WO2019080871A1 - Mask device and mask assembly thereof, and mask plate - Google Patents

Abstract

A mask device (10), comprising a mask assembly (200) and a mask frame (300), wherein the mask assembly (20) comprises a mask plate (100) and a shielding component (200), the edge of the mask plate (100) being connected to the mask frame (300); the mask plate (100) is evenly opened thereon with multiple through holes (101, 101a, 101b), each through hole (101, 101a, 101b) having the same shape, and each through hole (101, 101a, 101b) having the same size, while the shielding component (200) is opened with multiple through ports (201); the shielding component (200) abuts against the mask plate (100), and each through port (201) is aligned with part of the through holes (101, 101a, 101b) on the mask plate (100) respectively, the through ports (201) communicating with each aligned through hole (101, 101a, 101b), while the shielding component (200) shields the remaining part of the through holes (101, 101a, 101b) on the mask plate (100). Further disclosed are a mask assembly (20) and a mask plate (100).

Description

Mask device and mask assembly thereof, mask plate

This application claims the priority of the Chinese Patent Application entitled "Mask device and its mask assembly, mask" on October 25, 2017, the Chinese Patent Office, the application number is 201711006716.2, the entire contents of which are incorporated by reference. Combined in this application.

Technical field

The present application relates to the field of organic light-emitting display manufacturing technology, and in particular to a mask device, a mask assembly thereof, and a mask.

Background technique

The most influential process of the AMOLED (Active-matrix organic light emitting diode) production process is the evaporation process. The basic process of the evaporation process is to heat the organic material to evaporate the organic material. The through holes etched by the high-precision fine mask are evaporated onto the glass substrate to form a light-emitting unit. In the evaporation process, the evaporated organic material is evaporated onto the substrate through the through holes of the effective area of the mask to form an AA (Aive Area) area of the display screen, and the AA area is also referred to as a display area, that is, The effective area of the mask corresponds to the AA area of the display.

At present, the conventional mask is usually designed as Divide (in the form of a single strip) to correspond to a certain product model, and finally, a plurality of masks are separately soldered to the mask frame to correspond to the product layout of the substrate. Although it can meet the current production, there are problems in the following aspects in practice;

1: Since the mask is in the form of a single strip, it is usually necessary to etch the effective area of the mask in the etch effective area of the mask and etch the Dummy (reserved area) of different shapes around the effective area to ensure masking. Under the influence of the tensioning force of the template, the mechanical properties of the effective area and the reserved area are as uniform as possible, and the deformation is reduced; however, the manufacturing process of such a single mask is complicated, and multiple exposures are usually required to respectively etch the effective area. Etching holes and etched holes in the reserved area;

2: The mask usually needs to be designed according to the specific product model, and then etched, and since the mask manufacturing cycle is usually long and the product model of the display is updated faster, this method cannot quickly correspond to the market. product demand;

3: Due to the welding form of a single mask, the final typesetting of the substrate can only correspond to a certain product model, and the idle position in the typesetting cannot be reasonably utilized, so that the utilization rate of the glass substrate typesetting is low, resulting in high production cost.

Summary of the invention

According to various embodiments of the present application, a mask device, a mask assembly thereof, and a mask are provided.

A mask device comprising: a mask assembly and a mask frame, the mask assembly comprising a mask and a shutter;

The edge of the mask is connected to the mask frame;

a plurality of through holes are uniformly formed on the mask plate, the shape of each of the through holes is the same, and each of the through holes is equal in size, and the shielding member is provided with a plurality of through holes;

The shielding member abuts the masking plate, and each of the through holes is respectively aligned with a portion of the through hole on the masking plate, and the through opening communicates with each of the aligned through holes. The shielding member blocks the remaining portion of the through hole provided on the mask.

In one of the embodiments, each of the openings has the same shape.

In one of the embodiments, at least two of the ports of each of the ports have different shapes.

In one of the embodiments, the shape of the opening is an irregular shape.

In one embodiment, the shutter is a shield film.

In one of the embodiments, each of the through holes is disposed in a rectangular array.

In one embodiment, at least two of the through ports have different shapes, the shape of the opening is irregular, and the shielding member is a shielding film, and each of the through holes is Rectangular array settings.

A mask assembly comprising a mask and a shutter;

a plurality of through holes are uniformly formed on the mask plate, the shape of each of the through holes is the same, and each of the through holes is equal in size, and the shielding member is provided with a plurality of through holes;

The shielding member abuts the masking plate, and each of the through holes is respectively aligned with a portion of the through hole on the masking plate, and the through opening communicates with each of the aligned through holes. The shielding member blocks the remaining portion of the through hole provided on the mask.

In one of the embodiments, each of the openings has the same shape.

In one of the embodiments, at least two of the ports of each of the ports have different shapes.

a mask plate, the edge of the mask plate is disposed to be connected to a mask frame, the mask plate is uniformly provided with a plurality of through holes, each of the through holes has the same shape, and each of the through holes The dimensions are equal.

The mask device, the mask assembly, the mask plate, and the mask frame are provided with only one mask plate, and the mask plate is a whole, and a through hole is uniformly formed thereon, and the mask plate is blocked by the shielding member. The evaporation material is vapor-deposited through the port and the through hole to form a display area corresponding to the shape of the port. On the one hand, the mask plate does not need to set different reserved areas according to different display areas, and only needs to be etched as a whole to reduce etching. The process reduces the complexity of the process. In addition, since the through-holes are uniformly formed in the mask plate as a whole, the mechanical properties of the portions of the mask plate tend to be uniform, and the deformation is effectively reduced, so that the vapor deposition effect is better, and on the other hand, The nozzles of different shapes are arranged, so that the mask device can simultaneously evaporate display areas of different shapes, effectively utilize the idle position, improve the utilization ratio of the glass substrate, improve the evaporation efficiency, and effectively reduce the production cost, and further, corresponding to different displays. For the needs of the screen, only the corresponding occlusion members can be set, and the mask can be redesigned to quickly adapt to the product update requirements.

Details of one or more embodiments of the present application are set forth in the accompanying drawings and description below. Other features, objects, and advantages of the invention will be apparent from the description and appended claims.

DRAWINGS

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings to be used in the embodiments or the prior art description will be briefly described below. Obviously, the drawings in the following description are only It is a certain embodiment of the present application, and those skilled in the art can obtain drawings of other embodiments according to the drawings without any creative work.

1 is a perspective exploded structural view of a mask device of an embodiment;

2 is a schematic view showing a structure of a mask of an embodiment;

Fig. 3 is a schematic view showing the structure of a shutter of an embodiment.

Detailed ways

In order to facilitate the understanding of the present application, the present application will be described more fully hereinafter with reference to the accompanying drawings. Preferred embodiments of the present application are shown in the drawings. However, the application can be embodied in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that the understanding of the disclosure of the present application will be more thorough.

It should be noted that when an element is referred to as being "fixed" to another element, it can be directly on the other element or the element can be present. When an element is considered to be "connected" to another element, it can be directly connected to the other element or.

All technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention applies, unless otherwise defined. The terminology used herein is for the purpose of describing particular embodiments, and is not intended to be limiting.

For example, a mask device includes a mask assembly and a mask frame, the mask assembly including a mask and a shutter; an edge of the mask is coupled to the mask frame; a plurality of through holes are uniformly formed on the film plate, the shape of each of the through holes is the same, and each of the through holes is equal in size, and the shielding member is provided with a plurality of openings; the shielding member abuts against the mask Each of the through holes is respectively aligned with a portion of the through hole on the mask plate, and the through port is in communication with each of the aligned through holes, and the shielding member is disposed on the mask plate The remaining portion of the upper through hole.

For example, a mask assembly includes a mask plate and a shutter; the mask plate is uniformly provided with a plurality of through holes, each of the through holes has the same shape, and each of the through holes has the same size. The shielding member is provided with a plurality of openings; the shielding member abuts the masking plate, and each of the through holes is respectively aligned with a portion of the through hole on the masking plate, and the through opening is Each of the aligned through holes is in communication, and the shielding member blocks the remaining portion of the through hole on the mask.

For example, a mask is disposed, the edge of the mask is disposed to be connected to a mask frame, and the mask is uniformly provided with a plurality of through holes, each of the through holes has the same shape, and each of the The through holes are equal in size.

In the above embodiment, only one mask plate is disposed on the mask frame, and the mask plate is a whole, and a through hole is uniformly formed thereon, and the mask plate is shielded by the shielding member, so that the vapor deposition material passes through the mouth and the through hole. The hole is vapor-deposited into a display area corresponding to the shape of the port. On the one hand, the mask plate does not need to set different reserved areas according to different display areas, and only needs to be etched as a whole, thereby reducing the etching process and reducing the process complexity. Since the through-holes are uniformly formed in the mask plate as a whole, the mechanical properties of the portions of the mask plate tend to be uniform, and the deformation is effectively reduced, so that the vapor deposition effect is better. On the other hand, by setting the ports of different shapes, the mask is masked. The membrane device can simultaneously vaporize display areas of different shapes, effectively utilize the idle position, improve the utilization ratio of the glass substrate, improve the evaporation efficiency, and effectively reduce the production cost. In addition, corresponding to the requirements of different display screens, only the corresponding occlusion is set. You can quickly adapt to product update needs without having to redesign the mask.

In one embodiment, as shown in FIG. 1, a mask device 10 is provided, including: a mask assembly 20 and a mask frame 300, the mask assembly 20 includes a mask 100 and a shutter 200; The edge of the mask plate 100 is connected to the mask frame 300. The mask plate 100 is uniformly provided with a plurality of through holes 101. The shape of each of the through holes 101 is the same, and each of the through holes 101 is The shielding member 200 is provided with a plurality of openings 201; the shielding member 200 abuts against the masking plate 100, and the portions of the opening ports 201 respectively aligned with the masking plate 100 are The through hole 101 communicates with the aligned through holes 101, and the shutter 200 blocks the remaining portion of the through hole 101 on the mask plate 100.

Specifically, the mask 100 is formed by etching to form a through hole 101 for vapor-depositing a pixel pattern, and the evaporated organic material is evaporated onto the substrate through the via hole 101 to form a pixel. For example, the through hole 101 is The hole is etched, for example, the through hole 101 is an evaporation hole. For example, the widths of the through holes 101 are equal. For example, the apertures of the through holes 101 are equal, since the through holes 101 on the mask 100 are uniformly disposed, and the shapes are the same and the dimensions are equal, so that the vaporized pixels are formed. They have the same size and the same shape, and the pixel distances are the same, that is, the display screen formed by evaporation has the same PPI (Pixels Per Inch). In this way, the mask 100 does not need to etch different types of reserved regions according to different display regions, but etches the vias 101 in a full-page manner, and only needs to be exposed once after etching, which reduces the etching process and reduces the process. The complexity is effective in reducing the production cost of the mask 100.

Specifically, the position between the openings 201 of the shielding member 200 corresponds to the reserved area of the mask 100, and the opening 201 of the shielding member 200 corresponds to the effective evaporation area of the mask 100, that is, the mask 100 The through hole 101 is uniformly formed in the effective evaporation zone and the reserved area, so that the mask 100 does not need to etch the reserved area according to the shape of the display area, and only the entire mask 100 needs to be etched, thereby reducing the process. The complexity is effective in reducing the production cost of the mask 100.

For example, the mask 100 and the shutter 200 are stacked, and the shutter 200 is used to block the mask 100. Specifically, the shutter 200 is used to block a part of the through holes 101 on the mask 100, so that the organic The material is evaporated on the substrate through the through opening 201 and the unobstructed through hole 101. The shape of the opening 201 corresponds to the shape of the display area of the display screen, that is, the organic material is shielded by the shielding member 200, so that the organic material The material passes only through the through hole 101 corresponding to the position of the port 201, and is evaporated onto the substrate, so that a display area having the same shape as that of the port 201 is formed on the substrate, and the portion of the mask 100 that is blocked by the blocking member 200 is A reserved area in which the position on the substrate corresponding to the reserved area is not evaporated. In this way, for the display screens of different shapes and different sizes, it is only necessary to open the corresponding shape and corresponding size of the opening 201 on the shielding member 200 to realize evaporation of the display of the display screens of different shapes and different sizes. Corresponding to the different shape and size of the display screen, only the corresponding shielding member 200 can be disposed, and the corresponding shape and size of the opening 201 can be disposed on the shielding member 200, and the masking plate 100 can be redesigned, and the product updating requirement can be quickly adapted. On the other hand, the position of the port 201 on the shielding member 200 can be flexibly adjusted to reduce the idle position and reduce the area of the reserved area, so that one evaporation can evaporate more display areas, improve the utilization rate of the glass substrate, and improve Evaporation efficiency and effective reduction of production costs.

In this embodiment, a mask frame 300 corresponds to a mask 100. For example, a mask frame 300 is only connected to a mask 100. For example, a mask frame 300 is only soldered to a mask 100. That is, the mask 100 integrally covers the mask frame 300. For example, the mask 100 covers the entire edge of the mask frame 300, thus avoiding soldering the plurality of masks 100 to the mask frame 300, respectively. The structure of the mask device 10 is made more compact, and the production efficiency of the mask device 10 is effectively improved. Since the mask plate 100 is integrally provided with the through holes 101, the overall mechanical properties of the mask plate 100 tend to be uniform, so that the mask plate 100 effectively reduces deformation when the tension is applied to the net, effectively avoids wrinkles and reduces steaming. The plated product has a luminescent pixel color mixing, which makes the evaporation effect better.

It should be understood that the connection between the mask frame 300 and the mask 100 can be implemented by the prior art, and the connection between the mask frame 300 and the mask 100 is not reduced to one due to the number of the mask 100. However, it becomes impossible to implement, and the specific connection between the two is not cumbersome in the present embodiment.

In one embodiment, each of the through holes 201 has the same shape. For example, each of the through holes 201 has the same size. For example, the width of each of the through holes 201 is the same, so that a plurality of passes of the same shape and size are provided. The port 201 enables the plurality of display areas to be vapor-deposited at the same time by the mask device 10, thereby effectively improving the evaporation efficiency and improving the production efficiency. Further, since the mask 101 is uniformly formed with the through holes 101 as a whole, the mask 100 is made. The shape and distance of the through holes 101 of the upper portions are the same, so that the number of pixels and the pixel size of the plurality of display regions which are evaporated are the same, so that the display screens respectively made by the plurality of display areas respectively have the same pixel parameters. , effectively improve the vapor deposition accuracy.

In order to increase the space utilization of the glass substrate and improve the production efficiency, in one embodiment, referring again to FIG. 1, at least two of the ports 201 of each of the ports 201 have different shapes, for example, The shape of the port 201 is different. For example, at least three of the ports 201 have different shapes, that is, at least two of the ports 201 formed in the shutter 200 are different in shape. It should be understood that different display screens have different display shapes or sizes. According to the conventional mask 100, different display areas cannot be simultaneously evaporated on the glass substrate, resulting in low vapor deposition efficiency. In the embodiment, since the shape of the opening 201 formed in the shielding member 200 is different, the display areas of different shapes can be simultaneously evaporated on the glass substrate to meet the requirements of different display screens, and on the other hand, different shapes The port 201 is opened on the same shielding member 200. The spacing of the port 201 can be adjusted by appropriately setting the position of the port 201, and the area of the free area can be reduced, so that the number of the ports 201 on the shielding member 200 is more. The overall area of the port 201 is larger, so that more display regions can be vapor-deposited on the glass substrate in one vapor deposition, the vapor deposition efficiency is improved, and the glass substrate is fully utilized, and the utilization of the glass substrate is improved. rate.

It is worth mentioning that since the pitches of the through holes 101 on the same mask 100 are the same, the shapes, sizes, and pitches of the different display regions formed by evaporation are the same, that is, thereby The differently shaped displays will be based on the same separation rate or based on the same PPI. For example, the shape of the opening 201 formed on the same shielding member 200 includes a rectangle, a circle, and a square. Then, by the same evaporation, a rectangular display area, a circular display area, and a square display area can be formed on the glass substrate. The glass substrate of each display area formed by evaporation is cut, specifically, cut along the unvaporized area between the display areas, and correspondingly made into a rectangular display, a circular display and a square display For example, a rectangular display can be applied to electronic devices such as mobile phones and tablets, a circular display can be applied to an electronic watch, and a square display can be applied to an electronic watch or other electronic device using a square display.

It should be connected that the shape, size and spacing of the through holes 101 on the mask 100 can be used according to different product PPI settings, corresponding to different PPI products, using the mask 100 corresponding to the PPI. The same mask 100 can be used for products of different shapes based on the same PPI. In this way, based on the same PPI, only one mask 100 needs to be produced, and the shielding member 200 with different ports 201 is vapor-deposited into display areas of different shapes, and it is not necessary to etch different masks for different PPIs and different shapes of display areas. The diaphragm 100 can thus effectively reduce the cost of the mask 100.

In order to accommodate the evaporation requirements of the profiled display area, for example, the shape of the port 201 is an irregular shape. For example, at least one of the ports 201 of each of the ports 201 has an irregular shape. For example, the cross-sectional shape of the port 201 is irregular. In each embodiment, the irregular shape is an irregular shape and an irregular shape. For an unconventional shape, the conventional shape may be a shape of a commonly used display screen such as a circle, a square, and a rectangle. For example, the irregular shape may be a shape formed by a part of a regular shape protrusion, or may be a shape formed by a partial shape of a regular shape. . The irregular shape of the opening 201 is provided on the shielding member 200, which can adapt to the evaporation requirement of the shaped display area, and can better cooperate with the other openings 201 to reduce the spacing between the openings 201, so that the idle position is The area is reduced, so that the number of the ports 201 on one of the shielding members 200 is increased, thereby increasing the evaporation efficiency and further improving the utilization rate of the glass substrate.

In order to enable the shutter 200 to sufficiently abut the mask 100, in one embodiment, the shutter 200 is a shield film. The shielding film has a small thickness and is relatively soft in material and can sufficiently abut against the surface of the reserved area of the mask 100. For example, the shielding film is attached to the surface of the reserved area of the mask 100. The shielding film can fully block the second through hole 101 of the reserved area, and avoid evaporation of the organic material at a position corresponding to the reserved area of the substrate. Further, since the shielding film has a small thickness, the overall thickness of the masking device 10 can be made smaller, and the evaporation effect of the masking device 10 is further improved.

For another example, the shutter 200 is a shielding piece. The shielding sheet has a small thickness and has a large hardness, and has better meshing precision, so that the evaporation precision of the display area is higher.

In order to make the contact between the shielding member 200 and the masking plate 100 more tight, for example, the thickness of the shielding member 200 is 0.03 mm to 0.1 mm. For example, the thickness of the shielding member 200 is 0.05 mm to 0.008 mm. Therefore, since the shielding member 200 has a small thickness and has good flexibility, it can fully abut against the masking plate 100, so that the abutment between the two is tighter, so that the shielding member 200 faces the masking plate 100. The occlusion effect is better.

In order to make the contact between the shielding member 200 and the masking plate 100 more tight, the blocking effect of the shielding member 200 on the masking plate 100 is better, for example, the thickness of the shielding member 200 and the masking plate 100 are The material of the shielding member 200 is the same as that of the masking plate 100. That is, the shielding member 200 is made of the same material as the masking plate 100, so that the shielding member 200 can be made The mask 100 has the same or similar mechanical properties, and has the same deformation or tensile force between the two, so that the shielding member 200 can fully abut the mask 100, so that the shielding member 200 faces the mask 100. The occlusion effect is better.

It should be understood that, in the above embodiment, the shielding member 200 is made of the same material as the masking plate 100, and is also formed by etching, that is, the opening 201 of the shielding member 200 is formed by etching, for example, the shielding member 200. The port 201 is formed by laser etching.

In one embodiment, each of the through holes 101 is disposed in a rectangular array. For example, each of the through holes 101 is equidistantly disposed, for example, the row spacing of each of the through holes 101 is equal, for example, the column pitch of each of the through holes 101 is equal, for example, the row spacing and the column pitch of each of the through holes 101. Equally, the distribution of the through holes 101 on the mask 100 is more uniform on the one hand, which is advantageous for making the overall mechanical properties of the mask 100 more uniform, and avoiding wrinkles and deformation of the mask 100, so that the evaporation effect is more uniform. On the other hand, the display panel has the same PPI on the same glass substrate, and the PPI of the display screen is the same, and the product consistency is better.

In one embodiment, a mask assembly is provided, including a mask plate and a shutter; the mask plate is uniformly provided with a plurality of through holes, each of the through holes has the same shape, and each of the through holes The apertures are equal in size, and the shielding member is provided with a plurality of openings; the shielding member abuts the masking plate, and each of the through holes is respectively aligned with a portion of the through hole on the masking plate, and The through port is in communication with each of the aligned through holes, and the blocking member blocks the remaining portion of the through hole on the mask. The mask assembly in this embodiment can be applied to the mask device in any of the above embodiments.

For example, each of the ports has the same shape. For example, at least two of the ports in each of the ports have different shapes.

In one embodiment, a mask is provided, the edge of the mask is disposed to be connected to a mask frame, and the mask is uniformly provided with a plurality of through holes, each of the through holes having the same shape And each of the through holes has the same size. For example, the mask is used to cover the edge of one of the mask frames, so that when the vapor deposition is performed, only one mask is disposed on the mask frame, and it is not necessary to solder a plurality of masks.

The mask assembly in this embodiment can be applied to the mask device in any of the above embodiments, or to the mask assembly in any of the above embodiments.

In one embodiment, a mask assembly is provided. Please refer to FIG. 2 and FIG. 3, including a mask 100 and a shutter 200. The mask 100 is uniformly provided with a plurality of through holes 101; The shielding member 200 is in contact with the masking plate 100. The shielding member 200 is provided with a plurality of openings 201. Each of the openings 201 has an irregular shape, and the through opening 201 is aligned with the masking plate. a portion of the through hole 101 on the 100, and the through hole 201 communicates with each of the aligned through holes 101, and the shielding member 200 blocks the remaining portion of the through hole 101 on the mask plate 100. .

In order to make the evaporation effect better, in one embodiment, please refer to FIG. 2 and FIG. 3, the mask 100 includes a plurality of reserved areas 120 and a plurality of effective evaporation zones 110, each of the reserved areas. 120 is disposed outside each of the effective evaporation zones 110, the shape of the port 201 matches the shape of the effective evaporation zone 110, and the port 201 is aligned with the effective evaporation zone 110; The through hole 101 includes a plurality of first through holes 101a and a plurality of second through holes 101b. Each of the first through holes 101a is uniformly formed in the effective vapor deposition zone 110, and each of the second through holes 101b is uniformly opened. The through hole 201 is in communication with each of the first through holes 101a, and the shielding member 200 is disposed in each of the second through holes 101b.

For example, the mask assembly is divided into a reserved area 120 and an effective evaporation zone 110. Specifically, the effective evaporation zone 110 is an effective evaporation zone for vapor deposition to form effective pixels, for example, effective evaporation. The region 110 is used for vapor deposition of the pixel pattern, and the evaporated organic material is evaporated onto the substrate through the first via hole 101a of the effective evaporation region 110, and the first via hole 101a is a pixel hole for evaporating the organic material. Penetrate and vapor deposit on the substrate.

The reserved area 120 is a non-vapor deposition area, and the reserved area 120 may also be referred to as a Dummy area. The reserved area 120 can be regarded as an area formed by the mask assembly extending outside the effective evaporation zone 110, and the reserved area 120 is not used for evaporation.

It is worth mentioning that each of the reserved areas 120 is respectively provided with a second through hole 101b, but the second through hole 101b is not used for evaporation, that is, the second through hole 101b does not pass through the evaporated organic material, in use. The second through hole 101b of the reserved area 120 can be blocked by providing a barrier film in the reserved area 120 to prevent the evaporated organic material from passing through the second through hole 101b of the reserved area 120. That is to say, in the mask assembly of the present embodiment, the evaporation of the pixel pattern is performed only in the effective evaporation region 110 during the evaporation process, and the reserved region 120 does not vaporize the pixel pattern.

For example, the effective vapor deposition zone 110 has an irregular shape, that is, the effective vapor deposition zone 110 is a profiled vapor deposition zone, and the profiled vapor deposition zone 110 is vapor deposited on the substrate to form a shaped pixel pattern. It is also the shaped AA area. For example, the shape of the port 201 is the same as the shape of the effective evaporation zone 110, and the size of the port 201 is equal to the size of the effective evaporation zone 110, for example, the cross section of the port 201 The shape of the effective evaporation zone 110 is the same, for example, the projection shape of the port 201 on the mask 100 is the same as the shape of the effective evaporation zone 110, and the port The projection of 201 on the mask 100 coincides with the effective evaporation zone 110.

In this embodiment, when the vapor deposition is performed, the port 201 is aligned with the effective vapor deposition zone 110, so that the first through holes 101a are aligned with the port 201, and the shielding member 200 abuts on the reserved area 120, and will be reserved. The second through hole 101b of the region 120 is shielded, so that the evaporated organic material can be evaporated on the substrate through the port 201 and the first through hole 101a, and the second through hole 101b of the reserved region 120 is blocked, and the substrate is The position corresponding to the reserved area 120 does not evaporate the organic material, and since the port 201 is better aligned with the effective evaporation zone 110, the shape of the AA zone is more accurate, thereby making the evaporation effect better.

In order to better align the shutter 200 to the mask 100, in one embodiment, the shape of the shutter 200 matches the shape of the reserved area 120, and the shutter 200 is aligned with the pre- Reservation area 120. For example, the shape of the shielding member 200 is the same as the shape of the reserved area 120. For example, the size of the shielding member 200 is equal to the size of the reserved area 120, so that the shape and reservation of the shielding member 200 are reserved. The shapes of the regions 120 are equal, so that the shutter 200 is easily aligned with the reserved area 120, and the second through holes 101b of the reserved area 120 can be sufficiently completely shielded, thereby making the evaporation effect better.

In order to further make the mechanical properties of the portions of the mask 100 uniform, the mask sheet 100 is further prevented from being wrinkled. For example, as shown in FIG. 2, the shape of the second through hole 101b and the first through hole 101a are The shape is the same, and the size of the second through hole 101b is equal to the size of the first through hole 101a, and the interval between the second through holes 101b is equal to the distance between the first through holes 101a. .

Since the reserved area 120 defines the second through hole 101b, since the shape of the second through hole 101b is the same as the shape of the first through hole 101a, the size of the second through hole 101b is equal to the size of the first through hole 101a, and the second The spacing between the through holes 101b is equal to the spacing between the first through holes 101a, and therefore, the reserved area 120 has the same structure as the effective vapor deposition area 110, and therefore, the reserved area 120 has the effective evaporation area 110. With the same mechanical properties, the reserved region 120 and the effective vapor deposition zone 110 have the same stress characteristics, so that the reserved region 120 and the effective vapor deposition zone 110 are not easily wrinkled under the influence of the tensioning force, thereby effectively avoiding pixel color mixing, thereby making it possible to avoid pixel color mixing. The evaporation effect is better, and the yield of AMOLED is improved.

In one embodiment, each of the first through holes 101a is disposed in a rectangular array, and the second through holes 101b are disposed in a rectangular array, and a row spacing of the second through holes 101b is different from that of the first through holes 101a. The row spacing is equal, the column pitch of the second via hole 101b is equal to the column pitch of the first via hole 101a, and at least a portion of the second via hole 101b is aligned with the first via hole 101.

It should be understood that, since the shape of the reserved area 120 is different from the shape of the effective vapor deposition zone 110, not each row of the second through holes 101b in the reserved area 120 and the first through hole of the effective evaporation zone 110 101a is aligned, and not every row of second through holes 101b is aligned with a row of first through holes 101a of the effective evaporation zone 110. Therefore, at least part of the second through holes 101b of the reserved area 120 and the effective evaporation zone 110 The first through holes 101a are aligned, for example, at least one row of the second through holes 101b is aligned with a row of the first through holes 101a, for example, at least one column of the second through holes 101b is aligned with a row of the first through holes 101a That is, a portion of the second through holes 101b corresponding to the first through holes 101a in the reserved area 120, each row is aligned with a row of first through holes 101a, and each column is aligned with a column of the first through holes 101a.

Specifically, in this embodiment, each of the first through holes 101a is arranged in a plurality of rows and columns, and the row spacing between the first through holes 101a of the adjacent two rows is equal, and the first through holes of the adjacent two columns The column spacings between 101a are equal; each of the second through holes 101b is arranged in a plurality of rows and columns, and the row spacing of the second through holes 101b is equal to the row spacing of the first through holes 101a, and the second through holes 101b are The column pitch is equal to the column pitch of the first via hole 101a, and for the second via hole 101b partially aligned with the first via hole 101a, each row of the second via hole 101b is aligned with one row of the first via hole 101a, each column The second through hole 101b is aligned with the first row of the first through holes 101a, such that the distribution structure of the second through holes 101b of the reserved area 120 is the same as that of the first through holes 101a of the effective vapor deposition zone 110, so that the reserved The region 120 has the same structure as the effective vapor deposition zone 110, so that the reserved region 120 has the same mechanical properties as the effective vapor deposition zone 110, further making the evaporation effect better.

In one embodiment, the row spacing of the first via holes 101a is equal to the column pitch, that is, the row spacing of the first via holes 101a is equal to the column pitch of the first via holes 101a, which is in the effective evaporation region 110 in this embodiment. The first through holes 101a are equally spaced in the lateral direction and the longitudinal direction. For example, the row spacing of the second through holes 101b is equal to the column spacing. For example, the row spacing of the second through holes 101b is equal to the second through holes 101b. The column spacing, the second through holes 101b of the reserved area 120 are also equally spaced in the lateral direction and the longitudinal direction, so that the opening distances between the reserved area 120 and the effective evaporation area 110 are equal, which is advantageous for further avoiding the mask. The components produce wrinkles under the influence of the tensioning force, which further makes the evaporation effect better.

In one embodiment, the effective evaporation zone 110 has an irregular shape. For example, the reserved area 120 is a hollow hollow irregular shape, and the shape of the reserved area 120 matches the shape of the effective vapor deposition area 110, and the reserved area 120 surrounds the irregular shape. The vapor deposition zone 110 is such that, by the vapor deposition of the effective vapor deposition zone 110, an irregularly shaped pixel region is formed on the substrate, and the display area of the corresponding display screen is irregular.

Thus, with the above embodiments, the production requirements for the special-shaped display screen can be achieved.

In order to improve the vapor deposition precision of the mask assembly, for example, the positional accuracy of the first through hole 101a is less than 10 μm, for example, the width of the first through hole 101a is greater than or equal to 20 μm, for example, the width of the first through hole 101a. Less than or equal to 30 μm. For example, the positional accuracy of the second through hole 101b is less than 10 μm, for example, the width of the second through hole 101b is greater than or equal to 20 μm, for example, the width of the second through hole 101b is less than or equal to 30 μm.

In one embodiment, the second through hole 101b penetrates through two opposite surfaces of the reserved area 120, that is, the second through hole 101b is a through hole, and both ends of the second through hole 101b are transparent. Thus, the structure of the second through hole 101b is made the same as that of the first through hole 101a, so that the reserved area 120 has the same mechanical properties as the effective vapor deposition area 110, so that the reserved area 120 and the effective evaporation area 110 are It is not easy to produce wrinkles between them, effectively avoiding pixel color mixing, which makes the evaporation effect better.

It should be understood that the via 101 on the mask assembly may be formed by etching. In the evaporation process, in order to prevent the organic material from penetrating from the second via 101b to the substrate, in one embodiment, the second The through hole 101b is a non-permeate hole. For example, the second through hole 101b is provided with a stopper film. In this embodiment, the two ends of the second through hole 101b are not transparent, specifically, the mask assembly is performed. During etching, the second via hole 101b is formed by half etching on the reserved region 120, and the effective vapor deposition region 110 is completely etched to form the first via hole 101a, that is, when the reserved region 120 is etched, the second pass The stopper film is etched in the hole 101b so that the two ends of the second through hole 101b are not transparent, and thus, the reserved area 120 is provided with the second through hole of the same shape and size as the first through hole 101a of the effective vapor deposition zone 110. 101b, therefore, the reserved area 120 has the same mechanical properties as the effective vapor deposition zone 110, effectively avoiding wrinkles, and since the second through hole 101b is not transparent, the organic material after evaporation can be effectively prevented from passing, therefore, It is possible to avoid bits on the corresponding substrate of the reserved area 120 The organic material vapor deposition, thus making vapor deposition better.

It should be understood that the first through hole 101a may be a circular hole, a square hole or a polygonal hole for vapor deposition to form different pixel patterns. In one embodiment, the first through hole 101a and the second pass The holes 101b each have a circular cross section, and the apertures of the first through holes 101a and the apertures of the second through holes 101b are equal. For example, the first through hole 101a and the second through hole 101b are respectively circular in cross section. For example, the first through hole 101a and the second through hole 101b are respectively circular holes.

In one embodiment, the first through hole 101a and the second through hole 101b respectively have a square cross section, and the width of the first through hole 101a and the width of the second through hole 101b are equal. For example, the first through hole 101a and the second through hole 101b are respectively square in cross section. For example, the first through hole 101a and the second through hole 101b are square holes, respectively.

In one embodiment, the first through hole 101a and the second through hole 101b respectively have a polygonal cross section, and the width of the first through hole 101a and the width of the second through hole 101b are equal. For example, the cross-sections of the first through hole 101a and the second through hole 101b are respectively polygonal, and for example, the first through hole 101a and the second through hole 101b are polygonal holes, respectively.

In this way, the first through hole 101a is a circular hole, a square hole or a polygonal hole. In other embodiments, the first through hole 101a can also be an irregularly shaped through hole 101, which is not cumbersome in this embodiment, so that it can adapt to different pixels. The vapor deposition requirement of the pattern, in addition, since the second through hole 101b has the same shape as the first through hole 101a, the reserved area 120 and the effective vapor deposition area 110 have the same stress characteristics, so that the reserved area 120 and the effective evaporation are performed. The area 110 is not easy to produce wrinkles under the influence of the tensioning force, and the pixel color mixing is effectively avoided, so that the evaporation effect is better.

It is worth mentioning that the effective evaporation zone may be multiple, for example, two effective evaporation zones, two effective evaporation zones are adjacently disposed, and the reserved zone is disposed outside the two effective evaporation zones. And between two effective evaporation zones. For another example, there are three effective vapor deposition zones, and, for example, four effective vapor deposition zones. For the implementation of the plurality of effective vapor deposition zones, it is not cumbersome to describe in the embodiment that the number of the effective vapor deposition zones can be etched on the mask device according to the display requirements of the display screen, and the reserved area is set and effectively steamed. The first through holes of the plating zone are shaped, sized, and spaced apart by the second through holes such that the reserved regions and the effective vapor deposition zones have the same stress characteristics.

In the above embodiments, the entire mask 100 is integrally formed with a through hole, and the pixel is opened only in the effective evaporation region of the conventional mask 100, and the pixel is opened in the effective evaporation portion of the entire mask 100. The shape of the pixel opening of the non-active area (reserved area) is the same, and the entire mask 100 is completely filled with the through holes, so that the distribution of the through holes of the entire mask 100 is relatively uniform, so that the mask 100 is effective. The overall mechanical properties of the vapor deposition zone and the reserved zone are consistent. For example, the effective vapor deposition zone and the reserved zone have the same performance parameters in the elastic modulus and the shear modulus, thereby making the high-precision fine mask 100 function in the tensioning force. The lower deformation is consistent, and the high-precision fine mask 100 is prevented from being wrinkled, and the product luminescent pixel mixed by evaporation is reduced.

The technical features of the above-described embodiments may be arbitrarily combined. For the sake of brevity of description, all possible combinations of the technical features in the above embodiments are not described. However, as long as there is no contradiction between the combinations of these technical features, All should be considered as the scope of this manual.

The above-mentioned embodiments are merely illustrative of several embodiments of the present application, and the description thereof is more specific and detailed, but is not to be construed as limiting the scope of the invention. It should be noted that a number of variations and modifications may be made by those skilled in the art without departing from the spirit and scope of the present application. Therefore, the scope of the invention should be determined by the appended claims.

Claims (20)

A mask device comprising: a mask assembly and a mask frame, the mask assembly comprising a mask and a shutter; The edge of the mask is connected to the mask frame; a plurality of through holes are uniformly formed on the mask plate, the shape of each of the through holes is the same, and each of the through holes is equal in size, and the shielding member is provided with a plurality of through holes; The shielding member abuts the masking plate, and each of the through holes is respectively aligned with a portion of the through hole on the masking plate, and the through opening communicates with each of the aligned through holes. The shielding member blocks the remaining portion of the through hole provided on the mask. The mask device according to claim 1, wherein each of the openings has the same shape. The mask device according to claim 1, wherein at least two of said through ports have different shapes. The mask device according to claim 1, wherein the shape of the opening is an irregular shape. The mask device according to claim 2, wherein the shape of the opening is an irregular shape. The mask device according to claim 3, wherein the shape of the opening is an irregular shape. The mask device according to claim 1, wherein the shutter is a shielding film. The mask device according to claim 2, wherein the shutter is a shielding film. The mask device according to claim 3, wherein the shutter is a shielding film. The mask device according to claim 4, wherein the shutter is a shielding film. The mask device according to claim 5, wherein the shutter is a shielding film. The mask device according to claim 6, wherein the shutter is a shielding film. The mask device according to claim 1, wherein each of the through holes is provided in a rectangular array. The mask device according to claim 2, wherein each of the through holes is disposed in a rectangular array. The mask device according to claim 3, wherein each of the through holes is provided in a rectangular array. The mask device according to claim 1, wherein at least two of the through ports have different shapes, the shape of the opening is irregular, and the shielding member is a shielding film. The through holes are arranged in a rectangular array. A mask assembly comprising a mask and a shutter; a plurality of through holes are uniformly formed on the mask plate, the shape of each of the through holes is the same, and each of the through holes is equal in size, and the shielding member is provided with a plurality of through holes; The shielding member abuts the masking plate, and each of the through holes is respectively aligned with a portion of the through hole on the masking plate, and the through opening communicates with each of the aligned through holes. The shielding member blocks the remaining portion of the through hole provided on the mask. A mask assembly according to claim 17, wherein each of said openings has the same shape. A mask assembly according to claim 17, wherein at least two of said through ports have different shapes. a mask plate, the edge of the mask plate is disposed to be connected to a mask frame, the mask plate is uniformly provided with a plurality of through holes, each of the through holes has the same shape, and each of the through holes The dimensions are equal.

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