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WO2006060660A3 - Revetements en nitrure du groupe iii et procedes associes - Google Patents

Revetements en nitrure du groupe iii et procedes associes Download PDF

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Publication number
WO2006060660A3
WO2006060660A3 PCT/US2005/043637 US2005043637W WO2006060660A3 WO 2006060660 A3 WO2006060660 A3 WO 2006060660A3 US 2005043637 W US2005043637 W US 2005043637W WO 2006060660 A3 WO2006060660 A3 WO 2006060660A3
Authority
WO
WIPO (PCT)
Prior art keywords
group iii
iii nitride
silicon
nitride
thin films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2005/043637
Other languages
English (en)
Other versions
WO2006060660A2 (fr
Inventor
Huaqiang Wu
Michael G Spencer
Emmanuel Giannelis
Athanasios Bourlinos
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cornell Research Foundation Inc
Original Assignee
Cornell Research Foundation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cornell Research Foundation Inc filed Critical Cornell Research Foundation Inc
Priority to CN2005800414858A priority Critical patent/CN101068890B/zh
Publication of WO2006060660A2 publication Critical patent/WO2006060660A2/fr
Publication of WO2006060660A3 publication Critical patent/WO2006060660A3/fr
Priority to US11/809,879 priority patent/US7772288B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances

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  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Luminescent Compositions (AREA)
  • Paints Or Removers (AREA)

Abstract

L'invention concerne une composition qui est une dispersion à base de nitrure du groupe III, un système de solvant, et un dispersant. La dispersion peut servir à préparer des films minces en nitrure du groupe III sur une large gamme de substrats, par exemple, le verre, le silicium, le dioxyde de silicium, le nitrure de silicium, le carbure de silicium, le nitrure d'aluminium, le saphir, et des polymères organiques. La granulométrie du nitrure du groupe III servant à produire les films minces peut être régulée par ajustement de la centrifugation de la dispersion et sélection d'une couche recherchée du surnageant. Le dispersant peut être évacué des films minces par calcination. Le nitrure du groupe III peut contenir un dopant. Les films minces de nitrure du groupe III dopés peuvent émettre la lumière visible à la suite d'irradiation. Des émissions de lumière verte, rouge et jaune résultent de l'irradiation du nitrure de gallium dopé à l'erbium, l'europium, et au cérium, respectivement.
PCT/US2005/043637 2004-12-01 2005-12-01 Revetements en nitrure du groupe iii et procedes associes Ceased WO2006060660A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN2005800414858A CN101068890B (zh) 2004-12-01 2005-12-01 第iii族氮化物涂层及方法
US11/809,879 US7772288B2 (en) 2004-12-01 2007-06-01 Group III nitride coatings and methods

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US63199904P 2004-12-01 2004-12-01
US60/631,999 2004-12-01

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/809,879 Continuation US7772288B2 (en) 2004-12-01 2007-06-01 Group III nitride coatings and methods

Publications (2)

Publication Number Publication Date
WO2006060660A2 WO2006060660A2 (fr) 2006-06-08
WO2006060660A3 true WO2006060660A3 (fr) 2006-11-16

Family

ID=36565775

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2005/043637 Ceased WO2006060660A2 (fr) 2004-12-01 2005-12-01 Revetements en nitrure du groupe iii et procedes associes

Country Status (2)

Country Link
CN (1) CN101068890B (fr)
WO (1) WO2006060660A2 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101053115B1 (ko) * 2011-02-28 2011-08-01 박건 결정성 및 휘도가 우수한 질화물계 발광소자 및 그 제조 방법
KR101053111B1 (ko) * 2011-02-28 2011-08-01 박건 실리콘 기판을 이용한 질화물계 발광소자 및 그 제조 방법
CN102746025B (zh) * 2012-06-27 2014-03-26 电子科技大学 低成本GaN外延薄膜的制备方法
CN103343005B (zh) * 2013-07-13 2015-05-13 上海洞舟实业有限公司 一种高稳定碳纳米荧光染色剂
CN107429383B (zh) * 2015-03-30 2020-07-24 东曹株式会社 氮化镓系烧结体和其制造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4904411A (en) * 1986-04-25 1990-02-27 Ceramics Process Systems Corp. Highly loaded, pourable suspensions of particulate materials
US6653718B2 (en) * 2001-01-11 2003-11-25 Honeywell International, Inc. Dielectric films for narrow gap-fill applications
US20040023010A1 (en) * 2002-03-29 2004-02-05 Vladimir Bulovic Light emitting device including semiconductor nanocrystals

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1279585C (zh) * 2001-11-17 2006-10-11 厦门三安电子有限公司 一种p型ⅲ族氮化物材料的制作方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4904411A (en) * 1986-04-25 1990-02-27 Ceramics Process Systems Corp. Highly loaded, pourable suspensions of particulate materials
US6653718B2 (en) * 2001-01-11 2003-11-25 Honeywell International, Inc. Dielectric films for narrow gap-fill applications
US20040023010A1 (en) * 2002-03-29 2004-02-05 Vladimir Bulovic Light emitting device including semiconductor nanocrystals

Also Published As

Publication number Publication date
CN101068890A (zh) 2007-11-07
CN101068890B (zh) 2011-01-19
WO2006060660A2 (fr) 2006-06-08

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