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WO2006049113A1 - Intermediate for synthesizing carbapenem and method for preparation thereof - Google Patents

Intermediate for synthesizing carbapenem and method for preparation thereof Download PDF

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Publication number
WO2006049113A1
WO2006049113A1 PCT/JP2005/019970 JP2005019970W WO2006049113A1 WO 2006049113 A1 WO2006049113 A1 WO 2006049113A1 JP 2005019970 W JP2005019970 W JP 2005019970W WO 2006049113 A1 WO2006049113 A1 WO 2006049113A1
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compound
group
salt
amine
amine salt
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Japanese (ja)
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Masaaki Uenaka
Yutaka Ide
Masahiko Nagai
Hiromi Yabunaka
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Shionogi and Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D477/00Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring
    • C07D477/10Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 4, and with a carbon atom having three bonds to hetero atoms with at the most one bond to halogen, e.g. an ester or nitrile radical, directly attached in position 2
    • C07D477/12Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 4, and with a carbon atom having three bonds to hetero atoms with at the most one bond to halogen, e.g. an ester or nitrile radical, directly attached in position 2 with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, attached in position 6
    • C07D477/16Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached in position 4, and with a carbon atom having three bonds to hetero atoms with at the most one bond to halogen, e.g. an ester or nitrile radical, directly attached in position 2 with hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, attached in position 6 with hetero atoms or carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. an ester or nitrile radical, directly attached in position 3
    • C07D477/20Sulfur atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D205/00Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom
    • C07D205/02Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings
    • C07D205/06Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D205/08Heterocyclic compounds containing four-membered rings with one nitrogen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with one oxygen atom directly attached in position 2, e.g. beta-lactams
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D477/00Heterocyclic compounds containing 1-azabicyclo [3.2.0] heptane ring systems, i.e. compounds containing a ring system of the formula:, e.g. carbapenicillins, thienamycins; Such ring systems being further condensed, e.g. 2,3-condensed with an oxygen-, nitrogen- or sulphur-containing hetero ring
    • C07D477/02Preparation
    • C07D477/04Preparation by forming the ring or condensed ring systems
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Definitions

  • the present invention relates to a synthetic intermediate of rubapenem having antibacterial activity and a method for producing the same. Specifically, the present invention relates to the intermediate, its amine salt, its crystal, and a process for producing strong rubapenem using them. Background art
  • Patent Document 1 As a method for producing a synthetic intermediate of 1 alkyl strength rubapenem, Patent Document 1 (Reference Example 1 2) includes the following compound 5 6 as an intermediate for utilizing the Dieckmann condensation reaction. It is disclosed.
  • Patent Document 2 (Example 13) describes a method for producing doripenem from Compound 5 [Chemical Formula 2]
  • Non-Patent Document 1 describes the following reaction as a method for producing the hydroxy-protected form of Compound 5 described above.
  • Patent Document 1 JP-A-1 79180
  • Patent Document 2 JP-A-5-294970
  • Non-patent literature l Synlett, 315-316, 1995
  • Step 1 A step of producing compound (III) by protecting carboxy of compound ( ⁇ ),
  • Step 2 A step of producing Compound (V) by reacting Compound (III) with Compound (IV), and
  • Step 3 The compound (I) or the amine salt thereof according to (1) above, which comprises a step of subjecting the compound (V) to a deprotection reaction and optionally reacting with an amine.
  • COZ represents an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected by a protective group, a substituted aryloxy group, or a heteroaryl carbon group.
  • COZ is an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected with a protecting group for a thiol force propyloxyl group, a substituted aryloxycarbonyl group, or a heteroaryloxycarbonyl group;
  • R 3 comprises preparing a compound (VII) represented by hydroxy protecting group), then treating it with a base, and further treating with a hydroxyl active esterifying agent.
  • (14) is alkylsilyl, 2 is -3 to 11, and Z or L is OP (OXOPh) (Ph
  • the present invention provides a novel synthetic intermediate of force rubapenem derivative, a method for producing the same, and a method for producing force rubapenem derivative using the same.
  • the target strength rubapenem derivative can be synthesized in high yield with high efficiency.
  • Examples of the protecting group for hydroxy include trialkylsilyl (eg, trimethylsilyl, t-butyldimethylsilyl), acyl (eg, acetyl, bivaloyl), lower alkyl (eg, methyl, ethyl), lower alkoxy lower alkyl (eg, methoxymethyl, Methoxyethyl), lower alkyl sulfo (eg methanesulfol), lower alkoxy carbo (eg methoxy carboyl, t-butyloxy carbo), aralkyloxy carbo yl (eg benzyloxy) Noreboninole, o Nitrobenzinore, Xicanoreboninole, p Nitrobenzinore, Xicanorebonyl, p-methoxybenzyloxycarbonyl), substituted methyl (eg, methoxymethyl, 2-methoxyethoxymethyl, methylthiomethyl) ),
  • Carboxy protecting groups include lower alkyl (eg, methyl, ethyl, n-propoxy, isopropyl, t-butyl), substituted lower alkyl (example of substituent: lower alkoxy (eg, methoxy, ethoxy, n propoxy, Isopropoxy, n-butoxy, isobutoxy, t-butoxy)), substituted or unsubstituted aralkyl (eg benzyl, phenethyl, p-methoxybenzyl, 2, 4 dimethoxybenzyl, o nitrobenzyl, p nitrobenzyl, p— Benzyl)), hetero atoms (eg, 0, S, N) optionally intervening C3-C8 cycloalkyl, alkylsilyl (eg, trimethylsilyl, t-butyldimethylsilyl), lower alkoxymethyl (eg, methoxy) Methyl, e
  • “Lower” preferably means C1-C6, more preferably C1-C4.
  • Halogen represents F, Cl, Br, or I.
  • Amine salt amines of compound (I) include primary, secondary, and tertiary amines
  • Primary amines include methylamine, ethylamine, isopropylamine, sec-butylamine, tert-butylamine, isoamylamine, n-decylamine, 3-methoxypropylamine, benzylamine, phenethylamine, 4-methoxyphenethylamine, 2,2-dimethoxyethylamine, 3,3-dimethoxypropylamine, p-chloroarine, 2- (p-chlorophenol) ethylamine, (-)- ⁇ -methylbenzylamine, 3 , 4-Dimethoxyphenethylamine, Benzhydrylamine, 2- (4-aminophenol) ethylamine, 2-aminobenzylamine, (+)-dihydroabietylamine, 4-methoxybenzylamine, 3-methoxy Phenethylamine, 4-tert-butylbenzilamine, aniline, 4-bromo-2-fluoroani
  • Secondary amines include dimethylamine, jetylamine, diisopropylamine, dicyclohexylamine, 3,5-dichloro-4,4, -dihydroxydiphenylamine, benzyl-N-methyl. Ethanolamine is exemplified, and diisopropylamine and dicyclohexylamine are preferable.
  • tertiary amines examples include N-methylmorpholine, triethylamine, tributylamine, triarylamine, N-ethyldiisopropylamine, and ⁇ , ⁇ -dimethylbutylamine.
  • the amine salt of compound (I) is preferably a crystal.
  • those having good crystallinity with respect to compound (I) are primary or secondary amines, preferably methylamine, ethylamine, isopropylamine, tert-butylamine, (-)- ⁇ -methylbenzylamine, Diisopropylamine and dicyclohexylamine are preferable, and methylamine and diisopropylamine are more preferable.
  • diisopropylamine is particularly preferred because it has advantages such as low crystallinity, low toxicity, and low reactivity to the ⁇ -ratata ring. It can also be used as a base (acid trapping agent) in the next step condensation.
  • the amine salt or the crystal thereof may be a solvate.
  • the solvent include water and alcohol.
  • R 1 is a hydroxy protecting group
  • R 2 is a carboxy protecting group
  • X is a halogen
  • Compound (III) is obtained by protecting carboxy of compound (II).
  • the reaction may be carried out according to the usual carboxy protection reaction.
  • R 1 is a force exemplified by the above hydroxy protecting group, preferably trialkylsilyl, particularly t-butyldimethylsilyl (TBS).
  • TBS t-butyldimethylsilyl
  • R 2 is a force exemplified by the above-mentioned carboxy protecting group, preferably lower alkyl substituted with lower alkoxy, such as 1-methoxyethyl, 1-ethoxyethyl, 1 isopropoxycetyl, 1 n propoxychetil 1 n-butoxystil, 1-sobutoxyl, 1 t-butoxystil, particularly preferably 1-isobutoxyl.
  • carboxy protecting group preferably lower alkyl substituted with lower alkoxy, such as 1-methoxyethyl, 1-ethoxyethyl, 1 isopropoxycetyl, 1 n propoxychetil 1 n-butoxystil, 1-sobutoxyl, 1 t-butoxystil, particularly preferably 1-isobutoxyl.
  • These protecting groups are less susceptible to side reactions such as rearrangement to the 1-position N atom during the reaction.
  • reaction accelerator such as an acid
  • the acid include methanesulfonic acid, P-toluenesulfonic acid, hydrochloric acid, sulfuric acid, phosphoric acid and the like.
  • Reaction solvents include hydrocarbons (eg, pentane, hexane, heptane, cyclohexane, petroleum ether, toluene, xylene), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride), alcohols (eg, : Methanol, ethanol), formic acid, acetic acid, propionic acid, ethyl acetate, acetone, formamide, nitromethane, acetonitrile, ether (eg, tetrahydrofuran, jetyl ether), water and mixed solvents thereof are exemplified. Preferably, it is toluene, acetonitrile, or a mixed solvent thereof.
  • hydrocarbons eg, pentane, hexane, heptane, cyclohexane, petroleum ether, toluene, xylene
  • the reaction temperature is generally 0-100 ° C, preferably 0-50 ° C, more preferably 10-30 ° C.
  • the reaction time is several hours to several tens of hours.
  • the resulting compound (III) may be subjected to the next step without isolation.
  • Compound (V) is produced by reacting compound (III) with compound (IV).
  • the halogen represented by X is preferably C or Br.
  • a reaction accelerator such as a base
  • bases include NaH, sodium tert-butoxide, potassium tert-butoxide, sodium tert-pentoxide, n-butyllithium, lithium diisopropylamide, lithium bis (trimethylsilyl) amide, and sodium bis (trimethylsilyl) amide.
  • an interlayer transfer catalyst may be used in combination.
  • quaternary ammonium salt eg, tetra n-butyl ammonium chloride, tetra n-butyl ammonium chloride
  • Reaction solvents include hydrocarbons (eg, pentane, hexane, heptane, cyclohexane, petroleum ether, toluene, xylene), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride), alcohols (eg, : Methanol, ethanol), formic acid, acetic acid, propionic acid, ethyl acetate, acetone, formamide, nitromethane, acetonitrile, ether (eg, tetrahydrofuran, jetyl ether), water and mixed solvents thereof are preferable, , Toluene, acetonitrile, tetrahydrofuran or a mixed solvent thereof.
  • the reaction temperature is usually 70 to 0 ° C, preferably 50 to 30 ° C.
  • the reaction time is several hours to several tens of hours.
  • the resulting compound (V) may be subjected to the next step without isolation.
  • Compound (V) is subjected to a deprotection reaction and then optionally reacted with amine to give compound (I) or an amine salt thereof.
  • the deprotection reaction may be carried out in accordance with the conditions for a normal carboxy deprotection reaction.
  • compound (V) may be treated with an acid.
  • Acids include hydrochloric acid, sulfuric acid, potassium hydrogen sulfate Examples are sodium hydrogen sulfate, nitric acid, phosphoric acid, sodium dihydrogen phosphate, and potassium dihydrogen phosphate.
  • the reaction time is usually several minutes to several tens of hours.
  • the reaction with amine is usually carried out under ice cooling to room temperature.
  • a seed crystal may be added if desired.
  • Solvents used for crystallization include hydrocarbons (eg, pentane, hexane, heptane, cyclohexane, petroleum ether, toluene, xylene), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride).
  • Alcohol eg methanol, ethanol
  • formic acid acetic acid, propionic acid, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, acetone, formamide, nitromethane, acetonitrile, ether (eg tetrahydrofuran, jetyl ether), Examples thereof include water and mixed solvents thereof.
  • ether eg tetrahydrofuran, jetyl ether
  • examples thereof include water and mixed solvents thereof.
  • heat treatment, ultrasonic treatment, stirring, etc. may be performed.
  • compound (I) or an amine salt thereof is in the 4-position according to the method described in JP-A-6-316559.
  • COZ represents an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected by a protective group, a substituted aryloxy group, or a heteroaryl carbon group.
  • the Z group may be a halogen atom such as chlorine, bromine or iodine; for example, ethoxycarboxoxy, isopropyloxycarboxoxy, sec- Lower alkyloxycarboxoxy groups having 1 to 5 carbon atoms such as butyroxycarbonyloxy; A lower alkanesulfo-loxy group having 1 to 4 carbon atoms such as ruoxy; for example, an arylsulfo-loxy group such as p-toluenesulfo-loxy; for example, di (carbon number 1) such as dimethylphosphoryloxy and jetylphosphoryloxy -4 lower alkyl) phosphoryloxy groups; diarylphosphoryloxy groups such as di (phenol) phosphoryloxy; cyclic imidooxy groups such as N-succinimidoxy, N-phthalimidoxy Groups; heteroaryl groups such as imidazole and triazole;
  • a halogen atom such as chlorine, bromine or iodine
  • Suitable examples of the protective group for the carboxyl group and the protective group for the thiol carboxyl group used when COZ is a protected carboxyl group or a thiol carboxyl group are the same as those described above.
  • preferred examples of the substituted aryloxy group include P--trophenyloxy, o--trophenyloxy, 2,4,5-trichlorophenyloxy, etc.
  • the heteroaryloxy group includes o —Pyridyloxy, p-pyridyloxy and the like can be mentioned.
  • the conversion from the above compound (I) to (VI) is preferably carried out in the presence of a condensing agent. More preferably, compound (VI) in which COZ is COSPh (Ph is a phenol) can be produced by subjecting the carboxy moiety of compound (I) or its amine salt to a thioester in the presence of a condensing agent.
  • the above reaction is preferably performed in a high yield of 70% or more, more preferably 80% or more, and even more preferably 90% or more.
  • reaction may be used in combination with an acid scavenger if desired.
  • the above-mentioned amine can be used as the acid scavenger.
  • coz is an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected with a protecting group for a thiol force lpoxyl group, a substituted aryloxycarbonyl group, or a heteroaryloxycarbonyl group; R (3 ) is a hydroxy protecting group), after the production of compound (VII), it is treated with a base according to the method described in JP-A-6-316559, and further treated with an active esterifying agent for a hydroxyl group.
  • R 3 is a force exemplified by the above hydroxy protecting group, preferably trialkylsilyl, especially trimethylsilyl (TMS).
  • TMS trimethylsilyl
  • TMS is preferably used in terms of deprotection.
  • the active ester of a hydroxyl group represented by L is, for example, a substituted or unsubstituted aryl sulfonic acid ester group (substituted or unsubstituted aryl sulfonic sulfo-oxy group), a lower alkane sulfonic acid ester group (lower alkane sulfo-oxy group), a halogeno lower alkanthol. It represents a phosphonic acid ester group (norogeno-lower alkanesulfo-oxyloxy group) or a dialyl phosphoric acid ester group (diarylphosphoryloxy group) or a halogenated metal atom that is an ester with a hydrogen halide.
  • the active esterifying agent for a hydroxyl group is a reagent that produces an active ester as described above.
  • the substituted or unsubstituted aryl sulfonic acid ester include benzene sulfonic acid ester, p toluene sulfonic acid ester, p-trobenzene sulfonic acid ester, and p bromobenzene sulfonic acid ester.
  • the acid ester include methanesulfonic acid ester and ethanesulfonic acid ester.
  • the halogeno lower alkanesulfonic acid ester include trifluoromethanesulfonic acid ester.
  • dialyl phosphoric acid ester examples include Examples of the diphenyl phosphoric acid ester and the halogenated compounds include chlorine, bromine, and iodide.
  • these active esters of alcohol p-toluenesulfonic acid ester, methanesulfonic acid ester and diphenylphosphoric acid ester can be mentioned, and diphenylphosphoric acid ester is preferable.
  • diphenyl phosphoric acid chloride eg, diphenyl phosphoric acid chloride
  • the active esterifying agent is preferable as the active esterifying agent.
  • Bases for treating compound (VII) in an inert solvent include metal salts of amines such as lithium diisopropylamide, lithium bis (trimethylsilyl) amide, and sodium amide, metal salts of alcohols such as potassium tert-butoxide, Examples thereof include alkali metal hydrides such as sodium hydride and lithium hydride, and sodium methylsulfinylmethide.
  • the amount of base used is usually 1.5 to 3 equivalents.
  • the preferred reaction temperature is -75 ° C to 50 ° C.
  • R 3 is alkylsilyl
  • Z is SPh
  • Z or L is OP (OXOPh) (Ph is full).
  • the compound (ring) has the formula: R 4 — SH (R 4 is the same as the method described in JP-A-1-79180, JP-A-6-316559, JP-A-5-294970, USP 5,317,016, etc.
  • Examples of pharmaceutically acceptable salts include basic salts such as alkali metal salts such as sodium salts and potassium salts; alkaline earth metal salts such as calcium salts and magnesium salts; ammonium salts; trimethylamine salts. , Triethylamine salt, dicyclohexylamine salt, ethanolamine salt, diethanolamine salt, triethanolamine salt, brocaine salt, medalamine salt, diethanolamine salt or aliphatic amine amine salt such as ethylenediamine salt; ⁇ , ⁇ -dibenzyl ethylenediamine, Aralkylamine salts; Heterocyclic aromatic amine amines such as pyridine salts, picoline salts, quinoline salts, isoquinoline salts; tetramethylammonium salts, tetraethylammonium salts, benzyltrimethylammonium salts, benzyltrie Tiluamum salt, benzyltri Examples include quaternary ammonium salts
  • the acid salt examples include inorganic acid salts such as hydrochloride, sulfate, nitrate, phosphate, carbonate, bicarbonate, perchlorate; acetate, propionate, lactate, maleate , Organic acid salts such as fumarate, tartrate, malate, citrate, and ascorbate; sulfonic acids such as methanesulfonate, isethionate, benzenesulfonate, and ⁇ ⁇ ⁇ ⁇ -toluenesulfonate Salt: aspartate, glutamate And acidic amino acids such as Examples of solvates include hydrates and alcohol solvates.
  • Compound (X) includes: (1) cenamycin, (2) imipenem, (3) meropenem, (4) beer penem, (5) panipenem, (6) BQ-2727, (7 ) S-4661 (Doripenem) is an example (each “SR 4 " is shown below).
  • TBS t butyldimethylsilyl
  • TMS trimethylsilyl tBu: t butyl
  • the ethyl acetate layer was washed twice with 389 ml of water, the aqueous layer was extracted with 311 ml of ethyl acetate, the ethyl acetate layers were combined, concentrated under reduced pressure, 200 ml of toluene was added, and the solution was concentrated under reduced pressure to give a 6-like residue 108.16 g (quantitative value: 85.0 g, yield: 94%) was obtained.
  • the toluene layer was washed sequentially with 270 ml of water and 270 ml of saturated saline, the aqueous layer was extracted with 160 ml of toluene, the toluene layers were combined, concentrated under reduced pressure, and 92.70 g (quantitative value: 53.36 g, yield) of 7 Rate: 87%).
  • Example 13 of JP-A-5-294970 compound 7 obtained in Example 3 was subjected to a condensation reaction for forming a 2-position side chain to synthesize compound 8, and further deprotection By subjecting to reaction, compound 9 (doripenem) is obtained.
  • the corresponding amine salt was obtained by reacting the above-mentioned various amines other than diisopropylamine with the free form of Compound 4.
  • Dicyclohexylamine salt, methylamine salt, ethylamine salt, isopropylamine salt, t-butylamine salt, and (1) -a-methylbenzylamine salt were obtained as crystals.
  • dicyclohexylamine, methylamine, t-butylamine, and (1) a methylbenzylamine showed good crystallinity.
  • the powder X-ray diffraction patterns are shown in Figures 2 to 5, and the diffraction angles of the main peaks are shown below.
  • Example 9 Using the various amine salts obtained in Example 5 as raw materials, Compound 9 is obtained according to the methods of Examples 2-4.
  • the obtained SPL / methanol solution was cooled to 18 ° C., and 10% aqueous sodium hydroxide solution (130.5 g) was added to adjust the pH to 2.4.
  • ethyl acetate (357 ml) and brine (113 ml) were added, liquid separation was performed, and SPL was extracted into the organic layer.
  • the organic layer was washed successively with water (357 ml) and 2% brine (119 mix x 2).
  • the resulting four aqueous layers were back extracted with ethyl acetate (102 ml) to recover SPL lost to the aqueous layer.
  • FIG. 1 is a powder X-ray diffraction pattern and peak value of diisopropylamine salt crystals obtained in Example 1.
  • the vertical axis represents intensity (unit: cps), and the horizontal axis represents diffraction angle (2 ⁇ , unit: degree).
  • FIG. 2 is a powder X-ray diffraction pattern and peak value of dicyclohexylamine salt crystals obtained in Example 5.
  • FIG. 3 shows a powder X-ray diffraction pattern and peak value of methylamine salt crystals in Example 5.
  • FIG. 4 shows a powder X-ray diffraction pattern and peak value of t-ptylamine salt crystal in Example 5.
  • FIG. 5 shows the powder X-ray diffraction pattern and peak value of (1) -a-methylbenzylamine salt crystals in Example 5.
  • FIG. 6 is a powder X-ray diffraction pattern of SPL hemihydrate crystals obtained in Reference Example 1.
  • the vertical axis represents intensity (unit: cps), and the horizontal axis represents diffraction angle (2 ⁇ , unit: degree).
  • FIG. 7 is a powder X-ray diffraction pattern of anhydrous SPL crystals obtained in Reference Example 1.
  • the vertical axis represents intensity (unit: cps), and the horizontal axis represents diffraction angle (2 ⁇ , unit: degree).

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Abstract

A compound (I) which is obtained by the following reaction scheme: (II) (III) (IV) (V) (I) (wherein R1 and R2 represent a protecting group for a hydroxy group and a protecting group for a carboxy group, respectively, and X represents a halogen atom), and an amine salt thereof; and a method for producing a carbapenem derivative using the compound (1) and an amine salt thereof.

Description

力ルバぺネム合成中間体およびその製造法  Rubapenem synthetic intermediate and process for producing the same

技術分野  Technical field

[0001] 本発明は、抗菌活性を有する力ルバぺネムの合成中間体およびその製造法に関 する。詳しくは本発明は、該中間体、そのアミン塩、その結晶およびそれらを利用した 力ルバぺネムの製法に関する。 背景技術  [0001] The present invention relates to a synthetic intermediate of rubapenem having antibacterial activity and a method for producing the same. Specifically, the present invention relates to the intermediate, its amine salt, its crystal, and a process for producing strong rubapenem using them. Background art

[0002] 1 アルキル力ルバぺネムの合成中間体の製法として、特許文献 1 (参考例 1 2) には、 Dieckmann縮合反応を利用するための中間体として以下に示すィ匕合物 5 6が 開示されている。  [0002] As a method for producing a synthetic intermediate of 1 alkyl strength rubapenem, Patent Document 1 (Reference Example 1 2) includes the following compound 5 6 as an intermediate for utilizing the Dieckmann condensation reaction. It is disclosed.

[化 1]  [Chemical 1]

Figure imgf000003_0001
Figure imgf000003_0001

また特許文献 2 (実施例 13)には、化合物 5からドリぺネムの製法が記載されている [化 2]

Figure imgf000003_0002
Patent Document 2 (Example 13) describes a method for producing doripenem from Compound 5 [Chemical Formula 2]
Figure imgf000003_0002

Figure imgf000003_0003
(式中、 TMS:トリメチルシリル)
Figure imgf000003_0003
(Where TMS: trimethylsilyl)

非特許文献 1には、上記化合物 5のヒドロキシ保護体の製法として以下の反応が記 載されている。  Non-Patent Document 1 describes the following reaction as a method for producing the hydroxy-protected form of Compound 5 described above.

[化 3]  [Chemical 3]

Figure imgf000004_0001
a: 1) TBS-C1, NaH, THF, 0°C, lh 2) BrCH2C02Allyl, NaH(TMS)2, THF, 50°C,
Figure imgf000004_0001
a: 1) TBS-C1, NaH, THF, 0 ° C, lh 2) BrCH2C02Allyl, NaH (TMS) 2, THF, 50 ° C,

30min 3) K2C03, H20, 25°C, lOmin 4) aq. HC1 30min 3) K2C03, H20, 25 ° C, lOmin 4) aq.HC1

特許文献 1:特開平 1 79180  Patent Document 1: JP-A-1 79180

特許文献 2:特開平 5— 294970  Patent Document 2: JP-A-5-294970

非特許文献 l : Synlett, 315-316, 1995  Non-patent literature l: Synlett, 315-316, 1995

発明の開示  Disclosure of the invention

発明が解決しょうとする課題  Problems to be solved by the invention

[0003] 化合物 5を従来の方法で製造すると、副反応を十分に制御するのが容易ではなぐ その結果、 目的の力ルバぺネムを工業的に効率よく製造するのは極めて困難であつ た。例えば、 j8—ラタタム環の 4位のカルボキシをチォエステルとした後、 1位 N原子 をアルキルィ匕した場合には、チォエステル基の一部が外れることが分力つた。また出 発物質のヒドロキシ保護基の種類によっては、該ヒドロキシ保護基に由来する副生成 物が化合物 5に混入し、それを完全に除去することが困難であった。 [0003] When compound 5 is produced by a conventional method, it is not easy to sufficiently control the side reaction. As a result, it has been extremely difficult to produce the target force rubapenem industrially and efficiently. For example, when the 4-position carboxy of the j8-ratata ring was changed to a thioester and the N atom at the 1-position was alkylated, a part of the thioester group was released. Further, depending on the kind of hydroxy protecting group of the starting material, a by-product derived from the hydroxy protecting group is mixed into Compound 5 and it is difficult to completely remove it.

課題を解決するための手段  Means for solving the problem

[0004] 本発明者らは鋭意検討した結果、化合物 5およびその誘導体の製法として、新規中 間体である化合物 (I)またはそのアミン塩を経由すれば、工業的に効率よく目的化合 物が製造できることを見出した。また化合物 5を効率よく製造するための反応条件 (例 :縮合剤の種類)等についても検討し、以下に示す本発明を完成した。 [0004] As a result of diligent investigations, the present inventors have found that the compound 5 and its derivatives can be produced industrially and efficiently through a novel intermediate compound (I) or an amine salt thereof. We found that the product can be manufactured. In addition, the reaction conditions for efficiently producing compound 5 (eg, the type of condensing agent) were also examined, and the present invention shown below was completed.

(1)式: (1 set:

[化 4] [Chemical 4]

Figure imgf000005_0001
で示される化合物 (I)またはそのアミン塩。
Figure imgf000005_0001
Or a amine salt thereof.

(2)ァミンが 1級ァミンまたは 2級ァミンである、上記 1記載のアミン塩。  (2) The amine salt as described in 1 above, wherein the amine is a primary amine or a secondary amine.

(3)ァミンが、メチルァミン、ェチルァミン、イソプロピルァミン、 t—ブチルァミン、(一) a メチルベンジルァミン、ジイソプロピルァミン、またはジシクロへキシルァミンで ある、上記 1記載のアミン塩。  (3) The amine salt as described in 1 above, wherein the amine is methylamine, ethylamine, isopropylamine, t-butylamine, (1) a methylbenzylamine, diisopropylamine, or dicyclohexylamine.

(4)ジイソプロピルアミン塩である、上記 1記載のアミン塩。  (4) The amine salt as described in 1 above, which is a diisopropylamine salt.

(5)結晶である、上記 1〜4のいずれかに記載のアミン塩。  (5) The amine salt according to any one of 1 to 4 above, which is a crystal.

(6)粉末 X線回折パターンにおいて、 2 0 =8.7, 9.7, 15.7, 22.4度に主ピークを示す 結晶である、上記 4記載のジイソプロピルアミン塩。  (6) The diisopropylamine salt according to 4 above, which is a crystal having a main peak at 2 0 = 8.7, 9.7, 15.7, 22.4 degrees in a powder X-ray diffraction pattern.

(7)以下の反応スキーム:  (7) The following reaction scheme:

[化 5] [Chemical 5]

Figure imgf000005_0002
Figure imgf000005_0003
Figure imgf000005_0002
Figure imgf000005_0003

(式中、 R1はヒドロキシ保護基; R2はカルボキシ保護基; Xはハロゲン)で示され、以下 の工程: (Wherein R 1 is a hydroxy protecting group; R 2 is a carboxy protecting group; X is a halogen), Process of:

(第 1工程)化合物 (Π)のカルボキシを保護して化合物 (III)を製造する工程、 (Step 1) A step of producing compound (III) by protecting carboxy of compound (Π),

(第 2工程)化合物 (III)を化合物 (IV)と反応させて化合物 (V)を製造する工程、およ び (Step 2) A step of producing Compound (V) by reacting Compound (III) with Compound (IV), and

(第 3工程)ィ匕合物 (V)を脱保護反応に付した後、所望によりァミンと反応させる工程 を包含することを特徴とする、上記 1記載の化合物 (I)またはそのアミン塩の製造方法  (Step 3) The compound (I) or the amine salt thereof according to (1) above, which comprises a step of subjecting the compound (V) to a deprotection reaction and optionally reacting with an amine. Production method

(8) R1はアルキルシリルおよび/または R2はアルコキシアルキルである、上記 7記載 の製造方法。 (8) The production method according to the above 7, wherein R 1 is alkylsilyl and / or R 2 is alkoxyalkyl.

(9) R1は t—ブチルジメチルシリルおよび/または R2は 1—イソブトキシェチルである 、上記 7記載の製造方法。 (9) The production method according to the above 7, wherein R 1 is t-butyldimethylsilyl and / or R 2 is 1-isobutoxyl.

(10)上記 1に記載の化合物(I)またはそのアミン塩のカルボキシ部分を活性エステ ル化、活性酸無水物化、チオールエステル化、ァリールエステルイ匕またはへテロァリ ールエステルイ匕する工程を包含する、式:  (10) comprising a step of subjecting the carboxy moiety of the compound (I) or the amine salt thereof as described in 1 above to an active esterification, an active acid anhydride formation, a thiol esterification, an aryl ester ester or a heteroester ester ester. Formula:

[化 6]  [Chemical 6]

Figure imgf000006_0001
Figure imgf000006_0001

(式中、 COZは、カルボキシル基の活性エステルもしくは活性酸無水物、保護基で保 護されたチオールカルボキシル基、置換ァリールォキシカルボ-ル基、またはへテロ ァリールォキシカルボ-ル基)で示される化合物 (VI)の製造方法。 (In the formula, COZ represents an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected by a protective group, a substituted aryloxy group, or a heteroaryl carbon group. ) A method for producing a compound (VI) represented by:

(11)上記 1に記載の化合物(I)またはそのアミン塩のカルボキシ部分を、縮合剤存 在下、チオールエステル化することにより、 COZが COSPh(Phはフエ-ル)である化 合物 (VI)を製造する、上記 10記載の製造方法。  (11) A compound in which COZ is COSPh (Ph is phenol) by thiol-esterifying the carboxy moiety of the compound (I) or amine salt thereof described in 1 above in the presence of a condensing agent (VI 11. The production method according to 10 above, wherein

(12)縮合剤力 Ph P(0)C1、 (PhO) P(0)Cl (Phはフ -ル)または 2-クロ口- 4,6- ジメトキシトリアジンである、上記 11記載の製造方法。 (12) Condensation agent power Ph P (0) C1, (PhO) P (0) Cl (Ph is full) or 2-black port-4,6- 12. The production method according to 11 above, which is dimethoxytriazine.

(13)上記 10記載の方法により化合物 (VI)を製造した後、これをヒドロキシの保護反 応に付すことにより、式:  (13) After the compound (VI) is produced by the method described in the above 10, it is subjected to a protective reaction of hydroxy to give the formula:

[化 7] [Chemical 7]

Figure imgf000007_0001
Figure imgf000007_0001

(式中、 COZは、カルボキシル基の活性エステルもしくは活性酸無水物、チオール力 ルポキシル基の保護基で保護されたチオールカルボキシル基、置換ァリールォキシ カルボニル基、またはへテロアリールォキシカルボ-ル基; R3はヒドロキシ保護基)で 示される化合物 (VII)を製造した後、これを塩基で処理し、さらに水酸基の活性エス テル化剤で処理する工程を包含する、式: (In the formula, COZ is an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected with a protecting group for a thiol force propyloxyl group, a substituted aryloxycarbonyl group, or a heteroaryloxycarbonyl group; R 3 comprises preparing a compound (VII) represented by hydroxy protecting group), then treating it with a base, and further treating with a hydroxyl active esterifying agent.

[化 8]  [Chemical 8]

Figure imgf000007_0002
Figure imgf000007_0002

(式中、 R3はヒドロキシ保護基; Lはエステルイ匕されたヒドロキシ基)で示される化合物(Wherein R 3 is a hydroxy protecting group; L is an esterified hydroxy group)

(VIII)の製造方法。 A production method of (VIII).

(14) はァルキルシリル、2は—3?11、および Zまたは Lは— OP(OXOPh) (Phは  (14) is alkylsilyl, 2 is -3 to 11, and Z or L is OP (OXOPh) (Ph

2 フエニル)である、上記 13記載の製造方法。  14. The production method of the above-mentioned 13, which is 2 phenyl).

(15)上記 14記載の方法により化合物 (VIII)を製造した後、式: R4— SH (R4はカル バぺネム誘導体の 2位に結合し得るチォエーテル型側鎖の残基)で示される化合物(15) After the compound (VIII) is produced by the method described in 14 above, it is represented by the formula: R 4 — SH (R 4 is a residue of a thioether-type side chain capable of binding to the 2-position of the carbapenem derivative) Compound

(IX)またはその塩と反応させ、得られたィ匕合物を脱保護する工程を包含する、式 Reacting with (IX) or a salt thereof and deprotecting the resulting compound

Figure imgf000008_0001
Figure imgf000008_0001

(式中、 R4は前記と同意義)で示される化合物 (X)、その製薬上許容される塩または それらの溶媒和物の製造方法。 (Wherein R 4 is as defined above), a method for producing a compound (X), a pharmaceutically acceptable salt thereof, or a solvate thereof.

発明の効果  The invention's effect

[0005] 本発明は、力ルバぺネム誘導体の新規な合成中間体、その製造方法、およびそれ を用いた力ルバぺネム誘導体の製造方法を提供する。本発明の製法により目的の力 ルバぺネム誘導体を効率よぐ高収率で合成できる。  [0005] The present invention provides a novel synthetic intermediate of force rubapenem derivative, a method for producing the same, and a method for producing force rubapenem derivative using the same. By the production method of the present invention, the target strength rubapenem derivative can be synthesized in high yield with high efficiency.

発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION

[0006] 本発明中、各用語は特に断らない限り、単独または併用で、以下の意味を示す。 [0006] In the present invention, each term has the following meanings singly or in combination unless otherwise specified.

ヒドロキシの保護基としては、トリアルキルシリル (例:トリメチルシリル、 t—ブチルジメ チルシリル)、ァシル(例:ァセチル、ビバロイル)、低級アルキル(例:メチル、ェチル) 、低級アルコキシ低級アルキル(例:メトキシメチル、メトキシェチル)、低級アルキルス ルホ-ル(例:メタンスルホ -ル)、低級アルコキシカルボ-ル(例:メトキシカルボ-ル 、 t ブチルォキシカルボ-ル)、ァラルキルォキシカルボ-ル(例:ベンジルォキシカ ノレボニノレ、 o 二トロべンジノレ才キシカノレボニノレ、 p 二トロべンジノレ才キシカノレボニ ル、 p—メトキシベンジルォキシカルボ-ル)、置換メチル(例:メトキシメチル、 2—メト キシエトキシメチル、メチルチオメチル)、テトラヒドロビラニル等が例示される。  Examples of the protecting group for hydroxy include trialkylsilyl (eg, trimethylsilyl, t-butyldimethylsilyl), acyl (eg, acetyl, bivaloyl), lower alkyl (eg, methyl, ethyl), lower alkoxy lower alkyl (eg, methoxymethyl, Methoxyethyl), lower alkyl sulfo (eg methanesulfol), lower alkoxy carbo (eg methoxy carboyl, t-butyloxy carbo), aralkyloxy carbo yl (eg benzyloxy) Noreboninole, o Nitrobenzinore, Xicanoreboninole, p Nitrobenzinore, Xicanorebonyl, p-methoxybenzyloxycarbonyl), substituted methyl (eg, methoxymethyl, 2-methoxyethoxymethyl, methylthiomethyl) ), Tetrahydroviranyl and the like.

カルボキシの保護基としては、低級アルキル(例:メチル、ェチル、 n—プロポキシ、 イソプロピル、 t—ブチル)、置換された低級アルキル (置換基の例:低級アルコキシ( 例:メトキシ、エトキシ、 n プロポキシ、イソプロポキシ、 n ブトキシ、イソブトキシ、 t ーブトキシ))、置換または無置換のァラルキル(例:ベンジル、フエネチル、 p—メトキ シベンジル、 2, 4 ジメトキシベンジル、 o ニトロベンジル、 p ニトロベンジル、 p— クロ口ベンジル)、ヘテロ原子(例:0, S, N)が介在していてもよい C3〜C8シクロア ルキル、アルキルシリル(例:トリメチルシリル、 tーブチルジメチルシリル)、低級アルコ キシメチル (例:メトキシメチル、エトキシメチル、イソブトキシメチル)、低級脂肪族ァシ ルォキシメチル(例:ァセトキシメチル、プロピオ-ルォキシメチル、ブチリルォキシメ チル、ビバロイルォキシメチル)、低級アルコキシカルボ-ルォキシェチル(例: 1ーメ トキシカルボ-ルォキシェチル、 1 エトキシカルボ-ルォキシェチル)、置換または 無置換の炭素数 3〜10の 2 低級ァルケ-ル基(例:ァリル、 2—メチルァリル、 3—メ チルァリル、 3—フエ-ルァリル)、置換あるいは無置換のジァリールアルキル基(例: ジフエ-ルメチル、ジ—p ァ-シルメチル)、置換あるいは無置換のァリール基(例: フエ-ノレ、 p クロ口フエ二ノレ、 2, 4, 5 トリクロ口フエ二ノレ、 p -トロフエ-ノレ、 o— - トロフエ-ル、 p—メトキシフエ-ル)、ヘテロァリール(例: 2 ピリジル、 3 ピリジル、 4 —ピリジル、 2 ピリミジル、 2— (4, 6 ジメチル)ピリミジル)が例示される。 Carboxy protecting groups include lower alkyl (eg, methyl, ethyl, n-propoxy, isopropyl, t-butyl), substituted lower alkyl (example of substituent: lower alkoxy (eg, methoxy, ethoxy, n propoxy, Isopropoxy, n-butoxy, isobutoxy, t-butoxy)), substituted or unsubstituted aralkyl (eg benzyl, phenethyl, p-methoxybenzyl, 2, 4 dimethoxybenzyl, o nitrobenzyl, p nitrobenzyl, p— Benzyl)), hetero atoms (eg, 0, S, N) optionally intervening C3-C8 cycloalkyl, alkylsilyl (eg, trimethylsilyl, t-butyldimethylsilyl), lower alkoxymethyl (eg, methoxy) Methyl, ethoxymethyl, isobutoxymethyl), lower aliphatic acyloxymethyl (eg, acetoxymethyl, propio-oxymethyl, butyryloxymethyl, bivalyloxymethyl), lower alkoxycarboxoxyl (eg: 1-methoxycarboxoxyl), 1 ethoxycarboxetyl), substituted or unsubstituted 2 to 10 lower alkyl groups having 3 to 10 carbon atoms (eg, aryl, 2-methylaryl, 3-methylaryl, 3-phenolyl), substituted or unsubstituted Dialylalkyl groups (eg diphenylmethyl, di-p-sylmethyl), Or an unsubstituted aryl group (e.g., phenol, p chlorophene, 2, 4, 5 trichlorophenol, p-tropenol, o--trophenol, p-methoxyphenol) And heteroaryl (eg, 2 pyridyl, 3 pyridyl, 4-pyridyl, 2-pyrimidyl, 2- (4,6 dimethyl) pyrimidyl).

「低級」は、好ましくは C1〜C6、さらに好ましくは C1〜C4を意味する。  “Lower” preferably means C1-C6, more preferably C1-C4.

ハロゲンは、 F、 Cl、 Br、 Iを示す。  Halogen represents F, Cl, Br, or I.

化合物(I)のァミン塩のアミンは、 1級ァミン、 2級ァミン、および 3級ァミンを包含する  Amine salt amines of compound (I) include primary, secondary, and tertiary amines

1級ァミンとしては、メチルァミン、ェチルァミン、イソプロピルァミン、 sec-ブチルアミ ン、 tert-ブチルァミン,イソアミルァミン、 n-デシルァミン、 3-メトキシプロピルァミン、 ベンジルァミン、フエネチルァミン、 4-メトキシフエネチルァミン、 2,2-ジメトキシェチル ァミン、 3,3-ジメトキシプロピルァミン、 p-クロロア-リン、 2- (p-クロ口フエ-ル)ェチルァ ミン、(-) - α -メチルベンジルァミン、 3,4-ジメトキシフエネチルァミン、ベンズヒドリルァ ミン、 2- (4-ァミノフエ-ル)ェチルァミン、 2-ァミノベンジルァミン、(+)-ジヒドロアビエチ ルァミン、 4-メトキシベンジルァミン、 3-メトキシフエネチルァミン、 4- tert-ブチルベン ジルァミン、ァニリン、 4-ブロモ -2-フルォロア二リン、 4,4,-ジチオア二リン、 2,2,-ジチ ォジァ-リンが例示され、好ましくは、メチルァミン、ェチルァミン、イソプロピルアミン 、 tert-ブチルァミン、(-) - a -メチルベンジルァミンである。 Primary amines include methylamine, ethylamine, isopropylamine, sec-butylamine, tert-butylamine, isoamylamine, n-decylamine, 3-methoxypropylamine, benzylamine, phenethylamine, 4-methoxyphenethylamine, 2,2-dimethoxyethylamine, 3,3-dimethoxypropylamine, p-chloroarine, 2- (p-chlorophenol) ethylamine, (-)-α-methylbenzylamine, 3 , 4-Dimethoxyphenethylamine, Benzhydrylamine, 2- (4-aminophenol) ethylamine, 2-aminobenzylamine, (+)-dihydroabietylamine, 4-methoxybenzylamine, 3-methoxy Phenethylamine, 4-tert-butylbenzilamine, aniline, 4-bromo-2-fluoroaniline, 4,4, -dithioaniline, 2,2, -dithiodialin Illustrated, preferably, Mechiruamin, Echiruamin, isopropylamine, tert- Buchiruamin, (-) - a - methyl benzyl § Min.

2級ァミンとしては、ジメチルァミン、ジェチルァミン、ジイソプロピルァミン、ジシクロ へキシルァミン、 3, 5-ジクロロ- 4,4,-ジヒドロキシジフエニルァミン、ベンジル- N-メチル エタノールァミンが例示され、好ましくは、ジイソプロピルァミン、ジシクロへキシルアミ ンである。 Secondary amines include dimethylamine, jetylamine, diisopropylamine, dicyclohexylamine, 3,5-dichloro-4,4, -dihydroxydiphenylamine, benzyl-N-methyl. Ethanolamine is exemplified, and diisopropylamine and dicyclohexylamine are preferable.

3級ァミンとしては、 N-メチルモルホリン、トリェチルァミン、トリブチルァミン、 トリァリ ルァミン、 N-ェチルジイソプロピルァミン、 Ν,Ν-ジメチルブチルァミンが例示される。 化合物 (I)のアミン塩は好ましくは結晶である。上記ァミンの内、化合物 (I)に関して 結晶性が良いのは 1級または 2級ァミンであり、好ましくはメチルァミン、ェチルァミン 、イソプロピルァミン、 tert-ブチルァミン、(-) - α -メチルベンジルァミン、ジイソプロピ ルァミン、ジシクロへキシルァミンであり、さらに好ましくはメチルァミン、ジイソプロピル ァミンである。この内、ジイソプロピルアミンは、特に結晶性がよぐ毒性がなぐかつ β ラタタム環への反応性が低い等の利点を有するので特に好ましい。また次工程 縮合の際、塩基 (酸トラップ剤)としても利用できる。  Examples of tertiary amines include N-methylmorpholine, triethylamine, tributylamine, triarylamine, N-ethyldiisopropylamine, and Ν, Ν-dimethylbutylamine. The amine salt of compound (I) is preferably a crystal. Of the above amines, those having good crystallinity with respect to compound (I) are primary or secondary amines, preferably methylamine, ethylamine, isopropylamine, tert-butylamine, (-)-α-methylbenzylamine, Diisopropylamine and dicyclohexylamine are preferable, and methylamine and diisopropylamine are more preferable. Of these, diisopropylamine is particularly preferred because it has advantages such as low crystallinity, low toxicity, and low reactivity to the β-ratata ring. It can also be used as a base (acid trapping agent) in the next step condensation.

上記アミン塩またはその結晶は、溶媒和物であってもよい。該溶媒としては、水、ァ ルコールが例示される。  The amine salt or the crystal thereof may be a solvate. Examples of the solvent include water and alcohol.

本発明者らの検討結果では、化合物 (I)をァミン塩に変換することにより結晶性が 改善され、高純度の結晶として単離することに成功した。これによつて、化合物 (I)の 合成過程で混入してくる種々の副生成物(例:丁83— 011、丁83—じ1、 (TBS) Ο)  As a result of the study by the present inventors, the crystallinity was improved by converting the compound (I) into an ammine salt, and it was successfully isolated as a high-purity crystal. As a result, various by-products mixed in the synthesis process of compound (I) (eg, Ding 83-011, Ding 83-1, and (TBS) Ο)

2 を容易に除去できる (TBS = t プチルジメチルシリル)。その結果、カラム処理が不 要になり、またそれ以降の工程における反応効率が高まる等の利点が生じる。よって 、本発明製法では特に化合物 (I)のァミン塩、好ましくはその結晶を経由することによ り、種々の力ルバぺネム誘導体を工業的に効率よく合成できる。  2 can be easily removed (TBS = t-butyldimethylsilyl). As a result, there are advantages such as no column treatment and increased reaction efficiency in the subsequent steps. Therefore, in the production method of the present invention, various power rubapenem derivatives can be efficiently synthesized industrially, particularly through the amine salt of compound (I), preferably through its crystal.

上記アミン塩結晶は、粉末 X線解析によって、後記実施例に示す X線回折パターン を示す (X線回折測定条件:管球 CuK o;線、管電圧 40Kv、管電流 15mA、 dsin Θ =η λ (ηは整数、 dは面間隔(単位:オングストローム)、 Θは回折角(単位:度)))。 これらの結晶は、各回折角または面間隔の値によって特徴づけられる。  The above amine salt crystals show the X-ray diffraction pattern shown in the examples below by powder X-ray analysis (X-ray diffraction measurement conditions: tube CuK o; line, tube voltage 40 Kv, tube current 15 mA, dsin Θ = η λ (η is an integer, d is the surface separation (unit: angstrom), Θ is the diffraction angle (unit: degree))). These crystals are characterized by a value of each diffraction angle or spacing.

化合物 (I)およびそのアミン塩の製法にっ 、て説明する。

Figure imgf000011_0001
The production method of compound (I) and its amine salt will be described.
Figure imgf000011_0001

Figure imgf000011_0002
Figure imgf000011_0002

( V ) ( i )  (V) (i)

(式中、 R1はヒドロキシ保護基; R2はカルボキシ保護基; Xはハロゲン) (Wherein R 1 is a hydroxy protecting group; R 2 is a carboxy protecting group; X is a halogen)

(第 1工程) (First step)

化合物 (II)のカルボキシを保護することによりィ匕合物 (III)を得る。当該反応は、通 常のカルボキシの保護反応に準じて行えば良 、。  Compound (III) is obtained by protecting carboxy of compound (II). The reaction may be carried out according to the usual carboxy protection reaction.

R1としては前記のヒドロキシ保護基が例示される力 好ましくは、トリアルキルシリル 、特に tーブチルジメチルシリル (TBS)である。 R 1 is a force exemplified by the above hydroxy protecting group, preferably trialkylsilyl, particularly t-butyldimethylsilyl (TBS).

R2としては前記のカルボキシの保護基が例示される力 好ましくは、低級アルコキシ で置換された低級アルキルであり、例えば、 1—メトキシェチル、 1—エトキシェチル、 1 イソプロポキシェチル、 1 n プロポキシェチル、 1 n ブトキシェチル、 1ーィ ソブトキシェチル、 1 t ブトキシェチルであり、特に好ましくは、 1 イソブトキシェ チルである。これらの保護基は、反応中で 1位 N原子への転位等の副反応が起こりに くい。 R 2 is a force exemplified by the above-mentioned carboxy protecting group, preferably lower alkyl substituted with lower alkoxy, such as 1-methoxyethyl, 1-ethoxyethyl, 1 isopropoxycetyl, 1 n propoxychetil 1 n-butoxystil, 1-sobutoxyl, 1 t-butoxystil, particularly preferably 1-isobutoxyl. These protecting groups are less susceptible to side reactions such as rearrangement to the 1-position N atom during the reaction.

所望により酸等の反応促進剤を使用してもよい。酸としては、メタンスルホン酸、 P - トルエンスルホン酸、塩酸、硫酸、リン酸などが例示される。  If desired, a reaction accelerator such as an acid may be used. Examples of the acid include methanesulfonic acid, P-toluenesulfonic acid, hydrochloric acid, sulfuric acid, phosphoric acid and the like.

反応溶媒としては、炭化水素(例:ペンタン、へキサン、ヘプタン、シクロへキサン、 石油エーテル、トルエン、キシレン)、ハロゲン化炭化水素(例:ジクロロメタン、クロ口 ホルム、四塩化炭素)、アルコール(例:メタノール、エタノール)、ギ酸、酢酸、プロピ オン酸、酢酸ェチル、アセトン、ホルムアミド、ニトロメタン、ァセトニトリル、エーテル( 例:テトラヒドロフラン、ジェチルエーテル)、水それらの混合溶媒等が例示されるが、 好ましくは、トルエン、ァセトニトリル、またはその混合溶媒である。 Reaction solvents include hydrocarbons (eg, pentane, hexane, heptane, cyclohexane, petroleum ether, toluene, xylene), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride), alcohols (eg, : Methanol, ethanol), formic acid, acetic acid, propionic acid, ethyl acetate, acetone, formamide, nitromethane, acetonitrile, ether (eg, tetrahydrofuran, jetyl ether), water and mixed solvents thereof are exemplified. Preferably, it is toluene, acetonitrile, or a mixed solvent thereof.

反応温度は、通常、 0〜100°C、好ましくは 0〜50°C、より好ましくは 10〜30°Cであ る。  The reaction temperature is generally 0-100 ° C, preferably 0-50 ° C, more preferably 10-30 ° C.

反応時間は数時間から数十時間である。  The reaction time is several hours to several tens of hours.

得られる化合物(III)は、単離せずに次工程の反応に付してもよい。  The resulting compound (III) may be subjected to the next step without isolation.

(第 2工程) (Second process)

化合物 (III)を化合物 (IV)と反応させて化合物 (V)を製造する。  Compound (V) is produced by reacting compound (III) with compound (IV).

Xで示されるハロゲンは好ましくは、 Cほたは Brである。  The halogen represented by X is preferably C or Br.

所望により塩基等の反応促進剤を使用してもよい。塩基としては、 NaH、ソジゥム t ert-ブトキサイド、ポタシゥム tert-ブトキサイド、ソジゥム tert-ペントキサイド、 n-ブチ ルリチウム、リチウムジイソプロピルアミド、リチウムビス(トリメチルシリル)アミド、ソジゥ ムビス (トリメチルシリル)アミドが例示される。また所望により層間移動触媒を併用して もよい。層間移動触媒としては、 4級アンモ-ゥム塩 (例:テトラ n-プチルアンモ -ゥム クロライド、テトラ n-ブチルアンモ -ゥムブロマイド等が使用できる。  If desired, a reaction accelerator such as a base may be used. Examples of bases include NaH, sodium tert-butoxide, potassium tert-butoxide, sodium tert-pentoxide, n-butyllithium, lithium diisopropylamide, lithium bis (trimethylsilyl) amide, and sodium bis (trimethylsilyl) amide. . If desired, an interlayer transfer catalyst may be used in combination. As the interlayer transfer catalyst, quaternary ammonium salt (eg, tetra n-butyl ammonium chloride, tetra n-butyl ammonium chloride) can be used.

反応溶媒としては、炭化水素(例:ペンタン、へキサン、ヘプタン、シクロへキサン、 石油エーテル、トルエン、キシレン)、ハロゲン化炭化水素(例:ジクロロメタン、クロ口 ホルム、四塩化炭素)、アルコール(例:メタノール、エタノール)、ギ酸、酢酸、プロピ オン酸、酢酸ェチル、アセトン、ホルムアミド、ニトロメタン、ァセトニトリル、エーテル( 例:テトラヒドロフラン、ジェチルエーテル)、水それらの混合溶媒等が例示されるが、 好ましくは、トルエン、ァセトニトリル、テトラヒドロフランまたはその混合溶媒である。 反応温度は、通常 70〜0°C、好ましくは 50〜一 30°Cである。  Reaction solvents include hydrocarbons (eg, pentane, hexane, heptane, cyclohexane, petroleum ether, toluene, xylene), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride), alcohols (eg, : Methanol, ethanol), formic acid, acetic acid, propionic acid, ethyl acetate, acetone, formamide, nitromethane, acetonitrile, ether (eg, tetrahydrofuran, jetyl ether), water and mixed solvents thereof are preferable, , Toluene, acetonitrile, tetrahydrofuran or a mixed solvent thereof. The reaction temperature is usually 70 to 0 ° C, preferably 50 to 30 ° C.

反応時間は数時間から数十時間である。  The reaction time is several hours to several tens of hours.

得られる化合物 (V)は、単離せずに次工程の反応に付してもよい。  The resulting compound (V) may be subjected to the next step without isolation.

(第 3工程) (3rd process)

化合物 (V)を脱保護反応に付した後、所望によりァミンと反応させることにより、化合 物 (I)またはそのアミン塩を得る。  Compound (V) is subjected to a deprotection reaction and then optionally reacted with amine to give compound (I) or an amine salt thereof.

脱保護反応は、通常のカルボキシの脱保護反応の条件に準じて行えばよい。好ま しくは化合物 (V)を酸で処理すればよい。酸としては、塩酸、硫酸、硫酸水素カリウム 、硫酸水素ナトリウム、硝酸、燐酸、燐酸二水素ナトリウム、燐酸二水素カリウムが例 示される。反応時間は、通常、数分〜数十時間である。 The deprotection reaction may be carried out in accordance with the conditions for a normal carboxy deprotection reaction. Preferably, compound (V) may be treated with an acid. Acids include hydrochloric acid, sulfuric acid, potassium hydrogen sulfate Examples are sodium hydrogen sulfate, nitric acid, phosphoric acid, sodium dihydrogen phosphate, and potassium dihydrogen phosphate. The reaction time is usually several minutes to several tens of hours.

ァミンとの反応は、通常、氷冷下〜室温で行われる。アミン塩として晶析させる場合 、所望により、種晶を添加してもよい。晶析に使用する溶媒としては、炭化水素 (例: ペンタン、へキサン、ヘプタン、シクロへキサン、石油エーテル、トルエン、キシレン)、 ハロゲン化炭化水素(例:ジクロロメタン、クロ口ホルム、四塩化炭素)、アルコール(例 :メタノール、エタノール)、ギ酸、酢酸、プロピオン酸、酢酸メチル、酢酸ェチル、酢 酸プロピル、酢酸ブチル、アセトン、ホルムアミド、ニトロメタン、ァセトニトリル、エーテ ル (例:テトラヒドロフラン、ジェチルエーテル)、水それらの混合溶媒等が例示される 。また結晶化において、所望により、加熱処理、超音波処理や攪拌等を行ってもよい さらに化合物(I)またはそのアミン塩は、特開平 6— 316559号に記載の方法に従 い、 4位のカルボキシ部分を活性エステル化、活性酸無水物化、チオールエステル ィ匕、ァリールエステルイ匕またはへテロアリールエステルイ匕することにより、以下に示す 公知化合物 (VI)に変換できる。  The reaction with amine is usually carried out under ice cooling to room temperature. When crystallizing as an amine salt, a seed crystal may be added if desired. Solvents used for crystallization include hydrocarbons (eg, pentane, hexane, heptane, cyclohexane, petroleum ether, toluene, xylene), halogenated hydrocarbons (eg, dichloromethane, chloroform, carbon tetrachloride). , Alcohol (eg methanol, ethanol), formic acid, acetic acid, propionic acid, methyl acetate, ethyl acetate, propyl acetate, butyl acetate, acetone, formamide, nitromethane, acetonitrile, ether (eg tetrahydrofuran, jetyl ether), Examples thereof include water and mixed solvents thereof. In crystallization, if necessary, heat treatment, ultrasonic treatment, stirring, etc. may be performed. Further, compound (I) or an amine salt thereof is in the 4-position according to the method described in JP-A-6-316559. By converting the carboxy moiety into an active ester, an activated acid anhydride, a thiol ester, an aryl ester or a heteroaryl ester, it can be converted into the following known compound (VI).

[化 11] [Chemical 11]

Figure imgf000013_0001
Figure imgf000013_0001

(式中、 COZは、カルボキシル基の活性エステルもしくは活性酸無水物、保護基で保 護されたチオールカルボキシル基、置換ァリールォキシカルボ-ル基、またはへテロ ァリールォキシカルボ-ル基) (In the formula, COZ represents an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected by a protective group, a substituted aryloxy group, or a heteroaryl carbon group. )

COZがカルボキシル基の活性エステルまたは活性酸無水物である場合には、 Z基 としては例えば塩素、臭素、ヨウ素のようなハロゲン原子;例えばエトキシカルボ-ル ォキシ、イソプロピルォキシカルボルォキシ、 sec—ブチルォキシカルボニルォキシの ような炭素数 1〜5の低級アルキルォキシカルボ-ルォキシ基;例えばメタンスルホ- ルォキシのような炭素数 1〜4の低級アルカンスルホ -ルォキシ基;例えば p—トルェ ンスルホ-ルォキシのようなァリールスルホ -ルォキシ基;例えばジメチルホスホリル ォキシ、ジェチルホスホリルォキシのようなジ(炭素数 1〜4の低級アルキル)ホスホリ ルォキシ基;例えばジ(フエ-ル)ホスホリルォキシのようなジァリールホスホリルォキ シ基;例えば N—サクシイミドォキシ、 N—フタルイミドォキシのような環状イミドォキシ 基;イミダゾール、トリァゾールのようなへテロァリール基;例えば 3— (2—チォキソ) - チアゾリジニルのようなへテロシクロアルキル基等を挙げることができる。 When COZ is an active ester of a carboxyl group or an active acid anhydride, the Z group may be a halogen atom such as chlorine, bromine or iodine; for example, ethoxycarboxoxy, isopropyloxycarboxoxy, sec- Lower alkyloxycarboxoxy groups having 1 to 5 carbon atoms such as butyroxycarbonyloxy; A lower alkanesulfo-loxy group having 1 to 4 carbon atoms such as ruoxy; for example, an arylsulfo-loxy group such as p-toluenesulfo-loxy; for example, di (carbon number 1) such as dimethylphosphoryloxy and jetylphosphoryloxy -4 lower alkyl) phosphoryloxy groups; diarylphosphoryloxy groups such as di (phenol) phosphoryloxy; cyclic imidooxy groups such as N-succinimidoxy, N-phthalimidoxy Groups; heteroaryl groups such as imidazole and triazole; heterocycloalkyl groups such as 3- (2-thioxo) -thiazolidinyl, and the like.

COZが保護されたカルボキシル基またはチオールカルボキシル基である場合に用 いられるカルボキシル基の保護基およびチオールカルボキシル基の保護基は前述と 同様のものを好適なものとして挙げることができる。さらに置換ァリールォキシ基として は好適なものとして P— -トロフエ-ルォキシ、 o— -トロフエ-ルォキシ、 2, 4, 5—トリ クロ口フエニルォキシ等を挙げることができ、ヘテロァリールォキシ基としては o—ピリ ジルォキシ、 p -ピリジルォキシ等を挙げることができる。  Suitable examples of the protective group for the carboxyl group and the protective group for the thiol carboxyl group used when COZ is a protected carboxyl group or a thiol carboxyl group are the same as those described above. Furthermore, preferred examples of the substituted aryloxy group include P--trophenyloxy, o--trophenyloxy, 2,4,5-trichlorophenyloxy, etc., and the heteroaryloxy group includes o —Pyridyloxy, p-pyridyloxy and the like can be mentioned.

上記の化合物(I)から (VI)への変換は、好ましくは縮合剤存在下で行われる。より 好ましくは、化合物(I)またはそのアミン塩のカルボキシ部分を、縮合剤存在下、チォ ールエステル化することにより、 COZが COSPh (Phはフエ-ル)である化合物(V I) を製造できる。  The conversion from the above compound (I) to (VI) is preferably carried out in the presence of a condensing agent. More preferably, compound (VI) in which COZ is COSPh (Ph is a phenol) can be produced by subjecting the carboxy moiety of compound (I) or its amine salt to a thioester in the presence of a condensing agent.

縮合剤としては、種々のものが使用可能である力 好ましくは、 ClCOOiBu、 tBuC OCl、 CDI (カルボキシジイミダゾール)、 Ph P (0) C1、 (PhO) P (0) C1, (PhO) P (  As a condensing agent, various forces can be used. Preferably, ClCOOiBu, tBuC OCl, CDI (carboxydiimidazole), Ph P (0) C1, (PhO) P (0) C1, (PhO) P (

2 2  twenty two

0) C1、 2—クロ口— 4, 6—ジメトキシトリアジンが例示され、より好ましくは Ph P(0)C1  0) C1, 2—Black mouth—4, 6-Dimethoxytriazine, more preferably Ph P (0) C1

2 2 twenty two

、 (PhO) P (0) Cほたは 2—クロ口— 4, 6—ジメトキシトリアジンである。縮合剤の選 (PhO) P (0) C is 2-black mouth-4, 6-dimethoxytriazine. Selection of condensing agent

2  2

択に応じて、上記反応は、好ましくは 70%以上、より好ましくは 80%以上、さらに好ま しくは 90%以上の高収率で反応する。 Depending on the choice, the above reaction is preferably performed in a high yield of 70% or more, more preferably 80% or more, and even more preferably 90% or more.

また上記反応は所望により酸捕捉剤を併用してもよい。酸捕捉剤としては前記アミ ンが使用可能である。  Further, the above reaction may be used in combination with an acid scavenger if desired. The above-mentioned amine can be used as the acid scavenger.

さらに化合物 (VI)をヒドロキシの保護反応に付すことにより、式:  Further, by subjecting compound (VI) to a hydroxy protection reaction, the formula:

[化 12]

Figure imgf000015_0001
[Chemical 12]
Figure imgf000015_0001

(式中、 cozは、カルボキシル基の活性エステルもしくは活性酸無水物、チオール力 ルポキシル基の保護基で保護されたチオールカルボキシル基、置換ァリールォキシ カルボニル基、またはへテロアリールォキシカルボ-ル基; R3はヒドロキシ保護基)で 示される化合物 (VII)を製造した後、特開平 6— 316559号に記載の方法に従い、こ れを塩基で処理し、さらに水酸基の活性エステル化剤で処理することにより、式:(Wherein, coz is an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected with a protecting group for a thiol force lpoxyl group, a substituted aryloxycarbonyl group, or a heteroaryloxycarbonyl group; R (3 ) is a hydroxy protecting group), after the production of compound (VII), it is treated with a base according to the method described in JP-A-6-316559, and further treated with an active esterifying agent for a hydroxyl group. ,formula:

[化 13] [Chemical 13]

Figure imgf000015_0002
Figure imgf000015_0002

(式中、 R3はヒドロキシ保護基; Lはエステルイ匕されたヒドロキシ基)で示される化合物 (VIII)を製造できる。 (Wherein R 3 is a hydroxy protecting group; L is an esterified hydroxy group), (VIII).

R3としては前記のヒドロキシ保護基が例示される力 好ましくは、トリアルキルシリル 、特にトリメチルシリル (TMS)である。特に化合物 (VIII)を使用してドリぺネムを製造 する場合には、脱保護のしゃすさの点で TMSが好ましく使用される。 R 3 is a force exemplified by the above hydroxy protecting group, preferably trialkylsilyl, especially trimethylsilyl (TMS). In particular, when producing doripenem using compound (VIII), TMS is preferably used in terms of deprotection.

詳しくは、化合物 (VII)を不活性溶媒中、塩基で処理後、中間体を単離せず反応液 中の活性エステルもしくは活性酸無水物の残基または保護されたチオールカルボキ シル基のチオール残基(Z-)をョードメタン、ョードプロパン、臭化ァリル、臭化べンジ ル、 p—トルエンスルホン酸メチルエステル等のアルキル化剤、 p—トルエンスルホ- ルクロリド、メタンスルホユルクロリド等のァシル化剤によって捕捉した後、水酸基の活 性エステル化剤と処理すればょ ヽ。 Specifically, after treating compound (VII) with an inert solvent with a base, the intermediate is not isolated and the residue of the active ester or acid anhydride or the thiol residue of the protected thiolcarboxyl group in the reaction solution is isolated. (Z-) is captured by alkylating agents such as iodomethane, odopropane, allylic bromide, benzyl bromide, p-toluenesulfonic acid methyl ester, and acylating agents such as p-toluenesulfuric chloride and methanesulfuruyl chloride. After activation of the hydroxyl group If treated with a natural esterifying agent.

Lで示される水酸基の活性エステルとは、例えば置換もしくは無置換ァリールスルホ ン酸エステル基 (置換もしくは無置換ァリールスルホ-ルォキシ基)、低級アルカンス ルホン酸エステル基(低級アルカンスルホ-ルォキシ基)、ハロゲノ低級アルカンスル ホン酸エステル基(ノヽロゲノ低級アルカンスルホ-ルォキシ基)またはジァリールホス ホリックアシッドエステル基 (ジァリールホスホリルォキシ基)を示すか、またはハロゲン 化水素とのエステルであるハロゲンィ匕物原子を示す。したがって、水酸基の活性エス テル化剤とは、上述のような活性エステルを生成する試剤である。さらに、置換もしく は無置換ァリ一ルスルホン酸エステルとしては、例えばベンゼンスルホン酸エステル 、 p トルエンスルホン酸エステル、 p -トロベンゼンスルホン酸エステル、 p ブロ モベンゼンスルホン酸エステルなどを、低級アルカンスルホン酸エステルとしては、例 えばメタンスルホン酸エステル、エタンスルホン酸エステルなどを、ハロゲノ低級アル カンスルホン酸エステルとしては、例えばトリフルォロメタンスルホン酸エステルなどを 、ジァリールホスホリックアシッドエステルとしては、例えばジフエ-ルホスホリックァシ ッドエステルなどを、またハロゲンィ匕物としては、例えば塩素、臭素、ヨウ素化物など を挙げることができる。このようなアルコールの活性エステルの中で好適なものとして は、 p トルエンスルホン酸エステル、メタンスルホン酸エステル、ジフエ-ルホスホリ ック酸エステルを挙げることができ、好ましくは、ジフエ-ルホスホリック酸エステルで ある。よって活性エステル化剤として好ましくは、ジフエ-ルホスホリック酸クロライド( 例:ジフエ-ルホスホリック酸クロライド)である。  The active ester of a hydroxyl group represented by L is, for example, a substituted or unsubstituted aryl sulfonic acid ester group (substituted or unsubstituted aryl sulfonic sulfo-oxy group), a lower alkane sulfonic acid ester group (lower alkane sulfo-oxy group), a halogeno lower alkanthol. It represents a phosphonic acid ester group (norogeno-lower alkanesulfo-oxyloxy group) or a dialyl phosphoric acid ester group (diarylphosphoryloxy group) or a halogenated metal atom that is an ester with a hydrogen halide. Therefore, the active esterifying agent for a hydroxyl group is a reagent that produces an active ester as described above. Furthermore, examples of the substituted or unsubstituted aryl sulfonic acid ester include benzene sulfonic acid ester, p toluene sulfonic acid ester, p-trobenzene sulfonic acid ester, and p bromobenzene sulfonic acid ester. Examples of the acid ester include methanesulfonic acid ester and ethanesulfonic acid ester. Examples of the halogeno lower alkanesulfonic acid ester include trifluoromethanesulfonic acid ester. Examples of the dialyl phosphoric acid ester include Examples of the diphenyl phosphoric acid ester and the halogenated compounds include chlorine, bromine, and iodide. Among these active esters of alcohol, p-toluenesulfonic acid ester, methanesulfonic acid ester and diphenylphosphoric acid ester can be mentioned, and diphenylphosphoric acid ester is preferable. . Accordingly, diphenyl phosphoric acid chloride (eg, diphenyl phosphoric acid chloride) is preferable as the active esterifying agent.

化合物 (VII)を不活性溶媒中で処理する際の塩基としては、リチウムジイソプロピル アミド、リチウムビス(トリメチルシリル)アミド、ソジゥムアミド等のアミン類の金属塩、ポ タシゥム tーブトキサイド等のアルコール類の金属塩、水素化ナトリウム、水素化力リウ ム等の水素化アルカリ金属類およびソジゥムメチルスルフィ二ルメチド等を挙げること ができる。塩基の使用量は、通常、 1.5〜3当量である。好適な反応温度は— 75°C〜 50°Cである。  Bases for treating compound (VII) in an inert solvent include metal salts of amines such as lithium diisopropylamide, lithium bis (trimethylsilyl) amide, and sodium amide, metal salts of alcohols such as potassium tert-butoxide, Examples thereof include alkali metal hydrides such as sodium hydride and lithium hydride, and sodium methylsulfinylmethide. The amount of base used is usually 1.5 to 3 equivalents. The preferred reaction temperature is -75 ° C to 50 ° C.

上記反応において好ましくは、 R3はアルキルシリル、 Zは SPh、および Zまたは L は OP(OXOPh) (Phはフ -ル)である。 化合物(環)は、特開平 1— 79180、特開平 6— 316559、特開平 5— 294970号 、 USP 5, 317, 016等に記載の方法に準じて、式: R4— SH (R4は力ルバぺネム誘 導体の 2位に結合し得るチォエーテル型側鎖の残基)で示される化合物(IX)または その塩と反応させ、得られたィ匕合物を所望により脱保護することにより、式 In the above reaction, preferably R 3 is alkylsilyl, Z is SPh, and Z or L is OP (OXOPh) (Ph is full). The compound (ring) has the formula: R 4 — SH (R 4 is the same as the method described in JP-A-1-79180, JP-A-6-316559, JP-A-5-294970, USP 5,317,016, etc. By reacting with the compound (IX) or a salt thereof represented by the thioether-type side chain residue capable of binding to the 2-position of the rubabapenem derivative and optionally deprotecting the resulting compound. ,formula

[化 14]  [Chemical 14]

Figure imgf000017_0001
Figure imgf000017_0001

(式中、 R4は前記と同意義)で示される化合物 (X)、その製薬上許容される塩または それらの溶媒和物が製造できる。 (Wherein R 4 is as defined above), a pharmaceutically acceptable salt thereof or a solvate thereof can be produced.

製薬上許容される塩としては、塩基性塩として、例えば、ナトリウム塩、カリウム塩等 のアルカリ金属塩;カルシウム塩、マグネシウム塩等のアルカリ土類金属塩;アンモ- ゥム塩;トリメチルァミン塩、トリェチルァミン塩、ジシクロへキシルァミン塩、エタノール アミン塩、ジエタノールアミン塩、トリエタノールアミン塩、ブロカイン塩、メダルミン塩、 ジエタノールアミン塩またはエチレンジァミン塩等の脂肪族ァミン塩; Ν,Ν-ジベンジル エチレンジァミン、ベネタミン塩等のァラルキルアミン塩;ピリジン塩、ピコリン塩、キノリ ン塩、イソキノリン塩等のへテロ環芳香族ァミン塩;テトラメチルアンモ -ゥム塩、テトラ ェチルァモ -ゥム塩、ベンジルトリメチルアンモ -ゥム塩、ベンジルトリェチルアンモ- ゥム塩、ベンジルトリブチルアンモ -ゥム塩、メチルトリオクチルアンモ -ゥム塩、テトラ ブチルアンモ-ゥム塩等の第 4級アンモ-ゥム塩;アルギニン塩、リジン塩等の塩基 性アミノ酸塩等が挙げられる。酸性塩としては、例えば、塩酸塩、硫酸塩、硝酸塩、リ ン酸塩、炭酸塩、炭酸水素塩、過塩素酸塩等の無機酸塩;酢酸塩、プロピオン酸塩 、乳酸塩、マレイン酸塩、フマール酸塩、酒石酸塩、リンゴ酸塩、クェン酸塩、ァスコ ルビン酸塩等の有機酸塩;メタンスルホン酸塩、イセチオン酸塩、ベンゼンスルホン 酸塩、 Ρ-トルエンスルホン酸塩等のスルホン酸塩;ァスパラギン酸塩、グルタミン酸塩 等の酸性アミノ酸等が挙げられる。溶媒和物としては、水和物やアルコール和物が例 示される。 Examples of pharmaceutically acceptable salts include basic salts such as alkali metal salts such as sodium salts and potassium salts; alkaline earth metal salts such as calcium salts and magnesium salts; ammonium salts; trimethylamine salts. , Triethylamine salt, dicyclohexylamine salt, ethanolamine salt, diethanolamine salt, triethanolamine salt, brocaine salt, medalamine salt, diethanolamine salt or aliphatic amine amine salt such as ethylenediamine salt; Ν, Ν-dibenzyl ethylenediamine, Aralkylamine salts; Heterocyclic aromatic amine amines such as pyridine salts, picoline salts, quinoline salts, isoquinoline salts; tetramethylammonium salts, tetraethylammonium salts, benzyltrimethylammonium salts, benzyltrie Tiluamum salt, benzyltri Examples include quaternary ammonium salts such as butyl ammonium salt, methyl trioctyl ammonium salt and tetrabutyl ammonium salt; and basic amino acid salts such as arginine salt and lysine salt. Examples of the acid salt include inorganic acid salts such as hydrochloride, sulfate, nitrate, phosphate, carbonate, bicarbonate, perchlorate; acetate, propionate, lactate, maleate , Organic acid salts such as fumarate, tartrate, malate, citrate, and ascorbate; sulfonic acids such as methanesulfonate, isethionate, benzenesulfonate, and ト ル エ ン -toluenesulfonate Salt: aspartate, glutamate And acidic amino acids such as Examples of solvates include hydrates and alcohol solvates.

化合物 (X)としては、 (1)チェナマイシン、 (2)イミぺネム、 (3)メロぺネム、 (4)ビア ぺネム、 (5)パニぺネム、 (6) BQ— 2727、(7) S— 4661 (ドリぺネム)などが例示さ れる (各" SR4"を以下に示す)。 Compound (X) includes: (1) cenamycin, (2) imipenem, (3) meropenem, (4) beer penem, (5) panipenem, (6) BQ-2727, (7 ) S-4661 (Doripenem) is an example (each "SR 4 " is shown below).

[化 15] [Chemical 15]

Figure imgf000018_0001
以下に実施例を示す。
Figure imgf000018_0001
Examples are shown below.

(略号) (Abbreviation)

TBS :t ブチルジメチルシリル TMS :トリメチルシリル tBu:t ブチル  TBS: t butyldimethylsilyl TMS: trimethylsilyl tBu: t butyl

iPr:イソプロピル Ph:フエニル Ally CH CH=CH Alloc: CO CH CH=CH iPr: Isopropyl Ph: Phenyl Ally CH CH = CH Alloc: CO CH CH = CH

2 2 2 2 :  2 2 2 2:

DMF:ジメチルホルムアミド THF:テトラヒドロフラン  DMF: Dimethylformamide THF: Tetrahydrofuran

[化 16] [Chemical 16]

Figure imgf000019_0001
Figure imgf000019_0001

TMSCI, iPr2NHTMSCI, iPr 2 NH

AcOEt -DMFAcOEt -DMF

Figure imgf000019_0002
Figure imgf000019_0002

Figure imgf000019_0003
Figure imgf000019_0003

Figure imgf000019_0004
Figure imgf000019_0004

8 9 実施例 1 (1→4)  8 9 Example 1 (1 → 4)

(1)ソジゥムハイドライド (純度: 60%) 12.21 g(1.15 eq)、トルエン 120 ml、ァセトニトリル 40 mlの懸濁液に 40°C加熱下、 tert-ァミルアルコール 34.9 ml(1.2 eq)のトルエン 40 ml溶液を滴下し、そのまま 20分撹拌した後、室温まで冷却した (以下、ソジゥム tert- ペントキサイドのトルエン-ァセトニトリル溶液という)。  (1) Sodium hydride (purity: 60%) 12.21 g (1.15 eq), 120 ml of toluene, 40 ml of acetonitrile, heated at 40 ° C, 34.9 ml (1.2 eq) of tert-amyl alcohol Toluene 40 ml solution was added dropwise and stirred as it was for 20 minutes, and then cooled to room temperature (hereinafter referred to as a toluene-acetonitrile solution of sodium tert-pentoxide).

化合物 1 (80.00 g, 0.2654 mol )にパラトルエンスルホン酸 91 mg(0.002 eq)、無水トル ェン 400 mlをカ卩え、室温撹拌下、イソブチルビニルエーテル 44.99 g(1.3 eq)を加え、 そのまま 2.5時間撹拌した。 To compound 1 (80.00 g, 0.2654 mol), add 91 mg (0.002 eq) of paratoluenesulfonic acid and 400 ml of anhydrous toluene, add 44.99 g (1.3 eq) of isobutyl vinyl ether while stirring at room temperature, and continue for 2.5 hours. Stir.

(2)反応溶媒をトルエンから d -THFに変更して、上記(1)と同様の反応を行った。反  (2) The reaction solvent was changed from toluene to d -THF, and the same reaction as in the above (1) was performed. Anti

8  8

応液の一部を経時的に取り出して NMR測定を行い、原料ィ匕合物 1のピークの消失 を確認した。その場合の NMR値を以下に示す。 NMR値カゝら化合物 2が生成してい )S

Figure imgf000020_0001
A part of the reaction solution was taken out over time and subjected to NMR measurement to confirm the disappearance of the peak of the raw material 1 compound. The NMR value in that case is shown below. NMR value and compound 2 formed ) S
Figure imgf000020_0001

^nffi^、つ 翻 。 ·Π止纖 ^翻 S'I¾(bs S'Dlui SZ ベ ΰ

Figure imgf000020_0002
^ nffi ^. ΠΠ 纖 ^ 翻 S'I¾ (bs S'Dlui SZ
Figure imgf000020_0002

、 μιι οοτ ェ邈 (氺 。: , Μιι οοτ 邈邈 (氺.:

ra 00 ^

Figure imgf000020_0003
oiベエ Ai¾ (氺 οοΐ氺¾»べェ 。:ふ
Figure imgf000020_0004
0r a 00 ^
Figure imgf000020_0003
oi Bei Ai¾ (氺 οοΐ 氺 ¾ »Be
Figure imgf000020_0004
0

9ΐ氺; (bs 9·ΐ)§ 9-SS最軍。 つ 翻 9ΐ^^Ο)¾·、 (b3 S'0)F" Z'W 9ΐ 氺; (bs 9 · ΐ) § 9-SS best army. Tsu 翻 9ΐ ^^ Ο) ¾, ( b3 S'0) F "Z'W

Νε、止 If ^ ^ ^ oof 6 Τ «ffiW«(s)giT(  Νε, Stop If ^ ^ ^ oof 6 Τ «ffiW« (s) giT (

uidd uidd

(ω Ήΐ ) 06"S '( ZH re=f 'b Ήΐ ) 68'S '( ω 'HZ ) OS'S '( ω 'ΗΖ ) Z9'f '( ZH 0·8ΐ ' S'I=f 'PP Ήΐ ) 6Z'f '( ω 'Ηΐ ) 9Vf '( ω 'Ηΐ ) SI' '( 0·8ΐ=ί" 'P 'Ηΐ ) S8T '( ω ' I ) ο ·ε '( ^ 'ΗΪ ) ιζτ '( ω 'ΗΪ ) 66 '( ^ 'HI ) LS'Z '( ^ Ήε ) ε8·ΐ '( ω Ήε ) 8 ε·ΐ '( ω Ή9 ) Ζ'Ϊ '( ω Ή9 ) 06 '( s 'H6 ) 68 '( s 'H9 ) Ο -(OQD) Η Ν-ΗΤ (ω Ήΐ) 06 ''S' (ZH re = f 'b Ήΐ) 68'S' (ω 'HZ) OS'S' (ω 'ΗΖ) Z9'f' (ZH 0 / 8ΐ 'S'I = f' PP)) 6Z'f '(ω' Ηΐ) 9Vf '(ω' Ηΐ) SI '' (0 ・ 8ΐ = ί "'P' Ηΐ) S8T '(ω' I) ο · ε '(^' ΗΪ) ιζτ '( ω 'ΗΪ) 66' (^ 'HI) LS'Z' (^ Ήε) ε8 · ΐ '(ω Ήε) 8 ε · ΐ' (ω Ή9) Ζ'Ϊ '(ω Ϊ9) 06' ( s ' H6 ) 68 '( s ' H9) Ο-(OQD) Η Ν-Η Τ

°- § 6 Τ° 6 Τ

.a>£

Figure imgf000020_0005
ozベエ β¾¾氺、つ 回 S 1 00S氺 ¾簠ベエ ί
Figure imgf000020_0006
00S氺: Z'0)S 9 z-f
Figure imgf000020_0007
-ベ エ ίθ)、 ^ ベ - マ っ灞鱸^ 、 つ。 s—〜(^一、 (b3 ε·ΐ) s 9 -Ϊ94— ^ f
Figure imgf000020_0008
(I) 3IT (ε) uidd ( ZH VQ=i 'i>.a> £
Figure imgf000020_0005
oz beer β¾¾ 氺, times S 1 00S 氺 ¾ 簠 ベ エ ί
Figure imgf000020_0006
00S 氺: Z'0) S 9 zf
Figure imgf000020_0007
-Bee ίθ), ^ Bee-ma ^^, tsu. s— ~ (^ 1, ( b3 ε · ΐ) s 9 -Ϊ94— ^ f
Figure imgf000020_0008
(I) 3IT (ε) uidd (ZH VQ = i 'i>

'HI ) Z8"S '( ω 'Ηΐ ) Vf '( ω 'Ηΐ ) 9ZT '( ω 'Ηΐ ) ΖΥΖ '( ^ 'Ηΐ ) ΖΖ '( ^ 'Ηΐ ) WZ '(ω 'Ηΐ ) 9 '( ω 'Ηΐ ) 8Γΐ '( ω Ήε ) Γΐ '( ΖΗ 2- =Γ 'Ρ Ήε ) 6ΐ·ΐ '( ΖΗ Ζ •Ζ=ί" 'Ρ Ήε ) 8ΐ·ΐ '( ω Ή9 ) 06 '( s Ή6 ) 68 '( s 'H9 ) 80 : ( Η丄」 Ρ) Η顺- Ητ 'HI) Z8 "S' (ω 'Ηΐ) Vf' (ω 'Ηΐ) 9ZT' (ω 'Ηΐ) ΖΥΖ' (^ 'Ηΐ) ΖΖ' (^ 'Ηΐ) WZ' (ω 'Ηΐ) 9' ( ω 'Ηΐ) 8Γΐ' (ω Ήε) Γΐ '( Ζ Η 2- = Γ' Ρ Ήε) 6ΐ ・ ΐ '( Ζ Η Ζ • Ζ = ί "' Ρ ίε) 8ΐ · ΐ '(ω Ή9) 06' (s Ή6) 68 '(s' H9) 80: (Η 丄) Ρ) Η 顺-Η τ

。 SR . SR

81 81

0.66T0/S00Zdf/X3d εΐΐ6ΐ7θ/900Ζ OAV 収率: 65%)得た。 0.66T0 / S00Zdf / X3d εΐΐ6ΐ7θ / 900Ζ OAV Yield: 65%).

Anal. Calcd for C H N O -0.2H O: C, 58.50; H, 8.89; N, 7.18; H O, 0.92. Found:  Anal. Calcd for C H N O -0.2H O: C, 58.50; H, 8.89; N, 7.18; H O, 0.92. Found:

19 34 2 6 2 2 19 34 2 6 2 2

C, 58.74; H, 8.72; N, 7.25, H O, 0.97. JH- NMR (CDC1 ): 1.23 ( 3H, d, J=7.2 Hz ) C, 58.74; H, 8.72; N, 7.25, HO, 0.97. J H-NMR (CDC1): 1.23 (3H, d, J = 7.2 Hz)

2 3  twenty three

, 1.29 ( 6H, d, J=6.3 Hz ), 1.32 ( 3H, d, J=6.3 Hz ), 2.51 ( 1H, m ), 2.89 ( 1H, dd, J =2.1, 9.3 Hz ), 3.34 ( 1H, m ), 3.82 ( 1H, dd, J=1.8, 8.7 Hz ), 3.87 ( 1H, d, 18.6 Hz ), 4.11 ( 1H, m ), 4.31 ( 1H, d, 18 Hz ), 4.63 ( 2H, d, J=5.7 Hz ), 5.31 ( 2H, m ), 5. 90 ( 1H, m ), 7.0 ( 4H, br ) ppm  , 1.29 (6H, d, J = 6.3 Hz), 1.32 (3H, d, J = 6.3 Hz), 2.51 (1H, m), 2.89 (1H, dd, J = 2.1, 9.3 Hz), 3.34 (1H, m), 3.82 (1H, dd, J = 1.8, 8.7 Hz), 3.87 (1H, d, 18.6 Hz), 4.11 (1H, m), 4.31 (1H, d, 18 Hz), 4.63 (2H, d, J = 5.7 Hz), 5.31 (2H, m), 5.90 (1H, m), 7.0 (4H, br) ppm

ジイソプロピルアミン塩 4の粉末 X線回折パターンを図 1に示す。特に、 2 Θ =8.7, 9. 7, 15.7, 22.4度に主ピークを示した。  The powder X-ray diffraction pattern of diisopropylamine salt 4 is shown in FIG. In particular, the main peaks were shown at 2 Θ = 8.7, 9. 7, 15.7, and 22.4 degrees.

実施例 2 (4→6) Example 2 (4 → 6)

化合物 4 80.00 g (純度: 97.2%, 0.201 mol)に酢酸ェチル 311 mlをカ卩え、氷冷撹拌下 、ジフエ-ルリン酸クロライド 64.80 g(1.2 eq)を滴下し、室温で 1時間撹拌した。再び 氷冷し、 DMF 78 mlとチォフエノール 22.7 ml(l.l eq)をカ卩えた後、ジイソプロピルアミ ン 37.1 ml(1.3 eq)を滴下し、そのまま 1.5時間撹拌した。この時点でィ匕合物 5が生成し ていることを HPLC (高速液体クロマト)で確認した。さらに同温度で、トリメチルシリル クロライド 33.2 ml(1.3 eq)とジイソプロピルアミン 42.8 ml(1.5 eq)を順次滴下し、そのま ま 1.5時間撹拌した。 6%重曹水 367 ml(1.3 eq)を加え、室温で 10分撹拌した後、水を 1.2 L加え、分液した。酢酸ェチル層は水 389 mlで 2回洗浄、水層は酢酸ェチル 311 mlで抽出、酢酸ェチル層を合わせ、減圧濃縮した後、トルエン 200 mlを加え、減圧 濃縮し、 6のァメ状残渣 108.16 g (定量値: 85.0 g,収率: 94%)を得た。 To 80.00 g of compound 4 (purity: 97.2%, 0.201 mol), 311 ml of ethyl acetate was added, and 64.80 g (1.2 eq) of diphenyl phosphate chloride was added dropwise with stirring under ice cooling, followed by stirring at room temperature for 1 hour. The mixture was ice-cooled again, and 78 ml of DMF and 22.7 ml (l.l eq) of thiophenol were collected, and then 37.1 ml (1.3 eq) of diisopropylamine was added dropwise and stirred for 1.5 hours. At this point, it was confirmed by HPLC (high performance liquid chromatography) that Compound 5 was formed. Further, at the same temperature, 33.2 ml (1.3 eq) of trimethylsilyl chloride and 42.8 ml (1.5 eq) of diisopropylamine were successively added dropwise and stirred for 1.5 hours. After adding 367 ml (1.3 eq) of 6% sodium bicarbonate water and stirring at room temperature for 10 minutes, 1.2 L of water was added to separate the layers. The ethyl acetate layer was washed twice with 389 ml of water, the aqueous layer was extracted with 311 ml of ethyl acetate, the ethyl acetate layers were combined, concentrated under reduced pressure, 200 ml of toluene was added, and the solution was concentrated under reduced pressure to give a 6-like residue 108.16 g (quantitative value: 85.0 g, yield: 94%) was obtained.

1H-NMR (CDC1 ): 0.15 ( 9H, s ), 1.29 ( 6H, d, J=6.9Hz ), 3.08 ( 1H, dd, J=2.7, 8.1 1H-NMR (CDC1): 0.15 (9H, s), 1.29 (6H, d, J = 6.9Hz), 3.08 (1H, dd, J = 2.7, 8.1

3  Three

Hz ), 3.15 ( 1H, qd, J=6.9, 3.0 Hz ), 2.85 ( 1H, dd, J=0.6, 18.0 Hz ), 4.12 ( 1H, dd, J=2.4, 3.0 Hz ), 4.32 ( 1H, d, 18.0 Hz ), 4.60 ( 2H, m ), 5.27 ( 2H, m ), 6.87 ( 1H, m ), 7.40 (5H, m ) ppm  Hz), 3.15 (1H, qd, J = 6.9, 3.0 Hz), 2.85 (1H, dd, J = 0.6, 18.0 Hz), 4.12 (1H, dd, J = 2.4, 3.0 Hz), 4.32 (1H, d , 18.0 Hz), 4.60 (2H, m), 5.27 (2H, m), 6.87 (1H, m), 7.40 (5H, m) ppm

実施例 3 (6→7) Example 3 (6 → 7)

ソジゥムハイドライド (純度: 60%) 9.86 g(2.3 eq)、トルエン-ァセトニトリル (85- 15) 160 ml の懸濁液に 35°C加熱下、 tert-ァミルアルコール 28.2 ml(1.2 eq)のトルエン-ァセトニ トリル (85- 15) 37 ml溶液を滴下し、そのまま 15分撹拌した。— 45°C冷却撹拌下、実施 例 2で得た 6(純度: 78.6%, 0.107 mol)のトルエン-ァセトニトリル (85 - 15) 95 ml溶液を — 40°C以下で滴下し、そのまま 1.5時間撹拌した。さらに同温度でヨウ化メチル 8.67 ml(1.2 eq)を滴下し、 1.5時間撹拌した後、ジフエ-ルリン酸クロライド 30.22 g(1.05 eq) のトルエン-ァセトニトリル (85 - 15) 27 ml溶液を滴下、氷冷し 2時間 40分撹拌した。これ に重曹 13.5 g(1.5 eq)の水 270 ml溶液を加え、分液。トルエン層は水 270 ml、飽和食 塩水 270 mlで順次洗浄、水層はトルエン 160 mlで抽出、トルエン層を合わせ、減圧 濃縮し、 7のァメ状残渣 92.70 g (定量値: 53.36 g,収率: 87%)を得た。 Sodium hydride (purity: 60%) 9.86 g (2.3 eq), toluene-acetonitrile (85-15) 160 ml suspension in 35 ° C under heating, 28.2 ml (1.2 eq) tert-amyl alcohol A 37 ml solution of toluene-acetononitrile (85-15) was added dropwise, and the mixture was stirred as it was for 15 minutes. — Conducted under 45 ° C cooling and stirring A solution of 6 (purity: 78.6%, 0.107 mol) obtained in Example 2 in 95 ml of toluene-acetonitrile (85-15) was added dropwise at −40 ° C. or lower and stirred for 1.5 hours. Further, 8.67 ml (1.2 eq) of methyl iodide was added dropwise at the same temperature, and the mixture was stirred for 1.5 hours, and then a solution of 30.22 g (1.05 eq) of diphenylphosphate chloride in 27 ml of toluene-acetonitrile (85-15) was added dropwise to ice. It was cooled and stirred for 2 hours and 40 minutes. To this was added a solution of 13.5 g (1.5 eq) of sodium bicarbonate in 270 ml of water, followed by liquid separation. The toluene layer was washed sequentially with 270 ml of water and 270 ml of saturated saline, the aqueous layer was extracted with 160 ml of toluene, the toluene layers were combined, concentrated under reduced pressure, and 92.70 g (quantitative value: 53.36 g, yield) of 7 Rate: 87%).

JH-NMR (CDC1 ): 0.12 ( 9H, s ), 1.19 ( 3H, d, J=7.2 Hz ), 1.25 ( 3H, d, J=6.0 Hz ), JH-NMR (CDC1): 0.12 (9H, s), 1.19 (3H, d, J = 7.2 Hz), 1.25 (3H, d, J = 6.0 Hz),

3  Three

3.25 ( 1H, dd, J=3.0, 6.9 Hz ), 3.46 ( 1H, m ), 4.11 ( 1H, dd, J=3.0, 9.9 Hz ), 4.19 ( 1H, qu, J=6.6 Hz ), 4.66 ( 1H, m ), 5.29 ( 2H, m ), 5.87 ( 1H, m ), 7.31 ( 15H, m ) ppm  3.25 (1H, dd, J = 3.0, 6.9 Hz), 3.46 (1H, m), 4.11 (1H, dd, J = 3.0, 9.9 Hz), 4.19 (1H, qu, J = 6.6 Hz), 4.66 (1H , m), 5.29 (2H, m), 5.87 (1H, m), 7.31 (15H, m) ppm

実施例 4 (7→9) Example 4 (7 → 9)

実施例 3で得られた化合物 7を、特開平 5— 294970の実施例 13に記載の方法に 準じて、 2位側鎖形成用の縮合反応に付して化合物 8を合成し、さらに脱保護反応に 付すことにより、化合物 9 (ドリぺネム)を得る。  According to the method described in Example 13 of JP-A-5-294970, compound 7 obtained in Example 3 was subjected to a condensation reaction for forming a 2-position side chain to synthesize compound 8, and further deprotection By subjecting to reaction, compound 9 (doripenem) is obtained.

実施例 5 Example 5

実施例 1の方法に準じて、化合物 4のフリー体に、ジイソプロピルアミン以外の前記 の各種アミンを反応させることにより、対応するアミン塩を得た。ジシクロへキシルアミ ン塩、メチルァミン塩、ェチルァミン塩、イソプロピルアミン塩、 tーブチルァミン塩、お よび(一) - a—メチルベンジルァミン塩は結晶として得られた。特にジシクロへキシ ルァミン塩、メチルァミン塩、 tーブチルァミン塩、および(一) a メチルベンジル アミン塩は良好な結晶性を示した。粉末 X線回折パターンを図 2〜5に示し、主なピ ークの回折角を以下に示す。  In accordance with the method of Example 1, the corresponding amine salt was obtained by reacting the above-mentioned various amines other than diisopropylamine with the free form of Compound 4. Dicyclohexylamine salt, methylamine salt, ethylamine salt, isopropylamine salt, t-butylamine salt, and (1) -a-methylbenzylamine salt were obtained as crystals. In particular, dicyclohexylamine, methylamine, t-butylamine, and (1) a methylbenzylamine showed good crystallinity. The powder X-ray diffraction patterns are shown in Figures 2 to 5, and the diffraction angles of the main peaks are shown below.

ジシクロへキシノレアミン塩 Dicyclohexenoleamine salt

2 Θ = 8.5, 15.0, 18.1 , 19.3, 21.7, 22.6, 24.5度  2 Θ = 8.5, 15.0, 18.1, 19.3, 21.7, 22.6, 24.5 degrees

メチルァミン塩 Methylamine salt

2 Θ = 9.5, 11.3, 17.6, 18.0, 21.6, 22.3, 23.8, 26.0, 30.5、 33.6度  2 Θ = 9.5, 11.3, 17.6, 18.0, 21.6, 22.3, 23.8, 26.0, 30.5, 33.6 degrees

t ブチルァミン塩 2 θ =6.7, 8.1, 9.7, 13.3, 16.2, 17.7, 19.3, 20.0, 22.7度 t Butylamine salt 2 θ = 6.7, 8.1, 9.7, 13.3, 16.2, 17.7, 19.3, 20.0, 22.7 degrees

(-) - α—メチルベンジルァミン塩 (-)-α-Methylbenzylamine salt

2 Θ =7.2, 17.1, 17.4, 18.0, 18.3, 20.6, 22.5, 25.1, 26.6, 27.3度  2 Θ = 7.2, 17.1, 17.4, 18.0, 18.3, 20.6, 22.5, 25.1, 26.6, 27.3 degrees

実施例 6 Example 6

実施例 5で得られた各種アミン塩を原料にして、実施例 2〜4の方法に準じて化合 物 9を得る。  Using the various amine salts obtained in Example 5 as raw materials, Compound 9 is obtained according to the methods of Examples 2-4.

参考例 Reference example

4-二トロべンジル (2S,4S)-4-ァセチルチオ- 2-(Ν-スルファモイル- tert-ブトキシカル ボキサミドメチル)ピロリジン- 1-カルボキシレート (ATS, 51.0 g)をメタノール (169 ml)に 溶解した。これに 17%塩ィ匕水素/メタノール溶液 (82.8 g)を加え、 35°Cで 2時間、 40°Cで 3時間加熱攪拌して ATSの Boc基とァセチル基が脱保護された 4-ニトロべンジル(2S, 4S)-4-メルカプト- 2-スルファモイル-ァミノメチルピロリジン- 1-カルボキシレート (以下 SPL)へと誘導した。得られた SPL/メタノール溶液を 18 °Cまで冷却し、 10%水酸化ナト リウム水溶液 (130.5 g)を加えて pHを 2.4に調整した。次に酢酸ェチル (357 ml)と食塩 水 (113 ml)を加え、分液操作を行い、 SPLを有機層に抽出した。続いて、有機層を水 ( 357 ml)、 2%食塩水 (119 mi x 2回)で順次洗浄した。生じた 4つの水層はそれぞれ酢酸 ェチル (102 ml)で逆抽出して水層にロスした SPLを回収した。有機層を合併し、脱水 濃縮して得られた濃縮液 (36.9 g)に水 (368 mg, lwt%)を加え、 5°Cで終夜冷却放置し た。析出した結晶を濾取後乾燥して SPLの 0.5水和物結晶 (13.1 g)を得た。また、該結 晶は加温 40 °C、減圧乾燥により無水結晶に変換した。  4-Nitrobenzyl (2S, 4S) -4-acetylylthio-2- (Ν-sulfamoyl-tert-butoxycarboxamidomethyl) pyrrolidine-1-carboxylate (ATS, 51.0 g) was dissolved in methanol (169 ml). To this was added a 17% salt / hydrogen / methanol solution (82.8 g), and the mixture was heated and stirred at 35 ° C for 2 hours and at 40 ° C for 3 hours. Benzyl (2S, 4S) -4-mercapto-2-sulfamoyl-aminomethylpyrrolidine-1-carboxylate (hereinafter referred to as SPL) was derived. The obtained SPL / methanol solution was cooled to 18 ° C., and 10% aqueous sodium hydroxide solution (130.5 g) was added to adjust the pH to 2.4. Next, ethyl acetate (357 ml) and brine (113 ml) were added, liquid separation was performed, and SPL was extracted into the organic layer. Subsequently, the organic layer was washed successively with water (357 ml) and 2% brine (119 mix x 2). The resulting four aqueous layers were back extracted with ethyl acetate (102 ml) to recover SPL lost to the aqueous layer. Water (368 mg, lwt%) was added to the concentrated solution (36.9 g) obtained by combining the organic layers, dehydrating and concentrating, and allowed to cool overnight at 5 ° C. The precipitated crystals were collected by filtration and dried to obtain SPL hemihydrate crystals (13.1 g). The crystals were converted to anhydrous crystals by heating at 40 ° C. and drying under reduced pressure.

[化 17]  [Chemical 17]

Figure imgf000023_0001
Figure imgf000023_0001

0.5水和物結晶のデータ:元素分析 H(%)4.66 C(%)39.06 N(%)13.96 Data of 0.5 hydrate crystal: Elemental analysis H (%) 4.66 C (%) 39.06 N (%) 13.96

また、 0.5水和物結晶及び無水結晶それぞれの粉末 X線回折パターンを In addition, the powder X-ray diffraction patterns of each of the 0.5 hydrate crystals and anhydrous crystals

す。 (X線回折測定条件:管球 Cn、管電圧 40Kv、管電流 40mA) The (X-ray diffraction measurement conditions: tube Cn, tube voltage 40Kv, tube current 40mA)

図面の簡単な説明 Brief Description of Drawings

[図 1]実施例 1で得られたジイソプロピルアミン塩結晶の粉末 X線回折パターンとその ピーク値である。縦軸は強度(単位: cps)、横軸は回折角度(2 Θ、単位:度)を示す。 FIG. 1 is a powder X-ray diffraction pattern and peak value of diisopropylamine salt crystals obtained in Example 1. The vertical axis represents intensity (unit: cps), and the horizontal axis represents diffraction angle (2 Θ, unit: degree).

[図 2]実施例 5で得られたジシクロへキシルァミン塩結晶の粉末 X線回折パターンとそ のピーク値である。 FIG. 2 is a powder X-ray diffraction pattern and peak value of dicyclohexylamine salt crystals obtained in Example 5.

[図 3]実施例 5でメチルァミン塩結晶の粉末 X線回折パターンとそのピーク値である。  FIG. 3 shows a powder X-ray diffraction pattern and peak value of methylamine salt crystals in Example 5.

[図 4]実施例 5で t—プチルァミン塩結晶の粉末 X線回折パターンとそのピーク値であ る。 FIG. 4 shows a powder X-ray diffraction pattern and peak value of t-ptylamine salt crystal in Example 5.

[図 5]実施例 5で(一) - a—メチルベンジルァミン塩結晶の粉末 X線回折パターンと そのピーク値である。  FIG. 5 shows the powder X-ray diffraction pattern and peak value of (1) -a-methylbenzylamine salt crystals in Example 5.

[図 6]参考例 1で得られた SPLの 0.5水和物結晶の粉末 X線回析パターンである。縦軸 は強度 (単位: cps)、横軸は回折角度 (2 Θ、単位:度)を示す。  FIG. 6 is a powder X-ray diffraction pattern of SPL hemihydrate crystals obtained in Reference Example 1. The vertical axis represents intensity (unit: cps), and the horizontal axis represents diffraction angle (2 Θ, unit: degree).

[図 7]参考例 1で得られた SPLの無水結晶の粉末 X線回析パターンである。縦軸は強 度 (単位: cps)、横軸は回折角度 (2 Θ、単位:度)を示す。 FIG. 7 is a powder X-ray diffraction pattern of anhydrous SPL crystals obtained in Reference Example 1. The vertical axis represents intensity (unit: cps), and the horizontal axis represents diffraction angle (2 Θ, unit: degree).

Claims

請求の範囲 The scope of the claims [1] 式:  [1 set: [化 1]  [Chemical 1]
Figure imgf000025_0001
で示される化合物 (I)またはそのアミン塩。
Figure imgf000025_0001
Or a amine salt thereof.
ァミンが 1級ァミンまたは 2級ァミンである、請求項 1記載のアミン塩。  The amine salt according to claim 1, wherein the amine is a primary amine or a secondary amine. ァミンが、メチルァミン、ェチルァミン、イソプロピルァミン、 t—ブチルァミン、(一) a メチルベンジルァミン、ジイソプロピルァミン、またはジシクロへキシルァミンであ る、請求項 1記載のアミン塩。  The amine salt according to claim 1, wherein the amine is methylamine, ethylamine, isopropylamine, t-butylamine, (1) a methylbenzylamine, diisopropylamine, or dicyclohexylamine. [4] ジイソプロピルアミン塩である、請求項 1記載のアミン塩。  [4] The amine salt according to claim 1, which is a diisopropylamine salt. [5] 結晶である、請求項 1〜4のいずれかに記載のアミン塩。 [5] The amine salt according to any one of claims 1 to 4, which is a crystal. [6] 粉末 X線回折パターンにおいて、 2 0 =8.7, 9.7, 15.7, 22.4度に主ピークを示す結晶 である、請求項 4記載のジイソプロピルアミン塩。 6. The diisopropylamine salt according to claim 4, which is a crystal having a main peak at 20 = 8.7, 9.7, 15.7, 22.4 degrees in a powder X-ray diffraction pattern. [7] 以下の反応スキーム:  [7] The following reaction scheme: [化 2]  [Chemical 2]
Figure imgf000025_0002
Figure imgf000025_0003
Figure imgf000025_0002
Figure imgf000025_0003
(式中、 R1はヒドロキシ保護基; R2はカルボキシ保護基; Xはハロゲン)で示され、以下 の工程: (Wherein R 1 is a hydroxy protecting group; R 2 is a carboxy protecting group; X is a halogen), Process of: (第 1工程)化合物 (Π)のカルボキシを保護して化合物 (III)を製造する工程、 (Step 1) A step of producing compound (III) by protecting carboxy of compound (Π), (第 2工程)化合物 (III)を化合物 (IV)と反応させて化合物 (V)を製造する工程、およ び (Step 2) A step of producing Compound (V) by reacting Compound (III) with Compound (IV), and (第 3工程)ィ匕合物 (V)を脱保護反応に付した後、所望によりァミンと反応させる工程 を包含することを特徴とする、請求項 1記載の化合物 (I)またはそのアミン塩の製造方 法。  (Step 3) Compound (I) or an amine salt thereof according to claim 1, which comprises a step of subjecting compound (V) to a deprotection reaction and optionally reacting with amine. Manufacturing method. [8] R1はアルキルシリルおよび Zまたは R2はアルコキシアルキルである、請求項 7記載の 製造方法。 8. The production method according to claim 7, wherein R 1 is alkylsilyl and Z or R 2 is alkoxyalkyl. [9] R1は t—ブチルジメチルシリルおよび Zまたは R2は 1—イソブトキシェチルである、請 求項 7記載の製造方法。 [9] The production method according to claim 7, wherein R 1 is t-butyldimethylsilyl and Z or R 2 is 1-isobutoxyl. [10] 請求項 1に記載の化合物(I)またはそのアミン塩のカルボキシ部分を活性エステルイ匕[10] The carboxy moiety of the compound (I) or the amine salt thereof according to claim 1, is converted into an active ester salt. 、活性酸無水物化、チオールエステル化、ァリールエステル化またはへテロアリール エステルイ匕する工程を包含する、式: Comprising the steps of: activating, anhydride anhydride, thiol esterification, aryl esterification or heteroaryl esterification, [化 3]  [Chemical 3]
Figure imgf000026_0001
Figure imgf000026_0001
(式中、 COZは、カルボキシル基の活性エステルもしくは活性酸無水物、保護基で保 護されたチオールカルボキシル基、置換ァリールォキシカルボ-ル基、またはへテロ ァリールォキシカルボ-ル基)で示される化合物 (VI)の製造方法。 (In the formula, COZ represents an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected by a protective group, a substituted aryloxy group, or a heteroaryl carbon group. ) A method for producing a compound (VI) represented by: 請求項 1に記載の化合物(I)またはそのアミン塩のカルボキシ部分を、縮合剤存在下 、チオールエステル化することにより、 COZが COSPh(Phはフエ-ル)である化合物 (VI)を製造する、請求項 10記載の製造方法。 [12] 縮合剤が、 Ph P(0)C1、 (PhO) P(0)Cl (Phはフエ-ル)または 2-クロ口- 4,6-ジメトキThe compound (VI) in which COZ is COSPh (Ph is phenol) is produced by thiol-esterifying the carboxy moiety of the compound (I) or the amine salt thereof according to claim 1 in the presence of a condensing agent. The production method according to claim 10. [12] The condensing agent is Ph P (0) C1, (PhO) P (0) Cl (Ph is a phenol) or 2-chloro-4,6-dimethoxy. 2 2 twenty two シトリアジンである、請求項 11記載の製造方法。  12. The production method according to claim 11, which is citriazine. [13] 請求項 10記載の方法により化合物 (VI)を製造した後、これをヒドロキシの保護反応 に付すことにより、式: [13] After the compound (VI) is produced by the method according to claim 10, it is subjected to a hydroxy protection reaction to obtain a compound of the formula: [化 4]  [Chemical 4]
Figure imgf000027_0001
Figure imgf000027_0001
(式中、 COZは、カルボキシル基の活性エステルもしくは活性酸無水物、チオール力 ルポキシル基の保護基で保護されたチオールカルボキシル基、置換ァリールォキシ カルボニル基、またはへテロアリールォキシカルボ-ル基; R3はヒドロキシ保護基)で 示される化合物 (VII)を製造した後、これを塩基で処理し、さらに水酸基の活性エス テル化剤で処理する工程を包含する、式: (In the formula, COZ is an active ester or an acid anhydride of a carboxyl group, a thiol carboxyl group protected with a protecting group for a thiol force propyloxyl group, a substituted aryloxycarbonyl group, or a heteroaryloxycarbonyl group; R 3 comprises preparing a compound (VII) represented by hydroxy protecting group), then treating it with a base, and further treating with a hydroxyl active esterifying agent. [化 5]  [Chemical 5]
Figure imgf000027_0002
Figure imgf000027_0002
(式中、 R3はヒドロキシ保護基; Lはエステルイ匕されたヒドロキシ基)で示される化合物 (VIII)の製造方法。 (Wherein R 3 is a hydroxy-protecting group; L is an esterified hydroxy group). [14] R3はアルキルシリル、 Zは SPh、および Zまたは Lは一 OP(OXOPh) (Phはフエ-[14] R 3 is alkylsilyl, Z is SPh, and Z or L is OP (OXOPh) (Ph is 2 2 ル)である、請求項 13記載の製造方法。  14. The production method according to claim 13, wherein [15] 請求項 14記載の方法により化合物 (VIII)を製造した後、式: R4— SH (R4はカルバぺ ネム誘導体の 2位に結合し得るチォエーテル型側鎖の残基)で示される化合物(IX) またはその塩と反応させ、得られた化合物を脱保護する工程を包含する、式 [15] After the production of compound (VIII) by the method according to claim 14, R 4 — SH (R 4 is carba A compound comprising a compound (IX) or a salt thereof represented by (a residue of a thioether-type side chain capable of binding to the 2-position of a nem derivative), and a step of deprotecting the resulting compound [化 6][Chemical 6]
Figure imgf000028_0001
Figure imgf000028_0001
(式中、 R4は前記と同意義)で示される化合物 (X)、その製薬上許容される塩または それらの溶媒和物の製造方法。 (Wherein R 4 is as defined above), a method for producing a compound (X), a pharmaceutically acceptable salt thereof, or a solvate thereof.
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JPH05294970A (en) * 1991-08-20 1993-11-09 Shionogi & Co Ltd Pyrrolidylthiocarbapenem derivative
JPH0656836A (en) * 1992-08-06 1994-03-01 Tanabe Seiyaku Co Ltd Method for producing carbapenem derivative
WO2003089432A1 (en) * 2002-04-22 2003-10-30 Sumitomo Pharmaceuticals Co., Ltd. Process for producing carbapenem derivative

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JPH05294970A (en) * 1991-08-20 1993-11-09 Shionogi & Co Ltd Pyrrolidylthiocarbapenem derivative
JPH0656836A (en) * 1992-08-06 1994-03-01 Tanabe Seiyaku Co Ltd Method for producing carbapenem derivative
WO2003089432A1 (en) * 2002-04-22 2003-10-30 Sumitomo Pharmaceuticals Co., Ltd. Process for producing carbapenem derivative

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2401278A4 (en) * 2009-02-26 2012-07-04 Orchid Chemicals & Pharm Ltd An improved process for the preparation of carbapenem antibiotic

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