved in dilute sulfuric acid, and the dilute sulfuric acid turned blue.
- Example 11 Under the conditions of Example 1, a dense sintered body (solid heat storage material) of vanadium dioxide powder and copper powder (volume fraction 0.50) was prepared in advance and processed into a plate shape. This dense sintered body was superposed on a copper plate (purity 99.96%, thickness 1 mm), and after applying a pressure of 30 MPa, it was heated to 600 ° C. and held for 30 min. The atmosphere at this time was a vacuum. The obtained sintered body and the copper plate joint were cut with a cutter perpendicular to the interface, the cut surface was polished and then processed by ion milling, and the joint interface was observed with a scanning electron microscope. As shown in FIG. 9, it was confirmed that a close interface was formed and that a good composite of the sintered body and the copper plate material could be obtained by diffusion bonding.
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Abstract
Description
[1]二酸化バナジウムに二酸化バナジウムよりも高い熱伝導率を有する高熱伝導率物質が分散され、前記二酸化バナジウムと前記高熱伝導率物質とが緻密に密着した接合体であり、高熱伝導率物質の体積分率が0.03以上であることを特徴とする固体蓄熱材料。
[2]上記第[1]の発明において、高熱伝導率物質が銅である固体蓄熱材料。
[3]上記第[1]または第[2]の発明において、酸素過剰の二酸化バナジウムを原料とした固体蓄熱材料。
[4]上記第[1]から第[3]のいずれかの発明において、前記二酸化バナジウムと前記高熱伝導率物質との接合界面に拡散層及び反応相が存在しないことを特徴とする固体蓄熱材料。
[5]上記第[1]から第[4]のいずれかの発明において、酸化腐食に安定であることを特徴とする固体蓄熱材料。
[6]上記第[1]から第[5]のいずれかの発明において、高熱伝導率物質が伝熱方向に平行に配向した固体蓄熱材料。
[7]上記第[1]から第[6]のいずれかの発明において、ドーピングにより転移温度を調整された二酸化バナジウムを含む固体蓄熱材料。
[8]上記第[1]から第[7]のいずれかの発明の固体蓄熱材料と銅とが接合していることを特徴とする複合体。
ここで、Vhighkは高熱伝導率物質の体積分率、kVO2 は二酸化バナジウムの熱伝導率、khighkは高熱伝導率物質の熱伝導率である。
Vhighk≧ ( klimit- kVO2 ) / (khighk - kVO2 ) (2)
とする必要がある。ヒートシンク等で要求される熱応答性を鑑みれば、熱伝導率は一般的な金属材料の値以上は必要である。すなわち、ステンレス鋼の15 W/mK以上とする必要がある。二酸化バナジウムの熱伝導率が6 W/mKであること、典型的な高熱伝導率物質(銅、銀)の熱伝導率が400 W/mK程度であることから、15 W/mK以上の熱伝導率とするには、高熱伝導率物質の体積分率は0.03以上とすることが必要である。
密度の測定は、気孔率を正確に測定するためにアルキメデス法が望ましい。
銅粉(純度 99.9%、粒子サイズ 45μmメッシュアンダー、電解銅粉)と、二酸化バナジウム粉末(純度99.9%、平均粒子径 1μm)を接合した。二酸化バナジウム粉末は、密着性を向上させるために、予め250℃で20分間空気中で熱処理を行い、酸素過剰に処理した。それぞれの粉末は、銅の体積分率が0.00、0.25、0.50、0.75、1.00となるように秤量し、遊星式攪拌機により混合した。その後、真空中で、通電焼結装置により550℃、30分間、成形圧30MPaで処理し、緻密接合体を得た。すべての試料は、理論密度の95%以上であった。ここで、理論密度は、二酸化バナジウム-銅の場合、反応物がないとして、複合則により、以下のように決定される。
(理論密度)=(二酸化バナジウムの密度)×(二酸化バナジウムの体積分率)+(銅の密度)×(銅の体積分率)
アルミニウム粉末(純度99%up、粒子サイズ 300μmメッシュアンダー、アトマイズ粉)と二酸化バナジウム粉末と接合した。二酸化バナジウム粉末は、密着性を向上させるために、実施例1と同様に、予め熱処理を行った。アルミニウムの体積分率は0.50となるように秤量し、遊星式攪拌機により混合した。その後、真空中で、通電焼結装置により、成形圧30MPa、温度600℃、30分間の加熱により処理した。その結果、アルミニウム・二酸化バナジウム接合試料は理論密度に対して93%の緻密な接合体が得られた。その熱伝導率は13 W/mKであり、二酸化バナジウム単体の4 W/mK に比して増加することを確認した。
実施例1記載の銅粉と二酸化バナジウム粉末(熱処理あり)および炭素繊維(ピッチ系、チョップドファイバー、長さ6mm)を乳鉢で混錬した。体積分率は、銅0.25 二酸化バナジウム 0.5 炭素繊維 0.25 とした。その後、真空中で、通電焼結装置により、成形圧30MPa、温度700℃、30分間の加熱により処理した。その結果、理論密度に対して96%の緻密な接合体が得られた。その熱伝導率は27 W/mK であり、二酸化バナジウム単体の熱伝導率に比して増加することを確認した。
アルミニウム粉末(純度99%up、粒子サイズ 300μmメッシュアンダー、アトマイズ粉)または炭素繊維(ピッチ系、チョップドファイバー、長さ6mm)を、二酸化バナジウム粉末(純度 99.9%、平均粒子径 1μm)と接合した。二酸化バナジウム粉末は、密着性を向上させるために、実施例1と同様に、予め熱処理を行った。アルミニウムおよび炭素繊維の体積分率は、0.50となるように秤量し、遊星式攪拌機により混合した。なお炭素繊維は、予めエタノール中で超音波により分散させたものを用いた。その後、真空中で、通電焼結装置により、成形圧30MPaで処理した。アルミニウムは550℃、30分間の加熱、炭素繊維は950℃、30分間の加熱とした。その結果、アルミニウム・二酸化バナジウム接合試料は理論密度の87%、炭素繊維・二酸化バナジウム接合試料は理論密度の75%となり、緻密な接合体は得られなかった。また、炭素繊維・二酸化バナジウム接合試料では、両材料の化学反応が進行しV2O3が生成された。
チップの加熱における、基板材質の影響を調査した。基板の組成は、1)銅体積分率1.00(以降、銅基板)、2)銅体積分率0.50二酸化バナジウム体積分率0.50(以降、銅/二酸化バナジウム基板)、3)二酸化バナジウム体積分率1.00(以降、二酸化バナジウム基板)の3種類とした。基板の材料調整は、実施例1に同じである。それぞれを、30×30×5mmの板材に機械加工し、基板として用いた。
厚さ0.1mmの銅板材(純度99.96%)を二酸化バナジウム粉末と積層し、真空中で、通電焼結装置により550℃、30分間、成形圧30MPaで処理した。二酸化バナジウム粉末は、実施例1と同様に予め熱処理を行った。
実施例5の試料の界面を電子顕微鏡写真(STEM)及びエネルギー分散型蛍光エックス線分析装置(EDX)により分析した。図7にEDXの組成マッピングを示す。図7より、界面近傍に拡散層や反応相は観察されず、清浄な界面を形成していることが判明した。
厚さ0.1mmの銅板材(純度99.96%)を二酸化バナジウム粉末と積層し、真空中で、通電焼結装置により550℃、30分間、成形圧30MPaで処理した。二酸化バナジウム粉末は、熱処理を未処理とした。比較例2の試料のその接合界面の電子顕微鏡写真を図6に示す。図6から、銅板材と二酸化バナジウムは、密着性が悪く、空隙が多く存在していることがわかる。
比較例2の試料の界面を電子顕微鏡写真(STEM)及びエネルギー分散型蛍光エックス線分析装置(EDX)により分析した。図8にEDXの組成マッピングを示す。その結果、図8に示すように、界面にCu2O相が存在し、また界面近傍のVO2の粒界近傍にはアモルファス上のCu-V-O拡散層が明瞭に観察された。これら反応相の形成が、緻密な界面の形成を阻害しているものと考えられる。
厚さ0.1mmの銅板材と二酸化バナジウムを等間隔で複数積層し、実施例4と同様の条件で積層体を作製した。銅の体積分率は0.29であった。実施例6の積層体の伝熱方向を銅板の面方向として(銅を垂直配向)熱伝導率を測定した。結果を表1に示す。比較のため実施例1のデータも合わせて示す。表1から、銅含有量が同じ体積率であっても、熱伝導率が大幅に向上することがわかる。なお実施例1のとおり、潜熱量は二酸化バナジウムの体積分率により決まる。従って、潜熱量を維持したまま熱伝導率を増加させるには、銅の配向が効果的であることがわかる。
銅粉(純度99.9%、粒子サイズ 45μmメッシュアンダー、電解銅粉)と、タングステン添加二酸化バナジウム粉末(相転移温度10℃、平均粒子径 1μm)を接合した。タングステン添加二酸化バナジウム粉末は、密着性を向上させるために、予め250℃で20分間、空気中で熱処理を行い、酸素過剰に処理した。それぞれの粉末は、銅の体積分率が0.50となるように秤量し、乳鉢により混合した。その後、真空中で、通電焼結装置により550℃、30分間、成形圧30MPaで処理した。作製した試料は、理論密度96%の緻密な接合体であった。
実施例1に記載の銅粉と、クロム添加二酸化バナジウム粉末(相転移温度120℃、平均粒子径 1μm)を接合した。クロム添加二酸化バナジウム粉末は、密着性を向上させるために、予め熱処理を行い、酸素過剰に処理した。それぞれの粉末は、銅の体積分率が0.50となるように秤量し、乳鉢により混合した。その後、真空中で、通電焼結装置により700℃、30分間、成形圧30MPaで処理した。作製した試料は、理論密度97%の緻密な接合体であった。その熱伝導率は31 W/mK であり、二酸化バナジウム単体の熱伝導率に比して増加することを確認した。
実施例1の条件で作成した二酸化バナジウムと銅の接合体(銅体積分率0.50)を、2mol/Lの希硫酸中に24h浸漬した。その結果、試料は浸漬前の形状を維持していた。また、希硫酸が着色することはなかった。
実施例1の条件で作製した二酸化バナジウム(銅体積分率0.00)を、2mol/Lの希硫酸中に24h浸漬した。その結果、試料は完全に希硫酸に溶解し、希硫酸が青色に変色した。
実施例1の条件にて、二酸化バナジウム粉と銅粉(体積分率0.50)の緻密焼結体(固体蓄熱材料)を予め作製し、板状に加工した。この緻密焼結体を銅板(純度99.96% 厚さ1mm)と重ね、圧力30 MPa を掛けたのち600℃に加熱し30min保持した。このときの雰囲気は真空とした。得られた焼結体と銅板の接合体を、界面に垂直にカッターで切断し、切断面を研磨後イオンミリングで加工、接合界面を走査電子顕微鏡にて観察した。図9に示したように、密着した界面が形成されており、拡散接合により、焼結体と銅板材の良好な複合体が得られることを確認した。
Claims (8)
- 二酸化バナジウムに二酸化バナジウムよりも高い熱伝導率を有する高熱伝導率物質が分散され、前記二酸化バナジウムと前記高熱伝導率物質とが緻密に密着した接合体であり、前記高熱伝導率物質の体積分率が0.03以上であることを特徴とする固体蓄熱材料。
- 前記高熱伝導率物質が銅であることを特徴とする請求項1記載の固体蓄熱材料。
- 酸素過剰の二酸化バナジウムを原料としていることを特徴とする請求項1または2記載の固体蓄熱材料。
- 前記二酸化バナジウムと前記高熱伝導率物質との接合界面に拡散層及び反応相が存在しないことを特徴とする請求項1から3のいずれかに記載の固体蓄熱材料。
- 酸化腐食に安定であることを特徴とする請求項1から4のいずれかに記載の固体蓄熱材料。
- 前記高熱伝導率物質が伝熱方向に平行に配向していることを特徴とする請求項1から5のいずれかに記載の固体蓄熱材料。
- ドーピングにより転移温度を調整された二酸化バナジウムを含むことを特徴とする請求項1から6のいずれかに記載の固体蓄熱材料。
- 請求項1-7のいずれかに記載の固体蓄熱材料と、銅とが接合していることを特徴とする複合体。
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| CN202180035268.7A CN115605558A (zh) | 2020-05-14 | 2021-05-14 | 调节了热传导率的固体蓄热材料和复合体 |
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