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WO2002069065A3 - Regulateur de debit - Google Patents

Regulateur de debit Download PDF

Info

Publication number
WO2002069065A3
WO2002069065A3 PCT/US2002/006253 US0206253W WO02069065A3 WO 2002069065 A3 WO2002069065 A3 WO 2002069065A3 US 0206253 W US0206253 W US 0206253W WO 02069065 A3 WO02069065 A3 WO 02069065A3
Authority
WO
WIPO (PCT)
Prior art keywords
flow controller
temperature sensors
seamless slot
mass flow
fluidic communication
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2002/006253
Other languages
English (en)
Other versions
WO2002069065A2 (fr
Inventor
George K Porter
Seth B Wolf
Charles W Albrecht
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Porter Instrument Co Inc
Original Assignee
Porter Instrument Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Porter Instrument Co Inc filed Critical Porter Instrument Co Inc
Priority to EP02706478A priority Critical patent/EP1374004A2/fr
Priority to JP2002568122A priority patent/JP2004530190A/ja
Publication of WO2002069065A2 publication Critical patent/WO2002069065A2/fr
Publication of WO2002069065A3 publication Critical patent/WO2002069065A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B27/00—Instantaneous or flash steam boilers
    • F22B27/16—Instantaneous or flash steam boilers involving spray nozzles for sprinkling or injecting water particles on to or into hot heat-exchange elements, e.g. into tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B01F23/12—Mixing gases with gases with vaporisation of a liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/21—Mixing gases with liquids by introducing liquids into gaseous media
    • B01F23/213—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids
    • B01F23/2132—Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids using nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F16K27/003—Housing formed from a plurality of the same valve elements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B27/00—Instantaneous or flash steam boilers
    • F22B27/14—Instantaneous or flash steam boilers built-up from heat-exchange elements arranged within a confined chamber having heat-retaining walls
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
    • B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D2210/00—Indexing scheme relating to aspects and details of apparatus or devices for dispensing beverages on draught or for controlling flow of liquids under gravity from storage containers for dispensing purposes
    • B67D2210/00028—Constructional details
    • B67D2210/00047—Piping
    • B67D2210/0006—Manifolds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/877—With flow control means for branched passages
    • Y10T137/87885—Sectional block structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Drying Of Semiconductors (AREA)
  • Nozzles (AREA)
  • Valve Housings (AREA)
  • Measuring Volume Flow (AREA)
  • Flow Control (AREA)

Abstract

L'invention concerne un régulateur de débit permettant d'amener un volume précis de fluide, p. ex. flux de fluide de grande pureté, vers une destination de traitement telle qu'une chambre de traitement de plaquettes. Le régulateur de débit comprend une base comportant, formée dans une de ses faces, une fente sans soudure produisant une chute de pression prévisible. La fente sans soudure est en communication fluidique avec un canal de détection s'étendant vers le bas depuis la fente sans soudure ; sur ledit canal sont placés des capteurs de température servant à amener le débit dans le régulateur de débit. Une soupape en communication fluidique avec la fente sans soudure est connectée exploitable aux capteurs de température de manière à régler l'ouverture de la soupape jusqu'à ce que le débit amené par les capteurs de température soit égal au débit voulu.
PCT/US2002/006253 2001-02-28 2002-02-28 Regulateur de debit Ceased WO2002069065A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP02706478A EP1374004A2 (fr) 2001-02-28 2002-02-28 Regulateur de debit
JP2002568122A JP2004530190A (ja) 2001-02-28 2002-02-28 流量コントローラ

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27194701P 2001-02-28 2001-02-28
US60/271,947 2001-02-28

Publications (2)

Publication Number Publication Date
WO2002069065A2 WO2002069065A2 (fr) 2002-09-06
WO2002069065A3 true WO2002069065A3 (fr) 2003-03-20

Family

ID=23037766

Family Applications (4)

Application Number Title Priority Date Filing Date
PCT/US2002/006313 Ceased WO2002074445A2 (fr) 2001-02-28 2002-02-28 Atomiseur
PCT/US2002/006253 Ceased WO2002069065A2 (fr) 2001-02-28 2002-02-28 Regulateur de debit
PCT/US2002/006302 Ceased WO2002068127A2 (fr) 2001-02-28 2002-02-28 Systeme de distribution de fluide a collecteur
PCT/US2002/006411 Ceased WO2002068713A1 (fr) 2001-02-28 2002-02-28 Vaporisateur

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PCT/US2002/006313 Ceased WO2002074445A2 (fr) 2001-02-28 2002-02-28 Atomiseur

Family Applications After (2)

Application Number Title Priority Date Filing Date
PCT/US2002/006302 Ceased WO2002068127A2 (fr) 2001-02-28 2002-02-28 Systeme de distribution de fluide a collecteur
PCT/US2002/006411 Ceased WO2002068713A1 (fr) 2001-02-28 2002-02-28 Vaporisateur

Country Status (6)

Country Link
US (4) US6834848B2 (fr)
EP (4) EP1363745B1 (fr)
JP (4) JP2004524150A (fr)
AU (1) AU2002242304A1 (fr)
DE (3) DE60215618T2 (fr)
WO (4) WO2002074445A2 (fr)

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EP1363745A2 (fr) 2003-11-26
DE60204706D1 (de) 2005-07-21
JP2004530190A (ja) 2004-09-30
WO2002068127A3 (fr) 2002-11-21
EP1372864B1 (fr) 2006-10-18
WO2002074445A8 (fr) 2003-01-16
EP1427868B1 (fr) 2005-06-15
US6834848B2 (en) 2004-12-28
JP2004524150A (ja) 2004-08-12
WO2002074445A3 (fr) 2002-11-28
WO2002069065A2 (fr) 2002-09-06
AU2002242304A1 (en) 2002-09-12
US20020124961A1 (en) 2002-09-12
JP2005506681A (ja) 2005-03-03
US20020124641A1 (en) 2002-09-12
US6604492B2 (en) 2003-08-12
US20020121249A1 (en) 2002-09-05
DE60215618T2 (de) 2007-08-30
EP1427868A2 (fr) 2004-06-16
EP1363745B1 (fr) 2006-10-25
EP1374004A2 (fr) 2004-01-02
WO2002068713A1 (fr) 2002-09-06
DE60204706T2 (de) 2006-05-18
WO2002068713A8 (fr) 2002-10-24
EP1372864A2 (fr) 2004-01-02
US6892762B2 (en) 2005-05-17
DE60215471T2 (de) 2007-08-23
WO2002074445A2 (fr) 2002-09-26
US6694809B2 (en) 2004-02-24
DE60215618D1 (de) 2006-12-07
US20020148406A1 (en) 2002-10-17
WO2002068127A8 (fr) 2003-02-27
DE60215471D1 (de) 2006-11-30
WO2002068127A2 (fr) 2002-09-06
JP2004524148A (ja) 2004-08-12

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