WO2012014812A1 - 有機led素子の散乱層用ガラス及び有機led素子 - Google Patents
有機led素子の散乱層用ガラス及び有機led素子 Download PDFInfo
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- WO2012014812A1 WO2012014812A1 PCT/JP2011/066726 JP2011066726W WO2012014812A1 WO 2012014812 A1 WO2012014812 A1 WO 2012014812A1 JP 2011066726 W JP2011066726 W JP 2011066726W WO 2012014812 A1 WO2012014812 A1 WO 2012014812A1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/19—Silica-free oxide glass compositions containing phosphorus containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
- C03C17/04—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass by fritting glass powder
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/21—Silica-free oxide glass compositions containing phosphorus containing titanium, zirconium, vanadium, tungsten or molybdenum
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
- C03C8/08—Frit compositions, i.e. in a powdered or comminuted form containing phosphorus
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/22—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions containing two or more distinct frits having different compositions
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
- H10K50/854—Arrangements for extracting light from the devices comprising scattering means
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/45—Inorganic continuous phases
- C03C2217/452—Glass
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/48—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase having a specific function
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/948—Layers comprising indium tin oxide [ITO]
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/17—Deposition methods from a solid phase
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
- H10K50/125—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers specially adapted for multicolour light emission, e.g. for emitting white light
Definitions
- the present invention relates to glass, particularly glass used for a scattering layer of an organic LED element, and an organic LED element using the glass.
- Organic LED element has an organic layer. And there exists a bottom emission type which takes out the light produced
- the amount of light that can be extracted to the outside of the organic LED element is less than 20% of the emitted light.
- Patent Documents 1 and 3 there is a document describing that a scattering layer made of glass is provided in an organic LED element to improve light extraction efficiency. Moreover, although it is not the glass composition of the scattering layer of an organic LED element, there exists the literature which has described the composition as optical glass (patent document 2).
- Patent Document 1 has a problem that the content of the glass composition is not disclosed or suggested, and cannot be implemented.
- the glass of Patent Document 2 contains a large amount of GeO 2 whose raw material is expensive as an essential component, and has a problem that the raw material cost becomes too high.
- Patent Document 2 does not specifically describe the effect of using glass as a scattering layer in an organic LED element and thereby improving the light extraction efficiency.
- Patent Document 3 describes one characteristic value in paragraph 0164, but the composition of only one glass disclosed in Table 3 does not contain ZnO. For this reason, it is not clear what range of characteristics is disclosed in Patent Document 3.
- the present invention provides the following organic LED element scattering glass and organic LED element.
- (1) In terms of mol% based on oxide, P 2 O 5 15-30%, Bi 2 O 3 5-30%, Nb 2 O 5 5 to 27%, ZnO 4-40%, A glass for a scattering layer of an organic LED element, wherein the total content of alkali metal oxides comprising Li 2 O, Na 2 O, and K 2 O is 5% by mass or less.
- Content of said alkali metal oxide is 2 mass% or less in total, Glass for scattering layers of the organic LED element as described in (1) characterized by the above-mentioned.
- (3) The glass for a scattering layer of an organic LED element according to (1) or (2), which does not substantially contain the alkali metal oxide.
- An organic LED element comprising a transparent substrate, a first electrode, an organic layer, and a second electrode in this order, P 2 O 5 : 15 to 30%, Bi 2 O 3 : 5 to 30%, Nb 2 O 5 : 5 to 27%, ZnO: 4 to 40%
- An organic LED element comprising a scattering layer containing and having a total content of alkali metal oxides composed of Li 2 O, Na 2 O, and K 2 O of 5% by mass or less.
- the organic LED element according to (7), wherein the scattering layer is provided on the transparent substrate.
- the organic LED element according to (7), wherein the scattering layer is provided on the organic layer.
- the present invention it is possible to provide a glass of a scattering layer used for an organic LED element or an organic LED element using the scattering layer. By using such an organic LED element, light extraction efficiency can be improved.
- FIG. 1 is a cross-sectional view of a first organic LED element of the present invention.
- the first organic LED element of the present invention is a bottom emission type organic LED element.
- the first organic LED element of the present invention includes a transparent substrate 110, a scattering layer 120 formed on the transparent substrate 110, a first electrode 130 formed on the scattering layer 120, and the first electrode 130.
- the organic layer 140 is formed on the organic layer 140, and the second electrode 150 is formed on the organic layer 140.
- the first electrode 130 is a transparent electrode (anode)
- the second electrode 150 is a reflective electrode (cathode).
- the first electrode 130 has transparency for transmitting light emitted from the organic layer 140 to the scattering layer 120.
- the second electrode 150 has reflectivity for reflecting light emitted from the organic layer 140 and returning it to the organic layer 140.
- FIG. 2 is a cross-sectional view of the second organic LED element of the present invention.
- the second organic LED element of the present invention is a double-sided emission type organic LED element.
- the second organic LED element of the present invention includes a transparent substrate 110, a scattering layer 120 formed on the transparent substrate 110, a first electrode 130 formed on the scattering layer 120, and the first electrode 130.
- the organic layer 140 is formed on the organic layer 140, and the second electrode 210 is formed on the organic layer 140.
- the first electrode 130 is a transparent electrode (anode)
- the second electrode 210 is a transparent electrode (cathode).
- the first electrode 130 has transparency for transmitting light emitted from the organic layer 140 to the scattering layer 120.
- the second electrode 210 has transparency for transmitting light emitted from the organic layer 140 to a surface opposite to the surface facing the organic layer 140.
- This organic LED element is used as an illumination application in which light is emitted from the front and back surfaces.
- a material having a high visible light transmittance As the light-transmitting substrate used for forming the transparent substrate 110, a material having a high visible light transmittance, such as a glass substrate, is mainly used. Specifically, a material having a high transmittance is a plastic substrate in addition to a glass substrate. Examples of the material of the glass substrate include inorganic glass such as alkali glass, non-alkali glass, and quartz glass. In order to prevent the diffusion of the glass component, a silica film or the like may be coated on the surface of the glass substrate.
- the material for the plastic substrate examples include polyester, polycarbonate, polyether, polysulfone, polyethersulfone, polyvinyl alcohol, and fluorine-containing polymers such as polyvinylidene fluoride and polyvinyl fluoride.
- the plastic substrate may have a barrier property.
- the thickness of the transparent substrate is preferably 0.1 mm to 2.0 mm in the case of glass. However, if the thickness is too thin, the strength decreases, so that the thickness is particularly preferably 0.5 mm to 1.0 mm.
- the scattering layer 120 is formed by forming glass powder on a substrate by a method such as coating and baking at a desired temperature, and is dispersed in the base material 121 having the first refractive index and the base material 121. And a plurality of scattering materials 122 having a second refractive index different from that of the base material 121.
- the scattering layer is made of glass, so that it has excellent scattering characteristics while maintaining the smoothness of the surface. By using it on the light-emitting surface side of light-emitting devices, extremely efficient light extraction is possible. Can be realized.
- the scattering layer glass (base material) having a high light transmittance is used.
- a plurality of scattering substances for example, bubbles, precipitated crystals, material particles different from the base material, and phase-separated glass
- the particle refers to a small solid substance such as a filler or ceramic.
- Air bubbles refer to air or gas objects.
- phase-separated glass means the glass comprised by two or more types of glass phases.
- the refractive index of the base material is preferably equal to or higher than the refractive index of the first electrode. This is because, when the refractive index is low, a loss due to total reflection may occur at the interface between the base material and the first electrode.
- the refractive index of the base material only needs to exceed at least a part of the emission spectrum range of the organic layer (for example, red, blue, green, etc.), but exceeds the entire emission spectrum range (430 nm to 650 nm). It is more preferable that it exceeds the entire wavelength range of visible light (360 nm to 830 nm).
- the refractive index of the first electrode may be higher than the refractive index of the base material as long as the difference between the refractive index of the base material and the refractive index of the first electrode is within 0.2.
- the main surface of the scattering layer needs to be smooth.
- the scattering material protrudes from the main surface of the scattering layer.
- the scattering material does not exist within 0.2 ⁇ m from the main surface of the scattering layer.
- the arithmetic average roughness (Ra) defined in JIS B0601-1994 of the main surface of the scattering layer is preferably 30 nm or less, more preferably 10 nm or less, and particularly preferably 1 nm or less.
- Both the scattering material and the base material may have a high refractive index, but the difference in refractive index ( ⁇ n) is preferably 0.05 or more at least in a part of the emission spectrum range of the light emitting layer. In order to obtain sufficient scattering characteristics, the difference in refractive index ( ⁇ n) is 0.05 or more over the entire emission spectrum range (430 nm to 650 nm) or the entire visible wavelength range (360 nm to 830 nm). More preferred.
- the base material has a high refractive index glass and the scattering material has a gaseous object, that is, a bubble.
- the color of light emission can be changed.
- known ones such as transition metal oxides, rare earth metal oxides and metal colloids can be used alone or in combination.
- Whitening is a method of spatially painting red, blue, and green (painting method), a method of laminating light emitting layers having different emission colors (lamination method), and providing blue light that is separated spatially.
- a method (color conversion method) for performing color conversion with a color conversion material is known.
- a white layer can be obtained uniformly, so a lamination method is common.
- the light emitting layer to be stacked uses a combination that turns white by additive color mixing. For example, a blue-green layer and an orange layer may be stacked, or red, blue, and green may be stacked.
- the lamination method has an advantage that it is not necessary to spatially change the color arrangement, it has the following two problems.
- the first problem is that since the organic layer is thin, the extracted emitted light is affected by interference. Therefore, the color changes depending on the viewing angle. In the case of white, such a phenomenon may be a problem because the sensitivity to the color of human eyes is high.
- the second problem is that the carrier balance is shifted while the light is emitted, the light emission luminance of each color is changed, and the color is changed.
- a fluorescent material can be used as a scattering material or a base material. Therefore, the effect of changing the color by performing wavelength conversion can be brought about by the light emission from the organic layer. In this case, the light emission color of the organic LED can be reduced, and the emitted light is scattered and emitted, so that the angle dependency of the color and the temporal change of the color can be suppressed.
- the first electrode is required to have a translucency of 80% or more in order to extract light generated in the organic layer 140 to the outside.
- a high work function is required to inject many holes.
- ITO Indium Tin Oxide
- SnO 2 , ZnO, IZO Indium Zinc Oxide
- AZO ZnO—Al 2 O 3 : zinc oxide doped with aluminum
- GZO ZnO—Ga 2 O 3 : zinc oxide doped with gallium
- Nb-doped TiO 2 , Ta-doped TiO 2 and other materials are used.
- the thickness of the anode is preferably 100 nm or more.
- the refractive index of the anode 130 is 1.9 to 2.2.
- the refractive index of ITO can be lowered.
- SnO 2 has a standard of 10 wt%. From this, the refractive index of ITO can be lowered by increasing the Sn concentration.
- the carrier concentration increases with an increase in Sn concentration, there is a decrease in mobility and transmittance. Therefore, it is necessary to determine the Sn amount by balancing these.
- the first electrode used mainly in the bottom emission type organic LED element has been described, but it goes without saying that the first electrode may be used in a double-sided light emitting type organic LED element.
- the organic layer 140 is a layer having a light emitting function, and includes a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer.
- the refractive index of the organic layer 140 is 1.7 to 1.8.
- the hole injection layer is required to have a small difference in ionization potential in order to lower the hole injection barrier from the anode. Improvement of the charge injection efficiency from the electrode interface in the hole injection layer lowers the drive voltage of the device and increases the charge injection efficiency.
- PEDOT Polyethylene dioxythiophene
- PSS polystyrene sulfonic acid
- CuPc phthalocyanine-based copper phthalocyanine
- the hole transport layer serves to transport holes injected from the hole injection layer to the light emitting layer. It is necessary to have an appropriate ionization potential and hole mobility.
- the hole transport layer may be a triphenylamine derivative, N, N′-bis (1-naphthyl) -N, N′-diphenyl-1,1′-biphenyl-4,4′-diamine (NPD ), N, N′-diphenyl-N, N′-bis [N-phenyl-N- (2-naphthyl) -4′-aminobiphenyl-4-yl] -1,1′-biphenyl-4,4 ′ -Diamine (NPTE), 1,1-bis [(di-4-tolylamino) phenyl] cyclohexane (HTM2) and N, N'-diphenyl-N, N'-bis (3-methylphenyl) -1,1 ' -Diphenyl-4,4'-d
- the light emitting layer uses a material that provides a field where injected electrons and holes recombine and has high luminous efficiency. More specifically, the light emitting host material and the light emitting dye doping material used in the light emitting layer function as recombination centers of holes and electrons injected from the anode and the cathode, and light emission to the host material in the light emitting layer The doping of the dye obtains high luminous efficiency and converts the emission wavelength. These are required to have an appropriate energy level for charge injection, to form a uniform amorphous thin film having excellent chemical stability and heat resistance.
- Light emitting materials that are organic materials include low-molecular materials and high-molecular materials. Further, it is classified into a fluorescent material and a phosphorescent material according to the light emission mechanism.
- the light-emitting layer comprises tris (8-quinolinolato) aluminum complex (Alq 3 ), bis (8-hydroxy) quinaldine aluminum phenoxide (Alq ′ 2 OPh), bis (8-hydroxy) quinaldine aluminum— 2,5-dimethylphenoxide (BAlq), mono (2,2,6,6-tetramethyl-3,5-heptanedionate) lithium complex (Liq), mono (8-quinolinolato) sodium complex (Naq), Mono (2,2,6,6-tetramethyl-3,5-heptanedionate) lithium complex, mono (2,2,6,6-tetramethyl-3,5-heptanedionate) sodium complex and bis ( 8-quinolinolato) calcium complex (CAQ 2) metal complexes of quinoline derivatives such as tetraphenyl butadiene, off Nirukinakudorin (QD), anthracene, and a fluorescent substance such as perylene and coronene
- the electron transport layer serves to transport electrons injected from the electrode.
- the electron transport layer is formed of a quinolinol aluminum complex (Alq 3 ), an oxadiazole derivative (for example, 2,5-bis (1-naphthyl) -1,3,4-oxadiazole (BND) and 2 -(4-t-butylphenyl) -5- (4-biphenyl) -1,3,4-oxadiazole (PBD) and the like), triazole derivatives, bathophenanthroline derivatives, silole derivatives and the like are used.
- oxadiazole derivative for example, 2,5-bis (1-naphthyl) -1,3,4-oxadiazole (BND) and 2 -(4-t-butylphenyl) -5- (4-biphenyl) -1,3,4-oxadiazole (PBD) and the like
- triazole derivatives for example, 2,5-bis
- the electron injection layer is required to increase electron injection efficiency.
- the electron injection layer is provided with a layer doped with an alkali metal such as lithium (Li) or cesium (Cs) at the cathode interface.
- the reflective electrode (cathode) as the second electrode a metal having a small work function or an alloy thereof is used.
- the cathode include alkali metals, alkaline earth metals, metals of Group 3 of the periodic table, and the like.
- aluminum (Al), magnesium (Mg), silver (Ag), or alloys thereof are preferably used because they are inexpensive and have good chemical stability.
- a laminated electrode in which Al is vapor-deposited on a co-deposited film of Al, MgAg, a thin film deposited film of LiF or Li 2 O, or the like is used.
- a laminate of calcium (Ca) or barium (Ba) and aluminum (Al) is used.
- the reflective electrode may be used as an anode.
- the second electrode when used in the second organic LED element of the double-sided emission type, it is required to be translucent rather than reflective. Therefore, the configuration and characteristics at that time are preferably the same as those of the first electrode.
- the scattering layer glass of the organic LED element of the present invention will be described in detail. Since the refractive index of the glass for a scattering layer is preferably equal to or higher than the refractive index of the translucent electrode material as described above, it is desirable that it be as high as possible.
- the glass transition temperature of the glass for the scattering layer is desirably as low as possible in order to prevent thermal deformation of the substrate when the glass powder is fired and softened to form the scattering layer.
- the thermal expansion coefficient of the glass for the scattering layer must be close to or slightly lower than the thermal expansion coefficient of the substrate in order to prevent the phenomenon of cracking or warping due to stress generated between the scattering layer and the substrate. There is.
- the glass having a high refractive index and a low transition temperature has a coefficient of thermal expansion that is much larger than the coefficient of thermal expansion of the substrate. Therefore, it is desirable that the coefficient of thermal expansion of the glass for the scattering layer be as low as possible. Warpage and cracking become a major obstacle when forming a translucent electrode layer on a scattering layer.
- the glass for a scattering layer of the present invention has a refractive index (n d ) of 1.75 or more and 2.20 or less, a glass transition temperature (T g ) of 530 ° C. or less, and an average coefficient of thermal expansion from 50 ° C. to 300 ° C. ( ⁇ 50-300 ) is preferably 55 ⁇ 10 ⁇ 7 / K to 95 ⁇ 10 ⁇ 7 / K.
- the glass composition for a scattering layer of the present invention has a P 2 O 5 content of 15 to 30%, a Bi 2 O 3 content of 5 to 30%, Nb 2 O, expressed in mol% based on oxide. 5 and the content of 5 to 27%, the content of ZnO is contained and four to 40% total content of alkali metal oxide comprising Li 2 O, Na 2 O and K 2 O is 5 It is characterized by being not more than mass%.
- P 2 O 5 is a component that forms a network structure serving as a skeleton of the glass and stabilizes the glass, and is essential.
- P 2 O 5 is less than 15 mol%, devitrification is likely to occur. 19 mol% or more is preferable, and 20 mol% or more is more preferable.
- it exceeds 30 mol% it is difficult to obtain a high refractive index. 28 mol% or less is preferable and 26 mol% or less is more preferable.
- Bi 2 O 3 is a component that imparts a high refractive index and increases the stability of the glass, and is essential. If it is less than 5%, the effect becomes insufficient. 10 mol% or more is preferable and 13 mol% or more is more preferable. On the other hand, when it exceeds 30 mol%, the thermal expansion coefficient is increased, and the coloring is easily increased. 28 mol% or less is preferable and 25 mol% or less is more preferable.
- Nb 2 O 5 is a component that imparts a high refractive index and lowers the thermal expansion coefficient, and is essential. If it is less than 5 mol%, the effect becomes insufficient. 7 mol% or more is preferable and 10 mol% or more is more preferable. On the other hand, when it exceeds 27 mol%, the glass transition temperature is increased and devitrification is likely to occur. 20 mol% or less is preferable and 18 mol% or less is more preferable.
- ZnO is a component that greatly lowers the glass transition temperature and increases the refractive index while suppressing an excessive increase in the thermal expansion coefficient, and is essential. Moreover, there exists an effect which reduces the viscosity of glass and improves a moldability. If it is less than 4 mol%, the effect becomes insufficient. 16 mol% or more is preferable and 21 mol% or more is more preferable. On the other hand, when it exceeds 40 mol%, the tendency of devitrification of the glass becomes stronger. 35 mol% or less is preferable, and 30 mol% or less is more preferable. In addition, although it does not necessarily correspond on a one-to-one basis with mol% notation, it is preferably 7% by mass or more and more preferably 9% by mass or more when expressed in mass%.
- Alkali metal oxides composed of Li 2 O, Na 2 O and K 2 O may increase the thermal expansion coefficient. Therefore, it is preferable not to contain substantially (content is substantially zero). However, since it has the effect of giving the glass devitrification resistance and lowering the glass transition temperature, it may be contained up to 5% by mass.
- the alkali metal may move when an electric field is applied in a humid state, and may destroy the terminal of the organic LED element. Therefore, the total amount of the alkali metal oxide is preferably 5% by mass or less, more preferably 2% by mass or less, and particularly preferably substantially not contained (the content is substantially zero).
- Na 2 O and K 2 O since the result in particularly large thermal expansion coefficient compared to Li 2 O, if the inclusion of alkali metal oxides, substantially free of Na 2 O and K 2 O (Content is almost zero), it is preferable to use only Li 2 O.
- TiO 2 tends to devitrify as the glass transition temperature rises. Therefore, it is preferable that TiO 2 is not substantially contained (the content is substantially zero). However, since it has an effect of imparting a high refractive index, it may be contained up to 8 mol%.
- B 2 O 3 is not essential, but has an effect of improving the solubility of the glass. Therefore, you may contain to 17 mol%. However, if it exceeds 17 mol%, devitrification and phase separation are likely to occur, and it becomes difficult to obtain a high refractive index.
- WO 3 is not essential, but has the effect of imparting a high refractive index without significantly changing the thermal expansion coefficient and glass transition temperature. Therefore, you may contain to 20 mol%. However, when it exceeds 20 mol%, coloring increases and devitrification easily occurs.
- TeO 2 is not essential, but has an effect of lowering the glass transition temperature while suppressing an excessive increase in the thermal expansion coefficient. Therefore, you may contain to 7 mol%. However, it is expensive and may erode the platinum crucible, so it is preferable not to use a large amount.
- GeO 2 is an optional component having the effect of imparting a high refractive index, but since it is expensive, its content is preferably 7 mol% or less. In addition, although it does not necessarily respond
- ZrO 2 is not essential, but is a component that improves the stability of the glass and may be contained up to 7 mol%. However, when it contains exceeding 7 mol%, it will become easy to devitrify glass.
- Sb 2 O 3 is not essential, but it is not only effective as a clarifying agent but also has an effect of suppressing coloring. Therefore, you may contain to 2 mol%.
- Alkaline earth metal oxides (MgO, CaO, SrO, BaO) are not essential, but have the effect of improving the stability of the glass. Therefore, you may contain to 10 mol%. However, if the content exceeds 10 mol%, the refractive index is lowered and the thermal expansion coefficient is increased.
- the glass of the present invention does not lose the effect of the invention.
- SiO 2 , Al 2 O 3 , La 2 O 3 , Y 2 O 3 , Gd 2 O 3 , Ta 2 O 3 , Cs 2 O, transition metal oxides and the like can also be contained.
- Their total content is preferably less than 5 mol%, more preferably less than 3 mol%, and particularly preferably substantially no content (the content is almost zero).
- the glass of this invention does not contain lead oxide substantially from a viewpoint that possibility of causing environmental pollution is low.
- the glass of the present invention uses raw materials such as oxides, phosphates, metaphosphates, carbonates, nitrates, and hydroxides, weighs them so as to have a predetermined composition, mixes them, platinum, etc. It can be obtained by melting at a temperature of 950 to 1500 ° C. using a crucible and casting into a mold or pouring into a gap between twin rolls and quenching. Also, it may be gradually cooled to remove the distortion.
- the glass produced by the above method is used in the form of powder.
- the glass powder is obtained by pulverizing glass with a mortar, ball mill, jet mill or the like, and classifying it as necessary.
- the mass average particle size of the glass powder is typically 0.5 to 10 microns.
- the surface of the glass powder may be modified with a surfactant or a silane coupling agent.
- This glass frit is kneaded with a solvent or a binder as necessary, and then applied onto a transparent substrate and fired at a temperature about 60 ° C. higher than the glass transition temperature of the glass frit to soften the glass frit and cool to room temperature. By doing so, a transparent substrate with a scattering layer is obtained.
- the solvent include ⁇ -terpineol, butyl carbitol acetate, phthalate ester, 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate
- the binder includes ethyl cellulose, acrylic resin, styrene resin, Examples thereof include phenol resin and butyral resin.
- a binder before softening a glass frit, it is preferable to include the process of baking at a temperature lower than a glass transition temperature and vaporizing a binder.
- Glass compositions of the present invention are examples of glass compositions of the present invention.
- Tables 1 to 8 show the composition of the glass in mol% of each example, the refractive index (n d ), the glass transition temperature (T g ), and the average thermal expansion coefficient from 50 ° C. to 300 ° C. ( ⁇ 50-300 ).
- the composition in terms of mass% converted based on the composition in terms of mol% is also shown.
- oxides, metaphosphates or carbonates are used as raw materials for each component. After vitrification, the raw materials are weighed so as to have the composition shown in Table 1 and mixed sufficiently, and then a platinum crucible is used. After melting in a temperature range of 950 ° C. to 1350 ° C. in an electric furnace, it is cast into a carbon mold, the cast glass is cooled to a transition temperature, immediately put into an annealing furnace, and gradually cooled to room temperature.
- the obtained glass was measured for refractive index (n d ), glass transition temperature (T g ), and average thermal expansion coefficient ( ⁇ 50-300 ) from 50 ° C. to 300 ° C. as follows.
- Refractive index (n d ) After the glass was polished, it was measured by a V-block method using a Kalun precision refractometer KPR-2000.
- T g Glass transition temperature
- Examples 1 to 35 are examples of the present invention.
- Examples 36 to 37 are examples in which the glass composition of the present invention was formed on a substrate and the adhesion to the substrate and the degree of warpage were confirmed.
- the flaky glasses having the respective compositions shown in Examples 4 and 5 were weighed, mixed and melted in the same manner as described above, and then the melt was poured into a gap between twin rolls and rapidly cooled. Each flake was dry pulverized with an alumina ball mill for 1 hour to obtain each glass frit. Each glass frit had a mass average particle size of about 3 microns. 75 g of each glass frit thus obtained was kneaded with 25 g of an organic vehicle (10% by mass of ethyl cellulose dissolved in ⁇ -terpineol) to prepare a glass paste.
- an organic vehicle 10% by mass of ethyl cellulose dissolved in ⁇ -terpineol
- This glass paste is printed on a 10cm square and 0.55mm thick soda lime glass substrate surface-coated with a silica film, and uniformly printed in the center with a 9cm square size so that the film thickness after firing is 30 ⁇ m.
- the soda-lime glass used has an average coefficient of thermal expansion ( ⁇ 50-300 ) from 50 ° C. to 300 ° C. of 83 ⁇ 10 ⁇ 7 / K.
- the glass for the scattering layer of the organic LED element of the present invention is suitable as a scattering layer for the organic LED element because it has good adhesion to the substrate and does not cause problems such as warping and cracking. I understand that.
- the prepared powder raw material was dissolved in an electric furnace at 1050 ° C. for 90 minutes, held at 950 ° C. for 60 minutes, and then cast into a roll to obtain glass flakes.
- This glass has a glass transition temperature of 475 ° C., a yield point of 525 ° C., and a thermal expansion coefficient of 72 ⁇ 10 ⁇ 7 (1 / ° C.) (average value of 50 to 300 ° C.).
- the measurement was performed by a thermal expansion method using a thermal analyzer (manufactured by Bruker, trade name: TD5000SA) at a heating rate of 5 ° C./min.
- the refractive index nF at the F line (486.13 nm) is 2.00
- the refractive index nd at the d line (587.56 nm) is 1.98
- the refractive index nC at the C line (656.27 nm) is 1. .97.
- the measurement was performed with a refractometer (trade name: KPR-2000, manufactured by Kalnew Optical Industry Co., Ltd.).
- the prepared flakes were pulverized with a zirconia planetary mill for 2 hours and then sieved to obtain glass powder.
- the particle size distribution at this time was D50 of 2.15 ⁇ m, D10 of 0.50 ⁇ m, and D90 of 9.72 ⁇ m.
- 35 g of the obtained glass powder was kneaded with 13.1 g of an organic vehicle (ethyl cellulose dissolved in ⁇ -terpineol or the like) to prepare a glass paste.
- This glass paste was uniformly printed on the above-mentioned glass substrate so as to have a circular shape with a diameter of 10 mm and a film thickness after firing of 14 ⁇ m.
- a haze computer (trade name: HZ-2) manufactured by Suga Test Instruments Co., Ltd. was used, and a single glass substrate was used as a reference sample. That is, the total light transmittance is 100 and the haze is 0 when a single glass substrate is measured. As a result of measurement, the total light transmittance was 79, and the haze value was 52.
- the apparatus is a surface roughness measuring machine manufactured by Kosaka Laboratory Ltd. (table name: Surfcorder ET4000A), the evaluation length is 5.0 mm, the cutoff wavelength is 2.5 mm, and the measurement speed is 0.1 mm / The roughness was measured with s. As a result, the arithmetic average roughness Ra was 0.55 ⁇ m, and the arithmetic average wavelength ⁇ a was 193 ⁇ m. These numerical values are based on the ISO 4287-1997 standard.
- ITO having a thickness of 150 nm was formed by DC magnetron sputtering as a translucent electrode. At the time of sputtering, a film is formed in a desired shape using a mask.
- the refractive index of ITO and the refractive index of the glass for scattering layers described above are shown in FIG. In the figure, the vertical axis represents the refractive index, and the horizontal axis represents the wavelength (unit: nm).
- ⁇ -NPD N, N′-diphenyl-N, N′-bis (l-naphthyl) -l, l′ biphenyl-4,4 ′′ diamine: CAS No. 123847 is used using a vacuum deposition apparatus. -85-4) was deposited to 100 nm, Alq3 (tris8-hydroxyquinoline aluminum: CAS No. 2085-33-8) to 60 nm, LiF to 0.5 nm, and Al to 80 nm.
- ⁇ -NPD and Alq3 form a circular pattern having a diameter of 12 mm using a mask, and LiF and Al form a pattern using a mask having a 2 mm square region on the ITO pattern through the organic film.
- the element substrate was completed.
- a concave portion was partially formed by performing sandblasting on a separately prepared high strain point glass substrate (strain point 570 ° C. or higher, PD200 manufactured by Asahi Glass Co., Ltd.) to create a counter substrate.
- Photosensitive epoxy resin was applied to the bank around the recess for sealing the periphery.
- the element substrate and the counter substrate are placed in a glove box in a nitrogen atmosphere, and a water catching material containing CaO is attached to the concave portion of the counter substrate, and then the element substrate and the counter substrate are bonded together and irradiated with ultraviolet rays. Then, the peripheral sealing resin was cured to complete the organic EL element.
- FIG. 4 and FIG. 5 show how the element emits light.
- FIG. 4 shows an element having a scattering layer
- FIG. 5 shows an element without a scattering layer
- 400 represents a scattering layer
- 410 represents an organic layer
- 420 represents an ITO pattern
- 430 represents an Al pattern.
- light emission is confirmed only from the approximately 2 mm square region formed by the crossing of the ITO pattern and the Al pattern.
- the element fabricated on the scattering layer not only the above approximately 2 mm square region. It can be seen that light is also extracted from the surrounding scattering layer forming portion into the atmosphere.
- FIG. 6 shows current-voltage characteristics of an element with and without a scattering layer.
- the vertical axis represents voltage (unit: V)
- the horizontal axis represents current (unit: mA).
- the current luminous flux characteristics are shown in FIG.
- the vertical axis indicates the luminous flux (unit: lm)
- the horizontal axis indicates the current (unit: mA).
- the amount of light flux is proportional to the current regardless of the presence or absence of the scattering layer. Furthermore, it was confirmed that the element having the scattering layer had a 51% increase in the luminous flux compared to the element having no scattering layer. As shown in FIG. 3, since the refractive index of the scattering layer is higher than the refractive index of ITO, which is a translucent electrode, at the emission wavelength of Alq3 (470 nm to 700 nm), the EL emission light of Alq3 is scattered with ITO. Suppressing total reflection at the interface of the layers, indicating that light is efficiently extracted into the atmosphere.
- the angle dependency of light emission was evaluated.
- a color luminance meter (trade name: BM-7A) manufactured by Topcon Technohouse Co., Ltd. was used, and as shown in FIG.
- the angle dependence of the luminescent color was measured.
- 800 indicates an evaluation element
- 810 indicates a spectrometer.
- a current of 1 mA is applied to the element to light it.
- the angle is defined as a measurement angle ⁇ [°], which is an angle formed between the normal direction of the element and the direction from the element toward the luminance meter. That is, the state where the luminance meter is installed in front of the element is 0 °.
- the luminance data obtained from the measurement is shown in FIG.
- the vertical axis represents luminance (unit: cd / m 2 ), and the horizontal axis represents angle (unit: °). Further, chromaticity data obtained from the measurement is shown in FIG. In the figure, the vertical axis represents V ′ and the horizontal axis represents U ′.
- the CIE1976UCS color system is used to calculate the chromaticity coordinates.
- the present invention it is possible to provide a glass of a scattering layer used for an organic LED element or an organic LED element using the scattering layer. By using such an organic LED element, light extraction efficiency can be improved.
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Abstract
Description
(1)酸化物基準のモル%表示で、
P2O5 15~30%と、
Bi2O3 5~30%と、
Nb2O5 5~27%と、
ZnO 4~40%とを含有し、
Li2OとNa2OとK2Oとからなるアルカリ金属酸化物の含有量の合計が5質量%以下であることを特徴とする有機LED素子の散乱層用ガラス。
(2)前記アルカリ金属酸化物の含有量が合量で2質量%以下であることを特徴とする(1)に記載の有機LED素子の散乱層用ガラス。
(3)前記アルカリ金属酸化物を実質的に含有しないことを特徴とする(1)若しくは(2)に記載の有機LED素子の散乱層用ガラス。
(4)TiO2を実質的に含有しないことを特徴とする(1)から(3)のいずれか一つに記載の有機LED素子の散乱層用ガラス。
(5)ZnOの含有量が21モル%以上である(1)から(4)のいずれか一つに記載の有機LED素子の散乱層用ガラス。
(6)酸化鉛を実質的に含有しないことを特徴とする(1)から(5)のいずれか一つに記載の有機LED素子の散乱層用ガラス。
酸化物基準のモル%表示で、P2O5:15~30%と、Bi2O3:5~30%と、Nb2O5:5~27%と、ZnO:4~40%とを含有し、Li2OとNa2OとK2Oとからなるアルカリ金属酸化物の含有量の合計が5質量%以下である散乱層を有することを特徴とする有機LED素子。
(8)前記散乱層は前記透明基板上に設けられることを特徴とする(7)に記載の有機LED素子。
(9)前記散乱層は前記有機層上に設けられることを特徴とする(7)に記載の有機LED素子。
(10)前記第1及び第2の電極は透明電極である(7)から(9)のいずれか一つに記載の有機LED素子。
(11)照明に用いられる(7)から(10)のいずれか一つに記載の有機LED素子。
初めに、図面を用いて、本発明の有機LED素子について説明する。
透明基板110の形成に用いられる透光性の基板としては、主としてガラス基板など、可視光に対する透過率が高い材料が用いられる。透過率の高い材料は、具体的には、ガラス基板のほかにはプラスチック基板が用いられる。ガラス基板の材料としては、アルカリガラス、無アルカリガラスまたは石英ガラスなどの無機ガラスがある。ガラス成分の拡散を防止するために、ガラス基板の表面にシリカ膜等がコートされていてもかまわない。また、プラスチック基板の材料としては、ポリエステル、ポリカーボネート、ポリエーテル、ポリスルホン、ポリエーテルスルホン、ポリビニルアルコールならびにポリフッ化ビニリデン及びポリフッ化ビニルなどのフッ素含有ポリマーがある。なお、基板を水分が透過するのを防止するために、プラスチック基板にバリア性をもたせる構成としても良い。透明基板の厚さは、ガラスの場合0.1mm~2.0mmが好ましい。但し、あまり薄いと強度が低下するので、0.5mm~1.0mmであることが特に好ましい。
散乱層120は、塗布などの方法で基板上にガラス粉末を形成し、所望の温度で焼成することで形成され、第1の屈折率を有するベース材121と、ベース材121中に分散された、ベース材121と異なる第2の屈折率を有する複数の散乱物質122とを備える。そして、散乱層をガラスで構成することにより、優れた散乱特性を有しつつも表面の平滑性を維持することができ、発光デバイスなどの光出射面側に用いることで極めて高効率の光取り出しを実現することができる。
第1の電極(陽極)は、有機層140で発生した光を外部に取り出すために、80%以上の透光性が要求される。また、多くの正孔を注入するため、仕事関数が高いものが要求される。具体的には、ITO(Indium Tin Oxide)、SnO2、ZnO、IZO(Indium Zinc Oxide)、AZO(ZnO-Al2O3:アルミニウムがドーピングされた亜鉛酸化物)、GZO(ZnO-Ga2O3:ガリウムがドーピングされた亜鉛酸化物)、NbドープTiO2、TaドープTiO2などの材料が用いられる。陽極の厚さは、100nm以上が好ましい。なお、陽極130の屈折率は、1.9~2.2である。ここで、キャリア濃度を増加させると、ITOの屈折率を低下させることができる。市販されているITOは、SnO2が10wt%が標準となっているが、これより、Sn濃度を増やすことで、ITOの屈折率を下げることができる。但し、Sn濃度増加により、キャリア濃度は増加するが、移動度及び透過率の低下があるため、これらのバランスをとって、Sn量を決める必要がある。
有機層140は、発光機能を有する層であり、正孔注入層と、正孔輸送層と、発光層と、電子輸送層と、電子注入層とにより構成される。有機層140の屈折率は、1.7~1.8である。
第2の電極としての反射性電極(陰極)は、仕事関数の小さな金属またはその合金が用いられる。陰極は、具体的には、アルカリ金属、アルカリ土類金属及び周期表第3族の金属などが挙げられる。このうち、安価で化学的安定性の良い材料であることから、アルミニウム(Al)、マグネシウム(Mg)、銀(Ag)またはこれらの合金などが好ましく用いられる。また、Al、MgAgの共蒸着膜、LiFまたはLi2Oの薄膜蒸着膜の上にAlを蒸着した積層電極等が用いられる。また、高分子系では、カルシウム(Ca)またはバリウム(Ba)とアルミニウム(Al)の積層等が用いられる。なお、反射性電極を陽極としても良いことは言うまでもない。
次に、本発明の有機LED素子の散乱層用ガラスについて詳細に説明する。
散乱層用ガラスの屈折率は、前記のとおり透光性電極材料の屈折率と同等または若しくは高い方が好ましいため、できるだけ高いことが望まれる。また、散乱層用ガラスのガラス転移温度は、ガラス粉末を焼成して軟化させ散乱層を形成する際に、基板の熱変形を防ぐため、できるだけ低いことが望まれる。また、散乱層用ガラスの熱膨張係数は、散乱層を形成する際に基板との間に応力が発生して割れたり反ったりする現象を防ぐため、基板の熱膨張係数と近いか若干低い必要がある。一般的には高屈折率と低転移温度を有するガラスの熱膨張係数は基板の熱膨張係数よりもきわめて大きいため、散乱層用ガラスの熱膨張係数はできるだけ低いことが望まれる。反りや割れは、散乱層上に透光性電極層を形成する際に大きな障害となる。
本発明のガラスは、発明の効果を失わない範囲で、SiO2、Al2O3、La2O3、Y2O3、Gd2O3、Ta2O3、Cs2O、遷移金属酸化物等も含有することができる。それらの含有量は合計で5モル%未満が好ましく、3モル%未満がより好ましく、実質的に含有しない(含有量がほぼ零である)ことが特に好ましい。
例1~35は、本発明のガラス組成物の実施例である。
ガラスを研磨した後、カルニュー社製精密屈折計KPR-2000によって、Vブロック法で測定した。
ガラスを直径5mm長さ200mmの丸棒状に加工した後、ブルッカー・エイエックスエス社製熱機械分析装置(TMA)TD5000SAによって、昇温速度を5℃/minにして測定した。
ガラスを直径5mm長さ200mmの丸棒状に加工した後、ブルッカー・エイエックスエス社製熱機械分析装置(TMA)TD5000SAによって、昇温速度を5℃/minにして測定した。50℃に於けるガラス棒の長さをL50とし、300℃におけるガラス棒の長さをL300としたとき、50℃から300℃までの熱膨張係数(α50-300)は、α50-300={(L300/L50)―1}/(300-50)によって求められる。
例36~37は、本発明のガラス組成物を基板上に形成して基板との密着性と反りの程度を確認した実施例である。
次に、光取り出し効率の向上の確認実験について説明する。
まず、ガラス基板としては、旭硝子株式会社製ソーダライムガラスを用いた。散乱層は以下のように作製した。まずガラス組成が表10になるように粉末原料を調合した。
本出願は、2010年7月26日出願の日本特許出願2010-167093に基づくものであり、その内容はここに参照として取り込まれる。
120 散乱層
130 第1の電極
140 有機層
150、210 第2の電極
Claims (11)
- 酸化物基準のモル%表示で、
P2O5 15~30%と、
Bi2O3 5~30%と、
Nb2O5 5~27%と、
ZnO 4~40%とを含有し、
Li2OとNa2OとK2Oとからなるアルカリ金属酸化物の含有量の合計が5質量%以下であることを特徴とする有機LED素子の散乱層用ガラス。 - 前記アルカリ金属酸化物の含有量が合量で2質量%以下であることを特徴とする請求項1に記載の有機LED素子の散乱層用ガラス。
- 前記アルカリ金属酸化物を実質的に含有しないことを特徴とする請求項1若しくは2に記載の有機LED素子の散乱層用ガラス。
- TiO2を実質的に含有しないことを特徴とする請求項1から3のいずれか一項に記載の有機LED素子の散乱層用ガラス。
- ZnOの含有量が21モル%以上である請求項1から4のいずれか一項に記載の有機LED素子の散乱層用ガラス。
- 酸化鉛を実質的に含有しないことを特徴とする請求項1から5のいずれか一項に記載の有機LED素子の散乱層用ガラス。
- 透明基板と、第1の電極と、有機層と、第2の電極とをこの順番で備えた有機LED素子であって、
酸化物基準のモル%表示で、P2O5:15~30%と、Bi2O3:5~30%と、Nb2O5:5~27%と、ZnO:4~40%とを含有し、Li2OとNa2OとK2Oとからなるアルカリ金属酸化物の含有量の合計が5質量%以下である散乱層を有することを特徴とする有機LED素子。 - 前記散乱層は前記透明基板上に設けられることを特徴とする請求項7に記載の有機LED素子。
- 前記散乱層は前記有機層上に設けられることを特徴とする請求項7に記載の有機LED素子。
- 前記第1及び第2の電極は透明電極である請求項7から9のいずれか一項に記載の有機LED素子。
- 照明に用いられる請求項7から10のいずれか一項に記載の有機LED素子。
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| KR1020137002088A KR20130097144A (ko) | 2010-07-26 | 2011-07-22 | 유기 led 소자의 산란층용 유리 및 유기 led 소자 |
| JP2012526478A JPWO2012014812A1 (ja) | 2010-07-26 | 2011-07-22 | 有機led素子の散乱層用ガラス及び有機led素子 |
| CN2011800366031A CN103026785A (zh) | 2010-07-26 | 2011-07-22 | 有机led元件的散射层用玻璃及有机led元件 |
| EP11812402.3A EP2600693A1 (en) | 2010-07-26 | 2011-07-22 | Glass for scattering layer of organic led element, and organic led element |
| US13/750,812 US20130134407A1 (en) | 2010-07-26 | 2013-01-25 | Glass for scattering layer of organic led element, and organic led element |
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| US13/750,812 Continuation US20130134407A1 (en) | 2010-07-26 | 2013-01-25 | Glass for scattering layer of organic led element, and organic led element |
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| EP (1) | EP2600693A1 (ja) |
| JP (1) | JPWO2012014812A1 (ja) |
| KR (1) | KR20130097144A (ja) |
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| WO2014112414A1 (ja) * | 2013-01-17 | 2014-07-24 | 旭硝子株式会社 | 透光性基板の製造方法、透光性基板、および有機led素子 |
| US9218804B2 (en) | 2013-09-12 | 2015-12-22 | At&T Intellectual Property I, L.P. | System and method for distributed voice models across cloud and device for embedded text-to-speech |
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| KR101589343B1 (ko) * | 2012-03-30 | 2016-01-28 | 주식회사 엘지화학 | 유기전자소자용 기판 |
| CN104575661B (zh) * | 2013-10-25 | 2017-09-12 | 硕禾电子材料股份有限公司 | 一种导电浆及其制造方法 |
| JP2015199640A (ja) * | 2014-04-01 | 2015-11-12 | 日本電気硝子株式会社 | 波長変換部材及びそれを用いてなる発光デバイス |
| FR3020179B1 (fr) * | 2014-04-22 | 2017-10-06 | Saint Gobain | Electrode supportee transparente pour oled |
| CN105322433B (zh) * | 2014-05-28 | 2020-02-04 | 深圳光峰科技股份有限公司 | 波长转换装置及其相关发光装置 |
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Also Published As
| Publication number | Publication date |
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| JPWO2012014812A1 (ja) | 2013-09-12 |
| KR20130097144A (ko) | 2013-09-02 |
| EP2600693A1 (en) | 2013-06-05 |
| TW201212333A (en) | 2012-03-16 |
| US20130134407A1 (en) | 2013-05-30 |
| CN103026785A (zh) | 2013-04-03 |
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