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WO2008081845A1 - フラーレン誘導体を原料とするフラーレン膜およびフラーレン重合体ならびにそれらの製造方法 - Google Patents

フラーレン誘導体を原料とするフラーレン膜およびフラーレン重合体ならびにそれらの製造方法 Download PDF

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Publication number
WO2008081845A1
WO2008081845A1 PCT/JP2007/075036 JP2007075036W WO2008081845A1 WO 2008081845 A1 WO2008081845 A1 WO 2008081845A1 JP 2007075036 W JP2007075036 W JP 2007075036W WO 2008081845 A1 WO2008081845 A1 WO 2008081845A1
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Prior art keywords
fullerene
film
polymer
derivative
raw material
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Ceased
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PCT/JP2007/075036
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English (en)
French (fr)
Inventor
Katsutomo Tanaka
Masatoshi Takagi
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Mitsubishi Chemical Corp
Frontier Carbon Corp
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Mitsubishi Chemical Corp
Frontier Carbon Corp
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Priority to EP07860265.3A priority Critical patent/EP2098549B1/en
Priority to KR1020097011431A priority patent/KR101494474B1/ko
Priority to US12/521,630 priority patent/US8268402B2/en
Publication of WO2008081845A1 publication Critical patent/WO2008081845A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/152Fullerenes
    • C01B32/156After-treatment
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L65/00Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00Coating compositions based on unspecified macromolecular compounds
    • C09D201/005Dendritic macromolecules
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/211Fullerenes, e.g. C60
    • H10K85/215Fullerenes, e.g. C60 comprising substituents, e.g. PCBM
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
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    • H10K30/50Photovoltaic [PV] devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
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    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/30Self-sustaining carbon mass or layer with impregnant or other layer

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  • Condensed Matter Physics & Semiconductors (AREA)
  • Wood Science & Technology (AREA)
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  • Theoretical Computer Science (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electroluminescent Light Sources (AREA)
  • Epoxy Compounds (AREA)
  • Indole Compounds (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
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Abstract

 湿式法により容易に製膜が可能であり、フラーレン本来の性質を損なうことなく保持できる、フラーレン誘導体を原料とするフラーレン膜およびフラーレン重合体ならびにそれらの製造方法を提供する。フラーレンの熱分解温度よりも低い温度で分解する、例えば下式で表されるフラーレン誘導体の溶液を基材上に塗布して得られる塗布膜を、フラーレン誘導体の熱分解温度よりも高く、フラーレンの熱分解温度よりも低い温度で加熱することにより、フラーレン本来の性質を保持したフラーレン膜およびフラーレン重合体が得られる。  
PCT/JP2007/075036 2006-12-27 2007-12-26 フラーレン誘導体を原料とするフラーレン膜およびフラーレン重合体ならびにそれらの製造方法 Ceased WO2008081845A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP07860265.3A EP2098549B1 (en) 2006-12-27 2007-12-26 Fullerene film using fullerene derivative as raw material, fullerene polymer and their production methods
KR1020097011431A KR101494474B1 (ko) 2006-12-27 2007-12-26 풀러렌 유도체를 원료로 하는 풀러렌막 및 풀러렌 중합체 그리고 그들의 제조 방법
US12/521,630 US8268402B2 (en) 2006-12-27 2007-12-26 Fullerene film and fullerene polymer both produced from fullerene derivative and processes for producing these

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-351751 2006-12-27
JP2006351751 2006-12-27

Publications (1)

Publication Number Publication Date
WO2008081845A1 true WO2008081845A1 (ja) 2008-07-10

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PCT/JP2007/075036 Ceased WO2008081845A1 (ja) 2006-12-27 2007-12-26 フラーレン誘導体を原料とするフラーレン膜およびフラーレン重合体ならびにそれらの製造方法

Country Status (6)

Country Link
US (1) US8268402B2 (ja)
EP (1) EP2098549B1 (ja)
JP (1) JP5715743B2 (ja)
KR (1) KR101494474B1 (ja)
TW (1) TWI435888B (ja)
WO (1) WO2008081845A1 (ja)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009167165A (ja) * 2007-12-20 2009-07-30 Mitsubishi Chemicals Corp アミノ化フラーレン
WO2010067792A1 (ja) * 2008-12-08 2010-06-17 コニカミノルタホールディングス株式会社 有機光電変換素子、太陽電池及び光センサアレイ
WO2010067786A1 (ja) * 2008-12-10 2010-06-17 トヨタ自動車株式会社 表面処理方法
WO2010101161A1 (ja) * 2009-03-03 2010-09-10 三菱化学株式会社 フラーレン膜の製造方法およびフラーレン膜
WO2011016430A1 (ja) * 2009-08-04 2011-02-10 三菱化学株式会社 光電変換素子及びこれを用いた太陽電池
JP2011054947A (ja) * 2009-08-04 2011-03-17 Mitsubishi Chemicals Corp 光電変換素子用電極バッファー材料ならびにこれを用いた光電変換素子
JP2011054948A (ja) * 2009-08-05 2011-03-17 Mitsubishi Chemicals Corp 光電変換素子材料、光電変換素子用電極バッファー材料ならびにこれを用いた光電変換素子
WO2011105624A1 (en) * 2010-02-25 2011-09-01 Fujifilm Corporation Photoelectric conversion device, imaging device and production methods thereof
WO2011125527A1 (ja) * 2010-03-31 2011-10-13 富士フイルム株式会社 光電変換素子、その製造方法、光センサ、及び撮像素子
US8361694B2 (en) 2007-04-06 2013-01-29 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition
JP2014218492A (ja) * 2012-07-17 2014-11-20 株式会社リコー フラーレン誘導体およびその製造方法
JP2015113301A (ja) * 2013-12-11 2015-06-22 株式会社リコー フラーレン誘導体およびその製造方法
JP2019099686A (ja) * 2017-12-01 2019-06-24 株式会社Flosfia 着色膜形成用組成物
JP2019099685A (ja) * 2017-12-01 2019-06-24 株式会社Flosfia 着色方法
JP2019098252A (ja) * 2017-12-01 2019-06-24 株式会社Flosfia 成膜方法

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009161510A (ja) * 2007-12-13 2009-07-23 Mitsubishi Chemicals Corp アミノ化フラーレン
JP5534714B2 (ja) * 2008-10-06 2014-07-02 住友化学株式会社 フラーレン誘導体
KR20120038413A (ko) * 2009-06-23 2012-04-23 스미또모 가가꾸 가부시키가이샤 유기 전계발광 소자
JP5493496B2 (ja) * 2009-06-24 2014-05-14 コニカミノルタ株式会社 有機光電変換素子、太陽電池及び光センサアレイ
JP2012044079A (ja) * 2010-08-23 2012-03-01 Toyota Motor Corp アモルファスカーボン半導体及びその製造方法並びに光電変換素子及びその製造方法
KR101303083B1 (ko) * 2011-04-11 2013-09-03 부산대학교 산학협력단 신규한 풀러렌 유도체 및 이를 이용하여 제작한 광기전력 소자
JP6197165B2 (ja) * 2011-08-16 2017-09-20 イデア・インターナショナル株式会社 原子内包フラーレンの精製方法、及び、原子内包フラーレン薄膜
JP5849745B2 (ja) * 2012-02-03 2016-02-03 三菱商事株式会社 有機系炭素膜の製造方法及び積層体の製造方法
JP5987544B2 (ja) * 2012-08-08 2016-09-07 三菱商事株式会社 酸解離型重合性フラーレン誘導体及びその製造方法
RU2513098C1 (ru) * 2012-12-04 2014-04-20 Общество с ограниченной ответственностью "Нанолек" Способ получения водорастворимой неагломератной фуллереновой иммуностимулирующей наночастицы и водорастворимая неагломератная фуллереновая иммуностимулирующая наночастица
WO2014190070A1 (en) * 2013-05-22 2014-11-27 Robinson Alex Philip Graaham Fullerenes
US9246104B2 (en) * 2013-09-25 2016-01-26 Showa Denko K.K. Fullerene derivative, method of manufacturing fullerene derivative and solar cell
JP7012307B2 (ja) * 2016-01-20 2022-01-28 ザ・ホンコン・ユニバーシティー・オブ・サイエンス・アンド・テクノロジー 有機半導体配合物およびその応用
JP6623503B2 (ja) * 2017-10-25 2019-12-25 昭和電工株式会社 潤滑油組成物及びその製造方法
JP7561530B2 (ja) * 2020-06-25 2024-10-04 東京エレクトロン株式会社 成膜方法及び成膜装置

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762105A (ja) * 1993-08-27 1995-03-07 Toshiba Corp フラーレン−オルガノシラン共重合体
JP2003238490A (ja) 2002-02-13 2003-08-27 Canon Inc フラーレン誘導体及びそれを用いた構造体
JP2004014120A (ja) * 2002-06-03 2004-01-15 Sony Corp プロトン伝導体膜及びその製造方法、膜−電極接合体及びその製造方法、並びに電気化学デバイス
JP2005139035A (ja) * 2003-11-07 2005-06-02 Mitsubishi Chemicals Corp フラーレン類の製造方法及びそれにより製造されるフラーレン類
JP2005186429A (ja) * 2003-12-25 2005-07-14 Mitsui Chemicals Inc 光記録媒体
JP2006199674A (ja) 2004-05-17 2006-08-03 Mitsubishi Chemicals Corp アミノ化フラーレンの製造方法
JP2006227391A (ja) * 2005-02-18 2006-08-31 Shin Etsu Chem Co Ltd フォトレジスト下層膜形成材料及びパターン形成方法
JP2006306010A (ja) * 2004-08-16 2006-11-09 Frontier Carbon Corp 膜形成用品および膜形成方法ならびに離型剤
JP2006344794A (ja) * 2005-06-09 2006-12-21 Mitsubishi Chemicals Corp フラーレン類含有半導体ヘテロ接合膜
JP2006351751A (ja) 2005-06-15 2006-12-28 Tokyo Electron Ltd 基板処理装置及び基板処理方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3715935B2 (ja) * 2002-02-15 2005-11-16 栄一 中村 フラーレン誘導体の重合体の製造方法及びフラーレン誘導体の重合体
JP2006290788A (ja) * 2005-04-11 2006-10-26 Matsushita Electric Ind Co Ltd フラーレン誘導体ならびにそれを用いたフラーレン膜の製造方法および電界効果トランジスタの製造方法
WO2006123748A1 (ja) * 2005-05-18 2006-11-23 Mitsubishi Chemical Corporation 浸炭処理された金属材料、及びその製造方法
JP4723908B2 (ja) * 2005-05-27 2011-07-13 トヨタ自動車株式会社 フラーレン含有押出成形体の製造方法
JP4873456B2 (ja) * 2006-03-20 2012-02-08 独立行政法人産業技術総合研究所 有機半導体材料及びそれを用いた有機デバイス
KR101398795B1 (ko) 2006-11-20 2014-05-27 제이에스알 가부시끼가이샤 레지스트 하층막 형성용 조성물 및 패턴 형성 방법
JP4748055B2 (ja) 2006-12-27 2011-08-17 Jsr株式会社 レジスト下層膜形成用組成物及びパターン形成方法

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762105A (ja) * 1993-08-27 1995-03-07 Toshiba Corp フラーレン−オルガノシラン共重合体
JP2003238490A (ja) 2002-02-13 2003-08-27 Canon Inc フラーレン誘導体及びそれを用いた構造体
JP2004014120A (ja) * 2002-06-03 2004-01-15 Sony Corp プロトン伝導体膜及びその製造方法、膜−電極接合体及びその製造方法、並びに電気化学デバイス
JP2005139035A (ja) * 2003-11-07 2005-06-02 Mitsubishi Chemicals Corp フラーレン類の製造方法及びそれにより製造されるフラーレン類
JP2005186429A (ja) * 2003-12-25 2005-07-14 Mitsui Chemicals Inc 光記録媒体
JP2006199674A (ja) 2004-05-17 2006-08-03 Mitsubishi Chemicals Corp アミノ化フラーレンの製造方法
JP2006306010A (ja) * 2004-08-16 2006-11-09 Frontier Carbon Corp 膜形成用品および膜形成方法ならびに離型剤
JP2006227391A (ja) * 2005-02-18 2006-08-31 Shin Etsu Chem Co Ltd フォトレジスト下層膜形成材料及びパターン形成方法
JP2006344794A (ja) * 2005-06-09 2006-12-21 Mitsubishi Chemicals Corp フラーレン類含有半導体ヘテロ接合膜
JP2006351751A (ja) 2005-06-15 2006-12-28 Tokyo Electron Ltd 基板処理装置及び基板処理方法

Non-Patent Citations (7)

* Cited by examiner, † Cited by third party
Title
"Solvents and Solvent Effects in Organic Chemistry", 1990, VCH, pages: 59
HIROSHI IMAHORI ET AL.: "Journal of Physical Chemistry B", vol. 103, 10 August 1999, AMERICAN CHEMICAL SOCIETY, pages: 7233 - 7237
J. AM. CHEM. SOC., vol. 114, 1992, pages 10656 - 10657, XP008110968 *
JAN C. HUMMELEN ET AL., J. ORG. CHEM., vol. 60, 1995, pages 532 - 538
PAVEL JANDA ET AL.: "Advanced Materials", vol. 10, December 1998, WILEY VCH VERLAG, pages: 1434 - 1438
See also references of EP2098549A4
TAIYO ENERUGÏ, vol. 30, no. 1, 2004, pages 17 - 20

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8361694B2 (en) 2007-04-06 2013-01-29 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition
JP2009167165A (ja) * 2007-12-20 2009-07-30 Mitsubishi Chemicals Corp アミノ化フラーレン
WO2010067792A1 (ja) * 2008-12-08 2010-06-17 コニカミノルタホールディングス株式会社 有機光電変換素子、太陽電池及び光センサアレイ
JP5440508B2 (ja) * 2008-12-08 2014-03-12 コニカミノルタ株式会社 有機光電変換素子、太陽電池及び光センサアレイ
WO2010067786A1 (ja) * 2008-12-10 2010-06-17 トヨタ自動車株式会社 表面処理方法
JP2010137155A (ja) * 2008-12-10 2010-06-24 Toyota Motor Corp 表面処理方法
WO2010101161A1 (ja) * 2009-03-03 2010-09-10 三菱化学株式会社 フラーレン膜の製造方法およびフラーレン膜
JP2010229021A (ja) * 2009-03-03 2010-10-14 Mitsubishi Chemicals Corp フラーレン膜の製造方法およびフラーレン膜
JP2011054947A (ja) * 2009-08-04 2011-03-17 Mitsubishi Chemicals Corp 光電変換素子用電極バッファー材料ならびにこれを用いた光電変換素子
WO2011016430A1 (ja) * 2009-08-04 2011-02-10 三菱化学株式会社 光電変換素子及びこれを用いた太陽電池
JP2011054948A (ja) * 2009-08-05 2011-03-17 Mitsubishi Chemicals Corp 光電変換素子材料、光電変換素子用電極バッファー材料ならびにこれを用いた光電変換素子
WO2011105624A1 (en) * 2010-02-25 2011-09-01 Fujifilm Corporation Photoelectric conversion device, imaging device and production methods thereof
JP2011199253A (ja) * 2010-02-25 2011-10-06 Fujifilm Corp 光電変換素子及び撮像素子並びにその製造方法
KR101577858B1 (ko) 2010-02-25 2015-12-28 후지필름 가부시키가이샤 광전 변환 소자, 촬상 소자 및 이들의 제조 방법
KR20130009953A (ko) * 2010-02-25 2013-01-24 후지필름 가부시키가이샤 광전 변환 소자, 촬상 소자 및 이들의 제조 방법
US8686408B2 (en) 2010-02-25 2014-04-01 Fujifilm Corporation Photoelectric conversion device, imaging device and production methods thereof
JP2011228630A (ja) * 2010-03-31 2011-11-10 Fujifilm Corp 撮像素子及びその製造方法
US8822808B2 (en) 2010-03-31 2014-09-02 Fujifilm Corporation Photoelectric conversion device, method for manufacturing the same, photo sensor and imaging device
WO2011125527A1 (ja) * 2010-03-31 2011-10-13 富士フイルム株式会社 光電変換素子、その製造方法、光センサ、及び撮像素子
JP2014218492A (ja) * 2012-07-17 2014-11-20 株式会社リコー フラーレン誘導体およびその製造方法
JP2015113301A (ja) * 2013-12-11 2015-06-22 株式会社リコー フラーレン誘導体およびその製造方法
JP2019099686A (ja) * 2017-12-01 2019-06-24 株式会社Flosfia 着色膜形成用組成物
JP2019099685A (ja) * 2017-12-01 2019-06-24 株式会社Flosfia 着色方法
JP2019098252A (ja) * 2017-12-01 2019-06-24 株式会社Flosfia 成膜方法
JP7165314B2 (ja) 2017-12-01 2022-11-04 株式会社Flosfia 着色膜形成用組成物
JP7165313B2 (ja) 2017-12-01 2022-11-04 株式会社Flosfia 着色方法

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