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WO2010062661A3 - Monolithic linear polishing sheet - Google Patents

Monolithic linear polishing sheet Download PDF

Info

Publication number
WO2010062661A3
WO2010062661A3 PCT/US2009/062439 US2009062439W WO2010062661A3 WO 2010062661 A3 WO2010062661 A3 WO 2010062661A3 US 2009062439 W US2009062439 W US 2009062439W WO 2010062661 A3 WO2010062661 A3 WO 2010062661A3
Authority
WO
WIPO (PCT)
Prior art keywords
layer
polishing
polishing sheet
linear polishing
monolithic linear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2009/062439
Other languages
French (fr)
Other versions
WO2010062661A2 (en
Inventor
Benjamin A. Bonner
Gopalakrishna B. Prabhu
Erik S. Rondum
Gregory E. Menk
Anand N. Iyer
Peter Mcreynolds
Garlen C. Leung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to JP2011534729A priority Critical patent/JP2012507409A/en
Publication of WO2010062661A2 publication Critical patent/WO2010062661A2/en
Publication of WO2010062661A3 publication Critical patent/WO2010062661A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B24D11/001—Manufacture of flexible abrasive materials
    • B24D11/003—Manufacture of flexible abrasive materials without embedded abrasive particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/004—Machines or devices using grinding or polishing belts; Accessories therefor using abrasive rolled strips
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

A chemical mechanical polishing article can be a single contiguous layer having a polishing surface, the layer being an elongated substantially rectangular sheet having a width and a length at least four times greater than the width. Forming a polishing article can include depositing a liquid precursor on a moving belt, at least partially curing the liquid precursor while on the moving belt to form a polishing layer, and detaching the polishing layer from the belt.
PCT/US2009/062439 2008-11-03 2009-10-28 Monolithic linear polishing sheet Ceased WO2010062661A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011534729A JP2012507409A (en) 2008-11-03 2009-10-28 Monolithic linear polishing sheet

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/263,908 US20100112919A1 (en) 2008-11-03 2008-11-03 Monolithic linear polishing sheet
US12/263,908 2008-11-03

Publications (2)

Publication Number Publication Date
WO2010062661A2 WO2010062661A2 (en) 2010-06-03
WO2010062661A3 true WO2010062661A3 (en) 2010-07-29

Family

ID=42131991

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2009/062439 Ceased WO2010062661A2 (en) 2008-11-03 2009-10-28 Monolithic linear polishing sheet

Country Status (3)

Country Link
US (2) US20100112919A1 (en)
JP (1) JP2012507409A (en)
WO (1) WO2010062661A2 (en)

Families Citing this family (19)

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US10022842B2 (en) 2012-04-02 2018-07-17 Thomas West, Inc. Method and systems to control optical transmissivity of a polish pad material
SG11201406287QA (en) * 2012-04-02 2014-11-27 Thomas West Inc Methods and systems for centrifugal casting of polymer polish pads and polishing pads made by the methods
US10722997B2 (en) 2012-04-02 2020-07-28 Thomas West, Inc. Multilayer polishing pads made by the methods for centrifugal casting of polymer polish pads
KR101397731B1 (en) * 2012-08-09 2014-05-21 삼성전기주식회사 Apparatus for measuring a drying rate and method for measuring the drying rate using the same
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US9776361B2 (en) 2014-10-17 2017-10-03 Applied Materials, Inc. Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
CN113579992A (en) 2014-10-17 2021-11-02 应用材料公司 CMP pad construction with composite material properties using additive manufacturing process
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
US10618141B2 (en) 2015-10-30 2020-04-14 Applied Materials, Inc. Apparatus for forming a polishing article that has a desired zeta potential
US10593574B2 (en) 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
EP3571009A4 (en) 2017-01-20 2021-01-20 Applied Materials, Inc. THIN PLASTIC POLISHING ARTICLE FOR CMP APPLICATIONS
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
WO2019032286A1 (en) 2017-08-07 2019-02-14 Applied Materials, Inc. Abrasive delivery polishing pads and manufacturing methods thereof
JP7299970B2 (en) 2018-09-04 2023-06-28 アプライド マテリアルズ インコーポレイテッド Formulations for improved polishing pads
US11717936B2 (en) * 2018-09-14 2023-08-08 Applied Materials, Inc. Methods for a web-based CMP system
US11806829B2 (en) 2020-06-19 2023-11-07 Applied Materials, Inc. Advanced polishing pads and related polishing pad manufacturing methods
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ

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US6796880B2 (en) * 1999-02-04 2004-09-28 Applied Materials, Inc. Linear polishing sheet with window
JP2007061929A (en) * 2005-08-30 2007-03-15 Toyo Tire & Rubber Co Ltd Manufacturing method of laminated polishing pad
US20070197134A1 (en) * 2006-02-15 2007-08-23 Applied Materials, Inc. Polishing article with integrated window stripe
JP2008246639A (en) * 2007-03-30 2008-10-16 Toyo Tire & Rubber Co Ltd Polishing pad manufacturing method

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US1988065A (en) * 1931-09-26 1935-01-15 Carborundum Co Manufacture of open-spaced abrasive fabrics
US2220140A (en) * 1933-03-15 1940-11-05 Minnesota Mining & Mfg Abrasive sheet material
US2780533A (en) * 1950-03-07 1957-02-05 Rexall Drug Company Abrasive article and method of making
US4038047A (en) * 1969-04-14 1977-07-26 Norton Company Method of making a flexible resilient abrasive
US4589233A (en) * 1984-06-25 1986-05-20 Carborundum Abrasives Company Sectional abrasive belt
US5254194A (en) * 1988-05-13 1993-10-19 Minnesota Mining And Manufacturing Company Coated abrasive sheet material with loop material for attachment incorporated therein
ATE186001T1 (en) * 1994-08-09 1999-11-15 Ontrak Systems Inc LINEAR POLISHER AND WAFER PLANARISATION PROCESS
US5791969A (en) * 1994-11-01 1998-08-11 Lund; Douglas E. System and method of automatically polishing semiconductor wafers
US6108091A (en) * 1997-05-28 2000-08-22 Lam Research Corporation Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing
US6210257B1 (en) * 1998-05-29 2001-04-03 Micron Technology, Inc. Web-format polishing pads and methods for manufacturing and using web-format polishing pads in mechanical and chemical-mechanical planarization of microelectronic substrates
US6244935B1 (en) * 1999-02-04 2001-06-12 Applied Materials, Inc. Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet
US6475070B1 (en) * 1999-02-04 2002-11-05 Applied Materials, Inc. Chemical mechanical polishing with a moving polishing sheet
US6406363B1 (en) * 1999-08-31 2002-06-18 Lam Research Corporation Unsupported chemical mechanical polishing belt
KR20020072548A (en) * 1999-12-14 2002-09-16 로델 홀딩스 인코포레이티드 Method of manufacturing a polymer or polymer composite polishing pad
US6428394B1 (en) * 2000-03-31 2002-08-06 Lam Research Corporation Method and apparatus for chemical mechanical planarization and polishing of semiconductor wafers using a continuous polishing member feed
US6500056B1 (en) * 2000-06-30 2002-12-31 Lam Research Corporation Linear reciprocating disposable belt polishing method and apparatus
US6520841B2 (en) * 2000-07-10 2003-02-18 Applied Materials, Inc. Apparatus and methods for chemical mechanical polishing with an incrementally advanceable polishing sheet
US6540595B1 (en) * 2000-08-29 2003-04-01 Applied Materials, Inc. Chemical-Mechanical polishing apparatus and method utilizing an advanceable polishing sheet
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US7044989B2 (en) * 2002-07-26 2006-05-16 3M Innovative Properties Company Abrasive product, method of making and using the same, and apparatus for making the same
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US7160413B2 (en) * 2004-01-09 2007-01-09 Mipox International Corporation Layered support and method for laminating CMP pads
US6986705B2 (en) * 2004-04-05 2006-01-17 Rimpad Tech Ltd. Polishing pad and method of making same
US7090560B2 (en) * 2004-07-28 2006-08-15 3M Innovative Properties Company System and method for detecting abrasive article orientation
JP2006186239A (en) * 2004-12-28 2006-07-13 Toyo Tire & Rubber Co Ltd Polishing pad and method for manufacturing semiconductor device
US7591865B2 (en) * 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
KR20060099398A (en) * 2005-03-08 2006-09-19 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스 인코포레이티드 Aqueous polishing pad and manufacturing method
US7491251B2 (en) * 2005-10-05 2009-02-17 3M Innovative Properties Company Method of making a structured abrasive article
TW200800489A (en) * 2006-04-19 2008-01-01 Toyo Tire & Amp Rubber Co Ltd Method for manufacturing polishing pad
JP4261586B2 (en) * 2007-01-15 2009-04-30 東洋ゴム工業株式会社 Polishing pad manufacturing method
JP4954762B2 (en) * 2007-03-27 2012-06-20 東洋ゴム工業株式会社 Method for producing polyurethane foam
JP4941735B2 (en) * 2007-03-30 2012-05-30 東洋ゴム工業株式会社 Polishing pad manufacturing method
US20090088051A1 (en) * 2007-09-27 2009-04-02 Applied Materials, Inc. Leader and trailer for linear polishing sheet
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Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6796880B2 (en) * 1999-02-04 2004-09-28 Applied Materials, Inc. Linear polishing sheet with window
JP2007061929A (en) * 2005-08-30 2007-03-15 Toyo Tire & Rubber Co Ltd Manufacturing method of laminated polishing pad
US20070197134A1 (en) * 2006-02-15 2007-08-23 Applied Materials, Inc. Polishing article with integrated window stripe
JP2008246639A (en) * 2007-03-30 2008-10-16 Toyo Tire & Rubber Co Ltd Polishing pad manufacturing method

Also Published As

Publication number Publication date
US20140237905A1 (en) 2014-08-28
WO2010062661A2 (en) 2010-06-03
US20100112919A1 (en) 2010-05-06
JP2012507409A (en) 2012-03-29

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