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WO2009028332A1 - 波面収差計測装置および方法、並びに波面収差調整方法 - Google Patents

波面収差計測装置および方法、並びに波面収差調整方法 Download PDF

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Publication number
WO2009028332A1
WO2009028332A1 PCT/JP2008/064523 JP2008064523W WO2009028332A1 WO 2009028332 A1 WO2009028332 A1 WO 2009028332A1 JP 2008064523 W JP2008064523 W JP 2008064523W WO 2009028332 A1 WO2009028332 A1 WO 2009028332A1
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WO
WIPO (PCT)
Prior art keywords
wavefront aberration
wavefront
optical system
change
measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/064523
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English (en)
French (fr)
Inventor
Taketoshi Negishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
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Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to EP08828535.8A priority Critical patent/EP2184596B1/en
Priority to CN200880101961A priority patent/CN101772696A/zh
Publication of WO2009028332A1 publication Critical patent/WO2009028332A1/ja
Priority to US12/713,598 priority patent/US8797520B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested

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  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)

Abstract

　被検光学系（２０）の波面収差を計測する波面収差計測装置は、計測光を供給する点光源（３ａ：１～３）と、点光源と光学的に共役な位置に配置された検出面を有する光検出器（７）と、点光源と光検出器との間の光路中に配置されて被検光学系を経た光に波面の変化を付与する波面変化付与部（５）と、光検出器の出力と波面変化付与部において付与される波面の変化とに基づいて、被検光学系の波面収差を計測する計測部（６）とを備える。干渉法を用いることなく、比較的簡素な構成にしたがって被検光学系の波面収差を計測することができる。
PCT/JP2008/064523 2007-08-27 2008-08-13 波面収差計測装置および方法、並びに波面収差調整方法 Ceased WO2009028332A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP08828535.8A EP2184596B1 (en) 2007-08-27 2008-08-13 Wavefront aberration measuring device and method and wavefront aberration adjusting method
CN200880101961A CN101772696A (zh) 2007-08-27 2008-08-13 波面像差测量装置及方法、以及波面像差调整方法
US12/713,598 US8797520B2 (en) 2007-08-27 2010-02-26 Wavefront aberration measuring device and method and wavefront aberration adjusting method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-219215 2007-08-27
JP2007219215 2007-08-27

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/713,598 Continuation US8797520B2 (en) 2007-08-27 2010-02-26 Wavefront aberration measuring device and method and wavefront aberration adjusting method

Publications (1)

Publication Number Publication Date
WO2009028332A1 true WO2009028332A1 (ja) 2009-03-05

Family

ID=40387058

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/064523 Ceased WO2009028332A1 (ja) 2007-08-27 2008-08-13 波面収差計測装置および方法、並びに波面収差調整方法

Country Status (6)

Country Link
US (1) US8797520B2 (ja)
EP (1) EP2184596B1 (ja)
JP (1) JP5353112B2 (ja)
CN (1) CN101772696A (ja)
TW (1) TWI453381B (ja)
WO (1) WO2009028332A1 (ja)

Cited By (2)

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EP2339317A3 (en) * 2009-12-23 2011-07-20 Foxsemicon Integrated Technology, Inc. Method and System for Evaluating Light Uniformity Through an Optical Lens
CN108827595A (zh) * 2018-03-12 2018-11-16 西安应用光学研究所 基于自适应理论光学系统加工误差的检测装置

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US8665425B2 (en) * 2010-04-13 2014-03-04 Konica Minolta Advanced Layers, Inc. Eccentricity measuring method
CN102564731A (zh) * 2010-12-16 2012-07-11 中国科学院西安光学精密机械研究所 一种透镜焦距及波前畸变测量装置
CN102297759B (zh) * 2011-06-24 2013-03-27 北京理工大学 基于横向剪切干涉的扩束准直系统波面像差检测方法
CN102607719B (zh) * 2011-06-24 2013-07-17 北京理工大学 基于横向剪切干涉的扩束准直系统波面像差检测装置
JP6181084B2 (ja) * 2012-02-10 2017-08-16 ジョンソン・アンド・ジョンソン・ビジョン・ケア・インコーポレイテッドＪｏｈｎｓｏｎ ＆ Ｊｏｈｎｓｏｎ Ｖｉｓｉｏｎ Ｃａｒｅ， Ｉｎｃ． 眼用デバイスの波面を測定するための方法及び装置
JP2015087198A (ja) * 2013-10-30 2015-05-07 キヤノン株式会社 計測装置及び計測方法
CN107430046B (zh) * 2015-03-27 2019-08-30 奥林巴斯株式会社 波面计测装置和波面计测方法
JP6391550B2 (ja) * 2015-11-13 2018-09-19 三菱電機株式会社 波面センサ及び波面処理方法
RU2623702C1 (ru) * 2016-07-19 2017-06-28 федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный технический университет имени Н.Э. Баумана (национальный исследовательский университет)" (МГТУ им. Н.Э. Баумана) Устройство и способ определения радиуса кривизны крупногабаритных оптических деталей на основе датчика волнового фронта
RU2695085C2 (ru) * 2017-10-24 2019-07-19 Некоммерческое партнерство "Научный центр "Лазерные информационные технологии" НП НЦ "ЛИТ" Способ определения радиуса кривизны вогнутой оптической сферической поверхности с центральным осевым отверстием методом оптической дальнометрии
KR102781336B1 (ko) * 2022-12-08 2025-03-18 한국표준과학연구원 피조간섭계와 샥-하트만 센서를 결합한 복합 파면검사 시스템
KR20240127754A (ko) 2023-02-16 2024-08-23 삼성전자주식회사 광학 계측 설비
US12498293B2 (en) * 2023-03-20 2025-12-16 Mloptic Corp. Multi-configurable wavefront tester

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JPS6134430A (ja) * 1984-04-13 1986-02-18 テイ　ア−ル　ダブリユ−　インコ−ポレ−テツド アクテイブミラ−波面センサ
JPH11304641A (ja) * 1998-04-23 1999-11-05 Canon Inc 波面収差測定方法及び波面収差測定装置
JP2001235373A (ja) * 2001-01-17 2001-08-31 Mitsubishi Electric Corp 波面センサ
JP2007078434A (ja) * 2005-09-13 2007-03-29 Canon Inc 三次元位置測定装置、波面収差測定装置および三次元形状測定装置

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JPS6134430A (ja) * 1984-04-13 1986-02-18 テイ　ア−ル　ダブリユ−　インコ−ポレ−テツド アクテイブミラ−波面センサ
JPH11304641A (ja) * 1998-04-23 1999-11-05 Canon Inc 波面収差測定方法及び波面収差測定装置
JP2001235373A (ja) * 2001-01-17 2001-08-31 Mitsubishi Electric Corp 波面センサ
JP2007078434A (ja) * 2005-09-13 2007-03-29 Canon Inc 三次元位置測定装置、波面収差測定装置および三次元形状測定装置

Non-Patent Citations (1)

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Title
See also references of EP2184596A4 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2339317A3 (en) * 2009-12-23 2011-07-20 Foxsemicon Integrated Technology, Inc. Method and System for Evaluating Light Uniformity Through an Optical Lens
CN102109413B (zh) * 2009-12-23 2012-06-13 富士迈半导体精密工业（上海）有限公司 均匀度测量系统与方法
CN108827595A (zh) * 2018-03-12 2018-11-16 西安应用光学研究所 基于自适应理论光学系统加工误差的检测装置

Also Published As

Publication number Publication date
US8797520B2 (en) 2014-08-05
CN101772696A (zh) 2010-07-07
TW200921062A (en) 2009-05-16
TWI453381B (zh) 2014-09-21
JP5353112B2 (ja) 2013-11-27
EP2184596B1 (en) 2018-11-14
EP2184596A4 (en) 2012-12-05
JP2009075090A (ja) 2009-04-09
EP2184596A1 (en) 2010-05-12
US20100149549A1 (en) 2010-06-17

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