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WO2008149824A1 - Dlc-coated tool - Google Patents

Dlc-coated tool Download PDF

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Publication number
WO2008149824A1
WO2008149824A1 PCT/JP2008/060089 JP2008060089W WO2008149824A1 WO 2008149824 A1 WO2008149824 A1 WO 2008149824A1 JP 2008060089 W JP2008060089 W JP 2008060089W WO 2008149824 A1 WO2008149824 A1 WO 2008149824A1
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WO
WIPO (PCT)
Prior art keywords
film
dlc
coated tool
ratio
dlc film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/060089
Other languages
French (fr)
Japanese (ja)
Inventor
Hirofumi Takikawa
Yushi Hasegawa
Makoto Taki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ONWARD CERAMIC COATING CO Ltd
Toyohashi University of Technology NUC
Original Assignee
ONWARD CERAMIC COATING CO Ltd
Toyohashi University of Technology NUC
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Filing date
Publication date
Application filed by ONWARD CERAMIC COATING CO Ltd, Toyohashi University of Technology NUC filed Critical ONWARD CERAMIC COATING CO Ltd
Publication of WO2008149824A1 publication Critical patent/WO2008149824A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0605Carbon

Definitions

  • the present invention provides a cutting edge replacement used as a so-called cutting tool such as a turning tool (such as a byte or an end mill), a turning tool (such as a milling tool), or a drilling tool (such as a drill or reamer).
  • a cutting tool such as a turning tool (such as a byte or an end mill), a turning tool (such as a milling tool), or a drilling tool (such as a drill or reamer).
  • Cutting tools cutting of objects in a broad sense ⁇
  • Cutting tools used for cutting cutters, knives, slitters, saw blades, etc.
  • molding tools punches, dies, etc.
  • wear resistance on the surface The present invention relates to a tool and a member formed with a DLC film having anti-adhesion properties.
  • DLC coated tool having an amorphous carbon film (diamond-like carbon: hereinafter abbreviated as “DLC”) has been studied. '
  • DLC film contains a lot of sp 2 component depending on the ratio of sp 2 (graphite structure) component to sp 3 (diamond structure) component and whether it contains hydrogen (H) a — C ((amorphous C arbon; 3 ) Contains many 3 components & - ⁇ (te t. participatR_a_h..e.flower Dera 1 amorphous carbon), each containing H-containing a — C: Classified into 4 types, H and ta_C. Of these, a—C: H has already been put to practical use as a hard protective coating for dies and cutting tools as conventional DLC. DL
  • C is sometimes called i — C (i-carbon).
  • DLC (a-C: H) film formation is mainly performed by the following method using a hydrocarbon gas as a raw material, that is, an ion source method in which a raw gas is decomposed into a plasma using a hot filament.
  • a hydrocarbon gas as a raw material
  • an ion source method in which a raw gas is decomposed into a plasma using a hot filament.
  • Physical vapor deposition method A type of PVD method
  • Plasma CVD method that decomposes source gas by direct current or high frequency plasma
  • Plasma ion implantation deposition method etc. are used.
  • the sputtering method or vacuum arc method forms a DLC film (ta — C, a-C) that does not contain hydrogen because the film is formed using solid graphite as a raw material.
  • the vacuum arc method does not require a process gas and the ionization rate of the raw material is high, so it is considered that a film having high density and high adhesion can be formed.
  • Patent Documents 1 and 2 Hydrogen-free hydrogen-free DLC-coated tools are disclosed in Patent Documents 1 and 2, and Patent Document 1 describes excellent adhesion resistance, adhesion resistance, and resistance in cutting aluminum alloys and the like. It is said to show weldability.
  • Patent Document 2 the indentation recovery rate by the nanoindentation method is 0.9 or less, the density is 3.0 g / cm 3 or less, and the film thickness is 0.18 m or less. There is a description that chipping occurs.
  • Patent No. 3 7 1 8 6 6 4 Specification Japanese Unexamined Patent Publication No. 2 0 0 5-2 2 0 7 3
  • the present invention has been made in order to solve such a problem in a tool for a non-ferrous metal material having a relatively hard hardness.
  • the object of the present invention is to provide a non-ferrous metal such as aluminum, titanium, magnesium or copper. Or, when cutting these alloys, organic materials, materials containing hard particles, printed circuit boards, or mixed members of ferrous materials and soft metals, without causing defects such as chipping,
  • the aim is to provide a DLC coated tool that exhibits high wear resistance and low cutting resistance.
  • the present inventors have repeatedly conducted intensive studies on the types of DLC, the film surface shape, the film properties, the film formation method, the film formation conditions, etc.
  • the inventors have found an appropriate range of physical properties such as surface smoothness, density and hardness as a DLC film coated on the tool surface, and have completed the present invention.
  • the present invention is based on the above knowledge, and the DLC-coated tool of the present invention is formed by forming a DLC film substantially free of hydrogen on a substrate, and the density of the DLC film is 3 0 to 3.4 g Z cm 3 , Nano indentation hardness is 40 to 10 OGP a or less and needle tip curvature radius is 2 ⁇ m.
  • the ratio AR a Z t (
  • Z t) is 0.0.5
  • the ratio s / t to the film thickness t of the occupying area ratio s of unevenness due to adhesion and Z or desorption of foreign particles on the surface of the DLC film is not more than 0.01 (% / nm). It is characterized by. Brief Description of Drawings
  • Figures 1 (a) to 1 (c) are FE-SEM images comparing the surface shapes of DLC films deposited by T_FAD, NFA, and conventional FAD.
  • Fig. 2 is a graph showing the relationship between the hardness and Young's modulus of DLC films formed by various deposition methods.
  • Fig. 3 is a graph showing the relationship between the film thickness and warpage of a thin plate test piece having a DLC film formed by various film forming methods.
  • FIG. 4 is a graph showing a comparison of changes in surface roughness when a DLC film formed by T-F AD and PECC VD is held at a high temperature.
  • FIG. 5 is a graph showing an example of a Raman spectrum obtained by a He—N e laser with a wavelength of 63.2.8 nm of a DLC film formed by T-F AD.
  • FIG. 6 is an explanatory diagram showing the definition of the chip curl radius and the measuring procedure.
  • Figures 7 (a) to (c) are photographs showing the appearance of typical chips obtained by the cutting test of the example.
  • DLC coated tool of the present invention will be described in more detail, including its manufacturing method.
  • the DLC-coated tool of the present invention is formed by forming a DLC film substantially free of hydrogen on a substrate, and the density of the DLC film is 3.0 to 3.4 g Z cm 3 ,
  • the ratio s / t to the film thickness t of the uneven area ratio s due to adhesion and Z or desorption of foreign particles on the surface of the DLC film is less than 0.1 (% / nm). For example, it can be used for cutting non-ferrous metal alloys, organic materials, and materials containing hard particles.
  • the DLC coated tool of the present invention includes not only an integrated tool but also a blade-tip replaceable tip.
  • the DLC film coating treatment may be applied to at least the portion corresponding to the cutting edge of the base material in the cutting tool. In forming tools, it is sufficient that at least the part corresponding to the molding surface of the equipment is coated with a DLC film.
  • the DLC film used in the DLC-coated tool of the present invention is substantially free of hydrogen, but in the present invention, “substantially free of hydrogen” means that a gas containing hydrogen is intentionally contained in the process chamber. It means that the film was not introduced into the film. However, originally the inner wall and electrode of the vacuum chamber It is difficult to completely eliminate the hydrogen content because gas, dust, or water adhering to and adsorbing on the inside (and inner wall) may be desorbed during the process and mixed into the membrane. The degree is usually 5 atomic% or less.
  • the gas and moisture in the chamber inner wall and electrode heat the chamber to 100 ° C or higher, or empty the vacuum arc plasma before the film formation process (to generate plasma without film formation. Do not form a film with a shutter, or go straight without bending the plasma.
  • vacuum arc plasma blanking is effective for removing impurity gas by the getter action, raising the degree of vacuum (lowering pressure), and obtaining a clean process space.
  • the hydrogen content of the DLC film can be measured by, for example, glow discharge emission spectrometry (G D O E S) or elastic recoil particle detection (E R D A).
  • G D O E S glow discharge emission spectrometry
  • E R D A elastic recoil particle detection
  • the coating is processed in the depth direction of the coating by performing high-frequency sputtering of the coating in the Ar glow discharge region and spectroscopically analyzing the radiation from the sputtered atoms.
  • This is a method for elemental analysis. Although it is difficult to measure hydrogen quantitatively by this method, it is possible to know the relative change in the depth direction of the film.
  • the elastic recoil detection method is a method that measures the energy spectrum of atoms ejected from the surface by entering He ions or H ions at a low angle. Yes, it is one of the few measurement methods that can accurately measure light elements that are difficult to accurately measure by enabling the quantitative analysis of hydrogen by standardizing the spectrum of an arbitrary sample.
  • the present inventors have repeatedly investigated the smoothness of the DLC film-forming surface using various film-forming devices.
  • the main cause of the deterioration of the smoothness of the film-forming surface is a by-product from the cathode when the plasma occurs.
  • the cathode material particles (hereinafter referred to as “droplets”) are found to be found.
  • vacuum arc plasma constituent particles such as cathode material ions, electrons, and negative material neutral particles (atoms and molecules) are emitted from the cathode spot, and at the same time, the size is from submicron up to several hundred micron.
  • the uniformity and flatness of the DLC film formed on the substrate surface are greatly impaired.
  • the DLC-coated tool of the present invention is a DLC film made of ta-C having substantially a predetermined density and a predetermined hardness without substantially containing hydrogen, before and after the film formation per film thickness.
  • a DLC film having a very smooth surface shape defined by the amount of change in roughness and the occupied area ratio of irregularities is provided on the substrate.
  • Such a smooth DLC film has a droplet on the generated film.
  • foreign particle mainly means droplets, but it cannot be said that dust or the like does not adhere during handling other than this, and includes these dust particles. Called “foreign particles” To do.
  • a filtered arc neutral apparatus is used by using a filtered arc deposition apparatus connected to a film forming process chamber from a plasma source through a plasma magnetic transport duct.
  • This filtered arc vapor deposition system can prevent particles from entering as much as possible, so that the solid droplet emitted from the graphite arc cathode can be trapped and removed at the position facing the cathode.
  • It is desirable to have a let-collecting function for example, a T-shaped filter door evaporation system (see T 1 FAD: Patent No. 3 8 6 5 5 70) and an X-shaped filtered arc evaporation system ( JP, 2007-07-930, A) can be used.
  • the droplets as described above exist on the surface of the non-DLC film formed by the vacuum arc deposition method.
  • the droplet taken into the film increases in proportion to the DLC film thickness.
  • This drop rate in the film lowers the toughness of the film and causes stripping wear, so the higher the film thickness and the higher the interface stress, the smaller the drop rate in the film.
  • Thickening is effective for improving wear resistance as a coating film for tools, but in addition to the problems described above, the surface becomes rough and cutting resistance increases.
  • the droplet can be removed by polishing after film formation, and the smoothness can be increased, but the hole from which the droplet has been removed remains.
  • this recess also tends to cause peeling, and also increases the coefficient of friction, so it is desirable to reduce this as much as possible.
  • the evaluation of droplet size should be based on the volume density (l Z rn 3 ) occupied by the droplet relative to the membrane volume. However, since the expected film thickness ( ⁇ 1 m) and the size of the droplets are almost the same, the number of droplets on the surface, the amount of change in roughness, the area occupied by the droplets, etc. The value divided by the film thickness can be fully evaluated.
  • the size of foreign particles such as droplets on the surface is also important, and the ratio of the occupied area ratio S of unevenness to the film thickness t due to these must be less than 0.01 (% / nm).
  • the ratio S / t exceeds 0.01, there are too many droplets in the film, that is, the volume density (1 / m 3 ) occupied by the droplets in the film is high. Too much hardness and elasticity cannot be obtained, resulting in inconvenience that sufficient wear resistance and durability cannot be obtained as a coating for a tool.
  • the occupied area of the unevenness can be evaluated by observing F ⁇ — S K (F i 1 ed E m i s s i o n — S c a n i n g E l c ct ron M ic c o p e), which is superior in resolution to ordinary SEM.
  • FIGS 1 (a) to (c) show the T-shaped filtered arc deposition system (T-F).
  • DLC film irregularities are mainly caused by droplet adhesion and removal, but also dust adhesion and desorption during substrate handling is a secondary cause of DLC film irregularities. Needless to say. Therefore, when practicing the present invention, as a method for reducing the number of irregularities in the DLC film, the substrate should be thoroughly cleaned and the inside of the filtered arc vapor deposition apparatus.
  • baffles and orifice plates are provided in the plasma magnetic transport duct, and the anode shape is changed to recover the reflection direction of the drop rate.
  • Device control such as directing to the duct, and plasma control such as bending the plasma that has entered the process chamber by an electromagnetic field and forming a film at a position offset from the plasma entrance axis
  • the DLC film formed on the DLC-coated tool of the present invention has a density of 3.0 to 3.4 g / cm 3 , and exhibits good characteristics in application in this region, and the density is high. Is more preferred.
  • the density of diamond is 3.5 2 g Z cm 3 , and in conventional hydrogen-free DLC, when the density exceeds 3. O g / c ra 3 , the hardness increases and the compressive stress remaining inside It was thought that the adhesion to the base material was impaired and the film was easily peeled off. In addition, since the stress at the interface is proportional to the film thickness, even when the film thickness is increased, it is easy to peel off for the same reason.
  • the DLC film according to the present invention can simultaneously achieve high density, high hardness, high elastic modulus, and high adhesion, and this is because there are very few mechanically weak drop plates in the film, and the drop rate. It is thought that this was realized because there were very few concave defects caused by the desorption or removal of. In other words, many droplets have a glassy carbon or microcrystalline graphite structure, and their density is significantly lower than that of diamond. For this reason, the density becomes 3. Og / cm 3 or more only when the number density of droplets in the film is sufficiently low.
  • the density of such a DLC film can be obtained, for example, by X-ray reflectometry (XRR).
  • the hardness of the DLC film formed on the DLC-coated tool of the present invention must be in the range of 40 to 100 GPa as measured by the nanoindentation method. There is. That is, if the nanoindentation hardness is less than 40 GPa, there is a problem with wear resistance because of insufficient hardness, while if it exceeds OOGPa, diamond crystallization begins, and the diamond Crystallization increases the surface roughness and increases the coefficient of friction, which is undesirable.
  • the nano-indentation method is a type of hardness test, in which a displacement gauge is installed in the indenter drive section and the indentation depth is continuously measured to determine the hardness and Young's modulus. This is a technique with extremely low weight of about 0.1 mN to lN, and capable of accurate measurement even at an indentation depth of 100 nm or less.
  • the microphone mouth Vickers hardness meter or Knoop hardness meter that can only evaluate the hardness after plastic deformation is accurate. Cannot be evaluated.
  • the DLC used in the present invention has a very high Young's modulus, which is as high as 400 to 90 GPa.
  • Figure 2 shows a cemented carbide containing a WC average particle size of 0.8 ⁇ m, Co content of 10% by weight and 0.3% by weight of Cr on a mirror-finished substrate.
  • the graph shows the relationship between the hardness and Young's modulus of a DLC film formed to a thickness of 700 nm to 100 nm by various film forming methods.
  • T-shaped filtered arc deposition T-FAD
  • the DLC film produced by HI exceeds the conventional hydrogen-free DLC, and has the second highest hardness and high elastic modulus after diamond, indicating that it has high wear resistance. In addition, because of its high modulus of elasticity, the film can follow the substrate and wear such as chipping. It has become difficult.
  • ENT-1100 type nanoindenter device was used, test load: 9.8 mN, load step: 0.98 mN, load removal speed: 0.98 NZm sec, measurement Number: The condition of 10 points was adopted.
  • the surface area ratio s of the surface of the DLC film in the DLC coated tool of the present invention must be less than the ratio s / t force S 0.01 (% / nm) to the film thickness t (nm).
  • the number of protrusions is the ratio N p Z t of the number N p (unit mm 2 ) to the film thickness t (mm) with a diameter of 0.1 lm or more per unit area. 1.5 1 0 8 (pieces / / 1 1 1111 3) or less is desirable.
  • the ratio N h Z t to the film thickness t (mm) of the number N h (piece Zmm 2 ) with a diameter per unit area of 0. ⁇ ⁇ ⁇ or more is 1.0 X 1 0 8 ( Pieces / mm 3 ) or less. If this ratio N h / t exceeds the above value, the resistance to elastic deformation in the transverse direction of the film will be insufficient, which will cause peeling due to the film splitting. If a part of the film is peeled off, the work piece will adhere to the weld, which causes pinning of the tool, which may lead to tool wear and damage. In addition, the number of irregularities and occupied surface The lower the product, the better.
  • the thickness of the DLC film formed on the tool substrate is preferably in the range of 10 nm to l ⁇ m. This is the minimum requirement for completely covering the tool.
  • the film thickness is 10 nm and the film thickness is increased to more than 1 ⁇ , foreign particles such as droplets taken into the film increase, resulting in a decrease in surface smoothness and performance. By lowering.
  • the film thickness is thin, and the force S that it is described that chipping or the like of the cutting edge is likely to occur at a film thickness of 0.18 / m or more is described in the examples described later.
  • a film thickness of 0.2 111 or more shows excellent cutting performance, especially when Si is added. The force that has been confirmed to be prominent in the cutting of relatively hard aluminum alloys has not yet been clarified.
  • the D L C film in the D L C coated tool of the present invention has a very high density as described above, a very high internal stress acts on the inside of the film. This has the advantage of suppressing the propagation of cracks as a DLC film for general tools, but if the internal stress is too high, it will cause insufficient film adhesion and cause defects such as chipping. . However, in the DLC film used in the present invention, both high adhesion and high internal stress are compatible, and there is no fear of such defects.
  • the thickness is the thickness
  • Z7 is the total thickness
  • L is the length of the specimen
  • is the warp (difference between the warp before and after film formation).
  • the ratio y / x of the film thickness x (m) to the warp y ( ⁇ m) of the test piece is 4.0 or more and 9.0 or less.
  • the above region is in the range of 6 GPa or more and 14 GPa or less when converted to the internal stress of the DLC film. .
  • the X-ray stress measurement of the test piece was performed using an X-ray micro part stress measuring machine. Because DLC is amorphous, DLC itself cannot evaluate the buttocks stress with X-rays, but DLC used in the present invention is extremely stressful, so it is possible to measure the stress applied to the substrate side. Combined with the above test piece measurement results, the stress of the film can be estimated.
  • the principle of stress measurement by X-ray is that metal materials are within the elastic limit due to external force.
  • the crystal lattice spacing (d value) force S shifts in proportion to the magnitude of the stress.
  • the angle ⁇ between the sample surface normal N and the lattice plane normal N ′ is changed and the change in the diffraction angle (2 ⁇ ) is examined, the stress ⁇ can be obtained by the following equation (2).
  • K stress constant
  • the measured value was the peak of WC in the base material, and it does not include the part of the C ⁇ binder included in the ultrafine carbide substrate.
  • the stress of the substrate is proportional to the total stress of the film, and is considered to increase in proportion to the film thickness.
  • the stress applied to the W C crystal is considered to be basically proportional, although the substrate contains relatively soft C ⁇ serving as a binder. Even in the case of an iron-based substrate, the internal stress can be estimated by the same method.
  • the amount of change in the arithmetic average roughness Ra of the DLC film after holding for 1 hour in the atmosphere at 60 ° C is 0.05 ⁇ m or less.
  • Fig. 4 shows that the WC average particle size is 0.8 ⁇ m and the Co content is 10 weights. /.
  • the Cr content is 0.3 wt. / 0
  • Carbide specimen with mirror finish made of residual WC is used as a base material, and T-shaped filtered arc deposition (T-F AD) and plasma C VD (PEC VD) After coating with DLC, hold it in the atmosphere at each temperature from 20 ° C to 100 ° C at 60 ° C for 1 hour, return to room temperature after heating, and then surface each film The result of measuring the shape is shown in comparison with the non-coated case.
  • T-F AD T-shaped filtered arc deposition
  • PEC VD plasma C VD
  • the DLC film formed by the T-shaped filtered arc deposition method shows almost no change, whereas the uncoated specimen and the sample coated with DLC by the plasma CVD method are super
  • the result was that the hard substrate carbon was desorbed and the surface was rough.
  • the PECVD method contains hydrogen in the film, which is to detach from 5 0 0 D C before and after film is destroyed.
  • the base material was in contact with air and showed the same change as untreated.
  • the DLC film by T-shaped filtered arc deposition shows high heat resistance, and a slight residual drop rate burns and the degree of smoothness changes slightly. But it showed no abnormality.
  • the tool coating When applied to a cutting tool, it is extremely important that the tool coating is able to withstand the temperature rise of the cutting edge, especially in dry cutting.
  • melting In the case of aluminum alloy, melting is usually said to start at about 60 ° C, and the cutting edge is considered to have risen locally to this temperature. Therefore, a tool with a DLC film that can withstand temperatures of 600 ° C is extremely effective as a non-lubricated (dry) aluminum alloy cutting tool.
  • the peak energy of the plasmon loss spectrum of the DLC film formed on the substrate surface is 29 to 33 eV.
  • the plasmon excitation spectrum can be measured by electron energy loss spectroscopy (E E L S: E l e c t r n E n e r g y—L o ss S p c t r o s copy).
  • E E L S means that when electrons with energy of several hundred eV are incident on the sample surface, the incident electrons depend on the electron density of the solid and the arrangement of atoms.
  • the spectrum measured by EELS is called the EELS spectrum, and the spectrum due to plasmon excitation caused by the collective oscillation of free electrons appearing in the range of 10 to 50 eV is the plasmon excitation spectrum. Toru is called.
  • the peak position of the plasmon excitation spectrum is the square root of the electron density.
  • the peak position of the plasmon excitation spectrum being 28-33 keV indicates a high-density film. Since the peak positions of the plasmon excitation spectra of the graph and diamond are 26 eV and 33.7 eV, respectively, impurities such as hydrogen and relatively low-density impurities can be used. Do not include a droplet Only in the case of DLC, the peak position of the plasmon excitation spectrum is 29-33 keV. Furthermore, the higher this value is, the higher the density is, and it is suitable as the DLC of the present invention, which can obtain a sufficient hardness as a tool coating.
  • the DLC film formed on the surface of the base material is a Raman spectroscopic spectrum using a laser having a wavelength of 6 32.8 nm. It has a characteristic band with a peak between 200 cm- 1 and the area intensity ratio of D and G is less than 0.8, and the peak intensity ratio between the characteristic band and D band The area intensity ratio is preferably 0.15 or more.
  • Fig. 5 shows the Raman spectrum of a DLC film by T-shaped filtered arc deposition using a He_Ne laser with a wavelength of 6 32.8 nm.
  • S band J a new characteristic band having a peak in the vicinity of 1 0 0 c in— 1 appears.
  • S 40-: LOOGP a which is nothing but a DLC film having a density of 3.0-3.4 g / cm 3 .
  • a typical example of the substrate in the DLC-coated tool of the present invention is a WC-based carbide substrate.
  • This WC cemented carbide is composed of a hard phase mainly composed of tungsten carbide (WC) and a binder phase mainly composed of an iron group metal such as cobalt.
  • the DLC film applied to the present invention has the second highest elastic modulus after diamond, it can also be applied to ultra-fine carbide substrate with a large amount of cobalt having high toughness, which has been difficult in the past.
  • the cobalt content of the base material exhibiting stable adhesion without peeling off such a DLC film is 0 to 25% by mass, more preferably 5 to 15%.
  • WC average particle size is It is preferably 1.5 ⁇ or less.
  • the base material used in the tool of the present invention is not limited to cemented carbide, but is a kind of iron-based alloy, high-speed steel defined in JISG 440.3, carbon tool steel (JISG 4 4 0 1), alloy tool steel (JISG 4 4 0 4), cermet material, c BN-containing sintered body can be coated.
  • the DLC coated tool of the present invention it is preferable to provide an intermediate layer between the substrate and the DLC film from the viewpoint of strengthening the adhesion of the DLC film.
  • a metal film, a non-metal solid film, a nitride film, a hydride film, an oxide film, or a hydride film having a thickness of 0.1 to 500 nm. Selected from the group consisting of oxycarbide film, oxyhydrocarbon film, oxynitride film, oxynitride oxyhydride film, nitrocarbide film, nitrocarbide film, oxynitride carbide film, and oxynitride oxycarbide film It is desirable to have an intermediate layer consisting of at least one of the above-mentioned intermediate layers, and between the intermediate layer and the DLC film, a chemical composition obtained by mixing the respective coating compositions or a continuously altered chemical composition. It is even more desirable to obtain a stronger adhesion by interposing the above film.
  • the intermediate layer and the DLC film are slightly mixed, and a coating layer having the above-mentioned mixed chemical composition is formed.
  • Such a mixed chemical composition layer is difficult to confirm directly, but from the results of the profile in the depth direction of the film by XPS, X-rayphoto-electronic Spectroscopy (AES), AES (Auger Electron Spectroscopy), etc. It can be estimated sufficiently.
  • the DLC coated tool of the present invention is particularly suitable for its wear resistance and adhesion resistance. Suitable for tools for machining minium and its alloys. It is also optimal to use for non-ferrous materials such as titanium, magnesium and copper and their alloys. In addition, cutting materials such as graphite and other hard particles and fibers such as glass, organic materials, printing circuit board processing and glass processing, and co-machining processing of ferrous materials and aluminum Is also effective. In addition, since the DLC film in the present invention has a very high hardness, it can be used not only for non-ferrous materials but also for processing steel products such as stainless steel.
  • the DLC-coated tool of the present invention has high cutting performance, so that it can be used for drills, end mills, end milling cutting edge replacement inserts, milling cutting edge replacement inserts, turning cutting edge replacement inserts, metal saws, It can be used for cutting tools such as toothpaste, reamer and tap. In addition, because of its excellent wear resistance and adhesion resistance, it can be used for applications such as molding punches and dies.
  • a chip substrate made of WC-based cemented carbide (Sumitomo Electric hard metal chip, model number: APET 1 6 0 5 0 8 PDFR—S, chip material: HI) with the above DLC coating
  • inventive tip and body (Sumitomo Electric End Mill, Model No .: WEM 3 0 2 5)
  • WEM 3 0 2 5 when cutting within the recommended cutting conditions specified by the manufacturing force of the base tool shown in Table 1, It was found that when the obtained chip curl radius was 0.7 times or less the chip curl radius of the same chip not treated with DLC, adhesion of aluminum to the cutting edge was difficult to occur.
  • Body model number WEM3025 (25)
  • Base material Chip model APET 160508PDFR-S Chip material: H 1 (WC-Co)
  • the chip has better curl radius depending on the friction coefficient between the cutting tool surface on the rake face side and the work material. The smaller the radius, the better. Chips also remove the heat of the cutting edge, and chip discharge is one of the important factors that determine cutting tool performance. The smaller the curl radius, the better the discharge.
  • the DLC coated tool of the present invention has high chip discharge performance even for aluminum alloys such as AC 4 A and AD C 12 to which Si has been added, which has been difficult in the past. It is desirable that the chip curl radius obtained using the tool is not more than 0.7 times the chip curl radius of the untreated DLC coated tool.
  • the starting point of the free curved surface side of the chip free curved surface is A
  • the tangent line that touches A is the X axis.
  • the cutting resistance by the DLC-coated tip of the present invention at the initial stage of cutting is the DLC.
  • the ratio of cutting force due to uncoated chips to the cutting force is 0.6 or less for the main component force, 0.7 or less for the back component force, and 0.7 or less for the resultant force of the main component, the back component force and the feed component force It is desirable to be.
  • the cutting resistance can be measured by, for example, a piezoelectric cutting dynamometer (Kistler). “Initial cutting” specifically means that the cutting length is within 0.1 m from the start of cutting.
  • a base material As a base material, prepare a base material for chips made of WC-base cemented carbide (chip made by Sumitomo Electric Hard Metal, model number: APET 1 6 0 5 0 8 PDFR—S, chip material: HI) On the substrate, a DLC film was formed using a T-shaped filtered arc vapor deposition apparatus (T-FAD), and Samples 1 to 5 corresponding to the product of the present invention were produced.
  • T-FAD T-shaped filtered arc vapor deposition apparatus
  • a conventional vacuum arc deposition device without a droplet filter NAF, a conventional filtered arc deposition device (formerly FAD), and a plasma CVD device (PEC VD) are used on the substrate.
  • NFA droplet filter
  • FAD filtered arc deposition device
  • PEC VD plasma CVD device
  • the DLC coated tool of the present invention shows the minimum cutting resistance from the beginning of cutting.
  • the coefficient of friction is proportional to adhesion crushing, and the adhesion width after 7 m cutting is also generally reduced in proportion to the curl radius and cutting resistance.
  • the DLC-coated tool of the present invention is superior in density, hardness, and film surface smoothness to the conventional hydrogen-free DLC film (samples 6 to 8) shown in the comparative example.
  • the conventional hydrogen-free DLC film samples 6 to 8 shown in the comparative example.
  • the DLC film formed on the grave material is substantially free of hydrogen, is a DLC film classified as ta—C having a predetermined density and nanoindentation hardness, and Ratio of change in arithmetic average roughness of film surface after film formation to DLC film thickness relative to arithmetic average roughness of substrate surface before film formation by needle-type surface shape measurement, and adhesion of foreign particles such as droplets Or due to omission
  • the ratio of the uneven area on the surface of the DLC film and the film thickness ratio were specified to make the surface smoothness limit value, or the DLC film formed on the substrate had a wavelength of 6 3 2.8 nm
  • the Raman spectroscopic spectrum using a laser has a characteristic band with a peak between 1 0 0 0 and 1 2 0 0 cm— 1 and the area intensity ratio between the D and G bands is both It is assumed that the peak intensity ratio and area intensity ratio between the characteristic band and the D band are 0.15 or more because of high wear resistance and low cutting resistance. It can

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Abstract

A DLC-coated tool produced by forming a substantially hydrogen-free DLC film on a substrate, wherein the DLC film has a density of 3.0 to 3.4g/cm3 and a nanoindentation hardness of 40 to 100GPa and wherein in the surface scanning test with a stylus type surface profile measuring apparatus provided with a stylus whose point has a radius of curvature of 2μm at a measurement feed of 0.01mm, the ratio of the absolute value of a difference between the arithmetic mean surface roughness of the substrate before film formation and the arithmetic mean roughness of the DLC film to the thickness of the DLC film, ΔRa/t, is 0.05 or below and the ratio of the occupancy area ratio (s) of convexed and recessed parts of the DLC film due to the adhesion or desorption of foreign matter to the thickness (t) of the film, s/t, is 0.01 (%/nm) or below.

Description

明細書  Specification

D L C被覆工具 技術分野  D L C Coated Tool Technical Field

本発明は、 転削工具 (バイ ト、 エン ドミルなど) 、 旋削工具 (フライ ス工具など) 、 穴あけ工具 ( ド リ ル、 リ ーマーなど) などのいわゆる切 削工具と して使用される刃先交換型切削チップ、 広い意味で物の切断 · 切削に利用される切削工具 (カッター、 ナイフ、 スリ ツター、 鋸の刃な ど) 、 成型加工工具 (パンチ、 ダイなど) の表面に耐磨耗性及ぴ耐凝着 性を有する D L C膜を形成した工具やその部材に関するものである。 背景技術  The present invention provides a cutting edge replacement used as a so-called cutting tool such as a turning tool (such as a byte or an end mill), a turning tool (such as a milling tool), or a drilling tool (such as a drill or reamer). Cutting tools, cutting of objects in a broad sense · Cutting tools used for cutting (cutters, knives, slitters, saw blades, etc.), molding tools (punches, dies, etc.) and wear resistance on the surface The present invention relates to a tool and a member formed with a DLC film having anti-adhesion properties. Background art

アルミニウム、 チタン、 マグネシウム、 銅といった非鉄金属、 有機材 料、 グラフアイ トなど硬質粒子を含有する材料などの被削材を加工する 場合、 被削材の仕上げ表面形状維持、 母材硬度維持、 寸法精度維持など を高品位に行う ことが切削工具に求められている。  When processing work materials such as non-ferrous metals such as aluminum, titanium, magnesium and copper, organic materials, materials containing hard particles such as graphite, maintaining the finished surface shape of the work material, maintaining the hardness of the base material, dimensions Cutting tools are required to maintain high accuracy and so on.

しかし、 切削工具の切刃部分に被削材が凝着して切削抵抗が大きくな り、 刃先が破損するといつた問題が生じる。 これは他の被削材に比べ、 上記被削材の場合には、 工具表面への凝着が発生し易く、 凝着による切 刃のチッビングや加工精度の低下が著しいことによるものと考えられる。 そこで、 上記のよ うな問題に対して、 非晶質炭素皮膜 (ダイヤモンド ライクカーボン : 以下、 「D L C」 と略記する。 ) を備えた D L C被覆 工具が検討されている。 '  However, when the work material adheres to the cutting edge of the cutting tool, the cutting resistance increases, and the cutting edge breaks, a problem arises. This is thought to be due to the fact that adhesion to the tool surface is more likely to occur in the case of the above-mentioned work material than in other work materials, and the chipping of the cutting edge due to adhesion and the reduction in machining accuracy are significant. . In view of the above problems, a DLC coated tool having an amorphous carbon film (diamond-like carbon: hereinafter abbreviated as “DLC”) has been studied. '

D L C膜は、 s p 2 (グラフアイ ト構造) 成分と s p 3 (ダイヤモンド 構造) 成分との比率と、 水素 (H) 含有であるかどうかにより、 s p 2成 分を多く含む a — C ( ( a m o r p h o u s C a r b o n ; ァモノレフ ァスカー ン) 3 3成分を多く含む &ー〇 ( t e t.„r_a_h..e.„d e r a 1 a m o r p h o u s C a r b o n ; テ トラへドラノレァモノレフ ァ スカーボン) 、 それぞれに Hを含んだ a — C : Hや t a _ Cの 4種類に 分類される。 これらのうち、 a — C : Hは、 従来の D L Cと して、 金型 や切削工具の硬質保護皮膜と してすでに実用化されている。 なお、 D LDLC film contains a lot of sp 2 component depending on the ratio of sp 2 (graphite structure) component to sp 3 (diamond structure) component and whether it contains hydrogen (H) a — C ((amorphous C arbon; 3 ) Contains many 3 components & -〇 (te t. „R_a_h..e.„ Dera 1 amorphous carbon), each containing H-containing a — C: Classified into 4 types, H and ta_C. Of these, a—C: H has already been put to practical use as a hard protective coating for dies and cutting tools as conventional DLC. DL

Cは i — C ( i カーボン) と呼ばれることもある。 C is sometimes called i — C (i-carbon).

従来の D L C ( a — C : H) の成膜は、 主に、 炭化水素系のガスを原 料とする次のような方法、 すなわち熱フィラメントにより原料ガスを分 解しプラズマ化するイオン源法 (物理的蒸着法 : P VD法の一種) 、 直 流や高周波プラズマなどにより原料ガスを分解するプラズマ C V D法  Conventional DLC (a-C: H) film formation is mainly performed by the following method using a hydrocarbon gas as a raw material, that is, an ion source method in which a raw gas is decomposed into a plasma using a hot filament. (Physical vapor deposition method: A type of PVD method) Plasma CVD method that decomposes source gas by direct current or high frequency plasma

(プラズマ支援 C VD法 ; P E C VD法) 、 プラズマイオン注入成膜法 などが利用されている。  (Plasma assisted C VD method; PE C VD method), plasma ion implantation deposition method, etc. are used.

しかし、 これらの方法では、 原科ガスに含まれる水素が膜中に混入し、 炭素原子間の結合の終端となるため、 硬さが低下する。  However, in these methods, hydrogen contained in the gas is mixed in the film and terminates the bond between carbon atoms, so the hardness decreases.

これに対し、 スパ ッタ法ゃ真空アーク法では、 固体グラフアイ トを原 料と して成膜するため、 膜中に水素が含まれない D L C膜 ( t a — C , a - C) を成膜することができる。 特に、 真空アーク法はプロセスガス を必要とせず、 かつ原料のイオン化率が高いため、 高密度で高い密着力 を示す膜が成膜できると考えられている。  On the other hand, the sputtering method or vacuum arc method forms a DLC film (ta — C, a-C) that does not contain hydrogen because the film is formed using solid graphite as a raw material. Can be membrane. In particular, the vacuum arc method does not require a process gas and the ionization rate of the raw material is high, so it is considered that a film having high density and high adhesion can be formed.

水素を含まない水素フ リ ー D L C被覆工具については、 特許文献 1及 び 2に開示されており、 特許文献 1には、 アルミニウム合金などの切削 において優れた耐癒着性 · 耐凝着性 · 耐溶着性を示すとされている。 一方、 特許文献 2に、 はナノインデンテーショ ン法による圧痕の回復 率が 0. 9以下、 密度が 3. 0 g / c m3以下、 膜厚が 0. 1 8 m以下 でないと刃先の欠損ゃチッビングが生じるとの記載がある。 Hydrogen-free hydrogen-free DLC-coated tools are disclosed in Patent Documents 1 and 2, and Patent Document 1 describes excellent adhesion resistance, adhesion resistance, and resistance in cutting aluminum alloys and the like. It is said to show weldability. On the other hand, in Patent Document 2, the indentation recovery rate by the nanoindentation method is 0.9 or less, the density is 3.0 g / cm 3 or less, and the film thickness is 0.18 m or less. There is a description that chipping occurs.

特許第 3 7 1 8 6 6 4明細書 特開 2 0 0 5— 2 2 0 7 3号公報 Patent No. 3 7 1 8 6 6 4 Specification Japanese Unexamined Patent Publication No. 2 0 0 5-2 2 0 7 3

近年においては、 被削材の材質として、 アルミニウム合金の中でもダ ィキャス ト用合金である S i (ケィ素) や C u (銅) が添加された A C 系の材料が増加している。  In recent years, as materials for work materials, among the aluminum alloys, there are an increasing number of A C-based materials to which Si (Cai) and Cu (Copper), which are alloys for die casting, are added.

これらのアルミニゥム合金材料は、 例えば自動車の軽量化を目的と し て、 エンジンブロックを始めとする各部への採用が増加している。 さら に、 これらの材料を繊維材料等と複合化した材料についても、 一部採用 が始まっている。  These aluminum alloy materials are increasingly being used in various parts, including engine blocks, for the purpose of reducing the weight of automobiles. In addition, some of these materials have been used in combination with fiber materials.

しかしながら、 これらのアルミニウム合金は、 硬い S iや炭素繊維を 含むため、 従来の水素フリー D L C膜では十分な硬度が得られず、 刃先 部を被覆する D L C膜が磨耗してしまい、 そこから被削材の凝着が始ま つてしまう。 このため、 A C系材料や複合材料、 銅といった比較的硬い、 非鉄金属材料の切削は、 いまだダイヤモンド工具が用いられているのが 実情である。 しかし、 このようなダイヤモンド工具は、 コーティングェ 程に費用が嵩み、 製造コス トが非常に高くなるという問題がある。 発明の開示  However, since these aluminum alloys contain hard Si and carbon fibers, the conventional hydrogen-free DLC film does not provide sufficient hardness, and the DLC film covering the blade edge wears out, so that it can be cut from there. The material starts to stick. For this reason, diamond tools are still used to cut relatively hard, non-ferrous metal materials such as AC materials, composite materials, and copper. However, such a diamond tool has a problem that the coating process is expensive and the manufacturing cost is very high. Disclosure of the invention

本発明は、 比較的硬硬度の非鉄金属材料用工具におけるこのよ うな課 題を解決するためになされたものであって、 その目的とするところは、 アルミニウム、 チタン、 マグネシウムあるいは銅などの非鉄金属、 又は これらの合金、 有機材料、 硬質粒子を含有する材料、 プリ ント回路基板、 あるいは鉄系材料と軟質金属との混合部材などを切削加工する際に、 チ ッビングなどの欠陥を生じることなく、 高い耐磨耗性を示し、 しかも切 削抵抗が低い D L C被覆工具を提供することにある。  The present invention has been made in order to solve such a problem in a tool for a non-ferrous metal material having a relatively hard hardness. The object of the present invention is to provide a non-ferrous metal such as aluminum, titanium, magnesium or copper. Or, when cutting these alloys, organic materials, materials containing hard particles, printed circuit boards, or mixed members of ferrous materials and soft metals, without causing defects such as chipping, The aim is to provide a DLC coated tool that exhibits high wear resistance and low cutting resistance.

本発明者らは、 上記課題の解決に向けて、 D L Cの種類や膜表面形状、 膜性状、 成膜方法、 成膜条件などについて、 鋭意検討を繰り返した結果、 工具表面に被覆する D L C膜としての表面平滑度や密度や硬さなどの物 性の適正範囲を見出し、 本発明を完成するに到った。 In order to solve the above problems, the present inventors have repeatedly conducted intensive studies on the types of DLC, the film surface shape, the film properties, the film formation method, the film formation conditions, etc. The inventors have found an appropriate range of physical properties such as surface smoothness, density and hardness as a DLC film coated on the tool surface, and have completed the present invention.

本発明は上記知見に基づく ものであって、 本発明の D L C被覆工具は、 基材上に実質的に水素を含まない D L C膜を形成して成るものであって、 上記 D L C膜の密度が 3. 0〜 3. 4 g Z c m3、 ナノインデンテーショ ン硬さが 4 0〜 1 0 O G P a以下であって、 針先端曲率半径 2 μ mの触 針式表面形状測定器による測定送り 0. 0 1 mmの表面走查検出におい て、 上記基材の成膜前における被成膜面の算術平均粗さ R a ( S ) に対 する D L C膜面の算術平均粗さ R a (D) の絶対値変化量 A R a ( n m) と D L C膜の膜厚 t ( n m) との比 A R a Z t (= | R a ( S ) - R a (D) | Z t ) が 0. 0 5以下、 さらに D L C膜表面における異物 粒子の付着及び Z又は脱離に起因する凸凹の占有面積率 sの膜厚 tに対 する比 s / tが 0. 0 1 ( % / n m ) 以下であることを特徴とする。 図面の簡単な説明 The present invention is based on the above knowledge, and the DLC-coated tool of the present invention is formed by forming a DLC film substantially free of hydrogen on a substrate, and the density of the DLC film is 3 0 to 3.4 g Z cm 3 , Nano indentation hardness is 40 to 10 OGP a or less and needle tip curvature radius is 2 μm. 0 In the detection of surface run of 1 mm, the arithmetic average roughness R a (D) of the DLC film surface relative to the arithmetic average roughness R a (S) The ratio AR a Z t (= | R a (S)-R a (D) | Z t) is 0.0.5 Below, the ratio s / t to the film thickness t of the occupying area ratio s of unevenness due to adhesion and Z or desorption of foreign particles on the surface of the DLC film is not more than 0.01 (% / nm). It is characterized by. Brief Description of Drawings

図 1 ( a ) 〜 ( c ) は T _ F AD、 N F A、 従来 F ADにより成膜し た D L C膜表面形状を比較して示す F E— S EM像である。  Figures 1 (a) to 1 (c) are FE-SEM images comparing the surface shapes of DLC films deposited by T_FAD, NFA, and conventional FAD.

図 2は、 各種成膜法によって形成した D L C膜の硬さとヤング率の関 係を示すグラフである。  Fig. 2 is a graph showing the relationship between the hardness and Young's modulus of DLC films formed by various deposition methods.

図 3は、 各種成膜法によって D L C膜を形成した薄板試験片における 膜厚と反り との関係を示すグラフである。  Fig. 3 is a graph showing the relationship between the film thickness and warpage of a thin plate test piece having a DLC film formed by various film forming methods.

図 4は、 T— F AD及び P E C VDにより形成した D L C膜を高温保 持した場合における表面粗さの変化を比較して示すグラフである。  FIG. 4 is a graph showing a comparison of changes in surface roughness when a DLC film formed by T-F AD and PECC VD is held at a high temperature.

図 5は、 T一 F ADにより成膜された D L C膜の波長 6 3 2. 8 n m の H e —N e レーザによるラマンスぺク トルの一例を示すグラフである。 図 6は、 切り屑カール半径の定義及ぴ測定要領を示す説明図である。 図 7 ( a ) 〜 ( c ) は実施例の切削試験によ り得られた代表的な切り 屑の外観を示す写真である。 Fig. 5 is a graph showing an example of a Raman spectrum obtained by a He—N e laser with a wavelength of 63.2.8 nm of a DLC film formed by T-F AD. FIG. 6 is an explanatory diagram showing the definition of the chip curl radius and the measuring procedure. Figures 7 (a) to (c) are photographs showing the appearance of typical chips obtained by the cutting test of the example.

発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION

以下、 本発明の D L C被覆工具について、 その製造方法を含めてさら に詳細に説明する。  Hereinafter, the DLC coated tool of the present invention will be described in more detail, including its manufacturing method.

本発明の D L C被覆工具は、 基材上に実質的に水素を含まない D L C 膜を形成して成るものであって、 上記 D L C膜の密度が 3 . 0〜 3 . 4 g Z c m3、 ナノインデンテーション硬さが 4 0〜 1 O O G P a以下であ つて、 針先端曲率半径' 2 mの触針式表面形状測定器による測定送り 0 . 0 1 mmの表面走査検出において、 上記基材の成膜前における被成膜面 の算術平均粗さ R a ( S ) に対する D L C膜面の算術平均粗さ R aThe DLC-coated tool of the present invention is formed by forming a DLC film substantially free of hydrogen on a substrate, and the density of the DLC film is 3.0 to 3.4 g Z cm 3 , In the surface scanning detection of 0.1 mm surface scanning with a stylus type surface shape measuring instrument having an indentation hardness of 40 to 1 OOGPa or less and a needle tip curvature radius of 2 m, Arithmetic mean roughness Ra of DLC film surface relative to arithmetic mean roughness Ra (S)

( D ) の絶対値変化量 A R a ( n m) と D L C膜の膜厚 t ( n m) との 比厶 R a / t (= I R a ( S ) — R a ( D ) \ / t ) が 0 · 0 5以下、 さらに D L C膜表面における異物粒子の付着及び Z又は脱離に起因する 凸凹の占有面積率 s の膜厚 tに対する比 s / tが 0 . 0 1 (%/ n m) 以下であって、 例えば非鉄金属合金、 有機材料、 硬質粒子を含有する材 料などの切削加工に利用することができる。 The ratio R a / t (= IR a (S) — R a (D) \ / t) is 0 between the absolute value change amount AR a (nm) of (D) and the film thickness t (nm) of the DLC film The ratio s / t to the film thickness t of the uneven area ratio s due to adhesion and Z or desorption of foreign particles on the surface of the DLC film is less than 0.1 (% / nm). For example, it can be used for cutting non-ferrous metal alloys, organic materials, and materials containing hard particles.

なお、 本発明の D L C被覆工具とは、 一体型の工具はもとより、 刃先 交換型チップも含まれる。 また、 D L C膜の被覆処理は、 切削工具にお いては、 少なく とも基材の刃先に相当する部分に施してあればよい。 成 型加工用工具においては、 少なく とも機材の成型面に相当する部分に D L C膜の被覆処理が施してあればよい。  The DLC coated tool of the present invention includes not only an integrated tool but also a blade-tip replaceable tip. In addition, the DLC film coating treatment may be applied to at least the portion corresponding to the cutting edge of the base material in the cutting tool. In forming tools, it is sufficient that at least the part corresponding to the molding surface of the equipment is coated with a DLC film.

本発明の D L C被覆工具に用いる D L C膜は、 実質的に水素を含まな いものであるが、 本発明において 「実質的に水素を含有しない」 とは、 プロセスチャンパ内に水素を含むガスを意図的には導入しないで成膜し たものであることを意味する。 但し、 もともと真空チャンパ内壁や電極 内 (および内壁) に付着, 吸着していたガス, ゴミ, あるいは水などが プロセス中に脱離して、 膜内に混入する場合もあるため、 水素含有量を 完全になくすことは困難であるが、 その程度は、 通常 5原子%以下であ る。 The DLC film used in the DLC-coated tool of the present invention is substantially free of hydrogen, but in the present invention, “substantially free of hydrogen” means that a gas containing hydrogen is intentionally contained in the process chamber. It means that the film was not introduced into the film. However, originally the inner wall and electrode of the vacuum chamber It is difficult to completely eliminate the hydrogen content because gas, dust, or water adhering to and adsorbing on the inside (and inner wall) may be desorbed during the process and mixed into the membrane. The degree is usually 5 atomic% or less.

そして、 この程度であれば、 保護膜と しての密度や硬さ、 耐熱性、 耐 摩耗性、 耐凝着性などへの実質的な影響がないことから、 具体的な水素 含有量と しては 5原子%以下を意味する。 なお、 水素含有量が少ない方 が基材との密着性がよく、 0原子%によ り近い方がより優れた特性とな り、 より望ましい D L C膜であることは言うまでもない。  At this level, there is no substantial effect on the density, hardness, heat resistance, wear resistance, and adhesion resistance of the protective film. Means 5 atomic% or less. Needless to say, the lower the hydrogen content, the better the adhesion to the substrate, and the closer to 0 atomic%, the better the characteristics, and the more desirable DLC film.

チャンバ内壁や電極内のガスや水分は、 チャンバ內を 1 0 0 °C以上に 加熱したり、 成膜プロセス前に、 真空アークプラズマを空打ち (成膜を しないでプラズマを発生させること。 つまり、 シャッターで成膜しない ようにしたり、 プラズマを曲げずに直進させたりすること。 ) したりす ることによって除去することができる。 また、 真空アークプラズマの空 打ちは、 ゲッター作用により不純物ガスを除去でき、 真空度を上げ (圧 力を下げ) 、 清浄なプロセス空間を得るのに有効である。  The gas and moisture in the chamber inner wall and electrode heat the chamber to 100 ° C or higher, or empty the vacuum arc plasma before the film formation process (to generate plasma without film formation. Do not form a film with a shutter, or go straight without bending the plasma. In addition, vacuum arc plasma blanking is effective for removing impurity gas by the getter action, raising the degree of vacuum (lowering pressure), and obtaining a clean process space.

なお、 D L C膜の水素含有量は、 例えばグロ一放電発光分析法 (G D O E S ) や、 弾性反跳粒子検出法 (E R D A ) よって測定することがで きる。  The hydrogen content of the DLC film can be measured by, for example, glow discharge emission spectrometry (G D O E S) or elastic recoil particle detection (E R D A).

グロ一放電発光分析法は、 A r グロ一放電領域内で被膜を高周波スパ ッタ リ ングし、 そのスパッタ リ ングされた原子からの放射を分光分析す ることにより、 被膜の深さ方向の元素分析を行う手法である。 この方法 では、 定量的に水素を測定することは難しいが、 膜の深さ方向の相対的 な変化を知ることができる。  In the glow discharge emission spectrometry, the coating is processed in the depth direction of the coating by performing high-frequency sputtering of the coating in the Ar glow discharge region and spectroscopically analyzing the radiation from the sputtered atoms. This is a method for elemental analysis. Although it is difficult to measure hydrogen quantitatively by this method, it is possible to know the relative change in the depth direction of the film.

また、 弾性反跳粒子検出法は、 H eイオンや Hイオンを低角で入射し、 表面から弾きだされた、 原子のエネルギースぺク トルを測定する手法で あり、 任意の試料でスペク トルの規格化を行う ことで、 水素の定量分析 が可能となり、 正確な測定が難しい軽元素を正確に測定できる数少ない 測定方法の 1つである。 The elastic recoil detection method is a method that measures the energy spectrum of atoms ejected from the surface by entering He ions or H ions at a low angle. Yes, it is one of the few measurement methods that can accurately measure light elements that are difficult to accurately measure by enabling the quantitative analysis of hydrogen by standardizing the spectrum of an arbitrary sample.

一方、 本発明者等は、 D L C成膜面の平滑性について、 各種の成膜装 置を用いて繰り返し検討した結果、 成膜面の平滑性を損なう主因がブラ ズマの発生時に陰極から副生する陰極材料粒子 (以下、 「ドロップレツ ト」 という) にあることを見出すに到った。  On the other hand, the present inventors have repeatedly investigated the smoothness of the DLC film-forming surface using various film-forming devices. As a result, the main cause of the deterioration of the smoothness of the film-forming surface is a by-product from the cathode when the plasma occurs. The cathode material particles (hereinafter referred to as “droplets”) are found to be found.

一般に、 真空アーク放電では、 陰極点から陰極材料イオン、 電子、 陰 極材料中性粒子 (原子及び分子) といった真空アークプラズマ構成粒子 が放出されると同時に、 サブミクロンから最大数百ミ クロンの大きさの ドロップレツ トが放出され、 このよ うな ドロップレツ トが基材表面に付 着すると、 基材表面に形成される D L C膜の均一性や平坦性が大きく損 なわれることになる。  In general, in vacuum arc discharge, vacuum arc plasma constituent particles such as cathode material ions, electrons, and negative material neutral particles (atoms and molecules) are emitted from the cathode spot, and at the same time, the size is from submicron up to several hundred micron. When such droplets are released and attached to the substrate surface, the uniformity and flatness of the DLC film formed on the substrate surface are greatly impaired.

本発明の D L C被覆工具は、 上記したように、 実質的に水素を含むこ となく、 所定密度と所定硬さを有する t a — Cから成る D L C膜であつ て、 膜厚当たりの成膜前後の粗さ変化量や凹凸の占有面積率により定義 される極めて平滑な表面形状を有する D L C膜を基材上に備えたもので あるが、 このような平滑な D L C膜は、 生成膜へのドロップレッ トの衝 突及ぴ付着を極限まで下げることによって、 上記ドロップレツ トに代表 される異物粒子の混入をなく し、 これら異物粒子の付着による突起状欠 陥や、 脱離によるくぼみ状欠陥を極限まで低下させることによって得ら れ、 従来の水素フリー D L Cと較べて、 より高密度、 高圧縮応力化した 膜を実用化し、 さらに高い耐磨耗性と密着性を発現する。  As described above, the DLC-coated tool of the present invention is a DLC film made of ta-C having substantially a predetermined density and a predetermined hardness without substantially containing hydrogen, before and after the film formation per film thickness. A DLC film having a very smooth surface shape defined by the amount of change in roughness and the occupied area ratio of irregularities is provided on the substrate. Such a smooth DLC film has a droplet on the generated film. By reducing the impact and adhesion of the particles to the limit, contamination of foreign particles represented by the above-mentioned droplets can be eliminated, and protrusion defects due to the adhesion of these foreign particles and depression-like defects due to separation can be minimized. Compared to conventional hydrogen-free DLC, a higher density and higher compressive stress film is put into practical use, and higher wear resistance and adhesion are exhibited.

なお、 本発明において 「異物粒子」 とは、 主にドロップレッ トを意味 するが、 これ以外にもハンドリ ング中にゴミなどが付着することがない とは言えず、 これらのゴミ粒子をも含めて 「異物粒子」 と称するものと する。 In the present invention, “foreign particle” mainly means droplets, but it cannot be said that dust or the like does not adhere during handling other than this, and includes these dust particles. Called “foreign particles” To do.

そして、 本発明における D L Cの成膜に際しては、 プラズマ源からプ ラズマ磁気輸送ダク トを介して、 成膜プロセスチャンバと接続されるフ ィルタードアーク蒸着装置を用いることによって、 ドロップレッ トや中 性粒子の混入を極力防止することができ、 このフィルタードアーク蒸着 装置については、 黒鉛のアーク陰極から放出される固体状の ドロップレ ッ トを捕獲 · 除去するために、 陰極と直面対向する位置にドロップレツ ト捕集機能を設けることが望ましく、 例えば、 T字状フィルタードア一 ク蒸着装置 (T一 F A D : 特許第 3 8 6 5 5 7 0号明細書参照) や X字 状フィルター ドアーク蒸着装置 (特開 2 0 0 7— 9 3 0 3号公報参照) を利用することができる。  When forming a DLC film according to the present invention, a filtered arc neutral apparatus is used by using a filtered arc deposition apparatus connected to a film forming process chamber from a plasma source through a plasma magnetic transport duct. This filtered arc vapor deposition system can prevent particles from entering as much as possible, so that the solid droplet emitted from the graphite arc cathode can be trapped and removed at the position facing the cathode. It is desirable to have a let-collecting function, for example, a T-shaped filter door evaporation system (see T 1 FAD: Patent No. 3 8 6 5 5 70) and an X-shaped filtered arc evaporation system ( JP, 2007-07-930, A) can be used.

すなわち、 真空アーク蒸着法により形成した非 D L C膜の表面には、 上記のような ドロップレッ トが存在する。 一般に膜中に取り込まれる ド ロップレッ トは D L C膜の膜厚を増やせばそれに比例して増える。 この 膜中の ドロップレツ トは膜の靱性を下げ、 剥離ゃチッビング磨耗の原因 となるため、 膜厚を増やし界面の応力が高くなればなるほど、 膜中の ド ロップレツ トが少なければならない。 厚膜化は工具用被覆膜と しては対 磨耗性を向上させるに有効だが、 前述のよ うな問題の他、 表面が荒れて しまい切削抵抗を上げてしまう。  That is, the droplets as described above exist on the surface of the non-DLC film formed by the vacuum arc deposition method. In general, the droplet taken into the film increases in proportion to the DLC film thickness. This drop rate in the film lowers the toughness of the film and causes stripping wear, so the higher the film thickness and the higher the interface stress, the smaller the drop rate in the film. Thickening is effective for improving wear resistance as a coating film for tools, but in addition to the problems described above, the surface becomes rough and cutting resistance increases.

単に平滑にするだ.けなら、 成膜後に研磨することでドロップレツ トが 抜けて、 平滑度を上げることはできるが、 ドロップレッ トが抜けた穴が 残ってしまう。 この凹も被削材の凝着が生じる原因となる他、 剥離の原 因となりやすく、 また、 摩擦係数も上がるため、 これも極力少ない事が 望ましい。  If it is only smooth, the droplet can be removed by polishing after film formation, and the smoothness can be increased, but the hole from which the droplet has been removed remains. In addition to causing adhesion of the work material, this recess also tends to cause peeling, and also increases the coefficient of friction, so it is desirable to reduce this as much as possible.

ドロップレッ トの多寡に関する評価は、 本来、 膜の体積に対してドロ ップレッ トが占有する体積密度 ( l Z rn 3 ) で評価すべきであると考えら れるが、 想定している膜厚 (〜 1 m) と、 ドロップレッ トの大きさは 概ね同程度なため、 表面の ドロップレッ ト数や粗さの変化量、 ドロップ レッ トの占有面積等々を膜厚で割ったもので十分に評価できる。 The evaluation of droplet size should be based on the volume density (l Z rn 3 ) occupied by the droplet relative to the membrane volume. However, since the expected film thickness (~ 1 m) and the size of the droplets are almost the same, the number of droplets on the surface, the amount of change in roughness, the area occupied by the droplets, etc. The value divided by the film thickness can be fully evaluated.

表面粗さの評価方法と しては、 触針式表面形状測定器による表面走查 検出法がある。 この方法は、 1次元的な測定となるが、 電子顕微鏡 ( S EM) 等と比べると高さ方向の分解が優れており、 簡便にマクロなスケ ール ( 2 mm) で粗さの評価ができる'。  As a method for evaluating the surface roughness, there is a method for detecting surface scatting using a stylus type surface shape measuring instrument. Although this method is a one-dimensional measurement, it is superior in resolution in the height direction compared to electron microscopes (SEM), etc., and it is easy to evaluate roughness with a macro scale (2 mm). it can'.

触針式表面形状測定器による表面走査検出法で粗さを評価した場合、 被コーティング面の算術平均粗さ R a ( S ) に対する D L C被覆面の算 術平均粗さ R a (D) の絶対値変化量 A R a ( n m ) と D L C膜の膜厚 t ( n m) の間の比 A R a / t (= | R a (D) - R a ( S ) \ / t ) が 0. 1以下であれば十分な靱性が得られ、 0. 0 5以下であることが より望ましい。  When the roughness is evaluated by the surface scanning detection method using a stylus type surface profile measuring instrument, the absolute value of the arithmetic average roughness R a (D) of the DLC coated surface with respect to the arithmetic average roughness R a (S) of the coated surface The ratio AR a / t (= | R a (D)-R a (S) \ / t) between the value variation AR a (nm) and the DLC film thickness t (nm) is less than 0.1 If it is, sufficient toughness is obtained, and it is more desirable that it is 0.05 or less.

また同時に、 表面の ドロップレッ ト等の異物粒子の大きさも重要で、 これらに起因する凸凹の占有面積率 Sの膜厚 tに対する割合 S tが 0. 0 1 ( % / n m ) 以下である必要があり、 この比 S / tが 0. 0 1 を超 えると、 膜中の ドロップレッ トの数が多過ぎ、 すなわち膜中における ド ロップレッ トの占有する体積密度 ( 1 /m3) が高すぎて十分な硬度と弾 性率が得られず、 工具用被膜と して十分な耐摩耗性や耐久性が得られな いという不都合が生じる。 At the same time, the size of foreign particles such as droplets on the surface is also important, and the ratio of the occupied area ratio S of unevenness to the film thickness t due to these must be less than 0.01 (% / nm). When the ratio S / t exceeds 0.01, there are too many droplets in the film, that is, the volume density (1 / m 3 ) occupied by the droplets in the film is high. Too much hardness and elasticity cannot be obtained, resulting in inconvenience that sufficient wear resistance and durability cannot be obtained as a coating for a tool.

凸凹の占有面積については、 分解能が通常の S EMより も優れる、 F ϋ— S K (F i 1 e d E m i s s i o n— S c a n n i n g E l e c t r o n M i c r o s c o p e ) 観察によつて評価することがで さる。  The occupied area of the unevenness can be evaluated by observing F ϋ— S K (F i 1 ed E m i s s i o n — S c a n i n g E l c ct ron M ic c o p e), which is superior in resolution to ordinary SEM.

少なく とも 3, 0 0 0倍以上の倍率で、 試料表面を鉛直から 1 0 ± 5 度で傾けた方向から写真撮影を行い、 画像処理等でドロップレツ トの占 有面積比を求めると、 凸凹の評価と面積を少ない誤差で評価することが できる。 また直径 0. 1 m以上の凸凹数の面密度も直接数えることで 評価できる。 Take a picture from the direction where the sample surface is tilted at 10 ± 5 degrees from the vertical at a magnification of at least 3, 00 times and capture the drop rate by image processing. If the area ratio is calculated, the unevenness and the area can be evaluated with a small error. It can also be evaluated by directly counting the surface density of the number of irregularities with a diameter of 0.1 m or more.

図 1 ( a ) 〜 ( c ) は、 T字状フィルタードアーク蒸着装置 (T— F Figures 1 (a) to (c) show the T-shaped filtered arc deposition system (T-F).

5 AD) 、 ドロ ップレッ トフィルターなしの従来の真空アーク蒸着装置 (N F A : n o n - F f i 1 t e r d a r c ) 、 及び陰極と直面対向 する位置にドロップレッ ト捕集機能を設けることなく、 フィルタダク ト の内部に配置したひだ状のパッフルによって ドロップレツ トを除去する 従来タイプのフィルタードアーク蒸着装置 (従来 F AD) により D L C ίο 膜を成膜したフライ ス工具用刃先交換型切削チップのすくい面、 刃先直 下の F Ε _ S ΕΜ像を比較して示すものである。 5 AD), a conventional vacuum arc deposition apparatus (NFA: non-F fi 1 terdarc) without a droplet filter, and a filter duct without a droplet collecting function facing the cathode. The droplet is removed by a pleated paffle placed inside. The rake face and cutting edge of a cutting tip for a milling tool with a DLC ίο film formed by a conventional filtered arc evaporation system (conventional FAD). This shows a comparison of the F F _ S ΕΜ images directly below.

これら F Ε— S ΕΜ像から、 Τ字状フィルタードアーク蒸着装置 (Τ - F AD) による D L C膜の表面 (図 1 ( a ) ) が従来の真空アーク蒸 着装置 (N F A) や従来タイプのフィルタードアーク蒸着装置 (従来 F From these F Ε— S images, the surface of the DLC film (Fig. 1 (a)) by the U-shaped filtered arc vapor deposition device (Τ-F AD) is the same as that of the conventional vacuum arc deposition device (NFA) or the conventional type. Filtered arc evaporation system (conventional F

5 AD) による表面 (図 1 ( b ) 及び ( c ) ) と較べて平滑性が高いこと が分かる。 特に真空アーク蒸着装置による D L Cの表面 (図 1 ( b ) ) には、 黒丸で示した凸部以外に白丸で示した凹部が存在していること と 共に、 従来タイプのフィルタードアーク蒸着装置による表面 (図 1 ( c ) ) には、 粒子状の異物が極めて多数存在していることが分かる。5) It can be seen that the smoothness is higher than the surface by AD) (Fig. 1 (b) and (c)). In particular, the surface of the DLC by the vacuum arc deposition system (Fig. 1 (b)) has not only the projections indicated by the black circles but also the recesses indicated by the white circles. It can be seen that the surface (Fig. 1 (c)) contains an extremely large amount of particulate foreign matter.

:0 なお、 D L C膜の凹凸については、 ドロップレッ トの付着や脱落が主 因ではあるが、 その他、 基材のハンドリ ング中のゴミの付着や脱離も、 D L C膜の凹凸の副因であることは言うまでもない。 従って、 本発明を 実施するに際しては、 D L C膜の凹凸の数を減らすための方法と して、 基材の前洗浄を十分に行うこと、 フィルタ ドアーク蒸着装置内部のク: 0 DLC film irregularities are mainly caused by droplet adhesion and removal, but also dust adhesion and desorption during substrate handling is a secondary cause of DLC film irregularities. Needless to say. Therefore, when practicing the present invention, as a method for reducing the number of irregularities in the DLC film, the substrate should be thoroughly cleaned and the inside of the filtered arc vapor deposition apparatus.

:5 リ一二ングを十分に行うことに配慮する必要がある。 : 5 Careful consideration should be given to sufficient cleaning.

更にまた、 フィルタードアーク蒸着法において、 ドロ ップレッ トの発 生を極力抑え、 ドロップレツ トに起因する凹凸数を少なくする観点から、 プラズマ磁気輸送ダク ト内にバッフルやオリ フィ ス板を設ける、 陽極形 状を変更して ドロップレツ トの反射方向が回収ダク トに向かうよ うにす るなどの装置上の工夫、 プロセスチヤンバ内へ進入したプラズマを電磁 界によって屈曲させ、 プラズマの進入軸とオフセッ ト した位置で成膜す るなどのプラズマ制御による工夫、 あるいは、 アーク電流の大きさや波 形を勘案しドロップレツ トの発生自体を抑制するよ うな成膜条件を採用 することが重要である。 Furthermore, in the filtered arc deposition method, From the viewpoint of reducing the number of projections and depressions due to the drop rate as much as possible, baffles and orifice plates are provided in the plasma magnetic transport duct, and the anode shape is changed to recover the reflection direction of the drop rate. Device control such as directing to the duct, and plasma control such as bending the plasma that has entered the process chamber by an electromagnetic field and forming a film at a position offset from the plasma entrance axis Alternatively, it is important to adopt film forming conditions that suppress the generation of the droplet itself in consideration of the magnitude and waveform of the arc current.

本発明の D L C被覆工具に成膜される D L C膜は、 3. 0〜3. 4 g / c m3の密度を有し、 この領域で、 応用上良好な特性を示し、 密度につ いては高い方がよ り好ましい。 The DLC film formed on the DLC-coated tool of the present invention has a density of 3.0 to 3.4 g / cm 3 , and exhibits good characteristics in application in this region, and the density is high. Is more preferred.

一般に、 ダイヤモン ドの密度は 3. 5 2 g Z c m3であり、 従来の水素 フリー D L Cでは密度が 3. O g / c ra3以上になると、 硬度が高くなり、 内部に残留する圧縮応力が高く なって基材との密着性が損なわれ、 皮膜 が剥離しやすく なると考えられていた。 また、 界面の応力は膜厚に比例 するため、 膜厚が厚くなっていく場合も同じ理由で剥離しやすくなる。 In general, the density of diamond is 3.5 2 g Z cm 3 , and in conventional hydrogen-free DLC, when the density exceeds 3. O g / c ra 3 , the hardness increases and the compressive stress remaining inside It was thought that the adhesion to the base material was impaired and the film was easily peeled off. In addition, since the stress at the interface is proportional to the film thickness, even when the film thickness is increased, it is easy to peel off for the same reason.

しかし、 本発明における D L C膜は、 高密度、 高硬度、 高弾性率、 高 密着力を同時に実現することができ、 これは膜中に機械的に弱いドロッ プレツ トが極めて少なく、 かつドロップレツ トの脱離または除去に起因 する凹状欠陥が極めて少ないため、 実現できたと考えられる。 すなわち、 ドロップレッ トは、 グラッシ一カーボン又はマイクロ結晶グラフアイ ト 構造を呈するものが多く、 その密度はダイヤモン ドと比べて大幅に低い。 このため、 膜中の ドロップレッ トの数密度が十分に低い場合にのみ、 密 度が 3. O g / c m3以上になる。 However, the DLC film according to the present invention can simultaneously achieve high density, high hardness, high elastic modulus, and high adhesion, and this is because there are very few mechanically weak drop plates in the film, and the drop rate. It is thought that this was realized because there were very few concave defects caused by the desorption or removal of. In other words, many droplets have a glassy carbon or microcrystalline graphite structure, and their density is significantly lower than that of diamond. For this reason, the density becomes 3. Og / cm 3 or more only when the number density of droplets in the film is sufficiently low.

ただし、 当該 D L C膜の密度が 3. 4 g / c m3を超えると、 ダイヤモ ンド結晶化し始め、 結晶化することによって表面粗さが大きくなり、 摩 擦係数も增加するため好ましくない。 このような D L C膜の密度は、 例 えば X線反射率測定法 (X R R) により求めることができる。 However, when the density of the DLC film exceeds 3.4 g / cm 3 , diamond crystallization starts and the surface roughness increases due to crystallization. This is not preferable because the friction coefficient increases. The density of such a DLC film can be obtained, for example, by X-ray reflectometry (XRR).

また、 本発明の D L C被覆工具に成膜される D L C膜の硬さと しては、 ナノィンデンテーショ ン法によつて測定した硬さで 4 0〜 1 0 0 G P a の範囲とする必要がある。 すなわち、 ナノインデンテーショ ン硬さが 4 0 G P a未満の場合、 十分な硬さがないため耐磨耗性に問題が生じる一 方、 l O O G P aを超えると、 ダイヤモン ド結晶化し始め、 ダイヤモン ド結晶化することによつて表面粗さが大きくなり、 摩擦係数も増加する ため好ましくないという不具合が生じる) 。  Further, the hardness of the DLC film formed on the DLC-coated tool of the present invention must be in the range of 40 to 100 GPa as measured by the nanoindentation method. There is. That is, if the nanoindentation hardness is less than 40 GPa, there is a problem with wear resistance because of insufficient hardness, while if it exceeds OOGPa, diamond crystallization begins, and the diamond Crystallization increases the surface roughness and increases the coefficient of friction, which is undesirable.

ナノインデンテーション法は、 硬さ試験の一種であって、 圧子の押し 込み駆動部に変位計を設置し、 押し込み深さを連続的に測定し、 硬さや ヤング率を求める方法であり、 荷重範囲が 0. l mN〜 l N程度と極め て低加重で、 1 0 0 n m以下の押し込み深さでも正確に測定できる特徴 を持つ手法である。 本発明における D L C膜のよ うに、 Ι μ πι以下の膜 厚で、 しかも高い弾性率を示す膜の場合、 塑性変形後の硬さしか評価で きないマイク口ビッカース硬度計やヌープ硬度計では正確な評価ができ ない。  The nano-indentation method is a type of hardness test, in which a displacement gauge is installed in the indenter drive section and the indentation depth is continuously measured to determine the hardness and Young's modulus. This is a technique with extremely low weight of about 0.1 mN to lN, and capable of accurate measurement even at an indentation depth of 100 nm or less. In the case of a film having a film thickness of Ι μ πι or less and a high elastic modulus, such as the DLC film in the present invention, the microphone mouth Vickers hardness meter or Knoop hardness meter that can only evaluate the hardness after plastic deformation is accurate. Cannot be evaluated.

• なお、 本発明に用いる D L Cは、 ヤング率も極めて高く、 4 0 0 ~ 9 0 0 G P a もの高い値を示す。 図 2は、 WC平均粒度が 0. 8 μ m、 C o含有量が 1 0重量%、 0. 3重量%の C r を含有した超硬合金に、 鏡 面加工を施した基材上に、 各種成膜法によって、 7 0 0〜 1 0 0 0 n m の厚さに形成した D L C膜の硬さとヤング率の関係を示すグラフであつ て、 T字状フィルター ドアーク蒸着 (T一 F AD) による D L C膜は、 従来の水素フリー D L Cを上回り、 ダイヤモンドに次ぐ高硬度、 高弾性 率を示し、 これによつて高い耐磨耗性を有することが判る。 また、 弾性 率が高いため、 膜の基材への追従性が高く、 チッビング等の磨耗も起こ り難くなっている。 • Note that the DLC used in the present invention has a very high Young's modulus, which is as high as 400 to 90 GPa. Figure 2 shows a cemented carbide containing a WC average particle size of 0.8 μm, Co content of 10% by weight and 0.3% by weight of Cr on a mirror-finished substrate. The graph shows the relationship between the hardness and Young's modulus of a DLC film formed to a thickness of 700 nm to 100 nm by various film forming methods. T-shaped filtered arc deposition (T-FAD) The DLC film produced by HI exceeds the conventional hydrogen-free DLC, and has the second highest hardness and high elastic modulus after diamond, indicating that it has high wear resistance. In addition, because of its high modulus of elasticity, the film can follow the substrate and wear such as chipping. It has become difficult.

さらに、 従来の永素フリー D L Cでは、 これらの性質をもちつつ実用 的な密着性を得ることは困難であつたのに対し、 T一 F A D法による D L Cにおいては、 +分な密着力が得られている。  Furthermore, while conventional permanent-free DLC had these properties, it was difficult to obtain practical adhesion, whereas DLC using the T-FAD method provided + minute adhesion. ing.

なお、 図中示す P E C VD (P l a s m a E n h a n c e d -C h e m i c a 1 V a o r D e p o s i t i o n) と ^:、 !、わゅるプ ラズマ C VD法である。  In the figure, P E C VD (P l a s m a E n h a n c e d -C h e m i c a 1 V a o R D e p o s i t i o n) and ^ :,! This is the Wyru Plasma C VD method.

また、 測定には、 E N T— 1 1 0 0型ナノィンデンター装置を使用し、 試験荷重 : 9. 8 mN、 負荷ステップ : 0. 9 8 mN、 負荷除去速度 : 0. 9 8 NZm s e c、 測定数 : 1 0点の条件を採用した。  In addition, for measurement, ENT-1100 type nanoindenter device was used, test load: 9.8 mN, load step: 0.98 mN, load removal speed: 0.98 NZm sec, measurement Number: The condition of 10 points was adopted.

本発明の D L C被覆工具における D L C膜の表面の凹凸の面積率 s に ついては、 膜厚 t ( n m) に対する比 s / t力 S 0. 0 1 ( % / n m ) 以 下とすることが必要であることは上記したとおりであるが、 凸部の個数 については、 単位面積当たりの直径 0. l m以上の個数 N p (個ノ m m2) の膜厚 t (mm) に対する比 N p Z tカ 1 . 5 1 08 (個//111111 3) 以下とすることが望ましい。 すなわち、 この比 N p / tが上記値を超 えると、 ドロップレッ トの占有する体積密度 ( l Zni3) が高すぎて十分 な硬度と弾性率が得られず、 工具用被膜として十分な耐摩耗性や耐久性 が得られなくなる傾向があることによる。 The surface area ratio s of the surface of the DLC film in the DLC coated tool of the present invention must be less than the ratio s / t force S 0.01 (% / nm) to the film thickness t (nm). As described above, the number of protrusions is the ratio N p Z t of the number N p (unit mm 2 ) to the film thickness t (mm) with a diameter of 0.1 lm or more per unit area. 1.5 1 0 8 (pieces / / 1 1 1111 3) or less is desirable. That is, if this ratio N p / t exceeds the above value, the volume density (l Zni 3 ) occupied by the droplet is too high to obtain sufficient hardness and elastic modulus, which is sufficient as a coating for a tool. This is because wear resistance and durability tend not to be obtained.

また、 凹部の個数については、 単位面積当たりの直径 0. Ι μ πι以上 の個数 N h (個 Zmm2) の膜厚 t (mm) に対する比 N h Z tが 1. 0 X 1 08 (個/ mm3) 以下とすることが望ましい。 この比 N h / tが上 記値を超えると、 膜の横方向の弾性変形に対する抗力が不足し、 膜の割 , れによる剥離の原因となる。 膜の一部が剥離すると、 そこに被加工材が 凝着 '溶着し、 つま.り、 工具にピッチングが生じることになり、 工具の 摩耗 '破損に繋がることがあり、 好ましくない。 なお、 凸凹数や占有面 積は低ければ低いほど望ましい。 As for the number of recesses, the ratio N h Z t to the film thickness t (mm) of the number N h (piece Zmm 2 ) with a diameter per unit area of 0. Ι μ πι or more is 1.0 X 1 0 8 ( Pieces / mm 3 ) or less. If this ratio N h / t exceeds the above value, the resistance to elastic deformation in the transverse direction of the film will be insufficient, which will cause peeling due to the film splitting. If a part of the film is peeled off, the work piece will adhere to the weld, which causes pinning of the tool, which may lead to tool wear and damage. In addition, the number of irregularities and occupied surface The lower the product, the better.

また、 工具基材に成膜する D L C膜の厚さについては、 1 0 n m〜 l ^ mの範囲とすることが望ましいが、 この理由は、 工具を完全に被覆す るのに最低限必要な膜厚が 1 0 n mであると共に、 1 μ πιを超えて厚膜 化した場合には、 膜中に取り込まれる ドロップレッ トなどの異物粒子が 増加して、 表面平滑性が低下し、 性能が低下することによる。  The thickness of the DLC film formed on the tool substrate is preferably in the range of 10 nm to l ^ m. This is the minimum requirement for completely covering the tool. When the film thickness is 10 nm and the film thickness is increased to more than 1 μπι, foreign particles such as droplets taken into the film increase, resulting in a decrease in surface smoothness and performance. By lowering.

なお、 前述の特許文献 2には膜厚が薄い方が好ましく、 0. 1 8 / m 以上の膜厚では刃先の欠損ゃチッビング等が生じ易いとの記載がある力 S、 後述する実施例に示すように、 上記 D L C膜を切削用チップに被覆しァ ルミニゥム合金を切削した場合には、 膜厚が 0. 2 111以上の方がむし ろ優れた切削性能を示し、 特に、 S i を添加した比較的高硬度なアルミ ニゥム合金の切削において、 その傾向は顕著になることが確認された力 この理由は未だ明確になっていない。  In the above-mentioned Patent Document 2, it is preferable that the film thickness is thin, and the force S that it is described that chipping or the like of the cutting edge is likely to occur at a film thickness of 0.18 / m or more is described in the examples described later. As shown in the figure, when the above DLC film is coated on a cutting tip and an aluminum alloy is cut, a film thickness of 0.2 111 or more shows excellent cutting performance, especially when Si is added. The force that has been confirmed to be prominent in the cutting of relatively hard aluminum alloys has not yet been clarified.

本発明の D L C被覆工具における D L C膜は、 前述のように極めて高 密度であるため、 膜の内部に極めて高い内部応力が働いている。 これは、 一般の工具用 D L C被膜と しては、 クラックの伝播を抑えるなどの利点 がある反面、 内部応力が高すぎる場合、 膜の密着力が不足し、 チッピン グなどの欠陥の原因となる。 しかし、 本発明に用いる D L C膜において は、 高い密着力と高い内部応力が両立しており、 このような欠陥発生の 虞れはない。  Since the D L C film in the D L C coated tool of the present invention has a very high density as described above, a very high internal stress acts on the inside of the film. This has the advantage of suppressing the propagation of cracks as a DLC film for general tools, but if the internal stress is too high, it will cause insufficient film adhesion and cause defects such as chipping. . However, in the DLC film used in the present invention, both high adhesion and high internal stress are compatible, and there is no fear of such defects.

|¾ «3 、 長 2 2 mm、 幅 6 mm、 J¾ l mmの超硬基材 ( W C ( b a 1 ) 一 1 3. 5 w t %C o - l w t % C r /T a ) の両面を鏡面研磨 した応力測定用薄板試験片 (基材) の上に各種成膜法によって D L C膜 を形成した場合の膜厚に対する試験片の反りの変化量を示すグラフであ つて、 予め試験片の反りを計測しておき、 被処理物と同時に試験片の片 面のみに D L Cを被膜処理し、 処理後、 改めて中心部の反り と厚みを訐 W | ¾ «3, length 2 22 mm, width 6 mm, J¾ l mm carbide substrate (WC (ba 1) 1 13.5 wt% C o-lwt% C r / T a) A graph showing the amount of warpage of a specimen against the film thickness when a DLC film is formed by various deposition methods on a polished thin specimen specimen (base material) for stress measurement. Measure and apply DLC film on only one side of the specimen at the same time as the workpiece. After processing, check the warpage and thickness of the center again. W

一 15 — 測し、 次式 ( 1 ) から内部応力を求めた  15 — Measured and internal stress was calculated from the following equation (1)

数 1 Number 1

E D2S ED 2 S

3 (1 - ぃソ  3 (1-Iso

[式中の σ は膜の応力 (G P a ) 、 は基材のヤング率 ( 5 1 7. 5 4 G P a ) 、  [Where σ is the stress of the film (G P a), is the Young's modulus of the substrate (5 1 7. 5 4 G P a),

は基材のポアツソン比 (0. 2 3 8 ) 、 ゴは腠厚、 Z7は全厚、 Lは 試験片長さ、 δは反り (成膜前後の反りの差) を示す。 ]  Indicates the Poisson's ratio (0.2 3 8) of the substrate, the thickness is the thickness, Z7 is the total thickness, L is the length of the specimen, and δ is the warp (difference between the warp before and after film formation). ]

これより、 本発明における D L C膜は、 上記試験片の反り y ( μ m) に対する膜厚 x ( m) の比 y / xが 4. 0以上、 9. 0以下であるこ とが判る。  From this, it can be seen that in the DLC film according to the present invention, the ratio y / x of the film thickness x (m) to the warp y (μm) of the test piece is 4.0 or more and 9.0 or less.

この値を超えて反りが大きい場合、 チッビング等の欠陥を生じてしま い、 この値に満たない場合、 十分な膜の強度が得られず、 耐摩耗性に問 題を生じる。  If this value is exceeded and the warpage is large, defects such as chipping will occur, and if it is less than this value, sufficient film strength will not be obtained, causing problems in wear resistance.

なお、 上記領域は、 D L C膜の内部応力に換算すると、 6 G P a以上 1 4 G P a以下とレヽう ことになる。 .  It should be noted that the above region is in the range of 6 GPa or more and 14 GPa or less when converted to the internal stress of the DLC film. .

また、 X線微少部応力測定機を使用して、 上記試験片の X線応力測定を 行った。 D L Cはアモルファスであるため、 D L Cそのもの內部応力を X線で評価することはできないが、 本発明で用いる D L Cは、 極めて応 力が高いため、 基材側に掛かる応力を測定することが可能で、 上記試験 片測定結果と合わせて、 膜の応力を推定することができる。  In addition, the X-ray stress measurement of the test piece was performed using an X-ray micro part stress measuring machine. Because DLC is amorphous, DLC itself cannot evaluate the buttocks stress with X-rays, but DLC used in the present invention is extremely stressful, so it is possible to measure the stress applied to the substrate side. Combined with the above test piece measurement results, the stress of the film can be estimated.

これをもとに、 実際の被覆工具の刃先等の平面部位を数 mm 2程切り出 して、 X線応力測定を行う ことにより、 実際の工具の膜の応力を調べる ことができる。 Based on this, it is possible to investigate the actual film stress of the tool by cutting out a plane part such as the cutting edge of the actual coated tool by several mm 2 and measuring the X-ray stress.

X線による応力測定の原理は、 金属材料では外力により弾性限界内の 応力が生じると、 応力の大きさに比例して結晶の格子面間隔 ( d値) 力 S シフ トする。 試料表面法線を Nと格子面法線を N ' のなす角度 φを変え てその回折角度 ( 2 Θ ) の変化を調べると、 次式 ( 2 ) によって応力 σ が求まる。 The principle of stress measurement by X-ray is that metal materials are within the elastic limit due to external force. When stress occurs, the crystal lattice spacing (d value) force S shifts in proportion to the magnitude of the stress. When the angle φ between the sample surface normal N and the lattice plane normal N ′ is changed and the change in the diffraction angle (2 Θ) is examined, the stress σ can be obtained by the following equation (2).

数 2

Figure imgf000018_0001
Number 2
Figure imgf000018_0001

[式中の σ sは応力 (M P a ) 、 sはヤング率 (M P a ) 、 v sはポ アツソン比、 Θ 。は標準プラッグ角 (D e g ) を示す。 ]  [Where σ s is stress (M P a), s is Young's modulus (M P a), v s is Poisson's ratio, Θ. Indicates the standard plug angle (D e g). ]

ここで、 K (応力定数) は、 材料及び回折角によって決まる定数であ る。 測定値 ( Φ — 2 Θ ) から 2 Θ — s ί π 2 φの線図を書き、 最小二乗 法で勾配を求め、 を乗ずれば一義的に求まる。  Here, K (stress constant) is a constant determined by the material and the diffraction angle. Write a diagram from the measured value (Φ — 2 Θ) to 2 Θ — s ί π 2 φ, find the gradient using the method of least squares, and multiply by to find it uniquely.

ただし、 測定したのは基材中 W Cのピークであって、 超微粒子超硬基 材が含む C οバインダ一の部位は含まれない。 また、 基材の応力は膜の 全応力に対して比例し、 これより膜厚に比例して大きくなると考えられ る。 超硬基材の場合、 バインダーとなる比較的柔らかい C Οが基材中に 含まれることなどから、 W Cの結晶に掛かる応力は膜中より下がるもの の、 基本的に比例すると考えられる。 なお、 鉄系基材であっても同様の 手法により、 内部応力を推定できる。  However, the measured value was the peak of WC in the base material, and it does not include the part of the C ο binder included in the ultrafine carbide substrate. In addition, the stress of the substrate is proportional to the total stress of the film, and is considered to increase in proportion to the film thickness. In the case of a cemented carbide substrate, the stress applied to the W C crystal is considered to be basically proportional, although the substrate contains relatively soft C Ο serving as a binder. Even in the case of an iron-based substrate, the internal stress can be estimated by the same method.

測定の結果、 概ね膜厚に比例して基材側の応力も増加している。 一方、 N F A、 従来 F A D及ぴ P E C V Dで成膜した D L C膜被覆基材ではこ のようなピークシフ トは見られなかったことから、 十分な応力が得られ ていないと考えられる。 ' 本発明における D L C膜の超硬基材の W C粒子に加わる応力を y ( G As a result of the measurement, the stress on the base material side also increases almost in proportion to the film thickness. On the other hand, the DLC film-coated substrate formed by NFA, conventional FAD and PECCVD did not show such a peak shift, so it is considered that sufficient stress was not obtained. '' The stress applied to the W C particles of the carbide substrate of the D L C film in the present invention is expressed as y (G

P a ) 、 膜厚を x ( μ m) と した場合、 yノ xが 0 . 2以上 2 . 0以下 であることが望ましい。 上記値に満たない場合、 十分な膜の応力が得ら れてなく、 膜強度が不十分であり、 上記値を超える場合には、 基材自身 の靭性が不足し、 基材内からチッビング等の欠陥を生じることがあるた め望ましくない。 P a), when the film thickness is x (μm), y- nox is 0.2 or more and 2.0 or less It is desirable that If the above value is not reached, sufficient film stress cannot be obtained, and the film strength is insufficient.If the value exceeds the above value, the toughness of the base material itself is insufficient, and chipping or the like from within the base material. This is undesirable because it can cause defects.

上記 D L C膜の耐熱性については、 6 0 0 °C大気中で、 1時間保持し た後の D L C膜の算術平均粗さ R aの変化量が 0 . 0 5 μ m以下である ことが望ましい。  Regarding the heat resistance of the DLC film, it is desirable that the amount of change in the arithmetic average roughness Ra of the DLC film after holding for 1 hour in the atmosphere at 60 ° C is 0.05 μm or less. .

すなわち、 図 4は、 WC平均粒度が 0 . 8 μ m、 C o含有量が 1 0重 量。 /。、 C r含有量が 0 . 3重量。 /0、 残 WCから成る鏡面加工を施した超 硬試験片を基材と して、 この上に T字状フィルタードアーク蒸着法 (T - F AD) とプラズマ C VD法 (P E C VD) とによって D L Cを被覆 したのち、 大気中で、 2 0 0 °Cから 1 0 0 °Cずつ 6 0 0 °Cまでの各温度 でそれぞれ 1時間保持し、 加熱後室温にもどしてから各膜の表面形状を 測定した結果をノ ンコートの場合と比較して示すものである。 That is, Fig. 4 shows that the WC average particle size is 0.8 μm and the Co content is 10 weights. /. The Cr content is 0.3 wt. / 0 , Carbide specimen with mirror finish made of residual WC is used as a base material, and T-shaped filtered arc deposition (T-F AD) and plasma C VD (PEC VD) After coating with DLC, hold it in the atmosphere at each temperature from 20 ° C to 100 ° C at 60 ° C for 1 hour, return to room temperature after heating, and then surface each film The result of measuring the shape is shown in comparison with the non-coated case.

この結果、 T字状フィルタードアーク蒸着法による D L C膜は、 ほと んど変化が見られないのに対し、 未被覆の試験片とプラズマ C V D法に より D L C被覆を施した試料に関しては、 超硬基材の炭素が脱離してし まい表面が荒れてしま う結果となった。 P E C V D法では膜中に水素が 含まれ、 これが 5 0 0 DC前後から脱離するため、 膜が破壊されてしまう。 この結果、 基材が空気と接触してしまい未処理と同様の変化を示した。 これに対し、 T字状フィルタードアーク蒸着法による D L C膜は、 高い 耐熱性を示し、 微量の残留ドロップレツ トが燃焼して平滑度が若干変化 する程度で、 大気中では 6 0 0 °Cでも異常がないことを示した。 また、 粗さの変化が 0. 0 5 μ m以上の膜の場合、 ドロップレッ トの燃焼によ り膜に欠陥が生じてしま う。 このため、 急速に膜硬度が低下し、 工具用 被膜と しては十分な耐摩耗性が維持できなくなることがあるため、 好ま しくない。 As a result, the DLC film formed by the T-shaped filtered arc deposition method shows almost no change, whereas the uncoated specimen and the sample coated with DLC by the plasma CVD method are super The result was that the hard substrate carbon was desorbed and the surface was rough. The PECVD method contains hydrogen in the film, which is to detach from 5 0 0 D C before and after film is destroyed. As a result, the base material was in contact with air and showed the same change as untreated. In contrast, the DLC film by T-shaped filtered arc deposition shows high heat resistance, and a slight residual drop rate burns and the degree of smoothness changes slightly. But it showed no abnormality. In the case of a film with a roughness change of 0.05 μm or more, defects will occur in the film due to droplet combustion. For this reason, the film hardness decreases rapidly, and it may not be possible to maintain sufficient wear resistance as a tool coating. It ’s not good.

工具用被膜は、 切削工具に適用した場合、 特に ドライでの切削におい て、 その刃先の温度上昇に耐えうることが極めて重要になる。 アルミ合 金の場合、 通常 6 0 0 °C程度で溶解が始まるといわれており、 刃先は局 所的にこの温度まで上昇していると考えられる。 したがって 6 0 0 °Cの 温度にも耐える D L C膜を備えた工具は、 無潤滑 (ドライ) でのアルミ ニゥム合金の切削工具と して極めて有効である。  When applied to a cutting tool, it is extremely important that the tool coating is able to withstand the temperature rise of the cutting edge, especially in dry cutting. In the case of aluminum alloy, melting is usually said to start at about 60 ° C, and the cutting edge is considered to have risen locally to this temperature. Therefore, a tool with a DLC film that can withstand temperatures of 600 ° C is extremely effective as a non-lubricated (dry) aluminum alloy cutting tool.

本発明の D L C被覆工具においては、 基材表面に形成した D L C膜の プラズモンロススぺク トルのピークエネルギーが 2 9〜 3 3 e Vである ことが望ましい。  In the DLC-coated tool of the present invention, it is desirable that the peak energy of the plasmon loss spectrum of the DLC film formed on the substrate surface is 29 to 33 eV.

プラズモン励起スペク トルは、 電子エネルギー損失分光法 (E E L S : E l e c t r o n E n e r g y— L o s s S p e c t r o s c o p y ) で計測できる。 E E L S とは、 数百 e Vのエネルギーの電子を試 料表面に入射すると、 入射電子は固体の電子密度や原子の並びによって The plasmon excitation spectrum can be measured by electron energy loss spectroscopy (E E L S: E l e c t r n E n e r g y—L o ss S p c t r o s copy). E E L S means that when electrons with energy of several hundred eV are incident on the sample surface, the incident electrons depend on the electron density of the solid and the arrangement of atoms.

; 非弾性散乱し、 エネルギーを損失するため、 その電子エネルギーの損失 を分光する方法である。 E E L Sで計測されるスぺク トルを E E L Sス ぺク トルと言い、 1 0〜 5 0 e Vの範囲に現れる自由電子の集団振動に 起因するプラズモン励起によるスぺク トルをプラズモン励起スぺク トル と呼ぶ。 プラズモン励起スぺク トルのピーク位置は、 電子密度の平方根It is inelastically scattered and loses energy, so it is a method of spectroscopy of the loss of electron energy. The spectrum measured by EELS is called the EELS spectrum, and the spectrum due to plasmon excitation caused by the collective oscillation of free electrons appearing in the range of 10 to 50 eV is the plasmon excitation spectrum. Toru is called. The peak position of the plasmon excitation spectrum is the square root of the electron density.

I に比例するため、 ピーク位置が高いという ことは、 電子密度が高く、 引 いては、 原子密度が高いことを示す。 Since it is proportional to I, a high peak position means that the electron density is high, and hence the atomic density is high.

従って、 プラズモン励起スぺク トルのピーク位置が 2 8〜 3 3 k e V であるということは、 高密度の膜であるということを示すことになる。 グラフアイ ト及びダイヤモン ドのプラズモン励起スぺク トルのピーク位 置が、 それぞれ、 2 6 e Vおよび 3 3. 7 e Vであることから、 水素な どの不純物元素や比較的低密度の不純物である ドロップレツ トを含まな い D L Cの場合に限り、 プラズモン励起スぺク トルのピーク位置が 2 9 〜3 3 k e Vとなる。 さらには、 この値がより高いほうがより高密度の であり、 工具用被膜と して十分な硬さが得られる、 本発明の D L Cと し て好適である。 Therefore, the peak position of the plasmon excitation spectrum being 28-33 keV indicates a high-density film. Since the peak positions of the plasmon excitation spectra of the graph and diamond are 26 eV and 33.7 eV, respectively, impurities such as hydrogen and relatively low-density impurities can be used. Do not include a droplet Only in the case of DLC, the peak position of the plasmon excitation spectrum is 29-33 keV. Furthermore, the higher this value is, the higher the density is, and it is suitable as the DLC of the present invention, which can obtain a sufficient hardness as a tool coating.

上記下限値に満たない場合には密度が低く、 十分な硬さが得られず、 上限値を超えるとダイヤモンド結晶の領域となり、 ダイヤモンド結晶で は平滑な表面が得られず、 また摩擦抵抗も高くなってしまう。  When the above lower limit is not reached, the density is low and sufficient hardness cannot be obtained, and when the upper limit is exceeded, a diamond crystal region is obtained, and a smooth surface is not obtained with diamond crystal, and the frictional resistance is also high. turn into.

また、 本発明の D L C被覆工具においては、 基材表面に形成した D L C膜と しては、 波長 6 3 2. 8 n mのレーザを用いたラマン分光スぺク トルにおいて、 1 0 0 0〜 1 2 0 0 c m— 1の間にピークを有する特性バ ンドを持ち、 Dパンドと Gパン ドの面積強度比がいずれも 0. 8以下で あり、 当該特性バンドと Dバンドとのピーク強度比及び面積強度比が 0. 1 5以上であることが望ましい。 In the DLC-coated tool according to the present invention, the DLC film formed on the surface of the base material is a Raman spectroscopic spectrum using a laser having a wavelength of 6 32.8 nm. It has a characteristic band with a peak between 200 cm- 1 and the area intensity ratio of D and G is less than 0.8, and the peak intensity ratio between the characteristic band and D band The area intensity ratio is preferably 0.15 or more.

すなわち、 図 5は、 波長 6 3 2. 8 n mの H e _N e レーザを用いて、 T字状フィルタードアーク蒸着法による D L C膜のラマンスぺク トル In other words, Fig. 5 shows the Raman spectrum of a DLC film by T-shaped filtered arc deposition using a He_Ne laser with a wavelength of 6 32.8 nm.

(ラマンシフ ト) の一例を示.すものである。 なお、 波長 5 3 2 n mの半 導体ダリーンレーザを用いた場合も、 同様な結果を得ている。 An example of (Raman shift) is shown below. Similar results were obtained when a semiconductor Darlens laser with a wavelength of 5 3 2 nm was used.

一般に D L Cは非晶質ゆえに膜構造を特定することが難しいが、 光の 格子振動による弾性散乱であるラマン分光分析では、 特徴的なピークが 得られることが知られている。 特に、 1 5 6 0 c m一1付近 fc表れるグラ フアイ トの面内の振動の E 2 gモードと、 それと縮退したモー ドの重ね 合わせのピークである Gバンドと、 1 3 6 0 c m— 1付近に表れるグラフ アイ トの結晶端での非対称性による A 1 gモードと、 それと適退したモ 一ドの重ね合わせのピークである Dバンドが存在することは良く知られ ている。 In general, it is difficult to specify the film structure because DLC is amorphous, but it is known that characteristic peaks can be obtained by Raman spectroscopic analysis, which is elastic scattering by lattice vibration of light. In particular, the E 2 g mode of the in-plane vibration of the graph eye that appears in the vicinity of 1 560 cm 1 and the G band, which is the peak of the superposition of the degenerate mode, and 1 3 60 cm— 1 It is well known that there is an A 1 g mode due to asymmetry at the crystal edge of the graph eye that appears in the vicinity, and a D band that is a superposition peak of the mode and the appropriate mode.

本発明における D L C膜においては、 これらのピークに加えさらに 1 1 0 0 c in— 1近辺にピークを持つ新たな特性バンド (以下、 「 Sバン ド J と称する) が表れることを新たに見出した。 In the DLC film of the present invention, in addition to these peaks, It was newly found that a new characteristic band (hereinafter referred to as “S band J”) having a peak in the vicinity of 1 0 0 c in— 1 appears.

さらに、 Dパンドと Gパンドの面積強度比 ( S dZ S g ) が 0. 8以 下であると、 グラフアイ トとその微結晶状態が少なく、 かつ Sパンドと Dバン ドとのピーク強度比 ( I s / I d ) 及び面積強度比 ( S s ZS d ) がいずれも 0. 1 5以下であると、 当該 D L C膜が極めて高硬度と なり、 優れた耐摩耗性を持つ工具用被膜となる。  Furthermore, when the area intensity ratio (S dZ S g) of D and G Pand is less than 0.8, there are few graph items and their microcrystalline state, and the peak intensity ratio between S and P bands. If (I s / I d) and area strength ratio (S s ZS d) are both 0.15 or less, the DLC film will be extremely hard, and the tool coating will have excellent wear resistance. Become.

すなわち、 今回新たに見出した Sバンドは、 従来の紫外光レーザで検 出されている Tパン ドのピークと一致するため、 Sパンドは Tバンドと 同質であり、 s p 3構造を示すものと判断できる。 したがって、 可視光レ 一ザによるラマン分光で Sパンド = Tパンドが検出できたことは、 s p 2構造からなる ドロップレツ トを極限まで除去され、 s p 3構造成分が極 めて多いことを意味している。 すなわち、 可視光光源のラマン分光で S バンドが検出できれば、 ドロップレッ トを極限まで除去し、 凹凸のない 極めて平坦な D L C膜であり、 水素を実質的に含有せず、 ナノインデン テーシヨ ン硬さ力 S 4 0〜: L O O G P a、 密度が 3. 0〜 3. 4 g / c m 3の D L C膜であることを示すことに他ならない。 In other words, the newly discovered S-band coincides with the T-pand peak detected by the conventional ultraviolet laser, so it is judged that the S-pand is identical to the T-band and shows the sp 3 structure. it can. Therefore, the fact that S Pand = T Pand was detected by Raman spectroscopy using a visible light laser means that the drop rate consisting of sp 2 structures has been removed to the limit and that there are extremely many sp 3 structural components. ing. In other words, if the S-band can be detected by Raman spectroscopy of a visible light source, the droplet is removed to the limit, it is an extremely flat DLC film with no irregularities, it contains virtually no hydrogen, and it has nanoindentation hardness. S 40-: LOOGP a, which is nothing but a DLC film having a density of 3.0-3.4 g / cm 3 .

本発明の D L C被覆工具における基材と して、 代表的には、 WC基超 硬基材を挙げることができる。 この WC超硬合金は、 炭化タングステン (WC) を主成分とする硬質相と、 コバルトなどの鉄族金属を主成分と する結合相とからなる。  A typical example of the substrate in the DLC-coated tool of the present invention is a WC-based carbide substrate. This WC cemented carbide is composed of a hard phase mainly composed of tungsten carbide (WC) and a binder phase mainly composed of an iron group metal such as cobalt.

本発明に適用される D L C膜は、 ダイヤモンドに次ぐ高い弾性率を示 すため、 従来、 困難であった高い靭性を持つコバルト量の多い超々微粒 子超硬基材にも適用することができる。 このよ うな D L C膜が剥離する ことなく、 安定した密着性を示す基材のコバル ト含有量と しては、 0〜 2 5質量%、 より好ましく は 5〜 1 5 %である。 また、 W C平均粒度は 1 . 5 μ πι以下が好適である。 なお、 本発明の工具に用いられる基材は、 超硬合金に限らず、 .鉄基合金の一種である、 J I S G 4 4 0 3に規定 されている高速度鋼や、 炭素工具鋼 ( J I S G 4 4 0 1 ) 、 合金工 具鋼 ( J I S G 4 4 0 4 ) などの他、 サーメ ッ ト材、 c B N含有焼結 体への被覆も可能である。 Since the DLC film applied to the present invention has the second highest elastic modulus after diamond, it can also be applied to ultra-fine carbide substrate with a large amount of cobalt having high toughness, which has been difficult in the past. The cobalt content of the base material exhibiting stable adhesion without peeling off such a DLC film is 0 to 25% by mass, more preferably 5 to 15%. Also, WC average particle size is It is preferably 1.5 μπι or less. The base material used in the tool of the present invention is not limited to cemented carbide, but is a kind of iron-based alloy, high-speed steel defined in JISG 440.3, carbon tool steel (JISG 4 4 0 1), alloy tool steel (JISG 4 4 0 4), cermet material, c BN-containing sintered body can be coated.

本発明の D L C被覆工具においては、 D L C膜の密着力をより強固な ものにする観点から、 基材と D L C膜との間に中間層を設けることが好 ましい。  In the DLC coated tool of the present invention, it is preferable to provide an intermediate layer between the substrate and the DLC film from the viewpoint of strengthening the adhesion of the DLC film.

上記 D L C膜と基材との間に、 0. 1〜 5 0 0 n mの厚さを有する金 属膜、 非金属固体膜、 窒化物膜、 窒化水素化物膜、 酸化物膜、 酸化水素 化物膜、 酸化炭化物膜、 酸化炭化水素化物膜、 窒化酸化物膜、 窒化酸化 水素化物膜、 窒化炭化物膜、 窒化炭化水素化物膜、 窒化酸化炭化物膜及 び窒化酸化炭化水素化物膜から成る群よ り選ばれた少なく とも 1種から 成る中間層を備えていることが望ましく、 さらに、 上記中間層と D L C 膜との間に、 それぞれの被膜組成を混合した化学組成または連続的に変 - 化した化学組成の被膜を介在させ、 さらに強固な密着力得ることとが、 一層望ましい。  Between the DLC film and the substrate, a metal film, a non-metal solid film, a nitride film, a hydride film, an oxide film, or a hydride film having a thickness of 0.1 to 500 nm. , Selected from the group consisting of oxycarbide film, oxyhydrocarbon film, oxynitride film, oxynitride oxyhydride film, nitrocarbide film, nitrocarbide film, oxynitride carbide film, and oxynitride oxycarbide film It is desirable to have an intermediate layer consisting of at least one of the above-mentioned intermediate layers, and between the intermediate layer and the DLC film, a chemical composition obtained by mixing the respective coating compositions or a continuously altered chemical composition. It is even more desirable to obtain a stronger adhesion by interposing the above film.

中間層の成膜と D L C膜の成膜において製造条件を切り替える際、 通 常、 わずかに中間層と D L C膜との混合が生じ、 上記のような混合化学 組成の被膜層が形成される。  When the manufacturing conditions are switched between the formation of the intermediate layer and the formation of the DLC film, usually, the intermediate layer and the DLC film are slightly mixed, and a coating layer having the above-mentioned mixed chemical composition is formed.

このよ うな混合化学組成層は、 直接確認することは難しいが、 例えば X P S 、X— r a y p h o t o— e l e c t r o n i c S p e c t r o s c o p y ) や A E S (A u g e r E l e c t r o n S p e c t r o s c o p y ) などによる膜の深さ方向のプロファイルの結果から 十分推定することができる。  Such a mixed chemical composition layer is difficult to confirm directly, but from the results of the profile in the depth direction of the film by XPS, X-rayphoto-electronic Spectroscopy (AES), AES (Auger Electron Spectroscopy), etc. It can be estimated sufficiently.

本発明の D L C被覆工具は、 その耐磨耗性と耐凝着性から、 特にアル ミニゥム及びその合金を加工するための工具に適する。 また、 チタン、 マグネシウム、 銅など非鉄材やその合金に使用することが最適である。 さらに、 グラフアイ トなどの硬質粒子やガラスなどの繊維を含有する材 料、 有機材料などの切削や、 プリ ン ト回路基板加工やガラス加工、 鉄系 材料とアルミ ニウム との共削り加工などにも有効である。 加えて、 本発 明における D L C膜は非常に高硬度であることから、 非鉄材だけでなく、 ステンレス鋼などの鋼ゃ錶物などの加工にも用いることができる。 The DLC coated tool of the present invention is particularly suitable for its wear resistance and adhesion resistance. Suitable for tools for machining minium and its alloys. It is also optimal to use for non-ferrous materials such as titanium, magnesium and copper and their alloys. In addition, cutting materials such as graphite and other hard particles and fibers such as glass, organic materials, printing circuit board processing and glass processing, and co-machining processing of ferrous materials and aluminum Is also effective. In addition, since the DLC film in the present invention has a very high hardness, it can be used not only for non-ferrous materials but also for processing steel products such as stainless steel.

本発明の D L C被覆工具と しては、 高い切削性能を有することから、 ドリル、 エン ドミル、 エン ドミル加工用刃先交換型チップ、 フライス加 ェ用刃先交換型チップ、 旋削用刃先交換チップ、 メタルソー、 歯き りェ 具、 リーマ、 タップなどの切削工具と しての用途に用いることができる。 また、 その優れた耐摩耗性ゃ耐凝着性から、 成型加工用パンチ及ぴダイ などの用途に用いることができる。  The DLC-coated tool of the present invention has high cutting performance, so that it can be used for drills, end mills, end milling cutting edge replacement inserts, milling cutting edge replacement inserts, turning cutting edge replacement inserts, metal saws, It can be used for cutting tools such as toothpaste, reamer and tap. In addition, because of its excellent wear resistance and adhesion resistance, it can be used for applications such as molding punches and dies.

本発明の D L C被覆工具の切削性の指標と して、 アルミ二ゥム合金の 乾式切削加工時に得られる切り屑のカール径に着目する。  As an index of the machinability of the DLC coated tool of the present invention, attention is paid to the curl diameter of chips obtained during dry cutting of an aluminum alloy.

例えば、 WC基超硬合金から成るチップ用基材 (住友電工ハードメタ ル製チップ、 型番 : A P E T 1 6 0 5 0 8 P D F R— S、 チップ材質 : H I ) に上記のような D L C被覆を施した本発明のチップとボディー (住友電工製 エン ドミル、 型番 : WEM 3 0 2 5 ) を用いた場合、 表 1に示した基材工具の製作メ一力が指定する推奨切削条件内での切削時 に得られる切り屑カール半径が、 D L C被覆未処理の同チップによる切 り屑カール半径の 0. 7倍以下であれば、 アルミの刃先への凝着が生じ にくいことが分かった。  For example, a chip substrate made of WC-based cemented carbide (Sumitomo Electric hard metal chip, model number: APET 1 6 0 5 0 8 PDFR—S, chip material: HI) with the above DLC coating When using the inventive tip and body (Sumitomo Electric End Mill, Model No .: WEM 3 0 2 5), when cutting within the recommended cutting conditions specified by the manufacturing force of the base tool shown in Table 1, It was found that when the obtained chip curl radius was 0.7 times or less the chip curl radius of the same chip not treated with DLC, adhesion of aluminum to the cutting edge was difficult to occur.

表 1 住友電工ハードメタル製 table 1 Sumitomo Electric hard metal

工具  Tool

ボディ型番: WEM3025 ( 25)  Body model number: WEM3025 (25)

住友電工ハードメタル製  Sumitomo Electric hard metal

基材 チップ型番: APET 160508PDFR-S チップ材質: H 1 (WC-Co)  Base material Chip model: APET 160508PDFR-S Chip material: H 1 (WC-Co)

合金種 A 5052 AC4 A-T 6 ADC 1 2 被削材  Alloy type A 5052 AC4 A-T 6 ADC 1 2 Material

S t含有量 (at 0 8〜 10 9. 6〜 12 切削速度 (tn/min) 300  St content (at 0 8 ~ 10 9. 6 ~ 12 Cutting speed (tn / min) 300

1刃当リの送り量(晒/ tooth) 0. 15  Feed amount of 1 blade contact (bleach / tooth) 0.15

軸方向切 y込み深さ (議) 5  Axial depth of cut (Conference) 5

径方向切り込み深さ (議) 5  Radial depth of cut (Conference) 5

切削油 なし (エア一ブロー)  No cutting oil (Air blow)

この切り屑は、 切削工具表面のすくい面側の表面と被削材との摩擦係 数により、 そのカール半径が変化し、 半径が小さいほど良いとされる。 切り屑には刃先の熱を奪う役割もあり、 切り屑の排出のよさ (はけのよ さ) は切削工具の性能をきめる重要な要素の 1つであり、 摩擦係数が低 く、 切り屑のカール半径が小さいほど排出性も優れる。 The chip has better curl radius depending on the friction coefficient between the cutting tool surface on the rake face side and the work material. The smaller the radius, the better. Chips also remove the heat of the cutting edge, and chip discharge is one of the important factors that determine cutting tool performance. The smaller the curl radius, the better the discharge.

本発明の D L C被覆工具では、 従来は困難であった S i を添加した A C 4 Aや AD C 1 2 といったアルミ -ゥム合金に対しても、 高い切り屑 の排出性を持ち、 上記条件'工具を用いて得られる切り屑カール半径が、 D L C被覆未処理の工具による切り屑カール半径の 0. 7倍以下である ことが望ましい。  The DLC coated tool of the present invention has high chip discharge performance even for aluminum alloys such as AC 4 A and AD C 12 to which Si has been added, which has been difficult in the past. It is desirable that the chip curl radius obtained using the tool is not more than 0.7 times the chip curl radius of the untreated DLC coated tool.

なお、 切り屑カール半径については、 図 6に示すように、 切り屑自由 曲面 (工具のすくい面と接して、 切削された面) の自由曲面側の始点を A、 Aに接する接線を X軸とし、 Aを通り X軸に直行する Y軸を引き、 さらに切り屑自由曲面と Y軸との交点 ( 2点以上存在する場合は切り屑 厚さが最も厚い箇所を選択する) を Bとする。 そして、 線分 A Bを直径 とする円を描き、 その半径をもって切り屑カール半径とする。 Regarding the chip curl radius, as shown in Fig. 6, the starting point of the free curved surface side of the chip free curved surface (the surface cut by contact with the tool rake face) is A, and the tangent line that touches A is the X axis. Draw a Y-axis that passes through A and goes straight to the X-axis, and further intersects the chip free-form surface and the Y-axis (if there are two or more points, the Select B where the thickness is the thickest). Then, draw a circle with the line AB as the diameter, and use that radius as the chip curl radius.

また、 J I S H 4 0 0 0に A 5 0 5 2 と して規定されるアルミニゥ ム合金の前述条件による乾式切削加工時における切削抵抗については、 切削初期における本発明の D L C被覆チップによる切削抵抗の D L C被 覆未処理のチップによる切削抵抗に対する比率が、 主分力で 0. 6以下、 背分力で 0. 7以下、 主分力と背分力と送り分力の合力で 0. 7以下で あることが望ましい。  In addition, regarding the cutting resistance at the time of dry cutting of the aluminum alloy specified as A 5 0 5 2 in JISH 400, the cutting resistance by the DLC-coated tip of the present invention at the initial stage of cutting is the DLC. The ratio of cutting force due to uncoated chips to the cutting force is 0.6 or less for the main component force, 0.7 or less for the back component force, and 0.7 or less for the resultant force of the main component, the back component force and the feed component force It is desirable to be.

なお、 切削抵抗は、 例えば圧電式切削動力計 (キスラー) によって測 定することができる。 また、 「切削初期」 とは、 具体的には、 切削開始 から切削長 0. 1 m以内のことを意味するものとする。  The cutting resistance can be measured by, for example, a piezoelectric cutting dynamometer (Kistler). “Initial cutting” specifically means that the cutting length is within 0.1 m from the start of cutting.

実施例 Example

以下、 本発明を実施例に基づいて具体的に説明する。 なお、 本発明は、 これらの実施例によって何ら限定されるものではない。  Hereinafter, the present invention will be specifically described based on examples. In addition, this invention is not limited at all by these Examples.

基材と して、 WC基超硬合金から成るチップ用基材 (住友電工ハー ド メタル製チップ、 型番 : A P E T 1 6 0 5 0 8 P D F R— S、 チップ材 質 : H I ) を用意し、 当該基材上に、 T字状フィルター ドアーク蒸着装 置 (T一 F AD) を用いて D L C膜を形成して、 本発明品に相当する試 料 1〜 5を作製した。  As a base material, prepare a base material for chips made of WC-base cemented carbide (chip made by Sumitomo Electric Hard Metal, model number: APET 1 6 0 5 0 8 PDFR—S, chip material: HI) On the substrate, a DLC film was formed using a T-shaped filtered arc vapor deposition apparatus (T-FAD), and Samples 1 to 5 corresponding to the product of the present invention were produced.

一方、 上記基材上に、 ドロップレッ トフィルターなしの従来の真空ァ ーク蒸着装置 (N F A、 従来タイプのフィルタードアーク蒸着装置 (従 来 F AD) 、 及びプラズマ CVD装置 (P E C VD) により、 それぞれ D L C膜を成膜し、 比較例に相当する試料 6〜 1 0を作製した。 なお、 試料 1 0については、 D L C膜を形成することなく、 基材のままのス口 一ァウェイチップと した。  On the other hand, a conventional vacuum arc deposition device without a droplet filter (NFA, a conventional filtered arc deposition device (formerly FAD), and a plasma CVD device (PEC VD) are used on the substrate. Each DLC film was formed, and samples 6 to 10 corresponding to the comparative examples were produced.For sample 10, the DLC film was not formed, and the one-way chip as a base material was used. did.

そして、 得られたスローァゥヱイチップに形成された D L C膜の各種 物性や表面形状を測定した。 And various kinds of DLC films formed on the obtained thrower chip Physical properties and surface shape were measured.

そして、 3種のアルミ二ゥム合金の切削試験を表 1に示す条件で実施 し、 7 m切削後の切り屑を採取し、 そのカール径を図 7に示した要領に よって測定する共に、 刃先への凝着幅、 及び切削抵抗をキスラーにより 測定した。  Then, a cutting test of three kinds of aluminum alloys was conducted under the conditions shown in Table 1. Chips after cutting 7 m were collected, and the curl diameter was measured according to the procedure shown in FIG. The adhesion width to the cutting edge and the cutting resistance were measured with a kissler.

これらの結果を表 2〜 4に示す。  These results are shown in Tables 2-4.

また、 切削試験による切り屑の代表例として、 試料 3、 試科 6及ぴ D L C未被覆の試料 1 0のチップを用いたアルミ二ゥム合金 A D C 1 2の 切り屑の外観を図 7 ( a ) ( b ) 及び ( c ) にそれぞれ示す。  In addition, as a representative example of chips from the cutting test, the appearance of the chips of aluminum alloy ADC 1 2 using the tips of Sample 3, Trial 6 and DLC-uncoated sample 10 is shown in Fig. 7 (a ) Shown in (b) and (c), respectively.

表 2 Table 2

Figure imgf000028_0001
Figure imgf000028_0001

Figure imgf000029_0001
Figure imgf000029_0001

Figure imgf000030_0001
Figure imgf000030_0001

表 2〜 4の結果から明らかなように、 本発明に相当する試料 1〜 5の D L C被覆工具による切り屑は、 硬い S i が含まれる AD C 1 2や A CAs is clear from the results in Tables 2 to 4, the chips from the DLC coated tools of Samples 1 to 5 corresponding to the present invention are hardened with S i AD C 1 2 and A C

4 Aなどのアルミ二ゥム合金材の切削においても、 切削性の良い A 5 0Good cutting ability even when cutting aluminum alloy materials such as 4 A A 5 0

5 2 と,変わらず、 安定して小さなカール半径を示す。 これに対し、 従 来 F ADや NADにより成膜した D L C膜は、 密度や硬さ、 膜表面の平 滑度において劣り、 このような D L C膜で被覆した工具による切り屑は A 5 0 5 2に対しては優れた切削性を示すものの、 AD C 1 2や AC 4 Aの切削においては、 未被覆の工具と殆ど同じ性能でしかないことが確 認された。 また、 本発明の D L C被覆工具は、 AD C 1 2や A C 4 Aの 切削においては従来品より優れており、 切り屑のカール半径では未処理 のものと比べて、 およそ 0. 7倍以下となっている。 5 2 is the same and shows a small curl radius stably. On the other hand, conventional DLC films formed by FAD and NAD are inferior in density, hardness, and smoothness of the film surface. Chips from tools coated with such DLC films are A 5 0 5 2 However, it was confirmed that cutting with AD C 12 and AC 4 A had almost the same performance as uncoated tools. In addition, the DLC coated tool of the present invention is superior to conventional products in cutting AD C 12 and AC 4 A, and the curl radius of chips is about 0.7 times less than that of untreated chips. It has become.

さらに、 A 5 0 5 2に対する切削抵抗については、 切削初期から、 本 発明の D L C被覆工具は、 最小の切削抵抗を示している。  Furthermore, with respect to the cutting resistance with respect to A 5 0 52, the DLC coated tool of the present invention shows the minimum cutting resistance from the beginning of cutting.

アルミ合金の切削において、 摩擦係数は凝着のしゃすさに比例すると 示唆され、 7 m切削後の凝着幅も概ね、 カール半径、 切削抵抗に比例し て少なく なっている。  In aluminum alloy cutting, it is suggested that the coefficient of friction is proportional to adhesion crushing, and the adhesion width after 7 m cutting is also generally reduced in proportion to the curl radius and cutting resistance.

本発明の D L C被覆工具は、 比較例に示した従来の水素フリ一 D L C 膜を備えた工具 (試料 6〜8 ) に較べ、 密度や硬さ、 膜表面の平滑度に おいて勝り、 このよ うな幅広い被削材に対して、 切り屑の排出がよく、 切削抵抗が低く、 耐凝着性も優れていることが判明した。  The DLC-coated tool of the present invention is superior in density, hardness, and film surface smoothness to the conventional hydrogen-free DLC film (samples 6 to 8) shown in the comparative example. For a wide range of work materials, it was found that chips were discharged well, cutting resistance was low, and adhesion resistance was excellent.

産業上の利用可能性 Industrial applicability

本発明によれば、 墓材上に成膜される D L C膜を実質的に水素を含ま ず、 所定の密度及ぴナノインデンテーション硬さ有する t a — Cに分類 される D L C膜とすると共に、 触針式表面形状測定による成膜前の基材 面の算術平均粗さに対する成膜後の膜面の算術平均粗さの変化量と D L C膜厚の比、 さらに ドロップレツ トなどの異物粒子の付着や脱落に起因 する D L C膜表面における凹凸の占有面積と膜厚の比を特定して、 表面 平滑性の限界的な値と したため、 あるいは基材上に成膜される D L C膜 を波長 6 3 2. 8 n mのレーザを用いたラマン分光スぺク ト^ "において、 1 0 0 0〜 1 2 0 0 c m— 1の間にピークを有する特性バンドを持ち、 D パン ドと Gバンドの面積強度比がいずれも 0. 8以下であり、 且つ当該 特性バンドと Dパン ドとのピーク強度比及び面積強度比が 0. 1 5以上 であるものとしたため、 高い耐磨耗性を示し、 切削抵抗が低い D L C被 覆工具とすることができる。 According to the present invention, the DLC film formed on the grave material is substantially free of hydrogen, is a DLC film classified as ta—C having a predetermined density and nanoindentation hardness, and Ratio of change in arithmetic average roughness of film surface after film formation to DLC film thickness relative to arithmetic average roughness of substrate surface before film formation by needle-type surface shape measurement, and adhesion of foreign particles such as droplets Or due to omission The ratio of the uneven area on the surface of the DLC film and the film thickness ratio were specified to make the surface smoothness limit value, or the DLC film formed on the substrate had a wavelength of 6 3 2.8 nm The Raman spectroscopic spectrum using a laser has a characteristic band with a peak between 1 0 0 0 and 1 2 0 0 cm— 1 and the area intensity ratio between the D and G bands is both It is assumed that the peak intensity ratio and area intensity ratio between the characteristic band and the D band are 0.15 or more because of high wear resistance and low cutting resistance. It can be a cover tool.

Claims

請求の範囲 The scope of the claims 1. 基材上に実質的に水素を含まない D L C膜を形成して成る D L C 被覆工具であって、 上記 D L C膜の密度が 3. 0〜 3. 4 g / c m3、 ナ ノインデンテーショ ン硬さが 4 0〜 1 0 O G P a以下であると共に、 針 先端曲率半径 2 μ mの触針式表面形状測定器による測定送り 0. 0 1 m mの表面走査検出において、 上記基材の成膜前における被成膜面の算術 平均粗さ R a ( S ) に対する D L C膜面の算術平均粗さ R a (D) の絶 対値変化量 A R a ( n m) と当該 D L C膜の膜厚 t ( n m) との比厶 R a Z t (= I R a (D) 一 R a ( S ) \ / t ) が 0. 1以下、 且つ上記 D L C膜表面における異物粒子の付着及び Z又は脱離に起因する凸凹の 占有面積率 s の膜厚 tに対する比 s Z tが 0. 0 1 (%Z n m) 以下で あることを特徴とする D L C被覆工具。 1. A DLC-coated tool formed by forming a DLC film substantially free of hydrogen on a substrate, wherein the DLC film has a density of 3.0 to 3.4 g / cm 3 and a nano indentation. In the surface scanning detection of 0.01 mm surface scanning with a stylus type surface shape measuring instrument having a hardness of 40 to 10 OGPa or less and a needle tip curvature radius of 2 μm, The absolute value change AR a (nm) of the arithmetic average roughness Ra (D) of the DLC film surface relative to the arithmetic average roughness Ra (S) of the film formation surface before the film and the film thickness t of the DLC film R a Z t (= IR a (D)-1 R a (S) \ / t) is 0.1 or less, and the adhesion and Z or desorption of foreign particles on the DLC film surface A DLC-coated tool characterized in that the ratio s Z t of the occupying area ratio s due to unevenness to the film thickness t is 0.0 1 (% Z nm) or less. 2. 上記 D L C膜表面の凹凸のうち、 直径 0. Ι μ πι以上の凸部の個 数 Ν ρ (個 Zmm2) の膜厚 t (mm) に対する比 N p Z tが 1. 5 X 1 08 (個 Zmm3) 以下であることを特徴とする請求項 1 に記載の D L'C 被覆工具。 2. Of the irregularities on the surface of the DLC film, the ratio N p Z t of the number of convex parts with a diameter of 0. Ι μ πι or more Ν ρ (piece Zmm 2 ) to the film thickness t (mm) is 1.5 X 1 The D L'C coated tool according to claim 1, characterized in that the number is 0 8 (piece Zmm 3 ) or less. 3. 上記 D L C膜表面の凹凸のうち、 直径 0. Ι μ ιη以上の凹部の個 数 N h (個 Zmm 2) の膜厚 t (mm) に対する比 N h Z tが 1. 0 X 1 08 (個/ mm3) 以下であることを特徴とする請求項 1又は 2に記載の D L C被覆工具。 3. Of the irregularities on the surface of the DLC film, the ratio of the number of recesses with a diameter of 0. 0 μ ιη or more N h (pieces Zmm 2 ) to the film thickness t (mm) N h Z t is 1.0 X 1 0 The DLC-coated tool according to claim 1 or 2, wherein the number is 8 (pieces / mm 3 ) or less. 4. 上記 D L C膜の膜厚が 1 O n m〜 l μ ηιであることを特徼とする 請求項 1 〜 3のいずれか 1つの項に記載の D L C被覆工具。 4. The DLC-coated tool according to any one of claims 1 to 3, wherein the thickness of the DLC film is 1 O nm to l μηι. 5. 上記 D L C膜が圧縮応力を有し、 その内部応力が 6〜 1 4 G P a であることを特徴とする請求項 1〜 4のいずれか 1つの項に記載の D L C被覆工具。 5. The DLC coating tool according to any one of claims 1 to 4, wherein the DLC film has a compressive stress, and the internal stress is 6 to 14 GPa. 6. 6 0 0 °C大気中で、 1時間保持した後の D L C膜の算術平均粗さ R a の変化量が 0. 0 5 μ πι以下であることを特徴とする請求項 1〜 5 のいずれか 1つの項に記載の D L C被覆工具。 6. The amount of change in the arithmetic average roughness R a of the DLC film after holding for 1 hour in the atmosphere at 60 ° C. is not more than 0.05 μπι. DLC coated tool according to any one of the sections. 7. 上記 D L C膜のプラズモンロススぺク トルのピークエネルギーが 2 9〜 3 3 e Vであることを特徴とする請求項 1〜 6のいずれか 1つの 項に記載の D L C被覆工具。 7. The DLC coated tool according to any one of claims 1 to 6, wherein the peak energy of the plasmon loss spectrum of the DLC film is 29 to 33 eV. 8. 基材上に実質的に水素を含まない D L C膜を形成して成る D L C 被覆工具であって、 上記 D L C膜の波長 6 3 2. 8 n mのレーザを用い たラマン分光スぺク トルにおいて、 1 0 0 0〜 1 2 0 0 c m— 1の間にピ ークを有する特性パンドを持ち、 Dバン ドと Gパン ドの面積強度比が 0. 8以下であり、 且つ当該特性バンドと Dバンドとのピーク強度比及び面 積強度比がいずれも 0. 1 5以上であることを特徴とする D L C被覆ェ 具。 8. A DLC-coated tool formed by forming a DLC film substantially free of hydrogen on a substrate, in a Raman spectroscopic spectrum using a laser having a wavelength of 6 3 2.8 nm. 1 to 100 cm with a characteristic band having a peak between 1 , the area intensity ratio of D band and G band is 0.8 or less, and the characteristic band A DLC coating tool characterized in that both the peak intensity ratio and the area intensity ratio with the D band are 0.15 or more. 9. 上記基材が鉄基合金であることを特徴とする請求項 1〜 8のいず れか 1つの項に記載の D L C被覆工具。 9. The DLC coated tool according to any one of claims 1 to 8, wherein the base material is an iron-based alloy. 1 0. 上記基材が超硬合金であることを特徴とする請求項 1〜 8のい ずれか 1つの項に記載の D L C被覆工具。 10. The DLC-coated tool according to any one of claims 1 to 8, wherein the base material is a cemented carbide. 1 1. D L C膜を被覆したことによって超硬合金基材の WC粒子に加 わる応力 y (G P a ) の膜厚 x ( μ m) に対する比 y / xが 0. 2〜 2. 0の範囲であることを特徴とする請求項 1 0に記載の D L C被覆工具。 1 1. Ratio y / x of stress y (GPa) to film thickness x (μm) applied to WC particles of cemented carbide substrate by coating DLC film is in the range of 0.2 to 2.0 The DLC-coated tool according to claim 10, wherein 1 2. 上記基材と D L C膜との間に、 0. l〜 5 0 0 n mの厚さを有 する金属膜、 非金属固体膜、 窒化物膜、 窒化水素化物膜、 酸化物膜、 酸 化水素化物膜、 酸化炭化物膜、 酸化炭化水素化物膜、 窒化酸化物膜、 窒 化酸化水素化物膜、 窒化炭化物膜、 窒化炭化水素化物膜、 窒化酸化炭化 物膜及び窒化酸化炭化水素化膜から成る群より選ばれた少なく とも 1種 から成る中間層を備えていることを特徴とする請求項 1〜 1 1のいずれ か 2つの項に記載の D L C被覆工具。 1 2. Metal film, non-metal solid film, nitride film, hydride film, oxide film, acid film having a thickness of 0.1 to 500 nm between the above substrate and DLC film From hydride film, oxycarbide film, oxyhydrocarbon film, oxynitride film, oxynitride oxyhydride film, nitrocarbide film, nitrocarbide film, oxynitride oxynitride film and oxynitride oxycarbide film The DLC coated tool according to any one of claims 1 to 11, further comprising an intermediate layer made of at least one selected from the group consisting of: 1 3. 上記 D L C膜が陰極と直面対向する位置にドロ ップレツ ト捕集 手段を備えたフィルタードア一ク蒸着装置により コーティングされてい ることを特徴とする請求項 1〜 1 2のいずれか 1つの項に記載の D L C 被覆工具。 1 3. The DLC film according to any one of claims 1 to 12, wherein the DLC film is coated at a position facing the cathode and facing by a filter door deposition apparatus having a droplet collecting means. DLC coated tool as described in section. 1 4. ドリ ル、 エン ドミル、 エン ドミル加工用刃先交換型チップ、 フ ライス加工用刃先交換型チップ、 旋削用刃先交換チップ、 メ タルソー、 歯き り工具、 リーマ、 又はタップであることを特徴とする請求項 1〜 1 3のいずれか 1つの項に記載の D L C被覆工具。 1 4. Feature of drill, end mill, tip changeable tip for milling, tip changeable tip for frying, tip replacement tip for turning, metal saw, toothing tool, reamer, or tap The DLC-coated tool according to any one of claims 1 to 13. 1 5. アルミ二ゥム合金材 A 5 0 5 2、 A C 4 A (T 6処理) 及ぴ A D C 1 2を被切削材と して乾式切削加工した場合に、 加工に伴って得ら れる切り屑カール半径の D L C被覆未処理のチップによる力ール半径に 対する比率が 0. 7以下であることを特徴とする請求項 1〜 1 4のいず れか 1つの項に記載の D L C被覆工具 1 5. Aluminum alloy material A 5 0 5 2, AC 4 A (T 6 treatment) and ADC 1 2 cut when dry cutting is performed as the work material The ratio of the scrap curl radius to the force radius of the DLC-coated untreated chips is 0.7 or less, any one of claims 1 to 14 DLC coated tool as described in one section 1 6 . アルミニウム合金材 A 5 0 5 2を被切削材と して乾式切削加工 した場合に、 切削初期における切削抵抗の D L C被覆未処理のチップに よる切削抵抗に対する比率が、 主分力で 0 . 6以下、 背分力で 0 . 7以 下、 主分力と背分力と送り分力の合力で 0 . 7以下であることを特徴と する請求項 1〜 1 5のいずれか 1つの項に記載の D L C被覆工具。 1 6. When aluminum alloy material A 5 0 5 2 is dry-cut as the work material, the ratio of the cutting resistance to the cutting resistance due to the DLC-coated untreated chip at the initial stage of cutting is 0 as the main component force. 6 or less, the back component force is 0.7 or less, and the combined force of the main component force, the back component force and the feed component force is 0.7 or less. DLC coated tool according to item. 1 7 . 成型加工用パンチ又はダイであることを特徴とする請求項 1〜 1 3のいずれか 1つの項に記載の D L C被覆工具。 1 7. The DLC coated tool according to any one of claims 1 to 13, which is a punch or die for molding.
PCT/JP2008/060089 2007-06-01 2008-05-26 Dlc-coated tool Ceased WO2008149824A1 (en)

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