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WO2009008446A1 - Composition de formation de film de sous-couche de réserve et procédé de création de motif de réserve utilisant la composition. - Google Patents

Composition de formation de film de sous-couche de réserve et procédé de création de motif de réserve utilisant la composition. Download PDF

Info

Publication number
WO2009008446A1
WO2009008446A1 PCT/JP2008/062399 JP2008062399W WO2009008446A1 WO 2009008446 A1 WO2009008446 A1 WO 2009008446A1 JP 2008062399 W JP2008062399 W JP 2008062399W WO 2009008446 A1 WO2009008446 A1 WO 2009008446A1
Authority
WO
WIPO (PCT)
Prior art keywords
composition
underlayer film
film forming
resist underlayer
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/062399
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English (en)
Japanese (ja)
Inventor
Rikimaru Sakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Priority to JP2009522657A priority Critical patent/JP5158381B2/ja
Publication of WO2009008446A1 publication Critical patent/WO2009008446A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16—Dicarboxylic acids and dihydroxy compounds
    • C08G63/20—Polyesters having been prepared in the presence of compounds having one reactive group or more than two reactive groups
    • C08G63/21—Polyesters having been prepared in the presence of compounds having one reactive group or more than two reactive groups in the presence of unsaturated monocarboxylic acids or unsaturated monohydric alcohols or reactive derivatives thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Structural Engineering (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention vise à proposer une composition pour former un film de sous-couche de réserve qui est large en rapport de sélection de vitesse de gravure à sec et, en même temps, qui permet d'obtenir la valeur k voulue et un indice de réfraction (n) à une courte longueur d'onde comme dans un laser à excimère ArF (longueur d'onde : 193 nm). A cet effet, l'invention porte sur une composition de fabrication de film de sous-couche de réserve pour une lithographie, comportant un polymère et un solvant, le polymère ayant une chaîne principale contenant un dérivé d'acide cinnamique. Le dérivé d'acide cinnamique est introduit dans la chaîne principale du polymère par une liaison ester, ou par une liaison ester et une liaison éther.
PCT/JP2008/062399 2007-07-11 2008-07-09 Composition de formation de film de sous-couche de réserve et procédé de création de motif de réserve utilisant la composition. Ceased WO2009008446A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009522657A JP5158381B2 (ja) 2007-07-11 2008-07-09 レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-182140 2007-07-11
JP2007182140 2007-07-11
JP2007-220317 2007-08-27
JP2007220317 2007-08-27

Publications (1)

Publication Number Publication Date
WO2009008446A1 true WO2009008446A1 (fr) 2009-01-15

Family

ID=40228617

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/062399 Ceased WO2009008446A1 (fr) 2007-07-11 2008-07-09 Composition de formation de film de sous-couche de réserve et procédé de création de motif de réserve utilisant la composition.

Country Status (3)

Country Link
JP (1) JP5158381B2 (fr)
TW (1) TWI432905B (fr)
WO (1) WO2009008446A1 (fr)

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010181453A (ja) * 2009-02-03 2010-08-19 Nissan Chem Ind Ltd レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法
US20110230058A1 (en) * 2008-11-27 2011-09-22 Nissan Chemical Industries, Ltd. Composition for forming resist underlayer film with reduced outgassing
WO2015019961A1 (fr) * 2013-08-08 2015-02-12 日産化学工業株式会社 Composition de fabrication de film de sous-couche de réserve contenant un polymère qui contient un composé cyclique contenant de l'azote
KR20170070017A (ko) 2014-10-21 2017-06-21 닛산 가가쿠 고교 가부시키 가이샤 레지스트 하층막 형성 조성물
KR20170134380A (ko) 2015-04-03 2017-12-06 닛산 가가쿠 고교 가부시키 가이샤 광가교기를 가지는 단차 기판 피복 조성물
KR20180120692A (ko) 2016-03-10 2018-11-06 닛산 가가쿠 가부시키가이샤 탄소원자간의 불포화결합에 의한 광가교기를 갖는 화합물을 포함하는 단차기판 피복 조성물
WO2019069502A1 (fr) 2017-10-06 2019-04-11 三井化学株式会社 Matériau de résine servant à former un film de sous-couche, film de sous-couche de réserve, procédé de production de film de sous-couche de réserve et produit en couches
KR20190039472A (ko) 2016-08-08 2019-04-12 닛산 가가쿠 가부시키가이샤 광경화성 조성물 및 반도체장치의 제조방법
KR20190131543A (ko) 2017-04-03 2019-11-26 닛산 가가쿠 가부시키가이샤 광가교기를 갖는 폴리에테르수지를 포함하는 단차기판 피복조성물
KR20190137845A (ko) 2017-04-14 2019-12-11 닛산 가가쿠 가부시키가이샤 탄소원자간의 불포화결합에 의한 플라즈마 경화성 화합물을 포함하는 단차기판 피복막 형성 조성물
KR20200003087A (ko) 2017-05-31 2020-01-08 미쓰이 가가쿠 가부시키가이샤 하층막 형성용 재료, 레지스트 하층막, 레지스트 하층막의 제조 방법 및 적층체
KR20200038921A (ko) 2017-08-09 2020-04-14 닛산 가가쿠 가부시키가이샤 가교성 화합물을 함유하는 광경화성 단차기판 피복 조성물
KR20200052884A (ko) 2017-09-13 2020-05-15 닛산 가가쿠 가부시키가이샤 경화성 관능기를 갖는 화합물을 포함하는 단차기판 피복 조성물
WO2020162183A1 (fr) 2019-02-07 2020-08-13 三井化学株式会社 Matériau pour utlisation de formation de film de sous-couche, film de sous-couche de réserve et stratifié
KR20200098595A (ko) 2017-12-20 2020-08-20 닛산 가가쿠 가부시키가이샤 광경화성 실리콘함유 피복막 형성 조성물
KR20210138665A (ko) 2019-03-12 2021-11-19 닛산 가가쿠 가부시키가이샤 레지스트 하층막 형성 조성물
KR20220038346A (ko) 2019-07-18 2022-03-28 닛산 가가쿠 가부시키가이샤 경화성 관능기를 갖는 화합물을 포함하는 단차기판 피복 조성물
WO2022196662A1 (fr) * 2021-03-16 2022-09-22 日産化学株式会社 Composition de formation de film de sous-couche de réserve
WO2024048487A1 (fr) * 2022-08-29 2024-03-07 日産化学株式会社 Composition pour formation de matériau de remplissage d'espace
WO2024106454A1 (fr) 2022-11-16 2024-05-23 日産化学株式会社 Composition de formation de film de sous-couche de réserve contenant un dérivé de curcumine
WO2024128190A1 (fr) 2022-12-15 2024-06-20 日産化学株式会社 Composition pour formation de film de sous-couche de réserve
KR20240110876A (ko) 2021-11-30 2024-07-16 닛산 가가쿠 가부시키가이샤 하이드록시계피산 유도체를 갖는 레지스트 하층막 형성용 조성물
WO2025203678A1 (fr) * 2024-03-29 2025-10-02 大阪有機化学工業株式会社 Composé, composition pour un film de photo-alignement, film de photo-alignement, produit stratifié et film de différence de phase

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250042775A (ko) * 2022-07-29 2025-03-27 닛산 가가쿠 가부시키가이샤 레지스트 하층막 형성용 조성물

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JPS62215606A (ja) * 1986-03-18 1987-09-22 Agency Of Ind Science & Technol 感光性樹脂の製造方法
WO2003017002A1 (fr) * 2001-08-20 2003-02-27 Nissan Chemical Industries, Ltd. Composition permettant la formation d'un film anti-reflechissant destine a etre utilise en lithographie
JP2004533637A (ja) * 2001-04-17 2004-11-04 ブルーワー サイエンス アイ エヌ シー． 改善されたスピンボウル適合性を有する反射防止コーティング組成物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62215606A (ja) * 1986-03-18 1987-09-22 Agency Of Ind Science & Technol 感光性樹脂の製造方法
JP2004533637A (ja) * 2001-04-17 2004-11-04 ブルーワー サイエンス アイ エヌ シー． 改善されたスピンボウル適合性を有する反射防止コーティング組成物
WO2003017002A1 (fr) * 2001-08-20 2003-02-27 Nissan Chemical Industries, Ltd. Composition permettant la formation d'un film anti-reflechissant destine a etre utilise en lithographie

Cited By (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110230058A1 (en) * 2008-11-27 2011-09-22 Nissan Chemical Industries, Ltd. Composition for forming resist underlayer film with reduced outgassing
JP2010181453A (ja) * 2009-02-03 2010-08-19 Nissan Chem Ind Ltd レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法
WO2015019961A1 (fr) * 2013-08-08 2015-02-12 日産化学工業株式会社 Composition de fabrication de film de sous-couche de réserve contenant un polymère qui contient un composé cyclique contenant de l'azote
CN105431780A (zh) * 2013-08-08 2016-03-23 日产化学工业株式会社 含有包含含氮环化合物的聚合物的抗蚀剂下层膜形成用组合物
KR20160040521A (ko) * 2013-08-08 2016-04-14 닛산 가가쿠 고교 가부시키 가이샤 질소함유 환화합물을 포함하는 폴리머를 포함하는 레지스트 하층막 형성조성물
JPWO2015019961A1 (ja) * 2013-08-08 2017-03-02 日産化学工業株式会社 窒素含有環化合物を含むポリマーを含むレジスト下層膜形成組成物
KR102307200B1 (ko) * 2013-08-08 2021-10-01 닛산 가가쿠 가부시키가이샤 질소함유 환화합물을 포함하는 폴리머를 포함하는 레지스트 하층막 형성조성물
US10113083B2 (en) 2013-08-08 2018-10-30 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition containing polymer which contains nitrogen-containing ring compound
CN105431780B (zh) * 2013-08-08 2020-01-03 日产化学工业株式会社 含有包含含氮环化合物的聚合物的抗蚀剂下层膜形成用组合物
US10242871B2 (en) 2014-10-21 2019-03-26 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl group
KR20170070017A (ko) 2014-10-21 2017-06-21 닛산 가가쿠 고교 가부시키 가이샤 레지스트 하층막 형성 조성물
JPWO2016159358A1 (ja) * 2015-04-03 2018-03-08 日産化学工業株式会社 光架橋基を有する段差基板被覆組成物
US11155684B2 (en) 2015-04-03 2021-10-26 Nissan Chemical Industries, Ltd. Photocrosslinkable group-containing composition for coating stepped substrate
KR20170134380A (ko) 2015-04-03 2017-12-06 닛산 가가쿠 고교 가부시키 가이샤 광가교기를 가지는 단차 기판 피복 조성물
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US12147158B2 (en) 2016-08-08 2024-11-19 Nissan Chemical Corporation Photocurable composition and method for producing semiconductor device
KR20190039472A (ko) 2016-08-08 2019-04-12 닛산 가가쿠 가부시키가이샤 광경화성 조성물 및 반도체장치의 제조방법
US11681223B2 (en) 2016-08-08 2023-06-20 Nissan Chemical Corporation Photocurable composition and method for producing semiconductor device
US10871712B2 (en) 2017-04-03 2020-12-22 Nissan Chemical Corporation Stepped substrate-coating composition containing polyether resin having photocrosslinkable group
KR20190131543A (ko) 2017-04-03 2019-11-26 닛산 가가쿠 가부시키가이샤 광가교기를 갖는 폴리에테르수지를 포함하는 단차기판 피복조성물
KR102690024B1 (ko) 2017-04-14 2024-08-05 닛산 가가쿠 가부시키가이샤 탄소원자간의 불포화결합에 의한 플라즈마 경화성 화합물을 포함하는 단차기판 피복막 형성 조성물
KR20190137845A (ko) 2017-04-14 2019-12-11 닛산 가가쿠 가부시키가이샤 탄소원자간의 불포화결합에 의한 플라즈마 경화성 화합물을 포함하는 단차기판 피복막 형성 조성물
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US11385546B2 (en) 2017-04-14 2022-07-12 Nissan Chemical Corporation Multi-level substrate coating film-forming composition containing plasma-curable compound based on unsaturated bonds between carbon atoms
KR20200003087A (ko) 2017-05-31 2020-01-08 미쓰이 가가쿠 가부시키가이샤 하층막 형성용 재료, 레지스트 하층막, 레지스트 하층막의 제조 방법 및 적층체
US11886119B2 (en) 2017-05-31 2024-01-30 Mitsui Chemicals, Inc. Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate
US11454889B2 (en) 2017-08-09 2022-09-27 Nissan Chemical Corporation Crosslinkable compound-containing photocurable stepped substrate-coating composition
KR20200038921A (ko) 2017-08-09 2020-04-14 닛산 가가쿠 가부시키가이샤 가교성 화합물을 함유하는 광경화성 단차기판 피복 조성물
KR20200052884A (ko) 2017-09-13 2020-05-15 닛산 가가쿠 가부시키가이샤 경화성 관능기를 갖는 화합물을 포함하는 단차기판 피복 조성물
US11674051B2 (en) 2017-09-13 2023-06-13 Nissan Chemical Corporation Stepped substrate coating composition containing compound having curable functional group
US11599025B2 (en) 2017-10-06 2023-03-07 Mitsui Chemicals, Inc. Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate
WO2019069502A1 (fr) 2017-10-06 2019-04-11 三井化学株式会社 Matériau de résine servant à former un film de sous-couche, film de sous-couche de réserve, procédé de production de film de sous-couche de réserve et produit en couches
KR20200051752A (ko) 2017-10-06 2020-05-13 미쓰이 가가쿠 가부시키가이샤 하층막 형성용 수지 재료, 레지스트 하층막, 레지스트 하층막의 제조 방법 및 적층체
KR20200098595A (ko) 2017-12-20 2020-08-20 닛산 가가쿠 가부시키가이샤 광경화성 실리콘함유 피복막 형성 조성물
WO2020162183A1 (fr) 2019-02-07 2020-08-13 三井化学株式会社 Matériau pour utlisation de formation de film de sous-couche, film de sous-couche de réserve et stratifié
KR20210112361A (ko) 2019-02-07 2021-09-14 미쓰이 가가쿠 가부시키가이샤 하층막 형성용 재료, 레지스트 하층막 및 적층체
US12044969B2 (en) 2019-03-12 2024-07-23 Nissan Chemical Corporation Resist underlayer film-forming composition
KR20210138665A (ko) 2019-03-12 2021-11-19 닛산 가가쿠 가부시키가이샤 레지스트 하층막 형성 조성물
KR20220038346A (ko) 2019-07-18 2022-03-28 닛산 가가쿠 가부시키가이샤 경화성 관능기를 갖는 화합물을 포함하는 단차기판 피복 조성물
KR20230158054A (ko) * 2021-03-16 2023-11-17 닛산 가가쿠 가부시키가이샤 레지스트 하층막 형성 조성물
WO2022196662A1 (fr) * 2021-03-16 2022-09-22 日産化学株式会社 Composition de formation de film de sous-couche de réserve
KR102781156B1 (ko) 2021-03-16 2025-03-14 닛산 가가쿠 가부시키가이샤 레지스트 하층막 형성 조성물
KR20240110876A (ko) 2021-11-30 2024-07-16 닛산 가가쿠 가부시키가이샤 하이드록시계피산 유도체를 갖는 레지스트 하층막 형성용 조성물
WO2024048487A1 (fr) * 2022-08-29 2024-03-07 日産化学株式会社 Composition pour formation de matériau de remplissage d'espace
WO2024106454A1 (fr) 2022-11-16 2024-05-23 日産化学株式会社 Composition de formation de film de sous-couche de réserve contenant un dérivé de curcumine
KR20250107863A (ko) 2022-11-16 2025-07-14 닛산 가가쿠 가부시키가이샤 쿠르쿠민 유도체를 갖는 레지스트 하층막 형성용 조성물
EP4621487A1 (fr) 2022-11-16 2025-09-24 Nissan Chemical Corporation Composition de formation de film de sous-couche de réserve contenant un dérivé de curcumine
WO2024128190A1 (fr) 2022-12-15 2024-06-20 日産化学株式会社 Composition pour formation de film de sous-couche de réserve
EP4636487A1 (fr) 2022-12-15 2025-10-22 Nissan Chemical Corporation Composition pour formation de film de sous-couche de réserve
WO2025203678A1 (fr) * 2024-03-29 2025-10-02 大阪有機化学工業株式会社 Composé, composition pour un film de photo-alignement, film de photo-alignement, produit stratifié et film de différence de phase

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TW200928591A (en) 2009-07-01
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TWI432905B (zh) 2014-04-01

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