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WO2009063877A1 - 可動子、処理ステージ - Google Patents

可動子、処理ステージ Download PDF

Info

Publication number
WO2009063877A1
WO2009063877A1 PCT/JP2008/070524 JP2008070524W WO2009063877A1 WO 2009063877 A1 WO2009063877 A1 WO 2009063877A1 JP 2008070524 W JP2008070524 W JP 2008070524W WO 2009063877 A1 WO2009063877 A1 WO 2009063877A1
Authority
WO
WIPO (PCT)
Prior art keywords
movable element
processing stage
sub
processed
main plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/070524
Other languages
English (en)
French (fr)
Inventor
Yuya Inoue
Hisato Tanaka
Tamotsu Tanifuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to CN2008801099623A priority Critical patent/CN101815659B/zh
Priority to US12/742,177 priority patent/US8485507B2/en
Priority to JP2009541140A priority patent/JP5039148B2/ja
Priority to KR1020107009655A priority patent/KR101226942B1/ko
Publication of WO2009063877A1 publication Critical patent/WO2009063877A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/44—Movable or adjustable work or tool supports using particular mechanisms
    • B23Q1/56—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
    • B23Q1/58—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism a single sliding pair
    • B23Q1/585—Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism a single sliding pair perpendicular to the working surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67103—Apparatus for thermal treatment mainly by conduction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
    • H10P72/0432—
    • H10P72/3306—
    • H10P72/7616—
    • H10P76/00—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04—Arrangements of vacuum systems or suction cups
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04—Arrangements of vacuum systems or suction cups
    • B65G2249/045—Details of suction cups suction cups
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T483/00—Tool changing
    • Y10T483/10—Process

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

　被処理基板を載置して移動する可動子であって：金属材料からなるメインプレートと；前記メインプレート上に配置された、前記金属材料よりも硬度が高い材料からなる複数のサブプレートと；を備え、前記複数のサブプレートの上面が前記被処理基板の載置面であることを特徴とする可動子。
PCT/JP2008/070524 2007-11-13 2008-11-11 可動子、処理ステージ Ceased WO2009063877A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN2008801099623A CN101815659B (zh) 2007-11-13 2008-11-11 可动元件和处理台
US12/742,177 US8485507B2 (en) 2007-11-13 2008-11-11 Movable table and processing stage
JP2009541140A JP5039148B2 (ja) 2007-11-13 2008-11-11 可動子、処理ステージ
KR1020107009655A KR101226942B1 (ko) 2007-11-13 2008-11-11 가동자, 처리 스테이지

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007294402 2007-11-13
JP2007-294402 2007-11-13

Publications (1)

Publication Number Publication Date
WO2009063877A1 true WO2009063877A1 (ja) 2009-05-22

Family

ID=40638726

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/070524 Ceased WO2009063877A1 (ja) 2007-11-13 2008-11-11 可動子、処理ステージ

Country Status (6)

Country Link
US (1) US8485507B2 (ja)
JP (1) JP5039148B2 (ja)
KR (1) KR101226942B1 (ja)
CN (1) CN101815659B (ja)
TW (1) TWI392631B (ja)
WO (1) WO2009063877A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD959279S1 (en) 2020-04-07 2022-08-02 VB Brands LLC Spray bottle

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012219332B4 (de) * 2012-10-23 2014-11-13 Mdi Schott Advanced Processing Gmbh Vorrichtung und Verfahren zum Lagern und Fixieren einer Glasscheibe
CN105934715B (zh) 2014-01-20 2019-01-01 Asml荷兰有限公司 衬底保持件、用于光刻设备的支撑台、光刻设备和器件制造方法
US10381256B2 (en) * 2015-03-12 2019-08-13 Kla-Tencor Corporation Apparatus and method for chucking warped wafers
CN107428151A (zh) * 2015-04-09 2017-12-01 信越工程株式会社 贴合设备的制造装置
CN105750934A (zh) * 2016-05-04 2016-07-13 深圳市创世纪机械有限公司 数控机床的工作台和数控机床
CN107378520B (zh) * 2017-09-05 2023-11-10 洛阳霍鑫机电科技有限公司 一种不锈钢焊接式组合平台
CN109227154A (zh) * 2018-10-11 2019-01-18 佛山市南海区精鹰机械有限公司 一种组合式工作台
AT523640B1 (de) * 2020-04-27 2021-10-15 B & R Ind Automation Gmbh Stützstruktur für einen Planarmotor
CN114249109A (zh) * 2020-09-22 2022-03-29 川奇光电科技（扬州）有限公司 显示基板的自动装片装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6014824U (ja) * 1983-07-07 1985-01-31 株式会社　牧野フライス製作所 耐摩耗、耐蝕性の非金属表面を有したテ−ブル
JP2004172319A (ja) * 2002-11-19 2004-06-17 Seiko Epson Corp ワーク搬送テーブル、ワーク搬送装置、液滴吐出装置、電気光学装置、電気光学装置の製造方法および電子機器

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5645021A (en) * 1979-09-19 1981-04-24 Hitachi Ltd Moving apparatus
JPS6014824A (ja) 1983-07-08 1985-01-25 松下電器産業株式会社 炊飯器用表示装置
US4761876A (en) * 1986-04-18 1988-08-09 Dynamotion Corporation High speed precision drilling system
JPH07311375A (ja) 1994-05-17 1995-11-28 Ishikawajima Harima Heavy Ind Co Ltd 液晶ディスプレイ基板検査装置の検査ステージ
JP4244555B2 (ja) 2002-02-25 2009-03-25 東京エレクトロン株式会社 被処理体の支持機構
CN2638911Y (zh) * 2003-04-07 2004-09-08 帝马数字机器(深圳)有限公司 花岗石精密数控机床
JP2005114882A (ja) 2003-10-06 2005-04-28 Hitachi High-Tech Electronics Engineering Co Ltd 処理ステージの基板載置方法、基板露光ステージおよび基板露光装置
JP4170201B2 (ja) * 2003-12-01 2008-10-22 日立ビアメカニクス株式会社 基板加工装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6014824U (ja) * 1983-07-07 1985-01-31 株式会社　牧野フライス製作所 耐摩耗、耐蝕性の非金属表面を有したテ−ブル
JP2004172319A (ja) * 2002-11-19 2004-06-17 Seiko Epson Corp ワーク搬送テーブル、ワーク搬送装置、液滴吐出装置、電気光学装置、電気光学装置の製造方法および電子機器

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD959279S1 (en) 2020-04-07 2022-08-02 VB Brands LLC Spray bottle

Also Published As

Publication number Publication date
CN101815659B (zh) 2012-09-26
US8485507B2 (en) 2013-07-16
US20100276858A1 (en) 2010-11-04
TW200942473A (en) 2009-10-16
KR101226942B1 (ko) 2013-01-28
CN101815659A (zh) 2010-08-25
JP5039148B2 (ja) 2012-10-03
TWI392631B (zh) 2013-04-11
KR20100069702A (ko) 2010-06-24
JPWO2009063877A1 (ja) 2011-03-31

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