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WO2006030854A1 - Complex profile body polishing method and polishing apparatus - Google Patents

Complex profile body polishing method and polishing apparatus Download PDF

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Publication number
WO2006030854A1
WO2006030854A1 PCT/JP2005/017030 JP2005017030W WO2006030854A1 WO 2006030854 A1 WO2006030854 A1 WO 2006030854A1 JP 2005017030 W JP2005017030 W JP 2005017030W WO 2006030854 A1 WO2006030854 A1 WO 2006030854A1
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WIPO (PCT)
Prior art keywords
polishing
magnetic
fluid
polishing liquid
mixed
Prior art date
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Ceased
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PCT/JP2005/017030
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French (fr)
Japanese (ja)
Inventor
Keita Yamamoto
Rei Hanamura
Yoshio Matsuo
Kunio Simada
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FDK Corp
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FDK Corp
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Priority to JP2006535197A priority Critical patent/JPWO2006030854A1/en
Publication of WO2006030854A1 publication Critical patent/WO2006030854A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/10Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
    • B24B31/112Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B35/00Machines or devices designed for superfinishing surfaces on work, i.e. by means of abrading blocks reciprocating with high frequency
    • B24B35/005Machines or devices designed for superfinishing surfaces on work, i.e. by means of abrading blocks reciprocating with high frequency for making three-dimensional objects
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories

Definitions

  • the rotating polishing nozzle has a magnetic field generation source, and therefore, a magnetic field acts between the polishing tool and the object to be polished, and magnetic clusters are generated in the magnetic polishing liquid.
  • a large number of ferromagnetic particles for example, iron particles
  • magnetite particles are aggregated by a magnetic attractive force to form a magnetic cluster.
  • Magnetic clusters follow the magnetic flux. Therefore, a large number of magnetic clusters are arranged in a needle shape in opposition to the object to be polished, whereby the abrasive grains present in the magnetic polishing liquid are held on the surface of the object to be polished.
  • some abrasive grains are entangled in the magnetic cluster, so they are also pressed against the surface to be polished.
  • non-contact fluid polishing can be performed on an object to be polished by a magnetic cluster generated over a magnetic polishing liquid, and the magnetic polishing liquid is stirred. Therefore, even if the object to be polished is a complex shape having irregularities such as grooves, the entire surface can be polished evenly. Further, since the polishing of the present invention is non-contact fluid polishing, polishing can be performed without stress even on a polishing object having low strength. Then, by performing such polishing, it is possible to remove burrs or finish the mirror surface.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

[PROBLEMS] To provide a complex profile body mirror finish method and apparatus wherein fluid polishing in which the object being polished is not brought into contact is carried out, the entire surface can be mirror finished even if the object is a complex profile body having protrusions and recesses such as grooves, and even a weak strength object can be polished with no stress. [MEANS FOR SOLVING PROBLEMS] The object (3) to be polished is secured to the bottom of a fluid tank (2), a polishing bite (4) is opposed to the object out of contact with the bite (4), and then the tank is filled with a magnetic polishing liquid (1) such that both of them are immersed. The magnetic polishing liquid is mixed with nonmagnetic abrasive grains and α cellulose as thickener. The polishing bite is provided with a permanent magnet (41) and rotated by a rotating means (5). The fluid tank is caused to perform appropriate vibratory operation by a vibration means (6) linked therewith, thus stirring the magnetic polishing liquid in the tank. Magnetic clusters produced in the polishing liquid by the magnetic field of the permanent magnet act to press the abrasive grains in the liquid against the surface of the object. Since the polishing liquid flows, the abrasive grains move even in the recesses of a complex profile.

Description

明 細 書  Specification

複雑形状体の研磨方法および研磨装置  Polishing method and polishing apparatus for complex shapes

技術分野  Technical field

[0001] 本発明は、精密機械部品や金型など複雑な凹凸形状を有する複雑形状体の研磨 方法および研磨装置に関するもので、より具体的には、研磨対象である複雑形状体 に対して研磨バイトを非接触に対面し、これらの周辺に磁気研磨液を存在させて流 体研磨を行う技術の改良に関する。  TECHNICAL FIELD [0001] The present invention relates to a polishing method and a polishing apparatus for a complex-shaped body having a complicated uneven shape such as a precision machine part and a mold, and more specifically, polishing a complex-shaped body to be polished. The present invention relates to an improvement in a technique for performing fluid polishing by facing a bite in a non-contact manner and by causing a magnetic polishing liquid to exist around these tools.

背景技術  Background art

[0002] 研磨対象の表面を鏡面に仕上げる技術としては、一般に、遊離砲粒を分散させた 研磨剤を研磨対象とラップ定盤との間に介在させた状態で両者を擦り合わせる動作 を行うラッピングや、ラッピングよりも微細な砲粒を用い、ポリツシングパッドと呼ばれる 柔らか!/、工具により研磨対象との擦り合わせ動作を行うポリシングなどが行われて!/ヽ る。  [0002] As a technique for finishing the surface of the object to be polished into a mirror surface, generally, lapping is performed in which a polishing agent in which free particles are dispersed is rubbed between the object to be polished and a lapping platen. Or, using a finer particle than lapping, soft polishing called a polishing pad! / Polishing with a tool to rub against the object to be polished!

[0003] また、非接触の研磨技術にはフロートポリツシングがある。このフロートポリツシング は、錫定盤と研磨対象を、微細な研磨剤を混濁したポリシング液中で同時に回転さ せることにより両者間に介在するポリシング液の流動圧で研磨対象をわずかに浮上さ せ、そのポリシング液中の研磨剤により加工を進めるような技術である。  [0003] Further polishing is a non-contact polishing technique. In this float polishing, the tin plate and the object to be polished are simultaneously rotated in a turbid polishing liquid with a fine abrasive so that the polishing object is slightly lifted by the flow pressure of the polishing liquid interposed between them. In other words, the processing proceeds with the polishing agent in the polishing liquid.

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0004] し力しながら、そうした従来の鏡面研磨の技術では以下に示すような問題がある。ラ ッビングやポリシングは、研磨対象に対してラップ定盤,ポリツシングパッドなど工具を 接触させて力を加える加工方法であるため、研磨対象に大きな応力が生じる。このた め、強度が弱い研磨対象の研磨は、困難であり、仮に研磨をした場合には研磨対象 に対して加工変質層を生じる問題がある。  However, such conventional mirror polishing techniques have the following problems. Rubbing and polishing are processing methods that apply force by bringing a tool such as a lapping plate or polishing pad into contact with the object to be polished, resulting in large stresses on the object to be polished. For this reason, it is difficult to polish an object to be polished with low strength, and if it is polished, there is a problem that a work-affected layer is formed on the object to be polished.

[0005] また、ラッピングやポリシングは、研磨対象に工具を接触させて研磨するため、研磨 対象が溝などの凹凸を有する複雑形状 (複雑形状体)であるときは、その溝の底部な ど複雑な部位を研磨できない。その結果、表面の全域を鏡面に仕上げられず、部分 的にムラができてしまう問題がある。このことは、上記したフロートポリシングでも同様 である。フロートポリシングは研磨対象を非接触に浮上させる研磨ではあるが、研磨 対象に対して錫定盤の平面度を集積した形状に転写する点は接触研磨と変わりなく 、複雑形状体には対応できない。係る複雑形状体等に対する問題は、鏡面研磨に限 らず、バリの除去,皮膜の除去その他の研磨にも同様のことが言える。 [0005] In addition, lapping and polishing are performed by bringing a tool into contact with the object to be polished, and therefore when the object to be polished has a complex shape (complex shape body) having irregularities such as grooves, it is complicated such as the bottom of the groove. It is not possible to polish any part. As a result, the entire surface cannot be finished as a mirror surface. There is a problem of unevenness. The same applies to the above-described float policing. Float polishing is polishing that floats the object to be polished in a non-contact manner, but the point of transferring the flatness of the tin surface plate to the object to be polished is the same as contact polishing, and it cannot deal with complex shapes. The problem with such complex shaped bodies is not limited to mirror polishing, but the same can be said for removal of burrs, film removal and other polishing.

[0006] この発明は上記した課題を解決するもので、その目的は、研磨対象に非接触とする 流体研磨を行 、、研磨対象が溝など凹凸を有する複雑形状体であっても表面の全 域を研磨することができ、強度が弱 、研磨対象でも応力なく研磨が行える複雑形状 体の研磨方法および研磨装置を提供することにある。  [0006] The present invention solves the above-described problems, and an object of the present invention is to perform fluid polishing in a non-contact manner with respect to the object to be polished. An object of the present invention is to provide a polishing method and a polishing apparatus for a complex shaped body that can polish a region, have low strength, and can be polished without stress even on a polishing target.

課題を解決するための手段  Means for solving the problem

[0007] 上記した目的を達成するために、本発明に係る研磨方法は、複雑形状体である研 磨対象に対して研磨バイトを非接触に対面させるとともに、これらの周辺に磁気研磨 液を存在させて流体研磨を行う複雑形状体の研磨方法あって、前記研磨バイトは磁 場を発生する磁場発生源を設けて回転手段により回転動作させ、当該研磨バイト〖こ 対面させて前記研磨対象を支持するとともに、これら両者が浸力る状態に周辺に磁 気研磨液を満たし、前記磁気研磨液には非磁性の砥粒を混合しておき、前記研磨 ノ^トを回転動作するとともに前記磁場発生源により前記磁気研磨液に時間的に定 常的あるいは変動的な磁場を加え、当該磁気研磨液を攪拌手段によりかき混ぜて非 接触の状態で流体研磨を行うようにした。  [0007] In order to achieve the above-described object, the polishing method according to the present invention makes the polishing tool face non-contact with the object to be polished, which is a complex shape, and has a magnetic polishing liquid around these objects. A polishing method for a complex-shaped body that performs fluid polishing, wherein the polishing tool is provided with a magnetic field generating source for generating a magnetic field, is rotated by a rotating means, and the polishing tool is faced to support the object to be polished. At the same time, the magnetic polishing solution is filled in the periphery so that both of them are immersed, and nonmagnetic abrasive grains are mixed in the magnetic polishing solution, the polishing note is rotated and the magnetic field is generated. A constant or variable magnetic field was applied to the magnetic polishing liquid with a source, and the magnetic polishing liquid was stirred by a stirring means to perform fluid polishing in a non-contact state.

[0008] また、本発明に係る研磨装置は、出力軸が回転する回転手段と、永久磁石や電磁 コイルなど磁場を発生する磁場発生源を有しており前記出力軸の先端に着脱可能 に取り付ける研磨バイトと、前記研磨バイトと対面させて研磨対象を支持して当該両 者が浸かる状態に磁気研磨液を満たす流動槽と、前記流動槽に連係して適宜な動 作の振動を与える振動手段とを備え、前記磁気研磨液は非磁性の砥粒を混合し、前 記研磨バイトは前記研磨対象と接触させずに所定の間隔を隔てて回転動作するとと もに前記磁場発生源により前記磁気研磨液に時間的に定常的あるいは変動的な磁 場を加え、そして前記流動槽を振動させて当該槽内の磁気研磨液を力き混ぜる構成 にする。 [0009] 前記研磨バイトは、非磁性体力 なる円柱体に同心に永久磁石を埋め込み、当該 永久磁石により磁場を発生する構成とすることができる。別の構成としては、前記研 磨バイトは、非磁性体力もなる円柱体に対して環状の永久磁石を同心に複数を埋め 込み、磁性部位と非磁性部位とが同心に交互に繰り返す構成とすることができる。も ちろん、前記研磨バイトは、他の構成を採ることもできる。 [0008] Further, the polishing apparatus according to the present invention has a rotating means for rotating the output shaft and a magnetic field generating source for generating a magnetic field such as a permanent magnet and an electromagnetic coil, and is detachably attached to the tip of the output shaft. A polishing bite, a fluid tank that supports the object to be polished by facing the polishing bite and fills the magnetic polishing liquid in a state in which both of them are immersed, and a vibration means that provides vibrations of appropriate operation in conjunction with the fluid tank. The magnetic polishing liquid is mixed with non-magnetic abrasive grains, and the polishing tool is rotated at a predetermined interval without being in contact with the object to be polished. A magnetic field that is constant or fluctuating in time is applied to the polishing liquid, and the fluid tank is vibrated to mix the magnetic polishing liquid in the tank vigorously. [0009] The polishing tool may be configured such that a permanent magnet is concentrically embedded in a cylindrical body having a nonmagnetic physical force, and a magnetic field is generated by the permanent magnet. As another configuration, the polishing tool has a configuration in which a plurality of annular permanent magnets are concentrically embedded in a cylindrical body that also has non-magnetic force, and a magnetic part and a non-magnetic part repeat alternately and concentrically. be able to. Of course, the polishing tool may take other configurations.

[0010] 上述した各発明に用いられる磁気研磨液は、動粘度 0. 01〜: L00mm2Zs程度の 水ゃケロシン等の分散媒中に、粒子径 1〜80 μ mの強磁性粒子を好ましくは 10〜 9 5wt%分散させた流体に対して、粒子径 10〜50nmの球形マグネタイト粒子が電気 絶縁性を有する水ゃケロシン等の分散媒に一様に分散した流体を好ましくは 5〜90 wt%混合した複合流体に、粒子径 0. 01〜: LOO mの非磁性の砥粒を混合し、さら に増粘剤として OLセルロースなどの繊維状物質あるいはポリビュルアルコール等の 榭脂を混合する構成としたものを用いることができる。 [0010] The magnetic polishing liquid used in each of the above-mentioned inventions preferably comprises ferromagnetic particles having a particle diameter of 1 to 80 μm in a dispersion medium such as water kerosene having a kinematic viscosity of 0.01 to L00 mm 2 Zs. Is a fluid in which spherical magnetite particles having a particle diameter of 10 to 50 nm are uniformly dispersed in a dispersion medium such as water kerosene having an electrical insulation property, with respect to a fluid dispersed in a range of 10 to 5 wt%. Mix the mixed fluid with non-magnetic abrasive grains with a particle size of 0.01 ~: LOO m, and also add a fibrous material such as OL cellulose or a resin such as polybulu alcohol as a thickener. What was comprised can be used.

[0011] したがって本発明では、回転動作する研磨ノイトは磁場発生源を有し、このため研 磨バイトと研磨対象との間に磁場が作用し、磁気研磨液において磁気クラスタが生成 する。具体的には、請求項 2と請求項 6に示す組成において、強磁性粒子 (例えば鉄 粒子),マグネタイト粒子が磁気吸引力により多数が凝集して磁気クラスタとなる。磁 気クラスタは、磁束に沿う。従って、磁気クラスタは、研磨対象に対立して針状に多数 が立ち並び、これにより磁気研磨液中に存在する砥粒が研磨対象の表面に押えつ けられる。また、磁気クラスタに絡み込まれた砥粒もあるので、それらも研磨対象の表 面に押えつけられる。  Accordingly, in the present invention, the rotating polishing nozzle has a magnetic field generation source, and therefore, a magnetic field acts between the polishing tool and the object to be polished, and magnetic clusters are generated in the magnetic polishing liquid. Specifically, in the compositions shown in claims 2 and 6, a large number of ferromagnetic particles (for example, iron particles) and magnetite particles are aggregated by a magnetic attractive force to form a magnetic cluster. Magnetic clusters follow the magnetic flux. Therefore, a large number of magnetic clusters are arranged in a needle shape in opposition to the object to be polished, whereby the abrasive grains present in the magnetic polishing liquid are held on the surface of the object to be polished. In addition, some abrasive grains are entangled in the magnetic cluster, so they are also pressed against the surface to be polished.

[0012] こうした状態で研磨バイトが回転動作することから研磨対象との間の相対運動によ つて砥粒は研磨対象の表面を接触しつつ運動する。このため、研磨対象の表面の凸 部を砲粒が研削し、より平滑な表面が得られる。よって、仮に研磨対象にバリが存在 していたとしても、係るノ リも除去される。  [0012] Since the polishing tool rotates in this state, the abrasive grains move while contacting the surface of the object to be polished by relative movement with the object to be polished. For this reason, the projections on the surface of the surface to be polished are ground by the gunshot, and a smoother surface can be obtained. Therefore, even if burrs are present in the object to be polished, such sleigh is also removed.

[0013] また、流動槽を動かすことで磁気研磨液を力き混ぜることから、研磨対象の凹部で も磁気研磨液が入れ替わり、磁気研磨液中で砥粒が動き回るため研削の作用をし、 研磨が進むことになる。  [0013] In addition, since the magnetic polishing liquid is vigorously mixed by moving the fluidized tank, the magnetic polishing liquid is exchanged even in the concave portion to be polished, and the abrasive grains move around in the magnetic polishing liquid, so that the grinding action acts. Will go on.

[0014] さらに、磁気クラスタは、磁場発生源 (永久磁石)の磁場から飛び外れてしまうものも ある。これらは磁気研磨液中に分散してやがて消失してしまうが、少しの間は形状を 保持する。従って、磁場から飛び外れた磁気クラスタは、磁気研磨液の流動運動の ため研磨対象の側部など各部位に回り込む。そして、その回り込んだ磁気クラスタが 当該部位に当たって研削したり、当該部位で近辺に存在した砲粒を動力したりする。 その結果、研磨バイトと対面しない側部でも研磨が進む。もちろん、この浮遊した磁 気クラスタは、研磨対象の凹部でも動き回り研削の作用をし、研磨が進むことになる。 [0014] Furthermore, the magnetic cluster may be out of the magnetic field of the magnetic field generation source (permanent magnet). is there. These disperse in the magnetic polishing liquid and eventually disappear, but retain their shape for a while. Therefore, the magnetic cluster that has jumped out of the magnetic field wraps around each part such as the side of the object to be polished due to the flow motion of the magnetic polishing liquid. Then, the magnetic cluster that wraps around hits the part and grinds it, or powers the barrel that exists in the vicinity at the part. As a result, polishing proceeds even on the side that does not face the polishing tool. Of course, this floating magnetic cluster also moves around the recess to be polished and acts as a grinding tool, and polishing proceeds.

[0015] すなわち、磁場発生源の磁場により凝集して生じた磁気クラスタの一部は、研磨バ イトの回転動作および流動槽の振動動作に伴って磁場力 離脱して流動し、研磨対 象の凹部に入り込み、そして側部など研磨バイトと対面しない部位に当たり、あるい は近辺の砲粒を動力して当てるなど研削の作用をし、複雑形状の凹部や研磨バイト と対面しな 、側部でも研磨することになる。  That is, a part of the magnetic cluster generated by agglomeration due to the magnetic field of the magnetic field generation source flows away from the magnetic field force along with the rotation operation of the polishing byte and the vibration operation of the fluidized tank, and the object to be polished. It enters into the recess and hits a part such as the side that does not face the polishing bite, or powers and hits the nearby barrel, and does not face the complicatedly shaped recess or polishing bit. It will be polished.

[0016] また、上述した組成では、磁気研磨液には aセルロース等の増粘剤を含むので、 添加した増粘剤は磁気クラスタを保持するように作用し、その結果、多数の砥粒が研 磨対象の表面に接触する状況を促進でき、研磨を高効率に行えるようになる。  [0016] In the composition described above, since the magnetic polishing liquid contains a thickener such as a cellulose, the added thickener acts to hold the magnetic cluster, and as a result, a large number of abrasive grains are formed. The situation of contacting the surface to be polished can be promoted, and polishing can be performed with high efficiency.

発明の効果  The invention's effect

[0017] 本発明に係る複雑形状体の研磨では、磁気研磨液にぉ ヽて生成した磁気クラスタ により、研磨対象に対しては非接触の流体研磨を行うことができ、磁気研磨液を攪拌 手段によりかき混ぜるので、研磨の作用を促進でき、研磨対象が溝など凹凸を有す る複雑形状体であっても表面の全域をムラなく研磨することができる。また、本発明の 研磨は、非接触の流体研磨であるため、強度が弱い研磨対象でも応力なく研磨が行 える。そして、係る研磨を行なうことにより、バリを除去したり、鏡面に仕上げることがで きる。  In the polishing of a complex shaped body according to the present invention, non-contact fluid polishing can be performed on an object to be polished by a magnetic cluster generated over a magnetic polishing liquid, and the magnetic polishing liquid is stirred. Therefore, even if the object to be polished is a complex shape having irregularities such as grooves, the entire surface can be polished evenly. Further, since the polishing of the present invention is non-contact fluid polishing, polishing can be performed without stress even on a polishing object having low strength. Then, by performing such polishing, it is possible to remove burrs or finish the mirror surface.

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0018] 本発明をより詳細に説明するにあたり、添付の図面に従ってこれを説明する。図 1 は、本発明の好適な一実施の形態を示している。本実施の形態において、研磨装置 (鏡面研磨装置)は、磁気研磨液 1を満たした流動槽 2を有し、その流動槽 2の底部 に固定した研磨対象 (試料 3)に対して研磨バイト 4を非接触に対面させる。研磨バイ ト 4は、例えば永久磁石などの磁場を発生する磁場発生源を備えており、駆動モータ 5により回転させる。流動槽 2には、振動台 6を連係させ、適宜な動作の振動を行わせ る。そして、この研磨装置は、磁気研磨液 1に生成した磁気クラスタの作用により流体 研磨を行う構成になっている。 [0018] The present invention will be described in detail with reference to the accompanying drawings. FIG. 1 shows a preferred embodiment of the present invention. In the present embodiment, the polishing apparatus (mirror polishing apparatus) has a fluid tank 2 filled with magnetic polishing liquid 1, and a polishing tool 4 for a polishing object (sample 3) fixed to the bottom of the fluid tank 2. To face non-contact. The polishing byte 4 includes a magnetic field generation source that generates a magnetic field such as a permanent magnet, for example. Rotate by 5. A vibrating table 6 is linked to the fluidized tank 2 to vibrate appropriately. This polishing apparatus is configured to perform fluid polishing by the action of magnetic clusters generated in the magnetic polishing liquid 1.

[0019] 流動槽 2は、底面に試料 3を固定し、スプリングネジ 7によりトラバース装置 8の基台 9に取り付けるとともに、そのトラバース装置 8を振動台 6に取り付ける。スプリングネジ 7の部位には、接触式のロードセル 10を配置している。トラバース装置 8の基台 9を動 かすことで流動槽 2の上下位置を初期設定し、振動台 6により適宜な振動動作、例え ば研磨バイト 4の回転軸との対立面において 8の字を描くといった回動動作を与える とともに、その動作状況をロードセル 10により検出するようになっている。  The fluid tank 2 has the sample 3 fixed to the bottom surface, attached to the base 9 of the traverse device 8 with the spring screw 7, and the traverse device 8 is attached to the vibration table 6. A contact type load cell 10 is disposed at the spring screw 7. By moving the base 9 of the traverse device 8, the vertical position of the fluid tank 2 is initially set, and an appropriate vibration operation is performed by the vibration table 6, for example, a figure 8 is drawn on the surface opposite to the rotating shaft of the polishing tool 4. Such a turning operation is given, and the operation state is detected by the load cell 10.

[0020] 磁気研磨液 1は非磁性の砥粒を混合している。具体的には、動粘度 0. 01〜: LOO mm2Zs程度の水ゃケロシン等の分散媒中に、粒子径 1〜80 μ mの強磁性粒子を 1 0〜95wt%分散させた流体に対して、粒子径 10〜50nmの球形マグネタイト粒子が 電気絶縁性を有する水ゃケロシン等の分散媒に一様に分散した流体を 5〜90wt% 混合した複合流体に、粒子径 0. 01〜: LOO mの非磁性の砲粒を混合し、さらに増 粘剤として aセルロースなどの繊維状物質あるいはポリビュルアルコール等の榭脂を 混合している。 The magnetic polishing liquid 1 is mixed with nonmagnetic abrasive grains. Specifically, in a fluid in which 10 to 95 wt% of ferromagnetic particles having a particle diameter of 1 to 80 μm are dispersed in a dispersion medium such as water kerosene having a kinematic viscosity of 0.01 to LOO mm 2 Zs. On the other hand, in a composite fluid in which 5 to 90 wt% of a fluid in which spherical magnetite particles having a particle diameter of 10 to 50 nm are uniformly dispersed in a dispersion medium such as water kerosene having electrical insulation properties is mixed, the particle diameter is 0.01 to: LOO m non-magnetic bombardment is mixed, and as a thickener, a fibrous material such as cellulose, or a resin such as polybulal alcohol is mixed.

[0021] 図 2〜図 4に示すように、研磨バイト 4は、非磁性体力もなる円柱体 40に同心に永 久磁石 41を埋め込んだ構成を採る。すなわち、図 2に示す構造は、円柱形状の永久 磁石 41を一つだけ円柱体 40の中心に埋め込んであり、円柱体 40の直径 w2,永久 磁石 41の直径 wlに関して、  As shown in FIGS. 2 to 4, the polishing tool 4 adopts a configuration in which a permanent magnet 41 is concentrically embedded in a cylindrical body 40 having a non-magnetic force. That is, in the structure shown in FIG. 2, only one cylindrical permanent magnet 41 is embedded in the center of the cylindrical body 40. With respect to the diameter w2 of the cylindrical body 40 and the diameter wl of the permanent magnet 41,

1. 0≤w2/wl≤3. 0  1. 0≤w2 / wl≤3.0

という設定にしている。  It is set to.

[0022] また図 3に示す構造は、円柱形状の永久磁石 41を一つだけ円柱体 40の中心に埋 め込むとともに、バイト面を中心の永久磁石 41に向けて窪ませてあり、円柱体 40の 直径 w2,永久磁石 41の直径 wl ,窪み部の深さ h,窪み部の幅 w3に関して、 w2/ wl = 5  In addition, the structure shown in FIG. 3 is such that only one cylindrical permanent magnet 41 is embedded in the center of the cylindrical body 40 and the bite surface is recessed toward the central permanent magnet 41. 40 diameter w2, permanent magnet 41 diameter wl, depression depth h, depression width w3 w2 / wl = 5

w3/h=4  w3 / h = 4

w3 = (w2 -wl) /2 1. 0≤w2/wl≤3. 0 w3 = (w2 -wl) / 2 1. 0≤w2 / wl≤3.0

0. I≤h/w3≤10. 0  0. I≤h / w3≤10. 0

という設定にしている。  It is set to.

[0023] さらに、研磨バイト 4は、図 4 (a) , (b)に示すように、非磁性体力もなる円柱体 40に 、環状の永久磁石 41を同心に複数を埋め込み、磁性部位と非磁性部位とが同心に 交互に繰り返す構成を採ることもよ ヽ。  Further, as shown in FIGS. 4 (a) and 4 (b), the polishing tool 4 has a cylindrical body 40 having a nonmagnetic force, and a plurality of annular permanent magnets 41 are concentrically embedded so as not to have a magnetic part. It is also possible to adopt a configuration in which the magnetic part repeats alternately concentrically.

[0024] 駆動モータ 5には、例えばボール盤,旋盤, NC旋盤,フライス盤などの回転駆動機 構を用いることができ、出力軸に連結したチャック部 11に研磨バイト 4の軸を取り付け し、着脱が行える構成になっている。  [0024] As the drive motor 5, for example, a rotary drive mechanism such as a drilling machine, a lathe, an NC lathe, a milling machine, or the like can be used. The shaft of the grinding tool 4 is attached to the chuck portion 11 connected to the output shaft, and can be attached and detached. It can be configured.

[0025] 振動台 6は、図示しない駆動源を有し、研磨バイト 4の回転軸と対立する平面につ いて流動槽 4を動かす構成を採る。振動動作には複数のモードを設定してあり、適宜 に選択あるいは組み合わせるようになつている。つまり、振動台 6の振動動作は、研 磨バイト 4の回転軸との対立面において、定点を中心とする単純な回転動作、あるい は 8の字を描く回動動作、または当該平面における定方向で往復する振動動作など 、複数の振動モードがあり、研磨作業の際はこれらを適宜に選択あるいは組み合わ せること〖こなる。  The vibration table 6 has a drive source (not shown), and adopts a configuration in which the fluid tank 4 is moved on a plane opposite to the rotation axis of the polishing tool 4. Several modes are set for the vibration operation, and they are selected or combined as appropriate. In other words, the vibration motion of the shaking table 6 is a simple rotational motion centered on a fixed point, a rotational motion that draws a figure 8, or a constant motion in the plane in the plane opposite to the rotational axis of the polishing tool 4. There are a plurality of vibration modes such as a vibration operation reciprocating in the direction, and these can be selected or combined as appropriate during the polishing operation.

[0026] このような構成によれば、研磨バイト 4と試料 3との間には、図 5に示すように、磁束 が生じて磁気研磨液 1において磁気クラスタ 12が生成する。つまり、研磨バイト 4には 永久磁石 41を埋め込んであるので磁場が作用し、永久磁石 41と試料 3との間で磁 束が生じ、強磁性粒子 (例えば鉄粒子),マグネタイト粒子が磁気吸引力により多数 が凝集して磁気クラスタ 12となる。磁気クラスタ 12は、磁束に沿うので試料 3に対立し て針状に多数が立ち並ぶことになる。  According to such a configuration, as shown in FIG. 5, a magnetic flux is generated between the polishing tool 4 and the sample 3 to generate a magnetic cluster 12 in the magnetic polishing liquid 1. In other words, since the permanent magnet 41 is embedded in the polishing tool 4, a magnetic field acts, a magnetic flux is generated between the permanent magnet 41 and the sample 3, and ferromagnetic particles (for example, iron particles) and magnetite particles attract magnetic attraction force. As a result, many agglomerate into magnetic clusters 12. Since the magnetic cluster 12 is along the magnetic flux, a large number of needles are arranged in opposition to the sample 3.

[0027] このとき、磁気研磨液 1においては、増粘剤として加えた αセルロース 13が磁気ク ラスタ 12の相互間に織り込み状態に位置を占める。さらに磁気研磨液 1には、非磁 性の砲粒 14をカ卩えてあるので、これは磁気クラスタ 12に絡み込まれるものもあるが、 多くは試料 3の表面に存在することになる。したがって、針状に立ち並ぶ磁気クラスタ 12および織り込み状態のひセルロース 13とによって、磁気研磨液 1の中に存在する 砲粒 14が試料 3の表面に押さえつけられる。また、磁気クラスタ 12および αセルロー ス 13に絡み込まれた砲粒 14もあるので、それらも試料 3の表面に押えつけられる。 At this time, in the magnetic polishing liquid 1, α-cellulose 13 added as a thickener occupies a position in a woven state between the magnetic clusters 12. In addition, since the magnetic polishing liquid 1 has a non-magnetic bullet 14, some of them are entangled in the magnetic cluster 12, but many exist on the surface of the sample 3. Therefore, the gun particles 14 present in the magnetic polishing liquid 1 are pressed against the surface of the sample 3 by the magnetic clusters 12 arranged in a needle shape and the woven cellulose 13. Magnetic cluster 12 and alpha cellulosic There are also barrels 14 entangled in the tube 13, so they are also pressed against the surface of Sample 3.

[0028] こうした状態で研磨バイト 4 (永久磁石 41)が回転動作することから試料 3との間の 相対運動によって砲粒 14は試料 3の表面を接触しつつ運動する。このため、試料 3 の表面の凸部を砲粒 14が研削し、より平滑な表面が得られる。つまり、研磨対象にバ リが生じていた場合には、係るバリが除去できるし、鏡面研磨も行なえる。  In this state, the polishing tool 4 (permanent magnet 41) rotates, so that the barrel 14 moves while contacting the surface of the sample 3 due to the relative movement with the sample 3. For this reason, the projection 14 on the surface of the sample 3 is ground by the gunballs 14, and a smoother surface is obtained. In other words, when burrs have occurred in the object to be polished, such burrs can be removed and mirror polishing can be performed.

[0029] 磁場が定常的では、磁気クラスタ 12は磁束に沿って整列して立ち並び、磁力により 整列状態が保持されるので砥粒 14が試料 3の表面 (研磨面)に適度に当たって研磨 が行える。また、磁場が変動的では、磁気クラスタ 12は動揺し、このときも砲粒 14が 研磨面に適度に当たり研磨が行える。このように、試料 3に対して研磨バイト 4を接触 させずに所定に隔てた非接触の状態であっても、磁気クラスタ 12および aセルロー ス 13の押さえ作用により研磨することができ、流体研磨が行える。  [0029] When the magnetic field is stationary, the magnetic clusters 12 are aligned and aligned along the magnetic flux, and the aligned state is maintained by the magnetic force, so that the abrasive grains 14 can hit the surface (polishing surface) of the sample 3 appropriately to perform polishing. In addition, when the magnetic field is variable, the magnetic cluster 12 is shaken, and at this time, the gunballs 14 hit the polishing surface appropriately and can be polished. As described above, even when the polishing tool 4 is not in contact with the sample 3 without being in contact with the polishing tool 4, it can be polished by the pressing action of the magnetic cluster 12 and the a cell loss 13, and fluid polishing. Can be done.

[0030] また、流動槽 2を動かすことで磁気研磨液 1を力き混ぜることから、試料 3の凹部で も磁気研磨液 1が入れ替わり、磁気研磨液 1の中で砲粒 14が動き回るため研削の作 用をし、研磨が進むことになる。  [0030] In addition, since the magnetic polishing liquid 1 is vigorously mixed by moving the fluidized tank 2, the magnetic polishing liquid 1 is replaced even in the concave portion of the sample 3, and the gunballs 14 move around in the magnetic polishing liquid 1, so that grinding is performed. Polishing will proceed.

[0031] ところで、磁気クラスタ 12は、永久磁石 41の磁場から飛び外れてしまうものもある。  By the way, the magnetic cluster 12 may be out of the magnetic field of the permanent magnet 41.

これらは磁気研磨液 1の中に分散してやがて消失してしまうが、少しの間は形状を保 持することから、磁気研磨液 1の流動運動のため試料 3の側部など各部位に回り込む ことになる。すると、その回り込んだ磁気クラスタ 12が当該部位に当たり研削の作用を し、あるいは当該部位で近辺に存在した砲粒 14を動かす作用となる。その結果、研 磨バイト 4と対面しない側部でも研磨が進むことになる。もちろん、この浮遊した磁気 クラスタ 12は、試料 3の凹部でも動き回り研削の作用をし、研磨が進むことになる。  These disperse in the magnetic polishing liquid 1 and eventually disappear. However, since the shape is maintained for a short time, the magnetic polishing liquid 1 flows around each part such as the side of the sample 3 due to the flow motion. It will be. Then, the magnetic cluster 12 that has come around hits the relevant part and acts as a grinding, or acts to move the barrel 14 existing in the vicinity at the relevant part. As a result, polishing proceeds even on the side that does not face the polishing tool 4. Of course, the floating magnetic cluster 12 also moves around the concave portion of the sample 3 and acts as a grinding so that the polishing proceeds.

[0032] すなわち、永久磁石 41の磁場により凝集して生じた磁気クラスタ 12の一部は、研磨 ノイト 4の回転動作および流動槽 2の振動動作に伴って磁束力も離脱して流動し、試 料 3の凹部に入り込み、そして側部など研磨バイト 4と対面しない部位に当たり、ある いは近辺の砲粒 14を動力して当てるなど研削の作用をし、複雑形状の凹部や研磨 ノイト 4と対面しない側部でも研磨することになる。  That is, a part of the magnetic cluster 12 generated by agglomeration due to the magnetic field of the permanent magnet 41 flows with the magnetic flux force being released along with the rotating operation of the polishing knot 4 and the vibrating operation of the fluid tank 2, and the sample. It enters into the concave part of 3 and hits the part that does not face the polishing bit 4 such as the side, or powers and hits the nearby barrel 14 and does not face the concave part of the complex shape or the polishing note 4 The side will also be polished.

[0033] また、磁気研磨液 1には増粘剤として exセルロース 13を含むので、添加した増粘剤 は磁気クラスタ 12を保持するように作用する。その結果、多数の砥粒 14が試料 3の 表面に接触する状況を促進でき、研磨を高効率に行えるようになる。 In addition, since the magnetic polishing liquid 1 contains excellulose 13 as a thickener, the added thickener acts to hold the magnetic cluster 12. As a result, a large number of abrasive grains 14 The situation of contacting the surface can be promoted, and polishing can be performed with high efficiency.

[0034] したがって、本発明に係る鏡面研磨によれば、磁気研磨液 1にお ヽて生成した磁気 クラスタ 12により、試料 3 (研磨対象)に対しては非接触の流体研磨を行うことができ、 磁気研磨液 1を攪拌手段によりかき混ぜるので、研磨の作用を促進できる。よって、 研磨対象が溝などの凹凸を有する複雑形状体であっても表面の全域をムラなく鏡面 に仕上げることができる。そして、非接触の流体研磨であるため、強度が弱い研磨対 象でも応力なく研磨が行える。  Therefore, according to the mirror polishing according to the present invention, the non-contact fluid polishing can be performed on the sample 3 (polishing target) by the magnetic cluster 12 generated in the magnetic polishing liquid 1. Since the magnetic polishing liquid 1 is agitated by the stirring means, the action of polishing can be promoted. Therefore, even if the object to be polished is a complex shape having irregularities such as grooves, the entire surface can be mirror-finished evenly. And since it is non-contact fluid polishing, polishing can be performed without stress even if the polishing target is weak.

実施例  Example

[0035] 図 1に示す鏡面研磨装置を用いて試料の研磨を行った。つまり、本発明の効果を 実証するため、研磨の条件を替えて複数の試料を研磨し、それら各試料について表 面粗さ Ra (算術平均粗さ)を評価した。  [0035] The sample was polished using the mirror polishing apparatus shown in FIG. That is, in order to demonstrate the effect of the present invention, a plurality of samples were polished under different polishing conditions, and the surface roughness Ra (arithmetic average roughness) was evaluated for each sample.

[0036] 磁気研磨液としては表 1に示す組成とし、第 1評価試験には図 6 (a) , (b)に示す形 状寸法の試料を用いた。 [0036] The magnetic polishing liquid had the composition shown in Table 1, and samples having the dimensions shown in Figs. 6 (a) and (b) were used in the first evaluation test.

[表 1]  [table 1]

Figure imgf000010_0001
Figure imgf000010_0001

つまり、磁気研磨液はその組成に、非磁性の砥粒として粒子径 0. 05 /z mのアルミ ナを含み、さらに増粘剤としてひセルロースを含むものとする。そして、第 1評価試験 では、試料は図 6 (a) , (b)に示すように、外径 12mm,厚さ 5mmの円板形状で同心 に環状の溝部を有し、表 2に示す諸条件により研磨を行なった。その結果、同表に合 わせて示すような表面粗さ Raが得られた。 That is, the magnetic polishing liquid contains, in its composition, alumina having a particle diameter of 0.05 / zm as non-magnetic abrasive grains and further containing cellulose as a thickener. In the first evaluation test, as shown in FIGS. 6 (a) and 6 (b), the sample has a disk shape with an outer diameter of 12 mm and a thickness of 5 mm, and has a concentric annular groove. Polishing was performed according to conditions. As a result, the table A surface roughness Ra as shown is obtained.

[表 2]  [Table 2]

Figure imgf000011_0001
Figure imgf000011_0001

[0038] このとき、試料は真鍮からなり、研磨バイトは図 4 (a) , (b)に示したもの、環状の永 久磁石を同心に有する構成であって、その回転数は 915rpm、試料との間隔は lm m、研磨時間は 1時間、振動台は研磨バイトの回転軸との対立面において 8の字を描 く回動動作を行!ヽ、その振幅は 10mmで毎分 20回の振動とした。 [0038] At this time, the sample is made of brass, and the polishing tool has the configuration shown in FIGS. 4 (a) and 4 (b) and has a concentric ring-shaped permanent magnet, and the rotational speed is 915 rpm. Lm m, polishing time is 1 hour, and the shaking table rotates in a shape of 8 in the face opposite to the rotation axis of the polishing tool! ヽ, its amplitude is 10 mm and 20 times per minute Vibration was assumed.

[0039] その結果、表面粗さ Raは環状の溝部(凹部)でも 5. 7nmが得られており、これは上 方の表面(凸部)と同等な数 nmオーダであることを確認した。すなわち、本発明に係 る研磨によれば、複雑形状体についてその凹部も含む表面の全域を研磨 (鏡面研磨 )することができ、本発明の有用性が確認できた。  As a result, it was confirmed that the surface roughness Ra was 5.7 nm even in the annular groove portion (concave portion), which was on the order of several nm equivalent to the upper surface (convex portion). That is, according to the polishing according to the present invention, it was possible to polish the entire surface of the complex shape body including the concave portion (mirror polishing), and the usefulness of the present invention was confirmed.

[0040] 次に、試料を平板形状のものとして第 2評価試験を行った。つまり、試料は外径 20 mm,厚さ 10mmの円板形状のものとし、表 3に示す諸条件により研磨を行なった。そ の結果、同表に合わせて示すような表面粗さ Raが得られた。  [0040] Next, a second evaluation test was performed with the sample having a flat plate shape. In other words, the sample had a disk shape with an outer diameter of 20 mm and a thickness of 10 mm, and was polished under various conditions shown in Table 3. As a result, a surface roughness Ra as shown in the table was obtained.

[表 3] [Table 3]

バイト 回転数 間隔 下の台 Rai nm) 番号 材質 (No.) (rpm) (mm)研磨時間 Byte Rotational Speed Interval Bottom stand Rai nm) No. Material (No.) (rpm) (mm) Polishing time

(下の台振動の条件) 研磨前 研磨後 (Lower table vibration conditions) Before polishing After polishing

8の字振動 Figure 8 vibration

1 真鍮 A 515 2 1時間 240.8 6.8  1 Brass A 515 2 1 hour 240.8 6.8

(振幅 10mm,回転数 20/分)  (Amplitude 10mm, rotation speed 20 / min)

8の字振動  Figure 8 vibration

2 SUS304 A 515 2 1時間 192 3.4  2 SUS304 A 515 2 1 hour 192 3.4

(振幅 10mm,回転数 20/分)  (Amplitude 10mm, rotation speed 20 / min)

8の字振動  Figure 8 vibration

3 アルミ A 515 2 1時間 192.3 7.6  3 Aluminum A 515 2 1 hour 192.3 7.6

(振幅 10mm,回転数 20/分)  (Amplitude 10mm, rotation speed 20 / min)

8の字振動  Figure 8 vibration

4 ジュラルミン A 515 2 1時間 150.3 4.4  4 Duralumin A 515 2 1 hour 150.3 4.4

(振幅 10mm,回転数 2(V分)  (Amplitude 10mm, Rotation speed 2 (V)

8の字振動  Figure 8 vibration

5 銅 A 515 2 1時間 486.9 4.8  5 Copper A 515 2 1 hour 486.9 4.8

(振幅 10mm,回転数 20/分)  (Amplitude 10mm, rotation speed 20 / min)

8の字振動  Figure 8 vibration

6 真鍮 B 915 2 1時間 238.6 7.1  6 Brass B 915 2 1 hour 238.6 7.1

(振幅 10mm,回転数 20/分)  (Amplitude 10mm, rotation speed 20 / min)

8の字振動  Figure 8 vibration

7 真鍮 B 515 2 30分 285.1 7.8  7 Brass B 515 2 30 min 285.1 7.8

(振幅 1 Omm,回転数 20/分)  (Amplitude 1 Omm, rotation speed 20 / min)

8の字振動  Figure 8 vibration

8 真鍮 B 515 2 1時間 207.8 8.4  8 Brass B 515 2 1 hour 207.8 8.4

(振幅 1 Omm,回転数 20/分)  (Amplitude 1 Omm, rotation speed 20 / min)

8の字振動  Figure 8 vibration

9 Ti B 515 1 1時間 415.6 7.7  9 Ti B 515 1 1 hour 415.6 7.7

(振幅 10mm,回転数 20/分)  (Amplitude 10mm, rotation speed 20 / min)

[0041] 第 2評価試験では、試料は真鍮, SUS304,アルミニウム,ジュラルミン,銅, Tiで あり、研磨バイトは図 2に示したものがバイト A,図 3に示したものがバイト Bであって、 その回転数は 515rpmあるいは 915rpm、試料との間隔は 2mmあるいは lmm、研 磨時間は 1時間あるいは 30分、振動台は研磨バイトの回転軸との対立面において 8 の字を描く回動動作を行い、その振幅は 10mmで毎分 20回の振動とした。  [0041] In the second evaluation test, the samples are brass, SUS304, aluminum, duralumin, copper, and Ti, and the polishing tool shown in FIG. 2 is tool A, and the tool shown in FIG. The rotation speed is 515 rpm or 915 rpm, the distance from the sample is 2 mm or lmm, the polishing time is 1 hour or 30 minutes, and the shaking table rotates in a shape of 8 on the surface opposite to the rotation axis of the polishing tool. The amplitude was 10 mm and the vibration was 20 times per minute.

[0042] その結果、表面粗さ Raは番号 1〜番号 9の試料の何れにおいても数 nmオーダが 得られており、このとき試料は上面だけでなく側面 (周面)も鏡面研磨できていることを 確認した。すなわち、本発明に係る鏡面研磨によれば、充分な表面粗さに鏡面研磨 が行えるものであり、これは流動槽に固定した底面を除く表面の全域つまり磁気研磨 液と接した表面の全域を研磨 (鏡面研磨)することができ、本発明の有用性が確認で きた。  [0042] As a result, the surface roughness Ra was on the order of several nanometers for any of the samples numbered 1 to 9, and at this time, not only the top surface but also the side surface (circumferential surface) could be mirror-polished. It was confirmed. That is, according to the mirror polishing according to the present invention, the mirror polishing can be performed with a sufficient surface roughness, and this covers the entire surface except the bottom surface fixed to the fluid tank, that is, the entire surface in contact with the magnetic polishing liquid. It was possible to polish (mirror polishing), and the usefulness of the present invention was confirmed.

[0043] 上述した実験結果は、いずれも、本発明が鏡面研磨に有効に機能することをことを 証明するものである。本発明の効果は、上述した鏡面研磨に限るものではなぐ研磨 対象の形態にとらわれず、たとえ複雑形状体であっても研磨することができるもので ある。この研磨の一態様として、ノ リ取り(バレル研磨)がある。すなわち、たとえば図 7 に示すように、研磨対象 45が、機械加工により表面に円弧状の凹溝 45aを形成し、 その機械加工の際にその凹溝 45aの端部にバリ 45bが形成されたものとする。また、 図 8に示すように、研磨対象 46が、平板状の金属プレートに対してプレスカ卩ェなどを 行ない先端に細長な帯状板部 46aを有する形状力もなるものとする。そして、その帯 状板部 46aの側縁にノ リ 46bが残っていたとする。これらバリ 45b, 46bは、この例で は、数 μ m力も数 10 μ m程度の寸法である。 [0043] The experimental results described above prove that the present invention functions effectively for mirror polishing. The effect of the present invention is not limited to the shape of the object to be polished, and is not limited to the above-described mirror polishing, and can be polished even if it has a complicated shape. is there. As one aspect of this polishing, there is a removal of a barrel (barrel polishing). That is, for example, as shown in FIG. 7, an object 45 to be polished formed a circular groove 45a on the surface by machining, and a burr 45b was formed at the end of the groove 45a during the machining. Shall. Further, as shown in FIG. 8, it is assumed that the object to be polished 46 also has a shape force having a slender belt-like plate portion 46a at the tip by performing a press-cage or the like on a flat metal plate. Then, it is assumed that the groove 46b remains on the side edge of the strip-shaped plate portion 46a. In this example, these burrs 45b and 46b have dimensions of several μm force and several tens of μm.

磁気研磨液としては表 4に示す組成とし、第 3評価試験には図 7(No. 10),図 8(No . 11)に示す形状寸法の試料 (バリ付き)を用いた。そして、各試料に対し、それぞれ 表 5に示す研磨実施条件の下で、研磨を行なった。研磨に用いた研磨バイトは、図 1 ,図 2に示す構造のものである。また、振動第 6は、流動槽は 2が円運動するように動 作させた。その結果、何れの試料も、ノ リが綺麗に除去された。これにより、本発明の 研磨は、バリの除去にも有効に機能することが確認できた。例えば、図 8に示すように 、複雑形状であり、し力も、非常に微小で強度の弱い部材の場合、通常の方法でバリ を除去しょうとすると、帯状板部 46aが曲がったり、破損したりするおそれがあるが、本 発明によれば、帯状板部 46aに対する損傷はなぐノ リのみを除去することができる。  As the magnetic polishing liquid, the composition shown in Table 4 was used. In the third evaluation test, samples (with burrs) having the shape and dimensions shown in FIG. 7 (No. 10) and FIG. 8 (No. 11) were used. Each sample was polished under the polishing conditions shown in Table 5. The polishing tool used for polishing has the structure shown in FIGS. In addition, for vibration No. 6, the fluid tank was operated so that 2 moved in a circular motion. As a result, all samples were cleanly removed. Thus, it was confirmed that the polishing of the present invention also functions effectively for removing burrs. For example, as shown in FIG. 8, in the case of a member having a complicated shape and a very small and weak force, if the burrs are removed by a normal method, the belt-like plate portion 46a is bent or damaged. However, according to the present invention, it is possible to remove only the glue that does not damage the belt-like plate portion 46a.

[表 4] [Table 4]

Figure imgf000013_0001
Figure imgf000013_0001

[表 5] 試料-バイト間ギャップ 上部回転数 研磨時間 下部回転数 番号 被研磨物材質 [Table 5] Gap between sample and bite Upper rotation speed Polishing time Lower rotation speed Number Material of workpiece

imm) (rpm) (秒) (rpm) imm) (rpm) (seconds) (rpm)

10 SUS403 1 800 10 4010 SUS403 1 800 10 40

1 1 SUS403 1 800 180 40 1 1 SUS403 1 800 180 40

[0045] なお、鏡面研磨やバリ除去を行なう場合の研磨時間や、上部回転数,下部回転数 などの研磨条件は、材質,寸法形状その他の要因に基づき、適宜に設定する。 図面の簡単な説明 Note that the polishing time for mirror polishing and burr removal, and polishing conditions such as the upper rotation speed and the lower rotation speed are appropriately set based on the material, dimensions, and other factors. Brief Description of Drawings

[0046] [図 1]本発明に係る鏡面研磨装置の好適な一実施の形態を示す構成図である。  FIG. 1 is a block diagram showing a preferred embodiment of a mirror polishing apparatus according to the present invention.

[図 2]研磨バイトの好適な例 1を示す断面図である。  FIG. 2 is a cross-sectional view showing a preferred example 1 of a polishing tool.

[図 3]研磨バイトの好適な例 2を示す断面図である。  FIG. 3 is a cross-sectional view showing a preferred example 2 of a polishing tool.

[図 4]研磨バイトの好適な例 3を示し、(a)が断面図、(b)がそのバイト面を示す平面 図である。  FIG. 4 shows a preferred example 3 of a polishing tool, in which (a) is a sectional view and (b) is a plan view showing the tool surface.

[図 5]磁気クラスタによる流体研磨を示す説明図である。  FIG. 5 is an explanatory diagram showing fluid polishing by magnetic clusters.

[図 6]研磨試験の試料とした複雑形状体の形状寸法を示す斜視図 (a)および断面図 (b)である。  FIG. 6 is a perspective view (a) and a cross-sectional view (b) showing the shape and size of a complex shape body used as a sample for a polishing test.

[図 7]研磨対象の試料とした複雑形状体の一例を示す図である。  FIG. 7 is a diagram showing an example of a complex shape body as a sample to be polished.

[図 8]研磨対象の試料とした複雑形状体の一例を示す図である。  FIG. 8 is a diagram showing an example of a complex shape body used as a sample to be polished.

[0047] 1 磁気研磨液 [0047] 1 Magnetic polishing liquid

2 流動槽  2 Fluid tank

3 試料 (研磨対象)  3 samples (for polishing)

4 研磨バイト  4 Polishing tool

5 駆動モータ  5 Drive motor

6 振動台  6 Shaking table

7 スプリングネジ  7 Spring screw

8 トラバース装置 基台 ロード、セノレ チャック部 磁気クラスタ αセノレロース 砥粒 円柱体 永久磁石 研磨対象a 凹溝b バリ 研磨対象a 帯状板部b バリ 8 Traverse device Base Load, Senole Chuck part Magnetic cluster α-Cenellose Abrasive grain Cylinder Permanent magnet Polishing target a Groove b Burr Polishing target a Strip plate part b Burr

Claims

請求の範囲 The scope of the claims [1] 複雑形状体である研磨対象に対して研磨バイトを非接触に対面させるとともに、こ れらの周辺に磁気研磨液を存在させて流体研磨を行う複雑形状体の鏡面研磨方法 あって、  [1] A method for mirror polishing of a complex-shaped body in which a polishing tool is brought into contact with a polishing object that is a complex-shaped body in a non-contact manner, and a magnetic polishing liquid is present in the periphery to perform fluid polishing. 前記研磨バイトは、磁場を発生する磁場発生源を設けて回転手段により回転動作 させ、当該研磨バイトに対面させて前記研磨対象を支持するとともに、これら両者が 浸カゝる状態に周辺に磁気研磨液を満たし、前記磁気研磨液には非磁性の砥粒を混 合しておき、  The polishing tool is provided with a magnetic field generation source for generating a magnetic field, and is rotated by a rotating means. The polishing tool is supported by the polishing tool so as to face the polishing tool, and both of them are immersed in a state where they are immersed. Filled with liquid, and nonmagnetic abrasive grains are mixed in the magnetic polishing liquid, その状態で前記研磨バイトを回転動作するとともに前記磁場発生源により前記磁気 研磨液に時間的に定常的あるいは変動的な磁場を加え、そして当該磁気研磨液を 攪拌手段によりかき混ぜて非接触の状態で流体研磨を行うことを特徴とする複雑形 状体の研磨方法。  In this state, the polishing tool is rotated, a magnetic field is applied to the magnetic polishing liquid by the magnetic field generation source, and the magnetic polishing liquid is stirred by a stirring means in a non-contact state. A method for polishing a complex shaped body, comprising performing fluid polishing. [2] 前記磁気研磨液は、  [2] The magnetic polishing liquid is 動粘度 0. 01〜: L00mm2Zs程度の水ゃケロシン等の分散媒中に、粒子径 1〜80 μ mの強磁性粒子を分散させた流体に対して、粒子径 10〜50nmの球形マグネタイ ト粒子が電気絶縁性を有する水ゃケロシン等の分散媒に一様に分散した流体を 5〜 90wt%混合した複合流体に、粒子径 0. 01〜: LOO mの非磁性の砥粒を混合し、さ らに増粘剤として (Xセルロースなどの繊維状物質あるいはポリビュルアルコール等の 榭脂を混合することを特徴とする請求項 1に記載の複雑形状体の研磨方法。 Kinematic viscosity 0.01-: Spherical magnetite with a particle size of 10-50 nm for a fluid in which ferromagnetic particles with a particle size of 1-80 μm are dispersed in a dispersion medium such as water kerosene of L00mm 2 Zs To a composite fluid in which 5 to 90 wt% of a fluid that is uniformly dispersed in a dispersion medium such as water kerosene with electrically insulating properties is mixed with non-magnetic abrasive grains with a particle size of 0.01 to: LOO m 2. The method for polishing a complex-shaped body according to claim 1, further comprising mixing a fibrous substance such as X cellulose or a resin such as polybulal alcohol as a thickener. [3] 出力軸が回転する回転手段と、永久磁石や電磁コイルなど磁場を発生する磁場発 生源を有しており前記出力軸の先端に着脱可能に取り付ける研磨バイトと、前記研 磨バイトと対面させて研磨対象を支持して当該両者が浸カゝる状態に磁気研磨液を満 たす流動槽と、前記流動槽に連係して適宜な動作の振動を与える振動手段とを備え て、  [3] A polishing tool having a rotating means for rotating the output shaft, a magnetic field generating source for generating a magnetic field such as a permanent magnet or an electromagnetic coil, and detachably attached to the tip of the output shaft, and facing the polishing tool A fluid tank that fills the magnetic polishing liquid in a state where the object to be polished is supported and the both are immersed, and a vibration means that provides vibrations of appropriate operation in conjunction with the fluid tank. 前記磁気研磨液は非磁性の砥粒を混合し、前記研磨バイトは前記研磨対象と接触 させずに所定の間隔を隔てて回転動作するとともに前記磁場発生源により前記磁気 研磨液に時間的に定常的あるいは変動的な磁場を加え、そして前記流動槽を振動 させて当該槽内の磁気研磨液をかき混ぜることを特徴とする複雑形状体の研磨装置 The magnetic polishing liquid is mixed with non-magnetic abrasive grains, and the polishing bit rotates at a predetermined interval without being brought into contact with the object to be polished, and is constantly stationary in time with the magnetic polishing liquid by the magnetic field generation source. A polishing apparatus for complex shaped bodies, characterized by applying a magnetic field or a variable magnetic field, and vibrating the fluid tank to stir the magnetic polishing liquid in the tank [4] 前記研磨バイトは、非磁性体力 なる円柱体に同心に永久磁石を埋め込み、当該 永久磁石により磁場を発生することを特徴とする請求項 3に記載の複雑形状体の研 磨装置。 4. The polishing apparatus for a complex shaped body according to claim 3, wherein the polishing tool embeds a permanent magnet concentrically in a cylindrical body having a nonmagnetic physical force and generates a magnetic field by the permanent magnet. [5] 前記研磨ノイトは、非磁性体力もなる円柱体に対して環状の永久磁石を同心に複 数を埋め込み、磁性部位と非磁性部位とが同心に交互に繰り返す構成とすることを 特徴とする請求項 3に記載の複雑形状体の研磨装置。  [5] The polishing knot is characterized in that a plurality of annular permanent magnets are concentrically embedded in a cylindrical body having nonmagnetic force, and the magnetic part and the nonmagnetic part are alternately and concentrically repeated. 4. The polishing apparatus for complex shapes according to claim 3. [6] 前記磁気研磨液は、  [6] The magnetic polishing liquid is 動粘度 0. 01〜: L00mm2Zs程度の水ゃケロシン等の分散媒中に、粒子径 1〜80 μ mの強磁性粒子を分散させた流体に対して、粒子径 10〜50nmの球形マグネタイ ト粒子が電気絶縁性を有する水ゃケロシン等の分散媒に一様に分散した流体を混 合した複合流体に、粒子径 0. 01〜: L00 mの非磁性の砲粒を混合し、さらに増粘 剤として aセルロースなどの繊維状物質あるいはポリビュルアルコール等の榭脂を混 合することを特徴とする請求項 3のいずれか 1項に記載の複雑形状体の鏡面研磨装 置。 Kinematic viscosity 0.01-: Spherical magnetite with a particle size of 10-50 nm for a fluid in which ferromagnetic particles with a particle size of 1-80 μm are dispersed in a dispersion medium such as water kerosene of L00mm 2 Zs A non-magnetic cannonball with a particle size of 0.01 to: L00 m is mixed with a composite fluid in which a fluid in which particles are electrically dispersed in a dispersion medium such as water kerosene having electrical insulation properties is mixed. 4. The mirror polishing apparatus for complex-shaped bodies according to claim 3, wherein a fibrous material such as a cellulose or a resin such as polybulal alcohol is mixed as a thickener. [7] 前記磁気研磨液は、  [7] The magnetic polishing liquid is 動粘度 0. 01〜: L00mm2Zs程度の水ゃケロシン等の分散媒中に、粒子径 1〜80 μ mの強磁性粒子を分散させた流体に対して、粒子径 10〜50nmの球形マグネタイ ト粒子が電気絶縁性を有する水ゃケロシン等の分散媒に一様に分散した流体を混 合した複合流体に、粒子径 0. 01〜: L00 mの非磁性の砲粒を混合し、さらに増粘 剤として aセルロースなどの繊維状物質あるいはポリビュルアルコール等の榭脂を混 合することを特徴とする請求項 4に記載の複雑形状体の鏡面研磨装置。 Kinematic viscosity 0.01-: Spherical magnetite with a particle size of 10-50 nm for a fluid in which ferromagnetic particles with a particle size of 1-80 μm are dispersed in a dispersion medium such as water kerosene of L00mm 2 Zs A non-magnetic cannonball with a particle size of 0.01 to: L00 m is mixed with a composite fluid in which a fluid in which particles are electrically dispersed in a dispersion medium such as water kerosene having electrical insulation properties is mixed. 5. The mirror polishing apparatus for complex-shaped bodies according to claim 4, wherein a fibrous substance such as a cellulose or a resin such as polybulal alcohol is mixed as a thickener. [8] 前記磁気研磨液は、  [8] The magnetic polishing liquid is 動粘度 0. 01〜: L00mm2Zs程度の水ゃケロシン等の分散媒中に、粒子径 1〜80 μ mの強磁性粒子を分散させた流体に対して、粒子径 10〜50nmの球形マグネタイ ト粒子が電気絶縁性を有する水ゃケロシン等の分散媒に一様に分散した流体を混 合した複合流体に、粒子径 0. 01〜: L00 mの非磁性の砲粒を混合し、さらに増粘 剤として aセルロースなどの繊維状物質あるいはポリビュルアルコール等の榭脂を混 合することを特徴とする請求項 5に記載の複雑形状体の鏡面研磨装置 Kinematic viscosity 0.01-: Spherical magnetite with a particle size of 10-50 nm for a fluid in which ferromagnetic particles with a particle size of 1-80 μm are dispersed in a dispersion medium such as water kerosene of L00mm 2 Zs A non-magnetic cannonball with a particle size of 0.01 to: L00 m is mixed with a composite fluid in which a fluid in which particles are electrically dispersed in a dispersion medium such as water kerosene having electrical insulation properties is mixed. As a thickener, a fibrous material such as cellulose, or greaves such as polybulal alcohol is mixed. 6. The complex surface mirror polishing apparatus according to claim 5, wherein
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