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WO2008081873A1 - 位相回復法を用いたｘ線集光方法及びその装置 - Google Patents

位相回復法を用いたｘ線集光方法及びその装置 Download PDF

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Publication number
WO2008081873A1
WO2008081873A1 PCT/JP2007/075132 JP2007075132W WO2008081873A1 WO 2008081873 A1 WO2008081873 A1 WO 2008081873A1 JP 2007075132 W JP2007075132 W JP 2007075132W WO 2008081873 A1 WO2008081873 A1 WO 2008081873A1
Authority
WO
WIPO (PCT)
Prior art keywords
ray
wavefront
intensity distribution
mirror
vicinity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/075132
Other languages
English (en)
French (fr)
Inventor
Kazuto Yamauchi
Hidekazu Mimura
Hiromi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JTec Corp
University of Osaka NUC
Original Assignee
Osaka University NUC
JTec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka University NUC, JTec Corp filed Critical Osaka University NUC
Priority to US12/440,121 priority Critical patent/US7936860B2/en
Priority to AT07860354T priority patent/ATE551701T1/de
Priority to EP07860354A priority patent/EP2063434B1/en
Publication of WO2008081873A1 publication Critical patent/WO2008081873A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

【課題】 　波動光学理論に基づく位相回復法を利用し、実際の評価で使用する硬Ｘ線を用いてミラーにより集光された集光ビームの強度分布を用いることで、ミラー上の位相誤差分布、即ち、形状誤差を求めるＸ線波面計測法を提案し、それを利用してＸ線集光光学系を最適に調節する位相回復法を用いたＸ線集光方法及びその装置を提案する。 【解決手段】 　反射Ｘ線の波面を微調節可能な波面調節能を有するＸ線ミラーを備え、焦点近傍でのＸ線強度分布を測定し、Ｘ線ミラー近傍でのＸ線強度分布を測定し若しくは入射Ｘ線の既知のＸ線強度分布を用い、焦点近傍でのＸ線強度分布と反射面近傍でのＸ線強度分布から位相回復法を用いて反射面での複素振幅分布を算出し、この複素振幅分布からＸ線集光光学系の波面収差を算出し、この算出した波面収差を最小にするように波面調節能にてＸ線ミラーの反射面を制御する。
PCT/JP2007/075132 2006-12-28 2007-12-27 位相回復法を用いたｘ線集光方法及びその装置 Ceased WO2008081873A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/440,121 US7936860B2 (en) 2006-12-28 2007-12-27 X-ray condensing method and its device using phase restoration method
AT07860354T ATE551701T1 (de) 2006-12-28 2007-12-27 Röntgenstrahlenverdichtungsverfahren und vorrichtung mit phasenwiederherstellungsverfahren
EP07860354A EP2063434B1 (en) 2006-12-28 2007-12-27 X-ray condensing method and its device using phase restoration method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006357566A JP4814782B2 (ja) 2006-12-28 2006-12-28 位相回復法を用いたｘ線集光方法及びその装置
JP2006-357566 2006-12-28

Publications (1)

Publication Number Publication Date
WO2008081873A1 true WO2008081873A1 (ja) 2008-07-10

Family

ID=39588553

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/075132 Ceased WO2008081873A1 (ja) 2006-12-28 2007-12-27 位相回復法を用いたｘ線集光方法及びその装置

Country Status (5)

Country Link
US (1) US7936860B2 (ja)
EP (1) EP2063434B1 (ja)
JP (1) JP4814782B2 (ja)
AT (1) ATE551701T1 (ja)
WO (1) WO2008081873A1 (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014521991A (ja) * 2011-06-29 2014-08-28 ケーエルエー−テンカー コーポレイション 光源持続プラズマセルにおける収差を補正するための適応光学系
CN104376524A (zh) * 2014-09-16 2015-02-25 浙江农林大学 基于光阑加密和相位恢复算法的二值图像加密方法
CN104376525A (zh) * 2014-10-24 2015-02-25 浙江农林大学 基于迭代非线性双随机相位编码的图像加密方法
CN104376526A (zh) * 2014-10-24 2015-02-25 浙江农林大学 基于涡旋光束和相位恢复算法的图像加密方法
CN114200664A (zh) * 2021-11-11 2022-03-18 常州北邮新一代信息技术研究院有限公司 基于改进相位差算法的自适应光学系统
WO2023054157A1 (ja) * 2021-10-01 2023-04-06 国立大学法人東海国立大学機構 形状可変ミラーおよびｘ線装置

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US20100246036A1 (en) * 2007-07-27 2010-09-30 Lagana Paolo Preliminary Controlled Pre-Deformation Treatment for the Production of Mirrors
JP5343251B2 (ja) 2009-02-27 2013-11-13 株式会社ジェイテック Ｘ線ナノビーム強度分布の精密測定方法及びその装置
JP5756982B2 (ja) 2009-12-28 2015-07-29 株式会社ジェイテック Ｘ線集光方法、反射面形状制御ミラー装置及び反射面形状制御ミラーの製造方法
JP6074784B2 (ja) * 2011-12-08 2017-02-08 国立大学法人 千葉大学 ホログラムデータ作成プログラム
JP5942190B2 (ja) * 2012-06-27 2016-06-29 株式会社ジェイテック 二重反射型ｘ線ミラーを用いた斜入射ｘ線結像光学装置
JP6043906B2 (ja) * 2012-07-04 2016-12-14 株式会社ジェイテックコーポレーション 集光径可変なｘ線集光システム及びその使用方法
CN113936840B (zh) * 2021-10-22 2023-08-25 中国科学院上海高等研究院 一种温控x射线变形镜
JP7706207B2 (ja) * 2023-03-09 2025-07-11 国立大学法人東海国立大学機構 ミラー装置、光学装置およびレーザー核融合炉

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014521991A (ja) * 2011-06-29 2014-08-28 ケーエルエー−テンカー コーポレイション 光源持続プラズマセルにおける収差を補正するための適応光学系
CN104376524A (zh) * 2014-09-16 2015-02-25 浙江农林大学 基于光阑加密和相位恢复算法的二值图像加密方法
CN104376525A (zh) * 2014-10-24 2015-02-25 浙江农林大学 基于迭代非线性双随机相位编码的图像加密方法
CN104376526A (zh) * 2014-10-24 2015-02-25 浙江农林大学 基于涡旋光束和相位恢复算法的图像加密方法
WO2023054157A1 (ja) * 2021-10-01 2023-04-06 国立大学法人東海国立大学機構 形状可変ミラーおよびｘ線装置
JPWO2023054157A1 (ja) * 2021-10-01 2023-04-06
JP7587318B2 (ja) 2021-10-01 2024-11-20 国立大学法人東海国立大学機構 形状可変ミラーおよびｘ線装置
CN114200664A (zh) * 2021-11-11 2022-03-18 常州北邮新一代信息技术研究院有限公司 基于改进相位差算法的自适应光学系统
CN114200664B (zh) * 2021-11-11 2023-09-05 常州北邮新一代信息技术研究院有限公司 基于改进相位差算法的自适应光学系统

Also Published As

Publication number Publication date
EP2063434A1 (en) 2009-05-27
JP4814782B2 (ja) 2011-11-16
EP2063434B1 (en) 2012-03-28
US7936860B2 (en) 2011-05-03
JP2008164553A (ja) 2008-07-17
ATE551701T1 (de) 2012-04-15
US20100183122A1 (en) 2010-07-22
EP2063434A4 (en) 2010-12-29

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