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WO2018003268A1 - Elastic wave filter device, multiplexer, high-frequency front end circuit, and communication device - Google Patents

Elastic wave filter device, multiplexer, high-frequency front end circuit, and communication device Download PDF

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Publication number
WO2018003268A1
WO2018003268A1 PCT/JP2017/016619 JP2017016619W WO2018003268A1 WO 2018003268 A1 WO2018003268 A1 WO 2018003268A1 JP 2017016619 W JP2017016619 W JP 2017016619W WO 2018003268 A1 WO2018003268 A1 WO 2018003268A1
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Prior art keywords
parallel resonator
parallel
input
resonator
resonators
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French (fr)
Japanese (ja)
Inventor
高峰 裕一
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Murata Manufacturing Co Ltd
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Murata Manufacturing Co Ltd
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    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02Details
    • H03H9/125Driving means, e.g. electrodes, coils
    • H03H9/145Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46Filters
    • H03H9/64Filters using surface acoustic waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/70Multiple-port networks for connecting several sources or loads, working on different frequencies or frequency bands, to a common load or source
    • H03H9/72Networks using surface acoustic waves
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04BTRANSMISSION
    • H04B1/00Details of transmission systems, not covered by a single one of groups H04B3/00 - H04B13/00; Details of transmission systems not characterised by the medium used for transmission
    • H04B1/38Transceivers, i.e. devices in which transmitter and receiver form a structural unit and in which at least one part is used for functions of transmitting and receiving
    • H04B1/40Circuits
    • H04B1/50Circuits using different frequencies for the two directions of communication

Definitions

  • the present invention relates to an elastic wave filter device having a ladder-type resonator structure, a multiplexer including the elastic wave filter device, a high-frequency front-end circuit, and a communication device.
  • Patent Document 1 discloses a surface acoustic wave device that can suppress an increase in insertion loss while narrowing the band.
  • FIG. 8 is a diagram showing a resonator structure and resonance characteristics of the surface acoustic wave device described in Patent Document 1.
  • FIG. 6A series resonators 511a, 511b and 511c, and parallel resonators 512a, 512b, 512c and 512d are arranged in a ladder shape.
  • FIG. 5B the resonance frequencies of the series resonators 511a and 511b among the series resonators 511a to 511c are set lower than the anti-resonance frequencies of the parallel resonators 512a to 512d.
  • the capacitive region of the series resonator 511c is set in the inductive region formed by the parallel resonators 512a to 512d and the series resonators 511a and 511b that form the pass band. It is said that a lossy surface acoustic wave device can be realized.
  • the design method for matching the antiresonance frequencies of the parallel resonators 512a to 512d makes the filter passband width and the steepness of both ends of the passband. It becomes difficult to adjust the characteristics. For example, if the anti-resonance frequencies of all the parallel resonators are arranged in the vicinity of the center of the pass band, the bandwidth may be excessively widened. For example, when a narrow passband is required, such as a 2.4 GHz band WiFi filter, it is not possible to secure a sufficient amount of attenuation on the low frequency side outside the passband. For this reason, it is difficult to realize a narrow band filter having steepness on both the low frequency side and the high frequency side of the pass band while ensuring low loss of the pass band.
  • the present invention has been made to solve the above-described problem, and has a narrow band filter characteristic with good steepness on both the low frequency side and the high frequency side while ensuring low loss in the pass band. It is an object of the present invention to provide an elastic wave filter device, a multiplexer, a high frequency front end circuit, and a communication device.
  • an elastic wave filter device is a ladder-type elastic wave filter device having a series resonator and a parallel resonator, and includes a first input / output terminal and a second input.
  • the anti-resonance frequency of the third parallel resonator that is one of the two or more parallel resonators is Antiresonance of the parallel resonator and the second parallel resonator
  • the resonance frequency of the third parallel resonator is lower than the wave number and lower than the resonance frequency of the first parallel resonator and the second parallel resonator, and is one of the two or more parallel resonators.
  • the anti-resonance frequency of the fourth parallel resonator is higher than the anti-resonance frequencies of the first parallel resonator and the second parallel resonator, and the resonance frequency of the fourth parallel resonator is the first resonance frequency of the first parallel resonator.
  • the resonance frequency is higher than that of the parallel resonator and the second parallel resonator.
  • the anti-resonance frequency of the fourth parallel resonator is set to the anti-resonance frequency of the first parallel resonator closest to the first input / output terminal and the second parallel resonator closest to the second input / output terminal. Shift to a higher frequency side than the anti-resonance frequency. As a result, the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured.
  • the impedance matching on the low frequency side of the passband is shifted due to the effect of shifting the antiresonance frequency of the fourth parallel resonator to the high frequency side, the antiresonance frequency of the third parallel resonator is changed to the first parallel resonator. And the antiresonance frequency of the second parallel resonator. Thereby, the impedance matching can be adjusted.
  • the anti-resonance frequency of the first parallel resonator and the second parallel resonator is between the anti-resonance frequency of the third parallel resonator and the anti-resonance frequency of the fourth parallel resonator, and near the center of the passband.
  • impedance matching does not occur in the first input / output terminal and the second input / output terminal.
  • An elastic wave filter device is a ladder-type elastic wave filter device having a series resonator and a parallel resonator formed of IDT electrodes formed on a substrate having a piezoelectric layer. And three or more series resonators connected in series between the first input / output terminal and the second input / output terminal, the first input / output terminal, the second input / output terminal, and the three or more series resonances. 4 or more parallel resonators connected between one of the connection nodes of the child and the reference terminal, and the first of the four or more parallel resonators connected closest to the first input / output terminal.
  • a third parallel resonance which is one of the two or more parallel resonators
  • the electrode pitch of the child is the first parallel
  • the electrode pitch of the fourth parallel resonator which is larger than the electrode pitch of the pendulum and the second parallel resonator and is one of the two or more parallel resonators, is the first parallel resonator and the second parallel resonator. It is smaller than the electrode pitch of the resonator.
  • the electrode pitch of the fourth parallel resonator is smaller than the electrode pitch of the first parallel resonator closest to the first input / output terminal and the electrode pitch of the second parallel resonator closest to the second input / output terminal. By doing so, the anti-resonance frequency of the fourth parallel resonator is shifted to a higher frequency side than the vicinity of the center in the pass band. As a result, the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured.
  • the electrode pitch of the third parallel resonator is changed to that of the first parallel resonator.
  • the anti-resonance frequency of the third parallel resonator is shifted to the lower frequency side from the vicinity of the center in the pass band.
  • the electrode pitch of the first parallel resonator and the second parallel resonator is between the electrode pitch of the third parallel resonator and the electrode pitch of the fourth parallel resonator, and is the first parallel resonator and the second parallel resonator. Since the antiresonance frequency of the parallel resonator is set near the center of the pass band, impedance matching at the first input / output terminal and the second input / output terminal does not go away. As described above, it is possible to obtain a narrow-band ladder-type filter having good steepness on both the low frequency side and high frequency side of the pass band while ensuring low loss of the pass band.
  • An elastic wave filter device is a ladder-type elastic wave filter device having a series resonator and a parallel resonator formed of IDT electrodes formed on a substrate having a piezoelectric layer. And three or more series resonators connected in series between the first input / output terminal and the second input / output terminal, the first input / output terminal, the second input / output terminal, and the three or more series resonances. 4 or more parallel resonators connected between one of the connection nodes of the child and the reference terminal, and the first of the four or more parallel resonators connected closest to the first input / output terminal.
  • a third parallel resonance which is one of the two or more parallel resonators
  • the electrode duty of the child is
  • the electrode duty of the fourth parallel resonator which is larger than the electrode duty of the parallel resonator and the second parallel resonator and is one of the two or more parallel resonators, is the first parallel resonator and the second parallel resonator. It is smaller than the electrode duty of the two parallel resonators.
  • the electrode duty of the fourth parallel resonator is smaller than the electrode duty of the first parallel resonator closest to the first input / output terminal and the electrode duty of the second parallel resonator closest to the second input / output terminal. By doing so, the anti-resonance frequency of the fourth parallel resonator is shifted to a higher frequency side than the vicinity of the center in the pass band. As a result, the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured.
  • the electrode duty of the third parallel resonator is set to the electrode of the first parallel resonator.
  • the anti-resonance frequency of the third parallel resonator is shifted to the lower frequency side than the vicinity of the center in the pass band.
  • the electrode duty of the first parallel resonator and the second parallel resonator is between the electrode duty of the third parallel resonator and the electrode duty of the fourth parallel resonator, and is the first parallel resonator and the second parallel resonator. Since the antiresonance frequency of the parallel resonator is set near the center of the pass band, impedance matching at the first input / output terminal and the second input / output terminal does not go away. As described above, it is possible to obtain a narrow-band ladder-type filter having good steepness on both the low frequency side and high frequency side of the pass band while ensuring low loss of the pass band.
  • the substrate includes a piezoelectric layer in which the IDT electrode is formed on one main surface, and a high-sonic velocity supporting substrate whose bulk wave velocity is higher than an acoustic wave velocity that propagates through the piezoelectric layer. And a low sound velocity film disposed between the high sound velocity support substrate and the piezoelectric layer and having a bulk wave sound velocity propagating at a lower speed than an elastic wave sound velocity propagating through the piezoelectric layer. .
  • each resonator including the IDT electrode formed on the substrate having the piezoelectric layer can be maintained at a high value.
  • the multiplexer is a multiplexer that demultiplexes an input signal by including a plurality of bandpass filters that selectively pass a predetermined frequency band, and the plurality of bandpass filters pass through the multiplexer.
  • Each of the frequency bands is different, one end of each of the plurality of band pass filters is connected to a common terminal, and at least one of the plurality of band pass filters is any one of the elastic wave filter devices. .
  • a high-frequency front-end circuit includes any one of the elastic wave filter devices or the multiplexer and an amplifier circuit that is connected to the elastic wave filter device and amplifies a high-frequency signal.
  • a communication device includes the high-frequency front end circuit and an RF signal processing circuit that processes a high-frequency signal.
  • an elastic wave filter device a multiplexer, a high-frequency front-end circuit, and a communication having a narrow-band filter characteristic with good steepness on both the low-frequency side and the high-frequency side while ensuring a low loss in the pass band
  • An apparatus can be provided.
  • FIG. 1 is a circuit configuration diagram of an acoustic wave filter device according to an embodiment.
  • FIG. 2 is a plan view and a cross-sectional view schematically illustrating a resonator of the acoustic wave filter device according to the embodiment.
  • FIG. 3 is a circuit configuration diagram illustrating a principle of operation of a ladder-type elastic wave filter and a graph showing frequency characteristics.
  • FIG. 4 is a cross-sectional view illustrating a mounting configuration of the acoustic wave filter device according to the embodiment.
  • FIG. 5 is a graph showing filter pass characteristics and resonance characteristics of the acoustic wave filter device according to the example.
  • FIG. 6 is a graph comparing the filter pass characteristics of the elastic wave filter devices according to the example and the comparative example.
  • FIG. 1 is a circuit configuration diagram of an acoustic wave filter device according to an embodiment.
  • FIG. 2 is a plan view and a cross-sectional view schematically illustrating a resonator of the
  • FIG. 7 is a circuit configuration diagram of a high-frequency front-end circuit and a communication device having an elastic wave filter device according to an embodiment.
  • FIG. 8 is a diagram showing a resonator structure and resonance characteristics of the surface acoustic wave device described in Patent Document 1. In FIG.
  • Example [1. Basic configuration of elastic wave filter device] A basic configuration of an elastic wave filter device according to an embodiment of the present invention will be described. In this embodiment, a band-pass surface acoustic wave filter applied to a 2.4 GHz band WiFi (2400-2483 MHz) is illustrated.
  • FIG. 1 is a circuit configuration diagram of an elastic wave filter device 21 according to an embodiment.
  • the acoustic wave filter device 21 includes series resonators 101, 102, 103, 104, and 105, parallel resonators 151, 152, 153, and 154, input / output terminals 100 and 120, Is provided.
  • the series resonators 101 to 105 are connected in series between the input / output terminal 100 and the input / output terminal 120.
  • the parallel resonators 151 to 154 are connected in parallel between connection points of the input / output terminal 100, the input / output terminal 120, and the series resonators 101 to 105, and a reference terminal (ground). Due to the above-described connection configuration of the series resonators 101 to 105 and the parallel resonators 151 to 154, the acoustic wave filter device 21 constitutes a ladder type band pass filter.
  • the number of series resonators and parallel resonators of the acoustic wave filter device according to the present invention is not limited to 5 and 4, respectively, and there may be 2 or more series resonators and 4 or more parallel resonators. That's fine. Further, for a ladder structure composed of two or more series resonators and four or more parallel resonators, for example, a longitudinally coupled resonance is provided between the input / output terminal 100 and the input / output terminal 120. A child or the like may be connected.
  • the reference terminal (ground) to which the parallel resonators 152 to 154 are connected is shared, but the reference terminal (ground) to which the parallel resonators 151 to 154 are connected is shared. Or may be individualized.
  • circuit elements such as inductors and capacitors may be inserted or connected to connection points of the input / output terminals 100 and 120, the series resonators 101 to 105, and the parallel resonators 151 to 154.
  • the elastic wave filter device 21 is applied to the 2.4 GHz band WiFi.
  • the elastic wave filter device according to the present invention is not limited to WiFi and can be applied to other frequency bands. It is.
  • Resonator structure of acoustic wave filter device The structure of each resonator that is a component of the acoustic wave filter device 21 will be described.
  • the series resonator and the parallel resonator constituting the acoustic wave filter device 21 according to the present embodiment are surface acoustic wave (SAW) resonators.
  • FIG. 2 is a plan view and a cross-sectional view schematically showing a resonator of the acoustic wave filter device 21 according to the embodiment.
  • a schematic plan view and a schematic cross-sectional view showing the structure of the series resonator 101 among a plurality of resonators constituting the acoustic wave filter device 21 are illustrated.
  • the series resonator 101 shown in FIG. 2 is for explaining a typical structure of the plurality of resonators, and the number and length of electrode fingers constituting the electrode are the same. It is not limited.
  • Each resonator of the acoustic wave filter device 21 includes a substrate 220 having a piezoelectric layer 227 and IDT (InterDigital Transducer) electrodes 22a and 22b having a comb shape.
  • IDT InterDigital Transducer
  • the IDT electrode 22a includes a plurality of electrode fingers 222a that are parallel to each other and a bus bar electrode 221a that connects the plurality of electrode fingers 222a.
  • the IDT electrode 22b includes a plurality of electrode fingers 222b that are parallel to each other and a bus bar electrode 221b that connects the plurality of electrode fingers 222b.
  • the plurality of electrode fingers 222a and 222b are formed along a direction orthogonal to the X-axis direction.
  • the IDT electrode 22 composed of the plurality of electrode fingers 222a and 222b and the bus bar electrodes 221a and 221b has a laminated structure of the adhesion layer 223 and the main electrode layer 224 as shown in the cross-sectional view of FIG. ing.
  • the adhesion layer 223 is a layer for improving adhesion between the piezoelectric layer 227 and the main electrode layer 224, and Ti is used as a material, for example.
  • the film thickness of the adhesion layer 223 is 12 nm, for example.
  • the main electrode layer 224 is made of, for example, Al containing 1% Cu.
  • the film thickness of the main electrode layer 224 is, for example, 131 nm.
  • the protective layer 225 is formed so as to cover the IDT electrodes 22a and 22b.
  • the protective layer 225 is a layer for the purpose of protecting the main electrode layer 224 from the external environment, adjusting frequency temperature characteristics, and improving moisture resistance, for example, a film mainly composed of silicon dioxide. .
  • the film thickness of the protective layer 225 is, for example, 30 nm.
  • the materials constituting the adhesion layer 223, the main electrode layer 224, and the protective layer 225 are not limited to the materials described above. Furthermore, the IDT electrode 22 may not have the above-described laminated structure.
  • the IDT electrode 22 may be made of, for example, a metal or alloy such as Ti, Al, Cu, Pt, Au, Ag, or Pd, or may be made of a plurality of laminates made of the above metal or alloy. May be. Further, the protective layer 225 may not be formed.
  • the substrate 220 includes a high sound speed support substrate 228, a low sound speed film 226, and a piezoelectric layer 227.
  • the high sound speed support substrate 228, the low sound speed film 226, and the piezoelectric layer 227 are provided. It has a laminated structure in this order.
  • the piezoelectric layer 227 is formed of, for example, a 50 ° Y-cut X-propagating LiTaO 3 piezoelectric single crystal or a piezoelectric ceramic (lithium tantalate unit cut along a plane whose normal is an axis rotated by 50 ° from the Y axis with the X axis as the central axis. A single crystal or ceramics in which a surface acoustic wave propagates in the X-axis direction).
  • the thickness of the piezoelectric layer 227 is 3.5 ⁇ or less, for example, 450 nm when the wavelength of the elastic wave determined by the electrode pitch of the IDT electrode 22 is ⁇ .
  • the electrode pitch of the IDT electrode 22 refers to the distance between the centers of adjacent electrode fingers in the IDT electrode 22.
  • the high sound velocity support substrate 228 is a substrate that supports the low sound velocity film 226, the piezoelectric layer 227, and the IDT electrode 22.
  • the high-sonic support substrate 228 is a substrate in which the acoustic velocity of the bulk wave in the high-sonic support substrate 228 is higher than that of the surface wave or boundary wave that propagates through the piezoelectric layer 227.
  • the piezoelectric layer 227 and the low acoustic velocity film 226 are confined in a laminated portion and function so as not to leak downward from the high acoustic velocity support substrate 228.
  • the high sound speed support substrate 228 is, for example, a silicon substrate and has a thickness of, for example, 200 ⁇ m.
  • the high sound velocity support substrate 228 includes (1) a piezoelectric body such as aluminum nitride, aluminum oxide, silicon carbide, silicon nitride, silicon, sapphire, lithium tantalate, lithium niobate, or quartz, (2) alumina, zirconia, Various ceramics such as cordierite, mullite, steatite, or forsterite, (3) magnesia diamond, (4) materials containing the above materials as main components, and (5) mixtures of the above materials as main components. You may be comprised with either of materials.
  • the low acoustic velocity film 226 is a membrane in which the acoustic velocity of the bulk wave in the low acoustic velocity film 226 is lower than the acoustic velocity of the elastic wave propagating through the piezoelectric layer 227.
  • the low acoustic velocity membrane 226 is formed between the piezoelectric layer 227 and the high acoustic velocity support substrate 228. Arranged between. Due to this structure and the property that energy is concentrated in a medium where acoustic waves are essentially low in sound velocity, leakage of surface acoustic wave energy to the outside of the IDT electrode is suppressed.
  • the low acoustic velocity film 226 is, for example, a film mainly composed of silicon dioxide.
  • the thickness of the low acoustic velocity film 226 is 2 ⁇ or less, for example, 505 nm, where ⁇ is the wavelength of the elastic wave determined by the electrode pitch of the IDT electrode 22.
  • the Q value at the resonance frequency and the anti-resonance frequency can be significantly increased as compared with the conventional structure in which the piezoelectric substrate is used as a single layer. That is, since a surface acoustic wave resonator having a high Q value can be configured, a filter with a small insertion loss can be configured using the surface acoustic wave resonator.
  • the high sound velocity support substrate 228 has a structure in which a support substrate and a high sound velocity film in which the sound velocity of a propagating bulk wave is higher than that of a surface wave or boundary wave propagating in the piezoelectric layer 227 is laminated.
  • the support substrate is a piezoelectric material such as sapphire, lithium tantalate, lithium niobate, crystal, alumina, magnesia, silicon nitride, aluminum nitride, silicon carbide, zirconia, cordierite, mullite, steatite, forsterite, etc.
  • the high sound velocity film includes various materials such as aluminum nitride, aluminum oxide, silicon carbide, silicon nitride, silicon oxynitride, DLC film or diamond, a medium mainly composed of the above materials, and a medium mainly composed of a mixture of the above materials. High sound velocity material can be used.
  • the IDT electrode 22 constituting the acoustic wave filter device 21 is formed on the substrate 220 having the piezoelectric layer 227.
  • the substrate on which the IDT electrode 22 is formed is piezoelectric.
  • a piezoelectric substrate made of a single layer of the body layer 227 may be used.
  • the piezoelectric substrate in this case is composed of, for example, a LiTaO 3 piezoelectric single crystal or another piezoelectric single crystal such as LiNbO 3 .
  • the substrate on which the IDT electrode 22 is formed may have a structure in which a piezoelectric layer is laminated on a support substrate in addition to a piezoelectric layer as a whole as long as it has a piezoelectric layer.
  • the piezoelectric layer 227 according to the embodiment is obtained by using a 50 ° Y-cut X-propagation LiTaO 3 single crystal, cut angles of single crystal material is not limited thereto.
  • the laminated structure, material, and thickness may be appropriately changed according to the required pass characteristics of the acoustic wave filter device, and a LiTaO 3 piezoelectric substrate or a LiNbO 3 piezoelectric substrate having a cut angle other than the above is used. The same effect can be achieved even with the conventional surface acoustic wave filter.
  • the wavelength of the surface acoustic wave resonator is defined by a wavelength ⁇ that is a repetition period of the plurality of electrode fingers 222a or 222b constituting the IDT electrode 22 shown in the middle stage of FIG.
  • the electrode pitch is 1 ⁇ 2 of the wavelength ⁇
  • the line width of the electrode fingers 222a and 222b constituting the IDT electrodes 22a and 22b is W
  • the space width between the adjacent electrode fingers 222a and 222b Is defined as (W + S).
  • the crossing width L of the IDT electrode is an overlapping electrode finger length when viewed from the X-axis direction of the electrode finger 222a of the IDT electrode 22a and the electrode finger 222b of the IDT electrode 22b. It is.
  • the electrode duty of each resonator is the line width occupation ratio of the plurality of electrode fingers 222a and 222b, and is the ratio of the line width to the sum of the line width and the space width of the plurality of electrode fingers 222a and 222b. , W / (W + S).
  • FIG. 3 is a circuit configuration diagram illustrating a principle of operation of a ladder-type elastic wave filter and a graph showing frequency characteristics.
  • the elastic wave filter shown in FIG. 3 (a) is a basic ladder type filter composed of one series resonator 50s and one parallel resonator 50p.
  • the parallel resonator 50p has a resonance frequency frp and an anti-resonance frequency fap (> frp) in resonance characteristics.
  • the series resonator 50s has a resonance frequency frs and an anti-resonance frequency fas (> frs> frp) in resonance characteristics.
  • the anti-resonance frequency fap of the parallel resonator 50p and the resonance frequency frs of the series resonator 50s are brought close to each other.
  • the vicinity of the resonance frequency frp in which the impedance of the parallel resonator 50p approaches 0 becomes a low-frequency side stop band.
  • the impedance of the parallel resonator 50p increases near the antiresonance frequency fap, and the impedance of the series resonator 50s approaches 0 near the resonance frequency frs.
  • the signal path from the input / output terminals 100 to 120 becomes a signal pass band. Further, when the frequency becomes high and near the anti-resonance frequency fas, the impedance of the series resonator 50s becomes high, which becomes a high-frequency side blocking region.
  • the number of resonance stages composed of parallel resonators and series resonators is appropriately optimized according to the required specifications.
  • the anti-resonance frequencies fap of the plurality of parallel resonators are substantially matched, and the anti-resonance frequencies fas of the plurality of series resonators are substantially matched.
  • the acoustic wave filter having the above operation principle, when a high-frequency signal is input from the input / output terminal 100, a potential difference is generated between the input / output terminal 100 and the reference terminal, which causes the piezoelectric layer to be distorted, thereby causing an X direction.
  • Surface acoustic waves propagating to the surface are generated.
  • the pitch ⁇ of the IDT electrodes 22a and 22b substantially coincide with the wavelength of the pass band, only a high-frequency signal having a frequency component to be passed passes through the elastic wave filter.
  • FIG. 4 is a cross-sectional view showing a mounting configuration of the acoustic wave filter device 21 according to the embodiment.
  • the acoustic wave filter device 21 shown in the figure includes a substrate 220 having a piezoelectric layer, an IDT electrode 22, an electrode pad 233, a support layer 231, a cover layer 232, an under bump metal 234, and a bump 235. And a mounting board 23 and a resin member 24.
  • the acoustic wave filter device 21 according to the present embodiment has a so-called WLP (Wafer Level Package) structure in which a substrate 220 having an acoustic wave propagation function also serves as a package function, and realizes a reduction in size and height. Yes.
  • WLP structure is applied to a SAW filter such as the elastic wave filter device 21.
  • the IDT electrode 22 is a functional electrode that converts an elastic wave propagating through the substrate 220 into an electric signal, or converts an electric signal into the elastic wave.
  • the electrode pad 233 is electrically connected to the IDT electrode 22, is formed on the surface of the substrate 220, extracts an electric signal converted by the IDT electrode 22, or supplies the electric signal to the IDT electrode 22.
  • the electrode pad 233 is, for example, a stacked body of terminal electrodes 233a and wiring electrodes 233b.
  • the terminal electrode 233 a is an electrode connected to the IDT electrode 22 and is provided around the IDT electrode 22.
  • the terminal electrode 233a is made of the same material as the IDT electrode 22.
  • the wiring electrode 233b is an electrode electrically connected to the terminal electrode 233a, and constitutes a part of a wiring path for connecting the IDT electrode 22 and the external wiring.
  • the terminal electrode 233a and the wiring electrode 233b may be composed of a plurality of laminated bodies composed of metals or alloys.
  • the support layer 231 is a support member formed so as to surround the IDT electrode 22.
  • the cover layer 232 is a cover member formed on the support layer 231.
  • the substrate 220, the support layer 231 and the cover layer 232 seal the IDT electrode 22 in the hollow space 236.
  • a via hole (through hole) reaching the electrode pad 233 is formed in the cover layer 232 and the support layer 231.
  • This via hole is filled with an under bump metal 234.
  • the under bump metal 234 penetrates the cover layer 232 and the support layer 231 and is formed above the substrate 220.
  • a bump 235 exposed to the outside is formed on the under bump metal 234.
  • the bump 235 is formed so as to protrude from the cover layer 232.
  • the bump 235 is a ball-shaped electrode made of a highly conductive metal, and examples thereof include a solder bump made of Sn / Ag / Cu and a bump mainly composed of Au.
  • the mounting board 23 is a board on which the acoustic wave filter is mounted, and is, for example, a printed board or a ceramic board.
  • a land electrode 237 and wiring are formed on one main surface of the mounting substrate 23.
  • the substrate 220 and the IDT electrode 22 are flip-chip mounted (flip chip bonding) on the land electrode 237 of the mounting substrate 23 via bumps 235.
  • the resin member 24 is a sealing member that contacts the main surface of the mounting substrate 23 and covers the substrate 220, the IDT electrode 22, and the cover layer 232.
  • the arrangement of the resin member 24 enhances the reliability of the acoustic wave filter device 21 such as airtightness, heat resistance, water and moisture resistance, and insulation.
  • the resin member 24 is made of a resin such as an epoxy resin, for example.
  • the resin member 24 may include a thermosetting epoxy resin containing an inorganic filler such as SiO 2 .
  • the resin member 24 is not formed in the hollow space 236 but is filled between the cover layer 232 and the mounting substrate 23 and between the plurality of bumps 235.
  • the mounting configuration of the elastic wave filter device 21 according to the present invention is not limited to the mounting configuration described above.
  • the main surface of the piezoelectric substrate on which the IDT electrodes are not formed may be mounted on a mounting substrate with gold bumps or may have a structure other than WLP.
  • an elastic wave filter device 21 includes series resonators 101 to 105, parallel resonators 151 to 154, and input / output terminals 100 and 120.
  • the series resonators 101 to 105 are connected in series between the input / output terminal 100 (first input / output terminal) and 120 (second input / output terminal).
  • the parallel resonators 151 to 154 are connected in parallel to each other between the input / output terminals 100 and 120 and the connection points of the series resonators 101 to 105 and the reference terminal (ground). Due to the above-described connection configuration of the series resonators 101 to 105 and the parallel resonators 151 to 154, the acoustic wave filter device 21 constitutes a ladder type band pass filter.
  • Table 1 shows the design parameters (wavelength ⁇ (electrode pitch ⁇ 2), cross width L, IDT logarithm N, electrode) of the series resonators 101 to 105 and the parallel resonators 151 to 154 of the elastic wave filter device 21 according to the present embodiment. Details of duty D) are shown.
  • FIG. 5 is a graph showing filter pass characteristics and resonance characteristics of the acoustic wave filter device 21 according to the embodiment.
  • the upper part of the figure shows the pass characteristic (insertion loss) between the input / output terminals 100 and 120 of the elastic wave filter device 21 according to the example, and the lower part of the figure shows the elastic characteristic according to the example.
  • the impedance characteristic of each parallel resonator constituting the wave filter device 21 is shown.
  • the antiresonance frequency fap152 of the parallel resonator 152 (third parallel resonator) is equal to the antiresonance of the parallel resonator 151 (first parallel resonator) as shown in the impedance characteristics of FIG. It is lower than the frequency fap 151 and the antiresonance frequency fap 154 of the parallel resonator 154 (second parallel resonator).
  • the antiresonance frequency fap153 of the parallel resonator 153 (fourth parallel resonator) is equal to the antiresonance frequency fap154 of the parallel resonator 154 (second parallel resonator) and the antiresonance frequency fap154 of the parallel resonator 151 (first parallel resonator). It is higher than the resonance frequency fap151.
  • the antiresonance frequencies fap151 and fap154 of the parallel resonators 151 and 154 are set at substantially the center of the passband.
  • the resonance frequency of the parallel resonator 152 is lower than the resonance frequency of the parallel resonator 151 and the parallel resonator 154.
  • the resonance frequency of the parallel resonator 153 is higher than the resonance frequency of the parallel resonator 154 and the parallel resonator 151.
  • FIG. 6 is a graph comparing the filter pass characteristics of the elastic wave filter devices according to the example and the comparative example.
  • the acoustic wave filter device of the comparative example has the ladder-type resonance circuit configuration shown in FIG. 1, but the anti-resonance frequencies of the four parallel resonators are substantially the same frequency and pass band. It is set at almost the center.
  • the pass is narrower than the pass band determined by the electromechanical coupling coefficient of the piezoelectric layer. Even if it is intended to obtain the filter characteristics of the band, the bandwidth becomes too wide. For this reason, for example, as shown in FIG. 6 (broken line), it is not possible to secure an attenuation amount on the low frequency side outside the pass band, and the attenuation specification on the low frequency side defined by the relationship with the adjacent frequency band. Can not be satisfied.
  • the electrode pitch of the parallel resonator 153 (fourth parallel resonator) is closest to the input / output terminal 120 as shown in the resonance characteristics of FIG.
  • the electrode pitch of the parallel resonator 154 (second parallel resonator) and the electrode pitch of the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100 are made smaller.
  • the antiresonance frequency fap153 of the parallel resonator 153 is shifted to a higher frequency side than the vicinity of the center in the passband.
  • the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured.
  • the electrode pitch of the parallel resonator is the electrode pitch of the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100 and the parallel resonator 154 (second parallel resonator) closest to the input / output terminal 120. It is larger than the electrode pitch.
  • the anti-resonance frequency fap 152 of the parallel resonator 152 is shifted to the lower frequency side than the vicinity of the center in the pass band.
  • the impedance matching (capacitive and inductive degree) can be adjusted.
  • the electrode pitch of the parallel resonator 151 (first parallel resonator) and 154 (second parallel resonator) is equal to the electrode pitch of the parallel resonator 152 (third parallel resonator) and the parallel resonator 153. It is between the electrode pitches of (fourth parallel resonator). For this reason, the impedance matching at the input / output terminals 100 and 120 of the acoustic wave filter device 21 is not shifted, and an optimized state can be maintained. In other words, in the acoustic wave filter device 21 according to the embodiment of the present invention, a low-loss and narrow-band filter is realized without deteriorating impedance matching with an external circuit at the input / output terminals.
  • the antiresonance frequencies of the other parallel resonators are shifted while the antiresonance frequencies of the closest parallel resonators 151 and 154 are fixed near the center of the pass band.
  • the pass band width on the low pass band side can be narrowed and the attenuation on the low frequency side outside the pass band can be secured.
  • the pass band width can be narrowed, and the attenuation amount on the high frequency side outside the pass band can be secured.
  • the electrode pitch of the parallel resonator 152 (third parallel resonator) is set to the electrode pitch of the parallel resonator 151 (first parallel resonator) that is closest to the input / output terminal 100 and the parallel that is closest to the input / output terminal 120. It is larger than the electrode pitch of the resonator 154 (second parallel resonator).
  • the anti-resonance frequency fap 152 of the parallel resonator 152 is shifted to the lower frequency side than the vicinity of the center in the pass band.
  • the pass band width on the high pass band side can be narrowed, and the attenuation on the high frequency side outside the pass band can be secured.
  • the electrode pitch of the parallel resonator is the electrode pitch of the parallel resonator 154 (second parallel resonator) closest to the input / output terminal 120 and the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100. It is made smaller than the electrode pitch.
  • the antiresonance frequency fap153 of the parallel resonator 153 is shifted to a higher frequency side than the vicinity of the center in the passband.
  • the impedance matching (capacitive and inductive degree) can be adjusted.
  • the elastic wave filter device 21 obtains a narrow band ladder type filter with good steepness in both the low frequency side and the high frequency side while ensuring low loss in the pass band. It becomes possible.
  • the antiresonance frequency fap152 of the parallel resonator 152 is the antiresonance frequency fap151 of the parallel resonator 151 (first parallel resonator).
  • the parallel resonator 154 (second parallel resonator) is lower than the anti-resonance frequency fap 154, and the parallel resonator 153 (fourth parallel resonator) has an anti-resonance frequency fap 153 of the parallel resonator 154 (second parallel resonator).
  • the relationship between the electrode pitches of the parallel resonators is defined as in Equation 1.
  • the elastic wave filter device according to the present invention is not limited to this.
  • the elastic wave filter device may define the electrode duty of each parallel resonator instead of defining the magnitude relation of the electrode pitch of each parallel resonator. That is, the relationship of the following formula 2 may be satisfied.
  • the antiresonance frequency fap153 of the parallel resonator 153 is shifted to a higher frequency side than the vicinity of the center in the passband.
  • the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured.
  • impedance matching (capacity and inductivity) on the low frequency side of the passband shifts due to the effect of shifting the anti-resonance frequency fap153 of the parallel resonator 153 to the high frequency side.
  • the electrode duty of the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100 and the parallel resonator 154 (second parallel resonator) closest to the input / output terminal 120 are set. It is larger than the electrode duty.
  • the anti-resonance frequency fap 152 of the parallel resonator 152 is shifted to the lower frequency side than the vicinity of the center in the pass band.
  • the impedance matching (capacitive and inductive degree) can be adjusted.
  • the electrode duty of the parallel resonator 151 (first parallel resonator) and 154 (second parallel resonator) is the same as that of the parallel resonator 152 (third parallel resonator) and the parallel resonator 153 (fourth parallel resonator). It is between the electrode duty of the resonator. For this reason, the impedance matching at the input / output terminals 100 and 120 of the acoustic wave filter device 21 is not shifted, and an optimized state can be maintained. In other words, in the acoustic wave filter device 21 according to the embodiment of the present invention, a low-loss and narrow-band filter is realized without deteriorating impedance matching with an external circuit at the input / output terminals.
  • the antiresonance frequencies of the other parallel resonators are shifted while the antiresonance frequencies of the closest parallel resonators 151 and 154 are fixed near the center of the pass band.
  • the electrode duty of the parallel resonator 152 (third parallel resonator) is set closest to the electrode duty of the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100 and the input / output terminal 120.
  • the electrode duty of the parallel resonator 154 (second parallel resonator) is larger.
  • the anti-resonance frequency fap 152 of the parallel resonator 152 is shifted to the lower frequency side than the vicinity of the center in the pass band.
  • the pass band width on the high pass band side can be narrowed, and the attenuation on the high frequency side outside the pass band can be secured.
  • the impedance matching (capacity and inductivity) on the high frequency side of the passband shifts due to the effect of shifting the anti-resonance frequency fap152 of the parallel resonator 152 to the low frequency side.
  • the electrode duty of the parallel resonator 154 (second parallel resonator) closest to the input / output terminal 120 and the parallel resonator 151 (first parallel resonance) closest to the input / output terminal 100 are set. Smaller than the electrode duty of the child).
  • the antiresonance frequency fap153 of the parallel resonator 153 is shifted to a higher frequency side than the vicinity of the center in the passband.
  • the impedance matching (capacitive and inductive degree) can be adjusted.
  • the electrode duty is changed as described above, it is possible to obtain a narrow band ladder type filter with good steepness on both the low frequency side and the high frequency side while ensuring low loss in the pass band.
  • the electrode pitches of the parallel resonators 151 to 154 are substantially the same.
  • FIG. 7 is a circuit configuration diagram of the high-frequency front-end circuit 10 and the communication device 1 having the elastic wave filter device 21 according to the embodiment.
  • a high frequency front end circuit 10 an antenna element 2, an impedance matching circuit 5, an RF signal processing circuit (RFIC) 3, and a baseband signal processing circuit (BBIC) 4 are shown.
  • RFIC RF signal processing circuit
  • BBIC baseband signal processing circuit
  • the high-frequency front-end circuit 10, the RF signal processing circuit 3, and the baseband signal processing circuit 4 constitute the communication device 1.
  • the high frequency front end circuit 10 includes elastic wave filter devices 11 and 21, a power amplifier circuit 31, and a low noise amplifier circuit 41.
  • the power amplifier circuit 31 amplifies the high-frequency transmission signal output from the RF signal processing circuit 3 and outputs it to the antenna element 2 via the input / output terminal 110, the elastic wave filter device 11, and the impedance matching circuit 5. It is.
  • the low noise amplifier circuit 41 is a reception amplification circuit that amplifies a high-frequency signal that has passed through the antenna element 2, the impedance matching circuit 5, and the elastic wave filter device 21 and outputs the amplified signal to the RF signal processing circuit 3.
  • the acoustic wave filter device 11 is a filter that is connected to the antenna element 2 via the impedance matching circuit 5 and selectively passes, for example, a high-frequency signal in the Band A transmission band.
  • the acoustic wave filter device 21 is a filter that is connected to the antenna element 2 via the impedance matching circuit 5 and selectively passes, for example, a high-frequency signal in the Band A reception band.
  • the RF signal processing circuit 3 performs signal processing on the high-frequency reception signal input from the antenna element 2 via the reception signal path by down-conversion or the like, and the received signal generated by the signal processing is a baseband signal processing circuit 4. Output to. Further, the RF signal processing circuit 3 performs signal processing on the transmission signal input from the baseband signal processing circuit 4 by up-conversion or the like, and outputs the high-frequency transmission signal generated by the signal processing to the power amplifier circuit 31.
  • the RF signal processing circuit 3 is, for example, an RFIC (Radio Frequency Integrated Circuit).
  • the signal processed by the baseband signal processing circuit 4 is used, for example, for displaying an image as an image signal or for a call as an audio signal.
  • the high-frequency front end circuit 10 may include other circuit elements between the elastic wave filter devices 11 and 21, the power amplifier circuit 31, and the low noise amplifier circuit 41.
  • the elastic wave filter device according to the above embodiment can be applied to at least one of the elastic wave filter devices 11 and 21.
  • the high-frequency front-end circuit 10 having a narrow-band filter having good steepness on both the low-frequency side and the high-frequency side while ensuring a low loss in the passband.
  • the communication device 1 having a narrow band filter with good steepness on both the low frequency side and the high frequency side while ensuring low loss of the pass band.
  • the communication device 1 may not include the baseband signal processing circuit (BBIC) 4 according to the high-frequency signal processing method.
  • BBIC baseband signal processing circuit
  • the elastic wave filter devices 11 and 21 may be duplexers for simultaneously transmitting and receiving the Band A transmission signal and the reception signal.
  • the elastic wave filter devices 11 and 21 do not have to be transmission filters and reception filters in the same band, but may be transmission filters in different bands or reception filters in different bands. That is, the elastic wave filter device 21 according to the present embodiment may be applied to a filter constituting a duplexer or a multiplexer.
  • the acoustic wave filter apparatus which concerns on this invention is not limited to a surface acoustic wave filter, and is comprised with a series resonator and a parallel resonator.
  • An elastic wave filter device using boundary acoustic waves or BAW (Bulk Acoustic Wave) may be used. Also by this, the same effect as the effect which the surface acoustic wave filter concerning the above-mentioned embodiment has is produced.
  • the present invention can be widely used in communication devices such as mobile phones as an elastic wave filter device, a multiplexer, a high-frequency front-end circuit, and a communication device that can be applied to a frequency standard with a narrow bandwidth and a narrow band interval.

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Abstract

Provided is a ladder-type elastic wave filter device (21) comprising parallel resonators (151-154) and series resonators (101-105) configured from an IDT electrode (22) that is formed on a substrate (220) having a piezoelectric layer (227). In the parallel resonators (152 and 153) excluding the parallel resonator (151) connected closest to an input power terminal (100) and the parallel resonator (154) connected closet to an output power terminal (120) among the parallel resonators (151-154), the anti-resonance frequency fap152 of the parallel resonator (152) is lower than the anti-resonances frequencies fap151 and fap154 of the parallel resonators (151 and 154), and the anti-resonance frequency fap153 of the parallel resonator (153) is higher than the anti-resonance frequencies fap151 and fap154 of the parallel resonators (151 and 154).

Description

弾性波フィルタ装置、マルチプレクサ、高周波フロントエンド回路および通信装置Elastic wave filter device, multiplexer, high-frequency front-end circuit, and communication device

 本発明は、ラダー型の共振子構造を有する弾性波フィルタ装置、ならびに当該弾性波フィルタ装置を備えるマルチプレクサ、高周波フロントエンド回路および通信装置に関する。 The present invention relates to an elastic wave filter device having a ladder-type resonator structure, a multiplexer including the elastic wave filter device, a high-frequency front-end circuit, and a communication device.

 無線通信のための周波数資源を有効活用するという観点から、携帯端末などの通信帯域として、多様な周波数帯域が割り当てられる。また、近年のデータ通信量の増大や携帯端末の多機能化のため、周波数帯域が近いRF(Radio Frequency)回路が、1つの携帯端末に同時に使用されることが多くなってきた。例えば、2.4GHz帯WiFi(2400-2483MHz)の場合、低周波側にはBand40(2300-2400MHz)が存在し、高周波側にはBand7(送信帯域:2500-2570MHz、受信帯域:2620-2690MHz)が存在するため、2.4GHz帯WiFi用フィルタには、低周波側および高周波側の両方の急峻性が必要となる。 From the viewpoint of effectively using frequency resources for wireless communication, various frequency bands are allocated as communication bands for mobile terminals and the like. In addition, in recent years, due to an increase in data communication amount and multi-functionality of mobile terminals, RF (Radio Frequency) circuits having close frequency bands are often used simultaneously for one mobile terminal. For example, in the case of 2.4 GHz band WiFi (2400-2483 MHz), Band 40 (2300-2400 MHz) exists on the low frequency side, and Band 7 (transmission band: 2500-2570 MHz, reception band: 2620-2690 MHz) on the high frequency side. Therefore, the 2.4 GHz band WiFi filter requires steepness on both the low frequency side and the high frequency side.

 特許文献1には、狭帯域化を図りながら、挿入損失の増加を抑制できる弾性表面波装置が開示されている。 Patent Document 1 discloses a surface acoustic wave device that can suppress an increase in insertion loss while narrowing the band.

 図8は、特許文献1に記載された弾性表面波装置の共振子構造および共振特性を示す図である。特許文献1に記載された弾性表面波装置では、同図の(a)に示すように、直列共振子511a、511bおよび511c、ならびに、並列共振子512a、512b、512cおよび512dがラダー型に配置されている。同図の(b)に示すように、直列共振子511a~511cのうち直列共振子511aおよび511bの共振周波数を、並列共振子512a~512dの反共振周波数よりも低く設定している。これにより、通過帯域を形成する並列共振子512a~512dと直列共振子511aおよび511bとで形成される誘導性領域に、直列共振子511cの容量性領域が設定されるので、狭帯域化および低損失な弾性表面波装置を実現できるとしている。 FIG. 8 is a diagram showing a resonator structure and resonance characteristics of the surface acoustic wave device described in Patent Document 1. In the surface acoustic wave device described in Patent Document 1, as shown in FIG. 6A, series resonators 511a, 511b and 511c, and parallel resonators 512a, 512b, 512c and 512d are arranged in a ladder shape. Has been. As shown in FIG. 5B, the resonance frequencies of the series resonators 511a and 511b among the series resonators 511a to 511c are set lower than the anti-resonance frequencies of the parallel resonators 512a to 512d. As a result, the capacitive region of the series resonator 511c is set in the inductive region formed by the parallel resonators 512a to 512d and the series resonators 511a and 511b that form the pass band. It is said that a lossy surface acoustic wave device can be realized.

特開2005-045475号公報JP 2005-045475 A

 しかしながら、特許文献1に記載された従来のラダー型の弾性表面波装置のように、並列共振子512a~512dの反共振周波数を一致させる設計方法では、フィルタの通過帯域幅および通過帯域両端の急峻性を調整することが困難となる。例えば、全ての並列共振子の反共振周波数を通過帯域中央付近に一致させて配置すると、必要以上に帯域幅が広くなりすぎてしまう場合がある。例えば、2.4GHz帯WiFi用フィルタのように、挟帯域の通過帯域が必要とされる場合には、通過帯域外の低周波側の減衰量を十分に確保できない。このため、通過帯域の低損失を確保しつつ、当該通過帯域の低周波側および高周波側の両方の急峻性を有する狭帯域のフィルタを実現することは困難である。 However, as in the conventional ladder-type surface acoustic wave device described in Patent Document 1, the design method for matching the antiresonance frequencies of the parallel resonators 512a to 512d makes the filter passband width and the steepness of both ends of the passband. It becomes difficult to adjust the characteristics. For example, if the anti-resonance frequencies of all the parallel resonators are arranged in the vicinity of the center of the pass band, the bandwidth may be excessively widened. For example, when a narrow passband is required, such as a 2.4 GHz band WiFi filter, it is not possible to secure a sufficient amount of attenuation on the low frequency side outside the passband. For this reason, it is difficult to realize a narrow band filter having steepness on both the low frequency side and the high frequency side of the pass band while ensuring low loss of the pass band.

 そこで、本発明は、上記課題を解決するためになされたものであって、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のフィルタ特性を有する弾性波フィルタ装置、マルチプレクサ、高周波フロントエンド回路および通信装置を提供することを目的とする。 Therefore, the present invention has been made to solve the above-described problem, and has a narrow band filter characteristic with good steepness on both the low frequency side and the high frequency side while ensuring low loss in the pass band. It is an object of the present invention to provide an elastic wave filter device, a multiplexer, a high frequency front end circuit, and a communication device.

 上記目的を達成するために、本発明の一態様に係る弾性波フィルタ装置は、直列共振子および並列共振子を有するラダー型の弾性波フィルタ装置であって、第1入出力端子および第2入出力端子の間に互いに直列に接続された3以上の直列共振子と、前記第1入出力端子、前記第2入出力端子および前記3以上の直列共振子の接続ノードのいずれかと基準端子との間に接続された4以上の並列共振子とを備え、前記4以上の並列共振子のうち、前記第1入出力端子に最も近く接続された第1並列共振子と、前記第2入出力端子に最も近く接続された第2並列共振子とを除く2以上の並列共振子において、前記2以上の並列共振子のうちの1つである第3並列共振子の反共振周波数は、前記第1並列共振子および前記第2並列共振子の反共振周波数よりも低く、かつ、前記第3並列共振子の共振周波数は、前記第1並列共振子および前記第2並列共振子の共振周波数よりも低く、前記2以上の並列共振子のうちの1つである第4並列共振子の反共振周波数は、前記第1並列共振子および前記第2並列共振子の反共振周波数よりも高く、かつ、前記第4並列共振子の共振周波数は、前記第1並列共振子および前記第2並列共振子の共振周波数よりも高い。 In order to achieve the above object, an elastic wave filter device according to an aspect of the present invention is a ladder-type elastic wave filter device having a series resonator and a parallel resonator, and includes a first input / output terminal and a second input. Three or more series resonators connected in series between output terminals, a connection node between the first input / output terminal, the second input / output terminal, and the three or more series resonators and a reference terminal 4 or more parallel resonators connected in between, and among the 4 or more parallel resonators, a first parallel resonator connected closest to the first input / output terminal, and the second input / output terminal In the two or more parallel resonators except for the second parallel resonator connected closest to the first parallel resonator, the anti-resonance frequency of the third parallel resonator that is one of the two or more parallel resonators is Antiresonance of the parallel resonator and the second parallel resonator The resonance frequency of the third parallel resonator is lower than the wave number and lower than the resonance frequency of the first parallel resonator and the second parallel resonator, and is one of the two or more parallel resonators. The anti-resonance frequency of the fourth parallel resonator is higher than the anti-resonance frequencies of the first parallel resonator and the second parallel resonator, and the resonance frequency of the fourth parallel resonator is the first resonance frequency of the first parallel resonator. The resonance frequency is higher than that of the parallel resonator and the second parallel resonator.

 従来のラダー型弾性波フィルタのように、全ての並列共振子の反共振周波数を通過帯域の中央付近に配置した場合、狭帯域のフィルタ特性を得ようとしても、帯域幅が広くなり過ぎ、例えば、通過帯域外の低周波側における減衰量を確保できない。 When the anti-resonance frequencies of all parallel resonators are arranged near the center of the passband as in the conventional ladder-type elastic wave filter, the bandwidth becomes too wide even if an attempt is made to obtain a narrowband filter characteristic, for example, The attenuation on the low frequency side outside the passband cannot be secured.

 これに対し、第4並列共振子の反共振周波数を、第1入出力端子に最も近接する第1並列共振子の反共振周波数、および、第2入出力端子に最も近接する第2並列共振子の反共振周波数よりも高周波側にシフトさせる。これにより、通過帯域低域側の通過帯域幅を狭くでき、通過帯域外の低周波側の減衰量を確保できる。このとき、第4並列共振子の反共振周波数を高周波側にシフトさせた影響により、通過帯域低周波側のインピーダンス整合がずれるため、第3並列共振子の反共振周波数を、第1並列共振子の反共振周波数、および、第2並列共振子の反共振周波数よりも低くする。これにより、上記インピーダンス整合を調整できる。なお、第1並列共振子および第2並列共振子の反共振周波数は、第3並列共振子の反共振周波数と第4並列共振子の反共振周波数との間であって、通過帯域の中央付近に設定されているので、第1入出力端子および第2入出力端子におけるインピーダンス整合はずれない。以上により、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のラダー型フィルタを得ることが可能となる。 In contrast, the anti-resonance frequency of the fourth parallel resonator is set to the anti-resonance frequency of the first parallel resonator closest to the first input / output terminal and the second parallel resonator closest to the second input / output terminal. Shift to a higher frequency side than the anti-resonance frequency. As a result, the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured. At this time, because the impedance matching on the low frequency side of the passband is shifted due to the effect of shifting the antiresonance frequency of the fourth parallel resonator to the high frequency side, the antiresonance frequency of the third parallel resonator is changed to the first parallel resonator. And the antiresonance frequency of the second parallel resonator. Thereby, the impedance matching can be adjusted. The anti-resonance frequency of the first parallel resonator and the second parallel resonator is between the anti-resonance frequency of the third parallel resonator and the anti-resonance frequency of the fourth parallel resonator, and near the center of the passband. Therefore, impedance matching does not occur in the first input / output terminal and the second input / output terminal. As described above, it is possible to obtain a narrow-band ladder-type filter having good steepness on both the low frequency side and high frequency side of the pass band while ensuring low loss of the pass band.

 また、本発明の一態様に係る弾性波フィルタ装置は、圧電体層を有する基板上に形成されたIDT電極によって構成される直列共振子および並列共振子を有するラダー型の弾性波フィルタ装置であって、第1入出力端子および第2入出力端子の間に互いに直列に接続された3以上の直列共振子と、前記第1入出力端子、前記第2入出力端子および前記3以上の直列共振子の接続ノードのいずれかと基準端子との間に接続された4以上の並列共振子とを備え、前記4以上の並列共振子のうち、前記第1入出力端子に最も近く接続された第1並列共振子と前記第2入出力端子に最も近く接続された第2並列共振子とを除く2以上の並列共振子において、前記2以上の並列共振子のうちの1つである第3並列共振子の電極ピッチは、前記第1並列共振子および前記第2並列共振子の電極ピッチよりも大きく、前記2以上の並列共振子のうちの1つである第4並列共振子の電極ピッチは、前記第1並列共振子および前記第2並列共振子の電極ピッチよりも小さい。 An elastic wave filter device according to one embodiment of the present invention is a ladder-type elastic wave filter device having a series resonator and a parallel resonator formed of IDT electrodes formed on a substrate having a piezoelectric layer. And three or more series resonators connected in series between the first input / output terminal and the second input / output terminal, the first input / output terminal, the second input / output terminal, and the three or more series resonances. 4 or more parallel resonators connected between one of the connection nodes of the child and the reference terminal, and the first of the four or more parallel resonators connected closest to the first input / output terminal. In two or more parallel resonators excluding a parallel resonator and a second parallel resonator connected closest to the second input / output terminal, a third parallel resonance which is one of the two or more parallel resonators The electrode pitch of the child is the first parallel The electrode pitch of the fourth parallel resonator, which is larger than the electrode pitch of the pendulum and the second parallel resonator and is one of the two or more parallel resonators, is the first parallel resonator and the second parallel resonator. It is smaller than the electrode pitch of the resonator.

 第4並列共振子の電極ピッチを、第1入出力端子に最も近接する第1並列共振子の電極ピッチ、および、第2入出力端子に最も近接する第2並列共振子の電極ピッチよりも小さくすることで第4並列共振子の反共振周波数を通過帯域内の中央付近よりも高周波側にシフトさせる。これにより、通過帯域低域側の通過帯域幅を狭くでき、通過帯域外の低周波側の減衰量を確保できる。このとき、第4並列共振子の反共振周波数を高周波側にシフトさせた影響により、通過帯域低周波側のインピーダンス整合がずれるため、第3並列共振子の電極ピッチを、第1並列共振子の電極ピッチおよび第2並列共振子の電極ピッチよりも大きくすることで第3並列共振子の反共振周波数を通過帯域内の中央付近よりも低周波側にシフトさせる。これにより、上記インピーダンス整合を調整できる。なお、第1並列共振子および第2並列共振子の電極ピッチは、第3並列共振子の電極ピッチと第4並列共振子の電極ピッチとの間であって、第1並列共振子および第2並列共振子の反共振周波数は通過帯域の中央付近に設定されているので、第1入出力端子および第2入出力端子におけるインピーダンス整合はずれない。以上により、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のラダー型フィルタを得ることが可能となる。 The electrode pitch of the fourth parallel resonator is smaller than the electrode pitch of the first parallel resonator closest to the first input / output terminal and the electrode pitch of the second parallel resonator closest to the second input / output terminal. By doing so, the anti-resonance frequency of the fourth parallel resonator is shifted to a higher frequency side than the vicinity of the center in the pass band. As a result, the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured. At this time, because the impedance matching on the low frequency side of the passband is shifted due to the effect of shifting the anti-resonance frequency of the fourth parallel resonator to the high frequency side, the electrode pitch of the third parallel resonator is changed to that of the first parallel resonator. By making it larger than the electrode pitch and the electrode pitch of the second parallel resonator, the anti-resonance frequency of the third parallel resonator is shifted to the lower frequency side from the vicinity of the center in the pass band. Thereby, the impedance matching can be adjusted. The electrode pitch of the first parallel resonator and the second parallel resonator is between the electrode pitch of the third parallel resonator and the electrode pitch of the fourth parallel resonator, and is the first parallel resonator and the second parallel resonator. Since the antiresonance frequency of the parallel resonator is set near the center of the pass band, impedance matching at the first input / output terminal and the second input / output terminal does not go away. As described above, it is possible to obtain a narrow-band ladder-type filter having good steepness on both the low frequency side and high frequency side of the pass band while ensuring low loss of the pass band.

 また、本発明の一態様に係る弾性波フィルタ装置は、圧電体層を有する基板上に形成されたIDT電極によって構成される直列共振子および並列共振子を有するラダー型の弾性波フィルタ装置であって、第1入出力端子および第2入出力端子の間に互いに直列に接続された3以上の直列共振子と、前記第1入出力端子、前記第2入出力端子および前記3以上の直列共振子の接続ノードのいずれかと基準端子との間に接続された4以上の並列共振子とを備え、前記4以上の並列共振子のうち、前記第1入出力端子に最も近く接続された第1並列共振子と前記第2入出力端子に最も近く接続された第2並列共振子とを除く2以上の並列共振子において、前記2以上の並列共振子のうちの1つである第3並列共振子の電極デューティーは、前記第1並列共振子および前記第2並列共振子の電極デューティーよりも大きく、前記2以上の並列共振子のうちの1つである第4並列共振子の電極デューティーは、前記第1並列共振子および前記第2並列共振子の電極デューティーよりも小さい。 An elastic wave filter device according to one embodiment of the present invention is a ladder-type elastic wave filter device having a series resonator and a parallel resonator formed of IDT electrodes formed on a substrate having a piezoelectric layer. And three or more series resonators connected in series between the first input / output terminal and the second input / output terminal, the first input / output terminal, the second input / output terminal, and the three or more series resonances. 4 or more parallel resonators connected between one of the connection nodes of the child and the reference terminal, and the first of the four or more parallel resonators connected closest to the first input / output terminal. In two or more parallel resonators excluding a parallel resonator and a second parallel resonator connected closest to the second input / output terminal, a third parallel resonance which is one of the two or more parallel resonators The electrode duty of the child is The electrode duty of the fourth parallel resonator, which is larger than the electrode duty of the parallel resonator and the second parallel resonator and is one of the two or more parallel resonators, is the first parallel resonator and the second parallel resonator. It is smaller than the electrode duty of the two parallel resonators.

 第4並列共振子の電極デューティーを、第1入出力端子に最も近接する第1並列共振子の電極デューティー、および、第2入出力端子に最も近接する第2並列共振子の電極デューティーよりも小さくすることで第4並列共振子の反共振周波数を通過帯域内の中央付近よりも高周波側にシフトさせる。これにより、通過帯域低域側の通過帯域幅を狭くでき、通過帯域外の低周波側の減衰量を確保できる。このとき、第4並列共振子の反共振周波数を高周波側にシフトさせた影響により、通過帯域低周波側のインピーダンス整合がずれるため、第3並列共振子の電極デューティーを第1並列共振子の電極デューティーおよび第2並列共振子の電極デューティーよりも大きくすることで第3並列共振子の反共振周波数を通過帯域内の中央付近よりも低周波側にシフトさせる。これにより、上記インピーダンス整合を調整できる。なお、第1並列共振子および第2並列共振子の電極デューティーは、第3並列共振子の電極デューティーと第4並列共振子の電極デューティーとの間であって、第1並列共振子および第2並列共振子の反共振周波数は通過帯域の中央付近に設定されているので、第1入出力端子および第2入出力端子におけるインピーダンス整合はずれない。以上により、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のラダー型フィルタを得ることが可能となる。 The electrode duty of the fourth parallel resonator is smaller than the electrode duty of the first parallel resonator closest to the first input / output terminal and the electrode duty of the second parallel resonator closest to the second input / output terminal. By doing so, the anti-resonance frequency of the fourth parallel resonator is shifted to a higher frequency side than the vicinity of the center in the pass band. As a result, the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured. At this time, because the impedance matching on the low frequency side of the passband is shifted due to the effect of shifting the antiresonance frequency of the fourth parallel resonator to the high frequency side, the electrode duty of the third parallel resonator is set to the electrode of the first parallel resonator. By making the duty and the electrode duty of the second parallel resonator larger, the anti-resonance frequency of the third parallel resonator is shifted to the lower frequency side than the vicinity of the center in the pass band. Thereby, the impedance matching can be adjusted. The electrode duty of the first parallel resonator and the second parallel resonator is between the electrode duty of the third parallel resonator and the electrode duty of the fourth parallel resonator, and is the first parallel resonator and the second parallel resonator. Since the antiresonance frequency of the parallel resonator is set near the center of the pass band, impedance matching at the first input / output terminal and the second input / output terminal does not go away. As described above, it is possible to obtain a narrow-band ladder-type filter having good steepness on both the low frequency side and high frequency side of the pass band while ensuring low loss of the pass band.

 また、前記基板は、前記IDT電極が一方の主面上に形成された圧電体層と、前記圧電体層を伝搬する弾性波音速よりも、伝搬するバルク波音速が高速である高音速支持基板と、前記高音速支持基板と前記圧電体層との間に配置され、前記圧電体層を伝搬する弾性波音速よりも、伝搬するバルク波音速が低速である低音速膜とを備えてもよい。 The substrate includes a piezoelectric layer in which the IDT electrode is formed on one main surface, and a high-sonic velocity supporting substrate whose bulk wave velocity is higher than an acoustic wave velocity that propagates through the piezoelectric layer. And a low sound velocity film disposed between the high sound velocity support substrate and the piezoelectric layer and having a bulk wave sound velocity propagating at a lower speed than an elastic wave sound velocity propagating through the piezoelectric layer. .

 これにより、圧電体層を有する基板上に形成されたIDT電極を含む各共振子のQ値を高い値に維持できる。 Thereby, the Q value of each resonator including the IDT electrode formed on the substrate having the piezoelectric layer can be maintained at a high value.

 また、本発明の一態様に係るマルチプレクサは、所定の周波数帯域を選択的に通過させる帯域通過フィルタを複数有することにより、入力信号を分波するマルチプレクサであって、前記複数の帯域通過フィルタが通過させる前記周波数帯域のそれぞれは異なり、前記複数の帯域通過フィルタのそれぞれの一端同士は共通端子に接続され、前記複数の帯域通過フィルタのうちの少なくとも1つが、上記いずれかの弾性波フィルタ装置である。 The multiplexer according to one aspect of the present invention is a multiplexer that demultiplexes an input signal by including a plurality of bandpass filters that selectively pass a predetermined frequency band, and the plurality of bandpass filters pass through the multiplexer. Each of the frequency bands is different, one end of each of the plurality of band pass filters is connected to a common terminal, and at least one of the plurality of band pass filters is any one of the elastic wave filter devices. .

 これにより、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のフィルタ特性を有するマルチプレクサを提供できる。 Thereby, it is possible to provide a multiplexer having a narrow band filter characteristic with good steepness on both the low frequency side and high frequency side of the pass band while ensuring low loss of the pass band.

 また、本発明の一態様に係る高周波フロントエンド回路は、上記いずれかの弾性波フィルタ装置または上記マルチプレクサと、前記弾性波フィルタ装置に接続され、高周波信号を増幅する増幅回路と、を備える。 A high-frequency front-end circuit according to an aspect of the present invention includes any one of the elastic wave filter devices or the multiplexer and an amplifier circuit that is connected to the elastic wave filter device and amplifies a high-frequency signal.

 これにより、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のフィルタを有する高周波フロントエンド回路を提供できる。 Thus, it is possible to provide a high-frequency front-end circuit having a narrow-band filter with good steepness on both the low-frequency side and high-frequency side while ensuring a low loss in the pass band.

 また、本発明の一態様に係る通信装置は、上記高周波フロントエンド回路と、高周波信号を処理するRF信号処理回路と、を備える。 Also, a communication device according to an aspect of the present invention includes the high-frequency front end circuit and an RF signal processing circuit that processes a high-frequency signal.

 これにより、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のフィルタを有する通信装置を提供できる。 Thereby, it is possible to provide a communication apparatus having a narrow band filter with good steepness on both the low frequency side and the high frequency side while ensuring a low loss in the pass band.

 本発明によれば、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のフィルタ特性を有する弾性波フィルタ装置、マルチプレクサ、高周波フロントエンド回路および通信装置を提供することが可能となる。 According to the present invention, an elastic wave filter device, a multiplexer, a high-frequency front-end circuit, and a communication having a narrow-band filter characteristic with good steepness on both the low-frequency side and the high-frequency side while ensuring a low loss in the pass band An apparatus can be provided.

図1は、実施例に係る弾性波フィルタ装置の回路構成図である。FIG. 1 is a circuit configuration diagram of an acoustic wave filter device according to an embodiment. 図2は、実施例に係る弾性波フィルタ装置の共振子を模式的に表す平面図および断面図である。FIG. 2 is a plan view and a cross-sectional view schematically illustrating a resonator of the acoustic wave filter device according to the embodiment. 図3は、ラダー型の弾性波フィルタの動作原理を説明する回路構成図および周波数特性を表すグラフである。FIG. 3 is a circuit configuration diagram illustrating a principle of operation of a ladder-type elastic wave filter and a graph showing frequency characteristics. 図4は、実施例に係る弾性波フィルタ装置の実装構成を示す断面図である。FIG. 4 is a cross-sectional view illustrating a mounting configuration of the acoustic wave filter device according to the embodiment. 図5は、実施例に係る弾性波フィルタ装置のフィルタ通過特性および共振特性を表すグラフである。FIG. 5 is a graph showing filter pass characteristics and resonance characteristics of the acoustic wave filter device according to the example. 図6は、実施例および比較例に係る弾性波フィルタ装置のフィルタ通過特性を比較したグラフである。FIG. 6 is a graph comparing the filter pass characteristics of the elastic wave filter devices according to the example and the comparative example. 図7は、実施例に係る弾性波フィルタ装置を有する高周波フロントエンド回路および通信装置の回路構成図である。FIG. 7 is a circuit configuration diagram of a high-frequency front-end circuit and a communication device having an elastic wave filter device according to an embodiment. 図8は、特許文献1に記載された弾性表面波装置の共振子構造および共振特性を示す図である。FIG. 8 is a diagram showing a resonator structure and resonance characteristics of the surface acoustic wave device described in Patent Document 1. In FIG.

 以下、本発明の実施の形態について、実施例および図面を用いて詳細に説明する。なお、以下で説明する実施例は、いずれも包括的または具体的な例を示すものである。以下の実施例で示される数値、形状、材料、構成要素、構成要素の配置および接続形態などは、一例であり、本発明を限定する主旨ではない。以下の実施例における構成要素のうち、独立請求項に記載されていない構成要素については、任意の構成要素として説明される。また、図面に示される構成要素の大きさまたは大きさの比は、必ずしも厳密ではない。 Hereinafter, embodiments of the present invention will be described in detail with reference to examples and drawings. It should be noted that any of the embodiments described below is a comprehensive or specific example. Numerical values, shapes, materials, constituent elements, arrangement of constituent elements, connection forms, and the like shown in the following examples are merely examples, and are not intended to limit the present invention. Among the constituent elements in the following embodiments, constituent elements not described in the independent claims are described as arbitrary constituent elements. In addition, the size or size ratio of the components shown in the drawings is not necessarily strict.

 (実施例)
 [1.弾性波フィルタ装置の基本構成]
 本発明の実施例に係る弾性波フィルタ装置の基本構成について説明する。本実施例では、2.4GHz帯WiFi(2400-2483MHz)に適用される帯域通過型の弾性表面波フィルタについて例示する。
(Example)
[1. Basic configuration of elastic wave filter device]
A basic configuration of an elastic wave filter device according to an embodiment of the present invention will be described. In this embodiment, a band-pass surface acoustic wave filter applied to a 2.4 GHz band WiFi (2400-2483 MHz) is illustrated.

 図1は、実施例に係る弾性波フィルタ装置21の回路構成図である。同図に示すように、弾性波フィルタ装置21は、直列共振子101、102、103、104、および105と、並列共振子151、152、153、および154と、入出力端子100および120と、を備える。 FIG. 1 is a circuit configuration diagram of an elastic wave filter device 21 according to an embodiment. As shown in the figure, the acoustic wave filter device 21 includes series resonators 101, 102, 103, 104, and 105, parallel resonators 151, 152, 153, and 154, input / output terminals 100 and 120, Is provided.

 直列共振子101~105は、入出力端子100と入出力端子120との間に互いに直列に接続されている。また、並列共振子151~154は、入出力端子100、入出力端子120および直列共振子101~105の各接続点と、基準端子(グランド)との間に並列に接続されている。直列共振子101~105および並列共振子151~154の上記接続構成により、弾性波フィルタ装置21は、ラダー型のバンドパスフィルタを構成している。 The series resonators 101 to 105 are connected in series between the input / output terminal 100 and the input / output terminal 120. The parallel resonators 151 to 154 are connected in parallel between connection points of the input / output terminal 100, the input / output terminal 120, and the series resonators 101 to 105, and a reference terminal (ground). Due to the above-described connection configuration of the series resonators 101 to 105 and the parallel resonators 151 to 154, the acoustic wave filter device 21 constitutes a ladder type band pass filter.

 なお、本発明に係る弾性波フィルタ装置の直列共振子および並列共振子の数は、それぞれ、5個および4個に限定されず、直列共振子が2個以上および並列共振子が4個以上あればよい。さらに、2個以上の直列共振子と4個以上の並列共振子とで構成されるラダー型構造に対して、入出力端子100と入出力端子120との間に、例えば、縦結合型の共振子などが接続されていてもよい。 The number of series resonators and parallel resonators of the acoustic wave filter device according to the present invention is not limited to 5 and 4, respectively, and there may be 2 or more series resonators and 4 or more parallel resonators. That's fine. Further, for a ladder structure composed of two or more series resonators and four or more parallel resonators, for example, a longitudinally coupled resonance is provided between the input / output terminal 100 and the input / output terminal 120. A child or the like may be connected.

 また、本実施例では、並列共振子152~154が接続される基準端子(グランド)が共通化されているが、並列共振子151~154が接続される基準端子(グランド)は、共通化されていてもよいし、個別化されていてもよい。 In this embodiment, the reference terminal (ground) to which the parallel resonators 152 to 154 are connected is shared, but the reference terminal (ground) to which the parallel resonators 151 to 154 are connected is shared. Or may be individualized.

 また、入出力端子100および120、直列共振子101~105、ならびに、並列共振子151~154の接続点に、インダクタおよびキャパシタなどの回路素子が挿入または接続されていてもよい。 Further, circuit elements such as inductors and capacitors may be inserted or connected to connection points of the input / output terminals 100 and 120, the series resonators 101 to 105, and the parallel resonators 151 to 154.

 また、本実施例では、弾性波フィルタ装置21が2.4GHz帯WiFiに適用される例を説明するが、本発明に係る弾性波フィルタ装置は、WiFiに限らず他の周波数帯域にも適用可能である。 In this embodiment, an example in which the elastic wave filter device 21 is applied to the 2.4 GHz band WiFi will be described. However, the elastic wave filter device according to the present invention is not limited to WiFi and can be applied to other frequency bands. It is.

 [2.弾性波フィルタ装置の共振子構造]
 弾性波フィルタ装置21の構成要素である各共振子の構造について説明する。本実施例に係る弾性波フィルタ装置21を構成する直列共振子および並列共振子は、弾性表面波(SAW:Surface Acoustic Wave)共振子である。
[2. Resonator structure of acoustic wave filter device]
The structure of each resonator that is a component of the acoustic wave filter device 21 will be described. The series resonator and the parallel resonator constituting the acoustic wave filter device 21 according to the present embodiment are surface acoustic wave (SAW) resonators.

 図2は、実施例に係る弾性波フィルタ装置21の共振子を模式的に表す平面図および断面図である。同図には、弾性波フィルタ装置21を構成する複数の共振子のうち、直列共振子101の構造を表す平面摸式図および断面模式図が例示されている。なお、図2に示された直列共振子101は、上記複数の共振子の典型的な構造を説明するためのものであって、電極を構成する電極指の本数や長さなどは、これに限定されない。 FIG. 2 is a plan view and a cross-sectional view schematically showing a resonator of the acoustic wave filter device 21 according to the embodiment. In the figure, a schematic plan view and a schematic cross-sectional view showing the structure of the series resonator 101 among a plurality of resonators constituting the acoustic wave filter device 21 are illustrated. Note that the series resonator 101 shown in FIG. 2 is for explaining a typical structure of the plurality of resonators, and the number and length of electrode fingers constituting the electrode are the same. It is not limited.

 弾性波フィルタ装置21の各共振子は、圧電体層227を有する基板220と、櫛形形状を有するIDT(InterDigital Transducer)電極22aおよび22bとで構成されている。 Each resonator of the acoustic wave filter device 21 includes a substrate 220 having a piezoelectric layer 227 and IDT (InterDigital Transducer) electrodes 22a and 22b having a comb shape.

 図2の平面図に示すように、圧電体層227の上には、互いに対向する一対のIDT電極22aおよび22bが形成されている。IDT電極22aは、互いに平行な複数の電極指222aと、複数の電極指222aを接続するバスバー電極221aとで構成されている。また、IDT電極22bは、互いに平行な複数の電極指222bと、複数の電極指222bを接続するバスバー電極221bとで構成されている。複数の電極指222aおよび222bは、X軸方向と直交する方向に沿って形成されている。 As shown in the plan view of FIG. 2, a pair of IDT electrodes 22a and 22b facing each other are formed on the piezoelectric layer 227. The IDT electrode 22a includes a plurality of electrode fingers 222a that are parallel to each other and a bus bar electrode 221a that connects the plurality of electrode fingers 222a. The IDT electrode 22b includes a plurality of electrode fingers 222b that are parallel to each other and a bus bar electrode 221b that connects the plurality of electrode fingers 222b. The plurality of electrode fingers 222a and 222b are formed along a direction orthogonal to the X-axis direction.

 また、複数の電極指222aおよび222b、ならびに、バスバー電極221aおよび221bで構成されるIDT電極22は、図2の断面図に示すように、密着層223と主電極層224との積層構造となっている。 Further, the IDT electrode 22 composed of the plurality of electrode fingers 222a and 222b and the bus bar electrodes 221a and 221b has a laminated structure of the adhesion layer 223 and the main electrode layer 224 as shown in the cross-sectional view of FIG. ing.

 密着層223は、圧電体層227と主電極層224との密着性を向上させるための層であり、材料として、例えば、Tiが用いられる。密着層223の膜厚は、例えば、12nmである。 The adhesion layer 223 is a layer for improving adhesion between the piezoelectric layer 227 and the main electrode layer 224, and Ti is used as a material, for example. The film thickness of the adhesion layer 223 is 12 nm, for example.

 主電極層224は、材料として、例えば、Cuを1%含有したAlが用いられる。主電極層224の膜厚は、例えば131nmである。 The main electrode layer 224 is made of, for example, Al containing 1% Cu. The film thickness of the main electrode layer 224 is, for example, 131 nm.

 保護層225は、IDT電極22aおよび22bを覆うように形成されている。保護層225は、主電極層224を外部環境から保護する、周波数温度特性を調整する、および、耐湿性を高めるなどを目的とする層であり、例えば、二酸化ケイ素を主成分とする膜である。保護層225の膜厚は、例えば30nmである。 The protective layer 225 is formed so as to cover the IDT electrodes 22a and 22b. The protective layer 225 is a layer for the purpose of protecting the main electrode layer 224 from the external environment, adjusting frequency temperature characteristics, and improving moisture resistance, for example, a film mainly composed of silicon dioxide. . The film thickness of the protective layer 225 is, for example, 30 nm.

 なお、密着層223、主電極層224および保護層225を構成する材料は、上述した材料に限定されない。さらに、IDT電極22は、上記積層構造でなくてもよい。IDT電極22は、例えば、Ti、Al、Cu、Pt、Au、Ag、Pdなどの金属又は合金から構成されてもよく、また、上記の金属または合金から構成される複数の積層体から構成されてもよい。また、保護層225は、形成されていなくてもよい。 Note that the materials constituting the adhesion layer 223, the main electrode layer 224, and the protective layer 225 are not limited to the materials described above. Furthermore, the IDT electrode 22 may not have the above-described laminated structure. The IDT electrode 22 may be made of, for example, a metal or alloy such as Ti, Al, Cu, Pt, Au, Ag, or Pd, or may be made of a plurality of laminates made of the above metal or alloy. May be. Further, the protective layer 225 may not be formed.

 つぎに、基板220の積層構造について説明する。 Next, the laminated structure of the substrate 220 will be described.

 図2の下段に示すように、基板220は、高音速支持基板228と、低音速膜226と、圧電体層227とを備え、高音速支持基板228、低音速膜226および圧電体層227がこの順で積層された構造を有している。 As shown in the lower part of FIG. 2, the substrate 220 includes a high sound speed support substrate 228, a low sound speed film 226, and a piezoelectric layer 227. The high sound speed support substrate 228, the low sound speed film 226, and the piezoelectric layer 227 are provided. It has a laminated structure in this order.

 圧電体層227は、例えば、50°YカットX伝搬LiTaO圧電単結晶または圧電セラミックス(X軸を中心軸としてY軸から50°回転した軸を法線とする面で切断したタンタル酸リチウム単結晶またはセラミックスであって、X軸方向に弾性表面波が伝搬する単結晶またはセラミックス)からなる。圧電体層227の厚みは、IDT電極22の電極ピッチで定まる弾性波の波長をλとした場合、3.5λ以下であり、例えば、450nmである。なお、IDT電極22の電極ピッチとは、IDT電極22における隣接する電極指の中心間距離をいう。 The piezoelectric layer 227 is formed of, for example, a 50 ° Y-cut X-propagating LiTaO 3 piezoelectric single crystal or a piezoelectric ceramic (lithium tantalate unit cut along a plane whose normal is an axis rotated by 50 ° from the Y axis with the X axis as the central axis. A single crystal or ceramics in which a surface acoustic wave propagates in the X-axis direction). The thickness of the piezoelectric layer 227 is 3.5λ or less, for example, 450 nm when the wavelength of the elastic wave determined by the electrode pitch of the IDT electrode 22 is λ. The electrode pitch of the IDT electrode 22 refers to the distance between the centers of adjacent electrode fingers in the IDT electrode 22.

 高音速支持基板228は、低音速膜226、圧電体層227ならびにIDT電極22を支持する基板である。高音速支持基板228は、さらに、圧電体層227を伝搬する表面波や境界波の弾性波よりも、高音速支持基板228中のバルク波の音速が高速となる基板であり、弾性表面波を圧電体層227および低音速膜226が積層されている部分に閉じ込め、高音速支持基板228より下方に漏れないように機能する。高音速支持基板228は、例えば、シリコン基板であり、厚みは、例えば200μmである。なお、高音速支持基板228は、(1)窒化アルミニウム、酸化アルミニウム、炭化ケイ素、窒化ケイ素、シリコン、サファイア、リチウムタンタレート、リチウムニオベイト、または水晶等の圧電体、(2)アルミナ、ジルコニア、コージライト、ムライト、ステアタイト、またはフォルステライト等の各種セラミック、(3)マグネシアダイヤモンド、(4)上記各材料を主成分とする材料、ならびに、(5)上記各材料の混合物を主成分とする材料、のいずれかで構成されていてもよい。 The high sound velocity support substrate 228 is a substrate that supports the low sound velocity film 226, the piezoelectric layer 227, and the IDT electrode 22. The high-sonic support substrate 228 is a substrate in which the acoustic velocity of the bulk wave in the high-sonic support substrate 228 is higher than that of the surface wave or boundary wave that propagates through the piezoelectric layer 227. The piezoelectric layer 227 and the low acoustic velocity film 226 are confined in a laminated portion and function so as not to leak downward from the high acoustic velocity support substrate 228. The high sound speed support substrate 228 is, for example, a silicon substrate and has a thickness of, for example, 200 μm. Note that the high sound velocity support substrate 228 includes (1) a piezoelectric body such as aluminum nitride, aluminum oxide, silicon carbide, silicon nitride, silicon, sapphire, lithium tantalate, lithium niobate, or quartz, (2) alumina, zirconia, Various ceramics such as cordierite, mullite, steatite, or forsterite, (3) magnesia diamond, (4) materials containing the above materials as main components, and (5) mixtures of the above materials as main components. You may be comprised with either of materials.

 低音速膜226は、圧電体層227を伝搬する弾性波の音速よりも、低音速膜226中のバルク波の音速が低速となる膜であり、圧電体層227と高音速支持基板228との間に配置される。この構造と、弾性波が本質的に低音速な媒質にエネルギーが集中するという性質とにより、弾性表面波エネルギーのIDT電極外への漏れが抑制される。低音速膜226は、例えば、二酸化ケイ素を主成分とする膜である。低音速膜226の厚みは、IDT電極22の電極ピッチで定まる弾性波の波長をλとした場合、2λ以下であり、例えば505nmである。 The low acoustic velocity film 226 is a membrane in which the acoustic velocity of the bulk wave in the low acoustic velocity film 226 is lower than the acoustic velocity of the elastic wave propagating through the piezoelectric layer 227. The low acoustic velocity membrane 226 is formed between the piezoelectric layer 227 and the high acoustic velocity support substrate 228. Arranged between. Due to this structure and the property that energy is concentrated in a medium where acoustic waves are essentially low in sound velocity, leakage of surface acoustic wave energy to the outside of the IDT electrode is suppressed. The low acoustic velocity film 226 is, for example, a film mainly composed of silicon dioxide. The thickness of the low acoustic velocity film 226 is 2λ or less, for example, 505 nm, where λ is the wavelength of the elastic wave determined by the electrode pitch of the IDT electrode 22.

 基板220の上記積層構造によれば、圧電基板を単層で使用している従来の構造と比較して、共振周波数および反共振周波数におけるQ値を大幅に高めることが可能となる。すなわち、Q値が高い弾性表面波共振子を構成し得るので、当該弾性表面波共振子を用いて、挿入損失が小さいフィルタを構成することが可能となる。 According to the laminated structure of the substrate 220, the Q value at the resonance frequency and the anti-resonance frequency can be significantly increased as compared with the conventional structure in which the piezoelectric substrate is used as a single layer. That is, since a surface acoustic wave resonator having a high Q value can be configured, a filter with a small insertion loss can be configured using the surface acoustic wave resonator.

 なお、高音速支持基板228は、支持基板と、圧電体層227を伝搬する表面波や境界波の弾性波よりも、伝搬するバルク波の音速が高速となる高音速膜とが積層された構造を有していてもよい。この場合、支持基板は、サファイア、リチウムタンタレート、リチウムニオベイト、水晶等の圧電体、アルミナ、マグネシア、窒化ケイ素、窒化アルミニウム、炭化ケイ素、ジルコニア、コージライト、ムライト、ステアタイト、フォルステライト等の各種セラミック、ガラス等の誘電体またはシリコン、窒化ガリウム等の半導体及び樹脂基板等を用いることができる。また、高音速膜は、窒化アルミニウム、酸化アルミニウム、炭化ケイ素、窒化ケイ素、酸窒化ケイ素、DLC膜またはダイヤモンド、上記材料を主成分とする媒質、上記材料の混合物を主成分とする媒質等、様々な高音速材料を用いることができる。 Note that the high sound velocity support substrate 228 has a structure in which a support substrate and a high sound velocity film in which the sound velocity of a propagating bulk wave is higher than that of a surface wave or boundary wave propagating in the piezoelectric layer 227 is laminated. You may have. In this case, the support substrate is a piezoelectric material such as sapphire, lithium tantalate, lithium niobate, crystal, alumina, magnesia, silicon nitride, aluminum nitride, silicon carbide, zirconia, cordierite, mullite, steatite, forsterite, etc. Various ceramics, dielectrics such as glass, semiconductors such as silicon and gallium nitride, resin substrates, and the like can be used. In addition, the high sound velocity film includes various materials such as aluminum nitride, aluminum oxide, silicon carbide, silicon nitride, silicon oxynitride, DLC film or diamond, a medium mainly composed of the above materials, and a medium mainly composed of a mixture of the above materials. High sound velocity material can be used.

 なお、本実施例では、弾性波フィルタ装置21を構成するIDT電極22は、圧電体層227を有する基板220上に形成された例を示したが、IDT電極22が形成される基板は、圧電体層227の単層からなる圧電基板であってもよい。この場合の圧電基板は、例えば、LiTaOの圧電単結晶、または、LiNbOなどの他の圧電単結晶で構成される。 In the present embodiment, the IDT electrode 22 constituting the acoustic wave filter device 21 is formed on the substrate 220 having the piezoelectric layer 227. However, the substrate on which the IDT electrode 22 is formed is piezoelectric. A piezoelectric substrate made of a single layer of the body layer 227 may be used. The piezoelectric substrate in this case is composed of, for example, a LiTaO 3 piezoelectric single crystal or another piezoelectric single crystal such as LiNbO 3 .

 また、IDT電極22が形成される基板は、圧電体層を有する限り、全体が圧電体層からなるものの他、支持基板上に圧電体層が積層されている構造を用いてもよい。 In addition, the substrate on which the IDT electrode 22 is formed may have a structure in which a piezoelectric layer is laminated on a support substrate in addition to a piezoelectric layer as a whole as long as it has a piezoelectric layer.

 また、上記実施例に係る圧電体層227は、50°YカットX伝搬LiTaO単結晶を使用したものであるが、単結晶材料のカット角はこれに限定されない。つまり、弾性波フィルタ装置の要求通過特性などに応じて、適宜、積層構造、材料、および厚みを変更してもよく、上記以外のカット角を有するLiTaO圧電基板またはLiNbO圧電基板などを用いた弾性表面波フィルタであっても、同様の効果を奏することが可能となる。 Moreover, the piezoelectric layer 227 according to the embodiment is obtained by using a 50 ° Y-cut X-propagation LiTaO 3 single crystal, cut angles of single crystal material is not limited thereto. In other words, the laminated structure, material, and thickness may be appropriately changed according to the required pass characteristics of the acoustic wave filter device, and a LiTaO 3 piezoelectric substrate or a LiNbO 3 piezoelectric substrate having a cut angle other than the above is used. The same effect can be achieved even with the conventional surface acoustic wave filter.

 ここで、IDT電極22の設計パラメータについて説明する。弾性表面波共振子の波長とは、図2の中段に示すIDT電極22を構成する複数の電極指222aまたは222bの繰り返し周期である波長λで規定される。また、電極ピッチは、波長λの1/2であり、IDT電極22aおよび22bを構成する電極指222aおよび222bのライン幅をWとし、隣り合う電極指222aと電極指222bとの間のスペース幅をSとした場合、(W+S)で定義される。また、IDT電極の交叉幅Lは、図2の上段に示すように、IDT電極22aの電極指222aとIDT電極22bの電極指222bとのX軸方向から見た場合の重複する電極指長さである。また、各共振子の電極デューティーは、複数の電極指222aおよび222bのライン幅占有率であり、複数の電極指222aおよび222bのライン幅とスペース幅との加算値に対する当該ライン幅の割合であり、W/(W+S)で定義される。 Here, the design parameters of the IDT electrode 22 will be described. The wavelength of the surface acoustic wave resonator is defined by a wavelength λ that is a repetition period of the plurality of electrode fingers 222a or 222b constituting the IDT electrode 22 shown in the middle stage of FIG. The electrode pitch is ½ of the wavelength λ, the line width of the electrode fingers 222a and 222b constituting the IDT electrodes 22a and 22b is W, and the space width between the adjacent electrode fingers 222a and 222b Is defined as (W + S). Further, as shown in the upper part of FIG. 2, the crossing width L of the IDT electrode is an overlapping electrode finger length when viewed from the X-axis direction of the electrode finger 222a of the IDT electrode 22a and the electrode finger 222b of the IDT electrode 22b. It is. The electrode duty of each resonator is the line width occupation ratio of the plurality of electrode fingers 222a and 222b, and is the ratio of the line width to the sum of the line width and the space width of the plurality of electrode fingers 222a and 222b. , W / (W + S).

 [3.弾性波フィルタの動作原理]
 ここで、本実施の形態に係るラダー型の弾性波フィルタの動作原理について説明する。
[3. Principle of operation of elastic wave filter]
Here, the operation principle of the ladder-type elastic wave filter according to the present embodiment will be described.

 図3は、ラダー型の弾性波フィルタの動作原理を説明する回路構成図および周波数特性を表すグラフである。 FIG. 3 is a circuit configuration diagram illustrating a principle of operation of a ladder-type elastic wave filter and a graph showing frequency characteristics.

 図3の(a)に示された弾性波フィルタは、1つの直列共振子50sおよび1つの並列共振子50pで構成された基本的なラダー型フィルタである。図3の(b)に示すように、並列共振子50pは、共振特性において共振周波数frpおよび反共振周波数fap(>frp)を有している。また、直列共振子50sは、共振特性において共振周波数frsおよび反共振周波数fas(>frs>frp)を有している。 The elastic wave filter shown in FIG. 3 (a) is a basic ladder type filter composed of one series resonator 50s and one parallel resonator 50p. As shown in FIG. 3B, the parallel resonator 50p has a resonance frequency frp and an anti-resonance frequency fap (> frp) in resonance characteristics. The series resonator 50s has a resonance frequency frs and an anti-resonance frequency fas (> frs> frp) in resonance characteristics.

 ラダー型の共振子によりバンドパスフィルタを構成するにあたり、並列共振子50pの反共振周波数fapと直列共振子50sの共振周波数frsとを近接させる。これにより、並列共振子50pのインピーダンスが0に近づく共振周波数frp近傍は、低域側阻止域となる。また、これより周波数が増加すると、反共振周波数fap近傍で並列共振子50pのインピーダンスが高くなり、かつ、共振周波数frs近傍で直列共振子50sのインピーダンスが0に近づく。これにより、反共振周波数fap~共振周波数frsの近傍では、入出力端子100から120への信号経路において信号通過域となる。さらに、周波数が高くなり、反共振周波数fas近傍になると、直列共振子50sのインピーダンスが高くなり、高周波側阻止域となる。 In configuring a band-pass filter with ladder-type resonators, the anti-resonance frequency fap of the parallel resonator 50p and the resonance frequency frs of the series resonator 50s are brought close to each other. As a result, the vicinity of the resonance frequency frp in which the impedance of the parallel resonator 50p approaches 0 becomes a low-frequency side stop band. As the frequency increases, the impedance of the parallel resonator 50p increases near the antiresonance frequency fap, and the impedance of the series resonator 50s approaches 0 near the resonance frequency frs. As a result, in the vicinity of the anti-resonance frequency fap to the resonance frequency frs, the signal path from the input / output terminals 100 to 120 becomes a signal pass band. Further, when the frequency becomes high and near the anti-resonance frequency fas, the impedance of the series resonator 50s becomes high, which becomes a high-frequency side blocking region.

 なお、並列共振子および直列共振子で構成される共振段の段数は、要求仕様に応じて、適宜最適化される。一般的に、複数の共振段で弾性波フィルタが構成される場合には、複数の並列共振子の反共振周波数fapを略一致させ、複数の直列共振子の反共振周波数fasを略一致させる。 Note that the number of resonance stages composed of parallel resonators and series resonators is appropriately optimized according to the required specifications. In general, when an elastic wave filter is configured with a plurality of resonance stages, the anti-resonance frequencies fap of the plurality of parallel resonators are substantially matched, and the anti-resonance frequencies fas of the plurality of series resonators are substantially matched.

 上記動作原理を有する弾性波フィルタにおいて、入出力端子100から高周波信号が入力されると、入出力端子100と基準端子との間で電位差が生じ、これにより、圧電体層が歪むことでX方向に伝搬する弾性表面波が発生する。ここで、IDT電極22aおよび22bのピッチλと、通過帯域の波長とを略一致させておくことにより、通過させたい周波数成分を有する高周波信号のみが当該弾性波フィルタを通過する。 In the acoustic wave filter having the above operation principle, when a high-frequency signal is input from the input / output terminal 100, a potential difference is generated between the input / output terminal 100 and the reference terminal, which causes the piezoelectric layer to be distorted, thereby causing an X direction. Surface acoustic waves propagating to the surface are generated. Here, by making the pitch λ of the IDT electrodes 22a and 22b substantially coincide with the wavelength of the pass band, only a high-frequency signal having a frequency component to be passed passes through the elastic wave filter.

 [4.弾性波フィルタの実装構成]
 本実施例に係る弾性波フィルタ装置21の実装構成の一例について説明する。
[4. Mounting configuration of elastic wave filter]
An example of the mounting configuration of the acoustic wave filter device 21 according to the present embodiment will be described.

 図4は、実施例に係る弾性波フィルタ装置21の実装構成を示す断面図である。同図に示された弾性波フィルタ装置21は、圧電体層を有する基板220と、IDT電極22と、電極パッド233と、支持層231と、カバー層232と、アンダーバンプメタル234と、バンプ235と、実装基板23と、樹脂部材24とを備える。本実施例に係る弾性波フィルタ装置21は、弾性波の伝搬機能を有する基板220がパッケージ機能を兼ねた、いわゆるWLP(Wafer Level Package)構造を有し、小型化かつ低背化を実現している。このようなWLP構造は、例えば、弾性波フィルタ装置21のようなSAWフィルタに適用される。 FIG. 4 is a cross-sectional view showing a mounting configuration of the acoustic wave filter device 21 according to the embodiment. The acoustic wave filter device 21 shown in the figure includes a substrate 220 having a piezoelectric layer, an IDT electrode 22, an electrode pad 233, a support layer 231, a cover layer 232, an under bump metal 234, and a bump 235. And a mounting board 23 and a resin member 24. The acoustic wave filter device 21 according to the present embodiment has a so-called WLP (Wafer Level Package) structure in which a substrate 220 having an acoustic wave propagation function also serves as a package function, and realizes a reduction in size and height. Yes. Such a WLP structure is applied to a SAW filter such as the elastic wave filter device 21.

 IDT電極22は、図2で示したように、基板220を伝搬する弾性波を電気信号に変換する、または電気信号を当該弾性波に変換する機能電極である。 As shown in FIG. 2, the IDT electrode 22 is a functional electrode that converts an elastic wave propagating through the substrate 220 into an electric signal, or converts an electric signal into the elastic wave.

 電極パッド233は、IDT電極22と電気的に接続され、基板220の表面に形成され、IDT電極22で変換された電気信号を取り出す、または、電気信号をIDT電極22に供給する。電極パッド233は、例えば、端子電極233aおよび配線電極233bの積層体である。端子電極233aは、IDT電極22と接続された電極であり、IDT電極22の周囲に設けられる。端子電極233aは、IDT電極22と同様の材料で構成される。配線電極233bは、端子電極233aに電気的に接続される電極であり、IDT電極22と外部配線とを接続するための配線経路の一部を構成する。端子電極233aおよび配線電極233bは、金属または合金から構成される複数の積層体から構成されてもよい。 The electrode pad 233 is electrically connected to the IDT electrode 22, is formed on the surface of the substrate 220, extracts an electric signal converted by the IDT electrode 22, or supplies the electric signal to the IDT electrode 22. The electrode pad 233 is, for example, a stacked body of terminal electrodes 233a and wiring electrodes 233b. The terminal electrode 233 a is an electrode connected to the IDT electrode 22 and is provided around the IDT electrode 22. The terminal electrode 233a is made of the same material as the IDT electrode 22. The wiring electrode 233b is an electrode electrically connected to the terminal electrode 233a, and constitutes a part of a wiring path for connecting the IDT electrode 22 and the external wiring. The terminal electrode 233a and the wiring electrode 233b may be composed of a plurality of laminated bodies composed of metals or alloys.

 支持層231は、IDT電極22を囲むように形成された支持部材である。カバー層232は、支持層231上に形成されたカバー部材である。 The support layer 231 is a support member formed so as to surround the IDT electrode 22. The cover layer 232 is a cover member formed on the support layer 231.

 上記構成により、基板220、支持層231、カバー層232は、IDT電極22を中空空間236内に封止している。 With the above configuration, the substrate 220, the support layer 231 and the cover layer 232 seal the IDT electrode 22 in the hollow space 236.

 カバー層232および支持層231には、電極パッド233に達するビアホール(貫通孔)が形成されている。このビアホールには、アンダーバンプメタル234が充填されている。アンダーバンプメタル234は、カバー層232および支持層231を貫通し、基板220の上方に形成されている。そして、アンダーバンプメタル234上には、外部に露出するバンプ235が形成されている。 In the cover layer 232 and the support layer 231, a via hole (through hole) reaching the electrode pad 233 is formed. This via hole is filled with an under bump metal 234. The under bump metal 234 penetrates the cover layer 232 and the support layer 231 and is formed above the substrate 220. A bump 235 exposed to the outside is formed on the under bump metal 234.

 バンプ235は、カバー層232から突出するように形成されている。バンプ235は、高導電性金属で構成されたボール状の電極であり、例えば、Sn/Ag/Cuで構成されたはんだバンプ、および、Auを主成分とするバンプなどが挙げられる。 The bump 235 is formed so as to protrude from the cover layer 232. The bump 235 is a ball-shaped electrode made of a highly conductive metal, and examples thereof include a solder bump made of Sn / Ag / Cu and a bump mainly composed of Au.

 実装基板23は、弾性波フィルタを実装する基板であり、例えば、プリント基板またはセラミック基板などである。実装基板23の一方の主面には、ランド電極237および配線(図示せず)が形成されている。基板220およびIDT電極22は、実装基板23のランド電極237に、バンプ235を介してフリップチップ実装(フリップチップボンディング)されている。 The mounting board 23 is a board on which the acoustic wave filter is mounted, and is, for example, a printed board or a ceramic board. A land electrode 237 and wiring (not shown) are formed on one main surface of the mounting substrate 23. The substrate 220 and the IDT electrode 22 are flip-chip mounted (flip chip bonding) on the land electrode 237 of the mounting substrate 23 via bumps 235.

 樹脂部材24は、実装基板23の主面に接し、基板220、IDT電極22およびカバー層232を覆う封止部材である。 The resin member 24 is a sealing member that contacts the main surface of the mounting substrate 23 and covers the substrate 220, the IDT electrode 22, and the cover layer 232.

 樹脂部材24の配置により、弾性波フィルタ装置21の気密性、耐熱性、耐水耐湿性、および絶縁性などの信頼性が強化される。樹脂部材24は、例えば、エポキシ樹脂などの樹脂からなる。なお、樹脂部材24は、SiOなどの無機フィラーを含有した熱硬化性のエポキシ樹脂を含んでいてもよい。ここで、樹脂部材24は、中空空間236には形成されず、カバー層232と実装基板23との間であって、複数のバンプ235の間に充填されている。 The arrangement of the resin member 24 enhances the reliability of the acoustic wave filter device 21 such as airtightness, heat resistance, water and moisture resistance, and insulation. The resin member 24 is made of a resin such as an epoxy resin, for example. Note that the resin member 24 may include a thermosetting epoxy resin containing an inorganic filler such as SiO 2 . Here, the resin member 24 is not formed in the hollow space 236 but is filled between the cover layer 232 and the mounting substrate 23 and between the plurality of bumps 235.

 上記実装構成によれば、実施例に係る弾性波フィルタ装置21の小型化かつ低背化を実現できる。 According to the mounting configuration described above, it is possible to reduce the size and height of the elastic wave filter device 21 according to the embodiment.

 なお、本発明に係る弾性波フィルタ装置21の実装構成は、上記実装構成に限定されない。例えば、圧電基板のIDT電極が形成されていない主面を、金バンプにより実装基板に実装する構成や、WLP以外の構造を有していてもよい。 Note that the mounting configuration of the elastic wave filter device 21 according to the present invention is not limited to the mounting configuration described above. For example, the main surface of the piezoelectric substrate on which the IDT electrodes are not formed may be mounted on a mounting substrate with gold bumps or may have a structure other than WLP.

 [5.弾性波フィルタ装置の回路構成]
 図1に示すように、本実施例に係る弾性波フィルタ装置21は、直列共振子101~105と、並列共振子151~154と、入出力端子100および120とを備える。
[5. Circuit configuration of acoustic wave filter device]
As shown in FIG. 1, an elastic wave filter device 21 according to this embodiment includes series resonators 101 to 105, parallel resonators 151 to 154, and input / output terminals 100 and 120.

 直列共振子101~105は、入出力端子100(第1入出力端子)と120(第2入出力端子)との間に互いに直列に接続されている。また、並列共振子151~154は、入出力端子100および120、ならびに、直列共振子101~105の各接続点と基準端子(グランド)との間に互いに並列に接続されている。直列共振子101~105および並列共振子151~154の上記接続構成により、弾性波フィルタ装置21は、ラダー型のバンドパスフィルタを構成している。 The series resonators 101 to 105 are connected in series between the input / output terminal 100 (first input / output terminal) and 120 (second input / output terminal). The parallel resonators 151 to 154 are connected in parallel to each other between the input / output terminals 100 and 120 and the connection points of the series resonators 101 to 105 and the reference terminal (ground). Due to the above-described connection configuration of the series resonators 101 to 105 and the parallel resonators 151 to 154, the acoustic wave filter device 21 constitutes a ladder type band pass filter.

 表1に、本実施例に係る弾性波フィルタ装置21の直列共振子101~105、並列共振子151~154の設計パラメータ(波長λ(電極ピッチ×2)、交叉幅L、IDT対数N、電極デューティーD)の詳細を示す。 Table 1 shows the design parameters (wavelength λ (electrode pitch × 2), cross width L, IDT logarithm N, electrode) of the series resonators 101 to 105 and the parallel resonators 151 to 154 of the elastic wave filter device 21 according to the present embodiment. Details of duty D) are shown.

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001

 上記表1において、並列共振子151~154のうち、入出力端子100(第1入出力端子)に最も近く接続された並列共振子151(第1並列共振子)と、入出力端子120(第2入出力端子)に最も近く接続された並列共振子154(第2並列共振子)とを除く並列共振子152(第3並列共振子)および153(第4並列共振子)のIDT電極は、以下の式1の関係となっている。 In Table 1, among the parallel resonators 151 to 154, the parallel resonator 151 (first parallel resonator) connected closest to the input / output terminal 100 (first input / output terminal) and the input / output terminal 120 (first IDT electrodes of the parallel resonators 152 (third parallel resonators) and 153 (fourth parallel resonators) excluding the parallel resonator 154 (second parallel resonator) connected closest to the two input / output terminals) The following formula 1 is satisfied.

 [並列共振子152の波長λ(電極ピッチ)>並列共振子151の波長λ(電極ピッチ)]かつ[並列共振子152の波長λ(電極ピッチ)>並列共振子154の波長λ(電極ピッチ)]かつ[並列共振子153の波長λ(電極ピッチ)<並列共振子154の波長λ(電極ピッチ)]かつ[並列共振子153の波長λ(電極ピッチ)<並列共振子151の波長λ(電極ピッチ)]                                            (式1)
 なお、表1には記載していないが、本実施例では、直列共振子101~105および並列共振子151~154の電極デューティーは50%である。
[Wavelength λ (electrode pitch) of parallel resonator 152> Wavelength λ (electrode pitch) of parallel resonator 151] and [Wavelength λ (electrode pitch) of parallel resonator 152> Wavelength λ (electrode pitch) of parallel resonator 154 ] And [wavelength λ (electrode pitch) of the parallel resonator 153 <wavelength λ (electrode pitch) of the parallel resonator 154] and [wavelength λ (electrode pitch) of the parallel resonator 153 <wavelength λ of the parallel resonator 151 (electrode) Pitch)] (Formula 1)
Although not described in Table 1, in this embodiment, the electrode duties of the series resonators 101 to 105 and the parallel resonators 151 to 154 are 50%.

 図5は、実施例に係る弾性波フィルタ装置21のフィルタ通過特性および共振特性を表すグラフである。同図の上段には、実施例に係る弾性波フィルタ装置21の入出力端子100および120の間の通過特性(挿入損失)が示されており、同図の下段には、実施例に係る弾性波フィルタ装置21を構成する各並列共振子のインピーダンス特性が示されている。 FIG. 5 is a graph showing filter pass characteristics and resonance characteristics of the acoustic wave filter device 21 according to the embodiment. The upper part of the figure shows the pass characteristic (insertion loss) between the input / output terminals 100 and 120 of the elastic wave filter device 21 according to the example, and the lower part of the figure shows the elastic characteristic according to the example. The impedance characteristic of each parallel resonator constituting the wave filter device 21 is shown.

 上記式1を満たすことにより、図5のインピーダンス特性に示すように、並列共振子152(第3並列共振子)の反共振周波数fap152は、並列共振子151(第1並列共振子)の反共振周波数fap151および並列共振子154(第2並列共振子)の反共振周波数fap154よりも低くなっている。また、並列共振子153(第4並列共振子)の反共振周波数fap153は、並列共振子154(第2並列共振子)の反共振周波数fap154および並列共振子151(第1並列共振子)の反共振周波数fap151よりも高くなっている。なお、並列共振子151および154の反共振周波数fap151およびfap154は、通過帯域のほぼ中央部に設定されている。また、並列共振子152の共振周波数は、並列共振子151および並列共振子154の共振周波数よりも低くなっている。また、並列共振子153の共振周波数は、並列共振子154および並列共振子151の共振周波数よりも高くなっている。 By satisfying the above equation 1, the antiresonance frequency fap152 of the parallel resonator 152 (third parallel resonator) is equal to the antiresonance of the parallel resonator 151 (first parallel resonator) as shown in the impedance characteristics of FIG. It is lower than the frequency fap 151 and the antiresonance frequency fap 154 of the parallel resonator 154 (second parallel resonator). The antiresonance frequency fap153 of the parallel resonator 153 (fourth parallel resonator) is equal to the antiresonance frequency fap154 of the parallel resonator 154 (second parallel resonator) and the antiresonance frequency fap154 of the parallel resonator 151 (first parallel resonator). It is higher than the resonance frequency fap151. Note that the antiresonance frequencies fap151 and fap154 of the parallel resonators 151 and 154 are set at substantially the center of the passband. The resonance frequency of the parallel resonator 152 is lower than the resonance frequency of the parallel resonator 151 and the parallel resonator 154. The resonance frequency of the parallel resonator 153 is higher than the resonance frequency of the parallel resonator 154 and the parallel resonator 151.

 これにより、図5の通過特性に示すように、2.4GHz帯WiFi(2400-2483MHz)のフィルタ要求仕様を満たすフィルタ特性を実現できる。これについて、以下、詳細に説明する。 Thereby, as shown in the pass characteristic of FIG. 5, it is possible to realize a filter characteristic that satisfies the filter requirement specification of 2.4 GHz band WiFi (2400-2483 MHz). This will be described in detail below.

 図6は、実施例および比較例に係る弾性波フィルタ装置のフィルタ通過特性を比較したグラフである。ここで、比較例の弾性波フィルタ装置は、図1に示されたラダー型の共振回路構成を有しているが、4つの並列共振子の反共振周波数は、ほぼ同じ周波数であって通過帯域のほぼ中央部に設定されている。 FIG. 6 is a graph comparing the filter pass characteristics of the elastic wave filter devices according to the example and the comparative example. Here, the acoustic wave filter device of the comparative example has the ladder-type resonance circuit configuration shown in FIG. 1, but the anti-resonance frequencies of the four parallel resonators are substantially the same frequency and pass band. It is set at almost the center.

 比較例のラダー型弾性波フィルタのように、全ての並列共振子の反共振周波数を通過帯域の中央付近に配置した場合、圧電体層の電気機械結合係数で決定される通過帯域よりも狭い通過帯域のフィルタ特性を得ようとしても、帯域幅が広くなり過ぎる。このため、例えば、図6(の破線)に示すように、特に、通過帯域外の低周波側における減衰量を確保できず、隣接する周波数帯域との関係で規定される低周波側の減衰スペックを満足することができない。 When the anti-resonance frequency of all parallel resonators is arranged near the center of the pass band as in the ladder type elastic wave filter of the comparative example, the pass is narrower than the pass band determined by the electromechanical coupling coefficient of the piezoelectric layer. Even if it is intended to obtain the filter characteristics of the band, the bandwidth becomes too wide. For this reason, for example, as shown in FIG. 6 (broken line), it is not possible to secure an attenuation amount on the low frequency side outside the pass band, and the attenuation specification on the low frequency side defined by the relationship with the adjacent frequency band. Can not be satisfied.

 これに対し、本実施例に係る弾性波フィルタ装置21では、図5の共振特性に示すように、並列共振子153(第4並列共振子)の電極ピッチを、入出力端子120に最も近接する並列共振子154(第2並列共振子)の電極ピッチおよび入出力端子100に最も近接する並列共振子151(第1並列共振子)の電極ピッチよりも小さくしている。これにより、並列共振子153の反共振周波数fap153を通過帯域内の中央付近よりも高周波側にシフトさせる。この結果、通過帯域低域側の通過帯域幅を狭くでき、通過帯域外の低周波側の減衰量を確保できる。 On the other hand, in the acoustic wave filter device 21 according to the present embodiment, the electrode pitch of the parallel resonator 153 (fourth parallel resonator) is closest to the input / output terminal 120 as shown in the resonance characteristics of FIG. The electrode pitch of the parallel resonator 154 (second parallel resonator) and the electrode pitch of the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100 are made smaller. As a result, the antiresonance frequency fap153 of the parallel resonator 153 is shifted to a higher frequency side than the vicinity of the center in the passband. As a result, the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured.

 このとき、並列共振子153の反共振周波数fap153を高周波側にシフトさせた影響により、通過帯域低周波側のインピーダンス整合(容量性および誘導性の度合い)がずれるため、並列共振子152(第3並列共振子)の電極ピッチを入出力端子100に最も近接する並列共振子151(第1並列共振子)の電極ピッチおよび入出力端子120に最も近接する並列共振子154(第2並列共振子)の電極ピッチよりも大きくしている。これにより、並列共振子152の反共振周波数fap152を通過帯域内の中央付近よりも低周波側にシフトさせる。この結果、上記インピーダンス整合(容量性および誘導性の度合い)を調整できる。 At this time, impedance matching (capacity and inductivity) on the low frequency side of the passband shifts due to the effect of shifting the anti-resonance frequency fap153 of the parallel resonator 153 to the high frequency side. The electrode pitch of the parallel resonator) is the electrode pitch of the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100 and the parallel resonator 154 (second parallel resonator) closest to the input / output terminal 120. It is larger than the electrode pitch. As a result, the anti-resonance frequency fap 152 of the parallel resonator 152 is shifted to the lower frequency side than the vicinity of the center in the pass band. As a result, the impedance matching (capacitive and inductive degree) can be adjusted.

 なお、上記構成により、並列共振子151(第1並列共振子)および154(第2並列共振子)の電極ピッチは、並列共振子152(第3並列共振子)の電極ピッチと並列共振子153(第4並列共振子)の電極ピッチとの間となっている。このため、弾性波フィルタ装置21の入出力端子100および120におけるインピーダンス整合はずれず、最適化された状態を維持できる。つまり、本発明の実施例に係る弾性波フィルタ装置21では、入出力端子における外部回路とのインピーダンス整合を悪化させることなく低損失かつ狭帯域のフィルタを実現するため、入出力端子100および120に最も近接する並列共振子151および154の反共振周波数を通過帯域の中央付近に固定した状態で、その他の並列共振子の反共振周波数をシフトさせている。 With the above configuration, the electrode pitch of the parallel resonator 151 (first parallel resonator) and 154 (second parallel resonator) is equal to the electrode pitch of the parallel resonator 152 (third parallel resonator) and the parallel resonator 153. It is between the electrode pitches of (fourth parallel resonator). For this reason, the impedance matching at the input / output terminals 100 and 120 of the acoustic wave filter device 21 is not shifted, and an optimized state can be maintained. In other words, in the acoustic wave filter device 21 according to the embodiment of the present invention, a low-loss and narrow-band filter is realized without deteriorating impedance matching with an external circuit at the input / output terminals. The antiresonance frequencies of the other parallel resonators are shifted while the antiresonance frequencies of the closest parallel resonators 151 and 154 are fixed near the center of the pass band.

 なお、上記実施例では、通過帯域低域側の通過帯域幅を狭くでき、通過帯域外の低周波側の減衰量を確保できることを説明したが、上記構成によれば、通過帯域高域側の通過帯域幅を狭くでき、通過帯域外の高周波側の減衰量を確保できる。 In the above embodiment, it has been described that the pass band width on the low pass band side can be narrowed and the attenuation on the low frequency side outside the pass band can be secured. The pass band width can be narrowed, and the attenuation amount on the high frequency side outside the pass band can be secured.

 すなわち、並列共振子152(第3並列共振子)の電極ピッチを、入出力端子100に最も近接する並列共振子151(第1並列共振子)の電極ピッチおよび入出力端子120に最も近接する並列共振子154(第2並列共振子)の電極ピッチよりも大きくしている。これにより、並列共振子152の反共振周波数fap152を通過帯域内の中央付近よりも低周波側にシフトさせる。この結果、通過帯域高域側の通過帯域幅を狭くでき、通過帯域外の高周波側の減衰量を確保できる。 That is, the electrode pitch of the parallel resonator 152 (third parallel resonator) is set to the electrode pitch of the parallel resonator 151 (first parallel resonator) that is closest to the input / output terminal 100 and the parallel that is closest to the input / output terminal 120. It is larger than the electrode pitch of the resonator 154 (second parallel resonator). As a result, the anti-resonance frequency fap 152 of the parallel resonator 152 is shifted to the lower frequency side than the vicinity of the center in the pass band. As a result, the pass band width on the high pass band side can be narrowed, and the attenuation on the high frequency side outside the pass band can be secured.

 このとき、並列共振子152の反共振周波数fap152を低周波側にシフトさせた影響により、通過帯域高周波側のインピーダンス整合(容量性および誘導性の度合い)がずれるため、並列共振子153(第4並列共振子)の電極ピッチを入出力端子120に最も近接する並列共振子154(第2並列共振子)の電極ピッチおよび入出力端子100に最も近接する並列共振子151(第1並列共振子)の電極ピッチよりも小さくしている。これにより、並列共振子153の反共振周波数fap153を通過帯域内の中央付近よりも高周波側にシフトさせる。この結果、上記インピーダンス整合(容量性および誘導性の度合い)を調整できる。 At this time, the impedance matching (capacity and inductivity) on the high frequency side of the passband shifts due to the effect of shifting the anti-resonance frequency fap152 of the parallel resonator 152 to the low frequency side. The electrode pitch of the parallel resonator) is the electrode pitch of the parallel resonator 154 (second parallel resonator) closest to the input / output terminal 120 and the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100. It is made smaller than the electrode pitch. As a result, the antiresonance frequency fap153 of the parallel resonator 153 is shifted to a higher frequency side than the vicinity of the center in the passband. As a result, the impedance matching (capacitive and inductive degree) can be adjusted.

 上記構成により、本発明の実施例に係る弾性波フィルタ装置21では、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のラダー型フィルタを得ることが可能となる。 With the above-described configuration, the elastic wave filter device 21 according to the embodiment of the present invention obtains a narrow band ladder type filter with good steepness in both the low frequency side and the high frequency side while ensuring low loss in the pass band. It becomes possible.

 また、並列共振子が5つ以上配置されているようなラダー型フィルタ構造を有する場合には、入出力端子に最も近接する両端の並列共振子を除く3つ以上の並列共振子のうち、少なくとも2つの並列共振子が、上記式1または式2のような関係を満たせばよい。 In the case of having a ladder type filter structure in which five or more parallel resonators are arranged, at least of three or more parallel resonators excluding parallel resonators at both ends closest to the input / output terminal. The two parallel resonators only need to satisfy the relationship of the above formula 1 or formula 2.

 また、上記実施例では、図5のインピーダンス特性に示すように、並列共振子152(第3並列共振子)の反共振周波数fap152が並列共振子151(第1並列共振子)の反共振周波数fap151および並列共振子154(第2並列共振子)の反共振周波数fap154よりも低く、かつ、並列共振子153(第4並列共振子)の反共振周波数fap153が並列共振子154(第2並列共振子)の反共振周波数fap154および並列共振子151(第1並列共振子)の反共振周波数fap151よりも高い、関係を満たすため、式1のように各並列共振子の電極ピッチの大小関係を規定したが、本発明に係る弾性波フィルタ装置はこれに限られない。 In the above embodiment, as shown in the impedance characteristics of FIG. 5, the antiresonance frequency fap152 of the parallel resonator 152 (third parallel resonator) is the antiresonance frequency fap151 of the parallel resonator 151 (first parallel resonator). The parallel resonator 154 (second parallel resonator) is lower than the anti-resonance frequency fap 154, and the parallel resonator 153 (fourth parallel resonator) has an anti-resonance frequency fap 153 of the parallel resonator 154 (second parallel resonator). In order to satisfy the relationship that is higher than the anti-resonance frequency fap 154 and the anti-resonance frequency fap 151 of the parallel resonator 151 (first parallel resonator), the relationship between the electrode pitches of the parallel resonators is defined as in Equation 1. However, the elastic wave filter device according to the present invention is not limited to this.

 本発明に係る弾性波フィルタ装置は、各並列共振子の電極ピッチの大小関係を規定する代わりに、各並列共振子の電極デューティーを規定してもよい。つまり、以下の式2の関係を満たしてもよい。 The elastic wave filter device according to the present invention may define the electrode duty of each parallel resonator instead of defining the magnitude relation of the electrode pitch of each parallel resonator. That is, the relationship of the following formula 2 may be satisfied.

 [並列共振子152の電極デューティーD>並列共振子151の電極デューティーD]かつ[並列共振子152の電極デューティーD>並列共振子154の電極デューティーD]かつ[並列共振子153の電極デューティーD<並列共振子154の電極デューティーD]かつ[並列共振子153の電極デューティーD<並列共振子151の電極デューティーD]   (式2)
 つまり、並列共振子153(第4並列共振子)の電極デューティーを、入出力端子100に最も近接する並列共振子151(第1並列共振子)の電極デューティー、および、入出力端子120に最も近接する並列共振子154(第2並列共振子)の電極デューティーよりも小さくしている。これにより、並列共振子153の反共振周波数fap153を通過帯域内の中央付近よりも高周波側にシフトさせる。この結果、通過帯域低域側の通過帯域幅を狭くでき、通過帯域外の低周波側の減衰量を確保できる。
[Electrode duty D of parallel resonator 152> electrode duty D of parallel resonator 151] and [electrode duty D of parallel resonator 152> electrode duty D of parallel resonator 154] and [electrode duty D of parallel resonator 153> Electrode duty D of parallel resonator 154] and [electrode duty D of parallel resonator 153 <electrode duty D of parallel resonator 151] (Equation 2)
That is, the electrode duty of the parallel resonator 153 (fourth parallel resonator) is set closest to the electrode duty of the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100 and the input / output terminal 120. It is made smaller than the electrode duty of the parallel resonator 154 (second parallel resonator). As a result, the antiresonance frequency fap153 of the parallel resonator 153 is shifted to a higher frequency side than the vicinity of the center in the passband. As a result, the pass band width on the low pass band side can be narrowed, and the attenuation on the low frequency side outside the pass band can be secured.

 このとき、並列共振子153の反共振周波数fap153を高周波側にシフトさせた影響により、通過帯域低周波側のインピーダンス整合(容量性および誘導性の度合い)がずれるため、並列共振子152(第3並列共振子)の電極デューティーを入出力端子100に最も近接する並列共振子151(第1並列共振子)の電極デューティーおよび入出力端子120に最も近接する並列共振子154(第2並列共振子)の電極デューティーよりも大きくしている。これにより、並列共振子152の反共振周波数fap152を通過帯域内の中央付近よりも低周波側にシフトさせる。この結果、上記インピーダンス整合(容量性および誘導性の度合い)を調整できる。 At this time, impedance matching (capacity and inductivity) on the low frequency side of the passband shifts due to the effect of shifting the anti-resonance frequency fap153 of the parallel resonator 153 to the high frequency side. The electrode duty of the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100 and the parallel resonator 154 (second parallel resonator) closest to the input / output terminal 120 are set. It is larger than the electrode duty. As a result, the anti-resonance frequency fap 152 of the parallel resonator 152 is shifted to the lower frequency side than the vicinity of the center in the pass band. As a result, the impedance matching (capacitive and inductive degree) can be adjusted.

 なお、並列共振子151(第1並列共振子)および154(第2並列共振子)の電極デューティーは、並列共振子152(第3並列共振子)の電極デューティーと並列共振子153(第4並列共振子)の電極デューティーとの間となっている。このため、弾性波フィルタ装置21の入出力端子100および120におけるインピーダンス整合はずれず、最適化された状態を維持できる。つまり、本発明の実施例に係る弾性波フィルタ装置21では、入出力端子における外部回路とのインピーダンス整合を悪化させることなく低損失かつ狭帯域のフィルタを実現するため、入出力端子100および120に最も近接する並列共振子151および154の反共振周波数を通過帯域の中央付近に固定した状態で、その他の並列共振子の反共振周波数をシフトさせている。 The electrode duty of the parallel resonator 151 (first parallel resonator) and 154 (second parallel resonator) is the same as that of the parallel resonator 152 (third parallel resonator) and the parallel resonator 153 (fourth parallel resonator). It is between the electrode duty of the resonator. For this reason, the impedance matching at the input / output terminals 100 and 120 of the acoustic wave filter device 21 is not shifted, and an optimized state can be maintained. In other words, in the acoustic wave filter device 21 according to the embodiment of the present invention, a low-loss and narrow-band filter is realized without deteriorating impedance matching with an external circuit at the input / output terminals. The antiresonance frequencies of the other parallel resonators are shifted while the antiresonance frequencies of the closest parallel resonators 151 and 154 are fixed near the center of the pass band.

 また、並列共振子152(第3並列共振子)の電極デューティーを、入出力端子100に最も近接する並列共振子151(第1並列共振子)の電極デューティー、および、入出力端子120に最も近接する並列共振子154(第2並列共振子)の電極デューティーよりも大きくしている。これにより、並列共振子152の反共振周波数fap152を通過帯域内の中央付近よりも低周波側にシフトさせる。この結果、通過帯域高域側の通過帯域幅を狭くでき、通過帯域外の高周波側の減衰量を確保できる。 Further, the electrode duty of the parallel resonator 152 (third parallel resonator) is set closest to the electrode duty of the parallel resonator 151 (first parallel resonator) closest to the input / output terminal 100 and the input / output terminal 120. The electrode duty of the parallel resonator 154 (second parallel resonator) is larger. As a result, the anti-resonance frequency fap 152 of the parallel resonator 152 is shifted to the lower frequency side than the vicinity of the center in the pass band. As a result, the pass band width on the high pass band side can be narrowed, and the attenuation on the high frequency side outside the pass band can be secured.

 このとき、並列共振子152の反共振周波数fap152を低周波側にシフトさせた影響により、通過帯域高周波側のインピーダンス整合(容量性および誘導性の度合い)がずれるため、並列共振子153(第4並列共振子)の電極デューティーを入出力端子120に最も近接する並列共振子154(第2並列共振子)の電極デューティー、および、入出力端子100に最も近接する並列共振子151(第1並列共振子)の電極デューティーよりも小さくしている。これにより、並列共振子153の反共振周波数fap153を通過帯域内の中央付近よりも高周波側にシフトさせる。この結果、上記インピーダンス整合(容量性および誘導性の度合い)を調整できる。 At this time, the impedance matching (capacity and inductivity) on the high frequency side of the passband shifts due to the effect of shifting the anti-resonance frequency fap152 of the parallel resonator 152 to the low frequency side. The electrode duty of the parallel resonator 154 (second parallel resonator) closest to the input / output terminal 120 and the parallel resonator 151 (first parallel resonance) closest to the input / output terminal 100 are set. Smaller than the electrode duty of the child). As a result, the antiresonance frequency fap153 of the parallel resonator 153 is shifted to a higher frequency side than the vicinity of the center in the passband. As a result, the impedance matching (capacitive and inductive degree) can be adjusted.

 上記のように電極デューティーを変化させる構成によっても、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のラダー型フィルタを得ることが可能となる。なお、この場合、並列共振子151~154の電極ピッチを略同一にしていることが好ましい。これにより、上記式2の規定に従い電極デューティーを変化させることで、通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のラダー型フィルタを効果的に得ることが可能となる。 Even with the configuration in which the electrode duty is changed as described above, it is possible to obtain a narrow band ladder type filter with good steepness on both the low frequency side and the high frequency side while ensuring low loss in the pass band. . In this case, it is preferable that the electrode pitches of the parallel resonators 151 to 154 are substantially the same. As a result, by changing the electrode duty in accordance with the definition of Equation 2, it is possible to effectively obtain a narrow band ladder type filter with good steepness on both the low frequency side and the high frequency side of the pass band.

 [6.高周波フロントエンド回路および通信装置の構成]
 ここで、上記実施例に係る弾性波フィルタ装置を備える高周波フロントエンド回路および通信装置について説明する。
[6. Configuration of high-frequency front-end circuit and communication apparatus]
Here, a high-frequency front-end circuit and a communication device including the elastic wave filter device according to the above embodiment will be described.

 図7は、実施例に係る弾性波フィルタ装置21を有する高周波フロントエンド回路10および通信装置1の回路構成図である。同図には、高周波フロントエンド回路10と、アンテナ素子2と、インピーダンス整合回路5と、RF信号処理回路(RFIC)3と、ベースバンド信号処理回路(BBIC)4とが示されている。 FIG. 7 is a circuit configuration diagram of the high-frequency front-end circuit 10 and the communication device 1 having the elastic wave filter device 21 according to the embodiment. In the figure, a high frequency front end circuit 10, an antenna element 2, an impedance matching circuit 5, an RF signal processing circuit (RFIC) 3, and a baseband signal processing circuit (BBIC) 4 are shown.

 高周波フロントエンド回路10と、RF信号処理回路3と、ベースバンド信号処理回路4とは、通信装置1を構成している。 The high-frequency front-end circuit 10, the RF signal processing circuit 3, and the baseband signal processing circuit 4 constitute the communication device 1.

 高周波フロントエンド回路10は、弾性波フィルタ装置11および21と、パワーアンプ回路31と、ローノイズアンプ回路41とを備える。 The high frequency front end circuit 10 includes elastic wave filter devices 11 and 21, a power amplifier circuit 31, and a low noise amplifier circuit 41.

 パワーアンプ回路31は、RF信号処理回路3から出力された高周波送信信号を増幅し、入出力端子110、弾性波フィルタ装置11およびインピーダンス整合回路5を経由してアンテナ素子2に出力する送信増幅回路である。 The power amplifier circuit 31 amplifies the high-frequency transmission signal output from the RF signal processing circuit 3 and outputs it to the antenna element 2 via the input / output terminal 110, the elastic wave filter device 11, and the impedance matching circuit 5. It is.

 ローノイズアンプ回路41は、アンテナ素子2、インピーダンス整合回路5および弾性波フィルタ装置21を経由した高周波信号を増幅し、RF信号処理回路3へ出力する受信増幅回路である。 The low noise amplifier circuit 41 is a reception amplification circuit that amplifies a high-frequency signal that has passed through the antenna element 2, the impedance matching circuit 5, and the elastic wave filter device 21 and outputs the amplified signal to the RF signal processing circuit 3.

 弾性波フィルタ装置11は、インピーダンス整合回路5を介してアンテナ素子2に接続され、例えば、BandAの送信帯域の高周波信号を選択的に通過させるフィルタである。 The acoustic wave filter device 11 is a filter that is connected to the antenna element 2 via the impedance matching circuit 5 and selectively passes, for example, a high-frequency signal in the Band A transmission band.

 弾性波フィルタ装置21は、インピーダンス整合回路5を介してアンテナ素子2に接続され、例えば、BandAの受信帯域の高周波信号を選択的に通過させるフィルタである。 The acoustic wave filter device 21 is a filter that is connected to the antenna element 2 via the impedance matching circuit 5 and selectively passes, for example, a high-frequency signal in the Band A reception band.

 RF信号処理回路3は、アンテナ素子2から受信信号経路を介して入力された高周波受信信号を、ダウンコンバートなどにより信号処理し、当該信号処理して生成された受信信号をベースバンド信号処理回路4へ出力する。また、RF信号処理回路3は、ベースバンド信号処理回路4から入力された送信信号をアップコンバートなどにより信号処理し、当該信号処理して生成された高周波送信信号をパワーアンプ回路31へ出力する。RF信号処理回路3は、例えば、RFIC(Radio Frequency Integrated Circuit)である。 The RF signal processing circuit 3 performs signal processing on the high-frequency reception signal input from the antenna element 2 via the reception signal path by down-conversion or the like, and the received signal generated by the signal processing is a baseband signal processing circuit 4. Output to. Further, the RF signal processing circuit 3 performs signal processing on the transmission signal input from the baseband signal processing circuit 4 by up-conversion or the like, and outputs the high-frequency transmission signal generated by the signal processing to the power amplifier circuit 31. The RF signal processing circuit 3 is, for example, an RFIC (Radio Frequency Integrated Circuit).

 ベースバンド信号処理回路4で処理された信号は、例えば、画像信号として画像表示のために、または、音声信号として通話のために使用される。 The signal processed by the baseband signal processing circuit 4 is used, for example, for displaying an image as an image signal or for a call as an audio signal.

 なお、高周波フロントエンド回路10は、弾性波フィルタ装置11および21、パワーアンプ回路31、ならびにローノイズアンプ回路41の間に、他の回路素子を備えていてもよい。 The high-frequency front end circuit 10 may include other circuit elements between the elastic wave filter devices 11 and 21, the power amplifier circuit 31, and the low noise amplifier circuit 41.

 ここで、高周波フロントエンド回路10では、弾性波フィルタ装置11および21の少なくとも一方に、上記実施例に係る弾性波フィルタ装置を適用することができる。 Here, in the high-frequency front-end circuit 10, the elastic wave filter device according to the above embodiment can be applied to at least one of the elastic wave filter devices 11 and 21.

 上記構成によれば、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のフィルタを有する高周波フロントエンド回路10を提供できる。 According to the above configuration, it is possible to provide the high-frequency front-end circuit 10 having a narrow-band filter having good steepness on both the low-frequency side and the high-frequency side while ensuring a low loss in the passband.

 また、上記構成によれば、通過帯域の低損失を確保しつつ通過帯域低周波側および高周波側両方の急峻性が良好な挟帯域のフィルタを有する通信装置1を提供できる。 Further, according to the above configuration, it is possible to provide the communication device 1 having a narrow band filter with good steepness on both the low frequency side and the high frequency side while ensuring low loss of the pass band.

 また、通信装置1は、高周波信号の処理方式に応じて、ベースバンド信号処理回路(BBIC)4を備えていなくてもよい。 Further, the communication device 1 may not include the baseband signal processing circuit (BBIC) 4 according to the high-frequency signal processing method.

 なお、高周波フロントエンド回路10および通信装置1において、弾性波フィルタ装置11および21は、BandAの送信信号および受信信号を同時送受信するためのデュプレクサであってもよい。また、弾性波フィルタ装置11および21は、同じバンドの送信用フィルタおよび受信用フィルタでなくてもよく、異なるバンドの送信用フィルタ、または、異なるバンドの受信用フィルタであってもよい。つまり、本実施例に係る弾性波フィルタ装置21は、デュプレクサやマルチプレクサを構成するフィルタに適用されてもよい。 In the high-frequency front-end circuit 10 and the communication device 1, the elastic wave filter devices 11 and 21 may be duplexers for simultaneously transmitting and receiving the Band A transmission signal and the reception signal. The elastic wave filter devices 11 and 21 do not have to be transmission filters and reception filters in the same band, but may be transmission filters in different bands or reception filters in different bands. That is, the elastic wave filter device 21 according to the present embodiment may be applied to a filter constituting a duplexer or a multiplexer.

 [7.その他の変形例など]
 以上、本発明の実施の形態に係る弾性波フィルタ装置、マルチプレクサ、高周波フロントエンド回路および通信装置ついて、実施例を挙げて説明したが、本発明は、上記実施例には限定されない。
[7. Other variations]
As described above, the acoustic wave filter device, the multiplexer, the high-frequency front end circuit, and the communication device according to the embodiment of the present invention have been described with reference to the examples. However, the present invention is not limited to the above examples.

 また、上記実施の形態では、IDT電極を有する弾性表面波フィルタを例示したが、本発明に係る弾性波フィルタ装置は、弾性表面波フィルタに限定されず、直列共振子および並列共振子で構成される弾性境界波やBAW(Bulk Acoustic Wave)を用いた弾性波フィルタ装置であってもよい。これによっても、上記実施の形態に係る弾性表面波フィルタが有する効果と同様の効果が奏される。 Moreover, in the said embodiment, although the surface acoustic wave filter which has an IDT electrode was illustrated, the acoustic wave filter apparatus which concerns on this invention is not limited to a surface acoustic wave filter, and is comprised with a series resonator and a parallel resonator. An elastic wave filter device using boundary acoustic waves or BAW (Bulk Acoustic Wave) may be used. Also by this, the same effect as the effect which the surface acoustic wave filter concerning the above-mentioned embodiment has is produced.

 本発明は、挟帯域幅および狭いバンド間隔の周波数規格に適用できる弾性波フィルタ装置、マルチプレクサ、高周波フロントエンド回路および通信装置として、携帯電話などの通信機器に広く利用できる。 The present invention can be widely used in communication devices such as mobile phones as an elastic wave filter device, a multiplexer, a high-frequency front-end circuit, and a communication device that can be applied to a frequency standard with a narrow bandwidth and a narrow band interval.

 1  通信装置
 2  アンテナ素子
 3  RF信号処理回路(RFIC)
 4  ベースバンド信号処理回路(BBIC)
 5  インピーダンス整合回路
 10  高周波フロントエンド回路
 11、21  弾性波フィルタ装置
 22、22a、22b  IDT電極
 23  実装基板
 24  樹脂部材
 31  パワーアンプ回路
 41  ローノイズアンプ回路
 50s、101、102、103、104、105、511a、511b、511c  直列共振子
 50p、151、152、153、154、512a、512b、512c、512d  並列共振子
 100、110、120  入出力端子
 220  基板
 221a、221b  バスバー電極
 222a、222b  電極指
 223  密着層
 224  主電極層
 225  保護層
 226  低音速膜
 227  圧電体層
 228  高音速支持基板
 231  支持層
 232  カバー層
 233  電極パッド
 233a  端子電極
 233b  配線電極
 234  アンダーバンプメタル
 235  バンプ
 236  中空空間
 237  ランド電極
DESCRIPTION OF SYMBOLS 1 Communication apparatus 2 Antenna element 3 RF signal processing circuit (RFIC)
4 Baseband signal processing circuit (BBIC)
DESCRIPTION OF SYMBOLS 5 Impedance matching circuit 10 High frequency front end circuit 11, 21 Elastic wave filter apparatus 22, 22a, 22b IDT electrode 23 Mounting board 24 Resin member 31 Power amplifier circuit 41 Low noise amplifier circuit 50s, 101, 102, 103, 104, 105, 511a 511b, 511c Series resonator 50p, 151, 152, 153, 154, 512a, 512b, 512c, 512d Parallel resonator 100, 110, 120 Input / output terminal 220 Substrate 221a, 221b Bus bar electrode 222a, 222b Electrode finger 223 Adhesion layer 224 Main electrode layer 225 Protective layer 226 Low sound velocity film 227 Piezoelectric layer 228 High sound velocity support substrate 231 Support layer 232 Cover layer 233 Electrode pad 233a Terminal electrode 233b Wiring electrode 234 Down Dah bump metal 235 bump 236 hollow space 237 land electrode

Claims (7)

 直列共振子および並列共振子を有するラダー型の弾性波フィルタ装置であって、
 第1入出力端子および第2入出力端子の間に互いに直列に接続された3以上の直列共振子と、
 前記第1入出力端子、前記第2入出力端子および前記3以上の直列共振子の接続ノードのいずれかと基準端子との間に接続された4以上の並列共振子とを備え、
 前記4以上の並列共振子のうち、前記第1入出力端子に最も近く接続された第1並列共振子と、前記第2入出力端子に最も近く接続された第2並列共振子とを除く2以上の並列共振子において、
 前記2以上の並列共振子のうちの1つである第3並列共振子の反共振周波数は、前記第1並列共振子および前記第2並列共振子の反共振周波数よりも低く、かつ、前記第3並列共振子の共振周波数は、前記第1並列共振子および前記第2並列共振子の共振周波数よりも低く、
 前記2以上の並列共振子のうちの1つである第4並列共振子の反共振周波数は、前記第1並列共振子および前記第2並列共振子の反共振周波数よりも高く、かつ、前記第4並列共振子の共振周波数は、前記第1並列共振子および前記第2並列共振子の共振周波数よりも高い、
 弾性波フィルタ装置。
A ladder-type elastic wave filter device having a series resonator and a parallel resonator,
Three or more series resonators connected in series between the first input / output terminal and the second input / output terminal;
Four or more parallel resonators connected between any of the first input / output terminal, the second input / output terminal, and the connection node of the three or more series resonators and a reference terminal;
Of the four or more parallel resonators, 2 excluding the first parallel resonator connected closest to the first input / output terminal and the second parallel resonator connected closest to the second input / output terminal. In the above parallel resonator,
An anti-resonance frequency of a third parallel resonator that is one of the two or more parallel resonators is lower than an anti-resonance frequency of the first parallel resonator and the second parallel resonator, and the first The resonant frequency of the three parallel resonators is lower than the resonant frequency of the first parallel resonator and the second parallel resonator,
An anti-resonance frequency of a fourth parallel resonator that is one of the two or more parallel resonators is higher than an anti-resonance frequency of the first parallel resonator and the second parallel resonator, and the first The resonance frequency of the four parallel resonators is higher than the resonance frequency of the first parallel resonator and the second parallel resonator.
Elastic wave filter device.
 圧電体層を有する基板上に形成されたIDT電極によって構成される直列共振子および並列共振子を有するラダー型の弾性波フィルタ装置であって、
 第1入出力端子および第2入出力端子の間に互いに直列に接続された3以上の直列共振子と、
 前記第1入出力端子、前記第2入出力端子および前記3以上の直列共振子の接続ノードのいずれかと基準端子との間に接続された4以上の並列共振子とを備え、
 前記4以上の並列共振子のうち、前記第1入出力端子に最も近く接続された第1並列共振子と前記第2入出力端子に最も近く接続された第2並列共振子とを除く2以上の並列共振子において、
 前記2以上の並列共振子のうちの1つである第3並列共振子の電極ピッチは、前記第1並列共振子および前記第2並列共振子の電極ピッチよりも大きく、
 前記2以上の並列共振子のうちの1つである第4並列共振子の電極ピッチは、前記第1並列共振子および前記第2並列共振子の電極ピッチよりも小さい、
 弾性波フィルタ装置。
A ladder-type acoustic wave filter device having a series resonator and a parallel resonator constituted by IDT electrodes formed on a substrate having a piezoelectric layer,
Three or more series resonators connected in series between the first input / output terminal and the second input / output terminal;
Four or more parallel resonators connected between any of the first input / output terminal, the second input / output terminal, and the connection node of the three or more series resonators and a reference terminal;
Of the four or more parallel resonators, two or more excluding the first parallel resonator connected closest to the first input / output terminal and the second parallel resonator connected closest to the second input / output terminal. In the parallel resonator of
The electrode pitch of the third parallel resonator that is one of the two or more parallel resonators is larger than the electrode pitch of the first parallel resonator and the second parallel resonator,
The electrode pitch of the fourth parallel resonator that is one of the two or more parallel resonators is smaller than the electrode pitch of the first parallel resonator and the second parallel resonator,
Elastic wave filter device.
 圧電体層を有する基板上に形成されたIDT電極によって構成される直列共振子および並列共振子を有するラダー型の弾性波フィルタ装置であって、
 第1入出力端子および第2入出力端子の間に互いに直列に接続された3以上の直列共振子と、
 前記第1入出力端子、前記第2入出力端子および前記3以上の直列共振子の接続ノードのいずれかと基準端子との間に接続された4以上の並列共振子とを備え、
 前記4以上の並列共振子のうち、前記第1入出力端子に最も近く接続された第1並列共振子と前記第2入出力端子に最も近く接続された第2並列共振子とを除く2以上の並列共振子において、
 前記2以上の並列共振子のうちの1つである第3並列共振子の電極デューティーは、前記第1並列共振子および前記第2並列共振子の電極デューティーよりも大きく、
 前記2以上の並列共振子のうちの1つである第4並列共振子の電極デューティーは、前記第1並列共振子および前記第2並列共振子の電極デューティーよりも小さい、
 弾性波フィルタ装置。
A ladder-type acoustic wave filter device having a series resonator and a parallel resonator constituted by IDT electrodes formed on a substrate having a piezoelectric layer,
Three or more series resonators connected in series between the first input / output terminal and the second input / output terminal;
Four or more parallel resonators connected between any of the first input / output terminal, the second input / output terminal, and the connection node of the three or more series resonators and a reference terminal;
Of the four or more parallel resonators, two or more excluding the first parallel resonator connected closest to the first input / output terminal and the second parallel resonator connected closest to the second input / output terminal. In the parallel resonator of
The electrode duty of the third parallel resonator that is one of the two or more parallel resonators is greater than the electrode duty of the first parallel resonator and the second parallel resonator,
The electrode duty of the fourth parallel resonator that is one of the two or more parallel resonators is smaller than the electrode duty of the first parallel resonator and the second parallel resonator,
Elastic wave filter device.
 前記基板は、
 前記IDT電極が一方の主面上に形成された圧電体層と、
 前記圧電体層を伝搬する弾性波音速よりも、伝搬するバルク波音速が高速である高音速支持基板と、
 前記高音速支持基板と前記圧電体層との間に配置され、前記圧電体層を伝搬する弾性波音速よりも、伝搬するバルク波音速が低速である低音速膜とを備える、
 請求項2または3に記載の弾性波フィルタ装置。
The substrate is
A piezoelectric layer in which the IDT electrode is formed on one main surface;
A high sound velocity support substrate having a bulk wave sound velocity propagating higher than an elastic wave sound velocity propagating through the piezoelectric layer;
A low-sonic film disposed between the high-sonic speed support substrate and the piezoelectric layer and having a low acoustic wave velocity propagating through the piezoelectric layer and having a low bulk acoustic wave velocity.
The elastic wave filter device according to claim 2 or 3.
 所定の周波数帯域を選択的に通過させる帯域通過フィルタを複数有することにより、入力信号を分波するマルチプレクサであって、
 前記複数の帯域通過フィルタが通過させる前記周波数帯域のそれぞれは異なり、前記複数の帯域通過フィルタのそれぞれの一端同士は共通端子に接続され、
 前記複数の帯域通過フィルタのうちの少なくとも1つが、請求項1~4のいずれか1項に記載の弾性波フィルタ装置である、
 マルチプレクサ。
A multiplexer that demultiplexes an input signal by having a plurality of bandpass filters that selectively pass a predetermined frequency band,
Each of the frequency bands through which the plurality of band pass filters pass is different, and one end of each of the plurality of band pass filters is connected to a common terminal,
At least one of the plurality of bandpass filters is the acoustic wave filter device according to any one of claims 1 to 4.
Multiplexer.
 請求項1~4のいずれか1項に記載の弾性波フィルタ装置、または、請求項5に記載のマルチプレクサと、
 前記弾性波フィルタ装置に接続され、高周波信号を増幅する増幅回路と、を備える、
 高周波フロントエンド回路。
The elastic wave filter device according to any one of claims 1 to 4, or the multiplexer according to claim 5,
An amplification circuit connected to the acoustic wave filter device for amplifying a high-frequency signal,
High frequency front end circuit.
 請求項6に記載の高周波フロントエンド回路と、
 高周波信号を処理するRF信号処理回路と、を備える、
 通信装置。
A high-frequency front-end circuit according to claim 6;
An RF signal processing circuit for processing a high-frequency signal;
Communication device.
PCT/JP2017/016619 2016-06-28 2017-04-26 Elastic wave filter device, multiplexer, high-frequency front end circuit, and communication device Ceased WO2018003268A1 (en)

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