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WO2016171093A1 - Liquide de revêtement pour film de blocage thermique, procédé de production de liquide de revêtement pour film de blocage thermique, et corps de blocage de rayonnement infrarouge - Google Patents

Liquide de revêtement pour film de blocage thermique, procédé de production de liquide de revêtement pour film de blocage thermique, et corps de blocage de rayonnement infrarouge Download PDF

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Publication number
WO2016171093A1
WO2016171093A1 PCT/JP2016/062204 JP2016062204W WO2016171093A1 WO 2016171093 A1 WO2016171093 A1 WO 2016171093A1 JP 2016062204 W JP2016062204 W JP 2016062204W WO 2016171093 A1 WO2016171093 A1 WO 2016171093A1
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Prior art keywords
coating
film
infrared
layer
thermal barrier
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English (en)
Japanese (ja)
Inventor
安藤 達哉
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Konica Minolta Inc
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Konica Minolta Inc
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04Polyurethanes
    • C09D175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/28Interference filters

Definitions

  • the present invention relates to a coating solution for a thermal barrier film, in which coating unevenness and coating defects are improved and coating film peeling due to thermoforming can be prevented, a method for producing the thermal barrier film coating solution, and the thermal barrier film It is related with the infrared shielding body formed by apply
  • the present invention has been made in view of the above-mentioned problems and situations, and the solution is to improve coating unevenness and coating defects, and to prevent coating film peeling due to thermoforming. It is providing the infrared shielding body formed by apply
  • the present inventor in the process of examining the cause of the above-mentioned problems, the thermal barrier film coating liquid, tungsten oxide, at least one of polymerizable acrylate or urethane acrylate, fluorine-based Incorporating a surfactant and defining the viscosity and surface tension within a specific range, it has been found that coating unevenness and coating defects can be improved, and that coating film peeling due to thermoforming can be prevented. It came. That is, the said subject which concerns on this invention is solved by the following means. 1.
  • a thermal barrier film coating solution that shields infrared rays, Containing tungsten oxide, at least one of polymerizable acrylate or urethane acrylate, and a fluorosurfactant,
  • the viscosity of the coating solution at 25 ° C. measured by a vibration viscometer is in the range of 2.5 to 10.0 mPa ⁇ s
  • Thermal insulation characterized in that the dynamic surface tension at 25 ° C. when a single bubble is generated by the bubble pressure differential pressure method is in the range of 25.0-30.0 mN / m at 100 msec. Coating liquid for film.
  • Item 5 The thermal barrier film coating according to any one of items 1 to 4, which contains bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide as a polymerization initiator. liquid.
  • a method for producing a coating solution for a thermal barrier film which produces the coating solution for a thermal barrier film according to any one of items 1 to 5, After adding the said fluorosurfactant to the said tungsten oxide, at least any one of the said polymeric acrylate or urethane acrylate is added as a binder, The manufacturing method of the coating liquid for thermal insulation films characterized by the above-mentioned.
  • coating unevenness and coating defects are improved, and coating film for a thermal barrier film capable of preventing coating film peeling due to thermoforming, a method for producing the thermal barrier film coating liquid, and The infrared shielding body formed by apply
  • coating the coating liquid for thermal insulation films can be provided.
  • the expression mechanism or action mechanism of the effect of the present invention is not clear, but is presumed as follows.
  • the inventor of the present invention produces micro-aggregation of tungsten oxide in the coating liquid state, so even if it is a film with seemingly improved coating unevenness and coating defects, It was presumed that the condition was uneven, the coating film cracked due to heat, and the coating film peeled off starting from that part.
  • a heating test is performed by containing tungsten oxide, at least one of polymerizable acrylate or urethane acrylate, and a fluorosurfactant, and setting the viscosity and dynamic surface tension within the specific ranges described above. It has been found that a remarkable effect is exerted on peeling of the coating film on the surface. This is because when the coating solution comes into contact with the substrate to form a coating film, molecular motion of the tungsten oxide particles at the micro level is moderately suppressed, so that dispersibility increases and aggregation does not occur. It is estimated that there is. As a result, coating film peeling due to thermoforming can be prevented.
  • the thermal barrier film coating liquid of the present invention is a thermal barrier film coating liquid that shields infrared rays, and includes tungsten oxide, at least one of polymerizable acrylate or urethane acrylate, and a fluorine-based surfactant.
  • the viscosity of the coating solution at 25 ° C. measured by a vibration viscometer is in the range of 2.5 to 10.0 mPa ⁇ s, and one bubble is generated by the bubble pressure differential pressure method.
  • the dynamic surface tension at 25 ° C. is in the range of 25.0 to 30.0 mN / m at 100 msec.
  • the tungsten oxide is preferably a cesium-containing tungsten oxide from the viewpoints of infrared shielding properties and light resistance.
  • the number of functional groups of the polymerizable acrylate is preferably in the range of 3-6.
  • the functional group of the polymerizable acrylate is involved in crosslinking at the time of coating film formation, and the crosslinking density increases as the number of functional groups increases, and the crosslinking density decreases as the number of functional groups decreases. Therefore, by setting the number of functional groups within the range of 3 to 6, the crosslinking density by acrylate becomes appropriate, tungsten oxide is more appropriately dispersed, and micro-aggregation does not occur. As a result, peeling of the coating film during thermoforming can be prevented.
  • the metal salt acts as a curing accelerator, and a uniform film is formed by curing the coating film to the inside, thereby preventing microscopic aggregation of the tungsten oxide particles. As a result, uneven coating during thermoforming can be prevented.
  • the polymerization initiator preferably contains bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide.
  • a composition comprising a polymerizable acrylate and a polymerization initiator is applied onto a substrate and irradiated with ultraviolet rays, a polymerization reaction occurs and cures.
  • tungsten oxide is contained, bis (2,4,6-trimethylbenzoyl) -phenylphosphine has excellent internal curability as a polymerization initiator while the coating itself absorbs ultraviolet rays and the internal curing is difficult to proceed.
  • oxide the coating film is cured uniformly. As a result, uneven curing in the thickness direction of the coating film is suppressed, and micro-aggregation of tungsten oxide is less likely to occur. As a result, peeling of the coating film during thermoforming can be prevented.
  • the manufacturing method of the coating liquid for thermal insulation films which manufactures the coating liquid for thermal insulation films of this invention is the said polymerizable acrylate or urethane acrylate as a binder, after adding the said fluorosurfactant to the said tungsten oxide. It is preferable to add at least one of them.
  • a fluorosurfactant to tungsten oxide in advance during preparation of the coating solution for the thermal barrier film, the coating action of the fluorosurfactant on the tungsten oxide particle surface occurs and micro-aggregation is further suppressed. Is done. As a result, peeling of the coating film during thermoforming can be prevented.
  • the infrared shielding body of the present invention comprises an infrared shielding film formed by applying the coating liquid for a heat shielding film on a transparent substrate, and the transparent substrate.
  • Another infrared shielding body of the present invention is an infrared ray formed by applying the above-described coating solution for a heat shielding film on a transparent substrate with a reflective layer formed by laminating a low refractive index layer and a high refractive index layer.
  • a shielding film and the transparent substrate are provided.
  • is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
  • the coating solution for a thermal barrier film of the present invention contains tungsten oxide, at least one of polymerizable acrylate or urethane acrylate, and a fluorosurfactant, and has the following viscosity and dynamic surface tension. It is characterized by being within a specific range. Moreover, it is preferable that the coating liquid for thermal insulation films of this invention contains a metal salt and a polymerization initiator.
  • the coating solution for a thermal barrier film of the present invention is characterized in that the viscosity at 25 ° C. of the coating solution in a vibration viscometer is in the range of 2.5 to 10.0 mPa ⁇ s. More preferably, it is in the range of 3.0 to 8.0 mPa ⁇ s. If it is less than 2.5 mPa ⁇ s, the fluidity is large, and the particles in the coating solution are liable to cause micro-Brownian motion and easily aggregate. On the other hand, when it exceeds 10.0 mPa ⁇ s, the fluidity is poor, and the particles in the coating solution are not properly dispersed.
  • the adjustment of the viscosity can be adjusted by the solid content concentration of the coating solution.
  • the solid content concentration of the coating solution is preferably in the range of 30 to 50%.
  • the viscosity can be measured using a vibration type viscometer, for example, a digital viscomate MODEL VM-100 manufactured by yamachi electronics.
  • the thermal barrier film coating solution of the present invention has a dynamic surface tension at 25 ° C. of 25.0 to 30.0 mN / m when a single bubble is generated by the bubble pressure differential pressure method at 100 msec. It is within the range. More preferably, it is in the range of 25.0 to 28.5 mN / m.
  • the coating liquid can be applied when the coating liquid is applied to the substrate, and the spread of the liquid when wet spreads can be made appropriate. Liquid unevenness can be suppressed and aggregation of tungsten oxide can be suppressed.
  • the dynamic surface tension can be adjusted by adjusting the concentration of the fluorosurfactant in the solid content.
  • concentration of the fluorosurfactant in the solid content is preferably in the range of 0.01 to 0.2%.
  • the dynamic surface tension can be measured using a dynamic surface tension measuring instrument, for example, K100SF manufactured by KURUSS. The dynamic surface tension at 25 ° C. when the viscosity at 25 ° C.
  • the coating solution is in the range of 2.5 to 10.0 mPa ⁇ s and one bubble is generated by the bubble pressure differential pressure method is By setting the particle size within the range of 25.0 to 30.0 mN / m at 100 msec, the particles in the coating solution are appropriately dispersed, so that there is no micro-aggregation of the particles when the coating film is formed. As a result, it is presumed that there is no unevenness in the degree of heat application when heat formation is performed, and the coating film does not peel off.
  • Tungsten oxide used in the present invention is a compound particle (infrared absorbing particle) having an optical absorption characteristic that absorbs in the infrared wavelength region. In the present invention, it absorbs a large amount of light in the infrared region, particularly a wavelength of 1000 nm or more. In addition, it is preferable to have a heat shielding performance (heat shielding performance).
  • the tungsten oxide according to the present invention has a general formula WyOz (W is tungsten, O is oxygen, 2.2 ⁇ z / y ⁇ 2.999) or a general formula MxWyOz (where M is H, He, Alkali metal, alkaline earth metal, rare earth element, Mg, Zr, Cr, Mn, Fe, Ru, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd, Al, Ga, In , Tl, Si, Ge, Sn, Pb, Sb, B, F, P, S, Se, Br, Te, Ti, Nb, V, Mo, Ta, Re, Be, Hf, Os, Bi, I
  • W is tungsten
  • O is oxygen, 0.001 ⁇ x / y ⁇ 1, 2.2 ⁇ z / y ⁇ 3, 2.2 ⁇ z / y ⁇ 3)
  • MxWyOz also referred to as
  • the tungsten oxide represented by the general formula MxWyOz has excellent durability when it has a hexagonal, tetragonal, or cubic crystal structure. Therefore, at least one selected from the hexagonal, tetragonal, and cubic crystals is used.
  • the crystal structure is preferably included. Of these, hexagonal crystals are particularly preferred because they have the least absorption in the visible light region.
  • a composite tungsten oxide having a hexagonal crystal structure one type selected from each element of Cs, Rb, K, Tl, In, Ba, Li, Ca, Sr, Fe, and Sn as preferable M elements.
  • a composite tungsten oxide containing the above elements can be given.
  • a cesium-containing tungsten oxide is preferable as the tungsten oxide from the viewpoints of infrared shielding properties and weather resistance.
  • x / y indicating the composition ratio between the element M and W (tungsten) will be described. If the value of x / y is larger than 0.001, a sufficient amount of free electrons is generated, and the intended infrared shielding effect can be obtained. As the amount of the element M added increases, the supply amount of free electrons increases and the infrared shielding efficiency also increases. However, when the value of x / y is about 1, the effect is saturated. Moreover, it is preferable that the value of x / y is smaller than 1 because an impurity phase can be prevented from being generated in the tungsten oxide particles.
  • the particle diameter of the tungsten oxide can be selected according to the purpose of use.
  • it when it is used for an application that maintains transparency, it preferably has a particle diameter of 800 nm or less. This is because particles smaller than 800 nm do not completely block light due to scattering, and can maintain visibility in the visible light region and at the same time efficiently maintain transparency.
  • the particle diameter is 200 nm or less, preferably 100 nm or less.
  • the reason for this is that if the particle size of the particles is small, the scattering of light in the visible light region having a wavelength of 400 to 780 nm due to geometric scattering or Mie scattering is reduced, and as a result, the infrared shielding film becomes like frosted glass, This is because it is possible to avoid the loss of clear transparency. That is, when the particle diameter is 200 nm or less, the geometric scattering or Mie scattering is reduced and a Rayleigh scattering region is obtained. This is because in the Rayleigh scattering region, the scattered light is reduced in inverse proportion to the sixth power of the particle diameter, so that the scattering is reduced and the transparency is improved as the particle diameter is reduced. Furthermore, when the particle diameter is 100 nm or less, the scattered light is preferably extremely small. From the viewpoint of avoiding light scattering, a smaller particle diameter is preferable. If the particle diameter is 1 nm or more, industrial production is easy.
  • the haze value of a coating film (infrared shielding film) in which tungsten oxide particles (infrared absorbing particles) are dispersed in a medium such as a resin has a visible light transmittance of 85% or less.
  • the haze can be 30% or less.
  • the haze is a value larger than 30%, it becomes like frosted glass, and clear transparency cannot be obtained.
  • the tungsten oxide represented by the general formula WyOz or the general formula MxWyOz may be used singly or in combination of two or more. In addition, it may be used in combination with compound particles having optical absorption characteristics such as titanium oxide, cerium oxide, indium oxide, zinc sulfide, zinc oxide, anti-doped tin oxide (ATO) and tin-doped indium oxide (ITO).
  • optical absorption characteristics such as titanium oxide, cerium oxide, indium oxide, zinc sulfide, zinc oxide, anti-doped tin oxide (ATO) and tin-doped indium oxide (ITO).
  • the entire surface or a part of the infrared absorbing particles is coated with an oxide containing one or more kinds of metals of Si, Ti, Zr, and Al.
  • the coating method is not particularly limited, the surface of the infrared absorbing particles can be coated by adding the metal alkoxide to the solution in which the infrared absorbing particles are dispersed.
  • an ultraviolet curable acrylate resin that is cured by ultraviolet irradiation is preferably used.
  • the ultraviolet curable monomer include monomers having an ethylenically unsaturated double bond and an epoxy group, and monomers having an ethylenically unsaturated double bond are preferably used.
  • ultraviolet curable polyol acrylate resins include ethylene glycol (meth) acrylate, polyethylene glycol di (meth) acrylate, glycerin tri (meth) acrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, and dipentaerythritol. Examples include pentaacrylate, dipentaerythritol hexaacrylate, and alkyl-modified dipentaerythritol pentaacrylate.
  • the ultraviolet curable polyol acrylate resin a commercially available product may be used as the ultraviolet curable polyol acrylate resin.
  • the number of functional groups of the polymerizable acrylate is preferably in the range of 3 to 6.
  • the functional group means an acryloyl group (CH 2 ⁇ CH—C (O) O—), a (meth) acryloyl group (CH 2 ⁇ C (CH 3 ) —C (O) O—).
  • UV curable urethane acrylate resins include 2-hydroxyethyl acrylate and 2-hydroxyethyl methacrylate (hereinafter referred to as acrylates) in addition to products obtained by reacting polyester polyols with isocyanate monomers or prepolymers. Only acrylate is indicated), and it can be easily obtained by reacting an acrylate monomer having a hydroxy group such as 2-hydroxypropyl acrylate.
  • a mixture of 100 parts Unidic 17-806 (manufactured by DIC Corporation) and 1 part of Coronate L (manufactured by Tosoh Corporation) described in JP-A-59-151110 is preferably used.
  • an ultraviolet curable urethane acrylate resin you may use a commercial item, and as a commercial item, Beamset (trademark) 575, 577 (made by Arakawa Chemical Co., Ltd.), purple light (trademark) UV series ( Nippon Synthetic Chemical Industry Co., Ltd.), Hitaroid (registered trademark) (manufactured by Hitachi Chemical Co., Ltd.), and the like.
  • the fluorosurfactant improves the leveling property, water repellency, and slipperiness of the coating solution for the thermal barrier film, and increases the effect of moving the dynamic surface tension in 100 sec.
  • the fluorosurfactant include Megafac (registered trademark) F series (F-430, F-477, F-552 to F-559, F-561, F-562, etc.) manufactured by DIC Corporation, DIC Corporation MegaFace (registered trademark) RS series (RS-76-E, etc.), AGC Seimi Chemical Corporation Surflon (registered trademark) series, OMNOVA
  • Commercially available products such as POLYFOX series manufactured by SOLUTIONS, ZX series manufactured by T & K TOKA Co., Ltd., OPTOOL (registered trademark) series manufactured by Daikin Industries, Ltd., and Footent (registered trademark) series manufactured by Neos (602A, 650A, etc.) Goods can be used.
  • the metal salt not only suppresses the deterioration of the infrared shielding properties of the infrared shielding film over time and improves the weather resistance, but also acts as a curing accelerator, and the coating film cures to the inside to form a uniform film. Is formed, and micro-aggregation of tungsten oxide particles is prevented.
  • the metal salt applied to the present invention is a metal organic salt or a metal inorganic salt made of a metal selected from alkali metals, alkaline earth metals, nickel, manganese, cerium, zinc, tin, and these are used as one kind. You may use it in combination of 2 or more types.
  • the content of the metal salt contained in the coating solution for a thermal barrier film is 5 to 60 with respect to 100 parts by mass of tungsten oxide (infrared absorbing particles) from the viewpoint of compatibility, dispersibility, and haze. It is preferably in the range of parts by mass, more preferably in the range of 10 to 40 parts by mass. In the case of 5 parts by mass or more, it is possible to sufficiently suppress the temporal deterioration of the infrared shielding property, and in the case of 60 parts by mass or less, the compatibility with the plastic resin or the solvent is excellent, the dispersibility is improved, and , Haze also decreases.
  • the solvent is not particularly limited, and a known organic solvent can be used.
  • alcohol solvents such as methanol (MA), ethanol (EA), 1-propanol (NPA), isopropanol (IPA), butanol, pentanol, benzyl alcohol, diacetone alcohol, acetone, methyl ethyl ketone (MEK) , Ketone solvents such as methyl propyl ketone, methyl isobutyl ketone (MIBK), cyclohexanone, isophorone, ester solvents such as 3-methyl-methoxy-propionate (MMP), ethylene glycol monomethyl ether (MCS), ethylene glycol monoethyl ether (ECS), ethylene glycol isopropyl ether (IPC), propylene glycol methyl ether (PGM), propylene glycol methyl ether (PGM), propylene glycol methyl ether (PGM), propylene glycol methyl ether (PGM), prop
  • organic solvents having a low polarity are preferable, and particularly highly hydrophobic ones such as ketones such as MIBK and MEK, aromatic hydrocarbons such as toluene and xylene, glycol ether acetates such as PGMEA and PE-AC, and the like. More preferred. These solvents can be used alone or in combination of two or more.
  • a photopolymerization initiator As the polymerization initiator, it is preferable to use a photopolymerization initiator.
  • the photopolymerization initiator include a cationic photopolymerization initiator, an anionic photopolymerization initiator, and a radical photopolymerization initiator. From the viewpoint of curability and productivity, a radical photopolymerization initiator is preferable. .
  • the radical photopolymerization initiator is not particularly limited. For example, acylphosphine oxides, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones and azo compounds can be used.
  • Acylphosphine oxides are not particularly limited, and examples thereof include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,4,6-trimethylbenzoylphenylethoxyphosphine oxide, and bis (2,6-dimethoxybenzoyl). ) -2,4,4-trimethylpentylphosphine oxide, bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide, and the like.
  • the acetophenones are not particularly limited.
  • benzoin and its alkyl ethers such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, and benzyl methyl ketal; acetophenone, 2,2-dimethoxy-2-phenylacetophenone 1-hydroxycyclohexyl phenyl ketone and the like.
  • the anthraquinones are not particularly limited, and examples include methylanthraquinone, 2-ethylanthraquinone, 2-amylanthraquinone and the like.
  • the thioxanthones are not particularly limited, and examples thereof include thioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone and the like.
  • the ketals are not particularly limited, and examples thereof include acetophenone dimethyl ketal and benzyl dimethyl ketal.
  • the benzophenones are not particularly limited, and examples thereof include benzophenone and 4,4-bismethylaminobenzophenone.
  • acylphosphine oxides that are excellent in curability of the coating film at the interface between the coating film (infrared shielding film) and the substrate are preferable.
  • photopolymerization sufficiently proceeds at the time of coating film formation, and uncured components that are thermally cured at the time of subsequent heat molding can be reduced.
  • the shrinkage amount of the coating film at the time of heat molding can be reduced.
  • the shrinkage stress generated at the time of thermoforming is reduced at the interface between the coating film and the substrate, it is considered that the adhesion is improved.
  • acylphosphine oxides bis (2,4,6-trimethylbenzoyl) phenylphosphine oxide and 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide are more preferable, and bis (2 , 4,6-Trimethylbenzoyl) phenylphosphine oxide is more preferred.
  • the infrared shielding film can be formed by apply
  • the coating method for the heat shielding fill coating solution is not particularly limited as long as the coating film can be uniformly formed on the surface of the substrate, and a bar coating method, a gravure coating method, a spray coating method, a dip coating method, or the like may be used. it can.
  • the infrared shielding body of the present invention is obtained by laminating the infrared shielding film on a resin base material and a transparent molded body transparent to visible light.
  • a transparent molded body PET, acrylic, urethane, polycarbonate, polyethylene, ethylene vinyl acetate copolymer, polyvinyl chloride, fluororesin, inorganic glass, resin glass, and the like can be used for various purposes.
  • the infrared shielding body of the present invention comprises an infrared shielding film formed by applying the coating liquid for a heat shielding film on a transparent substrate, and the transparent substrate.
  • Another infrared shielding body of the present invention was formed by applying the above-described coating solution for a thermal barrier film on a transparent base material with an infrared reflecting layer formed by laminating a low refractive index layer and a high refractive index layer.
  • An infrared shielding film and the transparent substrate are provided.
  • the infrared shielding film formed by applying the coating solution for a thermal barrier film of the present invention can be used as a functional layer by appropriately selecting components such as a plastic resin and an additive.
  • the functional layer is a hard coat layer, or a conductive layer, an antistatic layer, a gas barrier layer, an antifouling layer, a deodorizing layer, a droplet layer, a slippery layer, an abrasion resistant layer, a protective layer.
  • the infrared shielding film is preferably used as a hard coat layer or an adhesive layer and disposed on the outermost surface of the infrared shielding body.
  • the stacking order of each layer is not particularly limited, and the present invention is not limited to these.
  • (A) Infrared shielding film / base material / adhesive layer (B) Infrared shielding film (hard coat layer) / base material / adhesive layer (C) Hard coat layer / infrared shielding film / infrared reflective layer / adhesive layer (D) Hard Coat layer / Infrared reflective layer / Infrared shielding film / Adhesive layer (E) Infrared shielding film (hard coat layer) / Base material / Infrared reflective layer / Adhesive layer (F) Hard coat layer / Base material / Infrared reflective layer / Infrared shield Film (adhesive layer) (G) Infrared shielding film (hard coat layer) / base material / infrared reflective layer / infrared shielding film (adhesive layer)
  • the infrared shielding body By disposing an adhesive layer having adhesiveness on the outermost layer of the infrared shielding body, the infrared shielding body can be attached to the indoor (inside or inside) or outdoor side of a substrate such as a glass window of a vehicle or a building. Further, by disposing a hard coat layer on the outermost layer of the infrared shielding body, it is possible to impart scratch resistance to the surface of the infrared shielding body.
  • FIG. 1 is an example of an embodiment of an infrared shield according to the present invention.
  • the infrared shielding body 5 is bonded to the base 1 via the adhesive layer 2.
  • a specific infrared wavelength region is reflected by the infrared reflecting layer 3 with respect to infrared rays incident from the substrate 1 in the direction of the infrared shielding film 4, and the infrared shielding film 4 absorbs infrared wavelengths that could not be reflected by the infrared reflecting layer 3. can do.
  • the infrared wavelength that can be shielded becomes wide, and the infrared shielding body 5 having high infrared shielding performance is obtained.
  • an infrared shielding body In the specification of attaching an infrared shielding body to the indoor side of the window glass (internal bonding), it is preferable to laminate the infrared reflection layer and the infrared shielding film in this order from the sunlight incident side, and the infrared shielding body of the present invention is provided on the outdoor side of the window glass. In the specifications for pasting (outside pasting), it is preferable to laminate the hard coat layer, the infrared reflecting layer, the infrared shielding film and the adhesive layer in this order from the sunlight incident side.
  • the infrared shielding film and the infrared reflecting layer since the amount of infrared rays irradiated to the infrared shielding film is suppressed by arranging the infrared reflecting layer on the incident direction side with respect to the incident direction of infrared rays, the infrared shielding film Heat generation generated when the infrared absorbing particles contained in the resin absorb infrared rays is prevented, and high weather resistance is obtained.
  • the hard coat layer used in the present invention refers to a film having a pencil hardness of H to 8H. Particularly preferably, it is in the range of 2H to 6H.
  • the pencil hardness is evaluated by pencil hardness evaluation specified by JIS K 5400 using a test pencil specified by JIS S 6006 after the prepared hard coat layer is conditioned for 2 hours at a temperature of 25 ° C. and a relative humidity of 60%. The value measured according to the method.
  • plastic resin used for the hard coat layer examples include organic hard coat materials such as silicone, melamine, epoxy, acrylate, and polyfunctional (meth) acrylic compounds; inorganic hard coat materials such as silicon dioxide; etc. Is mentioned.
  • organic hard coat materials such as silicone, melamine, epoxy, acrylate, and polyfunctional (meth) acrylic compounds
  • inorganic hard coat materials such as silicon dioxide; etc. Is mentioned.
  • a hard coat forming material of a (meth) acrylate-based or polyfunctional (meth) acrylic-based compound examples of the plastic resin used for the hard coat layer.
  • (meth) acryl refers to acrylic and methacrylic.
  • the hard coat layer is preferably a layer mainly composed of a resin that is cured through a crosslinking reaction, and more preferably an actinic radiation curable resin.
  • an ultraviolet curable resin is preferably used as the actinic radiation curable resin.
  • the UV curable resin is not particularly limited.
  • the coating composition for the UV curable resin layer preferably has a solid content in the range of 10 to 95% by mass, and an appropriate concentration is selected depending on the coating method.
  • any light source that generates ultraviolet rays can be used.
  • the aforementioned light source can be used.
  • Irradiation conditions vary depending on each lamp, but the amount of irradiation light may be about 20 to 1200 mJ / cm 2 , and is preferably in the range of 50 to 1000 mJ / cm 2 . From the near ultraviolet region to the visible light region, it can be used by using a sensitizer having an absorption maximum in that region.
  • the dry film thickness of the hard coat layer is in the range of an average film thickness of 0.1 to 30 ⁇ m, preferably in the range of 1 to 20 ⁇ m, particularly preferably in the range of 3 to 15 ⁇ m. When it is 3 ⁇ m or more, sufficient durability and impact resistance can be obtained. Moreover, it is preferable that it is 15 micrometers or less from a flexible or economical viewpoint.
  • the hard coat layer can be formed, for example, by irradiating active rays during or after drying after applying a hard coat layer-forming coating solution obtained by dissolving an active ray curable resin in an organic solvent.
  • the coating method for the hard coat layer coating composition is not particularly limited, and for example, it can be coated by a known method such as a gravure coater, dip coater, reverse coater, wire bar coater, die coater, or ink jet method. It is preferable to apply a wet film thickness within a range of 0.1 to 100 ⁇ m on one surface of the plastic resin substrate using the above-described application method.
  • the hard coat layer may be a single layer or a multilayer structure of two or more layers.
  • inorganic or organic fine particles are added to the coating composition of the hard coat layer in order to give the hard coat layer an antiglare property, to prevent adhesion with other substances, and to improve scratch resistance and the like. You can also.
  • the average particle size of the fine particle powder is in the range of 0.01 to 10 ⁇ m, and the amount used is blended so as to be in the range of 0.1 to 20 parts by mass with respect to 100 parts by mass of the ultraviolet curable resin composition. It is desirable to do. In order to impart an antiglare effect, it is preferable to use 1 to 15 parts by mass of fine particles having an average particle size in the range of 0.1 to 1 ⁇ m with respect to 100 parts by mass of the ultraviolet curable resin composition.
  • an antioxidant that does not inhibit the photocuring reaction can be selected and used.
  • examples include hindered phenol derivatives, thiopropionic acid derivatives, phosphite derivatives, and the like.
  • 4,4′-thiobis (6-tert-3-methylphenol), 4,4′-butylidenebis (6-tert-butyl-3-methylphenol), 1,3,5-tris (3,5-di-tert-butyl-4-hydroxybenzyl) isocyanurate, 2,4,6-tris (3,5-di-tert-butyl-4-hydroxybenzyl) mesitylene, di-octadecyl-4-
  • examples include hydroxy-3,5-di-tert-butylbenzyl phosphate.
  • the hard coat layer coating solution may contain a solvent, or may be appropriately contained and diluted as necessary.
  • the organic solvent contained in the coating solution include hydrocarbons (toluene, xylene), alcohols (methanol, ethanol, isopropanol, butanol, cyclohexanol), ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone), It can be appropriately selected from esters (methyl acetate, ethyl acetate, methyl lactate), glycol ethers, and other organic solvents, or a mixture thereof can be used.
  • Propylene glycol monoalkyl ether (1 to 4 carbon atoms in the alkyl group) or propylene glycol monoalkyl ether acetate ester (1 to 4 carbon atoms in the alkyl group) is 5% by mass or more, more preferably 5 to 80%. It is preferable to use the organic solvent contained in a mass% range.
  • the hard coat layer forms a hard coat layer having a good smooth surface with a center line average surface roughness Ra 75 defined by JIS B 0601 2001 of less than 0.05 ⁇ m, more preferably less than 0.002 to 0.04 ⁇ m. can do.
  • the center line average surface roughness (Ra 75 ) is preferably measured with an optical interference type surface roughness measuring instrument, for example, using a non-contact surface fine shape measuring device (WYKO NT-2000) manufactured by WYKO. Can be measured.
  • ultrafine particles having a volume average particle size of 0.005 to 0.1 ⁇ m in the same components as described above are added in an amount of 0.1 to 100 parts by mass with respect to 100 parts by mass of the resin composition. 5 parts by mass can also be used.
  • a binder such as a known thermoplastic resin, thermosetting resin or hydrophilic resin such as gelatin can be mixed with the above active energy ray curable resin.
  • These resins preferably have polar groups in the molecule.
  • the polar group includes —COOM, —OH, —NR 2 , —NR 3 X, —SO 3 M, —OSO 3 M, —PO 3 M 2 , —OPO 3 M (where M is a hydrogen atom, an alkali A metal or an ammonium group, X represents an acid that forms an amine salt, R represents a hydrogen atom or an alkyl group).
  • an antioxidant that does not inhibit the photocuring reaction can be selected and used.
  • examples include hindered phenol derivatives, thiopropionic acid derivatives, phosphite derivatives, and the like.
  • 4,4′-thiobis (6-t-3-methylphenol), 4,4′-butylidenebis (6-t-butyl-3-methylphenol), 1,3,5-tris (3,5-di-t-butyl-4-hydroxybenzyl) isocyanurate, 2,4,6-tris (3,5-di-t-butyl-4-hydroxybenzyl) mesitylene, di-octadecyl-4- Hydroxy-3,5-di-t-butylbenzyl phosphate and the like can be mentioned.
  • various additives can be further blended as necessary within the range where the effects of the present invention are not impaired.
  • an antioxidant an ultraviolet stabilizer, an ultraviolet absorber, a surfactant, a leveling agent, an antistatic agent and the like can be used.
  • the infrared shielding body of the present invention can be provided with an adhesive layer for the purpose of imparting adhesiveness for attaching the infrared shielding body to a substrate such as a window glass.
  • polymer materials such as elastomer and synthetic resin can be mentioned, and the material is appropriately selected depending on the material to be adhered and the use conditions of the member after adhesion.
  • resins, melamine resins, phenol resins, resorcinol resins, epoxy resins, polyimide resins, natural rubber, chloroprene rubber and the like examples include resins, melamine resins, phenol resins, resorcinol resins, epoxy resins, polyimide resins, natural rubber, chloroprene rubber and the like.
  • an acrylic resin (acrylic adhesive) or a silicone resin (silicone adhesive) is preferable.
  • an acrylic adhesive is preferable from the viewpoint of adhesive properties and cost.
  • solvent-based and emulsion-based acrylic adhesives are preferable, and solvent-based acrylic adhesives are more preferable because the peel strength can be easily controlled.
  • solvent-based acrylic adhesive known monomers can be used as the monomer.
  • This adhesive layer contains additives such as stabilizers, surfactants, UV absorbers, flame retardants, antistatic agents, antioxidants, thermal stabilizers, lubricants, fillers, coloring, adhesion modifiers, etc. It can also be made.
  • additives such as stabilizers, surfactants, UV absorbers, flame retardants, antistatic agents, antioxidants, thermal stabilizers, lubricants, fillers, coloring, adhesion modifiers, etc.
  • an ultraviolet absorber is effective in order to suppress deterioration of the infrared shielding body due to ultraviolet rays.
  • the thickness of the adhesive layer is preferably in the range of 1 to 100 ⁇ m, more preferably in the range of 3 to 50 ⁇ m. If it is 1 micrometer or more, it exists in the tendency for adhesiveness to improve, and sufficient adhesive force is obtained when an infrared shielding body is bonded to a base
  • any known method can be used.
  • a die coater method, a gravure roll coater method, a blade coater method, a spray coater method, an air knife coat method, a dip coat method, a transfer method, etc. are preferable.
  • These can be appropriately formed into a solution with a solvent capable of dissolving the adhesive, or can be applied using a dispersed coating solution, and known solvents can be used.
  • the adhesive layer may be formed directly on the infrared shielding body by the above-mentioned coating method, or once coated on the release film and dried, the infrared shielding body is bonded to the adhesive. May be transferred.
  • the drying temperature at this time is preferably such that the residual solvent is as small as possible.
  • the drying temperature and time are not specified, but preferably within the range of 50 to 150 ° C. and within the range of 10 seconds to 5 minutes. It is preferable to provide a drying time.
  • the infrared reflective layer in the present invention has a laminated structure in which at least three low refractive index layers or high refractive index layers are laminated.
  • a preferred form of the infrared reflecting layer has a form of an alternating laminate in which low refractive index layers and high refractive index layers are alternately laminated.
  • a refractive index layer having a higher refractive index than the other is referred to as a high refractive index layer
  • a refractive index layer having a lower refractive index than the other is referred to as a low refractive index layer.
  • the transmittance in the visible light region shown in JIS R3106-1998 is 50% or more, preferably 75% or more, more preferably 85% or more. It is preferable to have a region with a reflectance exceeding 50% in the region of 900 to 1400 nm.
  • the material for forming the infrared reflective layer conventionally known materials can be used, and examples thereof include metal oxide particles, polymers, and combinations thereof. It is preferable that at least one of the low refractive index layer and the high refractive index layer includes metal oxide particles, and it is more preferable that both include metal oxide particles.
  • metal oxide particles examples include titanium dioxide (TiO 2 ), zirconium dioxide (ZrO 2 ), tantalum pentoxide (Ta 2 O 5 ) and the like as examples of the high refractive index material.
  • examples thereof include silicon dioxide (SiO 2 ) and magnesium fluoride (MgF 2 ). These metal oxide particles can be dispersed in a polymer solution to form a coating.
  • the polymer contained in the infrared reflective layer is not particularly limited as long as it is a polymer that can form an infrared reflective layer.
  • the polymer described in JP-T-2002-509279 can be used as the polymer.
  • Specific examples include, for example, polyethylene naphthalate (PEN) and its isomers (eg, 2,6-, 1,4-, 1,5-, 2,7- and 2,3-PEN), polyalkylene terephthalate.
  • Copolymers such as copolymers of PEN [e.g. (a) terephthalic acid or ester thereof, (b) isophthalic acid or ester thereof, (c) phthalic acid or ester thereof, (d) alkane glycol, (e) cycloalkane glycol ( For example, cyclohexanedimethanoldiol), (f) alkanedicarboxylic acid, and / or (g) cycloalkanedicarboxylic acid (eg, cyclohexanedicarboxylic acid) and 2,6-, 1,4-, 1,5-, 2, 7- and / or copolymers with 2,3-naphthalenedicarboxylic acid or esters thereof], copolymers of polyalkylene terephthalates [eg (a) naphthalenedicarboxylic acid or esters thereof, (b) isophthalic acid or esters thereof ( c) Phthalic acid or its es (D) alkan
  • each layer may each include a blend of two or more of the above polymers or copolymers (eg, a blend of syndiotactic polystyrene (SPS) and atactic polystyrene). These polymers may be used alone or in combination of two or more.
  • SPS syndiotactic polystyrene
  • an infrared reflecting layer can be formed from the polymer by melt extrusion and stretching of the polymer.
  • a water-soluble polymer as the polymer.
  • the high-refractive index layer or low-refractive index layer of the infrared shielding body of the present invention includes an ultraviolet absorber, an anti-fading agent, a curing agent, various anionic, cationic or nonionic surfactants, fluorescent whitening agents, sulfuric acid, Various known additives such as phosphoric acid, acetic acid, citric acid, sodium hydroxide, potassium hydroxide, potassium carbonate and other pH adjusters, antifoaming agents, diethylene glycol and other lubricants, preservatives, antistatic agents, matting agents, etc. May be contained.
  • the method for producing the infrared reflective layer is not particularly limited, and a coextrusion method, a melt extrusion method, or the like can be used.
  • a melt extrusion method as in the method described in US Pat. No. 6,049,419, in addition to a method of forming an infrared reflective layer by melt extrusion and stretching of a polymer, an aqueous high refractive index layer is used. Examples include a method in which a coating solution and a coating solution for a low refractive index layer are alternately wet-coated and dried to form a laminate.
  • the following coating methods are preferably used.
  • rod bar coating method rod bar coating method, air knife coating method, spray coating method, curtain coating method, US Pat. Nos. 2,761,419 and 2,761,791
  • a slide hopper coating method, an extrusion coating method or the like is preferably used.
  • sequential multilayer coating or simultaneous multilayer coating may be used as a method of applying a plurality of layers in a multilayer manner.
  • the thicknesses of the coating solution for the high refractive index layer and the coating solution for the low refractive index layer in the infrared shielding body can be controlled by adjusting the coating amount so as to be the above-described preferable thickness at the time of drying.
  • the infrared shielding body of the present invention may use a substrate for the purpose of adding mechanical strength or protecting the constituent layers.
  • Various resin films can be used as the substrate. Specific examples include polyolefin films (polyethylene, polypropylene, etc.), polyester films (polyethylene terephthalate, polyethylene naphthalate, etc.), polyvinyl chloride, cellulose triacetate, etc., preferably polyester films. These may be used alone or in combination of two or more.
  • an antistatic agent an ultraviolet absorber, an antiseptic, a light stabilizer, a surfactant, a flame retardant, an antioxidant, a heat stabilizer, a lubricant, a filler, a modifier, or an arbitrary color tone is given as necessary.
  • Dyes or pigments may be added.
  • the thickness of the substrate used in the present invention is preferably in the range of 3 to 300 ⁇ m, particularly in the range of 20 to 150 ⁇ m.
  • the base material which concerns on this invention may be what piled up two sheets, and the kind may be the same or different in this case.
  • the infrared shielding body of the present invention may have a plurality of base materials.
  • the infrared shielding body (also referred to as a heat shielding film) of the present invention can take various constitutional forms as described above, but the infrared shielding performance is preferably at least 48%, more preferably 50%. That's it. Further, the ⁇ haze value after the 1000-hour weather test is 4 or less, more preferably 1.0 or less, and more preferably 0.5 or less.
  • the infrared shielding body of the present invention can be applied to a wide range of fields.
  • the infrared shielding body of the present invention is suitably used as a film for pasting an infrared shielding film such as an outdoor window of a building or a window of a vehicle, a film for an agricultural greenhouse, or the like.
  • the infrared shielding body according to the present invention is suitable as an infrared shielding body used by being bonded to a substrate such as glass or a glass substitute resin directly or via an adhesive layer.
  • an optical shield in which the infrared shield according to the present invention is provided on at least one surface of a base.
  • Specific examples thereof include architectural windows and vehicle windows as described above.
  • the following coating liquid for hard coat layer (coating liquid for thermal barrier film) was prepared.
  • YMF-02A (18 mass% Cs 0.33 WO 3 dispersion, dispersant 10 mass%, average particle size 50 nm, Sumitomo Metal Mining Co., Ltd.) 300 parts by mass MIBK (methyl isobutyl ketone) 165 parts by mass Hitaroid (registered trademark) 7902-1 (hexafunctional urethane acrylate, manufactured by Hitachi Chemical Co., Ltd.) 100 parts by mass MegaFac (registered trademark) F-552 (fluorine-based surfactant) 1 part by mass Irgacure (registered trademark) 184 (photopolymerization initiator, manufactured by BASF Japan Ltd.) 6 parts by mass
  • ⁇ Preparation of hard coat layer coating solutions HC2 to HC20> The acrylate monomer, tungsten oxide (infrared absorbing particles), fluorosurfactant, polymerization initiator, metal salt and solvent are changed as shown in Table 1 below, and each component is mixed to obtain a hard coat layer coating solution.
  • HC2 to HC20 were prepared.
  • the hard coat layer coating solution HC14 was prepared by mixing the components in the order of tungsten oxide, fluorine-based surfactant, solvent, acrylate, metal salt, and polymerization initiator.
  • the other hard coat layer coating solutions HC2 to HC13 and HC15 to HC20 were prepared by mixing the components in the order of tungsten oxide, solvent, acrylate, metal salt, fluorosurfactant, and polymerization initiator. .
  • Table 1 The terms used in Table 1 are as follows.
  • Hitaloid Hitaloid (registered trademark) 7902-1 (hexafunctional urethane acrylate, manufactured by Hitachi Chemical Co., Ltd.)
  • M402 Aronix (registered trademark) M-402 (5, 6 functional acrylate, 5 functional component 35 mass%, manufactured by Toagosei Co., Ltd.)
  • M305 Aronix (registered trademark) M-305 (3,4 functional acrylate, manufactured by Toagosei Co., Ltd.)
  • UV7640B UV7640B (6,7 functional acrylate, manufactured by Nippon Synthetic Chemical Industry Co., Ltd.)
  • HDDA HDDA (bifunctional acrylate, manufactured by Daicel Ornex Co., Ltd.)
  • UV3701 Aronix (registered trademark) UV3701 (hexafunctional acrylate, manufactured by Toagosei Co., Ltd.)
  • Irg184 Irgacure (registered
  • the coating solution for low refractive index layer was prepared by finishing 1000 parts by mass with pure water.
  • ⁇ Preparation of coating solution for high refractive index layer> (Preparation of silica-attached titanium dioxide sol) After adding 2 parts by mass of pure water to 0.5 parts by mass of titanium dioxide sol (15.0% by mass, SRD-W, volume average particle size: 5 nm, rutile titanium dioxide particles, manufactured by Sakai Chemical Industry Co., Ltd.), 90 ° C. Heated to. Next, 0.5 part by mass of a silicic acid aqueous solution (sodium silicate No. 4, manufactured by Nippon Chemical Co., Ltd. diluted with pure water so that the SiO 2 concentration becomes 0.5% by mass) was gradually added. In the autoclave, heat treatment was performed at 175 ° C.
  • titanium dioxide sol (“silica adhesion”) having a solid content concentration of 20% by mass and having SiO 2 adhered to the surface. Also referred to as “titanium dioxide sol” (volume average particle size: 9 nm).
  • silica-attached titanium dioxide sol solid content 20% by mass obtained as described above, and further ethylene modified polyvinyl alcohol (8% by mass).
  • the heat shield film (infrared shield) shown below was produced.
  • a base material a polyethylene terephthalate film having a thickness of 50 ⁇ m, Cosmo Shine A4300, manufactured by Toyobo Co., Ltd.
  • the hard coat layer coating solution HC1 was applied with a gravure coater and dried at 90 ° C. for 1 minute.
  • the coating film is cured by irradiating ultraviolet rays from the surface far from the base material of the coating film under the conditions of an illuminance of 100 mW / cm 2 , an irradiation amount of 0.2 J / cm 2 , and an oxygen concentration of 200 ppm.
  • a hard coat layer infrared shielding film
  • the thickness of the hard coat layer was appropriately adjusted so that the visible light transmittance was 70%.
  • Heat shield films 2 to 14 were produced in the same manner as the heat shield film 1, except that the hard coat layer coating solution HC1 was changed to the hard coat layer coating solutions HC2 to HC14, respectively.
  • thermo barrier film 15 A substrate (50 ⁇ m thick polyethylene terephthalate film, Cosmo Shine A4300) heated to 45 ° C. while keeping the coating solution for the low refractive index layer and the coating solution for the high refractive index layer at 45 ° C. using a slide hopper coating apparatus. , Manufactured by Toyobo Co., Ltd.), 21 layers were applied simultaneously (total film thickness: 2.85 ⁇ m). At this time, the lowermost layer and the uppermost layer were low refractive index layers, and other than that, the low refractive index layers and the high refractive index layers were alternately laminated.
  • the coating amount was adjusted so that the film thickness during drying was 150 nm for each low refractive index layer and 120 nm for each high refractive index layer.
  • 5 ° C. cold air was blown for 5 minutes, and then 80 ° C. hot air was blown to dry to produce an infrared reflective layer consisting of 21 layers.
  • the hard coat layer coating solution HC14 was applied on the side of the substrate opposite to the side on which the infrared reflective layer was formed, using a gravure coater, and dried at 90 ° C. for 1 minute.
  • the coating film is cured by irradiating ultraviolet rays from the surface far from the base material of the coating film under the conditions of an illuminance of 100 mW / cm 2 , an irradiation amount of 0.2 J / cm 2 , and an oxygen concentration of 200 ppm.
  • a hard coat layer was formed, and a heat shield film 15 was produced.
  • the thickness of the hard coat layer was appropriately adjusted so that the visible light transmittance was 70%.
  • Heat shield films 16 to 21 were produced in the same manner as the heat shield film 1 except that the hard coat layer coating solution HC1 was changed to the hard coat layer coating solutions HC15 to HC20, respectively.
  • TSER (%) ((100 ⁇ T (DS) ⁇ ⁇ R (DS)) ⁇ 0.7143) + R (DS) (Adhesive) N-2147 (acrylic adhesive, manufactured by Nippon Synthetic Chemical Industry) 100 parts by mass Tinuvin (registered trademark) 477 (ultraviolet absorber, manufactured by BASF Japan Ltd.) 2.1 parts by mass Coronate (registered trademark) HL (curing agent, manufactured by Tosoh Corporation) 5 parts by mass
  • the produced heat-shielding film was heat-treated at 230 ° C. for 5 minutes, and judged according to the following appearance rank.
  • the film peeling refers to a linear one having a length of 1 mm or more. 5: No peeling 4: Peeling off at less than 1/10 of the sample area 3: Peeling off at 1/10 to less than 1/4 of the sample area 2: Peeling off at least 1/4 and less than 1/2 of the sample area Yes 1: The entire surface of the sample is peeled off
  • CWO represents Cs 0.33 WO 3 .
  • the thermal barrier film using the hard coat layer coating solution of the present invention has a thermal barrier performance compared to the thermal barrier film using the hard coat layer coating solution of the comparative example. It is recognized that the coating film is peeled off, coating unevenness and spot failure are good.
  • the coating unevenness and the coating defect are improved, and the coating film for the thermal barrier film capable of preventing the peeling of the coating film due to thermoforming, the method for producing the thermal barrier film coating liquid, and the thermal barrier It is suitable for providing an infrared shielding body formed by applying a coating solution for film.

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Abstract

La présente invention aborde le problème consistant à fournir : un liquide de revêtement pour un film de blocage thermique, qui est amélioré en termes d'irrégularité de revêtement et de défauts de revêtement et qui peut empêcher un détachement de film de revêtement provoqué par un thermoformage ; un procédé de production du liquide de revêtement pour un film de blocage thermique ; et un corps de blocage de rayonnement infrarouge formé par revêtement du liquide de revêtement pour un film de blocage thermique. À cet effet, l'invention concerne un liquide de revêtement pour un film de blocage thermique qui bloque le rayonnement infrarouge, et qui est caractérisé par le fait qu'il contient un oxyde de tungstène, un acrylate et/ou un acrylate d'uréthane polymérisables, et un tensioactif à base de fluor, et qui est caractérisé en ce que la viscosité du liquide de revêtement à 25°C est dans la plage de 2,5 à 10,0 mPa·s, telle que mesurée à l'aide d'un viscosimètre de type à vibration, et la tension de surface dynamique à 25°C est dans la plage de 25,0 à 30,0 mN/m lorsqu'une bulle est générée à 100 msec à l'aide d'un procédé de pression différentielle de pression de bulle.
PCT/JP2016/062204 2015-04-23 2016-04-18 Liquide de revêtement pour film de blocage thermique, procédé de production de liquide de revêtement pour film de blocage thermique, et corps de blocage de rayonnement infrarouge Ceased WO2016171093A1 (fr)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106978051A (zh) * 2017-04-13 2017-07-25 江苏大使同丰涂料有限公司 一种玻璃用防热辐射涂料及其制备方法
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WO2022220188A1 (fr) * 2021-04-16 2022-10-20 日本製鉄株式会社 Matériau de revêtement à base de solvant organique et procédé de production de feuille métallique pré-revêtue
EP4130066A1 (fr) * 2021-08-06 2023-02-08 Nitto Denko Corporation Composition adhésive sensible à la pression dispersée dans l'eau
US12410344B2 (en) 2021-08-06 2025-09-09 Nitto Denko Corporation Water-dispersed pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet

Families Citing this family (3)

* Cited by examiner, † Cited by third party
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Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004160385A (ja) * 2002-11-14 2004-06-10 Toray Ind Inc 塗布方法およびカラーフィルター製造方法
JP2008200983A (ja) * 2007-02-20 2008-09-04 Lintec Corp 近赤外線遮蔽フィルム
JP2009227938A (ja) * 2008-03-25 2009-10-08 Dainippon Printing Co Ltd 近赤外線吸収材
JP2011197424A (ja) * 2010-03-19 2011-10-06 Dainippon Printing Co Ltd 光学シート、及び映像表示装置
JP2012118295A (ja) * 2010-11-30 2012-06-21 Fujifilm Corp 重合性組成物、並びに、これを用いた感光層、永久パターン、ウエハレベルレンズ、固体撮像素子、及び、パターン形成方法
WO2013077207A1 (fr) * 2011-11-25 2013-05-30 富士フイルム株式会社 Film et son procédé de fabrication
JP2013151675A (ja) * 2011-12-27 2013-08-08 Fujifilm Corp 赤外線吸収性組成物、これを用いた赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法
WO2014129366A1 (fr) * 2013-02-19 2014-08-28 富士フイルム株式会社 Composition d'absorption proche infrarouge, filtre de blocage proche infrarouge, procédé de production de filtre de blocage proche infrarouge, module de camera et procédé de fabrication de module de camera
JP2014194446A (ja) * 2013-03-28 2014-10-09 Fujifilm Corp 熱線遮蔽材、合わせガラス用中間膜および合わせガラス
WO2016088851A1 (fr) * 2014-12-05 2016-06-09 コニカミノルタ株式会社 Film pour barrière thermique, son procédé de fabrication et barrière thermique utilisant ledit film
WO2016088852A1 (fr) * 2014-12-05 2016-06-09 コニカミノルタ株式会社 Film de protection thermique et son procédé de production, et écran thermique utilisant le film

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004160385A (ja) * 2002-11-14 2004-06-10 Toray Ind Inc 塗布方法およびカラーフィルター製造方法
JP2008200983A (ja) * 2007-02-20 2008-09-04 Lintec Corp 近赤外線遮蔽フィルム
JP2009227938A (ja) * 2008-03-25 2009-10-08 Dainippon Printing Co Ltd 近赤外線吸収材
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WO2022220188A1 (fr) * 2021-04-16 2022-10-20 日本製鉄株式会社 Matériau de revêtement à base de solvant organique et procédé de production de feuille métallique pré-revêtue
EP4130066A1 (fr) * 2021-08-06 2023-02-08 Nitto Denko Corporation Composition adhésive sensible à la pression dispersée dans l'eau
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