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WO2008111165A1 - 有機膜のパターニング方法 - Google Patents

有機膜のパターニング方法 Download PDF

Info

Publication number
WO2008111165A1
WO2008111165A1 PCT/JP2007/054913 JP2007054913W WO2008111165A1 WO 2008111165 A1 WO2008111165 A1 WO 2008111165A1 JP 2007054913 W JP2007054913 W JP 2007054913W WO 2008111165 A1 WO2008111165 A1 WO 2008111165A1
Authority
WO
WIPO (PCT)
Prior art keywords
organic
film
patterning
area
organic films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/054913
Other languages
English (en)
French (fr)
Inventor
Tatsuya Yoshizawa
Takuya Hatakeyama
Kenichi Nagayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Corp filed Critical Pioneer Corp
Priority to US12/531,196 priority Critical patent/US20100087032A1/en
Priority to JP2009503807A priority patent/JP4927938B2/ja
Priority to PCT/JP2007/054913 priority patent/WO2008111165A1/ja
Publication of WO2008111165A1 publication Critical patent/WO2008111165A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

　各種有機デバイスを製造する際に好適な、新規な有機膜のパターニング方法を提供することを主たる課題とする。 　所定の領域に形成された有機膜のパターニング方法において、パターニング後に残存させるべき有機膜に対応する部分に、金属錯体を含有する有機カバー層を形成する、有機カバー層形成工程と、前記有機カバー層形成工程後、有機カバー層の上部からプラズマを照射することにより、前記有機膜における有機カバー層が形成されていない部分をエッチングする、プラズマエッチング工程と、を含むようにする。
PCT/JP2007/054913 2007-03-13 2007-03-13 有機膜のパターニング方法 Ceased WO2008111165A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/531,196 US20100087032A1 (en) 2007-03-13 2007-03-13 Method for patterning of organic film
JP2009503807A JP4927938B2 (ja) 2007-03-13 2007-03-13 有機膜のパターニング方法
PCT/JP2007/054913 WO2008111165A1 (ja) 2007-03-13 2007-03-13 有機膜のパターニング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/054913 WO2008111165A1 (ja) 2007-03-13 2007-03-13 有機膜のパターニング方法

Publications (1)

Publication Number Publication Date
WO2008111165A1 true WO2008111165A1 (ja) 2008-09-18

Family

ID=39759116

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/054913 Ceased WO2008111165A1 (ja) 2007-03-13 2007-03-13 有機膜のパターニング方法

Country Status (3)

Country Link
US (1) US20100087032A1 (ja)
JP (1) JP4927938B2 (ja)
WO (1) WO2008111165A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011151313A (ja) * 2010-01-25 2011-08-04 Nissha Printing Co Ltd 有機薄膜太陽電池およびその製造方法（２）
JP2011151312A (ja) * 2010-01-25 2011-08-04 Nissha Printing Co Ltd 有機薄膜太陽電池およびその製造方法（１）
JP2012238578A (ja) * 2011-04-27 2012-12-06 Canon Inc 有機ｅｌ表示装置の製造方法、電子機器

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2977720A1 (fr) * 2011-07-08 2013-01-11 Commissariat Energie Atomique Dispositif optoelectronique organique et son procede d'encapsulation.
KR102029471B1 (ko) * 2013-01-08 2019-10-07 삼성전기주식회사 정전 방전 보호 소자 및 이를 구비하는 칩 부품
CN115672602A (zh) * 2022-09-21 2023-02-03 中芯热成科技(北京)有限责任公司 喷涂装置、方法、胶体量子点薄膜、器件及其制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002208482A (ja) * 2001-01-11 2002-07-26 Sharp Corp 有機エレクトロルミネッセンス素子およびその製造方法
WO2004110105A1 (ja) * 2003-06-06 2004-12-16 Pioneer Corporation 有機半導体素子及びその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5948570A (en) * 1995-05-26 1999-09-07 Lucent Technologies Inc. Process for dry lithographic etching
US6087270A (en) * 1998-06-18 2000-07-11 Micron Technology, Inc. Method of patterning substrates
JP4095763B2 (ja) * 2000-09-06 2008-06-04 株式会社ルネサステクノロジ 半導体装置及びその製造方法
US7223691B2 (en) * 2004-10-14 2007-05-29 International Business Machines Corporation Method of forming low resistance and reliable via in inter-level dielectric interconnect

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002208482A (ja) * 2001-01-11 2002-07-26 Sharp Corp 有機エレクトロルミネッセンス素子およびその製造方法
WO2004110105A1 (ja) * 2003-06-06 2004-12-16 Pioneer Corporation 有機半導体素子及びその製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011151313A (ja) * 2010-01-25 2011-08-04 Nissha Printing Co Ltd 有機薄膜太陽電池およびその製造方法（２）
JP2011151312A (ja) * 2010-01-25 2011-08-04 Nissha Printing Co Ltd 有機薄膜太陽電池およびその製造方法（１）
JP2012238578A (ja) * 2011-04-27 2012-12-06 Canon Inc 有機ｅｌ表示装置の製造方法、電子機器

Also Published As

Publication number Publication date
US20100087032A1 (en) 2010-04-08
JPWO2008111165A1 (ja) 2010-06-24
JP4927938B2 (ja) 2012-05-09

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