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WO2008093513A1 - Crosslinkable polymer compound and photosensitive resin composition containing the same - Google Patents

Crosslinkable polymer compound and photosensitive resin composition containing the same Download PDF

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Publication number
WO2008093513A1
WO2008093513A1 PCT/JP2008/050092 JP2008050092W WO2008093513A1 WO 2008093513 A1 WO2008093513 A1 WO 2008093513A1 JP 2008050092 W JP2008050092 W JP 2008050092W WO 2008093513 A1 WO2008093513 A1 WO 2008093513A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin composition
photosensitive resin
composition containing
polymer compound
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/050092
Other languages
French (fr)
Japanese (ja)
Inventor
Shin Utsunomiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soken Kagaku KK
Soken Chemical and Engineering Co Ltd
Original Assignee
Soken Kagaku KK
Soken Chemical and Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soken Kagaku KK, Soken Chemical and Engineering Co Ltd filed Critical Soken Kagaku KK
Priority to KR1020097012023A priority Critical patent/KR20090112633A/en
Publication of WO2008093513A1 publication Critical patent/WO2008093513A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F257/00—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00
    • C08F257/02—Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group C08F12/00 on to polymers of styrene or alkyl-substituted styrenes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/02—Polyalkylene oxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02—Monomers containing only one unsaturated aliphatic radical
    • C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06—Hydrocarbons
    • C08F212/08—Styrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00—Polymer mixtures characterised by other features
    • C08L2205/05—Polymer mixtures characterised by other features containing polymer components which can react with one another

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

Disclosed is a crosslinkable compound which can be cured by heat and/or light without depending on a photopolymerization initiator or a polyfunctional monomer. Also disclosed is a highly sensitive photosensitive resin composition containing such a crosslinkable compound. Specifically disclosed is a polymer compound which is obtained by adding a compound (II) represented by the formula (1) below to a copolymer (I) containing a constitutional unit (A) derived from an unsaturated carboxylic acid and a constitutional unit (B) derived from at least one compound selected from styrene, methylstyrene, α-methylstyrene and indene.
PCT/JP2008/050092 2007-02-02 2008-01-09 Crosslinkable polymer compound and photosensitive resin composition containing the same Ceased WO2008093513A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020097012023A KR20090112633A (en) 2007-02-02 2008-01-09 Crosslinkable high molecular compound and photosensitive resin composition containing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007024631A JP2008189773A (en) 2007-02-02 2007-02-02 Crosslinkable polymer compound and photosensitive resin composition comprising the same
JP2007-024631 2007-09-10

Publications (1)

Publication Number Publication Date
WO2008093513A1 true WO2008093513A1 (en) 2008-08-07

Family

ID=39673827

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/050092 Ceased WO2008093513A1 (en) 2007-02-02 2008-01-09 Crosslinkable polymer compound and photosensitive resin composition containing the same

Country Status (4)

Country Link
JP (1) JP2008189773A (en)
KR (1) KR20090112633A (en)
TW (1) TW200902564A (en)
WO (1) WO2008093513A1 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10883998B2 (en) 2009-03-02 2021-01-05 Massachusetts Institute Of Technology Methods and products for in vivo enzyme profiling
US11054428B2 (en) 2018-03-05 2021-07-06 Massachusetts Institute Of Technology Inhalable nanosensors with volatile reporters and uses thereof
US11428689B2 (en) 2016-05-05 2022-08-30 Massachusetts Institute Of Technology Methods and uses for remotely triggered protease activity measurements
US11448643B2 (en) 2016-04-08 2022-09-20 Massachusetts Institute Of Technology Methods to specifically profile protease activity at lymph nodes
US11519905B2 (en) 2017-04-07 2022-12-06 Massachusetts Institute Of Technology Methods to spatially profile protease activity in tissue and sections
US11549947B2 (en) 2011-03-15 2023-01-10 Massachusetts Institute Of Technology Multiplexed detection with isotope-coded reporters
US11835522B2 (en) 2019-01-17 2023-12-05 Massachusetts Institute Of Technology Sensors for detecting and imaging of cancer metastasis
US12173349B2 (en) 2018-09-25 2024-12-24 Massachusetts Institute Of Technology Lung protease nanosensors and uses thereof
WO2025121031A1 (en) * 2023-12-08 2025-06-12 株式会社レゾナック Copolymer
WO2025121033A1 (en) * 2023-12-08 2025-06-12 株式会社レゾナック Method for producing copolymer

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5403545B2 (en) * 2009-09-14 2014-01-29 太陽ホールディングス株式会社 Solder resist composition, dry film and cured product thereof, and printed wiring board using them
JP5749119B2 (en) * 2011-08-19 2015-07-15 富士フイルム株式会社 Ink composition, image forming method, and printed matter
JP5887244B2 (en) * 2012-09-28 2016-03-16 富士フイルム株式会社 Self-assembled composition for pattern formation, pattern formation method by self-assembly of block copolymer using the same, self-assembled pattern, and method for producing electronic device
JP7744268B2 (en) * 2022-03-08 2025-09-25 日本化薬株式会社 Curable resin composition, cured product thereof, and semiconductor device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62215607A (en) * 1986-03-17 1987-09-22 Agency Of Ind Science & Technol Production of photosensitive resin
JPS63122708A (en) * 1986-11-13 1988-05-26 Showa Highpolymer Co Ltd Production of radically curable copolymer resin
JPH02190860A (en) * 1989-01-20 1990-07-26 Fuji Photo Film Co Ltd Liquid photosensitive resin composition
JPH1069081A (en) * 1997-06-06 1998-03-10 Daicel Chem Ind Ltd Composition for alkali-soluble resist
JPH10147685A (en) * 1996-11-18 1998-06-02 Toagosei Co Ltd Resin composition for insulation material

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62215607A (en) * 1986-03-17 1987-09-22 Agency Of Ind Science & Technol Production of photosensitive resin
JPS63122708A (en) * 1986-11-13 1988-05-26 Showa Highpolymer Co Ltd Production of radically curable copolymer resin
JPH02190860A (en) * 1989-01-20 1990-07-26 Fuji Photo Film Co Ltd Liquid photosensitive resin composition
JPH10147685A (en) * 1996-11-18 1998-06-02 Toagosei Co Ltd Resin composition for insulation material
JPH1069081A (en) * 1997-06-06 1998-03-10 Daicel Chem Ind Ltd Composition for alkali-soluble resist

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
MASAZO NIWA ET AL.: "Synthesis of Graft Polymers by Copolomerization of Macromonomer. I. Preparation of Macromonomers", JOURNAL OF MACROMOLECULAR SCIENCE - CHEMISTRY, vol. A23, no. 4, 1986, pages 433 - 450 *

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11703510B2 (en) 2009-03-02 2023-07-18 Massachusetts Institute Of Technology Methods and products for in vivo enzyme profiling
US11549951B2 (en) 2009-03-02 2023-01-10 Massachusetts Institute Of Technology Methods and products for in vivo enzyme profiling
US10883998B2 (en) 2009-03-02 2021-01-05 Massachusetts Institute Of Technology Methods and products for in vivo enzyme profiling
US11549947B2 (en) 2011-03-15 2023-01-10 Massachusetts Institute Of Technology Multiplexed detection with isotope-coded reporters
US11448643B2 (en) 2016-04-08 2022-09-20 Massachusetts Institute Of Technology Methods to specifically profile protease activity at lymph nodes
US11428689B2 (en) 2016-05-05 2022-08-30 Massachusetts Institute Of Technology Methods and uses for remotely triggered protease activity measurements
US11519905B2 (en) 2017-04-07 2022-12-06 Massachusetts Institute Of Technology Methods to spatially profile protease activity in tissue and sections
US12320801B2 (en) 2017-04-07 2025-06-03 Massachusetts Institute Of Technology Methods to spatially profile protease activity in tissue and sections
US11054428B2 (en) 2018-03-05 2021-07-06 Massachusetts Institute Of Technology Inhalable nanosensors with volatile reporters and uses thereof
US12173349B2 (en) 2018-09-25 2024-12-24 Massachusetts Institute Of Technology Lung protease nanosensors and uses thereof
US11835522B2 (en) 2019-01-17 2023-12-05 Massachusetts Institute Of Technology Sensors for detecting and imaging of cancer metastasis
WO2025121031A1 (en) * 2023-12-08 2025-06-12 株式会社レゾナック Copolymer
WO2025121033A1 (en) * 2023-12-08 2025-06-12 株式会社レゾナック Method for producing copolymer

Also Published As

Publication number Publication date
JP2008189773A (en) 2008-08-21
KR20090112633A (en) 2009-10-28
TW200902564A (en) 2009-01-16

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