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WO2008143518A1 - Dispositif et procédé pour exposer des tranches à un liquide - Google Patents

Dispositif et procédé pour exposer des tranches à un liquide Download PDF

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Publication number
WO2008143518A1
WO2008143518A1 PCT/NO2008/000170 NO2008000170W WO2008143518A1 WO 2008143518 A1 WO2008143518 A1 WO 2008143518A1 NO 2008000170 W NO2008000170 W NO 2008000170W WO 2008143518 A1 WO2008143518 A1 WO 2008143518A1
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
liquid
transportation
wafers
holding device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/NO2008/000170
Other languages
English (en)
Inventor
Erik Sauar
Robertus Antonius Steeman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renewable Energy Corp ASA
Original Assignee
Renewable Energy Corp ASA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renewable Energy Corp ASA filed Critical Renewable Energy Corp ASA
Priority to DE112008001312T priority Critical patent/DE112008001312T5/de
Priority to CN2008800164818A priority patent/CN101689524B/zh
Publication of WO2008143518A1 publication Critical patent/WO2008143518A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H10P72/33—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G15/00—Conveyors having endless load-conveying surfaces, i.e. belts and like continuous members, to which tractive effort is transmitted by means other than endless driving elements of similar configuration
    • B65G15/30—Belts or like endless load-carriers
    • B65G15/32—Belts or like endless load-carriers made of rubber or plastics
    • B65G15/42—Belts or like endless load-carriers made of rubber or plastics having ribs, ridges, or other surface projections
    • B65G15/44—Belts or like endless load-carriers made of rubber or plastics having ribs, ridges, or other surface projections for impelling the loads
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G17/00—Conveyors having an endless traction element, e.g. a chain, transmitting movement to a continuous or substantially-continuous load-carrying surface or to a series of individual load-carriers; Endless-chain conveyors in which the chains form the load-carrying surface
    • B65G17/06—Conveyors having an endless traction element, e.g. a chain, transmitting movement to a continuous or substantially-continuous load-carrying surface or to a series of individual load-carriers; Endless-chain conveyors in which the chains form the load-carrying surface having a load-carrying surface formed by a series of interconnected, e.g. longitudinal, links, plates, or platforms
    • B65G17/063—Conveyors having an endless traction element, e.g. a chain, transmitting movement to a continuous or substantially-continuous load-carrying surface or to a series of individual load-carriers; Endless-chain conveyors in which the chains form the load-carrying surface having a load-carrying surface formed by a series of interconnected, e.g. longitudinal, links, plates, or platforms the load carrying surface being formed by profiles, rods, bars, rollers or the like attached to more than one traction element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/02—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid
    • B65G49/04—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction
    • B65G49/0409—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction specially adapted for workpieces of definite length
    • B65G49/0413—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction specially adapted for workpieces of definite length arrangements for conveyance through the bath
    • B65G49/0418—Conveying systems characterised by their application for specified purposes not otherwise provided for for conveying workpieces through baths of liquid the workpieces being immersed and withdrawn by movement in a vertical direction specially adapted for workpieces of definite length arrangements for conveyance through the bath chain or belt conveyors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10P72/0416—
    • H10P72/0426—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Definitions

  • the present invention relates to a device and method for exposing wafers to a liquid.
  • Thin wafers are also lighter, and there is a risk that light wafers having a relative large surface area actually will float in the liquid, thereby causing that only one surface get exposed to the liquid.
  • the object of the present invention is to provide a device and method for exposing wafers to a liquid where the volume of the liquid tub can be reduced, thereby reducing the overall consumption of liquid. Moreover, it is an object of the present invention to provide a device and method where thinner wafers are handled gently so that breakage is avoided. Further, it is important to ensure that both surfaces of the wafer are exposed to the liquid. Finally, it is an object of the present innovation to be able to remove broken wafers without interrupting operation.
  • the present invention relates to a device for exposing a solar cell wafer to a liquid, comprising: a container filled with the liquid; a transportation device for transporting the wafer through the liquid; and a holding device for carrying the wafer together with the transportation device and submerging the wafer into the liquid, where the holding device has a substantially T-shaped cross section.
  • the holding device has a cross section substantially formed as two T's placed on top of each other.
  • the transportation device and/or holding device comprises perforations, meshes or other openings for allowing the liquid to circulate around the wafer and to ensure good mixing between the liquid above and below the wafers.
  • the holding device is fastened to the transportation device.
  • the transportation device comprises wiping means to push broken wafers to one end of the liquid container.
  • the holding device on the transportation device is shaped so that a strong bending of the movement direction of the transportation device can be used to automatically load and unload wafers from or to one or several transportation band(s), band(s) that preferably are moving the wafers at the same or a similar speed as the transportation device. In this way conventional pick- and-place robots can be avoided so that both investment costs and wafer breakage is reduced.
  • the device comprises guiding means to prevent the wafers from sliding out of position sideways.
  • the device comprises fluid control means to provide a near-symmetrical relative liquid flow above and below the wafer.
  • the holding device has a hard-wearing, polished surface towards the wafer while the material behind is softer such as foamed rubber etc. in order to provide a dampened touch for the wafer.
  • FIG. 1 illustrates a first embodiment of the invention
  • Fig. 2 illustrates a second embodiment of the invention
  • Fig. 3 illustrates a third embodiment of the invention
  • Fig. 4a and 4b illustrate details of the carrier devices in fig. 2;
  • Fig. 5 illustrates details of the carrier devices in fig. 3;
  • Fig. 6 illustrates details of the carrier devices of a fourth embodiment of the invention.
  • Fig. 7 illustrates the fifth embodiment of the invention
  • Fig. 8 is an enlargement of some details in fig. 7
  • Fig. 9 illustrates the sixth embodiment of the invention
  • Fig 10 illustrates a transportation device having wiping means.
  • the device 1 comprises a container 2 filled with a liquid 3.
  • the container 2 is shallow to reduce the volume of the liquid 3 that is used.
  • the device 1 further comprises a transportation device 4 for transporting a wafer 5 through the liquid.
  • the transportation device 4 comprises a transportation band 41 with carrier devices 42 to provide that the wafer 5 located between the carrier devices 42 is carried together with the transportation band through the liquid.
  • the transportation device 4 further comprises supporting rollers, driving means etc (not shown) for supporting and driving the transportation band 41 through the liquid.
  • the transportation band 41 moves submerged into the liquid from a first side 11 to a second side 12 of the device 1, in the direction of the arrow A.
  • the wafer 5 is put on the transportation band at the first side 11, for example transferred from a previous conveyor belt (not shown) and is removed from the transportation band 41 at the second side 12, for example transferred to a next conveyor belt (not shown).
  • the wafer is transported into the liquid at an angle ⁇ , which is exceeding 0.5 degrees in relation to the liquid surface. In this way it is ensured that the front end of the wafer is inserted into the wafer before the rear end, and consequently, the wafer can break the surface tension without a force that could break the wafers.
  • the transportation band 41 preferably is a continuous band, which will be described in further detail in relation to the other embodiments of the invention.
  • the first embodiment 1 further comprises a submerging device 6 for ensuring that the wafer is submerged into the liquid and thereby providing that both sides of the wafer will be exposed to the liquid.
  • the submerging device 6 comprises a spraying device 6OA with a spraying nozzle 61 for spraying the liquid towards the wafer as the transportation band 41 is submerged into the liquid near the first side 11.
  • the transportation band 41 is made of any suitable material, such as chemically resistant materials like PMMA or PVDF which are acid proof. Moreover, the transportation band 41 and/or carrier device 42 has perforations, meshes or other openings to allow the liquid to circulate between the transportation band 41 and the two sides of the wafer 5.
  • the second embodiment of the device 1 according to the present invention will now be described with reference to fig. 2, fig. 4a and fig. 4b.
  • the second embodiment comprises many of same elements as in the first embodiment, and the same reference numbers are used here. Those elements will therefore not be described in detail here.
  • the transportation device 4 is arranged by means of rollers 7 to pass under the container 2 from the second end 12 back to the first end 11.
  • the transportation device may include guiding lines or devices, which either pulls the transportation device down into the liquid or pushes it from above.
  • the functions of the submerging device 6 and the carrier device 42 are achieved by means of a holding device 6OB, i.e. the holding device is provided for carrying the wafer together with the transportation device and for submerging the wafer into the liquid.
  • the holding device 6OB has a substantially T- shaped cross-section, comprising a base member 62B and a cross member 64B fastened to an upper end of the base member 62B. A lower end of the base member 62B is fastened to the transportation band 41.
  • a wafer 5 is put on a sloping part of the transportation band 41 near a roller 7 on the first side 11.
  • the wafer 5 will glide along the transportation band 41 in the direction shown by arrow B until a front end 13 of the wafer 5 meets the base member 62B of a first holding device 6OB.
  • a second holding device 6OB (as seen to the left in fig. 4b) will pass over the roller 7 and hold a rear end 14 of the wafer 5. Consequently, the holding device 6OB provides the function of the carrier device of the first embodiment since the wafer 5 is carried between two holding devices 60 B along with the transportation device 4.
  • the holding device 6OB provides the function of the submerging device of the first embodiment since the wafer 5 is forced downwards into the liquid together with the transportation device 4 by means of the cross members 64B, thereby providing that the upper surface of the wafer 5 also is exposed to liquid.
  • the third embodiment of the device 1 according to the present invention will now be described with reference to fig. 3 and fig. 5.
  • the third embodiment comprises many of same elements as in the first embodiment, and the same reference numbers are used here. Those elements will therefore not be described in detail here.
  • the transportation device 4 is arranged by means of rollers 7 to pass over the container 2 from the second end 12 back to the first end 11.
  • the functions of the submerging device 6 and the carrier device 42 are achieved by means of a holding device 6OC, i.e. the holding device is provided for carrying the wafer together with the transportation device and for submerging the wafer into the liquid.
  • the holding device 6OC has a cross section substantially formed as two T's placed on top of each other, oriented with a base member 62C pointing upwards and with its upper end fastened to the transportation band.
  • the holding device 6OC further comprises a first cross member 64C fastened to a lower end of the base member 62C and a second cross member 66C fastened to the central part of the base member 62C, as shown in fig. 5.
  • the wafer 5 is fastened to the holding device 6OC in similar way as in the second embodiment, by utilizing a sloping part of the transportation band 41.
  • the holding device 6OC is holding the end of a wafer 5 between the first cross member 64C and the second cross member 60, as shown in fig. 5.
  • the holding device 6OC provides the function of the carrier device of the first embodiment since the wafer 5 is carried between two holding devices 6OC along with the transportation device 4. Moreover, the holding device 6OC provides the function of the submerging device of the first embodiment since the wafer 5 is forced downwards into the liquid by means of the first and second cross members 64C, 66C, thereby providing that the upper surface of the wafer 5 is exposed to liquid.
  • One advantage with the third embodiment is that the transportation band 41 itself must not necessarily be submerged into the liquid, it is sufficient that the holding devices 6OC are submerged together with the wafers.
  • the fourth embodiment of the device 1 according to the present invention will now be described with reference to fig. 6.
  • the fourth embodiment comprises many of same elements as in the first embodiment, and the same reference numbers are used here. Those elements will therefore not be described in detail here.
  • the transportation device 4 is arranged in the same way as in the second embodiment; that is to pass under the container 2 from the second end 12 back to the first end 11.
  • the functions of the submerging device 6 and the carrier device 42 are achieved by means of a holding device 6OD, i.e. the holding device is provided for carrying the wafer together with the transportation device and for submerging the wafer into the liquid.
  • the holding device 6OD comprises a tappet 62D protruding from transportation band 41 and a top belt 64D (indicated by a dashed line in fig. 6).
  • the top belt 64D is perforated or alternatively consist only of multiple strings or lines, and is arranged in a loop over the container, such as in the third embodiment shown in fig. 3.
  • the function of the top belt 64D may also be achieved by means of permanent bars mounted on fixtures above the bath or mounted to the bottom.
  • the wafer 5 is put on the transportation band 41 between two tappets 62D on the first side 11 of the device 1. As the transportation band 41 moves, the top belt 64D will get closer to the transportation band 41 and during the transportation through the liquid, the tappets 62D will be engaged in the perforations of the top belt 64 D.
  • the holding device 6OD provides the function of the carrier device of the first embodiment since the wafer 5 is carried between the two tappets 62D along with the transportation device 4. Moreover, the holding device 6OD provides the function of the submerging device of the first embodiment since the wafer 5 is forced downwards into the liquid by means of the top belt 64D, thereby providing that the upper surface of the wafer 5 is exposed to liquid.
  • the fifth embodiment of the device 1 according to the present invention will now be described with reference to fig. 7.
  • the fifth embodiment comprises many of same elements as in the first embodiment, and the same reference numbers are used here. Those elements will therefore not be described in detail here.
  • the transportation device 4 is arranged in the same way as in the third embodiment; that is to pass over the container 2 from the second end 12 back to the first end 11.
  • the functions of the submerging device 6 and the carrier device 42 are achieved by means of a holding device 6OE, i.e. the holding device is provided for carrying the wafer together with the transportation device and for submerging the wafer into the liquid.
  • the holding device 6OE has a cross section substantially formed as a dove tail joint, where the end of the wafer 5 is received and held by a wedge-shaped opening 62E.
  • the wedge shaped opening has preferably rounded edges.
  • the wedge shaped opening is preferably spacious with regard to the wafer to avoid that the wafer is stuck in the opening.
  • the transportation device 6 comprises two separate transportation bands 41, each of which is located on the respective side of the container 2 containing the liquid 3. Between the transportation bands 41 three and three holding devices 6OE are arranged on a holding bar 64E.
  • the holding bar 64E is in each end fixed to the transportation band 41 and moves together with the transportation band. In this way, three and three wafers 5 can be transported through the liquid in parallel.
  • the fifth embodiment further comprises a distance arrangement 70 for providing sufficient distance between the parallel wafers 5.
  • the distance arrangement 70 comprises a distance bar 72 fastened between the transportation bands 41, having distance elements 74 adapted to receive a wafer 5 between the distance elements 74, thereby preventing the wafers from moving sideways (perpendicular to arrow A). In fig. 8 it is shown that the distance bar comprises six distance elements 74.
  • each holding bar 64E there are one distance arrangement 70 on each side of each holding bar 64E (note that the rightmost distance arrangement 70 is omitted for clarity in fig. 7 and 8).
  • the holding device 6OE provides the function of the carrier device of the first embodiment since the wafer 5 is carried between two holding devices 6OE along fastened to the transportation device 4. Moreover, the holding device 6OE provides the function of the submerging device of the first embodiment since the wafer 5 is forced downwards into the liquid by means of its dove-tail shape.
  • the holding devices 6OE are perforated to allow the liquid to circulate around the wafer.
  • the holding device 6OE should ideally have a strong, polished surface (to avoid the wafers cutting into it) over a relatively soft material (to minimize impact on the wafers) inside the wedge shaped openings.
  • the sixth embodiment of the device 1 according to the present invention will now be described with reference to fig. 9.
  • the sixth embodiment comprises many of same elements as in the above embodiments, and the same reference numbers are used here. Those elements will therefore not be described in detail here.
  • the transportation device 4 is arranged by means of rollers 7 to pass under the container 2 from the second end 12 back to the first end 11.
  • the functions of the submerging device 6 is achieved by means of a bar device 6OF.
  • the bar device 6OF comprises a plurality of bars 62F located over the transportation band 41 and preferably below the surface of the liquid 3.
  • the bar device 6OF can also comprise guiding bars 64F provided above the surface of the liquid 3 near the first end 11 of the device 1, to guide the wafers along the transportation into the liquid, as shown in fig. 9. In this way, any floating of the wafers will be obstructed by the bar device 6OF and it is ensured that the wafers are submerged into the liquid.
  • the bars 62F and guiding bars 64F are located perpendicular to the transportation direction (arrow A), it would of course be possible to have the bar device 6OF arranged in parallel to the transportation band 41.
  • the bar device 6OF can also be provides as a grating or similar arrangement - the important feature is to guide the wafers so that they are submerged in the liquid.
  • each wafer is held separately by the holding device. Moreover, the wafers are held substantially in a horizontal position during transportation through the liquid.
  • all the above described submerging devices and transportation devices can comprise perforations, meshes, channels or other openings for allowing the liquid to circulate around the wafer.
  • all the embodiments above may comprise guiding means to guide the wafers in the direction of arrow A through the liquid.
  • the guiding means can be fastened to the transportation device or to the container.
  • the flexibility of thin wafers can be utilized to get a better grip on the wafer. This is achieved by making the distance between the holding devices somewhat smaller than the length of the wafer, so that the wafer is transported in a bent state. Moreover, it would be possible to insert the wafers 5 transversely into the holding device 6OB, 6OC, 64D instead of using a sloping transportation band 41 to lock the second end 14 of the wafer by means of the holding device 6OB.
  • the transportation device 4 comprises wiping means 80 that is protruding downwards from the transportation band.
  • the purpose of the wiping means 80 is to wipe or brush the bottom of the liquid container 2 so that broken wafers that have fallen off the transportation device can be pushed to one end of the container and thereafter be removed from the container in an easy way, without disturbing the operation. It should be noted that the wiping means can be used regardless of which side of the transportation device having the holding devices.
  • the transportation device and holding device can be designed and arranged in a way that provides a near symmetrical liquid flow pattern below and above the wafer.
  • can plates above and/or below the wafer or similar means be fixed to the container to control the relative fluid flow in the container as the transportation device and holding devices moves.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

L'invention porte sur un procédé et un dispositif pour exposer une tranche de cellule solaire à un liquide. Le dispositif comprend un conteneur rempli de liquide, un dispositif de transport pour transporter la tranche vers le liquide et un dispositif de support pour porter la tranche conjointement avec le dispositif de transport.
PCT/NO2008/000170 2007-05-18 2008-05-15 Dispositif et procédé pour exposer des tranches à un liquide Ceased WO2008143518A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
DE112008001312T DE112008001312T5 (de) 2007-05-18 2008-05-15 Vorrichtung und Verfahren, um Wafer einer Flüssigkeit auszusetzen
CN2008800164818A CN101689524B (zh) 2007-05-18 2008-05-15 用于使晶片暴置于液体中的设备和方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US93871007P 2007-05-18 2007-05-18
GB0709619.1 2007-05-18
GB0709619A GB2449309A (en) 2007-05-18 2007-05-18 A method for exposing a solar cell wafer to a liquid
US60/938,710 2007-05-18

Publications (1)

Publication Number Publication Date
WO2008143518A1 true WO2008143518A1 (fr) 2008-11-27

Family

ID=38234724

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/NO2008/000170 Ceased WO2008143518A1 (fr) 2007-05-18 2008-05-15 Dispositif et procédé pour exposer des tranches à un liquide

Country Status (5)

Country Link
KR (1) KR20100022477A (fr)
CN (1) CN101689524B (fr)
DE (1) DE112008001312T5 (fr)
GB (1) GB2449309A (fr)
WO (1) WO2008143518A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009126043A3 (fr) * 2008-04-10 2009-12-23 Rec Solar As Dispositif de mise en contact
WO2010009865A1 (fr) * 2008-07-24 2010-01-28 Stangl Semiconductor Equipment Ag Dispositif et procédé pour le traitement et la manipulation d'un produit
WO2013110582A1 (fr) 2012-01-26 2013-08-01 Singulus Stangl Solar Gmbh Appareil et procédé pour le traitement des éléments de processus en forme de plaque
DE102012209902A1 (de) 2012-06-13 2013-12-19 Singulus Stangl Solar Gmbh Verfahren und Vorrichtung zum Behandeln von Halbleiterstäben mit einer Flüssigkeit oder einem Gas
RU2746153C2 (ru) * 2016-04-06 2021-04-07 Сэн-Гобэн Гласс Франс Устройство для транспортировки и удержания листов стекол, в частности в установке мойки, и связанный с ним способ

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009123450A1 (fr) * 2008-04-01 2009-10-08 Stichting Energieonderzoek Centrum Nederland Agencement et procédé pour graver une tranche de silicium
DE102011050324A1 (de) * 2011-05-12 2012-11-29 Roth & Rau Ag Substrattransportmodul, Belade- und Entladesystem und Transportverfahren für Substrate in einer Substratbearbeitungsanlage
CN102807064A (zh) * 2012-09-04 2012-12-05 昆山市圣吉川工业自动化设备有限公司 钢枝输送带
FR3049940B1 (fr) * 2016-04-06 2018-04-13 Saint- Gobain Glass France Dispositif de support pour feuille de verre notamment dans une installation de lavage
CA2968115A1 (fr) * 2017-05-24 2018-11-24 Steven Kelley Systeme de transporteur a spirale destine a immerger des articles dans un liquide
WO2021090565A1 (fr) * 2019-11-05 2021-05-14 株式会社トクヤマ Dispositif de gravure pour fil à cœur de silicium et procédé de gravure pour fil à cœur de silicium

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4635788A (en) * 1984-07-12 1987-01-13 Cincinnati Milacron Inc. Conveyor
JPS6342131A (ja) * 1986-08-08 1988-02-23 Nec Corp 半導体ウエ−ハの処理装置
JPH0521936A (ja) * 1991-07-12 1993-01-29 Seiko Epson Corp 回路基板洗浄方法及び洗浄装置
JPH08115862A (ja) * 1994-10-13 1996-05-07 Hitachi Ltd 現像装置
JP2002203888A (ja) * 2000-10-23 2002-07-19 Sharp Corp 太陽電池セルの製造装置及び製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU772539B2 (en) * 1999-07-29 2004-04-29 Kaneka Corporation Method for cleaning photovoltaic module and cleaning apparatus
JP2001170583A (ja) * 1999-12-15 2001-06-26 Kanegafuchi Chem Ind Co Ltd 超音波洗浄装置及び超音波洗浄方法
JP2002203800A (ja) * 2000-10-30 2002-07-19 Canon Inc ウエハカセット、これを用いた液相成長方法および液相成長装置
JP2004210440A (ja) * 2002-12-27 2004-07-29 Ishikawajima Harima Heavy Ind Co Ltd 板状体の搬送装置
DE10320212A1 (de) * 2003-05-07 2004-12-02 Universität Konstanz Verfahren zum Texturieren von Oberflächen von Silizium-Scheiben

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4635788A (en) * 1984-07-12 1987-01-13 Cincinnati Milacron Inc. Conveyor
JPS6342131A (ja) * 1986-08-08 1988-02-23 Nec Corp 半導体ウエ−ハの処理装置
JPH0521936A (ja) * 1991-07-12 1993-01-29 Seiko Epson Corp 回路基板洗浄方法及び洗浄装置
JPH08115862A (ja) * 1994-10-13 1996-05-07 Hitachi Ltd 現像装置
JP2002203888A (ja) * 2000-10-23 2002-07-19 Sharp Corp 太陽電池セルの製造装置及び製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009126043A3 (fr) * 2008-04-10 2009-12-23 Rec Solar As Dispositif de mise en contact
WO2010009865A1 (fr) * 2008-07-24 2010-01-28 Stangl Semiconductor Equipment Ag Dispositif et procédé pour le traitement et la manipulation d'un produit
WO2013110582A1 (fr) 2012-01-26 2013-08-01 Singulus Stangl Solar Gmbh Appareil et procédé pour le traitement des éléments de processus en forme de plaque
DE102012210618A1 (de) 2012-01-26 2013-08-01 Singulus Stangl Solar Gmbh Vorrichtung und Verfahren zum Behandeln von plattenförmigem Prozessgut
DE102012209902A1 (de) 2012-06-13 2013-12-19 Singulus Stangl Solar Gmbh Verfahren und Vorrichtung zum Behandeln von Halbleiterstäben mit einer Flüssigkeit oder einem Gas
RU2746153C2 (ru) * 2016-04-06 2021-04-07 Сэн-Гобэн Гласс Франс Устройство для транспортировки и удержания листов стекол, в частности в установке мойки, и связанный с ним способ

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KR20100022477A (ko) 2010-03-02
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CN101689524B (zh) 2011-09-28
DE112008001312T5 (de) 2010-04-22
GB2449309A (en) 2008-11-19

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