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WO2008092650A2 - Procédé et film de marquage pour le transfert sélectif d'au moins une couche fonctionnelle sur un support - Google Patents

Procédé et film de marquage pour le transfert sélectif d'au moins une couche fonctionnelle sur un support Download PDF

Info

Publication number
WO2008092650A2
WO2008092650A2 PCT/EP2008/000703 EP2008000703W WO2008092650A2 WO 2008092650 A2 WO2008092650 A2 WO 2008092650A2 EP 2008000703 W EP2008000703 W EP 2008000703W WO 2008092650 A2 WO2008092650 A2 WO 2008092650A2
Authority
WO
WIPO (PCT)
Prior art keywords
layer
light
laser beam
functional layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2008/000703
Other languages
German (de)
English (en)
Other versions
WO2008092650A3 (fr
Inventor
Norbert Lutz
Andreas Schilling
Walter Kurz
Jürgen Hermann
Norbert Schmidt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Leonhard Kurz Stiftung and Co KG
Original Assignee
Leonhard Kurz Stiftung and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leonhard Kurz Stiftung and Co KG filed Critical Leonhard Kurz Stiftung and Co KG
Publication of WO2008092650A2 publication Critical patent/WO2008092650A2/fr
Publication of WO2008092650A3 publication Critical patent/WO2008092650A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382—Contact thermal transfer or sublimation processes
    • B41M5/38207—Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
    • B41M5/38214—Structural details, e.g. multilayer systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material

Definitions

  • the invention relates to a method for selectively transferring at least one functional layer, such as a color layer, from a carrier layer of a stamping foil to a substrate by means of an intense light beam, in particular a laser beam, and a stamping foil provided for this purpose.
  • the stamping foil has the carrier layer and the at least one
  • a CO 2 laser of wavelength 10.6 microns for example, a Nd: YAG laser of wavelength 1064 nm or a doubled Nd: YAG laser of wavelength 532 nm is used.
  • a Nd: YAG laser of wavelength 1064 nm or a doubled Nd: YAG laser of wavelength 532 nm is used.
  • other, known per se laser are applicable to at least one functional layer, such as a color layer, from the carrier layer of the embossing film partially transferred to a substrate.
  • the substrate is, for example, a card or a plate of a suitable plastic material.
  • a laser beam it can also be, for example, another intense light beam, because it is particularly important to specifically heat a region.
  • Contour sharpness and the resolution of the selectively transferred to the substrate selectively at least one functional layer, in particular a color layer, leave desires open.
  • the invention is therefore based on the object, a method of the type mentioned, with which a contour-selective transfer of the at least one functional layer, such as a color layer, is achieved by a carrier layer of a stamping foil on a substrate, and to provide a stamping film provided therefor.
  • a carrier layer is used, which at least largely absorbs the light or laser beam, so that the light or laser beam on the at least one functional layer, such as a color layer, sharp contiguous effect around the at least one functional layer, in particular color layer, contour sharp selectively or transfer to the substrate and to fix it to the substrate.
  • the light or laser beam is largely absorbed when at least 50% of the radiation is absorbed by the carrier layer, especially when at least 80% of the radiation is absorbed.
  • remaining radiation portions not absorbed by the carrier layer can be absorbed by the at least one functional layer, in particular by a colored layer, and / or by the substrate.
  • the contour sharpness of the areas of the at least one functional layer transferred to the substrate is assessed on the basis of the theoretically traceable contour. If a deviation of the contour of the areas of the at least one functional layer transmitted to the substrate from the theoretically desired contour with the naked eye and normal distance to the substrate, i. at a distance between eye and substrate of about 25 to 35 cm, not recognizable, so there is contour sharpness.
  • a carrier layer which is a layer structure or a composite layer of a light or Laser beam transmissive layer and a light or laser beam absorbing layer.
  • the light or laser beam transparent layer is preferably formed according to the invention of a film.
  • This film consists, for example, of polyethylene terephthalate (PET), which in particular has a film thickness in the range from 6 to 250 ⁇ m, e.g. a thickness of 19 microns, has.
  • PET polyethylene terephthalate
  • a layer structure can be used, wherein the light or laser beam absorbing layer is likewise formed by a film which is laminated together with the light or laser beam-permeable film.
  • CO 2 lasers may be black polyethylene or polypropylene film, which strongly absorb their radiation.
  • a layer structure is used, wherein the light- or laser-beam-absorbing layer is formed by a coating of the light- or laser-transmissive film.
  • a layer structure wherein the light- or laser-beam-absorbing coating is formed by a replication lacquer layer with a black-mirror structure.
  • a black mirror structure is, for example, a cross grating made of base gratings with periods d smaller than a cutoff wavelength ⁇ at the shortwave end in the spectrum of the one used
  • This structure is then provided with a metallic coating, preferably an opaque metallic coating.
  • Such relief structures absorb almost all of the incident light and scatter only a small fraction of the incident light.
  • the percentage of light absorbed depends on the structure depth h in a non-linear manner and can be selected by choosing Structure depth h in the above range are controlled to about 99%, in which case, the flatter the relief structure, the more incident light is scattered back and the less light is absorbed - and vice versa.
  • a cross grating instead of a cross grating, to use a normal line grating or another relief structure as a black mirror structure, in which the minimum distance adjacent local maxima is smaller than the cutoff wavelength of the light or laser light used.
  • the depth-to-width ratio, ie the ratio of the structure depth (average distance between maxima and minima) to these distances is less than 0.5, preferably less than 1 to choose.
  • a metal layer to apply a color layer or a layer which absorbs the light or laser light to the black mirror structure with particles or colorants which absorb the light or laser light.
  • the replication lacquer layer with the black mirror structure forms an antireflection coating for the light source used, in particular laser, when the lateral dimensions are smaller than the wavelength of the light or laser radiation.
  • the reflection on such an anti-reflection layer is for example 0.2% of the incident light or laser beam, so that 99.8% of the light or
  • Laser beam are coupled into the light or laser beam absorbing layer.
  • a layer structure can be used, wherein the replication lacquer layer with the black mirror structure at the light or
  • Laser beam facing away from the inside of the layer structure is provided so that the conversion of the light beam or laser beam energy into heat energy takes place in the vicinity of the at least one functional layer. It has proved to be particularly advantageous if a layer structure is used, the black mirror structure being provided with a metallization or with another coating which absorbs the light or laser beam used, in particular a metal oxide coating.
  • a metallization is a metal layer, which is realized for example by vacuum evaporation, sputtering or the like.
  • the metallization may consist, for example, of Al, Ni, Au, Ag, Cu or alloys of these metals or the like.
  • the replication lacquer layer with the black mirror structure is provided on the inside of the layer structure facing away from the light or laser beam, then it is expedient for the replication lacquer layer with the black mirror structure to be covered with an intermediate layer which lies between the replication lacquer layer and the surface at least one functional layer is provided.
  • the embossing foil used for the method accordingly has the carrier layer and furthermore the at least one functional layer which can be detached from the carrier layer.
  • the embossing foil is irradiated in regions with the light or laser beam, wherein the carrier layer is heated in the irradiated areas due to their absorbing properties for the radiation used. In the heated areas, a connection is formed between the at least one functional layer and the substrate, in particular by gluing. The non-fixed to the substrate areas of the at least one functional layer are then removed from the substrate together with the carrier layer.
  • a smooth contour sharp selective, ie area wise, transfer of at least one functional layer, such as a color layer, from the carrier layer of the embossing film to a substrate is possible if a layer structure is used, wherein between the carrier layer and the at least one functional layer, in particular color layer, a release layer is provided.
  • This release layer may consist of a suitable wax or silicone material known per se.
  • the release layer can be subtracted from the substrate either as part of the carrier layer after irradiation together with the carrier layer or as part of the at least one functional layer remain in the irradiated areas on the substrate.
  • the at least one functional layer has in particular a color layer.
  • a color layer both an opaque colored layer and a transparent colored layer are referred to.
  • the color layer can be monochromatic or have a different color in regions.
  • the coloring may show two or more different colors arranged in a regular pattern or a random pattern.
  • the at least one functional layer further comprises, in particular, an adhesive layer, in particular a hot-melt adhesive layer.
  • the at least one functional layer may comprise a release layer, which is arranged facing the carrier layer and in the irradiated areas the detachment behavior of the at least one
  • the release layer is formed in particular colorless transparent.
  • the at least one functional layer may comprise further layers, such as primer layers, lacquer layers, etc.
  • FIG. 1 Show it: FIG. 1 in sections, greatly enlarged and not to scale, an embossing foil and a substrate spaced therefrom in cross-section,
  • FIG. 2 is a sectional view, similar to FIG. 1, of the embossing foil in combination with the substrate in cross section, whereby a light or laser beam is also illustrated;
  • FIG. 3 shows a section-wise representation of the substrate similar to FIG. 2, with the functional layer selectively transferred by means of a light or laser beam, in cross-section, FIG.
  • FIG. 4 shows in sections an embodiment of a stamping film according to the invention, which is used in a method according to the invention, on a substrate in cross section,
  • FIG. 5 is a sectional view, similar to FIG. 4, of another embodiment of a stamping film according to the invention on a substrate in cross-section, which is used in the method according to the invention.
  • Figure 6 is a Figures 4 and 5 similar sections of yet another embodiment of an embossing film according to the invention for carrying out the method according to the invention on a substrate in cross section, and
  • FIG. 7 shows the detail VII in FIG. 5 in a further enlarged, not to scale representation.
  • FIG. 1 shows an embossing foil 10 and a dimensionally stable substrate 12, which is spaced therefrom and has a cross section.
  • the stamping foil 10 has a carrier layer 14 and a functional layer 16 in the form of a color layer. Between the carrier layer 14 and the functional layer 16 is a release layer 18 is provided to assist the detachment of the functional layer 16 from the carrier layer 14 when the functional layer 16 is selectively transferred to the substrate 12 by means of a laser beam. This is indicated in Figure 2, wherein the laser beam is illustrated by the arrow 20.
  • a carrier layer 14 is used according to the invention, which at least largely absorbs the laser beam 20, so that the Laser beam 20 on the color layer 16 contour sharp effect.
  • the contour-sharp effectiveness of the laser beam 20 is indicated in Figure 2 by the dashed lines 22.
  • the irradiated areas of the carrier layer 14 absorb the radiation and heat up, whereby the immediately adjacent regions of the functional layer 16 are heated.
  • the functional layer 16 is in this case made of a material, in particular a thermoplastic material or lacquer, which softens when heated at least slightly and can be connected to an adjacent substrate, optionally under pressure.
  • the at least one functional layer may further comprise an adhesive layer which faces the substrate, softens when heated and a fixation of Regions of the ink layer on the substrate allows.
  • the contour of the functional layer 16 selectively transferred to the substrate 12 is illustrated in FIG.
  • FIG. 4 shows a design of an embossing foil 10 according to the invention, in which the carrier layer 14 is formed by a layer structure comprising a laser-beam-permeable layer 24 and a laser-beam-absorbing layer 26.
  • the laser beam transmissive layer 24 is preferably formed by a film 28.
  • the film 28 consists for example of PET and has, for example, a thickness of> 6 microns. Small PET film thicknesses are advantageous in terms of resolution or contour sharpness.
  • the laser beam absorbing layer 26 may also comprise a film 30, in the case of using a CO 2 laser, for example a black polyethylene film or a black polypropylene film laminated with the film 28, or a coating 32 of the Laser-ray-permeable film 28 may be formed.
  • the reference numeral 16 is also in Figure 4 is a functional layer in the form of a colored layer and the reference numeral 18 denotes a release layer between the functional layer 16 and the carrier layer 14.
  • the reference numeral 20 designates the laser beam in FIG. 4, with which the functional layer 16 is selectively transferred to a substrate 12 in a contour-sharp manner.
  • the contour of the region of the functional layer 16 to be transferred from the embossing film 10 to the substrate 12 is again illustrated by the dashed lines 22.
  • a laser-beam-permeable film 28 with a laser-beam-absorbing coating 32 is used as the layer structure for the carrier layer 14, it is advantageous if the laser-beam-absorbing coating 32 is formed by a replication lacquer layer 34 with a black-mirror structure 36 which is suitable for the laser beam 20 forms a so-called anti-reflection layer.
  • the black-mirror structure 36 On the side next to the black-mirror structure 36, which is also referred to as a moth-eye structure, 4% of the radiation is reflected by the laser beam 20, for example of the order of magnitude, which is illustrated by the arrow 38 in FIG. That is, on the order of 96% of the laser beam 20 are coupled into the replication lacquer layer 34 on the order of. This 96% proportion is illustrated in FIG. 5 by the arrow 40.
  • the reflection of the laser beam 20 at the black mirror structure 36 is on the order of 0.2%, ie, on the order of 99.8% are coupled into the replication lacquer layer 34. This latter proportion is indicated in Figure 5 by the arrow 42.
  • the difference between the indicated by the arrows 40 and 42 shares is therefore on the order of 3.8%.
  • the replication lacquer layer 34 is provided with a metallization 44 or with another coating which absorbs the laser radiation used, for example a metal oxide coating.
  • a metallization 44 is a metallization 44 or with another coating which absorbs the laser radiation used, for example a metal oxide coating.
  • Thin-film metallization which is applied to the replication lacquer layer 34, for example by vacuum evaporation, cathode sputtering or the like (see FIG. 7).
  • the layer thickness of a thin layer is ⁇ 10 ⁇ m.
  • Such a design has the advantage that, in addition to the black mirror structure 36, the reflection of the laser beam 20 indicated by the arrow 38 in the case of metals, such as aluminum or copper, depending on the wavelength, is approximately 90% and that the Reflection of the laser beam 20 in the region of the black mirror structure 36, for example, 10%, so that laterally next to the black mirror structure 36 indicated by the arrow 40 energy input into the replication lacquer layer 34 about 10% and in the range Mirror structure 36 indicated by the arrow 42 is on the order of about 90%.
  • FIG. 5 illustrates a carrier layer 14, wherein the replication lacquer layer 34 with the black mirror structure 36 is provided on the outer side 46 of the layer structure or carrier layer 14 of the embossing film 10 facing the laser beam 20.
  • a further improvement of the contour sharpness during the transfer of the functional layer 16 from the carrier layer 14 to a substrate 12 can be realized by using a layer structure for the carrier layer 14 of the embossing film 10 according to the invention, the replication lacquer layer 34 having the black mirror structure 36 the inside of the carrier layer 14 facing away from the laser beam 20 is provided, and the replication lacquer layer 34 is covered with an optional intermediate layer 48 which is provided between the replication lacquer layer 34 and the functional layer 16, as FIG. 6 illustrates.
  • the black mirror structure 36 is provided with a metallization 44 or with another coating which absorbs the laser radiation used, for example a metal oxide coating.
  • the optional intermediate layer 48 according to FIG. 6 is provided on the metallization.
  • the reference numeral 18 also denotes the release layer between the carrier layer 14 and the functional layer 16 of the stamping foil 10 according to the invention in FIGS. 5 and 6.
  • FIG. 7 shows detail VII from FIG. 5 in a further enlarged, not to scale representation.
  • the metallization 44 can be recognized on the replication lacquer layer 34, also in the area of the black mirror structure 36.

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  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Decoration By Transfer Pictures (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

L'invention concerne un procédé de transfert sélectif à contours précis d'au moins une couche fonctionnelle (16), comme une couche de couleur, d'une couche support (14) d'un film de marquage (10) sur un support (12) au moyen d'un rayon de lumière intense, de préférence un rayon laser (20). L'invention porte également sur un film de marquage (10) qui absorbe au moins en grande partie le rayon de lumière intense ou le rayon laser (20) de sorte que ledit rayon de lumière intense ou rayon laser (20) agisse sur la ou les couches fonctionnelles (16) telles qu'une couche de couleur afin que celle-ci soit transférée sur le support (12) de manière sélective avec des contours précis.
PCT/EP2008/000703 2007-02-01 2008-01-30 Procédé et film de marquage pour le transfert sélectif d'au moins une couche fonctionnelle sur un support Ceased WO2008092650A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200710005885 DE102007005885A1 (de) 2007-02-01 2007-02-01 Verfahren und Prägefolie zum selektiven Übertragen einer Farbschicht auf ein Substrat
DE102007005885.5 2007-02-01

Publications (2)

Publication Number Publication Date
WO2008092650A2 true WO2008092650A2 (fr) 2008-08-07
WO2008092650A3 WO2008092650A3 (fr) 2008-09-18

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PCT/EP2008/000703 Ceased WO2008092650A2 (fr) 2007-02-01 2008-01-30 Procédé et film de marquage pour le transfert sélectif d'au moins une couche fonctionnelle sur un support

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DE (1) DE102007005885A1 (fr)
WO (1) WO2008092650A2 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9038534B2 (en) 2012-12-14 2015-05-26 Hewlett-Packard Indigo B.V. Embossing media
JP2021515719A (ja) * 2018-03-12 2021-06-24 ヘリオソニック ゲーエムベーハー レーザ印刷方法
US11890887B2 (en) 2018-01-27 2024-02-06 Heliosonic Gmbh Laser printing process
US11999181B2 (en) 2019-09-10 2024-06-04 Heliosonic Gmbh Laser induced transfer printing process

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4431531A1 (de) * 1994-09-03 1996-03-07 Kurz Leonhard Fa Rasterbild und Thermotransferfolie zu dessen Herstellung
JP2001199170A (ja) * 2000-01-21 2001-07-24 Konica Corp レーザー熱転写フィルム
DE10347035B4 (de) * 2003-10-09 2013-05-23 Giesecke & Devrient Gmbh Verfahren und Vorrichtung zum Erzeugen elektrisch leitender Strukturen auf einem Substrat für einen elektronischen Datenträger
US20070080146A1 (en) * 2003-11-10 2007-04-12 Werner Stockum Coloured laser marking

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9038534B2 (en) 2012-12-14 2015-05-26 Hewlett-Packard Indigo B.V. Embossing media
US11890887B2 (en) 2018-01-27 2024-02-06 Heliosonic Gmbh Laser printing process
JP2021515719A (ja) * 2018-03-12 2021-06-24 ヘリオソニック ゲーエムベーハー レーザ印刷方法
US11932041B2 (en) 2018-03-12 2024-03-19 Heliosonic Gmbh Laser printing process
US11999181B2 (en) 2019-09-10 2024-06-04 Heliosonic Gmbh Laser induced transfer printing process

Also Published As

Publication number Publication date
WO2008092650A3 (fr) 2008-09-18
DE102007005885A1 (de) 2008-08-07

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