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WO2005029178A3 - A system and method for the direct imaging of color filters - Google Patents

A system and method for the direct imaging of color filters Download PDF

Info

Publication number
WO2005029178A3
WO2005029178A3 PCT/IL2004/000882 IL2004000882W WO2005029178A3 WO 2005029178 A3 WO2005029178 A3 WO 2005029178A3 IL 2004000882 W IL2004000882 W IL 2004000882W WO 2005029178 A3 WO2005029178 A3 WO 2005029178A3
Authority
WO
WIPO (PCT)
Prior art keywords
laser
direct imaging
color filters
stripes
expose
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IL2004/000882
Other languages
French (fr)
Other versions
WO2005029178A8 (en
WO2005029178A2 (en
Inventor
Abraham Gross
Raanan Adin
Yigal Katzir
David Fisch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orbotech Ltd
Original Assignee
Orbotech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orbotech Ltd filed Critical Orbotech Ltd
Priority to JP2006526809A priority Critical patent/JP2007506136A/en
Publication of WO2005029178A2 publication Critical patent/WO2005029178A2/en
Priority to IL173669A priority patent/IL173669A0/en
Anticipated expiration legal-status Critical
Publication of WO2005029178A8 publication Critical patent/WO2005029178A8/en
Publication of WO2005029178A3 publication Critical patent/WO2005029178A3/en
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laser Beam Printer (AREA)

Abstract

A system and method for the laser direct imaging of stripe patterns onto a photosensitized surface comprising scanning a laser beam over a photo sensitized, surface. Stripe patterns are exposed by employing a pulse laser and synchronizing the delivery of pulses to expose additive regions of stripes. Alternatively, a laser is scanned over a rotated panel, and the speed of translation, speed of scanning and degree of rotation are coordinated to expose each stripe continuously, and avoid exposing regions between stripes.
PCT/IL2004/000882 2003-09-22 2004-09-22 A system and method for the direct imaging of color filters Ceased WO2005029178A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2006526809A JP2007506136A (en) 2003-09-22 2004-09-22 Color filter direct drawing system and direct drawing method
IL173669A IL173669A0 (en) 2003-09-22 2006-02-12 A system and method for the direct imaging of color filters

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US50388703P 2003-09-22 2003-09-22
US60/503,887 2003-09-22

Publications (3)

Publication Number Publication Date
WO2005029178A2 WO2005029178A2 (en) 2005-03-31
WO2005029178A8 WO2005029178A8 (en) 2006-04-13
WO2005029178A3 true WO2005029178A3 (en) 2006-09-14

Family

ID=34375412

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IL2004/000882 Ceased WO2005029178A2 (en) 2003-09-22 2004-09-22 A system and method for the direct imaging of color filters

Country Status (4)

Country Link
JP (1) JP2007506136A (en)
KR (1) KR20060097711A (en)
TW (1) TWI249083B (en)
WO (1) WO2005029178A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013061363A (en) * 2010-01-22 2013-04-04 Panasonic Corp Drawing device
TWI400549B (en) 2010-06-01 2013-07-01 Prime View Int Co Ltd Method for manufacturing color electrophoretic display device
CN102645809B (en) * 2011-02-22 2015-05-13 元太科技工业股份有限公司 Manufacturing method of color electrophoretic display device
US10149390B2 (en) 2012-08-27 2018-12-04 Mycronic AB Maskless writing of a workpiece using a plurality of exposures having different focal planes using multiple DMDs
WO2014140047A2 (en) * 2013-03-12 2014-09-18 Micronic Mydata AB Method and device for writing photomasks with reduced mura errors
TWI661280B (en) * 2014-04-01 2019-06-01 日商尼康股份有限公司 Substrate processing method and substrate processing device
CN115327866A (en) * 2022-09-28 2022-11-11 深圳市先地图像科技有限公司 A kind of laser direct imaging device and laser direct imaging method

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5853924A (en) * 1994-12-26 1998-12-29 Alps Electric Co., Ltd. Method of manufacturing color filters
WO1999045439A1 (en) * 1998-03-02 1999-09-10 Micronic Laser Systems Ab Improved pattern generator
US20020113218A1 (en) * 1994-02-22 2002-08-22 Masahiko Okumura Method and apparatus for positioning substrate and the like
US20020141024A1 (en) * 2001-01-04 2002-10-03 Wolfgang Retschke Direct pattern writer
US6552779B2 (en) * 2000-05-25 2003-04-22 Ball Semiconductor, Inc. Flying image of a maskless exposure system
US6560248B1 (en) * 2000-06-08 2003-05-06 Mania Barco Nv System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08236419A (en) * 1995-02-24 1996-09-13 Nikon Corp Positioning method
JP3757430B2 (en) * 1994-02-22 2006-03-22 株式会社ニコン Substrate positioning apparatus and exposure apparatus

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020113218A1 (en) * 1994-02-22 2002-08-22 Masahiko Okumura Method and apparatus for positioning substrate and the like
US5853924A (en) * 1994-12-26 1998-12-29 Alps Electric Co., Ltd. Method of manufacturing color filters
WO1999045439A1 (en) * 1998-03-02 1999-09-10 Micronic Laser Systems Ab Improved pattern generator
US6552779B2 (en) * 2000-05-25 2003-04-22 Ball Semiconductor, Inc. Flying image of a maskless exposure system
US6560248B1 (en) * 2000-06-08 2003-05-06 Mania Barco Nv System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation
US20020141024A1 (en) * 2001-01-04 2002-10-03 Wolfgang Retschke Direct pattern writer

Also Published As

Publication number Publication date
WO2005029178A8 (en) 2006-04-13
WO2005029178A2 (en) 2005-03-31
TWI249083B (en) 2006-02-11
JP2007506136A (en) 2007-03-15
KR20060097711A (en) 2006-09-14

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