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WO2008081768A1 - 脂環構造含有クロロメチルエーテル類、フォトレジスト用重合性モノマーおよびその製造方法 - Google Patents

脂環構造含有クロロメチルエーテル類、フォトレジスト用重合性モノマーおよびその製造方法 Download PDF

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Publication number
WO2008081768A1
WO2008081768A1 PCT/JP2007/074797 JP2007074797W WO2008081768A1 WO 2008081768 A1 WO2008081768 A1 WO 2008081768A1 JP 2007074797 W JP2007074797 W JP 2007074797W WO 2008081768 A1 WO2008081768 A1 WO 2008081768A1
Authority
WO
WIPO (PCT)
Prior art keywords
group
alicyclic structure
photoresist
producing
same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2007/074797
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English (en)
French (fr)
Inventor
Hidetoshi Ono
Nobuaki Matsumoto
Naoya Kawano
Shinji Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Idemitsu Kosan Co Ltd
Original Assignee
Idemitsu Kosan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Idemitsu Kosan Co Ltd filed Critical Idemitsu Kosan Co Ltd
Priority to JP2008552106A priority Critical patent/JPWO2008081768A1/ja
Publication of WO2008081768A1 publication Critical patent/WO2008081768A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/26—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D307/30—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D307/32—Oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Furan Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Materials For Photolithography (AREA)

Abstract

　アルキルアダマンチル基やラクトン構造を有するレジストにおいて、ラフネスが改善されたフォトレジスト用感光材料であって、下記一般式（II）で表される脂環構造含有（メタ)アクリル酸エステル類を構成成分として有する重合体を含有したフォトレジスト用組成物である。 （式中、Ｒ1は炭素数４～９の脂環式構造でエステル基又はケト基を少なくとも一つ有する官能基、Ｒ2は水素原子，メチル基又はトリフルオロメチル基である。）
PCT/JP2007/074797 2006-12-26 2007-12-25 脂環構造含有クロロメチルエーテル類、フォトレジスト用重合性モノマーおよびその製造方法 Ceased WO2008081768A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008552106A JPWO2008081768A1 (ja) 2006-12-26 2007-12-25 脂環構造含有クロロメチルエーテル類、フォトレジスト用重合性モノマーおよびその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006-350051 2006-12-26
JP2006350051 2006-12-26

Publications (1)

Publication Number Publication Date
WO2008081768A1 true WO2008081768A1 (ja) 2008-07-10

Family

ID=39588451

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/074797 Ceased WO2008081768A1 (ja) 2006-12-26 2007-12-25 脂環構造含有クロロメチルエーテル類、フォトレジスト用重合性モノマーおよびその製造方法

Country Status (3)

Country Link
JP (1) JPWO2008081768A1 (ja)
TW (1) TW200838842A (ja)
WO (1) WO2008081768A1 (ja)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010091858A (ja) * 2008-10-09 2010-04-22 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物、高分子化合物およびレジストパターン形成方法
WO2010061875A1 (ja) * 2008-11-26 2010-06-03 Jsr株式会社 感放射線性樹脂組成物
JP2010126581A (ja) * 2008-11-26 2010-06-10 Jsr Corp 重合体および感放射線性樹脂組成物
JP2010128388A (ja) * 2008-11-28 2010-06-10 Jsr Corp 重合体および感放射線性樹脂組成物
JP2010126696A (ja) * 2008-11-28 2010-06-10 Jsr Corp 重合体および感放射線性樹脂組成物
JP2010128391A (ja) * 2008-11-28 2010-06-10 Jsr Corp 感放射線性樹脂組成物
JP2010134380A (ja) * 2008-12-08 2010-06-17 Jsr Corp 感放射線性樹脂組成物
JP2010152349A (ja) * 2008-11-28 2010-07-08 Jsr Corp 重合体および感放射線性樹脂組成物
JP2010262241A (ja) * 2009-05-11 2010-11-18 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物、レジストパターン形成方法、高分子化合物、化合物
WO2013146356A1 (ja) * 2012-03-28 2013-10-03 株式会社クラレ アクリル酸エステル系誘導体の製造方法並びに中間体およびその製造方法
WO2013146379A1 (ja) * 2012-03-28 2013-10-03 株式会社クラレ アクリル酸エステル系誘導体
JP2014077999A (ja) * 2012-09-21 2014-05-01 Sumitomo Chemical Co Ltd 樹脂、レジスト組成物及びレジストパターンの製造方法
JP2014142424A (ja) * 2013-01-22 2014-08-07 Tokyo Ohka Kogyo Co Ltd レジストパターン形成方法
US20150037733A1 (en) * 2012-02-27 2015-02-05 Kuraray Co., Ltd. Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition
JP2015083695A (ja) * 2015-01-06 2015-04-30 大阪有機化学工業株式会社 ホモアダマンタン誘導体、その製造方法及びフォトレジスト用感光性材料
JP2021098838A (ja) * 2019-12-23 2021-07-01 住友化学株式会社 樹脂、レジスト組成物及びレジストパターンの製造方法並びに化合物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006040949A1 (ja) * 2004-10-12 2006-04-20 Tokyo Ohka Kogyo Co., Ltd. 液浸露光用ポジ型レジスト組成物およびレジストパターン形成方法
JP2006219555A (ja) * 2005-02-09 2006-08-24 Tokyo Ohka Kogyo Co Ltd 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法
WO2006123496A1 (ja) * 2005-05-17 2006-11-23 Tokyo Ohka Kogyo Co., Ltd. ポジ型レジスト組成物およびレジストパターン形成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006040949A1 (ja) * 2004-10-12 2006-04-20 Tokyo Ohka Kogyo Co., Ltd. 液浸露光用ポジ型レジスト組成物およびレジストパターン形成方法
JP2006219555A (ja) * 2005-02-09 2006-08-24 Tokyo Ohka Kogyo Co Ltd 高分子化合物、ポジ型レジスト組成物およびレジストパターン形成方法
WO2006123496A1 (ja) * 2005-05-17 2006-11-23 Tokyo Ohka Kogyo Co., Ltd. ポジ型レジスト組成物およびレジストパターン形成方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
LEE Y.R., CHO B.S., KWON H.J.: "A convenient and efficient preparation of beta-substituted alpha-haloenones from diazodicarbonyl compounds", TETRAHEDRON, vol. 59, no. 47, 17 November 2003 (2003-11-17), pages 9333 - 9347, XP004470374 *

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010091858A (ja) * 2008-10-09 2010-04-22 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物、高分子化合物およびレジストパターン形成方法
WO2010061875A1 (ja) * 2008-11-26 2010-06-03 Jsr株式会社 感放射線性樹脂組成物
JP2010126581A (ja) * 2008-11-26 2010-06-10 Jsr Corp 重合体および感放射線性樹脂組成物
JP2010128388A (ja) * 2008-11-28 2010-06-10 Jsr Corp 重合体および感放射線性樹脂組成物
JP2010126696A (ja) * 2008-11-28 2010-06-10 Jsr Corp 重合体および感放射線性樹脂組成物
JP2010128391A (ja) * 2008-11-28 2010-06-10 Jsr Corp 感放射線性樹脂組成物
JP2010152349A (ja) * 2008-11-28 2010-07-08 Jsr Corp 重合体および感放射線性樹脂組成物
JP2010134380A (ja) * 2008-12-08 2010-06-17 Jsr Corp 感放射線性樹脂組成物
JP2010262241A (ja) * 2009-05-11 2010-11-18 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物、レジストパターン形成方法、高分子化合物、化合物
US20150037733A1 (en) * 2012-02-27 2015-02-05 Kuraray Co., Ltd. Acrylic acid ester derivative and method for producing same, intermediate and method for producing same, high-molecular-weight compound, and photoresist composition
WO2013146356A1 (ja) * 2012-03-28 2013-10-03 株式会社クラレ アクリル酸エステル系誘導体の製造方法並びに中間体およびその製造方法
WO2013146379A1 (ja) * 2012-03-28 2013-10-03 株式会社クラレ アクリル酸エステル系誘導体
JP2013227269A (ja) * 2012-03-28 2013-11-07 Kuraray Co Ltd アクリル酸エステル系誘導体
JPWO2013146356A1 (ja) * 2012-03-28 2015-12-10 株式会社クラレ アクリル酸エステル系誘導体の製造方法並びに中間体およびその製造方法
JP2014077999A (ja) * 2012-09-21 2014-05-01 Sumitomo Chemical Co Ltd 樹脂、レジスト組成物及びレジストパターンの製造方法
JP2014142424A (ja) * 2013-01-22 2014-08-07 Tokyo Ohka Kogyo Co Ltd レジストパターン形成方法
JP2015083695A (ja) * 2015-01-06 2015-04-30 大阪有機化学工業株式会社 ホモアダマンタン誘導体、その製造方法及びフォトレジスト用感光性材料
JP2021098838A (ja) * 2019-12-23 2021-07-01 住友化学株式会社 樹脂、レジスト組成物及びレジストパターンの製造方法並びに化合物
JP7621777B2 (ja) 2019-12-23 2025-01-27 住友化学株式会社 樹脂、レジスト組成物及びレジストパターンの製造方法並びに化合物

Also Published As

Publication number Publication date
TW200838842A (en) 2008-10-01
JPWO2008081768A1 (ja) 2010-04-30

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