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WO2008099787A1 - 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれらを用いた光導波路 - Google Patents

光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれらを用いた光導波路 Download PDF

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Publication number
WO2008099787A1
WO2008099787A1 PCT/JP2008/052175 JP2008052175W WO2008099787A1 WO 2008099787 A1 WO2008099787 A1 WO 2008099787A1 JP 2008052175 W JP2008052175 W JP 2008052175W WO 2008099787 A1 WO2008099787 A1 WO 2008099787A1
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WO
WIPO (PCT)
Prior art keywords
optical material
resin composition
optical
resin
resin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/052175
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English (en)
French (fr)
Inventor
Tatsuya Makino
Atsushi Takahashi
Masatoshi Yamaguchi
Toshihiko Takasaki
Tomoaki Shibata
Masami Ochiai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2008558077A priority Critical patent/JP5365198B2/ja
Priority to EP08711054A priority patent/EP2112181A4/en
Priority to US12/526,812 priority patent/US8463099B2/en
Publication of WO2008099787A1 publication Critical patent/WO2008099787A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/06—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polyethers, polyoxymethylenes or polyacetals
    • C08F283/08—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polyethers, polyoxymethylenes or polyacetals on to polyphenylene oxides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/06—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polyethers, polyoxymethylenes or polyacetals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/061—Polyesters; Polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/062—Polyethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/08—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to macromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Engineering & Computer Science (AREA)
  • Optical Integrated Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

　（Ａ）カルボン酸変性フェノキシ樹脂、（Ｂ）重合性化合物、及び（Ｃ）重合開始剤を含有してなる光学材料用樹脂組成物、該樹脂組成物からなる光学材料用樹脂フィルム、並びにこれらを用いて形成されたコア部及び／又はクラッド層を有する光導波路である。耐熱性と透明性に優れ、かつアルカリ性水溶液に可溶な光学材料用樹脂組成物、該樹脂組成物からなる光学材料用樹脂フィルム及びこれらを用いて製造される光導波路を提供する。
PCT/JP2008/052175 2007-02-14 2008-02-08 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれらを用いた光導波路 Ceased WO2008099787A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2008558077A JP5365198B2 (ja) 2007-02-14 2008-02-08 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれらを用いた光導波路
EP08711054A EP2112181A4 (en) 2007-02-14 2008-02-08 RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE USING THE SAME
US12/526,812 US8463099B2 (en) 2007-02-14 2008-02-08 Resin composition for optical material, resin film for optical material, and optical waveguide using them

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-033357 2007-02-14
JP2007033357 2007-02-14
JP2007125854 2007-05-10
JP2007-125854 2007-05-10

Publications (1)

Publication Number Publication Date
WO2008099787A1 true WO2008099787A1 (ja) 2008-08-21

Family

ID=39690020

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/052175 Ceased WO2008099787A1 (ja) 2007-02-14 2008-02-08 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれらを用いた光導波路

Country Status (6)

Country Link
US (1) US8463099B2 (ja)
EP (1) EP2112181A4 (ja)
JP (1) JP5365198B2 (ja)
KR (1) KR20090118920A (ja)
TW (1) TWI421296B (ja)
WO (1) WO2008099787A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010091732A (ja) * 2008-10-07 2010-04-22 Hitachi Chem Co Ltd コア部形成用樹脂組成物及びこれを用いたコア部形成用樹脂フィルム、ならびにこれらを用いた光導波路
JP2010091734A (ja) * 2008-10-07 2010-04-22 Hitachi Chem Co Ltd コア部形成用樹脂組成物及びこれを用いたコア部形成用樹脂フィルム、ならびにこれらを用いた光導波路
JP2010164770A (ja) * 2009-01-15 2010-07-29 Hitachi Chem Co Ltd 光導波路
WO2010126116A1 (ja) * 2009-04-30 2010-11-04 日立化成工業株式会社 光導波路形成用樹脂組成物、光導波路形成用樹脂フィルム及び光導波路
JP2010282088A (ja) * 2009-06-05 2010-12-16 Hitachi Chem Co Ltd 光導波路形成用樹脂フィルム及びこれを用いた光導波路、その製造方法並びに光電気複合配線板

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2112181A4 (en) * 2007-02-14 2010-06-02 Hitachi Chemical Co Ltd RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE USING THE SAME
WO2009066638A1 (ja) * 2007-11-20 2009-05-28 Hitachi Chemical Company, Ltd. 感光性樹脂組成物、感光性樹脂硬化物、感光性樹脂フィルム、感光性樹脂フィルム硬化物及びこれらを用いて得られる光導波路
TWI422600B (zh) * 2010-05-05 2014-01-11 Benq Materials Corp 高折射率組成物及應用其之光學膜
EP2944775A1 (en) * 2014-05-12 2015-11-18 Siemens Aktiengesellschaft Method for assembling a turbine assembly
US20160024320A1 (en) * 2014-07-24 2016-01-28 Kolazi S. Narayanan Mixed solvent based compositions for removal of paint and varnish
WO2019124307A1 (ja) * 2017-12-20 2019-06-27 住友電気工業株式会社 プリント配線板の製造方法及び積層体
JP7511501B2 (ja) 2021-02-10 2024-07-05 東京エレクトロン株式会社 プラズマ処理装置及び監視装置

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JPH06258537A (ja) 1993-03-08 1994-09-16 Mitsubishi Rayon Co Ltd ドライフィルムレジストおよびそれを用いたプリント配線板
JPH06324489A (ja) * 1993-05-17 1994-11-25 Hitachi Chem Co Ltd 印刷配線板の製造法
JPH07261388A (ja) * 1994-03-25 1995-10-13 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント及びめっきレジストの製造法
JP2000047383A (ja) 1998-07-29 2000-02-18 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びこれらを用いためっきレジストの製造方法
JP2000147765A (ja) 1998-11-10 2000-05-26 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びこれらを用いためっきレジストの製造方法
JP2003195079A (ja) 2001-12-26 2003-07-09 Jsr Corp 光導波路形成用放射線硬化性組成物、光導波路ならびに光導波路の製造方法
JP2006028419A (ja) * 2004-07-20 2006-02-02 Taiyo Ink Mfg Ltd 光導波路材料用の光硬化性・熱硬化性樹脂組成物、及びその硬化物並びに光・電気混載基板
WO2006038691A1 (ja) * 2004-10-07 2006-04-13 Hitachi Chemical Company, Ltd. 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれを用いた光導波路

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WO2007105795A1 (ja) * 2006-03-15 2007-09-20 Hitachi Chemical Company, Ltd. 光学材料用フェノキシ樹脂、光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれらを用いた光導波路
WO2008013140A1 (en) * 2006-07-25 2008-01-31 Hitachi Chemical Company, Ltd. Resin composition for optical material, resin film for optical material, and optical waveguide
EP2112181A4 (en) * 2007-02-14 2010-06-02 Hitachi Chemical Co Ltd RESIN COMPOSITION FOR OPTICAL MATERIAL, RESIN FILM FOR OPTICAL MATERIAL, AND OPTICAL WAVEGUIDE USING THE SAME

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06258537A (ja) 1993-03-08 1994-09-16 Mitsubishi Rayon Co Ltd ドライフィルムレジストおよびそれを用いたプリント配線板
JPH06324489A (ja) * 1993-05-17 1994-11-25 Hitachi Chem Co Ltd 印刷配線板の製造法
JPH07261388A (ja) * 1994-03-25 1995-10-13 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント及びめっきレジストの製造法
JP2000047383A (ja) 1998-07-29 2000-02-18 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びこれらを用いためっきレジストの製造方法
JP2000147765A (ja) 1998-11-10 2000-05-26 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント及びこれらを用いためっきレジストの製造方法
JP2003195079A (ja) 2001-12-26 2003-07-09 Jsr Corp 光導波路形成用放射線硬化性組成物、光導波路ならびに光導波路の製造方法
JP2006028419A (ja) * 2004-07-20 2006-02-02 Taiyo Ink Mfg Ltd 光導波路材料用の光硬化性・熱硬化性樹脂組成物、及びその硬化物並びに光・電気混載基板
WO2006038691A1 (ja) * 2004-10-07 2006-04-13 Hitachi Chemical Company, Ltd. 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれを用いた光導波路

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Title
See also references of EP2112181A4 *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010091732A (ja) * 2008-10-07 2010-04-22 Hitachi Chem Co Ltd コア部形成用樹脂組成物及びこれを用いたコア部形成用樹脂フィルム、ならびにこれらを用いた光導波路
JP2010091734A (ja) * 2008-10-07 2010-04-22 Hitachi Chem Co Ltd コア部形成用樹脂組成物及びこれを用いたコア部形成用樹脂フィルム、ならびにこれらを用いた光導波路
JP2010164770A (ja) * 2009-01-15 2010-07-29 Hitachi Chem Co Ltd 光導波路
WO2010126116A1 (ja) * 2009-04-30 2010-11-04 日立化成工業株式会社 光導波路形成用樹脂組成物、光導波路形成用樹脂フィルム及び光導波路
CN102414591A (zh) * 2009-04-30 2012-04-11 日立化成工业株式会社 光波导形成用树脂组合物、光波导形成用树脂膜和光波导
US8787723B2 (en) 2009-04-30 2014-07-22 Hitachi Chemical Company, Ltd. Resin composition for forming optical waveguide, resin film for forming optical waveguide, and optical waveguide
JP5585578B2 (ja) * 2009-04-30 2014-09-10 日立化成株式会社 光導波路形成用樹脂組成物、光導波路形成用樹脂フィルム及び光導波路
JP2010282088A (ja) * 2009-06-05 2010-12-16 Hitachi Chem Co Ltd 光導波路形成用樹脂フィルム及びこれを用いた光導波路、その製造方法並びに光電気複合配線板

Also Published As

Publication number Publication date
JP5365198B2 (ja) 2013-12-11
EP2112181A4 (en) 2010-06-02
KR20090118920A (ko) 2009-11-18
US20100040339A1 (en) 2010-02-18
US8463099B2 (en) 2013-06-11
TW200848464A (en) 2008-12-16
EP2112181A1 (en) 2009-10-28
JPWO2008099787A1 (ja) 2010-05-27
TWI421296B (zh) 2014-01-01

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