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WO2017074149A1 - Electrode paste for solar cell and solar cell prepared by means of same - Google Patents

Electrode paste for solar cell and solar cell prepared by means of same Download PDF

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Publication number
WO2017074149A1
WO2017074149A1 PCT/KR2016/012344 KR2016012344W WO2017074149A1 WO 2017074149 A1 WO2017074149 A1 WO 2017074149A1 KR 2016012344 W KR2016012344 W KR 2016012344W WO 2017074149 A1 WO2017074149 A1 WO 2017074149A1
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WIPO (PCT)
Prior art keywords
solar cell
glass frit
electrode
paste composition
firing
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Ceased
Application number
PCT/KR2016/012344
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French (fr)
Korean (ko)
Inventor
전태현
고민수
노화영
최영훈
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LS MnM Inc
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LS Nikko Copper Inc
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Application filed by LS Nikko Copper Inc filed Critical LS Nikko Copper Inc
Publication of WO2017074149A1 publication Critical patent/WO2017074149A1/en
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C03C17/04Surface treatment of glass, not in the form of fibres or filaments, by coating with glass by fritting glass powder
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/30Coatings
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to an electrode paste composition for a solar cell and a solar cell manufactured using the same.
  • a solar cell is a semiconductor device that converts solar energy into electrical energy and generally has a p-n junction.
  • the basic structure is the same as that of a diode.
  • the solar cell device is generally configured using a p-type silicon semiconductor substrate having a thickness of 180 to 250 ⁇ m.
  • an n-type impurity layer having a thickness of 0.3 to 0.6 ⁇ m, an antireflection film and a front electrode are formed thereon.
  • a back electrode is formed on the back side of the p-type silicon semiconductor substrate.
  • the front electrode is formed by screen printing or the like using a conductive paste containing conductive particles containing silver as a main component, glass frit, and an organic vehicle, and the back electrode is formed of aluminum powder, glass frit, and organic vehicle.
  • the aluminum paste composition which consists of (organic vehicle) is apply
  • aluminum diffuses into the p-type silicon semiconductor substrate, whereby an Al-Si alloy layer is formed between the back electrode and the p-type silicon semiconductor substrate, and a p + layer is formed as an impurity layer by diffusion of aluminum atoms. do.
  • BSF back surface field
  • the anti-reflection film is eroded by the redox reaction of the glass frit powder, and the conductive metal crystals are precipitated in the form of the conductive powder crystals in the glass frit powder at the substrate interface.
  • the conductive metal crystals are precipitated in the form of the conductive powder crystals in the glass frit powder at the substrate interface.
  • it is known to exhibit contact by tunneling effect or direct adhesion with the bulk electrode depending on the thickness of the glass frit powder.
  • the present invention can increase the melt uniformity, improve the uniformity of the cell characteristics, ensure excellent contact characteristics even at low temperature / rapid firing, and can be applied to high-resistance solar cell electrode paste composition and high efficiency It is an object to provide a solar cell.
  • the present invention provides a paste composition for a solar cell electrode comprising a conductive metal powder, a glass frit, and an organic vehicle, wherein the glass transition temperature (Tg) of the glass frit is in a range of 200 ° C. or more and less than 300 ° C.
  • Tg glass transition temperature
  • a paste composition for a solar cell electrode characterized in that two or more crystallization peaks on the DSC data of the glass frit.
  • a paste composition for a solar cell electrode characterized in that a crystallization peak occurs on the DSC data of the glass frit below 500 ° C.
  • the first crystallization peak on the DSC data of the glass frit provides a paste composition for a solar cell electrode, characterized in that occurring below 400 °C.
  • the average particle diameter (D50) of the glass frit provides a solar cell electrode paste composition, characterized in that in the range of 0.5 ⁇ 10 ⁇ m.
  • the PbO content of the glass frit provides a paste composition for a solar cell electrode, characterized in that in the range of 10 to 29 mol% relative to the entire glass frit.
  • the front electrode is manufactured by applying the solar cell electrode paste composition and baking To provide.
  • the present invention having the above-described structural characteristics can increase the melt uniformity of the glass frit, and can improve the cell property uniformity. In addition, it is possible to ensure excellent contact characteristics even at low temperature / rapid firing, it can be applied particularly well to high surface resistance (90 ⁇ 120 ⁇ / sq) solar cells.
  • DSC differential scanning calorimetry
  • FIG. 8 is a schematic cross-sectional view of a general solar cell element.
  • the present invention provides a paste composition for a solar cell electrode comprising a conductive metal powder, a glass frit, and an organic vehicle, wherein the glass frit has a special thermal behavior.
  • the conductive metal powder silver powder, copper powder, nickel powder, aluminum powder, or the like may be used.
  • silver powder is mainly used, and for the back electrode, aluminum powder is mainly used.
  • the conductive metal material will be described using silver powder as an example. The following description is equally applicable to other metal powders.
  • the silver powder is preferably a pure silver powder.
  • a silver-coated composite powder having at least a surface of a silver layer, an alloy containing silver as a main component, and the like can be used.
  • other metal powders may be mixed and used.
  • the average particle diameter of the silver powder may be 0.1 to 10 ⁇ m, and 0.5 to 5 ⁇ m is preferable in consideration of the ease of pasting and the density at the time of baking, and the shape may be at least one of spherical, needle, plate and amorphous. have.
  • Silver powder may mix and use 2 or more types of powder from which an average particle diameter, particle size distribution, shape, etc. differ.
  • the content of the silver powder is preferably 60 to 98% by weight based on the total weight of the electrode paste composition in consideration of the electrode thickness formed during printing and the wire resistance of the electrode.
  • the organic vehicle is not limited but may include an organic binder and a solvent. Sometimes the solvent can be omitted.
  • the organic vehicle is not limited but is preferably 1 to 10% by weight based on the total weight of the electrode paste composition.
  • the organic vehicle is required to maintain a uniformly mixed state of metal powder and glass frit.
  • the conductive paste is applied to a substrate by screen printing, the conductive paste is made homogeneous and the printed pattern is blurred. And properties for suppressing flow and improving the dischargeability and plate separation property of the conductive paste from the screen plate.
  • the binder used in the electrode paste composition according to the embodiment of the present invention is not limited, examples of the cellulose ester-based compound include cellulose acetate and cellulose acetate butylate, and the cellulose ether compound includes ethyl cellulose, methyl cellulose, and hydride.
  • examples of the acryl-based compound include poly acrylamide, poly methacrylate, poly methyl methacrylate, and polyethyl meta An acrylate etc. can be mentioned, For example, polyvinyl butyral, polyvinyl acetate, a polyvinyl alcohol, etc. are mentioned as a vinyl type. At least one or more of the binders may be selected and used.
  • Solvents used for dilution of the composition include alpha-terpineol, texanol, dioctyl phthalate, dibutyl phthalate, cyclohexane, hexane, toluene, benzyl alcohol, dioxane, diethylene glycol, ethylene glycol mono butyl ether, ethylene At least one compound selected from the group consisting of glycol mono butyl ether acetate, diethylene glycol mono butyl ether, diethylene glycol mono butyl ether acetate and the like is preferably used.
  • the glass frit used is not limited. Lead-free glass frits can be used as well as leaded glass frits.
  • Glass transition temperature (Tg) of the glass frit is not limited, but may be 200 ⁇ 600 °C, preferably the glass transition temperature is in the range of 200 °C to less than 300 °C.
  • melt uniformity can be increased and cell uniformity can be improved.
  • the crystallization properties of the glass frit can be treated as an important factor.
  • Tg glass transition temperature
  • Ts softening point
  • the initial crystallization temperature is generally higher than 550 ° C. during DSC measurement.
  • the crystallization occurs more quickly when firing by allowing the initial crystallization peak in the DSC measurement data of the glass frit to be less than 400 ° C.
  • the electrical characteristics can be excellent by significantly reducing the breakdown of the emitter and the increase in the line width of the electrode.
  • There may be more than one crystallization peak in which case it is preferred that the crystallization peak first occur on the DSC data below 400 ° C., and the secondary crystallization peak occur above 400 ° C. and below 500 ° C. More preferably, all of the crystallization peaks occur below 500 ° C., in particular below 400 ° C., on the DSC data.
  • a glass frit there is no restriction
  • PbO is 10 to 29 mol%
  • TeO2 is 20 to 34 mol%
  • Bi2O3 is 3 to 20 mol%
  • SiO2 is 20 mol% or less
  • B2O3 is 10 mol% or less
  • Alkali metals (Li, Na, K, etc.) and alkaline earth metals (Ca, Mg, etc.) may contain 10 to 20 mol%.
  • PbO is preferably included within the above range in the glass frit.
  • PbO exceeds 30 mol% and the content of alkali metals and alkaline earth metals falls below the above range, the Al2O3 layer removal performance in the insulating layer is not preferable, which is not preferable.
  • the average particle diameter of the glass frit is not limited, but may have a particle diameter within the range of 0.5 ⁇ 10 ⁇ m, it is also possible to use a mixture of different paper particles having a different average particle diameter.
  • at least one glass frit has a mean particle size (D50) of 3 ⁇ m or more and 10 ⁇ m or less.
  • the glass transition temperature (Tg) of the glass frit whose average particle diameter is 3 micrometers or more and 10 micrometers or less is less than 300 degreeC. Since particles having a relatively large particle size are used, problems such as uneven melting during firing can be prevented by lowering the glass transition temperature.
  • the content of the glass frit is preferably 1 to 15% by weight based on the total weight of the conductive paste composition. If the content is less than 1% by weight, incomplete firing may occur to increase the electrical resistivity. There are too many components, and there exists a possibility that an electrical resistivity may also become high.
  • the paste composition for electrodes according to the present invention may further include additives commonly known as necessary, for example, a dispersant, a plasticizer, a viscosity modifier, a surfactant, an oxidant, a metal oxide, a metal organic compound, and the like.
  • additives commonly known as necessary, for example, a dispersant, a plasticizer, a viscosity modifier, a surfactant, an oxidant, a metal oxide, a metal organic compound, and the like.
  • the present invention also provides a method for forming an electrode of a solar cell and a solar cell electrode manufactured by the method, characterized in that the paste for the solar cell electrode is applied on a substrate, dried and baked.
  • the substrate, printing, drying and firing is a general method that can be used for the manufacture of a solar cell, of course.
  • the substrate may be a silicon wafer
  • the electrode made of the paste of the present invention may be a finger electrode or a busbar electrode on the front surface
  • the printing may be screen printing or offset printing
  • the drying may be 90 to 250. It may be made at °C, the firing may be made at 600 to 950 °C.
  • the high-temperature / high speed firing is performed at 800 to 950 ° C., more preferably at 850 to 900 ° C. for 5 seconds to 1 minute, and the printing is preferably performed at a thickness of 20 to 60 ⁇ m.
  • the structure of the solar cell described in Korean Unexamined-Japanese-Patent No. 10-2006-0108550, 10-2006-0127813, Unexamined-Japanese-Patent No. 2001-202822, and 2003-133567, and its manufacturing method are mentioned. have.
  • a glass frit was prepared with the composition as shown in Table 1 below, and the DSC data thereof was measured and shown in FIGS. 2 (Preparation Example 1) and 3 (Preparation Example 2).
  • Viox glass frit was prepared as a glass frit of Comparative Preparation Example, the DSC data was measured and shown in Figure 4 (Comparative Preparation Example 1).
  • Binders, solvents, additives, glass frit and the like as shown in Table 2 below dispersed using a three-bone mill, and then mixed with silver powder (spherical, average particle diameter 1 ⁇ 2 ⁇ m) and further using a three-bone mill Dispersed. Thereafter, vacuum / pressure defoaming was carried out to prepare a conductive paste.
  • Example 2 Comparative Example 1 Ethyl Cellulose 0.5 0.5 0.5 Texanol 2.4 2.4 2.4 DBA 2 2 2 DB 1.8 1.8 BYK-108 0.5 0.5 0.5 0.5 Amide wax 0.5 0.5 0.5 DPGDB 0.2 0.2 0.2 Silver powder 90 90 90 Glass frit (production example 1) (Tg 265 degrees Celsius) 2.1 Glass frit (production example 2) (Tg 255 degrees Celsius) 2.1 Glass frit (Comparative Production Example 1) (Tg 340 ° C) 2.1
  • the paste compositions prepared in Examples 1 and 2 and Comparative Example 1 were printed with Al paste by screen printing on the back of the wafer, and dried at 200-300 ° C. for 20 seconds using an IR drying furnace. Thereafter, a pattern of 40 ⁇ m line width was printed on the front surface of the wafer by screen printing, and dried in the same manner.
  • the cell formed by the above process was calcined for 20 seconds to 30 seconds using a belt-type kiln for 20 to 30 seconds, and the firing was performed at a maximum peak temperature of 740 ° C., 770 ° C., and 800 ° C., respectively.
  • a solar cell efficiency measuring equipment Halm, Cetis PV-celltester3
  • Isc, Voc, Rs, Fill Factor the efficiency of observing the performance shown in Table 3 and Figures 5 to 7 below.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Photovoltaic Devices (AREA)
  • Conductive Materials (AREA)
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  • Manufacturing & Machinery (AREA)

Abstract

The present invention provides a paste composition, for a solar cell electrode, comprising conductive metal powder, glass frit and an organic vehicle, wherein the glass transition temperature (Tg) of the glass frit is equal to or higher than 200℃ and lower than 300℃.

Description

태양전지용 전극 페이스트 및 이를 사용하여 제조된 태양전지Electrode paste for solar cell and solar cell manufactured using same

본 발명은 태양전지용 전극 페이스트 조성물 및 이를 사용하여 제조된 태양전지에 관한 것이다.The present invention relates to an electrode paste composition for a solar cell and a solar cell manufactured using the same.

태양 전지(solar cell)는 태양에너지를 전기에너지로 변환시켜주는 반도체 소자로서 일반적으로 p-n 접합 형태를 가지며 그 기본 구조는 다이오드와 동일하다.A solar cell is a semiconductor device that converts solar energy into electrical energy and generally has a p-n junction. The basic structure is the same as that of a diode.

도 8은 일반적인 태양전지 소자의 구조로서, 태양 전지 소자는 일반적으로 두께가 180~250㎛인 p형 실리콘 반도체 기판을 이용하여 구성된다. 실리콘 반도체 기판의 수광면측에는, 두께가 0.3~0.6㎛인 n형 불순물층과, 그 위에 반사 방지막과 전면 전극이 형성되어 있다. 또한, p형 실리콘 반도체 기판의 이면측에는 배면 전극이 형성되어 있다. 전면 전극은 은을 주성분으로 하는 도전성 입자, 글래스 프릿, 유기 비히클 등을 혼합한 도전성 페이스트를 이용하여, 스크린 인쇄 등의 방법에 의해서 전극을 형성하고 있으며, 배면 전극은 알루미늄 분말, 유리 프릿 및 유기 비히클(organic vehicle)로 이루어지는 알루미늄 페이스트 조성물을 스크린 인쇄 등에 의해 도포하고 건조한 후, 660℃(알루미늄의 융점) 이상의 온도에서 소성함으로써 형성되어 있다. 이 소성시에 알루미늄이 p형 실리콘 반도체 기판의 내부로 확산됨으로써, 배면 전극과 p형 실리콘 반도체 기판 사이에 Al-Si 합금층이 형성됨과 동시에, 알루미늄 원자의 확산에 의한 불순물층으로서 p+층이 형성된다. 이러한 p+층의 존재에 의해 전자의 재결합을 방지하고, 생성 캐리어의 수집 효율을 향상시키는 BSF(Back Surface Field) 효과가 얻어진다.8 is a structure of a general solar cell device, and the solar cell device is generally configured using a p-type silicon semiconductor substrate having a thickness of 180 to 250 μm. On the light-receiving surface side of the silicon semiconductor substrate, an n-type impurity layer having a thickness of 0.3 to 0.6 µm, an antireflection film and a front electrode are formed thereon. A back electrode is formed on the back side of the p-type silicon semiconductor substrate. The front electrode is formed by screen printing or the like using a conductive paste containing conductive particles containing silver as a main component, glass frit, and an organic vehicle, and the back electrode is formed of aluminum powder, glass frit, and organic vehicle. The aluminum paste composition which consists of (organic vehicle) is apply | coated by screen printing etc., and dried, and it forms by baking at the temperature more than 660 degreeC (melting point of aluminum). During the firing, aluminum diffuses into the p-type silicon semiconductor substrate, whereby an Al-Si alloy layer is formed between the back electrode and the p-type silicon semiconductor substrate, and a p + layer is formed as an impurity layer by diffusion of aluminum atoms. do. The presence of such a p + layer results in a back surface field (BSF) effect that prevents electron recombination and improves the collection efficiency of product carriers.

한편, 소성시 전면 전극에서는 반사 방지막이 글래스 프릿 분말의 산화 환원 반응을 통하여 침식되어지고, 글래스 프릿 분말 내의 도전성 분말 결정이 기판 계면에 석출되는 형태로 도전성 금속 결정립이 석출되고 상기 석출된 금속 결정립이 벌크 전면 전극과 실리콘 기판의 가교 역할을 할뿐만 아니라, 유리 프리트 분말의 두께에 따라 터널링 효과 또는 벌크 전극과의 직접적인 접착에 의한 컨택을 나타내는 것으로 알려져 있다.On the other hand, during firing, the anti-reflection film is eroded by the redox reaction of the glass frit powder, and the conductive metal crystals are precipitated in the form of the conductive powder crystals in the glass frit powder at the substrate interface. In addition to acting as a crosslinking of the bulk front electrode and the silicon substrate, it is known to exhibit contact by tunneling effect or direct adhesion with the bulk electrode depending on the thickness of the glass frit powder.

종래의 결정질 태양전지는 후면 Al, 후면 Ag, 전면 Ag의 조성 특성상 실측온도 750℃ 이상의 고온 소성공정이 일반적이나 최근 활발히 연구중인 Passivated Emitter 구조 태양전지(PESC, PERC, PERL)의 경우 박막 passivation 공정 특성상 소성 온도를 낮추거나 급격한 소성이 필요하다. 그래서 초기 연구는 전극 자체를 도금으로 증착하는 방식을 사용하였으나 투자비가 높고, 공정이 복잡한 단점이 있으며, 최근 전극을 인쇄공정으로 도입하는 연구가 활발히 진행 중이다. 그러나, 750℃ 이하의 소성 조건에서 기존 전극 페이스트 조성물은 에미터(emitter)와의 컨택이 불안정하며, 고면저항(100Ω/sq 이상)에서의 접촉저항이 좋지 않고, 유리프릿의 용융이 불균일한 문제점이 있어, 이에 적합한 전극 페이스트 조성물이 요구된다.Conventional crystalline solar cells have a high temperature firing process with an actual temperature of more than 750 ℃ due to the composition of the back Al, the back Ag, and the front Ag, but in the case of passivated emitter structured solar cells (PESC, PERC, PERL), which are being actively studied recently, Lower firing temperatures or rapid firing are required. So, the initial research used the method of depositing the electrode itself by plating, but the investment cost is high, and the process is complicated. Recently, the research to introduce the electrode into the printing process is actively underway. However, the conventional electrode paste composition is unstable in contact with the emitter under the firing conditions of 750 ° C or less, poor contact resistance at the surface resistance (100 kPa / sq or more), and uneven melting of the glass frit. There is a need for an electrode paste composition suitable for this.

본 발명은 용융 균일도를 높일 수 있으며, Cell 특성 균일도를 향상시킬 수 있고, 저온/급속 소성시에도 우수한 접촉 특성을 확보할 수 있으며, 고면저항 태양전지에도 우수하게 적용 가능한 태양전지용 전극 페이스트 조성물 및 고효율 태양전지를 제공하는 것을 목적으로 한다.The present invention can increase the melt uniformity, improve the uniformity of the cell characteristics, ensure excellent contact characteristics even at low temperature / rapid firing, and can be applied to high-resistance solar cell electrode paste composition and high efficiency It is an object to provide a solar cell.

상기의 과제를 해결하기 위한 수단으로서, As a means for solving the above problems,

본 발명은 도전성 금속 분말,유리 프릿,및 유기 비히클을 포함하여 이루어진 태양전지 전극용 페이스트 조성물로서, 상기 유리 프릿의 유리전이온도(Tg)는 200℃ 이상 300℃ 미만의 범위내인 것을 특징으로 하는 태양전지 전극용 페이스트 조성물을 제공한다.The present invention provides a paste composition for a solar cell electrode comprising a conductive metal powder, a glass frit, and an organic vehicle, wherein the glass transition temperature (Tg) of the glass frit is in a range of 200 ° C. or more and less than 300 ° C. Provided is a paste composition for a solar cell electrode.

또한, 상기 유리 프릿의 DSC 데이터 상에서 결정화 피크가 두 개 이상인 것을 특징으로 하는 태양전지 전극용 페이스트 조성물을 제공한다.In addition, there is provided a paste composition for a solar cell electrode, characterized in that two or more crystallization peaks on the DSC data of the glass frit.

또한, 상기 유리 프릿의 DSC 데이터 상에서 결정화 피크가 500℃ 미만에서 발생하는 것을 특징으로 하는 태양전지 전극용 페이스트 조성물을 제공한다.In addition, there is provided a paste composition for a solar cell electrode, characterized in that a crystallization peak occurs on the DSC data of the glass frit below 500 ° C.

또한, 상기 유리 프릿의 DSC 데이터 상에서 최초 결정화 피크가 400℃ 미만에서 발생하는 것을 특징으로 하는 태양전지 전극용 페이스트 조성물을 제공한다.In addition, the first crystallization peak on the DSC data of the glass frit provides a paste composition for a solar cell electrode, characterized in that occurring below 400 ℃.

또한, 상기 유리 프릿의 평균입경(D50)은 0.5 ~ 10㎛ 범위내인 것을 특징으로 하는 태양전지 전극용 페이스트 조성물을 제공한다.In addition, the average particle diameter (D50) of the glass frit provides a solar cell electrode paste composition, characterized in that in the range of 0.5 ~ 10㎛.

또한, 상기 유리 프릿의 PbO 함량은 유리 프릿 전체 대비 10 ~ 29 mol% 범위내인 것을 특징으로 하는 태양전지 전극용 페이스트 조성물을 제공한다.In addition, the PbO content of the glass frit provides a paste composition for a solar cell electrode, characterized in that in the range of 10 to 29 mol% relative to the entire glass frit.

또한, 기재 상부에 전면 전극을 구비하고, 기재 하부에 배면 전극을 구비한 태양전지에 있어서, 상기 전면 전극은, 상기 태양전지 전극용 페이스트 조성물을 도포한 후 소성시켜 제조된 것을 특징으로 하는 태양전지를 제공한다.In addition, in the solar cell having a front electrode on the upper substrate, and a back electrode on the lower substrate, the front electrode is manufactured by applying the solar cell electrode paste composition and baking To provide.

상기의 구성적 특징을 갖는 본 발명은 유리 프릿의 용융 균일도를 높일 수 있으며, Cell 특성 균일도를 향상시킬 수 있다. 또한, 저온/급속 소성시에도 우수한 접촉 특성을 확보할 수 있으며, 고면저항(90~120Ω/sq) 태양전지에 특히 우수하게 적용될 수 있다. The present invention having the above-described structural characteristics can increase the melt uniformity of the glass frit, and can improve the cell property uniformity. In addition, it is possible to ensure excellent contact characteristics even at low temperature / rapid firing, it can be applied particularly well to high surface resistance (90 ~ 120 Ω / sq) solar cells.

도 1은 유리프릿의 열적거동을 나타내는 DSC(시차주사열량계법) 데이터 개념도이며,1 is a conceptual diagram of differential scanning calorimetry (DSC) data showing thermal behavior of a glass frit.

도 2 내지 도 4는 제조예 및 비교제조예의 유리 프릿 DSC 데이터이며,2 to 4 are glass frit DSC data of Preparation Example and Comparative Preparation Example,

도 5 내지 도 7은 실시예 및 비교예의 성능 평가 데이터이며,5 to 7 are performance evaluation data of Examples and Comparative Examples,

도 8은 일반적인 태양전지 소자의 개략 단면도이다.8 is a schematic cross-sectional view of a general solar cell element.

이하에서는 도면 및 실시예를 통하여 본 발명을 보다 상세히 설명하기로 한다. 하기의 설명은 본 발명의 구체적 일례에 대한 것이므로, 비록 단정적, 한정적 표현이 있더라도 특허청구범위로부터 정해지는 권리범위를 제한하는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to the drawings and embodiments. The following descriptions are for specific examples of the present invention, but are not intended to limit the scope of the rights set forth in the claims, even if there is an assertive or limited expression.

본 발명은 도전성 금속 분말,유리 프릿,및 유기 비히클을 포함하여 이루어진 태양전지 전극용 페이스트 조성물로서,상기 유리 프릿은 특수한 열적 거동을 갖는 것을 특징으로 하는 태양전지 전극용 페이스트 조성물을 제공한다.The present invention provides a paste composition for a solar cell electrode comprising a conductive metal powder, a glass frit, and an organic vehicle, wherein the glass frit has a special thermal behavior.

이하 각 성분을 구체적으로 설명한다.Each component is demonstrated concretely below.

<도전성 금속 분말><Conductive Metal Powder>

도전성 금속 분말로는 은 분말, 구리분말, 니켈 분말, 알루미늄 분말 등이 사용될 수 있는데, 전면 전극의 경우 은 분말이 주로 사용되며, 배면 전극은 주로 알루미늄 분말이 사용된다. 이하에서는 편의상 은 분말을 예로 들어 도전성 금속재료에 대해 설명한다. 하기의 설명은 다른 금속 분말에도 동일하게 적용될 수 있다.As the conductive metal powder, silver powder, copper powder, nickel powder, aluminum powder, or the like may be used. For the front electrode, silver powder is mainly used, and for the back electrode, aluminum powder is mainly used. For convenience, the conductive metal material will be described using silver powder as an example. The following description is equally applicable to other metal powders.

은 분말은 순은 분말이 바람직하며, 이외에, 적어도 표면이 은층으로 이루어지는 은피복 복합 분말이나, 은을 주성분으로 하는 합금 등을 사용할 수 있다. 또한, 다른 금속 분말을 혼합하여 사용할 수도 있다. 예를 들면 알루미늄, 금, 팔라듐, 동, 니켈 등을 들 수 있다. 은 분말의 평균입경은 0.1 ~ 10㎛ 일 수 있으며, 페이스트화 용이성 및 소성시 치밀도를 고려할 때 0.5 ~ 5㎛가 바람직하며, 그 형상이 구상, 침상, 판상 그리고 무정상 중 적어도 1종 이상일 수 있다. 은 분말은 평균 입자지름이나 입도 분포, 형상 등이 다른 2종 이상의 분말을 혼합하여 이용해도 좋다. 은 분말의 함량은 인쇄시 형성되는 전극 두께 및 전극의 선저항을 고려할 때 전극용 페이스트 조성물 총중량을 기준으로 60 내지 98 중량%가 바람직하다.The silver powder is preferably a pure silver powder. In addition, a silver-coated composite powder having at least a surface of a silver layer, an alloy containing silver as a main component, and the like can be used. In addition, other metal powders may be mixed and used. For example, aluminum, gold, palladium, copper, nickel, etc. are mentioned. The average particle diameter of the silver powder may be 0.1 to 10 μm, and 0.5 to 5 μm is preferable in consideration of the ease of pasting and the density at the time of baking, and the shape may be at least one of spherical, needle, plate and amorphous. have. Silver powder may mix and use 2 or more types of powder from which an average particle diameter, particle size distribution, shape, etc. differ. The content of the silver powder is preferably 60 to 98% by weight based on the total weight of the electrode paste composition in consideration of the electrode thickness formed during printing and the wire resistance of the electrode.

<유기 비히클><Organic vehicle>

유기 비히클에는 제한되지 않으나 유기 바인더와 용제 등이 포함될 수 있다. 때로는 용제가 생략될 수 있다. 유기 비히클은 제한되지 않으나 전극용 페이스트 조성물 총중량을 기준으로 1~10 중량%가 바람직하다.The organic vehicle is not limited but may include an organic binder and a solvent. Sometimes the solvent can be omitted. The organic vehicle is not limited but is preferably 1 to 10% by weight based on the total weight of the electrode paste composition.

유기 비히클은 금속분말과 유리프릿 등이 균일하게 혼합된 상태를 유지하는 특성이 요구되며, 예를 들면 스크린인쇄에 의해 도전성 페이스트가 기재에 도포될 때에, 도전성 페이스트를 균질하게 해서, 인쇄패턴의 흐려짐 및 흐름을 억제하고, 또한 스크린판으로부터의 도전성 페이스트의 토출성 및 판분리성을 향상시키는 특성이 요구된다. The organic vehicle is required to maintain a uniformly mixed state of metal powder and glass frit. For example, when the conductive paste is applied to a substrate by screen printing, the conductive paste is made homogeneous and the printed pattern is blurred. And properties for suppressing flow and improving the dischargeability and plate separation property of the conductive paste from the screen plate.

본 발명의 실시예에 따른 전극용 페이스트 조성물에 사용되는 바인더는 제한되지 않으나 셀룰로오스 에스테르계 화합물로 셀룰로오스 아세테이트, 셀룰로오스 아세테이트 부틸레이트 등을 예로 들 수 있으며, 셀룰로오스 에테르 화합물로는 에틸 셀룰로오스, 메틸 셀룰로오스, 하이드록시 플로필 셀룰로오스, 하이드록시 에틸 셀룰로오스, 하이드록시 프로필 메틸 셀룰로오스, 하이드록시 에틸 메틸 셀룰로오스 등을 예로 들 수 있으며, 아크릴계 화합물로는 폴리 아크릴아미드, 폴리 메타 아크릴레이트, 폴리 메틸 메타 아크릴레이트, 폴리 에틸 메타 아크릴레이트 등을 예로 들 수 있으며, 비닐계로는 폴리비닐 부티랄, 폴리비닐 아세테이트 그리고 폴리비닐 알코올 등을 예로 들 수 있다. 상기 바인더들은 적어도 1종 이상 선택되어 사용될 수 있다. Although the binder used in the electrode paste composition according to the embodiment of the present invention is not limited, examples of the cellulose ester-based compound include cellulose acetate and cellulose acetate butylate, and the cellulose ether compound includes ethyl cellulose, methyl cellulose, and hydride. Roxy flophyll cellulose, hydroxy ethyl cellulose, hydroxy propyl methyl cellulose, hydroxy ethyl methyl cellulose, and the like, and examples of the acryl-based compound include poly acrylamide, poly methacrylate, poly methyl methacrylate, and polyethyl meta An acrylate etc. can be mentioned, For example, polyvinyl butyral, polyvinyl acetate, a polyvinyl alcohol, etc. are mentioned as a vinyl type. At least one or more of the binders may be selected and used.

조성물의 희석을 위해 사용되는 용제로서는 알파-터피네올, 텍사놀, 디옥틸 프탈레이트, 디부틸 프탈레이트, 시클로헥산, 헥산, 톨루엔, 벤질알코올, 디옥산, 디에틸렌글리콜, 에틸렌 글리콜 모노 부틸 에테르, 에틸렌 글리콜 모노 부틸 에테르 아세테이트, 디에틸렌 글리콜 모노 부틸 에테르, 디에틸렌 글리콜 모노 부틸 에테르 아세테이트 등으로 이루어진 화합물 중에서 적어도 1종 이상 선택되어 사용되는 것이 좋다. Solvents used for dilution of the composition include alpha-terpineol, texanol, dioctyl phthalate, dibutyl phthalate, cyclohexane, hexane, toluene, benzyl alcohol, dioxane, diethylene glycol, ethylene glycol mono butyl ether, ethylene At least one compound selected from the group consisting of glycol mono butyl ether acetate, diethylene glycol mono butyl ether, diethylene glycol mono butyl ether acetate and the like is preferably used.

<유리 프릿><Glass frit>

사용되는 유리 프릿은 제한되지 않는다. 유연 유리 프릿뿐만 아니라 무연 유리 프릿도 사용 가능하다. The glass frit used is not limited. Lead-free glass frits can be used as well as leaded glass frits.

유리 프릿의 유리전이온도(Tg)는 제한되지 않으나 200 ~ 600℃ 일 수 있으며, 바람직하기로는 유리전이온도는 200℃ 이상 300℃ 미만의 범위내가 좋다. 300℃ 미만의 낮은 유리전이온도의 유리 프릿을 사용함으로써 용융 균일도를 높일 수 있으며, Cell 특성 균일도를 향상시킬 수 있다. 또한, 저온/급속 소성시에도 우수한 접촉 특성을 확보할 수 있으며, 고면저항(90~120Ω/sq) 태양전지에 최적화될 수 있다.Glass transition temperature (Tg) of the glass frit is not limited, but may be 200 ~ 600 ℃, preferably the glass transition temperature is in the range of 200 ℃ to less than 300 ℃. By using a glass frit with a low glass transition temperature of less than 300 ° C., melt uniformity can be increased and cell uniformity can be improved. In addition, it is possible to secure excellent contact characteristics even at low temperature / rapid firing, it can be optimized for high surface resistance (90 ~ 120 Ω / sq) solar cells.

또한, 유리 프릿의 결정화 특성은 중요한 인자로 다루어질 수 있다. In addition, the crystallization properties of the glass frit can be treated as an important factor.

도 1은 유리프릿의 열적거동을 나타내는 DSC 데이터로서, 유리전이온도(Tg), 연화점(Ts), 결정화 피크 등을 관찰할 수 있다. 1 is DSC data showing the thermal behavior of the glass frit, the glass transition temperature (Tg), softening point (Ts), crystallization peak can be observed.

기존의 유리 프릿은 DSC 측정시 최초의 결정화 온도는 대체로 550℃ 이상에서 일어나는데, 본 발명에서는 유리 프릿의 DSC 측정 데이터 상 최초 결정화 피크가 400℃ 미만에서 이루어지도록 함으로써 소성시 보다 빨리 결정화가 일어나 소성 과정 중에 에미터 파괴 및 전극의 선폭이 커지는 것을 현저히 감소시킴으로써 전기적 특성을 우수하게 할 수 있다. 결정화 피크가 두 개 이상일 수 있으며, 그 경우에는 바람직하기로는 DSC 데이터 상에서 결정화 피크가 400℃ 미만에서 최초 발생하고, 2차 결정화 피크가 400℃ 이상 500℃ 미만에서 발생하는 것이 좋다. 더 좋기로는 DSC 데이터 상에서 500℃ 미만에서, 특히 400℃ 미만에서 결정화 피크가 모두 발생하는 것이 바람직하다.In the conventional glass frit, the initial crystallization temperature is generally higher than 550 ° C. during DSC measurement. In the present invention, the crystallization occurs more quickly when firing by allowing the initial crystallization peak in the DSC measurement data of the glass frit to be less than 400 ° C. The electrical characteristics can be excellent by significantly reducing the breakdown of the emitter and the increase in the line width of the electrode. There may be more than one crystallization peak, in which case it is preferred that the crystallization peak first occur on the DSC data below 400 ° C., and the secondary crystallization peak occur above 400 ° C. and below 500 ° C. More preferably, all of the crystallization peaks occur below 500 ° C., in particular below 400 ° C., on the DSC data.

한편, 유리 프릿의 조성이나 입경, 형상에 있어서 특별히 제한을 두지 않는다. 바람직하기로는 유리 프릿의 성분 및 함량으로서, 산화물 환산 기준으로 PbO는 10 ~ 29 mol%, TeO2는 20 ~ 34 mol%, Bi2O3는 3 ~ 20 mol%, SiO2 20 mol% 이하, B2O3 10 mol% 이하, 알칼리 금속(Li, Na, K 등) 및 알칼리 토금속(Ca, Mg 등)은 10 ~ 20 mol%를 함유하는 것이 좋다. 상기 각 성분의 유기적 함량 조합에 의해 전극 선폭 증가를 막고 고면저항에서 접촉저항을 우수하게 할 수 있으며, 단략전류 특성을 우수하게 할 수 있다. In addition, there is no restriction | limiting in particular in the composition, particle diameter, and shape of a glass frit. Preferably, as a component and content of the glass frit, PbO is 10 to 29 mol%, TeO2 is 20 to 34 mol%, Bi2O3 is 3 to 20 mol%, SiO2 is 20 mol% or less and B2O3 is 10 mol% or less , Alkali metals (Li, Na, K, etc.) and alkaline earth metals (Ca, Mg, etc.) may contain 10 to 20 mol%. By combining the organic content of the above components, it is possible to prevent the increase of the electrode line width, to improve the contact resistance at the sheet resistance, and to improve the short-circuit current characteristics.

특히, PbO의 함량이 너무 높으면 친환경적이지 않고, 용융시 점도가 너무 낮아져서 소성시 전극의 선폭이 커지는 문제점이 존재하며, 따라서 PbO는 유리프릿내에서 상기 범위내로 포함되는 것이 좋다. 더 나아가 PbO가 30mol%를 넘고, 알칼리 금속 및 알칼리 토금속의 함량이 상기 범위에 미달하는 경우에는 절연층 중 Al2O3층 제거 성능이 떨어져 바람직하지 않다. In particular, if the content of PbO is too high, it is not environmentally friendly, there is a problem that the viscosity of the electrode is too low to melt the line width of the electrode during firing, so PbO is preferably included within the above range in the glass frit. Furthermore, when PbO exceeds 30 mol% and the content of alkali metals and alkaline earth metals falls below the above range, the Al2O3 layer removal performance in the insulating layer is not preferable, which is not preferable.

한편, 유리 프릿의 평균 입경은 제한되지 않으나 0.5 ~ 10㎛ 범위내의 입경을 가질 수 있으며, 평균입경이 다른 다종이 입자를 혼합하여 사용할 수도 있다. 바람직하기로는 적어도 1종의 유리프릿은 평균입경(D50)이 3㎛ 이상 10 ㎛ 이하인 것을 사용하는 것이 좋다. 이를 통해 소성시 반응성이 우수해지고, 특히 고온에서 n층의 데미지를 최소화할 수 있으며 부착력이 개선되고 개방전압(Voc)을 우수하게 할 수 있다. 또한, 소성시 전극의 선폭이 증가하는 것을 감소시킬 수 있다. 또한, 상기 평균입경이 3㎛ 이상 10 ㎛ 이하인 유리프릿의 유리전이온도(Tg)는 300℃ 미만인 것이 바람직하다. 비교적 입경이 큰 입자를 사용하므로 유리전이온도를 낮춤으로써 소성시 불균일하게 용융되는 등의 문제점을 방지할 수 있다.On the other hand, the average particle diameter of the glass frit is not limited, but may have a particle diameter within the range of 0.5 ~ 10㎛, it is also possible to use a mixture of different paper particles having a different average particle diameter. Preferably, at least one glass frit has a mean particle size (D50) of 3 µm or more and 10 µm or less. Through this, the reactivity is excellent during firing, and the damage of the n-layer can be minimized, especially at high temperatures, and the adhesion can be improved and the open voltage (Voc) can be excellent. In addition, it is possible to reduce the increase in the line width of the electrode during firing. In addition, it is preferable that the glass transition temperature (Tg) of the glass frit whose average particle diameter is 3 micrometers or more and 10 micrometers or less is less than 300 degreeC. Since particles having a relatively large particle size are used, problems such as uneven melting during firing can be prevented by lowering the glass transition temperature.

유리 프릿의 함량은 도전성 페이스트 조성물 총중량을 기준으로 1 내지 15중량%가 바람직한데, 1 중량% 미만이면 불완전 소성이 이루어져 전기 비저항이 높아질 우려가 있고, 15 중량% 초과하면 은 분말의 소성체 내에 유리 성분이 너무 많아져 전기 비저항이 역시 높아질 우려가 있다. The content of the glass frit is preferably 1 to 15% by weight based on the total weight of the conductive paste composition. If the content is less than 1% by weight, incomplete firing may occur to increase the electrical resistivity. There are too many components, and there exists a possibility that an electrical resistivity may also become high.

<기타 첨가제><Other additives>

본 발명에 의한 전극용 페이스트 조성물은 필요에 따라 통상적으로 알려져 있는 첨가제, 예를 들면, 분산제, 가소제, 점도 조정제, 계면활성제, 산화제, 금속 산화물, 금속 유기 화합물 등을 더 포함할 수 있다. The paste composition for electrodes according to the present invention may further include additives commonly known as necessary, for example, a dispersant, a plasticizer, a viscosity modifier, a surfactant, an oxidant, a metal oxide, a metal organic compound, and the like.

본 발명은 또한 상기 태양전지 전극용 페이스트를 기재 위에 도포하고, 건조 및 소성하는 것을 특징으로 하는 태양전지의 전극 형성 방법 및 상기 방법에 의하여 제조된 태양전지 전극을 제공한다. 본 발명의 태양전지 전극 형성방법에서 상기 태양전지 전극 형성용 페이스트를 사용하는 것을 제외하고, 기재, 인쇄, 건조 및 소성은 통상적으로 태양전지의 제조에 사용되는 방법들이 사용될 수 있음은 물론이다. 일예로 상기 기재는 실리콘 웨이퍼일 수 있으며, 본 발명의 페이스트로 제조되는 전극은 전면의 핑거 전극, 버스바 전극일 수 있으며, 상기 인쇄는 스크린 인쇄, 옵셋 인쇄일 수 있으며, 상기 건조는 90 내지 250 ℃에서 이루어 질 수 있으며, 상기 소성은 600 내지 950 ℃에서 이루어질 수 있다. 바람직하기로는 상기 소성이 800 내지 950 ℃, 더욱 바람직하게는 850 내지 900 ℃에서 5초 내지 1분간 이루어지는 고온/고속 소성을 하는 것이 좋으며, 상기 인쇄는 20 내지 60 ㎛의 두께로 인쇄를 하는 것이 좋다. 구체적인 일예로 대한민국 공개특허공보 제10-2006-0108550호, 제10-2006-0127813호, 일본국 공개특허공보 특개2001-202822 및 특개2003-133567에 기재된 태양전지의 구조 및 이의 제조방법을 들 수 있다. The present invention also provides a method for forming an electrode of a solar cell and a solar cell electrode manufactured by the method, characterized in that the paste for the solar cell electrode is applied on a substrate, dried and baked. Except for using the solar cell electrode forming paste in the method of forming a solar cell electrode of the present invention, the substrate, printing, drying and firing is a general method that can be used for the manufacture of a solar cell, of course. For example, the substrate may be a silicon wafer, and the electrode made of the paste of the present invention may be a finger electrode or a busbar electrode on the front surface, and the printing may be screen printing or offset printing, and the drying may be 90 to 250. It may be made at ℃, the firing may be made at 600 to 950 ℃. Preferably, the high-temperature / high speed firing is performed at 800 to 950 ° C., more preferably at 850 to 900 ° C. for 5 seconds to 1 minute, and the printing is preferably performed at a thickness of 20 to 60 μm. . As a specific example, the structure of the solar cell described in Korean Unexamined-Japanese-Patent No. 10-2006-0108550, 10-2006-0127813, Unexamined-Japanese-Patent No. 2001-202822, and 2003-133567, and its manufacturing method are mentioned. have.

이하 실시예를 통해 보다 상세하게 설명한다.It will be described in more detail through the following examples.

<실시예><Example>

유리 프릿의 제조Preparation of Glass Frit

하기 표 1에 나타낸 바와 같은 조성으로 유리 프릿을 제조하였고, 그 DSC 데이터를 측정하여 도 2(제조예 1), 도 3(제조예 2)에 나타내었다. 한편, 비교 제조예의 유리 프릿으로 Viox社의 유리 프릿을 준비하였으며, 그 DSC 데이터를 측정하여 도 4(비교제조예 1)에 나타내었다. A glass frit was prepared with the composition as shown in Table 1 below, and the DSC data thereof was measured and shown in FIGS. 2 (Preparation Example 1) and 3 (Preparation Example 2). On the other hand, Viox glass frit was prepared as a glass frit of Comparative Preparation Example, the DSC data was measured and shown in Figure 4 (Comparative Preparation Example 1).

구성 성분Component 제조예 1(mol%)Preparation Example 1 (mol%) 제조예 2(mol%)Preparation Example 2 (mol%) PbOPbO 2929 2525 TeO2TeO2 3434 3434 Bi2O3Bi2O3 1010 1515 SiO2SiO2 1010 55 Li2OLi2O 55 77 Na2ONa2O 55 55 K2OK2O 55 55 ZnOZnO 1One 22 Al2O3Al2O3 22 TIO2TIO2 1One

페이스트 조성물의 제조Preparation of Paste Composition

하기 표 2에 나타낸 바와 같은 조성으로 바인더, 용제, 첨가제, 유리 프릿 등을 넣고 삼본밀을 사용하여 분산한 후, 실버 파우더(구상, 평균 입경 1~2㎛)를 혼합하고 또한 삼본밀을 사용하여 분산하였다. 그 뒤 감압/가압 탈포하고 도전성 페이스트를 제조하였다. Binders, solvents, additives, glass frit and the like as shown in Table 2 below, dispersed using a three-bone mill, and then mixed with silver powder (spherical, average particle diameter 1 ~ 2㎛) and further using a three-bone mill Dispersed. Thereafter, vacuum / pressure defoaming was carried out to prepare a conductive paste.

구분division 실시예 1Example 1 실시예 2Example 2 비교예1Comparative Example 1 Ethyl CelluloseEthyl Cellulose 0.50.5 0.50.5 0.50.5 TexanolTexanol 2.42.4 2.42.4 2.42.4 DBADBA 22 22 22 DBDB 1.81.8 1.81.8 1.81.8 BYK-108BYK-108 0.50.5 0.50.5 0.50.5 Amide WaxAmide wax 0.50.5 0.50.5 0.50.5 DPGDBDPGDB 0.20.2 0.20.2 0.20.2 실버 파우더Silver powder 9090 9090 9090 유리 프릿(제조예 1)(Tg 265℃)Glass frit (production example 1) (Tg 265 degrees Celsius) 2.12.1 유리 프릿(제조예 2)(Tg 255℃)Glass frit (production example 2) (Tg 255 degrees Celsius) 2.12.1 유리 프릿(비교제조예 1)(Tg 340℃)Glass frit (Comparative Production Example 1) (Tg 340 ° C) 2.12.1

<실험예> Cell의 제조 및 특성 테스트Experimental Example Preparation and Characterization of Cell

상기 실시예 1 내지 2 및 비교예 1에서 제조한 페이스트 조성물을 Wafer의 후면에 스크린 프린팅 기법으로 Al paste를 인쇄한 후 IR 건조로를 사용하여 200~300 ℃에서 20초 동안 건조시켰다. 이후 Wafer의 전면에 스크린 프린팅 기법으로 40㎛ 선폭의 패턴 인쇄를 하고, 동일한 방법으로 건조하였다. 상기 과정으로 형성된 Cell을 벨트형 소성로를 사용하여 500 내지 900 ℃사이로 20초에서 30초간 소성을 행하되, 최대 피크 온도를 740℃, 770℃, 800℃로 하여 각각 소성을 수행하였으며, 이렇게 제조 완료된 Cell은 태양전지효율측정장비(H.a.l.m社, Cetis PV-celltester3)를 사용하여, Isc, Voc, Rs, Fill Factor, 효율성능을 관찰하여 하기 표 3 및 도 5 내지 도 7에 나타내었다. The paste compositions prepared in Examples 1 and 2 and Comparative Example 1 were printed with Al paste by screen printing on the back of the wafer, and dried at 200-300 ° C. for 20 seconds using an IR drying furnace. Thereafter, a pattern of 40 μm line width was printed on the front surface of the wafer by screen printing, and dried in the same manner. The cell formed by the above process was calcined for 20 seconds to 30 seconds using a belt-type kiln for 20 to 30 seconds, and the firing was performed at a maximum peak temperature of 740 ° C., 770 ° C., and 800 ° C., respectively. Using a solar cell efficiency measuring equipment (Halm, Cetis PV-celltester3), Isc, Voc, Rs, Fill Factor, the efficiency of observing the performance shown in Table 3 and Figures 5 to 7 below.

소성온도Firing temperature IscIsc VocVoc EffEff FFFF RsRs 740℃740 ℃ 비교예 1Comparative Example 1 9.299.29 0.640.64 19.2819.28 76.9576.95 0.002150.00215 실시예 1Example 1 9.359.35 0.650.65 19.5919.59 77.6477.64 0.002030.00203 실시예 2Example 2 9.329.32 0.650.65 19.6019.60 77.8777.87 0.001980.00198 770℃770 ℃ 비교예 1Comparative Example 1 9.329.32 0.650.65 19.6219.62 77.9877.98 0.001890.00189 실시예 1Example 1 9.339.33 0.650.65 19.7019.70 78.2378.23 0.001770.00177 실시예 2Example 2 9.359.35 0.650.65 19.7419.74 78.2078.20 0.001810.00181 800℃800 ℃ 비교예 1Comparative Example 1 9.309.30 0.640.64 19.5719.57 78.0578.05 0.001870.00187 실시예 1Example 1 9.309.30 0.650.65 19.6719.67 78.3878.38 0.001750.00175 실시예 2Example 2 9.329.32 0.640.64 19.5819.58 78.0878.08 0.001790.00179

표 3 및 도 5 내지 도 7에 나타난 바와 같이, 본 발명의 실시예들은 비교예에 비하여, 여러 전기적 특성이 좋아진 것을 확인할 수 있다. 특히 저온 소성에서 성능이 우수한 것을 확인할 수 있다.As shown in Table 3 and Figures 5 to 7, it can be seen that the embodiments of the present invention have improved several electrical properties, compared to the comparative example. In particular, it can be seen that the performance is excellent at low temperature firing.

상기의 설명은 본 발명의 이해를 돕기 위한 일례이므로, 본 발명의 기술적 사상의 범위내에서 가할 수 있는 구성의 변형, 치환, 수정, 생략 등은 특허청구범위에 의해 정해지는 본 발명의 권리범위에 포함된다.Since the above description is an example for better understanding of the present invention, modifications, substitutions, modifications, omissions, and the like which can be added within the scope of the technical idea of the present invention are within the scope of the present invention defined by the claims. Included.

[부호의 설명][Description of the code]

10 : P형 실리콘 반도체 기판10: P-type silicon semiconductor substrate

20 : N형 불순물층20: N-type impurity layer

30 : 반사 방지막30: antireflection film

40 : P+층(BSF : back surface field)40: P + layer (BSF: back surface field)

50 : 배면 알루미늄 전극50: back aluminum electrode

60 : 배면 실버 전극60: back silver electrode

100 : 전면 전극 100: front electrode

Claims (7)

도전성 금속 분말,유리 프릿,및 유기 비히클을 포함하여 이루어진 태양전지 전극용 페이스트 조성물로서,A paste composition for solar cell electrodes comprising a conductive metal powder, a glass frit, and an organic vehicle, 상기 유리 프릿의 유리전이온도(Tg)는 200℃ 이상 300℃ 미만의 범위내인 것을 특징으로 하는 태양전지 전극용 페이스트 조성물.The glass transition temperature (Tg) of the glass frit is a solar cell electrode paste composition, characterized in that within the range of 200 ℃ or less. 제1항에 있어서,The method of claim 1, 상기 유리 프릿의 DSC 데이터 상에서 결정화 피크가 두 개 이상인 것을 특징으로 하는 태양전지 전극용 페이스트 조성물.Paste composition for a solar cell electrode, characterized in that more than one crystallization peak on the DSC data of the glass frit. 제1항에 있어서,The method of claim 1, 상기 유리 프릿의 DSC 데이터 상에서 결정화 피크가 500℃ 미만에서 발생하는 것을 특징으로 하는 태양전지 전극용 페이스트 조성물.The paste composition for solar cell electrodes, characterized in that a crystallization peak occurs below 500 ° C. on the DSC data of the glass frit. 제1항에 있어서,The method of claim 1, 상기 유리 프릿의 DSC 데이터 상에서 최초 결정화 피크가 400℃ 미만에서 발생하는 것을 특징으로 하는 태양전지 전극용 페이스트 조성물.Paste composition for a solar cell electrode, characterized in that the first crystallization peak occurs below 400 ℃ on the DSC data of the glass frit. 제1항에 있어서,The method of claim 1, 상기 유리 프릿의 평균입경(D50)은 0.5 ~ 10㎛ 범위내인 것을 특징으로 하는 태양전지 전극용 페이스트 조성물.Paste composition for a solar cell electrode, characterized in that the average particle diameter (D50) of the glass frit is in the range of 0.5 ~ 10㎛. 제1항에 있어서,The method of claim 1, 상기 유리 프릿의 PbO 함량은 유리 프릿 전체 대비 10 ~ 29 mol% 범위내인 것을 특징으로 하는 태양전지 전극용 페이스트 조성물.PbO content of the glass frit is a paste composition for a solar cell electrode, characterized in that in the range of 10 to 29 mol% compared to the entire glass frit. 기재 상부에 전면 전극을 구비하고, 기재 하부에 배면 전극을 구비한 태양전지에 있어서, In a solar cell having a front electrode on the upper substrate, and a back electrode on the lower substrate, 상기 전면 전극은, 제1항 내지 제6항 중 어느 한 항의 태양전지 전극용 페이스트 조성물을 도포한 후 소성시켜 제조된 것을 특징으로 하는 태양전지.The front electrode is manufactured by applying a paste composition for solar cell electrodes of any one of claims 1 to 6 and then firing.
PCT/KR2016/012344 2015-10-31 2016-10-31 Electrode paste for solar cell and solar cell prepared by means of same Ceased WO2017074149A1 (en)

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KR20100127619A (en) * 2009-05-26 2010-12-06 주식회사 엘지화학 Metal paste composition for electrode formation and silver-carbon composite electrode and silicon solar cell using same
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KR20140053435A (en) * 2012-10-25 2014-05-08 대주전자재료 주식회사 Silver paste composition used in the preparation of an electrode for a solar cell
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