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WO2005045877A1 - Source d'ions a double filament - Google Patents

Source d'ions a double filament Download PDF

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Publication number
WO2005045877A1
WO2005045877A1 PCT/AU2004/000570 AU2004000570W WO2005045877A1 WO 2005045877 A1 WO2005045877 A1 WO 2005045877A1 AU 2004000570 W AU2004000570 W AU 2004000570W WO 2005045877 A1 WO2005045877 A1 WO 2005045877A1
Authority
WO
WIPO (PCT)
Prior art keywords
filament
cathode
ion source
control system
filaments
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/AU2004/000570
Other languages
English (en)
Inventor
Wayne Sainty
William Waller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saintech Pty Ltd
Original Assignee
Saintech Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from AU2003906002A external-priority patent/AU2003906002A0/en
Application filed by Saintech Pty Ltd filed Critical Saintech Pty Ltd
Publication of WO2005045877A1 publication Critical patent/WO2005045877A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/135—Circuit arrangements therefor, e.g. for temperature control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H01J2237/082—Electron beam

Definitions

  • Dual filament ion source Field of the invention This invention relates to a cathode system for an ion source, in particular a thermal emission cathode.
  • gridless ion sources have been known, for example from US 4862032, as providing a broad area ion beam capable of providing ion assistance for the thin film deposition process.
  • a gas is ionized through collisions with energetic electrons.
  • the source of electrons is often a heated filament disposed in the ion expulsion path. The filament is degraded by temperature stresses and by impinging ions until ultimately the filament breaks, and the heating current circuit is broken.
  • the lifetime of the filament therefore places a limitation on the maximum length of the thin film deposition processes that utilize the ion source.
  • the vacuum chamber in which the ion source is disposed needs to be brought up to atmosphere, the filament replaced, and the chamber re-pumped to attain its operating pressure.
  • Modern thin film processes can now take of the order of hours, even days, for a single run and if the filament breaks during the process the entire run may be lost. With much automation of the process, it is often not practical to have a technician permanently monitor the state of the filament.
  • the invention resides in a cathode system for an ion source, the cathode system comprising at least two filaments and a filament control system, wherein the filament control system provides a heating current to a first of the filaments to cause electron emission therefrom, and wherein the control system monitors the state of the first filament and switches the heating current from the first filament to a second of the filaments in response to a failure condition in the first filament.
  • the invention resides in an ion source comprising an anode, an electron emitting cathode, an ionization region disposed between the anode and the cathode, an electric potential generator, a gas supply, and a cathode control system, wherein the cathode is disposed at one end of the ionisation region; wherein the anode is disposed at an opposite longitudinal end of the ionisation region; wherein the gas supply supplies an ionisable gas to the ionisation region; wherein the cathode control system causes the cathode to emit electrons; wherein the electric potential generator generates an electric potential between the cathode and the anode such that electrons emitted by the cathode flow toward the anode through the ionisation region and cause ionisation of the gas; wherein the cathode comprises at least two filaments; wherein the cathode control system provides a heating current to a first of the filaments to cause thermal electron emission
  • control system monitors the current of the first filament. In an alternative embodiment the control system monitors the voltage and/or the resistance of the first filament. In a further embodiment the control system monitors the temperature of the first filament. In a further embodiment the control system monitors the state of the first filament by monitoring another component of the ion source, for example the anode current. Preferably the cathode control system monitors the state of the second filament current at least after the heating current has been switched to the second filament.
  • the ion source control system further comprises an audible signal generator that is activated in response to a detection of a failure condition in the first filament. Preferably the audible signal generator is also activated upon detection of a failure condition in the second filament.
  • the filament is supported by a plurality of filament supports through which electrical connection to the filament is provided.
  • each filament is supported by an individual set of filament supports such that each of the filaments is electrically isolated from the other.
  • two filaments share a common filament support, and thus a common electrical connection.
  • the common electrical connection is an earth connection.
  • the invention resides in a method of operating a cathode of an ion source comprising at least two filaments, the method comprising providing a heating current to a first filament of the cathode, monitoring the state of the first filament, detecting a failure condition of the first filament, and switching the heating current to a second filament in response to the detected failure condition.
  • FIG. 1 shows a schematic cross section of an ion source
  • Figure 2 shows a plan view of the ion source of Figure 1
  • Figure 3 shows a schematic circuit for a cathode control system
  • Figure 4 shows a plan view of an alternative embodiment of the invention
  • Figure 5 shows an alternative circuit for a cathode control system.
  • ion source 100 in accordance with a preferred embodiment of the invention.
  • the ion source 100 includes a base plate 101 that screws or otherwise engages with a cylindrical shroud 102.
  • the shroud has an inner sloping surface 103 that defines an open end 116 of an ionisation region 113 to be described below.
  • the base plate 101 has a collar 105, extending upward from which is a threaded section 106 for engagement with the shroud 102.
  • the base 101 has an upper annular face 107.
  • An inner circumferential flange 108 extends from the face 107 to locate a ring magnet 114 thereon.
  • the magnet is preferably a high flux rare earth magnet such as an NdFeB magnet.
  • Disposed on the magnet 114 is a spacer 117, for example of aluminium, that provides a radiation shield to prevent the magnet 114 from overheating due to radiation from the anode 112.
  • the anode 112 has an end wall 120 and an outwardly sloping side wall 121.
  • the side wall and end wall together define the ionisation region 113.
  • Figure 1 shows one filament 111 supported at the open end 116 of the ionisation region 113 by filament support legs 130.
  • the filament legs 130 are connected to the shroud 102 through insulating mountings 131 to electrically isolate the filament legs 130 from the shroud 102.
  • the filament legs 130 are each electrically conducting and have an electrical connection point 132 for connecting into a filament supply circuit (not shown).
  • One filament is shown in Figure 1 for clarity, however as observed in Figure 2, the ion source is provided with two filaments, individually mounted on their own set of filament legs and electrically isolated from each other.
  • a projection 123 extends from the anode end wall 120 into the ionisation region 113.
  • the projection 123 shown in Figure 1 is curved having an apex located on an axis of the anode. In alternative embodiments, the projection may have angled faces or the like.
  • the projection provides a focal point for the electrons emitted by the cathode.
  • the anode 112 is located within the shroud by upper and lower insulating rings
  • a gas chamber 140 is defined by the anode 112, the insulating rings 118,119 and the inside surface of the shroud 102.
  • the upper insulator 118 is a rigid insulator for holding and locating the anode 112 properly in place.
  • the insulator 118 is also required to have a high temperature resistance and low thermal expansion in order that the insulator provides a seal for the gas chamber under operating conditions .
  • Preferred materials for the upper insulator include glass, ceramic or polymers such as PEEK (polyethylethylketone).
  • the lower insulator is preferably a high temperature elastomer ring that provides a resilient seal for the gas chamber 140 when the base 101 is screwed into the shroud.
  • An inlet 141 through the shroud is connectable to a gas line (not shown) that supplies gas to the gas chamber 140.
  • Control of the gas flow is governed by a mass flow controller or similar control mechanism disposed upstream of the ion source, as is well known in the art.
  • Extending through the anode side walls 121 are a plurality of channels 125, each terminating in the ionization region 113 at an aperture 126 disposed adjacent the end wall 120.
  • the channels 125 provide a conduit from the gas chamber 140 to the ionization region 113.
  • the channels 125 extend downwardly (as depicted in Figure 1) from the outer anode wall to the ionization region such that the channels are pointed at the projection 123.
  • the projection 123 is integrally formed with the end wall 120. Also shown within the anode 112 is a cavity 127 that receives a cooling fluid from an inlet conduit 150. The cavity 127 extends to an underside surface 128 of the end wall and the projection 123.
  • the thickness of the end wall is preferably less than 10mm in order that the cooling fluid can sufficiently cool the projection. The minimum thickness of the end wall and projection is determined only by the limits of the manufacturing processes used to fabricate the anode. In practice, the thickness of the end wall is approximately 2mm.
  • the fluid conduit 150 is a coaxial conduit, having an inner conduit 151 for supplying fluid, eg water, to the cavity 127 and an outer conduit 152 for removing fluid from the cavity.
  • the inner conduit 151 extends into the cavity so that the outlet end 153 of the conduit is disposed adjacent the underside surface 128 of the end wall. This ensures that the coolest water is directed at the end wall and projection, which receives the majority of the anode heat load.
  • the outlet 153 of the inner conduit has a notch 154 so that in the event that the inner conduit is inserted into the cavity until the conduit abuts the underside surface of the end wall, the flow of water is not restricted.
  • the fluid conduit 150 extends through the central aperture of the ring magnet 114 and the base plate 101 and can be used to provide an electrical connection to the anode with electrical breaks provided upstream of the connection.
  • the ion source is operated by providing a mains rectified voltage signal 0-300 V to the anode, as described in Applicant's co-filed application titled "Ion source control system", the entire contents of which are herein incorporated by reference.
  • An AC heating current of approximately 16A is passed through either of the cathode filaments to stimulate electron emission. Electrons generated at the cathode are influenced by the anode potential and are accelerated toward it.
  • the magnetic field imparts a spiral motion on the electrons increasing the time which the electrons spend in the ionisation region and thus their potential to ionise gas molecules, and focussing the electrons toward the longitudinal axis.
  • the electrons gain enough energy that collisions with gas molecules cause ionisation.
  • Positive ions created in the plasma experience the opposite effect to the electrons and are accelerated away from the anode out of the open end 116 of the ionisation region.
  • the general theory of operation of the ion source is known from Applicant's previous applications PCT/AU99/00591and PCT/AU01/01548 the entire contents of which are herein incorporated by reference.
  • a cathode control circuit will now be described with reference to Figure 3.
  • the circuit 300 receives at its input end 301 a variable 0-5 V input signal.
  • the input is passed through a high gain amplifier 302 and thereafter to a power device 303.
  • the power device is based on a phase controlled triac 321 controlling a transformer 322, the secondary side of which 323 outputs to the filament.
  • the power device 303 scales the variable input signal to a high current signal required for electron emission from the filament.
  • two filaments 311, 312 are provided in the circuit 300.
  • the selection of the filament is controlled by a relay 305 which in turn is governed by a logic circuit 340 to be described below.
  • the filaments are connected to ground 314 with a sense resistor 315 connecting through to the secondary winding 323 of the power device transformer, completing the power gain circuit.
  • the voltage across the sense resistor 315 is provided to a feedback block 316 that connects to the input circuit at a summing junction 317.
  • the feedback block 316 contains scaling components that match the typical voltages across the sense resistor with the desired filament currents for feeding back to the drive components such as the amplifier 302 and power device 303.
  • the input end 301 receives a 0-5 V signal as selected by the operator.
  • the summing junction 317 adds the feedback signal from the feedback block 316. Initially, the feedback signal from the feedback block is low and thus the output of the amplifier is relatively high.
  • the high input drives the power device 303, increasing the current output of the secondary winding 323 of the transformer 322 and thus increasing the current in the first filament 311.
  • the filament current is detected in the sense resistor 315 by the feedback block 316.
  • the output of the summing junction 317 decreases and the circuit achieves a steady state.
  • the logic circuit 340 contains a comparator that receives the output 345 from the amplifier 302 and compares it to a reference voltage 344, typically 9 V. Under steady state operation, the amplifier output signal 345 is low, typically 5 V.
  • the feedback circuit 316 provides zero return signal to the summing junction 317.
  • the input signal 301 therefore provides the sole driver to the amplifier and the amplifier is therefore driven to its maximum output, typically 10V.
  • This causes the switching of the comparator of the logic circuit 340, in turn switching the relay 305 to the second filament circuit 312.
  • the logic circuit 340 has a delay built in to it that prevents the circuit from switching due to transient signals that are not indicative of a failure condition in the first filament.
  • the relay circuit 305 has in it an LED 341 and a buzzer 342 that are activated when the relay is switched to the second filament circuit. The LED is permanently on, whilst the buzzer is operated for a brief period, e.g. 10 seconds, to provide an audible indication that the first filament has failed.
  • the power to the logic circuit 340 is dropped, e.g.
  • the change over circuit 500 includes an operational amplifier 501 that receives as inputs 502, 503 voltages representative of the filament current and filament voltage respectively.
  • the input voltages are derived from the filament circuit 514 and are filtered and scaled by scaling components 517 eg voltage dividers, resistors etc, so that under normal operating conditions, the voltage inputs 502, 503 are matched and the output of the op amp 501 is low.
  • the output of the op amp 501 feeds the base 508 of a transistor 504 via a resistor 505.
  • the transistor activates a relay 506 comprising a double pole switch.
  • a first pole of the switch 507 connects a voltage rail 511, eg 12 volts, to the base 508 of the transistor 504, thereby providing a latch circuit.
  • the second pole 509 operates a second relay 510 in the filament circuit 514 that switches the filament circuit 514 from the first filament 515 to the second filament 516.
  • the relay 506 is unenergised and the two switches 507, 509 are both open.
  • the relay 510 is also unenergised ensuring that the filament circuit 514 is set to the first filament 515.
  • the filament voltage input 503 to the op amp 501 remains unchanged, but the filament current input 502 is reduced because no current is able to flow. Because the voltage inputs 502, 503 are now unmatched, the output of the op amp becomes high enough to activate the transistor 504 which in turn energises the relay 506.
  • the first switch 507 closes and latches the voltage rail 511 to the base 508 of the transistor 504, thereby maintaining the relay 506 in the energized state regardless of the input coming from the op amp 501.
  • the second pole 509 is also closed, thus connecting the voltage rail 511 to the second relay 510 thereby switching in the second filament 516.
  • This state of the circuit is maintained due to the latching of the circuit through the first switch 507.
  • the entire circuit 500 In order to replace the first filament, the entire circuit 500 must be switched off so that no voltages are present in the vacuum chamber when the operator replaces the filaments. During the filament replacement, the transistor 504 is reset because no voltage is provided to the base 508.
  • the relay 506 is de-energised as is the latching circuit and the second relay 510.
  • the circuit 500 is reset to operate the first filament when the ion source is next operated.
  • the activation of the second filament circuit can coincide with the activation of a visible and/or audible alarm to indicate the failure of the first filament.
  • the logic circuit 340 may receive an input from a sense resistor placed in the anode supply line that measures the anode current. If a filament fails, the anode current will quickly go to zero.
  • the low signal can be sensed across the sense resistor and provided to the logic circuit to switch the filament.
  • An alternative embodiment is illustrated in Figure 4.
  • three filament legs 430, 431, 432 are provided to support two filaments 440, 441.
  • Filament leg 431 is thus shared by the two filaments and therefore provides a common electrical connection. It is preferred that the shared connection is an earth connection, for example as may be connected to the ground connection 314 of the circuit 300 described above and shown in Figure 3.
  • the dual filaments can be provided by a single length of filament. The single strand can be fixed at the first leg 430, extended to the common filament leg 431 where it is fixed in the middle of the strand, and then bent to extend to the third filament leg 432.
  • any greater number of filaments may be provided, the number required being dependent on the average lifetime of each filament, and the length of the process for which the ion source is required to operate continuously.
  • a greater number of filaments can be provided for by replicating the logic components of the cathode control circuit and by replacing the two position relay 305 with a multi-position switch, one position for each filament line.
  • the present invention as herein described in the preferred embodiments assists in providing continuity of operation for the length of the deposition process because as soon as the first filament is blown, the circuit automatically switches to the back-up filament.
  • the audible warning and first filament status indicator light allow an operator to quickly know the filament status.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

Selon l'invention, une source d'ions sans grille est fournie dans un système cathodique présentant deux filaments thermoélectroniques (515, 516). Le premier filament (515) est activé à une température d'émission d'électrons afin qu'une source d'électrons soit fournie à la source d'ions. L'état du premier filament est surveillé par un circuit de commande (500) et en cas de défaillance du premier filament, le circuit de commande commute sur le deuxième filament (516). Dans des modes de réalisation préférés, la commutation du deuxième filament est maintenue et est automatiquement réinitialisée sur le premier filament après mise hors tension de la source d'ions.
PCT/AU2004/000570 2003-10-31 2004-05-03 Source d'ions a double filament Ceased WO2005045877A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AU2003906002A AU2003906002A0 (en) 2003-10-31 Dual filament ion source
AU2003906002 2003-10-31

Publications (1)

Publication Number Publication Date
WO2005045877A1 true WO2005045877A1 (fr) 2005-05-19

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ID=34558169

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PCT/AU2004/000570 Ceased WO2005045877A1 (fr) 2003-10-31 2004-05-03 Source d'ions a double filament

Country Status (1)

Country Link
WO (1) WO2005045877A1 (fr)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7429863B2 (en) 2006-07-18 2008-09-30 Brooks Automation, Inc. Method and apparatus for maintaining emission capabilities of hot cathodes in harsh environments
WO2009018231A2 (fr) 2007-08-02 2009-02-05 Thermo Finnigan Llc Procédé et appareil pour fournir sélectivement des électrons dans une source d'ions
WO2009100073A3 (fr) * 2008-02-05 2009-11-19 Thermo Finnigan Llc Procédé et appareil pour normaliser le rendement d'une source d'électrons
EP2978008A1 (fr) * 2014-07-25 2016-01-27 Bruker Daltonics, Inc. Filament pour spectrométrie de masse à source ionique par impact d'électrons
JP2017015738A (ja) * 2008-09-19 2017-01-19 エム ケー エス インストルメンツ インコーポレーテッドＭｋｓ Ｉｎｓｔｒｕｍｅｎｔｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 電離真空計および圧力測定方法
CN111933503A (zh) * 2020-08-11 2020-11-13 中山市博顿光电科技有限公司 离子源的电源控制方法、系统及离子源装置
US20230100805A1 (en) * 2021-09-30 2023-03-30 Axcelis Technologies, Inc. Extended lifetime dual indirectly-heated cathode ion source
EP4449108A1 (fr) 2021-12-16 2024-10-23 INFICON, Inc. Ensemble source d'ions à filaments elliptiques multiples

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1082819A (en) * 1963-12-20 1967-09-13 Nat Res Corp Improved mass spectrometer
GB1152014A (en) * 1966-03-23 1969-05-14 Varian Associates Improvements in Ion Source Apparatus
JPS5719949A (en) * 1980-07-09 1982-02-02 Hitachi Ltd Dual filament ion source
US5438238A (en) * 1990-10-10 1995-08-01 Nec Electronics Inc. Multiple filament enhanced ion source
WO2000005742A1 (fr) * 1998-07-21 2000-02-03 Saintech Pty. Limited Source d'ions

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1082819A (en) * 1963-12-20 1967-09-13 Nat Res Corp Improved mass spectrometer
GB1152014A (en) * 1966-03-23 1969-05-14 Varian Associates Improvements in Ion Source Apparatus
JPS5719949A (en) * 1980-07-09 1982-02-02 Hitachi Ltd Dual filament ion source
US5438238A (en) * 1990-10-10 1995-08-01 Nec Electronics Inc. Multiple filament enhanced ion source
WO2000005742A1 (fr) * 1998-07-21 2000-02-03 Saintech Pty. Limited Source d'ions

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN *

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7429863B2 (en) 2006-07-18 2008-09-30 Brooks Automation, Inc. Method and apparatus for maintaining emission capabilities of hot cathodes in harsh environments
US7656165B2 (en) 2006-07-18 2010-02-02 Brooks Automation, Inc. Method and apparatus for maintaining emission capabilities of hot cathodes in harsh environments
WO2009018231A2 (fr) 2007-08-02 2009-02-05 Thermo Finnigan Llc Procédé et appareil pour fournir sélectivement des électrons dans une source d'ions
WO2009018231A3 (fr) * 2007-08-02 2009-10-29 Thermo Finnigan Llc Procédé et appareil pour fournir sélectivement des électrons dans une source d'ions
US7902529B2 (en) 2007-08-02 2011-03-08 Thermo Finnigan Llc Method and apparatus for selectively providing electrons in an ion source
WO2009100073A3 (fr) * 2008-02-05 2009-11-19 Thermo Finnigan Llc Procédé et appareil pour normaliser le rendement d'une source d'électrons
JP2017015738A (ja) * 2008-09-19 2017-01-19 エム ケー エス インストルメンツ インコーポレーテッドＭｋｓ Ｉｎｓｔｒｕｍｅｎｔｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ 電離真空計および圧力測定方法
US9401266B2 (en) 2014-07-25 2016-07-26 Bruker Daltonics, Inc. Filament for mass spectrometric electron impact ion source
EP2978008A1 (fr) * 2014-07-25 2016-01-27 Bruker Daltonics, Inc. Filament pour spectrométrie de masse à source ionique par impact d'électrons
CN111933503A (zh) * 2020-08-11 2020-11-13 中山市博顿光电科技有限公司 离子源的电源控制方法、系统及离子源装置
CN111933503B (zh) * 2020-08-11 2021-07-06 中山市博顿光电科技有限公司 离子源的电源控制方法、系统及离子源装置
US20230100805A1 (en) * 2021-09-30 2023-03-30 Axcelis Technologies, Inc. Extended lifetime dual indirectly-heated cathode ion source
US11798775B2 (en) * 2021-09-30 2023-10-24 Axcelis Technologies, Inc. Extended lifetime dual indirectly-heated cathode ion source
EP4449108A1 (fr) 2021-12-16 2024-10-23 INFICON, Inc. Ensemble source d'ions à filaments elliptiques multiples
EP4449108A4 (fr) * 2021-12-16 2025-05-21 INFICON, Inc. Ensemble source d'ions à filaments elliptiques multiples
US12494358B2 (en) 2021-12-16 2025-12-09 Inficon, Inc. Ion source assembly with multiple elliptical filaments

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