[go: up one dir, main page]

WO2017024616A1 - 超窄边框显示面板 - Google Patents

超窄边框显示面板 Download PDF

Info

Publication number
WO2017024616A1
WO2017024616A1 PCT/CN2015/087946 CN2015087946W WO2017024616A1 WO 2017024616 A1 WO2017024616 A1 WO 2017024616A1 CN 2015087946 W CN2015087946 W CN 2015087946W WO 2017024616 A1 WO2017024616 A1 WO 2017024616A1
Authority
WO
WIPO (PCT)
Prior art keywords
light blocking
substrate
blocking walls
disposed
walls
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2015/087946
Other languages
English (en)
French (fr)
Inventor
马超
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TCL China Star Optoelectronics Technology Co Ltd
Original Assignee
Shenzhen China Star Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US14/781,311 priority Critical patent/US9885918B2/en
Publication of WO2017024616A1 publication Critical patent/WO2017024616A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G02F1/133723—Polyimide, polyamide-imide
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133388—Constructional arrangements; Manufacturing methods with constructional differences between the display region and the peripheral region
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136231—Active matrix addressed cells for reducing the number of lithographic steps
    • G02F1/136236—Active matrix addressed cells for reducing the number of lithographic steps using a grey or half tone lithographic process
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device

Definitions

  • the present invention relates to the field of display manufacturing, and in particular to an ultra-narrow bezel display panel.
  • Liquid crystal display has many advantages such as thin body, power saving, and no radiation, and has been widely used.
  • Most of the liquid crystal display devices on the market are backlight type liquid crystal display devices, which include a liquid crystal display panel and a backlight module.
  • the working principle of the liquid crystal display panel is to place liquid crystal molecules in two parallel glass substrates, and control the liquid crystal molecules to change direction by energizing or not the glass substrate, and refract the light of the backlight module to produce a picture.
  • a liquid crystal display panel consists of a color filter substrate (CF), a thin film transistor substrate (TFT, Thin Film Transistor), a liquid crystal (LC) sandwiched between a color filter substrate and a thin film transistor substrate, and a sealant frame ( Sealant composition; generally, the thin film transistor substrate and the color film substrate respectively have an oriented film, and the alignment film can make the LC produce a pretilt angle in a certain direction after contacting the LC, thereby providing a bearing angle to the liquid crystal molecules (pre The size of the tilt angle has an important influence on the driving voltage, contrast, response time, viewing angle, etc. of the TFT-LCD.
  • the material of the alignment film is usually made of polyimide (PI) material, which is formed by coating the PI liquid on the substrate. .
  • the ultra-narrow bezel will further narrow the traditional TFT-LCD frame, further expanding the area of the effective display area (AA), thereby achieving a higher-level visual experience and product design aesthetic. That is to say, in the design and manufacture of the LCD panel, higher challenges are proposed, such as the accuracy of the device, the matching of the performance of the material, and the like, which require a large degree of improvement and improvement.
  • the coating accuracy of the PI liquid becomes particularly important. Because the design of the ultra-narrow bezel is different from the previous design, the AA area is closer to the edge of the glass substrate, and the PI liquid coating process is faced with the reflow after PI coating, the shrink film precision control after PI over-bake, etc. Once the coating accuracy of the PI liquid around the panel is not well controlled, it will cause the mura phenomenon (uneven brightness phenomenon) appearing around the AA area due to PI reflow to the AA area around the LCD panel, which greatly affects the panel. of Quality and yield.
  • the present invention provides an ultra-narrow bezel display panel, comprising a TFT substrate and a CF substrate disposed opposite to each other, and a frame glue sealingly connecting the TFT substrate and the CF substrate;
  • An effective display area at the center and a peripheral area located at the periphery of the effective display area, and the effective display area and the peripheral area on the TFT substrate and the CF substrate correspond to each other, and the frame is glued to the TFT substrate and the CF Between the peripheral regions of the substrate;
  • a plurality of light blocking walls are disposed in a peripheral region of the TFT substrate, and a plurality of light blocking walls and a plurality of grooves are disposed in a peripheral region of the CF substrate, thereby preventing coating of the PI liquid on the TFT substrate and the CF substrate.
  • the PI liquid that has been clothed to the surrounding area is returned to the effective display area.
  • first and second light blocking walls are disposed in the peripheral region of the TFT substrate, and the first light blocking wall, the second light blocking wall, the third light blocking wall, and the fourth light blocking wall are sequentially arranged from the outer side to the inner side of the TFT substrate;
  • the first and second light blocking walls are respectively disposed on the outer side and the inner side of the frame glue, and a gap is formed between the first and second light blocking walls, and the inner side of the second light blocking wall is a PI printing boundary, and the third a fourth light blocking wall is disposed between the boundary of the effective display area and the PI printing boundary;
  • a black matrix is disposed on the CF substrate, and three light blocking walls are disposed on the black matrix in the peripheral area of the CF substrate, and the fifth light blocking wall, the sixth light blocking wall, and the seventh light blocking are sequentially from the outer side to the inner side of the CF substrate.
  • the fifth and sixth light blocking walls are respectively disposed on the outer side and the inner side of the frame glue, and a certain gap is formed between the fifth and sixth light blocking walls, and the inner side of the sixth light blocking wall is a PI printing boundary.
  • the seventh light blocking wall is disposed between the boundary of the effective display area and the PI printing boundary;
  • a first trench is disposed between the sixth and seventh light blocking walls on the black matrix, and a second trench is disposed on an inner side of the seventh light blocking wall.
  • the widths and lengths of the first, second, third, and fourth light blocking walls are the same.
  • the height d 2 of the fourth light blocking wall is greater than the height d 1 of the third light blocking wall, and the heights d 1 , d 2 need to satisfy the following conditions:
  • l 0 and L are respectively the width and length of the third and fourth light blocking walls
  • l 1 is the spacing between the second and third light blocking walls
  • l 2 is the third and fourth light blocking walls.
  • X is the accuracy error of the PI liquid machine
  • Y is the thickness of the wet film after the PI liquid is applied.
  • the heights of the first and second light blocking walls are the same, and the heights d 0 of the first and second light blocking walls are greater than the height d 2 of the fourth light blocking walls.
  • the first, second, third, and fourth light blocking walls are exposed by using a half-light dimmer.
  • a color photoresist layer is disposed under the first, second, third, and fourth light blocking walls of the TFT substrate, and the first, second, third, and fourth light blocking walls and the color photoresist layer are used.
  • the material of the first, second, third, and fourth light blocking walls is a color photoresist.
  • the width, height, and length of the fifth, sixth, and seventh light blocking walls are the same.
  • the width and height of the first trench and the second trench are equal, and the width l of the first and second trenches needs to satisfy the following conditions:
  • K, H, and L are respectively the width, height, and length of the fifth, sixth, and seventh light blocking walls
  • h is the height of the first and second grooves
  • X is a PI liquid machine
  • Y is the thickness of the wet film after the PI solution is applied.
  • a plurality of photoresist spacers are uniformly distributed in the effective display area of the CF substrate, and the fifth, sixth, and seventh light blocking walls are formed by the same mask process as the photoresist spacers.
  • the fifth, sixth, and seventh light blocking walls are the same as the material of the photoresist spacer.
  • the present invention also provides an ultra-narrow bezel display panel, comprising a TFT substrate and a CF substrate disposed opposite to each other, and a frame glue sealingly connecting the TFT substrate and the CF substrate; the TFT substrate and the CF substrate are both located at the center An effective display area and a peripheral area located at a periphery of the effective display area, wherein the TFT substrate and the effective display area and the peripheral area on the CF substrate correspond to each other, and the frame is glued to the peripheral area of the TFT substrate and the CF substrate between;
  • a plurality of light blocking walls are disposed in a peripheral region of the TFT substrate, and a plurality of light blocking walls and a plurality of grooves are disposed in a peripheral region of the CF substrate, thereby preventing coating of the PI liquid on the TFT substrate and the CF substrate.
  • the PI liquid discharged to the surrounding area is returned to the effective display area;
  • four light blocking walls are disposed in the peripheral region of the TFT substrate, and are external to the TFT substrate.
  • the side to the inner side are: a first light blocking wall, a second light blocking wall, a third light blocking wall, and a fourth light blocking wall; the first and second light blocking walls are respectively disposed on the outer side and the inner side of the frame glue.
  • the inner side of the second light blocking wall is a PI printing boundary, and the third and fourth light blocking walls are disposed at the boundary of the effective display area and the PI printing Between the boundaries;
  • a black matrix is disposed on the CF substrate, and three light blocking walls are disposed on the black matrix in the peripheral area of the CF substrate, and the fifth light blocking wall, the sixth light blocking wall, and the seventh light blocking are sequentially from the outer side to the inner side of the CF substrate.
  • the fifth and sixth light blocking walls are respectively disposed on the outer side and the inner side of the frame glue, and a certain gap is formed between the fifth and sixth light blocking walls, and the inner side of the sixth light blocking wall is a PI printing boundary.
  • the seventh light blocking wall is disposed between the boundary of the effective display area and the PI printing boundary;
  • a first trench is disposed on the black matrix corresponding to the sixth and seventh light blocking walls, and a second trench is disposed on an inner side of the seventh light blocking wall;
  • widths and lengths of the first, second, third, and fourth light blocking walls are the same;
  • first, second, third, and fourth light blocking walls are exposed by using a half-light dimmer
  • first, second, third, and fourth light blocking walls of the TFT substrate are provided with a color photoresist layer, and the first, second, third, and fourth light blocking walls and the color photoresist
  • the layers are made by the same reticle process, and the materials of the first, second, third, and fourth light blocking walls are colored photoresists;
  • the effective display area of the CF substrate is provided with a plurality of photoresist spacers uniformly distributed, and the fifth, sixth, and seventh light blocking walls are formed by the same mask process as the photoresist spacers.
  • the fifth, sixth, and seventh light blocking walls are the same material as the photoresist spacer.
  • the ultra-narrow bezel display panel provided by the present invention has a plurality of light blocking walls and a plurality of grooves in a peripheral region of the CF substrate by providing a plurality of light blocking walls in a peripheral region of the TFT substrate, and
  • the height of the light blocking wall and the width of the groove are designed to take into account the multi-discharge portion due to the precision error of the machine.
  • the calculation of the light blocking wall and the groove size is accurately defined by calculation, thereby preventing coating on the TFT substrate and the CF substrate.
  • the PI liquid coated around the effective display area is returned to the effective display area to improve the surrounding mura phenomenon of the effective display area, and the light blocking wall located inside and outside the frame glue can maintain the frame.
  • the function of the thickness of the peripheral panel of the rubber further improves the quality of the display panel and improves the production yield; the light blocking walls of different heights on the TFT substrate are obtained by exposure using a halftone mask, so that the manufacturing process of the liquid crystal display panel is simple The production cost is lower.
  • FIG. 1 is a schematic structural view of a TFT substrate in an ultra-narrow bezel display panel of the present invention
  • FIG. 2 is a perspective view of a light blocking wall on the TFT substrate of FIG. 1;
  • FIG. 3 is a schematic structural view of a CF substrate in an ultra-narrow bezel display panel of the present invention
  • FIG. 4 is a perspective view of a light blocking wall and a black matrix trench on the CF substrate of FIG. 3.
  • the invention provides an ultra-narrow bezel display panel, which can overcome the PI liquid reflow phenomenon to the utmost extent, and effectively improve the surrounding mura phenomenon caused by the reflow of PI liquid frequently encountered in the ultra-narrow bezel, thereby improving the PI caused by the ultra-narrow bezel design. Yield problem.
  • the ultra-narrow bezel display panel includes a TFT substrate 10 and a CF substrate 20 disposed opposite to each other, and a frame glue 30 sealingly connecting the TFT substrate 10 and the CF substrate 20; the TFT substrate 10 and the CF substrate 20 are respectively provided with an effective display area at the center and a peripheral area located at the periphery of the effective display area, and the effective display area and the peripheral area on the TFT substrate 10 and the CF substrate 20 correspond to each other.
  • the frame glue 30 is disposed between the TFT substrate 10 and the peripheral region of the CF substrate 20.
  • each light blocking wall is disposed in the peripheral area of the TFT substrate 10, and the first light blocking wall 11, the second light blocking wall 12, and the third are sequentially from the outer side to the inner side of the TFT substrate 10.
  • a color photoresist layer is disposed under the first, second, third, and fourth light blocking walls 11 , 12 , 13 , 14 of the TFT substrate 10 , and the first, second, third, The fourth light blocking walls 11, 12, 13, 14 and the color photoresist layer are formed by the same mask process, and the materials of the first, second, third, and fourth light blocking walls 11, 12, 13, and 14 are formed. For color resists.
  • the first and second light blocking walls 11 and 12 are respectively disposed on the outer side and the inner side of the frame glue 30, and a gap is formed between the first and second light blocking walls 30, and the inner side of the second light blocking wall 12 is PI.
  • Printing boundary, the third and third light blocking walls 13, 14 are disposed on the side of the effective display area Between the boundary and the PI print boundary.
  • first and second light blocking walls 11 and 12 have the function of maintaining the thickness of the panel of the periphery of the frame glue 30, and the first light blocking wall 11 further has the function of preventing the cover glue 30 from overflowing.
  • the second light blocking wall 12 has a function of blocking the frame glue 30 from overlapping with the PI.
  • the widths and lengths of the first, second, third, and fourth light blocking walls 11, 12, 13, and 14 are the same, the width is l 0 , and the length is L.
  • the height d 2 of the fourth light blocking wall 14 is greater than the height d 1 of the third light blocking wall 13 , and the heights d 1 , d 2 need to satisfy the following conditions:
  • l 0 and L are the widths and lengths of the third and third light blocking walls 13 and 14, respectively, and l 1 is the spacing between the second and third light blocking layers 12 and 13 , and l 2 is the third.
  • the spacing between the third and fourth light blocking walls 13, 14 is the accuracy error of the PI liquid machine, and Y is the thickness of the wet film after the PI liquid is applied.
  • the PI liquid amount S1 to be accommodated between the second and third light blocking walls 12, 13 is composed of two parts: a normal coating amount + 1/2 of the third light blocking wall 13
  • the heights of the first and second light blocking walls 11 and 12 are the same, and both are d 0 , and the heights d 0 of the first and second light blocking layers 11 and 12 are slightly larger than the fourth light blocking.
  • the height of the wall 14 is d 2 .
  • the first, second, third, and fourth light blocking walls 11, 12, 13, 14 pass It is exposed by a half-light dimmer.
  • the CF substrate 20 is provided with a black matrix 23, and the black matrix 23 located in the peripheral region of the CF substrate 20 is provided with three light blocking walls, and the fifth light is sequentially from the outer side to the inner side of the CF substrate 20.
  • the effective display area of the CF substrate 20 is provided with a plurality of photoresist spacers uniformly distributed, and the fifth, sixth, and seventh light blocking walls 231, 232, and 233 and the photoresist spacers.
  • the fifth, sixth, and seventh light blocking walls 231, 232, and 233 are made of the same material as the photoresist spacer by the same mask process.
  • the fifth and sixth light blocking walls 231 and 232 are respectively disposed on the outer side and the inner side of the frame glue 30, and a gap is formed between the fifth and sixth light blocking walls 30, and the inner side of the sixth light blocking wall 232 is PI.
  • a printing boundary is provided, and the seventh light blocking wall 233 is disposed between the effective display area boundary and the PI printing boundary.
  • a first trench 235 is disposed between the sixth and seventh light blocking walls 232 and 233 on the black matrix 23, and a second trench 236 is disposed on the inner side of the seventh light blocking wall 233.
  • the space between the sixth and seventh light blocking walls 232 and 233 and the first trench 235 serve to accommodate the multi-discharge amount caused by the precision error of the machine and the seventh light blocking wall 233.
  • the effect of the falling PI liquid; the second groove 236 beside the seventh light blocking wall 233 functions to accommodate the PI liquid sliding on the seventh light blocking wall 233.
  • the fifth and sixth light blocking walls 231 and 232 function to maintain the thickness of the panel of the periphery of the frame glue 30, and the fifth light blocking wall 231 also has the function of preventing the frame glue 30 from overflowing.
  • the sixth light blocking wall 232 also has the function of blocking the frame glue 30 from overlapping with the PI.
  • the width, height, and length of the fifth, sixth, and seventh light blocking walls 231, 232, and 233 are the same.
  • the width and height of the first trench 235 and the second trench 236 are equal.
  • the width l of the first and second trenches 235 and 236 needs to satisfy the following conditions:
  • K, H, and L are the width, height, and length of the fifth, sixth, and seventh light blocking walls 231, 232, and 233, respectively, and h is the first and second grooves 235 and 236. Height, X is the accuracy error of the PI machine, and Y is the thickness of the wet film after the PI solution is applied.
  • S3 is further determined by the width l of the first trench 235, that is, (H+h) ⁇ L ⁇ l ⁇ (L ⁇ K ⁇ Y)/2+X+(Y ⁇ L ⁇ l), and it is inferred that:
  • the ultra-narrow bezel display panel provided by the present invention has several light blocking walls and a plurality of trenches in the peripheral region of the CF substrate by providing a plurality of light blocking walls in the peripheral region of the TFT substrate, and in the light.
  • the height of the barrier wall and the width of the groove are designed to take into account the multi-discharge portion due to the precision error of the machine.
  • the calculation of the size of the light-blocking wall and the groove is accurately defined by calculation, thereby preventing coating on the TFT substrate and the CF substrate.
  • the PI liquid coated around the effective display area is returned to the effective display area to improve the surrounding mura phenomenon of the effective display area, and the light blocking wall located inside and outside the frame glue can serve to maintain the frame glue.
  • the function of the thickness of the peripheral panel further improves the quality of the display panel and improves the production yield; the light blocking walls of different heights on the TFT substrate are obtained by exposure using a halftone mask, so that the manufacturing process of the liquid crystal display panel is simple. Production costs are lower.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

一种超窄边框显示面板，通过在TFT基板（10）的周边区域中设置数道光阻挡墙（11，12，13，14），在CF基板（20）的周边区域中设置数道光阻挡墙（231，232，233）及数条沟槽（235，236），并且在光阻挡墙（13，14）的高度（d 1，d 2）及沟槽（235，236）的宽度（l）设计上考虑了由于机台的精度误差导致的多吐出部分，通过计算准确定义光阻挡墙（13，14）及沟槽（235，236）的铺设尺寸，从而防止在TFT基板（10）与CF基板（20）上涂布PI液时涂布到有效显示区域周围的PI液回流到有效显示区域中，改善有效显示区域的周边mura现象，同时位于边框胶（30）内、外两侧的光阻挡墙（11，12）可以起到维持边框胶（30）周边面板盒厚的作用，进一步提升了显示面板的品质，提高生产良率；TFT基板（10）上不同高度的光阻挡墙（11，12，13，14）通过采用一道半色调光罩曝光得到，使得液晶显示面板的制程简单，生产成本较低。

Description

超窄边框显示面板 技术领域
本发明涉及显示器制造领域，尤其涉及一种超窄边框显示面板。
背景技术
液晶显示装置(LCD，Liquid Crystal Display)具有机身薄、省电、无辐射等众多优点，得到了广泛的应用。现有市场上的液晶显示装置大部分为背光型液晶显示装置，其包括液晶显示面板及背光模组(backlight module)。液晶显示面板的工作原理是在两片平行的玻璃基板当中放置液晶分子，通过玻璃基板通电与否来控制液晶分子改变方向，将背光模组的光线折射出来产生画面。
通常液晶显示面板由彩膜基板(CF，Color Filter)、薄膜晶体管基板(TFT，Thin Film Transistor)、夹于彩膜基板与薄膜晶体管基板之间的液晶(LC，Liquid Crystal)及密封胶框(Sealant)组成；通常，薄膜晶体管基板及彩膜基板上分别具有一层取向膜，该取向膜与LC接触后，能够使得LC产生一定方向的预倾角，从而给液晶分子提供一个承载的角度(预倾角的大小对TFT-LCD的驱动电压、对比度、响应时间、视角等具有重要影响)，取向膜的材料通常选用聚酰亚胺(Polyimide,PI)材料，由PI液涂布于基板上所形成。
随着显示技术的发展，人们对消费性电子产品的要求已经不单单局限于功能性，同时也更转向于设计性、艺术性以及具有良好的视觉体验性方面，比如当前盛行的超窄边框显示产品，那么顾名思义，超窄边框即将传统的TFT-LCD边框进一步缩窄，进一步的扩大有效显示区域(Active Area，AA)的面积，进而达到更高阶的视觉体验和产品设计美感。即由于此，在LCD面板设计和制造上便提出了更高挑战，比如对设备的精度、材料的性能匹配等等方面，均需要较大程度的提升和改善。
其中PI液的涂布精度变得尤为重要。因为超窄边框的设计不同于以往的设计，其AA区距离玻璃基板边缘更近，而PI液涂布过程又要面临着PI涂布后的回流、PI过烤后的缩膜精度控制等等，一旦面板周边的PI液涂布精度没有控制好，将会造成LCD面板周边因PI回流至AA区而导致AA区周边出现的mura现象(亮度不均匀的现象)出现，很大程度的影响面板的 品质和良率。
基于以上，业内设计者往往试图通过改变设计方面来克服以上的缺陷，如在AA外侧增加色阻挡墙的方式来控制PI的回流现象，但这样做一定程度上仍是会存在PI回流不均而导致的面板周边mura的出现。
发明内容
本发明的目的在于提供一种超窄边框显示面板，可以改善超窄边框显示面板中常遇到的因PI回流而导致有效显示区域周边出现的mura现象，提升良率。
为实现上述目的，本发明提供一种超窄边框显示面板，包括相对设置的TFT基板和CF基板、及密封连接所述TFT基板和CF基板的边框胶；所述TFT基板与CF基板上均设有位于中央的有效显示区域及位于所述有效显示区域外围的周边区域，且所述TFT基板与CF基板上的有效显示区域与周边区域相互对应，所述边框胶设于所述TFT基板与CF基板的周边区域之间；
其中，所述TFT基板的周边区域中设有数道光阻挡墙，所述CF基板的周边区域中设有数道光阻挡墙及数条沟槽，从而防止在TFT基板与CF基板上涂布PI液时涂布到周边区域的PI液回流到有效显示区域中。
所述TFT基板的周边区域中设有四道光阻挡墙，从TFT基板外侧到内侧依次为：第一光阻挡墙、第二光阻挡墙、第三光阻挡墙、第四光阻挡墙；所述第一、第二光阻挡墙分别设于边框胶的外侧和内侧，且与所述边框胶之间均形成一定间隙，所述第二光阻挡墙的内侧为PI喷印边界，所述第三、第四光阻挡墙设于所述有效显示区域边界与PI喷印边界之间；
所述CF基板上设有黑色矩阵，位于CF基板周边区域的黑色矩阵上设有三道光阻挡墙，从CF基板外侧到内侧依次为：第五光阻挡墙、第六光阻挡墙、第七光阻挡墙；所述第五、第六光阻挡墙分别设于边框胶的外侧和内侧，且与所述边框胶之间均形成一定间隙，所述第六光阻挡墙的内侧为PI喷印边界，所述第七光阻挡墙设于所述有效显示区域边界与PI喷印边界之间；
所述黑色矩阵上对应所述第六、第七光阻挡墙之间设有第一沟槽，对应所述第七光阻挡墙内侧设有第二沟槽。
所述第一、第二、第三、第四光阻挡墙的宽度、及长度均一致。
所述第四光阻挡墙的高度d2大于所述第三光阻挡墙的高度d1，且所述高度d1、d2需要满足以下条件：
Figure PCTCN2015087946-appb-000001
Figure PCTCN2015087946-appb-000002
其中，l0、L分别为第三、第四光阻挡墙的宽度、及长度，l1为第二、第三光阻挡墙之间的间距，l2为第三、第四光阻挡墙之间的间距，X为PI液机台的精度误差，Y为PI液涂布后湿膜的厚度。
所述第一、第二光阻挡墙的高度相同，并且所述第一、第二光阻挡墙的高度d0大于所述第四光阻挡墙的高度d2。
所述第一、第二、第三、第四光阻挡墙通过采用一道半光调光罩曝光得到。
所述TFT基板中第一、第二、第三、第四光阻挡墙的下方设有彩色光阻层，所述第一、第二、第三、第四光阻挡墙与彩色光阻层采用同一道光罩制程制得，所述第一、第二、第三、第四光阻挡墙的材料为彩色光阻。
所述第五、第六、第七光阻挡墙的宽度、高度、及长度均一致。
所述第一沟槽与第二沟槽的宽度、及高度相等，且所述第一、第二沟槽的宽度l需要满足以下条件：
Figure PCTCN2015087946-appb-000003
其中，K、H、L分别为所述第五、第六、第七光阻挡墙的宽度、高度、及长度，h为所述第一、第二沟槽的高度，X为PI液机台的精度误差，Y为PI液涂布后湿膜的厚度。
所述CF基板的有效显示区域中设有均匀分布的数个光阻间隔物，所述第五、第六、第七光阻挡墙与所述光阻间隙物采用同一道光罩制程制得，所述第五、第六、第七光阻挡墙与光阻间隙物的材料相同。
本发明还提供一种超窄边框显示面板，包括相对设置的TFT基板和CF基板、及密封连接所述TFT基板和CF基板的边框胶；所述TFT基板与CF基板上均设有位于中央的有效显示区域及位于所述有效显示区域外围的周边区域，且所述TFT基板与CF基板上的有效显示区域与周边区域相互对应，所述边框胶设于所述TFT基板与CF基板的周边区域之间；
其中，所述TFT基板的周边区域中设有数道光阻挡墙，所述CF基板的周边区域中设有数道光阻挡墙及数条沟槽，从而防止在TFT基板与CF基板上涂布PI液时涂布到周边区域的PI液回流到有效显示区域中；
其中，所述TFT基板的周边区域中设有四道光阻挡墙，从TFT基板外 侧到内侧依次为：第一光阻挡墙、第二光阻挡墙、第三光阻挡墙、第四光阻挡墙；所述第一、第二光阻挡墙分别设于边框胶的外侧和内侧，且与所述边框胶之间均形成一定间隙，所述第二光阻挡墙的内侧为PI喷印边界，所述第三、第四光阻挡墙设于所述有效显示区域边界与PI喷印边界之间；
所述CF基板上设有黑色矩阵，位于CF基板周边区域的黑色矩阵上设有三道光阻挡墙，从CF基板外侧到内侧依次为：第五光阻挡墙、第六光阻挡墙、第七光阻挡墙；所述第五、第六光阻挡墙分别设于边框胶的外侧和内侧，且与所述边框胶之间均形成一定间隙，所述第六光阻挡墙的内侧为PI喷印边界，所述第七光阻挡墙设于所述有效显示区域边界与PI喷印边界之间；
所述黑色矩阵上对应所述第六、第七光阻挡墙之间设有第一沟槽，对应所述第七光阻挡墙内侧设有第二沟槽；
其中，所述第一、第二、第三、第四光阻挡墙的宽度、及长度均一致；
其中，所述第一、第二、第三、第四光阻挡墙通过采用一道半光调光罩曝光得到；
其中，所述TFT基板中第一、第二、第三、第四光阻挡墙的下方设有彩色光阻层，所述第一、第二、第三、第四光阻挡墙与彩色光阻层采用同一道光罩制程制得，所述第一、第二、第三、第四光阻挡墙的材料为彩色光阻；
其中，所述第五、第六、第七光阻挡墙的宽度、高度、及长度均一致；
其中，所述CF基板的有效显示区域中设有均匀分布的数个光阻间隔物，所述第五、第六、第七光阻挡墙与所述光阻间隙物采用同一道光罩制程制得，所述第五、第六、第七光阻挡墙与光阻间隙物的材料相同。
本发明的有益效果：本发明提供的超窄边框显示面板，通过在TFT基板的周边区域中设置数道光阻挡墙，在CF基板的周边区域中设置数道光阻挡墙及数条沟槽，并且在光阻挡墙的高度及沟槽的宽度设计上考虑了由于机台的精度误差导致的多吐出部分，通过计算准确定义光阻挡墙及沟槽的铺设尺寸，从而防止在TFT基板与CF基板上涂布PI液时涂布到有效显示区域周围的PI液回流到有效显示区域中，改善有效显示区域的周边mura现象，同时位于所述边框胶内、外两侧的光阻挡墙可以起到维持边框胶周边面板盒厚的作用，进一步提升了显示面板的品质，提高生产良率；所述TFT基板上不同高度的光阻挡墙通过采用一道半色调光罩曝光得到，使得该液晶显示面板的制程简单，生产成本较低。
为了能更进一步了解本发明的特征以及技术内容，请参阅以下有关本 发明的详细说明与附图，然而附图仅提供参考与说明用，并非用来对本发明加以限制。
附图说明
下面结合附图，通过对本发明的具体实施方式详细描述，将使本发明的技术方案及其它有益效果显而易见。
附图中，
图1为本发明的超窄边框显示面板中的TFT基板的结构示意图；
图2为图1的TFT基板上的光阻挡墙的立体图；
图3为本发明的超窄边框显示面板中的CF基板的结构示意图；
图4为图3的CF基板上的光阻挡墙和黑色矩阵沟槽的立体图。
具体实施方式
为更进一步阐述本发明所采取的技术手段及其效果，以下结合本发明的优选实施例及其附图进行详细描述。
本发明提供一种超窄边框显示面板，可最大限度的克服PI液回流现象，有效改善超窄边框中常遇到的PI液回流导致的周边mura现象，从而提升超窄边框设计中因PI导致的良率问题。
具体的，请参阅图1-4，所述超窄边框显示面板包括相对设置的TFT基板10和CF基板20、及密封连接所述TFT基板10和CF基板20的边框胶30；所述TFT基板10与CF基板20上均设有位于中央的有效显示区域及位于所述有效显示区域外围的周边区域，且所述TFT基板10与CF基板20上的有效显示区域与周边区域相互对应，所述边框胶30设于所述TFT基板10与CF基板20的周边区域之间。
如图1-2所示，所述TFT基板10的周边区域中设有四道光阻挡墙，从TFT基板10外侧到内侧依次为：第一光阻挡墙11、第二光阻挡墙12、第三光阻挡墙13、第三四光阻挡墙14。
具体的，所述TFT基板10中第一、第二、第三、第四光阻挡墙11、12、13、14的下方设有彩色光阻层，所述第一、第二、第三、第四光阻挡墙11、12、13、14与彩色光阻层采用同一道光罩制程制得，所述第一、第二、第三、第四光阻挡墙11、12、13、14的材料为彩色光阻。
所述第一、第二光阻挡墙11、12分别设于边框胶30的外侧和内侧，且与所述边框胶30之间均形成一定间隙，所述第二光阻挡墙12的内侧为PI喷印边界，所述第三、第三四光阻挡墙13、14设于所述有效显示区域边 界与PI喷印边界之间。
具体的，所述第一、第二光阻挡墙11、12具有维持所述边框胶30周边面板盒厚的作用，所述第一光阻挡墙11还具有防止边框胶30外溢的作用，所述第二光阻挡墙12具有阻隔边框胶30与PI重叠的作用。
具体的，所述第一、第二、第三、第四光阻挡墙11、12、13、14的宽度、长度均一致，宽度为l0，长度为L。
具体的，所述第四光阻挡墙14的高度d2大于所述第三光阻挡墙13的高度d1，且所述高度d1、d2需要满足以下条件：
Figure PCTCN2015087946-appb-000004
Figure PCTCN2015087946-appb-000005
其中，l0、L分别为第三、第三四光阻挡墙13、14的宽度、及长度，l1为第二、第三光阻挡12、13之间的间距，l2为第三、第三四光阻挡墙13、14之间的间距，X为PI液机台的精度误差，Y为PI液涂布后湿膜的厚度。
具体的，上述第三、第四光阻挡墙13、14的高度d1、d2的计算公式的推理如下：
如图2所示，所述第二、第三光阻挡墙12、13之间需容纳的PI液量S1由两部分组成：正常涂布量+第三光阻挡墙13上的1/2的滑落量，即S1＝l1×L×Y+(l0×L×Y/2)；
而S1又取决于短的第三光阻挡墙13的高度d1，即：即S1＝d1×L×l1＝l1×L×Y+(l0×L×Y/2)，推知：
Figure PCTCN2015087946-appb-000006
同理，所述第三、第三四光阻挡墙13、14之间需容纳的PI液量S2由四部分组成：正常涂布量+第三光阻挡墙13上的1/2的滑落量+第四光阻挡墙14上的1/2的滑落量+由机台的精度误差导致的多吐出量X，即S2＝l2×L×Y+l0×L×Y/2+l0×L×Y/2+X；
而S2又取决于第四光阻挡墙14的高度d2，即S2＝d2×L×l2＝l2×L×Y+(l0×L×Y)+X，推知：
Figure PCTCN2015087946-appb-000007
具体的，所述第一、第二光阻挡墙11、12的高度相同，均为d0，且所述第一、第二光阻挡11、12的高度d0略大于所述第四光阻挡墙14的高度d2。
优选的，所述第一、第二、第三、第四光阻挡墙11、12、13、14通过 采用一道半光调光罩曝光得到。
如图3-4所示，所述CF基板20上设有黑色矩阵23，位于CF基板20周边区域的黑色矩阵23上设有三道光阻挡墙，从CF基板20外侧到内侧依次为：第五光阻挡墙231、第六光阻挡墙232、第七光阻挡墙233。
具体的，所述CF基板20的有效显示区域中设有均匀分布的数个光阻间隔物，所述第五、第六、第七光阻挡墙231、232、233与所述光阻间隙物采用同一道光罩制程制得，所述第五、第六、第七光阻挡墙231、232、233与光阻间隙物的材料相同。
所述第五、第六光阻挡墙231、232分别设于边框胶30的外侧和内侧，且与所述边框胶30之间均形成一定间隙，所述第六光阻挡墙232的内侧为PI喷印边界，所述第七光阻挡墙233设于所述有效显示区域边界与PI喷印边界之间。
所述黑色矩阵23上对应所述第六、第七光阻挡墙232、233之间设有第一沟槽235，对应所述第七光阻挡墙233内侧设有第二沟槽236。
具体的，所述第六、第七光阻挡墙232、233之间的空间及第一沟槽235起到收纳由机台的精度误差导致的多吐出量及所述第七光阻挡墙233上滑落的PI液的作用；所述第七光阻挡墙233旁边的第二沟槽236起到收纳第七光阻挡墙233上滑落的PI液的作用。
进一步的，所述第五、第六光阻挡墙231、232起到维持所述边框胶30周边面板盒厚的作用，且所述第五光阻挡墙231还具有防止边框胶30外溢的作用，所述第六光阻挡墙232还具有阻隔边框胶30与PI重叠的作用。
具体的，所述第五、第六、第七光阻挡墙231、232、233的宽度、高度、及长度均一致。
优选的，所述第一沟槽235与第二沟槽236的宽度、及高度相等。
具体的，所述第一、第二沟槽235、236的宽度l需要满足以下条件：
Figure PCTCN2015087946-appb-000008
其中，K、H、L分别为所述第五、第六、第七光阻挡墙231、232、233的宽度、高度、及长度，h为所述第一、第二沟槽235、236的高度，X为PI液机台的精度误差，Y为PI液涂布后湿膜的厚度。
具体的，所述第一沟槽235的宽度l的计算公式的推理如下：
所述第六、第七光阻挡墙232、233之间的空间及所述第一沟槽235内需容纳的PI液S3由三部分组成：正常涂布量+第七光阻挡墙233上的1/2的滑落量+由机台的精度误差导致的多吐出量X，即S3＝(L×K×Y)/2+X+ (Y×L×l)；
而S3又取决于第一沟槽235的宽度l，即(H+h)×L×l≥(L×K×Y)/2+X+(Y×L×l)，推知：
Figure PCTCN2015087946-appb-000009
综上所述，本发明提供的超窄边框显示面板，通过在TFT基板的周边区域中设置数道光阻挡墙，在CF基板的周边区域中设置数道光阻挡墙及数条沟槽，并且在光阻挡墙的高度及沟槽的宽度设计上考虑了由于机台的精度误差导致的多吐出部分，通过计算准确定义光阻挡墙及沟槽的铺设尺寸，从而防止在TFT基板与CF基板上涂布PI液时涂布到有效显示区域周围的PI液回流到有效显示区域中，改善有效显示区域的周边mura现象，同时位于所述边框胶内、外两侧的光阻挡墙可以起到维持边框胶周边面板盒厚的作用，进一步提升了显示面板的品质，提高生产良率；所述TFT基板上不同高度的光阻挡墙通过采用一道半色调光罩曝光得到，使得该液晶显示面板的制程简单，生产成本较低。
以上所述，对于本领域的普通技术人员来说，可以根据本发明的技术方案和技术构思作出其他各种相应的改变和变形，而所有这些改变和变形都应属于本发明权利要求的保护范围。

Claims (14)

  1. 一种超窄边框显示面板，包括相对设置的TFT基板和CF基板、及密封连接所述TFT基板和CF基板的边框胶；所述TFT基板与CF基板上均设有位于中央的有效显示区域及位于所述有效显示区域外围的周边区域，且所述TFT基板与CF基板上的有效显示区域与周边区域相互对应，所述边框胶设于所述TFT基板与CF基板的周边区域之间；
    其中，所述TFT基板的周边区域中设有数道光阻挡墙，所述CF基板的周边区域中设有数道光阻挡墙及数条沟槽，从而防止在TFT基板与CF基板上涂布PI液时涂布到周边区域的PI液回流到有效显示区域中。
  2. 如权利要求1所述的超窄边框显示面板，其中，所述TFT基板的周边区域中设有四道光阻挡墙，从TFT基板外侧到内侧依次为：第一光阻挡墙、第二光阻挡墙、第三光阻挡墙、第四光阻挡墙；所述第一、第二光阻挡墙分别设于边框胶的外侧和内侧，且与所述边框胶之间均形成一定间隙，所述第二光阻挡墙的内侧为PI喷印边界，所述第三、第四光阻挡墙设于所述有效显示区域边界与PI喷印边界之间；
    所述CF基板上设有黑色矩阵，位于CF基板周边区域的黑色矩阵上设有三道光阻挡墙，从CF基板外侧到内侧依次为：第五光阻挡墙、第六光阻挡墙、第七光阻挡墙；所述第五、第六光阻挡墙分别设于边框胶的外侧和内侧，且与所述边框胶之间均形成一定间隙，所述第六光阻挡墙的内侧为PI喷印边界，所述第七光阻挡墙设于所述有效显示区域边界与PI喷印边界之间；
    所述黑色矩阵上对应所述第六、第七光阻挡墙之间设有第一沟槽，对应所述第七光阻挡墙内侧设有第二沟槽。
  3. 如权利要求2所述的超窄边框显示面板，其中，所述第一、第二、第三、第四光阻挡墙的宽度、及长度均一致。
  4. 如权利要求3所述的超窄边框显示面板，其中，所述第四光阻挡墙的高度d2大于所述第三光阻挡墙的高度d1，且所述高度d1、d2需要满足以下条件：
    Figure PCTCN2015087946-appb-100001
    Figure PCTCN2015087946-appb-100002
    其中，l0、L分别为第三、第四光阻挡墙的宽度、及长度，l1为第二、第三光阻挡墙之间的间距，l2为第三、第四光阻挡墙之间的间距，X为PI液机台的精度误差，Y为PI液涂布后湿膜的厚度。
  5. 如权利要求3所述的超窄边框显示面板，其中，所述第一、第二光阻挡墙的高度相同，并且所述第一、第二光阻挡墙的高度d0大于所述第四光阻挡墙的高度d2。
  6. 如权利要求2所述的超窄边框显示面板，其中，所述第一、第二、第三、第四光阻挡墙通过采用一道半光调光罩曝光得到。
  7. 如权利要求2所述的超窄边框显示面板，其中，所述TFT基板中第一、第二、第三、第四光阻挡墙的下方设有彩色光阻层，所述第一、第二、第三、第四光阻挡墙与彩色光阻层采用同一道光罩制程制得，所述第一、第二、第三、第四光阻挡墙的材料为彩色光阻。
  8. 如权利要求2所述的超窄边框显示面板，其中，所述第五、第六、第七光阻挡墙的宽度、高度、及长度均一致。
  9. 如权利要求8所述的超窄边框显示面板，其中，所述第一沟槽与第二沟槽的宽度、及高度相等，且所述第一、第二沟槽的宽度l需要满足以下条件：
    Figure PCTCN2015087946-appb-100003
    其中，K、H、L分别为所述第五、第六、第七光阻挡墙的宽度、高度、及长度，h为所述第一、第二沟槽的高度，X为PI液机台的精度误差，Y为PI液涂布后湿膜的厚度。
  10. 如权利要求2所述的超窄边框显示面板，其中，所述CF基板的有效显示区域中设有均匀分布的数个光阻间隔物，所述第五、第六、第七光阻挡墙与所述光阻间隙物采用同一道光罩制程制得，所述第五、第六、第七光阻挡墙与光阻间隙物的材料相同。
  11. 一种超窄边框显示面板，包括相对设置的TFT基板和CF基板、及密封连接所述TFT基板和CF基板的边框胶；所述TFT基板与CF基板上均设有位于中央的有效显示区域及位于所述有效显示区域外围的周边区域，且所述TFT基板与CF基板上的有效显示区域与周边区域相互对应，所述边框胶设于所述TFT基板与CF基板的周边区域之间；
    其中，所述TFT基板的周边区域中设有数道光阻挡墙，所述CF基板的周边区域中设有数道光阻挡墙及数条沟槽，从而防止在TFT基板与CF基板上涂布PI液时涂布到周边区域的PI液回流到有效显示区域中；
    其中，所述TFT基板的周边区域中设有四道光阻挡墙，从TFT基板外侧到内侧依次为：第一光阻挡墙、第二光阻挡墙、第三光阻挡墙、第四光阻挡墙；所述第一、第二光阻挡墙分别设于边框胶的外侧和内侧，且与所述边框胶之间均形成一定间隙，所述第二光阻挡墙的内侧为PI喷印边界，所述第三、第四光阻挡墙设于所述有效显示区域边界与PI喷印边界之间；
    所述CF基板上设有黑色矩阵，位于CF基板周边区域的黑色矩阵上设有三道光阻挡墙，从CF基板外侧到内侧依次为：第五光阻挡墙、第六光阻挡墙、第七光阻挡墙；所述第五、第六光阻挡墙分别设于边框胶的外侧和内侧，且与所述边框胶之间均形成一定间隙，所述第六光阻挡墙的内侧为PI喷印边界，所述第七光阻挡墙设于所述有效显示区域边界与PI喷印边界之间；
    所述黑色矩阵上对应所述第六、第七光阻挡墙之间设有第一沟槽，对应所述第七光阻挡墙内侧设有第二沟槽；
    其中，所述第一、第二、第三、第四光阻挡墙的宽度、及长度均一致；
    其中，所述第一、第二、第三、第四光阻挡墙通过采用一道半光调光罩曝光得到；
    其中，所述TFT基板中第一、第二、第三、第四光阻挡墙的下方设有彩色光阻层，所述第一、第二、第三、第四光阻挡墙与彩色光阻层采用同一道光罩制程制得，所述第一、第二、第三、第四光阻挡墙的材料为彩色光阻；
    其中，所述第五、第六、第七光阻挡墙的宽度、高度、及长度均一致；
    其中，所述CF基板的有效显示区域中设有均匀分布的数个光阻间隔物，所述第五、第六、第七光阻挡墙与所述光阻间隙物采用同一道光罩制程制得，所述第五、第六、第七光阻挡墙与光阻间隙物的材料相同。
  12. 如权利要求11所述的超窄边框显示面板，其中，所述第四光阻挡墙的高度d2大于所述第三光阻挡墙的高度d1，且所述高度d1、d2需要满足以下条件：
    Figure PCTCN2015087946-appb-100004
    Figure PCTCN2015087946-appb-100005
    其中，l0、L分别为第三、第四光阻挡墙的宽度、及长度，l1为第二、第三光阻挡墙之间的间距，l2为第三、第四光阻挡墙之间的间距，X为PI液机台的精度误差，Y为PI液涂布后湿膜的厚度。
  13. 如权利要求11所述的超窄边框显示面板，其中，所述第一、第二光阻挡墙的高度相同，并且所述第一、第二光阻挡墙的高度d0大于所述第四光阻挡墙的高度d2。
  14. 如权利要求11所述的超窄边框显示面板，其中，所述第一沟槽与第二沟槽的宽度、及高度相等，且所述第一、第二沟槽的宽度l需要满足以下条件：
    Figure PCTCN2015087946-appb-100006
    其中，K、H、L分别为所述第五、第六、第七光阻挡墙的宽度、高度、及长度，h为所述第一、第二沟槽的高度，X为PI液机台的精度误差，Y为PI液涂布后湿膜的厚度。
PCT/CN2015/087946 2015-08-07 2015-08-24 超窄边框显示面板 Ceased WO2017024616A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US14/781,311 US9885918B2 (en) 2015-08-07 2015-08-24 Ultra-slim bezel display panel

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201510483510.3A CN105093705B (zh) 2015-08-07 2015-08-07 超窄边框显示面板
CN201510483510.3 2015-08-07

Publications (1)

Publication Number Publication Date
WO2017024616A1 true WO2017024616A1 (zh) 2017-02-16

Family

ID=54574476

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2015/087946 Ceased WO2017024616A1 (zh) 2015-08-07 2015-08-24 超窄边框显示面板

Country Status (3)

Country Link
US (2) US9885918B2 (zh)
CN (1) CN105093705B (zh)
WO (1) WO2017024616A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112485949A (zh) * 2020-11-04 2021-03-12 滁州惠科光电科技有限公司 一种显示面板和显示装置

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102473677B1 (ko) * 2015-08-17 2022-12-02 삼성디스플레이 주식회사 액정 표시 장치
KR102602166B1 (ko) * 2016-06-30 2023-11-14 삼성디스플레이 주식회사 액정 표시 장치
CN107153287B (zh) * 2017-06-20 2020-06-30 合肥市惠科精密模具有限公司 一种可吸收水汽tft基板
CN108020963A (zh) * 2017-09-22 2018-05-11 惠科股份有限公司 液晶显示面板
CN107608143B (zh) * 2017-11-03 2019-12-03 惠科股份有限公司 阵列基板及显示面板
CN107608144B (zh) * 2017-11-10 2020-06-05 业成科技（成都）有限公司 液晶显示面板及其薄膜晶体管基板
US10558075B2 (en) 2017-11-22 2020-02-11 Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Color filter substrate, display panel and method of manufacturing color filter substrate
CN107966844A (zh) * 2017-11-22 2018-04-27 深圳市华星光电半导体显示技术有限公司 彩膜基板、显示面板及彩膜基板的制备方法
CN108628039A (zh) * 2018-06-28 2018-10-09 武汉华星光电技术有限公司 液晶显示基板及其制备方法、液晶显示装置
CN109031805A (zh) * 2018-08-22 2018-12-18 惠科股份有限公司 显示面板
CN109061953B (zh) * 2018-08-22 2021-04-09 惠科股份有限公司 显示面板和显示装置
CN109001949A (zh) * 2018-09-11 2018-12-14 惠科股份有限公司 阵列基板及显示面板
CN110967861A (zh) * 2018-09-28 2020-04-07 咸阳彩虹光电科技有限公司 一种液晶面板、彩膜基板及其制备方法
CN208984920U (zh) * 2018-12-03 2019-06-14 惠科股份有限公司 显示面板及显示装置
CN110109286B (zh) * 2019-04-08 2023-03-21 北海惠科光电技术有限公司 一种显示面板的基板、制作方法和显示装置
CN109917589A (zh) * 2019-04-08 2019-06-21 深圳市华星光电技术有限公司 液晶显示面板及显示装置
WO2020207160A1 (zh) * 2019-04-08 2020-10-15 惠科股份有限公司 显示面板、显示面板的制作方法和显示装置
JP2023039205A (ja) * 2021-09-08 2023-03-20 株式会社ジャパンディスプレイ 液晶デバイス及び表示装置
CN115394203A (zh) * 2022-09-13 2022-11-25 友达光电（昆山）有限公司 显示面板、显示装置及其制造方法
CN116088236A (zh) * 2023-01-30 2023-05-09 华映科技（集团）股份有限公司 一种窄边框tft阵列基板及显示装置
WO2025043610A1 (zh) * 2023-08-31 2025-03-06 京东方科技集团股份有限公司 一种显示面板、其制作方法及显示装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000019528A (ja) * 1998-06-30 2000-01-21 Kyocera Corp 液晶表示装置
JP2000081624A (ja) * 1998-09-03 2000-03-21 Denso Corp 液晶セル及びその製造方法
CN101957518A (zh) * 2009-07-17 2011-01-26 乐金显示有限公司 液晶显示设备及其制造方法
CN102830553A (zh) * 2012-08-28 2012-12-19 深圳市华星光电技术有限公司 一种显示面板以及液晶显示器

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005181795A (ja) * 2003-12-22 2005-07-07 Sony Corp 液晶表示装置および液晶表示装置の製造方法
JP5544692B2 (ja) * 2007-12-07 2014-07-09 大日本印刷株式会社 カラーフィルタおよびカラーフィルタの製造方法
CN101344696A (zh) * 2008-08-07 2009-01-14 友达光电股份有限公司 阵列基板及液晶显示面板
CN101957511B (zh) * 2009-07-14 2012-04-04 北京京东方光电科技有限公司 液晶显示面板及其制造方法
TWI447492B (zh) * 2011-07-29 2014-08-01 Au Optronics Corp 顯示面板
CN102402071A (zh) * 2011-12-02 2012-04-04 深圳市华星光电技术有限公司 液晶显示装置的基板、液晶显示装置及其制造方法
EP2857894A4 (en) * 2012-05-25 2015-06-17 Sharp Kk LIQUID CRYSTAL DISPLAY DEVICE
CN102799028B (zh) * 2012-08-16 2014-11-19 深圳市华星光电技术有限公司 液晶面板及其制作方法
JP6132503B2 (ja) * 2012-10-02 2017-05-24 株式会社ジャパンディスプレイ 液晶表示装置
WO2015030065A1 (ja) * 2013-08-29 2015-03-05 堺ディスプレイプロダクト株式会社 液晶パネル、液晶表示装置、及び液晶パネルの製造方法
CN203858436U (zh) * 2014-03-06 2014-10-01 成都京东方光电科技有限公司 液晶显示面板和液晶显示装置
CN105044963B (zh) * 2015-08-11 2018-03-30 深圳市华星光电技术有限公司 显示面板及其制作方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000019528A (ja) * 1998-06-30 2000-01-21 Kyocera Corp 液晶表示装置
JP2000081624A (ja) * 1998-09-03 2000-03-21 Denso Corp 液晶セル及びその製造方法
CN101957518A (zh) * 2009-07-17 2011-01-26 乐金显示有限公司 液晶显示设备及其制造方法
CN102830553A (zh) * 2012-08-28 2012-12-19 深圳市华星光电技术有限公司 一种显示面板以及液晶显示器

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112485949A (zh) * 2020-11-04 2021-03-12 滁州惠科光电科技有限公司 一种显示面板和显示装置
CN112485949B (zh) * 2020-11-04 2022-07-08 滁州惠科光电科技有限公司 一种显示面板和显示装置

Also Published As

Publication number Publication date
US20180120651A1 (en) 2018-05-03
US10036923B2 (en) 2018-07-31
CN105093705B (zh) 2018-11-23
US9885918B2 (en) 2018-02-06
US20170146862A1 (en) 2017-05-25
CN105093705A (zh) 2015-11-25

Similar Documents

Publication Publication Date Title
WO2017024616A1 (zh) 超窄边框显示面板
US9563083B2 (en) Display device including main light blocking portion and spacers
KR20170082701A (ko) 표시장치 및 그 제조방법
WO2018120504A1 (zh) 液晶显示面板及其应用的液晶显示装置
WO2017008369A1 (zh) Coa型液晶显示面板及其制作方法
US20200192135A1 (en) Array substrate, manufacturing method for the array substrate, and display panel
WO2016061850A1 (zh) 曲面液晶面板的制作方法
US10481443B2 (en) Display panel
CN107450224B (zh) Coa型阵列基板的制备方法
WO2018176629A1 (zh) 显示面板及其制造方法
WO2020228168A1 (zh) 阵列基板及其制作方法
WO2018120509A1 (zh) 画素结构及其应用的显示面板
US10429701B2 (en) Display panel and LCD panel and LCD apparatus using the same
WO2019085224A1 (zh) 阵列基板及显示面板
WO2017128779A1 (zh) 显示基板及其制作方法、显示装置
WO2020082718A1 (zh) 胶框的制作方法及显示面板
JP2008033254A (ja) 液晶ディスプレイパネル
US20150185530A1 (en) TFT Array Substrate, Liquid Crystal Panel and LCD
WO2018082228A1 (zh) 显示器阵列基板画素结构及其应用的显示设备
CN106990597B (zh) 彩色滤光基板及其制造方法及显示面板及显示装置
KR102304890B1 (ko) 액정 표시 장치 및 그 제조 방법
CN107918232A (zh) 一种显示基板及显示装置
WO2018120647A1 (zh) 显示面板及显示装置的制造方法
KR102067964B1 (ko) 액정표시장치 및 이의 제조방법
TWI643009B (zh) 畫素結構以及包含此畫素結構的顯示面板

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 14781311

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 15900813

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 15900813

Country of ref document: EP

Kind code of ref document: A1