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TW200702915A - Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same - Google Patents

Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same

Info

Publication number
TW200702915A
TW200702915A TW095107268A TW95107268A TW200702915A TW 200702915 A TW200702915 A TW 200702915A TW 095107268 A TW095107268 A TW 095107268A TW 95107268 A TW95107268 A TW 95107268A TW 200702915 A TW200702915 A TW 200702915A
Authority
TW
Taiwan
Prior art keywords
volume phase
phase hologram
resin composition
photosensitive resin
hologram recording
Prior art date
Application number
TW095107268A
Other languages
Chinese (zh)
Other versions
TWI401532B (en
Inventor
Kouhei Tomari
Yasuji Shichijo
Masanao Kawabe
Original Assignee
Nippon Steel Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Chemical Co filed Critical Nippon Steel Chemical Co
Publication of TW200702915A publication Critical patent/TW200702915A/en
Application granted granted Critical
Publication of TWI401532B publication Critical patent/TWI401532B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Holo Graphy (AREA)
  • Graft Or Block Polymers (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)

Abstract

Disclosed is a volume phase hologram recording material excellent in transparency, sensitivity and low curing shrinkage factor. Also disclosed are a volume phase hologram recording medium and a volume phase hologram. Specifically disclosed is a photosensitive resin composition for volume phase hologram recording essentially containing a low-molecular-weight solvent-soluble aromatic copolymer (A) having a constitutional unit derived from a divinyl aromatic compound and a constitutional unit derived from a monovinyl aromatic compound, a radically photopolymerizable compound (B) which is copolymerizable with the solvent-soluble aromatic copolymer (A), and a photopolymerization initiator (C). This photosensitive resin composition further contains either or both of a polymer binder (D) and a plasticizer (E), and the solvent-soluble aromatic copolymer (A) is contained in an amount of 5-60% by weight.
TW095107268A 2005-03-08 2006-03-03 A photographic resin composition for volume phase type image recording, and an optical information recording medium using the composition TWI401532B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005063724 2005-03-08

Publications (2)

Publication Number Publication Date
TW200702915A true TW200702915A (en) 2007-01-16
TWI401532B TWI401532B (en) 2013-07-11

Family

ID=36953210

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095107268A TWI401532B (en) 2005-03-08 2006-03-03 A photographic resin composition for volume phase type image recording, and an optical information recording medium using the composition

Country Status (5)

Country Link
JP (1) JP4745333B2 (en)
KR (1) KR101024744B1 (en)
CN (1) CN101137940B (en)
TW (1) TWI401532B (en)
WO (1) WO2006095610A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102718914A (en) * 2007-03-26 2012-10-10 新日铁化学株式会社 Soluble polyfunctional vinyl aromatic copolymer, and method for production thereof
TWI427090B (en) * 2007-02-05 2014-02-21 Nippon Steel & Sumikin Chem Co Volume phase type full phase diagram recording material and optical information recording medium
TWI507425B (en) * 2010-06-14 2015-11-11 Nippon Steel & Sumikin Chem Co An ultraviolet-curing resin composition for use in an ink-jet printing method, and an optical element

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4976373B2 (en) * 2006-03-09 2012-07-18 新日鐵化学株式会社 Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
JP5108873B2 (en) * 2007-03-22 2012-12-26 新日鉄住金化学株式会社 Volume phase hologram recording material and optical information recording medium using the same
JP5073343B2 (en) * 2007-03-30 2012-11-14 新日鐵化学株式会社 Hard coat film or sheet, optical element, and image display device
US8323854B2 (en) 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
EP2466341A1 (en) 2009-08-13 2012-06-20 FUJIFILM Corporation Wafer-level lens, wafer-level lens production method, and imaging unit
JP5352392B2 (en) 2009-09-14 2013-11-27 富士フイルム株式会社 Wafer level lens array manufacturing method, wafer level lens array, lens module, and imaging unit
JP5401227B2 (en) 2009-09-16 2014-01-29 富士フイルム株式会社 Wafer level lens array manufacturing method, wafer level lens array, lens module, and imaging unit
JP5572355B2 (en) 2009-09-30 2014-08-13 富士フイルム株式会社 Lens array and lens array laminate
JP2011098487A (en) 2009-11-05 2011-05-19 Fujifilm Corp Element array mold and element array molded using the mold
JP2011161727A (en) 2010-02-08 2011-08-25 Fujifilm Corp Molding die of optical molded product, method of molding optical molded product, and lens array
JP2011180293A (en) 2010-02-26 2011-09-15 Fujifilm Corp Lens array
JP2011180292A (en) 2010-02-26 2011-09-15 Fujifilm Corp Lens array
JP2011197480A (en) 2010-03-19 2011-10-06 Fujifilm Corp Lens array, method for manufacturing the same,and lens and method for manufacturing the same
JP2011197479A (en) 2010-03-19 2011-10-06 Fujifilm Corp Lens, lens array, and manufacturing method thereof
JP2011194751A (en) 2010-03-19 2011-10-06 Fujifilm Corp Mold, molding method, and lens array
JP5647808B2 (en) 2010-03-30 2015-01-07 富士フイルム株式会社 Lens array master manufacturing method
JP5533249B2 (en) * 2010-05-20 2014-06-25 Ｔｄｋ株式会社 Volume hologram recording material and volume hologram recording medium
JP5569316B2 (en) * 2010-10-04 2014-08-13 Ｔｄｋ株式会社 Hologram recording material and hologram recording medium
JP5181056B2 (en) * 2011-11-28 2013-04-10 新日鉄住金化学株式会社 Hard coat film or sheet, optical element, and image display device
CN102854747B (en) * 2012-09-28 2017-06-06 乐凯华光印刷科技有限公司 The small flexible photosensitive resin plate of plate surface viscosity
WO2019131572A1 (en) 2017-12-26 2019-07-04 富士フイルム株式会社 Lens adhesive, cemented lens, and imaging module
KR102239212B1 (en) * 2018-12-14 2021-04-12 주식회사 엘지화학 Photopolymer composition
KR102255555B1 (en) 2019-08-20 2021-05-25 울산과학기술원 Manufacturing method for organogel having holographic pattern using dithering mask

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4950567A (en) * 1988-01-15 1990-08-21 E. I. Du Pont De Nemours And Company Holographic optical combiners for head-up displays
JP3044689B2 (en) 1994-10-14 2000-05-22 日本ゼオン株式会社 Photosensitive elastomer composition and photosensitive rubber plate
EP1376268A4 (en) * 2001-02-01 2006-08-02 Nat Inst Of Advanced Ind Scien COMPOSITION FOR HOLOGRAM RECORDING EQUIPMENT, HOLOGRAM RECORDER, AND PRODUCTION METHOD
JP4325404B2 (en) * 2002-03-27 2009-09-02 ダイソー株式会社 Photopolymer composition for hologram recording material, hologram recording medium and method for producing the same
JP4338951B2 (en) * 2002-10-01 2009-10-07 新日鐵化学株式会社 Soluble polyfunctional vinyl aromatic copolymer and polymerization method thereof

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427090B (en) * 2007-02-05 2014-02-21 Nippon Steel & Sumikin Chem Co Volume phase type full phase diagram recording material and optical information recording medium
CN102718914A (en) * 2007-03-26 2012-10-10 新日铁化学株式会社 Soluble polyfunctional vinyl aromatic copolymer, and method for production thereof
CN102718914B (en) * 2007-03-26 2015-04-22 新日铁住金化学株式会社 Soluble polyfunctional vinyl aromatic copolymer, and method for production thereof
TWI507425B (en) * 2010-06-14 2015-11-11 Nippon Steel & Sumikin Chem Co An ultraviolet-curing resin composition for use in an ink-jet printing method, and an optical element

Also Published As

Publication number Publication date
KR101024744B1 (en) 2011-03-25
TWI401532B (en) 2013-07-11
CN101137940A (en) 2008-03-05
WO2006095610A1 (en) 2006-09-14
CN101137940B (en) 2010-08-25
JPWO2006095610A1 (en) 2008-08-14
KR20070108947A (en) 2007-11-13
JP4745333B2 (en) 2011-08-10

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