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WO2008111488A1 - キセノンの濃縮方法および濃縮装置 - Google Patents

キセノンの濃縮方法および濃縮装置 Download PDF

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Publication number
WO2008111488A1
WO2008111488A1 PCT/JP2008/054059 JP2008054059W WO2008111488A1 WO 2008111488 A1 WO2008111488 A1 WO 2008111488A1 JP 2008054059 W JP2008054059 W JP 2008054059W WO 2008111488 A1 WO2008111488 A1 WO 2008111488A1
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Prior art keywords
xenon
concentration
equipment therefor
adsorption
temperature
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Ceased
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PCT/JP2008/054059
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English (en)
French (fr)
Inventor
Akihiro Nakamura
Tatsuya Hidano
Kazuhiko Fujie
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Nippon Sanso Holdings Corp
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Nippon Sanso Holdings Corp
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Priority to JP2009504011A priority Critical patent/JP5248478B2/ja
Publication of WO2008111488A1 publication Critical patent/WO2008111488A1/ja
Anticipated expiration legal-status Critical
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Abstract

　本発明は、温度スイング吸着法によるキセノンの濃縮方法であって、キセノンを含み、一酸化炭素を含まない常温の原料ガスを活性化したＣｕ－ＺＳＭ５が充填された吸着筒に流通させる吸着工程と、加熱によりキセノンを脱着する脱着工程とを有し、これら２つの工程を交互に繰り返すことによってキセノンを濃縮する方法を提供する。
PCT/JP2008/054059 2007-03-09 2008-03-06 キセノンの濃縮方法および濃縮装置 Ceased WO2008111488A1 (ja)

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Application Number Priority Date Filing Date Title
JP2009504011A JP5248478B2 (ja) 2007-03-09 2008-03-06 キセノンの濃縮方法および濃縮装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007059992 2007-03-09
JP2007-059992 2007-03-09

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WO2008111488A1 true WO2008111488A1 (ja) 2008-09-18

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TW (1) TW200902440A (ja)
WO (1) WO2008111488A1 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010076972A (ja) * 2008-09-25 2010-04-08 Taiyo Nippon Sanso Corp 不純希ガスの処理方法
WO2011030514A1 (ja) * 2009-09-09 2011-03-17 パナソニック株式会社 キセノン回収方法
WO2011030513A1 (ja) * 2009-09-09 2011-03-17 パナソニック株式会社 吸着材およびそれを用いたキセノン吸着デバイス
JP2011088773A (ja) * 2009-10-22 2011-05-06 Panasonic Corp ガス吸着デバイスおよびガス回収方法
JP2017080665A (ja) * 2015-10-27 2017-05-18 大陽日酸株式会社 吸着剤、吸着剤の製造方法、一酸化炭素除去装置、および一酸化炭素除去方法
CN114152487A (zh) * 2021-11-11 2022-03-08 苏州热工研究院有限公司 核设施废气中放射性惰性气体的检测装置及检测方法
CN117310011A (zh) * 2023-08-14 2023-12-29 广西电网有限责任公司南宁供电局 一种适用于sf6分解产物检测的氦离子气相色谱仪
JP2024519686A (ja) * 2021-05-11 2024-05-21 プラクスエア・テクノロジー・インコーポレイテッド エッチングチャンバを出るガス汚染物質流から希ガスを前処理して回収する新規な方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11650010B2 (en) * 2018-01-11 2023-05-16 Praxair Technology, Inc. Adsorptive xenon recovery process from a gas or liquid stream at cryogenic temperature

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62266381A (ja) * 1986-05-10 1987-11-19 共同酸素株式会社 キセノン製造方法
JPH05296654A (ja) * 1992-04-21 1993-11-09 Nippon Sanso Kk クリプトン及びキセノンの濃縮方法
JPH092808A (ja) * 1995-06-15 1997-01-07 Kyodo Sanso Kk クリプトンの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62266381A (ja) * 1986-05-10 1987-11-19 共同酸素株式会社 キセノン製造方法
JPH05296654A (ja) * 1992-04-21 1993-11-09 Nippon Sanso Kk クリプトン及びキセノンの濃縮方法
JPH092808A (ja) * 1995-06-15 1997-01-07 Kyodo Sanso Kk クリプトンの製造方法

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010076972A (ja) * 2008-09-25 2010-04-08 Taiyo Nippon Sanso Corp 不純希ガスの処理方法
US8679239B2 (en) 2009-09-09 2014-03-25 Panasonic Corporation Adsorbent material and xenon adsorption device using same
WO2011030514A1 (ja) * 2009-09-09 2011-03-17 パナソニック株式会社 キセノン回収方法
WO2011030513A1 (ja) * 2009-09-09 2011-03-17 パナソニック株式会社 吸着材およびそれを用いたキセノン吸着デバイス
JP2011057491A (ja) * 2009-09-09 2011-03-24 Panasonic Corp ガス回収方法
CN102482088A (zh) * 2009-09-09 2012-05-30 松下电器产业株式会社 吸附材料和使用该吸附材料的氙吸附设备
CN102482089A (zh) * 2009-09-09 2012-05-30 松下电器产业株式会社 氙回收方法
EP2476645A4 (en) * 2009-09-09 2012-10-31 Panasonic Corp ADSORPTION MATERIAL AND XENON ADSORPTION DEVICE WITH IT
EP2476646A4 (en) * 2009-09-09 2012-10-31 Panasonic Corp METHOD FOR XENON RECOVERY
US8679229B2 (en) 2009-09-09 2014-03-25 Panasonic Corporation Method for recovering xenon
JP2011088773A (ja) * 2009-10-22 2011-05-06 Panasonic Corp ガス吸着デバイスおよびガス回収方法
JP2017080665A (ja) * 2015-10-27 2017-05-18 大陽日酸株式会社 吸着剤、吸着剤の製造方法、一酸化炭素除去装置、および一酸化炭素除去方法
JP2024519686A (ja) * 2021-05-11 2024-05-21 プラクスエア・テクノロジー・インコーポレイテッド エッチングチャンバを出るガス汚染物質流から希ガスを前処理して回収する新規な方法
JP7662823B2 (ja) 2021-05-11 2025-04-15 プラクスエア・テクノロジー・インコーポレイテッド エッチングチャンバを出るガス汚染物質流から希ガスを前処理して回収する新規な方法
CN114152487A (zh) * 2021-11-11 2022-03-08 苏州热工研究院有限公司 核设施废气中放射性惰性气体的检测装置及检测方法
CN114152487B (zh) * 2021-11-11 2023-08-22 苏州热工研究院有限公司 核设施废气中放射性惰性气体的检测装置及检测方法
CN117310011A (zh) * 2023-08-14 2023-12-29 广西电网有限责任公司南宁供电局 一种适用于sf6分解产物检测的氦离子气相色谱仪
CN117310011B (zh) * 2023-08-14 2025-12-26 广西电网有限责任公司南宁供电局 一种适用于sf6分解产物检测的氦离子气相色谱仪

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