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WO2010100750A1 - Tour de refroidissement de trichlorosilane et procédé de production de trichlorosilane associé - Google Patents

Tour de refroidissement de trichlorosilane et procédé de production de trichlorosilane associé Download PDF

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Publication number
WO2010100750A1
WO2010100750A1 PCT/JP2009/054271 JP2009054271W WO2010100750A1 WO 2010100750 A1 WO2010100750 A1 WO 2010100750A1 JP 2009054271 W JP2009054271 W JP 2009054271W WO 2010100750 A1 WO2010100750 A1 WO 2010100750A1
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WO
WIPO (PCT)
Prior art keywords
cooling
trichlorosilane
reaction product
product gas
tetrachlorosilane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2009/054271
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English (en)
Japanese (ja)
Inventor
靖史 松尾
晃一 竹村
潤 中本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to PCT/JP2009/054271 priority Critical patent/WO2010100750A1/fr
Priority to JP2011502552A priority patent/JP5374576B2/ja
Priority to TW099102350A priority patent/TW201034957A/zh
Publication of WO2010100750A1 publication Critical patent/WO2010100750A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28C—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA COME INTO DIRECT CONTACT WITHOUT CHEMICAL INTERACTION
    • F28C3/00—Other direct-contact heat-exchange apparatus
    • F28C3/06—Other direct-contact heat-exchange apparatus the heat-exchange media being a liquid and a gas or vapour

Definitions

  • the present invention relates to a trichlorosilane cooling tower used for producing trichlorosilane from tetrachlorosilane and hydrogen, and a method for producing trichlorosilane using the trichlorosilane cooling tower.
  • Trichlorosilane (SiHCl 3 ) is a special material gas used for manufacturing semiconductors, liquid crystal panels, solar cells, and the like. In recent years, demand has been steadily expanding, and growth is expected as a CVD material widely used in the electronics field.
  • Trichlorosilane is produced by contacting tetrachlorosilane (SiCl 4 ) and hydrogen (H 2 ) to achieve the following thermal equilibrium state. SiCl 4 + H 2 ⁇ SiHCl 3 + HCl (1) This reaction is performed by heating a raw material gas composed of gasified tetrachlorosilane and hydrogen to 700 ° C. to 1400 ° C. in a reaction furnace.
  • the high-temperature reaction product gas discharged from the reaction furnace contains a large amount of unreacted tetrachlorosilane and hydrogen in addition to the produced trichlorosilane and hydrogen chloride.
  • a method of condensing in a distillation column using the difference in boiling point between tetrachlorosilane and trichlorosilane is used. Specifically, it is divided into chlorosilane, which is a condensed component, and hydrogen chloride, hydrogen, and non-condensed chlorosilane, which are uncondensed by a condenser, and the condensed component is cooled to about -70 ° C. by cryogenic separation. Isolate the chlorosilane.
  • trichlorosilane comprising a step of reacting tetrachlorosilane with hydrogen to convert to trichlorosilane and further cooling the reaction product gas
  • Patent Document 1 a method for producing trichlorosilane comprising a step of reacting tetrachlorosilane with hydrogen to convert to trichlorosilane and further cooling the reaction product gas
  • tetrachlorosilane and hydrogen are introduced into a reaction chamber and reacted at a temperature of 800 ° C. or higher to generate a mixed gas containing trichlorosilane and hydrogen chloride;
  • the method has a step of cooling the mixed gas by introducing a cooling gas mainly composed of at least one of hydrogen, tetrachlorosilane, or hydrogen chloride into the mixed gas.
  • Patent Document 2 discloses that a reaction product gas containing trichlorosilane and hydrogen chloride is obtained by introducing tetrachlorosilane and hydrogen into a reaction chamber and performing a conversion reaction at a temperature of 600 ° C. to 1200 ° C., and then from the reaction chamber.
  • An apparatus comprising a cooling means for spraying a chlorosilane mixture cooled to room temperature onto the derived reaction product gas and rapidly cooling to 300 ° C. or less within 1 second has been proposed.
  • Patent Document 2 describes that a reaction mixture (chlorosilane mixture) obtained by the reaction is cooled to room temperature and used as a cooling liquid. Specific conditions for spraying a cooling liquid made of a chlorosilane mixture are described. There is no formal disclosure.
  • the present invention has been made in view of the above circumstances, and is excellent in the cooling efficiency of the reaction product gas containing trichlorosilane without greatly changing the existing equipment and increasing the load required for cooling. It is an object of the present invention to provide a trichlorosilane cooling tower excellent in the recovery efficiency of trichlorosilane that does not cause raw materials and a method for producing trichlorosilane using the same.
  • the trichlorosilane cooling tower of the present invention is A coolant having an average droplet diameter of 2000 ⁇ m or less is sprayed on a reaction product gas containing trichlorosilane obtained by reacting a raw material gas containing tetrachlorosilane and hydrogen at a temperature in the range of 700 to 1400 ° C.
  • a primary cooling means that rapidly cools to a temperature range of 70 to 600 ° C., and a cooling liquid sprayed on the reaction product gas after the primary cooling provided above the primary cooling means and cooled to a temperature range of 30 to 60 ° C.
  • the method for producing trichlorosilane of the present invention includes: Producing a reaction product gas containing trichlorosilane obtained by reacting a raw material gas containing tetrachlorosilane and hydrogen at a temperature in the range of 700 to 1400 ° C .; A primary cooling step of spraying the reaction product gas with a cooling liquid having an average droplet particle diameter of 2000 ⁇ m or less and rapidly cooling to 70 to 600 ° C. within 1 second; A secondary cooling step of further spraying a cooling liquid onto the reaction product gas after the primary cooling to cool the reaction product gas to a range of 30 to 60 ° C .; Have
  • the cooling means is provided in multiple stages, and the temperature sufficient for freezing the equilibrium in the primary cooling step is 70 to 600.
  • the trichlorosilane can be efficiently recovered in the gaseous state by rapidly cooling to 0 ° C. and by gently cooling to the range of 30 to 60 ° C. in order to condense the high boiling point polymer exclusively in the secondary cooling step.
  • the trichlorosilane cooling tower and the trichlorosilane production method using the same since the cooling efficiency of the reaction product gas is extremely excellent, the equilibrium state tilted to trichlorosilane can be frozen instantly and reliably. it can. In addition, since trichlorosilane and the high-boiling point polymer can be separated and taken out, the trichlorosilane distillation load can be reduced. Furthermore, by providing the cooling means in multiple stages, more trichlorosilane can be taken out in a gaseous state. Thus, the synergistic action of these can greatly improve the productivity of trichlorosilane.
  • FIG. 1 schematically shows an apparatus for carrying out a trichlorosilane cooling tower of this embodiment and a method for producing trichlorosilane using the same.
  • the trichlorosilane cooling tower 100 of the present embodiment includes a substantially cylindrical metal container 101, a primary spray nozzle 102 and a secondary spray nozzle 103 that are installed in the container and spray a coolant in the container, and the primary spray.
  • a primary cooling liquid supply pipe 104 and a secondary cooling liquid supply pipe 105 that are connected to the nozzle 102 and the secondary spray nozzle 103, respectively, and supply a cooling liquid thereto, and are connected to the primary spray nozzle 102 inside the metal container 101.
  • a quenching pipe 106 and a filling member 107 installed between the primary spray nozzle 102 and the secondary spray nozzle 103.
  • the metal container 101 is not particularly limited as long as it is a material that does not react with the reaction product gas, and can typically be made of a metal such as stainless steel.
  • a reaction product gas introduction opening 108 for taking in the reaction product gas is provided on the side wall of the metal container 101.
  • a cooling tower gas component extraction pipe 109 for extracting a gas component of the cooled reaction product gas is connected to the upper part of the metal container 101, and the bottom of the metal container 101 was used for cooling.
  • a cooling tower liquid component extraction pipe 110 is connected to extract the cooling liquid and the condensate generated by cooling.
  • the quenching tube 106 is not particularly limited as long as it does not react with the reaction product gas, and can typically be composed of a metal such as stainless steel.
  • the quench pipe 106 is provided with an introduction opening 111 for taking in the reaction product gas at a position corresponding to the reaction product gas introduction opening 108 of the metal container 101. Further, the bottom of the quench pipe 106 is open on the entire surface, and a discharge opening 112 for discharging the cooled reaction product gas is formed.
  • the primary spray nozzle 102 is installed from the canopy portion of the quench pipe 106 toward the inside of the quench pipe 106, and is connected to the primary coolant supply pipe 104.
  • the primary spray nozzle 102 sprays the coolant toward the reaction product gas introduced from the introduction opening 111 of the quench pipe 106, and instantaneously reaches 70 to 600 ° C. where the equilibrium of the above formula (1) is frozen. Cool quickly.
  • the primary spray nozzle 102 is not particularly limited as long as it can spray droplets having an average droplet particle diameter in a range of 2000 ⁇ m or less, and various types of nozzles can be used. In particular, a full-cone nozzle that can achieve a uniform flow distribution over the entire spray region is preferred.
  • the average droplet particle size depends not only on the nozzle characteristics but also on the spraying conditions.
  • the spray amount is 0.1 to 0.3 l / min
  • the spray pressure is 0.1 to 0.2 MPa
  • a mixed liquid composed of tetrachlorosilane and trichlorosilane having a mixing ratio described later is used as the cooling liquid, a liquid that can realize the above average droplet particle diameter is used.
  • the filling member 107 is installed above the primary spray nozzle 102.
  • the filling member 107 is provided with a gas passage so that the reaction product gas that is primarily cooled in the quench pipe 106 and pushed out from the discharge opening 112 of the quench pipe 106 is disturbed in its straight travel when rising inside the trichlorosilane cooling tower 100.
  • Any form can be used as long as it is formed.
  • it may be a form in which small blocks such as chips or blocks are packed irregularly, or a plurality of plate-like members provided with a large number of holes arranged at intervals.
  • the filling member 107 is not particularly limited as long as it does not react with the reaction product gas, and can typically be made of a metal such as stainless steel.
  • the secondary spray nozzle 103 is installed further above the primary spray nozzle 102 and the filling member 107, and is connected to the secondary coolant supply pipe 105.
  • the secondary spray nozzle 103 is ejected from the discharge opening 112 of the quench pipe 106, rises in the trichlorosilane cooling tower 100, and sprays the coolant toward the reaction product gas passing through the filling member 107. Gently cool the temperature of the reaction product gas to the range of 30-60 ° C. while condensing the boiling polymer.
  • the coolant sprayed from the secondary spray nozzle 103 also has a function of lowering the temperature inside the trichlorosilane cooling tower 100 and preventing the coolant from being vaporized before coming into contact with the reaction product gas.
  • the secondary spray nozzle 103 is not particularly limited, and various types of nozzles can be used. In particular, a full-cone nozzle that can achieve a uniform flow distribution over the entire spray region is preferred.
  • the average droplet diameter of the cooling liquid sprayed from the secondary spray nozzle 103 is not particularly limited, but is preferably in the range of 2000 ⁇ m or less, as in the case of the primary spray nozzle 102, because the cooling efficiency is excellent.
  • a mixed liquid composed of tetrachlorosilane and trichlorosilane is preferably used, and the content of tetrachlorosilane in the mixed liquid is preferably 80 to 100 mol%, more preferably 85 to 95 mol%.
  • the cooling liquid having such a specific composition the reaction can be frozen while the equilibrium of the above formula (1) is sufficiently moved to the right side, and trichlorosilane can be recovered with a high yield.
  • the temperature of the coolant is preferably adjusted to 50 ° C. or lower. If the temperature of the cooling liquid is adjusted to 50 ° C. or less, the temperature of the reaction product gas can be rapidly cooled in a short time, so that the state of being sufficiently moved to the right side in the above equation (1) is maintained. The equilibrium can be frozen.
  • a method for producing trichlorosilane using the above-described trichlorosilane cooling tower will be described with reference to FIG.
  • a raw material gas in which gasified tetrachlorosilane and hydrogen are mixed is supplied to the bottom of the reaction furnace 201 through a raw material gas supply pipe 200.
  • the reaction furnace 201 is made of graphite, and can be maintained in a state in which the interior of the reaction furnace 201 exceeds 700 ° C. and is not higher than 1400 ° C. by heating with a heater 202 having a maximum output of 500 KW provided in the periphery. . If the reaction temperature is 700 ° C. or higher, the equilibrium of the above formula (1) is sufficiently tilted to the right, and if it is 1400 ° C. or lower, it is preferable because the phenomenon that metal silicon precipitates and leads to blockage of the apparatus can be suppressed.
  • the reaction product gas that has been heated in the reaction furnace 201 and has reached the thermal equilibrium state shown in the above formula (1) moves to the upper side of the reaction furnace 201 and maintains a temperature of 700 ° C. or higher in the reaction gas extraction pipe.
  • 203 is introduced into the trichlorosilane cooling tower 100.
  • the reactor gas extraction pipe 203 passes through the side wall of the trichlorosilane cooling tower 100 and the side wall of the quench pipe 106 and reaches the inside of the quench pipe 106.
  • the reaction product gas taken out into the quenching pipe 106 is sprayed with a cooling liquid having an average droplet particle diameter of 2000 ⁇ m or less from the primary spray nozzle 102 connected to the primary cooling liquid supply pipe 104 to achieve equilibrium. Is rapidly cooled to the range of 70 to 600 ° C. where it freezes.
  • the reaction product gas and the fine droplet-shaped coolant are mixed in the narrow quenching tube 106 so that they are more reliably brought into contact with each other, and the reaction is generated by using latent heat of vaporization when the coolant is vaporized. Heat is quickly and efficiently removed from the gas. As a result, the equilibrium state between the substances in the reaction product gas is frozen.
  • the reaction product gas quenched in the quenching tube 106 is pushed out from the discharge opening 112 of the quenching tube 106, rises in the trichlorosilane cooling tower 100, and passes through the filling member 107.
  • the coolant is further sprayed from the secondary spray nozzle 103 connected to the secondary coolant supply pipe 105 to condense the high-boiling point polymer in the reaction product gas, and the temperature of the reaction product gas is set to 30 to 60. Cool gently to the °C range.
  • the temperature of the reaction product gas is rapidly cooled to 70 to 600 ° C. by the primary cooling, almost the thermal equilibrium state is frozen.
  • the secondary cooling does not need to be rapidly performed in a short time, but rather is preferably performed under milder conditions so as to condense only the high-boiling point polymer without condensing trichlorosilane.
  • the gas component that remains a gas even after cooling to the range of 30 to 60 ° C. is extracted from the cooling tower gas component extraction pipe 109 and cooled by the condenser 300, where most of the chlorosilane in the gas Is condensed and collected in the storage tank 301.
  • condensate such as a high boiling point polymer that condenses in the temperature range of 30 to 60 ° C. flows down to the bottom of the trichlorosilane cooling tower 100 together with the cooling liquid, and is extracted from the cooling tower liquid component extraction pipe 110. .
  • the cooling liquid used for cooling and the condensate condensed by cooling are collected in the storage tank 400 via the cooling tower liquid component extraction pipe 110. Further, a preparation liquid made of tetrachlorosilane and / or trichlorosilane is supplied to the storage tank 400 through the preparation liquid supply pipe 401 in order to keep the concentration of tetrachlorosilane in the cooling liquid constant.
  • the coolant prepared in the storage tank 400 is extracted by the pump 402, cooled by the heat exchanger 403, and supplied again to the trichlorosilane cooling tower 100 through the primary coolant supply pipe 104 and the secondary coolant supply pipe 105.
  • the heat exchanger 403 can be cooled through cooling water through the jacket.
  • a two-stage cooling method comprising two spraying means is used as a reaction product gas cooling method, but if the temperature of the reaction product gas is rapidly cooled to 500 to 600 ° C. by primary cooling, Since the composition of the reaction product gas does not substantially change, the secondary cooling can be performed in multiple stages using a plurality of spraying means.
  • Examples 1 to 3 and Comparative Example 1 All of Examples 1 to 3 and Comparative Example 1 were tested using the apparatus shown in FIG.
  • the reaction furnace 201 has an inner diameter of 50 mm and a length of 800 mm, and is heated by the heater 202, and the center of the reaction furnace 201 was heated to 1300 ° C.
  • the metal container 101 was provided with a quenching tube 106 having an inner diameter of 140 mm and a length of 1300 mm, and an inner diameter of 35 mm and a length of 420 mm and having a bottom opened.
  • a raw material gas composed of tetrachlorosilane and hydrogen previously heated to 600 ° C. is continuously supplied to the reaction furnace 201 through the raw material gas supply pipe 200 at a flow rate of 27 mol / hour, and the gas reacted in the reaction furnace 201 is further supplied to the reaction furnace.
  • the gas was supplied to the quenching pipe 106 installed inside the metal container 101 through the gas extraction pipe 203.
  • the raw material tetrachlorosilane was 33 mol% with respect to the total of tetrachlorosilane and hydrogen.
  • the heat exchanger 403 was cooled with cooling water at 20 ° C.
  • the pump 402 was It was driven to continuously spray the cooling liquid in the storage tank 400 into the quench pipe 106 and the metal container 101 through the primary spray nozzle 102 and the secondary spray nozzle 103, respectively.
  • the coolant supplied through the primary spray nozzle 102 has a spray amount of 0.1 l / min and a spray pressure of 0.15 MPa.
  • the cooling liquid supplied through the next spray nozzle 103 was sprayed with a spray amount of 0.6 l / min and a spray pressure of 0.15 MPa.
  • the temperature of the coolant was kept at 30 ° C. by passing through the heat exchanger 403.
  • the coolant extracted from the bottom of the metal container 101 was collected in the storage tank 400 and used continuously. If necessary, the cooling liquid was continuously supplemented with tetrachlorosilane or trichlorosilane through the preparation liquid supply pipe 401 to keep the composition constant.
  • the same type of spray nozzle was used as the primary spray nozzle 102 and the secondary spray nozzle 103 for each of the above Examples and Comparative Examples. That is, the cooling liquid sprayed from the primary spray nozzle 102 and the secondary spray nozzle 103 had the same particle size distribution for each example and comparative example.
  • the particle size distribution of the coolant sprayed from the spray nozzle used in each example and comparative example is shown in FIG.
  • the average droplet diameter is shown in Table 1 below.
  • Example 1 For each of Examples 1 to 3 and Comparative Example 1, the temperature of the reaction product gas immediately after the primary cooling in the quench pipe 106, the temperature of the gas extracted from the top of the trichlorosilane cooling tower 100, and included in the gas The content of the high boiling point polymer to be recovered and the recovered amount of trichlorosilane recovered from this gas via the condenser 300 were examined. The results are shown in Table 1 below.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Silicon Compounds (AREA)

Abstract

La présente invention concerne une tour de refroidissement de trichlorosilane avec laquelle l'efficacité de refroidissement d'un produit réactionnel gazeux peut être grandement améliorée. La tour de refroidissement comprend : un moyen de refroidissement principal dans lequel un liquide de refroidissement est pulvérisé sous la forme de gouttelettes ayant un diamètre moyen de 2000 µm ou moins sur un produit réactionnel gazeux contenant du trichlorosilane et est obtenu par réaction d'un gaz brut comprenant du tétrachlorosilane et de l'hydrogène à une température allant de 700 à 1400 °C pour de ce fait refroidir rapidement le produit réactionnel gazeux à une température dans la gamme allant de 70 à 600 °C ; et un moyen de refroidissement secondaire qui est disposé au-dessus du moyen de refroidissement principal et dans lequel le liquide de refroidissement est encore pulvérisé sur le produit réactionnel gazeux qui a subi le refroidissement principal pour de ce fait refroidir le gaz à une température allant de 30 à 60 °C.
PCT/JP2009/054271 2009-03-06 2009-03-06 Tour de refroidissement de trichlorosilane et procédé de production de trichlorosilane associé Ceased WO2010100750A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
PCT/JP2009/054271 WO2010100750A1 (fr) 2009-03-06 2009-03-06 Tour de refroidissement de trichlorosilane et procédé de production de trichlorosilane associé
JP2011502552A JP5374576B2 (ja) 2009-03-06 2009-03-06 トリクロロシラン冷却塔およびそれを用いたトリクロロシラン製造方法
TW099102350A TW201034957A (en) 2009-03-06 2010-01-28 Cooling tower of trichlorosilane and preparation method of trichlorosilane using the same

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PCT/JP2009/054271 WO2010100750A1 (fr) 2009-03-06 2009-03-06 Tour de refroidissement de trichlorosilane et procédé de production de trichlorosilane associé

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010235439A (ja) * 2009-03-11 2010-10-21 Mitsubishi Materials Corp トリクロロシランの製造装置および製造方法
JP2015042600A (ja) * 2013-08-26 2015-03-05 三菱マテリアル株式会社 トリクロロシラン製造方法
JP2016064951A (ja) * 2014-09-25 2016-04-28 デンカ株式会社 オクタクロロトリシランの製造方法並びに該方法により製造されるオクタクロロトリシラン

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895396A (fr) * 1972-02-26 1973-12-07
JPS6081010A (ja) * 1983-10-13 1985-05-09 Denki Kagaku Kogyo Kk トリクロルシランの製造法
JPS6163519A (ja) * 1984-09-04 1986-04-01 Denki Kagaku Kogyo Kk モノシラン製造法
JP2008137885A (ja) * 2006-11-07 2008-06-19 Mitsubishi Materials Corp トリクロロシランの製造方法およびトリクロロシラン製造装置
JP2008143775A (ja) * 2006-11-14 2008-06-26 Mitsubishi Materials Corp 水素分離回収方法および水素分離回収設備
JP2009007240A (ja) * 2007-05-25 2009-01-15 Mitsubishi Materials Corp トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4895396A (fr) * 1972-02-26 1973-12-07
JPS6081010A (ja) * 1983-10-13 1985-05-09 Denki Kagaku Kogyo Kk トリクロルシランの製造法
JPS6163519A (ja) * 1984-09-04 1986-04-01 Denki Kagaku Kogyo Kk モノシラン製造法
JP2008137885A (ja) * 2006-11-07 2008-06-19 Mitsubishi Materials Corp トリクロロシランの製造方法およびトリクロロシラン製造装置
JP2008143775A (ja) * 2006-11-14 2008-06-26 Mitsubishi Materials Corp 水素分離回収方法および水素分離回収設備
JP2009007240A (ja) * 2007-05-25 2009-01-15 Mitsubishi Materials Corp トリクロロシランの製造方法と製造装置および多結晶シリコンの製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010235439A (ja) * 2009-03-11 2010-10-21 Mitsubishi Materials Corp トリクロロシランの製造装置および製造方法
JP2015042600A (ja) * 2013-08-26 2015-03-05 三菱マテリアル株式会社 トリクロロシラン製造方法
JP2016064951A (ja) * 2014-09-25 2016-04-28 デンカ株式会社 オクタクロロトリシランの製造方法並びに該方法により製造されるオクタクロロトリシラン

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TW201034957A (en) 2010-10-01
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