GB2334145B - Methods and apparatus for cleaning,rinsing and drying wafers - Google Patents

Methods and apparatus for cleaning,rinsing and drying wafers

Info

Publication number: GB2334145B
Authority: GB; United Kingdom
Prior art keywords: rinsing; cleaning; methods; drying wafers; wafers
Prior art date: 1996-07-08
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

GB9900410A

Other versions

GB9900410D0 (en

GB2334145A (en

Inventor

Glenn E Peterson

Eric Shurtliff

Chad Goudie

John Natalicio

Gregory A Olsen

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Integrated Process Equipment Corp

Speedfam IPEC Corp

Speedfam Corp

Original Assignee

Integrated Process Equipment Corp

Speedfam IPEC Corp

Speedfam Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1996-07-08

Filing date

1997-07-08

Publication date

2001-08-22

1996-07-08 Priority claimed from US08/676,546 external-priority patent/US5950327A/en

1997-07-08 Application filed by Integrated Process Equipment Corp, Speedfam IPEC Corp, Speedfam Corp filed Critical Integrated Process Equipment Corp

1999-02-24 Publication of GB9900410D0 publication Critical patent/GB9900410D0/en

1999-08-11 Publication of GB2334145A publication Critical patent/GB2334145A/en

2001-08-22 Application granted granted Critical

2001-08-22 Publication of GB2334145B publication Critical patent/GB2334145B/en

2017-07-08 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- H10P72/0406—
- H10P95/00—

GB9900410A 1996-07-08 1997-07-08 Methods and apparatus for cleaning,rinsing and drying wafers Expired - Fee Related GB2334145B (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US08/676,546 US5950327A (en)	1996-07-08	1996-07-08	Methods and apparatus for cleaning and drying wafers
US85520897A	1997-03-13	1997-03-13
PCT/US1997/011830 WO1998001892A1 (en)	1996-07-08	1997-07-08	Methods and apparatus for cleaning, rinsing, and drying wafers

Publications (3)

Publication Number	Publication Date
GB9900410D0 GB9900410D0 (en)	1999-02-24
GB2334145A GB2334145A (en)	1999-08-11
GB2334145B true GB2334145B (en)	2001-08-22

Family

ID=27101574

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB9900410A Expired - Fee Related GB2334145B (en)	1996-07-08	1997-07-08	Methods and apparatus for cleaning,rinsing and drying wafers

Country Status (6)

Country	Link
JP (1)	JP2002509643A (en)
KR (1)	KR20000023597A (en)
DE (2)	DE19781822T1 (en)
GB (1)	GB2334145B (en)
TW (1)	TW387093B (en)
WO (1)	WO1998001892A1 (en)

Families Citing this family (23)

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US5954888A (en) *	1998-02-09	1999-09-21	Speedfam Corporation	Post-CMP wet-HF cleaning station
WO1999053531A2 (en) *	1998-04-10	1999-10-21	Speedfam-Ipec Corporation	Post-cmp wet-hf cleaning station
US6356091B1 (en)	1998-11-19	2002-03-12	Speedfam-Ipec Corporation	Automatic wafer mapping in a wet environment on a wafer cleaner
US6368183B1 (en)	1999-02-03	2002-04-09	Speedfam-Ipec Corporation	Wafer cleaning apparatus and associated wafer processing methods
DE19904548C2 (en) *	1999-02-04	2001-07-05	Steag Micro Tech Gmbh	Method and device for cleaning substrates
US6481447B1 (en) *	2000-09-27	2002-11-19	Lam Research Corporation	Fluid delivery ring and methods for making and implementing the same
US6573522B2 (en)	2001-06-27	2003-06-03	Applied Matrials, Inc.	Locator pin integrated with sensor for detecting semiconductor substrate carrier
JP3918981B2 (en) *	2001-10-03	2007-05-23	東京エレクトロン株式会社	Liquid processing apparatus and setting management method thereof
WO2006116767A1 (en) *	2005-04-27	2006-11-02	Aehr Test Systems	Apparatus for testing electronic devices
KR100791709B1 (en) *	2006-12-28	2008-01-03	동부일렉트로닉스 주식회사	Wafer Exposure Apparatus and Method
KR100929817B1 (en)	2007-10-23	2009-12-07	세메스 주식회사	Substrate Processing Apparatus and Manufacturing Method of Substrate Processing Apparatus
US7800382B2 (en)	2007-12-19	2010-09-21	AEHR Test Ststems	System for testing an integrated circuit of a device and its method of use
US8795032B2 (en)	2008-06-04	2014-08-05	Ebara Corporation	Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method
TWI550705B (en) *	2008-06-04	2016-09-21	荏原製作所股份有限公司	Honing device and honing method
US8030957B2 (en)	2009-03-25	2011-10-04	Aehr Test Systems	System for testing an integrated circuit of a device and its method of use
KR101097509B1 (en) *	2009-07-17	2011-12-22	주식회사 엠엠티	Apparatus for cleaning substrate
TWI782508B (en)	2016-01-08	2022-11-01	美商艾爾測試系統	Method and system for thermal control of devices in an electronics tester
CN105665339B (en) *	2016-02-17	2018-04-06	上海华力微电子有限公司	A kind of drying device and drying means for groove profile wet method equipment
CN108649008A (en) *	2018-07-05	2018-10-12	睿力集成电路有限公司	One chip cleaning device and method for wafer cleaning after ion implanting
US11835575B2 (en)	2020-10-07	2023-12-05	Aehr Test Systems	Electronics tester
JP6892176B1 (en) *	2020-11-19	2021-06-23	不二越機械工業株式会社	Work cleaning device
CN215838789U (en) *	2021-07-16	2022-02-18	北京石头世纪科技股份有限公司	Base station and cleaning robot system
CN114601378A (en)	2021-07-16	2022-06-10	北京石头世纪科技股份有限公司	Base station and cleaning robot system

Citations (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH02250324A (en) *	1989-03-23	1990-10-08	Hitachi Ltd	Manufacture of semiconductor device and cleaning apparatus used therefor
EP0412796A2 (en) *	1989-08-09	1991-02-13	Shin-Etsu Handotai Company Limited	Automatic cleaning apparatus for disks
US5442828A (en) *	1992-11-30	1995-08-22	Ontrak Systems, Inc.	Double-sided wafer scrubber with a wet submersing silicon wafer indexer
US5518552A (en) *	1992-05-28	1996-05-21	Tokyo Electron Limited	Method for scrubbing and cleaning substrate

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5947457B2 (en) *	1982-11-15	1984-11-19	株式会社東芝	How to clean semiconductor wafers
US4517752A (en) *	1983-06-27	1985-05-21	Machine Technology, Inc.	Splash retarder
US4519846A (en) *	1984-03-08	1985-05-28	Seiichiro Aigo	Process for washing and drying a semiconductor element
DE3624878A1 (en) *	1985-07-31	1987-02-12	Speedfam Corp	Flat lay machine
JPS6362673A (en) *	1986-09-01	1988-03-18	Speedfam Co Ltd	Surface polishing machine associated with fixed dimension mechanism
JPS63224332A (en) *	1987-03-13	1988-09-19	Nec Corp	Double side washing equipment for semiconductor wafer
DE3814706A1 (en) *	1988-04-30	1989-11-09	Philips & Du Pont Optical	Process for depositing a thin metallic protective layer on an electrotype
US5357645A (en) *	1989-04-09	1994-10-25	System Seiko Co., Ltd.	Apparatus for cleaning and drying hard disk substrates
DE4100526A1 (en) *	1991-01-10	1992-07-16	Wacker Chemitronic	DEVICE AND METHOD FOR AUTOMATICALLY SEPARATING STACKED DISCS
JP2640698B2 (en) *	1991-07-31	1997-08-13	信越半導体株式会社	Automatic wafer cleaning equipment
JPH0547899A (en) *	1991-08-20	1993-02-26	Sharp Corp	Wafer transfer arm
US5498199A (en) *	1992-06-15	1996-03-12	Speedfam Corporation	Wafer polishing method and apparatus
US5329732A (en) *	1992-06-15	1994-07-19	Speedfam Corporation	Wafer polishing method and apparatus
US5483984A (en) *	1992-07-10	1996-01-16	Donlan, Jr.; Fraser P.	Fluid treatment apparatus and method
US5485644A (en) *	1993-03-18	1996-01-23	Dainippon Screen Mfg. Co., Ltd.	Substrate treating apparatus
JPH0774225A (en) *	1993-09-02	1995-03-17	Toshiba Corp	Carrier
US5518542A (en) *	1993-11-05	1996-05-21	Tokyo Electron Limited	Double-sided substrate cleaning apparatus
DE4408537A1 (en) *	1994-03-14	1995-09-21	Leybold Ag	Device for the transport of substrates
US5779203A (en) *	1996-06-28	1998-07-14	Edlinger; Erich	Adjustable wafer cassette stand

1997
- 1997-07-08 DE DE19781822T patent/DE19781822T1/en active Pending
- 1997-07-08 WO PCT/US1997/011830 patent/WO1998001892A1/en not_active Ceased
- 1997-07-08 DE DE19781822A patent/DE19781822B4/en not_active Expired - Fee Related
- 1997-07-08 TW TW086109559A patent/TW387093B/en not_active IP Right Cessation
- 1997-07-08 GB GB9900410A patent/GB2334145B/en not_active Expired - Fee Related
- 1997-07-08 JP JP50531798A patent/JP2002509643A/en active Pending
1999
- 1999-01-07 KR KR1019997000043A patent/KR20000023597A/en not_active Abandoned

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH02250324A (en) *	1989-03-23	1990-10-08	Hitachi Ltd	Manufacture of semiconductor device and cleaning apparatus used therefor
EP0412796A2 (en) *	1989-08-09	1991-02-13	Shin-Etsu Handotai Company Limited	Automatic cleaning apparatus for disks
US5518552A (en) *	1992-05-28	1996-05-21	Tokyo Electron Limited	Method for scrubbing and cleaning substrate
US5442828A (en) *	1992-11-30	1995-08-22	Ontrak Systems, Inc.	Double-sided wafer scrubber with a wet submersing silicon wafer indexer
US5529638A (en) *	1992-11-30	1996-06-25	Ontrak Systems, Inc.	Method for wafer scrubbing

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM Technical Disclosure Bulletin, vol 17, no 2, 2/7/74, pg 427, "Wafer Processing", Carufe. *

Also Published As

Publication number	Publication date
GB9900410D0 (en)	1999-02-24
WO1998001892A1 (en)	1998-01-15
KR20000023597A (en)	2000-04-25
DE19781822B4 (en)	2004-09-09
TW387093B (en)	2000-04-11
GB2334145A (en)	1999-08-11
DE19781822T1 (en)	1999-06-17
JP2002509643A (en)	2002-03-26

Publication	Publication Date	Title
GB2334145B (en)	2001-08-22	Methods and apparatus for cleaning,rinsing and drying wafers
SG81975A1 (en)	2001-07-24	Method and apparatus for drying washed objects
AU3575697A (en)	1998-02-09	Wafer cleaning apparatus
GB2337327B (en)	2000-11-15	Apparatus and method for monitoring hand washing
HUP0102648A3 (en)	2003-05-28	Dry cleaning method and solvent
IL137996A0 (en)	2001-10-31	Apparatus and method for cleaning semiconductor wafers
GB2333805B (en)	2001-09-19	Cleaning method and apparatus
KR100201170B1 (en)	1999-06-15	Vapor drying apparatus, cleaning apparatus incorporating the same and vapor drying method
AU6271599A (en)	2000-05-01	Wafer cleaning and vapor drying system and method
HUP0102952A3 (en)	2003-03-28	Dry cleaning method and modified solvent
SG74629A1 (en)	2000-08-22	Drying processing method and apparatus using same
TW475491U (en)	2002-02-01	Apparatus of cleaning semiconductor wafer
GB2328080B (en)	2002-09-04	Improved method for rinsing and drying a wafer
AU4977799A (en)	2000-02-01	Wafer cleaning apparatus
TW474456U (en)	2002-01-21	Semiconductor apparatus
SG67439A1 (en)	1999-09-21	Apparatus and method for washing substrate
AU5446000A (en)	2000-12-18	Wafer drying apparatus and method
KR0157702B1 (en)	1998-12-01	Cleaning agent and method for cleaning semiconductor wafers
AU3903000A (en)	2000-10-16	Semiconductor wafer cleaning apparatus and method
AU1073101A (en)	2001-05-10	Method and apparatus for semiconductor cleaning
ZA985187B (en)	1999-12-17	Wash apparatus and method.
GB0006847D0 (en)	2000-05-10	Method for rinsing clean object and apparatus therefor
GB9704445D0 (en)	1997-04-23	Cleaning method & apparatus
GB2337921B (en)	2002-01-23	Washing apparatus
GB9627012D0 (en)	1997-02-19	Cleaning method, material and apparatus

Legal Events

Date	Code	Title	Description
1999-09-29	732E	Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
2004-02-25	PCNP	Patent ceased through non-payment of renewal fee	Effective date: 20030708