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WO2010008211A3 - Batch-type heat treatment device and heater used therein - Google Patents

Batch-type heat treatment device and heater used therein Download PDF

Info

Publication number
WO2010008211A3
WO2010008211A3 PCT/KR2009/003909 KR2009003909W WO2010008211A3 WO 2010008211 A3 WO2010008211 A3 WO 2010008211A3 KR 2009003909 W KR2009003909 W KR 2009003909W WO 2010008211 A3 WO2010008211 A3 WO 2010008211A3
Authority
WO
WIPO (PCT)
Prior art keywords
batch
substrates
treatment device
heat treatment
type heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2009/003909
Other languages
French (fr)
Korean (ko)
Other versions
WO2010008211A2 (en
Inventor
허관선
강호영
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tera Semicon Corp
Original Assignee
Tera Semicon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020080069331A external-priority patent/KR101016061B1/en
Priority claimed from KR1020080069330A external-priority patent/KR101016058B1/en
Priority claimed from KR1020080069329A external-priority patent/KR101016048B1/en
Priority claimed from KR1020080110813A external-priority patent/KR101016064B1/en
Priority claimed from KR1020080110814A external-priority patent/KR101009990B1/en
Application filed by Tera Semicon Corp filed Critical Tera Semicon Corp
Priority to CN200980122777.2A priority Critical patent/CN102067294B/en
Priority to JP2011518650A priority patent/JP5973728B2/en
Publication of WO2010008211A2 publication Critical patent/WO2010008211A2/en
Publication of WO2010008211A3 publication Critical patent/WO2010008211A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H10P72/0434—
    • H10P72/17—

Abstract

Disclosed are: a batch-type heat treatment device which can heat treat a plurality of substrates simultaneously, each of the substrate being heated by a plurality of heaters corresponding to the each substrate; and a heater used in the batch-type heat treatment device. The batch-type heat treatment device of the present invention comprises: a chamber (100) which provides a heat-treatment space for a plurality of substrates (10); a boat (108) for loading the plurality of substrates (10) therein and supporting the substrates (10); and a plurality of main heater units (120) disposed at predetermined intervals in the direction in which the substrates are stacked, each of the main heater units (120) comprising a plurality of individual main heaters (200), wherein the substrates (10) are disposed between the plurality of main heater units (120).
PCT/KR2009/003909 2008-07-16 2009-07-16 Batch-type heat treatment device and heater used therein Ceased WO2010008211A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN200980122777.2A CN102067294B (en) 2008-07-16 2009-07-16 Batch type heat treatment device and heater applicable to the heat treatment device
JP2011518650A JP5973728B2 (en) 2008-07-16 2009-07-16 Batch heat treatment apparatus and heater applied to the apparatus

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
KR1020080069331A KR101016061B1 (en) 2008-07-16 2008-07-16 Heater for heat treatment device
KR10-2008-0069329 2008-07-16
KR10-2008-0069330 2008-07-16
KR1020080069330A KR101016058B1 (en) 2008-07-16 2008-07-16 Heater for heat treatment device
KR10-2008-0069331 2008-07-16
KR1020080069329A KR101016048B1 (en) 2008-07-16 2008-07-16 Batch heat treatment equipment
KR10-2008-0110813 2008-11-10
KR10-2008-0110814 2008-11-10
KR1020080110813A KR101016064B1 (en) 2008-11-10 2008-11-10 heater
KR1020080110814A KR101009990B1 (en) 2008-11-10 2008-11-10 heater

Publications (2)

Publication Number Publication Date
WO2010008211A2 WO2010008211A2 (en) 2010-01-21
WO2010008211A3 true WO2010008211A3 (en) 2010-03-25

Family

ID=41550851

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/003909 Ceased WO2010008211A2 (en) 2008-07-16 2009-07-16 Batch-type heat treatment device and heater used therein

Country Status (4)

Country Link
JP (2) JP5973728B2 (en)
CN (3) CN105140157B (en)
TW (1) TWI508178B (en)
WO (1) WO2010008211A2 (en)

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TW201222622A (en) * 2010-04-30 2012-06-01 Tera Semicon Corp Apparatus for processing a substrate
KR101157192B1 (en) * 2010-08-31 2012-06-20 주식회사 테라세미콘 Batch type appartus for processing a substrate
KR101306751B1 (en) * 2011-04-29 2013-09-10 주식회사 테라세미콘 Holder for supporting substrate and apparatus for processing substrate using the same
KR101155813B1 (en) * 2011-08-24 2012-06-12 (주)써모니크 With graphite heater
KR101435454B1 (en) * 2012-04-27 2014-08-28 주식회사 테라세미콘 Apparatus for processing substrate
KR101982724B1 (en) * 2012-12-26 2019-05-27 주식회사 탑 엔지니어링 Thermal Treatment Device for Substrate
KR101982725B1 (en) * 2012-12-26 2019-05-27 주식회사 탑 엔지니어링 Heating Assembly for Substrate Thermal Treatment Device
KR101557037B1 (en) * 2013-08-14 2015-10-02 (주) 예스티 Heat processing apparatus for large glass substrate
KR101527158B1 (en) * 2013-10-24 2015-06-09 주식회사 테라세미콘 Batch type apparatus for processing substrate
KR101479224B1 (en) 2013-12-09 2015-01-05 포스코에너지 주식회사 Thin plate mica heater
TWI698944B (en) * 2013-12-23 2020-07-11 南韓商圓益Ｉｐｓ股份有限公司 Batch type apparatus for processing substrate
KR102117421B1 (en) * 2014-05-12 2020-06-02 주식회사 제우스 Heater fixing device and substrate heat tretment apparatus using it
KR101753376B1 (en) 2015-08-24 2017-07-04 주식회사 하이원시스 Pre-heater including 4-direction sliding doors on ceiling
JP2019029102A (en) * 2017-07-26 2019-02-21 株式会社Ｓｃｒｅｅｎホールディングス Heating device
JP2019027623A (en) * 2017-07-26 2019-02-21 株式会社Ｓｃｒｅｅｎホールディングス Heating device and heating method
JP6826166B2 (en) * 2018-08-16 2021-02-03 ウォニク アイピーエス カンパニー リミテッドＷｏｎｉｋ Ｉｐｓ Ｃｏ．，Ｌｔｄ． Heat treatment system and heat treatment equipment
CN110890262B (en) * 2018-09-11 2025-05-23 北京北方华创微电子装备有限公司 Chamber cooling device and semiconductor processing equipment
TWI709203B (en) * 2018-09-11 2020-11-01 大陸商北京北方華創微電子裝備有限公司 Chamber cooling device and semiconductor processing equipment
US20210398829A1 (en) * 2018-11-30 2021-12-23 Lam Research Corporation Ceramic pedestal with multi-layer heater for enhanced thermal uniformity
JP7079044B2 (en) * 2019-05-31 2022-06-01 株式会社九州日昌 Heating device and heating method
JP7079042B2 (en) * 2019-05-31 2022-06-01 株式会社九州日昌 Heating device and heating method
JP2021197448A (en) * 2020-06-15 2021-12-27 光洋サーモシステム株式会社 Thermal treatment device
KR102559562B1 (en) * 2021-03-11 2023-07-27 주식회사 한국제이텍트써모시스템 Heat treatment oven exhaust duct integrated heater unit
WO2022261289A1 (en) * 2021-06-09 2022-12-15 Watlow Electric Manufacturing Company Cold conduit insulation device
CN114485170B (en) * 2021-12-27 2024-04-30 江苏邑文微电子科技有限公司 Rapid annealing furnace heating system and temperature control method
KR102508123B1 (en) * 2022-10-28 2023-03-10 (주)삼양세라텍 Heat treatment apparatus
CN118919461A (en) * 2024-10-12 2024-11-08 苏州芯默科技有限公司 Wafer annealing equipment
CN118969680A (en) * 2024-10-12 2024-11-15 苏州芯默科技有限公司 Wafer annealing equipment

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KR100817400B1 (en) * 2006-11-09 2008-03-27 권상환 Heat treatment device

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Publication number Priority date Publication date Assignee Title
JP2003059837A (en) * 2001-08-10 2003-02-28 Tokyo Electron Ltd Apparatus and method for heat treatment
JP2004179672A (en) * 2003-12-12 2004-06-24 Hitachi Kokusai Electric Inc Substrate heating apparatus and method of forming semiconductor circuit
KR100817400B1 (en) * 2006-11-09 2008-03-27 권상환 Heat treatment device

Also Published As

Publication number Publication date
TWI508178B (en) 2015-11-11
CN102983091A (en) 2013-03-20
CN102067294A (en) 2011-05-18
CN102067294B (en) 2016-10-19
JP2014146815A (en) 2014-08-14
CN105140157B (en) 2018-05-29
TW201007847A (en) 2010-02-16
CN105140157A (en) 2015-12-09
JP2011528501A (en) 2011-11-17
WO2010008211A2 (en) 2010-01-21
JP5973728B2 (en) 2016-08-23

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