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WO2009034787A1 - Thin film thermophysical property measuring method and thin film thermophysical property measuring apparatus - Google Patents

Thin film thermophysical property measuring method and thin film thermophysical property measuring apparatus Download PDF

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Publication number
WO2009034787A1
WO2009034787A1 PCT/JP2008/063630 JP2008063630W WO2009034787A1 WO 2009034787 A1 WO2009034787 A1 WO 2009034787A1 JP 2008063630 W JP2008063630 W JP 2008063630W WO 2009034787 A1 WO2009034787 A1 WO 2009034787A1
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
temperature
property measuring
intensity
thermophysical property
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/063630
Other languages
French (fr)
Japanese (ja)
Inventor
Naoyuki Taketoshi
Tetsuya Baba
Takashi Yagi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute of Advanced Industrial Science and Technology AIST filed Critical National Institute of Advanced Industrial Science and Technology AIST
Publication of WO2009034787A1 publication Critical patent/WO2009034787A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00—Investigating or analyzing materials by the use of thermal means
    • G01N25/18—Investigating or analyzing materials by the use of thermal means by investigating thermal conductivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K11/00—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00
    • G01K11/12—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in colour, translucency or reflectance
    • G01K11/125—Measuring temperature based upon physical or chemical changes not covered by groups G01K3/00, G01K5/00, G01K7/00 or G01K9/00 using changes in colour, translucency or reflectance using changes in reflectance
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
    • G01K3/00—Thermometers giving results other than momentary value of temperature
    • G01K3/08—Thermometers giving results other than momentary value of temperature giving differences of values; giving differentiated values
    • G01K3/10—Thermometers giving results other than momentary value of temperature giving differences of values; giving differentiated values in respect of time, e.g. reacting only to a quick change of temperature

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials Using Thermal Means (AREA)

Abstract

To provide a surface heating and surface temperature measuring thin film thermal diffusion factor measuring apparatus incorporating an analysis model wherein film thickness is taken into account and to quantitatively and simply measure a thin film formed on a discretionary substrate. The surface of a thin film (2) on a substrate (1) is instantaneously heated by using heating pulse light (3) to instantaneously increase the surface temperature. The heat diffuses into the thin film (2) and permeates inside the substrate (1), and the surface temperature of the thin film (2) is reduced. Temperature measuring pulse light (4) (P2) is applied to the same region where the heating pulse light (3) (P1) is applied (4a), and the intensity of its reflecting light (4b) slightly changes depending on the surface temperature. The temperature change of the surface of the thin film (2) can be detected by detecting such intensity change depending on the temperature by a detector (5). The detector (5) is provided with a light intensity sensor (5a) for measuring intensity of the reflecting light (4b), and an information processor (5b). The information processor (5b) incorporates a calculating section for calculating the thermal diffusion factor of the thin film, based on the analysis model wherein thin film thickness is taken into account.
PCT/JP2008/063630 2007-09-11 2008-07-30 Thin film thermophysical property measuring method and thin film thermophysical property measuring apparatus Ceased WO2009034787A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007235679A JP2009068909A (en) 2007-09-11 2007-09-11 Thin film thermophysical property measuring method and thin film thermophysical property measuring device
JP2007-235679 2007-09-11

Publications (1)

Publication Number Publication Date
WO2009034787A1 true WO2009034787A1 (en) 2009-03-19

Family

ID=40451799

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/063630 Ceased WO2009034787A1 (en) 2007-09-11 2008-07-30 Thin film thermophysical property measuring method and thin film thermophysical property measuring apparatus

Country Status (2)

Country Link
JP (1) JP2009068909A (en)
WO (1) WO2009034787A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107941850A (en) * 2017-11-21 2018-04-20 宁波英飞迈材料科技有限公司 A kind of apparatus and method of quick measurement thin-film material thermal capacitance
CN109557129A (en) * 2018-10-29 2019-04-02 同济大学 A kind of measurement method of film thermal diffusion coefficient
CN114384118A (en) * 2022-01-28 2022-04-22 同济大学 Method and device for measuring thermal diffusion coefficient of film with substrate medium

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019092898A1 (en) 2017-11-07 2019-05-16 株式会社ピコサーム Physical property value measurement device, physical property value measurement method, and program

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4710030A (en) * 1985-05-17 1987-12-01 Bw Brown University Research Foundation Optical generator and detector of stress pulses
JPH11511240A (en) * 1995-08-25 1999-09-28 ブラウン ユニバーシティー リサーチ ファウンデーション Optical techniques for measuring properties of changed materials.
JP2001083113A (en) * 1999-09-14 2001-03-30 Agency Of Ind Science & Technol Method for measuring thermal diffusivity by thermo- reflectance method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4710030A (en) * 1985-05-17 1987-12-01 Bw Brown University Research Foundation Optical generator and detector of stress pulses
JPH11511240A (en) * 1995-08-25 1999-09-28 ブラウン ユニバーシティー リサーチ ファウンデーション Optical techniques for measuring properties of changed materials.
JP2001083113A (en) * 1999-09-14 2001-03-30 Agency Of Ind Science & Technol Method for measuring thermal diffusivity by thermo- reflectance method

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NAOYUKI TAKETOSHI ET AL.: "Electrical delay technique in the picosecond thermoreflectance method for thermophysical property measurements of thin films", REVIEW OF SCIENTIFIC INSTRUMENTS, vol. 76, 7 September 2005 (2005-09-07), pages P094903-1 - P094903-8 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107941850A (en) * 2017-11-21 2018-04-20 宁波英飞迈材料科技有限公司 A kind of apparatus and method of quick measurement thin-film material thermal capacitance
CN107941850B (en) * 2017-11-21 2020-08-04 宁波英飞迈材料科技有限公司 A device and method for rapidly measuring heat capacity of thin film materials
CN109557129A (en) * 2018-10-29 2019-04-02 同济大学 A kind of measurement method of film thermal diffusion coefficient
CN114384118A (en) * 2022-01-28 2022-04-22 同济大学 Method and device for measuring thermal diffusion coefficient of film with substrate medium
CN114384118B (en) * 2022-01-28 2023-08-29 同济大学 Method and device for measuring thermal diffusivity of thin film with base dielectric

Also Published As

Publication number Publication date
JP2009068909A (en) 2009-04-02

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