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WO1999003787A1 - Procede et dispositif permettant de produire des vapeurs de charge d'alimentation de faible debit - Google Patents

Procede et dispositif permettant de produire des vapeurs de charge d'alimentation de faible debit Download PDF

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Publication number
WO1999003787A1
WO1999003787A1 PCT/US1998/014018 US9814018W WO9903787A1 WO 1999003787 A1 WO1999003787 A1 WO 1999003787A1 US 9814018 W US9814018 W US 9814018W WO 9903787 A1 WO9903787 A1 WO 9903787A1
Authority
WO
WIPO (PCT)
Prior art keywords
injector
feedstock
liquid feedstock
gas
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1998/014018
Other languages
English (en)
Inventor
Mark A. Mcdermott
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Priority to EP98933203A priority Critical patent/EP1007484A4/fr
Priority to AU82913/98A priority patent/AU727914B2/en
Priority to CA002295684A priority patent/CA2295684A1/fr
Priority to JP2000503025A priority patent/JP2001510136A/ja
Priority to KR1020007000638A priority patent/KR20010022069A/ko
Publication of WO1999003787A1 publication Critical patent/WO1999003787A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00504—Controlling the temperature by means of a burner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00548—Flow
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid

Definitions

  • the present invention relates to the field of producing low flow rates of feedstock vapors utilized in the manufacturing of silica glass.
  • the invention is especially suited for use m the manufacture of planar optical waveguides and lightwave optical circuits .
  • Silica soot is deposited m thin layers on planar surfaces m the manufacture of lightwave optical circuits.
  • the deposited soot is sintered and consolidated into silica glass that form the core and cladding glasses that make up the optical waveguides m optical circuits.
  • Trouchet the disclosure of which is hereby incorporated by reference discloses such a planar optical circuit which functions as a wavelength demultiplexer.
  • Previous feedstock vapor producing systems used m the manufacture of planar optical waveguides and circuits have used a complicated system of multiple bubblers with an individual bubbler for each of the chemical components of the feedstock vapor.
  • Prior art feedstock vapor producing systems have been complicated and unreliable m producing a low volume flow rate of feedstock vapors.
  • Prior art feedstock vapor producing systems have been found to produce an undesirable pulse m the stream of soot emerging from the flame of the conversion site burner and have difficulties m delivering a consistent low flow rate of feedstock vapors.
  • the present invention is directed to a system for producing a low flow rate of feedstock vapors utilized m the manufacturing of optical waveguides such as planar optical circuits that substantially obviates one or more of the problems due to limitations and disadvantages of the related art.
  • the invention includes a method of producing feedstock vapors m the manufacturing of optical waveguides using the steps of providing a constant flow of a liquid feedstock, mixing the flow of liquid feedstock with an inert injector gas, providing a vaporizer chamber, expelling the mixture of liquid feedstock and injector gas from an injector orifice, and into the vaporizer chamber, flowing a carrier gas into the vaporizer chamber and by the injector orifice and through the expelled mixture of liquid feedstock and injector gas.
  • the inventive method includes the further steps of vaporizing the liquid feedstock into a feedstock vapor and delivering the feedstock vapor to a conversion site where it is converted into a silica soot which produces a silica based glass.
  • the invention includes an apparatus for generating and delivering feedstock vapors m the manufacturing of silica glass which includes a means for providing a constant flow of a liquid feedstock, a means for providing a flow of an injector gas, and a mixer for mixing the liquid feedstock with the injector gas.
  • the apparatus further includes a longitudinal injector tube for communicating the mixture of liquid feedstock and injector gas from the mixer and into a vaporizer chamber and a means for flowing a carrier gas close to the injector tube, preferably said flow starting before entry into the vaporizer chamber, and into the vaporizer chamber wherein the injected liquid feedstock is vaporized into a feedstock vapor.
  • the apparatus includes a delivery conduit for delivering the feedstock vapor to a silica glass manufacturing site wherein the feedstock vapor is converted into silica soot.
  • FIG. 1 discloses a vaporizer system m accordance with the invention.
  • FIG. 2 is an enlarged view of part of FIG. 1 and discloses the vaporizer system and fluid flows therein m accordance with the invention.
  • FIG. 3 is a schematic view of vaporizer system and the manufacture of optical waveguides and planar optical circuits .
  • FIG. 4 discloses an injector tube m accordance with the invention.
  • the inventive method of making an optical waveguide includes an inventive method of providing feedstock vapors which are converted into a silica based glass which forms the optical waveguide.
  • the method includes the step of providing a constant fluid flow of a liquid feedstock at a volume flow rate less than approximately 0.5 ml/minute.
  • the method includes the step of mixing the provided constant flow of liquid feedstock with an injector gas, preferably an inert injector gas such as N 2 .
  • the method includes the step of providing a vaporizer chamber.
  • the method includes the step of expelling the mixture of liquid feedstock and injector gas from an injector orifice into the vaporizer chamber.
  • the injector orifice has an inside diameter less than 1.4 mm, more preferably m the range from about .15 mm to about .9 mm, more preferably m the range from about .4 mm to about .8 mm, more preferably m the range from about .7 mm to about .8 mm, more preferably m the range from about .73 mm to about .79 mm, more preferably m the range from about .75 mm to about .77 mm, and most preferably about .03 inch.
  • the method further includes the step of flowing a carrier gas, preferably an inert carrier gas, such as N ⁇ , into said vaporizer chamber proximate said injector orifice, and through the mixture of liquid feedstock and injector gas expelled from the injector orifice.
  • the method further includes the step of vaporizing the liquid feedstock into a feedstock vapor within the vaporizer chamber.
  • the method includes the step of removing the feedstock vapor from the vaporizer chamber and delivering the feedstock vapor to a conversion site.
  • the method includes the step of converting the feedstock vapor delivered to the conversion site into a silica based glass used to form the optical waveguide and planar optical circuit.
  • the preferred conversion site is comprised of a elongated burner which produces a flame which conver t s the vapor feedstock into a soot.
  • the preferred method of converting the vapor feedstock includes flame hydrolyzmg the vapor feedstock m a burner flame which converts the vapor feedstock into a silica soot which is deposited onto a preferably planar deposition surface and then sintered into a silica based glass layer.
  • a mixture of fuel gas is added to the feedstock vapor prior to delivering to the conversion site burner and flame.
  • the step of providing a constant flow of a liquid feedstock at a volume flow rate less than about 0.5 ml/mmute includes preferably providing a constant flow of the liquid feedstock at a volume flow rate less than 0.1 ml/mmute, preferably m the range of 0.01 to 0.09 ml/mmute, more preferably m the range of 0.03 to 0.06 ml/m utes and most preferably the range of 0.045 to 0.055 ml/mmute.
  • the step of mixing and providing the constant flow of liquid feedstock with an injector gas includes the step of mixing the liquid feedstock with the injector gas being provided at a gas volume flow rate m the range from 0.01 to 0.15 standard liters per minute and more preferably in the range from 0.02 to 0.1 standard liters per minute.
  • the flow of injector gas is traverse to the flow of liquid feedstock to provide beneficial mixing between the liquid feedstock and the injector gas prior to entry into the injector tube and the vaporizer chamber.
  • the flow of injector gas is approximately perpendicular to the flow of liquid feedstock during mixing.
  • the step of expelling the mixture of liquid feedstock and injector gas from an injector orifice and into the vaporizer chamber includes expelling the mixture from an injector orifice having an mside diameter less than 0.9 mm, and preferably greater than 0.15 mm.
  • the mside diameter of the injector orifice is m the range from about 0.4 mm to 0.8 mm, more preferably m the range from about .73 mm to .79 mm, more preferably the range from about .75 mm to about .77 mm, and most preferably is about .03 inch (.762 mm) .
  • the steps of mixing and expelling the mixture of liquid feedstock and injector gas include the step of forcing the liquid feedstock and injector gas through a longitudinal injector tube extending into the vaporizer chamber with the longitudinal injector tube terminating with an injector orifice.
  • the longitudinal injector tube has an entrance, at its distal end from the injector orifice, with the entrance having an mside diameter greater than the mside diameter of the injector orifice.
  • the longitudinal tube has a decreasing mside diameter between the entrance and the injector orifice.
  • the step of providing a constant flow of a liquid feedstock includes the step of pumping the liquid feedstock with a single stroke nonreciprocat g pump.
  • the method includes the step of providing a liquid feedstock by mixing a liquid siloxane with at least one dopant precursor liquid to form the liquid feedstock utilized m the invention.
  • the step of flowing a carrier gas into the vaporizer chamber, by said injector orifice, and through the expelled mixture includes the step of flowing an inert carrier gas, preferably along the longitudinal length of the longitudinal injector tube, preferably starting the flow along the length prior to entry into the vaporizer chamber, at a gas volume flow rate m the range from 0.1 to 0.3 standard liters per minute, most preferably m the range from 0.15 and 0.2 standard liters per mmute.
  • the flowing of a carrier gas coaxially along the length of the longitudinal injector tube includes flowing the carrier gas along a segment of the injector tube that is outside of the vaporizer chamber.
  • the step of providing a liquid feedstock includes the step of mixing at least two liquid compounds and preferably the step of vaporizing the liquid feedstock into a feedstock vapor includes the step of heating the vaporizer chamber to a temperature at least as high as the boiling points of the liquid compounds.
  • the step of providing a vaporizer chamber includes providing a vaporizer chamber comprised of a longitudinal length of ducting having an side diameter m the range of 8 mm to 20 mm, more preferably with the vaporizer chamber containing solid inert members, such as glass beads, with a diameter m the range from 3 mm to 5 mm. More preferably the flow of the carrier gas is along an axis which is coaxial and common with the longitudinal axis of the vaporizer chamber ducting, and the injector tube.
  • the inventive apparatus for generating and delivering feedstock vapors m the manufacturing of silica glass which is formed into planar optical waveguides m a planar optical circuit includes a means for providing a constant flow of a liquid feedstock and a means for providing a flow of an injector gas.
  • the apparatus includes a mixer wherein the flow of liquid feedstock is mixed with the flow of injector gas to form a mixture of liquid feedstock and injector gas.
  • the apparatus includes a longitudinal injector tube for communicating said mixture of liquid feedstock and injector gas away from the mixer and into a vaporizer chamber.
  • the apparatus includes a means for flowing a carrier gas proximate said injector tube and into said vaporizer chamber.
  • the apparatus further includes a means for delivering the feedstock vapor to a silica glass manufacturing site wherein the feedstock vapor is converted into silica, preferably silica soot an glass which form planar optical waveguides m a planar optical circuit.
  • the means for delivering the feedstock vapor to a silica glass manufacturing site includes a means for delivering the feedstock vapor to a conversion site burner wherein said feedstock vapors enter a conversion site flame which converts the feedstock vapor into silica soot which is deposited on a deposition surface .
  • the means for providing a constant flow of the liquid feedstock m the apparatus preferably includes a nonreciprocatmg pump.
  • the mixer comprises a conduit junction wherein the flow of liquid feedstock is substantially traverse to the flow of injector gas, more preferably wherein said flow of liquid feedstock is vertically oriented and substantially perpendicular to said flow of injector gas.
  • the longitudinal injector tube of the apparatus includes an entrance proximate said mixer and a distal injector orifice that is proximate the vaporizer chamber wherein the injector orifice preferably has an mside diameter m the range from about 0.15 mm to about 0.9 mm, more preferably about .4 mm to about .8 mm, more preferably about .73 mm to about .79 mm, more preferably about .75 mm to about .77 mm, and most preferably about .03 inch.
  • the means for flowing a carrier gas proximate said injector tube and into the vaporizer chamber includes a longitudinal carrier gas conduit with said longitudinal injector tube extending through said carrier gas conduit wherein said carrier g is flows along a length of the injector tube, proximate the injector orifice, and through the mixture of liquid feedstock and injector gas that is injected through said injector orifice and into the vaporizer chamber.
  • the vaporizer chamber includes a longitudinal length of ducting having an mside diameter m the range of 8 mm to 20 mm.
  • the longitudinal injector tube, the carrier gas conduit, and the vaporizer chamber ducting is substantially coaxial and col ear.
  • the means for removing the feedstock vapors from the vaporizer chamber includes a vapor feedstock delivery conduit proximate the vaporizer chamber which is coaxial and colmear with the vaporizer chamber ducting.
  • FIG. 1 discloses an apparatus and method of the invention.
  • Feedstock vaporizer system 20 was used to vaporize a liquid feedstock into a feedstock vapor which was converted m a combustion flame into silica soot which was deposited onto a deposition surface and converted into a silica glass which formed an optical waveguide m a planar optical circuit.
  • Means for providing a constant flow of a liquid feedstocK 22 provides a constant flow of a liquid feedstock, preferably at a volume flow rate less than about 0.5 ml/mmute to mixer 28.
  • Means for providing a flow of an injector gas 24 provides a f.ow of injector gas to mixer 28 wherein the liquid feedstock is mixed with the injector gas.
  • Longitudinal injector tube 30 communicates the liquid feedstock mixed with injector gas from injector tube entrance 34 to injector orifice 36.
  • the liquid feedstock mixed with injector gas is expelled from injector orifice 36 into vaporizer chamber 32 wherein the liquid feedstock expelled from the injector tube 30 is vaporized into a feedstock vapor.
  • Means for flowing a carrier gas 26 proximate injector tube 30 and into vaporizer chamber 32 provides a flow of carrier gas by injector orifice 36.
  • Vapor feedstock delivery conduit 38 provides a means for delivering the feedstock vapor to a conversion site.
  • feedstock vaporizer system 20 is vertically oriented as shown m FIG. 1.
  • FIG. 2 is an enlarged view of the upper portion of vaporizer system 20 as shown m FIG. 1.
  • the end segment of the 1.5875 mm outside diameter tube was cut off so that only about 1.5 mm to 3.2 mm of the tube extends out from the 3.175 mm outside diameter tube.
  • a length of a hypodermic tube was inserted about 1.6 mm into the 1.5875 mm outside diameter tube and secured therein with silver solder.
  • the end segment of the hypodermic tube was cut off and deburred so that only about 1.5 mm to 3.2 mm of the hypodermic tube extends out from the 1.5875 mm outside diameter tube.
  • the hypodermic tube may have an mside diameter of .254 mm (0.010 mch), .3556 mm (.014 mch), .4318 mm (.017 mch), and .762 mm (.030 mch).
  • the hypodermic tube that is preferred and used has an mside diameter of .762 mm (. ⁇ JO mch).
  • the end of the hypodermic tube provides the injector orifice 36 having an mside diameter equal to the mside diameter of the hypodermic tube.
  • the preferred longitudinal injector tube 30 of the invention is shown m FIG. 4.
  • Longitudinal injector tube 30 shown FIG. 4 was made by inserting injector tip 23, which was fabricated by press forming and swaggmg down a 1.6 mm (.065 mch) outside diameter stainless steel tube 61 to have a narrowing portion 63 which terminated with injector orifice 36 having a mside diameter of about .76 mm (.030 mch), into a 3.175 mm (1/8 mch) mside diameter stainless steel tube 25 and silver soldered therein.
  • liquid feedstock and injector gas mixer 28 was comprised of a T-junction of cippropriate size to match up with the delivery tubing 40 of liquid feedstock delivery means 22 and the delivery tubing 42 of injector gas delivery means 24.
  • Mixer 28 provided a junction wherein liquid feedstock flow 46 was traverse and substantially perpendicular to injector gas flow 44 to produce a mixture of liquid feedstock and injector gas which enters injector tube 30 through entrance 34.
  • the elongated longitudinal length of injector tube 30 provides additional space where the liquid feedstock may mix with the injector gas.
  • Injector tube 30, having a length of about 114.3 mm, extended through the interior of outer pipe members 48, through carrier gas T-junction 50 and through carrier gas conduit 45 which had a combined length of about half the length of injector tube 30, and communicated the mixture of injector gas and liquid feedstock through injector orifice 36 and into vaporizer chamber 32.
  • Vaporizer chamber 32 was formed from a longitudinal length of ducting 52 made from stainless steel tube having a 12.7 mm (1/2 mch) mside diameter and a longitudinal length of about 381 mm (15 mch) (about 3 to 4 times the length of injector tube 30) . Glass beads 54 having a 4 mm diameter were packed into the interior of ducting 52.
  • Feedstock vaporizer system 20 generated and delivered feedstock vapors for the manufacturing of silica soot glass layers as shown FIG. 3. Feedstock vapors were delivered through feedstock vapor delivery conduit 38 to conversion site 21.
  • a mixture of fuel gas which includes oxygen 27 and methane 29 was added through fuel gas mixture supply line 31 to the feedstock vapors delivery conduit 38 being delivered to conversion site 21.
  • the mixture of fuel gas and feedstock vapors were delivered to conversion site burner 33.
  • the feedstock vapors were converted into silica soot 37 m conversion site flame 35.
  • Silica soot 37 from the stream of silica soot emerging from flame 35 was deposited on deposition surface 39 of planar substrate 41 held by substrate holder 43.
  • the silica soot deposited on deposition surface 39 was sintered and consolidated to form a silica glass layer.
  • a liquid feedstock was provided by mixing appropriate amounts of a high purity siloxane liquid comprised of at least 98% by weight of octamethylcyclotetrasiloxane, as the silica feedstock source, with liquid dopant feedstock sources (dopant precursor) of trimethylphosphate, triethyllborate, and germanium ethoxide to result in a silica glass composition in the Ge0 2 - B 2 0 3 - P2O5 - Si0 2 system useful as a core glass in a planar waveguide.
  • a high purity siloxane liquid comprised of at least 98% by weight of octamethylcyclotetrasiloxane
  • liquid dopant feedstock sources dopant precursor of trimethylphosphate, triethyllborate, and germanium ethoxide
  • a mixture without germanium ethoxide can provide a silica glass composition in the B 2 0 - P 2 0 5 - Si0 system useful as a cladding glass in a planar waveguide.
  • the liquid feedstock mixture of octamethylcyclotetrasiloxane with dopant precursor compounds was used to fill a syringe cylinder of a controllable flow screw driven 74900 Series brand syringe pump commercially available from Cole Palmer Inc..
  • This nonreciprocating single stroke syringe pump filled with the liquid feedstock mixture was the providing means 22 for providing a constant flow of a liquid feedstock.
  • This providing means 22 was able to provide a constant flow of the liquid feedstock at a volume flow rate less than about 0.5 ml/minute.
  • the preferred flow rate of liquid feedstock flow 46 was about 0.05 ml/minute which provided the system with good performance.
  • Means 24 for providing a flow of an injector gas included a N 2 inert nitrogen gas source which provided an inert N 2 injector gas flow 44 at a volume flow rate in the preferred range of .025 to 0.1 standard liters per minute.
  • This N 2 injector flow mixed with the flow of liquid feedstock to provide liquid feedstock and N 2 injector gas mixture flow 56 which communicated down through « longitudinal injector tube 30 and was expelled through injector orifice 36 and into vaporizer chamber 32.
  • Means 24 for flowing a carrier gas proximate said injector tube 30 and into vaporizer chamber 32 included a N 2 inert nitrogen gas source which provided an inert N 2 carrier gas flow 58 at a volume flow rate m the preferred range of 0.15 to 0.2 standard liters per minute.
  • Carrier gas flow 58 flowed along injector tube 30, by injector orifice 36, and through the liquid feedstock injector gas mixture that was expelled through orifice 36. The liquid feedstock expelled from orifice 36 was vaporized within vaporizer chamber 32 into a feedstock vapor.
  • Vaporizer chamber 32 was heated to about 230°C which was above the 218°C boiling point of highest boiling point compound of the liquid feedstock. Heat tape was used to heat vaporizer chamber 32 and vapor feedstock delivery conduit 38 which provided a means to deliver the feedstock vapor to a silica glass manufacturing site where the feedstock vapor was converted m a flame into silica soot.
  • Feedstock vaporizer system 20 generated and delivered a consistent and steady flow of feedstock vapors to a conversion site combustion burner flame which converted the feedstock vapors into silica soot which was deposited on the deposition surface of a silica substrate.
  • Feedstock vaporizer system 20 utilized very low volume flow rates of liquid feedstock without the formation of pulses at the conversion site flame.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Optical Integrated Circuits (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Abstract

L'invention concerne un procédé et un appareil permettant de produire des vapeurs de charge d'alimentation utilisées dans la production de verre de silice. L'appareil comprend un moyen destiné à produire un flux constant d'une charge d'alimentation liquide (22), un moyen produisant un gaz injecteur (24), un mélangeur (28), un tube injecteur (30) doté d'une entrée (34) et d'un orifice injecteur (36), un moyen destiné à l'écoulement d'un gaz porteur (26), une chambre de vaporisation (32) et un conduit (38) destiné à délivrer des vapeurs de charge d'alimentation à un site de conversion qui les transforme en verre de silice. L'invention permet d'obtenir des vapeurs de charge d'alimentation de faibles débits utiles, convenant particulièrement à l'utilisation dans la production de guides d'ondes optiques planaires et des circuits optiques à ondes lumineuses.
PCT/US1998/014018 1997-07-21 1998-07-07 Procede et dispositif permettant de produire des vapeurs de charge d'alimentation de faible debit Ceased WO1999003787A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP98933203A EP1007484A4 (fr) 1997-07-21 1998-07-07 Procede et dispositif permettant de produire des vapeurs de charge d'alimentation de faible debit
AU82913/98A AU727914B2 (en) 1997-07-21 1998-07-07 Method and apparatus for producing low flow rates of feedstock vapors
CA002295684A CA2295684A1 (fr) 1997-07-21 1998-07-07 Procede et dispositif permettant de produire des vapeurs de charge d'alimentation de faible debit
JP2000503025A JP2001510136A (ja) 1997-07-21 1998-07-07 低流量の原料蒸気の生成方法および装置
KR1020007000638A KR20010022069A (ko) 1997-07-21 1998-07-07 저유량 공급원료 증기 제조장치 및 그 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US5331597P 1997-07-21 1997-07-21
US60/053,315 1997-07-21

Publications (1)

Publication Number Publication Date
WO1999003787A1 true WO1999003787A1 (fr) 1999-01-28

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PCT/US1998/014018 Ceased WO1999003787A1 (fr) 1997-07-21 1998-07-07 Procede et dispositif permettant de produire des vapeurs de charge d'alimentation de faible debit

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EP (1) EP1007484A4 (fr)
JP (1) JP2001510136A (fr)
KR (1) KR20010022069A (fr)
CN (1) CN1264352A (fr)
AU (1) AU727914B2 (fr)
CA (1) CA2295684A1 (fr)
TW (1) TW434194B (fr)
WO (1) WO1999003787A1 (fr)

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EP4144705A4 (fr) * 2020-05-01 2024-05-01 Shin-Etsu Chemical Co., Ltd. Dispositif de fabrication pour préforme en verre poreux, procédé de fabrication de préforme en verre poreux, et procédé de fabrication de préforme en verre de fibre optique

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Publication number Priority date Publication date Assignee Title
CN108499489A (zh) * 2018-03-30 2018-09-07 蔡艳辉 一种新型的化学试剂注入设备

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US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
US5141549A (en) * 1991-05-17 1992-08-25 The Charles Stark Draper Laboratories Method of fabricating rare earth doped planar optical waveguide for integrated optical circuit
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
US5707415A (en) * 1994-12-30 1998-01-13 Corning Incorporated Method of vaporizing reactants in a packed-bed, column, film evaporator

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US5703191A (en) * 1995-09-01 1997-12-30 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
CN1128111C (zh) * 1995-12-19 2003-11-19 康宁股份有限公司 在制造二氧化硅时抑制硅氧烷原料凝胶化的方法
WO1998027140A1 (fr) * 1996-12-16 1998-06-25 Corning Incorporated Procede et charge pour le formage de silice dopee au germanium

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5043002A (en) * 1990-08-16 1991-08-27 Corning Incorporated Method of making fused silica by decomposing siloxanes
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EP4144705A4 (fr) * 2020-05-01 2024-05-01 Shin-Etsu Chemical Co., Ltd. Dispositif de fabrication pour préforme en verre poreux, procédé de fabrication de préforme en verre poreux, et procédé de fabrication de préforme en verre de fibre optique

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TW434194B (en) 2001-05-16
AU8291398A (en) 1999-02-10
EP1007484A1 (fr) 2000-06-14
KR20010022069A (ko) 2001-03-15
AU727914B2 (en) 2001-01-04
JP2001510136A (ja) 2001-07-31
CN1264352A (zh) 2000-08-23
EP1007484A4 (fr) 2000-09-20
CA2295684A1 (fr) 1999-01-28

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