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WO2014104042A1 - Organic el element, and image display device and lighting device each of which is provided with same - Google Patents

Organic el element, and image display device and lighting device each of which is provided with same Download PDF

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Publication number
WO2014104042A1
WO2014104042A1 PCT/JP2013/084544 JP2013084544W WO2014104042A1 WO 2014104042 A1 WO2014104042 A1 WO 2014104042A1 JP 2013084544 W JP2013084544 W JP 2013084544W WO 2014104042 A1 WO2014104042 A1 WO 2014104042A1
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Prior art keywords
organic
light
layer
cathode
hole
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French (fr)
Japanese (ja)
Inventor
裕政 周防
祐介 山▲崎▼
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Resonac Holdings Corp
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Showa Denko KK
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/875Arrangements for extracting light from the devices
    • H10K59/879Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/805Electrodes
    • H10K59/8052Cathodes
    • H10K59/80521Cathodes characterised by their shape

Definitions

  • the present invention relates to an organic EL element, and an image display device and an illumination device including the organic EL element.
  • Organic EL devices (organic electroluminescence devices) have features such as wide viewing angle, high-speed response, clear self-luminous display, etc., and they are next-generation lighting because they are thin, lightweight and have low power consumption. It is expected as a pillar of devices and image display devices. Organic EL elements are classified into a bottom emission type in which light is extracted from the support substrate side and a top emission type in which light is extracted from the opposite side of the support substrate, depending on the direction in which the light generated in the organic light emitting layer is extracted. .
  • a transparent substrate for example, a small incident angle (light ray and incident surface) of a critical angle or less at the interface between glass (refractive index: 1.52) and air (refractive index: 1.0).
  • a small incident angle light ray and incident surface
  • refracted at the interface and extracted outside the organic EL element These lights can be referred to as external mode lights.
  • the light incident on the interface between the transparent substrate and air at an incident angle larger than the critical angle is totally reflected at the interface and is not taken out of the device, and finally Can be absorbed by the material.
  • This light can be referred to as substrate mode light, and the resulting loss is referred to as substrate loss.
  • an anode made of a transparent conductive oxide (for example, indium tin oxide (ITO (refractive index: 1.82)) and a transparent substrate (for example, glass (refractive index: 1.52))
  • ITO indium tin oxide
  • a transparent substrate for example, glass (refractive index: 1.52)
  • SPP surface plasmon polariton
  • the light extraction efficiency of the organic EL element (ratio of the light extracted outside the element with respect to the light emitted from the light emitting layer) is generally considered to be about 20%. That is, about 80% of the light emitted from the light emitting layer is lost, and it is a big problem to reduce these losses and improve the light extraction efficiency.
  • the extraction of the substrate mode light can be dealt with by providing a light diffusion sheet or the like on the transparent substrate. It is known that waveguide mode light can be extracted by using a transparent substrate having a high refractive index (refractive index: 1.7 to 2.0).
  • Patent Document 1 As a method for extracting the SPP mode light captured on the surface of the metal cathode, a configuration in which a periodic uneven structure of about 50 nm is formed on the surface of the metal cathode is also known (Patent Document 2).
  • Non-Patent Document 1 As a method for preventing the surface of the metal cathode from being supplemented as SPP, a configuration in which the distance between the metal cathode and the light emitting portion is increased by increasing the thickness of the organic layer is also known (Non-Patent Document 1).
  • the present invention has been made in view of the above circumstances, and an object thereof is to provide an organic EL element that can suppress SPP mode light and improve light extraction efficiency, and an image display device and an illumination device including the organic EL element. .
  • An organic EL element in which an organic layer including a light emitting layer is sandwiched between a pair of electrodes facing each other, one electrode is a metal electrode, and the other electrode is a transparent electrode, mainly the transparent electrode
  • An organic EL element having a configuration in which light is extracted from the side to the outside, and the metal electrode has a plurality of through holes or a plurality of non-through holes formed from the surface on the organic layer side.
  • An organic EL element comprising a first electrode, an organic layer including a light emitting layer, and a metal layer in this order, wherein the first electrode is a transparent electrode made of a transparent conductive material, and the metal layer is a second electrode.
  • the metal layer has a plurality of through-holes or a plurality of non-through holes formed from the surface on the organic layer side, and the first electrode side is a main light extraction side.
  • EL element (3) The organic EL element according to (2), wherein the first electrode is an anode formed on a substrate, and the metal layer is a cathode.
  • the organic EL element as described in.
  • a first dielectric layer having a refractive index lower than that of the organic layer and having a plurality of holes is provided between the first electrode and the metal layer, and the organic layer
  • the first electrode includes a plurality of first electrode holes, and a second dielectric layer having a refractive index lower than a refractive index of the first electrode and lower than a refractive index of the organic layer is provided as the first dielectric layer.
  • the organic EL device according to any one of (2) to (10), wherein the organic EL device is provided inside an electrode hole.
  • An organic EL element including a first electrode, an organic layer including a light emitting layer, a second electrode, an insulating layer, and a metal layer in this order, both of the first electrode and the second electrode being a transparent conductive material
  • the metal layer has a plurality of through holes or a plurality of non-through holes formed from the surface on the organic layer side, and the first electrode side is a main light extraction side.
  • An image display device comprising the organic EL element according to any one of (1) to (12).
  • An illuminating device comprising the organic EL element according to any one of (1) to (12).
  • an organic EL element that suppresses SPP mode light and improves light extraction efficiency, and an image display device and an illumination device including the organic EL element.
  • FIG. 14 is a graph showing simulation results of in-light emission positions in an example of the organic EL device according to the first embodiment of the present invention, and FIGS. 13A to 13C are vertical propagation light, parallel propagation light, and random propagation, respectively. The wavelength dependence of the light extraction efficiency (eta) to the glass substrate of light is shown.
  • 15 is a graph showing simulation results of out emission positions in an example of the organic EL device according to the first embodiment of the present invention, and FIGS.
  • FIG. 14A to 14C are vertical propagation light, parallel propagation light, and random propagation, respectively.
  • the wavelength dependence of the light extraction efficiency (eta) to the glass substrate of light is shown.
  • FIG.15 (a) is a cross-sectional schematic diagram which shows the example
  • FIG.15 (b) is a cross section which shows another example. It is a schematic diagram.
  • FIG. 16 is a graph showing simulation results of the in-light emission position of the organic EL element according to the model structure shown in FIG. 15, and FIGS. 16 (a) to 16 (c) are glasses of vertical propagation light, parallel propagation light, and random propagation light, respectively.
  • the wavelength dependence of the light extraction efficiency ⁇ up to the substrate is shown. It is a graph which shows the simulation result of in light emission position in an example of the organic EL element concerning a 4th embodiment of the present invention, and Drawing 17 (a) and (b) is a glass substrate of perpendicular propagation light and parallel propagation light, respectively. The wavelength dependence of the light extraction efficiency ⁇ is shown. It is a graph which shows the simulation result of the out light emission position in an example of the organic EL element which concerns on 4th Embodiment of this invention, (a), (b) is a glass substrate of perpendicular direction propagation light and parallel direction propagation light, respectively. The wavelength dependence of the light extraction efficiency ⁇ is shown.
  • FIG. 21 is a graph showing simulation results of an in emission position and an out emission position in an example of an organic EL element according to the sixth embodiment of the present invention
  • FIGS. 21A to 21C are vertical direction propagation light and parallel direction propagation light, respectively.
  • the wavelength dependence of light extraction efficiency (eta) to the glass substrate of light and random propagation light is shown.
  • FIG. 22A and FIG. 22C are graphs showing simulation results of in light emission positions and out light emission positions in an example of the organic EL device according to the seventh embodiment of the present invention, and FIGS. 22A to 22C are respectively vertical propagation light and parallel propagation light.
  • the wavelength dependence of light extraction efficiency (eta) to the glass substrate of light and random propagation light is shown.
  • FIG.23 (a) is a 50,000 times enlarged photograph of a 1st example
  • FIG.23 (b) Is a 3000 times enlarged photograph of the first example
  • FIG. 23C is a 50,000 times enlarged photograph of the second example
  • FIG. 23D is a 3000 times enlarged photograph of the second example.
  • the model structure used for the simulation of the organic EL element which concerns on 1st Embodiment of this invention is shown
  • Fig.24 (a) is a cross-sectional schematic diagram of the model structure
  • FIG. 25A is a graph showing a simulation result of the organic EL element according to the model structure shown in FIG. 24.
  • FIG. 25A shows the wavelength dependence of the light extraction efficiency ⁇ of the parallel propagation light to the glass substrate
  • FIG. ) Shows the wavelength dependence of the light extraction efficiency ⁇ of random propagation light up to the glass substrate.
  • 27 is a graph showing simulation results of the in-light emission position of the organic EL element according to the model structure shown in FIG. 26, and FIGS.
  • FIGS. 29 (a) to 29 (c) are glasses for vertically propagated light, parallel propagated light, and randomly propagated light, respectively.
  • the wavelength dependence of the light extraction efficiency ⁇ up to the substrate is shown.
  • the organic EL element exemplified below as an embodiment has a bottom emission type configuration including a substrate on the first electrode side as viewed from the organic layer, but a top emission type configuration including a substrate on the metal layer side as viewed from the organic layer. It is good also as a structure.
  • the first electrode is configured as an anode, but the first electrode may be configured as a cathode.
  • the organic EL device includes a first electrode, an organic layer including a light emitting layer made of an organic EL material, and a metal layer in this order on a substrate.
  • the first electrode is a transparent electrode made of a transparent conductive material
  • the metal layer is a second electrode.
  • the metal layer has a plurality of through-hole portions, and the first electrode side is the main light extraction side.
  • FIG. 1 is a schematic cross-sectional view for explaining an example of the organic EL element according to the first embodiment of the present invention.
  • An organic EL element 10 shown in FIG. 1 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 14 in this order on a substrate 11.
  • the anode 12 is a transparent electrode made of a transparent conductive material
  • the cathode 14 is a metal electrode made of a conductive metal material.
  • the cathode 14 is a bottom emission type organic EL element 10 having a plurality of through-hole portions 14A and configured to extract light mainly from the anode 12 side.
  • the organic EL element 10 of the present embodiment is a bottom emission type organic EL element that extracts light emitted from the light emitting layer mainly from the substrate 11 side. Therefore, the substrate 11 is a light-transmitting substrate and usually needs to be transparent to visible light.
  • transparent to visible light means that it is only necessary to transmit visible light having a wavelength emitted from the light emitting layer, and does not need to be transparent over the entire visible light region.
  • the transmittance in visible light of 400 to 700 nm is preferably 50% or more. More preferably, the transmittance is 70% or more.
  • the substrate 11 include a glass plate and a polymer plate.
  • the glass plate material include soda lime glass, barium / strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass, and quartz.
  • the polymer plate material include polycarbonate, polymethyl methacrylate, polyethylene terephthalate, polymethyl naphthalate, polyethylene naphthalate, polyether sulfide, polysulfone and the like.
  • the transmittance is preferably 50% or more and more preferably 70% or more with respect to the wavelength at which the emission spectrum has the maximum intensity.
  • an opaque material can be used in addition to the same material as described above.
  • a metal material such as stainless steel, Si, SiC, AlN, GaN, Nonmetallic materials such as GaAs and sapphire, and other substrate materials usually used in top emission type organic EL elements can be used.
  • a material having high thermal conductivity is preferably used for the substrate.
  • the thickness of the substrate 11 is appropriately set depending on the required mechanical strength, and is not limited, but is preferably 0.01 to 10 mm, more preferably 0.05 to 2 mm.
  • the cathode 14 is an electrode for injecting electrons into the light emitting layer, and it is preferable to use a material made of a metal, an alloy, a conductive compound, or a mixture thereof having a small work function. It is preferable to use a material having a work function of 1.9 eV or more and 5 eV or less so that the difference from the LUMO (Lowest Unoccupied Molecular Orbital) level of the organic layer 13 in contact with the cathode 14 does not become excessive.
  • materials such as single metals such as Au, Ag, Cu, Zn, and Al, alloys thereof, MgAg alloys, alloys of Al and alkali (earth) metals such as AlLi and AlCa, etc. can do.
  • the thickness of the cathode 14 is not particularly limited, but is, for example, 30 to 1000 nm, and preferably 100 to 1000 nm. If the thickness of the cathode 14 is less than 30 nm, the sheet resistance increases and the driving voltage rises. If the thickness of the cathode 14 is thicker than 1000 nm, heat and radiation damage during film formation, and mechanical damage due to film stress may accumulate in the electrode and the organic layer.
  • the cathode 14 includes a plurality of through-hole portions 14 ⁇ / b> A, and the bottom of each through-hole portion 14 ⁇ / b> A is closed with the organic layer 13.
  • the organic layer 13 has a structure that does not enter the through-hole portion 14A.
  • the inside of the through-hole portion may be filled with a gas, or may be filled with an organic material (the same material as the organic layer 13 or a different material may be used). Further, it may be filled with an insulating material or a metal oxide.
  • the refractive index of the medium inside the through-hole portion 14A is lower than that of the organic layer 13, it is easy to totally reflect at the interface between the organic layer 13 and the medium having a low refractive index. Can be improved.
  • the through-hole portion 14A penetrates the entire cathode 14 in the thickness direction.
  • Typical shapes of the through-hole portion 14A include a columnar shape, an elliptical column shape, a polygonal column shape, a truncated cone shape, a truncated pyramid shape, a hemispherical shape, and a shape in which these are combined.
  • the cross section may be either a straight shape or a curved shape. That is, neither the cross-sectional shape nor the planar shape of the through-hole portion 14A is limited.
  • the size of the through hole portion 14A can be defined by the minimum width and the maximum width of the through hole portion 14A in plan view. The minimum width refers to the diameter of the maximum circle included in the through hole portion 14A.
  • the maximum width means the diameter of the minimum circle that includes the through-hole portion 14A.
  • the through-hole portion 14A is a perfect circle, the minimum width and the maximum width match.
  • the size of the through-hole portion 14A is not particularly limited as long as the through-hole is formed.
  • the minimum width of the through hole portion 14A is preferably 100 nm or more, for example, and the interval between the through hole portions can be set to 50 nm or more, for example.
  • the interval refers to the shortest distance not including the through hole portion between adjacent through hole portions 14A.
  • the maximum width of the through-hole portion 14A is preferably as large as possible within a range not overlapping with the other through-hole portions 14A.
  • the arrangement of the plurality of through-hole portions 14A may be periodic or aperiodic.
  • the occupied area ratio ratio of the bottom area of the through-hole portion 14A to the light-emitting region (a region combining an in-light-emitting region and an out-light-emitting region described later) in plan view of the through-hole portion 14A is 20 to 90% is preferable.
  • the bottom area of the through-hole portion 14A in plan view refers to the area of the through-hole portion 14A at the interface between the cathode 14 and the organic layer 13.
  • the anode 12 is an electrode for applying a voltage between the anode 14 and injecting holes from the anode 12 into the light emitting layer. It is preferable to use a material made of a metal, an alloy, a conductive compound, or a mixture thereof having a high work function. It is preferable to use a material having a work function of 4 eV or more and 6 eV or less so that the difference from the HOMO (Highest Occupied Molecular Orbital) level of the organic layer 13 in contact with the anode 12 does not become excessive.
  • the material of the anode 12 is not particularly limited as long as it is a translucent and conductive material, and a known material can be used.
  • conductive high conductivity doped with transparent inorganic oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), tin oxide, zinc oxide, conductive polymers such as PEDOT: PSS, polyaniline, and arbitrary acceptors.
  • transparent inorganic oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), tin oxide, zinc oxide, conductive polymers such as PEDOT: PSS, polyaniline, and arbitrary acceptors.
  • transparent carbon materials such as molecules, carbon nanotubes, and graphene.
  • the anode 12 can be formed on the substrate 11 by, for example, a sputtering method, a vacuum deposition method, a coating method, an ion plating method, or the like.
  • the thickness of the anode 12 is not limited, but is, for example, 10 to 2000 nm, and preferably 50 to 1000 nm.
  • the thickness of the anode 12 is greater than 2000 nm, the flatness of the organic layer 13 cannot be maintained, and the transmittance of the anode 12 decreases. If the thickness of the anode 12 is less than 10 nm, the film thickness non-uniformity may increase, or the sheet resistance may increase and the in-plane luminance may become non-uniform.
  • the organic layer 13 may include a light emitting layer made of an organic EL material, a hole injection layer, a hole transport layer, an electron injection layer, an electron transport layer, or the like individually or in combination.
  • the hole injection layer is a layer that assists hole injection from the anode 12 to the organic layer 13, and its ionization energy is usually as low as 5.5 eV or less.
  • a material that injects holes into the organic layer 13 with lower electric field strength is preferable.
  • the material for forming the hole injection layer is not particularly limited as long as it can perform the above function, and any material can be selected and used from known materials.
  • the hole transport layer is a layer that transports holes to the light emitting region and has a high hole mobility.
  • the material for forming the hole transport layer is not particularly limited as long as it can perform the above functions, and any material can be selected and used from known materials.
  • the electron injection layer is a layer that assists electron injection from the cathode 14 to the organic layer 13. As such an electron injection layer, a material that injects electrons into the organic layer 13 with lower electric field strength is preferable.
  • the material for forming the electron injection layer is not particularly limited as long as it can perform the above function, and any material can be selected and used from known materials.
  • the electron transport layer is a layer that transports electrons to the light emitting region and has a high electron mobility. The material for forming the electron transport layer is not particularly limited as long as it can perform the above functions, and any material can be selected and used from known materials.
  • the organic layer 13 can be formed by a known method.
  • the organic layer 13 may be formed by a dry process such as an evaporation method or a transfer method, or a spin coating method, a spray coating method, a die coating method, a gravure printing method, or the like.
  • the film may be formed by a wet process.
  • the thickness of the organic layer 13 is not limited, but is, for example, 50 to 2000 nm, and preferably 100 to 1000 nm. When the thickness of the organic layer 13 is less than 50 nm, quenching other than the SPP coupling by the cathode metal occurs, such as a decrease in internal quantum efficiency due to a punch-through current and a lossy surface wave mode coupling. When the thickness of the organic layer 13 is greater than 2000 nm, the drive voltage increases.
  • the organic EL element 10 of the present embodiment When the organic EL element 10 of the present embodiment is energized so as to apply a potential difference between the anode 12 and the cathode 14, the light emitting layer inside the organic layer 13 emits light, so that the main is via the anode 12 made of a transparent conductive material. In addition, light can be extracted from the substrate 11 side.
  • the amount of light extracted from the anode 12 side, which is a transparent electrode is smaller, but the light passing through the through-hole portion 14A of the cathode 14 can also be extracted from the cathode 14 side. .
  • the organic layer 13 may emit light at any position in the layered region sandwiched between the anode 12 and the cathode 14, and can be described by dividing into in emission and out emission as follows.
  • the light emission form inside the organic layer 13 the light emission form in a region where the organic layer 13 is not seen from the plan view when the organic layer 13 is present, that is, a region overlapping the through hole portion 14 ⁇ / b> A of the cathode 14 is referred to as in light emission in this specification.
  • a light emission form in a region where the cathode 14 exists, that is, a region overlapping with a region where the through-hole portion 14A is not formed is referred to as out light emission in this specification.
  • the organic layer 13 is generally strong on the shortest path connecting layers (anode 12 and cathode 14) made of a highly conductive material. Emits light.
  • a region that emits light strongly is a lower region of the cathode 14 where the distance between the anode 12 and the cathode 14 is short (out emission).
  • a buffer layer having high conductivity between the cathode 14 having the through-hole portion 14A and the organic layer 13 in contact with the organic layer 13 a conventional element having no through-hole portion 14A in the cathode 14 is formed.
  • the entire light emitting layer can emit light of the same degree regardless of the arrangement of the through holes 14A of the cathode 14.
  • the conductive medium is formed so as to fill a part of the through-hole portion 14A.
  • the highly conductive buffer layer is not limited as long as no plasmon is generated.
  • the buffer layer is formed using a material used as an electron injection layer, for example.
  • This layer may have a function of increasing the electron injection efficiency by lowering the electron injection barrier from the cathode to the organic layer.
  • Specific materials include, for example, metals such as alkali metals (Na, K, Rb, Cs), alkaline earth metals (Mg, Ca, Sr, Ba), and rare earth metals (Pr, Sm, Eu, Yb). Materials selected from fluorides, chlorides, oxides and mixtures of two or more can be used.
  • a mixture of an organic compound having a high electron affinity such as 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline (basocuproin (BCP)) and a material having a high electron donating property such as Cs is also preferably used.
  • the thickness of the buffer layer is preferably from 0.1 to 50 nm, more preferably from 0.1 to 20 nm, and even more preferably from 0.5 to 10 nm.
  • the cathode 14 that has the through-hole portion 14A.
  • the electrode having the through-hole portion may be used as the anode.
  • the highly conductive buffer layer is formed by using, for example, a material used as a hole injection layer.
  • a material used as a hole injection layer for example, conductive polymers such as polyacetylene, polyparaphenylene, polyaniline, polythiophene, polyparaphenylene vinylene; organic compounds such as arylamine and phthalocyanine; vanadium oxide, zinc oxide, molybdenum oxide, ruthenium oxide, oxidation An oxide such as titanium may be used. These materials can improve conductivity by injecting carriers that can be freely doped and doped.
  • the buffer layer may be formed by stacking different hole injection layer materials.
  • dopants include a mixture of poly (3,4-ethylenedioxythiophene) (PEDOT) and polystyrene sulfonic acid (PSS) (PEDOT: PSS), polyaniline (PANI) and polystyrene sulfonic acid (PSS).
  • PANI polyaniline
  • PSS polystyrene sulfonic acid
  • a mixture (PANI: PSS) etc. are mentioned.
  • a material which is used as an anode and which is not a metal may be used.
  • indium tin oxide ITO: Indium Tin Oxide: In 2 O 3
  • ITO Indium Tin Oxide: In 2 O 3
  • indium zinc oxide IZO: Indium Zinc Oxide: In 2 O 3 —ZnO
  • indium molybdenum oxide IMO: Indium Molybdenum
  • zinc oxide ZnO
  • aluminum zinc oxide AZO: Aluminum Zinc Oxide: Al 2 O 3 —ZnO
  • gallium zinc oxide GZO: Gallium Zinc Oxide: Ga 2 O 3 —ZnO
  • molybdenum oxide MoO 3
  • fluorine-doped tin oxide FTO: Fluorine Tin Oxide: F / SnO 2
  • a material containing at least one oxide of niobium-doped titanium oxide NTO: Niobium Titanium Oxide: Nb / TiO 2
  • antimony-doped tin oxide ATO: Antimony Tin Oxide Sb / SnO 2
  • NTO Niobium Titanium Oxide: Nb / TiO 2
  • ATO Antimony-doped tin oxide
  • the light emission position in in light emission has a larger distance from the cathode 14 than the light emission position in out light emission, and is in a region corresponding to the through-hole portion 14A, so that the amount of energy transfer to the SPP mode is small. That is, the generation of SPP mode light is small and plasmon loss due to this is reduced.
  • the distance between the light emitting position and the cathode 14 be 100 nm or more, and the light extraction efficiency can be improved.
  • the size of the inner diameter of the through hole portion 14A is important, and the minimum width of the through hole portion 14A can be set to 100 nm or more, for example, in the range of 100 to 4000 nm, and preferably in the range of 200 to 2000 nm. be able to. As described above, the minimum width of the through-hole portion 14A can be defined by the diameter of the maximum circle included in the through-hole portion 14A in plan view.
  • the inside of the through-hole portion 14A is a void, and is filled with a gas such as nitrogen, for example, and the material of the organic layer 13 is not formed inside the through-hole portion 14A.
  • a gas such as nitrogen
  • the material of the organic layer 13 is not formed inside the through-hole portion 14A.
  • it may be configured to be filled with the organic layer 13 or other materials.
  • the through-hole portion 14A if a material having a refractive index lower than that of the organic layer 13 is present in the through-hole portion 14A, light incident on the interface between the organic layer 13 and the low refractive index material at a critical angle or more is totally reflected. Therefore, when the through hole 14A is filled with a material having a lower refractive index than the organic layer 13, the propagation distance of the guided light propagating through the organic layer 13 is shortened, so that the light loss is reduced and the light extraction efficiency is improved. Since it improves, it is preferable.
  • a gas such as nitrogen has a lower refractive index than the organic material constituting the organic layer, this corresponds to the case of this low refractive index material, compared to the case where the inside of the through-hole portion 14A is filled with an organic material or a high refractive index material. Also, the light extraction efficiency is improved.
  • the flat portion having a period of 100 nm or more is intermittent in the interface in contact with the organic layer 13 in the through-hole portion 14A of the cathode 14. Therefore, the mode light generated at the interface is radiated into the organic layer 13 where the interface is interrupted (converted into an optical mode propagating in the organic layer). For this reason, the light extraction efficiency is improved by providing the cathode 14 with through-hole portions 14A having a minimum width of 100 nm or more and an interval of 50 nm or more.
  • the cathode 14 has the through-hole portion 14A, there is an advantage that the light that has become the SPP mode light can be taken out, and the portion of the organic layer 13 corresponding to the through-hole portion 14A has a cathode (metal).
  • the layer) 14 is an area that does not exist in the vicinity and does not become SPP mode light, so that the light extraction efficiency is improved. Since the cathode 14 has the through-hole portion 14A, light generated in the organic layer 13 can be extracted outside the cathode 14 through the through-hole portion 14A.
  • the organic layer 13 is covered with a cathode (metal layer) 14 made of a conductive metal material in a region other than the through-hole portion 14A, the light extracted through the through-hole portion 14A is emitted in light or out. Regardless, less light is extracted from the anode 12 side. The same applies to the case where the electrode having the through-hole portion is used as the anode.
  • the substrate 11 is provided on the side opposite to the organic layer 13 of the anode 12 that is a transparent electrode, and is a bottom emission type in which light is extracted from the substrate 11 side that is the anode 12 side.
  • a top emission type in which the stacking relationship of the cathode 14 is reversed may be employed.
  • a structure in which the cathode 14 is formed on the substrate and the organic layer 13 and the anode 12 are formed thereon may be employed.
  • the cathode 14 is made of a metal material, and a through-hole portion 14A is formed in the cathode 14.
  • the transparent electrode is the anode 12 and the metal electrode having the through-hole portion 14A is the cathode 14, but the former may be a cathode and the latter may be the anode.
  • the organic layer is extracted to the outside through a cathode that is mainly transparent.
  • the through-hole portion 14A in the cathode 14 As a method of forming the through-hole portion 14A in the cathode 14, a method of forming a hole by using a mask or the like at the time of film formation by vapor deposition or the like, and a cathode in which a through-hole portion is separately formed are bonded by a transfer method or the like as will be described later. There are methods. After forming a layer having a certain film thickness by vapor deposition or the like, the through-hole portion can also be formed by ablation or the like using a laser or the like.
  • FIG. 2 is a diagram illustrating an example of an image display device including the organic EL element 10.
  • An image display device 100 shown in FIG. 2 is a so-called passive matrix type image display device.
  • a sealing plate 116 and a sealing material 118 are provided.
  • a plurality of anode wirings 104 are formed on the substrate 11 of the organic EL element 10.
  • the anode wirings 104 are arranged in parallel at a constant interval.
  • the anode wiring 104 is made of a transparent conductive film, and is made of, for example, ITO (Indium Tin Oxide).
  • the thickness of the anode wiring 104 can be set to 100 to 150 nm, for example.
  • An anode auxiliary wiring 106 is formed on the end of each anode wiring 104.
  • the anode auxiliary wiring 106 is electrically connected to the anode wiring 104.
  • the anode auxiliary wiring 106 functions as a terminal for connecting to the external wiring on the end portion side of the substrate 1, and the anode wiring is connected from the driving circuit (not shown) provided outside through the anode auxiliary wiring 106.
  • a current can be supplied to 104.
  • the anode auxiliary wiring 106 is made of a metal film having a thickness of 500 to 600 nm, for example.
  • a plurality of cathode wirings 108 are provided on the organic EL element 10.
  • the plurality of cathode wirings 108 are arranged so as to be parallel to each other and orthogonal to the anode wiring 104.
  • the cathode wiring 108 can be made of Al or an Al alloy.
  • the thickness of the cathode wiring 108 is, for example, 100 to 150 nm.
  • a cathode auxiliary wiring (not shown) is provided at the end of the cathode wiring 108, similarly to the anode auxiliary wiring 106 for the anode wiring 104, and is electrically connected to the cathode wiring 108. Therefore, a current can flow between the cathode wiring 108 and the cathode auxiliary wiring.
  • an insulating film 110 is formed on the substrate 11 so as to cover the anode wiring 104.
  • a rectangular opening 120 is provided in the insulating film 110 so as to expose a part of the anode wiring 104.
  • the plurality of openings 120 are arranged in a matrix on the anode wiring 104.
  • the organic EL element 10 is provided between the anode wiring 104 and the cathode wiring 108. That is, each opening 120 becomes a pixel. Accordingly, a display area is formed corresponding to the opening 120.
  • the film thickness of the insulating film 110 can be, for example, 100 to 200 nm
  • the size of the opening 120 can be, for example, 100 ⁇ m ⁇ 100 ⁇ m.
  • the organic EL element 10 is located between the anode wiring 104 and the cathode wiring 108 in the opening 120.
  • the anode 12 of the organic EL element 10 is connected to the anode wiring 104 and the cathode 14 is connected to the cathode wiring 108.
  • the thickness of the organic EL element 10 can be set to 150 to 200 nm, for example.
  • On the insulating film 110 a plurality of cathode partition walls 112 are formed along a direction perpendicular to the anode wiring 104.
  • the cathode partition 112 plays a role for spatially separating the plurality of cathode wirings 108 so that the wirings of the cathode wirings 108 do not conduct with each other.
  • the cathode wiring 108 is disposed between the adjacent cathode partition walls 112.
  • the size of the cathode partition 112 for example, a configuration having a height of 2 to 3 ⁇ m and a width of 10 ⁇ m can be employed.
  • the substrate 11 is bonded with a sealing plate 116 and a sealing material 118 interposed therebetween. Thereby, the space in which the organic EL element 10 is provided can be sealed, and the organic EL element 10 can be prevented from being deteriorated by moisture in the air.
  • a sealing plate 116 for example, a glass substrate having a thickness of 0.7 to 1.1 mm can be used.
  • a current can be supplied to the organic EL element 10 through the anode auxiliary wiring 106 and the cathode auxiliary wiring (not shown) by a driving device (not shown) to cause the light emitting layer to emit light. Then, light can be emitted from the substrate 11 through the substrate 11.
  • the target image can be displayed on the image display device 100 by controlling the light emission and non-light emission of the organic EL element 10 corresponding to the above-described pixel by the control device.
  • FIG. 3 is a diagram illustrating an example of a lighting device including the organic EL element 10. 3 is installed adjacent to the organic EL element 10 described above and the substrate 11 (see FIG. 1) of the organic EL element 10, and is connected to the anode 12 (see FIG. 1). And a terminal 203 connected to the cathode 14 (see FIG. 1) through the wiring layer 15, and a lighting circuit 201 for driving the organic EL element 10 connected to the terminal 202 and the terminal 203.
  • the lighting circuit 201 has a DC power source (not shown) and a control circuit (not shown) inside, and supplies current between the anode 12 and the cathode 14 of the organic EL element 10 through the terminal 202 and the terminal 203. Then, the organic EL element 10 is driven, the light emitting layer emits light, the light is emitted through the substrate 11, and used as illumination light.
  • the light emitting layer may be made of a light emitting material that emits white light, and each of the organic EL elements 10 using light emitting materials that emit green light (G), blue light (B), and red light (R). A plurality of them may be provided so that the combined light is white.
  • FIG. 4 shows a second embodiment of the organic EL element according to the present invention.
  • An organic EL element 20 shown in FIG. 4 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 24 in this order on a substrate 11.
  • the anode 12 is a transparent electrode made of a transparent conductive material
  • the cathode 24 is a metal electrode made of a conductive metal material.
  • the cathode 24 is a bottom emission type organic EL element 20 having a plurality of non-penetrating holes 24A formed from the surface on the organic layer 13 side and configured to extract light mainly from the anode 12 side. .
  • the difference between the organic EL element 20 of the second embodiment and the previous organic EL element 10 is that the hole 24A formed in the cathode 24 does not have a shape that penetrates the entire thickness direction of the cathode 24, but the thickness of the cathode 24. It is the point which is formed in the recessed part shape so that a part of the length may be left as the base part 24B, and has a shape in which one side of the hole part 24A is closed.
  • the organic EL element 20 has the same structure as that of the organic EL element 10 described above, and thus the description of the similar structure is omitted.
  • the hole portion 24A has a non-penetrating recess shape formed so as to dig a part of the cathode 24 in the thickness direction.
  • a typical shape of the hole portion 24A like the through hole portion of the first embodiment, a cylindrical shape, an elliptical column shape, a polygonal column shape, a conical shape, a pyramid shape, a truncated cone shape, a truncated pyramid shape, and a hemispherical shape , And a shape in which these are combined.
  • the cross section may be linear or curved. That is, the cross-sectional shape and the planar shape of the hole 14A are not limited.
  • the size of the hole 24A can be defined by the minimum width and the maximum width of the hole 24A in plan view.
  • the minimum width refers to the diameter of the maximum circle included in the hole 24A.
  • the maximum width refers to the diameter of the minimum circle that includes the hole 24A. When the hole 24A is a perfect circle, the minimum width matches the maximum width.
  • the minimum width of the hole 24A is preferably 200 nm or more, and the minimum width is more preferably 300 nm or more.
  • the interval between the holes 24A can be set to 50 nm or more, for example.
  • the interval refers to the shortest distance not including the hole portion between the adjacent hole portions 24A. It is preferable that the maximum width of the hole 24A is as large as possible without overlapping the other hole 24A.
  • the arrangement of the plurality of hole portions 24A may be periodic or aperiodic. Also in the organic EL element 20 provided with the hole 24A, the distance between the cathode 24 and the light emitting position becomes large at the in light emitting position, and it can be prevented that the light becomes SPP mode light. Furthermore, since the concavo-convex structure is formed on the cathode 24 which is an electrode made of metal, it is possible to take out the light which has become the SPP mode light.
  • the hole 24A is formed, and the base 24B, which is a part of the cathode 24, is formed above the hole 24A. Therefore, the emitted light is reflected from the cathode 24 without being taken out from the cathode 24 side. Is done. As a result, more light is extracted to the anode 12 side than the through hole portion 14A of the first embodiment.
  • the depth of the hole 24A is preferably 100 nm or more, more preferably 150 nm or more, and even more preferably 200 nm or more.
  • the size of the hole 24A in the second embodiment is the same as the through hole 14A in the first embodiment.
  • the ratio of the bottom area of the hole portion 24A to the region (the region combining the region and the out emission region) is preferably in the range of 20 to 90%.
  • the bottom area of the hole 24A in plan view refers to the area of the hole 24A at the interface between the cathode 24 and the organic layer 13.
  • a method of forming the hole 24A in the cathode 24 for example, a method of forming a hole at the time of film formation by vapor deposition or the like using a mask, a method of bonding a cathode having a separate hole formed by a transfer method or the like as described later, etc. There are bonding methods such as a transfer method. A method of sticking a layer having a constant film thickness on the upper surface after forming the through hole may be used. As a method for forming the through hole, the method shown in the first embodiment can be used.
  • the cathode may have both through holes and holes.
  • FIG. 5 shows a third embodiment of the organic EL element according to the present invention.
  • the organic EL element 30 shown in FIG. 5 includes a light emitting layer made of an anode (first electrode) 12 and an organic EL material on a substrate 11.
  • the anode 12 is a transparent electrode made of a transparent conductive material
  • the cathode 14 is a metal electrode made of a conductive metal material.
  • the cathode 14 is a bottom emission type organic EL element 30 having a plurality of through-hole portions 14A and configured to extract light mainly from the anode 12 side.
  • the same materials and thicknesses as those of the first embodiment can be used for the substrate 11, the anode 12, and the cathode 14.
  • the difference from the organic EL element 10 of the first embodiment is that the organic layer 23 is located between the anode (first electrode) 12 and the cathode (metal layer, second electrode) 14.
  • the first dielectric layer 27 having a low refractive index is provided, the first dielectric layer 27 has a plurality of hole portions 27A, and the organic layer 23 covers at least the inner surface of the hole portion 27A.
  • the formation position of the through hole portion 14 ⁇ / b> A and the formation position of the hole portion 27 ⁇ / b> A overlap in a plan view of the organic EL element 30. Accordingly, the first dielectric layer 27 is formed below the region where the cathode 14 exists.
  • the organic layer 23 is formed below the through-hole portion 14A, but the edge portion 23a of the organic layer 23 is formed below the edge portion 14a of the cathode 14 located around the through-hole portion 14A.
  • the first dielectric layer 27 is formed with the same thickness as the organic layer 23.
  • the organic layer 23 is formed on the first dielectric layer 27, and the organic layer 23 formed in the hole 27A. May be formed continuously with the organic layer 23 on the first dielectric layer 27. That is, as shown in FIGS. 15A and 15B described later, the organic layer 23 is formed in a portion covering the inner surface of the hole 27A and a region sandwiched between the first dielectric layer 27 and the entire cathode 14. It is good also as a structure which has the layered part formed. Furthermore, the formation position of the through hole 14A and the formation position of the hole portion 27A shown in FIG. 5 may be shifted from each other when the organic EL element 30 is viewed in plan.
  • the material of the first dielectric layer 27 is not particularly limited as long as it is light transmissive and has a refractive index lower than that of the organic layer 23.
  • a metal fluoride such as SOG (typical refractive index: 1.25), MgF 2 (typical refractive index: 1.38), PTFE, etc.
  • the thickness of the first dielectric layer 27 is not particularly limited, but is, for example, 10 to 2000 nm, and preferably 50 to 1000 nm.
  • the thickness of the first dielectric layer 27 is less than 10 nm, the amount of light passing through the first dielectric layer 27 is small with respect to the emitted light traveling in the organic layer 23, so that guided mode light is difficult to be extracted. Become. If the thickness of the first dielectric layer 27 is greater than 2000 nm, it is difficult to maintain the flatness of the organic layer 23.
  • the refractive index of the organic layer 23 refers to the average refractive index of all the layers constituting the organic layer 23 including the light emitting layer made of an organic EL material.
  • the shape of the hole 27A is not particularly limited as long as it has an effect of refracting light toward the substrate 11 on the inner surface thereof. From the viewpoint of refracting the guided mode light in a direction that is more perpendicular to the substrate surface (a plane parallel to the light emitting surface of the organic EL element), a shape in which the area on the cathode 14 side is smaller than the area on the anode 12 side is preferable.
  • the inner side surface is configured to be arranged perpendicular to the substrate surface, but is not limited to such a configuration.
  • the angle of the inner surface of the hole 27A with respect to the substrate surface is preferably 30 ° or more, more preferably 45 ° or more, and still more preferably 60 ° or more.
  • the organic layer 23 may include a hole injection layer, a hole transport layer, an electron injection layer, an electron transport layer, and the like in addition to a light emitting layer made of an organic EL material. The thing similar to what was used in embodiment can be used.
  • the organic EL element 30 of the present embodiment having the through-hole portion 14A When the organic EL element 30 of the present embodiment having the through-hole portion 14A is energized so as to apply a potential difference between the anode 12 and the cathode 14, the light emitting layer inside the organic layer 23 emits light. Light can be extracted from the substrate 11 side through the anode 12 made of the above.
  • the waveguide mode light can be extracted more efficiently by the first dielectric layer 27.
  • the light extraction efficiency is improved as compared with the first embodiment.
  • light emission is particularly intense at the in emission position mainly from the organic layer 23 located below the through-hole portion 14A. Therefore, light emission at the in emission position is obtained, and light extraction efficiency is suppressed by suppressing SPP mode light. Can be high.
  • the cathode 14 is not a through-hole, but the upper surface of the cathode is connected to the non-through-hole shown in the second embodiment. 24A may be formed. Even in this case, the effect of forming the hole 24A in the cathode 24 shown in the second embodiment and the effect of forming the first dielectric layer 27 shown in the third embodiment can be obtained together.
  • the anode 12 is continuously drilled (a hole that does not penetrate) is formed continuously with the plurality of holes 27A formed in the first dielectric layer 27, and the anode 12 is continuously formed with the hole 27A.
  • a form in which a through hole is formed, and a form in which the substrate is continuously drilled (a hole that does not pass through) is formed continuously with the hole 27A and the anode 12 may be employed.
  • “Fourth Embodiment” 6 and 7 show a fourth embodiment of the organic EL element according to the present invention.
  • the organic EL element 40 shown in FIGS. 6 and 7 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 14 on a substrate 11. In this order.
  • a protective layer 44 made of a transparent conductive material such as ITO is provided between the cathode 14 and the organic layer 13.
  • the anode 12 is a transparent electrode made of a transparent conductive material
  • the cathode 14 is a metal electrode made of a conductive metal material.
  • the cathode 14 is a bottom emission type organic EL element 40 having a plurality of through-hole portions 14A and configured to extract light mainly from the anode 12 side.
  • the organic EL element 40 of the present embodiment is different from the organic EL element 10 of the first embodiment in that a protective layer 44 is provided.
  • the protective layer 44 is formed for the purpose of preventing the organic layer 13 from being damaged by energy such as heat when the through-hole portion 14 ⁇ / b> A is formed in the cathode 14. It is possible to prevent the organic layer 13 from being damaged by heat or pressure when the organic EL element 40 is formed using a method in which the cathode 14 separately formed with the through-hole portion 14A is bonded by a transfer method or the like.
  • any material can be used for the protective layer 44 as long as it is not a metal that generates SPP.
  • a conductive material in addition to the protective effect described above, there is an advantage that the light emitting region can be both in light emission and out light emission.
  • the same materials and thicknesses as those of the first embodiment can be used for the substrate 11, the anode 12, the organic layer 13, and the cathode 14.
  • the cathode 14 is not penetrating the upper surface of the cathode shown in the second embodiment instead of the through hole.
  • the hole 24A may be formed. Even in this case, the effect of forming the hole 24A in the cathode 24 shown in the second embodiment and the effect of forming the protective layer 41 shown in the fourth embodiment can be obtained together.
  • “Fifth Embodiment” 8 and 9 show a fifth embodiment of the organic EL element according to the present invention.
  • 8 and 9 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, a cathode (second electrode) 54, and a dielectric material.
  • An insulating layer 55 and a metal layer 56 are provided in this order.
  • Both the anode 12 and the cathode 54 are transparent electrodes made of a transparent conductive material.
  • the metal layer 56 is a bottom emission type organic EL element 50 having a plurality of through-hole portions 56A and configured to extract light mainly from the anode 12 side.
  • the cathode 54 is a transparent electrode made of a transparent conductive material, and the cathode 54 is the same as the protective layer 44 of the fourth embodiment described above when the through-hole portion 56A is formed in the metal layer 56. Bring about the effect.
  • the material of the cathode 54 may be a known transparent conductive material such as a metal oxide or an organic conductive material, not a metal material that generates SPP.
  • a material having a high refractive index compared to the refractive index in the insulating layer 55 or the through-hole portion 56 ⁇ / b> A and a high refractive index compared to the refractive index of the organic layer 13 is preferable. Furthermore, by setting the above refractive index, the cathode 54 / insulating layer 55 / metal layer 56 have an Otto type arrangement in the out emission region, so that the light extraction efficiency can be improved.
  • the metal layer 56 is not a through hole but a metal layer such as the cathode 24 shown in the second embodiment. You may form the hole part 24A which the upper surface connected and does not penetrate. Even in this case, the effect of forming the hole 24A in the cathode 24 shown in the second embodiment and the effect shown in the fifth embodiment can be obtained together.
  • the metal layer of one organic EL element may have both a through hole and a hole.
  • FIG. 10 shows a sixth embodiment of the organic EL element according to the present invention.
  • An organic EL element 60 shown in FIG. 10 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 64 in this order on a substrate 11.
  • the anode 12 is a transparent electrode made of a transparent conductive material
  • the cathode 64 is a metal electrode made of a conductive metal material.
  • the cathode 64 is a bottom emission type organic EL element 60 which has a plurality of non-penetrating holes 64A formed from the surface on the organic layer 13 side, and is configured to mainly extract light from the anode 12 side to the outside. is there.
  • the same materials and thicknesses as those of the first embodiment can be used for the substrate 11, the anode 12, and the organic layer 13.
  • the organic EL element 60 of the present embodiment is obtained by bonding the cathode 64 with the hole 64A separately formed so as to be in contact with the organic layer 13 using a transfer method or the like.
  • An Al layer or the like is separately formed on a substrate (not shown) and the like, and the cathode 64 is attached to the organic layer 13 by bonding.
  • a known method can be used as the bonding method.
  • a layer having a constant film thickness may be bonded to the upper surface by the above method.
  • the layer to be bonded may be a material different from that of the side surface portion, but is preferably a layer that reflects light. Increasing the amount of reflected light can increase the amount of light extracted from the substrate 11 side. This embodiment is particularly effective when it is difficult to form a through hole or a hole in the cathode on the organic layer.
  • the cathode 64 of the present embodiment has hole portions 64A formed with the same size and spacing as the hole portions 24A formed in the cathode 24 of the second embodiment, but the cathode 64 is the cathode 24 of the second embodiment. It is easy to make it thicker by several times, and it is easy to make the hole 64A deeper than the hole 24A of the cathode 24 of the second embodiment.
  • the hole 64A is not deep enough to penetrate the entire thickness direction of the cathode 64, but is formed in a concave shape so as to leave a part of the cathode 64 as the base 64B. However, a form in which a through hole is formed may be used. .
  • the cathode 64 is in close contact with the organic layer 13 so that the opening side 64a of the hole 64A is closed by the organic layer 13.
  • the organic EL element 60 has the same structure as that of the organic EL element 10 described above.
  • the in-light emission position that overlaps the hole 64 ⁇ / b> A in plan view in the organic layer 13 has a larger distance from the cathode 64 than the out emission position, and the out-light emission position that does not overlap the hole 64 ⁇ / b> A.
  • the in light emission position is a region corresponding to the hole 64A with a large distance from the cathode 64, energy transfer to the SPP mode is small, generation of SPP mode light is small, and plasmon loss is small.
  • the size of the inner diameter of the hole 64A is important, and the generation of the SPP mode light can be reduced at a position where the distance between the in light emission position and the cathode 64 is 100 nm or more.
  • the light extraction efficiency can be improved.
  • the depth of the hole 64A is 100 nm or more, more preferably 150 nm or more, and even more preferably 200 nm or more, the distance from the cathode 64 can be surely ensured at the in emission position. That is, the energy transfer to the SPP mode at the in emission position is small, the generation of SPP mode light is small, and the plasmon loss is small.
  • the occupied area ratio (ratio of the bottom area of the hole 64A to the light emitting region (in light emitting region + out light emitting region)) in plan view of the hole 64A of the present embodiment is preferably in the range of 20 to 90%.
  • the bottom area of the hole 64A in plan view refers to the area of the hole 64A at the interface between the cathode 64 and the organic layer 13.
  • “Seventh Embodiment” 11 and 12 show a seventh embodiment of the organic EL element according to the present invention.
  • An organic EL element 70 shown in FIG. 11 includes an anode (first electrode) 72, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 14 in this order on a substrate 11.
  • the anode 12 is a transparent electrode made of a transparent conductive material
  • the cathode 14 is a metal electrode made of a conductive metal material.
  • the cathode 14 is a bottom emission type organic EL element 70 having a plurality of through-hole portions 14A and configured to extract light mainly from the anode 12 side.
  • the same materials and thicknesses as those of the first embodiment can be used for the substrate 11, the anode 72, the organic layer 13, and the cathode 14.
  • the structure of the seventh embodiment is different from the organic EL element 10 of the first embodiment in that the anode 72 includes a plurality of holes 72A, which is lower than the refractive index of the anode 72 and higher than the refractive index of the organic layer 13.
  • the second dielectric layer 77 having a low refractive index is provided in the plurality of holes 72A.
  • the material of the second dielectric layer 77 is not particularly limited as long as it is light transmissive and has a refractive index lower than that of the anode 72 and lower than that of the organic layer 13.
  • the material of the anode 72 is ITO (typical refractive index: 1.82) and the refractive index of the organic layer is 1.72, SOG (typical refractive index: 1.25), MgF 2 Metal fluorides (typical refractive index: 1.38), organic fluorine compounds such as PTFE, oxides such as SiO 2 (typical refractive index: 1.45), various low-melting glasses, porosity Examples include materials such as substances.
  • the thickness of the second dielectric layer 77 is not particularly limited, but is, for example, 10 to 2000 nm, and preferably 50 to 1000 nm.
  • the thickness of the second dielectric layer 77 is less than 10 nm, the amount of light passing through the dielectric layer 77 relative to the emitted light traveling in the organic layer 13 is small, so that waveguide mode light is difficult to be extracted. . If the thickness of the second dielectric layer 77 is thicker than 2000 nm, it becomes difficult to maintain the flatness of the organic layer 13.
  • the shape of the hole 72A is not particularly limited as long as it has an effect of refracting light toward the substrate 11 on the inner surface thereof. From the viewpoint of refracting the guided mode light in a direction more perpendicular to the substrate surface, a shape having a smaller area on the cathode 14 side than an area on the anode 72 side is preferable. From the viewpoint of strongly refracting the guided mode light and taking it out with a smaller propagation distance, a shape having a small bottom area is preferable. In the example illustrated in FIG. 11, the inner side surface is configured to be disposed perpendicular to the substrate surface, but is not limited to such a configuration.
  • the angle of the inner side surface of the hole 72A with respect to the substrate surface is preferably 30 ° or more, more preferably 45 ° or more, and still more preferably 60 ° or more.
  • the positions of the cathode side through-hole portion 14A and the anode side second dielectric layer 77 coincide, but the present embodiment is not limited to this.
  • the through-hole portion 14A may coincide with the anode 72 in plan view or may be displaced.
  • the in light emission position is a region corresponding to the through-hole portion 14A with a large distance from the cathode 14, the generation of SPP mode light is small and the plasmon loss is small.
  • the size of the inner diameter of the through hole portion 14A is important, and the generation of the SPP mode light is reduced at a position where the distance between the in light emission position and the cathode 14 is 100 nm or more. And the light extraction efficiency can be improved. Therefore, the minimum width of the through hole portion 14A is preferably in the range of 100 to 1000 nm, and more preferably in the range of 150 to 800 nm. In the structure shown in FIGS.
  • the present invention is not limited to this, and the cathode 14 has not the through hole but the upper surface of the cathode shown in the second embodiment.
  • a connected non-penetrating hole 24A may be formed. Even in this case, the effect of forming the hole 24A in the cathode 24 shown in the second embodiment and the effect shown in the seventh embodiment can be obtained together.
  • the minimum width of the hole is preferably in the range of 100 to 1000 nm, and more preferably in the range of 150 to 800 nm.
  • FIGS. 24A and 24B show a finite difference time domain (FDTD: FiniteFiDifference Time) in order to grasp the influence of the light source position on the light extraction efficiency with respect to the through hole portion 14A of the organic EL element of the first embodiment.
  • FDTD FiniteFiDifference Time
  • FIG. 24A is a schematic cross-sectional view of the model structure used for the calculation
  • FIG. 24B is an enlarged perspective view of the through hole portion.
  • the FDTD method is an analysis method for tracking the time change of the electromagnetic field at each point in space by differentiating Maxwell's equation describing the time change of the electromagnetic field spatially and temporally. More specifically, a calculation method is adopted in which light emission in the light emitting layer is regarded as radiation from a minute dipole, and time variation of the radiation (electromagnetic field) is tracked.
  • the calculation shows that the direction of the micro dipole is X direction (direction parallel to the substrate surface), Z direction (direction perpendicular to the substrate surface) and random direction (dipole direction is randomly oriented in XYZ space) I went about the case.
  • the light radiated from the dipole in the XY direction is mainly light propagating in the direction perpendicular to the substrate surface
  • the light radiated from the dipole in the Z direction is mainly light propagated in the direction parallel to the substrate surface. is there.
  • the light emitted from the X-direction dipole is the vertical propagation light
  • the light emitted from the Z-direction dipole is the parallel propagation light
  • the light emitted from the random dipole is the random propagation light. I will call it.
  • the propagation light in the parallel direction is light that is confined inside the device as waveguide mode light or SPP mode light in a normal organic EL device having no through-hole portion. Therefore, by calculating the degree of improvement in the extraction efficiency of the parallel propagation light, the high light extraction performance of the organic EL element of the present invention can be evaluated. Random propagation light has a light emission state similar to the light emission state of an actual organic EL device, and the magnitude of the external quantum efficiency of the actually created device is estimated by comparing the light extraction efficiency of this random propagation light. It is possible. Therefore, unless otherwise specified, the high light extraction efficiency with respect to random propagation light is used as a reference for evaluating the high light extraction performance.
  • the model structure of the organic EL element 82 of the first embodiment shown in FIGS. 24A and 24B is the same as the structure shown in FIG.
  • the substrate 11 is made of glass, and a refractive index of 1.52 is used.
  • the refractive index is set to 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated by a Lorentz model.
  • the refractive index of the organic layer 13 1.72 was used.
  • the cathode 14 is made of Al, and the refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and the other wavelengths are extrapolated by the Drude model.
  • the through-hole portions 14A (set to a radius of 800 nm) formed in the cathode 14 are arranged in a square lattice with a period of 2000 nm, and the medium in the through-hole portion 14A is nitrogen, and the refractive index is 1.0.
  • the film thicknesses of the anode 12, the organic layer 13, and the cathode 14 were 150 nm, 100 nm, and 100 nm, respectively.
  • the center of the through-hole portion 14A is set as the origin (0), and the light source is simulated at a position away from this position by 200, 400, 600, 800, 1000 nm in the in-plane direction. It was.
  • the light source positions when the light source positions are 0 nm (in light emission) and 1000 nm (out light emission) are indicated by stars.
  • a simulation was also performed for the same configuration (standard) except that the through-hole portion 14A was not formed in the cathode 14.
  • FIG. 25A shows the wavelength dependence of the light extraction efficiency ⁇ of parallel direction propagation light to the glass substrate
  • FIG. 25B shows the wavelength dependence of the light extraction efficiency ⁇ of random direction propagation light to the glass substrate.
  • the light extraction efficiency is improved wherever the light emission position is, compared to the case where there is no through-hole portion 14A (standard).
  • SPP can be suppressed, and the effect of forming the through-hole portion 14A can be confirmed.
  • the emitted light generated at the lower portion of the cathode (metal layer) 14 is captured as SPP mode light at the upper cathode (metal layer) 14, but is re-radiated at the through-hole portion 14 A as described above to extract the SPP. Light extraction efficiency is improved.
  • the light emitting part in the organic EL element is in the vicinity of the shortest path between the electrodes.
  • the lower part of the cathode (metal layer) 14 emits light (that is, out light emission) in a normal organic material.
  • the buffer layer is formed of a material having good conductivity on the cathode (metal layer) 14 side of the organic layer 13, the entire surface can emit light.
  • it can be handled by forming an insulating layer in a part between the cathode (metal layer) and the organic layer.
  • the light extraction efficiency when light is emitted from the entire surface is an integrated result of calculation using each part as a light source. As a result, it can be said that the light extraction is improved by forming the through-hole portion in any light emission mode. The same can be said for the organic EL element of the second embodiment in which a hole that does not penetrate is formed.
  • FIGS. 13 and 14 show the results of computer simulation of the light extraction efficiency ⁇ using the same FDTD method as in the previous example in order to confirm the effect of the organic EL element of the first embodiment.
  • the model structure of the organic EL element 10 of the first embodiment used in the simulation is the same as the structure shown in FIG.
  • the substrate 11 is made of glass, and a refractive index of 1.52 is used.
  • the anode 12 is made of ITO, and the refractive index is 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model.
  • the cathode 14 is made of Al.
  • the refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.
  • the medium in the through-hole portion 14A formed in the cathode 14 is nitrogen, and a refractive index of 1.0 is used.
  • the thicknesses of the anode 12, the organic layer 13, and the cathode 14 were 150 nm, 100 nm, and 100 nm, respectively.
  • FIG. 13 is a simulation result of the in-light emission position corresponding to the through-hole portion 14A.
  • FIGS. 13A to 13C show light extraction from the vertically propagated light, parallel propagated light, and randomly propagated light to the glass substrate, respectively. The wavelength dependence of the efficiency ⁇ is shown.
  • FIG. 14 shows the simulation results of the out emission position corresponding to the through-hole portion 14A.
  • FIGS. 14A to 14C show the light extraction of the vertical propagation light, parallel propagation light, and random propagation light to the glass substrate, respectively. The wavelength dependence of the efficiency ⁇ is shown. From the results shown in FIGS.
  • the light extraction efficiency is improved when the through-hole portion 14 ⁇ / b> A is formed as compared with the case where there is no through-hole portion (standard). It can also be seen that the light extraction performance is further improved by setting the radius of the through-hole portion 14A to 50 nm or more, more preferably 100 nm or more.
  • FIGS. 15A and 15B show model structures of the organic EL elements 80 and 81 used in the simulation in order to confirm the effect of the organic EL element of the third embodiment.
  • FIG. 16 shows the result of computer simulation of the light extraction efficiency ⁇ for the element having the structure shown in FIG. 15 using the FDTD method similar to the previous example.
  • the anode 32, the first dielectric layer 27, and the organic layer 23 are formed on the substrate 11, and the hole 32A formed in the anode 32 and the hole 27A formed in the first dielectric layer 27 are formed.
  • An example of the organic EL element 80 formed so as to be filled with a part of the organic layer 23 and provided with the cathode 14 having the through-hole portion 14A on the organic layer 23 is shown.
  • the organic layer 23 has a layered portion.
  • FIG. 16 shows the result of computer simulation of the light extraction efficiency ⁇ using the organic EL element 80 and the organic EL element 81 as models.
  • “F.15. (A)” is the result of the organic EL element 80
  • “F.15. (B)” is the result of the organic EL element 81.
  • “Pole only” is the result of the same configuration as the organic EL element 81 except that the first dielectric layer 27 is not provided
  • “standard” is “hole only” except that the through hole portion 14A is not formed in the cathode 14. Is the result of the same configuration.
  • Various conditions of the simulation are as described in FIG. FIG. 16 shows the simulation result of the in-light emission position, and FIGS.
  • 16A to 16C show the wavelength dependence of the light extraction efficiency ⁇ of the vertically propagating light, the parallel propagating light, and the random propagating light to the glass substrate, respectively.
  • the organic layer 23 is introduced by forming a hole portion up to the first dielectric layer 27 or the anode 32 below the structure having only the through hole portion formed in the cathode 14 (hole only).
  • the light extraction efficiency was improved in the structure (organic EL elements 80 and 81). This is because a waveguide mode light extraction structure in which holes are formed in the anode and the first dielectric layer and a part of the organic layer 23 is introduced into these holes is introduced. It can be seen that the structure shown in FIG. 15A (organic EL element 80) is slightly higher in light extraction efficiency than the structure shown in FIG. 15B (organic EL element 81).
  • the model structure of the organic EL element 40 of the fourth embodiment used in the simulation is the same as the structure shown in FIG.
  • the substrate 11 is made of glass, and a refractive index of 1.52 is used.
  • the anode 12 is made of ITO, and the refractive index is 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model.
  • the cathode 14 is made of Al.
  • the refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.
  • the through holes 14A (set to a radius of 800 nm) formed in the cathode 14 are arranged in a square lattice with a period of 2000 nm, the medium in the through holes 14A is nitrogen, and the refractive index is 1.0.
  • the film thicknesses of the anode 12, the organic layer 13, and the cathode 14 were 150 nm, 100 nm, and 100 nm, respectively.
  • the protective layer 44 is made of ITO, the above-described refractive index is used, and a simulation is performed for each of the film thicknesses of 50 nm, 100 nm, and 150 nm. For comparison, a simulation was also performed on a model structure (standard) using a cathode in which the protective layer 44 and the through-hole portion 14A were not formed.
  • FIG. 17 shows simulation results of the in-light emission position corresponding to the through-hole portion 14A
  • FIGS. 17A and 17B show the wavelength of light extraction efficiency ⁇ of vertically propagated light and parallel propagated light to the glass substrate, respectively.
  • FIG. 18 is a simulation result of the out emission position corresponding to the through-hole portion 14A
  • FIGS. 18A and 18B show the wavelength of light extraction efficiency ⁇ of vertically propagating light and parallel propagating light to the glass substrate, respectively.
  • Indicates dependency Since the result of the random propagation light can be understood from the result of the vertical propagation light and the horizontal propagation light, it can be seen that the light extraction efficiency is improved. Since this structure emits light entirely, it can be said that the light extraction efficiency is improved overall.
  • the model structure of the organic EL element 50 of the fifth embodiment used in the simulation is the same as the structure shown in FIG.
  • the substrate 11 is made of glass, and a refractive index of 1.52 is used.
  • the anode 12 is made of ITO, and the refractive index is 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model.
  • the cathode 54 is made of ITO, and the above values are used.
  • the insulating layer 55 is made of SiO 2 , and the refractive index is 1.45. Assuming that the metal layer 56 is made of Al, the refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.
  • the through-hole portions 56A (set to a radius of 800 nm) formed in the metal layer 56 were arranged in a square lattice pattern with a period of 2000 nm.
  • the medium in the through hole portion 56A of the metal layer 56 is nitrogen, and the refractive index is 1.0.
  • the film thicknesses of the anode 12, the cathode 54, the organic layer 13, and the metal layer 56 were 150 nm, 50 nm, 100 nm, and 100 nm, respectively.
  • As the film thickness of the insulating layer 55 (SiO 2 ) simulation was performed in each of 50 nm, 100 nm, and 200 nm. For comparison, a simulation was also performed for the same case (standard) as the above model structure except that neither the insulating layer 55 nor the metal layer 56 was formed and the cathode was made of Al.
  • FIG. 19 is a simulation result of the in light emission position corresponding to the through-hole portion 56A on the Bottom side
  • FIGS. 19A and 19B are light extraction efficiencies of vertically propagated light and parallel propagated light to the glass substrate, respectively.
  • the wavelength dependence of ⁇ is shown.
  • FIG. 20 is a simulation result of the out emission position corresponding to the through-hole portion 56A on the Bottom side
  • FIGS. 20A and 20B are light extraction efficiencies to the glass substrate of vertical direction propagation light and parallel direction propagation light, respectively.
  • the wavelength dependence of ⁇ is shown. Since the random propagation light can be understood from the results of the vertical propagation light and the horizontal propagation light, it can be seen that the light extraction property is improved. Since this structure emits light entirely, it can be said that the light extraction efficiency is improved overall.
  • FIG. 21 shows the result of computer simulation of the light extraction efficiency ⁇ using the FDTD method similar to the previous example in order to confirm the effects of the organic EL elements of the second embodiment and the sixth embodiment.
  • the model structure of the organic EL element 60 of the sixth embodiment used in the simulation is the same as the structure shown in FIG.
  • the substrate 11 is made of glass, and a refractive index of 1.52 is used.
  • the anode 12 is made of ITO, and the refractive index is 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model.
  • the cathode 64 is made of Al, the refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.
  • the holes 64A (set to a radius of 800 nm and a depth of 800 nm) formed in the cathode 64 were assumed to have a cylindrical shape (col) or a hemispherical shape (hemi), and were arranged in a square lattice with a period of 2000 nm.
  • the medium in the hole 64A of the cathode 64 is nitrogen and the refractive index is 1.0.
  • the layer thicknesses of the anode 12 and the organic layer 13 were 150 nm and 100 nm, respectively. For comparison, a simulation was also performed for a case (standard) in which a cathode in which no hole was formed was used.
  • FIG. 21 is a simulation result of the in light emission position corresponding to the hole 64A and the out light emission position not corresponding to the hole 64A on the Bottom side.
  • FIGS. 21 (a) to 21 (c) are vertical propagation light and parallel propagation light, respectively.
  • the wavelength dependence of light extraction efficiency (eta) to the glass substrate of light and random propagation light is shown.
  • eta light extraction efficiency
  • FIG. 21 indicate light emission positions, _col indicates a cylindrical shape, and _hemi indicates a hemispherical shape.
  • FIG. 22 shows the result of computer simulation of the light extraction efficiency ⁇ using the same FDTD method as in the previous example in order to confirm the effect of the organic EL element of the seventh embodiment.
  • the model structure of the organic EL element 70 of the seventh embodiment used in the simulation is the same as the structure shown in FIG.
  • the substrate 11 is made of glass, and a refractive index of 1.52 is used.
  • the refractive index is set to 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model.
  • the cathode 14 is made of Al.
  • the refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.
  • the through-hole portions 14A (set to a radius of 800 nm and a depth of 800 nm) formed in the cathode 14 were arranged in a square lattice with a period of 2000 nm.
  • the medium in the through-hole portion 14A of the cathode 14 was nitrogen, and the refractive index was 1.0.
  • the hole 72A (radius 800 nm) was formed in a square lattice pattern with a period of 2000 nm with the same center position in plan view as the through hole 14A of the cathode 14.
  • a second dielectric layer 77 was formed in the hole 72 A of the anode 72.
  • the second dielectric layer is made of SiO 2 and has a refractive index of 1.45.
  • the film thicknesses of the anode 72, the organic layer 13, and the cathode 14 were 150 nm, 100 nm, and 100 nm, respectively.
  • a simulation was also performed in the case where a model structure (standard) in which neither the through-hole portion nor the hole portion was formed in the cathode 14 and the anode 72 was used.
  • the in light emission position (“in” in the figure) overlaps with the position of the through-hole part 14A formed in the cathode 14, and the out light emission position (“out” in the figure) extends from the through-hole part 14A. This corresponds to the shifted position.
  • “inP” indicates that the through-hole portion 14A and the hole portion 72A overlap each other in plan view
  • “outP” indicates that the through-hole portion 14A and the hole portion 72A are shifted from each other in plan view.
  • FIG. 22 is a simulation result of the in light emission position corresponding to the hole 14A and the out light emission position not corresponding to the hole 14A on the Bottom side.
  • FIGS. 22 (a) to 22 (c) are vertical direction propagation light and parallel direction propagation light, respectively. The wavelength dependence of light extraction efficiency (eta) to the glass substrate of light and random propagation light is shown.
  • FIG. 23 shows a structure in which an ITO anode and an organic layer are formed on a glass substrate, an ITO film having a thickness of 50 nm is formed, and a 100 nm-thick Al film is stacked thereon as a cathode.
  • a SEM photograph scanning electron micrograph showing a result of a test of forming a through-hole portion in the Al layer as a cathode by irradiation with the second harmonic of a Yb-YAG laser of It is.
  • FIG. 23 (a) is a 50,000 times magnified photograph of the through hole formed in the Al layer
  • FIG. 23 (b) is a 3000 magnified photograph of the through hole.
  • FIG. 23 (c) is a 50,000 times enlarged photograph of a through hole portion formed in an Al layer having the same structure as above
  • FIG. 23 (d) is a 3000 times enlarged photograph of the through hole portion. It can be seen that the through-hole portion can be processed.
  • the samples shown in FIGS. 23A and 23B are the results under the conditions of a laser output of 75 mW and an incident angle of the laser beam of 14 degrees.
  • the samples shown in FIGS. The results are obtained under the conditions of an output of 150 mW and a laser beam incident angle of 6 degrees. When these structures were energized, it was confirmed that they actually emitted light.
  • FIG. 26 shows an anode 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode 64 in this order on a substrate 11 used for confirming the effect of the organic EL element of the sixth embodiment.
  • the model structure of the organic EL element 83 provided is shown.
  • the cathode 64 is formed with the same radius and cycle as the hole 64A formed in the cathode 64 of the previous sixth embodiment. The difference from the previous example is that a part of the organic layer 13 is embedded in the hole 64A.
  • the organic layer 13 is composed of a portion in which the hole 64 is embedded and a layered portion.
  • the light extraction efficiency ⁇ was computer-simulated using the same FDTD method as in the previous example based on the conditions shown in FIG. In this simulation, each simulation was performed when the depth h of the hole 64A was 50, 100, 200, 400, 600, and 800 nm. For comparison, a simulation was also performed for a model structure in which a hole was not formed in the cathode (standard).
  • FIG. 27 shows the simulation results of the in-light emission position corresponding to the hole 64A.
  • FIGS. 27A to 27C show the light extraction efficiency of the vertical propagation light, parallel propagation light, and random propagation light to the glass substrate, respectively. The wavelength dependence of ⁇ is shown.
  • the light extraction efficiency improves as the hole 64A is deepened. It can be seen that when the inside of the hole 64A is a medium having a low refractive index, the light extraction performance is remarkably improved.
  • the depth of the hole 64A is preferably 50 nm or more, more preferably 100 nm or more, and most preferably 150 nm or more.
  • FIG. 28 is the same as FIG. 26 and used for confirming the effect of the organic EL device of the sixth embodiment.
  • the anode 12 the organic layer 13 including a light emitting layer made of an organic EL material
  • the cathode The structure of the organic EL element 84 which comprises 64 is shown.
  • the cathode 64 is formed with the same radius and cycle as the hole 64A formed in the cathode 64 of the previous sixth embodiment.
  • the medium in the hole 64 was nitrogen and the refractive index was 1.0.
  • the light extraction efficiency ⁇ was computer-simulated using the same FDTD method as in the previous example based on the conditions shown in FIG.
  • each simulation was performed when the depth h of the hole 64A was 50, 100, 200, 400, 600, and 800 nm.
  • a simulation was also performed for a model structure (standard) in which no hole was formed in the cathode.
  • FIG. 29 is a simulation result of the in light emission position corresponding to the hole 64A
  • FIGS. 29A to 29C show the light extraction efficiency of the vertical direction propagation light, parallel direction propagation light, and random propagation light to the glass substrate, respectively.
  • the wavelength dependence of ⁇ is shown. From the results shown in FIG. 29, when the medium of the hole 64A is nitrogen and the refractive index is 1.0, the light extraction efficiency decreases as the height increases in the vertical propagation light, and increases in the parallel propagation light. It can be seen that the higher the value, the higher the efficiency. From FIG. 29 (b), it can be seen that the SPP is hardly excited if the depth of the hole 64A is 400 nm or more, and it is considered that the SPP can be suppressed although there is some excitation at 200 nm.
  • Organic EL elements 81.

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Abstract

This organic EL element (10) is sequentially provided, on a substrate (11), with a positive electrode (first electrode) (12), an organic layer (13) which includes a light emitting layer that is formed of an organic EL material, and a negative electrode (metal layer, second electrode) (14). The positive electrode (12) is a transparent electrode that is formed of a transparent conductive material. The negative electrode (14) is formed of a conductive metal material and has a plurality of through hole portions (14A). This organic EL element (10) is configured such that light is mainly extracted from the positive electrode (12) side to the outside.

Description

有機EL素子並びにそれを備えた画像表示装置及び照明装置ORGANIC EL ELEMENT AND IMAGE DISPLAY DEVICE AND LIGHTING DEVICE EQUIPPED

 本発明は、有機EL素子並びにそれを備えた画像表示装置及び照明装置に関するものである。本願は、2012年12月28日に、日本に出願された特願2012-289021に基づき優先権を主張し、その内容をここに援用する。 The present invention relates to an organic EL element, and an image display device and an illumination device including the organic EL element. This application claims priority based on Japanese Patent Application No. 2012-289021 filed in Japan on December 28, 2012, the contents of which are incorporated herein by reference.

 有機EL素子(有機エレクトロルミネッセンス素子)は、広視野角、高速応答、鮮明な自発光表示等の特徴を有し、また、薄型軽量で低消費電力であること等の理由から、次世代の照明装置や画像表示装置等の柱として期待されている。
 有機EL素子は、有機発光層で発生した光が取り出される向きに応じて、支持基板側から光が取り出されるボトムエミッション型と、支持基板の反対側から光が取り出されるトップエミッション型とに分けられる。
Organic EL devices (organic electroluminescence devices) have features such as wide viewing angle, high-speed response, clear self-luminous display, etc., and they are next-generation lighting because they are thin, lightweight and have low power consumption. It is expected as a pillar of devices and image display devices.
Organic EL elements are classified into a bottom emission type in which light is extracted from the support substrate side and a top emission type in which light is extracted from the opposite side of the support substrate, depending on the direction in which the light generated in the organic light emitting layer is extracted. .

 ボトムエミッション型の有機EL素子において、発光層で発光した光のうち、透明基板に垂直に入射した光は透明基板を透過して素子の外部に取り出される。発光層で発光した光のうち、透明基板、例えば、ガラス(屈折率:1.52)と空気(屈折率:1.0)との界面に臨界角以下の小さい入射角(光線と入射面の法線がなす角度)で入射した光は、その界面で屈折して有機EL素子の外部に取り出される。これらの光を外部モード(External Mode)光ということができる。
 これに対して、発光層で発光した光のうち、透明基板と空気との界面に臨界角より大きい入射角で入射した光はその界面で全反射されて素子の外部に取り出されず、最終的に材料に吸収されうる。この光を基板モード(Substrate Mode)光ということができ、これによる損失を基板損失という。
 発光層で発光した光のうち、透明導電性酸化物からなる陽極(例えば、酸化インジウム錫(ITO(屈折率:1.82))と透明基板(例えば、ガラス(屈折率:1.52))との界面や発光層と陽極間に存在する可能性のある高屈折率層(入射側)と低屈折率層(出射側)界面に、臨界角より大きい入射角で入射した光もその界面で全反射されて有機EL素子の外部に取り出されず、最終的に材料に吸収されうる。この光を導波モード(Waveguide Mode)光ということができ、これによる損失を導波損失という。
 発光層で発光した光のうち、金属陰極等の金属表面に入射して金属陰極の自由電子振動と結合し、表面プラズモンポラリトン(SPP;Surface Plasmon Polariton)として金属陰極の表面に捕捉された光も有機EL素子の外部に取り出されず、最終的に熱として材料に吸収されうる。この光をSPPモード光(SPP Mode)ということができ、これによる損失をプラズモン損失という。
In a bottom emission type organic EL element, light incident on the transparent substrate out of the light emitted from the light emitting layer passes through the transparent substrate and is extracted outside the element. Of the light emitted from the light emitting layer, a transparent substrate, for example, a small incident angle (light ray and incident surface) of a critical angle or less at the interface between glass (refractive index: 1.52) and air (refractive index: 1.0). Light incident at an angle formed by a normal line is refracted at the interface and extracted outside the organic EL element. These lights can be referred to as external mode lights.
On the other hand, of the light emitted from the light emitting layer, the light incident on the interface between the transparent substrate and air at an incident angle larger than the critical angle is totally reflected at the interface and is not taken out of the device, and finally Can be absorbed by the material. This light can be referred to as substrate mode light, and the resulting loss is referred to as substrate loss.
Of the light emitted from the light emitting layer, an anode made of a transparent conductive oxide (for example, indium tin oxide (ITO (refractive index: 1.82)) and a transparent substrate (for example, glass (refractive index: 1.52)) Light incident on the interface between the high refractive index layer (incident side) and the low refractive index layer (exit side) that may exist between the light emitting layer and the anode at an incident angle greater than the critical angle The light is totally reflected and is not taken out of the organic EL element, but can be finally absorbed by the material.This light can be referred to as waveguide mode light, and the loss due to this is referred to as waveguide loss.
Of the light emitted from the light emitting layer, light incident on a metal surface such as a metal cathode is coupled with free electron vibration of the metal cathode, and the light captured on the surface of the metal cathode as surface plasmon polariton (SPP) It is not taken out of the organic EL element and can be finally absorbed by the material as heat. This light can be referred to as SPP mode light, and the loss due to this is referred to as plasmon loss.

 有機EL素子の光取り出し効率(発光層で発光した光に対して素子の外部に取り出される光の割合)は一般に20%程度に留まっているとされている。すなわち、発光層で発光した光のうち、約80%が損失となっており、これらの損失を低減して光の取り出し効率を向上させることが大きな課題となっている。
 ここで、基板モード光の取り出しについては透明基板上に光拡散シートなどを設けることで対処できることが知られている。導波モード光の取り出しについては屈折率の高い(屈折率;1.7~2.0)の透明基板を用いることで対処できることが知られている。
The light extraction efficiency of the organic EL element (ratio of the light extracted outside the element with respect to the light emitted from the light emitting layer) is generally considered to be about 20%. That is, about 80% of the light emitted from the light emitting layer is lost, and it is a big problem to reduce these losses and improve the light extraction efficiency.
Here, it is known that the extraction of the substrate mode light can be dealt with by providing a light diffusion sheet or the like on the transparent substrate. It is known that waveguide mode light can be extracted by using a transparent substrate having a high refractive index (refractive index: 1.7 to 2.0).

 SPPモード光の光取り出しに関し、陽極と陰極間に発光層を設けた構造において発光層の近傍又は内部にプラズモン共鳴を生じさせる微粒子を配置し、プラズモンによる発光遷移により発光増強を図る構成が知られている(特許文献1)。
 金属陰極の表面に捕捉されたSPPモード光を取り出す方法として、金属陰極の表面に50nm程度の周期的な凹凸構造を形成した構成も知られている(特許文献2)。
 金属陰極表面にSPPとして補足されるのを抑制する方法として、有機層膜厚を増加することにより金属陰極と発光部の距離を離す構成も知られている(非特許文献1)。
Regarding light extraction of SPP mode light, a structure in which fine particles that generate plasmon resonance are arranged in the vicinity of or inside a light emitting layer in a structure in which a light emitting layer is provided between an anode and a cathode, and light emission enhancement by luminescence transition by plasmon is known. (Patent Document 1).
As a method for extracting the SPP mode light captured on the surface of the metal cathode, a configuration in which a periodic uneven structure of about 50 nm is formed on the surface of the metal cathode is also known (Patent Document 2).
As a method for preventing the surface of the metal cathode from being supplemented as SPP, a configuration in which the distance between the metal cathode and the light emitting portion is increased by increasing the thickness of the organic layer is also known (Non-Patent Document 1).

特開2010-238775号公報JP 2010-238775 A 特開2006-313667号公報JP 2006-313667 A

Appl. Phys. Lett., 2010, 97, 253305Appl. Phys. Lett., 2010, 97, 253305

 しかしながら、SPPモード光を抑制する構造、SPPモード光を取り出すための構造などについては研究開発が始められた状況であり、上述の従来技術以外にSPPモード光を抑制して光取り出し効率を向上できる構造の提供が望まれている。 However, research and development has been started on a structure for suppressing SPP mode light and a structure for extracting SPP mode light, and the light extraction efficiency can be improved by suppressing SPP mode light in addition to the above-described conventional technology. It is desirable to provide a structure.

 本発明は、上記事情に鑑みなされたものであり、SPPモード光を抑制でき、光取り出し効率を向上させた有機EL素子並びにそれを備えた画像表示装置及び照明装置を提供することを目的とする。 The present invention has been made in view of the above circumstances, and an object thereof is to provide an organic EL element that can suppress SPP mode light and improve light extraction efficiency, and an image display device and an illumination device including the organic EL element. .

(1)対向する一対の電極間に発光層を含む有機層が挟まれた有機EL素子であり、一方の電極が金属電極であり、他方の電極が透明電極であって、主に前記透明電極側から外部に光を取り出す構成であり、前記金属電極に複数の貫通孔部または前記有機層側の表面から形成された複数の貫通しない穴部を有することを特徴とする有機EL素子。
(2)第1電極、発光層を含む有機層、金属層をこの順に具備する有機EL素子であって、前記第1電極は透明導電材料からなる透明電極であり、前記金属層は第2電極であり、前記金属層は複数の貫通孔部または前記有機層側の表面から形成された複数の貫通しない穴部を有し、前記第1電極側が主たる光取出し側であることを特徴とする有機EL素子。
(3)前記第1電極が基板上に形成された陽極であり、前記金属層が陰極であることを特徴とする(2)に記載の有機EL素子。
(4)前記貫通孔部の最小幅が100nm以上であることを特徴とする(2)または(3)に記載の有機EL素子。
(5)前記貫通しない穴部の最小幅が200nm以上であり、かつ、隣接する前記貫通しない穴部の間隔が50nm以上であることを特徴とする(2)~(4)のいずれか一項に記載の有機EL素子。
(6)前記貫通しない穴部の最大幅が前記間隔以上であることを特徴とする(5)に記載の有機EL素子。
(7)前記金属層の膜厚が50~1000nmの範囲であることを特徴とする(2)~(6)のいずれか一項に記載の有機EL素子。
(8)前記有機層と前記金属層との間に保護層を有することを特徴とする(2)~(7)のいずれか一項に記載の有機EL素子。
(9)前記金属層が前記有機層に接することを特徴とする(2)~(7)のいずれか一項に記載の有機EL素子。
(10)前記第1電極と前記金属層との間に、前記有機層の屈折率よりも低い屈折率を有し、複数の孔部を備えた第1誘電体層を具備し、前記有機層は少なくとも前記孔部の内側面を覆うことを特徴とする(2)~(9)のいずれか一項に記載の有機EL素子。
(1) An organic EL element in which an organic layer including a light emitting layer is sandwiched between a pair of electrodes facing each other, one electrode is a metal electrode, and the other electrode is a transparent electrode, mainly the transparent electrode An organic EL element having a configuration in which light is extracted from the side to the outside, and the metal electrode has a plurality of through holes or a plurality of non-through holes formed from the surface on the organic layer side.
(2) An organic EL element comprising a first electrode, an organic layer including a light emitting layer, and a metal layer in this order, wherein the first electrode is a transparent electrode made of a transparent conductive material, and the metal layer is a second electrode. The metal layer has a plurality of through-holes or a plurality of non-through holes formed from the surface on the organic layer side, and the first electrode side is a main light extraction side. EL element.
(3) The organic EL element according to (2), wherein the first electrode is an anode formed on a substrate, and the metal layer is a cathode.
(4) The organic EL element according to (2) or (3), wherein a minimum width of the through hole is 100 nm or more.
(5) Any one of (2) to (4), wherein a minimum width of the non-penetrating hole is 200 nm or more, and an interval between the non-penetrating holes adjacent to each other is 50 nm or more. The organic EL element as described in.
(6) The organic EL element according to (5), wherein the maximum width of the hole not penetrating is not less than the interval.
(7) The organic EL element according to any one of (2) to (6), wherein the thickness of the metal layer is in the range of 50 to 1000 nm.
(8) The organic EL device according to any one of (2) to (7), wherein a protective layer is provided between the organic layer and the metal layer.
(9) The organic EL element according to any one of (2) to (7), wherein the metal layer is in contact with the organic layer.
(10) A first dielectric layer having a refractive index lower than that of the organic layer and having a plurality of holes is provided between the first electrode and the metal layer, and the organic layer The organic EL element according to any one of (2) to (9), characterized in that covers at least the inner surface of the hole.

(11)前記第1電極は複数の第1電極孔部を備え、該第1電極の屈折率より低く且つ前記有機層の屈折率よりも低い屈折率を有する第2誘電体層を前記第1電極孔部の内部に備えたことを特徴とする(2)~(10)のいずれか一項に記載の有機EL素子。
(12)第1電極、発光層を含む有機層、第2電極、絶縁層、金属層をこの順に具備する有機EL素子であって、前記第1電極及び前記第2電極はいずれも透明導電材料からなる透明電極であり、前記金属層は複数の貫通孔部または前記有機層側の表面から形成された複数の貫通しない穴部を有し、前記第1電極側が主たる光取出し側であることを特徴とする有機EL素子。
(13)(1)~(12)のいずれか一項に記載の有機EL素子を備えたことを特徴とする画像表示装置。
(14)(1)~(12)のいずれか一項に記載の有機EL素子を備えたことを特徴とする照明装置。
(11) The first electrode includes a plurality of first electrode holes, and a second dielectric layer having a refractive index lower than a refractive index of the first electrode and lower than a refractive index of the organic layer is provided as the first dielectric layer. The organic EL device according to any one of (2) to (10), wherein the organic EL device is provided inside an electrode hole.
(12) An organic EL element including a first electrode, an organic layer including a light emitting layer, a second electrode, an insulating layer, and a metal layer in this order, both of the first electrode and the second electrode being a transparent conductive material The metal layer has a plurality of through holes or a plurality of non-through holes formed from the surface on the organic layer side, and the first electrode side is a main light extraction side. A characteristic organic EL element.
(13) An image display device comprising the organic EL element according to any one of (1) to (12).
(14) An illuminating device comprising the organic EL element according to any one of (1) to (12).

 本発明によれば、SPPモード光を抑制して光取り出し効率を向上させた有機EL素子並びにそれを備えた画像表示装置及び照明装置を提供できる。 According to the present invention, it is possible to provide an organic EL element that suppresses SPP mode light and improves light extraction efficiency, and an image display device and an illumination device including the organic EL element.

本発明の第1実施形態に係る有機EL素子の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the organic EL element which concerns on 1st Embodiment of this invention. 本発明に係る有機EL素子を備えた画像表示装置の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the image display apparatus provided with the organic EL element which concerns on this invention. 本発明に係る有機EL素子を備えた照明装置の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the illuminating device provided with the organic EL element which concerns on this invention. 本発明の第2実施形態に係る有機EL素子の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the organic EL element which concerns on 2nd Embodiment of this invention. 本発明の第3実施形態に係る有機EL素子の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the organic EL element which concerns on 3rd Embodiment of this invention. 本発明の第4実施形態に係る有機EL素子の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the organic EL element which concerns on 4th Embodiment of this invention. 本発明の第4実施形態に係る有機EL素子の貫通孔部の配置を示す斜視略図である。It is a schematic perspective view which shows arrangement | positioning of the through-hole part of the organic EL element which concerns on 4th Embodiment of this invention. 本発明の第5実施形態に係る有機EL素子の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the organic EL element which concerns on 5th Embodiment of this invention. 本発明の第5実施形態に係る有機EL素子の貫通孔部の配置を示す斜視略図である。It is a schematic perspective view which shows arrangement | positioning of the through-hole part of the organic EL element which concerns on 5th Embodiment of this invention. 本発明の第6実施形態に係る有機EL素子の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the organic EL element which concerns on 6th Embodiment of this invention. 本発明の第7実施形態に係る有機EL素子の一例を示す断面模式図である。It is a cross-sectional schematic diagram which shows an example of the organic EL element which concerns on 7th Embodiment of this invention. 本発明の第7実施形態に係る有機EL素子の貫通孔部の配置を示す斜視略図である。It is a schematic perspective view which shows arrangement | positioning of the through-hole part of the organic EL element which concerns on 7th Embodiment of this invention. 本発明の第1実施形態に係る有機EL素子の一例におけるin発光位置のシミュレーション結果を示すグラフであり、図13(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。14 is a graph showing simulation results of in-light emission positions in an example of the organic EL device according to the first embodiment of the present invention, and FIGS. 13A to 13C are vertical propagation light, parallel propagation light, and random propagation, respectively. The wavelength dependence of the light extraction efficiency (eta) to the glass substrate of light is shown. 本発明の第1実施形態に係る有機EL素子の一例におけるout発光位置のシミュレーション結果を示すグラフであり、図14(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。15 is a graph showing simulation results of out emission positions in an example of the organic EL device according to the first embodiment of the present invention, and FIGS. 14A to 14C are vertical propagation light, parallel propagation light, and random propagation, respectively. The wavelength dependence of the light extraction efficiency (eta) to the glass substrate of light is shown. 本発明の第3実施形態に係る有機EL素子のシミュレーションに用いたモデル構造を示すもので、図15(a)はその一例を示す断面模式図、図15(b)は他の例を示す断面模式図である。The model structure used for the simulation of the organic EL element which concerns on 3rd Embodiment of this invention is shown, FIG.15 (a) is a cross-sectional schematic diagram which shows the example, FIG.15 (b) is a cross section which shows another example. It is a schematic diagram. 図15に示すモデル構造に係る有機EL素子のin発光位置のシミュレーション結果を示すグラフであり、図16(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。FIG. 16 is a graph showing simulation results of the in-light emission position of the organic EL element according to the model structure shown in FIG. 15, and FIGS. 16 (a) to 16 (c) are glasses of vertical propagation light, parallel propagation light, and random propagation light, respectively. The wavelength dependence of the light extraction efficiency η up to the substrate is shown. 本発明の第4実施形態に係る有機EL素子の一例におけるin発光位置のシミュレーション結果を示すグラフであり、図17(a)、(b)はそれぞれ垂直方向伝播光、平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。It is a graph which shows the simulation result of in light emission position in an example of the organic EL element concerning a 4th embodiment of the present invention, and Drawing 17 (a) and (b) is a glass substrate of perpendicular propagation light and parallel propagation light, respectively. The wavelength dependence of the light extraction efficiency η is shown. 本発明の第4実施形態に係る有機EL素子の一例におけるout発光位置のシミュレーション結果を示すグラフであり、図18(a)、(b)はそれぞれ垂直方向伝播光、平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。It is a graph which shows the simulation result of the out light emission position in an example of the organic EL element which concerns on 4th Embodiment of this invention, (a), (b) is a glass substrate of perpendicular direction propagation light and parallel direction propagation light, respectively. The wavelength dependence of the light extraction efficiency η is shown. 本発明の第5実施形態に係る有機EL素子の一例におけるin発光位置のシミュレーション結果を示すグラフであり、図19(a)、(b)はそれぞれ垂直方向伝播光、平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。It is a graph which shows the simulation result of the in light emission position in an example of the organic EL element concerning a 5th embodiment of the present invention, and Drawing 19 (a) and (b) is a glass substrate of perpendicular propagation light and parallel propagation light, respectively. The wavelength dependence of the light extraction efficiency η is shown. 本発明の第5実施形態に係る有機EL素子の一例におけるout発光位置のシミュレーション結果を示すグラフであり、図20(a)、(b)はそれぞれ垂直方向伝播光、平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。It is a graph which shows the simulation result of the out light emission position in an example of the organic EL element concerning a 5th embodiment of the present invention, and Drawing 20 (a) and (b) is a glass substrate of perpendicular direction propagation light and parallel direction propagation light, respectively. The wavelength dependence of the light extraction efficiency η is shown. 本発明の第6実施形態に係る有機EL素子の一例におけるin発光位置とout発光位置のシミュレーション結果を示すグラフであり、図21(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。FIG. 21 is a graph showing simulation results of an in emission position and an out emission position in an example of an organic EL element according to the sixth embodiment of the present invention, and FIGS. 21A to 21C are vertical direction propagation light and parallel direction propagation light, respectively. The wavelength dependence of light extraction efficiency (eta) to the glass substrate of light and random propagation light is shown. 本発明の第7実施形態に係る有機EL素子の一例におけるin発光位置とout発光位置のシミュレーション結果を示すグラフであり、図22(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。FIG. 22A and FIG. 22C are graphs showing simulation results of in light emission positions and out light emission positions in an example of the organic EL device according to the seventh embodiment of the present invention, and FIGS. 22A to 22C are respectively vertical propagation light and parallel propagation light. The wavelength dependence of light extraction efficiency (eta) to the glass substrate of light and random propagation light is shown. 本発明の実施例において陰極に貫通孔部を形成した状態を示す走査型電子顕微鏡(SEM)写真であり、図23(a)は第1の例の5万倍拡大写真、図23(b)は第1の例の3000倍拡大写真、図23(c)は第2の例の5万倍拡大写真、図23(d)は第2の例の3000倍拡大写真である。It is a scanning electron microscope (SEM) photograph which shows the state which formed the through-hole part in the cathode in the Example of this invention, FIG.23 (a) is a 50,000 times enlarged photograph of a 1st example, FIG.23 (b) Is a 3000 times enlarged photograph of the first example, FIG. 23C is a 50,000 times enlarged photograph of the second example, and FIG. 23D is a 3000 times enlarged photograph of the second example. 本発明の第1実施形態に係る有機EL素子のシミュレーションに用いたモデル構造を示すもので、図24(a)はそのモデル構造の断面模式図、図24(b)は貫通孔部を拡大した斜視図である。貫通孔部に対する光源位置の影響を把握するためにシミュレーションする場合のモデル構造である。The model structure used for the simulation of the organic EL element which concerns on 1st Embodiment of this invention is shown, Fig.24 (a) is a cross-sectional schematic diagram of the model structure, FIG.24 (b) expanded the through-hole part. It is a perspective view. It is a model structure in the case of simulating in order to grasp the influence of the light source position on the through hole. 図24に示すモデル構造に係る有機EL素子のシミュレーション結果を示すグラフであり、図25(a)は平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示し、図25(b)はランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。FIG. 25A is a graph showing a simulation result of the organic EL element according to the model structure shown in FIG. 24. FIG. 25A shows the wavelength dependence of the light extraction efficiency η of the parallel propagation light to the glass substrate, and FIG. ) Shows the wavelength dependence of the light extraction efficiency η of random propagation light up to the glass substrate. 本発明の第6実施形態に係る有機EL素子のシミュレーションに用いた他のモデル構造を示す断面模式図である。It is a cross-sectional schematic diagram which shows the other model structure used for the simulation of the organic EL element which concerns on 6th Embodiment of this invention. 図26に示すモデル構造に係る有機EL素子のin発光位置のシミュレーション結果を示すグラフであり、図27(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。27 is a graph showing simulation results of the in-light emission position of the organic EL element according to the model structure shown in FIG. 26, and FIGS. 27A to 27C are glasses for vertically propagating light, parallel propagating light, and random propagating light, respectively. The wavelength dependence of the light extraction efficiency η up to the substrate is shown. 本発明の第6実施形態に係る有機EL素子のシミュレーションに用いた他のモデル構造を示す断面模式図である。It is a cross-sectional schematic diagram which shows the other model structure used for the simulation of the organic EL element which concerns on 6th Embodiment of this invention. 図28に示すモデル構造に係る有機EL素子のin発光位置のシミュレーション結果を示すグラフであり、図29(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。29 is a graph showing simulation results of the in-light emission position of the organic EL element according to the model structure shown in FIG. 28, and FIGS. 29 (a) to 29 (c) are glasses for vertically propagated light, parallel propagated light, and randomly propagated light, respectively. The wavelength dependence of the light extraction efficiency η up to the substrate is shown.

 以下、本発明を適用した有機EL素子並びにそれを備えた画像表示装置及び照明装置について、図面を用いてその構成を説明する。以下の説明で用いる図面は、特徴をわかりやすくするために便宜上特徴となる部分を拡大して示している場合があり、各構成要素の寸法比率などは実際と同じであるとは限らない。以下の説明において例示される材料、寸法等は一例であって、本発明はそれらに限定されるものではなく、その要旨を変更しない範囲で適宜変更して実施することが可能である。
 以下に実施形態として例示する有機EL素子は、有機層からみて第1電極側に基板を具備するボトムエミッション型の構成としているが、有機層からみて金属層側に基板を具備するトップエミッション型の構造としてもよい。さらに以下の実施形態では第1電極を陽極とする構成としているが、第1電極を陰極とする構成としてもよい。
Hereinafter, the structure of an organic EL element to which the present invention is applied, an image display apparatus and an illumination apparatus including the organic EL element will be described with reference to the drawings. In the drawings used in the following description, in order to make the features easier to understand, the portions that become the features may be shown in an enlarged manner for convenience, and the dimensional ratios and the like of the respective components are not always the same as the actual ones. The materials, dimensions, and the like exemplified in the following description are merely examples, and the present invention is not limited to these, and can be appropriately modified and implemented without changing the gist thereof.
The organic EL element exemplified below as an embodiment has a bottom emission type configuration including a substrate on the first electrode side as viewed from the organic layer, but a top emission type configuration including a substrate on the metal layer side as viewed from the organic layer. It is good also as a structure. Furthermore, in the following embodiments, the first electrode is configured as an anode, but the first electrode may be configured as a cathode.

「第1実施形態」「有機EL素子」
 本発明の第1実施形態に係る有機EL素子は、基板上に、第1電極、有機EL材料からなる発光層を含む有機層、金属層をこの順に具備する。第1電極は透明導電材料からなる透明電極であり、金属層は第2電極である。金属層は複数の貫通孔部を有し、第1電極側が主たる光取り出し側とするものである。
“First Embodiment” “Organic EL Device”
The organic EL device according to the first embodiment of the present invention includes a first electrode, an organic layer including a light emitting layer made of an organic EL material, and a metal layer in this order on a substrate. The first electrode is a transparent electrode made of a transparent conductive material, and the metal layer is a second electrode. The metal layer has a plurality of through-hole portions, and the first electrode side is the main light extraction side.

 図1は、本発明の第1実施形態に係る有機EL素子の一例を説明するための断面模式図である。
 図1に示す有機EL素子10は、基板11上に、陽極(第1電極)12、有機EL材料からなる発光層を含む有機層13、陰極(金属層、第2電極)14をこの順に具備する。陽極12は透明導電材料からなる透明電極であり、陰極14は導電性の金属材料からなる金属電極である。陰極14は複数の貫通孔部14Aを有し、主に陽極12側から外部に光を取り出すように構成されたボトムエミッション型の有機EL素子10である。
FIG. 1 is a schematic cross-sectional view for explaining an example of the organic EL element according to the first embodiment of the present invention.
An organic EL element 10 shown in FIG. 1 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 14 in this order on a substrate 11. To do. The anode 12 is a transparent electrode made of a transparent conductive material, and the cathode 14 is a metal electrode made of a conductive metal material. The cathode 14 is a bottom emission type organic EL element 10 having a plurality of through-hole portions 14A and configured to extract light mainly from the anode 12 side.

 本実施形態の有機EL素子10は、発光層で発光した光を主に基板11側から取り出すボトムエミッション型の有機EL素子である。そのため、基板11は透光性の基板であり、通常、可視光に対して透明であることが必要である。ここで、「可視光に対し透明である」とは、発光層から発する波長の可視光を透過することができればよいという意味であり、可視光領域全域にわたり透明である必要はない。400~700nmの可視光における透過率が50%以上であることが好ましい。透過率が70%以上であることがより好ましい。 The organic EL element 10 of the present embodiment is a bottom emission type organic EL element that extracts light emitted from the light emitting layer mainly from the substrate 11 side. Therefore, the substrate 11 is a light-transmitting substrate and usually needs to be transparent to visible light. Here, “transparent to visible light” means that it is only necessary to transmit visible light having a wavelength emitted from the light emitting layer, and does not need to be transparent over the entire visible light region. The transmittance in visible light of 400 to 700 nm is preferably 50% or more. More preferably, the transmittance is 70% or more.

 基板11として具体的には、ガラス板、ポリマー板等が挙げられる。ガラス板の材料としては、特にソーダ石灰ガラス、バリウム・ストロンチウム含有ガラス、鉛ガラス、アルミノケイ酸ガラス、ホウケイ酸ガラス、バリウムホウケイ酸ガラス、石英等が挙げられる。ポリマー板の材料としては、ポリカーボネート、ポリメチルメタクリレート、ポリエチレンテレフタレート、ポリメチルナフタレート、ポリエチレンナフタレート、ポリエーテルサルファイド、ポリサルフォン等を挙げることができる。
 発光光が可視光でない場合は、少なくとも発光波長領域に対して、可視光の場合と同様に透明であることが必要である。透過率としては、発光スペクトルが最大強度となる波長に対し、50%以上であることが好ましく、70%以上であることが更に好ましい。
Specific examples of the substrate 11 include a glass plate and a polymer plate. Examples of the glass plate material include soda lime glass, barium / strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass, and quartz. Examples of the polymer plate material include polycarbonate, polymethyl methacrylate, polyethylene terephthalate, polymethyl naphthalate, polyethylene naphthalate, polyether sulfide, polysulfone and the like.
When the emitted light is not visible light, it is necessary to be transparent at least with respect to the emission wavelength region as in the case of visible light. The transmittance is preferably 50% or more and more preferably 70% or more with respect to the wavelength at which the emission spectrum has the maximum intensity.

本実施形態に係る有機EL素子の構成がトップエミッション型である場合は、上記と同様な材料の他に、不透明な材料も使用できる。具体的には、例えばCu、Ag、Au、Pt、W、Ti、Ta、Nb、Alの単体、またはこれらの元素を含んだ合金、あるいはステンレスなどの金属材料、Si、SiC、AlN、GaN、GaAs、サファイアなどの非金属材料、その他のトップエミッション型の有機EL素子で通常用いられる基板材料を用いることができる。素子の発光に伴い生じる熱を逃がすため、熱伝導率の高い材料を基板に用いることが好ましい。 When the configuration of the organic EL element according to this embodiment is a top emission type, an opaque material can be used in addition to the same material as described above. Specifically, for example, Cu, Ag, Au, Pt, W, Ti, Ta, Nb, Al alone, an alloy containing these elements, or a metal material such as stainless steel, Si, SiC, AlN, GaN, Nonmetallic materials such as GaAs and sapphire, and other substrate materials usually used in top emission type organic EL elements can be used. In order to release heat generated by light emission of the element, a material having high thermal conductivity is preferably used for the substrate.

 基板11の厚さは、要求される機械的強度により適宜設定され、限定されないが、好ましくは、0.01~10mm、より好ましくは0.05~2mmである。 The thickness of the substrate 11 is appropriately set depending on the required mechanical strength, and is not limited, but is preferably 0.01 to 10 mm, more preferably 0.05 to 2 mm.

 陰極14は、発光層に電子を注入するための電極であり、仕事関数の小さい金属、合金、導電性化合物、あるいはこれらの混合物からなる材料を用いることが好ましい。陰極14に接する有機層13のLUMO(Lowest Unoccupied Molecular Orbital)準位との差が過大にならないように仕事関数が1.9eV以上5eV以下の材料を用いるのが好ましい。
 具体的には、例えば、Au、Ag、Cu、Zn、Al等の単体金属やこれらの合金、MgAg合金、AlLiやAlCa等のAlとアルカリ(土類)金属との合金等の材料等を例示することができる。
The cathode 14 is an electrode for injecting electrons into the light emitting layer, and it is preferable to use a material made of a metal, an alloy, a conductive compound, or a mixture thereof having a small work function. It is preferable to use a material having a work function of 1.9 eV or more and 5 eV or less so that the difference from the LUMO (Lowest Unoccupied Molecular Orbital) level of the organic layer 13 in contact with the cathode 14 does not become excessive.
Specifically, for example, materials such as single metals such as Au, Ag, Cu, Zn, and Al, alloys thereof, MgAg alloys, alloys of Al and alkali (earth) metals such as AlLi and AlCa, etc. can do.

 陰極14の厚さは、特に限定はされないが、例えば30~1000nmであり、好ましくは100~1000nmである。陰極14の厚さが30nmより薄いとシート抵抗が増加して、駆動電圧が上昇する。陰極14の厚さが1000nmより厚いと成膜時の熱や放射線によるダメージ、膜応力による機械的ダメージが電極や有機層に蓄積するおそれがある。 The thickness of the cathode 14 is not particularly limited, but is, for example, 30 to 1000 nm, and preferably 100 to 1000 nm. If the thickness of the cathode 14 is less than 30 nm, the sheet resistance increases and the driving voltage rises. If the thickness of the cathode 14 is thicker than 1000 nm, heat and radiation damage during film formation, and mechanical damage due to film stress may accumulate in the electrode and the organic layer.

 陰極14は、複数の貫通孔部14Aを備えているが、各貫通孔部14Aの底部は有機層13で閉じられている。本実施形態において有機層13は貫通孔部14Aの内部に入り込んでいない構造とされる。他の形態として、貫通孔部の内部が気体で満たされていても良いし、有機材料で満たされていても良い(有機層13と同じ材料でも良いし違う材料でも良い)。更に絶縁材料や金属酸化物で満たされていても良い。
貫通孔部14A内部の媒質の屈折率が、有機層13より低屈折率の場合、有機層13と低屈折率の媒質との界面で全反射しやすいため、発光光のロスが少なく光取出しを向上させることができる。貫通孔部14Aは、陰極14の厚さ方向全体を貫通している。
The cathode 14 includes a plurality of through-hole portions 14 </ b> A, and the bottom of each through-hole portion 14 </ b> A is closed with the organic layer 13. In the present embodiment, the organic layer 13 has a structure that does not enter the through-hole portion 14A. As another form, the inside of the through-hole portion may be filled with a gas, or may be filled with an organic material (the same material as the organic layer 13 or a different material may be used). Further, it may be filled with an insulating material or a metal oxide.
When the refractive index of the medium inside the through-hole portion 14A is lower than that of the organic layer 13, it is easy to totally reflect at the interface between the organic layer 13 and the medium having a low refractive index. Can be improved. The through-hole portion 14A penetrates the entire cathode 14 in the thickness direction.

 貫通孔部14Aの代表的な形状としては、円柱形状、楕円柱形状、多角柱形状、円錐台形状、角錐台形状、半球形状、及びこれらが複合された形状などが挙げられる。形状にテーパーがある場合は、断面において直線状、曲線状のいずれの形状であっても良い。即ち、貫通孔部14Aの断面形状、および平面形状はいずれも限定されない。
 貫通孔部14Aの大きさは、平面視での貫通孔部14Aの最小幅と最大幅で定義することができる。最小幅とは貫通孔部14Aに内包される最大円の直径を言う。この最大幅とは貫通孔部14Aを内包する最小円の直径を言う。貫通孔部14Aが正円の場合、最小幅と最大幅は一致する。貫通孔部14Aの大きさは特に限定されず、貫通孔が形成されていれば良い。貫通孔部14Aの形成しやすさから、貫通孔部14Aの最小幅は例えば100nm以上であることが好ましく、貫通孔部の間隔は例えば50nm以上に設定することができる。間隔とは、隣接する貫通孔部14Aの間の貫通孔部を含まない最短距離をいう。
Typical shapes of the through-hole portion 14A include a columnar shape, an elliptical column shape, a polygonal column shape, a truncated cone shape, a truncated pyramid shape, a hemispherical shape, and a shape in which these are combined. When the shape has a taper, the cross section may be either a straight shape or a curved shape. That is, neither the cross-sectional shape nor the planar shape of the through-hole portion 14A is limited.
The size of the through hole portion 14A can be defined by the minimum width and the maximum width of the through hole portion 14A in plan view. The minimum width refers to the diameter of the maximum circle included in the through hole portion 14A. The maximum width means the diameter of the minimum circle that includes the through-hole portion 14A. When the through-hole portion 14A is a perfect circle, the minimum width and the maximum width match. The size of the through-hole portion 14A is not particularly limited as long as the through-hole is formed. In view of the ease of forming the through hole portion 14A, the minimum width of the through hole portion 14A is preferably 100 nm or more, for example, and the interval between the through hole portions can be set to 50 nm or more, for example. The interval refers to the shortest distance not including the through hole portion between adjacent through hole portions 14A.

 貫通孔部14Aの最大幅は他の貫通孔部14Aと重ならない範囲でできるだけ大きいことが好ましい。複数の貫通孔部14Aの配列は、周期的でも、非周期的でも良い。SPPモード光を取り出すために、貫通孔部14Aの平面視での占有面積比(発光領域(後述するin発光領域とout発光領域を併せた領域)に対する貫通孔部14Aの底面積の比)が、20~90%の範囲であることが好ましい。貫通孔部14Aの平面視での底面積とは、陰極14と有機層13の界面における貫通孔部14Aの面積をいう。 The maximum width of the through-hole portion 14A is preferably as large as possible within a range not overlapping with the other through-hole portions 14A. The arrangement of the plurality of through-hole portions 14A may be periodic or aperiodic. In order to extract the SPP mode light, the occupied area ratio (ratio of the bottom area of the through-hole portion 14A to the light-emitting region (a region combining an in-light-emitting region and an out-light-emitting region described later) in plan view of the through-hole portion 14A is 20 to 90% is preferable. The bottom area of the through-hole portion 14A in plan view refers to the area of the through-hole portion 14A at the interface between the cathode 14 and the organic layer 13.

 陽極12は陰極14との間で電圧を印加し、陽極12より発光層に正孔を注入するための電極である。仕事関数の大きい金属、合金、導電性化合物、あるいはこれらの混合物からなる材料を用いることが好ましい。陽極12に接する有機層13のHOMO(Highest Occupied Molecular Orbital)準位との差が過大にならないように仕事関数が4eV以上6eV以下の材料を用いることが好ましい。
陽極12の材料としては透光性でかつ導電性の材料であれば特に制限はなく公知の材料を用いることができる。例えば、酸化インジウム錫(ITO)、酸化インジウム亜鉛(IZO)、酸化錫、酸化亜鉛などの透明無機酸化物、PEDOT:PSS、ポリアニリンなどの導電性高分子および任意のアクセプタなどでドープした導電性高分子、カーボンナノチューブ、グラフェンなどの透明カーボン材料を挙げることができる。陽極12は、基板11上に例えば、スパッタ法、真空蒸着法、塗布法、イオンプレーティング法などによって形成することができる。
 陽極12の厚さは限定的ではないが、例えば10~2000nmであり、好ましくは50~1000nmである。陽極12の厚さが2000nmより厚いと有機層13の平坦度を保てなくなると共に、陽極12の透過率が低下する。陽極12の厚さが10nmより薄いと、膜厚の不均一性が大きくなることや、シート抵抗が高くなり面内の輝度が不均一になるおそれがある。
The anode 12 is an electrode for applying a voltage between the anode 14 and injecting holes from the anode 12 into the light emitting layer. It is preferable to use a material made of a metal, an alloy, a conductive compound, or a mixture thereof having a high work function. It is preferable to use a material having a work function of 4 eV or more and 6 eV or less so that the difference from the HOMO (Highest Occupied Molecular Orbital) level of the organic layer 13 in contact with the anode 12 does not become excessive.
The material of the anode 12 is not particularly limited as long as it is a translucent and conductive material, and a known material can be used. For example, conductive high conductivity doped with transparent inorganic oxides such as indium tin oxide (ITO), indium zinc oxide (IZO), tin oxide, zinc oxide, conductive polymers such as PEDOT: PSS, polyaniline, and arbitrary acceptors. Examples thereof include transparent carbon materials such as molecules, carbon nanotubes, and graphene. The anode 12 can be formed on the substrate 11 by, for example, a sputtering method, a vacuum deposition method, a coating method, an ion plating method, or the like.
The thickness of the anode 12 is not limited, but is, for example, 10 to 2000 nm, and preferably 50 to 1000 nm. If the thickness of the anode 12 is greater than 2000 nm, the flatness of the organic layer 13 cannot be maintained, and the transmittance of the anode 12 decreases. If the thickness of the anode 12 is less than 10 nm, the film thickness non-uniformity may increase, or the sheet resistance may increase and the in-plane luminance may become non-uniform.

 有機層13を構成する発光層の材料としては、有機EL素子用の材料として知られる任意の材料を用いることができる。
 有機層13は、有機EL材料からなる発光層の他、正孔注入層、正孔輸送層、電子注入層、電子輸送層等をそれぞれ個別あるいは複数組み合わせて備えてもよい。
正孔注入層は陽極12から有機層13への正孔注入を助ける層であり、イオン化エネルギーが通常5.5eV以下と低い。このような正孔注入層としてはより低い電界強度で正孔を有機層13に注入する材料が好ましい。正孔注入層を形成する材料としては、上記の機能を担えるものであれば特に制限はなく、公知のものの中から任意のものを選択して用いることができる。正孔輸送層は発光領域まで正孔を輸送する層であって、正孔移動度が大きい。正孔輸送層を形成する材料としては、上記の機能を担えるものであれば特に制限はなく、公知のものの中から任意のものを選択して用いることができる。
電子注入層は陰極14から有機層13への電子注入を助ける層である。このような電子注入層としてはより低い電界強度で電子を有機層13に注入する材料が好ましい。電子注入層を形成する材料としては、上記の機能を担えるものであれば特に制限はなく、公知のものの中から任意のものを選択して用いることができる。電子輸送層は発光領域まで電子を輸送する層であって、電子移動度が大きい。電子輸送層を形成する材料としては、上記の機能を担えるものであれば特に制限はなく、公知のものの中から任意のものを選択して用いることができる。
As a material of the light emitting layer constituting the organic layer 13, any material known as a material for an organic EL element can be used.
The organic layer 13 may include a light emitting layer made of an organic EL material, a hole injection layer, a hole transport layer, an electron injection layer, an electron transport layer, or the like individually or in combination.
The hole injection layer is a layer that assists hole injection from the anode 12 to the organic layer 13, and its ionization energy is usually as low as 5.5 eV or less. As such a hole injection layer, a material that injects holes into the organic layer 13 with lower electric field strength is preferable. The material for forming the hole injection layer is not particularly limited as long as it can perform the above function, and any material can be selected and used from known materials. The hole transport layer is a layer that transports holes to the light emitting region and has a high hole mobility. The material for forming the hole transport layer is not particularly limited as long as it can perform the above functions, and any material can be selected and used from known materials.
The electron injection layer is a layer that assists electron injection from the cathode 14 to the organic layer 13. As such an electron injection layer, a material that injects electrons into the organic layer 13 with lower electric field strength is preferable. The material for forming the electron injection layer is not particularly limited as long as it can perform the above function, and any material can be selected and used from known materials. The electron transport layer is a layer that transports electrons to the light emitting region and has a high electron mobility. The material for forming the electron transport layer is not particularly limited as long as it can perform the above functions, and any material can be selected and used from known materials.

 有機層13は、公知の方法で成膜することができ、例えば蒸着法、転写法などの乾式プロセスによって成膜してもよいし、スピンコート法、スプレーコート法、ダイコート法、グラビア印刷法など、湿式プロセスによって成膜してもよい。
 有機層13の厚さは限定的ではないが、例えば50~2000nmであり、好ましくは100~1000nmである。有機層13の厚さが50nmより薄いと突き抜け電流による内部量子効率の低下や損失性表面波モードカップリング(lossy surface wave mode coupling)など、陰極金属によるSPPカップリング以外の消光が起こる。有機層13の厚さが2000nmより厚いと駆動電圧が上昇する。
The organic layer 13 can be formed by a known method. For example, the organic layer 13 may be formed by a dry process such as an evaporation method or a transfer method, or a spin coating method, a spray coating method, a die coating method, a gravure printing method, or the like. Alternatively, the film may be formed by a wet process.
The thickness of the organic layer 13 is not limited, but is, for example, 50 to 2000 nm, and preferably 100 to 1000 nm. When the thickness of the organic layer 13 is less than 50 nm, quenching other than the SPP coupling by the cathode metal occurs, such as a decrease in internal quantum efficiency due to a punch-through current and a lossy surface wave mode coupling. When the thickness of the organic layer 13 is greater than 2000 nm, the drive voltage increases.

 本実施形態の有機EL素子10は、陽極12と陰極14の間に電位差を付加するように通電すると、有機層13の内部の発光層が発光するので、透明導電材料からなる陽極12を介し主に基板11側から光を取り出すことができる。第1実施形態の有機EL素子10において、透明電極である陽極12側から取り出す光の量よりは少ないが、陰極14側からも、陰極14の貫通孔部14Aを通過する光を取り出すことができる。
 有機層13は、陽極12と陰極14とに挟まれる層状領域中の、どの位置において発光しても良いが、以下のように特にin発光とout発光に分けて説明することができる。有機層13内部の発光形態において、有機層13を平面視して陰極14が存在しない領域、即ち、陰極14の貫通孔部14Aと重なる領域での発光形態を本明細書ではin発光と呼称し、陰極14が存在する領域、即ち、貫通孔部14Aが形成されていない領域と重なる領域での発光形態を本明細書ではout発光と呼称する。
When the organic EL element 10 of the present embodiment is energized so as to apply a potential difference between the anode 12 and the cathode 14, the light emitting layer inside the organic layer 13 emits light, so that the main is via the anode 12 made of a transparent conductive material. In addition, light can be extracted from the substrate 11 side. In the organic EL element 10 of the first embodiment, the amount of light extracted from the anode 12 side, which is a transparent electrode, is smaller, but the light passing through the through-hole portion 14A of the cathode 14 can also be extracted from the cathode 14 side. .
The organic layer 13 may emit light at any position in the layered region sandwiched between the anode 12 and the cathode 14, and can be described by dividing into in emission and out emission as follows. In the light emission form inside the organic layer 13, the light emission form in a region where the organic layer 13 is not seen from the plan view when the organic layer 13 is present, that is, a region overlapping the through hole portion 14 </ b> A of the cathode 14 is referred to as in light emission in this specification. A light emission form in a region where the cathode 14 exists, that is, a region overlapping with a region where the through-hole portion 14A is not formed is referred to as out light emission in this specification.

 有機層13に通常有機EL素子で用いられる有機材料を用いた場合、有機層13の中でも、一般的には高導電性材料からなる層(陽極12と陰極14)同士を結ぶ最短経路上で強く発光する。本実施形態で強く発光する領域は、陽極12と陰極14間距離が短い領域である陰極14の下部領域となる(out発光)。しかし、貫通孔部14Aを有する陰極14と有機層13の間で有機層13に接して全面に導電性の高いバッファ層を形成することで、陰極14に貫通孔部14Aを持たない従来の素子と同様、陰極14の貫通孔部14Aの配置形態に関係なく発光層全体で同程度の発光をさせることができる。
陰極12と有機層13との間のout発光領域だけに絶縁層を形成し、さらに陰極12を形成した上から、貫通孔部14Aの一部を充填するように導電性媒質を形成することで、in発光で強く発光する有機EL素子を作成することができる。
When an organic material usually used in an organic EL element is used for the organic layer 13, the organic layer 13 is generally strong on the shortest path connecting layers (anode 12 and cathode 14) made of a highly conductive material. Emits light. In the present embodiment, a region that emits light strongly is a lower region of the cathode 14 where the distance between the anode 12 and the cathode 14 is short (out emission). However, by forming a buffer layer having high conductivity between the cathode 14 having the through-hole portion 14A and the organic layer 13 in contact with the organic layer 13, a conventional element having no through-hole portion 14A in the cathode 14 is formed. Similarly, the entire light emitting layer can emit light of the same degree regardless of the arrangement of the through holes 14A of the cathode 14.
By forming an insulating layer only in the out light emitting region between the cathode 12 and the organic layer 13, and further forming the cathode 12, the conductive medium is formed so as to fill a part of the through-hole portion 14A. Thus, an organic EL element that emits light strongly by in-light emission can be produced.

 ここで導電性の高いバッファ層は、プラズモンを生じなければ何ら限定されるものではない。陰極14が貫通孔部14Aを有する場合、バッファ層は、例えば電子注入層として用いられる材料を使用して形成される。この層は陰極から有機層へ電子の注入障壁を下げて電子の注入効率を上げる機能を有していても良い。具体的な材料としては、例えば、アルカリ金属(Na、K、Rb、Cs)、アルカリ土類金属(Mg、Ca、Sr、Ba)、希土類金属(Pr、Sm、Eu、Yb)などの金属のフッ化物、塩化物、酸化物から選ばれる材料並びに2つ以上の混合物を使用することができる。さらに、2,9-ジメチル-4,7-ジフェニル-1,10-フェナントロリン(バソクプロイン(BCP))等の電子親和性の高い有機化合物とCs等の電子供与性の高い材料の混合物も好ましく用いられる。バッファ層の厚さは0.1~50nmが好ましく、0.1~20nmがより好ましく、0.5~10nmがより一層好ましい。 Here, the highly conductive buffer layer is not limited as long as no plasmon is generated. When the cathode 14 has the through-hole part 14A, the buffer layer is formed using a material used as an electron injection layer, for example. This layer may have a function of increasing the electron injection efficiency by lowering the electron injection barrier from the cathode to the organic layer. Specific materials include, for example, metals such as alkali metals (Na, K, Rb, Cs), alkaline earth metals (Mg, Ca, Sr, Ba), and rare earth metals (Pr, Sm, Eu, Yb). Materials selected from fluorides, chlorides, oxides and mixtures of two or more can be used. Furthermore, a mixture of an organic compound having a high electron affinity such as 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline (basocuproin (BCP)) and a material having a high electron donating property such as Cs is also preferably used. . The thickness of the buffer layer is preferably from 0.1 to 50 nm, more preferably from 0.1 to 20 nm, and even more preferably from 0.5 to 10 nm.

 図1に示される実施形態において、貫通孔部14Aを有するのは陰極14であるが、本発明においては貫通孔部を有する電極を陽極とする構成としてもよい。このような構成の場合、導電性の高いバッファ層としては、例えば正孔注入層として用いられる材料を使用して形成される。具体的には、例えば、ポリアセチレン、ポリパラフェニレン、ポリアニリン、ポリチオフェン、ポリパラフェニレンビニレン等の導電性高分子;アリールアミン、フタロシアニン等の有機化合物;酸化バナジウム、酸化亜鉛、酸化モリブデン、酸化ルテニウム、酸化チタン等の酸化物が挙げられる。これらの材料は、キャリアをドーピングし自由に動けるキャリアを注入することにより、導電性を向上させることができる。
 正孔注入層の材料は、ドーパントがドープされた混合物のように、1種単独または2種以上を混合して用いてもよい。さらに、異なる正孔注入層の材料を積層してバッファ層を形成してもよい。ドーパントを使用した例として、ポリ(3,4-エチレンジオキシチオフェン)(PEDOT)とポリスチレンスルホン酸(PSS)との混合物(PEDOT:PSS)、ポリアニリン(PANI)とポリスチレンスルホン酸(PSS)との混合物(PANI:PSS)等が挙げられる。陽極として用いられる材料でかつ金属でない材料でもよい。
In the embodiment shown in FIG. 1, it is the cathode 14 that has the through-hole portion 14A. However, in the present invention, the electrode having the through-hole portion may be used as the anode. In such a configuration, the highly conductive buffer layer is formed by using, for example, a material used as a hole injection layer. Specifically, for example, conductive polymers such as polyacetylene, polyparaphenylene, polyaniline, polythiophene, polyparaphenylene vinylene; organic compounds such as arylamine and phthalocyanine; vanadium oxide, zinc oxide, molybdenum oxide, ruthenium oxide, oxidation An oxide such as titanium may be used. These materials can improve conductivity by injecting carriers that can be freely doped and doped.
As the material for the hole injection layer, one kind may be used alone, or two or more kinds may be mixed and used like a mixture doped with a dopant. Further, the buffer layer may be formed by stacking different hole injection layer materials. Examples of using dopants include a mixture of poly (3,4-ethylenedioxythiophene) (PEDOT) and polystyrene sulfonic acid (PSS) (PEDOT: PSS), polyaniline (PANI) and polystyrene sulfonic acid (PSS). A mixture (PANI: PSS) etc. are mentioned. A material which is used as an anode and which is not a metal may be used.

 さらに貫通孔部14Aを有する電極が陽極か陰極かに関わらず、上記の導電性の良い材料として、導電性を有する金属酸化物である、酸化インジウム錫(ITO:Indium Tin Oxide:In-SnO)、酸化インジウム亜鉛(IZO:Indium Zinc Oxide:In-ZnO)、酸化インジウムモリブデン(IMO:Indium Molybdenum)、酸化亜鉛(ZnO)、酸化アルミニウム亜鉛(AZO:Alminium Zinc Oxide:Al-ZnO)、酸化ガリウム亜鉛(GZO:Gallium Zinc Oxide:Ga-ZnO)、酸化モリブデン(MoO)、フッ素ドープ酸化錫(FTO:Fluorine Tin Oxide:F/SnO)、ニオブドープ酸化チタン(NTO:Niobium Titanum Oxide:Nb/TiO)、アンチモンドープ酸化錫(ATO:Antimony Tin Oxide Sb/SnO)の内の少なくとも一種以上の酸化物を含む材料等を使用することができる。 Further, regardless of whether the electrode having the through-hole portion 14A is an anode or a cathode, indium tin oxide (ITO: Indium Tin Oxide: In 2 O 3 ), which is a metal oxide having conductivity, is used as the material having good conductivity. -SnO 2 ), indium zinc oxide (IZO: Indium Zinc Oxide: In 2 O 3 —ZnO), indium molybdenum oxide (IMO: Indium Molybdenum), zinc oxide (ZnO), aluminum zinc oxide (AZO: Aluminum Zinc Oxide: Al 2 O 3 —ZnO), gallium zinc oxide (GZO: Gallium Zinc Oxide: Ga 2 O 3 —ZnO), molybdenum oxide (MoO 3 ), fluorine-doped tin oxide (FTO: Fluorine Tin Oxide: F / SnO 2 ) A material containing at least one oxide of niobium-doped titanium oxide (NTO: Niobium Titanium Oxide: Nb / TiO 2 ) and antimony-doped tin oxide (ATO: Antimony Tin Oxide Sb / SnO 2 ) may be used. it can.

 図1に示すようにin発光における発光位置はout発光における発光位置に比べて陰極14との距離が大きく、貫通孔部14Aに対応する領域にあるので、SPPモードへのエネルギー移動量が少ない。すなわちSPPモード光の発生が少なく、これによるプラズモン損失が少なくなる。このSPPモード光の発生を少なくするためには、発光位置と陰極14との距離が100nm以上離れることが好ましく、光取り出し効率を向上させることができる。このため、貫通孔部14Aの内径の大きさが重要であり、貫通孔部14Aの最小幅を100nm以上、例えば、100~4000nmの範囲とすることができ、好ましくは200~2000nmの範囲とすることができる。貫通孔部14Aの最小幅は、上述した通り平面視での貫通孔部14Aに内包される最大円の直径で定義することができる。 As shown in FIG. 1, the light emission position in in light emission has a larger distance from the cathode 14 than the light emission position in out light emission, and is in a region corresponding to the through-hole portion 14A, so that the amount of energy transfer to the SPP mode is small. That is, the generation of SPP mode light is small and plasmon loss due to this is reduced. In order to reduce the generation of this SPP mode light, it is preferable that the distance between the light emitting position and the cathode 14 be 100 nm or more, and the light extraction efficiency can be improved. Therefore, the size of the inner diameter of the through hole portion 14A is important, and the minimum width of the through hole portion 14A can be set to 100 nm or more, for example, in the range of 100 to 4000 nm, and preferably in the range of 200 to 2000 nm. be able to. As described above, the minimum width of the through-hole portion 14A can be defined by the diameter of the maximum circle included in the through-hole portion 14A in plan view.

 図1に示す有機EL発光素子10の構造では、貫通孔部14Aの内部は空隙であり、例えば窒素等の気体で満たされ貫通孔部14Aの内部に有機層13の材料は形成されていない。一方、有機層13や他の材料によって満たされる構成としても構わない。貫通孔部14Aの内側に有機層から延長して有機材料が存在すると、発光光が有機層13内を伝播しこの貫通孔部14A内の有機材料へも侵入する。貫通孔部14A内に発光層よりも屈折率が高い材料が存在する場合も同様である。一方、貫通孔部14A内に有機層13よりも低屈折率の材料が存在すると有機層13と低屈折率材料の界面に臨界角以上で入射した光は全反射する。そのため貫通孔部14A内が有機層13より低屈折率の材料で満たされている方が有機層13内を伝播する導波光の伝播距離が短くなるため光の損失が少なくなり、光取り出し効率が向上するので好ましい。窒素等の気体は有機層を構成する有機材料より屈折率が低いため、この低屈折率の材料の場合に相当し、貫通孔部14A内が有機材料や高屈折率の材料で満たされる場合よりも光取り出し効率が向上する。 In the structure of the organic EL light emitting device 10 shown in FIG. 1, the inside of the through-hole portion 14A is a void, and is filled with a gas such as nitrogen, for example, and the material of the organic layer 13 is not formed inside the through-hole portion 14A. On the other hand, it may be configured to be filled with the organic layer 13 or other materials. When an organic material is present inside the through hole portion 14A extending from the organic layer, the emitted light propagates through the organic layer 13 and enters the organic material in the through hole portion 14A. The same applies to the case where a material having a refractive index higher than that of the light emitting layer is present in the through hole portion 14A. On the other hand, if a material having a refractive index lower than that of the organic layer 13 is present in the through-hole portion 14A, light incident on the interface between the organic layer 13 and the low refractive index material at a critical angle or more is totally reflected. Therefore, when the through hole 14A is filled with a material having a lower refractive index than the organic layer 13, the propagation distance of the guided light propagating through the organic layer 13 is shortened, so that the light loss is reduced and the light extraction efficiency is improved. Since it improves, it is preferable. Since a gas such as nitrogen has a lower refractive index than the organic material constituting the organic layer, this corresponds to the case of this low refractive index material, compared to the case where the inside of the through-hole portion 14A is filled with an organic material or a high refractive index material. Also, the light extraction efficiency is improved.

 更に、陰極14の貫通孔部14Aにおいて有機層13と接する界面は、周期100nm以上の平坦部分が断続的な構造となっている。そのため、この界面に発生したモード光は、界面が途切れるところで有機層13内に放射される(有機層内を伝播する光モードに変換される)。このため、最小幅100nm以上であって、間隔50nm以上の貫通孔部14Aを陰極14に有することで、光取り出し効率が向上する。
 上述したように、陰極14が貫通孔部14Aを有するため、SPPモード光となった光を取り出すことができる利点も有する上に、貫通孔部14Aに対応する有機層13の部分は陰極(金属層)14が近傍に存在しない領域となり、SPPモード光とはならないため、光取り出し効率が向上する。
陰極14は貫通孔部14Aを有するため、有機層13で生じた光はこの貫通孔部14Aを通じて陰極14の外部に取り出されうる。ただし有機層13は、貫通孔部14A以外の領域を導電性の金属材料からなる陰極(金属層)14で覆われているため、この貫通孔部14Aを通じて取り出される光は、in発光、out発光にかかわらず、陽極12側から取り出される光よりも少ない。これは貫通孔部を有する電極を陽極とする構成の場合も全て同様である。
Furthermore, the flat portion having a period of 100 nm or more is intermittent in the interface in contact with the organic layer 13 in the through-hole portion 14A of the cathode 14. Therefore, the mode light generated at the interface is radiated into the organic layer 13 where the interface is interrupted (converted into an optical mode propagating in the organic layer). For this reason, the light extraction efficiency is improved by providing the cathode 14 with through-hole portions 14A having a minimum width of 100 nm or more and an interval of 50 nm or more.
As described above, since the cathode 14 has the through-hole portion 14A, there is an advantage that the light that has become the SPP mode light can be taken out, and the portion of the organic layer 13 corresponding to the through-hole portion 14A has a cathode (metal). The layer) 14 is an area that does not exist in the vicinity and does not become SPP mode light, so that the light extraction efficiency is improved.
Since the cathode 14 has the through-hole portion 14A, light generated in the organic layer 13 can be extracted outside the cathode 14 through the through-hole portion 14A. However, since the organic layer 13 is covered with a cathode (metal layer) 14 made of a conductive metal material in a region other than the through-hole portion 14A, the light extracted through the through-hole portion 14A is emitted in light or out. Regardless, less light is extracted from the anode 12 side. The same applies to the case where the electrode having the through-hole portion is used as the anode.

 本実施形態の構造においては、透明電極である陽極12の有機層13とは反対側に基板11を備え、陽極12側である基板11側から光を取り出すボトムエミッション型としているが、陽極12と陰極14の積層関係を逆にするトップエミッション型としても良い。具体的には、基板上に陰極14が形成され、その上に有機層13と陽極12が形成された構造としても良い。この場合、陰極14が金属材料からなり、この陰極14に貫通孔部14Aが形成されている。このようなトップエミッション型の場合、有機層13で発光した光は陽極12を通じて、主に基板と反対側の面から取り出される。図1に示す例では、透明電極を陽極12、貫通孔部14Aを有する金属電極を陰極14とする構成としているが、前者を陰極、後者を陽極とする構成でもかまわない。このような陽極・陰極を反転させた構成の場合、有機層中の光は、主に透明である陰極を通じて外部に取り出される。
 陰極14に貫通孔部14Aを形成する方法としては、蒸着等により成膜時にマスク等を用いて孔を形成する方法、後述するように別途貫通孔部を形成した陰極を転写法等により貼り合せる方法等がある。一定膜厚の層を蒸着等により成膜した後、レーザー等を用いてアブレーション等により貫通孔部を形成することもできる。
In the structure of the present embodiment, the substrate 11 is provided on the side opposite to the organic layer 13 of the anode 12 that is a transparent electrode, and is a bottom emission type in which light is extracted from the substrate 11 side that is the anode 12 side. A top emission type in which the stacking relationship of the cathode 14 is reversed may be employed. Specifically, a structure in which the cathode 14 is formed on the substrate and the organic layer 13 and the anode 12 are formed thereon may be employed. In this case, the cathode 14 is made of a metal material, and a through-hole portion 14A is formed in the cathode 14. In the case of such a top emission type, light emitted from the organic layer 13 is extracted mainly from the surface opposite to the substrate through the anode 12. In the example shown in FIG. 1, the transparent electrode is the anode 12 and the metal electrode having the through-hole portion 14A is the cathode 14, but the former may be a cathode and the latter may be the anode. In the case where such an anode / cathode is inverted, light in the organic layer is extracted to the outside through a cathode that is mainly transparent.
As a method of forming the through-hole portion 14A in the cathode 14, a method of forming a hole by using a mask or the like at the time of film formation by vapor deposition or the like, and a cathode in which a through-hole portion is separately formed are bonded by a transfer method or the like as will be described later. There are methods. After forming a layer having a certain film thickness by vapor deposition or the like, the through-hole portion can also be formed by ablation or the like using a laser or the like.

「画像表示装置」
 次に、先の第1実施形態の有機EL素子10を備えた画像表示装置について説明する。
 図2は前記有機EL素子10を備えた画像表示装置の一例を示す図である。
 図2に示す画像表示装置100は、いわゆるパッシブマトリクス型の画像表示装置であり、有機EL素子10の他に、陽極配線104、陽極補助配線106、陰極配線108、絶縁膜110、陰極隔壁112、封止プレート116、シール材118を備えている。
"Image display device"
Next, an image display apparatus including the organic EL element 10 of the first embodiment will be described.
FIG. 2 is a diagram illustrating an example of an image display device including the organic EL element 10.
An image display device 100 shown in FIG. 2 is a so-called passive matrix type image display device. In addition to the organic EL element 10, an anode wiring 104, an anode auxiliary wiring 106, a cathode wiring 108, an insulating film 110, a cathode partition 112, A sealing plate 116 and a sealing material 118 are provided.

 本実施形態において、有機EL素子10の基板11上には、複数の陽極配線104が形成されている。陽極配線104は、一定の間隔を隔てて平行に配置される。陽極配線104は、透明導電膜により構成され、例えばITO(Indium Tin Oxide)からなる。陽極配線104の厚さは例えば、100~150nmとすることができる。そして、それぞれの陽極配線104の端部の上には、陽極補助配線106が形成されている。陽極補助配線106は陽極配線104と電気的に接続されている。この構成とすることにより、陽極補助配線106は、基板1の端部側において外部配線と接続するための端子として機能し、外部に設けられた図示しない駆動回路から陽極補助配線106を介し陽極配線104に電流を供給することができる。陽極補助配線106は、例えば、厚さ500~600nmの金属膜によって構成される。 In the present embodiment, a plurality of anode wirings 104 are formed on the substrate 11 of the organic EL element 10. The anode wirings 104 are arranged in parallel at a constant interval. The anode wiring 104 is made of a transparent conductive film, and is made of, for example, ITO (Indium Tin Oxide). The thickness of the anode wiring 104 can be set to 100 to 150 nm, for example. An anode auxiliary wiring 106 is formed on the end of each anode wiring 104. The anode auxiliary wiring 106 is electrically connected to the anode wiring 104. With this configuration, the anode auxiliary wiring 106 functions as a terminal for connecting to the external wiring on the end portion side of the substrate 1, and the anode wiring is connected from the driving circuit (not shown) provided outside through the anode auxiliary wiring 106. A current can be supplied to 104. The anode auxiliary wiring 106 is made of a metal film having a thickness of 500 to 600 nm, for example.

 有機EL素子10上には、複数の陰極配線108が設けられている。複数の陰極配線108は、それぞれが平行となるよう、かつ、陽極配線104と直交するように配設されている。陰極配線108はAlまたはAl合金から構成することができる。陰極配線108の厚さは、例えば、100~150nmである。陰極配線108の端部には、陽極配線104に対する陽極補助配線106と同様に、図示しない陰極補助配線が設けられ、陰極配線108と電気的に接続されている。よって、陰極配線108と陰極補助配線との間に電流を流すことができる。 A plurality of cathode wirings 108 are provided on the organic EL element 10. The plurality of cathode wirings 108 are arranged so as to be parallel to each other and orthogonal to the anode wiring 104. The cathode wiring 108 can be made of Al or an Al alloy. The thickness of the cathode wiring 108 is, for example, 100 to 150 nm. A cathode auxiliary wiring (not shown) is provided at the end of the cathode wiring 108, similarly to the anode auxiliary wiring 106 for the anode wiring 104, and is electrically connected to the cathode wiring 108. Therefore, a current can flow between the cathode wiring 108 and the cathode auxiliary wiring.

 更に基板11上には、陽極配線104を覆うように絶縁膜110が形成されている。絶縁膜110には、陽極配線104の一部を露出するように矩形状の開口部120が設けられている。複数の開口部120は、陽極配線104の上にマトリクス状に配置されている。
これらの開口部120において、陽極配線104と陰極配線108の間に有機EL素子10が設けられている。すなわち、それぞれの開口部120が画素となる。従って、開口部120に対応して表示領域が形成される。ここで、絶縁膜110の膜厚は、例えば、100~200nmとすることができ、開口部120の大きさは、例えば、100μm×100μmとすることができる。
Further, an insulating film 110 is formed on the substrate 11 so as to cover the anode wiring 104. A rectangular opening 120 is provided in the insulating film 110 so as to expose a part of the anode wiring 104. The plurality of openings 120 are arranged in a matrix on the anode wiring 104.
In these openings 120, the organic EL element 10 is provided between the anode wiring 104 and the cathode wiring 108. That is, each opening 120 becomes a pixel. Accordingly, a display area is formed corresponding to the opening 120. Here, the film thickness of the insulating film 110 can be, for example, 100 to 200 nm, and the size of the opening 120 can be, for example, 100 μm × 100 μm.

 有機EL素子10は、開口部120において陽極配線104と陰極配線108の間に位置している。そしてこの場合、有機EL素子10の陽極12が陽極配線104と接続され、陰極14が陰極配線108と接続されている。有機EL素子10の厚さは、例えば、150~200nmとすることができる。
 絶縁膜110の上には、複数の陰極隔壁112が陽極配線104と垂直な方向に沿って形成されている。陰極隔壁112は、陰極配線108の配線同士が導通しないように、複数の陰極配線108を空間的に分離するための役割を担っている。従って、隣接する陰極隔壁112の間にそれぞれ陰極配線108が配置される。陰極隔壁112の大きさとしては、例えば、高さが2~3μm、幅が10μmの構成を採用できる。
The organic EL element 10 is located between the anode wiring 104 and the cathode wiring 108 in the opening 120. In this case, the anode 12 of the organic EL element 10 is connected to the anode wiring 104 and the cathode 14 is connected to the cathode wiring 108. The thickness of the organic EL element 10 can be set to 150 to 200 nm, for example.
On the insulating film 110, a plurality of cathode partition walls 112 are formed along a direction perpendicular to the anode wiring 104. The cathode partition 112 plays a role for spatially separating the plurality of cathode wirings 108 so that the wirings of the cathode wirings 108 do not conduct with each other. Accordingly, the cathode wiring 108 is disposed between the adjacent cathode partition walls 112. As the size of the cathode partition 112, for example, a configuration having a height of 2 to 3 μm and a width of 10 μm can be employed.

 基板11は、封止プレート116とシール材118を介し貼り合わせられている。
これにより、有機EL素子10が設けられた空間を封止することができ、有機EL素子10が空気中の水分により劣化するのを防ぐことができる。封止プレート116として、例えば、厚さが0.7~1.1mmのガラス基板を使用できる。
The substrate 11 is bonded with a sealing plate 116 and a sealing material 118 interposed therebetween.
Thereby, the space in which the organic EL element 10 is provided can be sealed, and the organic EL element 10 can be prevented from being deteriorated by moisture in the air. As the sealing plate 116, for example, a glass substrate having a thickness of 0.7 to 1.1 mm can be used.

 以上のような構造の画像表示装置100において、図示しない駆動装置により、陽極補助配線106、図示しない陰極補助配線を介し、有機EL素子10に電流を供給し、発光層を発光させることができる。そして基板11から基板11を通し、光を出射させることができる。そして、上述の画素に対応した有機EL素子10の発光、非発光を制御装置により制御することにより、画像表示装置100に目的の画像を表示できる。 In the image display device 100 having the above-described structure, a current can be supplied to the organic EL element 10 through the anode auxiliary wiring 106 and the cathode auxiliary wiring (not shown) by a driving device (not shown) to cause the light emitting layer to emit light. Then, light can be emitted from the substrate 11 through the substrate 11. The target image can be displayed on the image display device 100 by controlling the light emission and non-light emission of the organic EL element 10 corresponding to the above-described pixel by the control device.

「照明装置」
 次に、第1実施形態の有機EL素子10を用いた照明装置の一例について説明する。
 図3は、前記有機EL素子10を備える照明装置の一例を示す図である。
 図3に示した照明装置200は、上述した有機EL素子10と、有機EL素子10の基板11(図1参照)に隣接して設置され、陽極12(図1参照)に接続された端子202と、陰極14(図1参照)に配線層15を介し接続された端子203と、端子202と端子203に接続し有機EL素子10を駆動するための点灯回路201とから構成されている。
"Lighting device"
Next, an example of a lighting device using the organic EL element 10 of the first embodiment will be described.
FIG. 3 is a diagram illustrating an example of a lighting device including the organic EL element 10.
3 is installed adjacent to the organic EL element 10 described above and the substrate 11 (see FIG. 1) of the organic EL element 10, and is connected to the anode 12 (see FIG. 1). And a terminal 203 connected to the cathode 14 (see FIG. 1) through the wiring layer 15, and a lighting circuit 201 for driving the organic EL element 10 connected to the terminal 202 and the terminal 203.

 点灯回路201は、図示しない直流電源と図示しない制御回路を内部に有し、端子202と端子203を通して、有機EL素子10の陽極12と陰極14との間に電流を供給する。そして、有機EL素子10を駆動し、発光層を発光させて、基板11を通し、光を出射させ、照明光として利用する。発光層は白色光を出射する発光材料より構成されていてもよく、また緑色光(G)、青色光(B)、赤色光(R)を出射する発光材料を使用した有機EL素子10をそれぞれ複数個設け、その合成光が白色となるようにしてもよい。 The lighting circuit 201 has a DC power source (not shown) and a control circuit (not shown) inside, and supplies current between the anode 12 and the cathode 14 of the organic EL element 10 through the terminal 202 and the terminal 203. Then, the organic EL element 10 is driven, the light emitting layer emits light, the light is emitted through the substrate 11, and used as illumination light. The light emitting layer may be made of a light emitting material that emits white light, and each of the organic EL elements 10 using light emitting materials that emit green light (G), blue light (B), and red light (R). A plurality of them may be provided so that the combined light is white.

 「第2実施形態」
 図4は本発明に係る有機EL素子の第2実施形態を示すものである。図4に示す有機EL素子20は、基板11上に、陽極(第1電極)12、有機EL材料からなる発光層を含む有機層13、陰極(金属層、第2電極)24をこの順に具備する。陽極12は透明導電材料からなる透明電極であり、陰極24は導電性の金属材料からなる金属電極である。陰極24は有機層13側の表面から形成された複数の貫通しない穴部24Aを有し、主に陽極12側から外部に光を取り出すように構成されたボトムエミッション型の有機EL素子20である。
 第2実施形態の有機EL素子20において先の有機EL素子10と異なる点は、陰極24に形成されている穴部24Aが陰極24の厚さ方向全部を貫通する形状では無く、陰極24の厚さの一部を基部24Bとして残すように凹部形状に形成され、穴部24Aの一側が閉じられた形状とされている点である。陰極24の穴部24Aの開口部側は有機層13で閉じられている。その他の構造において有機EL素子20は先の有機EL素子10と同様の構造であるので、同様の構造の部分の説明は略す。
“Second Embodiment”
FIG. 4 shows a second embodiment of the organic EL element according to the present invention. An organic EL element 20 shown in FIG. 4 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 24 in this order on a substrate 11. To do. The anode 12 is a transparent electrode made of a transparent conductive material, and the cathode 24 is a metal electrode made of a conductive metal material. The cathode 24 is a bottom emission type organic EL element 20 having a plurality of non-penetrating holes 24A formed from the surface on the organic layer 13 side and configured to extract light mainly from the anode 12 side. .
The difference between the organic EL element 20 of the second embodiment and the previous organic EL element 10 is that the hole 24A formed in the cathode 24 does not have a shape that penetrates the entire thickness direction of the cathode 24, but the thickness of the cathode 24. It is the point which is formed in the recessed part shape so that a part of the length may be left as the base part 24B, and has a shape in which one side of the hole part 24A is closed. The opening side of the hole 24 </ b> A of the cathode 24 is closed with the organic layer 13. In other structures, the organic EL element 20 has the same structure as that of the organic EL element 10 described above, and thus the description of the similar structure is omitted.

 第2実施形態において、穴部24Aは、陰極24の厚さ方向の一部を掘り込むように形成された非貫通の凹部形状である。穴部24Aの代表的な形状としては、第1実施形態の貫通孔部と同様に、円柱形状、楕円柱形状、多角柱形状、円錐形状、角錐形状、円錐台形状、角錐台形状、半球形状、及びこれらが複合された形状などが挙げられる。形状にテーパーがある場合は、断面において、直線状、曲線状のいずれの形状であっても良い。即ち、穴部14Aの断面形状、および平面形状はいずれも限定されない。 In the second embodiment, the hole portion 24A has a non-penetrating recess shape formed so as to dig a part of the cathode 24 in the thickness direction. As a typical shape of the hole portion 24A, like the through hole portion of the first embodiment, a cylindrical shape, an elliptical column shape, a polygonal column shape, a conical shape, a pyramid shape, a truncated cone shape, a truncated pyramid shape, and a hemispherical shape , And a shape in which these are combined. When the shape is tapered, the cross section may be linear or curved. That is, the cross-sectional shape and the planar shape of the hole 14A are not limited.

 穴部24Aの大きさは、平面視での穴部24Aの最小幅と最大幅で定義することができる。最小幅とは穴部24Aに内包される最大円の直径を言う。この最大幅とは、穴部24Aを内包する最小円の直径を言う。穴部24Aが正円の場合、最小幅と最大幅は一致する。穴部24Aの最小幅は200nm以上であることが好ましく、最小幅は300nm以上であることがより好ましい。 The size of the hole 24A can be defined by the minimum width and the maximum width of the hole 24A in plan view. The minimum width refers to the diameter of the maximum circle included in the hole 24A. The maximum width refers to the diameter of the minimum circle that includes the hole 24A. When the hole 24A is a perfect circle, the minimum width matches the maximum width. The minimum width of the hole 24A is preferably 200 nm or more, and the minimum width is more preferably 300 nm or more.

 穴部24Aの間隔は例えば50nm以上に設定することができる。間隔とは、隣接する穴部24A間の穴部を含まない最短距離をいう。穴部24Aの最大幅は他の穴部24Aと重ならない範囲でできるだけ大きいことが好ましい。複数の穴部24Aの配列は、周期的でも、非周期的でも良い。穴部24Aを備えた有機EL素子20においても、in発光位置において陰極24と発光位置との距離は大きくなりSPPモード光になるのを防ぐことができる。さらに金属からなる電極である陰極24に凹凸構造が形成されていることとなるのでSPPモード光となった光を取り出すことができる。
 第2実施形態では穴部24Aが形成され、穴部24Aの上部に陰極24の一部である基部24Bが形成されているため、発光光が陰極24側から取り出されることがなく陰極24で反射される。その結果、第1実施形態の貫通孔部14Aと比較して陽極12側に取り出される光が増える。穴部24Aの深さはSPPを抑制するために、100nm以上が好ましく、150nm以上がより好ましく、さらに200nm以上がより好ましい。
The interval between the holes 24A can be set to 50 nm or more, for example. The interval refers to the shortest distance not including the hole portion between the adjacent hole portions 24A. It is preferable that the maximum width of the hole 24A is as large as possible without overlapping the other hole 24A. The arrangement of the plurality of hole portions 24A may be periodic or aperiodic. Also in the organic EL element 20 provided with the hole 24A, the distance between the cathode 24 and the light emitting position becomes large at the in light emitting position, and it can be prevented that the light becomes SPP mode light. Furthermore, since the concavo-convex structure is formed on the cathode 24 which is an electrode made of metal, it is possible to take out the light which has become the SPP mode light.
In the second embodiment, the hole 24A is formed, and the base 24B, which is a part of the cathode 24, is formed above the hole 24A. Therefore, the emitted light is reflected from the cathode 24 without being taken out from the cathode 24 side. Is done. As a result, more light is extracted to the anode 12 side than the through hole portion 14A of the first embodiment. In order to suppress SPP, the depth of the hole 24A is preferably 100 nm or more, more preferably 150 nm or more, and even more preferably 200 nm or more.

 このようにSPPモード光を取り出すために、第2実施形態の穴部24Aの大きさは、第1実施形態の貫通孔部14Aと同様に、穴部24Aの占有面積比(発光領域(in発光領域とout発光領域を併せた領域)に対する穴部24Aの底面積の比)が、20~90%の範囲が好ましい。穴部24Aの平面視での底面積とは、陰極24と有機層13の界面における穴部24Aの面積をいう。
 陰極24に穴部24Aを形成する方法としては、蒸着等により例えばマスクを用いて成膜時に穴を形成する方法、後述する通り、別途孔部を形成した陰極を転写法等により貼り合せる方法等がある転写法等の貼り合せ等がある。貫通孔を形成した後上面に一定膜厚の層を貼り付ける方法でも良い。貫通孔を形成する方法としては第1実施形態で示した方法を用いることができる。
 以上、第1実施形態では陰極14に貫通孔部14Aを形成した例を、第2実施形態では陰極24に貫通していない穴部24Aを形成した例を示したが、1つの有機EL素子の陰極(金属層)において、貫通孔部と穴部の両方を有するものであっても構わない。
In order to take out the SPP mode light in this way, the size of the hole 24A in the second embodiment is the same as the through hole 14A in the first embodiment. The ratio of the bottom area of the hole portion 24A to the region (the region combining the region and the out emission region) is preferably in the range of 20 to 90%. The bottom area of the hole 24A in plan view refers to the area of the hole 24A at the interface between the cathode 24 and the organic layer 13.
As a method of forming the hole 24A in the cathode 24, for example, a method of forming a hole at the time of film formation by vapor deposition or the like using a mask, a method of bonding a cathode having a separate hole formed by a transfer method or the like as described later, etc. There are bonding methods such as a transfer method. A method of sticking a layer having a constant film thickness on the upper surface after forming the through hole may be used. As a method for forming the through hole, the method shown in the first embodiment can be used.
As described above, in the first embodiment, an example in which the through-hole portion 14A is formed in the cathode 14 is shown, and in the second embodiment, an example in which the hole portion 24A that does not penetrate through the cathode 24 is shown. The cathode (metal layer) may have both through holes and holes.

 「第3実施形態」
 図5は本発明に係る有機EL素子の第3実施形態を示すもので、図5に示す有機EL素子30は、基板11上に、陽極(第1電極)12、有機EL材料からなる発光層を含む有機層23、陰極(金属層、第2電極)14をこの順に具備する。陽極12は透明導電材料からなる透明電極であり、陰極14は導電性の金属材料からなる金属電極である。陰極14は複数の貫通孔部14Aを有し、主に陽極12側から外部に光を取り出すように構成されたボトムエミッション型の有機EL素子30である。
 本実施形態の有機EL素子30において、基板11、陽極12、陰極14の材料及び厚さとして、第1実施形態と同様なものを用いることができる。
“Third Embodiment”
FIG. 5 shows a third embodiment of the organic EL element according to the present invention. The organic EL element 30 shown in FIG. 5 includes a light emitting layer made of an anode (first electrode) 12 and an organic EL material on a substrate 11. An organic layer 23 including a cathode (metal layer, second electrode) 14 in this order. The anode 12 is a transparent electrode made of a transparent conductive material, and the cathode 14 is a metal electrode made of a conductive metal material. The cathode 14 is a bottom emission type organic EL element 30 having a plurality of through-hole portions 14A and configured to extract light mainly from the anode 12 side.
In the organic EL element 30 of the present embodiment, the same materials and thicknesses as those of the first embodiment can be used for the substrate 11, the anode 12, and the cathode 14.

 第3実施形態の構造において先の第1実施形態の有機EL素子10と異なる点は、陽極(第1電極)12と陰極(金属層、第2電極)14との間に有機層23よりも低い屈折率を有する第1誘電体層27を具備し、第1誘電体層27は複数の孔部27Aを有し、有機層23は少なくとも孔部27Aの内側面を覆う点である。
 本実施形態の構造において、貫通孔部14Aの形成位置と孔部27Aの形成位置は有機EL素子30の平面視で重なっている。従って第1誘電体層27は陰極14が存在する領域の下方に形成されている。貫通孔部14Aの下方には有機層23が形成されているが、有機層23の縁部23aは、貫通孔部14Aの周囲に位置する陰極14の縁部14aの下方に形成されている。図5において第1誘電体層27は有機層23と同じ膜厚で形成されているが、第1誘電体層27上に有機層23が形成され、孔部27A内に形成された有機層23が第1誘電体層27上の有機層23と連続して形成されていても良い。すなわち、後述する図15(a)、(b)に示すように、有機層23は、孔部27Aの内側面を覆う部分と、第1誘電体層27と陰極14の全体に挟まれる領域に形成される層状部を有する構成としてもよい。
 さらに、図5に示す貫通孔14Aの形成位置と孔部27Aの形成位置は、有機EL素子30を平面視した場合にずれた位置としても良い。
In the structure of the third embodiment, the difference from the organic EL element 10 of the first embodiment is that the organic layer 23 is located between the anode (first electrode) 12 and the cathode (metal layer, second electrode) 14. The first dielectric layer 27 having a low refractive index is provided, the first dielectric layer 27 has a plurality of hole portions 27A, and the organic layer 23 covers at least the inner surface of the hole portion 27A.
In the structure of the present embodiment, the formation position of the through hole portion 14 </ b> A and the formation position of the hole portion 27 </ b> A overlap in a plan view of the organic EL element 30. Accordingly, the first dielectric layer 27 is formed below the region where the cathode 14 exists. The organic layer 23 is formed below the through-hole portion 14A, but the edge portion 23a of the organic layer 23 is formed below the edge portion 14a of the cathode 14 located around the through-hole portion 14A. In FIG. 5, the first dielectric layer 27 is formed with the same thickness as the organic layer 23. However, the organic layer 23 is formed on the first dielectric layer 27, and the organic layer 23 formed in the hole 27A. May be formed continuously with the organic layer 23 on the first dielectric layer 27. That is, as shown in FIGS. 15A and 15B described later, the organic layer 23 is formed in a portion covering the inner surface of the hole 27A and a region sandwiched between the first dielectric layer 27 and the entire cathode 14. It is good also as a structure which has the layered part formed.
Furthermore, the formation position of the through hole 14A and the formation position of the hole portion 27A shown in FIG. 5 may be shifted from each other when the organic EL element 30 is viewed in plan.

 第1誘電体層27の材料としては、透光性でかつ有機層23の屈折率より低い屈折率を有する材料であれば特に制限はない。例えば、有機層23の屈折率が1.72の場合は、SOG(代表的な屈折率:1.25)、MgF(代表的な屈折率:1.38)等の金属フッ化物、PTFE等の有機フッ素化合物、SiO(代表的な屈折率:1.45)等の酸化物、各種の低融点ガラス、多孔性物質が挙げられる。
 第1誘電体層27の厚さは特に限定はされないが、例えば10~2000nmであり、好ましくは50~1000nmである。第1誘電体層27の厚さが10nmより薄いと有機層23内を進行する発光光に対して第1誘電体層27を通過する光の量が少ないため、導波モード光が取り出されにくくなる。第1誘電体層27の厚さが2000nmより厚いと有機層23の平坦度を保ちにくくなる。
The material of the first dielectric layer 27 is not particularly limited as long as it is light transmissive and has a refractive index lower than that of the organic layer 23. For example, when the refractive index of the organic layer 23 is 1.72, a metal fluoride such as SOG (typical refractive index: 1.25), MgF 2 (typical refractive index: 1.38), PTFE, etc. Organic fluorine compounds, oxides such as SiO 2 (typical refractive index: 1.45), various low-melting glasses, and porous materials.
The thickness of the first dielectric layer 27 is not particularly limited, but is, for example, 10 to 2000 nm, and preferably 50 to 1000 nm. If the thickness of the first dielectric layer 27 is less than 10 nm, the amount of light passing through the first dielectric layer 27 is small with respect to the emitted light traveling in the organic layer 23, so that guided mode light is difficult to be extracted. Become. If the thickness of the first dielectric layer 27 is greater than 2000 nm, it is difficult to maintain the flatness of the organic layer 23.

 前記構造について屈折率の比較を行う場合に、有機層23の屈折率とは、有機EL材料からなる発光層を含む有機層23を構成する全ての層の平均の屈折率をいう。後述する他の実施形態でも同様である。
 孔部27Aの形状はその内側面で光を基板11側へ屈折させる効果を奏するものであれば特に限定はされない。導波モード光を基板面(有機EL素子の発光面に平行な平面)に対しより垂直に近い方向へ屈折させる観点からは陽極12側の面積より陰極14側の面積が小さい形状が好ましい。導波モード光を強く屈折させ、より少ない伝播距離で取り出す観点からは底面の面積ができるだけ小さい形状が好ましい。図5で示した例では、内側面は基板面に対して垂直に配置される構成であるが、かかる構成に限定されない。
 孔部27Aの内側面が基板面に対する角度は30°以上が好ましく、45°以上がより好ましく、60°以上がより一層好ましい。内側面をこのような角度とすることにより、陽極側へ向かう導波モード光が孔部27Aの内側面に外側から入射して基板11側に屈折し、基板11の外表面から外部へ取り出される。
When comparing the refractive indexes of the structures, the refractive index of the organic layer 23 refers to the average refractive index of all the layers constituting the organic layer 23 including the light emitting layer made of an organic EL material. The same applies to other embodiments described later.
The shape of the hole 27A is not particularly limited as long as it has an effect of refracting light toward the substrate 11 on the inner surface thereof. From the viewpoint of refracting the guided mode light in a direction that is more perpendicular to the substrate surface (a plane parallel to the light emitting surface of the organic EL element), a shape in which the area on the cathode 14 side is smaller than the area on the anode 12 side is preferable. From the viewpoint of strongly refracting the guided mode light and taking it out with a smaller propagation distance, a shape with a surface area as small as possible is preferable. In the example shown in FIG. 5, the inner side surface is configured to be arranged perpendicular to the substrate surface, but is not limited to such a configuration.
The angle of the inner surface of the hole 27A with respect to the substrate surface is preferably 30 ° or more, more preferably 45 ° or more, and still more preferably 60 ° or more. By setting the inner surface to such an angle, guided mode light traveling toward the anode side enters the inner surface of the hole 27A from the outside, is refracted toward the substrate 11, and is extracted from the outer surface of the substrate 11 to the outside. .

 有機層23は、有機EL材料からなる発光層の他、正孔注入層、正孔輸送層、電子注入層、電子輸送層等を備えてもよく、これらを形成するための材料としては第1実施形態で用いたものと同様のものを用いることができる。 The organic layer 23 may include a hole injection layer, a hole transport layer, an electron injection layer, an electron transport layer, and the like in addition to a light emitting layer made of an organic EL material. The thing similar to what was used in embodiment can be used.

 貫通孔部14Aを備えた本実施形態の有機EL素子30は、陽極12と陰極14の間に電位差を付加するように通電すると、有機層23の内部の発光層が発光するので、透明導電材料からなる陽極12を介し基板11側から光を取り出すことができる。陰極14に貫通孔部14Aを設けた第1実施形態の効果に加えて、本実施形態では上述した通り、第1誘電体層27により導波モード光をより効率的に取り出すことができるため、第1実施形態よりも光取り出し効率が向上する。
 本実施形態においては主に貫通孔部14Aの下方に位置する有機層23からのin発光位置で特に強く発光するので、in発光位置における発光が得られ、SPPモード光を抑制して光取り出し効率を高くすることができる。
When the organic EL element 30 of the present embodiment having the through-hole portion 14A is energized so as to apply a potential difference between the anode 12 and the cathode 14, the light emitting layer inside the organic layer 23 emits light. Light can be extracted from the substrate 11 side through the anode 12 made of the above. In addition to the effect of the first embodiment in which the through hole portion 14A is provided in the cathode 14, in the present embodiment, as described above, the waveguide mode light can be extracted more efficiently by the first dielectric layer 27. The light extraction efficiency is improved as compared with the first embodiment.
In the present embodiment, light emission is particularly intense at the in emission position mainly from the organic layer 23 located below the through-hole portion 14A. Therefore, light emission at the in emission position is obtained, and light extraction efficiency is suppressed by suppressing SPP mode light. Can be high.

 図5に示す構造では陰極14に貫通孔部14Aを形成した例を示したが、陰極14には、貫通孔ではなく陰極の上面がつながった第2実施形態で示した貫通していない穴部24Aを形成しても良い。この場合でも、第2実施形態で示した陰極24に孔部24Aを形成した効果と、第3実施形態で示した第1誘電体層27を形成した効果を併せて得ることができる。
 さらに、第3実施形態として、第1誘電体層27に形成された複数の孔部27Aと連続して陽極12を穿孔(貫通しない穴を形成)した形態、孔部27Aと連続して陽極12に貫通孔を形成した形態、さらに孔部27A、陽極12と連続して基板を穿孔(貫通しない穴を形成)した形態としても良い。
In the structure shown in FIG. 5, the example in which the through-hole portion 14A is formed in the cathode 14 is shown. However, the cathode 14 is not a through-hole, but the upper surface of the cathode is connected to the non-through-hole shown in the second embodiment. 24A may be formed. Even in this case, the effect of forming the hole 24A in the cathode 24 shown in the second embodiment and the effect of forming the first dielectric layer 27 shown in the third embodiment can be obtained together.
Furthermore, as a third embodiment, the anode 12 is continuously drilled (a hole that does not penetrate) is formed continuously with the plurality of holes 27A formed in the first dielectric layer 27, and the anode 12 is continuously formed with the hole 27A. Further, a form in which a through hole is formed, and a form in which the substrate is continuously drilled (a hole that does not pass through) is formed continuously with the hole 27A and the anode 12 may be employed.

 「第4実施形態」
 図6と図7は本発明に係る有機EL素子の第4実施形態を示すものである。図6、図7に示す有機EL素子40は、基板11上に、陽極(第1電極)12、有機EL材料からなる発光層を含む有機層13、陰極(金属層、第2電極)14をこの順に具備する。この陰極14と有機層13との間には、ITOなどの透明導電材料からなる保護層44を備える。陽極12は透明導電材料からなる透明電極であり、陰極14は導電性の金属材料からなる金属電極である。陰極14は複数の貫通孔部14Aを有し、主に陽極12側から外部に光を取り出すように構成されたボトムエミッション型の有機EL素子40である。
 本実施形態の有機EL素子40において、第1実施形態の有機EL素子10と異なる点は、保護層44を有する点である。ここで保護層44は、陰極14に貫通孔部14Aを形成する際、熱等のエネルギーで有機層13がダメージを受けるのを防ぐ目的で形成される。貫通孔部14Aを別途形成した陰極14を転写法等により貼り合せる方法等を用いて有機EL素子40を形成する際に、熱や圧力によって有機層13がダメージを受けるのを防ぐこともできる。このような保護層44として用いられる材料としてはSPPを発生する金属でなければ何でも良い。例えば、導電性材料であれば前述の保護効果の他に、発光領域をin発光とout発光の両方にすることができるという利点がある。
 本実施形態の有機EL素子40において、基板11、陽極12、有機層13、陰極14の材料及び厚さとして、第1実施形態と同様なものを用いることができる。
“Fourth Embodiment”
6 and 7 show a fourth embodiment of the organic EL element according to the present invention. The organic EL element 40 shown in FIGS. 6 and 7 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 14 on a substrate 11. In this order. A protective layer 44 made of a transparent conductive material such as ITO is provided between the cathode 14 and the organic layer 13. The anode 12 is a transparent electrode made of a transparent conductive material, and the cathode 14 is a metal electrode made of a conductive metal material. The cathode 14 is a bottom emission type organic EL element 40 having a plurality of through-hole portions 14A and configured to extract light mainly from the anode 12 side.
The organic EL element 40 of the present embodiment is different from the organic EL element 10 of the first embodiment in that a protective layer 44 is provided. Here, the protective layer 44 is formed for the purpose of preventing the organic layer 13 from being damaged by energy such as heat when the through-hole portion 14 </ b> A is formed in the cathode 14. It is possible to prevent the organic layer 13 from being damaged by heat or pressure when the organic EL element 40 is formed using a method in which the cathode 14 separately formed with the through-hole portion 14A is bonded by a transfer method or the like. Any material can be used for the protective layer 44 as long as it is not a metal that generates SPP. For example, in the case of a conductive material, in addition to the protective effect described above, there is an advantage that the light emitting region can be both in light emission and out light emission.
In the organic EL element 40 of the present embodiment, the same materials and thicknesses as those of the first embodiment can be used for the substrate 11, the anode 12, the organic layer 13, and the cathode 14.

図6,7に示す構造では陰極14に貫通孔部14Aを形成した例を示したが、陰極14には、貫通孔ではなく第2実施形態で示した陰極の上面がつながった貫通していない穴部24Aを形成しても良い。この場合でも、第2実施形態で示した陰極24に穴部24Aを形成した効果と、第4実施形態で示した保護層41を形成した効果を併せて得ることができる。 In the structure shown in FIGS. 6 and 7, an example in which the through hole portion 14 </ b> A is formed in the cathode 14 is shown. However, the cathode 14 is not penetrating the upper surface of the cathode shown in the second embodiment instead of the through hole. The hole 24A may be formed. Even in this case, the effect of forming the hole 24A in the cathode 24 shown in the second embodiment and the effect of forming the protective layer 41 shown in the fourth embodiment can be obtained together.

 「第5実施形態」
 図8と図9は本発明に係る有機EL素子の第5実施形態を示すものである。図8と図9に示す有機EL素子50は、基板11上に、陽極(第1電極)12、有機EL材料からなる発光層を含む有機層13、陰極(第2電極)54、誘電体材料からなる絶縁層55、金属層56をこの順に具備する。陽極12及び陰極54はいずれも透明導電材料からなる透明電極である。金属層56は複数の貫通孔部56Aを有し、主に陽極12側から外部に光を取り出すように構成されたボトムエミッション型の有機EL素子50である。
 本実施形態の有機EL素子50において、基板11、陽極12、有機層13の材料及び厚さとして、それぞれ第1実施形態と同様なものを用いることができる。一方、有機EL素子50では、陰極54が透明導電材料からなる透明電極であり、陰極54は金属層56に貫通孔部56Aを形成する際に、前述の第4実施形態の保護層44と同様の効果をもたらす。陰極54の材料としては、SPPを発生する金属材料ではなく、金属酸化物や有機導電性材料等の公知の透明導電性材料であれば良い。特に絶縁層55あるいは貫通孔部56A内の屈折率と比較して高屈折率であって、さらに有機層13の屈折率と比較して高屈折率の材料であることが好ましい。さらに上記の屈折率とすることでout発光領域において陰極54/絶縁層55/金属層56がOtto型配置の構造を取ることになるため光取り出し効率を向上することができる。
“Fifth Embodiment”
8 and 9 show a fifth embodiment of the organic EL element according to the present invention. 8 and 9 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, a cathode (second electrode) 54, and a dielectric material. An insulating layer 55 and a metal layer 56 are provided in this order. Both the anode 12 and the cathode 54 are transparent electrodes made of a transparent conductive material. The metal layer 56 is a bottom emission type organic EL element 50 having a plurality of through-hole portions 56A and configured to extract light mainly from the anode 12 side.
In the organic EL element 50 of this embodiment, the same materials and thicknesses as those of the first embodiment can be used for the substrate 11, the anode 12, and the organic layer 13. On the other hand, in the organic EL element 50, the cathode 54 is a transparent electrode made of a transparent conductive material, and the cathode 54 is the same as the protective layer 44 of the fourth embodiment described above when the through-hole portion 56A is formed in the metal layer 56. Bring about the effect. The material of the cathode 54 may be a known transparent conductive material such as a metal oxide or an organic conductive material, not a metal material that generates SPP. In particular, a material having a high refractive index compared to the refractive index in the insulating layer 55 or the through-hole portion 56 </ b> A and a high refractive index compared to the refractive index of the organic layer 13 is preferable. Furthermore, by setting the above refractive index, the cathode 54 / insulating layer 55 / metal layer 56 have an Otto type arrangement in the out emission region, so that the light extraction efficiency can be improved.

 図8,9に示す構造では金属層56に貫通孔部56Aを形成した例を示したが、金属層56には、貫通孔ではなく第2実施形態で示した陰極24のような金属層の上面がつながった貫通していない穴部24Aを形成しても良い。この場合でも、第2実施形態で示した陰極24に穴部24Aを形成した効果と、第5実施形態で示した効果を併せて得ることができる。さらに、一つの有機EL素子の金属層において、貫通孔部と穴部の両方を有するものとしても構わない。 In the structure shown in FIGS. 8 and 9, an example in which the through hole portion 56A is formed in the metal layer 56 is shown. However, the metal layer 56 is not a through hole but a metal layer such as the cathode 24 shown in the second embodiment. You may form the hole part 24A which the upper surface connected and does not penetrate. Even in this case, the effect of forming the hole 24A in the cathode 24 shown in the second embodiment and the effect shown in the fifth embodiment can be obtained together. Furthermore, the metal layer of one organic EL element may have both a through hole and a hole.

 「第6実施形態」
 図10は本発明に係る有機EL素子の第6実施形態を示すものである。図10に示す有機EL素子60は、基板11上に、陽極(第1電極)12、有機EL材料からなる発光層を含む有機層13、陰極(金属層、第2電極)64をこの順に具備する。陽極12は透明導電材料からなる透明電極であり、陰極64は導電性の金属材料からなる金属電極である。陰極64は有機層13側の表面から形成された複数の貫通しない穴部64Aを有し、主に前記陽極12側から外部に光を取り出すように構成されたボトムエミッション型の有機EL素子60である。
“Sixth Embodiment”
FIG. 10 shows a sixth embodiment of the organic EL element according to the present invention. An organic EL element 60 shown in FIG. 10 includes an anode (first electrode) 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 64 in this order on a substrate 11. To do. The anode 12 is a transparent electrode made of a transparent conductive material, and the cathode 64 is a metal electrode made of a conductive metal material. The cathode 64 is a bottom emission type organic EL element 60 which has a plurality of non-penetrating holes 64A formed from the surface on the organic layer 13 side, and is configured to mainly extract light from the anode 12 side to the outside. is there.

 本実施形態の有機EL素子60において、基板11、陽極12、有機層13の材料及び厚さとして、第1実施形態と同様なものを用いることができる。本実施形態の有機EL素子60は、別途穴部64Aを形成した陰極64を転写法等により貼り合わせる方法等を用いて有機層13に接するように接合したものである。Al層などを別体として図示略の基板等の上に構成し、貼り合わせにより陰極64とし有機層13に取り付けた構造とされている。この貼り合わせ方法は、公知の方法を用いることができる。 In the organic EL element 60 of the present embodiment, the same materials and thicknesses as those of the first embodiment can be used for the substrate 11, the anode 12, and the organic layer 13. The organic EL element 60 of the present embodiment is obtained by bonding the cathode 64 with the hole 64A separately formed so as to be in contact with the organic layer 13 using a transfer method or the like. An Al layer or the like is separately formed on a substrate (not shown) and the like, and the cathode 64 is attached to the organic layer 13 by bonding. A known method can be used as the bonding method.

 別の方法として最初に穴部64Aの側面部を他の実施形態の貫通孔部と同様の方法で形成した後、上面に一定膜厚の層を上記方法で貼り合せても良い。この場合、貼り合せる層は側面部と異なる材料でもよいが、光を反射する層であることが好ましい。反射する光の量が増えることにより基板11側から取り出す光を増やすことができる。
 本実施形態は、特に有機層上の陰極に貫通孔部や穴部を形成することが難しい場合に効果的である。有機層上に成膜された陰極に貫通孔部や穴部を形成する場合、形成方法としては、有機層が熱や光で劣化する方法や、有機層が溶解する溶剤を用いる方法を用いることができない。このため、例えば、貫通孔部や穴部が複雑な形状である場合や微細である場合に、本実施形態の貼り合せ方法は有効である。
As another method, after the side surface portion of the hole portion 64A is first formed by the same method as that of the through hole portion of the other embodiments, a layer having a constant film thickness may be bonded to the upper surface by the above method. In this case, the layer to be bonded may be a material different from that of the side surface portion, but is preferably a layer that reflects light. Increasing the amount of reflected light can increase the amount of light extracted from the substrate 11 side.
This embodiment is particularly effective when it is difficult to form a through hole or a hole in the cathode on the organic layer. When forming a through hole or a hole in a cathode formed on an organic layer, a method of forming the organic layer by heat or light or a method using a solvent in which the organic layer dissolves is used. I can't. For this reason, for example, when the through-hole part and the hole part have a complicated shape or are fine, the bonding method of the present embodiment is effective.

 本実施形態の陰極64は、第2実施形態の陰極24に形成される穴部24Aと同等の大きさ及び間隔で形成された穴部64Aを有するが、陰極64は第2実施形態の陰極24より数倍程度厚くすることが容易であり、第2実施形態の陰極24の穴部24Aよりもより深い穴部64Aとすることが容易である。穴部64Aは陰極64の厚さ方向全体を貫通する深さではなく、陰極64の一部を基部64Bとして残すような凹部形状に形成されているが、貫通孔部を形成した形態でも構わない。
 陰極64は穴部64Aの開口側64aを有機層13で閉じるようにして有機層13に密着されている。
 その他の構造において有機EL素子60は先の有機EL素子10と同様の構造であるので、同様の構造の部分の説明は略す。
The cathode 64 of the present embodiment has hole portions 64A formed with the same size and spacing as the hole portions 24A formed in the cathode 24 of the second embodiment, but the cathode 64 is the cathode 24 of the second embodiment. It is easy to make it thicker by several times, and it is easy to make the hole 64A deeper than the hole 24A of the cathode 24 of the second embodiment. The hole 64A is not deep enough to penetrate the entire thickness direction of the cathode 64, but is formed in a concave shape so as to leave a part of the cathode 64 as the base 64B. However, a form in which a through hole is formed may be used. .
The cathode 64 is in close contact with the organic layer 13 so that the opening side 64a of the hole 64A is closed by the organic layer 13.
In other structures, the organic EL element 60 has the same structure as that of the organic EL element 10 described above.

 図10に示すように有機層13において穴部64Aと平面視で重なるin発光位置では、out発光位置に比べて陰極64との距離が大きく、穴部64Aと重ならないout発光位置では、陰極64との距離が小さくなる。
 ここで、in発光位置は陰極64との距離が大きく、穴部64Aに対応する領域であるので、SPPモードへのエネルギー移動が少なく、SPPモード光の発生が少なく、プラズモン損失が少なくなる。このSPPモード光の発生を少なくするためには、穴部64Aの内径の大きさが重要であり、in発光位置と陰極64との距離が100nm以上離れた位置ではSPPモード光の発生を少なくでき、光取り出し効率を向上させることができる。
As shown in FIG. 10, the in-light emission position that overlaps the hole 64 </ b> A in plan view in the organic layer 13 has a larger distance from the cathode 64 than the out emission position, and the out-light emission position that does not overlap the hole 64 </ b> A. The distance between and becomes smaller.
Here, since the in light emission position is a region corresponding to the hole 64A with a large distance from the cathode 64, energy transfer to the SPP mode is small, generation of SPP mode light is small, and plasmon loss is small. In order to reduce the generation of the SPP mode light, the size of the inner diameter of the hole 64A is important, and the generation of the SPP mode light can be reduced at a position where the distance between the in light emission position and the cathode 64 is 100 nm or more. The light extraction efficiency can be improved.

 穴部64Aの深さについては、100nm以上、より好ましくは150nm以上、さらに好ましくは200nm以上にするとin発光位置において陰極64との距離を確実に大きく確保できる。つまり、in発光位置でのSPPモードへのエネルギー移動が少なく、SPPモード光の発生が少なく、プラズモン損失が少なくなる。
 本実施形態の穴部64Aの平面視での占有面積比(発光領域(in発光領域+out発光領域)に対する穴部64Aの底面積の比)が、20~90%の範囲であることが好ましい。穴部64Aの平面視での底面積とは、陰極64と有機層13の界面における穴部64Aの面積をいう。
If the depth of the hole 64A is 100 nm or more, more preferably 150 nm or more, and even more preferably 200 nm or more, the distance from the cathode 64 can be surely ensured at the in emission position. That is, the energy transfer to the SPP mode at the in emission position is small, the generation of SPP mode light is small, and the plasmon loss is small.
The occupied area ratio (ratio of the bottom area of the hole 64A to the light emitting region (in light emitting region + out light emitting region)) in plan view of the hole 64A of the present embodiment is preferably in the range of 20 to 90%. The bottom area of the hole 64A in plan view refers to the area of the hole 64A at the interface between the cathode 64 and the organic layer 13.

 「第7実施形態」
 図11及び図12は本発明に係る有機EL素子の第7実施形態を示すものである。図11に示す有機EL素子70は、基板11上に、陽極(第1電極)72、有機EL材料からなる発光層を含む有機層13、陰極(金属層、第2電極)14をこの順に具備する。陽極12は透明導電材料からなる透明電極であり、陰極14は導電性の金属材料からなる金属電極である。陰極14は複数の貫通孔部14Aを有し、主に前記陽極12側から外部に光を取り出すように構成されたボトムエミッション型の有機EL素子70である。
 本実施形態の有機EL素子70において、基板11、陽極72、有機層13、陰極14の材料及び厚さとして、第1実施形態と同様なものを用いることができる。
“Seventh Embodiment”
11 and 12 show a seventh embodiment of the organic EL element according to the present invention. An organic EL element 70 shown in FIG. 11 includes an anode (first electrode) 72, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode (metal layer, second electrode) 14 in this order on a substrate 11. To do. The anode 12 is a transparent electrode made of a transparent conductive material, and the cathode 14 is a metal electrode made of a conductive metal material. The cathode 14 is a bottom emission type organic EL element 70 having a plurality of through-hole portions 14A and configured to extract light mainly from the anode 12 side.
In the organic EL element 70 of this embodiment, the same materials and thicknesses as those of the first embodiment can be used for the substrate 11, the anode 72, the organic layer 13, and the cathode 14.

 第7実施形態の構造において先の第1実施形態の有機EL素子10と異なる点は、陽極72に複数の孔部72Aを備え、陽極72の屈折率より低く且つ有機層13の屈折率よりも低い屈折率を有する第2誘電体層77を、複数の孔部72A内に具備している点である。
 第2誘電体層77の材料としては、透光性であり、陽極72の屈折率より低く、且つ有機層13の屈折率よりも低い屈折率を有する材料であれば特に制限はされない。例えば、陽極72の材料がITO(代表的な屈折率:1.82)であり、有機層の屈折率が1.72の場合は、SOG(代表的な屈折率:1.25)、MgF(代表的な屈折率:1.38)等の金属フッ化物、PTFE等の有機フッ素化合物、SiO(代表的な屈折率:1.45)等の酸化物、各種の低融点ガラス、多孔性物質等の材料が挙げられる。
 第2誘電体層77の厚さは特に限定はされないが、例えば10~2000nmであり、好ましくは50~1000nmである。第2誘電体層77の厚さが、10nmより薄いと有機層13内を進行する発光光に対して誘電体層77を通過する光の量が少ないため、導波モード光が取り出されにくくなる。第2誘電体層77の厚さが、2000nmより厚いと有機層13の平坦度を保ちにくくなる。
The structure of the seventh embodiment is different from the organic EL element 10 of the first embodiment in that the anode 72 includes a plurality of holes 72A, which is lower than the refractive index of the anode 72 and higher than the refractive index of the organic layer 13. The second dielectric layer 77 having a low refractive index is provided in the plurality of holes 72A.
The material of the second dielectric layer 77 is not particularly limited as long as it is light transmissive and has a refractive index lower than that of the anode 72 and lower than that of the organic layer 13. For example, when the material of the anode 72 is ITO (typical refractive index: 1.82) and the refractive index of the organic layer is 1.72, SOG (typical refractive index: 1.25), MgF 2 Metal fluorides (typical refractive index: 1.38), organic fluorine compounds such as PTFE, oxides such as SiO 2 (typical refractive index: 1.45), various low-melting glasses, porosity Examples include materials such as substances.
The thickness of the second dielectric layer 77 is not particularly limited, but is, for example, 10 to 2000 nm, and preferably 50 to 1000 nm. If the thickness of the second dielectric layer 77 is less than 10 nm, the amount of light passing through the dielectric layer 77 relative to the emitted light traveling in the organic layer 13 is small, so that waveguide mode light is difficult to be extracted. . If the thickness of the second dielectric layer 77 is thicker than 2000 nm, it becomes difficult to maintain the flatness of the organic layer 13.

 孔部72Aの形状はその内側面で光を基板11側へ屈折させる効果を奏するものであれば特に限定はされない。導波モード光を基板面に対しより垂直に近い方向へ屈折させる観点からは陽極72側の面積より陰極14側の面積が小さい形状が好ましい。導波モード光を強く屈折させ、より少ない伝播距離で取り出す観点からは底面の面積が小さい形状が好ましい。図11で示した例では、内側面は基板面に対して垂直に配置される構成であるが、かかる構成に限定されない。
 孔部72Aの内側面が基板面に対する角度は30°以上が好ましく、45°以上がより好ましく、60°以上がより一層好ましい。内側面をこのような角度とすることにより、陽極側へ向かう導波モード光が孔部72Aの内側面に外側から入射して基板11側に屈折し、基板11の外表面から外部へ取り出される。
The shape of the hole 72A is not particularly limited as long as it has an effect of refracting light toward the substrate 11 on the inner surface thereof. From the viewpoint of refracting the guided mode light in a direction more perpendicular to the substrate surface, a shape having a smaller area on the cathode 14 side than an area on the anode 72 side is preferable. From the viewpoint of strongly refracting the guided mode light and taking it out with a smaller propagation distance, a shape having a small bottom area is preferable. In the example illustrated in FIG. 11, the inner side surface is configured to be disposed perpendicular to the substrate surface, but is not limited to such a configuration.
The angle of the inner side surface of the hole 72A with respect to the substrate surface is preferably 30 ° or more, more preferably 45 ° or more, and still more preferably 60 ° or more. By setting the inner surface to such an angle, guided mode light directed toward the anode side enters the inner surface of the hole 72A from the outside, is refracted toward the substrate 11, and is extracted from the outer surface of the substrate 11 to the outside. .

 図11に示す構造では有機層13内の発光層からの発光を得ることができるが、特に貫通孔部14Aと平面視で重なるin発光位置では、out発光位置に比べて陰極14との距離が大きく、貫通孔部14Aと重ならないout発光位置では、陰極14との距離が小さくなる。
 このため、一般的な有機ELに用いられる材料の場合、陰極と陽極の距離が短いout発光位置で発光しやすい。陽極および陰極の有機層側に上述したような導電性の高いバッファ層を用いることにより、in発光位置の発光を強くすることができる。さらに、図11に示す構造では、陰極側の貫通孔部14Aと陽極側の第2誘電体層77の位置が一致しているが、本実施形態はこれに限定されない。具体的には、貫通孔部14Aが陽極72と平面視上で一致していても良いし、ずれていても良い。
In the structure shown in FIG. 11, light emission from the light emitting layer in the organic layer 13 can be obtained. In particular, in the in light emission position overlapping with the through hole portion 14A in plan view, the distance from the cathode 14 is larger than the out light emission position. At the out emission position that is large and does not overlap with the through-hole portion 14A, the distance from the cathode 14 is small.
For this reason, in the case of a material used for a general organic EL, light is easily emitted at an out emission position where the distance between the cathode and the anode is short. By using a highly conductive buffer layer as described above on the organic layer side of the anode and the cathode, light emission at the in light emission position can be strengthened. Furthermore, in the structure shown in FIG. 11, the positions of the cathode side through-hole portion 14A and the anode side second dielectric layer 77 coincide, but the present embodiment is not limited to this. Specifically, the through-hole portion 14A may coincide with the anode 72 in plan view or may be displaced.

 ここで、in発光位置は陰極14との距離が大きく、貫通孔部14Aに対応する領域であるので、SPPモード光の発生が少なく、プラズモン損失が少なくなる。このSPPモード光の発生を少なくするためには、貫通孔部14Aの内径の大きさが重要であり、in発光位置と陰極14との距離が100nm以上離れた位置ではSPPモード光の発生を少なくでき、光取り出し効率を向上させることができる。
 このため、貫通孔部14Aの最小幅を、100~1000nmの範囲とすることが好ましく、150~800nmの範囲とすることがさらに好ましい。
 図11、12に示す構造では陰極14の貫通孔部14Aを形成した例について説明したが、これに限定されず、陰極14には、貫通孔ではなく第2実施形態で示した陰極の上面がつながった貫通していない穴部24Aを形成しても良い。この場合でも、第2実施形態で示した陰極24に穴部24Aを形成した効果と、第7実施形態で示した効果を併せて得ることができる。
 この場合の穴部の最小幅も、100~1000nmの範囲とすることが好ましく、150~800nmの範囲とすることがさらに好ましい。
Here, since the in light emission position is a region corresponding to the through-hole portion 14A with a large distance from the cathode 14, the generation of SPP mode light is small and the plasmon loss is small. In order to reduce the generation of the SPP mode light, the size of the inner diameter of the through hole portion 14A is important, and the generation of the SPP mode light is reduced at a position where the distance between the in light emission position and the cathode 14 is 100 nm or more. And the light extraction efficiency can be improved.
Therefore, the minimum width of the through hole portion 14A is preferably in the range of 100 to 1000 nm, and more preferably in the range of 150 to 800 nm.
In the structure shown in FIGS. 11 and 12, the example in which the through hole portion 14A of the cathode 14 is formed has been described. However, the present invention is not limited to this, and the cathode 14 has not the through hole but the upper surface of the cathode shown in the second embodiment. A connected non-penetrating hole 24A may be formed. Even in this case, the effect of forming the hole 24A in the cathode 24 shown in the second embodiment and the effect shown in the seventh embodiment can be obtained together.
In this case, the minimum width of the hole is preferably in the range of 100 to 1000 nm, and more preferably in the range of 150 to 800 nm.

 本発明に係る有機EL素子の実施例について以下に説明する。  Examples of organic EL elements according to the present invention will be described below. *

 図24(a)、(b)は、第1実施形態の有機EL素子の貫通孔部14Aに対する光源位置の光取り出し効率への影響を把握するために、有限差分時間領域(FDTD:Finite Difference Time Domain)法を用いて、放射強度の相対値(光取り出し効率η)をコンピュータシミュレーションする場合の有機EL素子のモデル構造を示す。図24(a)は計算に用いたモデル構造の断面模式図、図24(b)は貫通孔部を拡大した斜視図である。FDTD法は、電磁界の時間変化を記述するMaxwellの方程式を空間的・時間的に差分化し、空間の各点における電磁界の時間変化を追跡する解析手法である。より具体的には、発光層における発光を微小ダイポールからの放射と捉えて、その放射(電磁界)の時間変化を追跡するという計算手法を採る。 FIGS. 24A and 24B show a finite difference time domain (FDTD: FiniteFiDifference Time) in order to grasp the influence of the light source position on the light extraction efficiency with respect to the through hole portion 14A of the organic EL element of the first embodiment. The model structure of the organic EL element in the case of performing a computer simulation of the relative value of the radiation intensity (light extraction efficiency η) using the Domain method is shown. FIG. 24A is a schematic cross-sectional view of the model structure used for the calculation, and FIG. 24B is an enlarged perspective view of the through hole portion. The FDTD method is an analysis method for tracking the time change of the electromagnetic field at each point in space by differentiating Maxwell's equation describing the time change of the electromagnetic field spatially and temporally. More specifically, a calculation method is adopted in which light emission in the light emitting layer is regarded as radiation from a minute dipole, and time variation of the radiation (electromagnetic field) is tracked.

 計算は、微小ダイポールの向きがX方向(基板面に平行な方向)、Z方向(基板面にへ垂直な方向)およびランダムな方向(ダイポールの方向がXYZ空間でランダムに配向しているもの)の場合について行った。ここで、XY方向のダイポールから放射される光は基板面に垂直方向に伝播する光がメインであり、Z方向のダイポールから放射される光は基板面に平行な方向に伝播する光がメインである。そこで、以下本明細書では、X方向のダイポールから放射される光を垂直方向伝播光、Z方向のダイポールから放射される光を平行方向伝播光、ランダムなダイポールから放射される光をランダム伝播光と呼ぶこととする。 The calculation shows that the direction of the micro dipole is X direction (direction parallel to the substrate surface), Z direction (direction perpendicular to the substrate surface) and random direction (dipole direction is randomly oriented in XYZ space) I went about the case. Here, the light radiated from the dipole in the XY direction is mainly light propagating in the direction perpendicular to the substrate surface, and the light radiated from the dipole in the Z direction is mainly light propagated in the direction parallel to the substrate surface. is there. Therefore, in the following description, the light emitted from the X-direction dipole is the vertical propagation light, the light emitted from the Z-direction dipole is the parallel propagation light, and the light emitted from the random dipole is the random propagation light. I will call it.

平行方向伝播光は、貫通孔部を有さない通常の有機EL素子では導波モード光またはSPPモード光となって素子内部に閉じ込められる光である。そこでこの平行方向伝播光の取り出し効率の向上度合いを計算することにより、本発明の有機EL素子の光取り出し性能の高さを評価することができる。ランダム伝播光は、実際の有機EL素子の発光状態と同様の発光状態であり、このランダム伝播光の光取り出し効率の大小を比較することにより、実際に作成した素子の外部量子効率の大小を見積もることが可能である。そこで、以降特に断りがない場合は、ランダム伝播光に対する光取り出し効率の高さを、光取り出し性能の高さを評価する基準として用いる。 The propagation light in the parallel direction is light that is confined inside the device as waveguide mode light or SPP mode light in a normal organic EL device having no through-hole portion. Therefore, by calculating the degree of improvement in the extraction efficiency of the parallel propagation light, the high light extraction performance of the organic EL element of the present invention can be evaluated. Random propagation light has a light emission state similar to the light emission state of an actual organic EL device, and the magnitude of the external quantum efficiency of the actually created device is estimated by comparing the light extraction efficiency of this random propagation light. It is possible. Therefore, unless otherwise specified, the high light extraction efficiency with respect to random propagation light is used as a reference for evaluating the high light extraction performance.

 図24(a)、(b)に示す第1実施形態の有機EL素子82のモデル構造は、図1に示す構造と同様である。基板11はガラスからなるとして、屈折率としては1.52を用いた。陽極12はITOからなるとして、屈折率としては波長550nmで1.82+0.009iとし、その他の波長はローレンツモデルで外挿した。有機層13の屈折率としては1.72を用いた。陰極14はAlからなるとして、屈折率として波長550nmで0.649+4.32iとし、その他の波長はドルーデモデルで外挿した。 The model structure of the organic EL element 82 of the first embodiment shown in FIGS. 24A and 24B is the same as the structure shown in FIG. The substrate 11 is made of glass, and a refractive index of 1.52 is used. Assuming that the anode 12 is made of ITO, the refractive index is set to 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated by a Lorentz model. As the refractive index of the organic layer 13, 1.72 was used. The cathode 14 is made of Al, and the refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and the other wavelengths are extrapolated by the Drude model.

 陰極14に形成した貫通孔部14A(半径800nmに設定)は正方格子状に周期2000nmで配置し、貫通孔部14A内の媒質は窒素であるとし屈折率は1.0とした。陽極12、有機層13、陰極14のそれぞれの膜厚は、150nm、100nm、100nmとした。
 図24(a)に示すように、貫通孔部14Aの中心を原点(0)として、光源が、この位置から面内方向で200、400、600、800、1000nmだけ離れた位置についてシミュレーションを行った。図24(a)、(b)では、光源位置が0nm(in発光)と1000nm(out発光)の場合の光源位置を星印で示す。
 比較のため、陰極14に貫通孔部14Aを形成していない以外は同じ構成とした場合(標準)についてもシミュレーションを行った。
The through-hole portions 14A (set to a radius of 800 nm) formed in the cathode 14 are arranged in a square lattice with a period of 2000 nm, and the medium in the through-hole portion 14A is nitrogen, and the refractive index is 1.0. The film thicknesses of the anode 12, the organic layer 13, and the cathode 14 were 150 nm, 100 nm, and 100 nm, respectively.
As shown in FIG. 24A, the center of the through-hole portion 14A is set as the origin (0), and the light source is simulated at a position away from this position by 200, 400, 600, 800, 1000 nm in the in-plane direction. It was. 24A and 24B, the light source positions when the light source positions are 0 nm (in light emission) and 1000 nm (out light emission) are indicated by stars.
For comparison, a simulation was also performed for the same configuration (standard) except that the through-hole portion 14A was not formed in the cathode 14.

 シミュレーション結果を図25に示す。図25(a)は平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示し、図25(b)はランダム方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 このシミュレーションは、貫通孔部14Aの中央に光源がある場合(in発光)から金属電極下に光源がある場合(out発光)まで、その位置により光取り出し効率がどう変化するかを調べたことになる。
The simulation result is shown in FIG. FIG. 25A shows the wavelength dependence of the light extraction efficiency η of parallel direction propagation light to the glass substrate, and FIG. 25B shows the wavelength dependence of the light extraction efficiency η of random direction propagation light to the glass substrate. Show.
This simulation examined how the light extraction efficiency changes depending on the position from when the light source is in the center of the through-hole portion 14A (in light emission) to when the light source is under the metal electrode (out light emission). Become.

 図25に示す結果から、貫通孔部14Aがない場合(標準)と比較して、発光位置がどこにあっても光取り出し効率が向上している。特に、貫通孔部14Aでは近傍に陰極(金属層)がないためSPPを抑制でき、貫通孔部14Aを形成した効果を確認することができる。
陰極(金属層)14下部で生成した発光光は上部の陰極(金属層)14にSPPモード光として捕捉されるが、上述したように貫通孔部14Aの部分で再放射され、SPPを取り出すことができ光取り出し効率が向上する。
From the results shown in FIG. 25, the light extraction efficiency is improved wherever the light emission position is, compared to the case where there is no through-hole portion 14A (standard). In particular, since there is no cathode (metal layer) in the vicinity of the through-hole portion 14A, SPP can be suppressed, and the effect of forming the through-hole portion 14A can be confirmed.
The emitted light generated at the lower portion of the cathode (metal layer) 14 is captured as SPP mode light at the upper cathode (metal layer) 14, but is re-radiated at the through-hole portion 14 A as described above to extract the SPP. Light extraction efficiency is improved.

 有機EL素子における発光部位は、電極間の最短経路近傍であり、本計算に用いた構造の有機EL素子の場合、通常の有機材料では陰極(金属層)14下部が発光(すなわちout発光)するが、上述したとおり、有機層13の陰極(金属層)14側に導電性の良い材料でバッファ層を形成すると全面発光させることができる。SPP抑制効果の高い貫通孔部の内部だけで発光(すなわちin発光)させるためには、陰極(金属層)と有機層の間の一部に絶縁層を形成することで対応できる。
 全面発光した場合の光取り出し効率は、各部位を光源とした計算の積算結果となり、結果として、いずれの発光形態の場合においても、貫通孔部を形成したことにより光取出しが向上すると言える。
 この結果は、貫通しない穴部を形成した第2実施形態の有機EL素子でも同様のことが言える。
The light emitting part in the organic EL element is in the vicinity of the shortest path between the electrodes. In the case of the organic EL element having the structure used in this calculation, the lower part of the cathode (metal layer) 14 emits light (that is, out light emission) in a normal organic material. However, as described above, when the buffer layer is formed of a material having good conductivity on the cathode (metal layer) 14 side of the organic layer 13, the entire surface can emit light. In order to emit light (that is, in light emission) only inside the through hole portion having a high SPP suppressing effect, it can be handled by forming an insulating layer in a part between the cathode (metal layer) and the organic layer.
The light extraction efficiency when light is emitted from the entire surface is an integrated result of calculation using each part as a light source. As a result, it can be said that the light extraction is improved by forming the through-hole portion in any light emission mode.
The same can be said for the organic EL element of the second embodiment in which a hole that does not penetrate is formed.

 図13及び図14は、第1実施形態の有機EL素子の効果を確認するために、先の例と同様のFDTD法を用いて、光取り出し効率ηをコンピュータシミュレーションした結果を示す。 FIGS. 13 and 14 show the results of computer simulation of the light extraction efficiency η using the same FDTD method as in the previous example in order to confirm the effect of the organic EL element of the first embodiment.

 シミュレーションで用いた、第1実施形態の有機EL素子10のモデル構造は、図1に示す構造と同様である。基板11はガラスからなるとして、屈折率としては1.52を用いた。陽極12はITOからなるとして、屈折率としては波長550nmで1.82+0.009iとし、その他の波長はローレンツモデルを用いて外挿した。有機層13の屈折率としては1.72を用いた。陰極14はAlからなるとして、屈折率として波長550nmで0.649+4.32iとし、その他の波長はドルーデモデルを用いて外挿した。 The model structure of the organic EL element 10 of the first embodiment used in the simulation is the same as the structure shown in FIG. The substrate 11 is made of glass, and a refractive index of 1.52 is used. The anode 12 is made of ITO, and the refractive index is 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model. As the refractive index of the organic layer 13, 1.72 was used. The cathode 14 is made of Al. The refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.

 陰極14に形成した貫通孔部14A内の媒質は窒素であるとし、屈折率として1.0を用いた。陽極12、有機層13、陰極14それぞれの層厚は、150nm、100nm、100nmとした。
 以上の条件にて、陰極14に正方格子状の配置で形成した複数の貫通孔部14Aの半径をr、周期をpとして、(r(nm),p(nm))=(50,500),(100,500),(200,500),(400,1000),(800,2000),(1200,3000),(1800,4000)のそれぞれの値とした場合のシミュレーションを行った。比較のために、陰極14に貫通孔部14Aを形成していない以外は同じ構成とした場合(標準)についてもシミュレーションを行った。
The medium in the through-hole portion 14A formed in the cathode 14 is nitrogen, and a refractive index of 1.0 is used. The thicknesses of the anode 12, the organic layer 13, and the cathode 14 were 150 nm, 100 nm, and 100 nm, respectively.
Under the above conditions, assuming that the radius of the plurality of through-hole portions 14A formed on the cathode 14 in a square lattice arrangement is r and the period is p, (r (nm), p (nm)) = (50,500) , (100, 500), (200, 500), (400, 1000), (800, 2000), (1200, 3000), and (1800, 4000). For comparison, a simulation was also performed for the same configuration (standard) except that the through-hole portion 14A was not formed in the cathode 14.

 図13は貫通孔部14Aに対応するin発光位置のシミュレーション結果であり、図13(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 図14は貫通孔部14Aに対応するout発光位置のシミュレーション結果であり、図14(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 図13と図14に示す結果から、貫通孔部が無い場合(標準)と比較して、貫通孔部14Aを形成すると光取り出し効率が向上することがわかる。貫通孔部14Aの半径を50nm以上、より好ましくは100nm以上にすることで光取出性がより向上することもわかる。
FIG. 13 is a simulation result of the in-light emission position corresponding to the through-hole portion 14A. FIGS. 13A to 13C show light extraction from the vertically propagated light, parallel propagated light, and randomly propagated light to the glass substrate, respectively. The wavelength dependence of the efficiency η is shown.
FIG. 14 shows the simulation results of the out emission position corresponding to the through-hole portion 14A. FIGS. 14A to 14C show the light extraction of the vertical propagation light, parallel propagation light, and random propagation light to the glass substrate, respectively. The wavelength dependence of the efficiency η is shown.
From the results shown in FIGS. 13 and 14, it is understood that the light extraction efficiency is improved when the through-hole portion 14 </ b> A is formed as compared with the case where there is no through-hole portion (standard). It can also be seen that the light extraction performance is further improved by setting the radius of the through-hole portion 14A to 50 nm or more, more preferably 100 nm or more.

 図15(a)、(b)は、第3実施形態の有機EL素子の効果を確認するために、シミュレーションに用いた有機EL素子80と81のモデル構造をそれぞれ示す。図16は、図15に構造を示す素子について、先の例と同様のFDTD法を用いて、光取り出し効率ηをコンピュータシミュレーションした結果を示す。図15(a)は、基板11上に陽極32と第1誘電体層27と有機層23を形成し、陽極32に形成した孔部32Aと第1誘電体層27に形成した孔部27Aを有機層23の一部で埋めるように形成し、有機層23上に貫通孔部14Aを有する陰極14を設けた有機EL素子80の一例を示す。
 図15(b)は基板11上に陽極12と第1誘電体層27と有機層23を形成し、第1誘電体層27に形成した孔部27Aを有機層23の一部で埋めるように形成し、有機層23上に貫通孔部14Aを有する陰極14を設けた有機EL素子81の一例を示す。
 どちらの場合も有機層23は層状部を有する構成である。
FIGS. 15A and 15B show model structures of the organic EL elements 80 and 81 used in the simulation in order to confirm the effect of the organic EL element of the third embodiment. FIG. 16 shows the result of computer simulation of the light extraction efficiency η for the element having the structure shown in FIG. 15 using the FDTD method similar to the previous example. In FIG. 15A, the anode 32, the first dielectric layer 27, and the organic layer 23 are formed on the substrate 11, and the hole 32A formed in the anode 32 and the hole 27A formed in the first dielectric layer 27 are formed. An example of the organic EL element 80 formed so as to be filled with a part of the organic layer 23 and provided with the cathode 14 having the through-hole portion 14A on the organic layer 23 is shown.
15B, the anode 12, the first dielectric layer 27, and the organic layer 23 are formed on the substrate 11, and the hole 27A formed in the first dielectric layer 27 is filled with a part of the organic layer 23. An example of the organic EL element 81 formed and provided with the cathode 14 having the through-hole portion 14A on the organic layer 23 is shown.
In either case, the organic layer 23 has a layered portion.

 有機EL素子80と有機EL素子81をモデルとして、光取り出し効率ηをコンピュータシミュレーションした結果を図16に示す。グラフ図中で、「F.15.(a)」は有機EL素子80の結果、「F.15.(b)」有機EL素子81の結果である。「孔のみ」は第1誘電体層27を有しない以外は有機EL素子81と同じ構成の結果であり、「標準」は陰極14に貫通孔部14Aを形成していない以外は「孔のみ」と同じ構成の結果である。シミュレーションの各種条件は図15(b)に表記した通りである。図16はin発光位置のシミュレーション結果であり、図16(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 図16に示す結果から、陰極14に貫通孔部を形成したのみの構造(孔のみ)に対し、第1誘電体層27あるいはその下の陽極32まで孔部を形成して有機層23を導入した構造(有機EL素子80、81)の方が、光取り出し効率が向上した。
これは、陽極や第1誘電体層に孔部を設けてこれらの孔部に有機層23の一部を導入する導波モードの光取り出し構造を導入したためである。図15(a)に示す構造(有機EL素子80)の方が図15(b)に示す構造(有機EL素子81)よりも若干、光取り出し効率が高いことがわかる。
FIG. 16 shows the result of computer simulation of the light extraction efficiency η using the organic EL element 80 and the organic EL element 81 as models. In the graph, “F.15. (A)” is the result of the organic EL element 80 and “F.15. (B)” is the result of the organic EL element 81. “Pole only” is the result of the same configuration as the organic EL element 81 except that the first dielectric layer 27 is not provided, and “standard” is “hole only” except that the through hole portion 14A is not formed in the cathode 14. Is the result of the same configuration. Various conditions of the simulation are as described in FIG. FIG. 16 shows the simulation result of the in-light emission position, and FIGS. 16A to 16C show the wavelength dependence of the light extraction efficiency η of the vertically propagating light, the parallel propagating light, and the random propagating light to the glass substrate, respectively. Show.
From the result shown in FIG. 16, the organic layer 23 is introduced by forming a hole portion up to the first dielectric layer 27 or the anode 32 below the structure having only the through hole portion formed in the cathode 14 (hole only). The light extraction efficiency was improved in the structure (organic EL elements 80 and 81).
This is because a waveguide mode light extraction structure in which holes are formed in the anode and the first dielectric layer and a part of the organic layer 23 is introduced into these holes is introduced. It can be seen that the structure shown in FIG. 15A (organic EL element 80) is slightly higher in light extraction efficiency than the structure shown in FIG. 15B (organic EL element 81).

 図17、図18は、第4実施形態の有機EL素子の効果を確認するために、先の例と同様のFDTD法を用いて、光取り出し効率ηをコンピュータシミュレーションした結果を示す。
 シミュレーションで用いた、第4実施形態の有機EL素子40のモデル構造は、図6に示す構造と同様である。基板11はガラスからなるとして、屈折率としては1.52を用いた。陽極12はITOからなるとして、屈折率としては波長550nmで1.82+0.009iとし、その他の波長はローレンツモデルを用いて外挿した。有機層13の屈折率としては1.72を用いた。陰極14はAlからなるとして、屈折率として波長550nmで0.649+4.32iとし、その他の波長はドルーデモデルを用いて外挿した。
17 and 18 show the results of computer simulation of the light extraction efficiency η using the same FDTD method as in the previous example in order to confirm the effect of the organic EL element of the fourth embodiment.
The model structure of the organic EL element 40 of the fourth embodiment used in the simulation is the same as the structure shown in FIG. The substrate 11 is made of glass, and a refractive index of 1.52 is used. The anode 12 is made of ITO, and the refractive index is 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model. As the refractive index of the organic layer 13, 1.72 was used. The cathode 14 is made of Al. The refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.

 陰極14に形成した貫通孔部14A(半径800nmに設定)は正方格子状に周期2000nmで配置し、貫通孔部14Aの内の媒質は窒素であるとし、屈折率は1.0とした。陽極12、有機層13、陰極14のそれぞれの膜厚は、150nm、100nm、100nmとした。
 保護層44はITOからなるとして屈折率は上述の値を用い、膜厚として、50nm、100nm、150nmのぞれぞれの場合についてシミュレーションを行った。また、比較のために、保護層44および貫通孔部14Aを形成していない陰極を用いたモデル構造(標準)についても、シミュレーションを行った。
The through holes 14A (set to a radius of 800 nm) formed in the cathode 14 are arranged in a square lattice with a period of 2000 nm, the medium in the through holes 14A is nitrogen, and the refractive index is 1.0. The film thicknesses of the anode 12, the organic layer 13, and the cathode 14 were 150 nm, 100 nm, and 100 nm, respectively.
As the protective layer 44 is made of ITO, the above-described refractive index is used, and a simulation is performed for each of the film thicknesses of 50 nm, 100 nm, and 150 nm. For comparison, a simulation was also performed on a model structure (standard) using a cathode in which the protective layer 44 and the through-hole portion 14A were not formed.

 図17は貫通孔部14Aに対応するin発光位置のシミュレーション結果であり、図17(a)、(b)はそれぞれ垂直方向伝播光、平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 図18は貫通孔部14Aに対応するout発光位置のシミュレーション結果であり、図18(a)、(b)はそれぞれ垂直方向伝播光、平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 ランダム伝播光の結果は、これらの垂直方向伝播光と水平方向伝播光の結果からわかるので、光取り出し効率が向上することがわかる。この構造は全面発光するため、総合的に光取り出し効率は向上すると言える。
FIG. 17 shows simulation results of the in-light emission position corresponding to the through-hole portion 14A, and FIGS. 17A and 17B show the wavelength of light extraction efficiency η of vertically propagated light and parallel propagated light to the glass substrate, respectively. Indicates dependency.
FIG. 18 is a simulation result of the out emission position corresponding to the through-hole portion 14A, and FIGS. 18A and 18B show the wavelength of light extraction efficiency η of vertically propagating light and parallel propagating light to the glass substrate, respectively. Indicates dependency.
Since the result of the random propagation light can be understood from the result of the vertical propagation light and the horizontal propagation light, it can be seen that the light extraction efficiency is improved. Since this structure emits light entirely, it can be said that the light extraction efficiency is improved overall.

 図19、図20は、第5実施形態の有機EL素子の効果を確認するために、先の例と同様のFDTD法を用いて、光取り出し効率ηをコンピュータシミュレーションした結果を示す。
 シミュレーションで用いた、第5実施形態の有機EL素子50のモデル構造は、図8に示す構造と同様である。基板11はガラスからなるとして、屈折率としては1.52を用いた。陽極12はITOからなるとして、屈折率としては波長550nmで1.82+0.009iとし、その他の波長はローレンツモデルを用いて外挿した。有機層13の屈折率としては1.72を用いた。陰極54はITOからなるとして上述の値を用い、絶縁層55はSiOからなるとして、屈折率として1.45を用いた。金属層56はAlからなるとして、屈折率として波長550nmで0.649+4.32iとし、その他の波長はドルーデモデルを用いて外挿した。
19 and 20 show the results of computer simulation of the light extraction efficiency η using the same FDTD method as in the previous example in order to confirm the effect of the organic EL element of the fifth embodiment.
The model structure of the organic EL element 50 of the fifth embodiment used in the simulation is the same as the structure shown in FIG. The substrate 11 is made of glass, and a refractive index of 1.52 is used. The anode 12 is made of ITO, and the refractive index is 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model. As the refractive index of the organic layer 13, 1.72 was used. The cathode 54 is made of ITO, and the above values are used. The insulating layer 55 is made of SiO 2 , and the refractive index is 1.45. Assuming that the metal layer 56 is made of Al, the refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.

 金属層56に形成した貫通孔部56A(半径800nmに設定)は正方格子状に周期2000nmで配置した。金属層56の貫通孔部56A内の媒質は窒素であるとし、屈折率は1.0とした。陽極12、陰極54、有機層13、金属層56のそれぞれの膜厚は、150nm、50nm、100nm、100nmとした。
 絶縁層55(SiO)の膜厚として、50nm、100nm、200nmのぞれぞれの場合のシミュレーションを行った。比較のために、絶縁層55、金属層56をいずれも形成せず、陰極をAlとした以外は前述のモデル構造と同じ場合(標準)についてもシミュレーションを行った。
The through-hole portions 56A (set to a radius of 800 nm) formed in the metal layer 56 were arranged in a square lattice pattern with a period of 2000 nm. The medium in the through hole portion 56A of the metal layer 56 is nitrogen, and the refractive index is 1.0. The film thicknesses of the anode 12, the cathode 54, the organic layer 13, and the metal layer 56 were 150 nm, 50 nm, 100 nm, and 100 nm, respectively.
As the film thickness of the insulating layer 55 (SiO 2 ), simulation was performed in each of 50 nm, 100 nm, and 200 nm. For comparison, a simulation was also performed for the same case (standard) as the above model structure except that neither the insulating layer 55 nor the metal layer 56 was formed and the cathode was made of Al.

 図19はBottom側において貫通孔部56Aに対応するin発光位置のシミュレーション結果であり、図19(a)、(b)はそれぞれ垂直方向伝播光、平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 図20はBottom側において貫通孔部56Aに対応するout発光位置のシミュレーション結果であり、図20(a)、(b)はそれぞれ垂直方向伝播光、平行方向伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 ランダム伝播光は、これらの垂直方向伝播光と水平方向伝播光の結果からわかるので、光取出性が向上することがわかる。この構造は全面発光するため、総合的に光取り出し効率は向上すると言える。
FIG. 19 is a simulation result of the in light emission position corresponding to the through-hole portion 56A on the Bottom side, and FIGS. 19A and 19B are light extraction efficiencies of vertically propagated light and parallel propagated light to the glass substrate, respectively. The wavelength dependence of η is shown.
FIG. 20 is a simulation result of the out emission position corresponding to the through-hole portion 56A on the Bottom side, and FIGS. 20A and 20B are light extraction efficiencies to the glass substrate of vertical direction propagation light and parallel direction propagation light, respectively. The wavelength dependence of η is shown.
Since the random propagation light can be understood from the results of the vertical propagation light and the horizontal propagation light, it can be seen that the light extraction property is improved. Since this structure emits light entirely, it can be said that the light extraction efficiency is improved overall.

 図21は、第2実施形態および第6実施形態の有機EL素子の効果を確認するために、先の例と同様のFDTD法を用いて、光取り出し効率ηをコンピュータシミュレーションした結果を示す。
 シミュレーションで用いた、第6実施形態の有機EL素子60のモデル構造は、図10に示す構造と同様である。基板11はガラスからなるとして、屈折率としては1.52を用いた。陽極12はITOからなるとして、屈折率としては波長550nmで1.82+0.009iとし、その他の波長はローレンツモデルを用いて外挿した。有機層13の屈折率としては1.72を用いた。陰極64はAlからなるとして、屈折率として波長550nmで0.649+4.32iとし、その他の波長はドルーデモデルを用いて外挿した。
FIG. 21 shows the result of computer simulation of the light extraction efficiency η using the FDTD method similar to the previous example in order to confirm the effects of the organic EL elements of the second embodiment and the sixth embodiment.
The model structure of the organic EL element 60 of the sixth embodiment used in the simulation is the same as the structure shown in FIG. The substrate 11 is made of glass, and a refractive index of 1.52 is used. The anode 12 is made of ITO, and the refractive index is 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model. As the refractive index of the organic layer 13, 1.72 was used. The cathode 64 is made of Al, the refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.

 陰極64に形成した穴部64A(半径800nm、深さ800nmに設定)は、形状が円柱形状(col)または半球形状(hemi)であるとし、正方格子状に周期2000nmで配置した。陰極64の穴部64A内の媒質は窒素であるとし、屈折率は1.0とした。陽極12、有機層13の層厚はそれぞれ、150nm、100nmとした。比較のために、穴部を形成していない陰極を用いた場合(標準)についても、シミュレーションを行った。 The holes 64A (set to a radius of 800 nm and a depth of 800 nm) formed in the cathode 64 were assumed to have a cylindrical shape (col) or a hemispherical shape (hemi), and were arranged in a square lattice with a period of 2000 nm. The medium in the hole 64A of the cathode 64 is nitrogen and the refractive index is 1.0. The layer thicknesses of the anode 12 and the organic layer 13 were 150 nm and 100 nm, respectively. For comparison, a simulation was also performed for a case (standard) in which a cathode in which no hole was formed was used.

 図21はBottom側において穴部64Aに対応するin発光位置と穴部64Aに対応しないout発光位置のシミュレーション結果であり、図21(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 図21に示すinとoutは、発光位置を示し、_colは形状が円柱形状、_hemiは形状が半球形状を示す。
FIG. 21 is a simulation result of the in light emission position corresponding to the hole 64A and the out light emission position not corresponding to the hole 64A on the Bottom side. FIGS. 21 (a) to 21 (c) are vertical propagation light and parallel propagation light, respectively. The wavelength dependence of light extraction efficiency (eta) to the glass substrate of light and random propagation light is shown.
In and out shown in FIG. 21 indicate light emission positions, _col indicates a cylindrical shape, and _hemi indicates a hemispherical shape.

 図21に示すシミュレーション結果において、穴部の形状を円柱形状と半球形状とした場合の光取り出し効率の結果に大きな差は見られず、光取り出し効率ηの値は陰極64の穴部64Aの形状に大きくは依存しないことが分かる。図4、図10に示したin発光位置から陰極への最短距離が、円柱形状と半球形状で同じであるためと考えられる。陰極に貫通しない穴部を設けた構造を採用した形態であっても、Al層からなる陰極に貫通孔部を設けた構造を採用したこれまでの各実施形態のシミュレーション結果と同じ傾向を示した。 In the simulation results shown in FIG. 21, there is no significant difference in the light extraction efficiency results when the hole shape is a cylindrical shape and a hemispherical shape, and the value of the light extraction efficiency η is the shape of the hole 64A of the cathode 64. It turns out that it does not depend largely on. This is probably because the shortest distance from the in emission position shown in FIGS. 4 and 10 to the cathode is the same for the cylindrical shape and the hemispherical shape. Even in a configuration that employs a structure in which a hole portion that does not penetrate the cathode is employed, the same tendency as the simulation results of each of the previous embodiments that employ a structure in which a cathode portion made of an Al layer is provided with a through hole portion was exhibited. .

 図22は、第7実施形態の有機EL素子の効果を確認するために、先の例と同様のFDTD法を用いて、光取り出し効率ηをコンピュータシミュレーションした結果を示す。
 シミュレーションで用いた、第7実施形態の有機EL素子70のモデル構造は、図11に示す構造と同様である。基板11はガラスからなるとして、屈折率としては1.52を用いた。陽極72はITOからなるとして、屈折率としては波長550nmで1.82+0.009iとし、その他の波長はローレンツモデルを用いて外挿した。有機層13の屈折率としては1.72を用いた。陰極14はAlからなるとして、屈折率として波長550nmで0.649+4.32iとし、その他の波長はドルーデモデルを用いて外挿した。
FIG. 22 shows the result of computer simulation of the light extraction efficiency η using the same FDTD method as in the previous example in order to confirm the effect of the organic EL element of the seventh embodiment.
The model structure of the organic EL element 70 of the seventh embodiment used in the simulation is the same as the structure shown in FIG. The substrate 11 is made of glass, and a refractive index of 1.52 is used. Assuming that the anode 72 is made of ITO, the refractive index is set to 1.82 + 0.009i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Lorentz model. As the refractive index of the organic layer 13, 1.72 was used. The cathode 14 is made of Al. The refractive index is 0.649 + 4.32i at a wavelength of 550 nm, and other wavelengths are extrapolated using a Drude model.

 陰極14に形成した貫通孔部14A(半径800nm、深さ800nmに設定)は正方格子状に周期2000nmで配置した。陰極14の貫通孔部14A内の媒質は窒素であるとし、屈折率は1.0とした。陽極72には、陰極14の貫通孔部14Aと平面視で中心位置を同じにして、孔部72A(半径800nm)を正方格子状に周期2000nmで形成した。陽極72の孔部72A内には第2誘電体層77を形成した。第2誘電体層はSiOからなるとし、屈折率としては1.45を用いた。
 陽極72、有機層13、陰極14のそれぞれの膜厚は、150nm、100nm、100nmとした。比較のために、陰極14、陽極72にいずれも貫通孔部、孔部を形成していないモデル構造(標準)を用いた場合についてもシミュレーションを行った。
 本シミュレーションにおいて、in発光位置(図中の「in」)は陰極14に形成した貫通孔部14Aの位置と重なる位置であり、out発光位置(図中の「out」)は貫通孔部14Aからずれた位置に相当する。図中の「inP」は貫通孔部14Aと孔部72Aが平面視で重なる位置にあることを表し、「outP」は貫通孔部14Aと孔部72Aが平面視でずれた位置にあることを表す。
The through-hole portions 14A (set to a radius of 800 nm and a depth of 800 nm) formed in the cathode 14 were arranged in a square lattice with a period of 2000 nm. The medium in the through-hole portion 14A of the cathode 14 was nitrogen, and the refractive index was 1.0. In the anode 72, the hole 72A (radius 800 nm) was formed in a square lattice pattern with a period of 2000 nm with the same center position in plan view as the through hole 14A of the cathode 14. A second dielectric layer 77 was formed in the hole 72 A of the anode 72. The second dielectric layer is made of SiO 2 and has a refractive index of 1.45.
The film thicknesses of the anode 72, the organic layer 13, and the cathode 14 were 150 nm, 100 nm, and 100 nm, respectively. For comparison, a simulation was also performed in the case where a model structure (standard) in which neither the through-hole portion nor the hole portion was formed in the cathode 14 and the anode 72 was used.
In this simulation, the in light emission position (“in” in the figure) overlaps with the position of the through-hole part 14A formed in the cathode 14, and the out light emission position (“out” in the figure) extends from the through-hole part 14A. This corresponds to the shifted position. In the figure, “inP” indicates that the through-hole portion 14A and the hole portion 72A overlap each other in plan view, and “outP” indicates that the through-hole portion 14A and the hole portion 72A are shifted from each other in plan view. To express.

 図22はBottom側において孔部14Aに対応するin発光位置と穴部14Aに対応しないout発光位置のシミュレーション結果であり、図22(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。 FIG. 22 is a simulation result of the in light emission position corresponding to the hole 14A and the out light emission position not corresponding to the hole 14A on the Bottom side. FIGS. 22 (a) to 22 (c) are vertical direction propagation light and parallel direction propagation light, respectively. The wavelength dependence of light extraction efficiency (eta) to the glass substrate of light and random propagation light is shown.

 図22に示すシミュレーション結果から、in発光は、非常に高い取り出し効率であることが分かる。これは、誘電体層77を設けていない構造(後述する図26の結果)に対比して明らかである。特に、in発光で、孔部72Aがin発光位置からずれた位置にある場合において高い取り出し効率が得られることが分かる。 From the simulation results shown in FIG. 22, it can be seen that in light emission has a very high extraction efficiency. This is apparent in comparison with a structure in which the dielectric layer 77 is not provided (result of FIG. 26 described later). In particular, it can be seen that a high extraction efficiency can be obtained when the hole 72A is located at a position shifted from the in light emission position by in light emission.

 図23はガラス基板上にITOの陽極と有機層を形成した後、膜厚50nmのITOを成膜し、その上に陰極として膜厚100nmのAlを積層した構造体に、レーザー光(波長515nmのYb-YAGレーザーの第二高調波を用いた。)を照射して陰極であるAl層に貫通孔部を形成する試験を行った結果を示すSEM写真(走査型電子顕微鏡写真)を示すものである。
 図23(a)はAl層に形成した貫通孔部の5万倍拡大写真、図23(b)は同貫通孔部の3000倍拡大写真であるが、Al層からなる陰極に貫通孔部を加工できていることがわかる。図23(c)は上記と同等構造のAl層に形成した貫通孔部の5万倍拡大写真、図23(d)は同貫通孔部の3000倍拡大写真であるが、Al層からなる陰極に貫通孔部を加工できていることがわかる。
 図23(a)、(b)の写真の試料は、レーザー出力75mW、レーザービームの入射角14度の条件での結果であり、図23(c)、(d)の写真の試料は、レーザー出力150mW、レーザービームの入射角6度の条件での結果である。
 これらの構造に通電したところ、実際に発光することを確認することができた。
FIG. 23 shows a structure in which an ITO anode and an organic layer are formed on a glass substrate, an ITO film having a thickness of 50 nm is formed, and a 100 nm-thick Al film is stacked thereon as a cathode. A SEM photograph (scanning electron micrograph) showing a result of a test of forming a through-hole portion in the Al layer as a cathode by irradiation with the second harmonic of a Yb-YAG laser of It is.
FIG. 23 (a) is a 50,000 times magnified photograph of the through hole formed in the Al layer, and FIG. 23 (b) is a 3000 magnified photograph of the through hole. The through hole is formed on the cathode made of the Al layer. You can see that it has been processed. FIG. 23 (c) is a 50,000 times enlarged photograph of a through hole portion formed in an Al layer having the same structure as above, and FIG. 23 (d) is a 3000 times enlarged photograph of the through hole portion. It can be seen that the through-hole portion can be processed.
The samples shown in FIGS. 23A and 23B are the results under the conditions of a laser output of 75 mW and an incident angle of the laser beam of 14 degrees. The samples shown in FIGS. The results are obtained under the conditions of an output of 150 mW and a laser beam incident angle of 6 degrees.
When these structures were energized, it was confirmed that they actually emitted light.

 図26は第6実施形態の有機EL素子の効果を確認するために用いた、基板11上に、陽極12と、有機EL材料からなる発光層を含む有機層13と、陰極64とをこの順に具備する有機EL素子83のモデル構造を示す。陰極64は、先の第6実施形態の陰極64に形成されていた穴部64Aと同様の半径及び周期で形成されている。先の例と異なっているのは、穴部64Aに有機層13の一部が埋め込まれている点である。有機層13は、孔部64を埋め込む部分と層状部からなる構成である。
 図26に示す構造をモデルとして図26に示す条件に基づき先の例と同様のFDTD法を用いて、光取り出し効率ηをコンピュータシミュレーションした。このシミュレーションでは、穴部64Aの深さhを50、100、200、400、600、800nmとした場合について各シミュレーションを行った。また比較のために、陰極に穴部を形成していないモデル構造を用いた場合(標準)についてもシミュレーションを行った。
FIG. 26 shows an anode 12, an organic layer 13 including a light emitting layer made of an organic EL material, and a cathode 64 in this order on a substrate 11 used for confirming the effect of the organic EL element of the sixth embodiment. The model structure of the organic EL element 83 provided is shown. The cathode 64 is formed with the same radius and cycle as the hole 64A formed in the cathode 64 of the previous sixth embodiment. The difference from the previous example is that a part of the organic layer 13 is embedded in the hole 64A. The organic layer 13 is composed of a portion in which the hole 64 is embedded and a layered portion.
Using the structure shown in FIG. 26 as a model, the light extraction efficiency η was computer-simulated using the same FDTD method as in the previous example based on the conditions shown in FIG. In this simulation, each simulation was performed when the depth h of the hole 64A was 50, 100, 200, 400, 600, and 800 nm. For comparison, a simulation was also performed for a model structure in which a hole was not formed in the cathode (standard).

 図27は穴部64Aに対応するin発光位置のシミュレーション結果であり、図27(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 図27に示す結果では、穴部64Aを深くするほど光取り出し効率が向上する。穴部64Aの内部が低屈折率の媒質であると格段に光取出性が向上することがわかる。穴部64Aの深さは50nm以上であることが好ましく、100nm以上であることがより好ましく、さらに150nm以上であることが最も好ましい。
FIG. 27 shows the simulation results of the in-light emission position corresponding to the hole 64A. FIGS. 27A to 27C show the light extraction efficiency of the vertical propagation light, parallel propagation light, and random propagation light to the glass substrate, respectively. The wavelength dependence of η is shown.
In the result shown in FIG. 27, the light extraction efficiency improves as the hole 64A is deepened. It can be seen that when the inside of the hole 64A is a medium having a low refractive index, the light extraction performance is remarkably improved. The depth of the hole 64A is preferably 50 nm or more, more preferably 100 nm or more, and most preferably 150 nm or more.

 図28は図26と同様に第6実施形態の有機EL素子の効果を確認するために用いた、基板11上に、陽極12と、有機EL材料からなる発光層を含む有機層13と、陰極64とを具備する有機EL素子84の構造を示す。陰極64は、先の第6実施形態の陰極64に形成されていた穴部64Aと同等の半径及び周期で形成されている。穴部64内の媒質は窒素であるとし、屈折率は1.0とした。
 図28に示すモデル構造として、図28に示す条件に基づき先の例と同様のFDTD法を用いて、光取り出し効率ηをコンピュータシミュレーションした。このシミュレーションでは、穴部64Aの深さhを50、100、200、400、600、800nmとした場合について各シミュレーションを行った。比較のために、陰極に穴部を形成していないモデル構造を用いた場合(標準)についてもシミュレーションを行った。
FIG. 28 is the same as FIG. 26 and used for confirming the effect of the organic EL device of the sixth embodiment. On the substrate 11, the anode 12, the organic layer 13 including a light emitting layer made of an organic EL material, and the cathode The structure of the organic EL element 84 which comprises 64 is shown. The cathode 64 is formed with the same radius and cycle as the hole 64A formed in the cathode 64 of the previous sixth embodiment. The medium in the hole 64 was nitrogen and the refractive index was 1.0.
As the model structure shown in FIG. 28, the light extraction efficiency η was computer-simulated using the same FDTD method as in the previous example based on the conditions shown in FIG. In this simulation, each simulation was performed when the depth h of the hole 64A was 50, 100, 200, 400, 600, and 800 nm. For comparison, a simulation was also performed for a model structure (standard) in which no hole was formed in the cathode.

 図29は穴部64Aに対応するin発光位置のシミュレーション結果であり、図29(a)~(c)はそれぞれ垂直方向伝播光、平行方向伝播光、ランダム伝播光のガラス基板までの光取り出し効率ηの波長依存性を示す。
 図29に示す結果から、穴部64Aの媒質が窒素で屈折率が1.0の場合、光取り出し効率は、垂直方向伝播光では高さが高くなるほど効率が下がり、平行方向伝播光では高さが高くなるほど効率が上がることがわかる。
 図29(b)から穴部64Aの深さが400nm以上であればSPPはほとんど励起されないと見ることができ、200nmでは多少の励起があるもののSPPを抑制できていると思われる。
FIG. 29 is a simulation result of the in light emission position corresponding to the hole 64A, and FIGS. 29A to 29C show the light extraction efficiency of the vertical direction propagation light, parallel direction propagation light, and random propagation light to the glass substrate, respectively. The wavelength dependence of η is shown.
From the results shown in FIG. 29, when the medium of the hole 64A is nitrogen and the refractive index is 1.0, the light extraction efficiency decreases as the height increases in the vertical propagation light, and increases in the parallel propagation light. It can be seen that the higher the value, the higher the efficiency.
From FIG. 29 (b), it can be seen that the SPP is hardly excited if the depth of the hole 64A is 400 nm or more, and it is considered that the SPP can be suppressed although there is some excitation at 200 nm.

 10…有機EL素子、11…基板、12…陽極、13…有機層、14…陰極、14A…貫通孔部、20…有機EL素子、23…有機層、24…陰極、24A…穴部、27…第1誘電体層、27A…孔部、30…有機EL素子、32…陽極、32A…孔部、40…有機EL素子、44…保護層、50…有機EL素子、54…陰極、55…絶縁層、56…金属層、56A…貫通孔部、60…有機EL素子、64…陰極、64A…穴部、70…有機EL素子、72…陽極、72A…孔部、77…第2誘電体層、80…有機EL素子、81…有機EL素子、82…有機EL素子、83…有機EL素子、84…有機EL素子、100…画像表示装置、200…照明装置。 DESCRIPTION OF SYMBOLS 10 ... Organic EL element, 11 ... Board | substrate, 12 ... Anode, 13 ... Organic layer, 14 ... Cathode, 14A ... Through-hole part, 20 ... Organic EL element, 23 ... Organic layer, 24 ... Cathode, 24A ... Hole part, 27 1st dielectric layer, 27A ... hole, 30 ... organic EL element, 32 ... anode, 32A ... hole, 40 ... organic EL element, 44 ... protective layer, 50 ... organic EL element, 54 ... cathode, 55 ... Insulating layer, 56 ... metal layer, 56A ... through hole, 60 ... organic EL element, 64 ... cathode, 64A ... hole, 70 ... organic EL element, 72 ... anode, 72A ... hole, 77 ... second dielectric Layers 80... Organic EL elements 81. Organic EL elements 82. Organic EL elements 83. Organic EL elements 84. Organic EL elements 100.

Claims (14)

 対向する一対の電極間に発光層を含む有機層が挟まれた有機EL素子であり、一方の電極が金属電極であり、他方の電極が透明電極であって、主に前記透明電極側から外部に光を取り出す構成であり、前記金属電極に複数の貫通孔部または前記有機層側の表面から形成された複数の貫通しない穴部を有することを特徴とする有機EL素子。 An organic EL element in which an organic layer including a light emitting layer is sandwiched between a pair of opposed electrodes, one electrode is a metal electrode, and the other electrode is a transparent electrode, mainly from the transparent electrode side. The organic EL device is characterized in that light is extracted from the metal electrode, and the metal electrode has a plurality of through-hole portions or a plurality of non-penetrating hole portions formed from the surface on the organic layer side. 第1電極、発光層を含む有機層、金属層をこの順に具備する有機EL素子であって、
前記第1電極は透明導電材料からなる透明電極であり、
前記金属層は第2電極であり、
前記金属層は複数の貫通孔部または前記有機層側の表面から形成された複数の貫通しない穴部を有し、
前記第1電極側が主たる光取出し側であることを特徴とする有機EL素子。
An organic EL device comprising a first electrode, an organic layer including a light emitting layer, and a metal layer in this order,
The first electrode is a transparent electrode made of a transparent conductive material,
The metal layer is a second electrode;
The metal layer has a plurality of through-hole portions or a plurality of non-through holes formed from the surface on the organic layer side,
The organic EL element, wherein the first electrode side is a main light extraction side.
 前記第1電極が基板上に形成された陽極であり、前記金属層が陰極であることを特徴とする請求項2に記載の有機EL素子。 3. The organic EL element according to claim 2, wherein the first electrode is an anode formed on a substrate, and the metal layer is a cathode.  前記貫通孔部の最小幅が100nm以上であることを特徴とする請求項2または3に記載の有機EL素子。 The organic EL element according to claim 2 or 3, wherein the minimum width of the through hole is 100 nm or more.  前記貫通しない穴部の最小幅が200nm以上であり、かつ、隣接する前記貫通しない穴部の間隔が50nm以上であることを特徴とする請求項2~4のいずれか一項に記載の有機EL素子。 5. The organic EL according to claim 2, wherein the minimum width of the non-penetrating hole is 200 nm or more, and the interval between the non-penetrating holes adjacent to each other is 50 nm or more. element.  前記貫通しない穴部の最大幅が前記間隔以上であることを特徴とする請求項5に記載の有機EL素子。 6. The organic EL element according to claim 5, wherein the maximum width of the non-penetrating hole is not less than the interval.  前記金属層の膜厚が50~1000nmの範囲であることを特徴とする請求項2~6のいずれか一項に記載の有機EL素子。 The organic EL device according to any one of claims 2 to 6, wherein the thickness of the metal layer is in the range of 50 to 1000 nm.  前記有機層と前記金属層との間に保護層を有することを特徴とする請求項2~7のいずれか一項に記載の有機EL素子。 The organic EL device according to any one of claims 2 to 7, further comprising a protective layer between the organic layer and the metal layer.  前記金属層が前記有機層に接することを特徴とする請求項2~7のいずれか一項に記載の有機EL素子。 The organic EL element according to any one of claims 2 to 7, wherein the metal layer is in contact with the organic layer.  前記第1電極と前記金属層との間に、前記有機層の屈折率よりも低い屈折率を有し、複数の孔部を備えた第1誘電体層を具備し、前記有機層は少なくとも前記孔部の内側面を覆うことを特徴とする請求項2~9のいずれか一項に記載の有機EL素子。 A first dielectric layer having a refractive index lower than the refractive index of the organic layer and having a plurality of holes is provided between the first electrode and the metal layer, and the organic layer is at least the The organic EL element according to any one of claims 2 to 9, wherein the organic EL element covers an inner surface of the hole.  前記第1電極は複数の第1電極孔部を備え、該第1電極の屈折率より低く且つ前記有機層の屈折率よりも低い屈折率を有する第2誘電体層を前記第1電極孔部の内部に備えたことを特徴とする請求項2~10のいずれか一項に記載の有機EL素子。 The first electrode includes a plurality of first electrode holes, and a second dielectric layer having a refractive index lower than the refractive index of the first electrode and lower than the refractive index of the organic layer is provided in the first electrode hole. The organic EL device according to any one of claims 2 to 10, wherein the organic EL device is provided inside the device.  第1電極、発光層を含む有機層、第2電極、絶縁層、金属層をこの順に具備する有機EL素子であって、
前記第1電極及び前記第2電極はいずれも透明導電材料からなる透明電極であり、
前記金属層は複数の貫通孔部または前記有機層側の表面から形成された複数の貫通しない穴部を有し、前記第1電極側が主たる光取出し側であることを特徴とする有機EL素子。
An organic EL device comprising a first electrode, an organic layer including a light emitting layer, a second electrode, an insulating layer, and a metal layer in this order,
The first electrode and the second electrode are both transparent electrodes made of a transparent conductive material,
The metal layer has a plurality of through-hole portions or a plurality of non-through holes formed from the surface on the organic layer side, and the first electrode side is a main light extraction side.
 請求項1~12のいずれか一項に記載の有機EL素子を備えたことを特徴とする画像表示装置。 An image display device comprising the organic EL element according to any one of claims 1 to 12.  請求項1~12のいずれか一項に記載の有機EL素子を備えたことを特徴とする照明装置。 An illumination device comprising the organic EL element according to any one of claims 1 to 12.
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