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JP2007167968A - Mirror polishing method and mirror polishing apparatus - Google Patents

Mirror polishing method and mirror polishing apparatus Download PDF

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JP2007167968A
JP2007167968A JP2005364893A JP2005364893A JP2007167968A JP 2007167968 A JP2007167968 A JP 2007167968A JP 2005364893 A JP2005364893 A JP 2005364893A JP 2005364893 A JP2005364893 A JP 2005364893A JP 2007167968 A JP2007167968 A JP 2007167968A
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polishing
magnetic
polished
tool
magnetic field
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Keita Yamamoto
慶太 山本
Rei Hanamura
玲 花村
Yoshio Matsuo
良夫 松尾
Kunio Shimada
邦雄 島田
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FDK Corp
Fukushima University NUC
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Fukushima University NUC
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  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

【課題】 研磨対象の表面を鏡面に仕上げる研磨において、表面全域について平坦度を向上させて研磨することができ、そして平坦度を良好にし得る研磨を短時間で行える鏡面研磨方法および鏡面研磨装置を提供すること
【解決手段】 支持台2に研磨対象(試料1)を固定し、試料1には研磨バイト3を対面させ、両者の狭間へ磁気研磨液4を供給する。磁気研磨液4には非磁性の砥粒を混合し、αセルロースなどの増粘剤を混合する。研磨バイト3は遊星歯車30の軸端に取り付け、複数を試料1に対面させる。遊星歯車機構は、太陽歯車31の外側に複数の遊星歯車30を配置し、さらに外側に内歯車32を噛み合わせてあり、太陽歯車31の軸部に連係した駆動モータ10により駆動する。したがって、研磨バイト3は自転と公転の2つの運動が行えて試料1の表面に対する移動が平均化し、研磨作用のばらつきを低減できる。
【選択図】 図1
PROBLEM TO BE SOLVED: To provide a mirror polishing method and a mirror polishing apparatus capable of improving the flatness of the entire surface in polishing for finishing the surface to be polished to a mirror surface, and capable of performing polishing that can improve the flatness in a short time. Provided An object to be polished (sample 1) is fixed to a support base 2, a polishing tool 3 is made to face the sample 1, and a magnetic polishing liquid 4 is supplied between the two. Nonmagnetic abrasive grains are mixed in the magnetic polishing liquid 4 and a thickener such as α cellulose is mixed. The polishing tool 3 is attached to the shaft end of the planetary gear 30, and a plurality of polishing tools 3 face the sample 1. In the planetary gear mechanism, a plurality of planetary gears 30 are arranged outside the sun gear 31, and an internal gear 32 is meshed further outside, and the planetary gear mechanism is driven by the drive motor 10 linked to the shaft portion of the sun gear 31. Therefore, the polishing tool 3 can perform two movements of rotation and revolution, and the movement with respect to the surface of the sample 1 can be averaged, so that variation in polishing action can be reduced.
[Selection] Figure 1

Description

本発明は、精密機械部品や金型などの表面を鏡面に研磨するための鏡面研磨方法および鏡面研磨装置に関するもので、より具体的には、研磨対象に対して研磨バイトを対面させるとともに、これらの周辺に磁気研磨液を存在させて流体研磨を行うことの改良に関する。   The present invention relates to a mirror polishing method and a mirror polishing apparatus for polishing a surface of a precision machine component or a mold to a mirror surface, and more specifically, a polishing tool is made to face a polishing object, and these The present invention relates to an improvement in performing fluid polishing in the presence of a magnetic polishing liquid in the vicinity of the substrate.

研磨対象の表面を鏡面に仕上げる技術としては、一般に、遊離砥粒を分散させた研磨剤を研磨対象とラップ定盤との間に介在させた状態で両者を擦り合わせる動作を行うラッピングや、ラッピングよりも微細な砥粒を用い、ポリシングパッドと呼ばれる柔らかい工具により研磨対象との擦り合わせ動作を行うポリシングなどが行われている。   As a technique for finishing the surface to be polished into a mirror surface, in general, lapping or lapping is performed in which an abrasive in which loose abrasive grains are dispersed is rubbed between the polishing object and a lapping surface. Polishing is performed using finer abrasive grains and performing a rubbing operation with a polishing object with a soft tool called a polishing pad.

非接触の研磨技術にはフロートポリシングがあり、これは錫定盤と研磨対象を、微細な研磨剤を混濁したポリシング液中で同時に回転させることにより両者間に介在するポリシング液の流動圧で研磨対象をわずかに浮上させ、そのポリシング液中の研磨剤により加工を進めるような技術である。   Non-contact polishing technology includes float polishing, which is performed by rotating the tin plate and the object to be polished simultaneously in a polishing solution in which a fine polishing agent is turbid, and polishing with the fluid pressure of the polishing solution interposed between them. This is a technique that slightly raises the object and proceeds with the polishing agent in the polishing liquid.

また、磁界を作用させることで研磨を行う磁気研磨の技術もよく知られており、例えば特許文献1,2に見られるようなものがある。特許文献1には、磁気研磨液における分散粒子を調整することにより研磨液の性能を改善し、精密な研磨、仕上げ加工に適用し得るような技術の提案がある。特許文献2には、磁性砥粒からなる粒子ブラシと研磨対象との間で適正に相対運動を行わせること、および磁性砥粒に非磁性層を被覆することにより研磨の挙動を改善し、精密な研磨、仕上げ加工に適用し得るような技術の提案がある。係る磁気研磨は、いわゆる非接触の研磨が行えるため強度が弱い研磨対象でも応力なく研磨が行えるメリットがあり、精密仕上げの用途に好まれている。   Further, a technique of magnetic polishing in which polishing is performed by applying a magnetic field is well known, for example, as shown in Patent Documents 1 and 2. Patent Document 1 proposes a technique that improves the performance of the polishing liquid by adjusting dispersed particles in the magnetic polishing liquid, and can be applied to precise polishing and finishing. In Patent Document 2, the behavior of polishing is improved by causing the relative movement between the particle brush made of magnetic abrasive grains and the object to be polished appropriately, and by coating the magnetic abrasive grains with a nonmagnetic layer. There are proposals of techniques that can be applied to smooth polishing and finishing. Such magnetic polishing has a merit that it can perform polishing without stress even for a polishing object having low strength because it can perform so-called non-contact polishing, and is preferred for precision finishing applications.

磁気研磨は、磁性砥粒(粒子ブラシ)つまり研削工具は磁界により活性化するため、研磨対象の研磨は磁場発生源の磁極が向き合う対面部位については良好に進む特性を持つ。そこで、磁場発生源は例えば永久磁石とし、これを研磨バイトに組み付けて駆動源により回転させる構成を採り、対面させた研磨対象との間には磁気研磨液を存在させて流体研磨を行う鏡面研磨の技術がある。
特開2002−170791号公報 特開2002−283216号公報
In magnetic polishing, magnetic abrasive grains (particle brushes), that is, grinding tools, are activated by a magnetic field, so that polishing to be polished has a property of favorably progressing at a facing portion where magnetic poles of a magnetic field generation source face each other. Therefore, the magnetic field generation source is, for example, a permanent magnet, which is assembled to a polishing tool and rotated by a driving source, and a mirror polishing is performed in which a magnetic polishing liquid is present between a polishing target and a polishing target to perform fluid polishing. There is a technology.
JP 2002-170791 A JP 2002-283216 A

しかしながら、係る従来の鏡面研磨の技術では以下に示すような問題がある。すなわち、永久磁石を設けた研磨バイトを研磨対象に対面させ、駆動源により回転させるため、永久磁石の近辺には粒子ブラシが良好に生じて密度が高い。その結果、研磨対象の表面研磨についてムラができてしまい、表面の全域を平坦に仕上げることが難しいという問題がある。   However, the conventional mirror polishing technique has the following problems. That is, since the polishing tool provided with the permanent magnet faces the object to be polished and is rotated by the driving source, the particle brush is well generated in the vicinity of the permanent magnet and the density is high. As a result, the surface polishing of the object to be polished becomes uneven and there is a problem that it is difficult to finish the entire surface flat.

この発明は上述した課題を解決するもので、その目的は、研磨対象の表面を鏡面に仕上げる研磨において、表面全域について平坦度を向上させて研磨することができ、平坦度を良好にし得る研磨を短時間で行える鏡面研磨方法および鏡面研磨装置を提供することにある。   The present invention solves the above-described problems. The purpose of the present invention is to polish the surface of the object to be polished into a mirror surface by improving the flatness of the entire surface and polishing that can improve the flatness. An object of the present invention is to provide a mirror polishing method and a mirror polishing apparatus that can be performed in a short time.

上述した目的を達成するために、本発明に係る鏡面研磨方法は、研磨対象に対して研磨バイトを対面させるとともに、これらの周辺に磁気研磨液を存在させて流体研磨を行う鏡面研磨方法であって、研磨バイトは研磨対象との対面に磁場を発生する磁場発生源を設けるとともに、平面上での所定軌跡の運動動作となる駆動を行う第1駆動手段に連係し、研磨対象は平面上での所定軌跡の運動動作となる駆動を行う第2駆動手段に連係し、研磨バイトと研磨対象との間に磁気研磨液を存在させて当該磁気研磨液には非磁性の砥粒を混合しておき、第1駆動手段を起動して研磨バイトを平面上で所定軌跡の運動動作を行わせ、そして第2駆動手段を起動して研磨対象についても平面上で所定軌跡の運動動作を行わせ、このとき磁場発生源により磁気研磨液に時間的に定常的あるいは変動的な磁場を加えて流体研磨を行うようにした。   In order to achieve the above-described object, the mirror polishing method according to the present invention is a mirror polishing method in which a polishing tool is made to face an object to be polished and a magnetic polishing liquid is present around the polishing tool to perform fluid polishing. The polishing tool is provided with a magnetic field generation source that generates a magnetic field on the opposite side of the object to be polished, and is linked to a first driving means that performs a motion operation of a predetermined locus on the plane. The magnetic polishing liquid is linked between the polishing tool and the object to be polished, and nonmagnetic abrasive grains are mixed in the magnetic polishing liquid. The first driving means is activated to cause the polishing tool to move in a predetermined locus on the plane, and the second driving means is activated to cause the polishing object to move in a predetermined locus on the plane. At this time, the magnetic field source And to perform fluid polishing added temporally constant or fluctuating magnetic fields in the polishing liquid.

また、本発明に係る鏡面研磨装置は、研磨対象との対面に磁場発生源を有する研磨バイトと、当該研磨バイトに連係して平面上での所定軌跡の運動動作を行わせる第1駆動手段と、研磨対象に連係して平面上で所定軌跡の運動動作を行わせる第2駆動手段と、研磨バイトと研磨対象との狭間へ磁気研磨液を供給する供給手段とを備えて、磁気研磨液には非磁性の砥粒を混合しておき、供給手段を起動して研磨バイトと研磨対象との間に磁気研磨液を存在させ、第1駆動手段を起動して研磨バイトを平面上で所定軌跡の運動動作を行わせ、第2駆動手段を起動して研磨対象についても平面上で所定軌跡の運動動作を行わせ、磁場発生源により磁気研磨液に時間的に定常的あるいは変動的な磁場を加えるように構成した。   Further, the mirror polishing apparatus according to the present invention includes a polishing tool having a magnetic field generation source facing the object to be polished, and a first driving unit that performs a motion operation of a predetermined locus on a plane in association with the polishing tool. A second driving means for performing a motion movement of a predetermined locus on a plane in cooperation with the object to be polished, and a supply means for supplying a magnetic polishing liquid to a gap between the polishing tool and the object to be polished. Mixes non-magnetic abrasive grains, activates the supply means to cause the magnetic polishing liquid to be present between the polishing bite and the object to be polished, and activates the first driving means to cause the polishing bite to have a predetermined locus on a plane. The second driving means is activated to cause the polishing object to move in a predetermined locus on the plane, and a magnetic field generation source applies a magnetic field that is constantly or fluctuating in time to the magnetic polishing liquid. Configured to add.

第1駆動手段は、太陽歯車の外側に複数の遊星歯車を噛み合わせるとともに、さらに外側に内歯車を噛み合わせてある遊星歯車機構を有し、それら遊星歯車の少なくとも1つに研磨バイトを取り付けし、太陽歯車を駆動源により駆動することにより研磨バイトには自転動作と公転動作とを行わせる構成とするとよい。さらに、研磨バイトは遊星歯車のそれぞれに取り付ける構成とするとよい。   The first drive means has a planetary gear mechanism in which a plurality of planetary gears are engaged with the outside of the sun gear and an internal gear is further engaged with the outside, and a polishing tool is attached to at least one of the planetary gears. The polishing tool may be configured to perform a rotation operation and a revolution operation by driving the sun gear with a drive source. Furthermore, it is preferable that the grinding tool is attached to each planetary gear.

各発明に用いる磁気研磨液は、動粘度0.01〜100mm2/s程度の水やケロシン等の分散媒中に、粒子径1〜80μmの強磁性粒子を10〜95wt%分散させた流体に対して、粒子径10〜50nmの球形マグネタイト粒子が、電気絶縁性を有する水やケロシン等の分散媒に一様に分散した流体を5〜90wt%混合した複合流体に、粒子径0.01〜100μmの非磁性の砥粒を混合し、さらに増粘剤としてαセルロースなどの繊維状物質あるいはポリビニルアルコール等の樹脂を5〜90wt%混合する構成のものが好ましい。   The magnetic polishing liquid used in each invention is based on a fluid in which 10 to 95 wt% of ferromagnetic particles having a particle diameter of 1 to 80 μm are dispersed in a dispersion medium such as water or kerosene having a kinematic viscosity of about 0.01 to 100 mm 2 / s. In addition, spherical magnetite particles having a particle diameter of 10 to 50 nm are mixed with a composite fluid in which 5 to 90 wt% of a fluid uniformly dispersed in a dispersion medium such as water or kerosene having electrical insulation properties is mixed with a particle diameter of 0.01 to 100 μm. The non-magnetic abrasive grains are mixed, and a fibrous substance such as α-cellulose or a resin such as polyvinyl alcohol is mixed as a thickener in an amount of 5 to 90 wt%.

したがって本発明では、研磨バイトには磁場発生源を有し、第1駆動手段により平面上で所定軌跡の運動動作を行い、研磨対象は第2駆動手段により平面上で所定軌跡の運動動作を行う。研磨バイトと研磨対象との間には磁気研磨液が存在し、当該磁気研磨液は非磁性の砥粒を含み、磁場発生源により磁気研磨液に時間的に定常的あるいは変動的な磁場が加わると、磁気研磨液において磁気クラスタが生成する。具体的には上述したような組成において、強磁性粒子(例えば鉄粒子),マグネタイト粒子が磁気吸引力により多数が凝集して磁気クラス夕となる。磁気クラス夕は、磁束に沿うので研磨対象に対立して針状に多数が立ち並び、これにより磁気研磨液中に存在する砥粒が研磨対象の表面に押えつけられる。また、磁気クラス夕に絡み込まれた砥粒もあるので、それらも研磨対象の表面に押えつけられる。   Therefore, in the present invention, the polishing tool has a magnetic field generation source, and the first driving means performs a predetermined locus motion on the plane, and the polishing object performs the predetermined locus motion on the plane by the second driving means. . A magnetic polishing liquid exists between the polishing tool and the object to be polished. The magnetic polishing liquid contains non-magnetic abrasive grains, and a magnetic field generation source applies a time-dependent or variable magnetic field to the magnetic polishing liquid. Then, magnetic clusters are generated in the magnetic polishing liquid. Specifically, in the composition as described above, a large number of ferromagnetic particles (for example, iron particles) and magnetite particles are aggregated by a magnetic attractive force to form a magnetic class. Since the magnetic class is along the magnetic flux, a large number of needles stand in opposition to the object to be polished, so that the abrasive grains present in the magnetic polishing liquid are pressed against the surface of the object to be polished. In addition, since there are abrasive grains entangled in the magnetic class, they are also pressed against the surface to be polished.

係る状態で研磨バイトと研磨対象とが相対的に運動し、これにより砥粒は研磨対象の表面を接触しつつ運動する。このため、研磨対象の表面の凸部を砥粒が研削し、より平滑な表面が得られる。このとき、研磨バイトは単に回転動作するのではなく、平面上で所定軌跡の運動動作を行うので、研磨対象の表面に対する移動が平均化し、さらに研磨対象の側も平面について運動するので研磨バイトとの相対運動が増し、このため研磨作用のばらつきを低減でき、表面全域に対して磁気クラスタにより十分に研磨することができる。   In this state, the polishing tool and the object to be polished move relative to each other, whereby the abrasive grains move while contacting the surface of the object to be polished. For this reason, an abrasive grain grinds the convex part of the surface of grinding | polishing object, and a smoother surface is obtained. At this time, the polishing bite does not simply rotate, but moves with a predetermined trajectory on the plane, so that the movement relative to the surface of the object to be polished is averaged, and further, the side of the object to be polished also moves about the plane. The relative movement of the surface increases, so that the dispersion of the polishing action can be reduced, and the entire surface can be sufficiently polished by the magnetic cluster.

また、複数の研磨バイトが研磨対象に対面する構成では、それぞれにおいて磁気クラスタが研磨の作用を行うことから、単位時間当たりの研磨作用の領域が広くなり、研磨速度が早くなる。   Further, in the configuration in which a plurality of polishing tools face the object to be polished, since the magnetic cluster performs the polishing action in each, the polishing action area per unit time is widened, and the polishing speed is increased.

本発明に係る鏡面研磨では、研磨バイトには磁場発生源を有し、第1駆動手段により平面上で所定軌跡の運動動作を行うので、研磨対象の表面に対する移動が平均化し、そして研磨対象についても第2駆動手段により平面上で所定軌跡の運動動作を行うので両者の相対運動が増し、このため研磨作用のばらつきを低減でき、表面全域に対して磁気クラスタにより十分に研磨することができる。その結果、研磨対象の表面を鏡面に仕上げる研磨において、表面全域について平坦度を向上させて研磨することができる。   In the mirror polishing according to the present invention, the polishing tool has a magnetic field generation source, and the first drive means performs a motion operation of a predetermined locus on the plane, so that the movement with respect to the surface of the polishing object is averaged, and the polishing object is In addition, since the second drive means performs a motion movement of a predetermined trajectory on the plane, the relative movement between the two increases, so that variation in the polishing action can be reduced, and the entire surface can be sufficiently polished by the magnetic cluster. As a result, in the polishing for finishing the surface to be polished into a mirror surface, the entire surface can be polished with improved flatness.

そして、複数の研磨バイトが研磨対象に対面する構成では、それぞれにおいて磁気クラスタが研磨の作用を行うことから、単位時間当たりの研磨作用の領域が広くなり、研磨速度が早くなる。したがって、平坦度を良好にし得る研磨を短時間で行える。もちろん、磁気クラスタによる研磨なので研磨対象に大きな応力をかけることなく研磨が行える。   In the configuration in which a plurality of polishing tools face the object to be polished, since the magnetic cluster performs the polishing action in each of them, the area of the polishing action per unit time is widened and the polishing speed is increased. Therefore, polishing that can improve the flatness can be performed in a short time. Of course, since the polishing is performed by the magnetic cluster, the polishing can be performed without applying a large stress to the object to be polished.

図1は、本発明の好適な一実施の形態を示している。本実施の形態において、鏡面研磨装置は、研磨対象(試料1)を支持台2に固定し、その試料1に対して複数の研磨バイト3…を非接触に対面させるとともに、それら両者の間には磁気研磨液4を存在させる。各研磨バイト3には、磁場の発生と所定軌跡の運動とを行わせるとともに、支持台2についても所定軌跡の振動を行わせ、磁気研磨液4に生成した磁気クラスタにより流体研磨を行う構成になっている。   FIG. 1 shows a preferred embodiment of the present invention. In the present embodiment, the mirror polishing apparatus fixes the object to be polished (sample 1) to the support base 2 and causes the plurality of polishing tools 3 to face the sample 1 in a non-contact manner between them. Presents the magnetic polishing liquid 4. Each polishing tool 3 is caused to generate a magnetic field and to move in a predetermined locus, and also to vibrate the supporting stand 2 in a predetermined locus so that fluid polishing is performed by a magnetic cluster generated in the magnetic polishing liquid 4. It has become.

磁気研磨液4は、非磁性の砥粒を含有し、具体的には、動粘度0.01〜100mm2/s程度の水やケロシン等の分散媒中に、粒子径1〜80μmの強磁性粒子を10〜95wt%分散させた流体に対して、粒子径10〜50nmの球形マグネタイト粒子が、電気絶縁性を有する水やケロシン等の分散媒に一様に分散した流体を5〜90wt%混合した複合流体に、粒子径0.01〜100μmの非磁性の砥粒を混合し、さらに増粘剤としてαセルロースなどの繊維状物質あるいはポリビニルアルコール等の樹脂を5〜90wt%混合している。この磁気研磨液4は、図示しない供給手段により、試料1と研磨バイト3との狭間へ供給するようになっている。   The magnetic polishing liquid 4 contains non-magnetic abrasive grains. Specifically, ferromagnetic particles having a particle diameter of 1 to 80 μm in a dispersion medium such as water or kerosene having a kinematic viscosity of about 0.01 to 100 mm 2 / s. 5 to 90 wt% of a fluid in which spherical magnetite particles having a particle diameter of 10 to 50 nm are uniformly dispersed in a dispersion medium such as water or kerosene having electrical insulation properties is mixed with a fluid in which 10 to 95 wt% is dispersed. The composite fluid is mixed with non-magnetic abrasive grains having a particle diameter of 0.01 to 100 μm, and further mixed with 5 to 90 wt% of a fibrous substance such as α cellulose or a resin such as polyvinyl alcohol as a thickener. The magnetic polishing liquid 4 is supplied to a space between the sample 1 and the polishing tool 3 by a supply means (not shown).

支持台2はスプリングネジ5を介してトラバース装置6の基台7に組み付ける。そして、トラバース装置6を振動台8に組み付ける。スプリングネジ5を装着した部位には、接触式のロードセル9を配置している。つまり、トラバース装置6の基台7を動かすことで支持台2の上下位置を初期設定し、振動台8により所定軌跡の振動を与える。この所定軌跡は、例えば研磨バイト3との対立面において8の字の軌跡を描いて振動するといった運動動作を与えることである。そして、その動作状況をロードセル9により検出するようになっている。   The support 2 is assembled to the base 7 of the traverse device 6 via the spring screw 5. Then, the traverse device 6 is assembled to the vibration table 8. A contact type load cell 9 is disposed at a portion where the spring screw 5 is mounted. That is, the vertical position of the support base 2 is initially set by moving the base 7 of the traverse device 6, and vibration of a predetermined locus is given by the vibration base 8. This predetermined trajectory is to give a motion such as, for example, drawing an 8-shaped trajectory on the surface opposite to the polishing tool 3 and vibrating. The operation state is detected by the load cell 9.

複数の研磨バイト3…は、それぞれ遊星歯車30に取り付けてあり、自転と公転とを行う、いわゆる遊星歯車機構に構成している。この遊星歯車機構は、図2に示すように、中央の太陽歯車31の外側に複数の遊星歯車30を配置して噛み合わせ、さらに外側に内歯車32を配置して噛み合わせている。各遊星歯車30…は、キャリア33に組み付けて回転自在に支持し、内歯車32は支持板34に固定して全体を支持するようになっている。この支持板34は支持台2の上方の図示しない取り付け部に固定し、支持台2に対して複数の研磨バイト3を上方から突き向けている。太陽歯車31は、駆動モータ10に連係させ、これを駆動する構成になっている。   Each of the plurality of polishing tools 3 is attached to the planetary gear 30 and is configured as a so-called planetary gear mechanism that rotates and revolves. As shown in FIG. 2, this planetary gear mechanism has a plurality of planetary gears 30 arranged and meshed outside the central sun gear 31, and an internal gear 32 arranged and meshed further outside. Each planetary gear 30 is assembled to a carrier 33 and rotatably supported, and an internal gear 32 is fixed to a support plate 34 to support the whole. The support plate 34 is fixed to a mounting portion (not shown) above the support table 2, and a plurality of polishing tools 3 are directed toward the support table 2 from above. The sun gear 31 is linked to the drive motor 10 to drive it.

駆動モータ10は、例えばボール盤,旋盤,NC旋盤,フライス盤などの回転駆動機構を用いることができる。駆動モータ10の出力軸に連結したチャック部11に太陽歯車31の軸部を取り付けることで、態様歯車31は、着脱が行える構成になっている。   The drive motor 10 may be a rotary drive mechanism such as a drilling machine, a lathe, an NC lathe, or a milling machine. By attaching the shaft portion of the sun gear 31 to the chuck portion 11 connected to the output shaft of the drive motor 10, the aspect gear 31 can be attached and detached.

研磨バイト3は、非磁性体からなる円柱体35に同心に永久磁石36を埋め込んであり、その永久磁石36が試料1(研磨対象)に向き合うように設定される。つまり、永久磁石36は、対面する試料1との間で磁気研磨液4に対して磁界を作用し、磁場を発生する磁場発生源となる。磁場発生源としては永久磁石36に限らず、例えば電磁石なども好ましく適用でき、磁気研磨液4に対して磁界を作用し得るものであればよい。磁場の発生は時間的に定常的である必要はなく、時間的に変動的な磁場を発生させることもよい。   The polishing tool 3 has a permanent magnet 36 concentrically embedded in a cylindrical body 35 made of a non-magnetic material, and is set so that the permanent magnet 36 faces the sample 1 (target to be polished). That is, the permanent magnet 36 acts as a magnetic field generation source that generates a magnetic field by applying a magnetic field to the magnetic polishing liquid 4 between the facing magnet 1 and the facing sample 1. The magnetic field generation source is not limited to the permanent magnet 36, and for example, an electromagnet or the like can be preferably applied as long as it can act on the magnetic polishing liquid 4. The generation of the magnetic field does not have to be stationary in time, and a magnetic field that varies in time may be generated.

振動台8は図示しない駆動源を有し、研磨バイト3との対立面において所定軌跡で振動する構成を採る。そして、その振動動作は、複数の振動モードを設定している。振動台8による振動動作は、太陽歯車31の軸部との対立面において、8の字の軌跡を描いて回り動く運動動作、あるいは定点を中心に単純に回転する運動動作、または往復に振動する運動動作などの複数の振動モードがあり、研磨作業の際はこれらを適宜に選択あるいは組み合わせることになる。なお、振動台8は、研磨バイト3の軸方向に向かう縦振動を含む運動動作を行うように構成することもよい。   The vibration table 8 has a drive source (not shown) and adopts a configuration that vibrates in a predetermined locus on the surface opposite to the polishing tool 3. The vibration operation sets a plurality of vibration modes. The vibration operation by the vibration table 8 is a motion operation that moves around a figure-eight locus or a motion operation that simply rotates around a fixed point or reciprocally vibrates on the opposite surface to the shaft portion of the sun gear 31. There are a plurality of vibration modes such as a movement operation, and these are appropriately selected or combined during the polishing operation. Note that the vibration table 8 may be configured to perform a motion operation including longitudinal vibration in the axial direction of the polishing tool 3.

試料1を研磨する場合、まず支持台2に試料1を固定し、上方の研磨バイト3に対して試料1の位置関係を初期設定し、それら両者の狭間に対して磁気研磨液4の供給を開始する。そして、駆動モータ10および振動台8を起動して、研磨バイト3および試料1(支持台2)の両者を互いに運動動作させ、磁気研磨液4を攪拌状態にする。このとき、磁気研磨液4には、磁場発生源(永久磁石36)により磁場が作用し、試料1と研磨バイト3との間では、図3に示すように、磁束が生じて磁気研磨液4において磁気クラスタ12が生成する。   When the sample 1 is polished, first, the sample 1 is fixed to the support 2, the positional relationship of the sample 1 is initially set with respect to the upper polishing tool 3, and the magnetic polishing liquid 4 is supplied between the two. Start. Then, the drive motor 10 and the vibration table 8 are activated to cause both the polishing tool 3 and the sample 1 (support table 2) to move and move the magnetic polishing solution 4 in a stirring state. At this time, a magnetic field acts on the magnetic polishing liquid 4 by a magnetic field generation source (permanent magnet 36), and a magnetic flux is generated between the sample 1 and the polishing bit 3 as shown in FIG. A magnetic cluster 12 is generated in FIG.

つまり、研磨バイト3には永久磁石36を埋め込んであるので磁場が作用し、永久磁石36と試料1との間で磁束が生じ、強磁性粒子(例えば鉄粒子),マグネタイト粒子が磁気吸引力により多数が凝集して磁気クラスタ12となる。磁気クラスタ12は、磁束に沿うので試料1に対立して針状に多数が立ち並ぶことになる。磁気研磨液4においては、増粘剤として加えたαセルロース13が磁気クラスタ12の相互間に織り込み状態に位置を占め、さらに非磁性の砥粒14を加えてあるので、これは磁気クラスタ12に絡み込まれるものもあるが、当該液が攪拌状態にあるため多くは試料1の表面に存在することになる。したがって、針状に立ち並ぶ磁気クラスタ12および織り込み状態のαセルロース13とによって、磁気研磨液4の中に存在する砥粒14が試料1の表面に押さえつけられる。また、磁気クラスタ12およびαセルロース13に絡み込まれた砥粒14もあるので、それらも試料1の表面に押えつけられる。   That is, since the permanent magnet 36 is embedded in the polishing tool 3, a magnetic field acts, a magnetic flux is generated between the permanent magnet 36 and the sample 1, and ferromagnetic particles (for example, iron particles) and magnetite particles are attracted by magnetic attraction. Many aggregate to form magnetic clusters 12. Since the magnetic cluster 12 is along the magnetic flux, a large number of needles are arranged in opposition to the sample 1. In the magnetic polishing liquid 4, α-cellulose 13 added as a thickener occupies a position in a woven state between the magnetic clusters 12, and further, nonmagnetic abrasive grains 14 are added. Some are entangled, but many of them are present on the surface of the sample 1 because the liquid is in a stirred state. Therefore, the abrasive grains 14 present in the magnetic polishing liquid 4 are pressed against the surface of the sample 1 by the magnetic clusters 12 arranged in a needle shape and the α cellulose 13 in a woven state. In addition, since there are abrasive grains 14 entangled in the magnetic clusters 12 and α-cellulose 13, they are also pressed against the surface of the sample 1.

このような状態で研磨バイト3および試料1(支持台2)の両者が互いに運動動作することから、相対運動によって砥粒14は試料1の表面を接触しつつ運動し、このため試料1の表面の凸部を砥粒14が研削し、より平滑な表面が得られる。つまり、鏡面研磨が行える。   In this state, since both the polishing tool 3 and the sample 1 (support 2) move with each other, the abrasive grains 14 move while in contact with the surface of the sample 1 due to relative movement. The projections 14 are ground by the abrasive grains 14 to obtain a smoother surface. That is, mirror polishing can be performed.

磁場が定常的の場合、磁気クラスタ12は磁束に沿って整列して立ち並び、磁力により整列状態が保持されるので砥粒14が試料1の表面(研磨面)に適度に当たって研磨が行える。また、磁場が変動的の場合、磁気クラスタ12は揺れ動き、このときも砥粒14が研磨面に適度に当たり研磨が行える。このように、研磨バイト3は、試料1に対して見かけ上は有効な研削刃を持たないものの、磁気クラスタ12およびαセルロース13の押さえ作用により研磨することができ、流体研磨が行える。   When the magnetic field is stationary, the magnetic clusters 12 stand in line along the magnetic flux, and the alignment state is maintained by the magnetic force, so that the abrasive grains 14 can hit the surface (polishing surface) of the sample 1 appropriately to perform polishing. Further, when the magnetic field is fluctuating, the magnetic cluster 12 swings, and at this time, the abrasive grains 14 hit the polishing surface appropriately and can be polished. Thus, although the polishing tool 3 does not have an apparently effective grinding blade with respect to the sample 1, it can be polished by the pressing action of the magnetic cluster 12 and the α cellulose 13, and fluid polishing can be performed.

磁気研磨液4には増粘剤としてαセルロース13を含むので、添加した増粘剤は磁気クラスタ12を保持するように作用し、その結果、多数の砥粒14が試料1の表面に接触する状況を促進でき、研磨を高効率に行える。   Since the magnetic polishing liquid 4 contains α-cellulose 13 as a thickener, the added thickener acts to hold the magnetic cluster 12, and as a result, many abrasive grains 14 come into contact with the surface of the sample 1. The situation can be promoted and polishing can be performed with high efficiency.

ここで本発明に係る鏡面研磨によれば、研磨バイト3は遊星歯車機構に取り付けたので、自転と公転の2つの運動が行えるため、試料1の表面に対する移動が平均化する。このとき、支持台2についても平面上で8の字を描く軌跡で振動動作するので両者の相対運動が増し、このため研磨作用のばらつきを低減でき、表面全域に対して磁気クラスタ12により十分に研磨することができる。その結果、試料1の表面を鏡面に仕上げる研磨において、表面全域について平坦度を向上させて研磨することができ、平坦度の高い滑らかな平面が得られる。   Here, according to the mirror polishing according to the present invention, since the polishing bit 3 is attached to the planetary gear mechanism, two movements of rotation and revolution can be performed, so that movement relative to the surface of the sample 1 is averaged. At this time, since the support base 2 also vibrates along a trajectory that draws a figure of 8 on the plane, the relative movement between the two increases, so that variation in the polishing action can be reduced, and the magnetic cluster 12 can be sufficiently applied to the entire surface. Can be polished. As a result, in the polishing for finishing the surface of the sample 1 into a mirror surface, the entire surface can be polished with improved flatness, and a smooth flat surface with high flatness can be obtained.

そして、複数の研磨バイト3が試料1に対面する構成なので、それぞれにおいて磁気クラスタ12が研磨の作用を行うことになり、このため単位時間当たりの研磨作用の領域が広くなり、研磨速度が早くなる。したがって、平坦度を良好にし得る研磨を短時間で行える。もちろん、磁気クラスタ12による研磨なので試料1に大きな応力をかけることなく研磨が行える。   Since the plurality of polishing tools 3 face the sample 1, the magnetic cluster 12 performs the polishing action in each of them, so that the area of the polishing action per unit time is widened and the polishing speed is increased. . Therefore, polishing that can improve the flatness can be performed in a short time. Of course, since the polishing is performed by the magnetic cluster 12, the sample 1 can be polished without applying a large stress.

図1に示す鏡面研磨装置を用いて試料の研磨を行った。つまり、本発明の効果を実証するため、所定の研磨条件において試料の研磨を行い、その試料について表面粗さRa(算術平均粗さ),Ry(最大粗さ)を評価した。磁気研磨液は表1に示す組成とし、評価試験は従来方式の構成つまり1つの研磨バイトを単に回転する構成による研磨も行い、それを比較例とした。   The sample was polished using the mirror polishing apparatus shown in FIG. That is, in order to demonstrate the effect of the present invention, the sample was polished under predetermined polishing conditions, and the surface roughness Ra (arithmetic average roughness) and Ry (maximum roughness) were evaluated for the sample. The magnetic polishing liquid had the composition shown in Table 1, and the evaluation test was performed by a conventional method, that is, a polishing by simply rotating one polishing tool, which was used as a comparative example.

Figure 2007167968
Figure 2007167968

ここで、磁気研磨液はその組成に、非磁性の砥粒として粒子径0.05μmのアルミナを含み、さらに増粘剤としてαセルロースを含ませている。そして、試料は真鍮製で平板形状のものを用い、表2に示す諸条件により研磨を行っており、その結果、同表に合わせて示す表面粗さRa,Ryが得られた。

Figure 2007167968
Here, the magnetic polishing liquid contains, in its composition, alumina having a particle diameter of 0.05 μm as non-magnetic abrasive grains, and further contains α-cellulose as a thickener. The sample was made of brass and flat, and was polished under various conditions shown in Table 2. As a result, surface roughness Ra and Ry shown in the same table were obtained.
Figure 2007167968

すなわち、本発明に係る構成(遊星歯車式)では、磁場発生源である永久磁石36は直径10mmとし、表面の磁束密度240mTであり、従来方式の構成(回転式)においては永久磁石は直径8mmとし、表面の磁束密度は520mTとなっている。また、駆動モータ10の回転数は800rpmであり、研磨時間は1時間、振動台8は太陽歯車31の軸部との対立面において8の字の軌跡を描いて回り動く運動動作(振動)を行い、その振幅は10mmで毎分20回の振動とした。そして、表2に示す研磨後の表面粗さRa,Ryは、掃引長さが0.1mm〜1mmの範囲における値である。   That is, in the configuration according to the present invention (planetary gear type), the permanent magnet 36 as the magnetic field generation source has a diameter of 10 mm and the surface magnetic flux density is 240 mT. In the conventional configuration (rotary type), the permanent magnet has a diameter of 8 mm. The surface magnetic flux density is 520 mT. Further, the rotational speed of the drive motor 10 is 800 rpm, the polishing time is 1 hour, and the vibration table 8 performs a motion operation (vibration) that moves around an 8-shaped locus on the opposite side of the shaft of the sun gear 31. The amplitude was 10 mm and the vibration was 20 times per minute. The surface roughness Ra and Ry after polishing shown in Table 2 are values in the range where the sweep length is 0.1 mm to 1 mm.

その結果、表面粗さRa,Ryは、本発明では0.0066μm,0.048μmであり、これに対して比較例では0.009μm,0.092μmであって、最大粗さRyを略1/2に低減できており、平坦度を明らかに高くできる研磨が行えることを確認した。そして、比較例とは研磨時間が同一であるので研磨速度が速いと言え、本発明の有用性が確認できた。   As a result, the surface roughness Ra and Ry are 0.0066 μm and 0.048 μm in the present invention, whereas in the comparative example, they are 0.009 μm and 0.092 μm, and the maximum roughness Ry is approximately 1 / It was confirmed that polishing can be performed with a clearly increased flatness. Since the polishing time is the same as that of the comparative example, it can be said that the polishing rate is high, and the usefulness of the present invention was confirmed.

次に表3は、掃引長さを20mmとした評価試験における結果を示し、研磨の条件は表2に示すものと同一としてある。そして、図4は20mmの掃引における研磨波形を示し、(a)は本発明に係る研磨波形、(b)は従来方式による研磨波形である。

Figure 2007167968
Next, Table 3 shows the results of an evaluation test with a sweep length of 20 mm, and the polishing conditions are the same as those shown in Table 2. 4 shows a polishing waveform in a 20 mm sweep, (a) is a polishing waveform according to the present invention, and (b) is a polishing waveform according to a conventional method.
Figure 2007167968

掃引長さを20mmとした評価試験では、表3および図4に示すように、表面粗さRa,Ryは、本発明では0.157mm,1.04mmであり、これに対して比較例では0.702mm,3.30mmであって、最大粗さRyを略1/3に低減できており、平坦度を明らかに高くできる研磨が行えて、鏡面仕上げが良好に行えることを確認した。   In the evaluation test in which the sweep length is 20 mm, as shown in Table 3 and FIG. 4, the surface roughness Ra and Ry are 0.157 mm and 1.04 mm in the present invention, whereas they are 0 in the comparative example. It was confirmed that the maximum roughness Ry could be reduced to about 1/3, polishing that could clearly increase the flatness, and mirror finish could be performed satisfactorily.

このように、本発明に係る鏡面研磨によれば、研磨波形が滑らかであり表面粗さRa,Ryを十分に低い値ににでき、さらに研磨速度が速くなる。従って、平坦度が高く得られる研磨を短時間で行え、研磨対象の表面全域について充分な表面粗さに鏡面研磨が行える。   As described above, according to the mirror polishing according to the present invention, the polishing waveform is smooth, the surface roughness Ra, Ry can be set to a sufficiently low value, and the polishing rate is further increased. Therefore, polishing with high flatness can be performed in a short time, and mirror polishing can be performed with sufficient surface roughness over the entire surface to be polished.

本発明に係る鏡面研磨装置の好適な一実施の形態を示す構成図である。1 is a configuration diagram showing a preferred embodiment of a mirror polishing apparatus according to the present invention. 図1に示す研磨バイトを説明する断面図(a)および平面図(b)である。It is sectional drawing (a) and top view (b) explaining the grinding | polishing tool | tool shown in FIG. 磁気クラスタによる流体研磨を示す説明図である。It is explanatory drawing which shows the fluid grinding | polishing by a magnetic cluster. 表面粗さを示すグラフ図であり、(a)は本発明に係る研磨波形、(b)は従来方式による研磨波形である。It is a graph which shows surface roughness, (a) is the grinding | polishing waveform based on this invention, (b) is the grinding | polishing waveform by a conventional system.

符号の説明Explanation of symbols

1 研磨対象(試料)
2 支持台
3 研磨バイト
4 磁気研磨液
5 スプリングネジ
6 トラバース装置
7 基台
8 振動台
9 ロードセル
10 駆動モータ
11 チャック部
12 磁気クラスタ
13 αセルロース
14 砥粒
30 遊星歯車
31 太陽歯車
32 内歯車
33 キャリア
34 支持板
35 円柱体
36 永久磁石(磁場発生源)
1 Polishing target (sample)
2 Support table 3 Polishing tool 4 Magnetic polishing solution 5 Spring screw 6 Traverse device 7 Base 8 Vibration table 9 Load cell 10 Drive motor 11 Chuck part 12 Magnetic cluster 13 α cellulose 14 Abrasive grain 30 Planetary gear 31 Sun gear 32 Internal gear 33 Carrier 34 Support plate 35 Cylinder 36 Permanent magnet (magnetic field source)

Claims (4)

研磨対象に対して研磨バイトを対面させるとともに、これらの周辺に磁気研磨液を存在させて流体研磨を行う鏡面研磨方法であって、
前記研磨バイトは前記研磨対象との対面に磁場を発生する磁場発生源を設けるとともに、平面上での所定軌跡の運動動作となる駆動を行う第1駆動手段に連係し、前記研磨対象は平面上での所定軌跡の運動動作となる駆動を行う第2駆動手段に連係し、前記研磨バイトと前記研磨対象との間に前記磁気研磨液を存在させて当該磁気研磨液には非磁性の砥粒を混合しておき、前記第1駆動手段を起動して前記研磨バイトを平面上で所定軌跡の運動動作を行わせるとともに、前記第2駆動手段を起動して前記研磨対象についても平面上で所定軌跡の運動動作を行わせ、このとき前記磁場発生源により前記磁気研磨液に時間的に定常的あるいは変動的な磁場を加えて流体研磨を行うことを特徴とする鏡面研磨方法。
A polishing method in which a polishing tool is made to face a polishing object, and a fluid polishing is performed in the presence of a magnetic polishing liquid in the periphery of the polishing tool,
The polishing tool is provided with a magnetic field generation source that generates a magnetic field on the opposite side of the polishing object, and is linked to a first driving unit that performs a driving operation of a predetermined locus on the plane. The magnetic polishing liquid is linked between the polishing tool and the object to be polished, and the magnetic polishing liquid is non-magnetic abrasive grains. And the first driving means is activated to cause the polishing tool to move along a predetermined locus on the plane, and the second driving means is activated to determine the polishing object on the plane as well. A mirror polishing method characterized in that a moving motion of a locus is performed, and fluid polishing is performed by applying a stationary or fluctuating magnetic field in time to the magnetic polishing liquid by the magnetic field generation source.
研磨対象との対面に磁場発生源を有する研磨バイトと、当該研磨バイトに連係して平面上での所定軌跡の運動動作を行わせる第1駆動手段と、前記研磨対象に連係して平面上で所定軌跡の運動動作を行わせる第2駆動手段と、前記研磨バイトと前記研磨対象との狭間へ磁気研磨液を供給する供給手段とを備え、
前記磁気研磨液には非磁性の砥粒を混合しておき、前記供給手段を起動して前記研磨バイトと前記研磨対象との間に前記磁気研磨液を存在させ、前記第1駆動手段を起動して前記研磨バイトを平面上で所定軌跡の運動動作を行わせ、前記第2駆動手段を起動して前記研磨対象について平面上で所定軌跡の運動動作を行わせ、前記磁場発生源により前記磁気研磨液に時間的に定常的あるいは変動的な磁場を加えることを特徴とする鏡面研磨装置。
A polishing tool having a magnetic field generation source facing the object to be polished, first driving means for performing a motion operation of a predetermined locus on the plane in association with the polishing tool, and on a plane in association with the object to be polished Second driving means for performing a movement operation of a predetermined locus, and supply means for supplying a magnetic polishing liquid to a gap between the polishing bit and the object to be polished,
Nonmagnetic abrasive grains are mixed in the magnetic polishing liquid, the supply means is activated to cause the magnetic polishing liquid to exist between the polishing bit and the object to be polished, and the first driving means is activated. The polishing tool is moved in a predetermined locus on a plane, the second driving means is activated to move the polishing object in a predetermined locus on the plane, and the magnetic field generating source performs the magnetic movement. A mirror polishing apparatus, characterized in that a magnetic field that is constant or fluctuating in time is applied to a polishing liquid.
前記第1駆動手段は、太陽歯車の外側に複数の遊星歯車を噛み合わせるとともに、さらに外側に内歯車を噛み合わせてある遊星歯車機構を有し、それら遊星歯車の少なくとも1つに前記研磨バイトを取り付けし、前記太陽歯車を駆動源により駆動することにより前記研磨バイトには自転動作と公転動作とを行わせることを特徴とする請求項2に記載の鏡面研磨装置。   The first drive means has a planetary gear mechanism that meshes a plurality of planetary gears outside the sun gear and further meshes an internal gear on the outside, and the polishing tool is attached to at least one of the planetary gears. The mirror polishing apparatus according to claim 2, wherein the polishing tool is rotated and revolved by attaching and driving the sun gear by a driving source. 前記研磨バイトは前記遊星歯車のそれぞれに取り付け、前記太陽歯車を駆動源により駆動することにより前記研磨バイトには自転動作と公転動作とを行わせることを特徴とする請求項3に記載の鏡面研磨装置。   4. The mirror polishing according to claim 3, wherein the polishing tool is attached to each of the planetary gears, and the polishing tool is rotated and revolved by driving the sun gear with a driving source. apparatus.
JP2005364893A 2005-12-19 2005-12-19 Mirror polishing method and mirror polishing apparatus Withdrawn JP2007167968A (en)

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010214505A (en) * 2009-03-16 2010-09-30 Akita Prefectural Univ Method for increasing form restoring force of particle dispersion type mixture functional fluid using varied magnetic field and polishing method and polishing device using the same
WO2013172785A1 (en) * 2012-05-15 2013-11-21 Agency For Science, Technology And Research Surface Polishing Apparatus
CN104551995A (en) * 2015-01-26 2015-04-29 湖州师范学院 Hub polishing drive device
JP2015530422A (en) * 2012-07-18 2015-10-15 キューイーディー・テクノロジーズ・インターナショナル・インコーポレーテッド Magnetorheological fluid for ultra-smooth polishing
CN105598812A (en) * 2016-03-18 2016-05-25 叶绍月 Shaft part polishing mechanism with high flexibility and use method thereof
CN108214113A (en) * 2018-01-28 2018-06-29 吉林大学 A kind of permanent magnet is distant to manipulate vortex burnishing device and polishing method
CN111423929A (en) * 2020-03-05 2020-07-17 湖南大学 Nano-fluid magnetic grinding fluid and magnetic field auxiliary micro-lubricating system
CN113305650A (en) * 2021-06-17 2021-08-27 广东工业大学 Ultra-smooth planarization polishing method and device
CN114941136A (en) * 2022-07-21 2022-08-26 中北大学 A multifunctional deep hole tool passivation device and method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010214505A (en) * 2009-03-16 2010-09-30 Akita Prefectural Univ Method for increasing form restoring force of particle dispersion type mixture functional fluid using varied magnetic field and polishing method and polishing device using the same
WO2013172785A1 (en) * 2012-05-15 2013-11-21 Agency For Science, Technology And Research Surface Polishing Apparatus
JP2015530422A (en) * 2012-07-18 2015-10-15 キューイーディー・テクノロジーズ・インターナショナル・インコーポレーテッド Magnetorheological fluid for ultra-smooth polishing
CN104551995A (en) * 2015-01-26 2015-04-29 湖州师范学院 Hub polishing drive device
CN105598812A (en) * 2016-03-18 2016-05-25 叶绍月 Shaft part polishing mechanism with high flexibility and use method thereof
CN108214113A (en) * 2018-01-28 2018-06-29 吉林大学 A kind of permanent magnet is distant to manipulate vortex burnishing device and polishing method
CN111423929A (en) * 2020-03-05 2020-07-17 湖南大学 Nano-fluid magnetic grinding fluid and magnetic field auxiliary micro-lubricating system
CN113305650A (en) * 2021-06-17 2021-08-27 广东工业大学 Ultra-smooth planarization polishing method and device
CN114941136A (en) * 2022-07-21 2022-08-26 中北大学 A multifunctional deep hole tool passivation device and method

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