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WO2009001420A1 - 光学的立体造形用重合性樹脂組成物 - Google Patents

光学的立体造形用重合性樹脂組成物 Download PDF

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Publication number
WO2009001420A1
WO2009001420A1 PCT/JP2007/062659 JP2007062659W WO2009001420A1 WO 2009001420 A1 WO2009001420 A1 WO 2009001420A1 JP 2007062659 W JP2007062659 W JP 2007062659W WO 2009001420 A1 WO2009001420 A1 WO 2009001420A1
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WO
WIPO (PCT)
Prior art keywords
optical
resin composition
polymerizable resin
molding
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/062659
Other languages
English (en)
French (fr)
Inventor
Tsuneo Hagiwara
Takashi Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CMET Inc
Original Assignee
CMET Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CMET Inc filed Critical CMET Inc
Priority to PCT/JP2007/062659 priority Critical patent/WO2009001420A1/ja
Publication of WO2009001420A1 publication Critical patent/WO2009001420A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12—Sulfonium compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

　光照射時に高硬化感度を示し、短縮された造形時間で造形精度、寸法精度、耐水性、耐湿性、力学的特性に優れる立体造形物を生産性良く製造でき、毒性が低く安全性に優れ、作業環境や地球環境の汚染や悪化を招かない光学的造形用重合性樹脂組成物の提供を目的とする。 　本発明は、式：［Ｓ＋（Ｒ１）ａ（Ｒ２）ｂ（Ｒ３）ｃ］［Ｐ－Ｆ６－ｎ（Ｒｆ）ｎ］ｍで表される芳香族スルホニウム化合物［式中、Ｒ1、Ｒ2はフェニル、クロロフェニル、フルオロフェニル、４－フェニルチオフェニルまたは下記の式で表される基（式中，Ｘは塩素またはフッ素）、Ｒ3は４’－フェニルスルホニオ－４－フェニルチオフェニル、ＲｆはＣ1～8のフルオロアルキル基、ａ、ｂ及びｃは０～３、ａとｂとｃの合計が３、ｍは１＋ｃと同じ数、ｎは１～５］を光カチオン開始剤として含有する光学的立体造形用重合性樹脂組成物である。
PCT/JP2007/062659 2007-06-25 2007-06-25 光学的立体造形用重合性樹脂組成物 Ceased WO2009001420A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/062659 WO2009001420A1 (ja) 2007-06-25 2007-06-25 光学的立体造形用重合性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/062659 WO2009001420A1 (ja) 2007-06-25 2007-06-25 光学的立体造形用重合性樹脂組成物

Publications (1)

Publication Number Publication Date
WO2009001420A1 true WO2009001420A1 (ja) 2008-12-31

Family

ID=40185254

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/062659 Ceased WO2009001420A1 (ja) 2007-06-25 2007-06-25 光学的立体造形用重合性樹脂組成物

Country Status (1)

Country Link
WO (1) WO2009001420A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017179202A (ja) * 2016-03-31 2017-10-05 株式会社Adeka 硬化性組成物、硬化物の製造方法、およびその硬化物
US12520927B1 (en) 2024-11-14 2026-01-13 Umbrella Scents US LLC Personal care product dispenser with dipstick and roll-on applicators

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09268205A (ja) * 1996-03-29 1997-10-14 Asahi Denka Kogyo Kk 光学的立体造形用樹脂組成物および光学的立体造形法
JPH11199647A (ja) * 1998-01-13 1999-07-27 Teijin Seiki Co Ltd 光学的造形用樹脂組成物
JP2000062030A (ja) * 1998-08-20 2000-02-29 Asahi Denka Kogyo Kk 光学的立体造形方法
WO2004029037A1 (ja) * 2002-09-25 2004-04-08 Asahi Denka Co.Ltd. 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物並びに光学的立体造形法
WO2004113396A1 (ja) * 2003-06-25 2004-12-29 Cmet Inc. 安定性の向上した活性エネルギー線硬化性の光学的立体造形用樹脂組成物
JP2005015739A (ja) * 2003-06-24 2005-01-20 Cmet Inc 靱性に優れた光学的立体造形用樹脂組成物
JP2005263796A (ja) * 2004-02-20 2005-09-29 Asahi Denka Kogyo Kk 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物ならびに光学的立体造形法
WO2007037434A1 (ja) * 2005-09-29 2007-04-05 Cmet Inc. 光学的立体造形用樹脂組成物

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09268205A (ja) * 1996-03-29 1997-10-14 Asahi Denka Kogyo Kk 光学的立体造形用樹脂組成物および光学的立体造形法
JPH11199647A (ja) * 1998-01-13 1999-07-27 Teijin Seiki Co Ltd 光学的造形用樹脂組成物
JP2000062030A (ja) * 1998-08-20 2000-02-29 Asahi Denka Kogyo Kk 光学的立体造形方法
WO2004029037A1 (ja) * 2002-09-25 2004-04-08 Asahi Denka Co.Ltd. 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物並びに光学的立体造形法
JP2005015739A (ja) * 2003-06-24 2005-01-20 Cmet Inc 靱性に優れた光学的立体造形用樹脂組成物
WO2004113396A1 (ja) * 2003-06-25 2004-12-29 Cmet Inc. 安定性の向上した活性エネルギー線硬化性の光学的立体造形用樹脂組成物
JP2005263796A (ja) * 2004-02-20 2005-09-29 Asahi Denka Kogyo Kk 新規な芳香族スルホニウム塩化合物、これからなる光酸発生剤およびこれを含む光重合性組成物、光学的立体造形用樹脂組成物ならびに光学的立体造形法
WO2007037434A1 (ja) * 2005-09-29 2007-04-05 Cmet Inc. 光学的立体造形用樹脂組成物

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017179202A (ja) * 2016-03-31 2017-10-05 株式会社Adeka 硬化性組成物、硬化物の製造方法、およびその硬化物
JP7008398B2 (ja) 2016-03-31 2022-01-25 株式会社Adeka 硬化性組成物、硬化物の製造方法、およびその硬化物
US12520927B1 (en) 2024-11-14 2026-01-13 Umbrella Scents US LLC Personal care product dispenser with dipstick and roll-on applicators

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