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WO2004077574A3 - Halbleiterspeicherzelle und verfahren zu deren herstellung - Google Patents

Halbleiterspeicherzelle und verfahren zu deren herstellung Download PDF

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Publication number
WO2004077574A3
WO2004077574A3 PCT/DE2004/000365 DE2004000365W WO2004077574A3 WO 2004077574 A3 WO2004077574 A3 WO 2004077574A3 DE 2004000365 W DE2004000365 W DE 2004000365W WO 2004077574 A3 WO2004077574 A3 WO 2004077574A3
Authority
WO
WIPO (PCT)
Prior art keywords
region
cell
gox
ferroelectric
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2004/000365
Other languages
English (en)
French (fr)
Other versions
WO2004077574A2 (de
Inventor
Cay-Uwe Pinnow
Thomas Mikolajick
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Infineon Technologies AG
Original Assignee
Infineon Technologies AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Infineon Technologies AG filed Critical Infineon Technologies AG
Publication of WO2004077574A2 publication Critical patent/WO2004077574A2/de
Publication of WO2004077574A3 publication Critical patent/WO2004077574A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/01—Manufacture or treatment
    • H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0415—Manufacture or treatment of FETs having insulated gates [IGFET] of FETs having ferroelectric gate insulators
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/701—IGFETs having ferroelectric gate insulators, e.g. ferroelectric FETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/031—Manufacture or treatment of data-storage electrodes
    • H10D64/033—Manufacture or treatment of data-storage electrodes comprising ferroelectric layers

Landscapes

  • Semiconductor Memories (AREA)

Abstract

Es werden eine Halbleiterspeicherzelle und ein Verfahren zu deren Herstellung vorgeschlagen, bei welchen die Kapazität (CFe) einer ferroelektrischen Kondensatoranordnung, welche gebildet wird von dem Kontakt und/oder dem Bereich eines im Wesentlichen konstanten Potenzials zwischen einem Gateisolatiosbereich (GOX) und einem Ferroelektrikumsbereich (16), dem Ferroelektrikumsbereich (16) und einer oberen Gateelektrode (18), relativ zu herkömmlichen Verhältnissen und/oder relativ zur Kapazität (CGOX) einer Gateisolationskondensatoranordnung, welche gebildet wird von der Grenzfläche zwischen einem Kanalbereich (K) und dem Gateisolationsbereich (GOX), dem Gateisolationsbereich (GOX) und dem Kontakt und/oder dem Bereich eines im Wesentlichen konstanten Potenzials zwischen einem Gateisolatiosbereich (GOX) und dem Ferroelektrikumsbereich (16), reduziert ausgebildet ist oder wird.
PCT/DE2004/000365 2003-02-28 2004-02-27 Halbleiterspeicherzelle und verfahren zu deren herstellung Ceased WO2004077574A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10308970.5 2003-02-28
DE10308970A DE10308970A1 (de) 2003-02-28 2003-02-28 Halbleiterspeicherzelle und Verfahren zu deren Herstellung

Publications (2)

Publication Number Publication Date
WO2004077574A2 WO2004077574A2 (de) 2004-09-10
WO2004077574A3 true WO2004077574A3 (de) 2004-11-18

Family

ID=32842060

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2004/000365 Ceased WO2004077574A2 (de) 2003-02-28 2004-02-27 Halbleiterspeicherzelle und verfahren zu deren herstellung

Country Status (2)

Country Link
DE (1) DE10308970A1 (de)
WO (1) WO2004077574A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11335702B1 (en) * 2020-11-13 2022-05-17 Renesas Electronics Corporation Semiconductor device and method of manufacturing the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1131792A (ja) * 1997-07-14 1999-02-02 Oki Electric Ind Co Ltd 半導体記憶素子およびその製造方法
WO2001024272A1 (de) * 1999-09-28 2001-04-05 Infineon Technologies Ag Ferroelektrischer transistor
EP1246254A2 (de) * 2001-03-28 2002-10-02 Sharp Kabushiki Kaisha MFOS-Speicher-Transistor und diesbezügliches Herstellungsverfahren
EP1302978A2 (de) * 2001-10-16 2003-04-16 Sharp Kabushiki Kaisha Herstellungsverfahren eines selbstjustierten ferrroelektrischen Speichertransistor

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5384729A (en) * 1991-10-28 1995-01-24 Rohm Co., Ltd. Semiconductor storage device having ferroelectric film
JP3136045B2 (ja) * 1994-04-28 2001-02-19 沖電気工業株式会社 メモリセルトランジスタ
JP3281839B2 (ja) * 1997-06-16 2002-05-13 三洋電機株式会社 誘電体メモリおよびその製造方法
JPH11330275A (ja) * 1998-05-18 1999-11-30 Sony Corp 半導体装置およびその製造方法
US6674109B1 (en) * 1999-09-30 2004-01-06 Rohm Co., Ltd. Nonvolatile memory
US6420742B1 (en) * 2000-06-16 2002-07-16 Micron Technology, Inc. Ferroelectric memory transistor with high-k gate insulator and method of fabrication
JP3627640B2 (ja) * 2000-09-22 2005-03-09 松下電器産業株式会社 半導体メモリ素子
JP2002110932A (ja) * 2000-09-28 2002-04-12 Toshiba Corp 半導体装置及びその製造方法
US6602720B2 (en) * 2001-03-28 2003-08-05 Sharp Laboratories Of America, Inc. Single transistor ferroelectric transistor structure with high-K insulator and method of fabricating same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1131792A (ja) * 1997-07-14 1999-02-02 Oki Electric Ind Co Ltd 半導体記憶素子およびその製造方法
WO2001024272A1 (de) * 1999-09-28 2001-04-05 Infineon Technologies Ag Ferroelektrischer transistor
EP1246254A2 (de) * 2001-03-28 2002-10-02 Sharp Kabushiki Kaisha MFOS-Speicher-Transistor und diesbezügliches Herstellungsverfahren
EP1302978A2 (de) * 2001-10-16 2003-04-16 Sharp Kabushiki Kaisha Herstellungsverfahren eines selbstjustierten ferrroelektrischen Speichertransistor

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1999, no. 05 31 May 1999 (1999-05-31) *

Also Published As

Publication number Publication date
DE10308970A1 (de) 2004-09-09
WO2004077574A2 (de) 2004-09-10

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