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WO2008015700A2 - Procédé de nanopositionnement d'un objet et dispositif associé - Google Patents

Procédé de nanopositionnement d'un objet et dispositif associé Download PDF

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Publication number
WO2008015700A2
WO2008015700A2 PCT/IN2007/000230 IN2007000230W WO2008015700A2 WO 2008015700 A2 WO2008015700 A2 WO 2008015700A2 IN 2007000230 W IN2007000230 W IN 2007000230W WO 2008015700 A2 WO2008015700 A2 WO 2008015700A2
Authority
WO
WIPO (PCT)
Prior art keywords
actuator
nanopositioning
moving stage
shear
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IN2007/000230
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English (en)
Other versions
WO2008015700A3 (fr
Inventor
Hilaal Alam
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Individual
Original Assignee
Individual
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Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of WO2008015700A2 publication Critical patent/WO2008015700A2/fr
Anticipated expiration legal-status Critical
Publication of WO2008015700A3 publication Critical patent/WO2008015700A3/fr
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/02—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors
    • H02N2/021—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing linear motion, e.g. actuators; Linear positioners ; Linear motors using intermittent driving, e.g. step motors, piezoleg motors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0005—Apparatus specially adapted for the manufacture or treatment of microstructural devices or systems, or methods for manufacturing the same
    • B81C99/002—Apparatus for assembling MEMS, e.g. micromanipulators

Definitions

  • the field of invention is related to the nanopositioning technology with nanometer resolution. Moving an object in nanometer resolution for longer range in desired direction with just two actuators, whose expansion range, even with amplification lever is much smaller than the desired positioning range, is the crux of the invention. For example, moving the nanopositioning stage for 1000 micron just with 2 micron actuators is an example of the work.
  • This invention is related to positioning objects such as lenses, fibers, tools, sensors and other objects; with respect to nanometer resolution is a challenging one. With the advent of the technology in various fields such as photonics, optics, semiconductor, microscopy etc., the requirement for precise positioning with nanometer resolution is inevitable. Nano-tribology is another upcoming field which requires nanopositioning technology very much.
  • the invention made by M/S Omicron (US 5,237,238, GB 2 246 236, DE 40 23 31 1 C2,
  • J 2 089 171) is the closest prior art of the invention.
  • their methodology introduces friction is not at all desired in Nanopositioning and the invention is based on the inertia of the objects and stick and slip method.
  • Method also is based on inertial property of the stage and the object, the controlling parameters are the systems' stiffness and its natural frequency.
  • the speed of the Nanopositioner can be controlled by adjusting the stiffness of actuator and the mechanical trajectory guide. Larger displacement is possible with just a low range solid state actuators. The disadvantages are loss of motion during the r motion of actuators.
  • Figure 1 shows a nanopositioner assembly with various parts of the assembly and their direction of movement.
  • Figure Ia shows moving stage(l ) at its initial stage.
  • Figure Ib shows a nanopositioner assembly with Linear Actuator(4) fully expanded, Shear Actuators(3) at full expansion (sheared).
  • Figure Ic shows a nanopositioner assembly with Linear Actuator (4) zero expanded
  • Figure Id shows a nanopositioner assembly with Linear Actuator(4) fully expanded
  • Figure 2 shows the actual fabrication of the Nanopositioner.
  • the primary objective of the invention is to develop a method for nanopositioning of objects.
  • Another objective of the invention is to place the object onto a moving stage(2) and lifting shear actuator(3) vertically by expanding linear actuator(4) placed below the shear actuator(3) to bring it in contact with the moving stage(2),
  • Another objective of the invention is to develop a device for nanopositioning of objects.
  • Yet another objective of the invention is to develop moving stage(2) to hold the objects and shear actuator(3) to move the moving stage(2).
  • Still another objective of the invention is to develop linear actuator(4) to lift the shear actuator(3) to come in contact with the moving stage(2).
  • Yet another objective of the invention is to develop holder (1) to maintain the moving stage(2) in single axis direction.
  • Another objective of the invention is to develop a system for nanopositioning of objects comprising the device
  • the present invention is related to a method for nanopositioning of objects wherein said method comprises steps of: placing the object onto a moving stage(2), lifting shear actuator(3) vertically by expanding linear actuator(4) placed below the shear actuator(3) to bring it in contact with the moving stage(2), moving the stage horizontally in a single axis forward direction by expanding the shear actuator(3), making the shear actuator(3) to lose contact with the moving stage(2) by contracting the " linear actuator(4), maintaining the moving stage in single axis reverse direction due to holder(l ) stiffness and thereby nanopositioning the object; and a device for nanopositioning of objects comprising: moving stage(2) to hold the objects, shear actuator(3) to move the moving stage(2), linear actuator(4) to lift the shear actuator(3) to come in contact with the moving stage(2) and holder (1) to maintain the moving stage(2) in single axis direction; and a system for nanopositioning of objects comprising above device and a circuit to drive the actuators.
  • the primary embodiment of the invention is a method for nanopositioning of objects wherein said method comprises steps of: placing the object onto a moving stage(2), lifting shear actuator(3) vertically by expanding linear actuator(4) placed below the shear actuator(3) to bring it in contact with the moving stage(2), moving the stage horizontally in a single axis forward direction by expanding the shear actuator(3), making the shear actuator(3) to lose contact with the moving stage(2) by contracting the linear actuator(4). maintaining the moving stage in single axis reverse direction due to holder(l) stiffness and thereby nanopositioning the object.
  • the shear actuator(3) attains zero expansion before it touches the moving stage(2).
  • the linear actuator's(4) contracting and expanding time is equal to that of the shear actuator's (3) time for contracting to zero expansion.
  • resultant displacement of the moving stage(2) is difference in displacement due to the shear actuator(3) and displacement due to the holder (1).
  • the holder (1) stiffness is less than that of shear actuator (3).
  • Another main embodiment of the present invention a device for nanopositioning of objects comprising: moving stage(2) to hold the objects, shear actuator(3) to move the moving stage(2), linear actuator(4) to lift the shear actuator(3) to come in contact with the moving stage(2) and holder (1 ) to maintain the moving stage(2) in single axis direction.
  • the shear actuator (2) is stacked above the linear actuator (4).
  • the holder (or spring) (1 ) moves the moving stage (2) in one axis preventing sway and crosstalk motion.
  • the actuators are solid state actuator(s) preferable piezo crystals.
  • the holder (1) is spring.
  • the linear actuator's contracting and expanding time is equal to that of the shear actuator time for contracting to zero expansion/unactuated state.
  • the device is a monolithic structure.
  • FIG. 1 is a nanopositioner assembly showing the various parts of the assembly and their direction of movement.
  • the shear and linear actuators (3 and 4) are put together so that they work as a single system.
  • the shear actuator (3) is provided with the saw tooth triangle electronics signal pulse in such a way that, the shear actuator shears to push the moving stage (2) forward.
  • the linear actuator (4) As the linear actuator (4) is fully expanded, it always holds the shear actuator (3) against the moving stage (2) firmly. Due to the shear in the shear actuator (3), the moving stage (2) goes along with the shear actuator (3).
  • Step 1 the figure shows moving stage(l ) at its initial stage wherein the holder/spring(l) is not under any stress.
  • the object to be nanopositioned is placed on the moving stage.
  • the Linear Actuator(4) is fully expanded, Shear Actuators(3) is at zero expansion (i.e.unactuated state) and Nanopositioner at zero displacement.
  • the linear actuator(4) actually lifts the shear actuator(3) vertically there by making the shear actuator to contact the moving stage(2).
  • the holders( l ) are flexible springs which deforms on application of force, holder (1) maintain the moving stage(2) in single axis direction thereby preventing sway and crosstalk motion of the moving stage.
  • Step 2 Linear Actuator(4) fully expanded, Shear Actuators(3) at full expansion (sheared) with "x" displacement and Nanopositioner at “x” displacement as well.
  • Step 3 Linear Actuator (4) zero expanded, Shear Actuator (3) at zero expansion and Nanopositioner at zero displacement (reversal displacement - y)
  • Linear actuator (4) contracts and shear actuator is released to its original state i.e. non- expansion or unactuated state.
  • the actuators are not in touch with moving stage (2). So due to spring action of the holder/ spring (1), the moving stage will also tend to go in reverse direction.
  • the speed of reversal motion of actuators is faster than that of the moving stage (2) due to the difference in the stiffness of holder/spring (1) and actuators.
  • the reversal displacement of the moving stage(2) due to the stiffness of the holder (1) as "y". Now the resultant displacement of the moving stage (2) is
  • Step 4 (see figure Id): Linear Actuator(4) fully expanded, Shear Actuator(3) at zero expansion and Nanopositioner at (x - y) displacement
  • Linear actuator (4) expands and shear actuator (3) is still at zero expansion.
  • the moving stage (2) also is stationary.
  • the linear actuator's (4) contracting and expanding time is equal to that of the shear actuator's (3) time for contracting to zero expansion.
  • Step 5 Linear Actuator (4) fully expanded, Shear Actuator (3) at full expansion (sheared) with "x" displacement.
  • the Nanopositioner moves from (x - y) by "x'" distance.
  • shear actuator (3) shears, it takes the moving stage (2) along with it to "X s" displacement (i.e. full range expansion of the solid state actuators).
  • the moving stage (2) moves from (x - y) to x
  • I f step 1 to step 4 is considered as one cycle, the total displacement that can be produced with the actuator that expands for "x" distance, is
  • An apparatus of the invention may comprise the following blocks.
  • Solid state actuator like Piezo crystal/crystals in housing (collectively called a piezo actuator): Piezo actuator acts like a motor to displace the moving stage. The piezo has a characteristic to expand in size when applied with voltage.
  • Mechanical stage This is mechanical moving stage shown in the figure
  • Power supply to provide power to the piezo actuator The power supply is required to apply voltage into the piezo such that piezo expands.
  • the piezo housing has to be designed keeping the piezo material characteristics, housing material, insulation material and preload requirement in mind.
  • the fabrication is done using standard machining techniques like milling, shaping and drilling.
  • the assembly is then undertaken manually. Thereafter, it is tested and calibrated using high-end interferometer equipments or capacitance sensors.
  • the power supply drives the piezo actuator. These supplies are standard off-the shelf components. The important issues while selecting the right power supply is stability of output, noise, resolution and output current.
  • the speed of the linear actuator is twice that of the speed of the shear actuator.
  • the stiffness of the mechanical spring systems is designed to be less than that of the shear actuator.
  • the condition of working model is
  • the picture in figure 2 shows the actual fabrication of the Nanopositioner.
  • the material is stainless steel with the following specifications:
  • 15 shows the steel made monolithic nanopositioner
  • 14 is linear actuator "
  • 13 indicates the shear actuator
  • the maximum displacement of the flexible compliance stage can be calculated as
  • the nanopositioner can produce displacement up to 1000 mircon (1 mm) and the stiffness is 9.5157E-07 kN/micron.
  • the dynamic analysis shows that the natural frequency of the stage is 0.21991612 Hz.
  • Actuator Design The actuator stiffness should be more than that of the stiffness of the stage.
  • the stiffness of the actuator is 0.003070446 kN / micron which is more than the value of stage.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Apparatuses For Generation Of Mechanical Vibrations (AREA)
  • Details Of Measuring And Other Instruments (AREA)

Abstract

Selon l'invention, deux actionneurs sont fixés l'un à l'autre. Un des actionneurs accomplit un déplacement de cisaillement tandis que l'autre accomplit un déplacement linéaire. L'actionneur de cisaillement est placé de telle sorte que l'étage mobile veient au contact de l'actionneur. L'actionneur linéaire est placé sous l'actionneur de cisaillement. Ce montage est réalisé au-dessus de la zone fixe de l'étage monolithique. La rigidité de l'étage mécanique est inférieure à celle des actionneurs à semiconducteurs. Cette combinaison fonctionne efficacement lorsque la pulsion continue est envoyée à l'actionneur, à la fréquence de ce dernier.
PCT/IN2007/000230 2006-07-31 2007-06-08 Procédé de nanopositionnement d'un objet et dispositif associé Ceased WO2008015700A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IN1356CH2006 2006-07-31
IN01356/CHE/2006 2006-07-31

Publications (2)

Publication Number Publication Date
WO2008015700A2 true WO2008015700A2 (fr) 2008-02-07
WO2008015700A3 WO2008015700A3 (fr) 2009-09-24

Family

ID=38997579

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IN2007/000230 Ceased WO2008015700A2 (fr) 2006-07-31 2007-06-08 Procédé de nanopositionnement d'un objet et dispositif associé

Country Status (1)

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WO (1) WO2008015700A2 (fr)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69128104T2 (de) * 1990-05-18 1998-04-09 Hitachi Ltd Elektronenmikroskop, Probenstellglied für ein Elektronenmikroskop und Verfahren zum Beobachten von mikroskopischen Bildern
DE4023311A1 (de) * 1990-07-21 1992-01-23 Omicron Vakuumphysik Verstellvorrichtung fuer mikrobewegungen
EP1764185B1 (fr) * 2004-04-23 2008-07-09 Schott AG Dispositif et méthode pour la production de micro-structures
TWI237618B (en) * 2004-06-03 2005-08-11 Ind Tech Res Inst A long-distance nanometer positioning apparatus

Also Published As

Publication number Publication date
WO2008015700A3 (fr) 2009-09-24

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