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WO2008104393A3 - Vorrichtung zur feldemission von teilchen und verfahren zur herstellung - Google Patents

Vorrichtung zur feldemission von teilchen und verfahren zur herstellung Download PDF

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Publication number
WO2008104393A3
WO2008104393A3 PCT/EP2008/001583 EP2008001583W WO2008104393A3 WO 2008104393 A3 WO2008104393 A3 WO 2008104393A3 EP 2008001583 W EP2008001583 W EP 2008001583W WO 2008104393 A3 WO2008104393 A3 WO 2008104393A3
Authority
WO
WIPO (PCT)
Prior art keywords
emitter
particle
particles
vacuum space
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2008/001583
Other languages
English (en)
French (fr)
Other versions
WO2008104393A2 (de
Inventor
Josef Sellmair
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to US12/449,919 priority Critical patent/US8242674B2/en
Priority to JP2009551138A priority patent/JP5239026B2/ja
Publication of WO2008104393A2 publication Critical patent/WO2008104393A2/de
Publication of WO2008104393A3 publication Critical patent/WO2008104393A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/143—Permanent magnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06375—Arrangement of electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H01J2237/0807—Gas field ion sources [GFIS]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/14—Lenses magnetic
    • H01J2237/142—Lenses magnetic with superconducting coils

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

Die Erfindung betrifft eine Vorrichtung und ein Verfahren zur Herstellung einer Vorrichtung zur thermisch induzierten Feldemission von Teilchen für teilchenoptische Geräte wie insbesondere Elektronen- oder Ionenmikroskope, mit wenigstens einem in einem Vakuumraum (2) angeordneten bzw. in einen Vakuumraum (2) zeigenden Teilchenemitter (3) mit wenigstens einer Feldemitterspitze (4) zur Emission der Teilchen, und einer dem wenigstens einen Teilchenemitter (3) zugeordneten Magnetfelderzeuger (6) zur Fokussierung des emittierten Teilchenstroms (5), wobei der Teilchenemitter (3) mit seiner Feldemitterspitze (4) durch auf bzw. in der Oberfläche (7) auf der dem Magnetfelderzeuger (6) abgewandten Seite eines Substrates (8) gefertigte Emitterstrukturen (9) ausgebildet ist, und das Substrat (8) als Trennwandung zwischen dem Vakuumraum (2) und dem außerhalb des Vakuumraumes (2) liegenden Atmosphärenraum (10) ausgebildet ist, und der Magnetfelderzeuger (6) außerhalb des Vakuumraums (2) auf der den Emitterstrukturen (9) abgewandten Seite (14) des Substrates (8) angeordnet ist.
PCT/EP2008/001583 2007-03-01 2008-02-28 Vorrichtung zur feldemission von teilchen und verfahren zur herstellung Ceased WO2008104393A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/449,919 US8242674B2 (en) 2007-03-01 2008-02-28 Device for the field emission of particles and production method
JP2009551138A JP5239026B2 (ja) 2007-03-01 2008-02-28 粒子を電界放出する装置および製作方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007010463A DE102007010463B4 (de) 2007-03-01 2007-03-01 Vorrichtung zur Feldemission von Teilchen
DE102007010463.6 2007-03-01

Publications (2)

Publication Number Publication Date
WO2008104393A2 WO2008104393A2 (de) 2008-09-04
WO2008104393A3 true WO2008104393A3 (de) 2009-03-26

Family

ID=39563353

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2008/001583 Ceased WO2008104393A2 (de) 2007-03-01 2008-02-28 Vorrichtung zur feldemission von teilchen und verfahren zur herstellung

Country Status (4)

Country Link
US (1) US8242674B2 (de)
JP (1) JP5239026B2 (de)
DE (1) DE102007010463B4 (de)
WO (1) WO2008104393A2 (de)

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DE102006040308A1 (de) * 2006-07-06 2008-01-31 Carl Zeiss Nts Gmbh Verfahren und Vorrichtung zur Erzeugung eines Bildes
DE102008049654B4 (de) 2008-09-30 2024-08-01 Carl Zeiss Microscopy Gmbh Elektronenstrahlquelle, Elektronenstrahlsystem mit derselben, Verfahren zur Herstellung der Elektronenstrahlquelle sowie deren Verwendung
US8575867B2 (en) * 2008-12-05 2013-11-05 Cornell University Electric field-guided particle accelerator, method, and applications
US8536773B2 (en) 2011-03-30 2013-09-17 Carl Zeiss Microscopy Gmbh Electron beam source and method of manufacturing the same
US8810131B2 (en) 2011-12-29 2014-08-19 Elwha Llc Field emission device with AC output
US8575842B2 (en) 2011-12-29 2013-11-05 Elwha Llc Field emission device
US9349562B2 (en) 2011-12-29 2016-05-24 Elwha Llc Field emission device with AC output
US9646798B2 (en) 2011-12-29 2017-05-09 Elwha Llc Electronic device graphene grid
US8928228B2 (en) 2011-12-29 2015-01-06 Elwha Llc Embodiments of a field emission device
US8946992B2 (en) 2011-12-29 2015-02-03 Elwha Llc Anode with suppressor grid
US8970113B2 (en) 2011-12-29 2015-03-03 Elwha Llc Time-varying field emission device
US9018861B2 (en) 2011-12-29 2015-04-28 Elwha Llc Performance optimization of a field emission device
US8810161B2 (en) 2011-12-29 2014-08-19 Elwha Llc Addressable array of field emission devices
US9171690B2 (en) 2011-12-29 2015-10-27 Elwha Llc Variable field emission device
US8692226B2 (en) 2011-12-29 2014-04-08 Elwha Llc Materials and configurations of a field emission device
WO2013163439A1 (en) * 2012-04-26 2013-10-31 Elwha Llc Variable field emission device
US9659735B2 (en) 2012-09-12 2017-05-23 Elwha Llc Applications of graphene grids in vacuum electronics
US9659734B2 (en) 2012-09-12 2017-05-23 Elwha Llc Electronic device multi-layer graphene grid
US9793089B2 (en) * 2013-09-16 2017-10-17 Kla-Tencor Corporation Electron emitter device with integrated multi-pole electrode structure
US9478390B2 (en) * 2014-06-30 2016-10-25 Fei Company Integrated light optics and gas delivery in a charged particle lens
TWI502616B (zh) * 2014-08-08 2015-10-01 Nat Univ Tsing Hua 桌上型電子顯微鏡以及其廣域可調式磁透鏡
US9799484B2 (en) * 2014-12-09 2017-10-24 Hermes Microvision, Inc. Charged particle source

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Also Published As

Publication number Publication date
JP2010520581A (ja) 2010-06-10
DE102007010463B4 (de) 2010-08-26
US20100090579A1 (en) 2010-04-15
US8242674B2 (en) 2012-08-14
WO2008104393A2 (de) 2008-09-04
DE102007010463A1 (de) 2008-09-04
JP5239026B2 (ja) 2013-07-17

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