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WO2015079626A1 - Procédé permettant de produire un film conducteur transparent - Google Patents

Procédé permettant de produire un film conducteur transparent Download PDF

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Publication number
WO2015079626A1
WO2015079626A1 PCT/JP2014/005564 JP2014005564W WO2015079626A1 WO 2015079626 A1 WO2015079626 A1 WO 2015079626A1 JP 2014005564 W JP2014005564 W JP 2014005564W WO 2015079626 A1 WO2015079626 A1 WO 2015079626A1
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Prior art keywords
conductive film
transparent conductive
pressure
roll
pressure treatment
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PCT/JP2014/005564
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English (en)
Japanese (ja)
Inventor
井上　純一
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Dexerials Corp
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Dexerials Corp
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/52—Electrically conductive inks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys

Definitions

  • the present invention relates to a method for producing a transparent conductive film.
  • a transparent conductive film provided on the display surface of the display panel, and a transparent conductive film such as a transparent conductive film of an information input device arranged on the display surface side of the display panel, such as a transparent conductive film, includes indium tin oxide.
  • Metal oxides such as (ITO) have been used.
  • transparent conductive films using metal oxides are expensive to produce because they are sputtered in a vacuum environment, and cracks and delamination are likely to occur due to deformation such as bending and deflection. .
  • a transparent conductive film using a metal oxide instead of a transparent conductive film using a metal oxide, a transparent conductive film using metal nanowires or carbon nanotubes that can be formed by coating or printing and has high resistance to bending and bending has been studied.
  • Transparent conductive films using metal nanowires and carbon nanotubes are also attracting attention as next-generation transparent conductive films that do not use indium, which is a rare metal (see, for example, Patent Documents 1 and 2 and Non-Patent Document 1).
  • Patent Document 3 is known as a suitable method for producing a transparent conductive film using metal nanowires.
  • a plurality of metal nanowires are placed on a substrate (the metal nanowires are dispersed in a liquid), and the liquid is dried, whereby the metal nanowires are formed on the substrate.
  • a network layer (a layer in which a plurality of metal nanowires are connected in a network) is formed.
  • a metal nanowire network layer is formed on a base
  • Patent Document 3 describes that a roll-to-roll process is performed.
  • This invention makes it a subject to solve the said various problems in the past and to achieve the following objectives. That is, it aims at providing the manufacturing method of the transparent conductive film which can manufacture the transparent conductive film in which electroconductivity was fully improved.
  • the present inventor as a result of intensive studies to achieve the above object, the present inventor, as a result of the pressure treatment process for pressure-treating the transparent conductive film, (i) at least one of the rolls used for the pressure treatment is treated with a predetermined rubber By making the elastic roll of hardness and pressurizing with a predetermined surface pressure, or (ii) By using all the rolls used for the pressurizing process as metal rolls and pressing with a predetermined surface pressure, It has been found that a transparent conductive film with sufficiently improved conductivity can be produced, and the present invention has been completed.
  • the present invention is based on the above findings by the present inventors, and means for solving the above problems are as follows. That is, ⁇ 1> In the manufacturing method of the transparent conductive film containing at least any one of metal nanowire and a carbon nanotube, it includes the pressurization process process which pressurizes the said transparent conductive film, In the said pressurization process process, the said pressurization process A transparent conductive film characterized in that at least one of the rolls used in the invention is an elastic roll having a rubber hardness of 75 ° to 100 ° and is subjected to a pressure treatment at a surface pressure of 2.9 MPa (30 kg / cm 2 ) or more. It is a manufacturing method.
  • the pressure treatment step of pressure-treating the transparent conductive film in the pressure treatment step of pressure-treating the transparent conductive film, at least one of the rolls to be used is an elastic roll having a predetermined rubber hardness, Pressurization is performed with surface pressure. As a result, a transparent conductive film with sufficiently improved conductivity is obtained.
  • the pressure treatment step is performed with a line width of 5.0 mm or less.
  • a metal roll having a diameter of less than 200 mm is used as a press roll in the pressure treatment step.
  • ⁇ 4> The method for producing a transparent conductive film according to any one of ⁇ 1> to ⁇ 3>, wherein an elastic roll having a diameter of 200 mm or more is used as a back roll in the pressure treatment step.
  • the pressurization process process which pressurizes the said transparent conductive film is included, In the said pressurization process process, the said pressurization process All the rolls used in the above are metal rolls and are subjected to a pressure treatment at a surface pressure of 5.7 MPa (58 kg / cm 2 ) or more.
  • a method for producing a transparent conductive film which can solve the above-mentioned problems and can achieve the above-described object and can produce a transparent conductive film with sufficiently improved conductivity. be able to.
  • FIG. 1 is a schematic diagram for explaining a pressure treatment step in the method for producing a transparent conductive film of the present invention (part 1).
  • FIG. 2 is a schematic diagram for demonstrating the pressurization process process in the manufacturing method of the transparent conductive film of this invention (the 2).
  • FIG. 3 is a diagram for explaining the surface pressure and the line width in the pressure treatment step in the method for producing a transparent conductive film of the present invention.
  • the method for producing a transparent conductive film of the present invention includes at least a pressure treatment step, and further includes other steps such as a dispersion preparation step, a coating step, a drying step, and a heat curing treatment step, which are appropriately selected as necessary. Including.
  • the pressure treatment step is a step of pressure-treating the transparent conductive film.
  • the transparent conductive film includes at least one of metal nanowires and carbon nanotubes, and further includes a transparent resin material (binder), a dispersant, and other components as necessary.
  • the transparent conductive film for example, prepares a dispersion liquid containing at least one of metal nanowires and carbon nanotubes (dispersion liquid preparation process), and applies the prepared dispersion liquid on a substrate (application process) ), The solvent in the dispersion is dried and removed (drying step), and then heat-cured (heat-cured treatment).
  • the thickness of the transparent conductive film is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.1 ⁇ m to 500 ⁇ m, more preferably 1 ⁇ m to 100 ⁇ m, and particularly preferably 10 ⁇ m to 50 ⁇ m. If the thickness of the transparent conductive film is less than 0.1 ⁇ m, sufficient conductivity may not be obtained, and if it exceeds 500 ⁇ m, in addition to not forming a sufficient network of metal nanowires or carbon nanotubes, Transparency may deteriorate. On the other hand, when the thickness of the transparent conductive film is within the more preferable range or the particularly preferable range, it is advantageous in terms of forming a network of metal nanowires or carbon nanotubes.
  • the metal nanowire is made of metal and is a fine wire having a diameter on the order of nm.
  • the constituent element of the metal nanowire is not particularly limited as long as it is a metal element, and can be appropriately selected according to the purpose.
  • Ag, Au, Ni, Cu, Pd, Pt, Rh, Ir examples include Ru, Os, Fe, Co, Sn, Al, Tl, Zn, Nb, Ti, In, W, Mo, Cr, Fe, V, Ta, and the like. These may be used individually by 1 type and may use 2 or more types together.
  • Ag and Cu are preferable in terms of high conductivity.
  • the average minor axis diameter of the metal nanowire is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably more than 1 nm and not more than 500 nm, and more preferably 10 nm to 100 nm.
  • the average minor axis diameter of the metal nanowire is 1 nm or less, the conductivity of the metal nanowire deteriorates, and the transparent conductive film containing the metal nanowire may not function as a conductive film. If it exceeds, the total light transmittance and haze of the transparent conductive film containing the metal nanowires may deteriorate.
  • the average minor axis diameter of the metal nanowire is within the more preferable range, it is advantageous in that the transparent conductive film including the metal nanowire has high conductivity and high transparency.
  • the average major axis length of the metal nanowire is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably more than 1 ⁇ m and not more than 1000 ⁇ m, and more preferably 10 ⁇ m to 300 ⁇ m.
  • the metal nanowires are not easily connected to each other, and the transparent conductive film containing the metal nanowires may not function as a conductive film.
  • the total light transmittance and haze of the transparent conductive film containing the metal nanowire may be deteriorated, or the dispersibility of the metal nanowire in the dispersion used when forming the transparent conductive film may be deteriorated.
  • the metal nanowire may have a wire shape in which metal nanoparticles are connected in a bead shape.
  • the length of the metal nanowire is not limited.
  • the weight per unit area of the metal nanowires is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.001g / m 2 ⁇ 1.000g / m 2, 0.003g / m 2 ⁇ 0.3 g / m 2 is more preferable.
  • the basis weight of the metal nanowire is less than 0.001 g / m 2 , the metal nanowire is not sufficiently present in the metal nanowire layer, and the conductivity of the transparent conductive film may be deteriorated. If it exceeds .000 g / m 2 , the total light transmittance and haze of the transparent conductive film may deteriorate.
  • the basis weight of the metal nanowire is within the more preferable range, it is advantageous in that the conductivity of the transparent conductive film is high and the transparency is high.
  • the metal nanowire network means a network structure formed by connecting a plurality of metal nanowires to each other in a network.
  • the said metal nanowire network is formed by passing through the pressurization process mentioned later.
  • combined by the conventional synthesis method may be sufficient, and a commercially available thing may be used.
  • combining method of the said carbon nanotube According to the objective, it can select suitably, For example, an arc discharge method, a laser evaporation method, a thermal CVD method etc. are mentioned.
  • limiting in particular as said carbon nanotube According to the objective, it can select suitably, A single-walled carbon nanotube (SWNT) may be sufficient, and a multi-walled carbon nanotube (MWNT) may be sufficient. However, the single-walled carbon nanotube is preferable.
  • the carbon nanotube may be a mixture of metallic and semiconducting carbon nanotubes, or may be a selectively separated semiconducting carbon nanotube.
  • the carbon nanotube network means a network structure formed by connecting a plurality of carbon nanotubes in a network.
  • the carbon nanotube network is formed through a pressure treatment described later.
  • the transparent resin material (binder) is for dispersing the metal nanowires and / or the carbon nanotubes.
  • transparent resin material (binder) There is no restriction
  • the thermoplastic resin is not particularly limited and may be appropriately selected depending on the intended purpose.
  • thermosetting (photo) curable resin is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include silicon resins such as melamine acrylate, urethane acrylate, isocyanate, epoxy resin, polyimide resin, and acrylic-modified silicate. And a polymer in which a photosensitive group such as an azide group or a diazirine group is introduced into at least one of a main chain and a side chain.
  • the dispersant is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include polyvinyl pyrrolidone (PVP); amino group-containing compounds such as polyethyleneimine; sulfo groups (including sulfonates) and sulfonyl groups.
  • PVP polyvinyl pyrrolidone
  • amino group-containing compounds such as polyethyleneimine
  • sulfo groups including sulfonates
  • Sulfonamide group carboxylic acid group (including carboxylate), amide group, phosphate group (including phosphate and phosphate ester), phosphino group, silanol group, epoxy group, isocyanate group, cyano group, vinyl group,
  • a compound having a functional group such as a thiol group or a carbinol group, which can be adsorbed to a metal; These may be used alone or in combination of two or more.
  • the dispersant may be adsorbed on the surface of the metal nanowire or the carbon nanotube. Thereby, the dispersibility of the said metal nanowire or the said carbon nanotube can be improved.
  • the other components are not particularly limited and may be appropriately selected depending on the intended purpose.
  • surfactants for example, surfactants, viscosity modifiers, curing accelerators, plasticity, stabilizers such as antioxidants and sulfidizing agents, and the like. , Etc.
  • the dispersion liquid contains at least metal nanowires and / or carbon nanotubes, and further contains a transparent resin material (binder), a solvent, a dispersant, and other components as necessary.
  • a transparent resin material binder
  • the metal nanowire, the carbon nanotube, the transparent resin material (binder), the dispersant, and other components are as described above.
  • the dispersion method of the dispersion is not particularly limited and may be appropriately selected depending on the purpose. For example, stirring, ultrasonic dispersion, bead dispersion, kneading, homogenizer treatment, pressure dispersion treatment, and the like are preferable. It is mentioned in.
  • the mass of the said dispersion liquid is 100 mass parts, it is 0. 0.011 parts by mass to 10.00 parts by mass is preferable.
  • the blending amount of the metal nanowires and / or carbon nanotubes is less than 0.01 parts by mass, the basis weight (0.001 g) sufficient for the metal nanowires and / or carbon nanotubes in the finally obtained transparent conductive film. / M 2 to 1.000 g / m 2 ) may not be obtained, and if it exceeds 10.00 parts by mass, the dispersibility of the metal nanowires and / or carbon nanotubes may be deteriorated.
  • the solvent is not particularly limited as long as metal nanowires and / or carbon nanotubes are dispersed, and can be appropriately selected according to the purpose.
  • water methanol, ethanol, n-propanol , I-propanol, n-butanol, i-butanol, sec-butanol, tert-butanol and other alcohols; cyclohexanone, cyclopentanone, anone and other ketones; N, N-dimethylformamide (DMF) and other amides; dimethyl sulfoxide Sulfides such as (DMSO); and the like. These may be used individually by 1 type and may use 2 or more types together.
  • DMF N-dimethylformamide
  • DMSO dimethyl sulfoxide Sulfides
  • a high boiling point solvent may be further added to the dispersion. Thereby, the evaporation rate of the solvent from the dispersion can be controlled.
  • the high boiling point solvent is not particularly limited and may be appropriately selected depending on the intended purpose.
  • the dispersant when added to the dispersion, it is preferable to add the dispersant so that the conductivity of the finally obtained transparent conductive film does not deteriorate.
  • the said dispersing agent can be made to adsorb
  • the transparent base material comprised with the material which has transparency with respect to visible light, such as an inorganic material and a plastic material, is preferable.
  • the transparent substrate has a film thickness required for a transparent electrode having a transparent conductive film.
  • quartz, sapphire, glass, etc. are mentioned.
  • a triacetyl cellulose TAC
  • polyester TPE
  • PET polyethylene terephthalate
  • PEN polyethylene naphthalate
  • PA polyimide
  • PA polyamide
  • PA polyamide
  • PA polyamide
  • PA polyamide
  • PA polyamide
  • PA polyamide
  • PE polyacrylate
  • PE polyether sulfone
  • PP polypropylene
  • PP diacetyl cellulose
  • PVC polyvinyl chloride
  • acrylic resin PMMA
  • PC polycarbonate
  • Known polymer materials such as resin, urea resin, urethane resin, melamine resin, and cycloolefin polymer (COP) can be used.
  • the film thickness of the transparent substrate is preferably 5 ⁇ m to 500 ⁇ m from the viewpoint of productivity, but is not particularly limited to this range.
  • FIG. 3 is a diagram for explaining the surface pressure and the line width in the pressure treatment step in the method for producing a transparent conductive film of the present invention, and the transparent conductive film 20 (pressurized body 30) is pressed into a press roll ( (First roll) FIG.
  • the area sandwiched and pressed by the roll pair 60 is the pressurized part X
  • the pressure applied to the pressurized part X is the surface pressure
  • the width of the pressurized part X is the line width.
  • the roll used for the pressure treatment is not particularly limited as long as (i) at least one is an elastic roll having a predetermined rubber hardness, or (ii) all are metal rolls, depending on the purpose. It can be selected appropriately.
  • the surface pressure, line width, pressure (load), and conveyance speed in the pressure treatment are adjusted to predetermined values according to the type of roll used for the pressure treatment.
  • the press roll 40 and the back roll 50 may rotate the surface of the transparent conductive film 20 once or a plurality of times.
  • the transparent conductive film is heated, for example, at 80 ° C. to 250 ° C. for 10 minutes or less, more preferably at 100 ° C. to 160 ° C. for 10 seconds to 2 minutes.
  • the transparent conductive film can be heated to a temperature higher than 250 ° C. depending on the type of substrate, and can be heated to a temperature of 400 ° C.
  • the glass substrate can be heat-treated at a temperature in the range of 350 ° C. to 400 ° C.
  • post-treatment at higher temperatures may require the presence of a non-oxidizing atmosphere such as nitrogen or a noble gas.
  • the heating can be performed either online or offline.
  • the transparent conductive film can be placed in an oven set at a predetermined temperature for a predetermined time.
  • the conductivity of the transparent conductive film can be improved.
  • the roll may be heated (roll temperature control).
  • the roll is preferably heated to 30 ° C. to 200 ° C., more preferably 40 ° C. to 100 ° C.
  • the substrate can be sandwiched even if it is, for example, a plastic plate substrate or a glass substrate, and is used for the pressure treatment.
  • the applicable range of the base material that can be sandwiched is larger than when all of the rolls to be performed are metal rolls.
  • Elastic roll-- The rubber hardness of the elastic roll is not particularly limited as long as it is 75 ° to 100 °, and can be appropriately selected according to the purpose, but is preferably 80 ° to 100 °, more preferably 90 ° to 100 °. preferable. If the rubber hardness of the elastic roll is less than 75 °, contact failure of metal nanowires or carbon nanotubes due to insufficient pressurization, and a sufficient resistance value cannot be obtained. Further, if the rubber hardness of the elastic roll is less than 80 °, it is necessary to increase the set pressure in order to obtain a sufficient network formation of metal nanowires or carbon nanotubes.
  • the rubber hardness of the elastic roll is within the more preferable range, it is advantageous in terms of improving the conductivity by forming a network of metal nanowires or carbon nanotubes.
  • the rubber hardness means Shore A hardness and can be measured by using a JIS K 6253 durometer as a measuring instrument.
  • the diameter of the elastic roll is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 30 mm to 1,000 mm, more preferably 40 mm to 500 mm, and particularly preferably 50 mm to 300 mm.
  • the diameter of the elastic roll is less than 30 mm, it is difficult to wind the rubber around the metal roll, and it may be difficult to produce the elastic roll, and when it exceeds 1,000 mm, it may be difficult to handle the roll. .
  • the diameter of the elastic roll is within the more preferable range or the particularly preferable range, it is advantageous in terms of roll production and handling.
  • the material of the elastic roll is not particularly limited and may be appropriately selected depending on the intended purpose.
  • the main component is a chloroprene polymer rubber, acrylonitrile butadiene rubber (NBR), ethylene-propylene-diene rubber (EPDM). Such as rubber; resin; and the like. These may be used individually by 1 type and may use 2 or more types together. Among these, rubber having high hardness and solvent resistance is preferable.
  • the material of the said elastic roll is not rubber
  • metal roll--- There is no restriction
  • the metal may be subjected to, for example, hard chrome plating. Among these, a metal with high workability and solvent resistance is preferable.
  • the diameter of the metal roll is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 30 mm to 1,000 mm, more preferably 40 mm to 500 mm, and particularly preferably 50 mm to 300 mm. If the diameter of the metal roll is less than 30 mm, it may be difficult to produce the roll, and if it exceeds 1,000 mm, handling of the roll may be difficult. On the other hand, when the diameter of the metal roll is within the more preferable range or the particularly preferable range, it is advantageous in terms of roll production and handling.
  • a metal roll having a diameter of less than 200 mm is preferably used as the press roll (first roll), and an elastic roll having a diameter of 200 mm or more is preferably used as the back roll (second roll).
  • the cushioning action is increased by using a metal roll having a diameter of less than 200 mm as the press roll (first roll) and using an elastic roll having a diameter of 200 mm or more as the back roll (second roll).
  • the pressure can be suitably released.
  • the surface pressure is not particularly limited as long as it is 2.9 MPa (30 kg / cm 2 ) or more, and can be appropriately selected according to the purpose, but 2.9 MPa to 11.8 MPa (30 kg / cm 2 to 30 kg / cm 2 ). 120 kg / cm 2 ) is preferable, and 3.8 MPa to 10.5 MPa (39 g / cm 2 to 107 kg / cm 2 ) is more preferable.
  • the surface pressure is less than 2.9 MPa (30 kg / cm 2 ), sufficient metal nanowire network formation cannot be obtained due to insufficient surface pressure.
  • the surface pressure exceeds 11.8 MPa (120 kg / cm 2 )
  • the resistance value decreases sufficiently, but the substrate may be damaged during pressurization.
  • the surface pressure is within the more preferable range, it is advantageous in terms of network formation of metal nanowires and substrate handling.
  • the surface pressure is measured by a pressure sensor (load cell) in the apparatus.
  • the line width is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 5.0 mm or less, and more preferably 0.20 mm to 0.50 mm. If the line width exceeds 5.0 mm, sufficient surface pressure may not be obtained. On the other hand, when the line width is within the more preferable range, it is advantageous in that a surface pressure necessary and sufficient for forming a network of metal nanowires can be obtained.
  • the pressure (load) is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.2 kN to 50 kN, and more preferably 0.4 kN to 30 kN. If the pressurization (load) is less than 0.2 kN, a sufficient surface pressure may not be obtained, and if it exceeds 50 kN, the substrate may be damaged during pressurization. On the other hand, when the pressurization (load) is within the more preferable range, it is advantageous in terms of network formation of metal nanowires and substrate handling.
  • the pressurization (load) is measured by a pressure sensor (load cell) in the apparatus.
  • the transport speed is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.1 m / min to 10 m / min, and more preferably 0.5 m / min to 5 m / min. If the conveying speed is less than 0.1 m / min, productivity may be significantly deteriorated, and if it exceeds 10 m / min, handling may be difficult in the case of flat plate processing. On the other hand, when the pressurization (load) is within the more preferable range, it is advantageous in terms of network formation of metal nanowires and substrate handling.
  • the diameter of the metal roll is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 30 mm to 1,000 mm, more preferably 40 mm to 500 mm, and particularly preferably 50 mm to 300 mm. If the diameter of the metal roll is less than 30 mm, it may be difficult to produce the roll, and if it exceeds 1,000 mm, handling of the roll may be difficult. On the other hand, when the diameter of the metal roll is within the more preferable range or the particularly preferable range, it is advantageous in terms of roll production and handling.
  • the surface pressure is not particularly limited as long as it is 5.7 MPa (58 kg / cm 2 ) or more, and can be appropriately selected depending on the purpose, but it is 5.7 MPa to 50.0 MPa (58 kg / cm 2 to 58 kg / cm 2 ). 509 kg / cm 2 ), preferably 8.8 MPa to 40.0 MPa (90 kg / cm 2 to 408 kg / cm 2 ). If the surface pressure is less than 5.7 MPa (58 kg / cm 2 ), sufficient network formation of metal nanowires cannot be obtained due to insufficient surface pressure.
  • the surface pressure exceeds 50.0 MPa (509 kg / cm ⁇ 2 >), although resistance value falls sufficiently, on the other hand, a base material may be damaged at the time of pressurization.
  • the surface pressure is within the more preferable range, it is advantageous in terms of network formation of metal nanowires and substrate handling.
  • the surface pressure is measured by a pressure sensor (load cell) in the apparatus.
  • the line width is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.50 mm or less, more preferably 0.05 mm to 0.45 mm, and particularly preferably 0.10 mm to 0.40 mm. preferable. If the line width exceeds 0.50 mm, the surface pressure may be insufficient. On the other hand, it is advantageous in terms of surface pressure when the line width is within the more preferable range or the particularly preferable range.
  • the pressurization (load) is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.1 kN to 10.0 kN, more preferably 0.2 kN to 5.0 kN, and 0.4 kN ⁇ 3.0 kN is particularly preferred. If the pressure (load) is less than 0.1 kN, sufficient surface pressure may not be obtained. If it exceeds 10.0 kN, the substrate may be damaged during pressurization. On the other hand, when the pressurization (load) is within the more preferable range or the particularly preferable range, it is advantageous in terms of forming a metal nanowire network and handling the substrate.
  • the pressurization (load) is measured by a pressure sensor (load cell) in the apparatus.
  • the transport speed is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.1 m / min to 10 m / min, and more preferably 0.5 m / min to 5 m / min. If the conveying speed is less than 0.1 m / min, productivity may be significantly deteriorated, and if it exceeds 10 m / min, handling may be difficult in the case of flat plate processing. On the other hand, when the pressure (load) is within the more preferable range, it is advantageous in terms of network formation of metal nanowires or carbon nanotubes and handling of the substrate.
  • the dispersion preparation step is a step of preparing a dispersion containing at least one of metal nanowires and carbon nanotubes.
  • the metal nanowire, the carbon nanotube, and the dispersion liquid are as described above.
  • the coating step is a step of coating the prepared dispersion on a substrate.
  • the dispersion and the base material are as described above.
  • the application method is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include application using a coil bar, application using an applicator, application using a slit die, application using a spin coater, and the like.
  • the drying step is a step of drying and removing the solvent in the dispersion.
  • the dispersion liquid and the solvent are as described above.
  • the heat curing process is a process for performing a heat curing process.
  • the heating temperature in the heat curing treatment is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 60 ° C to 140 ° C, more preferably 80 ° C to 120 ° C, and particularly preferably about 120 ° C. .
  • the heating temperature in the heat curing treatment is less than 60 ° C., the time required for drying may become long and workability may deteriorate, and when it exceeds 140 ° C., the balance with the glass transition temperature (Tg) of the substrate The substrate may be distorted.
  • the heating temperature in the heat curing treatment is within the more preferable range or the particularly preferable temperature, it is advantageous in terms of forming a metal nanowire network.
  • the heating time in the heat curing treatment is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 1 minute to 30 minutes, more preferably 2 minutes to 10 minutes, and particularly preferably about 5 minutes. .
  • the heating time in the heat curing treatment is less than 1 minute, drying may be insufficient, and when it exceeds 30 minutes, workability may be deteriorated.
  • the heating time in the heat curing treatment is within the more preferable range or the particularly preferable time, it is advantageous in terms of network formation and workability of metal nanowires or carbon nanotubes.
  • Example 1 Preparation of silver nanowire ink (dispersion)> A silver nanowire ink was prepared with the following composition.
  • Metal nanowire Silver nanowire (manufactured by Seashell Technology, AgNW-25, average diameter 25 nm, average length 23 ⁇ m): compounding amount 0.05 part by mass
  • binder hydroxypropylmethylcellulose (manufactured by Aldrich Corporation) 2% aqueous solution viscosity at 20 ° C. 80 cP to 120 cP (reference value)): blending amount 0.15 parts by mass
  • solvent (i) water: blending amount 89.80 parts by mass, (ii) ethanol: blending amount 10.00 parts by mass
  • a silver nanowire transparent conductive film was prepared by the following procedure. First, the produced silver nanowire ink (dispersion) was applied onto a transparent substrate (PET: U34, film thickness 125 ⁇ m) with a coil bar (counter 10) to form a silver nanowire dispersion film. . Here, the basis weight of the silver nanowires was set to about 0.01 g / m 2 . Next, in the atmosphere, hot air was applied to the coated surface with a dryer to remove the solvent in the silver nanowire-dispersed film by drying. Thereafter, a heat curing treatment at 120 ° C. for 5 minutes was performed in an oven to produce a silver nanowire transparent conductive film.
  • ⁇ Pressure treatment of silver nanowire transparent conductive film Pressurizing the produced silver nanowire transparent conductive film using a calendar processing device (see FIGS. 1 and 2) having a cylindrical press roll (first roll) and a back roll (second roll). Processing (calendar processing) was performed.
  • the press roll (first roll) is made of steel (manufacturer name: Miyagawa Roller Co., Ltd.) and roll (diameter 100 mm, width 300 mm), and the back roll (second roll) is rubber hardness.
  • the resistance value of the pressure-treated silver nanowire transparent conductive film was measured as follows. A measurement probe of a manual nondestructive resistance measuring instrument (Napson Co., Ltd., EC-80P) is brought into contact with the surface of the silver nanowire dispersion film, and at any 12 locations on the surface of the transparent conductive film (silver nanowire layer). The resistance value was measured, and the average value was taken as the resistance value. The resistance value was 83 ⁇ / ⁇ . The measurement results are shown in Table 1.
  • ⁇ Evaluation of conductivity> The conductivity was evaluated based on the following evaluation criteria. The evaluation results are shown in Table 1. ⁇ : Resistance value is less than 150 ⁇ / ⁇ ⁇ : Resistance value is 150 ⁇ / ⁇ or more and less than 400 ⁇ / ⁇ ⁇ : Resistance value is 400 ⁇ / ⁇ or more
  • Example 2 In Example 1, instead of applying pressure (load) under the pressure treatment conditions of 50 kN and surface pressure of 10.5 MPa (107 kg / cm 2 ), pressure (load) of 40 kN and surface pressure of 8.4 MPa ( 86 kg / cm 2 ) A silver nanowire transparent conductive film was produced in the same manner as in Example 1 except that the pressure treatment was performed under pressure treatment conditions of 86 kg / cm 2 ). The resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 3 In Example 1, instead of performing pressure treatment under a pressure treatment condition of a pressure (load) of 50 kN and a surface pressure of 10.5 MPa (107 kg / cm 2 ), a pressure (load) of 30 kN and a surface pressure of 6.3 MPa ( 64 kg / cm 2 ) A silver nanowire transparent conductive film was prepared in the same manner as in Example 1 except that the pressure treatment was performed under a pressure treatment condition of 64 kg / cm 2 ). The resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 4 In Example 1, a back roll made of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 100 °, a line width of 2.0 mm, and a surface pressure of 10.5 MPa (107 kg / cm 2 ) Instead of pressurizing, NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 98 °, roll width, pressurizing condition of line width 2.5 mm, surface pressure 7.3 MPa (74 kg / cm 2 )
  • a silver nanowire transparent conductive film was prepared in the same manner as in Example 1, except that the silver nanowire transparent conductive film was subjected to pressure treatment and pressure treatment, as in Example 1. The resistance value of was measured and the conductivity was evaluated. The results are shown in Table 1.
  • Example 5 In Example 4, instead of pressurizing under a pressurizing process condition of pressurization (load) of 50 kN and surface pressure of 7.3 MPa (74 kg / cm 2 ), pressurization (load) of 40 kN and surface pressure of 5.8 MPa ( 59 kg / cm 2 ) A silver nanowire transparent conductive film was produced in the same manner as in Example 4 except that the pressure treatment was performed under pressure treatment conditions of 59 kg / cm 2 ). The resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 6 In Example 4, instead of pressurizing under the pressurizing process conditions of pressurization (load) of 50 kN and surface pressure of 7.3 MPa (74 kg / cm 2 ), pressurization (load) of 30 kN and surface pressure of 4.4 MPa ( 45 kg / cm 2 ) A silver nanowire transparent conductive film was produced in the same manner as in Example 4 except that the pressure treatment was performed under a pressure treatment condition of 45 kg / cm 2 ). The resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 7 In Example 4, instead of pressurizing under a pressurizing process condition of pressurization (load) of 50 kN and surface pressure of 7.3 MPa (74 kg / cm 2 ), pressurization (load) of 20 kN and surface pressure of 2.9 MPa ( 30 kg / cm 2 ) A silver nanowire transparent conductive film was produced in the same manner as in Example 4 except that the pressure treatment was performed under a pressure treatment condition of 30 kg / cm 2 ). The resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 8 In Example 1, a back roll made of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 100 °, a line width of 2.0 mm, and a surface pressure of 10.5 MPa (107 kg / cm 2 ) Instead of pressure treatment, pressure treatment conditions of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 80 °, line width 3.0 mm, surface pressure 5.6 MPa (57 kg / cm 2 )
  • a silver nanowire transparent conductive film was prepared in the same manner as in Example 1, except that the silver nanowire transparent conductive film was subjected to pressure treatment and pressure treatment, as in Example 1. The resistance value of was measured and the conductivity was evaluated. The results are shown in Table 1.
  • Example 9 In Example 8, instead of pressurizing under the pressurizing process conditions of pressurization (load) of 50 kN and surface pressure of 5.6 MPa (57 kg / cm 2 ), pressurization (load) of 40 kN and surface pressure of 4.4 MPa ( 45 kg / cm 2 ) A silver nanowire transparent conductive film was produced in the same manner as in Example 8 except that the pressure treatment was performed under pressure treatment conditions of 45 kg / cm 2 ). The resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 10 In Example 8, instead of pressurizing under the pressurizing process conditions of pressurization (load) of 50 kN and surface pressure of 5.6 MPa (57 kg / cm 2 ), pressurization (load) of 30 kN and surface pressure of 3.3 MPa ( 34 kg / cm 2 ) A silver nanowire transparent conductive film was prepared in the same manner as in Example 8 except that the pressure treatment was performed under a pressure treatment condition of 34 kg / cm 2 ). The resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 8 (Comparative Example 1) In Example 8, instead of pressurizing under a pressurizing process condition of pressurizing (load) of 50 kN and surface pressure of 5.6 MPa (57 kg / cm 2 ), pressurizing (load) of 20 kN and surface pressure of 2.3 MPa ( 23 kg / cm 2 ) A silver nanowire transparent conductive film was produced in the same manner as in Example 8 except that the pressure treatment was performed under pressure treatment conditions of 23 kg / cm 2 ). The resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 2 (Comparative Example 2) In Example 1, a back roll made of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 100 °, a line width of 2.0 mm, and a surface pressure of 10.5 MPa (107 kg / cm 2 ) Instead of pressure treatment, pressure treatment conditions of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 70 °, line width of 8.0 mm, and surface pressure of 1.7 MPa (17 kg / cm 2 ) A silver nanowire transparent conductive film was prepared in the same manner as in Example 1, except that the silver nanowire transparent conductive film was subjected to pressure treatment and pressure treatment, as in Example 1. The resistance value of was measured and the conductivity was evaluated. The results are shown in Table 1.
  • Comparative Example 3 In Comparative Example 2, instead of applying pressure (load) under the pressure treatment conditions of 50 kN and a surface pressure of 1.7 MPa (17 kg / cm 2 ), the pressure (load) is 20 kN and the surface pressure is 0.69 MPa ( 7 kg / cm 2 ) A silver nanowire transparent conductive film was produced in the same manner as in Comparative Example 2 except that the pressure treatment was performed under a pressure treatment condition of 7 kg / cm 2 ). The resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 11 In Example 1, a back roll made of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 100 °, a line width of 2.0 mm, and a surface pressure of 10.5 MPa (107 kg / cm 2 ) Instead of pressure treatment, a back roll made of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 75 °, pressure (load) 45 kN, line width 5.0 mm, surface pressure 3.8 MPa (39 kg / cm 2 )
  • a silver nanowire transparent conductive film was produced in the same manner as in Example 1 except that the pressure treatment was performed under the pressure treatment conditions of 2 ). The resistance value of the obtained silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 12 In Example 1, the diameter of a steel roll as a press roll (first roll) is 100 mm, pressurization (load) is 50 kN, line width is 2.0 mm, and surface pressure is 10.5 MPa (107 kg / cm 2 ). Instead of pressure treatment under the treatment conditions, the diameter of the steel roll as the press roll (first roll) is 200 mm, the pressure (load) is 45 kN, the line width is 2.2 mm, the surface pressure is 8.6 MPa (88 kg / cm 2 ) A silver nanowire transparent conductive film was produced in the same manner as in Example 1 except that the pressure treatment was performed under the pressure treatment conditions of 2 ). The resistance value of the obtained silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 13 In Example 1, during the pressure treatment (calendar treatment), the press roll (first roll) was a steel (manufacturer name: Miyagawa Roller Co., Ltd.) roll (diameter 100 mm, width 300 mm), and the back roll (second roll).
  • first roll was a steel (manufacturer name: Miyagawa Roller Co., Ltd.) roll (diameter 100 mm, width 300 mm), and the back roll (second roll).
  • a press roll (first The roll is a roll made of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) having a rubber hardness of 100 ° (diameter 200 mm, width 300 mm), and the back roll (second roll) is steel (manufacturer name: Miyagawa Roller Co., Ltd.). )
  • a silver nanowire transparent conductive film was produced in the same manner as in Example 1 except that the roll was made of 100 mm in diameter and 300 mm in width. Then, the produced silver nanowire transparent conductive film was subjected to pressure treatment, the resistance value of the pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 1.
  • Example 14 In Example 1, during the pressure treatment (calendar treatment), the press roll (first roll) was a steel (manufacturer name: Miyagawa Roller Co., Ltd.) roll (diameter 100 mm, width 300 mm), and the back roll (second roll).
  • first roll was a steel (manufacturer name: Miyagawa Roller Co., Ltd.) roll (diameter 100 mm, width 300 mm), and the back roll (second roll).
  • the roll is made of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 100 ° (diameter 200 mm, width 300 mm), pressurization (load) is 50 kN, line width is 2.0 mm, surface Instead of setting the pressure to 10.5 MPa (107 kg / cm 2 ), the press roll (first roll) and the back roll (second roll) are both steel (manufacturer: Miyagawa Roller Co., Ltd.) roll (diameter 40 mm, width 55 mm), pressure (load) 1.5 kN, line width 0.20 mm, surface pressure 40.
  • Example 15 In Example 14, instead of pressurizing under pressure (load) of 1.5 kN and surface pressure of 40.0 MPa (408 kg / cm 2 ), pressurization (load) of 1.0 kN and surface pressure of 26 A silver nanowire transparent conductive film was produced in the same manner as in Example 14 except that the pressure treatment was performed under a pressure treatment condition of 0.7 MPa (272 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized. The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 16 In Example 14, instead of pressurizing under pressure (load) of 1.5 kN and surface pressure of 40.0 MPa (408 kg / cm 2 ), pressurization (load) of 0.7 kN and surface pressure of 18 A silver nanowire transparent conductive film was produced in the same manner as in Example 14 except that the pressure treatment was performed under a pressure treatment condition of 6 MPa (190 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized. The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 17 In Example 14, instead of pressurizing under pressure (load) of 1.5 kN and surface pressure of 40.0 MPa (408 kg / cm 2 ), pressurization (load) of 0.4 kN and surface pressure of 10 A silver nanowire transparent conductive film was produced in the same manner as in Example 14 except that the pressure treatment was performed under a pressure treatment condition of 0.7 MPa (109 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized. The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 18 In Example 14, instead of pressure treatment under pressure (load) 1.5 kN and pressure treatment conditions of surface pressure 40.0 MPa (408 kg / cm 2 ), pressure (load) 0.3 kN, surface pressure 7 A silver nanowire transparent conductive film was produced in the same manner as in Example 14 except that the pressure treatment was performed under a pressure treatment condition of 0.7 MPa (79 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized. The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 19 In Example 14, instead of pressurizing under pressure (load) of 1.5 kN and surface pressure of 40.0 MPa (408 kg / cm 2 ), pressurization (load) of 0.2 kN and surface pressure of 5 A silver nanowire transparent conductive film was produced in the same manner as in Example 14 except that the pressure treatment was performed under a pressure treatment condition of 0.7 MPa (58 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized. The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 14 instead of pressurizing under pressure (load) of 1.5 kN and surface pressure of 40.0 MPa (408 kg / cm 2 ), pressurization (load) of 0.1 kN and surface pressure of 2
  • load instead of pressurizing under pressure (load) of 1.5 kN and surface pressure of 40.0 MPa (408 kg / cm 2 ), pressurization (load) of 0.1 kN and surface pressure of 2
  • a silver nanowire transparent conductive film was produced in the same manner as in Example 14 except that the pressure treatment was performed under a pressure treatment condition of 6 MPa (27 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized.
  • the resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 20 In Example 1, during the pressure treatment (calendar treatment), the press roll (first roll) was a steel (manufacturer name: Miyagawa Roller Co., Ltd.) roll (diameter 100 mm, width 300 mm), and the back roll (second roll).
  • first roll was a steel (manufacturer name: Miyagawa Roller Co., Ltd.) roll (diameter 100 mm, width 300 mm), and the back roll (second roll).
  • the roll is made of NBR rubber (manufacturer name: Miyagawa Roller Co., Ltd.) with a rubber hardness of 100 ° (diameter 200 mm, width 300 mm), pressurization (load) is 50 kN, line width is 2.0 mm, surface Instead of setting the pressure to 10.5 MPa (107 kg / cm 2 ), the press roll (first roll) and the back roll (second roll) are both steel (manufacturer: Miyagawa Roller Co., Ltd.) roll (diameter 160 mm, width 300 mm), pressure (load) 3.0 kN, line width 0.50 mm, surface pressure 2 Silver except that the .0MPa (245kg / cm 2), in the same manner as in Example 1, to prepare a silver nanowire transparent conductive film, silver nanowire transparent conductive film produced by pressure treatment, treated under pressure The resistance value of the nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 21 In Example 20, instead of pressurizing under pressure (load) of 3.0 kN and surface pressure of 24.0 MPa (245 kg / cm 2 ), pressurization (load) of 2.0 kN and surface pressure of 16 A silver nanowire transparent conductive film was produced in the same manner as in Example 20 except that the pressure treatment was performed under a pressure treatment condition of 0.0 MPa (163 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized. The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 22 In Example 20, instead of pressurizing under pressure (load) of 3.0 kN and surface pressure of 24.0 MPa (245 kg / cm 2 ), pressurization (load) of 1.6 kN and surface pressure of 12 A silver nanowire transparent conductive film was produced in the same manner as in Example 20 except that the pressure treatment was performed under a pressure treatment condition of 8 MPa (131 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized. The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 23 In Example 20, instead of pressurizing under pressure (load) of 3.0 kN and surface pressure of 24.0 MPa (245 kg / cm 2 ), pressurization (load) of 1.1 kN and surface pressure of 8 A silver nanowire transparent conductive film was prepared and the produced silver nanowire transparent conductive film was pressurized in the same manner as in Example 20 except that the pressure treatment was performed under a pressure treatment condition of 8 MPa (90 kg / cm 2 ). The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 24 In Example 20, instead of pressurizing under pressure (load) of 3.0 kN and surface pressure of 24.0 MPa (245 kg / cm 2 ), pressurization (load) of 0.9 kN and surface pressure of 7 A silver nanowire transparent conductive film was produced in the same manner as in Example 20 except that the pressure treatment was performed under a pressure treatment condition of 0.5 MPa (76 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized. The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • Example 5 (Comparative Example 5) In Example 20, instead of pressurizing under pressure (load) of 3.0 kN and surface pressure of 24.0 MPa (245 kg / cm 2 ), pressurization (load) of 0.7 kN and surface pressure of 5 A silver nanowire transparent conductive film was produced in the same manner as in Example 20 except that the pressure treatment was performed under a pressure treatment condition of 6 MPa (57 kg / cm 2 ), and the produced silver nanowire transparent conductive film was pressurized. The resistance value of the processed and pressure-treated silver nanowire transparent conductive film was measured, and the conductivity was evaluated. The results are shown in Table 2.
  • the transparent conductive film produced by the method of the present invention is suitable as an alternative to a transparent conductive film using a metal oxide such as indium tin oxide (ITO) used in electronic devices such as notebook computers and smartphones. Is available.
  • ITO indium tin oxide

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Abstract

L'invention concerne un procédé qui permet de produire un film conducteur transparent et qui peut produire un film conducteur transparent qui présente une conductivité suffisamment améliorée. Le procédé permettant de produire un film conducteur transparent contenant des nanofils métalliques et/ou des nanotubes de carbone comporte une étape de traitement de compression consistant à soumettre le film conducteur transparent à un traitement de compression et, au cours de l'étape de traitement de compression, au moins l'un des rouleaux utilisés dans le traitement de compression est un rouleau élastique présentant une dureté de caoutchouc qui varie entre 75 et 100°, et le traitement de compression est effectué à une pression superficielle de 2,9 MPa (30 kg/cm2).
PCT/JP2014/005564 2013-11-27 2014-11-05 Procédé permettant de produire un film conducteur transparent Ceased WO2015079626A1 (fr)

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TWI602199B (zh) * 2016-07-29 2017-10-11 Preparation method of silver-carbon composite aqueous solution, silver-carbon composite aqueous solution, silver-carbon composite unit, electric conductor, and preparation method of electric conductor
TWI629693B (zh) * 2017-03-08 2018-07-11 南臺科技大學 軟性透明導電膜及其製造方法
CN109080876B (zh) * 2017-06-14 2023-01-17 张家港康得新光电材料有限公司 利用保护膜的产品加工方法

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WO2006109799A1 (fr) * 2005-04-12 2006-10-19 Sumitomo Metal Mining Co., Ltd. Couche conductrice métallique et son procédé de fabrication
JP2009059666A (ja) * 2007-09-03 2009-03-19 Sumitomo Metal Mining Co Ltd 透明導電層付フィルムとフレキシブル機能性素子、およびそれらの製造方法
JP2011076918A (ja) * 2009-09-30 2011-04-14 Fujifilm Corp 導電膜の製造方法
JP2011090878A (ja) * 2009-10-22 2011-05-06 Fujifilm Corp 透明導電体の製造方法
JP2013065450A (ja) * 2011-09-16 2013-04-11 Fujifilm Corp 導電性部材、導電性部材の製造方法、タッチパネル及び太陽電池

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Publication number Priority date Publication date Assignee Title
WO2006109799A1 (fr) * 2005-04-12 2006-10-19 Sumitomo Metal Mining Co., Ltd. Couche conductrice métallique et son procédé de fabrication
JP2009059666A (ja) * 2007-09-03 2009-03-19 Sumitomo Metal Mining Co Ltd 透明導電層付フィルムとフレキシブル機能性素子、およびそれらの製造方法
JP2011076918A (ja) * 2009-09-30 2011-04-14 Fujifilm Corp 導電膜の製造方法
JP2011090878A (ja) * 2009-10-22 2011-05-06 Fujifilm Corp 透明導電体の製造方法
JP2013065450A (ja) * 2011-09-16 2013-04-11 Fujifilm Corp 導電性部材、導電性部材の製造方法、タッチパネル及び太陽電池

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