WO2010038675A1 - 染料含有ネガ型硬化性組成物、これを用いたカラーフィルタ及びその製造方法、並びに固体撮像素子 - Google Patents
染料含有ネガ型硬化性組成物、これを用いたカラーフィルタ及びその製造方法、並びに固体撮像素子 Download PDFInfo
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- WO2010038675A1 WO2010038675A1 PCT/JP2009/066646 JP2009066646W WO2010038675A1 WO 2010038675 A1 WO2010038675 A1 WO 2010038675A1 JP 2009066646 W JP2009066646 W JP 2009066646W WO 2010038675 A1 WO2010038675 A1 WO 2010038675A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1807—C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F220/60—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
Definitions
- the present invention relates to a dye-containing negative curable composition, a color filter using the same, a method for producing the same, and a solid-state imaging device.
- a staining method As a method for producing a color filter used for a liquid crystal display device or a solid-state imaging device, a staining method, a printing method, an electrodeposition method, and a pigment dispersion method are known.
- the pigment dispersion method is a method for producing a color filter by a photolithography method using a colored radiation-sensitive composition in which a pigment is dispersed in various photosensitive compositions. It has the advantage of being stable to heat and the like. Further, since patterning is performed by a photolithography method, it has been widely used as a suitable method for manufacturing a color filter for a large-screen, high-definition color display with high positional accuracy.
- a radiation sensitive composition is applied on a glass substrate by a spin coater or a roll coater and dried to form a coating film, and the coating film is subjected to pattern exposure and development. Colored pixels are formed, and a color filter can be obtained by repeating this operation for each color.
- a negative photosensitive composition in which a photopolymerizable monomer and a photopolymerization initiator are used in combination with an alkali-soluble resin is described (for example, JP-A-2-181704, (See Kaihei 2-199403, JP-A-5-273411, JP-A-7-140654, JP-A-54-63903).
- a radiation sensitive composition for a color filter including an alkali-soluble resin, a polyfunctional monomer, a photopolymerization initiator, and a polyfunctional epoxy compound (low molecular or high molecular compound) is disclosed.
- a thermosetting ink composition for a color filter containing a pigment, a binder, and an epoxy monomer is disclosed (for example, see JP-A-2001-350012).
- color filters for use in solid-state imaging devices are required to have a film thickness of 1 ⁇ m or less, and further a pixel size of 2 ⁇ m or less, and high dye density and high resolution are required. .
- the smaller the pixel size the more difficult it is to achieve high resolution.
- the prior art when developing with a pattern having a pixel size of 2 ⁇ m or less, particularly when a Bayer pattern is formed, there is a problem of a development residual film and a residue, and it is also difficult to obtain a rectangular pattern.
- the present invention has been made in view of the above problems, and is a dye-containing negative curable composition capable of forming a good pattern shape having no developed residual film and residue even when the pixel size becomes fine, It is an object to provide a color filter using the composition, a method for producing the color filter, and a solid-state imaging device excellent in color reproducibility.
- a dye-containing negative curable composition comprising at least a resin and (E) an organic solvent.
- R 1 and R 2 may independently represent a hydrogen atom or a monovalent organic group, and R 1 and R 2 may be linked together to form a ring structure.
- R 1 and R 2 have the same meanings as in General Formula (1).
- R 3 , R 4 and R 5 each independently represent a hydrogen atom or a monovalent organic group, Represents * —C ( ⁇ O) —O—, * —C ( ⁇ O) —NR 6 — (R 6 represents a hydrogen atom or a monovalent organic group), or a phenylene group, * represents the main chain (L represents a single bond or a divalent linking group.)
- R 6 represents a hydrogen atom or a monovalent organic group
- * represents the main chain (L represents a single bond or a divalent linking group.)
- ⁇ 3> The dye-containing negative curing according to the above ⁇ 1> or ⁇ 2>, wherein the (D) amino group-containing alkali-soluble resin has a weight average molecular weight of 3,000 to 100,000 and an acid value of 10 to 200 Sex composition.
- ⁇ 7> The dye-containing negative type according to any one of ⁇ 1> to ⁇ 6>, wherein the content of the (A) organic solvent-soluble dye is 40% by mass or more based on the total solid content Curable composition.
- ⁇ 8> The dye-containing negative curable composition as described in any one of ⁇ 1> to ⁇ 7> above, wherein the (B) photopolymerization initiator is an oxime compound.
- ⁇ 9> The dye-containing negative curable composition as described in any one of ⁇ 1> to ⁇ 8> above, which is used for forming a color filter for a solid-state imaging device.
- ⁇ 11> Applying the dye-containing negative curable composition according to any one of the above ⁇ 1> to ⁇ 9> on a support to form a dye-containing negative curable composition layer;
- a method for producing a color filter comprising a step of exposing a negative curable composition layer through a mask and developing to form a pattern on the support.
- a solid-state imaging device comprising the color filter according to ⁇ 10>.
- a development residual film a dye-containing negative curable composition capable of forming a good pattern shape with no residue
- a color filter using the composition it is possible to provide a method for manufacturing a color filter and a solid-state imaging device having excellent color reproducibility.
- FIG. 1 is a diagram for explaining evaluation criteria for a cross-sectional pattern profile
- (A) is a diagram showing a good rectangle
- (B) is a diagram with slightly rounded corners (cad)
- (C ) Is a diagram showing a round top shape
- (D) is a diagram showing a round top shape and a shape in which the lower part of the pattern is expanded
- (E) is a diagram showing a complete round top shape with the pattern collapsed.
- the dye-containing negative curable composition of the present invention is represented by (A) an organic solvent-soluble dye, (B) a photopolymerization initiator, (C) a photopolymerizable compound, and the following general formula (1). It contains at least (D) an amino group-containing alkali-soluble resin having a structure in the side chain and (E) an organic solvent, and may further contain other components such as an alkali-soluble binder and a crosslinking agent as necessary. Good.
- each component which comprises the dye-containing negative curable composition of this invention is explained in full detail.
- the dye-containing negative curable composition of the present invention contains at least one organic solvent-soluble dye.
- the organic solvent-soluble dye in the present invention includes derivatives thereof.
- the organic solvent-soluble dye can be used without particular limitation, and can be selected, for example, from conventionally known dyes for color filters.
- coating characteristics (coating characteristics) In-plane uniformity) is preferable in that it can be improved.
- Examples of the known dye include, for example, JP-A-64-90403, JP-A-64-91102, JP-A-1-94301, JP-A-6-11614, JP-T-2592207, US Patent No. 4,808,501, U.S. Pat.No. 5,667,920, U.S. Pat.No. 5,059,500, JP-A-5-333207, JP-A-6-35183, Examples thereof include the dyes described in JP-A-6-51115 and JP-A-6-194828.
- organic solvent soluble dyes is triphenylmethane, anthraquinone, benzylidene, oxonol, cyanine, phenothiazine, pyrazoleazo, anilinoazo, pyrazolotriazoleazo, pyridoneazo, pyrrolopyrazole azomethine Xanthene, phthalocyanine, benzopyran, indigo, anthrapyridone, and the like.
- organic solvent-soluble dyes are pyrazole azo dyes, anilinoazo dyes, pyrazolotriazole azo dyes, pyridone azo dyes, anthraquinone dyes, and anthrapyridone dyes.
- the dye-containing negative curable composition of the present invention when used in a resist system that can be patterned by development with water or alkali, it is removed by development by using an organic solvent-soluble acidic dye in the composition.
- the binder and / or dye to be attempted can be made completely removable.
- direct dyes, basic dyes, mordant dyes, acid mordant dyes, azoic dyes, disperse dyes, Oil-soluble dyes, food dyes, and / or derivatives thereof can also be used.
- the organic solvent-soluble acid dye (hereinafter also simply referred to as “acid dye”) will be described below.
- the acidic dye is not particularly limited as long as it is a pigment having an acidic group such as sulfonic acid, carboxylic acid, or phenolic hydroxyl group. Among them, a pigment having a carboxylic acid is preferable from the viewpoint of the effect of the present invention.
- Acid dyes are soluble in organic solvents and developers used during development, salt-forming with basic compounds, absorbance, interaction with other components in the curable composition, light resistance, heat resistance, etc. It is preferred that the selection be made taking into account all of the required performance.
- acid alizarin violet N acid black 1, 2, 24, 48; acid blue 1,7,9,15,18,23,25,27,29,40,42,45,51,62,70,74,80,83,86,87,90,92,96,103, 112, 113, 120, 129, 138, 147, 150, 158, 171, 182, 192, 210, 242, 243, 256, 259, 267, 278, 280, 285, 290, 296, 315, 324: 1, 335, 340; acid chroma violet K; acid Fuchsin; acid green 1,3,5,9,16,25,27,50,58,63,65,80,104,105,106,109; acid orange 6, 7, 8, 10, 12, 26, 50, 51, 52, 56, 62, 63, 64, 74, 75, 94, 95, 107, 108,
- acid black 24 acid blue 23, 25, 29, 62, 80, 86, 87, 92, 138, 158, 182, 243, 324: 1; acid orange 8, 51, 56, 63, 74; acid red 1,4,8,34,37,42,52,57,80,87,97,114,143,145,151,183,217,249; acid violet 7; acid yellow 17, 23, 25, 29, 34, 42, 72, 76, 99, 111, 112, 114, 116, 134, 155, 169, 172, 184, 220, 228, 230, 232, 243; acid Green 25; Dyes such as these and derivatives of these dyes are preferred.
- azo, xanthene and phthalocyanine acid dyes are also preferred.
- an inorganic salt of an acidic dye having an acidic group such as sulfonic acid or carboxylic acid, a salt of an acidic dye and a nitrogen-containing compound, an amide compound such as a sulfonamide of an acidic dye, or the like may be used.
- the dye-containing negative curable composition is not particularly limited as long as it can be dissolved when it is prepared in solution, and is soluble in the organic solvent and the developer used in the development process, absorbance, and composition. It is selected in consideration of all necessary performances such as interaction with other components, light resistance, heat resistance and the like.
- the “salt of acid dye and nitrogen-containing compound” will be described.
- the method of forming a salt of an acid dye and a nitrogen-containing compound may be effective for improving the solubility of the acid dye (providing solubility in an organic solvent) and improving heat resistance and light resistance.
- Nitrogen-containing compounds that form salts with acid dyes, and nitrogen-containing compounds that form amide bonds with acid dyes are soluble in salt or amide compounds in organic solvents and developers, salt-forming properties, dye absorbance / color value, It is selected in consideration of all of the interaction with other components in the composition, heat resistance as a colorant, light resistance, and the like.
- the nitrogen-containing compound is preferably as low as possible in molecular weight, more preferably a molecular weight of 300 or less, more preferably a molecular weight of 280 or less, and a molecular weight of 250 or less. Particularly preferred.
- n is a value that determines the molar ratio between the acidic dye molecule and the nitrogen-containing compound (amine compound) that forms a counter ion, and can be freely selected according to the salt forming conditions of the acidic dye-amine compound.
- n is preferably a value between 0 ⁇ n ⁇ 4.5, more preferably a value between 0 ⁇ n ⁇ 4, and 0 ⁇ n. It is particularly preferable to take a numerical value between ⁇ 3.5.
- the above acidic dye is an acidic dye due to the introduction of an acidic group, it can be converted to a non-acidic dye by changing the substituent.
- the acid dye may suitably act during alkali development, but on the other hand, it may be over-developed, and a non-acid dye may be preferably used.
- the non-acidic dye those having no acidic group of the above-mentioned acidic dye can be suitably used.
- the above-mentioned dyes can be used as monochromatic dyes when they are complementary colors such as yellow, magenta, and cyan. However, when they are primary colors such as red, green, and blue, they are generally 2 in terms of hue. It is preferable to use a combination of two or more kinds of dyes. As the organic solvent-soluble acid dye, it is preferable to assemble a primary color system by combining two or more kinds of dyes.
- organic solvent-soluble acid dyes when two or more kinds of organic solvent-soluble acid dyes are combined, they can be suitably used as a mixed system (mixture) in which at least two kinds of dyes having different absorption characteristics are combined. Can be configured.
- the absorption characteristics include a maximum absorption wavelength.
- a combination of dyes having different maximum absorption wavelengths of 50 nm to 250 nm is preferable, and a combination of dyes having a difference of 50 nm to 200 nm is more preferable.
- combinations of such preferable organic solvent-soluble acid dyes include a combination of Acid Yellow 23 and Acid Red 87 (mass ratio 1: 1), and a combination of Varifast Yellow 1101 and Acid Red 57 (mass ratio 2: 3), a combination of Direct Yellow 33 and Direct Green 27 (mass ratio 2: 3), a combination of Modern Violet 40 and Direct Green 69 (mass ratio 1: 2), and the like.
- the content of the organic solvent-soluble dye in the dye-containing negative curable composition varies depending on the dye, but is preferably 40% by mass or more based on the total solid components of the composition. Among them, from the viewpoint of further suppressing the thermal sag associated with the heat treatment of the cured pattern after patterning (after exposure / development, etc.), and further improving the improvement effect of the adhesion of the cured pattern to the substrate and the residual color rate after the development process, the content of the organic solvent-soluble dye is more preferably in the range of 40 to 90% by mass, still more preferably in the range of 50 to 80% by mass, and particularly preferably 55 to 90% by mass with respect to the entire dye-containing negative curable composition. The range is 70% by mass.
- the amount of organic solvent-soluble dye added in the smallest amount is when the total amount of organic solvent-soluble dye is 100% in terms of hue. It is preferable that it is at least 10% or more.
- the dye-containing negative curable composition of the present invention contains at least one photopolymerization initiator.
- the photopolymerization initiator acts on the polymerizable compound (C) described later to cure the composition.
- the photopolymerization initiator in the present invention is not particularly limited as long as it can at least polymerize the polymerizable compound (C), and is selected from the viewpoint of characteristics, initiation efficiency, absorption wavelength, availability, cost, and the like. Is preferred.
- the photopolymerization initiator examples include at least one active halogen compound selected from halomethyloxadiazole compounds and halomethyl-s-triazine compounds, 3-aryl-substituted coumarin compounds, lophine dimers, benzophenone compounds, Examples include acetophenone compounds and derivatives thereof, cyclopentadiene-benzene-iron complexes and salts thereof, and oxime compounds.
- Examples of the active halogen compound that is the halomethyloxadiazole compound include 2-halomethyl-5-vinyl-1,3,4-oxadiazole compounds described in JP-B-57-6096, 2-trichloromethyl, and the like. -5-styryl-1,3,4-oxadiazole, 2-trichloromethyl-5- (p-cyanostyryl) -1,3,4-oxadiazole, 2-trichloromethyl-5- (p-methoxy) Styryl) -1,3,4-oxadiazole, and the like.
- Examples of the active halogen compound which is the halomethyl-s-triazine compound include vinyl-halomethyl-s-triazine compounds described in JP-B-59-1281 and 2- (naphtho) described in JP-A-53-133428. -1-yl) -4,6-bis (halomethyl) -s-triazine compounds and 4- (p-aminophenyl) -2,6-bis (halomethyl) -s-triazine compounds.
- halomethyl-s-triazine compound examples include 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine, 2,6-bis (trichloromethyl) -4- (3 , 4-methylenedioxyphenyl) -1,3,5-triazine, 2,6-bis (trichloromethyl) -4- (4-methoxyphenyl) -1,3,5-triazine, 2,4-bis ( Trichloromethyl) -6- (1-p-dimethylaminophenyl-1,3-butadienyl) -s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine, 2- (naphtho -1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxy-naphth-1-yl) -4,6-bis (t
- photopolymerization initiator examples include TAZ series (for example, TAZ-107, TAZ-110, TAZ-104, TAZ-109, TAZ-140, TAZ-204, TAZ-113, and TAZ-) manufactured by Midori Chemical.
- T series for example, T-OMS, T-BMP, TR, TB
- Irgacure series for example, Irgacure 651, Irgacure 184, Irgacure, manufactured by Ciba Specialty Chemicals 500, Irgacure 1000, Irgacure 149, Irgacure 819, Irgacure 261)
- Darocur series eg Darocur 1173
- 4,4′-bis (diethylamino) -benzophenone 2- (O-benzoyloxime) -1- [4- (Phenylthio) phenyl]- 1,2-octanedione, 2-benzyl-2-dimethylamino-4-morpholinobutyrophenone, 2,2-dimethoxy-2-phenylacetophenone,
- oxime compounds are preferable, for example, 2- (O-benzoyloxime) -1- [4- (phenylthio) phenyl] -1,2-octanedione, and 1- (O— Acetyloxime) -1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone is particularly preferred.
- photopolymerization initiators can be used in combination with a sensitizer and a light stabilizer.
- Specific examples thereof include benzoin, benzoin methyl ether, 9-fluorenone, 2-chloro-9-fluorenone, 2-methyl-9-fluorenone, 9-anthrone, 2-bromo-9-anthrone, 2-ethyl-9- Anthrone, 9,10-anthraquinone, 2-ethyl-9,10-anthraquinone, 2-t-butyl-9,10-anthraquinone, 2,6-dichloro-9,10-anthraquinone, xanthone, 2-methylxanthone, 2 -Methoxyxanthone, 2-ethoxyxanthone, thioxanthone, 2,4-diethylthioxanthone, acridone, 10-butyl-2-chloroacridone, benzyl, dibenzylacetone, p-
- photopolymerization initiators can be used in the dye-containing negative curable composition of the present invention.
- Substituted ⁇ -carbonyl compounds, acyloin ethers disclosed in US Pat. No. 2,448,828, ⁇ -hydrocarbons disclosed in US Pat. No. 2,722,512 Aromatic acyloin compounds, polynuclear quinone compounds disclosed in US Pat. Nos. 3,046,127 and 2,951,758, disclosed in US Pat. No. 3,549,367.
- the content of the photopolymerization initiator is preferably 0.01% by mass to 50% by mass, more preferably 1% by mass to 30% by mass with respect to the following polymerizable compound solid content (mass). 20% by mass is particularly preferred.
- the content of the photopolymerization initiator is in the range of 0.01 to 50% by mass, the polymerization is easy to proceed, and the film strength can be sufficiently improved.
- (C) Polymerizable compound As the polymerizable compound, a compound having at least one addition-polymerizable ethylenic double bond and having a boiling point of 100 ° C or higher under normal pressure is preferable.
- the photopolymerizable layer (dye-containing negative curable composition) can be formed into a negative type.
- polymerizable compound examples include monofunctional acrylates and methacrylates such as polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, and phenoxyethyl (meth) acrylate; polyethylene glycol di (meth) acrylate, Trimethylolethane tri (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) Acrylate, hexanediol (meth) acrylate, candy
- the Japan Adhesion Association Vol. 20, no. 7, pages 300 to 308 are listed as photocurable monomers and oligomers.
- the polymerizable compound is preferably a polyfunctional (meth) acrylic compound.
- the polymerizable compounds in the present invention may be used alone or in combination of two or more.
- the content of the polymerizable compound in the dye-containing negative curable composition is 0 with respect to the total solid content (mass) of the composition from the viewpoint of improving the curability of the photocurable layer. It is preferably 1 to 90% by mass, more preferably 1.0 to 80% by mass, and particularly preferably 2.0 to 70% by mass. When the content is 0.1% by mass or more, the curability of the exposed portion is improved, and when it is 90% by mass or less, the elution property of the unexposed portion is improved.
- the amino group-containing alkali-soluble resin in the present invention is a polymer compound having a structure represented by the following general formula (1) in the side chain (hereinafter also referred to as a specific polymer compound). And any alkali-soluble resin having the structure in the side chain.
- R 1 and R 2 in the general formula (1) may independently represent a hydrogen atom or a monovalent organic group, and R 1 and R 2 may be linked to each other to form a ring structure.
- the monovalent organic group is preferably an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group, and each may have a substituent.
- alkyl group examples include linear, branched, and cyclic alkyl groups having 1 to 20 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, and pentyl.
- the alkyl group can be substituted, and as the substituent, a group composed of a monovalent nonmetallic atomic group excluding a hydrogen atom is used.
- Preferred examples include halogen atoms (—F, —Br, —Cl, -I), hydroxyl group, alkoxy group, aryloxy group, mercapto group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, acyloxy group, carbamoyloxy group, formyl group, acyl group, carboxyl group, alkoxycarbonyl group, Aryloxycarbonyl group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, alkoxysulfonyl group, aryloxysulfonyl group, sulfinamoyl group, cyano group,
- alkenyl group examples include alkenyl groups having 2 to 20 carbon atoms.
- the alkenyl group can be substituted, and examples of the substituent include those shown as the substituent in the substituted alkyl group.
- Specific examples of the alkenyl group include a vinyl group, 1-propenyl group, 1-butenyl group, cinnamyl group, 2-chloro-1-ethenyl group, and the like.
- alkynyl group examples include alkynyl groups having 2 to 20 carbon atoms.
- the alkynyl group can be substituted, and examples of the substituent include those shown as the substituent in the substituted alkyl group.
- Specific examples of the alkynyl group include ethynyl group, 1-propynyl group, 1-butynyl group, trimethylsilylethynyl group and the like.
- aryl group an aryl group having 6 to 20 carbon atoms in which one benzene ring or 2 to 3 benzene rings form a condensed ring, and a benzene ring and a 5-membered unsaturated ring have a condensed ring.
- examples thereof include a phenyl group, a biphenyl group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenaphthenyl group, and a fluorenyl group.
- a phenyl group and a naphthyl group are more preferable.
- the aryl group can be substituted, and examples of the substituent include those shown as the substituent in the substituted alkyl group.
- Specific examples of the aryl group include tolyl group, xylyl group, mesityl group, cumenyl group, chlorophenyl group, bromophenyl group, chloromethylphenyl group, hydroxyphenyl group, methoxyphenyl group, ethoxyphenyl group, phenoxyphenyl group, acetoxyphenyl.
- heterocyclic group examples include monovalent organic groups derived from pyridine, triazine, furan, and pyran.
- the heterocyclic group can be substituted, and examples of the substituent include those shown as the substituent in the substituted alkyl group.
- examples of the ring formed by combining R 1 and R 2 with each other include morpholine, piperazine, pyrrolidine, pyrrole, indoline and the like. These may be further substituted with a substituent as described above. Among these, the case where an alicyclic ring is formed is preferable.
- R 1 and R 2 are more preferably a linear alkyl group having 1 to 12 carbon atoms, a branched alkyl group having 3 to 12 carbon atoms, or a cyclic alkyl group having 5 to 10 carbon atoms, Of these, linear alkyl groups having 1 to 8 carbon atoms, branched alkyl groups having 3 to 8 carbon atoms, and cyclic alkyl groups having 5 to 8 carbon atoms are preferred because of their strong interaction with dyes. A chain is particularly preferred.
- the (D) amino-containing alkali-soluble resin in the present invention is preferably a polymer compound having a repeating unit represented by the following formula (2). You may have multiple types of this repeating unit.
- R 1 and R 2 have the same meaning as in General Formula (1), and preferred examples are also the same.
- R 3 , R 4 and R 5 each independently represent a hydrogen atom or a monovalent organic group, and X represents * —C ( ⁇ O) —O—, * —C ( ⁇ O) —NR 6 — ( R 6 represents a hydrogen atom or a monovalent organic group) or a phenylene group.
- * Represents a bond connected to the main chain.
- L represents a single bond or a divalent linking group.
- examples of the monovalent organic group represented by R 3 , R 4 , R 5 and R 6 include an alkyl group and an aryl group, and a substituted or unsubstituted alkyl group is preferable.
- an alkyl group having 1 to 12 carbon atoms is preferable, an alkyl group having 1 to 8 carbon atoms is more preferable, and an alkyl group having 1 to 4 carbon atoms is particularly preferable. preferable.
- alkyl group of R 3 , R 4 , R 5 and R 6 has a substituent
- substituents include a hydroxy group and an alkoxy group (preferably having 1 to 5 carbon atoms, more preferably 1 to 5 carbon atoms). 3 is more preferable.), A methoxy group, an ethoxy group, a cyclohexyloxy group, and the like.
- Specific examples of preferred alkyl groups for R 3 , R 4 , R 5 and R 6 include, for example, methyl group, ethyl group, propyl group, n-butyl group, i-butyl group, t-butyl group, and n-hexyl.
- R 3 , R 4 and R 6 are most preferably a hydrogen atom, and R 5 is most preferably a hydrogen atom or a methyl group.
- L represents a single bond or a divalent linking group.
- the divalent linking group is preferably a substituted or unsubstituted alkylene group.
- the alkylene group is preferably an alkylene group having 1 to 12 carbon atoms, more preferably an alkylene group having 1 to 8 carbon atoms, and particularly preferably an alkylene group having 1 to 4 carbon atoms.
- the alkylene group represented by L may be one in which two or more are connected via a hetero atom (for example, an oxygen atom, a nitrogen atom, or a sulfur atom).
- Specific examples of the preferable alkylene group represented by L include a methylene group, an ethylene group, a propylene group, a trimethylene group, and a tetramethylene group.
- examples of the substituent include a hydroxy group.
- examples of the divalent linking group represented by L include —O—, —S—, * —C ( ⁇ O) O—, * —CONH—, * —C ( ⁇ O) at the end of the alkylene group.
- the amino-containing alkali-soluble resin (D) in the present invention is a polymer compound having a repeating unit represented by the general formula (2), and the repeating unit represented by the general formula (2) is represented by the following general formula It can comprise using the monomer represented by Formula (3).
- R 1 , R 2 , R 3 , R 4 , R 5 , X, and L have the same meanings as the corresponding groups in the general formula (2).
- preferred specific examples of the monomer represented by the general formula (3) are shown below, but the present invention is not limited thereto.
- the amino value of the (D) amino group-containing alkali-soluble resin in the present invention having an amino group in the side chain is not particularly limited, but is preferably 5 to 200 mgKOH / g from the viewpoint of development residual film and residue generation,
- the preferred range is 10 to 100 mg KOH / g, and the most preferred range is 10 to 80 mg KOH / g.
- the amino value as the amino group content is preferably 5 mgKOH / g or more from the viewpoint of promoting the development of the dye in the non-image area (residue, residual film), and if it is 200 mgKOH / g or less, aggregation between amino groups Is preferred because it suppresses the strength of the ink from becoming strong and causes aggregation of the dye and hardly forms a precipitate. That is, in order to accelerate development of the dye in the non-image area, the amino value is preferably in the above range.
- the (D) amino group-containing alkali-soluble resin in the present invention preferably further contains a structural unit derived from a monomer having an acid group.
- the amino group-containing alkali-soluble resin when it is applied to a photosensitive composition, it is excellent in development removability of unexposed areas. This is preferable.
- Examples of the monomer having an acid group include unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, ⁇ -chloroacrylic acid, cinnamic acid; maleic acid, maleic anhydride, fumaric acid, itaconic acid, Unsaturated dicarboxylic acids such as itaconic acid, citraconic acid, citraconic anhydride, and mesaconic acid or their anhydrides; trivalent or higher unsaturated polycarboxylic acids or their anhydrides; succinic acid mono (2-acryloyloxy) Ethyl), succinic acid mono (2-methacryloyloxyethyl), phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) monohydric polycarboxylic acid mono [(Meth) acryloyloxyalkyl] esters; ⁇ -carboxy-polycaprolactone monoacrylate
- the amino group-containing alkali-soluble resin (D) in the present invention may contain only one type of structural unit derived from a monomer having an acid group, or may contain two or more types.
- the acid value of the (D) amino group-containing alkali-soluble resin in the present invention is preferably 10 to 200 mgKOH / g, more preferably 30 to 200 mgKOH / g, and particularly preferably 50 to 180 mgKOH / g.
- the acid value is preferably 10 mgKOH / g or more from the viewpoint of suppressing the formation of precipitates in the developer.
- the content of the structural unit derived from the monomer having an acid group is preferably within the above range.
- the amino group-containing alkali-soluble resin (D) in the present invention may further contain a structural unit derived from a copolymerizable vinyl monomer as long as the effect is not impaired.
- a vinyl monomer which can be used here For example, (meth) acrylic acid esters, crotonic acid esters, vinyl esters, maleic acid diesters, fumaric acid diesters, itaconic acid diesters, ( Preference is given to (meth) acrylamides, vinyl ethers, esters of vinyl alcohol, styrenes, (meth) acrylonitrile and the like.
- Specific examples of such vinyl monomers include the following compounds.
- when showing either or both of "acryl and methacryl it may describe as "(meth) acryl".
- Examples of (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate , Isobutyl (meth) acrylate, t-butyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, t-butylcyclohexyl (meth) acrylate, 2- (meth) acrylic acid 2- Ethylhexyl, t-octyl (meth) acrylate, dodecyl (meth) acrylate, octadecyl (meth) acrylate, acetoxyethyl (meth) acrylate, phenyl (meth) acrylate, 2-hydroxyethyl (meth)
- Examples of crotonic acid esters include butyl crotonate and hexyl crotonate.
- Examples of vinyl esters include vinyl acetate, vinyl propionate, vinyl butyrate, vinyl methoxyacetate, vinyl benzoate, and the like.
- Examples of maleic acid diesters include dimethyl maleate, diethyl maleate, and dibutyl maleate.
- Examples of the fumaric acid diesters include dimethyl fumarate, diethyl fumarate, and dibutyl fumarate.
- Examples of itaconic acid diesters include dimethyl itaconate, diethyl itaconate, and dibutyl itaconate.
- (Meth) acrylamides include (meth) acrylamide, N-methyl (meth) acrylamide, N-ethyl (meth) acrylamide, N-propyl (meth) acrylamide, N-isopropyl (meth) acrylamide, Nn-butyl (Meth) acrylamide, Nt-butyl (meth) acrylamide, N-cyclohexyl (meth) acrylamide, N- (2-methoxyethyl) (meth) acrylamide, N, N-dimethyl (meth) acrylamide, N, N- Examples include diethyl (meth) acrylamide, N-phenyl (meth) acrylamide, N-benzyl (meth) acrylamide, (meth) acryloylmorpholine, diacetone acrylamide, and the like.
- vinyl ethers include methyl vinyl ether, butyl vinyl ether, hexyl vinyl ether, and methoxyethyl
- styrenes examples include styrene, methyl styrene, dimethyl styrene, trimethyl styrene, ethyl styrene, isopropyl styrene, butyl styrene, hydroxy styrene, methoxy styrene, butoxy styrene, acetoxy styrene, chlorostyrene, dichlorostyrene, bromostyrene, chloromethyl
- acidsic substance for example, t-Boc and the like
- the preferred molecular weight of the (D) amino group-containing alkali-soluble resin in the present invention is in the range of 1,000 to 100,000 in terms of weight average molecular weight (Mw) and in the range of 400 to 50,000 in terms of number average molecular weight (Mn). It is preferable. More preferably, the weight average molecular weight (Mw) is in the range of 3,000 to 100,000, and the number average molecular weight (Mn) is in the range of 2,000 to 30,000. More preferably, the weight average molecular weight (Mw) is in the range of 5,000 to 50,000, and the number average molecular weight (Mn) is in the range of 2,000 to 30,000. In particular, the weight average molecular weight (Mw) is most preferably in the range of 8,000 to 30,000, and the number average molecular weight (Mn) is in the range of 4,000 to 12,000.
- the weight average molecular weight (Mw) of the (D) amino group-containing alkali-soluble resin in the present invention is preferably 1,000 or more from the viewpoint of accelerating the development of the dye in the non-image area. Is preferably 100,000 or less from the viewpoint of developability when a color filter is produced from the curable composition (photocurable composition).
- the amino group-containing alkali-soluble resin can be produced by a normal radical polymerization method using, for example, the monomer represented by the general formula (3) and another radical polymerizable compound as a copolymerization component. it can. In general, a suspension polymerization method or a solution polymerization method is used. Solvents used in the synthesis of such polymers include, for example, ethylene dichloride, cyclohexanone, methyl ethyl ketone, acetone, methanol, ethanol, propanol, butanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, 2-methoxyethyl.
- Examples include acetate, 1-methoxy-2-propanol, 1-methoxy-2-propyl acetate, N, N-dimethylformamide, N, N-dimethylacetamide, dimethyl sulfoxide, toluene, ethyl acetate, methyl lactate, and ethyl lactate. . These solvents may be used alone or in combination of two or more.
- a radical polymerization initiator can be used, and a chain transfer agent (eg, 2-mercaptoethanol and dodecyl mercaptan) can be further used.
- the dye-containing negative curable composition of the present invention contains at least one organic solvent.
- the organic solvent is basically not particularly limited as long as it can satisfy the solubility of each component and the applicability of the dye-containing negative curable composition, and particularly the solubility, applicability, and safety of the dye and binder. It is preferable to select in consideration of the properties.
- organic solvent examples include esters such as amyl formate; alkyl acetates such as ethyl acetate, n-butyl acetate, isobutyl acetate, isoamyl acetate, and isobutyl acetate; butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate Methyl lactate, ethyl lactate, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate and the like;
- 3-oxypropionic acid alkyl esters such as methyl 3-oxypropionate and ethyl 3-oxypropionate, such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxy Ethyl propionate, etc .
- 2-oxypropionic acid alkyl esters such as methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, such as methyl 2-methoxypropionate, 2-methoxypropionate Acid ethyl, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, 2-methoxy- 2-methylpropio Methyl acid, 2-ethoxy-2-methylpropionic acid ethyl, etc; methyl pyruvate,
- Ethers such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, ethyl carbitol acetate, butyl carbitol acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether Butyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, etc .;
- Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc .; aromatic hydrocarbons such as toluene and xylene are preferred.
- organic solvents are also preferably used in a mixture of two or more types from the viewpoints of solubility of the dye and, when an alkali-soluble resin (binder) is included, improvement of its solubility and coating surface condition.
- a mixed solution composed of two or more selected from acetate, butyl carbitol acetate, propylene glycol monomethyl ether, and propylene glycol monomethyl ether acetate is preferably used.
- the amount of the organic solvent used is preferably such that the total solid content concentration of the dye-containing negative curable composition is 5 to 80% by mass, more preferably 7 to 60% by mass, from the viewpoint of applicability. 10 to 50% by mass is particularly preferable.
- the dye-containing negative curable composition of the present invention is an alkali other than the above (D) amino group-containing alkali-soluble resin as long as the effects of the present invention are not impaired.
- Other components such as a soluble binder and a crosslinking agent may be included.
- the alkali-soluble binder is not particularly limited except that it has alkali solubility, and can be preferably selected from the viewpoints of heat resistance, developability, availability, and the like.
- the alkali-soluble binder is preferably a linear organic polymer, soluble in an organic solvent, and developable with a weak alkaline aqueous solution.
- linear organic high molecular polymers include polymers having a carboxylic acid in the side chain, such as JP-B-59-44615, JP-B-54-34327, JP-B-58-12777, and JP-B-54-25957.
- Maleic acid copolymers, partially esterified maleic acid copolymers, and the like, and acidic cellulose derivatives having a carboxylic acid in the side chain are also useful.
- the alkali-soluble binder includes, in addition to the above, those obtained by adding an acid anhydride to a polymer having a hydroxyl group, polyhydroxystyrene resins, polysiloxane resins, poly (2-hydroxyethyl (meta) ) Acrylate), polyvinyl pyrrolidone, polyethylene oxide, polyvinyl alcohol, and the like are also useful.
- the linear organic polymer may be a copolymer of hydrophilic monomers.
- examples include alkoxyalkyl (meth) acrylate, hydroxyalkyl (meth) acrylate, glycerol (meth) acrylate, (meth) acrylamide, N-methylol acrylamide, secondary or tertiary alkyl acrylamide, dialkylaminoalkyl (meth) Acrylate, morpholine (meth) acrylate, N-vinylpyrrolidone, N-vinylcaprolactam, vinylimidazole, vinyltriazole, methyl (meth) acrylate, ethyl (meth) acrylate, branched or linear propyl (meth) acrylate, branched or straight
- Examples include butyl (meth) acrylate of a chain, phenoxyhydroxypropyl (meth) acrylate, and the like.
- hydrophilic monomer examples include a tetrahydrofurfuryl group, a phosphoric acid group, a phosphoric ester group, a quaternary ammonium base, an ethyleneoxy chain, a propyleneoxy chain, a sulfonic acid group and a salt-derived group, a morpholinoethyl group, and the like. Also useful are monomers comprising
- the alkali-soluble binder may have a polymerizable group in the side chain in order to improve the crosslinking efficiency.
- a polymerizable group for example, an allyl group, a (meth) acryl group, an allyloxyalkyl group, etc.
- Polymers contained in the side chain are also useful.
- examples of the above-mentioned polymer containing a polymerizable group include commercially available KS resist-106 (manufactured by Osaka Organic Chemical Industry Co., Ltd.), cyclomer P series (manufactured by Daicel Chemical Industries, Ltd.) and the like.
- alcohol-soluble nylon, polyether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin are also useful.
- polyhydroxystyrene resins, polysiloxane resins, acrylic resins, acrylamide resins, and acrylic / acrylamide copolymer resins are preferable, and from the viewpoint of development control.
- acrylic resins, acrylamide resins, and acrylic / acrylamide copolymer resins are preferable, and from the viewpoint of development control.
- acrylic resin examples include a copolymer composed of a monomer selected from benzyl (meth) acrylate, (meth) acrylic acid, hydroxyethyl (meth) acrylate, (meth) acrylamide, and the like, and a commercially available KS resist 106 ( Osaka Organic Chemical Industry Co., Ltd.) and Cyclomer P Series (Daicel Chemical Industries, Ltd.) are preferred.
- the alkali-soluble binder is preferably a polymer having a weight average molecular weight (polystyrene equivalent value measured by GPC method) of 1000 to 2 ⁇ 10 5 from the viewpoint of developability, liquid viscosity, and the like, and a weight of 2000 to 1 ⁇ 10 5 is preferable. Polymers are more preferred, and polymers of 5000 to 5 ⁇ 10 4 are particularly preferred.
- -Crosslinking agent- In the present invention, it is also possible to obtain a film that has been further cured by using a crosslinking agent.
- a crosslinking agent Hereinafter, the crosslinking agent will be described.
- the crosslinking agent is not particularly limited as long as the film can be cured by a crosslinking reaction.
- an epoxy compound having a molecular weight of less than 1000 (a compound other than the epoxy resin contained in (D) described above)
- polyfunctional epoxy compounds are preferred.
- the epoxy compound (a) may be any epoxy compound as long as it has an epoxy group and has crosslinkability, for example, bisphenol A diglycidyl ether, ethylene glycol diglycidyl ether, butanediol diglycidyl ether.
- Divalent glycidyl group-containing low molecular weight compounds such as hexanediol diglycidyl ether, dihydroxybiphenyl diglycidyl ether, diglycidyl phthalate, N, N-diglycidyl aniline; trimethylolpropane triglycidyl ether, trimethylolphenol tri Trivalent glycidyl group-containing low molecular weight compounds represented by glycidyl ether, TrisP-PA triglycidyl ether, etc .; pentaerythritol tetraglycidyl ether, tetramethylol bisphenol Tetravalent glycidyl group-containing low molecular compounds typified by tetraglycidyl ether and the like; polyvalent glycidyl group-containing low molecular compounds such as dipentaerythritol pentaglycidyl ether and dipentaerythritol hex
- the number of methylol groups, alkoxymethyl groups, and acyloxymethyl groups substituted in the crosslinking agent (b) is 2 to 6 for melamine compounds, 2 for glycoluril compounds, guanamine compounds, and urea compounds. However, it is preferably 5 to 6 in the case of a melamine compound, and 3 to 4 in the case of a glycoluril compound, a guanamine compound or a urea compound.
- the melamine compound, guanamine compound, glycoluril compound and urea compound of (b) are collectively referred to as a compound (methylol group-containing compound, alkoxymethyl group-containing compound, or acyloxymethyl group-containing compound) according to (b).
- the methylol group-containing compound according to (b) can be obtained by heating the alkoxymethyl group-containing compound according to (b) in the presence of an acid catalyst such as hydrochloric acid, sulfuric acid, nitric acid or methanesulfonic acid in alcohol.
- the acyloxymethyl group-containing compound according to (b) can be obtained by mixing and stirring the methylol group-containing compound according to (b) with acyl chloride in the presence of a basic catalyst.
- the melamine compound examples include hexamethylol melamine, hexamethoxymethyl melamine, a compound in which 1 to 5 methylol groups of hexamethylol melamine are methoxymethylated, or a mixture thereof, hexamethoxyethyl melamine, hexaacyloxymethyl melamine, hexamethylol.
- examples thereof include compounds in which 1 to 5 methylol groups of melamine are acyloxymethylated, or mixtures thereof.
- Examples of the guanamine compound include tetramethylolguanamine, tetramethoxymethylguanamine, a compound obtained by methoxymethylating one to three methylol groups of tetramethylolguanamine, or a mixture thereof, tetramethoxyethylguanamine, tetraacyloxymethylguanamine, tetramethylol.
- Examples thereof include compounds in which 1 to 3 methylol groups of guanamine are acyloxymethylated or a mixture thereof.
- glycoluril compound examples include tetramethylol glycoluril, tetramethoxymethylglycoluril, a compound obtained by methoxymethylating one to three methylol groups of tetramethylolglycoluril, or a mixture thereof, or a methylol group of tetramethylolglycoluril.
- examples thereof include compounds in which 1 to 3 are acyloxymethylated or a mixture thereof.
- urea compound examples include tetramethylol urea, tetramethoxymethyl urea, a compound obtained by methoxymethylating 1 to 3 methylol groups of tetramethylol urea or a mixture thereof, tetramethoxyethyl urea, and the like. These compounds according to (b) may be used alone or in combination of two or more.
- the crosslinking agent (c) that is, a phenol compound, a naphthol compound, or a hydroxyanthracene compound substituted with at least one group selected from a methylol group, an alkoxymethyl group, and an acyloxymethyl group is the crosslinking agent (b).
- the thermal cross-linking suppresses intermixing with the overcoated photoresist and further increases the film strength.
- these compounds may be collectively referred to as a compound according to (c) (a methylol group-containing compound, an alkoxymethyl group-containing compound, or an acyloxymethyl group-containing compound).
- the number of methylol groups, acyloxymethyl groups or alkoxymethyl groups contained in the crosslinking agent (c) is at least 2 per molecule, and from the viewpoint of thermal crosslinkability and storage stability, phenol as a skeleton Compounds in which the 2nd and 4th positions of the compound are all substituted are preferred.
- the naphthol compound and hydroxyanthracene compound as the skeleton are preferably compounds in which all of the ortho-position and para-position of the OH group are substituted.
- the 3-position or 5-position of the phenol compound may be unsubstituted or may have a substituent.
- the naphthol compound may be unsubstituted or substituted except for the ortho position of the OH group.
- the methylol group-containing compound according to (c) is a compound in which the ortho-position or para-position (2-position or 4-position) of the phenolic OH group is a hydrogen atom, and this is used as sodium hydroxide, potassium hydroxide, It can be obtained by reacting with formalin in the presence of a basic catalyst such as ammonia or tetraalkylammonium hydroxide.
- the alkoxymethyl group-containing compound according to (c) can be obtained by heating the methylol group-containing compound according to (c) in an alcohol in the presence of an acid catalyst such as hydrochloric acid, sulfuric acid, nitric acid, methanesulfonic acid or the like.
- the acyloxymethyl group-containing compound according to (c) can be obtained by reacting the methylol group-containing compound according to (c) with an acyl chloride in the presence of a basic catalyst.
- Examples of the skeleton compound in the crosslinking agent (c) include phenol compounds, naphthols, hydroxyanthracene compounds, etc., in which the ortho-position or para-position of the phenolic OH group is unsubstituted. , 3-xylenol, 2,5-xylenol, 3,4-xylenol, 3,5-xylenol, bisphenols such as bisphenol A, 4,4'-bishydroxybiphenyl, TrisP-PA (Honshu Chemical Industry) Naphthol, dihydroxynaphthalene, 2,7-dihydroxyanthracene, etc. are used.
- crosslinking agent (c) examples include a phenol compound or a naphthol compound, for example, a compound obtained by methoxymethylating one or two methylol groups of trimethylolphenol, tri (methoxymethyl) phenol, trimethylolphenol, Compounds obtained by methoxymethylating one or two methylol groups of trimethylol-3-cresol, tri (methoxymethyl) -3-cresol, trimethylol-3-cresol, di-methyl compounds such as 2,6-dimethylol-4-cresol, etc.
- Examples of the hydroxyanthracene compound include 1,6-dihydroxymethyl-2,7-dihydroxyanthracene.
- Examples of the acyloxymethyl group-containing compound include compounds obtained by partially or fully acyloxymethylating the methylol group of the methylol group-containing compound.
- trimethylolphenol bishydroxymethyl-p-cresol, tetramethylolbisphenol A, trimethylol-form of TrisP-PA (manufactured by Honshu Chemical Industry Co., Ltd.) or their methylol groups.
- examples thereof include an alkoxymethyl group and a phenol compound substituted with both a methylol group and an alkoxymethyl group.
- These compounds according to (c) may be used alone or in combination of two or more.
- the crosslinking agent it is not always necessary to contain the crosslinking agent.
- the total content of the crosslinking agents (a) to (c) in the dye-containing negative curable composition varies depending on the material, but the solid content (mass) of the curable composition
- the content is preferably 1 to 70% by mass, more preferably 5 to 50% by mass, and particularly preferably 7 to 30% by mass.
- a thermal polymerization inhibitor can be added to the dye-containing negative curable composition of the present invention.
- a thermal polymerization inhibitor can be added to the dye-containing negative curable composition of the present invention.
- hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol), 2,2 ' -Methylenebis (4-methyl-6-t-butylphenol), 2-mercaptobenzimidazole and the like are useful.
- additives In the dye-containing negative curable composition of the present invention, various additives such as a filler, a polymer compound other than the alkali-soluble binder, a surfactant, an adhesion promoter, an antioxidant, an ultraviolet ray are optionally added. Absorbers, anti-aggregation agents and the like can be blended.
- the various additives include fillers such as glass and alumina; polymer compounds other than binder resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, and polyfluoroalkyl acrylate; nonionic, cationic And anionic surfactants: vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2 -Aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ) Ethyltrimet Adhesion promoters such as silane, 3-chlor
- the composition has an organic carboxylic acid, preferably a molecular weight of 1000 or less. Of low molecular weight organic carboxylic acids can be added.
- aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, enanthic acid, caprylic acid; oxalic acid, malonic acid, succinic acid, Aliphatic dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, citraconic acid; Aliphatic tricarboxylic acids such as tricarballylic acid, aconitic acid, and camphoric acid; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, hemelitic acid, and mesitylene acid; phthalic acid
- the dye-containing negative curable composition of the present invention can be suitably used for forming colored pixels such as color filters used in liquid crystal display devices (LCDs), solid-state imaging devices (eg, CCDs, CMOSs, etc.) and the like. .
- the dye-containing negative curable composition of the present invention is particularly suitable for forming a color filter for a solid-state imaging device in which a colored pattern is formed in a thin film with a very small size and a good rectangular cross-sectional profile is required.
- the pixel pattern size constituting the color filter (the side length of the pixel pattern viewed from the substrate normal direction) is 2 ⁇ m or less (for example, 0.5 to 2.0 ⁇ m)
- the effect of coarse particles in the pigment In the case of dyes, color loss may occur due to elution of the dye itself into the developer, or when the amount of dye increases, the relative amount of components that contribute to photolithographic properties decreases and post baking after patterning, etc. It is easy to cause thermal sag by heat treatment. This is particularly noticeable when the pixel pattern size is 1.0 to 1.7 ⁇ m (further 1.2 to 1.5 ⁇ m).
- the amount of components that contribute to photolithographic properties excluding the colorant in the film is relatively reduced, and the amount of other components is further reduced by the increase in the amount of colorant.
- Sensitivity is increased, and the pattern is easily peeled off in the low exposure region, and heat sag is easily caused by heat treatment such as post-baking after patterning as described above. This is particularly noticeable when the film thickness is 0.005 ⁇ m to 0.9 ⁇ m (further 0.1 ⁇ m to 0.7 ⁇ m).
- the color filter of the present invention will be described in detail through its manufacturing method.
- the above-described dye-containing negative curable composition of the present invention is used.
- the dye-containing negative curable composition of the present invention a high residual color rate can be obtained after development processing.
- the dye-containing negative curable composition of the present invention because the heat fluidity of the dye can be suppressed by the interaction between the dye and the (D) amino group-containing alkali-soluble resin, A color filter composed of a fine pattern with good shape and high resolution, which is less deformed by the influence of thermal sagging during heat treatment can be manufactured.
- a cured pattern can be formed with high sensitivity, adhesion with a support and the like can be improved, and a color filter with reduced occurrence of peeling (pixel defects) can be obtained.
- the organic solvent-soluble dye in the dye-containing negative curable composition of the present invention is used at a high concentration, and the (D) amino group-containing alkali-soluble resin is used, the above effect becomes remarkable.
- the method for producing a color filter of the present invention comprises a step of coating the dye-containing negative curable composition of the present invention on a support to form a dye-containing negative curable composition layer, and the dye-containing negative curable composition.
- the composition layer is exposed to light through a mask and developed to form a pattern on the support.
- the dye-containing negative curable composition of the present invention is coated on a support by a coating method such as spin coating, cast coating, roll coating or the like, and the dye-containing negative curable composition layer (radiation sensitive)
- the composition can be suitably produced by forming a negative coloring pattern by exposing the layer through a predetermined mask pattern and developing the layer with a developer (image forming step). ).
- the hardening process which hardens
- a color filter having a desired hue can be produced by repeating the image forming step (and the curing step if necessary) by the desired number of hues.
- ultraviolet rays such as g-line, h-line and i-line are particularly preferably used.
- the exposure may be performed by any of a proximity method, a mirror projection method, and a stepper method.
- the exposure is performed by a stepper method (reduction projection exposure method using a reduction projection exposure machine).
- a stepper method reduction projection exposure method using a reduction projection exposure machine.
- a pattern is formed by performing exposure while varying the exposure amount stepwise, and the rectangularity of the pattern can be particularly improved when performing stepper exposure.
- an exposure apparatus used for stepper exposure for example, an i-line stepper (trade name: FPA-3000i5 +, manufactured by Canon Inc.) can be used.
- the support examples include soda glass, Pyrex (registered trademark) glass, and quartz glass used for liquid crystal display elements and the like, and those obtained by attaching a transparent conductive film thereto, and photoelectric conversion element substrates used for imaging elements and the like.
- photoelectric conversion element substrates used for imaging elements and the like.
- examples thereof include a silicon substrate and a complementary metal oxide semiconductor (CMOS). These substrates may have black stripes that separate pixels.
- CMOS complementary metal oxide semiconductor
- an undercoat layer may be provided on these supports, if necessary, in order to improve adhesion with the upper layer, prevent diffusion of substances, or flatten the substrate surface.
- Any developer can be used as long as it has a composition that dissolves the uncured portion of the dye-containing negative curable composition of the present invention but does not dissolve the cured portion (irradiated portion).
- a combination of various organic solvents or an alkaline aqueous solution can be used.
- said organic solvent the above-mentioned organic solvent used when preparing the dye-containing negative curable composition of this invention is mentioned.
- alkaline aqueous solution examples include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide.
- An alkaline compound such as choline, pyrrole, piperidine, 1,8-diazabicyclo- [5.4.0] -7-undecene is used at a concentration of 0.001 to 10% by mass, preferably 0.01 to 1% by mass.
- An alkaline aqueous solution obtained by dissolution is preferable. When a developer composed of such an alkaline aqueous solution is used, it is generally washed with water after development.
- the color filter of the present invention can be used for a solid-state image pickup device such as a liquid crystal display device or a CCD, and is particularly suitable for a high-resolution CCD device or a CMOS that exceeds 1 million pixels.
- the color filter of the present invention can be used as, for example, a color filter disposed between a light receiving portion of each pixel constituting a CCD and a microlens for condensing light.
- the color filter of the present invention can obtain a colored pattern having excellent rectangularity by using the dye-containing negative curable composition of the present invention, and the solid-state imaging device provided with this color filter has excellent color reproducibility.
- the configuration of the solid-state imaging device is not particularly limited as long as it includes the color filter of the present invention and functions as a solid-state imaging device.
- a support body has a plurality of photodiodes constituting a light receiving area of a CCD image sensor (solid-state imaging device) and a transfer electrode made of polysilicon or the like, and only the light receiving portion of the photodiode is placed on the photodiode and the transfer electrode.
- It has a light shielding film made of tungsten or the like having an opening, and has a device protective film made of silicon nitride or the like formed so as to cover the entire surface of the light shielding film and the photodiode light receiving portion on the light shielding film, on the device protective film,
- This is a configuration having the color filter of the present invention.
- a configuration having light collecting means for example, a microlens, etc., the same applies hereinafter
- Example 1 1) Preparation of dye-containing negative curable composition The following composition was mixed and dissolved to prepare the dye-containing negative curable composition of the present invention.
- a resist CT-4000L solution (manufactured by FUJIFILM Electronics Materials Co., Ltd.) was applied onto the silicon wafer substrate using a spin coater to a film thickness of 0.1 ⁇ m, A cured film (undercoat layer) was formed by heating and drying at 220 ° C. for 1 hour.
- the exposure amount at which the ratio of the width of the pixel pattern of 2 ⁇ m in length ⁇ 2 ⁇ m in width to the width of the space between the pixel patterns was 1: 1 was determined as the appropriate exposure amount.
- Example 1 In Example 1, it carried out similarly to Example 1 and evaluated similarly except having changed each composition contained in the dye-containing negative curable composition into the composition shown in the following Tables 2 and 3.
- Example 1 In Example 1, it evaluated similarly and carried out similarly to Example 1 except having changed each composition contained in the dye-containing negative curable composition into the composition shown in following Table 4.
- ⁇ Evaluation criteria> A: No development residue is seen in the non-image area (unexposed area). B: Although development residue is not visible in the non-image area (unexposed area), a very small amount of development residue can be confirmed at the boundary between the image area (exposed area) and the non-image area (unexposed area). C: A slight development residue can be confirmed in the non-image area (unexposed area). D: A dotted development residue can be clearly confirmed in the non-image area (unexposed area). E: Development residue remains as a residual film in the non-image area (unexposed area). (The ground is not visible.)
- Oxime A 2- (O-benzoyloxime) -1- [4- (phenylthio) phenyl] -1,2-octanedione (manufactured by Ciba Specialty Chemicals)
- Oxime B 1- (O-acetyloxime) -1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone (manufactured by Ciba Specialty Chemicals)
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Abstract
Description
また、顔料分散法として、アルカリ可溶性樹脂、多官能性モノマー、光重合開始剤、及び多官能性エポキシ化合物(低分子又は高分子化合物)を含むカラーフィルタ用感放射線性組成物が開示されている(例えば、特開平11-231124号公報参照)。
更に、顔料、バインダー、及びエポキシモノマーを含有するカラーフィルタ用熱硬化性インキ組成物が開示されている(例えば、特開2001-350012号公報参照)。
一般にピクセルサイズが小さくなるほど、高解像性を達成することが困難になることが知られている。従来技術では、2μm以下のピクセルサイズのパターンで現像する場合、特にBayerパターンを形成する場合には現像残膜や残渣が問題となり、更にはパターンの矩形性を得ることも困難であった。
本発明は、上記問題に鑑みてなされたものであり、ピクセルサイズが微細になっても、現像残膜、残渣がない良好なパターン形状の形成が可能な染料含有ネガ型硬化性組成物、該組成物を用いてなるカラーフィルタ及びカラーフィルタの製造方法、並びに色再現性に優れた固体撮像素子を提供することを目的とする。
(A)有機溶剤可溶性染料と、(B)光重合開始剤と、(C)重合性化合物と、(D)下記一般式(1)で表される構造を側鎖に有するアミノ基含有アルカリ可溶性樹脂と、(E)有機溶剤と、を少なくとも含む染料含有ネガ型硬化性組成物。
前記(D)アミノ基含有アルカリ可溶性樹脂が下記一般式(2)で表される繰り返し単位を有する高分子化合物である上記<1>に記載の染料含有ネガ型硬化性組成物。
<3>
前記(D)アミノ基含有アルカリ可溶性樹脂の重量平均分子量が3,000~100,000であり、かつ酸価が10~200である上記<1>又は<2>に記載の染料含有ネガ型硬化性組成物。
<4>
前記(D)アミノ基含有アルカリ可溶性樹脂のアミノ価が5~200mgKOH/gである上記<1>~<3>のいずれか1項に記載の染料含有ネガ型硬化性組成物。
<5>
前記(D)アミノ基含有アルカリ可溶性樹脂の酸価が30~200mgKOH/gである上記<3>又は<4>に記載の染料含有ネガ型硬化性組成物。
<6>
前記(A)有機溶剤可溶性染料が、酸性染料であることを特徴とする上記<1>~<5>のいずれか1項に記載の染料含有ネガ型硬化性組成物。
<7>
前記(A)有機溶剤可溶性染料の含有量が、全固形分に対して40質量%以上であることを特徴とする上記<1>~<6>のいずれか1項に記載の染料含有ネガ型硬化性組成物。
<8>
前記(B)光重合開始剤が、オキシム系化合物であることを特徴とする上記<1>~<7>のいずれか1項に記載の染料含有ネガ型硬化性組成物。
<9>
固体撮像素子用カラーフィルタの形成に用いられることを特徴とする上記<1>~<8>のいずれか1項に記載の染料含有ネガ型硬化性組成物。
<10>
上記<1>~<9>のいずれか1項に記載の染料含有ネガ型硬化性組成物を用いてなるカラーフィルタ。
<11>
上記<1>~<9>のいずれか1項に記載の染料含有ネガ型硬化性組成物を支持体上に塗布して染料含有ネガ型硬化性組成物層を形成する工程と、前記染料含有ネガ型硬化性組成物層を、マスクを通して露光し、現像して前記支持体上にパターンを形成する工程を有するカラーフィルタの製造方法。
<12>
上記<10>に記載のカラーフィルタを備えた固体撮像素子。
本発明の染料含有ネガ型硬化性組成物は、(A)有機溶剤可溶性染料と、(B)光重合開始剤と、(C)光重合性化合物と、下記一般式(1)で表される構造を側鎖に有する(D)アミノ基含有アルカリ可溶性樹脂と、(E)有機溶剤と、を少なくとも含み、必要に応じて、更にアルカリ可溶性バインダー、架橋剤等の他の成分を含んでいてもよい。
以下、本発明の染料含有ネガ型硬化性組成物を構成する各成分について詳述する。
本発明の染料含有ネガ型硬化性組成物は、有機溶剤可溶性染料の少なくとも1種を含有する。
本発明における有機溶剤可溶性染料はその誘導体も含むものとする。
本発明において、有機溶剤可溶性染料は、特に制限なく使用することができ、例えば、従来カラーフィルタ用として公知の染料などの中から選択することができる。
本発明の構成において、染料として有機溶剤可溶性の酸性染料を用いることにより、パターン形成後の高温ベーク処理による熱ダレ(heat sag)の発生を効果的に抑制することができ、更に塗布特性(塗布面内均一性)を良化することができる点で好ましい。
前記公知の染料としては、例えば、特開昭64-90403号公報、特開昭64-91102号公報、特開平1-94301号公報、特開平6-11614号公報、特登2592207号、米国特許第4,808,501号明細書、米国特許第5,667,920号明細書、米国特許第5,059,500号明細書、特開平5-333207号公報、特開平6-35183号公報、特開平6-51115号公報、特開平6-194828号公報等に記載の色素が挙げられる。
本発明においては、前記有機溶剤可溶性染料として前記有機溶剤可溶性酸性染料のほか、本発明の効果を損なわない範囲で、直接染料、塩基性染料、媒染染料、酸性媒染染料、アゾイック染料、分散染料、油溶染料、食品染料、及び/又はこれらの誘導体等を使用することもできる。
酸性染料は、スルホン酸やカルボン酸、フェノール性水酸基等の酸性基を有する色素であれば、特に限定されないが、その中でも、カルボン酸を有する色素であることが本発明の効果の観点から好ましい。
また、酸性染料は、有機溶剤や現像時に用いる現像液に対する溶解性、塩基性化合物との塩形成性、吸光度、硬化性組成物中の他の成分との相互作用、耐光性、耐熱性等の必要とされる性能の全てを考慮して選択されることが好ましい。
acid alizarin violet N;
acid black 1,2,24,48;
acid blue 1,7,9,15,18,23,25,27,29,40,42,45,51,62,70,74,80,83,86,87,90,92,96,103,112,113,120,129,138,147,150,158,171,182,192,210,242,243,256,259,267,278,280,285,290,296,315,324:1,335,340;
acid chrome violet K;
acid Fuchsin;
acid green 1,3,5,9,16,25,27,50,58,63,65,80,104,105,106,109;
acid orange 6,7,8,10,12,26,50,51,52,56,62、63,64、74,75、94、95,107,108,169,173;
acid violet 6B,7,9,17,19;
acid yellow 1,3,7,9,11,17,23,25,29,34,36,38,40、42,54,65,72,73,76,79,98,99,111,112,113,114,116,119,123,128,134,135,138,139,140,144,150、155,157,160,161,163,168,169,172,177,178,179,184,190,193,196,197,199,202,203,204,205,207,212,214,220,221,228,230,232,235,238,240,242,243,251;
Direct Orange 34,39,41,46,50,52,56,57,61,64,65,68,70,96,97,106,107;
Direct Red 79,82,83,84,91,92,96,97,98,99,105,106,107,172,173,176,177,179,181,182,184,204,207,211,213,218,220,221,222,232,233,234,241,243,246,250;
Direct Violet 47,52,54,59,60,65,66,79,80,81,82,84,89,90,93,95,96,103,104;
Direct Green 25,27,31,32,34,37,63,65,66,67,68,69,72,77,79,82;
Mordant Orange 3,4,5,8,12,13,14,20,21,23,24,28,29,32,34,35,36,37,42,43,47,48;
Mordant Red 1,2,3,4,9,11,12,14,17,18,19,22,23,24,25,26,30,32,33,36,37,38,39,41,43,45,46,48,53,56,63,71,74,85,86,88,90,94,95;
Mordant Violet 2,4,5,7,14,22,24,30,31,32,37,40,41,44,45,47,48,53,58;
Mordant Blue 2,3,7,8,9,12,13,15,16,19,20,21,22,23,24,26,30,31,32,39,40,41,43,44,48,49,53,61,74,77,83,84;
Mordant Green 1,3,4,5,10,15,19,26,29,33,34,35,41,43,53;
Food Yellow 3;
及びこれらの染料の誘導体が挙げられる。
acid black 24;
acid blue 23,25,29,62,80,86,87,92,138,158,182,243,324:1;
acid orange 8,51,56,63,74;
acid red 1,4,8,34,37,42,52,57,80,87,97,114,143,145,151,183,217,249;
acid violet 7;
acid yellow 17,23,25,29,34,42,72,76,99,111,112,114,116,134,155,169,172,184,220,228,230,232,243;
acid Green 25;
などの染料及びこれらの染料の誘導体が好ましい。
このような好ましい有機溶剤可溶性酸性染料の組合わせとしては、例えば、Acid Yellow 23とAcid Red 87との組み合わせ(質量比1:1)、Valifast Yellow 1101とAcid Red 57との組み合わせ(質量比2:3)、Direct Yellow 33とDirect Green 27との組み合わせ(質量比2:3)、Mordant Violet 40とDirect Green 69との組み合わせ(質量比1:2)等が挙げられる。
中でも、パターニング後(露光・現像等後)の硬化パターンの熱処理に伴う熱ダレをより抑制し、硬化パターンの基板との密着性及び現像処理後の残色率の向上効果をより高める観点から、有機溶剤可溶性染料の含有量は、染料含有ネガ型硬化性組成物全体に対して40~90質量%の範囲がより好ましく、更に好ましくは50~80質量%の範囲であり、特に好ましくは55~70質量%の範囲である。
また、2種以上の有機溶剤可溶性染料を混合して調色する場合には、最も少量添加する有機溶剤可溶性染料の量は、色相の点で、有機溶剤可溶性染料の全量を100%としたときの少なくとも10%以上であることが好ましい。
本発明の染料含有ネガ型硬化性組成物は、光重合開始剤の少なくとも1種を含有する。光重合開始剤は、後述の(C)重合性化合物に作用して組成物を硬化させる。本発明における光重合開始剤としては、少なくとも(C)重合性化合物を重合させ得るものであれば、特に制限はなく、特性、開始効率、吸収波長、入手性、コスト等の観点で選ばれるのが好ましい。
その具体例としては、ベンゾイン、ベンゾインメチルエーテル、9-フルオレノン、2-クロロ-9-フルオレノン、2-メチル-9-フルオレノン、9-アントロン、2-ブロモ-9-アントロン、2-エチル-9-アントロン、9,10-アントラキノン、2-エチル-9,10-アントラキノン、2-t-ブチル-9,10-アントラキノン、2,6-ジクロロ-9,10-アントラキノン、キサントン、2-メチルキサントン、2-メトキシキサントン、2-エトキシキサントン、チオキサントン、2,4-ジエチルチオキサントン、アクリドン、10-ブチル-2-クロロアクリドン、ベンジル、ジベンジルアセトン、p-(ジメチルアミノ)フェニルスチリルケトン、p-(ジメチルアミノ)フェニル-p-メチルスチリルケトン、ベンゾフェノン、p-(ジメチルアミノ)ベンゾフェノン(またはミヒラーケトン)、p-(ジエチルアミノ)ベンゾフェノン、ベンゾアントロン等や特公昭51-48516号公報記載のベンゾチアゾール系化合物等や、長瀬産業(株)製のチヌビン1130、同400等が挙げられる。
具体的には、米国特許第2,367,660号明細書に開示されているビシナールポリケタルドニル化合物、米国特許第2,367,661号および第2,367,670号明細書に開示されているα-カルボニル化合物、米国特許第2,448,828号明細書に開示されているアシロインエーテル、米国特許第2,722,512号明細書に開示されているα-炭化水素で置換された芳香族アシロイン化合物、米国特許第3,046,127号および第2,951,758号明細書に開示されている多核キノン化合物、米国特許第3,549,367号明細書に開示されているトリアリールイミダゾリルダイマー/p-アミノフェニルケトンの組合せ、特公昭51-48516号公報に開示されているベンゾチアゾール系化合物/トリハロメチール-s-トリアジン系化合物、等を挙げることができる。
重合性化合物としては、少なくとも1つの付加重合可能なエチレン性二重結合を有し、常圧下で100℃以上の沸点を持つ化合物が好ましい。前記重合性化合物は、本発明における光重合開始剤等と共に用いることにより、光重合性層(染料含有ネガ型硬化性組成物)をネガ型に構成することができる。
上記の中でも、重合性化合物は、多官能(メタ)アクリル化合物であることが好ましい。
本発明における重合性化合物は単独で用いても、また2種以上を併用してもよい。
前記含有量が0.1質量%以上であると露光部の硬化性が向上し、90質量%以下とすると未露光部の溶出性が向上する点で好ましい。
本発明における(D)アミノ基含有アルカリ可溶性樹脂は下記一般式(1)で表される構造を側鎖に有する高分子化合物(以下、特定高分子化合物ともいう。)であり、該構造を側鎖に有するアルカリ可溶性樹脂であれば、特に限定されるものではない。
上記1価の有機基としては、アルキル基、アルケニル基、アルキニル基、アリール基、又はヘテロ環基が好ましく、それぞれ置換基を有していてもよい。
前記アルケニル基は、置換可能であり、該置換基としては、前記置換アルキル基における置換基として示したものを挙げることができる。
アルケニル基の具体例としては、ビニル基、1-プロペニル基、1-ブテニル基、シンナミル基、2-クロロ-1-エテニル基、等が挙げられる。
前記アルキニル基は置換可能であり、該置換基としては、前記置換アルキル基における置換基として示したものを挙げることができる。
アルキニル基の具体例としては、エチニル基、1-プロピニル基、1-ブチニル基、トリメチルシリルエチニル基等が挙げられる。
前記アリール基は置換可能であり、該置換基としては、前記置換アルキル基における置換基として示したものを挙げることができる。
アリール基の具体例としては、トリル基、キシリル基、メシチル基、クメニル基、クロロフェニル基、ブロモフェニル基、クロロメチルフェニル基、ヒドロキシフェニル基、メトキシフェニル基、エトキシフェニル基、フェノキシフェニル基、アセトキシフェニル基、ベンゾイロキシフェニル基、メチルチオフェニル基、フェニルチオフェニル基、カルボキシフェニル基、メトキシカルボニルフェニル基、エトキシカルボニルフェニル基、フェノキシカルボニルフェニル基、シアノフェニル基、スルホフェニル基、スルホナトフェニル基、ホスホノフェニル基、ホスホナトフェニル基等をあげることができる。
前記へテロ環基は、置換可能であり、該置換基としては、前記置換アルキル基における置換基として示したものを挙げることができる。
R3、R4、R5及びR6のアルキル基としては、炭素数1~12のアルキル基が好ましく、炭素数1~8のアルキル基がより好ましく、炭素数1~4のアルキル基が特に好ましい。
R3、R4、R5及びR6のアルキル基が置換基を有する場合、該置換基としては、例えば、ヒドロキシ基、アルコキシ基(好ましくは炭素数1~5、より好ましくは炭素数1~3がより好ましい。)、メトキシ基、エトキシ基、シクロヘキシロキシ基等が挙げられる。
R3、R4、R5及びR6の好ましいアルキル基として具体的には、例えば、メチル基、エチル基、プロピル基、n-ブチル基、i-ブチル基、t-ブチル基、n-ヘキシル基、シクロヘキシル基、2-ヒドロキシエチル基、3-ヒドロキシプロピル基、2-ヒドロキシプロピル基、2-メトキシエチル基が挙げられる。
R3、R4及びR6としては水素原子が、R5としては水素原子又はメチル基が最も好ましい。
Lで表されるアルキレン基は、ヘテロ原子(例えば、酸素原子、窒素原子、又は硫黄原子)を介して2以上連結したものであってもよい。
Lで表される好ましいアルキレン基として具体的には、例えば、メチレン基、エチレン基、プロピレン基、トリメチレン基、テトラメチレン基が挙げられる。
Lで表される好ましいアルキレン基が置換基を有する場合、該置換基としては、例えば、ヒドロキシ基、等が挙げられる。
Lで表される2価の連結基としては、上記のアルキレン基の末端において、-O-、-S-、*-C(=O)O-、*-CONH-、*-C(=O)S-、*-S-C(=O)-、-NHCONH-、*-NHC(=O)O-、*-NHC(=O)S-、*-S-NHC(=O)-、*-OC(=O)-、*-OCONH-、及び*-NHCO-から選ばれるヘテロ原子又はヘテロ原子を含む部分構造を有し、該ヘテロ原子又はヘテロ原子を含む部分構造を介して一般式(2)のアミノ基と連結するものであってもよい。*は主鎖側に連結する結合手を表す。
本発明において、前記一般式(3)で表される単量体の好ましい具体例を以下に挙げるが、本発明はこれらに制限されるものではない。
前記アミノ基の含有量としてのアミノ価が5mgKOH/g以上であることが非画像部の染料の現像促進(残渣、残膜)という点で好ましく、200mgKOH/g以下であるとアミノ基間の凝集が強くなるのを抑え、染料の凝集が生じ析出物と成り難いことから好ましい。
即ち、非画像部の染料の現像を促進するためには、前記アミノ価が上記範囲であることが好ましい。
(D)アミノ基含有アルカリ可溶性樹脂がさらに酸基を有する単量体に由来する構成単位を含むことは、感光性組成物に適用した場合において、未露光部の現像除去性に優れるものとなる点で好ましい。
本発明における(D)アミノ基含有アルカリ可溶性樹脂の酸価は、好ましくは10~200mgKOH/gであり、より好ましくは30~200mgKOH/gであり、特に、好ましくは50~180mgKOH/gである。
酸価は10mgKOH/g以上であることが現像液中での析出物の生成抑制という点で好ましい。また、酸価が200mgKOH/g以下であると酸基間の凝集が強くなり難く、染料の凝集が生じて凝集物となり難く好ましい。即ち、非画像部の染料の現像を促進し、現像除去性を高めるためには、酸基を有する単量体に由来する構成単位の含有量は上記範囲であることが好ましい。
ここで使用可能なビニルモノマーとしては、特に制限されないが、例えば、(メタ)アクリル酸エステル類、クロトン酸エステル類、ビニルエステル類、マレイン酸ジエステル類、フマル酸ジエステル類、イタコン酸ジエステル類、(メタ)アクリルアミド類、ビニルエーテル類、ビニルアルコールのエステル類、スチレン類、(メタ)アクリロニトリルなどが好ましい。このようなビニルモノマーの具体例としては、例えば以下のような化合物が挙げられる。なお、本明細書において「アクリル、メタクリル」のいずれか或いは双方を示す場合「(メタ)アクリル」と記載することがある。
ビニルエステル類の例としては、ビニルアセテート、ビニルプロピオネート、ビニルブチレート、ビニルメトキシアセテート、及び安息香酸ビニルなどが挙げられる。
マレイン酸ジエステル類の例としては、マレイン酸ジメチル、マレイン酸ジエチル、及びマレイン酸ジブチルなどが挙げられる。
フマル酸ジエステル類の例としては、フマル酸ジメチル、フマル酸ジエチル、及びフマル酸ジブチルなどが挙げられる。
イタコン酸ジエステル類の例としては、イタコン酸ジメチル、イタコン酸ジエチル、及びイタコン酸ジブチルなどが挙げられる。
ビニルエーテル類の例としては、メチルビニルエーテル、ブチルビニルエーテル、ヘキシルビニルエーテル、及びメトキシエチルビニルエーテルなどが挙げられる。
ビニルアルコールのエステル類の例としては、ビニルアクリレート、ビニルメタクリレートなどが挙げられる。
該ラジカル重合の際、ラジカル重合開始剤を使用することができ、また、さらに連鎖移動剤(例、2-メルカプトエタノールおよびドデシルメルカプタン)を使用することができる。
本発明の染料含有ネガ型硬化性組成物は、有機溶剤の少なくとも1種を含有する。有機溶剤は、各成分の溶解性や染料含有ネガ型硬化性組成物の塗布性を満足できるものであれば、基本的には特に制限はなく、特に染料、バインダーの溶解性、塗布性、安全性を考慮して選ばれることが好ましい。
本発明の染料含有ネガ型硬化性組成物は、上記の成分に加えて、本発明の効果を損なわない範囲で、さらに上記(D)アミノ基含有アルカリ可溶性樹脂以外のアルカリ可溶性バインダー、架橋剤などの他の成分を含んでいてもよい。
アルカリ可溶性バインダーは、アルカリ可溶性を有すること以外は特に限定はなく、好ましくは耐熱性、現像性、入手性等の観点から選択することができる。
本発明においては、補足的に架橋剤を用いて更に高度に硬化させた膜を得ることも可能である。以下、架橋剤について説明する。
架橋剤としては、架橋反応により膜硬化を行なえるものであれば、特に限定はなく、例えば、(a)分子量が1000未満のエポキシ化合物(前述の(D)に含まれるエポキシ樹脂以外の化合物)、(b)メチロール基、アルコキシメチル基、及びアシロキシメチル基から選ばれる少なくとも一つの置換基で置換された、メラミン化合物、グアナミン化合物、グリコールウリル化合物又はウレア化合物、(c)メチロール基、アルコキシメチル基、及びアシロキシメチル基から選ばれる少なくとも一つの置換基で置換された、フェノール化合物、ナフトール化合物又はヒドロキシアントラセン化合物、が挙げられる。中でも、多官能エポキシ化合物が好ましい。
以下、前記(b)のメラミン化合物、グアナミン化合物、グリコールウリル化合物及びウレア化合物を総じて、(b)に係る化合物(メチロール基含有化合物、アルコキシメチル基含有化合物、又はアシロキシメチル基含有化合物)という。
前記メラミン化合物として、例えば、ヘキサメチロールメラミン、ヘキサメトキシメチルメラミン、ヘキサメチロールメラミンのメチロール基の1~5個がメトキシメチル化した化合物又はその混合物、ヘキサメトキシエチルメラミン、ヘキサアシロキシメチルメラミン、ヘキサメチロールメラミンのメチロール基の1~5個がアシロキシメチル化した化合物又はその混合物、などが挙げられる。
これら(b)に係る化合物は、単独で使用してもよく、複数種を組み合わせて使用してもよい。
前記ナフトール化合物においても、OH基のオルト位以外は、未置換であっても置換基を有していてもよい。
前記(c)に係るアルコキシメチル基含有化合物は、(c)に係るメチロール基含有化合物をアルコール中で塩酸、硫酸、硝酸、メタンスルホン酸等の酸触媒の存在下で加熱することにより得られる。
前記(c)に係るアシロキシメチル基含有化合物は、(c)に係るメチロール基含有化合物を塩基性触媒の存在下アシルクロリドと反応させることにより得られる。
また、アシロキシメチル基含有化合物として、例えば、前記メチロール基含有化合物のメチロール基を、一部又は全部アシロキシメチル化した化合物等が挙げられる。
これら(c)に係る化合物は、単独で使用してもよく、複数種を組み合わせて使用してもよい。
本発明の染料含有ネガ型硬化性組成物には、前記成分のほか、更に熱重合防止剤を加えておくことができる。例えば、ハイドロキノン、p-メトキシフェノール、ジ-t-ブチル-p-クレゾール、ピロガロール、t-ブチルカテコール、ベンゾキノン、4,4'-チオビス(3-メチル-6-t-ブチルフェノール)、2,2'-メチレンビス(4-メチル-6-t-ブチルフェノール)、2-メルカプトベンゾイミダゾール等が有用である。
本発明の染料含有ネガ型硬化性組成物には、必要に応じて、各種添加物、例えば充填剤、前記アルカリ可溶性バインダー以外の高分子化合物、界面活性剤、密着促進剤、酸化防止剤、紫外線吸収剤、凝集防止剤等を配合することができる。
具体的には、例えば、ギ酸、酢酸、プロピオン酸、酪酸、吉草酸、ピバル酸、カプロン酸、ジエチル酢酸、エナント酸、カプリル酸等の脂肪族モノカルボン酸;シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、ブラシル酸、メチルマロン酸、エチルマロン酸、ジメチルマロン酸、メチルコハク酸、テトラメチルコハク酸、シトラコン酸等の脂肪族ジカルボン酸;トリカルバリル酸、アコニット酸、カンホロン酸等の脂肪族トリカルボン酸;安息香酸、トルイル酸、クミン酸、ヘメリト酸、メシチレン酸等の芳香族モノカルボン酸;フタル酸、イソフタル酸、テレフタル酸、トリメリト酸、トリメシン酸、メロファン酸、ピロメリト酸等の芳香族ポリカルボン酸;フェニル酢酸、ヒドロアトロパ酸、ヒドロケイ皮酸、マンデル酸、フェニルコハク酸、アトロパ酸、ケイ皮酸、ケイ皮酸メチル、ケイ皮酸ベンジル、シンナミリデン酢酸、クマル酸、ウンベル酸等のその他のカルボン酸が挙げられる。
本発明の染料含有ネガ型硬化性組成物は、着色パターンが微少サイズで薄膜に形成され、しかも良好な矩形の断面プロファイルが要求される固体撮像素子用のカラーフィルタの形成に特に好適である。具体的には、カラーフィルタを構成する画素パターンサイズ(基板法線方向からみた画素パターンの辺長)が2μm以下である場合(例えば0.5~2.0μm)は、顔料では粗大粒子の影響で色ムラが発生しやすく、染料では、染料自身の現像液中への溶出で色抜けが生じたり、染料量が増大するとフォトリソ性に寄与する成分の相対量が減ってパターニング後のポストベーク等の熱処理で熱ダレを起こしたりし易い。これは、特に画素パターンサイズが1.0~1.7μm(更に1.2~1.5μm)の場合に顕著になる。また、厚み1μm以下の薄膜である場合、着色剤を除くフォトリソ性に寄与する成分の膜中の量が相対的に減少し、着色剤量の増大で他成分の量は更に減少して、低感度化し、低露光量領域ではパターンが剥離しやすくなり、前記同様にパターニング後のポストベーク等の熱処理で熱ダレを起こし易い。これは、特に膜厚が0.005μm~0.9μm(更に0.1μm~0.7μm)の場合に顕著になる。
このような固体撮像素子用のカラーフィルタを形成する場合において、特に、本発明の染料含有ネガ型硬化性組成物を用いることにより効果的に、熱ダレによる順テーパー化が抑えられ、矩形に近いパターンが得られる。更には、高い感度が得られると共に、形成されたパターンの基板等との密着性も向上し、剥がれの発生、ひいては画像欠陥の発生が防止される。
特に固体撮像素子用のカラーフィルタの場合には、例えば厚み1μm以下の薄膜でも高い色濃度を有し、熱による順テーパー状変形の少ない矩形に近い良好な断面プロファイルを有するパターン画像を形成することができる。加えて更に、形成されたパターンの基板等への密着性が向上し、剥がれによる画像欠陥の発生も抑えられる。
次に、本発明のカラーフィルタについて、その製造方法を通じて詳述する。
本発明のカラーフィルタの製造方法においては、既述の本発明の染料含有ネガ型硬化性組成物が用いられる。
本発明の染料含有ネガ型硬化性組成物を用いることで、現像処理後に高い残色率が得られる。また、本発明の染料含有ネガ型硬化性組成物を用いることで、染料と(D)アミノ基含有アルカリ可溶性樹脂との相互作用により染料の熱流動性を抑えられるため耐熱性を具えるので、熱処理時の熱ダレの影響で受ける変形の少ない、形状良好で高解像度の微細なパターンで構成されたカラーフィルタを作製することができる。更には、感度良く硬化パターンの形成が可能であり、支持体等との密着性が向上し、剥がれ(画素欠陥)の発生を抑えたカラーフィルタが得られる。特に、本発明の染料含有ネガ型硬化性組成物における前記有機溶剤可溶性染料を高濃度で用い、更に前記(D)アミノ基含有アルカリ可溶性樹脂を用いたときに上記効果は顕著となる。
具体的には、本発明の染料含有ネガ型硬化性組成物を支持体上に回転塗布、流延塗布、ロール塗布等の塗布方法により塗布して染料含有ネガ型硬化性組成物層(感放射線性組成物層)を形成し、該層を所定のマスクパターンを介して露光し、現像液で現像することでネガ型の着色パターンを形成することによって好適に作製することができる(画像形成工程)。また、必要により、形成された着色パターンを加熱及び/又は露光により硬化する硬化工程を含んでいてもよい。
また、ステッパー露光に用いる露光装置としては、例えば、i線ステッパー(商品名:FPA-3000i5+、キャノン(株)製)等を用いることができる。
また、これらの支持体上には、必要により、上部の層との密着改良、物質の拡散防止あるいは基板表面の平坦化のために下塗り層を設けてもよい。
なお、このようなアルカリ性水溶液からなる現像液を使用した場合は、一般に、現像後水で洗浄する。
固体撮像素子の構成としては、本発明のカラーフィルタを備え、固体撮像素子として機能する構成であれば特に限定はないが、例えば、以下のような構成が挙げられる。
支持体上に、CCDイメージセンサー(固体撮像素子)の受光エリアを構成する複数のフォトダイオード及びポリシリコン等からなる転送電極を有し、前記フォトダイオード及び前記転送電極上にフォトダイオードの受光部のみ開口したタングステン等からなる遮光膜を有し、遮光膜上に遮光膜全面及びフォトダイオード受光部を覆うように形成された窒化シリコン等からなるデバイス保護膜を有し、前記デバイス保護膜上に、本発明のカラーフィルタを有する構成である。
さらに、前記デバイス保護層上であってカラーフィルタの下(支持体に近い側)に集光手段(例えばマイクロレンズ等。以下同様。)を有する構成や、カラーフィルタ上に集光手段を有する構成等であってもよい。
〔合成例1〕
<特定高分子化合物P-1の合成>
一般式(3)で表される単量体A-1 7.0g、BzMA 77.0g、MAA 16.0g、および1-メトキシ-2-プロパノール 150.0gを、窒素置換した三つ口フラスコに導入し、攪拌機(新東科学(株):スリーワンモータ)にて攪拌し、窒素をフラスコ内に流しながら加熱して80℃まで昇温した。これに2,2-アゾビス(2,4-ジメチルバレロニトリル)(和光純薬(株)製V-65)を4.61g加え、80℃にて2時間加熱攪拌を行った。2時間後、さらにV-65を4.61g加え、3時加熱攪拌の後、特定高分子化合物P-1の40質量%溶液を得た。
得られた特定高分子化合物の重量平均分子量をポリスチレンを標準物質としたゲルパーミエーションクロマトグラフィー法(GPC)により測定した結果、1.5万であった。
また、水酸化ナトリウムを用いた滴定から、固形分あたりの酸価は、102mgKOH/g、塩酸を用いた滴定から、固形分あたりのアミノ価は、26mgKOH/gであった。
合成例1において、合成例1において用いたモノマーの種類と量を、表1に記載のモノマーの種類と量に変更した以外は同様に行なって、特定高分子化合物P-2~P-19の40質量%溶液を得た。得られた特定高分子化合物の重量平均分子量等を合成例1と同様にして測定し、結果を表1に示した。
合成例1において、合成例1において用いたモノマーの種類と量を、表1に記載のモノマーの種類と量に変更した以外は同様に行なって、高分子化合物C-1及びC-2の40質量%溶液を得た。得られた高分子化合物の重量平均分子量等を合成例1と同様にして測定し、結果を表1に示した。
1)染料含有ネガ型硬化性組成物の調製
下記に示す組成を混合して溶解し、本発明の染料含有ネガ型硬化性組成物を調製した。
〔組成〕
・(E)有機溶剤(シクロヘキサノン)
26g
・(A)有機溶剤可溶性酸性染料(Varifast Yellow 1101)
4.0g
・(B)光重合開始剤(オキシムA、下記参照)
1.0g
・(C)重合性モノマー(モノマーA、下記参照)
3.0g
・(D)アミノ基含有アルカリ可溶性樹脂(特定高分子化合物P-1)(上記参照)
2.0g
レジストCT-4000L溶液(富士フイルムエレクトロニクスマテリアルズ(株)製)を、シリコンウェハー基板上に膜厚0.1μmになるようにスピンコーターを用いて塗布し、220℃で1時間加熱乾燥させて硬化膜(下塗り層)を形成した。
前記1)で得られた染料含有ネガ型硬化性組成物を、上記2)で得られた下塗り層付シリコンウェハー基板の下塗り層の上に膜厚が1μmになるようにスピンコーターを用いて塗布し、100℃で120秒間プリベークした。
次いで、i線縮小投影露光装置を使用して塗布膜に365nmの波長で縦2μm×横2μmのマスクを通して露光量を変化させて照射した。照射後、100%CD-2060(富士フイルムエレクトロニクスマテリアルズ(株)製)現像液を用いて、23℃で60秒間の条件で現像した。次いで、流水で20秒間リンスした後、スピン乾燥させてパターン像が形成されたカラーフィルタを得た。
パターン像の形状は、光学顕微鏡及びSEM写真観察により通常の方法で確認した。このとき、縦2μm×横2μmの画素パターンの幅と、該画素パターン間のスペースの幅との比が1:1になる露光量を適正露光量とした。
実施例1において、染料含有ネガ型硬化性組成物に含まれる各組成を下記表2、3に示す組成に変更した以外は、実施例1と同様にして行い同様に評価した。
実施例1において、染料含有ネガ型硬化性組成物に含まれる各組成を下記表4に示す組成に変更した以外は、実施例1と同様にして行い同様に評価した。
(1)現像残色率
上記3)において、現像工程前後の膜吸光度を分光測定装置(MCPD-3000:大塚電子(株)製)を用いて測定し、下記計算式により現像残色率を計算して比較評価した。
現像残色率(%)=現像後の膜吸光度/現像前の膜吸光度×100
上記3)において、適正露光量時に形成された画素パターンについて、200℃で300秒間ポストベークした後、ポストベーク後のパターンを走査型電子顕微鏡(SEM)の撮影画像により観察し、パターン断面(シリコン基板の法線方向と平行であってパターンの一辺と平行な平面で切断したときの切断面)の形状を下記の評価基準にしたがって評価した。結果を下記表2~4に示す。
A:断面のパターンプロファイルは、図1(A)のように良好な矩形であった。
B:断面のパターンプロファイルは、図1(B)のように基板非接触の角(カド)がやや丸みを帯びていたが、実用上許容できる範囲であった。
C:断面のパターンプロファイルは、図1(C)のように基板非接触の角(カド)がとれて丸みができ、ラウンドトップ(頭が丸い)形状であった。
D:断面のパターンプロファイルは、図1(D)のようにラウンドトップ形状かつパターン下部が広がる形状であった。
E:断面のパターンプロファイルは、図1(E)のように完全にラウンドトップ形状であった。
上記3)において、適正露光量時に形成された画素パターンについて、現像後のパターンを走査型電子顕微鏡(SEM)の撮影画像により非画像部(未露光部)の現像残渣の有無を観察した。
A:非画像部(未露光部)に現像残渣が全く見えない。
B:非画像部(未露光部)に現像残渣が見えないが、画像部(露光部)と非画像部(未露光部)の境界部にごくわずかに現像残渣が確認できる。
C:非画像部(未露光部)に現像残渣がわずかに確認できる。
D:非画像部(未露光部)に点状の現像残渣がはっきりと確認できる。
E:非画像部(未露光部)に現像残渣が残膜として残っている。(下地が見えていない。)
前記実施例及び比較例で得られた染料含有ネガ型硬化性組成物を、8インチウェハー上に膜厚が1.0μmになるようにスピンコーターで塗布し、100℃で120秒間プリベークした後、膜面内でランダムに12点において膜厚測定し、その平均から一番大きいズレを算出した。値が小さいほうが良好である。
また、膜厚測定方法は接触式膜厚計、非接触式膜厚計いずれの方法でも可能だが、本実施例では、ウェハー上の膜を削り取り、ウェハーと膜表面との距離を接触式段差測定器(Veeco社製DEKTAK6)にて測定した。結果を下記表2~4に示す。
・加重:10mg
・測定速度:M-Range
・オキシムA:2-(O-ベンゾイルオキシム)-1-[4-(フェニルチオ)フェニル]-1,2-オクタンジオン(チバ・スペシャルティ・ケミカルズ(株)製)
・オキシムB:1-(O-アセチルオキシム)-1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]エタノン(チバ・スペシャルティ・ケミカルズ(株)製)
一方、本発明の構成を有する染料含有ネガ型硬化性組成物を用いた実施例は、パターンプロファイルが良好で、塗布面内均一性(塗布特性)においても優れていることが判った。
Claims (12)
- 前記(D)アミノ基含有アルカリ可溶性樹脂の重量平均分子量が3,000~100,000であり、かつ酸価が10~200mgKOH/gである請求項1に記載の染料含有ネガ型硬化性組成物。
- 前記(D)アミノ基含有アルカリ可溶性樹脂のアミノ価が5~200mgKOH/gである請求項1に記載の染料含有ネガ型硬化性組成物。
- 前記(D)アミノ基含有アルカリ可溶性樹脂の酸価が30~200mgKOH/gである請求項3に記載の染料含有ネガ型硬化性組成物。
- 前記(A)有機溶剤可溶性染料が、酸性染料であることを特徴とする請求項1に記載の染料含有ネガ型硬化性組成物。
- 前記(A)有機溶剤可溶性染料の含有量が、全固形分に対して40質量%以上であることを特徴とする請求項1に記載の染料含有ネガ型硬化性組成物。
- 前記(B)光重合開始剤が、オキシム系化合物であることを特徴とする請求項1に記載の染料含有ネガ型硬化性組成物。
- 固体撮像素子用カラーフィルタの形成に用いられることを特徴とする請求項1に記載の染料含有ネガ型硬化性組成物。
- 請求項1に記載の染料含有ネガ型硬化性組成物を用いてなるカラーフィルタ。
- 請求項1に記載の染料含有ネガ型硬化性組成物を支持体上に塗布して染料含有ネガ型硬化性組成物層を形成する工程と、前記染料含有ネガ型硬化性組成物層を、マスクを通して露光し、現像して前記支持体上にパターンを形成する工程を有するカラーフィルタの製造方法。
- 請求項10に記載のカラーフィルタを備えた固体撮像素子。
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| JPH0194301A (ja) | 1987-10-06 | 1989-04-13 | Konica Corp | カラーモザイクフィルター |
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| JPH0651115A (ja) | 1992-07-31 | 1994-02-25 | Sumitomo Chem Co Ltd | カラーフィルター用色素 |
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| JPH1082908A (ja) * | 1996-07-01 | 1998-03-31 | Mitsubishi Chem Corp | カラーフィルター用レジスト組成物及びカラーフィルター |
| JPH11231124A (ja) | 1998-02-13 | 1999-08-27 | Jsr Corp | カラーフィルタ用感放射線性組成物 |
| JP2001350012A (ja) | 2000-06-09 | 2001-12-21 | Dainippon Printing Co Ltd | カラーフィルター用熱硬化性インキ組成物、及びカラーフィルターの製造方法 |
| JP2002258472A (ja) * | 2001-03-05 | 2002-09-11 | Nippon Kayaku Co Ltd | 着色感光性組成物 |
| JP2005202252A (ja) * | 2004-01-16 | 2005-07-28 | Dainippon Printing Co Ltd | 固体撮像素子カラーフィルター用感光性着色組成物、固体撮像素子カラーフィルター、固体撮像素子、及び固体撮像素子カラーフィルターの製造方法 |
| JP2008209765A (ja) * | 2007-02-27 | 2008-09-11 | Fujifilm Corp | 着色感光性組成物、カラーフィルター及びその製造方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5914206A (en) | 1996-07-01 | 1999-06-22 | Mitsubishi Chemical Corporation | Color filter and black resist composition |
| US5939238A (en) | 1998-06-02 | 1999-08-17 | Morton International, Inc. | Photoimageable composition having improved photoinitiator system |
| AU707217B1 (en) | 1997-12-01 | 1999-07-08 | Nichigo Morton Co., Ltd. | Photoimageable compositions |
| US7323290B2 (en) | 2002-09-30 | 2008-01-29 | Eternal Technology Corporation | Dry film photoresist |
| JP2005274966A (ja) * | 2004-03-24 | 2005-10-06 | Fuji Photo Film Co Ltd | 染料含有ネガ型硬化性組成物、カラーフィルターおよびその製造方法 |
| JP2008197285A (ja) * | 2007-02-09 | 2008-08-28 | Fujifilm Corp | カラーフィルタ用硬化性組成物 |
-
2008
- 2008-09-30 JP JP2008252601A patent/JP5393092B2/ja active Active
-
2009
- 2009-09-25 EP EP09817708.2A patent/EP2348361B1/en not_active Not-in-force
- 2009-09-25 KR KR1020117006569A patent/KR101585050B1/ko active Active
- 2009-09-25 US US13/062,281 patent/US8603708B2/en not_active Expired - Fee Related
- 2009-09-25 WO PCT/JP2009/066646 patent/WO2010038675A1/ja not_active Ceased
- 2009-09-30 TW TW098133252A patent/TWI479265B/zh active
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012212005A (ja) * | 2011-03-31 | 2012-11-01 | Toyo Ink Sc Holdings Co Ltd | カラーフィルタ用青色着色組成物、およびカラーフィルタ |
| CN113281966A (zh) * | 2016-09-02 | 2021-08-20 | 住友化学株式会社 | 着色组合物及化合物 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2348361A4 (en) | 2012-06-27 |
| JP5393092B2 (ja) | 2014-01-22 |
| KR101585050B1 (ko) | 2016-01-13 |
| US20110189598A1 (en) | 2011-08-04 |
| JP2010085553A (ja) | 2010-04-15 |
| TW201020688A (en) | 2010-06-01 |
| EP2348361A1 (en) | 2011-07-27 |
| TWI479265B (zh) | 2015-04-01 |
| KR20110059857A (ko) | 2011-06-07 |
| EP2348361B1 (en) | 2014-06-25 |
| US8603708B2 (en) | 2013-12-10 |
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