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WO2015018155A1 - Procédé de fabrication d'appareil d'affichage - Google Patents

Procédé de fabrication d'appareil d'affichage Download PDF

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Publication number
WO2015018155A1
WO2015018155A1 PCT/CN2013/089143 CN2013089143W WO2015018155A1 WO 2015018155 A1 WO2015018155 A1 WO 2015018155A1 CN 2013089143 W CN2013089143 W CN 2013089143W WO 2015018155 A1 WO2015018155 A1 WO 2015018155A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
radiation
polyimide film
film
sealant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2013/089143
Other languages
English (en)
Chinese (zh)
Inventor
李建
张伟
李鸿鹏
宋省勋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing BOE Optoelectronics Technology Co Ltd
Original Assignee
Beijing BOE Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing BOE Optoelectronics Technology Co Ltd filed Critical Beijing BOE Optoelectronics Technology Co Ltd
Publication of WO2015018155A1 publication Critical patent/WO2015018155A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/02—Materials and properties organic material
    • G02F2202/022—Materials and properties organic material polymeric
    • G02F2202/023—Materials and properties organic material polymeric curable

Definitions

  • Embodiments of the present invention relate to the field of display technology, and in particular, to a method of fabricating a display device, particularly a narrow bezel display device. Background technique
  • LCDs Liquid crystal displays
  • the narrow bezel design of the display device is a trend in the field of display.
  • the narrow bezel design method of LCD (TFT-LCD) display products is mostly realized by overlapping polyimide film (PI film) and sealing frame glue.
  • PI film polyimide film
  • sealing frame glue due to the poor adhesion between the PI film and the sealant, it is easy to cause defects in reliability, such as weak adhesion, residual image problems due to contamination due to poor compatibility, resulting in The uncontrollable factors of PI film and frame sealant make it difficult to achieve the ideal product design requirements for narrow frames.
  • the narrow bezel design that does not overlap the PI film and the frame sealant, although it avoids the above problems, the method does not maximize the narrow bezel.
  • the overlap of the PI film and the sealant is an optimal solution, so improving the adhesion of the PI film to the sealant is an urgent problem to be solved.
  • a commonly used method for realizing a narrow bezel is to directly apply a sealant on the PI film and form a seal after curing.
  • the sealing strength obtained by this method is poor, and problems such as penetration of liquid crystal, precipitation of contaminants, and poor reliability are liable to occur.
  • Embodiments of the present invention are directed to a method of preparing a display device capable of achieving strong bonding between a sealant and a PI film by means of radiation modification without changing the design of the display device. Sex.
  • the method according to the embodiment of the present invention can effectively form a display device having a narrow frame of 6 to 11 mm by overlapping the PI film and the sealant, and can prevent problems such as puncture of liquid crystal, precipitation of contaminants, and poor reliability.
  • Embodiments of the present invention provide a method of preparing a display device, the method comprising: radiation treatment
  • the polyimide film located at the sealing position of the substrate causes the polyimide film located at the sealing position of the substrate to generate radicals; and the sealant is coated at the sealing position and cured.
  • the polyimide film may have a first reactive group selected from the group consisting of -COO-, -OH, and -NH 2 , and preferably may have -COO- on the branch.
  • Sealant may be selected from -COOH, -OH and -NH 2 in a second reactive group.
  • the radiation treatment can be performed using a radiation source that emits linear ultraviolet light.
  • the radiation source can be irradiated to the sealing position of the substrate by the radiant hood.
  • the light-transmitting portion of the radiant hood can be aligned with the sealing position of the substrate.
  • the linear ultraviolet light may have a wavelength of 254 nm and/or 313 nm.
  • the linear ultraviolet light may have a intensity of 1.0 to 4.0 J/cm 2 .
  • the first reactive group may undergo a cleavage reaction after being subjected to a radiation treatment to generate a radical.
  • the free radicals can form a chemical bond with the second reactive group of the sealer.
  • the substrate may be an array substrate or a color filter substrate.
  • the method may further comprise: orienting the polyimide film prior to performing the radiation treatment step.
  • the surface layer of the PI film in the sealant coating region is subjected to radiation modification, and the radical generated by the cracking and the active group of the sealant are encapsulated.
  • the group can achieve good wettability and adsorption before curing, and chemical bonding of PI film-encapsulated gel during curing.
  • the internal bonding force of the molecule is much larger than the intermolecular force, thus realizing the polyamid.
  • the bond strength between the amine film and the sealant is enhanced.
  • FIG. 1 is a schematic view showing an overlap of a polyimide film and a sealant of a display device according to an embodiment of the present invention
  • FIG. 2 is a schematic structural view of a radiant hood used in a method according to an embodiment of the present invention
  • FIG. 3 is a schematic view showing radiation modification of a polyimide film according to an embodiment of the present invention.
  • Embodiments of the present invention provide a method of preparing a display device, the method comprising: irradiating a polyimide film located at a sealing position of a substrate to freely form a polyimide film located at a sealing position of the substrate Then, the sealant is coated at the sealing position and cured, and the radical of the polyimide film reacts with the active group of the sealant to make the polyimide film and the sealant A strong bond is produced between them.
  • FIG. 1 shows a narrow bezel display panel prepared by overlapping a PI film and a sealant in accordance with an embodiment of the present invention, wherein there is no distance constraint between the PI film and the sealant, which can effectively reduce the frame area.
  • the substrate may be a substrate on which an array pattern or a color film pattern is formed on, for example, a glass substrate or a plastic substrate having good transparency and stability, that is, an array substrate or a color filter substrate.
  • the oriented substrate « is placed on the stage.
  • the stage can be placed in the radiation chamber.
  • the radiation chamber can be evacuated or filled with an inert gas.
  • a radiant hood for defining a radiant area may be disposed above the stage.
  • the radiant hood can be a shading material having a specific light transmissive area commonly used in the art.
  • the light shielding portion 1 of the radiant hood may be a metal plate, or an opaque plastic plate, or any other covering that blocks the radiation of the radiation source.
  • the light transmitting portion 2 of the radiant hood may be a material that transmits radiation emitted from a radiation source, such as glass, transparent plastic, or the like.
  • the stage can be rotated such that the substrate to be irradiated is at a position corresponding to the radiant hood, that is, the light-transmitting portion 2 corresponds to the sealing position of the substrate, and the light-shielding portion 1 corresponds to the pattern area of the substrate.
  • the substrate to be irradiated can then be fixed.
  • the distance between the radiant hood and the substrate to be irradiated can be adjusted and aligned so that the sealing position of the substrate is aligned with the light transmitting position of the radiant hood.
  • the alignment process can generally include coarse alignment prior to dropping the radiant hood to a certain position, followed by fine alignment. Then, the degree of alignment can be detected using an electron microscope and fine-tuned.
  • Figure 3 is a schematic view showing radiation modification of a polyimide film, wherein the radiation in the hood
  • the effective area (i.e., the area of each light transmitting portion) Wl, W2, W3 may have the following relationship with the area to be irradiated W, l, W, 2, W, 3 of the PI film: W1 > W, 1 , W2 > W2 , W3 > W, 3.
  • the side reflectors may be located at both ends of the radiation source to reflect radiation emitted laterally from the radiation source, thereby ensuring radiation modification of the end side of the substrate.
  • the distance between the radiant hood and the substrate to be irradiated may be preset as needed, and may be specifically set according to the composition of the PI film and the area of the radiant area of the PI film. If the radiation area of the PI film is large, the distance between the radiant hood and the substrate can be set to be small; if the radiation area of the PI film is small, the distance between the radiant hood and the substrate can be set. It is larger.
  • the radiation source can control the radiation area of the PI film by the angular range of its movement.
  • Radiation sources can emit electromagnetic waves of various wavelengths, such as visible light, ultraviolet light, X-rays, gamma rays, and lasers of different wavelengths, alpha rays, beta rays, and neutron rays.
  • the number of radiation sources can be one or more and can be adjusted according to actual needs.
  • the source of radiation may be a device that produces linear ultraviolet light.
  • the trajectory of the radiation source may be a horizontal motion range at both ends of the substrate, and the horizontal motion speed may be 20 to 50 mm/s.
  • the radiation source can also be centered on the vertical direction -30. ⁇ 30.
  • the sport can have an angular velocity of 0-30. /s.
  • the intensity of the linear ultraviolet light can be set according to the composition of the PI film, and may be, for example, 1.0 to 4.0 J/cm 2 (for a wavelength of 254 nm) or 1.0 to 4.0 J/cm 2 (for a wavelength of 313 nm).
  • the polyimide film may have a first reactive group selected from the group consisting of -COO-, -OH, and -NH 2 , and preferably has -COO- on the branch.
  • the above-mentioned first reactive group may undergo a cleavage reaction by radiation treatment of the above-mentioned radiation source to generate a radical.
  • Sealant may be selected from -COOH, -OH and -NH 2 in a second reactive group.
  • the radiation source is returned to the position, the radiant hood is raised back to the initial position, and the irradiated substrate is taken out of the radiation chamber.
  • the sealant is then applied to the sealed position of the irradiated substrate and cured, for example, by UV curing or heat curing.
  • the second reactive group and the radical generated by the first reactive group can have good wettability and can form intramolecular chemical bonding. Thus, good bonding properties can be obtained.
  • the following cleavage reaction can occur at the time of radiation treatment:
  • the surface group of the PI film is cleaved by a radiation reaction to form a radical, which can be combined with the active group of the sealant, thereby increasing the gap between the sealant and the PI film.
  • the bonding strength avoids the occurrence of liquid crystal puncture, liquid crystal contamination, and poor reliability.
  • the PI liquid (polyamide AL-00010) is used as an example for radiation modification.
  • the above PI liquid may be coated on an array substrate to form a PI film by a conventional method in the art, and subjected to rubbing alignment treatment.
  • the oriented array substrate is placed on a stage in the radiation chamber. The stage is rotated, and the position of the radiant hood is adjusted so that the portion to be irradiated (sealed position) of the array substrate is aligned with the light transmitting portion of the radiant hood.
  • the radiation source can be an ultraviolet lamp, and the linear ultraviolet light emitted has a wavelength of 254 nm and the radiation intensity is
  • the active group in the structure ie, the ester group on the branch indicated by the arrow
  • the active group in the structure is mainly cleaved in the cleavage mode 1 to form the radical derivative 1, and a small amount is conventionally
  • the cleavage mode 2 is cleaved to form a free radical derivative 2.
  • An acrylate frame sealant (for example, WB73) is coated on the sealing position of the above-mentioned radiation-treated array substrate, and subjected to a conventional process of box-up, ultraviolet curing, and the like to obtain a liquid crystal display device. During the curing process, a sub-bonding process can occur between the radiation-modified PI film and the sealant:
  • the PI film on the color filter substrate can be irradiated, and the good sealing between the PI film and the sealant on the color film substrate can be achieved.
  • conventional processes such as boxing and curing, it is possible to produce a display device with better reliability and stability.
  • a glass substrate having a thickness of 0.4T (0.4mm) was used, the PI liquid was polyimide AL-00010, the sealant was WB-73, and the rubber width was 0.7 mm.
  • the radiation treated PI film and the seal were formed by the method of the above examples.
  • the sealing structure of the sealant is compared with the sealed structure of the non-radiation-treated PI film and the sealant.
  • the 4.5 inch peel off data of the obtained sealing structure was tested. If the average peeling force of the left bonding pad (pad) and the right bonding pad (pad) were both greater than 1.25 kgf, the bonding strength was considered to be Qualified (OK), otherwise the bond strength is considered to be unacceptable (NG).
  • the radiation-treated sealing method can obtain a significantly enhanced bonding strength.
  • the above is only the exemplary embodiments of the present invention, and is not intended to limit the scope of the present invention.
  • the scope of the present invention is defined by the claims and their equivalents.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)

Abstract

L'invention concerne un procédé de fabrication d'un appareil d'affichage comprenant: la réalisation d'un traitement de rayonnement sur une pellicule polyimide au niveau d'une position étanche d'un substrat de manière à amener la pellicule polyimide au niveau de la position étanche du substrat à générer un radical libre, l'application d'une colle d'étanchéité de structure au niveau de la position étanche et la réalisation d'une consolidation. Par la réalisation d'un traitement de rayonnement sur une pellicule polyimide, une réaction de craquelure d'un groupe de surface de la pellicule polyimide se produit pour générer un radical libre et des réactions mutuelles peuvent se produire entre le radical libre et un groupe actif de la colle d'étanchéité de structure de manière à augmenter la force d'adhérence et à éviter l'apparition de problèmes tels qu'une perforation de cristaux liquides, une pollution de cristaux liquides et une mauvaise fiabilité.
PCT/CN2013/089143 2013-08-05 2013-12-11 Procédé de fabrication d'appareil d'affichage Ceased WO2015018155A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201310337313.1 2013-08-05
CN201310337313.1A CN104345501B (zh) 2013-08-05 2013-08-05 制备窄边框显示装置的方法

Publications (1)

Publication Number Publication Date
WO2015018155A1 true WO2015018155A1 (fr) 2015-02-12

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Application Number Title Priority Date Filing Date
PCT/CN2013/089143 Ceased WO2015018155A1 (fr) 2013-08-05 2013-12-11 Procédé de fabrication d'appareil d'affichage

Country Status (2)

Country Link
CN (1) CN104345501B (fr)
WO (1) WO2015018155A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105700208B (zh) * 2016-04-13 2019-07-05 京东方科技集团股份有限公司 一种用于制造显示面板的方法、显示面板以及显示装置
CN107884995B (zh) * 2017-12-22 2021-06-22 苏州华星光电技术有限公司 显示面板
CN110426877B (zh) * 2019-07-08 2020-10-27 深圳市华星光电技术有限公司 一种窄边框显示面板及其制备方法、窄边框显示装置
CN111176022B (zh) * 2020-03-12 2022-02-22 Tcl华星光电技术有限公司 显示面板及其制备方法、显示装置

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US4391491A (en) * 1979-05-04 1983-07-05 Ebauches Electroniques, S.A. Passive electro-optic display cell and method of manufacturing thereof
JP2001083532A (ja) * 1999-09-10 2001-03-30 Canon Inc 液晶素子
CN1841168A (zh) * 2005-03-28 2006-10-04 精工爱普生株式会社 密封结构、密封方法、液晶装置及其制造方法、投影仪
JP2011064866A (ja) * 2009-09-16 2011-03-31 Canon Inc 液晶表示素子の製造方法及びその製造方法にて作成された液晶表示素子を用いた画像表示装置
CN102236209A (zh) * 2010-04-20 2011-11-09 Jsr株式会社 液晶显示元件的制造方法、聚合物组合物以及液晶显示元件
CN102608811A (zh) * 2012-03-22 2012-07-25 深圳市华星光电技术有限公司 液晶显示装置及其制造方法
CN102629031A (zh) * 2012-04-24 2012-08-08 深圳市华星光电技术有限公司 改善基板pi不沾的方法及pi液
CN102643424A (zh) * 2011-08-25 2012-08-22 北京京东方光电科技有限公司 聚酰亚胺及其制备方法和应用
CN102695732A (zh) * 2009-12-08 2012-09-26 光学转变公司 具有改进粘合性的光定向材料
WO2013024762A1 (fr) * 2011-08-17 2013-02-21 積水化学工業株式会社 Agent d'étanchéité pour élément d'affichage à cristaux liquides et élément d'affichage à cristaux liquides associé

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JP5121432B2 (ja) * 2007-12-11 2013-01-16 キヤノン株式会社 液晶表示装置及びその製造方法並びに液晶プロジェクション装置

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Publication number Priority date Publication date Assignee Title
US4391491A (en) * 1979-05-04 1983-07-05 Ebauches Electroniques, S.A. Passive electro-optic display cell and method of manufacturing thereof
JP2001083532A (ja) * 1999-09-10 2001-03-30 Canon Inc 液晶素子
CN1841168A (zh) * 2005-03-28 2006-10-04 精工爱普生株式会社 密封结构、密封方法、液晶装置及其制造方法、投影仪
JP2011064866A (ja) * 2009-09-16 2011-03-31 Canon Inc 液晶表示素子の製造方法及びその製造方法にて作成された液晶表示素子を用いた画像表示装置
CN102695732A (zh) * 2009-12-08 2012-09-26 光学转变公司 具有改进粘合性的光定向材料
CN102236209A (zh) * 2010-04-20 2011-11-09 Jsr株式会社 液晶显示元件的制造方法、聚合物组合物以及液晶显示元件
WO2013024762A1 (fr) * 2011-08-17 2013-02-21 積水化学工業株式会社 Agent d'étanchéité pour élément d'affichage à cristaux liquides et élément d'affichage à cristaux liquides associé
CN102643424A (zh) * 2011-08-25 2012-08-22 北京京东方光电科技有限公司 聚酰亚胺及其制备方法和应用
CN102608811A (zh) * 2012-03-22 2012-07-25 深圳市华星光电技术有限公司 液晶显示装置及其制造方法
CN102629031A (zh) * 2012-04-24 2012-08-08 深圳市华星光电技术有限公司 改善基板pi不沾的方法及pi液

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