WO2004093147A3 - Wafer carrier cleaning system - Google Patents
Wafer carrier cleaning system Download PDFInfo
- Publication number
- WO2004093147A3 WO2004093147A3 PCT/US2004/011159 US2004011159W WO2004093147A3 WO 2004093147 A3 WO2004093147 A3 WO 2004093147A3 US 2004011159 W US2004011159 W US 2004011159W WO 2004093147 A3 WO2004093147 A3 WO 2004093147A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- carrier
- door
- robot
- cleaning system
- wafer carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H10P72/0414—
-
- H10P72/3402—
-
- H10P72/3404—
-
- H10P72/3406—
-
- H10P72/7602—
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04749998A EP1615735A2 (en) | 2003-04-10 | 2004-04-12 | Wafer carrier cleaning system |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46242803P | 2003-04-10 | 2003-04-10 | |
| US60/462,428 | 2003-04-10 | ||
| US82064604A | 2004-04-08 | 2004-04-08 | |
| US10/820,646 | 2004-04-08 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| WO2004093147A2 WO2004093147A2 (en) | 2004-10-28 |
| WO2004093147A3 true WO2004093147A3 (en) | 2005-01-27 |
| WO2004093147B1 WO2004093147B1 (en) | 2005-03-17 |
Family
ID=33303086
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2004/011159 Ceased WO2004093147A2 (en) | 2003-04-10 | 2004-04-12 | Wafer carrier cleaning system |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP1615735A2 (en) |
| WO (1) | WO2004093147A2 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7520286B2 (en) * | 2005-12-05 | 2009-04-21 | Semitool, Inc. | Apparatus and method for cleaning and drying a container for semiconductor workpieces |
| JP5730297B2 (en) * | 2009-06-17 | 2015-06-10 | ダイナミック マイクロシステムズ セミコンダクター イクイップメント ゲーエムベーハー | Integrated cleaner and dryer system |
| CN105702601B (en) | 2011-06-23 | 2020-02-07 | 布鲁克斯Ccs有限公司 | Cleaning system and method |
| US10714364B2 (en) * | 2017-08-31 | 2020-07-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and method for inspecting wafer carriers |
| CN110369400A (en) * | 2018-04-12 | 2019-10-25 | 津伦(天津)精密机械股份有限公司 | A kind of Full-automatic plasma cleaning equipment |
| US11813649B2 (en) * | 2020-05-29 | 2023-11-14 | Taiwan Semiconductor Manufacturing Company Limited | Semiconductor arrangement and method for making |
| TWI762273B (en) | 2021-04-16 | 2022-04-21 | 科嶠工業股份有限公司 | Material transfer box cleaning method and equipment |
| CN114194776B (en) * | 2021-12-15 | 2023-04-21 | 上海世禹精密设备股份有限公司 | Apparatus for transferring wafer carrier cassettes |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4627785A (en) * | 1984-05-14 | 1986-12-09 | Monforte Robotics, Inc. | Exchangeable multi-function end effector tools |
| WO1999033726A1 (en) * | 1997-12-24 | 1999-07-08 | Asyst Technologies, Inc. | Smif pod door and port door removal and return system |
| US20010020480A1 (en) * | 1998-03-23 | 2001-09-13 | Kabushiki Kaisha Toshiba | Pod and method of cleaning it |
| US6412502B1 (en) * | 1999-07-28 | 2002-07-02 | Semitool, Inc. | Wafer container cleaning system |
-
2004
- 2004-04-12 WO PCT/US2004/011159 patent/WO2004093147A2/en not_active Ceased
- 2004-04-12 EP EP04749998A patent/EP1615735A2/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4627785A (en) * | 1984-05-14 | 1986-12-09 | Monforte Robotics, Inc. | Exchangeable multi-function end effector tools |
| WO1999033726A1 (en) * | 1997-12-24 | 1999-07-08 | Asyst Technologies, Inc. | Smif pod door and port door removal and return system |
| US6704998B1 (en) * | 1997-12-24 | 2004-03-16 | Asyst Technologies, Inc. | Port door removal and wafer handling robotic system |
| US20010020480A1 (en) * | 1998-03-23 | 2001-09-13 | Kabushiki Kaisha Toshiba | Pod and method of cleaning it |
| US6412502B1 (en) * | 1999-07-28 | 2002-07-02 | Semitool, Inc. | Wafer container cleaning system |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1615735A2 (en) | 2006-01-18 |
| WO2004093147A2 (en) | 2004-10-28 |
| WO2004093147B1 (en) | 2005-03-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2007067395A3 (en) | Apparatus and method for cleaning and drying a container for semiconductor workpieces | |
| WO1987007077A3 (en) | Method and apparatus for cleaning semiconductor wafers | |
| TW349244B (en) | Method of fabricating a semiconductor device using a CMP process and a polishing apparatus for such a CMP process | |
| GB2292254B (en) | Method for polishing semiconductor substrate and apparatus for the same | |
| IL137996A0 (en) | Apparatus and method for cleaning semiconductor wafers | |
| WO2002003431A3 (en) | Apparatus and methods for semiconductor wafer processing equipment | |
| WO2005001888A3 (en) | Device and method for cleaning objects used to produce semiconductors, especially transport and cleaning containers for wafers | |
| WO2004093147A3 (en) | Wafer carrier cleaning system | |
| GB2334145B (en) | Methods and apparatus for cleaning,rinsing and drying wafers | |
| SG73498A1 (en) | Wafer processing apparatus and method wafer convey robot semiconductor substrate fabrication method and semiconductor fabrication apparatus | |
| US4974619A (en) | Wafer cleaning device for use in manufacturing a semiconductor device | |
| WO2001064391A3 (en) | Planarization system with a wafer transfer corridor and multiple polishing modules | |
| EP0599516A3 (en) | Process for removing surface contaminants from iii-v semiconductors. | |
| KR0157702B1 (en) | Cleaning agent and method for cleaning semiconductor wafers | |
| WO2006050551A3 (en) | Machine tool loading and unloading method and system | |
| GB2383526B (en) | Method and apparatus for performing multiple cleaning and vacuum drying operations in enclosed vessels | |
| WO2003038858A3 (en) | A semiconductor manufacturing apparatus having a built-in inspection apparatus and method therefor | |
| SG116411A1 (en) | Method and apparatus for cleaning a semiconductor wafer processing system. | |
| JPH07169730A (en) | Method and device for treating a disk-shaped processed product with a liquid | |
| TW372926B (en) | Method and system of processing semiconductor workpieces and robot for use in said system | |
| WO2003007346A3 (en) | Clean method and apparatus for vacuum holding of substrates | |
| GB0007275D0 (en) | Method and apparatus for storing a semiconductor wafter after CMP polishing | |
| JP2002520132A (en) | Method and apparatus for cleaning a substrate | |
| SG123541A1 (en) | Handling device and method for loading and unloading work pieces from trays | |
| CN104602841A (en) | Cleaning a plurality of needles, post manufacture and before assembly into a syringe, cannula and the like |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| DPEN | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed from 20040101) | ||
| B | Later publication of amended claims |
Effective date: 20041227 |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2004749998 Country of ref document: EP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 20048160950 Country of ref document: CN |
|
| WWP | Wipo information: published in national office |
Ref document number: 2004749998 Country of ref document: EP |
|
| WWW | Wipo information: withdrawn in national office |
Ref document number: 2004749998 Country of ref document: EP |