WO2006001395A1 - エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 - Google Patents
エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 Download PDFInfo
- Publication number
- WO2006001395A1 WO2006001395A1 PCT/JP2005/011670 JP2005011670W WO2006001395A1 WO 2006001395 A1 WO2006001395 A1 WO 2006001395A1 JP 2005011670 W JP2005011670 W JP 2005011670W WO 2006001395 A1 WO2006001395 A1 WO 2006001395A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- epoxy resin
- component
- phenol
- parts
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
- C08G59/08—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols from phenol-aldehyde condensates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
Definitions
- the present invention relates to an electrical / electronic component insulating material typified by high-reliability semiconductor encapsulation, and various electrical / electronic devices including a laminated board (printed wiring board) and CFRP (carbon fiber reinforced plastic).
- the present invention relates to an epoxy resin useful for a wide range of applications such as materials, molding materials, casting materials, laminate materials, paints, adhesives, resists, and optical materials, an epoxy resin composition containing the same, and a cured product thereof.
- Epoxy resin is generally cured with various curing agents, resulting in a cured product having excellent mechanical properties, water resistance, chemical resistance, heat resistance, electrical properties, and the like. It is used in a wide range of fields such as laminates, molding materials and casting materials.
- Epoxy resins generally used are liquids at room temperature and those having a soft point of about 50 to 100 ° C.
- epoxy resins and their cured products in the above fields have further improved various properties such as high purity, heat resistance, moisture resistance, adhesion, low dielectric properties, fast curing properties, flame retardancy, and high toughness.
- high purity, heat resistance, moisture resistance, adhesion, low dielectric properties, fast curing properties, flame retardancy, and high toughness There is a need for improvement.
- there is a strong demand for higher heat resistance, moisture resistance, and toughness due to the advancement of fields of use such as the electrical and electronics industry, automobiles, and aerospace.
- a problem in using epoxy resin is its storage stability.
- there are two methods of using epoxy resin a two-part type that is stored separately from the curing agent and mixed at the time of use, and a one-part type that is stored in a state mixed with the curing agent from the beginning.
- the one-pack type is more advantageous in terms of workability.
- the epoxy resin and the curing agent react gradually during storage, and the liquid composition has viscosity and the solid composition has fluidity. The problem that has changed is pointed out.
- cured products having high heat resistance tend to have low moisture resistance as a compensation.
- an epoxy resin a crystalline tetrafunctional epoxy resin, for example, an epoxy resin obtained by glycidylation of 1,1,2,2-tetrakis (4-hydroxyphenol) ethane has been reported (Patent Document 1). ).
- This epoxy resin has a melting point close to 180 ° C, and the epoxy resin composition containing this epoxy resin has excellent storage stability with little change over time even when left at 80 ° C for a long time, and its cured product. It has been reported that its heat resistance is high, but its physical properties such as adhesion and toughness are not sufficient.
- Patent Document 1 Japanese Patent Application Laid-Open No. 2004-43533
- the present invention relates to an epoxy resin having a high heat resistance in the cured product, and provides an epoxy resin having improved adhesion and toughness compared to conventional high heat-resistant epoxy resins. For the purpose.
- the present inventors completed the present invention as a result of intensive studies to develop an epoxy resin having the above-mentioned characteristics.
- each R independently represents a hydrogen atom, a hydrocarbon group having 1 to 15 carbon atoms or a trifluoromethyl group.
- component (b) is phenol aralkyl resin
- component (b) is a biphenyl type phenol aralkyl resin
- component (a) is 65 to 95% by weight and component (b) is 35 to 5% by weight with respect to the total amount of component (a) and component (b) is epino and lohydrin.
- An epoxy resin composition comprising the epoxy resin according to any one of the above (1) to (6) and a compound having an ethylenically unsaturated group,
- the epoxy resin of the present invention has superior heat resistance in cured products as compared with a highly heat-resistant epoxy resin obtained by glycidylation of phenol resin, which is a conventional condensate of darioxal and phenol. It is an epoxy resin with improved brittleness and water resistance. In addition, compared with ordinary epoxy resin, the glass transition point is improved and the coefficient of linear expansion is greatly reduced. Therefore, it can be said that the epoxy resin is excellent in heat resistance. Furthermore, the epoxy resin of the present invention can be made into a crystalline form, and the epoxy resin of the present invention can be thermally stabilized by dispersing it in a thermosetting resin composition or a light / thermosetting resin composition. An epoxy resin composition having excellent properties can be obtained. Therefore, the epoxy resin composition of the present invention is extremely useful for a wide range of applications such as electrical / electronic materials, molding materials, casting materials, laminated materials, paints, adhesives, resists, optical materials and the like.
- the crystalline epoxy resin of the present invention is a phenol condensate obtained by condensing darioxal and phenols, and the content of the compound of the formula (1) is 80% (according to gel permeation chromatography). Area%: High-performance liquid chromatography (274 nm) is preferred when more accurate measurement is desired) More than this, preferably 95% or more Phenolic condensates (a) and phenols other than (a), or It can be obtained by reacting the mixture of (b) with epihalohydrin and glycidyl.
- the mixing ratio of component (a) and component (b) is not particularly limited.
- the proportion force of component (a) in the mixture of component (a) and component (b) may be 60% by weight or more depending on the case, but usually 65% by weight or more 70% by weight or more is more preferable. 75% by weight or more is very preferable, especially 80% by weight (unless otherwise indicated,% is shown) and most preferable. Therefore, component (b) is 35% or less, preferably 25% or less, more preferably 20% or less, based on the total amount of component (a) and component (b).
- the upper limit of component (a) is not limited as long as the effect of the present invention is achieved, but it is usually 98% or less, more preferably 95% or less, still more preferably 92% or less, and the lower limit of component (b). Is the remaining force of component (a), preferably 2% or more, more preferably 5% or more, and even more preferably 8% or more.
- component (a) may be 5% or more, preferably 10% or more, more preferably 15% or more, and the upper limit is the same as described above.
- the lower limit of component (b) is the same as above, but the upper limit is, for example, 95% or less, more preferably 90% or less, and even more preferably 85% or less.
- each R independently represents a hydrogen atom, a halogen atom, a hydrocarbon group having 115 carbon atoms, or a trifluoromethyl group.
- the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
- the hydrocarbon group having 1 15 carbon atoms includes methyl group, ethyl group, n-propyl group, isopropyl group, cyclopropyl group, n-butyl group, sec-butyl group, tert-butyl group, isobutyl group, cyclohexane.
- aryl groups include a phenol group, a naphthyl group, and a tolyl group.
- R is not particularly limited, but the ortho position or the meta position of the hydroxyl group is independently taken.
- a method for synthesizing component (a) methods shown in Japanese Patent No. 2897850 and Japanese Patent No. 3381819 can be employed.
- the phenols other than (a) or the phenolic resin (b) is not particularly limited as long as it is a compound having a phenolic hydroxyl group.
- bisphenols bisphenolanol A, bisphenolanol F, Bisphenolol S, biphenol, bisphenolanol AD, etc.
- phenols phenol, alkyl-substituted phenol, aromatic-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene, dihydroxynaphthalene, etc.
- various aldehydes (formaldehyde, acetate aldehyde)
- component (b) is phenol aralkyl rosin.
- phenol aralkyl resins include a resin having a molecular structure bonded to phenols via an aromatic ring-carbon bond, an isopropylidene group, or an ethylidene group, specifically, a biphenyl type phenol.
- each R is independently a hydrogen atom, a hydrocarbon group having 1 to 15 carbon atoms, a trifluoromethyl group
- Ar is a phenyl group, a biphenyl group, a fluoro group, or a naphthyl group.
- M represents an integer of 1 to 4
- n represents an integer of 1 to 10, and the average number of repetitions is usually 0.5 to 4.5, preferably 1.0 to 3.0
- the compound of the formula (2) includes a phenol corresponding to the formula (2) and the following formula:
- X represents halogen, alkoxy, hydroxy
- Ar represents the same group as in the above formula (2)
- bis for example, bishalogenomethyl of phenyl, biphenyl, fluorenyl or naphthyl And bisalkoxymethyl, bishydroxymethyl, etc.
- the substitution position on the aryl group of the two substituted methyl groups is not particularly limited, but a substitution at the 4,4′-position on the aryl group, that is, a 4,4′-bis form is preferable.
- the halogen include fluorine, chlorine, bromine and iodine.
- the alkoxy group is not particularly limited as long as the above reaction is not hindered, and usually includes an alkoxy group of about C1 to C4.
- each R independently represents a hydrogen atom, a hydrocarbon group having 1 to 15 carbon atoms or a trifluoromethyl group.
- the hydrocarbon group having 1 to 15 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, cyclopropyl group, n-butyl group, sec-butyl group, tert butyl group, isobutyl group, cyclobutyl group, n Pentyl, isopentyl, neopentyl, tert pentyl, cyclopentyl, n-hexyl, isohexyl, cyclohexyl, n-heptyl, cycloheptyl, n-octyl And a chain or cyclic alkyl group such as a cyclooctyl group, an aryl group or an aryl group.
- aryl groups include phenyl, naphthyl, and tolyl groups.
- a hydrogen atom, a methyl group, an aryl group or a tert butyl group is preferable, and a hydrogen atom is particularly preferable.
- the substitution position of R is not particularly limited, but relative to the hydroxyl group The ortho or meta position is preferred.
- n represents an average value of 0 to 10, usually 0.5 to 4.5, preferably 1 to 3, and preferably 0 to 3.0 in some cases.
- Phenoral aralkyl rosin is also available on the market. Specifically, Mitsui Chemicals XLC series, Meiwa Kasei MEH-7851, Dainippon Ink & Chemicals CZ-236K, CZ-25 6A, CZ — 256C etc. It can also be synthesized by a conventional method or a method described in JP-A-63-238129. However, it is not limited to these. These may be used alone or in combination of two or more.
- the epoxy resin of the present invention comprises a mixture of component (a) and component (b) in the presence of an alkali metal hydroxide, and epihalohydrin such as epip mouth mohydrin, epichlorohydrin, and epipyhydrin. Can be obtained by glycidyl cocoon.
- the content of the compound of the formula (1) is preferably 80% (area% by gel permeation chromatography) or more, more preferably 90% or more, and still more preferably 95 It is preferable to use a high purity phenol condensate of at least% as a raw material.
- the component (a) and the component (b) are separately glycidylated and mixed into an epoxy resin mixture, the formula (1) in the component (a) As the proportion of the compound increases, the component (a) becomes more difficult to remove the solvent from the component (a), which tends to precipitate crystals when the reaction solvent is distilled off after the glycidylation reaction.
- the component (b) by mixing the component (b) and then glycidyl soaking, such a phenomenon can be removed smoothly and the epoxy resin of the present invention can be produced.
- the above advantages are also significant.
- the alkali metal hydroxide in the form of a solid or an aqueous solution thereof. Preferably it is a solid.
- the alkali metal hydroxide aqueous solution is continuously added to the reaction system, and water and epihalohydrin are distilled off continuously under reduced pressure or atmospheric pressure, and the distillate is separated.
- a method may be used in which the brine is removed and the epihalohydrin is continuously returned to the reaction system.
- the amount of alkali metal hydroxide used is usually 0.5 to 2.5 mol, preferably 0.9 to 2.5 mol, based on 1 mol of hydroxyl group in the mixture of component (a) and component (b). .
- a quaternary ammonium salt may be added as a catalyst. it can.
- the quaternary ammonium salt include CI-C4 alkyl ammonium halides which may have a phenol group as a substituent, such as tetramethyl ammonium chloride, tetramethyl ammonium chloride, trimethylbenzyl ammonium chloride, and the like.
- Etc. The amount of the quaternary ammonium salt used is usually 0.1 to 15 parts by weight, preferably 0.2 to part by weight of LO (hereinafter specifically noted) per 1 equivalent of hydroxyl group in the mixture of component ( a ) and component (b). Unless otherwise indicated, parts represent parts by weight).
- the amount of epino and rhohydrin to be used is usually 0.5 to 20 mol, preferably 0.7 to 12 mol, per 1 mol of hydroxyl group in the mixture of component (a) and component (b). In some cases, it may be about 0.7 to 10 moles.
- epichlorohydrin is industrially easy to use.
- the reaction may be carried out in a solvent in order to improve the fluidity of the mixture of the component (a) and the component (b).
- the solvent that can be used include alcohols and aprotic polar solvents.
- alcohols include alcohols such as methanol, ethanol, isopropyl alcohol, and n-butanol tert-butanol, preferably C1-C4 alcohol, more preferably C1-C3 alcohol.
- aprotic polar solvent examples include dimethyl sulfone, dimethyl sulfoxide, tetrahydrofuran, dioxane and the like.
- the amount used is usually 2 to 50% by weight, preferably 4 to 30% by weight, based on the amount of epino and rhohydrin.
- the amount of Rohidorin usually 5 to the amount of Rohidorin: LOO weight 0/0, is preferably 10 to 80 wt% (hereinafter, unless otherwise specified,% represents weight%) .
- the reaction temperature is usually 30 to 90 ° C, preferably 35 to 80 ° C, and the temperature may be constant or may be changed with time.
- the reaction time is usually 0.5 to: LO time, preferably 1 to 8 hours.
- reaction solution (A) After completion of the reaction, it is preferable to remove the salt produced by the reaction solution. Removal of the salt from the reaction solution can be usually performed by washing the reaction solution with water. In some cases, the reaction solution may be cooled to room temperature to precipitate a salt, and then the salt may be removed by filtration. Part of the used solvent is also removed during the washing process. The salt thus obtained was removed For convenience, the reaction solution is referred to as reaction solution (A).
- reaction solution (A) Powerful reaction product is taken out with no particular limitation, but it is preferably carried out by the following method (1) or (2).
- the reaction product if the amount of component (a) is small, for example, 75% or less, further 70% or less, more certainly 60%, relative to the total amount of component (a) and component (b).
- the reaction product is taken out in the form of grease when it is below.
- the amount of component (a) is large, for example, 75% or more, further 80% or more, etc., it can be taken out in the form of a greave according to the purpose. It can also be taken out as a crystalline powder.
- the reaction product is taken out as a residue by directly distilling the epihalohydrin, solvent, etc. from the reaction solution (A), and the reaction product containing a small amount of component (a) is obtained. It can be used when crystallization is difficult, or when the reaction product can be crystallized, but need to be taken out as crystals.
- reaction solution (A) is washed with water or without washing with water, epino, rhohydrin, solvent and the like are removed under heating and reduced pressure.
- the recovered epoxy resin is dissolved in a solvent such as toluene or methylisobutyl ketone, and alkali metal hydroxide such as sodium hydroxide or potassium hydroxide is dissolved.
- the reaction can be carried out by adding an aqueous solution of the substance to ensure ring closure.
- the amount of the alkali metal hydroxide used is usually 0.01 to 0.3 mol, preferably 0.05 to 0.2 mol, based on 1 mol of the hydroxyl group of the phenol resin used in the epoxy resin.
- the reaction temperature is usually 50 to 120 ° C, and the reaction time is usually 0.5 to 2 hours.
- the produced salt is removed by filtration, washing with water, etc., and then the solvent is removed from the oil layer to obtain the greave-like epoxy resin of the present invention.
- the solvent can be distilled off in accordance with the distillation of the unreacted epino, rhohydrin, solvent, etc., which is usually preferably carried out under a caro heat and reduced pressure.
- the target epoxy resin is crystallized from the reaction solution (A) .
- the amount of component (a) is large, for example, the component (a) and component (b) a) 70% or more
- the reaction product can be taken out in crystalline form.
- the melting point of the crystalline epoxy resin obtained in the present invention cannot be generally specified depending on the kind and blending amount of the component (b), but is approximately 80 to 170 ° C, preferably 110 to 170 ° C, more preferably 120 to It is a crystal of 165 ° C. When high melting point crystals are required, those having a melting point of 140-170 ° C are preferred.
- the term “poor solvent” means a solvent having an epoxy resin of the present invention having a solubility of 5% or less, preferably 1% or less, at 25 ° C.
- reaction solution (A) may also be added after the excess epino, lohydrin, etc. are distilled off or without distillation, and a water-soluble polar solvent is added to the reaction solution (A). Epic halohydrin and the like are removed, concentrated and cooled, and then an epoxy resin crystal is precipitated with water.
- Step 1 Add water-soluble polar solvent and remove excess epino and lohydrin
- reaction solution (A) may be added to the reaction solution (A) by adding a water-soluble polar solvent without distilling off or carrying out a part of the excess epihalohydrin or the like. Let's say. If necessary, before or after the addition of the solvent, preferably with heating under reduced pressure Concentrate to concentration.
- the concentration of the resin in the reaction solution is about 40 to 90% by weight, more preferably 50 to 80% by weight at ° C.
- water-soluble polar solvent examples include aprotic polar solvents such as dimethyl sulfoxide, N, N'-dimethylformamide, N-methylpyrrolidone, acetone, diglyme, and triglyme, methanol, ethanol, isopropanol, n-butanol, and t-butanol. And alcohols such as ethylene glycol and propylene glycol and propylene glycol and monomethylol ether. In this step, together with the water-soluble polar solvent described above, other solvents can be used together as necessary.
- aprotic polar solvents such as dimethyl sulfoxide, N, N'-dimethylformamide, N-methylpyrrolidone, acetone, diglyme, and triglyme, methanol, ethanol, isopropanol, n-butanol, and t-butanol.
- alcohols such as ethylene glycol and propylene glycol and propylene glyco
- Solvents that can be used in combination include ester-based organic solvents such as ethyl acetate, butyl acetate, and butyl lactate, preferably C1-C4 organic acids, more preferably C1-C4 alcohol esters of C2-C3 organic acids, methyl isobutyl ketone, methyl
- Examples include ketone organic solvents such as ethyl ketone, methyl isobutyl ketone and cyclohexanone, and aromatic organic solvents such as toluene and xylene.
- ester-based organic solvents such as ethyl acetate, butyl acetate, and butyl lactate
- C1-C4 organic acids more preferably C1-C4 alcohol esters of C2-C3 organic acids
- methyl isobutyl ketone methyl
- Examples include ketone organic solvents such as ethyl ketone, methyl isobutyl ketone and cyclohexan
- the amount of the water-soluble polar solvent used is 20 to 500% by weight, preferably 50 to 300% by weight, based on the theoretical yield. When another solvent is used in combination, it may be used in an appropriate amount as necessary.
- the water-soluble polar solvent a high boiling point solvent (HBS) is preferable.
- the high boiling point solvent means a solvent having a higher boiling point than that of epino or rhohydrin used in excess as a raw material, and is preferably 30 ° C or higher than the boiling point of epino or lohydrin used as a raw material.
- epichlorohydrin boiling point 116 ° C
- a solvent having a boiling point 30 ° C or higher is preferably used, and N-methylpyrrolidone (202.
- Amide compounds such as dimethylformamide (boiling point 153 ° C), dimethylacetamide (boiling point 165.5 ° C), diglyme (162 ° C), triglyme (216 ° C), tetraglyme (275 ° C) And ethers such as C), ketones such as anone, and dimethyl sulfoxide (boiling point 189 ° C.).
- HBS dimethylformamide
- dimethylacetamide bisoiling point 165.5 ° C
- triglyme 216 ° C
- tetraglyme 275 ° C
- ethers such as C
- ketones such as anone
- dimethyl sulfoxide (boiling point 189 ° C.).
- the range of heating and decompression varies depending on the solvent used-the range cannot generally be specified, but the degree of decompression is usually about 0. OlMPa to about 1.
- IMPa about 50 to 140 ° C, preferably 50 to 110 °.
- epihalohydrin be removed as much as possible at this point in time because it is not preferable that the epihalohydrin remains in the product.
- Precipitation of crystals of the reaction product obtained in the above can be carried out by adding water to the obtained solution.
- the amount of water added is not a problem even if it is large, it is preferably about 50 to 150% of the amount of water-soluble polar solvent used from the viewpoint of waste liquid treatment.
- the temperature of the water used is 0 to 70 ° C, preferably 15 to 50 ° C. Care must be taken as too hot water can cause fusion of dispersed crystals.
- the particle shape can be adjusted by the temperature of the water.
- the average particle size is usually about 5 to 300 microns. It is possible to adjust the particle size to 500 microns or more by changing the combination of the temperature of water and the water-soluble polar solvent used. Considering filterability and drying properties, it is preferable to adjust to about 20 to 250 micron.
- the desired epoxy resin crystals are removed by filtration. At this time, in order to further increase the purity, it is preferable to wash with an organic solvent such as methanol and ethanol, and further with water.
- the desired epoxy rosin crystal powder can be obtained by drying the obtained crystals.
- Step 1 Crystal precipitation in a poor solvent
- the reaction solution (A) may be added with a poor solvent, preferably a solvent that azeotropes with the used epino or rhohydrin (hereinafter also simply referred to as an azeotropic solvent) to precipitate crystals.
- a poor solvent preferably a solvent that azeotropes with the used epino or rhohydrin (hereinafter also simply referred to as an azeotropic solvent) to precipitate crystals.
- a part of the epino, rhohydrin and the like that have excessive reaction liquid power may be distilled off to increase the concentration of the epoxy resin so that crystals are easily precipitated.
- a part of the epoxy resin may be precipitated as crystals in the reaction solution. Distilling off excess epihalohydrin or the like is preferably carried out under reduced pressure and, if necessary, with heating.
- the conditions at this time are not particularly limited, but the degree of decompression is 0. OlMPa to 1 0. IMPa is preferred.
- the temperature at that time is 40 ° C or higher, 140 ° C or lower, especially 100 ° C or lower. preferable.
- the concentration of the epoxy resin after the distillation is preferably 40 to 90%, more preferably 50 to 80%.
- the crystalline epoxy resin of the present invention is difficult to dissolve and is not particularly limited.
- water, methanol, ethanol, isopropanol, n- Alcohols such as butanol, t-butanol, ethylene glycol, propylene glycol, propylene glycol monomethyl ether, water, and ester organic solvents such as ethyl acetate, butyl acetate, butyl lactate, acetone, methyl ethyl
- ester organic solvents such as ethyl acetate, butyl acetate, butyl lactate, acetone, methyl ethyl
- ketone-based organic solvents such as ketone and methylisobutyl ketone. These can be used alone or in combination.
- the crystallization in step 1 may be performed with a solvent other than the above.
- Solvents that can be used in combination are shown below, but some of them overlap with the above poor solvents because the solubility in the solvent varies depending on the epoxy resin skeleton.
- Aprotic polar solvent dimethyl sulfoxide, N, N, dimethylformamide, tetrahydrofuran, N-methylpyrrolidone, diglyme, triglyme, etc.
- Ester organic solvents Ethyl acetate, butyl acetate, butyl lactate, etc.
- Ketone-based organic solvents methyl isobutyl ketone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.
- Aromatic organic solvents toluene, xylene, etc.
- the amount of the poor solvent to be added is 20 to 500% by weight, preferably 50 to 300% by weight, based on the theoretical yield.
- the amount used is preferred, as it does not adversely affect the yield of crystals precipitated in the poor solvent.
- a solvent that azeotropes with epihalohydrin is preferable. That is, water, alcohols, and aromatic solvents. These azeotropic solvents can be found in, for example, Pocket Book, Organic Synthetic Chemistry Association Ohm Co.
- Step 2 Distill off the solvents
- the solvent is preferably distilled off under reduced pressure by heating, and the temperature is not particularly limited as long as it does not melt the precipitated epoxy resin crystal.
- a temperature that is 10 ° C. or more lower than the melting point of the epoxy resin is preferable.
- the degree of decompression is preferably ⁇ 0. OlMPa to 1 ⁇ 0. IMPa.
- the drying temperature is not particularly limited as long as it is a temperature at which the crystals do not melt and can be dried, and preferably the temperature obtained by subtracting 100 ° C from the melting point of the obtained crystalline epoxy resin to the crystalline epoxy resin.
- the temperature is in the range of 10 ° C minus the melting point.
- the drying time is usually 1 hour to 36 hours, more preferably 2 to 24 hours.
- the resin-like or crystalline epoxy resin obtained as described above can be used as an epoxy resin composition containing a curing agent together with other epoxy resins as necessary.
- a cured product having heat resistance can be obtained from the epoxy resin composition, and it can be used for various applications described later.
- the epoxy resin of the present invention preferably crystalline epoxy resin, may be used together with a photopolymerization initiator and a compound having an ethylenically unsaturated group to form a photosensitive resin composition. I can do it.
- the epoxy resin composition of the present invention will be described.
- the epoxy resin of the present invention can be used alone or in combination with other epoxy resins.
- the mixing ratio of each epoxy resin can be arbitrarily changed.
- other epoxy resins can be changed in the range of about 0 to 500 parts, usually about 0 to 300 parts.
- 100 parts of the epoxy resin of the present invention is about 10 to 200 parts, preferably about 20 to 150 parts, more preferably about 30 to 120 parts of other epoxy resins. Can be used in a range.
- the ratio of the epoxy resin of the present invention in the epoxy resin composition of the present invention can be widely used, for example, 1 to 98%, preferably about 3 to 95%, and about 5 to 90%.
- the remainder is a curing agent and other additives that are added as necessary, such as other epoxy resins, solvents, and other additives.
- Phenols aromatic substituted phenols, naphthols, alkyl-substituted naphthols, dihydroxybenzenes, alkyl-substituted dihydroxybenzenes, dihydroxynaphthalene, etc.
- aldehydes formaldehyde, acetoaldehyde, alkyl aldehydes, benzaldehydes, alkyl-substituted benzaldehydes, hydroxybenzaldehydes
- Naphthaldehyde glutaraldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde, etc.
- phenols and various gen compounds Polymers with dicyclopentagen, terpenes, burcyclohexene, norbornagen, burnorbornene, tetrahydroindene, dibutenebenzene, divinyl biphenyl, diisopropyl bi
- the epoxy resin used in combination is preferably a crystalline epoxy resin having a soft point of 90 ° C or higher! /, which has a melting point. Even if two or more types are used together, it does not work.
- bixylenol-type or biphenol-type crystalline epoxy resin or a mixture thereof such as YX-4000 manufactured by Japan Epoxy Resin Co., Ltd. or CER-3000 manufactured by Nippon Kayaku Co., Ltd.
- the epoxy resin composition of the present invention contains a curing agent.
- the curing agent include the following curing agents (a) to (e) such as an amine compound, an acid anhydride compound, an amide compound, and a phenol compound.
- amine compounds include diaminodiphenylmethane, diethylenetriamine, triethylenetetramine, diaminodiphenylsulfone, and isophoronediamine.
- acid anhydride compounds include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methyl nadic anhydride, hexahydrophthalic anhydride. Acid, methylhexahydrophthalic anhydride, etc.
- amide-based compounds include dicyandiamide or polyamide resin synthesized from dimer of linolenic acid and ethylenediamine,
- (d) phenolic compounds examples include:
- phenols eg, phenol, alkyl-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, dihydroxynaphthalene, etc.
- aldehydes formaldehyde, acetoaldehyde, benzaldehyde, p-hydroxybenzaldehyde, o-hydroxybenzaldehyde, Furfural, etc.
- ketones p-hydroxyacetophenone, o-hydroxyacetophenone, etc.
- phenolic resins obtained by condensation with gens such as dicyclopentagen, tricyclopentagen, etc.
- the amount of the curing agent used is 0.5 to 2.0 equivalent force relative to 1 equivalent of epoxy group of epoxy resin, and 0.6 to 1 5 equivalents are particularly preferred.
- the epoxy resin composition of the present invention may also contain a curing accelerator.
- curing accelerators that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole, 2-phenolimidazole, 2-ethyl-4-methylimidazole, 2- (dimethylaminomethyl) phenol, triethylenediethylene.
- the amount used is 0.01 to 15 parts by weight based on 100 parts by weight of the epoxy resin, if necessary.
- the epoxy resin composition of the present invention may be added with various compounding agents such as an inorganic filler, a silane coupling agent, a release agent, and a pigment, and various thermosetting resins as necessary.
- inorganic fillers include crystalline silica, fused silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, silicon nitride, boron nitride, zircoyu, fosterite, steatite, spinel, titer, talc, etc.
- the force including, but not limited to, powders of the above or beads formed by spheroidizing them. These may be used alone or in combination of two or more.
- these inorganic fillers are particularly preferable in the epoxy resin composition in terms of heat resistance, moisture resistance, mechanical properties, etc. of the cured product when an epoxy resin composition for a semiconductor encapsulant is obtained. It is preferably used in a proportion of ⁇ 93%.
- the balance is the epoxy resin of the present invention, a curing agent, and other additives that are added as necessary, and the other additives include other epoxy resins and curing accelerators.
- the epoxy resin of the present invention is 1 to 19%, preferably about 2 to 18%, more preferably about 3 to 18%.
- the balance 1 to 9%, preferably 2 to 7% is a curing agent and other additives added as required.
- the epoxy resin composition of the present invention can be obtained by uniformly mixing the above components, and is preferably used for semiconductor encapsulation.
- the epoxy resin composition of the present invention can be easily made into a cured product by a method similar to a conventionally known method.
- the epoxy resin of the present invention and a curing agent, and if necessary, a curing accelerator and an inorganic filler, a compounding agent, and various thermosetting resins can be uniformly used using an extruder, kneader, roll, etc.
- the epoxy resin composition of the present invention is obtained by thoroughly mixing until it becomes, and the epoxy resin composition is molded by a melt casting method, a transfer molding method, an injection molding method, a compression molding method, etc.
- the cured product of the present invention can be obtained by heating at a melting point or higher and 2 to LO time.
- the epoxy resin composition of the present invention can also be a varnish containing a solvent.
- This varnish is prepared by dissolving or uniformly mixing a composition containing the epoxy resin of the present invention, a curing agent and other additives as required in an organic solvent such as toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone. It can be obtained by dispersing.
- the amount of the solvent is usually 10 to 70%, preferably 15 to 65% with respect to the whole varnish.
- the epoxy resin of the present invention is 10 to 70% in the varnish, preferably about 20 to 50%, and the balance is a curing agent and other additives as required.
- the varnish of the present invention may be a varnish containing an inorganic filler by further adding an inorganic filler to a solution containing the epoxy resin of the present invention, a curing agent, and if necessary, other additives and a solvent.
- a prepreg can be obtained by impregnating a base material such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber or paper with the varnish of the present invention obtained as described above, followed by drying by heating.
- a cured product can also be obtained by hot press molding the pre-preda.
- a preferred application of the epoxy resin composition of the present invention is a sealant material for a semiconductor device.
- DIP Dual Inline Package
- QFP Quad Flat Package
- BGA Bit Grid Array
- CSP Chip Size Package
- SOP Small Outline Package
- TSOP Thin Small Outline
- TQFP inink-and-flat package
- the epoxy resin of the present invention is excellent in light transmittance with little coloring, it can be used for an optical semiconductor sealing device. In this optical semiconductor field, it can be suitably used for sealing optical semiconductor elements (semiconductor chips) such as light emitting diodes (LEDs), phototransistors, CCDs (charge coupled devices), and EPROMs such as UV-EPROMs.
- LEDs light emitting diodes
- CCDs charge coupled devices
- EPROMs such as UV-EPROMs.
- photocurable resin composition (photosensitive resin composition) containing the epoxy resin of the present invention, preferably a photothermosetting resin composition, will be described.
- the epoxy resin of the present invention can be used as a curing agent for improving the reliability of a photosensitive resin composition, preferably a photothermosetting resin composition.
- the epoxy resin of the present invention is preferably a crystalline epoxy resin.
- the photosensitive resin composition of the present invention contains at least the epoxy resin of the present invention and a compound having an ethylenically unsaturated group and has little heat denaturation and the like, and has a high performance semiconductor sealing agent and the like.
- the preferred photosensitive resin composition is the epoxy resin of the present invention.
- the photosensitive resin composition is obtained by uniformly mixing the aqueous alkali solution soluble resin (A), the crosslinking agent (B), the photopolymerization initiator (C) and the epoxy resin of the present invention by a conventional method. I can do it.
- the photosensitive resin composition may contain the inorganic filler or the like as necessary.
- a thermosetting catalyst is included.
- the photosensitive resin composition contains the epoxy resin of the present invention, a photopolymerization initiator and a compound having an ethylenically unsaturated group.
- the content of each component is 20 to 80% of the epoxy resin of the present invention, 10 to 70% of the photopolymerization initiator and 10% of the compound having an ethylenically unsaturated group, based on the total of the three components. ⁇ 70%.
- the photosensitive resin composition is a photosensitive resin containing the epoxy resin of the present invention, an aqueous alkali-soluble resin (A), a crosslinking agent (B), and a photopolymerization initiator (C). It is a composition.
- the content ratio of each of these four parties is 5 to 60%, preferably 5 to 40%, more preferably 10 to 30% of the epoxy resin of the present invention based on the total of these four parties.
- Alkaline aqueous solution soluble resin (A) 35-80%, preferably 40-75%, crosslinking agent (B) 3-30%, preferably 5-20%, photopolymerization initiator 2-30%, preferably In the range of 4 to 15%, the total of the four is 100%.
- the composition may further contain an inorganic filler, a solvent and the like.
- the photosensitive resin composition contains a thermosetting catalyst in addition to the above four components.
- the thermosetting catalyst is in a proportion of 0.3 to 5%, preferably 0.5 to 3% with respect to the total of the above four components.
- the content of the epoxy resin of the present invention is usually 1 to 50% by weight, preferably 2 to 30% by weight.
- the epoxy resin used in the photosensitive resin composition of the present invention is preferably in the crystalline form, and particularly preferably has a melting point of 140 ° C to 170 ° C.
- the photopolymerization initiator will be described in the section of the photopolymerization initiator (C) described later.
- the compound having an ethylenically unsaturated group is not particularly limited, but a compound having a (meth) acrylic group (meaning an acrylic group or a methacrylic group) is preferred. These compounds are disclosed in Japanese Patent Application Laid-Open No. 2004-155916 and the like as aqueous alkali soluble resins and crosslinking agents, and are known.
- the term “(meth) acryl” means acryl or methacryl)
- Aqueous alkali-soluble soluble fat (A) Aqueous alkali-soluble soluble fat (A);
- Any coagulant that can be dissolved and removed with an aqueous alkaline solution can be used without particular limitation, and any conventionally known aqueous alkaline solution-soluble coagulant can be used.
- an epoxy carboxylate compound obtained by reacting an epoxy compound ( a ) having two or more epoxy groups in the molecule with a monocarboxylic acid compound (b) having an ethylenically unsaturated group in the molecule.
- KAYARAD CCR-1159H KAYARAD PCR-1169H
- KAYARAD TCR-1310H KAYARAD ZFR-11401H
- KAYARAD ZAR-1395H all manufactured by Nippon Gyaku Co., Ltd.
- cross-linking agent (B) [0052] cross-linking agent (B);
- the (meth) acrylate having the (meth) acrylic group and other functional groups is preferred, which is preferably a polyfunctional compound having an ethylenically unsaturated group.
- Specific examples include KAYARAD HX-220, KAYARAD HX-620, KAYA RAD DPHA, KAYARAD DPCA-60 (V, deviation is made by Nippon Kayaku Co., Ltd.).
- any conventionally known photopolymerization initiator known in the art can be used.
- examples include benzoins, acetophenones, anthraquinones, thixanthones, ketals, benzophenones, and phosphine oxides.
- KAYACURE DETX-S manufactured by Nippon Gyaku Co., Ltd.
- Irgacure 907 Irga Specialty Chemical
- various additives such as fillers such as talc, barium sulfate, aluminum hydroxide, aluminum oxide, silica, clay, preferably inorganic fillers, aerosols, etc.
- Thixotropic agent coloring agent such as phthalocyanine blue, phthalocyanine green, titanium oxide, silicone, fluorine-based leveling agent or antifoaming agent; polymerization inhibitor such as hydroquinone, rhodium, idroquinone monomethyl ether, etc. It can be added for the purpose of improving various performances.
- the amount of the filler used is more preferably the photosensitive resin composition including the above four (epoxy resin of the present invention, alkaline aqueous solution-soluble resin (A), crosslinking agent (B), photopolymerization initiator (C)). In the product, it is about 0 to 100%, preferably about 0 to 60% with respect to the total of these four parties.
- the photosensitive resin composition of the present invention may contain a solvent if necessary.
- solvents include, for example, ketones such as acetone, ethylmethyl ketone, and cyclohexanone, aromatic hydrocarbons such as benzene, toluene, xylene, and tetramethylbenzene, and ethylene glycolo-resin methylenoateol.
- Glycol ethers such as ethyleneglycol lectino enoate, dipropylene glycol dimethyl ether, dipropylene glycol dimethyl ether, triethylene glycol dimethyl ether, triethylene glycol dimethyl ether, ethyl acetate, butyl acetate, methyl solvate acetate Ethyl cellosolve acetate, butylcetosolve acetate, carbitol acetate, propylene glycol monomethyl ether acetate, dialkyl glutarate, dialkyl succinate,
- esters such as dialkyl phosphates, cyclic esters such as ⁇ -butyrolatatone
- petroleum solvents such as petroleum ether, petroleum naphtha, hydrogenated petroleum naphtha, and solvent naphtha, which may be used alone. 2 or more types may be used in combination.
- the amount of the solvent used is more preferably the photosensitive resin composition including the above four (epoxy resin of the present invention, aqueous alkaline resin soluble resin ( ⁇ ), crosslinking agent ( ⁇ ), photopolymerization initiator (C))). In this respect, it is 0 to 50%, preferably 0 to 20%, based on the total of these four persons.
- the epoxy resin composition of the present invention is useful as a resist material such as an insulating material between layers of electronic components, an optical waveguide connecting optical components, a solder resist for printed circuit boards, a coverlay, etc. It can also be used as a color filter, printing ink, sealant, paint, coating agent, adhesive, etc.
- the photosensitive resin composition of the present invention can be cured by irradiation with energy rays such as ultraviolet rays and by a heating operation. Curing by irradiation with energy rays such as ultraviolet rays can be performed by a conventional method.
- an ultraviolet ray generator such as a low pressure mercury lamp, a high pressure mercury lamp, an ultra high pressure mercury lamp, a xenon lamp, an ultraviolet light emitting laser (excimer laser, etc.) may be used.
- the cured product of the present invention can be obtained by further irradiating with ultraviolet rays as necessary, followed by heat treatment usually at a temperature of 100 to 20 ° C, preferably 140 to 180 ° C.
- the cured product of the epoxy resin composition of the present invention includes, for example, a resist film, an interlayer insulating material for a build-up method, an optical waveguide such as a printed wiring board, an optoelectronic substrate and an optical substrate. Used for materials. Specific articles using these include, for example, computers, home appliances, and portable devices.
- a printed wiring board is produced using, for example, a photothermosetting photosensitive resin composition
- a screen printing method a spray method
- a mouthpiece is applied to the printed wiring board.
- the photosensitive resin composition of the present invention is applied at a film thickness of 0.5 to 160 / ⁇ ⁇ by a method such as a coat coating method, an electrostatic coating method, or a curtain coating method, and the coating film is usually 50 to 110 ° C, Preferably, the coating film is formed by drying at 60 to 100 ° C.
- the high Engineering Nerugi clear distinction such as an ultraviolet ray was irradiated at normal 10 ⁇ 2000MiZcm 2 medium strong directly or indirectly to the coating film through a photo mask formed with exposure patterns, such as negative film, described later unexposed portions Development is performed using a developer, for example, by spraying, rocking immersion, brushing, scraping, or the like.
- further UV irradiation is performed, and then heat treatment is usually performed at a temperature of 100 to 200 ° C, preferably 140 to 180 ° C, so that it has excellent gold plating properties, heat resistance, solvent resistance,
- a printed wiring board having a permanent protective film that satisfies various properties such as acid resistance, adhesion, and flexibility can be obtained.
- Examples of the alkaline aqueous solution used in the development include potassium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium phosphate, potassium phosphate, and the like.
- Inorganic alkaline aqueous solutions such as tetramethylammonium humide, tetraethylammonium hydride, tetraptylammoum hydride oxide, monoethanolamine, diethanolamine, triethanolamine, etc.
- An alkaline aqueous solution can be used.
- TEP-DF biphenyl type phenol aralkyl resin
- the crystal was sufficiently washed with 200 parts of methanol and further 200 parts of water, and dried, whereby the epoxy resin (EP2) of the present invention (epoxy equivalent 179 gZeq. Melting point 161 ° C) was white to light yellow powdery crystal. As a result, 140 parts were obtained.
- Example 2 the amount of use of the condensate of Darioquizal and phenol (TEP—DF Asahi Organic Materials Co., Ltd.) is 80 parts, and the amount of bi-type phenol alcohol slag is used.
- the epoxy resin of the present invention (EP3) was prepared in the same manner as in Example 2, except that 20 parts of epichlorohydrin was used in an amount of 425 parts and flaky sodium hydroxide was used in an amount of 35 parts. ) (Epoxy equivalent 182 gZeq. Melting point 149 ° C.) was obtained as white to pale yellow powdery crystals.
- Example 2 the use amount of the condensate of Darioquizal and phenol (TEP—DF Asahi Organic Materials Co., Ltd.) was 90 parts, and biphenol type phenol aralkyl resin was added to phenol and p-key.
- a phenol-type phenol aralkyl resin that is a condensate with silenol (Ar in formula (2) is a phenol group, R is a hydrogen atom, n l.
- Example 5 [0066] In Example 2, the amount of Darioxar and phenol condensate (TEP—DF Asahi Organic Materials Co., Ltd.) used was 90 parts, and biphenol type phenol aralkyl resin was added to phenol novolac ( ( Maywa Kasei Kogyo Co., Ltd., softening point: 83 ° C, hydroxyl group equivalent: 106 gZeq.), 455 parts of epichlorohydrin and 40 parts of flaky sodium hydroxide were used. Thus, 147 parts of the epoxy resin (EP5) of the present invention (epoxy equivalent 172 g / eq. Melting point 159 ° C.) was obtained as white powdery crystals.
- TEP5 Darioxar and phenol condensate
- Example 2 the use amount of the condensate of Darioquizal and phenol (TEP—DF Asahi Organic Materials Co., Ltd.) was 90 parts, biphenol type phenol aralkyl resin was added to bisphenol F,
- the epoxy resin (EP6) of the present invention (epoxy equivalent 172 g / eq) was obtained in the same manner as in Example 2 except that 460 parts of epichlorohydrin and 40 parts of flaky sodium hydroxide were used. 144 parts were obtained as white powdery crystals.
- Example 2 the amount of the condensate of Darioquizal and phenol (TEP—DF Asahi Organic Materials Co., Ltd.) used was 90 parts, biphenol type phenol aralkyl resin was added to bisphenol S,
- the epoxy resin (EP7) of the present invention (epoxy equivalent 179 g / eq) was used in the same manner as Example 2 except that 455 parts of epichlorohydrin and 39 parts of flaky sodium hydroxide were used. 144 parts were obtained as white powdery crystals.
- a nitrogen gas purge was applied to the flask equipped with a thermometer, dropping funnel, condenser, and stirrer. While adding 99.5 parts of a condensate of glyoxal and phenol, 460 parts of epichlorohydrin, and 100 parts of methanol, the mixture was heated to about 70 ° C with stirring and dissolved. Next, 40 parts of flaky sodium hydroxide was added in portions over 90 minutes, and then further reacted at reflux temperature for 1 hour.
- the epoxy resin (EP1) obtained in Example 1 (Example 8) or the epoxy resin (EP8) (Comparative Example 3) obtained in Comparative Example 1 was used as the epoxy resin, and phenol nopolac as a curing agent. (Soft softening point 83 ° C, hydroxyl group equivalent 106gZeq), using triphenylphosphine (TPP) as a curing accelerator at the weight ratio shown in the ⁇ Composition composition '' column of Table 1, transfer molding Thus, a resin molded body was prepared and cured at 160 ° C. for 2 hours and further at 180 ° C. for 8 hours.
- TPP triphenylphosphine
- Table 1 shows the results of measuring the physical properties of the cured product thus obtained.
- the physical property values were measured by the following methods.
- TMA Glass transition temperature
- K1C The method described in JIS K-6911.
- Epoxy resin (E P 8) 1 0 0 Phenolic nopolac 5 9 6 3 T P P 1. 0 1. 0
- Example 8 Comparative example 3 Glass transition point (° C) 1 9 0 1 9 8 Water absorption (%) 1. 2 1. 9
- Example 10 Comparative Example 5 Glass transition point (° C) 1 99 205
- the epoxy resin composition containing the crystalline epoxy resin of the present invention has high storage stability.
- the resulting cured epoxy resin is greatly improved in toughness and adhesion compared to the conventional tetrafunctional epoxy resin.
- the cured product of the epoxy resin composition containing the crystalline epoxy resin of the present invention includes insulating materials for electrical / electronic parts, laminated boards (printed wiring boards, etc.), various composite materials including CFRP, and adhesives. It is extremely useful when used in paints, resist materials, etc.
- Example 2 Using the epoxy resin obtained in Example 2 (EP2) (Example 11) or the epoxy resin (EP9) obtained in Comparative Example 2 (Comparative Example 6), mixing at the blending ratio shown in Table 4, 3 It knead
- This was applied to a printed circuit board of about 10 cm square by a screen printing method so that the dry film thickness was 15 to 25 m, and the coating film was dried with a hot air dryer at 80 ° C. for 30 minutes.
- ultraviolet rays were irradiated through a mask on which a circuit pattern was drawn using an ultraviolet ray exposure apparatus (Oak Manufacturing Co., Ltd., model HMW-680GW).
- Tackiness Absorbent cotton was rubbed onto the dried film applied to the substrate, and the tackiness of the film was evaluated.
- Thermal stability The developability was evaluated when the drying time at 80 ° C was 30, 40, and 50 minutes, and the following evaluation criteria were used. At the time of development, the ink was completely removed, and the evaluation was performed based on the time when the development was possible.
- photosensitivity the coating film after drying, are brought into close contact with 21 step tablet (manufactured by Kodak) for irradiating exposed to ultraviolet rays of the integrated light quantity 500miZcm 2. Next, develop with a 1% sodium carbonate solution for 60 seconds at a spray pressure of 2. OkgZcm 2 , and check the number of coating layers remaining without development.
- Adhesion 100 mm lmm grids were made on the test piece, and a peeling test (JIS K 5600-5-6) was performed using a cellophane tape (R), and the resist mass in close contact with the test piece was evaluated. The following criteria were used to describe the results.
- Heat resistance A rosin flux was applied to the test piece and immersed in a solder bath at 260 ° C for 5 seconds. This was one cycle and repeated three cycles. After being allowed to cool to room temperature, a peeling test with Cellotape TM was performed and evaluated according to the following criteria.
- Example 2 the condensate of Darioquizal and phenol (TEP—DF Asahi Organic Materials Co., Ltd.) was used in an amount of 80 parts, and biphenol type phenol aralkyl resin was added to orthocresol novolak (soft). (Equipment point 81 ° C) The same procedure as in Example 2 was repeated except that 20 parts, 455 parts of epichlorohydrin, and 38 parts of flaky sodium hydroxide were used. 137 parts of fat (epoxy equivalent 180gZeq. Melting point 145 ° C) were obtained as white powdery crystals.
- Example 2 70 parts of the condensate of Darioquizal and phenol (TEP—DF Asahi Organic Materials Co., Ltd.) was used, and biphenol type phenol aralkyl resin was mixed with meta and para This was the same as in Example 2 except that 30 parts of Zornovolak (EP5000 manufactured by Asahi Organic Materials Co., Ltd.), 455 parts of epichlorohydrin, and 35 parts of flaky sodium hydroxide were used. 137 parts of the inventive epoxy resin (epoxy equivalent 189 g / eq. Melting point 162 ° C.) were obtained as white powdery crystals.
- Example 14 [0091] Condensation of Darioxar and phenol (TEP-DF; manufactured by Asahi Organic Materials Co., Ltd.) 20 parts, bisphenol F80 parts, Epiclor, while purging a flask equipped with a thermometer, a cooler, and a stirrer with nitrogen gas purge 429 parts of hydrin and 40 parts of methanol were charged and dissolved. The mixture was further heated to 70 ° C., and 40 parts of flaky sodium hydroxide was added in portions over 90 minutes, followed by further reaction at 70 ° C. for 60 minutes.
- TEP-DF manufactured by Asahi Organic Materials Co., Ltd.
- the product is washed once with 150 parts of water to remove the generated salt and the like, and then excess epichlorohydrin and the like are removed from the oil layer under heating and reduced pressure.
- the residue is converted to 450 parts of methyl isobutyl ketone. Dissolved. After this solution was heated to 70 ° C., 7 parts of a 30% aqueous sodium hydroxide solution was added and allowed to react for 1 hour. Subsequently, washing with water was carried out until the washing solution became neutral, and methyl isobutyl ketone was distilled off from the oil layer under heating and reduced pressure to obtain 145 parts of epoxy resin.
- the epoxy equivalent was 163 g / eq., A liquid epoxy resin.
- the viscosity at 25 ° C was 129 Pa's (E-type viscometer).
- Bisphenol F-type epoxy resin (epoxy equivalent 164gZeq., Viscosity at 25 ° C 3 590mPa-s Nippon Kayaku product name RE-404S) and tetrakisphenol type epoxy resin (epoxy equivalent 167gZeq. Melting point 173 ° C Nippon Kayaku GTR-1800) was mixed at a ratio of 8: 2 and melted to form liquid epoxy resin.
- the viscosity at 25 ° C was 198 Pa ⁇ s (E-type viscometer).
- the ratio of the tetrakisphenol ethane type epoxy resin and the bisphenol F type epoxy resin is 2: 8.
- the viscosity of the epoxy resin of the present invention is compared to that of a simple mixture (the bisphenol F type epoxy resin used in this comparative example is a low viscosity liquid epoxy resin).
- the viscosity is very low.
- the temperature and the degree of pressure reduction were gradually increased, and finally the temperature was adjusted to about 80 ° C. and about ⁇ 0.0 MPa, and the solvent was distilled off until no solvent efflux was observed.
- the conditions were further tightened to about 120 ° C. and about ⁇ 0.095 MPa, and the drying process was performed for 12 hours. In this way, 149 parts of the desired crystalline epoxy resin was obtained.
- the epoxy equivalent of the obtained epoxy resin is 169gZeq. Its melting point is 165 ° C.
- the cured product of the epoxy resin of the present invention exhibits heat resistance equivalent to that of a cured product of epoxy resin obtained by glycidylation of conventional tetrakisphenol ethane, and also has improved brittleness and water resistance.
- a thermosetting resin composition containing a crystalline epoxy resin of the present invention or a cured film formed of a light / thermosetting resin composition is more adhesive than conventional ones. It is extremely useful for a wide range of applications such as electrical and electronic materials, molding materials, casting materials, layer materials, paints, adhesives, resists, and optical materials.
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
Description
Claims
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006528643A JP5284586B2 (ja) | 2004-06-25 | 2005-06-24 | エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 |
| CA002570409A CA2570409A1 (en) | 2004-06-25 | 2005-06-24 | Epoxy resin, epoxy resin composition and cured product thereof |
| TW094121119A TWI369368B (en) | 2004-06-25 | 2005-06-24 | Epoxy resin, epoxy resin composition and cured object thereof |
| KR1020067027673A KR20070034534A (ko) | 2004-06-25 | 2005-06-24 | 에폭시 수지, 에폭시 수지 조성물 및 그의 경화물 |
| US11/629,313 US20080021173A1 (en) | 2004-06-25 | 2005-06-24 | Epoxy Resin, Epoxy Resin Composition And Cured Product Thereof |
| EP05753292A EP1760101A1 (en) | 2004-06-25 | 2005-06-24 | Epoxy resin, epoxy resin composition and cured product thereof |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004-188841 | 2004-06-25 | ||
| JP2004-188844 | 2004-06-25 | ||
| JP2004188841 | 2004-06-25 | ||
| JP2004188844 | 2004-06-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2006001395A1 true WO2006001395A1 (ja) | 2006-01-05 |
Family
ID=35781837
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2005/011670 Ceased WO2006001395A1 (ja) | 2004-06-25 | 2005-06-24 | エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20080021173A1 (ja) |
| EP (1) | EP1760101A1 (ja) |
| JP (1) | JP5284586B2 (ja) |
| KR (1) | KR20070034534A (ja) |
| CA (1) | CA2570409A1 (ja) |
| TW (1) | TWI369368B (ja) |
| WO (1) | WO2006001395A1 (ja) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009019114A (ja) * | 2007-07-12 | 2009-01-29 | Nitto Denko Corp | 半導体封止用エポキシ樹脂組成物およびそれを用いた半導体装置 |
| JP2013507482A (ja) * | 2009-10-07 | 2013-03-04 | ダウ グローバル テクノロジーズ エルエルシー | 固体エポキシ樹脂中の不純物の減少法 |
| JP2013181124A (ja) * | 2012-03-02 | 2013-09-12 | Sumitomo Bakelite Co Ltd | 一液型エポキシ樹脂組成物、硬化物、モータ及び発電機 |
| JP2014210859A (ja) * | 2013-04-19 | 2014-11-13 | 日本化薬株式会社 | エポキシ樹脂ワニス、エポキシ樹脂組成物、硬化性シート、プリプレグ、積層板、プリント配線板および半導体装置 |
| WO2015072123A1 (ja) * | 2013-11-12 | 2015-05-21 | Jfeケミカル株式会社 | フェノール樹脂組成物、エポキシ樹脂組成物およびエポキシ樹脂硬化物 |
| JP2017206690A (ja) * | 2016-05-12 | 2017-11-24 | 長春人造樹脂廠股▲分▼有限公司 | ポリフェノール縮合物及びそのエポキシ樹脂 |
| JP2018003024A (ja) * | 2013-11-12 | 2018-01-11 | Jfeケミカル株式会社 | エポキシ樹脂硬化物の中間体 |
| US11015818B1 (en) | 2020-09-18 | 2021-05-25 | The Gritchie Kitchen Company Limited | Table having a heating appliance |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080204418A1 (en) * | 2007-02-27 | 2008-08-28 | Adam Cybart | Adaptable User Interface and Mechanism for a Portable Electronic Device |
| JP4349424B2 (ja) * | 2007-03-13 | 2009-10-21 | セイコーエプソン株式会社 | カラーフィルター用インク、カラーフィルター、画像表示装置、および、電子機器 |
| US8902152B2 (en) * | 2007-04-30 | 2014-12-02 | Motorola Mobility Llc | Dual sided electrophoretic display |
| US8077154B2 (en) * | 2007-08-13 | 2011-12-13 | Motorola Mobility, Inc. | Electrically non-interfering printing for electronic devices having capacitive touch sensors |
| CN102027400B (zh) * | 2008-05-13 | 2016-03-30 | 日立化成工业株式会社 | 光波导的制造方法及光波导 |
| US20140099456A1 (en) * | 2012-10-09 | 2014-04-10 | Venkatkrishna Raghavendran | Fiber reinforced polymer strengthening system |
| US9472771B2 (en) * | 2013-10-31 | 2016-10-18 | Sabic Global Technologies B.V. | Method of making axially fluorinated-phthalocyanines with an aprotic fluoride compound |
| WO2022219483A1 (en) * | 2021-04-11 | 2022-10-20 | P.R.S Geo Tech Technologies Ltd | Cellular confinement system |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63275626A (ja) * | 1987-05-08 | 1988-11-14 | Ube Ind Ltd | エポキシ樹脂組成物 |
| JPH02219812A (ja) * | 1989-02-21 | 1990-09-03 | Hitachi Ltd | 熱硬化性樹脂組成物及びそれを用いたコイル、パネル |
| JPH02238018A (ja) * | 1989-03-13 | 1990-09-20 | Yuka Shell Epoxy Kk | 封止用エポキシ樹脂組成物 |
| JPH05155978A (ja) * | 1991-12-06 | 1993-06-22 | Nippon Kayaku Co Ltd | 高純度エポキシ樹脂の製造法 |
| JP2004010877A (ja) * | 2002-06-12 | 2004-01-15 | Nippon Kayaku Co Ltd | 結晶性エポキシ樹脂、及びその製法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4023594B2 (ja) * | 2002-07-09 | 2007-12-19 | 日本化薬株式会社 | エポキシ樹脂組成物、及びその硬化物 |
-
2005
- 2005-06-24 JP JP2006528643A patent/JP5284586B2/ja not_active Expired - Fee Related
- 2005-06-24 KR KR1020067027673A patent/KR20070034534A/ko not_active Withdrawn
- 2005-06-24 TW TW094121119A patent/TWI369368B/zh not_active IP Right Cessation
- 2005-06-24 EP EP05753292A patent/EP1760101A1/en not_active Withdrawn
- 2005-06-24 US US11/629,313 patent/US20080021173A1/en not_active Abandoned
- 2005-06-24 CA CA002570409A patent/CA2570409A1/en not_active Abandoned
- 2005-06-24 WO PCT/JP2005/011670 patent/WO2006001395A1/ja not_active Ceased
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63275626A (ja) * | 1987-05-08 | 1988-11-14 | Ube Ind Ltd | エポキシ樹脂組成物 |
| JPH02219812A (ja) * | 1989-02-21 | 1990-09-03 | Hitachi Ltd | 熱硬化性樹脂組成物及びそれを用いたコイル、パネル |
| JPH02238018A (ja) * | 1989-03-13 | 1990-09-20 | Yuka Shell Epoxy Kk | 封止用エポキシ樹脂組成物 |
| JPH05155978A (ja) * | 1991-12-06 | 1993-06-22 | Nippon Kayaku Co Ltd | 高純度エポキシ樹脂の製造法 |
| JP2004010877A (ja) * | 2002-06-12 | 2004-01-15 | Nippon Kayaku Co Ltd | 結晶性エポキシ樹脂、及びその製法 |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009019114A (ja) * | 2007-07-12 | 2009-01-29 | Nitto Denko Corp | 半導体封止用エポキシ樹脂組成物およびそれを用いた半導体装置 |
| JP2013507482A (ja) * | 2009-10-07 | 2013-03-04 | ダウ グローバル テクノロジーズ エルエルシー | 固体エポキシ樹脂中の不純物の減少法 |
| JP2013181124A (ja) * | 2012-03-02 | 2013-09-12 | Sumitomo Bakelite Co Ltd | 一液型エポキシ樹脂組成物、硬化物、モータ及び発電機 |
| JP2014210859A (ja) * | 2013-04-19 | 2014-11-13 | 日本化薬株式会社 | エポキシ樹脂ワニス、エポキシ樹脂組成物、硬化性シート、プリプレグ、積層板、プリント配線板および半導体装置 |
| KR101787302B1 (ko) * | 2013-11-12 | 2017-10-18 | 제이에프이 케미칼 가부시키가이샤 | 페놀 수지 조성물, 에폭시 수지 조성물 및 에폭시 수지 경화물 |
| JP2015117360A (ja) * | 2013-11-12 | 2015-06-25 | Jfeケミカル株式会社 | フェノール樹脂組成物、エポキシ樹脂組成物およびエポキシ樹脂硬化物 |
| WO2015072123A1 (ja) * | 2013-11-12 | 2015-05-21 | Jfeケミカル株式会社 | フェノール樹脂組成物、エポキシ樹脂組成物およびエポキシ樹脂硬化物 |
| JP2018003024A (ja) * | 2013-11-12 | 2018-01-11 | Jfeケミカル株式会社 | エポキシ樹脂硬化物の中間体 |
| US10351660B2 (en) | 2013-11-12 | 2019-07-16 | Jfe Chemical Corporation | Phenolic resin composition, epoxy resin composition, and cured epoxy resin |
| JP2017206690A (ja) * | 2016-05-12 | 2017-11-24 | 長春人造樹脂廠股▲分▼有限公司 | ポリフェノール縮合物及びそのエポキシ樹脂 |
| JP2021138717A (ja) * | 2016-05-12 | 2021-09-16 | 長春人造樹脂廠股▲分▼有限公司Chang Chun Plastics Co., Ltd. | ポリフェノール縮合物及びそのエポキシ樹脂 |
| JP7245867B2 (ja) | 2016-05-12 | 2023-03-24 | 長春人造樹脂廠股▲分▼有限公司 | ポリフェノール縮合物及びそのエポキシ樹脂 |
| JP7385342B2 (ja) | 2016-05-12 | 2023-11-22 | 長春人造樹脂廠股▲分▼有限公司 | ポリフェノール縮合物及びそのエポキシ樹脂 |
| US11015818B1 (en) | 2020-09-18 | 2021-05-25 | The Gritchie Kitchen Company Limited | Table having a heating appliance |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070034534A (ko) | 2007-03-28 |
| EP1760101A1 (en) | 2007-03-07 |
| JPWO2006001395A1 (ja) | 2008-04-17 |
| JP5284586B2 (ja) | 2013-09-11 |
| TWI369368B (en) | 2012-08-01 |
| US20080021173A1 (en) | 2008-01-24 |
| TW200610773A (en) | 2006-04-01 |
| CA2570409A1 (en) | 2006-01-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6240069B2 (ja) | エポキシ樹脂組成物、およびその硬化物、並びに、硬化性樹脂組成物 | |
| JP6366504B2 (ja) | エポキシ樹脂、エポキシ樹脂組成物および硬化物 | |
| JP6212227B2 (ja) | エポキシ樹脂、エポキシ樹脂組成物、感光性樹脂組成物およびその硬化物 | |
| WO2006001395A1 (ja) | エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 | |
| JP2008195843A (ja) | フェノール樹脂、エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 | |
| KR20160118208A (ko) | 에폭시 수지, 경화성 수지 조성물 및 그 경화물 | |
| JP5142180B2 (ja) | エポキシ樹脂組成物、およびその硬化物 | |
| WO2010052877A1 (ja) | フェノール樹脂混合物、エポキシ樹脂混合物、エポキシ樹脂組成物、及び硬化物 | |
| JP5127164B2 (ja) | 変性エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 | |
| JP6016647B2 (ja) | エポキシ樹脂、および硬化性樹脂組成物 | |
| JP5220488B2 (ja) | エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 | |
| JP5127160B2 (ja) | エポキシ樹脂、硬化性樹脂組成物、およびその硬化物 | |
| JP4915895B2 (ja) | エポキシ樹脂の製造法 | |
| JP4915896B2 (ja) | エポキシ樹脂の製造法 | |
| JP2005200544A (ja) | フェノール樹脂、エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 | |
| JP2010053293A (ja) | エポキシ樹脂組成物 | |
| JP2008081546A (ja) | エポキシ樹脂、エポキシ樹脂組成物及びその硬化物 | |
| JP2006213823A (ja) | 耐熱性エポキシ樹脂組成物 | |
| JP2014141688A (ja) | フェノール樹脂、エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 | |
| JP2007045978A (ja) | エポキシ樹脂、エポキシ樹脂組成物、およびその硬化物 | |
| JP2006307013A (ja) | 液状エポキシ樹脂、エポキシ樹脂組成物およびその硬化物 | |
| JP2007284583A (ja) | エポキシ樹脂、硬化性樹脂組成物、およびその硬化物 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| WWE | Wipo information: entry into national phase |
Ref document number: 2006528643 Country of ref document: JP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2005753292 Country of ref document: EP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 11629313 Country of ref document: US |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2570409 Country of ref document: CA |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 200580020580.X Country of ref document: CN |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 1020067027673 Country of ref document: KR |
|
| WWW | Wipo information: withdrawn in national office |
Country of ref document: DE |
|
| WWP | Wipo information: published in national office |
Ref document number: 2005753292 Country of ref document: EP |
|
| WWP | Wipo information: published in national office |
Ref document number: 1020067027673 Country of ref document: KR |
|
| WWP | Wipo information: published in national office |
Ref document number: 11629313 Country of ref document: US |
|
| WWW | Wipo information: withdrawn in national office |
Ref document number: 2005753292 Country of ref document: EP |