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WO2017026747A1 - Laser processing device - Google Patents

Laser processing device Download PDF

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Publication number
WO2017026747A1
WO2017026747A1 PCT/KR2016/008643 KR2016008643W WO2017026747A1 WO 2017026747 A1 WO2017026747 A1 WO 2017026747A1 KR 2016008643 W KR2016008643 W KR 2016008643W WO 2017026747 A1 WO2017026747 A1 WO 2017026747A1
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WO
WIPO (PCT)
Prior art keywords
laser beams
lens unit
workpiece
telecentric lens
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2016/008643
Other languages
French (fr)
Korean (ko)
Inventor
성진우
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EO Technics Co Ltd
Original Assignee
EO Technics Co Ltd
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Filing date
Publication date
Application filed by EO Technics Co Ltd filed Critical EO Technics Co Ltd
Publication of WO2017026747A1 publication Critical patent/WO2017026747A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B23K26/046Automatically focusing the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067Dividing the beam into multiple beams, e.g. multifocusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment

Definitions

  • the present invention relates to a laser processing apparatus, and more particularly, to a laser processing apparatus capable of adjusting the position and angle of a laser beam irradiated to a workpiece.
  • the laser processing process refers to a process of processing a shape or physical properties of the surface of the workpiece by scanning a laser beam on the surface of the workpiece.
  • the shape may be a 2D planar shape.
  • An example of a laser processing process may be a process of crystallizing an amorphous silicon film by scanning a laser beam on a silicon wafer to form a polysilicone film.
  • the quality of the result of this machining process depends on the position, direction, time, etc. at which the laser beam is irradiated onto the workpiece.
  • the beam emitted from the light source is divided into a plurality of beams at the same time, or the position at which the laser beam emitted from the light source is irradiated onto the workpiece is moved through the operation of the scanner.
  • the angle at which the laser beam is irradiated onto the workpiece is changed depending on the path of the laser beam.
  • the processing shape of the workpiece by the laser beam is changed, which may adversely affect the laser processing quality.
  • the present invention provides a laser measuring apparatus and a laser which can determine whether a laser beam is defective by dividing a laser beam emitted from a laser light source into a measuring beam and a processing beam for a laser processing process, and then measuring optical characteristics of the measuring beam.
  • a processing system and laser measuring method are provided.
  • the laser processing apparatus includes a telecentric lens unit configured to receive the laser beams reflected from the scanners and to condense the laser beams so that the incident laser beams are incident perpendicularly to the workpiece.
  • a condensing point detecting device capable of accurately and stably detecting the condensing point position of the processing beam is provided.
  • FIG. 1 is a view illustrating a laser beam focused through a general focusing lens unit.
  • FIG. 2 is a diagram schematically illustrating a laser processing pattern by laser beams passing through the lens unit illustrated in FIG. 1.
  • FIG. 3 is a diagram illustrating beams irradiated to a telecentric lens unit according to an exemplary embodiment.
  • FIG. 4 is a view schematically showing a laser processing apparatus according to an exemplary embodiment.
  • FIG. 5 is a view schematically showing a laser processing apparatus according to another exemplary embodiment.
  • FIG. 6 is a view showing an example in which the scanner driver adjusts the position and angle of the scanner.
  • Fig. 7 is a view showing a laser processing apparatus according to another exemplary embodiment.
  • FIG. 8 is a view schematically showing a laser processing apparatus according to another exemplary embodiment.
  • FIG. 9 is a view showing an example in which the diffractive optical element shown in FIG. 8 is rotated.
  • the laser processing apparatus includes a telecentric lens unit configured to receive the laser beams reflected from the scanners and to condense the laser beams so that the incident laser beams are incident perpendicularly to the workpiece.
  • the laser beams reflected by the scanners may pass through the aperture center of the telecentric lens unit.
  • the laser processing apparatus may further include a scanner driver for adjusting the position and angle of the scanners.
  • the scanner driver may adjust the position and angle of the scanner such that the laser beams reflected from the scanners pass through the aperture center of the telecentric lens unit.
  • the laser processing apparatus may further include a photographing unit configured to photograph the laser beams emitted from the telecentric lens unit being irradiated onto the workpiece.
  • the laser processing apparatus may further include a dichroic mirror provided at an aperture of the telecentric lens unit.
  • the laser processing apparatus may further include an illumination light source irradiating illumination light toward the dichroic mirror.
  • the dichroic mirror may be configured to transmit light with respect to the wavelength of the laser beams and reflect light with respect to the wavelength of the illumination light.
  • a diffractive optical element for dividing the beam emitted from the light source into at least two;
  • a laser processing apparatus including a telecentric lens unit for allowing the beams split by the diffractive optical element to be incident perpendicularly to the workpiece.
  • the laser processing apparatus may further include a rotation stage for controlling a rotation angle of the first diffractive optical element.
  • the laser processing method includes: irradiating illumination light toward a dichroic mirror provided in an aperture of the telecentric lens unit; And
  • first and second may be used to describe various components, but the components should not be limited by the terms. The terms are only used to distinguish one component from another.
  • unit and “module” described in the specification mean a unit that processes at least one function or operation.
  • FIG. 1 is a view showing a state in which a laser beam is focused through a general focusing lens unit 10.
  • the lens unit 10 includes the first to fourth lenses 12, 14, 16, and 18 is illustrated, but this is merely illustrative, and the number of lenses included in the lens unit 10 and The shape can be changed.
  • beams passing through an aperture of the lens unit 10 may form converging points P0, P1, and P2 on the condensing surface through the lens unit 10.
  • the center light of the beam incident in parallel with the optical axis of the lens unit 10 may be irradiated perpendicular to the condensing surface. That is, the angle ⁇ 0 between the center light and the light collecting surface may be close to 90 degrees.
  • the center light of the beams incident not parallel to the optical axis of the lens unit 10 may be irradiated not perpendicular to the condensing surface.
  • the angle ⁇ 1 between the center light of the beam forming the light collecting point P1 and the light collecting surface may be smaller than 90 degrees.
  • the angle ⁇ 2 between the center light of the beam forming the light collecting point P2 and the light collecting surface may be smaller than ⁇ 1. That is, as the distance between the optical axis and the condensing point of the lens unit 10 increases, the angle between the center light of the beam and the condensing surface may become smaller.
  • the shape and angle of incidence of the laser beam are collected on the light collecting surface according to the angle of incidence of the beams.
  • FIG. 2 is a diagram schematically illustrating a laser processing pattern by laser beams passing through the lens unit 10 illustrated in FIG. 1.
  • FIG. 2A illustrates the laser processing near the optical axis of the lens unit 10, that is, near the condensing point P0.
  • 2B shows a state in which laser processing is performed at a point deviating from the optical axis of the lens unit 10, that is, near the condensing points P1 and P2.
  • the central beam of the laser beam is irradiated perpendicularly to the workpiece, so that the laser processing pattern may have a symmetrical shape.
  • the center light of the laser beam is irradiated obliquely to the workpiece at the point outside the optical axis of the lens unit 10 may change the laser processing shape. As such, when the laser processing shape is changed, the laser processing quality may be adversely affected.
  • FIG 3 is a diagram illustrating beams being irradiated to the telecentric lens unit 20 according to an exemplary embodiment.
  • light passing through the aperture center C of the telecentric lens unit 20 may be irradiated perpendicularly to the incident plane regardless of the incident angle. Since the telecentric lens unit 20 has an exit pupil close to infinity, the light irradiated with the aperture may be focused in the same shape regardless of the incident angle. However, the location of the focusing point may vary according to the incident angle of the incident beam irradiated to the aperture. For example, a relationship as shown in Equation 1 may be satisfied between the incident angle of the incident beam and the distance between the converging point and the optical axis.
  • Equation 1 h is the distance between the focusing point and the optical axis of the telecentric lens unit 20
  • f is the effective focal length of the telecentric lens unit 20
  • is the optical axis of the telecentric lens unit 20
  • the angle between the incident beam it can be seen that as the angle between the optical axis of the telecentric lens unit 20 and the incident beam increases, the distance between the condensing point and the optical axis of the telecentric lens unit 20 also increases. Therefore, by adjusting the incident direction of the incident beam, the position of the focusing point can be adjusted. For example, in FIG.
  • the telecentric lens unit 20 includes one concave lens 22, two convex lenses 26 and 28, and a lens 24 having a concave left side and a convex right side.
  • the telecentric lens unit 20 may have any other lens array that can emit light incident on the aperture center C in parallel.
  • the aperture 29 is shown to help understand the invention, but the aperture is for expressing the position and range of the lens characteristics and may not be a component that actually exists.
  • the beam passing through the telecentric aperture may have an infinite exit pupil, and light incident on the aperture may be condensed in the same shape regardless of the angle of incidence.
  • 2 is a view schematically illustrating a laser processing apparatus according to an exemplary embodiment.
  • the laser processing apparatus shown in FIG. 4 may include the telecentric lens unit 20 shown in FIG. 3.
  • the telecentric lens unit 20 is simply shown as a block in FIG. 4.
  • a laser processing apparatus may include a beam generator (not shown) for emitting a plurality of laser beams and a path of a plurality of laser beams emitted from the beam generator (not shown).
  • the laser beams reflected from the plurality of scanners 32, 34, 36, 38 and scanners 32, 34, 36, 38 for adjusting the radiation are irradiated, and the laser beams are irradiated perpendicularly to the workpiece.
  • It may include a telecentric lens unit 20 for condensing them.
  • the beam generation unit may inject the first to fourth beams L1, L2, L3, and L4 into the first to fourth scanners 32, 34, 36, and 38, respectively.
  • the configuration of the beam generator may be variously changed.
  • the beam generator may include a plurality of light sources.
  • the beam generation unit divides one light source and a beam emitted from the one light source into a plurality of beams L1, L2, L3, and L4 to the first to fourth scanners 32, 34, 36, and 38. It may also include a beam splitting optical system for transmitting.
  • the first to fourth beams L1, L2, L3, and L4 have the center C of the aperture 29 of the telecentric lens unit 20. Can be passed.
  • the position and size of the aperture of the aperture 29 of the telecentric lens unit 20 may vary depending on the size and lens characteristics of the telecentric lens unit 20. Therefore, the positions and the angles of the first to fourth scanners 32, 34, 36, and 38 may also vary according to the size and lens characteristics of the telecentric lens unit 20.
  • the first to fourth beams L1, L2, L3, and L4 are centered on the aperture 29 of the telecentric lens unit 20 by the first to fourth scanners 32, 34, 36, and 38. After passing through, the first to fourth beams L1, L2, L3, and L4 may be irradiated to the workpiece 5 in parallel with each other through the telecentric lens unit 20. That is, the first to fourth beams L1, L2, L3, and L4 may be irradiated at the same angle with respect to the workpiece 5. Through this, the plurality of laser beams L1, L2, L3, L4 may be irradiated to the workpiece 5 in the same direction and in the same beam shape. By injecting the plurality of laser beams L1, L2, L3, L4 into the workpiece 5 with the same characteristics at once, the speed of the laser processing process can be increased, and the laser processing quality can be improved.
  • FIG 4 illustrates an example in which the positions and angles of the first to fourth scanners 32, 34, 36, and 38 are fixed so that the laser beams L1, L2, L3, and L4 having the same characteristics are incident on the workpiece 5 at once. Indicated. However, the embodiment is not limited thereto.
  • FIG. 5 is a view schematically showing a laser processing apparatus according to another exemplary embodiment.
  • the description overlapping with FIG. 4 will be omitted.
  • the laser processing apparatus may include a beam generator (not shown) for emitting the first and second laser beams L1 and L2 and the first and second beams L1 and L2.
  • a beam generator (not shown) for emitting the first and second laser beams L1 and L2 and the first and second beams L1 and L2.
  • the number of laser beams and the number of scanners emitted from the beam generator (not shown) are merely exemplary and the present invention is not limited thereto.
  • the positions and angles of the first and second scanners 31 and 33 may vary. Therefore, the position where the first and second beams L1 and L2 form the light collection point on the workpiece 5 may also vary depending on the position and angle of the first and second scanners 31 and 33.
  • the laser processing apparatus may include a scanner driver (not shown) for adjusting the position and angle of the first and second scanners 31 and 33.
  • the scanner driver may adjust the position and the arrangement angle of the scanners 31 and 33.
  • the scanner drive unit positions and angles of the scanners 31 and 33 such that the beams L1 and L2 reflected by the scanners 31 and 33 pass through the center of the aperture 29 of the telecentric lens unit 20. Can be adjusted.
  • FIG. 6 is a view showing an example in which the scanner driver adjusts the position and angle of the scanner.
  • the beam L1 reflected from the scanner is arranged along the optical axis of the telecentric lens unit 20. It can be irradiated perpendicularly to the workpiece 5 past the center of the aperture 29 of 20.
  • the angle between the advancing direction of the beam reflected by the scanner and the optical axis of the telecentric lens unit 20 can be changed. have.
  • the angle of the beam reflected from the scanner is adjusted, the beam L21 reflected from the scanner may not pass through the center C of the aperture 29 of the telecentric lens unit 20. Then, even if the beam L21 passes through the telecentric lens unit 20, the workpiece 5 can be irradiated obliquely.
  • the position of the scanner may be changed so that the beam reflected from the scanner passes through the center C of the aperture 29 of the telecentric lens unit 20. That is, as the angle of the scanner is changed from ⁇ 1 to ⁇ 2, the position of the scanner may be changed from P1 to P2. Through this, the beam L22 reflected from the scanner is irradiated perpendicularly to the workpiece 5, thereby changing the position at which the beam L22 is irradiated onto the workpiece 5.
  • the laser processing apparatus In order to precisely control the operation of the scanner driver shown in FIG. 6, it is necessary to measure the laser processing process at any time.
  • the laser processing apparatus according to the exemplary embodiments illustrated in FIGS. 4 and 5 further includes a photographing unit for photographing that the laser beams emitted from the telecentric lens unit 20 are irradiated onto the workpiece 5. It may include.
  • a photographing unit for photographing that the laser beams emitted from the telecentric lens unit 20 are irradiated onto the workpiece 5. It may include.
  • FIG. 5 further includes a photographing unit will be described with reference to the drawings.
  • Fig. 7 is a view showing a laser processing apparatus according to another exemplary embodiment.
  • the laser processing apparatus may further include a photographing unit 90.
  • the photographing unit 90 may include a CCD camera 92 and a condenser lens 94 as a device for photographing illumination light reflected from the surface of the workpiece 5.
  • the CCD camera 92 is merely exemplary and may be replaced with another configuration capable of light sensing.
  • the illumination light reflected from the surface of the workpiece 5 may use reflected light by laboratory interior lighting, a separate illumination light source 70 may be further provided. If the laser processing apparatus includes a separate illumination light source 70, it is necessary to transmit some of the light from the illumination light source 70 and reflect some of the illumination light reflected from the workpiece 5 toward the CCD camera 92.
  • the beam splitter 96 may be further provided in the photographing unit 90.
  • the processing laser beams L1 and L2 may also be reflected in the workpiece 5, and when the reflected processing laser beams L1 and L2 are irradiated onto the CCD camera 92 of the imaging unit, only the adverse effects on the captured image may be affected. It may also cause damage to the equipment.
  • the laser processing apparatus may include a dichroic mirror 39 provided in the aperture 29 of the telecentric lens unit 20.
  • the dichroic mirror 39 may transmit or reflect light depending on the wavelength.
  • the dichroic mirror 39 can transmit most of the light to the wavelength of the processing laser beam and hardly reflect it. Through this, the processing laser beams L1 and L2 may be prevented from being irradiated to the photographing unit 90.
  • the dichroic mirror 39 may reflect most of the light with respect to the wavelength of the illumination light emitted from the illumination light source 70. Through this, the illumination light reflected from the workpiece 5 may be transmitted to the photographing unit 90.
  • the position of the dichroic mirror 39 is exemplary and may vary depending on the optical system configuration and the requirements of the product.
  • the CCD camera 92 of the photographing unit 90 may photograph the illumination light reflected from the workpiece 5 to provide a photographed image.
  • the laser processing process can be checked at any time through the photographed image.
  • FIG. 8 is a view schematically showing a laser processing apparatus according to another exemplary embodiment.
  • a light source (not shown) for irradiating a laser beam, a diffractive optical element 62 for dividing the beam emitted from the light source into at least two, and beams split from the diffractive optical element 62 are irradiated perpendicularly to the workpiece
  • the telecentric lens unit 20 may be included.
  • the diffractive optical element 62 may branch out one laser beam irradiated using a diffraction phenomenon of the laser beam.
  • the laser beam is branched using the diffractive optical element 62, an effect of simultaneously controlling the plurality of laser beams at a plurality of points of the object can be obtained.
  • the processing form of the object is determined according to the design of the diffractive optical element 62.
  • the beam from the light source can be split into a plurality of beams via the diffractive optical element 62.
  • the beams split by the diffractive optical element 62 may be irradiated perpendicularly to the workpiece 5 through the telecentric lens unit 20.
  • the divided laser beams are irradiated onto one workpiece line D1 on the workpiece 5.
  • the rotation angle ⁇ of the diffractive optical element 62 is 0 °
  • the position where the laser beam is irradiated on the workpiece 5 is changed by changing the rotation angle ⁇ of the diffractive optical element 62. You can change it.
  • FIG. 9 is a view showing an example in which the diffractive optical element 62 shown in FIG. 8 is rotated.
  • the diffractive optical element 62 can be rotated at a designated angle (0 ⁇ ⁇ 90 °).
  • the laser processing apparatus may include a rotating stage to rotate the diffractive optical element 62.
  • the diffractive optical element 62 is rotated by the rotating stage, the divided laser beams may be irradiated to different processing lines D1 and D2, respectively. That is, two rows of the workpiece 5 may be simultaneously processed.

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)

Abstract

A laser processing device is disclosed. The disclosed laser processing device comprises: a beam generation unit for emitting a plurality of laser beams; a plurality of scanners for adjusting paths of the plurality of laser beams emitted from the beam generation unit; and a telecentric lens unit allowing laser beams reflected from the scanners to be incident thereon, and condensing the laser beams such that the incident laser beams are vertically incident to a workpiece.

Description

레이저 가공장치Laser processing equipment

레이저 가공장치에 관한 것으로, 가공물에 조사되는 레이저 빔의 위치와 각도의 조절이 가능한 레이저 가공장치에 관한 것이다.The present invention relates to a laser processing apparatus, and more particularly, to a laser processing apparatus capable of adjusting the position and angle of a laser beam irradiated to a workpiece.

일반적으로 레이저 가공 공정이라 함은 가공물의 표면에 레이저 빔을 주사하여 가공물 표면의 형상이나 물리적 성질 등을 가공하는 공정을 말한다.. 이러한 가공물에는 여러가지 예가 있을 수 있으며 그 형상은 2 D 평면 형상일 수 있다. 레이저 가공 공정의 일 예로 실리콘 웨이퍼 상에 레이저 빔을 주사함으로써 비정질 실리콘(amorphous silicon)막을 결정화시켜 다결정 실리콘(polysilicone) 막으로 형성하는 공정이 있을 수 있다. In general, the laser processing process refers to a process of processing a shape or physical properties of the surface of the workpiece by scanning a laser beam on the surface of the workpiece. There may be various examples of such a workpiece, and the shape may be a 2D planar shape. have. An example of a laser processing process may be a process of crystallizing an amorphous silicon film by scanning a laser beam on a silicon wafer to form a polysilicone film.

이러한 가공 공정의 결과물의 품질은 레이저 빔이 가공물에 조사되는 위치, 방향, 시간 등에 의존한다. 레이저 가공공정 중에는 광원에서 출사된 빔을 복수로 분할하여 동시에 조사하거나 광원에서 출사된 레이저 빔이 가공물에 조사되는 위치를 스캐너의 조작을 통해 이동시킨다. 그런데, 이러한 경우 레이저 빔이 가공물에 조사되는 각도가 레이저 빔의 경로에 따라 달라지게 된다. 그리고, 이로 인해 레이저 빔에 의한 가공물의 가공모양이 달라지게 되어 레이저 가공품질에 악영향을 줄 수 있다.The quality of the result of this machining process depends on the position, direction, time, etc. at which the laser beam is irradiated onto the workpiece. During the laser processing process, the beam emitted from the light source is divided into a plurality of beams at the same time, or the position at which the laser beam emitted from the light source is irradiated onto the workpiece is moved through the operation of the scanner. However, in this case, the angle at which the laser beam is irradiated onto the workpiece is changed depending on the path of the laser beam. As a result, the processing shape of the workpiece by the laser beam is changed, which may adversely affect the laser processing quality.

따라서, 복수의 레이저 빔을 동시에 조사하거나, 레이저 빔의 조사위치를 변경하더라도 레이저 빔이 가공물에 조사되는 각도를 일정하게 유지시켜줄 필요가 있다. 또한, 가공위치를 정밀하게 제어하기 위해 레이저 가공공정 과정을 관측할 수 있는 관측기술이 필요하다.Therefore, even when irradiating a plurality of laser beams at the same time or changing the irradiation position of the laser beam, it is necessary to keep the angle at which the laser beam is irradiated to the workpiece constant. In addition, in order to precisely control the machining position, an observation technique capable of observing a laser machining process is required.

본 발명은, 레이저 가공 공정을 위해 레이저 광원으로부터 방출되는 레이저 빔을 측정빔과 가공빔으로 분할한 다음, 측정빔의 광 특성을 측정함으로써 레이저 빔의 불량여부를 판단할 수 있는 레이저 측정장치와 레이저 가공 시스템 및 레이저 측정방법을 제공한다.The present invention provides a laser measuring apparatus and a laser which can determine whether a laser beam is defective by dividing a laser beam emitted from a laser light source into a measuring beam and a processing beam for a laser processing process, and then measuring optical characteristics of the measuring beam. A processing system and laser measuring method are provided.

일 측면에 있어서,In one aspect,

복수의 레이저 빔을 출사시키는 빔 생성부;A beam generator for emitting a plurality of laser beams;

상기 빔 생성부에서 출사된 복수의 레이저 빔들의 경로를 조절하는 복수의 스캐너; 및A plurality of scanners for adjusting a path of the plurality of laser beams emitted from the beam generator; And

상기 스캐너들에서 반사된 레이저 빔들이 입사되며, 입사된 레이저 빔들이 가공물에 수직하게 입사되도록 상기 레이저 빔들을 집광하는 텔레센트릭 렌즈부;를 포함하는 레이저 가공장치가 제공된다.The laser processing apparatus includes a telecentric lens unit configured to receive the laser beams reflected from the scanners and to condense the laser beams so that the incident laser beams are incident perpendicularly to the workpiece.

실시예에 따르면, 집광광학계의 변동, 가공물의 두께 변화가 있더라도 가공빔의 집광점 위치를 정밀하고 안정적으로 검출할 수 있는 집광점 검출장치가 제공된다.According to the embodiment, even if there is a fluctuation in the condensing optical system and a change in the thickness of the workpiece, a condensing point detecting device capable of accurately and stably detecting the condensing point position of the processing beam is provided.

도 1은 일반적인 포커싱 렌즈부를 통해 레이저 빔이 집광되는 모습을 나타낸 도면이다.1 is a view illustrating a laser beam focused through a general focusing lens unit.

도 2는 도 1에서 나타낸 렌즈부를 통과한 레이저 빔들에 의한 레이저 가공모양을 대략적으로 나타낸 도면이다.FIG. 2 is a diagram schematically illustrating a laser processing pattern by laser beams passing through the lens unit illustrated in FIG. 1.

도 3은 예시적인 실시예에 따른 텔레센트릭 렌즈부에 빔들이 조사되는 것을 나타낸 도면이다.3 is a diagram illustrating beams irradiated to a telecentric lens unit according to an exemplary embodiment.

도 4는 예시적인 실시예에 따른 레이저 가공장치를 대략적으로 나타낸 도면이다.4 is a view schematically showing a laser processing apparatus according to an exemplary embodiment.

도 5는 다른 예시적인 실시예에 따른 레이저 가공장치를 대략적으로 나타낸 도면이다.5 is a view schematically showing a laser processing apparatus according to another exemplary embodiment.

도 6은 스캐너 구동부가 스캐너의 위치 및 각도를 조절하는 예를 나타낸 도면이다.6 is a view showing an example in which the scanner driver adjusts the position and angle of the scanner.

도 7은 다른 예시적인 실시예에 따른 레이저 가공장치를 나타낸 도면이다.Fig. 7 is a view showing a laser processing apparatus according to another exemplary embodiment.

도 8은 다른 예시적인 실시예에 따른 레이저 가공장치를 대략적으로 나타낸 도면이다.8 is a view schematically showing a laser processing apparatus according to another exemplary embodiment.

도 9는 도 8에서 나타낸 회절 광학 소자를 회전시킨 예를 나타낸 도면이다.9 is a view showing an example in which the diffractive optical element shown in FIG. 8 is rotated.

일 측면에 있어서,In one aspect,

복수의 레이저 빔을 출사시키는 빔 생성부;A beam generator for emitting a plurality of laser beams;

상기 빔 생성부에서 출사된 복수의 레이저 빔들의 경로를 조절하는 복수의 스캐너; 및A plurality of scanners for adjusting a path of the plurality of laser beams emitted from the beam generator; And

상기 스캐너들에서 반사된 레이저 빔들이 입사되며, 입사된 레이저 빔들이 가공물에 수직하게 입사되도록 상기 레이저 빔들을 집광하는 텔레센트릭 렌즈부;를 포함하는 레이저 가공장치가 제공된다.The laser processing apparatus includes a telecentric lens unit configured to receive the laser beams reflected from the scanners and to condense the laser beams so that the incident laser beams are incident perpendicularly to the workpiece.

상기 스캐너들에서 반사된 레이저 빔들은 상기 텔레센트릭 렌즈부의 어퍼쳐 중심을 통과할 수 있다.The laser beams reflected by the scanners may pass through the aperture center of the telecentric lens unit.

상기 레이저 가공장치는, 상기 스캐너들의 위치와 각도를 조절하는 스캐너 구동부를 더 포함할 수 있다.The laser processing apparatus may further include a scanner driver for adjusting the position and angle of the scanners.

상기 스캐너 구동부는 상기 스캐너들에서 반사된 레이저 빔들이 상기 텔레센트릭 렌즈부의 어퍼쳐 중심을 통과하도록 상기 스캐너의 위치와 각도를 조절할 수 있다.The scanner driver may adjust the position and angle of the scanner such that the laser beams reflected from the scanners pass through the aperture center of the telecentric lens unit.

상기 레이저 가공장치는, 상기 텔레센트릭 렌즈부로부터 출사된 레이저 빔들이 상기 가공물에 조사되는 것을 촬영하기 위한 촬영부;를 더 포함할 수 있다.The laser processing apparatus may further include a photographing unit configured to photograph the laser beams emitted from the telecentric lens unit being irradiated onto the workpiece.

상기 레이저 가공장치는, 상기 텔레센트릭 렌즈부의 어퍼쳐에 마련된 다이크로익 미러;를 더 포함할 수 있다.The laser processing apparatus may further include a dichroic mirror provided at an aperture of the telecentric lens unit.

상기 레이저 가공장치는, 상기 다이크로익 미러를 향해 조명광을 조사하는 조명광원;을 더 포함할 수 있다.The laser processing apparatus may further include an illumination light source irradiating illumination light toward the dichroic mirror.

상기 다이크로익 미러는, 상기 레이저 빔들의 파장에 대해서는 광을 투과시키고 조명광의 파장에 대해서는 광을 반사시키도록 구성될 수 있다.The dichroic mirror may be configured to transmit light with respect to the wavelength of the laser beams and reflect light with respect to the wavelength of the illumination light.

다른 측면에 있어서,In another aspect,

광원;Light source;

상기 광원에서 출사된 빔을 적어도 둘 이상으로 분할하는 회절 광학 소자(Diffractive Optical Element; DOE);A diffractive optical element (DOE) for dividing the beam emitted from the light source into at least two;

상기 회절 광학 소자에서 분할된 빔들이 가공물에 수직으로 입사되도록 하는 텔레센트릭 렌즈부;를 포함하는 레이저 가공장치가 제공된다.There is provided a laser processing apparatus including a telecentric lens unit for allowing the beams split by the diffractive optical element to be incident perpendicularly to the workpiece.

상기 레이저 가공장치는, 상기 제1 회절 광학 소자의 회전각도를 제어하는 회전 스테이지;를 더 포함할 수 있다.The laser processing apparatus may further include a rotation stage for controlling a rotation angle of the first diffractive optical element.

다른 측면에 있어서,In another aspect,

복수의 레이저 빔을 출사시키는 빔 출사단계;A beam emitting step of emitting a plurality of laser beams;

상기 빔 출사단계에서 출사된 복수의 레이저 빔들이 텔레센트릭 렌즈부로 입사되도록 상기 레이저 빔들의 광 경로를 조절하는 단계; 및Adjusting an optical path of the laser beams such that the plurality of laser beams emitted in the beam exiting step are incident on the telecentric lens unit; And

상기 텔레센트릭 렌즈부를 이용하여 상기 레이저 빔들이 가공물에 수직하게 입사되도록 상기 레이저 빔들을 집광하는 단계;를 포함하는 레이저 가공방법이 제공된다.And condensing the laser beams such that the laser beams are incident perpendicularly to the workpiece by using the telecentric lens unit.

상기 레이저 가공방법은, 상기 텔레센트릭 렌즈부의 어퍼쳐에 마련된 다이크로익 미러를 향해 조명광을 조사하는 단계; 및The laser processing method includes: irradiating illumination light toward a dichroic mirror provided in an aperture of the telecentric lens unit; And

상기 가공물에 의해 반사된 상기 조명광 측정함으로써 상기 레이저 빔들이 상기 가공물에 조사되는 것을 촬영하는 단계;를 포함할 수 있다.Photographing that the laser beams are irradiated onto the workpiece by measuring the illumination light reflected by the workpiece.

이하의 도면들에서 동일한 참조부호는 동일한 구성요소를 지칭하며, 도면상에서 각 구성요소의 크기는 설명의 명료성과 편의상 과장되어 있을 수 있다. 한편, 이하에 설명되는 실시예는 단지 예시적인 것에 불과하며, 이러한 실시예들로부터 다양한 변형이 가능하다. In the drawings, like reference numerals refer to like elements, and the size of each element in the drawings may be exaggerated for clarity and convenience of description. Meanwhile, the embodiments described below are merely exemplary, and various modifications are possible from these embodiments.

제 1, 제 2 등의 용어는 다양한 구성요소들을 설명하는데 사용될 수 있지만, 구성요소들은 용어들에 의해 한정되어서는 안 된다. 용어들은 하나의 구성요소를 다른 구성요소로부터 구별하는 목적으로만 사용된다.Terms such as first and second may be used to describe various components, but the components should not be limited by the terms. The terms are only used to distinguish one component from another.

단수의 표현은 문맥상 명백하게 다르게 뜻하지 않는 한, 복수의 표현을 포함한다. 또한 어떤 부분이 어떤 구성요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.Singular expressions include plural expressions unless the context clearly indicates otherwise. In addition, when a part is said to "include" a certain component, which means that it may further include other components, except to exclude other components unless otherwise stated.

또한, 명세서에 기재된 “...부”, “모듈” 등의 용어는 적어도 하나의 기능이나 동작을 처리하는 단위를 의미한다.In addition, terms such as “unit” and “module” described in the specification mean a unit that processes at least one function or operation.

도 1은 일반적인 포커싱 렌즈부(10)를 통해 레이저 빔이 집광되는 모습을 나타낸 도면이다. 도 1에서는 렌즈부(10)가 제1 내지 제4 렌즈(12, 14, 16, 18)를 포함하는 예를 나타냈지만 이는 예시적인 것에 불과할 뿐, 렌즈부(10)에 포함된 렌즈의 개수 및 모양은 바뀔 수 있다.1 is a view showing a state in which a laser beam is focused through a general focusing lens unit 10. In FIG. 1, an example in which the lens unit 10 includes the first to fourth lenses 12, 14, 16, and 18 is illustrated, but this is merely illustrative, and the number of lenses included in the lens unit 10 and The shape can be changed.

도 1을 참조하면, 렌즈부(10)의 어퍼쳐(aperture)를 통과한 빔들이 렌즈부(10)를 거쳐 집광면에 집광점들(P0, P1, P2)을 형성할 수 있다. 렌즈부(10)의 광축과 평행하게 입사된 빔의 중심광은 집광면에 수직하게 조사될 수 있다. 즉, 중심광과 집광면 사이의 각도 θ0가 90도에 근접할 수 있다. 하지만, 렌즈부(10)의 광축에 평행하지 않게 입사된 빔들의 중심광은 집광면에 수직하지 않게 조사될 수 있다. 예를 들어, 집광점 P1을 형성하는 빔의 중심광과 집광면 사이 각도 θ1은 90도보다 작아질 수 있다. 또한, 집광점 P2를 형성하는 빔의 중심광과 집광면 사이 각도 θ2는 θ1보다 더 작아질 수 있다. 즉, 렌즈부(10)의 광축과 집광점 사이 거리가 멀어질수록 빔의 중심광과 집광면 사이 각도가 작아질 수 있다.Referring to FIG. 1, beams passing through an aperture of the lens unit 10 may form converging points P0, P1, and P2 on the condensing surface through the lens unit 10. The center light of the beam incident in parallel with the optical axis of the lens unit 10 may be irradiated perpendicular to the condensing surface. That is, the angle θ0 between the center light and the light collecting surface may be close to 90 degrees. However, the center light of the beams incident not parallel to the optical axis of the lens unit 10 may be irradiated not perpendicular to the condensing surface. For example, the angle θ1 between the center light of the beam forming the light collecting point P1 and the light collecting surface may be smaller than 90 degrees. Further, the angle θ2 between the center light of the beam forming the light collecting point P2 and the light collecting surface may be smaller than θ1. That is, as the distance between the optical axis and the condensing point of the lens unit 10 increases, the angle between the center light of the beam and the condensing surface may become smaller.

도 1에서 나타낸 바와 같이, 렌즈부(10)의 어퍼쳐 내에 빔들이 조사되더라도 빔들의 입사각에 따라 집광면에서 레이저 빔이 집광되는 모양과 입사각도가 달라질 수 있다. As shown in FIG. 1, even when beams are irradiated into the aperture of the lens unit 10, the shape and angle of incidence of the laser beam are collected on the light collecting surface according to the angle of incidence of the beams.

도 2는 도 1에서 나타낸 렌즈부(10)를 통과한 레이저 빔들에 의한 레이저 가공모양을 대략적으로 나타낸 도면이다. 도 2의 (a)는 렌즈부(10)의 광축 근처 즉, 집광점 P0 근처에서 레이저 가공이 이루어진 모습을 나타낸다. 또한, 도 2의 (b)는 렌즈부(10)의 광축으로부터 벗어난 지점, 즉, 집광점 P1, P2 근처에서 레이저 가공이 이루어진 모습을 나타낸다.FIG. 2 is a diagram schematically illustrating a laser processing pattern by laser beams passing through the lens unit 10 illustrated in FIG. 1. FIG. 2A illustrates the laser processing near the optical axis of the lens unit 10, that is, near the condensing point P0. 2B shows a state in which laser processing is performed at a point deviating from the optical axis of the lens unit 10, that is, near the condensing points P1 and P2.

도 2의 (a)를 참조하면, 렌즈부(10)의 광축 근처에서는 레이저 빔의 중심광이 가공물에 대해 수직하게 조사되어 레이저 가공모양이 대칭적인 모양을 가질 수 있다. 반면, 도 2의 (b)를 참조하면, 렌즈부(10)의 광축을 벗어난 지점에서는 레이저 빔의 중심광이 가공물에 대해 비스듬하게 조사되어 레이저 가공모양이 바뀔 수 있다. 이와 같이 레이저 가공모양이 바뀌면 레이저 가공품질에 악영향을 줄 수 있다.Referring to FIG. 2A, near the optical axis of the lens unit 10, the central beam of the laser beam is irradiated perpendicularly to the workpiece, so that the laser processing pattern may have a symmetrical shape. On the other hand, referring to Figure 2 (b), the center light of the laser beam is irradiated obliquely to the workpiece at the point outside the optical axis of the lens unit 10 may change the laser processing shape. As such, when the laser processing shape is changed, the laser processing quality may be adversely affected.

도 3은 예시적인 실시예에 따른 텔레센트릭 렌즈부(20)에 빔들이 조사되는 것을 나타낸 도면이다.3 is a diagram illustrating beams being irradiated to the telecentric lens unit 20 according to an exemplary embodiment.

도 3을 참조하면, 텔레센트릭 렌즈부(20)의 어퍼쳐 중심(C)을 통과한 광은 입사각에 관계없이 항상 입사면에 수직하게 조사될 수 있다. 텔레센트릭 렌즈부(20)는 출사동(Exit pupil)이 무한대에 가깝기 때문에 어퍼쳐로 조사되는 광은 입사각에 관계없이 같은 모양으로 집광할 수 있다. 다만, 어퍼쳐에 조사되는 입사빔의 입사각에 따라 집광점의 위치가 달라질 수 있다. 예시적으로, 입사빔의 입사각과 집광점과 광축 사이의 거리 사이에는 수학식 1과 같은 관계가 만족할 수 있다.Referring to FIG. 3, light passing through the aperture center C of the telecentric lens unit 20 may be irradiated perpendicularly to the incident plane regardless of the incident angle. Since the telecentric lens unit 20 has an exit pupil close to infinity, the light irradiated with the aperture may be focused in the same shape regardless of the incident angle. However, the location of the focusing point may vary according to the incident angle of the incident beam irradiated to the aperture. For example, a relationship as shown in Equation 1 may be satisfied between the incident angle of the incident beam and the distance between the converging point and the optical axis.

Figure PCTKR2016008643-appb-I000001
... 수학식 1
Figure PCTKR2016008643-appb-I000001
... Equation 1

수학식 1에서 h는 집광점과 텔레센트릭 렌즈부(20)의 광축 사이의 거리, f는 텔레센트릭 렌즈부(20)의 유효초점거리, θ는 텔레센트릭 렌즈부(20)의 광축과 입사빔 사이의 각도를 나타낸다. 수학식 1을 참조하면, 텔레센트릭 렌즈부(20)의 광축과 입사빔 사이의 각도가 커질수록 집광점과 텔레센트릭 렌즈부(20)의 광축 사이의 거리도 커짐을 알 수 있다. 따라서, 입사빔의 입사방향을 조절함으로써, 집광점의 위치를 조절할 수 있다. 예를 들어, 도 3에서 광축에 대해 α1의 각도로 입사된 빔은 광축으로부터 h1=f* α1만큼 떨어진 지점에 집광점을 형성할 수 있다. 또한, 광축에 대해 α2의 각도로 입사된 빔은 광축으로부터 h2=f* α2만큼 떨어진 지점에 집광점을 형성할 수 있다.In Equation 1, h is the distance between the focusing point and the optical axis of the telecentric lens unit 20, f is the effective focal length of the telecentric lens unit 20, θ is the optical axis of the telecentric lens unit 20 And the angle between the incident beam. Referring to Equation 1, it can be seen that as the angle between the optical axis of the telecentric lens unit 20 and the incident beam increases, the distance between the condensing point and the optical axis of the telecentric lens unit 20 also increases. Therefore, by adjusting the incident direction of the incident beam, the position of the focusing point can be adjusted. For example, in FIG. 3, a beam incident at an angle of α1 with respect to the optical axis may form a condensing point at a point apart from the optical axis by h1 = f * α1. In addition, a beam incident at an angle of α2 with respect to the optical axis may form a condensing point at a point apart from the optical axis by h2 = f * α2.

도 3에서는 텔레센트릭 렌즈부(20)가 하나의 오목렌즈(22)와 두 개의 볼록렌즈(26, 28), 그리고 좌측은 오목하고 우측은 볼록한 렌즈(24)를 포함하는 예를 나타냈다. 하지만, 텔레센트릭 렌즈부(20)는 어퍼쳐 중심(C)에 입사된 광을 평행하게 출사시킬 수 있는 임의의 다른 렌즈배열을 가질 수도 있다. 본 발명에서는 발명의 이해를 돕기 위해 어퍼쳐(29)를 도시하였으나, 어퍼쳐는 렌즈 특성의 위치와 범위를 표현하기 위한 것이며 실제로 존재하는 구성품은 아닐 수 있다. 전술한 바와 같이 텔레센트릭의 어퍼쳐를 통과한 빔은 출사동(Exit pupil)이 무한대로 될 수 있으며, 어펴처로 입사하는 광은 입사각에 관계없이 같은 모양으로 집광할 수 있다.도 4는 예시적인 실시예에 따른 레이저 가공장치를 대략적으로 나타낸 도면이다. 도 4에서 나타낸 레이저 가공장치는 도 3에서 나타낸 텔레센트릭 렌즈부(20)를 포함할 수 있다. 편의상 도 4에서는 텔레센트릭 렌즈부(20)를 간단하게 블록으로 나타내었다.3 illustrates an example in which the telecentric lens unit 20 includes one concave lens 22, two convex lenses 26 and 28, and a lens 24 having a concave left side and a convex right side. However, the telecentric lens unit 20 may have any other lens array that can emit light incident on the aperture center C in parallel. In the present invention, the aperture 29 is shown to help understand the invention, but the aperture is for expressing the position and range of the lens characteristics and may not be a component that actually exists. As described above, the beam passing through the telecentric aperture may have an infinite exit pupil, and light incident on the aperture may be condensed in the same shape regardless of the angle of incidence. 2 is a view schematically illustrating a laser processing apparatus according to an exemplary embodiment. The laser processing apparatus shown in FIG. 4 may include the telecentric lens unit 20 shown in FIG. 3. For convenience, the telecentric lens unit 20 is simply shown as a block in FIG. 4.

도 4를 참조하면, 예시적인 실시예에 따른, 레이저 가공장치는, 복수의 레이저 빔을 출사시키는 빔 생성부(미도시)와, 빔 생성부(미도시)에서 출사된 복수의 레이저 빔들의 경로를 조절하는 복수의 스캐너(32, 34, 36, 38) 및 스캐너들(32, 34, 36, 38)에서 반사된 레이저 빔들이 조사되며, 입사된 레이저 빔들이 가공물에 수직하게 조사되도록 상기 레이저 빔들을 집광하는 텔레센트릭 렌즈부(20)를 포함할 수 있다. 4, a laser processing apparatus according to an exemplary embodiment may include a beam generator (not shown) for emitting a plurality of laser beams and a path of a plurality of laser beams emitted from the beam generator (not shown). The laser beams reflected from the plurality of scanners 32, 34, 36, 38 and scanners 32, 34, 36, 38 for adjusting the radiation are irradiated, and the laser beams are irradiated perpendicularly to the workpiece. It may include a telecentric lens unit 20 for condensing them.

빔 생성부(미도시)는 도 4에서 나타낸 바와 같이 제1 내지 제4 빔(L1, L2, L3, L4)을 각각 제1 내지 제4 스캐너(32, 34, 36, 38)에 입사시킬 수 있다. 빔 생성부의 구성은 다양하게 변경될 수 있다. 예를 들어, 빔 생성부는 복수의 광원을 포함할 수 있다. 다른 예로, 빔 생성부는 하나의 광원과 상기 하나의 광원에서 출사된 빔을 복수의 빔(L1, L2, L3, L4)으로 분할하여 제1 내지 제4 스캐너(32, 34, 36, 38)에 전달하는 빔 분할 광학계를 포함할 수도 있다.As shown in FIG. 4, the beam generation unit may inject the first to fourth beams L1, L2, L3, and L4 into the first to fourth scanners 32, 34, 36, and 38, respectively. have. The configuration of the beam generator may be variously changed. For example, the beam generator may include a plurality of light sources. As another example, the beam generation unit divides one light source and a beam emitted from the one light source into a plurality of beams L1, L2, L3, and L4 to the first to fourth scanners 32, 34, 36, and 38. It may also include a beam splitting optical system for transmitting.

제1 내지 제4 스캐너(32, 34, 36, 38)는 제1 내지 제4 빔들(L1, L2, L3, L4)이 텔레센트릭 렌즈부(20)의 어퍼쳐(29) 중심(C)을 지나도록 할 수 있다. 여기서, 텔레센트릭 렌즈부(20)의 어퍼쳐(29)의 개구의 위치 및 크기는 텔레센트릭 렌즈부(20)의 크기와 렌즈 특성에 따라 달라질 수 있다. 따라서, 제1 내지 제4 스캐너(32, 34, 36, 38)의 위치 및 배열 각도 또한 텔레센트릭 렌즈부(20)의 크기와 렌즈 특성에 따라 달라질 수 있다.In the first to fourth scanners 32, 34, 36, and 38, the first to fourth beams L1, L2, L3, and L4 have the center C of the aperture 29 of the telecentric lens unit 20. Can be passed. Here, the position and size of the aperture of the aperture 29 of the telecentric lens unit 20 may vary depending on the size and lens characteristics of the telecentric lens unit 20. Therefore, the positions and the angles of the first to fourth scanners 32, 34, 36, and 38 may also vary according to the size and lens characteristics of the telecentric lens unit 20.

제1 내지 제4 스캐너(32, 34, 36, 38)에 의해 제1 내지 제4 빔들(L1, L2, L3, L4)이 텔레센트릭 렌즈부(20)의 어퍼쳐(29) 중심(C)을 지나면, 제1 내지 제4 빔들(L1, L2, L3, L4)은 텔레센트릭 렌즈부(20)를 지나 서로 평행하게 가공물(5)에 조사될 수 있다. 즉, 제1 내지 제4 빔들(L1, L2, L3, L4) 가공물(5)에 대해 같은 각도로 조사될 수 있다. 이를 통해, 복수의 레이저 빔들(L1, L2, L3, L4)이 동일한 방향 및 동일한 빔 모양으로 가공물(5)에 조사될 수 있다. 복수의 레이저 빔(L1, L2, L3, L4)을 한꺼번에 동일한 특성으로 가공물(5)에 입사시킴으로써 레이저 가공공정의 속도를 높이고, 레이저 가공 품질을 높일 수 있다.The first to fourth beams L1, L2, L3, and L4 are centered on the aperture 29 of the telecentric lens unit 20 by the first to fourth scanners 32, 34, 36, and 38. After passing through, the first to fourth beams L1, L2, L3, and L4 may be irradiated to the workpiece 5 in parallel with each other through the telecentric lens unit 20. That is, the first to fourth beams L1, L2, L3, and L4 may be irradiated at the same angle with respect to the workpiece 5. Through this, the plurality of laser beams L1, L2, L3, L4 may be irradiated to the workpiece 5 in the same direction and in the same beam shape. By injecting the plurality of laser beams L1, L2, L3, L4 into the workpiece 5 with the same characteristics at once, the speed of the laser processing process can be increased, and the laser processing quality can be improved.

도 4에서는 제1 내지 제4 스캐너(32, 34, 36, 38)의 위치 및 각도가 고정되어 동일한 특성의 레이저 빔들(L1, L2, L3, L4)을 한꺼번에 가공물(5)에 입사시키는 예를 나타냈다. 하지만, 실시예가 이에 제한되는 것은 아니다.4 illustrates an example in which the positions and angles of the first to fourth scanners 32, 34, 36, and 38 are fixed so that the laser beams L1, L2, L3, and L4 having the same characteristics are incident on the workpiece 5 at once. Indicated. However, the embodiment is not limited thereto.

도 5는 다른 예시적인 실시예에 따른 레이저 가공장치를 대략적으로 나타낸 도면이다. 도 5의 실시예를 설명함에 있어서, 도 4와 중복되는 내용은 생략하기로 한다.5 is a view schematically showing a laser processing apparatus according to another exemplary embodiment. In the description of the embodiment of FIG. 5, the description overlapping with FIG. 4 will be omitted.

도 5를 참조하면, 예시적인 실시예에 따른 레이저 가공장치는, 제1 및 제2 레이저 빔(L1, L2)을 출사시키는 빔 생성부(미도시)와 제1 및 제2 빔(L1, L2)이 각각 조사되는 제1 및 제2 스캐너(31, 33)를 포함할 수 있다. 여기서, 빔 생성부(미도시)에서 출사되는 레이저 빔의 개수 및 스캐너의 개수는 예시적인 것에 불과하며 이에 제한되는 것은 아니다. 도 5에서 나타낸 실시예에서는 제1 및 제2 스캐너(31, 33)의 위치 및 각도가 변할 수 있다. 따라서 제1 및 제2 빔(L1, L2)이 가공물(5)에 집광점을 형성하는 위치 또한, 제1 및 제2 스캐너(31, 33)의 위치 및 각도에 따라 변할 수 있다. Referring to FIG. 5, the laser processing apparatus according to the exemplary embodiment may include a beam generator (not shown) for emitting the first and second laser beams L1 and L2 and the first and second beams L1 and L2. ) May include first and second scanners 31 and 33 respectively irradiated. Here, the number of laser beams and the number of scanners emitted from the beam generator (not shown) are merely exemplary and the present invention is not limited thereto. In the embodiment shown in FIG. 5, the positions and angles of the first and second scanners 31 and 33 may vary. Therefore, the position where the first and second beams L1 and L2 form the light collection point on the workpiece 5 may also vary depending on the position and angle of the first and second scanners 31 and 33.

도면에는 나타내지 않았지만, 예시적인 실시예에 따른 레이저 가공장치는, 제1 및 제2 스캐너(31, 33)의 위치 및 각도를 조절하는 스캐너 구동부(미도시)를 포함할 수 있다. 스캐너 구동부는 스캐너들(31, 33)의 위치와 배열각도를 조절할 수 있다. 스캐너 구동부는, 스캐너들(31, 33)에서 반사된 빔들(L1, L2)이 텔레센트릭 렌즈부(20)의 어퍼쳐(29) 중심을 통과하도록 스캐너들(31, 33)의 위치 및 각도를 조절할 수 있다.Although not shown in the drawings, the laser processing apparatus according to the exemplary embodiment may include a scanner driver (not shown) for adjusting the position and angle of the first and second scanners 31 and 33. The scanner driver may adjust the position and the arrangement angle of the scanners 31 and 33. The scanner drive unit positions and angles of the scanners 31 and 33 such that the beams L1 and L2 reflected by the scanners 31 and 33 pass through the center of the aperture 29 of the telecentric lens unit 20. Can be adjusted.

도 6은 스캐너 구동부가 스캐너의 위치 및 각도를 조절하는 예를 나타낸 도면이다.6 is a view showing an example in which the scanner driver adjusts the position and angle of the scanner.

도 6을 참조하면, 스캐너가 광원(50)으로부터 나온 빔과 β1의 각도를 이룰 때, 스캐너에서 반사된 빔(L1)이 텔레센트릭 렌즈부(20)의 광축을 따라 텔레센트릭 렌즈부(20)의 어퍼쳐(29) 중심을 지나서 가공물(5)에 수직하게 조사될 수 있다. 여기서, 빔이 가공물(5)에 집광되는 위치를 바꾸기 위해서 수학식 1을 참조하여 설명한 바와 같이, 스캐너에서 반사되는 빔의 진행방향과 텔레센트릭 렌즈부(20)의 광축 사이의 각도를 변경할 수 있다. 그런데 스캐너에서 반사되는 빔의 각도를 조절하면 스캐너에서 반사된 빔(L21)이 텔레센트릭 렌즈부(20)의 어퍼쳐(29) 중심(C)을 통과하지 않을 수 있다. 그렇게 되면, 빔(L21)이 텔레센트릭 렌즈부(20)를 통과하더라도 가공물(5)에 비스듬하게 조사될 수 있다. Referring to FIG. 6, when the scanner forms an angle of β1 with the beam emitted from the light source 50, the beam L1 reflected from the scanner is arranged along the optical axis of the telecentric lens unit 20. It can be irradiated perpendicularly to the workpiece 5 past the center of the aperture 29 of 20. Here, as described with reference to Equation 1 to change the position where the beam is focused on the workpiece 5, the angle between the advancing direction of the beam reflected by the scanner and the optical axis of the telecentric lens unit 20 can be changed. have. However, if the angle of the beam reflected from the scanner is adjusted, the beam L21 reflected from the scanner may not pass through the center C of the aperture 29 of the telecentric lens unit 20. Then, even if the beam L21 passes through the telecentric lens unit 20, the workpiece 5 can be irradiated obliquely.

따라서, 스캐너에서 반사된 빔이 텔레센트릭 렌즈부(20)의 어퍼쳐(29) 중심(C)을 통과하도록 스캐너의 위치를 변경해줄 수 있다. 즉, 스캐너의 각도를 β1에서 β2로 변경함에 따라 스캐너의 위치를 P1에서 P2로 변경할 수 있다. 이를 통해, 스캐너에서 반사된 빔(L22)이 가공물(5)에 수직하게 조사되면서 가공물(5)에 빔(L22)이 조사되는 위치를 변경할 수 있다.Therefore, the position of the scanner may be changed so that the beam reflected from the scanner passes through the center C of the aperture 29 of the telecentric lens unit 20. That is, as the angle of the scanner is changed from β1 to β2, the position of the scanner may be changed from P1 to P2. Through this, the beam L22 reflected from the scanner is irradiated perpendicularly to the workpiece 5, thereby changing the position at which the beam L22 is irradiated onto the workpiece 5.

도 6에서 나타낸 스캐너 구동부의 동작 등을 정밀하게 제어하기 위해서는 레이저 가공공정 과정을 수시로 측정할 필요가 있다. 이를 위해, 도 4 및 도 5에서 나타낸 예시적인 실시예들에 따른 레이저 가공장치는, 텔레센트릭 렌즈부(20)로부터 출사된 레이저 빔들이 가공물(5)에 조사되는 것을 촬영하기 위한 촬영부를 더 포함할 수 있다. 이하에서는 도 5에서 나타낸 실시예에 따른 레이저 가공장치가 촬영부를 더 포함하는 예를 도면을 참조하여 설명한다.In order to precisely control the operation of the scanner driver shown in FIG. 6, it is necessary to measure the laser processing process at any time. To this end, the laser processing apparatus according to the exemplary embodiments illustrated in FIGS. 4 and 5 further includes a photographing unit for photographing that the laser beams emitted from the telecentric lens unit 20 are irradiated onto the workpiece 5. It may include. Hereinafter, an example in which the laser processing apparatus according to the embodiment illustrated in FIG. 5 further includes a photographing unit will be described with reference to the drawings.

도 7은 다른 예시적인 실시예에 따른 레이저 가공장치를 나타낸 도면이다.Fig. 7 is a view showing a laser processing apparatus according to another exemplary embodiment.

도 7을 참조하면, 실시예에 따른 레이저 가공장치는, 촬영부(90)를 더 포함할 수 있다. 촬영부(90)는, 가공물(5) 표면에서 반사된 조명광을 촬영하기 위한 장치로서 CCD 카메라(92)와, 집광렌즈(94)를 포함할 수 있다. CCD 카메라(92)는 예시적인 것에 불과할 뿐, 광 센싱이 가능한 다른 구성으로 대체될 수도 있다. 가공물(5) 표면에서 반사되는 조명광은 실험실 내부 조명에 의한 반사광을 사용할 수도 있지만, 별도 조명용 광원(70)이 추가로 마련될 수 있다. 레이저 가공장치가 별도의 조명용 광원(70)을 포함하는 경우, 조명용 광원(70)에서 나온 광 중 일부를 투과시키고 가공물(5)에서 반사된 조명용 광 중 일부는 CCD 카메라(92) 쪽으로 반사시키기 위한 빔 스플리터(96)가 촬영부(90)에 더 마련될 수도 있다.Referring to FIG. 7, the laser processing apparatus according to the embodiment may further include a photographing unit 90. The photographing unit 90 may include a CCD camera 92 and a condenser lens 94 as a device for photographing illumination light reflected from the surface of the workpiece 5. The CCD camera 92 is merely exemplary and may be replaced with another configuration capable of light sensing. Although the illumination light reflected from the surface of the workpiece 5 may use reflected light by laboratory interior lighting, a separate illumination light source 70 may be further provided. If the laser processing apparatus includes a separate illumination light source 70, it is necessary to transmit some of the light from the illumination light source 70 and reflect some of the illumination light reflected from the workpiece 5 toward the CCD camera 92. The beam splitter 96 may be further provided in the photographing unit 90.

일반적으로 가공물(5)에서 가공용 레이저 빔(L1, L2)도 반사가 일어날 수 있으며, 반사된 가공용 레이저 빔(L1, L2)이 촬영부의 CCD 카메라(92)에 조사되면 촬영영상에 악영향을 줄 뿐 아니라 장비의 손상을 야기할 수 있다. 이를 방지하기 위해, 실시예에 따른 레이저 가공장치는, 텔레센트릭 렌즈부(20)의 어퍼쳐(29)에 마련된 다이크로익 미러(dichroic mirror,39)를 포함할 수 있다. 다이크로익 미러(39)는 파장에 따라 광을 투과시키거나 반사시킬 수 있다. 예를 들어, 다이크로익 미러(39)는 가공용 레이저 빔의 파장에 대해서는 광을 대부분 투과시켜버리고 거의 반사시키지 않을 수 있다. 이를 통해 촬영부(90)에 가공용 레이저 빔(L1, L2)이 조사되는 것을 방지할 수 있다. 반면, 다이크로익 미러(39)는 조명용 광원(70)에서 출사되는 조명용 광의 파장에 대해서는 광을 대부분 반사시켜 버릴 수 있다. 이를 통해, 가공물(5)에서 반사된 조명용 광이 촬영부(90)에 대부분 전달되도록 할 수 있다. 다이크로익 미러(39)의 위치는 예시적인 것이며, 광학계 구성 및 제품의 요구사항에 따라 달라질 수 있다.In general, the processing laser beams L1 and L2 may also be reflected in the workpiece 5, and when the reflected processing laser beams L1 and L2 are irradiated onto the CCD camera 92 of the imaging unit, only the adverse effects on the captured image may be affected. It may also cause damage to the equipment. In order to prevent this, the laser processing apparatus according to the embodiment may include a dichroic mirror 39 provided in the aperture 29 of the telecentric lens unit 20. The dichroic mirror 39 may transmit or reflect light depending on the wavelength. For example, the dichroic mirror 39 can transmit most of the light to the wavelength of the processing laser beam and hardly reflect it. Through this, the processing laser beams L1 and L2 may be prevented from being irradiated to the photographing unit 90. On the other hand, the dichroic mirror 39 may reflect most of the light with respect to the wavelength of the illumination light emitted from the illumination light source 70. Through this, the illumination light reflected from the workpiece 5 may be transmitted to the photographing unit 90. The position of the dichroic mirror 39 is exemplary and may vary depending on the optical system configuration and the requirements of the product.

촬영부(90)의 CCD 카메라(92)는 가공물(5)에서 반사된 조명용 광을 촬영하여 촬영이미지를 제공할 수 있다. 상기 촬영이미지를 통해 레이저 가공공정을 수시로 체크할 수 있다.The CCD camera 92 of the photographing unit 90 may photograph the illumination light reflected from the workpiece 5 to provide a photographed image. The laser processing process can be checked at any time through the photographed image.

이상의 실시예에서는 스캐너를 이용하여 텔레센트릭 렌즈부(20)에 복수의 빔을 입사시키는 실시예들을 설명했다. 이하에서는 회절 광학 소자(Diffractive Optical Element; DOE)를 이용하여 텔레센트릭 렌즈부(20)에 복수의 빔을 입사시키는 예를 설명한다.In the above embodiments, embodiments in which a plurality of beams are incident on the telecentric lens unit 20 using a scanner have been described. Hereinafter, an example in which a plurality of beams are incident on the telecentric lens unit 20 by using a diffractive optical element (DOE) will be described.

도 8은 다른 예시적인 실시예에 따른 레이저 가공장치를 대략적으로 나타낸 도면이다.8 is a view schematically showing a laser processing apparatus according to another exemplary embodiment.

도 8을 참조하면, 예시적인 실시예에 따른 레이저 가공장치는, 8, the laser processing apparatus according to an exemplary embodiment,

레이저 빔을 조사하는 광원(미도시)과, 상기 광원에서 출사된 빔을 적어도 둘 이상으로 분할하는 회절 광학 소자(62) 및 상기 회절 광학 소자(62)에서 분할된 빔들이 가공물에 수직으로 조사되도록 하는 텔레센트릭 렌즈부(20)를 포함할 수 있다.A light source (not shown) for irradiating a laser beam, a diffractive optical element 62 for dividing the beam emitted from the light source into at least two, and beams split from the diffractive optical element 62 are irradiated perpendicularly to the workpiece The telecentric lens unit 20 may be included.

회절 광학 소자(62)는 레이저 빔의 회절 현상을 이용하여 조사되는 하나의 레이저 빔을 복수개로 분기하여 출사할 수 있다. 회절 광학 소자(62)를 이용하여 레이저 빔을 분기시키면 대상물의 복수의 지점에 복수의 레이저 빔을 동시에 조절할 수 있는 효과를 얻을 수 있다. 아울러, 대상물의 가공 형태는 회절 광학 소자(62)의 디자인에 따라 결정된다. 광원에서 나온 빔은 회절 광학 소자(62)를 거쳐 복수의 빔으로 분할될 수 있다. 또한, 회절 광학 소자(62)에서 분할된 빔들은 텔레센트릭 렌즈부(20)를 지나 가공물(5)에 수직하게 조사될 수 있다. The diffractive optical element 62 may branch out one laser beam irradiated using a diffraction phenomenon of the laser beam. When the laser beam is branched using the diffractive optical element 62, an effect of simultaneously controlling the plurality of laser beams at a plurality of points of the object can be obtained. In addition, the processing form of the object is determined according to the design of the diffractive optical element 62. The beam from the light source can be split into a plurality of beams via the diffractive optical element 62. In addition, the beams split by the diffractive optical element 62 may be irradiated perpendicularly to the workpiece 5 through the telecentric lens unit 20.

도 8에서는 분할된 레이저 빔들이 가공물(5) 상에서 하나의 가공라인(D1)에 조사되고 있다. 이 상태를 회절 광학 소자(62)의 회전각도(θ)가 0°라고 정하면, 회절 광학 소자(62)의 회전각도(θ)를 바꿈에 따라 가공물(5) 상에 레이저 빔이 조사되는 위치를 변경할 수 있다. In FIG. 8, the divided laser beams are irradiated onto one workpiece line D1 on the workpiece 5. In this state, if the rotation angle θ of the diffractive optical element 62 is 0 °, the position where the laser beam is irradiated on the workpiece 5 is changed by changing the rotation angle θ of the diffractive optical element 62. You can change it.

도 9는 도 8에서 나타낸 회절 광학 소자(62)를 회전시킨 예를 나타낸 도면이다.FIG. 9 is a view showing an example in which the diffractive optical element 62 shown in FIG. 8 is rotated.

도 9를 참조하면, 회절 광학 소자(62)를 지정된 각도(0<θ<90°) 회전시킬 수 있다. 회절 광학 소자(62)를 회전시키기 위해 레이저 가공장치는, 회전 스테이지를 포함할 수 있다. 회전 스테이지에 의해 회절 광학 소자(62)가 회전되면 분할된 레이저 빔들이 각각 다른 가공라인(D1, D2)에 조사될 수 있다. 즉, 가공물(5)에 2줄 가공이 동시에 수행될 수 있다.Referring to FIG. 9, the diffractive optical element 62 can be rotated at a designated angle (0 <θ <90 °). The laser processing apparatus may include a rotating stage to rotate the diffractive optical element 62. When the diffractive optical element 62 is rotated by the rotating stage, the divided laser beams may be irradiated to different processing lines D1 and D2, respectively. That is, two rows of the workpiece 5 may be simultaneously processed.

이상의 설명에서 많은 사항들이 구체적으로 기재되어 있으나, 그들은 발명의 범위를 한정하는 것이라기보다 바람직한 실시예의 예시로서 해석되어야 한다. 때문에 본 발명의 범위는 설명된 실시예에 의하여 정하여 질 것이 아니고 특허 청구범위에 기재된 기술적 사상에 의해 정하여져야 한다.While many details are set forth in the foregoing description, they should be construed as illustrative of preferred embodiments rather than to limit the scope of the invention. Therefore, the scope of the present invention should not be defined by the described embodiments, but should be determined by the technical spirit described in the claims.

Claims (12)

복수의 레이저 빔을 출사시키는 빔 생성부;A beam generator for emitting a plurality of laser beams; 상기 빔 생성부에서 출사된 복수의 레이저 빔들의 경로를 조절하는 복수의 스캐너; 및A plurality of scanners for adjusting a path of the plurality of laser beams emitted from the beam generator; And 상기 스캐너들에서 반사된 레이저 빔들이 입사되며, 입사된 레이저 빔들이 가공물에 수직하게 입사되도록 상기 레이저 빔들을 집광하는 텔레센트릭 렌즈부;를 포함하는 레이저 가공장치.And a telecentric lens unit configured to focus the laser beams so that the laser beams reflected from the scanners are incident and the incident laser beams are incident perpendicularly to the workpiece. 제 1 항에 있어서,The method of claim 1, 상기 스캐너들에서 반사된 레이저 빔들은 상기 텔레센트릭 렌즈부의 어퍼쳐 중심을 통과하는 레이저 가공장치.And laser beams reflected from the scanners pass through an aperture center of the telecentric lens unit. 제 1 항에 있어서,The method of claim 1, 상기 스캐너들의 위치와 각도를 조절하는 스캐너 구동부를 더 포함하는 레이저 가공장치.The laser processing apparatus further comprises a scanner driver for adjusting the position and angle of the scanners. 제 3 항에 있어서,The method of claim 3, wherein 상기 스캐너 구동부는 상기 스캐너들에서 반사된 레이저 빔들이 상기 텔레센트릭 렌즈부의 어퍼쳐 중심을 통과하도록 상기 스캐너의 위치와 각도를 조절하는 레이저 가공장치.And the scanner driver adjusts the position and angle of the scanner such that the laser beams reflected from the scanners pass through the aperture center of the telecentric lens unit. 제 1 항에 있어서,The method of claim 1, 상기 텔레센트릭 렌즈부로부터 출사된 레이저 빔들이 상기 가공물에 조사되는 것을 촬영하기 위한 촬영부;를 더 포함하는 레이저 가공장치.And a photographing unit configured to photograph the laser beams emitted from the telecentric lens unit being irradiated onto the workpiece. 제 5 항에 있어서,The method of claim 5, 상기 텔레센트릭 렌즈부의 어퍼쳐에 마련된 다이크로익 미러;를 더 포함하는 레이저 가공장치.And a dichroic mirror provided at the aperture of the telecentric lens unit. 제 6 항에 있어서,The method of claim 6, 상기 다이크로익 미러를 향해 조명광을 조사하는 조명광원;을 더 포함하는 레이저 가공장치.And an illumination light source for irradiating illumination light toward the dichroic mirror. 제 7 항에 있어서,The method of claim 7, wherein 상기 다이크로익 미러는, 상기 레이저 빔들의 파장에 대해서는 광을 투과시키고 조명광의 파장에 대해서는 광을 반사시키도록 구성되는 레이저 가공장치.And the dichroic mirror is configured to transmit light with respect to the wavelength of the laser beams and reflect light with respect to the wavelength of the illumination light. 광원;Light source; 상기 광원에서 출사된 빔을 적어도 둘 이상으로 분할하는 회절 광학 소자(Diffractive Optical Element; DOE);A diffractive optical element (DOE) for dividing the beam emitted from the light source into at least two; 상기 회절 광학 소자에서 분할된 빔들이 가공물에 수직으로 입사되도록 하는 텔레센트릭 렌즈부;를 포함하는 레이저 가공장치.And a telecentric lens unit for allowing the beams split by the diffractive optical element to be incident perpendicularly to the workpiece. 제 9 항에 있어서, The method of claim 9, 상기 회절 광학 소자의 회전각도를 제어하는 회전 스테이지;를 더 포함하는 레이저 가공장치.And a rotation stage for controlling the rotation angle of the diffractive optical element. 복수의 레이저 빔을 출사시키는 빔 출사단계;A beam emitting step of emitting a plurality of laser beams; 상기 빔 출사단계에서 출사된 복수의 레이저 빔들이 텔레센트릭 렌즈부로 입사되도록 상기 레이저 빔들의 광 경로를 조절하는 단계; 및Adjusting an optical path of the laser beams such that the plurality of laser beams emitted in the beam exiting step are incident on the telecentric lens unit; And 상기 텔레센트릭 렌즈부를 이용하여 상기 레이저 빔들이 가공물에 수직하게 입사되도록 상기 레이저 빔들을 집광하는 단계;를 포함하는 레이저 가공방법.And condensing the laser beams such that the laser beams are incident perpendicularly to a workpiece using the telecentric lens unit. 제 11 항에 있어서,The method of claim 11, 상기 텔레센트릭 렌즈부의 어퍼쳐에 마련된 다이크로익 미러를 향해 조명광을 조사하는 단계; 및Irradiating illumination light toward a dichroic mirror provided in an aperture of the telecentric lens unit; And 상기 가공물에 의해 반사된 상기 조명광을 측정함으로써 상기 레이저 빔들이 상기 가공물에 조사되는 것을 촬영하는 단계;를 포함하는 레이저 가공방법.Photographing that the laser beams are irradiated onto the workpiece by measuring the illumination light reflected by the workpiece.
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KR20170018740A (en) 2017-02-20
TW201711780A (en) 2017-04-01

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